A method for generating reference status data for monitoring the status of a chamber, a method for monitoring the status of a chamber, and a device for monitoring the status of a chamber.

Abstract

This invention provides a method for generating reference status data for monitoring the status of a chamber, a method for monitoring the status of a chamber, and a device for monitoring the status of a chamber. [Solution] The method includes the steps of: obtaining a reference status dataset that reflects the status of a chamber; transmitting radio waves within a specific frequency range into the chamber to be monitored and receiving the radio waves reflected by the internal space of the chamber; generating current status data of the chamber using the received radio waves; generating monitoring information for the current status of the chamber using the reference status dataset and the current status data; and providing the monitoring information.

Description

Technical Field

[0001] The present disclosure relates to a method for generating reference status data for monitoring the status of a chamber, a method for monitoring the status of a chamber, and a device for monitoring the status of a chamber.

Background Art

[0002] In the manufacturing and inspection processes of semiconductors or displays, it is important to check whether the status of the equipment for the process is within the verified normal range and whether the process conditions are properly set. For example, the status of an ongoing process can be partially checked by detecting a specific physical quantity of plasma. However, it is difficult to individually check the status, such as whether the equipment is properly assembled before the process starts or whether the status of the equipment is normal during the process. Ultimately, the only option is to check the process result by performing a test run, which incurs additional costs and time. In addition, even if the process result is incorrect, it is difficult to identify the cause of the problem.

Summary of the Invention

Problems to be Solved by the Invention

[0003] The present disclosure aims to provide monitoring of the status of a chamber.

[0004] The present disclosure aims to provide monitoring of the status of a chamber not only when the process is in progress but also when the process is not in progress.

[0005] The present disclosure aims to provide means for comparing the statuses of multiple chambers.

[0006] The technical problems to be resolved by this disclosure are not limited to those described above, and other technical problems not mentioned will be clearly understood from this disclosure by those skilled in the art. [Means for solving the problem]

[0007] According to one embodiment, a method for generating reference status data to monitor the status of a chamber, the method comprising: a step of preparing a chamber in a first status, the chamber comprising a plurality of parts, wherein the geometric shape of the internal space of the chamber is defined by the plurality of parts, wherein the first status is defined by a combination of the geometric statuses of each of the plurality of parts; a step of transmitting radio waves of a specific frequency range into the internal space of the chamber in the first status and receiving the radio waves reflected by the internal space of the chamber; and a step of generating first reference status data of the chamber in the first status by using the radio waves received by an antenna.

[0008] The method further includes the steps of: preparing the chamber in a second status in which the geometric status of at least some of the plurality of components has changed from that of the chamber in the first status; and generating second reference status data by transmitting and receiving radio waves to and from the chamber in the second status.

[0009] The steps of transmitting and receiving the radio waves include transmitting radio waves from outside the chamber to the internal space of the chamber via a viewport formed in the chamber, and receiving radio waves reflected by the internal space of the chamber.

[0010] According to one embodiment, a method for generating reference status data to monitor the status of a chamber, the method comprising: a step of preparing a chamber in a first status comprising a plurality of components, wherein the geometric and electrical status of the internal space of the chamber is defined by the plurality of components, wherein the first status is defined by a combination of the geometric and electrical statuses of each of the plurality of components; a step of transmitting radio waves of a specific frequency range into the internal space of the chamber in the first status and receiving the radio waves reflected by the internal space of the chamber; and a step of generating first reference status data of the chamber in the first status by using the radio waves received by an antenna.

[0011] According to one embodiment, a method for monitoring the status of a chamber, the method comprising: obtaining a reference status dataset that reflects the status of the chamber; transmitting radio waves within a specific frequency range into the internal space of the chamber to be monitored and receiving the radio waves reflected by the internal space of the chamber; generating current status data of the chamber using the received radio waves; generating monitoring information for the current status of the chamber using the reference status dataset and the current status data; and providing the monitoring information, wherein the reference status dataset comprises a plurality of reference status data reflecting a plurality of statuses of the chamber, wherein the step of generating the monitoring information comprises calculating the similarity between each of the plurality of reference status data and the current status data, and generating the monitoring information based on the similarity.

[0012] The reference status dataset includes first reference status data reflecting a first status of the chamber and second reference status data reflecting a second status of the chamber, wherein the step of generating the monitoring information includes the step of calculating a first similarity between the first reference status data and the current status data; the step of calculating a second similarity between the second reference status data and the current status data; and the step of generating the monitoring information based on the first and second similarities.

[0013] The monitoring information includes information indicating that the chamber is in a state in which at least the first status and the second status overlap, if the first similarity is greater than or equal to the first criterion value and the second similarity is greater than or equal to the second criterion value.

[0014] The reference status dataset includes a plurality of reference status data reflecting a plurality of statuses of the chamber, wherein the step of generating the monitoring information includes the step of calculating the similarity between each of the plurality of reference status data and the current status data; and the step of generating the monitoring information based on the similarity.

[0015] The reference status dataset includes a plurality of reference status data reflecting a plurality of statuses of the chamber, wherein the method further includes the step of setting the current status data as a new reference status data if the similarity between each of the plurality of reference status data and the current status data is lower than a threshold value.

[0016] The method further includes the step of setting the current status data as new reference status data if user input is obtained that sets the current status of the chamber as a reference status.

[0017] The aforementioned specific frequency range includes a first frequency section and a second frequency section, wherein the steps for generating the monitoring information include: calculating a first similarity between data corresponding to at least some of the plurality of reference status data of the reference status dataset and data corresponding to the first frequency section of the current status data; calculating a second similarity between data corresponding to at least some of the plurality of reference status data of the reference status dataset and data corresponding to the second frequency section of the current status data; and generating the monitoring information based on the first and second similarities.

[0018] The step of providing the monitoring information includes the step of outputting an alarm considering the similarity between the reference status dataset and the current status data.

[0019] The steps of transmitting and receiving the radio waves include transmitting radio waves from outside the chamber to the internal space of the chamber via a viewport formed in the chamber, and receiving radio waves reflected by the internal space of the chamber.

[0020] The reference status dataset includes first process reference status data for a first process and second process reference status data for a second process, wherein the step of generating the monitoring information includes: acquiring process information; and generating the monitoring information using one of the first process reference status data and the second process reference status data, and the current status data based on the process information.

[0021] According to one embodiment, a non-temporary computer-readable medium storing instructions, wherein the instructions, when executed by one or more processors of the device, cause the device to perform a method.

[0022] According to one embodiment, a device for monitoring the status of a chamber, the device comprising: an antenna for transmitting radio waves within a frequency range of 300 MHz or higher and 30 GHz or lower into the chamber and receiving radio waves reflected by the internal space of the chamber; a bracket for fixing the antenna outside the chamber; a signal processing unit for applying an electrical signal to the antenna and acquiring the electrical signal from the antenna; a communication unit for communicating with the outside; and a control unit for generating monitoring information regarding the status of the chamber.

[0023] The bracket is designed to fix the position of the antenna outside a viewport formed in the chamber.

[0024] The positional relationship between the bracket and the antenna is designed such that one end of the antenna adjacent to the viewport has a predetermined distance from one side of the viewport adjacent to the antenna.

[0025] The position of the antenna is fixed by the bracket so as to correspond to a viewport formed in the chamber or a separate port for the antenna, and the position of the antenna is fixed by the bracket such that one end of the antenna adjacent to the viewport or the separate port has a predetermined distance from one side of the viewport or the separate port adjacent to the antenna.

[0026] The device further includes an electromagnetic shield disposed outside the chamber so as to surround the antenna.

[0027] The control unit generates status data regarding radio waves transmitted from the antenna and radio waves received by the antenna, and generates the monitoring information using the status data.

[0028] The control unit generates status data regarding a ratio between an input voltage applied to the antenna and an output voltage output from the antenna, and generates the monitoring information using the status data.

[0029] However, the solution means of the present disclosure is not limited to the above solution means, and solution means not mentioned may be clearly understood by those skilled in the art from the present disclosure. [Advantages of the Invention] According to an embodiment of the present disclosure, radio waves are transmitted inside the chamber, and the radio waves reflected by the internal space of the chamber are received and analyzed, thereby monitoring the status of the chamber at a lower cost and in less time.

[0030] The effects of the present disclosure are not limited to the above effects, and other effects not mentioned will be clearly understood by those skilled in the art from the present disclosure. [Brief Description of the Drawings]

[0031] [Figure 1] It is a block diagram showing a monitoring device according to an embodiment. [Figure 2] It is a schematic diagram showing a monitoring device installed in a chamber according to an embodiment. [Figure 3] It is a schematic diagram showing a monitoring device installed in a chamber according to an embodiment. [Figure 4] It is a graph showing the S11 parameter which is an example of status data. [Figure 5] It is a flowchart showing a method for generating reference status data according to an embodiment. [Figure 6] It is a flowchart showing a method for generating reference status data according to an embodiment. [Figure 7] It is a diagram showing a reference status data set including a reference status sub-data set according to an embodiment. [Figure 8] It is a flowchart showing a method for monitoring a chamber according to an embodiment. [Figure 9] This is a flowchart showing a method for monitoring a chamber according to an embodiment. [Figure 10] This figure shows the display of monitoring information according to the embodiment. [Figure 11] This figure shows the analysis of each frequency section of status data according to the embodiment. [Figure 12] This is a block diagram of a monitoring system according to an embodiment. [Figure 13] This is a schematic diagram showing a monitoring system installed on process equipment according to an embodiment. [Figure 14] This figure shows the status of the chamber used in the experimental example. [Figure 15] This figure shows the status of the chamber used in the experimental example. [Figure 16] This figure shows the status of the chamber used in the experimental example. [Figure 17] This figure shows the status of the chamber used in the experimental example. [Figure 18] This figure shows the experimental results in an example experiment. [Figure 19] This figure shows the experimental results in an example experiment. [Figure 20] This figure shows the experimental results in an example experiment. [Figure 21] This figure shows the experimental results in an example experiment. [Modes for carrying out the invention]

[0032] The embodiments described herein are intended to clearly illustrate the concepts of the disclosure to those skilled in the art in which the disclosure pertains. Therefore, the disclosure is not limited to the embodiments described herein, and the scope of the disclosure should be interpreted as including modifications or variations that fall within the concepts of the disclosure.

[0033] The terms used in this disclosure are common terms that are currently in widespread use, and are used in light of their function in this disclosure. However, such terms may change due to the intent of those skilled in the art, precedents, or the emergence of new technologies. However, where a particular term is defined and used with an optional meaning, the meaning of that term is explained. Therefore, the terms used in this disclosure should be interpreted not merely as names of terms, but based on their actual meaning and the details throughout this disclosure.

[0034] The drawings accompanying this disclosure are for illustrative purposes only, and the shapes shown in the drawings may be exaggerated to aid in understanding the disclosure; therefore, this disclosure is not limited by the drawings.

[0035] Where it is determined that a detailed description of a known structure or function relating to this disclosure would obscure the subject matter of this disclosure, such detailed description is omitted. In addition, throughout this disclosure, terms such as "Part 1," "Part 2," etc., are used solely to distinguish one element from another, unless otherwise noted.

[0036] According to this disclosure, a monitoring device may be provided. The monitoring device transmits radio waves into the chamber of process equipment such as semiconductor process equipment and display process equipment, and receives radio waves reflected by the internal space of the chamber, thereby monitoring the geometric status of the internal space of the chamber. More specifically, the chamber includes several components, such as a lower electrode on which a substrate such as a wafer is placed, an upper electrode opposite the lower electrode, pins for supporting the substrate, and baffles. The geometric status of the chamber may be defined by a combination of geometric statuses, such as the position or shape of each component. In this specification, even if the same radio waves are transmitted into the chamber, the received radio waves may vary depending on the geometric status of the chamber. For example, if the geometric status of some of the components changes, for example, if the position or shape of some of the components changes, the radio waves received after the change may differ from the radio waves received before the change, even if the same radio waves are transmitted into the chamber. That is, how radio waves are reflected by the internal space of the chamber may vary depending on the geometric status of the chamber. In other words, the received reflected waves may reflect the geometric status of the chamber.

[0037] Accordingly, monitoring devices can monitor chambers where a process is not in progress (as well as chambers where a process is in progress). For example, by monitoring the geometric status of the chamber's internal space, a monitoring device can monitor chambers where a process is not in progress, such as determining the assembly status of process equipment when it was manufactured, or determining the results of preventive maintenance (PM) on process equipment. As another example, by monitoring the geometric status of the chamber's internal space, a monitoring device can monitor chambers where a process is in progress, such as proceeding with the process while checking that each stage of the process is progressing normally, or predicting the timing of preventive maintenance.

[0038] The devices and methods disclosed herein for monitoring the status of a chamber monitor, as described above, whether the equipment is properly assembled before the process starts, or whether the status of the equipment is normal between and during the process. Specifically, objects monitored by the devices and methods disclosed herein may include the geometry of each component inside the chamber, the wear level of each component, the relative positional relationship between each component, and unwanted deposition of by-products generated by the process of the target substrate through the chamber on the inner wall of the chamber and on the surface of each component inside the chamber.

[0039] On the other hand, the objects monitored by the devices and methods disclosed herein may not include the state of the materials and energy supplied to the chamber being monitored (e.g., active species, etching gases, inert gases flowing into the chamber to perform the required process, RF power, or their plasma).

[0040] Figure 1 is a block diagram showing a monitoring device according to an embodiment. Referring to Figure 1, the monitoring device 100 may include an antenna 110, a signal processing unit 120, a communication unit 130, a control unit 140, and a storage unit 150.

[0041] The monitoring device 100 may transmit and receive radio waves via the antenna 110. The antenna 110 may receive electrical signals in order to transmit radio waves. The antenna 110 may receive radio waves and convert them into electrical signals. The monitoring device 100 may include one antenna 110. Alternatively, the monitoring device 100 may include two or more antennas 110. In this case, one or more of the two or more antennas 110 may be for transmitting radio waves, and the others may be for receiving radio waves. Alternatively, each of the two or more antennas 110 may be for transmitting and receiving radio waves at different locations.

[0042] The monitoring device 100 can apply an electrical signal to the antenna 110 via the signal processing unit 120 and acquire an electrical signal from the antenna 110. The signal processing unit 120 can apply an electrical signal within a specific frequency range to the antenna 110. The signal processing unit 120 can acquire an electrical signal within a specific frequency range from the antenna 110.

[0043] The monitoring device 100 can generate status data via the signal processing unit 120. This will be explained in more detail later.

[0044] The monitoring device 100 can communicate with the outside world via the communication unit 130. For example, the communication unit 130 can transmit status data and monitoring information to the outside world.

[0045] The communication unit 130 may perform wired or wireless communication. The communication unit 130 may be, but is not limited to, a wired / wireless local area network (LAN) module, a WAN module, an Ethernet® module, a Bluetooth® module, a ZigBee® module, a Universal Serial Bus (USB) module, an IEEE 1394 module, a Wi-Fi® module, an Ether-CAT module, a DeviceNet module, or a combination thereof.

[0046] The monitoring device 100 can generate monitoring information via the control unit 140. The control unit 140 can generate monitoring information based on status data. This will be explained in more detail later.

[0047] The control unit 140 may be implemented as a computer or similar device, depending on whether it is hardware, software, or a combination thereof. Hardware-wise, the control unit 140 may be one or more processors. Alternatively, the control unit 140 may be provided as processors that are physically separated from each other and cooperate via communication. The control unit 140 may be, but is not limited to, a central processing unit (CPU), a graphics processing unit (GPU), a digital signal processor (DSP), a state machine, a field-programmable gate array (FPGA), an application-specific integrated circuit (ASIC), a radio frequency integrated circuit (RFIC), or a combination thereof. Software-wise, the control unit 140 may be provided in the form of a program that drives the hardware control unit 140.

[0048] The monitoring device 100 can store various types of data and programs in the storage unit 150. For example, the storage unit 150 can store status data generated by the signal processing unit 120. As another example, the storage unit 150 can store monitoring information generated by the control unit 140.

[0049] The storage unit 150 may be, but is not limited to, non-volatile semiconductor memory, hard disk, flash memory, solid-state drive (SSD), random access memory (RAM), read-only memory (ROM), electrically erasable programmable read-only memory (EEPROM), other types of tangible non-volatile recording media, or combinations thereof.

[0050] The monitoring device 100 may further include a fixing part 160. The fixing part 160 can fix the antenna 110 in a location close to the chamber. For example, the fixing part 160 can fix the antenna 110 such that the antenna 110 and the chamber are separated by a predetermined distance. The predetermined distance may be, for example, 1 mm, 3 mm, 5 mm, 7 mm, or 1 cm, but is not limited thereto. As another example, the fixing part 160 can fix the antenna 110 such that the antenna 110 and the chamber are in contact with each other. The fixing part 160 may be, for example, a bracket, but is not limited thereto.

[0051] The monitoring device 100 may further include an output unit 170. For example, the output unit 170 may be a display. The monitoring device 100 may display monitoring information via the display. As another example, the output unit 170 may be a speaker. The monitoring device 100 may output an alarm via the speaker.

[0052] The monitoring device 100 may further include an electromagnetic shield 180. The electromagnetic shield 180 prevents the antenna 110 from being affected by external electromagnetic waves or reduces their effectiveness. For example, the electromagnetic shield 180 may be positioned outside the chamber so as to surround the antenna 110. The electromagnetic shield 180 may be provided from a variety of materials capable of shielding electromagnetic waves.

[0053] An integrated type of monitoring device 100 may be provided. For example, the monitoring device 100 may be provided in an integrated form comprising an antenna 110, a signal processing unit 120, a communication unit 130, a control unit 140, a storage unit 150, and a fixed unit 160.

[0054] Alternatively, a separate type of monitoring device 100 may be provided. For example, the monitoring device 100 may be provided in a form in which the antenna 110 and other elements are separated.

[0055] Not all elements shown in Figure 1 are essential for a monitoring device, and at least one or more of the elements of a monitoring device shown in Figure 1 may be omitted. In addition, a monitoring device may include elements not shown in Figure 1.

[0056] Monitoring devices can be implemented using network analyzers such as vector network analyzers (VNAs).

[0057] For example, signal processing units, communication units, control units, and storage units can be implemented using a network analyzer.

[0058] As another example, a signal processing unit may be implemented using a network analyzer. In this case, in addition to the network analyzer, the monitoring device may include additional devices to implement communication units, control units, and storage units.

[0059] The monitoring device may be installed inside the chamber.

[0060] Figures 2 and 3 are schematic diagrams showing a monitoring device installed in a chamber according to an embodiment.

[0061] Referring to Figure 2, the antenna may be located outside the chamber 10. For example, the antenna may be located outside the viewport 11 formed within the chamber 10.

[0062] The antenna may be mounted outside the chamber 10 by a fixed part. For example, the antenna may be mounted outside the chamber 10 by a fixed part such that the antenna and the chamber 10 are spaced apart by a predetermined distance. As another example, the antenna may be mounted outside the chamber 10 by a fixed part such that the antenna and the chamber 10 are in contact with each other.

[0063] Although not shown, the antenna may be located inside the chamber. For example, the antenna may be located inside a viewport formed in the chamber. The antenna may be mounted inside the chamber by a fixed part. However, if the antenna is located inside the chamber, the antenna may contaminate the chamber, or the antenna may become contaminated as the process progresses, which may be disadvantageous compared to positioning the antenna outside the chamber.

[0064] Referring to Figure 3, in the case of an integrated type of monitoring device 100, the monitoring device 100 may be used in a form that is mounted on the chamber 10.

[0065] In the case of a distinct type of monitoring device, the monitoring device may be used in a configuration in which only one or more elements of the monitoring device are mounted in a chamber, and the other elements are connected to the chambered elements via wires. For example, the monitoring device may be used in a configuration in which an antenna is mounted in a chamber, and the other elements are connected to the antenna via wires. The connecting wires may be, for example, coaxial cables.

[0066] While the antenna has been described with reference to Figures 2 and 3 as being positioned in correspondence with the viewport, in addition to the viewport, the antenna may be positioned in correspondence with a ceramic or other area of ​​the chamber through which the radio waves penetrate. For example, in addition to the presence of the viewport, an additional port for mounting the antenna may be formed in the chamber, and the antenna may be positioned in correspondence with the additional port.

[0067] In addition, while the monitoring device has been described with reference to Figures 2 and 3 as including one antenna, the monitoring device may include two or more antennas, as described above. In this case, one or more of the two or more antennas may be mounted in one area of ​​the chamber, and the others may be mounted in another area of ​​the chamber.

[0068] The following section provides a more detailed explanation of how to monitor the chamber status.

[0069] Monitoring devices can generate status data.

[0070] Status data may relate to radio waves incident from the antenna into the chamber (hereinafter referred to as "incident waves") and radio waves reflected by the internal space of the chamber and received by the antenna (hereinafter referred to as "reflected waves"). Status data may also relate to the voltage applied to the antenna and the voltage output from the antenna.

[0071] Status data may correspond to a specific frequency range. Status data may be generated for a specific frequency range.

[0072] Status data can be defined using incident and reflected waves. For example, status data can be defined using the ratio between the incident and reflected waves, e.g., the ratio of the reflected wave to the incident wave. Status data may be, but are not limited to, S-parameters, H-parameters, Y-parameters, Z-parameters, or parameters calculated therefrom.

[0073] In some embodiments, status data may be S-parameters.

[0074] In some other embodiments, the status data may be H parameters.

[0075] In some other embodiments, the status data may be the Y parameter.

[0076] In some other embodiments, the status data may be the Z parameter.

[0077] In some other embodiments, the status data may be a parameter derived from at least one selected from the group of S parameters, H parameters, Y parameters, and Z parameters.

[0078] In addition, in some other embodiments, the status data may be a combination of at least two parameters selected from the group of S parameters, H parameters, Y parameters, and Z parameters.

[0079] In addition, in some other embodiments, the status data may be parameters derived from a combination of at least two parameters selected from the group of S parameters, H parameters, Y parameters, and Z parameters.

[0080] In other words, the status data may be i) S-parameter, ii) H-parameter, iii) Y-parameter, iv) Z-parameter, v) a combination of at least two parameters selected from the group of S-parameter, H-parameter, Y-parameter, and Z-parameter, vi) a parameter derived from the S-parameter, H-parameter, Y-parameter, and Z-parameter, or vii) a parameter derived from a combination of at least two parameters selected from the group of S-parameter, H-parameter, Y-parameter, and Z-parameter.

[0081] For example, status data can be represented as the following n×2 matrix. (First frequency) (Size of reflected wave / Size of incident wave) (Second frequency) (Size of reflected wave / Size of incident wave) ... (nth frequency) (size of reflected wave / size of incident wave) As another example, status data can be represented as the following n×3 matrix. (First frequency) (Incident wave size) (Reflected wave size) (Second frequency) (Incident wave size) (Reflected wave size) ... (nth frequency) (size of incident wave) (size of reflected wave) In this specification, n indicates the number of frequencies at which status data is measured. The first frequency is the lower limit of the frequencies at which status data is measured. The nth frequency is the upper limit of the frequencies at which status data is measured. The frequencies from the first to the nth frequency constitute the frequency range at which status data is measured.

[0082] Status data may include parameter values ​​for a specific frequency range. In the example above, (size of reflected wave / size of incident wave), (size of incident wave), and (size of reflected wave) may be parameter values. The number of parameter values ​​included in the status data may be, for example, at least 500, 1000, 1500, or 2000. Considering the status data, multiple status data belonging to a specific frequency range may include multiple peaks belonging to that frequency range. The number of peaks included in the status data may be, for example, at least 5, 10, 20, 50, or 100.

[0083] Status data can correspond to a specific point in time. Status data can be generated at a specific point in time. For example, a specific point in time may be a time when the process is not in progress, such as when the assembly of process equipment is completed when the equipment is manufactured, or when preventive maintenance of process equipment is completed. Alternatively, a specific point in time may be a time when the process is in progress, such as a point in time at a specific stage of the process.

[0084] Figure 4 is a graph showing S11 parameters, which are an example of status data. Figure 4 shows the S11 parameters in dB for a frequency range from 3 GHz to 8.5 GHz. In Figure 4, several dozen peaks are observed, but the number of peaks may vary depending on the criteria used to count the peaks.

[0085] Status data may reflect the geometric status of the chamber. For example, if the geometric status of a component changes, such as the position or shape of a component contained inside the chamber, the status data after the change may differ from the status data before the change. As another example, the status data if part of a component is damaged may differ from the status data if there is no damage. As yet another example, the status data if foreign matter is present inside the chamber may differ from the status data if no foreign matter is present.

[0086] Status data may also reflect the electrical status of the chamber. For example, since conductivity and dielectric constant are determined by the material properties of the chamber or component, status data may reflect the electrical status of the chamber. As another example, if a polymer film is formed on the inner wall of the chamber as the process progresses, the dielectric constant of the wall changes, so status data may reflect the electrical status of the chamber.

[0087] According to the embodiment, the monitoring device can transmit radio waves of each frequency within a specific frequency range into the chamber and generate status data by receiving the radio waves reflected by the internal space of the chamber. For example, the monitoring device can generate a first parameter value by transmitting a radio wave of a first frequency into the chamber and receiving the radio wave reflected by the internal space of the chamber, and can generate a second parameter value by transmitting a radio wave of a second frequency into the chamber and receiving the radio wave reflected by the internal space of the chamber. By performing this for all frequencies, the monitoring device can generate status data corresponding to a specific frequency range.

[0088] To monitor a chamber, it may exist in a standard chamber monitoring status, and the chamber in the standard status and the chamber in the current status can be compared to monitor the chamber in the current status. Thus, the standard chamber status for chamber monitoring may be referred to as the reference status. For example, the reference status may be the golden chamber status. As another example, the reference status may be the status of a chamber of user interest. Examples of chambers of user interest may include, but are not limited to, a chamber in a good assembly status, a chamber with completed preventive maintenance, a chamber with good process results, a chamber in a poor status, a chamber in a status requiring preventive maintenance, and a chamber in a fault status.

[0089] The monitoring device may generate chamber status data in the reference status (hereinafter referred to as "reference status data").

[0090] Figures 5 and 6 are flowcharts showing a method for generating reference status data according to an embodiment.

[0091] Referring to Figure 5, the method for generating reference status data may include: step S102, preparing a chamber in a first status, the chamber comprising multiple components; step S104, transmitting radio waves into the chamber in the first status and receiving the radio waves reflected by the internal space of the chamber in the first status; and step S106, using the received radio waves to generate first reference status data for the chamber in the first status.

[0092] In step S102, the monitoring device may be installed in a chamber containing multiple components, which is in a first status. The chamber in the first status may be the chamber in the reference status described above.

[0093] In step S104, the monitoring device may transmit radio waves within a specific frequency range into the chamber in the first status and may receive radio waves reflected by the internal space of the chamber in the first status.

[0094] A specific frequency range may be determined by considering the characteristics of the object being monitored using the devices and methods for monitoring the status of the chamber disclosed herein.

[0095] For example, as described above, the devices and methods disclosed herein for monitoring the status of a chamber monitor whether the equipment (chamber) is properly assembled before the process starts, or whether there are any abnormalities on the inner walls of the equipment or on the surfaces of various components located inside the equipment, resulting from processes between processes and after the process is completed. In other words, objects monitored by the devices and methods disclosed herein may include the geometry of each component inside the chamber, the wear level of each component, the relative positional relationship between each component, and unwanted deposition of by-products generated by the process of the target substrate through the chamber on the inner walls of the chamber and on the surfaces of each component inside the chamber. On the other hand, the objects monitored by the devices and methods disclosed herein may not include the state of the materials and energy supplied to the chamber being monitored (e.g., active species, etching gases, inert gases flowing into the chamber to perform the required process, RF power, or their plasma).

[0096] Accordingly, specific frequency ranges used in the devices and methods disclosed herein may be determined to be frequency bands that are advantageous for monitoring the geometry of each component inside the chamber, the relative positional relationship between each component, the wear level of each component, or unwanted deposition of by-products generated by the process of the target substrate through the chamber on the inner wall of the chamber and the surface of each component inside the chamber.

[0097] On the other hand, a particular frequency range may be determined to be a frequency band that is not affected, or is relatively unaffected, by the material supplied to the chamber, which is under monitoring during the substrate process and is influenced by the energy state within the chamber (e.g., active species, etching gas, inert gas flowing into the chamber to perform the required process, RF power, or their plasma).

[0098] According to some embodiments, a particular frequency range can be determined as a frequency band having wavelengths from 1 mm to 1000 mm. That is, a particular frequency range could be from 300 MHz to 300 GHz.

[0099] According to some other embodiments, a particular frequency range may be determined as a frequency band having wavelengths from 10 mm to 500 mm. That is, a particular frequency range may be from 600 MHz to 30 GHz.

[0100] According to some other embodiments, the specific frequency range can be from 1 GHz to 20 GHz.

[0101] A specific frequency range may be determined by the size of the internal space of the chamber and / or the size of the components contained within the chamber.

[0102] The lower limit of a particular frequency range can be determined by the size of the chamber's internal space. For example, the larger the size of the chamber's internal space, the smaller the lower limit becomes.

[0103] The upper limit of a particular frequency range can be determined by the size of the components contained within the chamber. For example, the smaller the component size, the higher the upper limit.

[0104] Step S104 may include a step of transmitting radio waves into the chamber in the first status. For example, step S104 may include a step of transmitting radio waves from outside the chamber in the first status into the chamber in the first status.

[0105] Step S104 may include a step of receiving radio waves reflected by the internal space of the chamber in the first state. For example, step S104 may include a step of receiving the radio waves reflected by the internal space of the chamber in the first state by the outside of the chamber in the first state.

[0106] In step S106, the monitoring device may use the received radio waves to generate first reference status data for the chamber in the first status. The above details of the step for generating status data can be similarly applied to the above step for generating first reference status data using received radio waves, so their redundant explanations are omitted.

[0107] The above method for generating reference status data can be carried out as shown in Figure 6.

[0108] Referring to Figure 6, the method for generating reference status data may include: step S202, preparing the chamber in the second status; step S204, transmitting radio waves into the chamber in the second status and receiving the radio waves reflected by the internal space of the chamber in the second status; and step S206, using the received radio waves to generate second reference status data for the chamber in the second status.

[0109] In stage S202, the monitoring device may be installed in a chamber containing multiple components, which is in the second status. The chamber in the second status may be the same as the chamber in the reference status described above.

[0110] A chamber in the second status may be a chamber in a different status than the chamber in the first status.

[0111] The status of a chamber can be defined by the combination of geometric statuses of the components contained within it. Therefore, chambers with different geometric statuses of at least some components can be in different statuses.

[0112] The status of a chamber can vary depending on the position of its components. For example, a chamber with the first component in the first position and a chamber with the first component in the second position may be in different statuses.

[0113] The status of a chamber can vary depending on the shape of its components. For example, a chamber with a normal first component and a chamber with an abnormal first component (e.g., a damaged component) can be in different statuses. Another example is a chamber with a normal first component and an abnormal second component, and a chamber with an abnormal first component and a normal second component.

[0114] The status of a chamber can vary depending on whether a part is present or not. For example, a chamber with a first part present and a chamber without a first part (e.g., the part has been removed) can be in different statuses.

[0115] The status of a chamber can vary depending on whether or not foreign matter is present. For example, a chamber with foreign matter and a chamber without foreign matter may be in different statuses.

[0116] The factors described above that define the status of a chamber can be applied independently. For example, consider the case where the first part changes the status of the chamber. Assuming the first part has 5 positions, 2 shapes (normal / abnormal), and 2 states (present and absent), the first part causes the chamber to have at least 20 (5 × 2 × 2 = 20) different statuses. If the second part causes the chamber to have 20 different statuses, then the first and second parts together cause the chamber to have at least 400 (20 × 20 = 400) different statuses.

[0117] In step S204, the monitoring device may transmit radio waves within a specific frequency range into the chamber in the second state and may receive radio waves reflected by the internal space of the chamber in the second state. The above details of step S104 can be similarly applied here, so a redundant explanation is omitted.

[0118] In step S206, the monitoring device may use the received radio waves to generate second reference status data for the chamber in the second status. The above details of the step for generating status data can be similarly applied to the above step for generating second reference status data using the received radio waves, so their redundant explanations are omitted.

[0119] The process of generating reference status data for a chamber in two statuses is illustrated with reference to Figures 5 and 6, but similarly, reference status data for a chamber in three or more statuses can be generated. By generating multiple reference status data in this manner, a reference status dataset or reference status library can be constructed.

[0120] Optionally, a reference status dataset may contain multiple reference status sub-datasets. For example, multiple reference status sub-datasets may each relate to a different process. A reference status sub-dataset may contain at least one of the reference status data.

[0121] Figure 7 shows a reference status dataset including a reference status subdataset according to an embodiment. Referring to Figure 7, the reference status dataset may include a first process reference status subdataset for a first process and a second process reference status subdataset for a second process. Each of the first process reference status subdataset and the second process reference status subdataset may include at least one of the reference status data.

[0122] To monitor the current status of a chamber, for example, to determine the assembly status of the process equipment when it was manufactured, to determine the results of preventive maintenance (PM) on the process equipment, to allow the process to proceed while checking whether each stage of the process is progressing normally, or to predict the timing of preventive maintenance, a monitoring device may monitor the current status of a chamber by using the chamber's reference status data and current status data (hereinafter referred to as "current status data"). For example, a monitoring device may compare the reference status data and the current status data to monitor the current status of a chamber.

[0123] Figures 8 and 9 are flowcharts showing a method for monitoring a chamber according to an embodiment.

[0124] Referring to Figure 8, the method for monitoring the chamber may include: step S310, acquiring a reference status dataset; step S320, transmitting radio waves into the chamber and receiving the radio waves reflected by the chamber's internal space; step S330, generating current status data for the chamber using the received radio waves; step S340, generating monitoring information using the reference status dataset and the current status data; and step S350, providing the monitoring information.

[0125] In step S310, the monitoring device may obtain a reference status dataset. The reference status dataset may be generated as described above.

[0126] In step S320, the monitoring device may transmit radio waves within a specific frequency range into the chamber being monitored and may receive radio waves reflected by the internal space of the chamber being monitored. The details of step S104 described above can be applied similarly, so a redundant explanation is omitted.

[0127] In step S330, the monitoring device may use the received radio waves to generate current status data for the chamber. The above details of the step for generating status data can also be applied to the above step for generating current status data using received radio waves, so their redundant explanations are omitted.

[0128] In step S340, the monitoring device may generate monitoring information using the reference status dataset and the current status data.

[0129] Monitoring information may include status data.

[0130] Monitoring information may include information indicating the current reference status.

[0131] Monitoring information may include information on the similarity between reference status data and current status data. A higher similarity can be understood or judged as indicating a greater similarity between the current status and the reference status. Alternatively, if the similarity exceeds a similarity threshold, the current status can be understood or judged as the reference status. In other words, the current status of a chamber can be determined by referring to its similarity.

[0132] Monitoring information may include a scatter plot of current status data relative to reference status data. The scatter plot allows users to visually determine the relationship between reference status data and current status data.

[0133] Monitoring information may include a history of chambers that were determined to be in a past reference status. Examples of history may include, but are not limited to, the date, time, and number of times the reference status occurred.

[0134] Monitoring information may include a description of the reference status. This description may, for example, describe what status the reference status represents, but may not be limited to, various details about the reference status.

[0135] Referring to Figure 9, step S340 may include: step S341, which is the step of calculating the similarity between the current status data and each reference status data included in the reference status dataset; and step S342, which is the step of generating monitoring information based on the similarity.

[0136] In step S341, the monitoring device may calculate the similarity between the current status data and each reference status data included in the reference status dataset. The monitoring device may also calculate a first similarity between the current status data and the first reference status data, and a second similarity between the current status data and the second reference status data. In other words, multiple similarities are calculated for the current status data.

[0137] Similarity can be calculated using graph similarity algorithms such as mean, sum of squares (SOS), cosine similarity, correlation integral techniques, or convolution techniques, but there are no restrictions on the methods used.

[0138] The following sections describe some examples of similarity calculations.

[0139] As an example of similarity calculation, a monitoring device may calculate similarity by using the differences between reference status data and current status data within a specific frequency range. For example, referring to Equation 1 below, a monitoring device may calculate the similarity as the sum of the squares of the differences between the parameter values ​​of the reference status data and the parameter values ​​of the current status data within a specific frequency range. [Formula 1]

number

[0140] As another example of similarity calculation, referring to Equation 2 below, a monitoring device may calculate similarity by using the cosine similarity between reference status data and current status data within a specific frequency range. [Formula 2]

number

[0141] While the use of multiple reference status data has been primarily illustrated with reference to Figures 8 and 9, a single reference status data may be used, in which case the details described above may apply similarly.

[0142] In step S350, the monitoring device may provide monitoring information.

[0143] Stage S350 may include the step of displaying monitoring information via a display unit.

[0144] Figure 10 shows a display of monitoring information according to an embodiment. Referring to Figure 10, the monitoring device may display monitoring information including status data 21, similarity information 22, and a scatter plot 23 via a display unit 171.

[0145] Step S350 may include a step of transmitting monitoring information to an external device. For example, the monitoring device may transmit monitoring information to external devices such as process equipment and a fab fault detection and classification (FDC) system.

[0146] Step S350 may include a step of outputting an alarm. In this specification, the step of outputting an alarm may mean that the monitoring device outputs an alarm directly via an output unit or transmits an alarm signal to an external device.

[0147] A monitoring device may output an alarm considering the similarity between reference status data and current status data. For example, if the reference status is an abnormal status such as an accident or hazardous situation, the monitoring device may output an alarm when the similarity exceeds a threshold value. As another example, if the reference status is a normal status such as a golden chamber status, the monitoring device may output an alarm when the similarity is below a threshold value. In this specification, the threshold values ​​for abnormal status and normal status may be the same or different from each other.

[0148] The method for monitoring the chamber may further include a step of setting the current status data as new reference status data. The monitoring device may set the current status data as new reference status data.

[0149] According to one embodiment, the monitoring device may set the current status data as new reference status data based on the similarity between the reference status data and the current status data. For example, if the similarity between all reference status data included in the reference status dataset and the current status data is lower than a threshold value, the monitoring device may set the current status data as new reference status data.

[0150] According to another embodiment, the monitoring device may receive user input to set the current status as a reference status and set the current status data as new reference status data. For example, if a new type of failure occurs, the user may want to record the status data in that situation so that it can be used in the future. In this case, the user may input user input to the monitoring device to set the current status as a reference status. The monitoring device that has received the user input may set the current status data as new reference status data.

[0151] Optionally, a monitoring device may represent the current status as a status where two or more reference statuses overlap. In this case, the information included in the monitoring information that indicates which reference status the current status is may indicate that the current status is a status where two or more reference statuses overlap. For example, if there are two or more reference statuses that exceed the similarity threshold of the current status, the monitoring device may represent the current status as a status where two or more reference statuses overlap.

[0152] Optionally, the monitoring device may analyze the status data of each frequency section to calculate similarity.

[0153] In status data for a specific frequency range, that range may be divided into multiple frequency sections. A monitoring device can calculate the similarity of each frequency section and monitor the chamber based on the similarity of each frequency section. For example, a monitoring device can monitor the chamber by directly using the similarity of each frequency section. Alternatively, a monitoring device can calculate the similarity of the entire frequency range by using the similarity of each frequency section and monitor the chamber by using the similarity of the entire frequency range.

[0154] Figure 11 shows an analysis of each frequency section of status data according to an embodiment. Referring to Figure 11, the entire frequency range from 3 GHz to 8.5 GHz can be divided into five frequency sections S1, S2, S3, S4, and S5 in 1.1 GHz increments. A monitoring device can calculate the similarity of the frequency sections to calculate the similarity of the five sections and monitor the chamber based on the five similarities.

[0155] Referring to Figure 11, it has been explained that the chamber is divided into five frequency sections with 1.1 GHz intervals for monitoring, but this is merely an example, and the size or number of frequency sections is not limited to this.

[0156] While monitoring the geometric status of the chamber's internal space has been primarily described, the methods for monitoring the chamber described above are not limited to this. A method for monitoring a chamber according to the embodiment may also perform monitoring of the electrical properties of the chamber's internal space. For example, a monitoring device may use the status data described above to perform process monitoring, such as plasma monitoring or cleaning endpoint monitoring. As another example, a monitoring device may use the status data described above to monitor the deposition of a material, such as a polymer, on the inner wall of the chamber as the process progresses. As yet another example, a monitoring device may use the status data described above to monitor changes in dielectric constant due to insufficient surface finish of the chamber's internal space or components.

[0157] A monitoring system including at least one of the monitoring devices described above may be provided. The monitoring system may be installed in process equipment including at least one chamber.

[0158] Figure 12 is a block diagram showing a monitoring system according to an embodiment. Referring to Figure 12, the monitoring system may include one or more monitoring devices 100 and a management device 200. In this specification, the monitoring device 100 is the same as the monitoring device 100 described above, so a redundant explanation thereof is omitted.

[0159] The monitoring system may include a management device 200. The management device 200 may manage the monitoring device 100.

[0160] The management device 200 may include a communication unit 210, a storage unit 220, and a control unit 230.

[0161] The management device 200 can communicate with the outside world via the communication unit 210. For example, the management device 200 can obtain monitoring information from the monitoring device 100 via the communication unit 210. As another example, the management device 200 can transmit monitoring information to external devices such as process equipment or a fabrication lab via the communication unit 210. A redundant explanation of the communication unit 210 and similar devices of the monitoring device 100 is omitted.

[0162] The management device 200 may store various types of data and programs in the storage unit 220. For example, the storage unit 220 may store monitoring information. As another example, the storage unit 220 may store reference status data. A redundant explanation of the storage unit 220 of the monitoring device 100 is omitted.

[0163] The control unit 230 can perform processing and calculations of various types of information within the management device 200. The control unit 230 can also control other elements that constitute the management device 200. A redundant explanation of the control unit 230 of the monitoring device 100 is omitted.

[0164] Figure 13 is a schematic diagram showing a monitoring system installed on process equipment according to an embodiment, where the monitoring device is of an integrated type. Referring to Figure 13, the monitoring device 100 may be attached to each chamber 10 of the process equipment 1. The monitoring device 100 may generate status data for the chamber 10 to which the monitoring device 100 is attached. The monitoring device 100 may generate monitoring information based on the status data. Alternatively, the monitoring device 100 may transmit status data to a management device 200, which may generate monitoring information.

[0165] The methods according to the embodiments may be executed by processing logic including hardware, firmware, software, or a combination thereof. The methods according to the embodiments may be executed by a processor for executing code stored in a non-temporary computer-readable medium. Examples of non-temporary computer-readable mediums include magnetic media such as hard disks, floppy disks, and magnetic tapes; optical media such as CD-ROMs and DVD-ROMs; magneto-optical media such as floppy disks; and hardware devices such as ROMs, RAMs, and flash memory that are specifically structured to store and execute program instructions.

[0166] While this disclosure has been described above with reference to embodiments, it is not limited thereto. It will be apparent to those skilled in the art that various changes or modifications can be made to the spirit and scope of this disclosure, and that such changes or modifications fall within the scope of the appended claims. [Example of experiment] The following describes experimental examples in which monitoring information such as status data, similarity, and scatter plots are generated according to the geometric status of the chamber. The following experimental examples are illustrative and are not intended to limit the scope of this disclosure.

[0167] These experiments were conducted to verify whether the geometric shape of the internal space of the chamber could be monitored through the monitoring method described above.

[0168] First, a chamber containing three lift pins and baffles was prepared, and the following wafers were prepared: a half-wafer, a prime wafer, a seasoning wafer, a wafer coated with 700 nm thick PR (PR-coated wafer), a seasoning wafer with a Kapton film covering 5% of the region (Kapton 5% coverage seasoning wafer), a seasoning wafer with a Kapton film covering 15% of the region (Kapton 15% coverage seasoning wafer), and a seasoning wafer with a Kapton film covering 50% of the region (Kapton 50% coverage seasoning wafer). In addition, M4 bolts were prepared.

[0169] Subsequently, monitoring devices, including antennas and VNAs, were prepared and installed in the chamber.

[0170] Subsequently, the chambers, wafers, and bolts were used to prepare chambers of 25 different statuses. For each of these statuses, S11 parameters were measured in the frequency range of 3 GHz to 8.5 GHz to generate a reference status dataset containing 25 reference status data.

[0171] The status of the chambers used in the experiment is shown in Figures 14 to 17. *The basic status refers to the status of waiting for the process while the vacuum is maintained.

[0172] The lift pin up (no wafer) status refers to a state where all three lift pins are in the up position without a wafer (Figure 15(a)).

[0173] The lift pin down (no wafer) status refers to a state where all three lift pins are down due to the absence of a wafer.

[0174] The "Lift Pin Up (Wafer Included)" status indicates that all three lift pins are in the raised position and the wafer is positioned on the lift pins.

[0175] The "Lift Pin Down (Wafer Included)" status indicates that all three lift pins are in the down position and the wafer is positioned on the lift pins.

[0176] The lift pin up (#3 pin missing) status refers to a state where the lift pin is in the up position without a wafer, and pin 3 is missing (Figure 15(b)).

[0177] The "Lift Pin Down (#3 Pin Missing)" status indicates that the lift pins are in the down position due to the absence of a wafer, and that pin 3 is missing.

[0178] The "Lift Pin Up (#2 Pin Missing)" status refers to a state where the lift pins are in the up position without a wafer, and pin #2 is missing.

[0179] The "Lift Pin Down (#2 Pin Missing)" status indicates that the lift pins are in the down position due to the absence of a wafer, and that pin 2 is missing.

[0180] The "Lift Pin Up (#1 Pin Missing)" status refers to a state where the lift pins are in the up position without a wafer, and pin 1 is missing.

[0181] The "Lift Pin Down (#1 Pin Missing)" status indicates that the lift pins are in the down position due to the absence of a wafer, meaning pin 1 is missing.

[0182] The lift pin up (#3 pin damaged) status indicates that the lift pin is in the up position without a wafer, and pin 3 is damaged (Figure 15(c)).

[0183] The lift pin down (#3 pin damaged) status indicates that the lift pin is down without a wafer and pin 3 is damaged.

[0184] The Chamber Separation 380mTorr status refers to the status where, after the chamber has been separated by closing the valve in the flow path to the pump in the basic status, the internal pressure has increased to 380mTorr.

[0185] The "5 minutes after separation pumping" status refers to the status where, 5 minutes have passed since the separation in the chamber separation 380mTorr status was canceled, and pumping begins when the valve in the flow path to the pump is opened.

[0186] The status indicating "no baffle" refers to the status of a chamber that did not have a baffle (Figure 16(a)).

[0187] The M4 bolt status on the baffle refers to the status of the chamber where the M4 bolts are located on the baffle (Figure 16(b)).

[0188] The half-wafer status refers to the status where a half-wafer is placed in the chamber (Figure 17(a)).

[0189] The prime wafer status refers to the status in which a prime wafer has been placed in the chamber.

[0190] The seasoning wafer status refers to the status in which the seasoning wafer has been placed in the chamber (Figure 17(b)).

[0191] The PR coating wafer status refers to the status where a PR coating wafer has been placed in the chamber (Figure 17(c)).

[0192] The Kapton 5% coverage seasoning wafer status refers to the status where a seasoning wafer with a Kapton film covering 5% of the area is placed in the chamber (Figure 17(d)).

[0193] The Kapton 15% coverage seasoning wafer status refers to the status where a seasoning wafer with a Kapton film covering 15% of the area is placed in the chamber (Figure 17(e)).

[0194] The Kapton 50% coverage seasoning wafer status refers to the status where a seasoning wafer with a Kapton film covering 50% of the area is placed in the chamber (Figure 17(f)).

[0195] The vented chamber status refers to the state in the base status where the chamber has been vented and reached atmospheric pressure.

[0196] In the above chamber status, the lift pin is in the down position unless otherwise specified.

[0197] Subsequently, an arbitrary status was set as the current status, and a scatter plot of the current status data against the reference status data and the similarity between them were generated. In this specification, similarity was calculated using the sum of squares according to Equation 1 and the cosine similarity according to Equation 2.

[0198] Figure 18 shows the similarity when the lift-pin-up (wafer present) status (status 4) is set as the current status. (a) shows the similarity table, (b) shows the sum-of-squares similarity graph, and (c) shows the cosine similarity graph. In Figure 18, it can be seen that status 4 is well distinguishable from other statuses.

[0199] Figure 19 shows the similarity when the lift-pin-up (#2 pinless) status (status 8) is set as the current status. (a) shows the similarity table, (b) shows the sum-of-squares similarity graph, and (c) shows the cosine similarity graph. In Figure 19, status 8 was similar to several statuses but was distinguished by considering the sum-of-squares similarity of 10 or more and the cosine similarity to four decimal places.

[0200] Figure 20 shows the similarity when a status without baffles (status 16) is set as the current status. (a) shows the similarity table, (b) shows the sum-of-squares similarity graph, and (c) shows the cosine similarity graph. In Figure 20, it can be seen that status 16 is better distinguished from the other statuses than in Figure 18.

[0201] Figure 21 shows a scatter plot in which the base status (status 1) is used as a reference status for other statuses. The labels shown in each scatter plot are the same as those shown in Figure 14. In Figure 21, it is visually confirmed that the scatter plots vary depending on the status.

[0202] Explanation of reference numbers in drawings 100: Surveillance devices 110: Antenna 120: Signal Processing Unit 130: Communication Unit 140: Control Unit 150: Storage Unit 160: Fixed part 170: Output section 180: Electromagnetic shielding 200: Managed devices 210: Communication Unit 220: Storage Unit 230: Control Unit

Claims

1. A method for generating reference status data to monitor the status of a chamber, wherein the method is: In the first stage, the chamber is prepared, where the chamber includes a plurality of parts. Here, the geometric shape of the internal space of the chamber is defined by the plurality of components, Here, the first status is defined by a combination of the geometric statuses of each of the plurality of parts; A step of transmitting radio waves in the frequency range of 300 MHz or higher and 30 GHz or lower from outside or inside the chamber in the first status to the internal space of the chamber in the first status, and receiving the radio waves reflected by the internal space of the chamber; A step of using radio waves received by an antenna to calculate, in the frequency range, one parameter selected from a group consisting of i) S-parameters, ii) H-parameters, iii) Y-parameters, iv) Z-parameters, and v) one parameter derived from the S-parameters, H-parameters, Y-parameters, and Z-parameters; and A step of generating first reference status data for the chamber in the first status using the calculated parameters. A method that includes [a certain feature].

2. A step of preparing the chamber in a second state in which the geometric status of at least some of the plurality of parts has changed from that of the chamber in the first state; and A step in which second reference status data is generated by transmitting and receiving radio waves to and from the chamber in the second status. The method according to claim 1, comprising:

3. The method according to claim 1, wherein the steps of transmitting and receiving the radio waves include transmitting radio waves from outside the chamber to the internal space of the chamber via a viewport formed in the chamber, and receiving radio waves reflected by the internal space of the chamber.

4. A method for generating reference status data to monitor the status of a chamber, wherein the method is: The step of preparing the chamber in a first state which includes multiple components, Here, the geometric and electrical status of the internal space of the chamber is defined by the plurality of components, Here, the first status is defined by a combination of the geometric and electrical statuses of each of the plurality of components; A step of transmitting radio waves in the frequency range of 300 MHz or higher and 30 GHz or lower from outside or inside the chamber in the first status to the internal space of the chamber in the first status, and receiving the radio waves reflected by the internal space of the chamber; A step of using radio waves received by an antenna to calculate, in the frequency range, one parameter selected from a group consisting of i) S-parameters, ii) H-parameters, iii) Y-parameters, iv) Z-parameters, and v) one parameter derived from the S-parameters, H-parameters, Y-parameters, and Z-parameters; and A step of generating first reference status data for the chamber in the first status using the calculated parameters. A method that includes [a certain feature].

5. A method for monitoring the status of a chamber, the method being: A step of obtaining a reference status dataset that reflects the status of the chamber; A step of transmitting radio waves within a specific frequency range into the internal space of the chamber to be monitored, and receiving the radio waves reflected by the internal space of the chamber; A step of generating current status data of the chamber using the received radio waves; A step of generating monitoring information for the current status of the chamber using the aforementioned reference status dataset and the current status data; and Step of providing the aforementioned monitoring information Equipped with, Here, the reference status dataset includes multiple reference status data reflecting multiple statuses of the chamber, Here, the step of generating the monitoring information is: A step of calculating the similarity between each of the plurality of reference status data and the current status data, and This includes the step of generating the monitoring information based on the similarity. method.

6. The reference status dataset includes first reference status data reflecting the first status of the chamber, and second reference status data reflecting the second status of the chamber. Here, the step of generating the monitoring information is: A step of calculating a first similarity between the first reference status data and the current status data; A step of calculating a second similarity between the second reference status data and the current status data; and Step of generating the monitoring information based on the first similarity and the second similarity. The method according to claim 5, including the method described in claim 5.

7. The method according to claim 6, wherein the monitoring information includes information indicating that the chamber is in a state in which at least the first status and the second status overlap, when the first similarity is greater than or equal to a first criterion value and the second similarity is greater than or equal to a second criterion value.

8. The reference status dataset includes the plurality of reference status data reflecting the plurality of statuses of the chamber, The method according to claim 5, further comprising the step of setting the current status data as new reference status data if the similarity between each of the plurality of reference status data and the current status data is lower than a threshold value.

9. The method according to claim 5, further comprising the step of setting the current status data as new reference status data when user input is obtained that sets the current status of the chamber as a reference status.

10. The aforementioned specific frequency range includes a first frequency section and a second frequency section, where The steps for generating the aforementioned monitoring information are: A step of calculating a first similarity between data corresponding to at least some of the first frequency sections among the plurality of reference status data of the reference status dataset, and data corresponding to the first frequency section among the current status data; A step of calculating a second similarity between data corresponding to at least some of the second frequency sections of the plurality of reference status data in the reference status dataset and data corresponding to the second frequency section of the current status data; and The method according to claim 5, further comprising the step of generating the monitoring information based on the first similarity and the second similarity.

11. The method according to claim 5, wherein the step of providing the monitoring information includes the step of outputting an alarm considering the similarity between the reference status dataset and the current status data.

12. The method according to claim 5, wherein the steps of transmitting and receiving the radio waves include transmitting radio waves from outside the chamber to the internal space of the chamber via a viewport formed in the chamber, and receiving radio waves reflected by the internal space of the chamber.

13. The aforementioned reference status dataset includes first process reference status data for the first process and second process reference status data for the second process, where The steps for generating the aforementioned monitoring information are: The stage of acquiring process information; and The method according to claim 5, further comprising the step of generating monitoring information using one of the first process reference status data and the second process reference status data, and the current status data based on the process information.

14. A computer program that stores instructions, where, A computer program which, when the instruction is executed by one or more processors of the device, causes the device to perform the method according to any one of claims 1 to 13.

15. A device for monitoring the status of a chamber, wherein the device: An antenna for transmitting radio waves in the frequency range of 300 MHz or higher and 30 GHz or lower into the chamber and receiving radio waves reflected by the internal space of the chamber; A bracket for fixing the antenna to the outside of the chamber; A signal processing unit for applying an electrical signal to the antenna and acquiring the electrical signal from the antenna; A communication unit for communicating with the outside; and Control unit for generating monitoring information for the status of the chamber Equipped with, Here, the control unit uses the radio waves received by the antenna to calculate one parameter selected from a group consisting of i) S-parameter, ii) H-parameter, iii) Y-parameter, iv) Z-parameter, and v) one parameter derived from the S-parameter, H-parameter, Y-parameter, and Z-parameter, in the frequency range. Using the calculated parameters, the current status data of the chamber is generated. The monitoring information is generated based on the generated current status data and the pre-stored reference status dataset. device.

16. The device according to claim 15, wherein the bracket is designed to fix the position of the antenna outside the viewport formed in the chamber.

17. The device according to claim 16, wherein the positional relationship between the bracket and the antenna is designed such that one end of the antenna adjacent to the viewport is at a predetermined distance from one side of the viewport adjacent to the antenna.

18. The device according to claim 15, wherein the position of the antenna is fixed by the bracket to correspond to a viewport formed in the chamber or a separate port for the antenna.

19. The device according to claim 16, wherein the position of the antenna is adjacent to the viewport or a separate port for the antenna, and one end of the antenna is fixed by the bracket at a predetermined distance from one side of the viewport or the separate port adjacent to the antenna.

20. The device according to claim 15, further comprising an electromagnetic shield disposed on the outside of the chamber so as to surround the antenna.

21. The device according to any one of claims 15 to 20, wherein the control unit generates status data relating to the radio waves transmitted from the antenna and the radio waves received by the antenna, and generates the monitoring information using the status data.

22. The device according to any one of claims 15 to 20, wherein the control unit generates status data relating to the ratio between an input voltage applied to the antenna and an output voltage output from the antenna, and generates the monitoring information using the status data.

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