Regeneration device and method for filter modules

Abstract

This enables the replacement of the adsorbed powder deposit layer in the filter module. [Solution] The above problem is solved by a filter module regeneration device 10 that performs a cleaning operation in which a module supply quick coupler 12q and a cleaning discharge quick coupler 33q are connected to the secondary side quick coupler 6q and primary side quick coupler 5q of the used filter module 1, and cleaning liquid CW supplied from the cleaning liquid supply unit 30 is supplied to the secondary side of the used filter module 1 for backwashing; and a deposit layer 3 formation operation in which a module supply quick coupler 12q and a module discharge quick coupler 13q are connected to the primary side quick coupler 5q and secondary side quick coupler 6q of the filter module 1 after the cleaning operation, and a deposit layer 3 formation operation is performed in which a deposit layer CS supplied from the slurry supply unit 20 is supplied to the primary side of the filter module 1 after the cleaning operation to form a deposit layer 3.

Description

Technical Field

[0001] The present invention relates to a regeneration device and a method thereof for removing used adsorption powder and attaching new adsorption powder in a filter module that performs total amount filtration of a liquid to be treated by a filtration layer having a filtration membrane and a deposition layer of adsorption powder attached to the surface on the primary side of the filtration membrane.

Background Art

[0002] As one of the filtration technologies for a liquid to be treated, for example, wastewater generated at factories, construction sites, etc., a filtration technology is known in which total amount filtration is performed by a filtration layer having a filtration membrane and a deposition layer of adsorption powder attached to the surface on the primary side of the filtration membrane (see, for example, Patent Document 1).

[0003] In this prior art, prior to the filtration treatment, a slurry in which adsorption powder such as activated carbon is dispersed in water or the like is filtered through a filtration membrane, and the adsorption powder is deposited on the surface on the primary side of the filtration membrane to form a deposition layer. During filtration, as the liquid to be treated passes through the deposition layer of the adsorption powder, the substance to be separated in the liquid to be treated is adsorbed by the adsorption powder, and the permeate in which the substance to be separated passes through the deposition layer and the filtration membrane and is separated and removed is discharged as filtrate (treated liquid). When the adsorption performance of the adsorption powder deteriorates due to use, as described in Patent Document 1, the filter module can be regenerated by performing a replacement operation of removing the adsorption powder attached to the filtration membrane and attaching new adsorption powder to the filtration membrane.

[0004] However, the above prior art is one in which an adsorption powder replacement device is attached to the filtration equipment, and it could not cope with the case where the adsorption powder replacement device could not be attached due to limitations in the installation space in the filtration equipment.

Prior Art Documents

Patent Documents

[0005]

Patent Document 1

Patent Document 2

[0006] Therefore, the main objective of the present invention is to enable the replacement of the adsorbed powder deposit layer without requiring the installation of equipment for replacing the adsorbed powder on the filtration equipment. [Means for solving the problem]

[0007] The filter module regeneration device and method that solve the above problems are as follows. <First aspect> A filter module regeneration device comprising a filter membrane and a filter layer having a deposit layer of adsorbed powder attached to the primary side surface of the filter membrane, a primary quick coupler communicating with the primary side of the filter layer and a secondary quick coupler communicating with the secondary side of the filter layer, configured to perform total filtration by the filter layer, A slurry supply unit that supplies slurry for forming a deposit layer, and a cleaning liquid supply unit that supplies cleaning liquid, A pump that selectively pumps the slurry for forming the deposition layer supplied from the slurry supply unit and the cleaning liquid supplied from the cleaning liquid supply unit, A module supply channel has a module supply quick coupler at one end that can be selectively attached to and detached from the primary side quick coupler and the secondary side quick coupler, and the other end is connected to the outlet of the pump, A module discharge channel having a module discharge quick coupler at one end that is attached to and detached from the secondary quick coupler, The system includes a cleaning and discharge channel having a cleaning and discharge quick coupler at one end that is attached to and detached from the primary side quick coupler, With the module supply quick coupler connected to the secondary quick coupler of the used filter module, and the cleaning discharge quick coupler connected to the primary quick coupler of the used filter module, the pump is operated to supply the cleaning liquid supplied from the cleaning liquid supply unit to the secondary side of the used filter module via the pump and the module supply channel to perform backwashing, and the cleaning liquid that flows back to the primary side of the filtration membrane, along with the adsorbed powder that has been detached from the filtration membrane, is discharged together with the cleaning liquid into the cleaning discharge channel, thus performing a cleaning operation. The module supply quick coupler is connected to the primary side quick coupler of the filter module after the cleaning operation, and the module discharge quick coupler is connected to the secondary side quick coupler of the filter module after the cleaning operation. By operating the pump, the slurry for forming the deposit layer supplied from the slurry supply unit is supplied to the primary side of the filter module after the cleaning operation via the pump and the module supply channel to perform total filtration, thereby depositing the adsorbed powder on the primary side surface of the filter membrane to form a deposit layer, and the filtrate that has passed through the filter membrane is discharged via the module discharge channel, thus performing a deposit layer formation operation. A filter module regeneration device characterized by being configured to perform the following.

[0008] (Effects and Benefits) This regeneration device assumes that the filter module is equipped with a primary quick coupler leading to the primary side and a secondary quick coupler leading to the secondary side. The primary and secondary quick couplers of the filter module are connected to the supply path for the fluid to be treated and the discharge path for the treated fluid of the filtration equipment, respectively, allowing for filtration of the fluid to be treated. When the adsorbent powder in the filter module needs to be replaced due to use, the used filter module is removed from the filtration equipment and connected to this regeneration device, and regenerated by performing a washing operation and a deposition layer formation operation. The regenerated filter module can then be attached to the filtration equipment and reused. Thus, since this regeneration device does not need to be attached to the filtration equipment, it can be used even when it is not possible to attach adsorbent powder replacement equipment to the filtration equipment due to space limitations, etc. In particular, in this regeneration device, both the module supply quick coupler and the module discharge quick coupler can be selectively attached to the primary and secondary quick couplers of the filter module, and a common pump is used for the washing operation and deposition layer formation operation. Therefore, this regeneration device also has the advantage of being simple and compact. Furthermore, "quick coupler" refers to a fitting that allows fluid piping to be easily connected and disconnected without the use of tools, as is well known, and is also called a one-touch coupler or quick fitting. In addition, "selectively attached to and detached from the primary quick coupler and the secondary quick coupler" means that it is possible to disconnect what was connected to the secondary quick coupler and connect it to the primary quick coupler, and to disconnect what was connected to the primary quick coupler and connect it to the secondary quick coupler. Moreover, "selectively pumping the slurry for deposit formation from the slurry supply unit and the cleaning liquid from the cleaning liquid supply unit" means that the process is switched between pumping the slurry for deposit formation from the slurry supply unit without pumping the cleaning liquid from the cleaning liquid supply unit, and pumping the cleaning liquid from the cleaning liquid supply unit without pumping the slurry for deposit formation from the slurry supply unit.

[0009] <Second aspect> The aforementioned cleaning fluid supply unit is Washing fluid storage tank, A powder recovery unit having a separation filter for separating the washing discharge liquid into the adsorbed powder and the washing liquid, and a quick coupler for discharging the separated liquid for discharging the washing liquid separated by the separation filter, The system includes a cleaning fluid supply channel having a cleaning fluid supply quick coupler at one end that can be attached to and detached from the separation fluid discharge quick coupler, and the other end of which is connected to the cleaning fluid storage tank, The other end of the washing and discharge channel is connected to the primary side of the separation filter of the powder recovery section. In the cleaning operation, a predetermined amount of the cleaning liquid is stored in the cleaning liquid storage tank, the cleaning discharge quick coupler is connected to the primary side quick coupler, and the cleaning liquid supply quick coupler is connected to the separation liquid discharge quick coupler. With the pump in this state, the cleaning liquid in the cleaning liquid storage tank is supplied to the secondary side of the used filter module via the pump and the module supply channel to perform backwashing. The cleaning liquid that flows back to the primary side of the filtration membrane and the adsorbed powder that has been separated from the filtration membrane are supplied together with the cleaning liquid to the powder recovery section via the cleaning discharge channel. The cleaning liquid from the adsorbed powder and cleaning liquid separated in the powder recovery section is returned to the cleaning liquid storage tank via the cleaning liquid supply channel. A regeneration device for a filter module according to the first embodiment.

[0010] (Effects and Benefits) In this regeneration system, the cleaning discharge liquid (a mixture of adsorbed powder detached from the filtration membrane and the cleaning liquid) discharged by backwashing is separated into solid and liquid components in the powder recovery section, allowing the adsorbed powder to be recovered and the cleaning liquid to be returned to the cleaning liquid storage tank for reuse. Therefore, the discharge of adsorbed powder from the filter module can be performed effectively with less cleaning liquid used. As a result, this regeneration system can be used even in locations where large amounts of cleaning liquid cannot be used (for example, on ships).

[0011] <Third aspect> A mounting base on which the filter module is installed, The system includes a vibration source that applies vibration to the filter module installed on the mounting base, The filter module is installed on the mounting base, and the cleaning operation is performed while the filter module is vibrated by the vibration source. A second embodiment of a filter module regeneration device.

[0012] (Effects and Benefits) Applying vibration to the filter module during the cleaning operation is preferable because it promotes the detachment of adsorbed powder from the filtration membrane.

[0013] <Fourth aspect> The slurry supply unit is, Slurry storage tank, A raw material container is provided, which stores a raw material slurry containing adsorbent powder and dispersion liquid, and has an inlet quick coupler for introducing liquid into the container and an outlet quick coupler for releasing the liquid from the container. A return flow path has a circulating quick coupler at one end that is attached to and detached from the inlet quick coupler, and the other end is connected to the outlet of the pump. The system comprises a primary slurry supply channel having a primary slurry supply quick coupler at one end that is attached to and detached from the aforementioned outflow quick coupler, and the other end of which is connected to the slurry storage tank, The module discharge channel leads to the slurry storage tank, In the deposition layer formation operation, a predetermined amount of diluting liquid is stored in the slurry storage tank, the circulation quick coupler is connected to the inflow quick coupler, and the primary slurry supply quick coupler is connected to the outflow quick coupler. Then, the pump is operated, and a first circulation path passing through the pump, the module supply flow path, the filter module after the cleaning operation, the module discharge flow path, and the slurry storage tank, and a second circulation path passing through the pump, the return flow path, the raw material container, the primary slurry supply flow path, and the slurry storage tank are circulated at a predetermined flow rate ratio respectively. Thus, a deposition layer forming slurry obtained by diluting the raw material slurry with the diluting liquid is supplied to the primary side of the filter module after the cleaning operation to form the deposition layer, and the filtrate that has passed through the filtration membrane is returned to the slurry storage tank via the module discharge flow path. A regenerating apparatus for a filter module according to the first or second aspect.

[0014] (Function and effect) The slurry supply unit is not particularly limited as long as it can supply the slurry for forming the deposition layer. However, the replacement operation of the adsorbent powder described in Patent Document 1 is complicated for the user to perform in terms of requiring weighing operations for the adsorbent powder and the dispersion liquid. In contrast, in this apparatus, it is only necessary to set a raw material container in which the primary slurry is stored in advance, so even a user can easily perform it. Alternatively, the slurry for forming the deposition layer may be stored in the raw material container in the amount required for one regeneration, and the slurry for forming the deposition layer may be directly supplied from the raw material container. However, it is preferable that the adsorption powder concentration of the slurry for forming the deposition layer is lower. However, if such a low-concentration slurry for forming the deposition layer is stored in the raw material container in the amount required for one regeneration, the volume and weight of the raw material container will become excessive, which is not preferable from the viewpoint of carrying in and storing the raw material container. On the other hand, in this apparatus, the primary slurry supplied from the raw material container is diluted to prepare the slurry for forming the deposition layer, and this slurry for forming the deposition layer is used to form a deposition layer on the filter module, so that the volume and weight of the raw material container can be reduced, which is preferable in terms of carrying in and storing the raw material container. Of course, since the installation space of the raw material container in this regeneration apparatus can also be made small, this regeneration apparatus can be made more compact. Furthermore, by returning the filtrate (dispersion liquid) discharged from the filter module in the deposition layer forming operation to the slurry storage tank and reusing it for diluting the primary slurry, the deposition layer forming operation can be effectively performed with a smaller amount of diluting liquid used. As a result, it is suitable for places where a large amount of dispersion liquid cannot be used or places where there are space limitations (for example, ships, etc.).

[0015] <The fifth aspect> It has a line mixer provided between the pump and the primary side quick coupler in the first circulation path, In the deposition layer forming operation, the slurry for forming the deposition layer prepared by the slurry supply unit is configured to be supplied to the primary side of the filter module after the cleaning operation without being retained by passing through the line mixer. <000​​​​​​When filtering the entire volume of a fluid to be treated using a filtration layer comprising a filtration membrane and a deposited layer of adsorbed powder attached to the primary side surface of the filtration membrane, the quality of the deposited layer, such as the density and homogeneity of the particle packing structure, is important. For example, if the deposited layer contains heterogeneous defects such as cracks or relatively large pores, or if there are locally thin areas, the liquid to be treated may short-circuit through these heterogeneous defects, potentially leading to an extremely short breakthrough time and preventing the required performance from being achieved. Furthermore, the deposited layer is maintained in its aggregate state (layer shape) and attachment to the filtration membrane by intermolecular forces (van der Waals forces, electrostatic forces, hydrogen bonds), and is not bonded with adhesives, binders, or welds, meaning that cracks, delamination, or collapse can occur due to external forces. Therefore, if the particle packing structure of the deposited layer is not dense, the durability of the deposited layer will be low, and cracks may occur in the deposited layer due to vibration or pulsation, or it may gradually collapse from the surface, potentially shortening the breakthrough time. Therefore, it is desirable that a deposit layer of consistent quality can be easily formed, even if the user performs a replacement operation of the adsorbed powder deposit layer.

[0017] In this apparatus, the slurry for forming the deposit layer is supplied to the primary side of the filtration membrane without stagnation, making it less likely for the adsorbed powder in the slurry to aggregate. Furthermore, since the slurry for forming the deposit layer is passed through a line mixer before being supplied to the primary side of the filtration membrane, the slurry is spatially constrained within the line mixer and forcibly agitated with shear action. Even if there are aggregates or clumps of adsorbed powder, they are effectively broken down into single particles (single particle formation effect). In other words, in this apparatus, the entire amount of slurry for forming the deposit layer, which contains more dispersed single particles than conventional methods, is filtered through the filtration membrane without stagnation, thus improving the density and homogeneity of the particle-packed structure of the deposit layer compared to conventional methods. Furthermore, the device described in Patent Document 2 differs fundamentally from this filtration device in that, although it uses a line mixer to mix the slurry, the mixed slurry is retained in an adsorption reactor, and no deposit layer is formed because cross-flow filtration is performed.

[0018] <Sixth aspect> A method for regenerating a filter module comprising a filter membrane, a filter layer having a deposit layer of adsorbed powder attached to the primary side surface of the filter membrane, a primary quick coupler communicating with the primary side of the filter layer, and a secondary quick coupler communicating with the secondary side of the filter layer, wherein the filter layer is configured to perform total filtration, A slurry supply unit that supplies slurry for forming a deposit layer, and a cleaning liquid supply unit that supplies cleaning liquid, A pump that selectively pumps the slurry for forming the deposition layer supplied from the slurry supply unit and the cleaning liquid supplied from the cleaning liquid supply unit, A module supply channel has a module supply quick coupler at one end that can be selectively attached to and detached from the primary side quick coupler and the secondary side quick coupler, and the other end is connected to the outlet of the pump, A module discharge channel having a module discharge quick coupler at one end that is attached to and detached from the secondary quick coupler, A filter module regeneration device is used, which includes a cleaning and discharge channel having a cleaning and discharge quick coupler at one end that is attached to and detached from the primary side quick coupler; With the module supply quick coupler connected to the secondary quick coupler of the used filter module, and the cleaning discharge quick coupler connected to the primary quick coupler of the used filter module, the pump is operated to supply the cleaning liquid supplied from the cleaning liquid supply unit to the secondary side of the used filter module via the pump and the module supply channel to perform backwashing, and the cleaning liquid that flows back to the primary side of the filtration membrane, along with the adsorbed powder that has been detached from the filtration membrane, is discharged together with the cleaning liquid into the cleaning discharge channel, thus performing a cleaning operation. The module supply quick coupler is connected to the primary side quick coupler of the filter module after the cleaning operation, and the module discharge quick coupler is connected to the secondary side quick coupler of the filter module after the cleaning operation. By operating the pump, the slurry for forming the deposit layer supplied from the slurry supply unit is supplied to the primary side of the filter module after the cleaning operation via the pump and the module supply channel to perform total filtration, thereby depositing the adsorbed powder on the primary side surface of the filter membrane to form a deposit layer, and the filtrate that has passed through the filter membrane is discharged via the module discharge channel, thus performing a deposit layer formation operation. A method for regenerating a filter module, characterized by performing the following steps in this order.

[0019] (Effects and Benefits) It produces the same effects as the first embodiment. [Effects of the Invention]

[0020] According to the present invention, it becomes possible to replace the adsorbed powder deposit layer without requiring the installation of equipment for replacing the adsorbed powder in the filtration system. [Brief explanation of the drawing]

[0021] [Figure 1] This is a schematic diagram showing a filter module regeneration device. [Figure 2] This is a schematic diagram showing the regeneration device for the filter module during the cleaning operation. [Figure 3] This is a schematic diagram showing the regeneration device for the filter module during the start of the sedimentation layer formation operation. [Figure 4] This is a schematic diagram showing the regeneration device for the filter module during the deposition layer formation operation. [Figure 5] This is a front view showing a cutaway of the main part of the filter module. [Figure 6] This is a plan view of the filter module. [Figure 7] This is a longitudinal cross-section of the filter unit. [Figure 8] This is a plan view of the filter unit. [Figure 9] This is a cross-sectional view taken from IX-IX in Figure 7. [Figure 10] This is an enlarged view showing the state of sedimentary layer adhesion in section Y of Figure 9. [Figure 11] This is a cross-sectional view taken along line XI-XI in Figure 7. [Figure 12] This is a schematic diagram showing a filter module regeneration device. [Modes for carrying out the invention]

[0022] The following describes an example of a treatment apparatus for the liquid to be treated. However, the following description and drawings are merely examples, and the content of the present invention should not be interpreted as being limited to the following description and drawings.

[0023] (Filter module) Figures 3-10 show an example of a filter module 1 usable in a regeneration device. This filter module 1 has filter layers 2 and 3, each having a filter membrane 2 and a deposit layer 3 of adsorbed powder attached to the primary side surface of the filter membrane 2, and a container 4 in which these filter layers 2 and 3 are housed. The container 4 has a supply port 5 leading to the primary side of the filter layers 2 and 3 and a primary-side quick coupler 5q attached thereto, and an outlet 6 leading to the secondary side of the filter layers 2 and 3 and a secondary-side quick coupler 6q attached thereto. The fluid to be treated Fi supplied into the container 4 through the primary-side quick coupler 5q flows through the deposit layer 3 and then the filter membrane 2 in that order, and after total filtration (dead-end filtration) is performed, the treated fluid Fx is discharged outside the container 4 through the secondary-side quick coupler 6q.

[0024] (filtration membrane) The filtration membrane 2 may be a flat membrane or a pleated membrane. Furthermore, the filtration membrane 2 (which may be either a flat membrane or a pleated membrane) may be provided in a planar manner or in a cylindrical manner within the container 4.

[0025] The filtration membrane 2 can be appropriately selected from filter materials (filter paper, filter cloth, etc.) having pore sizes that do not allow the adsorbed powder forming the deposition layer 3 to pass through. If there are substances to be separated that cannot be separated by the adsorbed powder or its deposition layer 3, it is desirable to use a filtration membrane 2 that can separate those substances. The filtration membrane 2 can be a porous membrane formed by melting resin and forming it into a film, or a fibrous membrane formed by laminating and integrating resin fibers by methods such as electrospinning, electroblowing, and meltblowing. Both can be used, but the fibrous membrane is preferred because it has a larger surface area and higher porosity, resulting in excellent fluid permeability and excellent adhesion to the deposition layer 3. The pore structure of the porous membrane can be appropriately selected from known structures such as lace-like, node-like, and fibril-like structures.

[0026] The material of the filtration membrane 2 is not particularly limited and can be appropriately selected from known organic materials such as polyester (PEs), polyethersulfone (PES), polytetrafluoroethylene (PTFE), polyamide (PA), polyphenylene sulfide (PPS), polyethylene (PE), ultra-high molecular weight polyethylene (UPE), polyvinylidene fluoride (PVDF), polypropylene (PP), polyimide (PI), polycarbonate (PC), and polymethyl methacrylate (PMMA), as well as inorganic materials such as ceramics (alumina, glass, etc.) and metals (stainless steel, titanium, etc.).

[0027] The filtration membrane 2 may be single-layered or multi-layered, and may be a symmetric or asymmetric membrane. Furthermore, the filtration membrane 2 may be a hydrophilic or hydrophobic membrane.

[0028] The pore size of the filtration membrane 2 can be determined as appropriate, but for example, approximately 0.01 μm to 0.3 μm (MF membrane), 0.01 μm or less (UF membrane), and 1 nm to 2 nm (NF membrane) can be suitably used. Note that the pore size of the filtration membrane 2 refers to the maximum pore size calculated based on the bubble point measured by the bubble point test method specified in JIS K 3832-1990. If the filtration membrane 2 is a fiber membrane, the fiber diameter (equivalent to the projected area circle diameter, Heywood diameter; the same applies hereinafter) can be determined as appropriate, but is preferably 1 nm to 3 μm, and more preferably 500 nm or less.

[0029] The removal rate of the filtration membrane 2 is determined by the thickness, pore size, and pore size distribution of the filtration membrane 2, and can be selected as appropriate. For example, if the pore size is similar to that of an MF membrane, a membrane with a removal rate of 99.95% or higher for particles of 0.1 to 0.3 μm can be used.

[0030] (Adsorbent powder) The adsorbent powder constituting the depositional layer 3 can be appropriately selected from one or more types depending on the target of adsorption. For example, if it is desired to remove PFOS and its salts, PFOA and its salts and PFOA-related substances, PFHxS and its salts and PFHxS-related substances, and PFHxA, activated carbon can be used as the adsorbent powder. Other adsorbent powders that can be used include, for example, organic porous materials such as ion exchange resins, zeolites, metal-organic frameworks (MOFs), diatomaceous earth, acid clay, activated clay, inorganic porous materials such as carbon black, metal oxides and metal powders such as titanium dioxide, and substances such as Prussian blue.

[0031] The particle size of the adsorbent powder can be selected as appropriate, but for example, in the case of liquid treatment such as wastewater, it is preferable to use powder with an average particle size of 1 to 30 μm, and more preferably 5 to 9 μm. If the average particle size of the activated carbon particles is smaller than 1 μm, the gaps between the activated carbon particles are too narrow, which tends to slow down the filtration treatment speed. On the other hand, if the average particle size of the activated carbon particles is larger than 30 μm, the gaps between the activated carbon particles become wider, and the substance to be adsorbed is not adsorbed onto the activated carbon but easily passes through the gaps between the activated carbon particles to the secondary side. The average particle size of the adsorbent powder refers to the average value of the projected circle equivalent diameter of each particle (the diameter of a circle equal to the projected area of ​​the particle), and can be determined by measuring the particle size distribution using a laser diffraction / scattering particle size distribution analyzer (for example, product LA-960V2 series, manufactured by Horiba, Ltd.) and determining the particle size when the cumulative volume corresponds to 50%.

[0032] (sedimentary layer) The deposited layer 3 is a layer in which the adsorbed powder maintains its aggregated state (layer shape) and adhesion to the filter membrane 2 through intermolecular forces (van der Waals forces, electrostatic forces, hydrogen bonds), and is not bonded with adhesives, binders, or welds, meaning that it can crack, peel, or collapse due to external forces. Such a deposited layer 3 can be formed as a cake layer on the primary side surface of the filter membrane 2 by filtering the slurry of adsorbed powder through the filter membrane 2. The deposited layer 3 may be dry or wet with water or the like.

[0033] By filtering the fluid Fi to be treated through the deposited layer 3, the substances to be adsorbed in the fluid Fi can be adsorbed onto the adsorbent powder. Therefore, the thickness of the deposited layer 3 can be appropriately set according to the adsorption properties of the adsorbent powder. For example, the thickness of the deposited layer 3 can be about 1 to 10 mm, preferably about 1.5 to 5 mm, more preferably 2 to 5 mm, and particularly preferably about 3 to 5 mm. If the thickness of the deposited layer 3 is too thin, the substances to be adsorbed will not be adsorbed onto the adsorbent powder and will easily permeate through the gaps between the adsorbent powder particles to the secondary side. For example, when adsorbing and removing PFOS, if activated carbon particles with an average particle size of about 10 μm are used as the adsorbent powder, the thickness of the deposited layer 3 can be 1.5 mm or more, preferably 3 mm or more.

[0034] (container) As long as the filtration membrane 2 and the deposited layer 3 are housed in the container 4, the shape of the internal space in which these storage components are arranged, the orientation of the storage components within the container 4, and the means for fixing the storage components can be designed as appropriate. For example, the container 4 can be a pressure vessel (vessel) having a cylindrical main part 4A, such as a cylindrical or polygonal main part, a first lid 4B that closes one opening of the main part 4A, and a second lid 4C that closes the other opening of the main part 4A. The arrangement of the supply port 5 and the discharge port 6 can also be designed as appropriate according to the arrangement of the primary and secondary sides of the filtration membrane 2. For example, in the case of a container 4 having a cylindrical main part 4A, a first lid 4B that closes one opening of the main part 4A, and a second lid 4C that closes the other opening of the main part 4A, either the first lid 4B or the second lid 4C may have a supply port 5 and an outlet port 6, or either the first lid 4B or the second lid 4C may have a supply port 5 and the other may have an outlet port 6. Alternatively, either the supply port 5 or an outlet port 6, or both, may be provided on the main part 4A (side wall).

[0035] To explain in more detail the example shown in Figures 5 to 11, in this filter module 1, the main part 4A of the container 4 is cylindrical, and the filter unit 7 is housed inside this main part 4A. The filter unit 7 has a non-porous inner tube 7A, an outer tube 7B positioned outside the inner tube 7A and having numerous permeable holes for treated fluid provided at intervals on the tube wall, a pleated filter 7C in which a filtration membrane 2 is formed in a cylindrical shape to surround the outer surface of the outer tube 7B, and a first closing plate 7D and a second closing plate 7E that close the opening on the first lid 4B side and the opening on the second lid 4C side in the space between the outer surface of the inner tube 7A and the inner surface of the outer tube 7B, respectively. Furthermore, a seal ring 4R is sandwiched between the first closing plate 7D and the first lid portion 4B, and the heads 4H of bolts screwed into the second lid portion 4C on the side facing the second closing plate 7E protrude at equal intervals in the circumferential direction, serving as spacers to form a first gap S1 between the second closing plate 7E and the second lid portion 4C. The outer tube 7B can be formed from a mesh material such as perforated metal.

[0036] The main body 4A, inner tube 7A, outer tube 7B, and pleated filter 7C of the container 4 are arranged substantially concentrically, and the outer edges of the first closing plate 7D, the second closing plate 7E, and the pleated filter 7C are spaced apart from the inner surface of the main body 4A along their entire circumference, forming a second gap S2. The inner tube 7A extends through the first closing plate 7D and the second closing plate 7E, respectively, with one opening of the inner tube 7A connected to the supply port 5 of the first lid 4B, and the other opening of the inner tube 7A connected to the first gap S1 between the second closing plate 7E and the second lid 4C. An outflow hole 8 is formed around the inner tube 7A in the first closing plate 7D, which leads to a third gap S3 between the inner tube 7A and the outer tube 7B, and this outflow hole 8 leads to the discharge port 6 of the first lid 4B. In addition, the first lid 4B in the illustrated example is provided with an air vent hole 4P that leads into the container 4. As shown in Figures 1 to 4, an air vent passage 9 having an air vent valve 9V is connected to this air vent hole 4P.

[0037] As shown in Figures 9 and 10, it is preferable to provide a spacer 2s between opposing inner surfaces of the pleats 2p of the pleat filter 7C to maintain the spacing between the inner surfaces of the pleats. Suitable spacers include mesh materials such as perforated metal or wire mesh. Furthermore, as shown in Figure 11, at both ends of the pleat filter 7C in the central direction, the inner surfaces of each pleat 2p can be sealed together by adhesive or welding along the entire protruding direction of the pleats 2p, and the inner circumferential surface of the pleat filter 7C and the outer circumferential surface of the outer tube 7B can be sealed together by adhesive b1 along the entire circumference.

[0038] During filtration, the fluid to be treated Fi, supplied via the primary quick coupler 5q and the supply port 5, is supplied through the inner tube 7A to the first gap S1 between the second lid 4C and the second closing plate 7E. It then flows around to the second gap S2 between the entire outer surface of the pleated filter 7C and the main part 4A, and is filtered by the pleated filter 7C and the deposited layer 3 attached to its outer surface. The filtrate flows from the perforation hole of the outer tube 7B into the third gap S3 between the outer tube 7B and the inner tube 7A, and is then discharged through the outflow hole 8 of the first closing plate 7D, the outlet 6 of the first lid 4B, and the secondary quick coupler 6q in that order. During backwashing, the cleaning fluid flows in the opposite direction.

[0039] In the illustrated example, the primary quick coupler 5q and the secondary quick coupler 6q are fixedly connected to the supply port 5 and discharge port 6 of the container 4, respectively, without the use of hoses or other pipes. However, if necessary, one or both of them may be connected to the supply port 5 or discharge port 6 of the container 4 via hoses or other pipes.

[0040] (playback device) Figure 1 shows an example of a filter module regeneration device 10. This regeneration device 10 includes a slurry supply unit 20 that supplies a slurry for forming a deposit layer, a cleaning liquid supply unit 30 that supplies a cleaning liquid such as clean water, a pump 11 that selectively pumps the slurry for forming a deposit layer supplied from the slurry supply unit 20 and the cleaning liquid supplied from the cleaning liquid supply unit 30, a module supply channel 12 having a module supply quick coupler 12q at one end which is selectively attached to and detached from a primary quick coupler 5q and a secondary quick coupler 6q, and the other end which is connected to the outlet of the pump 11, a module discharge channel 13 having a module discharge quick coupler 13q at one end which is attached to and detached from the secondary quick coupler 6q, and a cleaning discharge channel 33 having a cleaning discharge quick coupler 33q at one end which is attached to and detached from the primary quick coupler 5q.

[0041] The flow paths, such as the module supply flow path 12, the module discharge flow path 13, and the cleaning discharge flow path 33, can be formed in whole or in part by hoses (flexible) or fixed pipes made of metal or synthetic resin. From the viewpoint of ease of quick coupler connection, it is preferable to configure the module supply flow path 12, the module discharge flow path 13, and the cleaning discharge flow path 33 with hoses as shown in the illustrated example, and to fix the primary quick coupler 5q, the secondary quick coupler 6q, and the cleaning discharge quick coupler 33q to the supply port 5 and the discharge port 6 of the container 4 without using hoses, or to configure the module supply flow path 12, the module discharge flow path 13, and the cleaning discharge flow path 33 with fixed pipes, and to connect the primary quick coupler 5q, the secondary quick coupler 6q, and the cleaning discharge quick coupler 33q to the supply port 5 and the discharge port 6 of the container 4 via hoses.

[0042] The module supply quick coupler 12q, module discharge quick coupler 13q, and cleaning discharge quick coupler 33q are plug-type (male) quick couplers in the illustrated example, while the primary quick coupler 5q and secondary quick coupler 6q are socket-type (female) quick couplers, although their genders may be reversed. However, the module supply quick coupler 12q must be selectively attached to and detached from both the primary quick coupler 5q and the secondary quick coupler 6q, the module discharge quick coupler 13q must be attached to and detached from the secondary quick coupler 6q, and the cleaning discharge quick coupler 33q must be attached to and detached from the primary quick coupler 5q. Therefore, since the module supply quick coupler 12q, module discharge quick coupler 13q, and cleaning discharge quick coupler 33q must be able to connect to the same coupler, their genders are the same. The same applies to the primary quick coupler 5q and the secondary quick coupler 6q.

[0043] The cleaning fluid supply unit 30 can be configured with only a cleaning fluid storage tank 31, as shown in Figure 12, as long as it can supply the required amount of cleaning fluid CW, and the cleaning fluid CW can be replenished as needed. On the other hand, the cleaning fluid supply unit 30 shown in Figure 1 is designed to reuse the cleaning fluid CW, considering its use in places where a large amount of cleaning fluid CW cannot be used (for example, on a ship). In other words, as can be seen from the state of the washing operation shown in Figure 2, the washing liquid supply unit 30 comprises a washing liquid storage tank 31, a powder recovery unit 32 having separation filters 32A and 32B that separate the washing discharge liquid into adsorbed powder and washing liquid CW, and a quick coupler 32q for discharging the washing liquid CW separated by the separation filters 32A and 32B, and a washing liquid supply channel 34 having a quick coupler 34q for supplying washing liquid that can be attached to and detached from the quick coupler 32q for discharging the washing liquid, with the other end connected to the washing liquid storage tank 31, and the other end of the washing discharge channel 33 connected to the primary side of the separation filters 32A and 32B of the powder recovery unit 32. The separation filters 32A and 32B in the illustrated example are configured to perform two-stage filtration with a first filter 32A having a relatively large pore size and a second filter 32B having a relatively small pore size, but are not limited to this configuration.

[0044] The washing liquid CW is not particularly limited and is preferably the same as the slurry dispersion DW used in the deposition layer formation operation, but the washing liquid CW may be different from the slurry dispersion DW used in the deposition layer formation operation. One preferred example of the washing liquid CW and dispersion DW is clean water.

[0045] The slurry supply unit 20 may consist of a slurry storage tank 21 into which adsorbent powder CP and dispersion liquid DW are introduced, and a stirrer 28 for the adsorbent powder CP and dispersion liquid DW in the slurry storage tank 21, as shown in Figure 12, as long as it can supply the required concentration and quantity of slurry CS for forming the deposit layer. Alternatively, although not shown, the slurry supply unit 20 may consist only of a slurry container containing the required concentration and quantity of slurry CS for forming the deposit layer. However, the former is cumbersome for the user to implement due to the need to weigh the adsorbent powder and dispersion liquid DW, and the latter is unsuitable for locations where a large amount of dispersion liquid DW cannot be used or where space is limited (e.g., ships). On the other hand, the slurry supply unit 20 shown in the examples in Figures 1 and 3 solves these problems. In other words, the slurry supply unit 20 comprises a slurry storage tank 21, a raw material container 22 in which raw material slurry RS containing adsorbent powder CP and dispersion liquid DW is stored and which has an inlet quick coupler 22iq for introducing liquid into the interior and an outlet quick coupler 22xq for releasing the liquid inside, a return flow path 23 having a circulation quick coupler 23q attached to and detached from the inlet quick coupler 22iq at one end and the other end connected to the outlet of the pump 11, and a primary slurry supply flow path 24 having a primary slurry supply quick coupler 24q attached to and detached from the outlet quick coupler 22xq at one end and the other end connected to the slurry storage tank 21, and the module discharge flow path 13 leads to the slurry storage tank 21. In the deposition layer formation operation state, where the circulation quick coupler 23q is connected to the inlet quick coupler 22iq and the primary slurry supply quick coupler 24q is connected to the outlet quick coupler 22xq, as shown in Figure 3, a first circulation path C1 is configured via the pump 11, module supply channel 12, filter module 1 after washing operation, module discharge channel 13 and slurry storage tank 21, and a second circulation path C2 is configured via the pump 11, return channel 23, raw material container 22, primary slurry supply channel 24 and slurry storage tank 21. In the illustrated example, the module supply channel and return channel 23 are branched from a shared channel 25 connected to the outlet of the pump 11, but such a shared channel 25 does not necessarily have to be provided.

[0046] The flow rate ratio of the first circulation path C1 and the second circulation path C2 can be determined as appropriate, for example, 7-9:1-3. This flow rate ratio can be determined by appropriately selecting the inner diameter of the flow path constituting the first circulation path C1 (for example, the inner diameter of the hose or pipe constituting the module supply flow path 12) and the inner diameter of the flow path constituting the second circulation path C2 (for example, the inner diameter of the hose or pipe constituting the return flow path 23). This flow rate ratio can also be adjusted by providing a flow rate control valve (not shown) in either or both (for example, only the return flow path 23) of the flow path constituting the first circulation path C1 (for example, the module supply flow path 12) and the flow path constituting the second circulation path C2 (for example, the return flow path 23).

[0047] As shown in the example in Figure 1, the slurry storage tank 21 can be used in common with the washing liquid storage tank 31. In other words, a single storage tank 21, 31 can be used as the washing liquid storage tank 31 during washing operations and as the slurry storage tank 21 during the deposition layer formation operation. In this case, it is preferable that the washing liquid CW and the dispersion liquid DW are the same, but they may be different. Also, as needed, such as when the liquid to be treated is used as the diluent DL described later, a waste liquid passage 21D with a discharge valve 21V can be provided in the slurry storage tank 21. If the washing liquid storage tank 31 is provided separately from the slurry storage tank 21, a waste liquid passage 31D with a discharge valve 31V can also be provided in the washing liquid storage tank 31. Of course, as shown in Figure 12, the slurry storage tank 21 and the washing liquid storage tank 31 can also be provided separately. In this case, by providing on-off valves 20V and 30V in the discharge channel of the slurry storage tank 21 and the discharge channel of the washing liquid storage tank 31, and opening one of them and closing the other, the slurry CS for forming the deposit layer in the slurry storage tank 21 and the washing liquid CW in the washing liquid storage tank 31 can be selectively pumped by the pump 11.

[0048] Furthermore, unlike the illustrated example, the primary slurry supply channel 24 having a quick coupler 24q for primary slurry supply, or the module discharge channel 13 having a quick coupler 13q for module discharge, can be used in common with the cleaning fluid supply channel 34 having a quick coupler 34q for cleaning fluid supply. In other words, a single quick coupler and hose can be used as the cleaning fluid supply quick coupler 34q and cleaning fluid supply channel 34 during cleaning operation, and as the primary slurry supply quick coupler 24q and primary slurry supply channel 24, or the module discharge quick coupler 13q and module discharge channel 13 during deposition layer formation operation. In this case, it is preferable that the cleaning fluid CW and the dispersion fluid DW are the same, but they may be different.

[0049] The adsorbed powder and cleaning slurry discharged through the cleaning discharge channel can be stored and recovered in the cleaning wastewater storage tank 35 without being reused, as shown in Figure 12, and then subjected to solid-liquid separation in another facility or discharged as is. Along with or instead of this, the filtrate discharged through the module discharge channel 13 can be discharged as is without being reused, as shown in Figure 12.

[0050] (How to play) When regenerating a used filter module 1, first, as shown in Figure 2, the module supply quick coupler 12q is connected to the secondary quick coupler 6q of the used filter module 1, and the cleaning and discharge quick coupler 33q is connected to the primary quick coupler 5q of the used filter module 1. With this connected, the pump 11 is operated to perform a cleaning operation. As a result, the cleaning liquid CW supplied from the cleaning liquid supply unit 30 is supplied to the secondary side of the used filter module 1 via the pump 11 and the module supply channel 12, and backwashing is performed. That is, the cleaning liquid CW flows back from the secondary side to the primary side of the filtration membrane 2, causing the adsorbed powder CP that was attached to the filtration membrane 2 to detach from the filtration membrane 2 and be discharged into the cleaning and discharge channel 33 together with the cleaning liquid CW. In this case, to close the return channel 23 and the primary slurry supply channel 24, the circulation quick coupler 23q and the primary slurry supply quick coupler 24q may be plugged, or on / off valves (not shown) may be provided in the return channel 23 and the primary slurry supply channel 24 to close the return channel 23 and the primary slurry supply channel 24 during the washing operation. Alternatively, the circulation quick coupler 23q and the primary slurry supply quick coupler 24q may be configured to be connectable, and during the washing operation, they may be connected to return a portion of the washing liquid CW pumped by the pump 11 to the washing liquid storage tank 31 via the return channel 23 and the primary slurry supply channel 24.

[0051] In particular, in the case of the cleaning fluid supply unit 30 shown in Figure 2, during cleaning operation, a predetermined amount of cleaning fluid CW is stored in the cleaning fluid storage tank 31, the cleaning discharge quick coupler 33q is connected to the primary quick coupler 5q, and the cleaning fluid supply quick coupler 34q is connected to the separated fluid discharge quick coupler 32q, and the pump 11 is operated. As a result, the cleaning fluid CW in the cleaning fluid storage tank 31 is supplied to the secondary side of the used filter module 1 via the pump 11 and the module supply channel 12, and backwashing is performed. Meanwhile, the adsorbed powder CP and cleaning fluid CW separated from the filtration membrane 2 by backwashing are supplied to the powder recovery unit 32 via the cleaning discharge channel 33, and the cleaning fluid CW from the adsorbed powder CP and cleaning fluid CW separated in the powder recovery unit 32 is returned to the cleaning fluid storage tank 31 via the cleaning fluid supply channel 34. Therefore, in this cleaning fluid supply unit 30, the cleaning fluid CW is recycled, so there is basically no need to replenish the cleaning fluid CW.

[0052] Once cleaning is complete, the pump 11 is stopped and the cleaning operation is terminated. The cleaning operation can be terminated automatically or manually. The cleaning operation may be terminated after a predetermined time has elapsed using a timer, or by installing pressure gauges (not shown) in the primary and secondary flow paths of the filter module 1 to measure internal pressure, and terminating the operation when the differential pressure between the primary and secondary sides of the filter module 1 falls below a predetermined value, or by installing a turbidimeter (not shown) in the module discharge flow path 13 and terminating the operation when the turbidity falls below a predetermined value. At the end of the cleaning operation, residual liquid may be discharged by opening the discharge valve 31V of the cleaning liquid storage tank 31, or the residual liquid may be reused as dilution liquid DL during the subsequent deposition layer formation operation.

[0053] After the cleaning operation is completed, the deposition layer formation operation is started automatically or manually. In the deposition layer formation operation, as shown in Figures 3 and 4, the cleaning discharge quick coupler 33q is disconnected from the primary side quick coupler 5q of the filter module 1 after the cleaning operation, and the module supply quick coupler 12q is disconnected from the secondary side quick coupler 6q of the filter module 1 after the cleaning operation. The module supply quick coupler 12q is connected to the primary side quick coupler 5q of the filter module 1 after the cleaning operation, and the module discharge quick coupler 13q is connected to the secondary side quick coupler 6q of the filter module 1 after the cleaning operation, and the pump 11 is operated. As a result, the deposition layer formation slurry CS supplied from the slurry supply unit 20 is supplied to the primary side of the filter module 1 after the cleaning operation via the pump 11 and the module supply channel 12, and the entire amount is filtered, forming a deposition layer 3 of adsorbed powder CP on the primary side surface of the filter membrane 2, and the filtrate that has passed through the filter membrane 2 is discharged via the module discharge channel 13.

[0054] In particular, in the example of deposition layer formation operation shown in the illustration, as shown in Figure 3, a predetermined amount of diluent DL is stored in the slurry storage tank 21, the circulation quick coupler 23q is connected to the inlet quick coupler 22iq, and the primary slurry supply quick coupler 24q is connected to the outlet quick coupler 22xq, and the pump 11 is operated. As a result, circulation is started in the first circulation path C1 and the second circulation path C2 at predetermined flow rates, and the deposition layer formation slurry CS, which is the raw material slurry RS diluted with the diluent, is supplied to the primary side of the filter module 1 after the washing operation, forming a deposition layer 3 on the filtration membrane 2, and the filtrate that has passed through the filtration membrane 2 is returned to the slurry storage tank 21 via the module discharge channel 13.

[0055] More specifically, at the start of the deposition layer formation operation, the diluent DL in the slurry storage tank 21 is pumped by the pump 11 and distributed at a predetermined flow rate ratio to the primary side of the filter module 1 after the washing operation and to the raw material container 22. Primary slurry PS (consisting almost entirely of raw material slurry RS) is supplied from the raw material container 22 and filtrate (consisting almost entirely of diluent DL) is supplied from the filter module 1 to the slurry storage tank 21 at a predetermined flow rate ratio. As a result, as shown in Figure 4, a deposition layer formation slurry CS (adsorbent powder CP, dispersion DW, and diluent DL) is produced in the slurry storage tank 21 by diluting the primary slurry PS with the filtrate. A stirrer for the stored liquid may be provided in the slurry storage tank 21, but it is not required. It is preferable to keep the air vent valve 9V of the filter module 1 open at the start of the deposition layer formation operation and close the air vent valve 9V after a predetermined time has elapsed (i.e., after the air in the system has been released).

[0056] The diluent DL is not particularly limited and may be the same as or different from the slurry dispersion DW. One preferred example of the diluent DL is clean water, but if the filter module 1 is for liquid filtration (the fluid to be processed Fi is a liquid), the diluent DL may be the fluid to be processed Fi.

[0057] Subsequently, the slurry CS for deposit formation, produced in the slurry storage tank 21, is distributed and supplied by the pump 11 at a predetermined flow rate ratio to the primary side of the filter module 1 after the washing operation and to the raw material container 22. In the filter module 1 after the washing operation, the entire amount of slurry CS for deposit formation is filtered, forming a deposit layer 3 of adsorbed powder CP on the primary side surface of the filter membrane 2. The filtrate that has passed through the filter membrane 2 (a mixture of diluent DL and dispersion DW) is returned to the slurry storage tank 21 via the module discharge channel 13. In addition, as slurry CS for deposit formation is distributed and supplied to the raw material container 22, the mixed slurry of the stored slurry in the raw material container 22 (raw material slurry RS at the start) and slurry CS for deposit formation is returned to the slurry storage tank 21 as primary slurry PS. Therefore, during the deposit formation operation, the thickness of the deposit layer 3 increases over time, while the concentrations of primary slurry PS and slurry CS for deposit formation decrease.

[0058] The concentration of the adsorbed powder in the slurry CS for deposit formation can be determined as appropriate, but it is preferably around 3000 to 5000 mg / L. The concentration of the raw material slurry can also be determined as appropriate, but it is preferably around 90 to 500 mg / L.

[0059] The supply flow rate of the slurry CS for deposit formation to the filter module 1 is preferably 17 to 28 L / min (permeation flux of approximately 500 to 800 LMH). Furthermore, the differential pressure between the primary and secondary sides of the filtration membrane 2 is preferably approximately 5 to 30 kPa.

[0060] Although not shown in the diagram, on-off valves may be interposed in the module supply channel 12 and the return channel 23. After the start of the deposition layer 3 formation operation, the on-off valve in the module supply channel 12 may be closed to prevent circulation through the first circulation path C1, while the on-off valve in the return channel 23 may be opened to allow circulation only through the second circulation path C2. After the concentration of the deposition layer formation slurry CS has stabilized to some extent (for example, after a certain period of time has elapsed), the on-off valve in the return channel 23 may be closed to stop circulation through the second circulation path C2, and the on-off valve in the module supply channel 12 may be opened to start circulation through the first circulation path C1.

[0061] Thus, in this regeneration device, the primary slurry PS supplied from the raw material container 22 is diluted to produce a slurry CS for deposit layer formation, and this slurry CS is used to form a deposit layer 3 in the filter module 1. This reduces the volume and weight of the raw material container 22, which is advantageous in terms of transporting and storing the raw material container 22. Of course, the installation space for the raw material container 22 in this regeneration device is also small, allowing the regeneration device to be made more compact. Furthermore, the filtrate (dispersion DW) discharged from the filter module 1 during the deposit layer formation operation is returned to the slurry storage tank 21 and reused for diluting the primary slurry PS. This allows for effective deposit layer formation with a smaller amount of diluent DL used, and basically eliminates the need to replenish the diluent dispersion DW. As a result, it is suitable for locations where a large amount of dispersion DW cannot be used or where space is limited (e.g., ships).

[0062] Furthermore, by using the dispersion liquid DW as the washing liquid CW, the subsequent deposition layer formation operation can be performed without completely draining the washing liquid CW from the filter module 1. In addition, the washing liquid storage tank 31 and the slurry storage tank 21 can be shared, and the washing liquid CW remaining after washing can be used as the diluent DL, in which case there will be no need to replenish the diluent DL.

[0063] Once the formation of the deposited layer 3 is complete, the pump 11 is stopped, and the deposited layer formation operation is terminated. The deposited layer formation operation can be terminated automatically or manually. The deposited layer formation operation may be terminated after a predetermined time has elapsed using a timer, or pressure gauges (not shown) may be installed in the primary and secondary flow paths of the filter module 1 to measure internal pressure, and the operation may be terminated when the differential pressure between the primary and secondary sides of the filter module 1 exceeds a predetermined value. Alternatively, a turbidimeter may be installed to measure the turbidity in the raw material container 22 or slurry storage tank 21, and the relationship between the raw material slurry RS concentration and the turbidity of the residual liquid in the raw material container 22 or slurry storage tank 21 when the formation of the deposited layer 3 is complete may be determined in advance, and the deposited layer formation operation may be automatically terminated when the turbidity measurement result falls below a predetermined value. At the end of the deposited layer formation operation, the residual liquid may be discharged by opening the discharge valve 21V of the slurry storage tank 21, or the residual liquid may be reused as the cleaning liquid CW during a subsequent cleaning operation.

[0064] The regenerated filter module 1 (after the deposition layer formation operation has been completed) can be used by removing it from the regeneration device 10 and installing it in the filtration equipment. In the example shown in Figures 1 to 4, to remove the regenerated filter module 1 from the regeneration device 10, the module supply quick coupler 12q is removed from the primary quick coupler 5q, and the module discharge quick coupler 13q is removed from the secondary quick coupler 6q. When replacing the raw material container 22, the circulation quick coupler 23q is removed from the inlet quick coupler 22iq, and the primary slurry supply quick coupler 24q is removed from the outlet quick coupler 22xq. Furthermore, when replacing the powder recovery unit 32, the washing discharge quick coupler 33q is removed from the primary quick coupler 5q, and the washing liquid supply quick coupler 34q is removed from the separation liquid discharge quick coupler 32q. The adsorbed powder CP recovered in the powder recovery unit 32 can be disposed of alone or together with the separation filters 32A and 32B.

[0065] (others) To facilitate the removal of adsorbed powder CP from the filter membrane 2 during the cleaning operation, as shown in Figures 1 and 2, it is preferable to provide a mounting base 41 on which the filter module 1 is installed, and a vibration source (vibrator) 42 that vibrates the filter module 1 installed on the mounting base 41. During the cleaning operation, it is preferable to install the filter module 1 on the mounting base 41 and to apply intermittent or continuous vibration to the filter module 1 using the vibration source 42. In the illustrated example, the vibration source 42 is an air vibrator that generates vibration using compressed air CA as the driving source, and compressed air CA is supplied to this vibration source 42 from an air compressor (not shown) via a flow control valve 42V.

[0066] To enhance the backwashing effect of the cleaning liquid CW, it is preferable to intermittently supply compressed air CA to the module supply channel 12 (pulse blow). This is because the water hammer effect caused by the pulsation of the cleaning liquid CW being pumped to the secondary side of the filter membrane 2 promotes the detachment of adsorbed powder CP from the filter membrane 2. The means for intermittently supplying compressed air CA is not particularly limited, but in the example shown in Figures 1 and 2, a pulse air channel 26 is provided to supply compressed air CA from an air compressor (not shown) to the common channel 25 (which may also be the module supply channel 12), and a pulse blow valve 26P and a flow control valve 26V are provided in this pulse air channel 26.

[0067] To improve the quality of the deposited layer 3, such as the density and homogeneity of the particle packing structure, it is preferable to provide a line mixer 27 between the pump 11 and the primary-side quick coupler 5q in the first circulation path C1, and to supply the slurry CS for deposit formation produced in the slurry supply unit 20 to the primary side of the filter module 1 after the washing operation by passing it through the line mixer 27 without allowing it to accumulate. That is, by passing it through the line mixer 27, the slurry CS for deposit formation is forcibly stirred with shear action in a spatially constrained state within the line mixer 27, and even if there are aggregates or clumps of adsorbed powder CP, they are effectively broken down and easily become single particles (single particle formation action). Then, by filtering the entire amount of the slurry CS for deposit formation, which now contains more single particles in a dispersed state, through the filter membrane 2 without allowing it to accumulate, the density and homogeneity of the particle packing structure of the deposited layer 3 can be improved.

[0068] The line mixer 27 is not particularly limited as long as it forcibly agitates the liquid passing through the flow path with shear action while spatially constraining it, and there is no stagnation. In short, a so-called static mixer (for example, one that has a stationary baffle or obstacle inside the piping that changes the direction of flow), a jet mixer, an injector mixer, or a dynamic mixer that has a rotating agitator such as a rotating agitator blade inside the piping can be used.

[0069] (Fluid to be processed) The filter module 1 regenerated by this regeneration device 10 may have a processed fluid Fi that is a liquid such as river or lake water, seawater, groundwater, spring water, wastewater from factories (such as semiconductor manufacturing plants or photographic film manufacturing plants), or wastewater from ships or vessels, or it may be a gas. [Explanation of Symbols]

[0070] 1…Filter module, 2,3…Filtration layer, 2…Filtration membrane, 2s…Spacer, 3…Deposit layer, 4…Container, 4A…Main part, 4B…First lid, 4C…Second lid, 4R…Seal ring, 5…Supply port, 5q…Primary side quick coupler, 6…Discharge port, 6q…Secondary side quick coupler, 7…Filter unit, 7A…Inner tube, 7B…Outer tube, 7C…Pleated filter, 7D…First closing plate, 7E…Second closing plate, 8…Outlet hole, 9…Air vent passage, 9V…Air vent valve, 1 0... Filter module regeneration device, 11... Pump, 12... Module supply channel, 12q... Quick coupler for module supply, 13... Module discharge channel, 13q... Quick coupler for module discharge, 20... Slurry supply section, 21... Slurry storage tank, 21D... Waste liquid channel, 21V... Discharge valve, 22... Raw material container, 22iq... Inlet quick coupler, 22xq... Outlet quick coupler, 23... Return channel, 23q... Quick coupler for circulation, 24... One 24q...Quick coupler for primary slurry supply, 26...Pulse air flow path, 26P...Pulse blow valve, 25...Shared flow path, 26V...Flow control valve, 27...Line mixer, 28...Agitator, 30...Washing liquid supply section, 31...Washing liquid storage tank, 32...Powder recovery section, 32A, 32B...Separation filters, 32A...First filter, 32B...Second filter, 32q...Quick coupler for separated liquid discharge, 33...Washing discharge flow path, 33q...Washing discharge Quick coupler for use, 34... Cleaning fluid supply channel, 34q... Quick coupler for supplying cleaning fluid, 41... Mounting base, 42... Vibration source, 42V... Flow control valve, C1... First circulation path, C2... Second circulation path, CP... Adsorbent powder, CS... Slurry for forming deposition layer, CW... Cleaning fluid, DL... Dilution liquid, CA... Compressed air, DW... Dispersion liquid, Fi... Fluid to be treated, Fx... Treated fluid, PS... Primary slurry, RS... Raw material slurry, S1... First gap, S2... Second gap, S3... Third gap.

Claims

1. A filter module regeneration device comprising a filter membrane and a filter layer having a deposit layer of adsorbed powder attached to the primary side surface of the filter membrane, a primary quick coupler communicating with the primary side of the filter layer and a secondary quick coupler communicating with the secondary side of the filter layer, configured to perform total filtration by the filter layer, A slurry supply unit that supplies slurry for forming a deposit layer, and a cleaning liquid supply unit that supplies cleaning liquid, A pump that selectively pumps the slurry for forming the deposition layer supplied from the slurry supply unit and the cleaning liquid supplied from the cleaning liquid supply unit, A module supply channel has a module supply quick coupler at one end that can be selectively attached to and detached from the primary side quick coupler and the secondary side quick coupler, and the other end is connected to the outlet of the pump, A module discharge channel having a module discharge quick coupler at one end that is attached to and detached from the secondary quick coupler, The system includes a cleaning and discharge channel having a cleaning and discharge quick coupler at one end that is attached to and detached from the primary side quick coupler, With the module supply quick coupler connected to the secondary quick coupler of the used filter module, and the cleaning discharge quick coupler connected to the primary quick coupler of the used filter module, the pump is operated to supply the cleaning liquid supplied from the cleaning liquid supply unit to the secondary side of the used filter module via the pump and the module supply channel to perform backwashing, and the cleaning liquid that flows back to the primary side of the filtration membrane, along with the adsorbed powder that has been detached from the filtration membrane, is discharged together with the cleaning liquid into the cleaning discharge channel, thus performing a cleaning operation. The module supply quick coupler is connected to the primary side quick coupler of the filter module after the cleaning operation, and the module discharge quick coupler is connected to the secondary side quick coupler of the filter module after the cleaning operation. By operating the pump, the slurry for forming the deposit layer supplied from the slurry supply unit is supplied to the primary side of the filter module after the cleaning operation via the pump and the module supply channel to perform total filtration, thereby depositing the adsorbed powder on the primary side surface of the filter membrane to form a deposit layer, and the filtrate that has passed through the filter membrane is discharged via the module discharge channel, thus performing a deposit layer formation operation. A filter module regeneration device characterized by being configured to perform the following.

2. The aforementioned cleaning fluid supply unit is Washing fluid storage tank, A powder recovery unit having a separation filter for solid-liquid separation of the mixture of the adsorbed powder and the cleaning liquid discharged into the cleaning discharge channel, and a quick coupler for discharging the separated cleaning liquid for discharging the cleaning liquid separated by the separation filter, The system includes a cleaning fluid supply channel having a cleaning fluid supply quick coupler at one end that can be attached to and detached from the separation fluid discharge quick coupler, and the other end of which is connected to the cleaning fluid storage tank, The other end of the washing and discharge channel is connected to the primary side of the separation filter of the powder recovery section. In the cleaning operation, a predetermined amount of the cleaning liquid is stored in the cleaning liquid storage tank, the cleaning discharge quick coupler is connected to the primary side quick coupler, and the cleaning liquid supply quick coupler is connected to the separation liquid discharge quick coupler. With the pump in this state, the cleaning liquid in the cleaning liquid storage tank is supplied to the secondary side of the used filter module via the pump and the module supply channel to perform backwashing. The cleaning liquid that flows back to the primary side of the filtration membrane and the adsorbed powder that has been separated from the filtration membrane are supplied together with the cleaning liquid to the powder recovery section via the cleaning discharge channel. The adsorbed powder and the cleaning liquid separated in the powder recovery section are returned to the cleaning liquid storage tank via the cleaning liquid supply channel. A filter module regeneration device according to claim 1.

3. A mounting base on which the filter module is installed, The system includes a vibration source that applies vibration to the filter module installed on the mounting base, The filter module is installed on the mounting base, and the cleaning operation is performed while the filter module is vibrated by the vibration source. A filter module regeneration device according to claim 2.

4. The slurry supply unit is, Slurry storage tank, A raw material container is provided, which stores the raw material slurry containing the adsorbent powder and dispersion, and has an inlet quick coupler for introducing liquid into the container and an outlet quick coupler for releasing the liquid from the container. A return flow path has a circulating quick coupler at one end that is attached to and detached from the inlet quick coupler, and the other end is connected to the outlet of the pump. The system comprises a primary slurry supply channel having a primary slurry supply quick coupler at one end that is attached to and detached from the aforementioned outflow quick coupler, and the other end of which is connected to the slurry storage tank, The module discharge channel leads to the slurry storage tank, In the aforementioned deposition layer formation operation, a predetermined amount of diluent is stored in the slurry storage tank, the circulation quick coupler is connected to the inlet quick coupler, and the primary slurry supply quick coupler is connected to the outlet quick coupler. With the pump activated, circulation is performed at a predetermined flow rate ratio in a first circulation path passing through the pump, the module supply channel, the filter module after the cleaning operation, the module discharge channel, and the slurry storage tank, and in a second circulation path passing through the pump, the return channel, the raw material container, the primary slurry supply channel, and the slurry storage tank. By doing so, the slurry for deposition layer formation, obtained by diluting the raw material slurry with the diluent, is supplied to the primary side of the filter module after the cleaning operation to form the deposition layer, and the filtrate that has passed through the filtration membrane is returned to the slurry storage tank via the module discharge channel. A filter module regeneration device according to claim 1 or 2.

5. The first circulation path includes a line mixer provided between the pump and the primary side quick coupler, In the aforementioned deposition layer formation operation, the slurry for deposition layer formation produced in the slurry supply unit is supplied to the primary side of the filter module after the washing operation without being passed through the line mixer and allowed to remain there. A filter module regeneration device according to claim 4.

6. A method for regenerating a filter module comprising a filter membrane, a filter layer having a deposit layer of adsorbed powder attached to the primary side surface of the filter membrane, a primary quick coupler communicating with the primary side of the filter layer, and a secondary quick coupler communicating with the secondary side of the filter layer, wherein the filter layer is configured to perform total filtration, A slurry supply unit that supplies slurry for forming a deposit layer, and a cleaning liquid supply unit that supplies cleaning liquid, A pump that selectively pumps the slurry for forming the deposition layer supplied from the slurry supply unit and the cleaning liquid supplied from the cleaning liquid supply unit, A module supply channel has a module supply quick coupler at one end that can be selectively attached to and detached from the primary side quick coupler and the secondary side quick coupler, and the other end is connected to the outlet of the pump, A module discharge channel having a module discharge quick coupler at one end that is attached to and detached from the secondary quick coupler, A filter module regeneration device is used that includes a cleaning and discharge channel having a cleaning and discharge quick coupler at one end which is attached to and detached from the primary side quick coupler; With the module supply quick coupler connected to the secondary quick coupler of the used filter module, and the cleaning discharge quick coupler connected to the primary quick coupler of the used filter module, the pump is operated to supply the cleaning liquid supplied from the cleaning liquid supply unit to the secondary side of the used filter module via the pump and the module supply channel to perform backwashing, and the cleaning liquid that flows back to the primary side of the filtration membrane, along with the adsorbed powder that has been detached from the filtration membrane, is discharged together with the cleaning liquid into the cleaning discharge channel, thus performing a cleaning operation. The module supply quick coupler is connected to the primary side quick coupler of the filter module after the cleaning operation, and the module discharge quick coupler is connected to the secondary side quick coupler of the filter module after the cleaning operation. By operating the pump, the slurry for forming the deposit layer supplied from the slurry supply unit is supplied to the primary side of the filter module after the cleaning operation via the pump and the module supply channel to perform total filtration, thereby depositing the adsorbed powder on the primary side surface of the filter membrane to form a deposit layer, and the filtrate that has passed through the filter membrane is discharged via the module discharge channel, thus performing a deposit layer formation operation. A method for regenerating a filter module, characterized by performing the following steps in this order.

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