Substrate processing equipment

Abstract

This invention provides a substrate processing apparatus that improves the accuracy of substrate cleaning using cleaning tools. [Solution] The substrate processing apparatus comprises a cleaning tool for cleaning a substrate, a load transmission member 130 having a first force transmission point P1 and a second force transmission point P2, and a linear guide 200 that supports the load transmission member 130 so as to be movable in the downward (-Z direction) and upward (+Z direction). The substrate processing apparatus further comprises an air cylinder device 110 that applies a downward force to the first force transmission point P1 of the load transmission member 130, and a load sensor 310 that has a contact member 311 that can contact the second force transmission point P2 of the load transmission member 130 and detects a downward force acting from the second force transmission point P2 to the contact member 311. The first force transmission point P1 of the load transmission member 130, the second force transmission point P2, and the linear guide 200 coincide with a virtual straight line L11 extending horizontally in a plan view.

Description

Technical Field

[0001] The present invention relates to a substrate processing apparatus that processes a cleaning tool by bringing it into contact with a substrate.

Background Art

[0002] In order to perform various processes on substrates such as semiconductor substrates, substrates for flat panel displays (FPDs) such as liquid crystal display devices or organic EL (Electro Luminescence) display devices, optical disk substrates, magnetic disk substrates, magneto-optical disk substrates, photomask substrates, ceramic substrates, or solar cell substrates, a substrate processing apparatus is used.

[0003] As an example of such a substrate processing apparatus, the substrate processing apparatus described in Patent Document 1 includes a back surface cleaning processing unit that scrub-cleans the back surface (one surface) of a substrate. The back surface cleaning processing unit includes a spin chuck, a brush, a holding arm, and a brush moving mechanism.

[0004] The spin chuck holds the substrate rotatably in a horizontal posture. The holding arm holds the brush. A brush moving mechanism is connected to the holding arm. The brush moving mechanism brings the brush into contact with one surface of the substrate held and rotated by the spin chuck by moving the holding arm. Further, the brush moving mechanism moves the brush on one surface of the substrate by further moving the holding arm. Thereby, one surface of the substrate is cleaned.

[0005] In the holding arm, the brush is attached to the lower end of a rotating shaft that extends in the vertical direction. The rotating shaft is supported by the housing of the holding arm via a coil spring. Therefore, in a state where the brush does not contact the substrate, the weight of the configuration including the rotating shaft and the brush is offset by the elastic force of the coil spring.

[0006] Furthermore, the holding arm incorporates a bracket and a pressing actuator for pressing the rotating shaft downwards to press the brush against the substrate while the brush is in contact with one surface of the substrate. The degree of cleaning force applied to one surface of the substrate varies depending on the pressing force (pressing pressure) applied from the brush to that surface of the substrate. Therefore, the pressing actuator presses the rotating shaft toward the substrate with a predetermined force to obtain a predetermined degree of cleaning force when cleaning one surface of the substrate. [Prior art documents] [Patent Documents]

[0007] [Patent Document 1] Japanese Patent Publication No. 2009-206139 [Overview of the project] [Problems that the invention aims to solve]

[0008] The holding arm described above also has a built-in pressure sensor. The pressure sensor receives the driving force generated by the pressing actuator via the bracket and detects it as the pressing pressure from the pressing actuator.

[0009] In the above-described substrate processing apparatus, the pressure applied by the brush to the substrate is preset based on the value detected by the pressure sensor. Therefore, if the pressure detected by the pressure sensor is inaccurate, it becomes difficult to clean the substrate under the desired conditions.

[0010] The objective of the present invention is to provide a substrate processing apparatus that improves the accuracy of substrate cleaning using a cleaning tool. [Means for solving the problem]

[0011] A substrate processing apparatus according to one aspect of the present invention comprises a cleaning tool for cleaning a substrate, a force transmission body having a first part and a second part, a linear guide that supports the force transmission body so as to be movable in a first direction and a second direction opposite to the first direction, a force application unit that applies a force in the first direction or a force in the second direction to the first part of the force transmission body, and a force detection unit having a contact part that can contact the second part and that detects a force acting from the second part on the contact part in the first direction, wherein the force transmission body is capable of transmitting the force applied from the force application unit to the first part to the cleaning tool, and the first part, the second part and the linear guide coincide with a virtual straight line that intersects the first direction and the second direction when viewed in the first direction. [Effects of the Invention]

[0012] According to the present invention, it becomes possible to improve the accuracy of cleaning substrates using a cleaning tool. [Brief explanation of the drawing]

[0013] [Figure 1] This is a schematic plan view of a substrate cleaning apparatus according to one embodiment of the present invention. [Figure 2] Figure 1 is a flowchart showing the basic processing flow performed by the control unit in the substrate cleaning apparatus. [Figure 3] This figure illustrates an example of the operation of the substrate cleaning apparatus shown in Figure 1 during the substrate cleaning process. [Figure 4] This is a schematic plan view of the brush arm in Figure 1, as seen in the -Z direction. [Figure 5] Figure 1 is a schematic one-sided side view of the brush arm as seen in the +X direction. [Figure 6] This is a schematic other side view of the brush arm in Figure 1, viewed in the -X direction. [Figure 7] This is a schematic one-sided end view of the brush arm in Figure 1, viewed in the +Y direction. [Figure 8] This is a diagram illustrating the process of adjusting the brush pressure. [Figure 9]This is a diagram for defining the moments that may occur in the linear guide. [Figure 10] This is a plan view of the linear guide built into the brush arm of FIG. 1. [Figure 11] This is a schematic side view of the linear guide of FIG. 10 seen in the +Y direction. [Figure 12] This is a cross-sectional view taken along the Q-Q line of FIG. 11. [Figure 13] This is a schematic plan view of the brush arm according to the comparative example seen in the -Z direction. [Figure 14] This is a schematic side view of the brush arm of FIG. 13 seen in the +X direction. [Figure 15] This is a diagram showing the experimental results of the pressing force detection. [Figure 16] This is a block diagram showing the configuration of the control system of the substrate cleaning apparatus of FIG. 1. [Figure 17] This is a flowchart of the brush pressing force adjustment process. [Figure 18] This is a schematic plan view showing an example of a substrate processing apparatus including the substrate cleaning apparatus of FIG. 1. [Figure 19] This is a diagram showing an example of a brush arm according to another embodiment. [Figure 20] This is a diagram showing an example of a brush arm according to still another embodiment.

Embodiments for Carrying Out the Invention

[0014] Hereinafter, a substrate processing apparatus according to an embodiment of the present invention will be described with reference to the drawings. In the following description, the substrate refers to a substrate for FPD (Flat Panel Display) used in a liquid crystal display device or an organic EL (Electro Luminescence) display device, a semiconductor substrate, a substrate for an optical disk, a substrate for a magnetic disk, a substrate for a magneto-optical disk, a substrate for a photomask, a ceramic substrate, a substrate for a solar cell, or the like.

[0015] In this embodiment, the substrate has a circular shape in plan view, except for the notch formation area. The substrate also has a front surface, which is the circuit formation surface, and a back surface, which is the opposite surface to the circuit formation surface. In the following description, regardless of whether it is the front or back surface of the substrate, the surface of the substrate that faces upward will be referred to as the top surface of the substrate, and the surface of the substrate that faces downward will be referred to as the bottom surface of the substrate.

[0016] The substrate processing apparatus described below is a substrate cleaning apparatus that performs a cleaning process on a substrate to be processed using a brush. During the cleaning process, a predetermined cleaning solution is supplied to the upper surface of the substrate, while a brush is pressed against the upper surface of the substrate.

[0017] 1. Overall configuration of the circuit board cleaning device Figure 1 is a schematic plan view of a substrate cleaning apparatus according to one embodiment of the present invention. In Figure 1 and subsequent figures, arrows indicating the mutually orthogonal X, Y, and Z directions are provided to clarify the positional relationships. The X and Y directions are mutually orthogonal in the horizontal plane. In this embodiment, the X direction corresponds to the left-right direction of the substrate cleaning apparatus 1, and the Y direction corresponds to the front-back direction of the substrate cleaning apparatus 1. The Z direction corresponds to the up-down direction (vertical direction) of the substrate cleaning apparatus 1.

[0018] Furthermore, in the X direction, when distinguishing between the direction the arrow is pointing and its opposite direction, the direction the arrow is pointing is called the +X direction, and its opposite direction is called the -X direction. Similarly, in the Y direction, when distinguishing between the direction the arrow is pointing and its opposite direction, the direction the arrow is pointing is called the +Y direction, and its opposite direction is called the -Y direction. Similarly, in the Z direction, when distinguishing between the direction the arrow is pointing and its opposite direction, the direction the arrow is pointing is called the +Z direction, and its opposite direction is called the -Z direction.

[0019] As shown in Figure 1, the substrate cleaning apparatus 1 has a configuration in which multiple components are housed in a chamber CH, and includes a substrate holding device 10, a cup device 20, a nozzle device 30, a brush arm device 40, a standby pod 71, a brush cleaning device 72, a brush device 80, and a control unit 900.

[0020] Chamber CH has four sides, a top surface, and a bottom surface CHB. One side of Chamber CH has a transport opening (not shown) for transporting substrates between the inside and outside of Chamber CH.

[0021] A substrate holding device 10 is provided approximately in the center of the chamber CH floor surface CHB. The substrate holding device 10 comprises a spin base 11, a plurality of holding pins 12, a substrate holding drive unit 13 (Figure 16), and a substrate rotation drive unit 14 (Figure 16). The substrate rotation drive unit 14 includes, for example, a motor, and is fixed to the chamber CH floor surface CHB such that the rotation axis of the motor faces upward. A disc-shaped spin base 11 is attached to the upper end of the rotation axis.

[0022] The spin base 11 has an outer diameter larger than the substrate W to be processed. A plurality of retaining pins 12 are provided on the upper peripheral edge of the spin base 11. Each of the plurality of retaining pins 12 has a contact portion. Each retaining pin 12 is configured to be able to transition between a holding state in which the contact portion abuts against the outer peripheral edge of the substrate W, and a release state in which the contact portion is separated from the substrate W, when the substrate W is placed on the spin base 11. The substrate holding drive unit 13 includes, for example, a magnet, and uses the magnetic force of the magnet to switch each retaining pin 12 between the holding state and the release state. The substrate W is held on the spin base 11 by the contact portions of the plurality of retaining pins 12 in the holding state abutting against multiple parts of the outer peripheral edge of the substrate W. In Figure 1, the outer shape of the substrate W held by the substrate holding device 10 is shown by a dashed line.

[0023] The cup device 20 includes a cup body 21 and a cup lifting drive unit 22. The cup body 21 has a substantially cylindrical shape and is provided to surround the spin base 11 in a plan view and extend in the Z direction. The cup body 21 is also provided to be movable in the Z direction.

[0024] The cup lifting drive unit 22 includes an actuator such as a motor or air cylinder, and moves the cup body 21 between a predetermined upper cup position and a lower cup position. The upper cup position is the height position (position in the Z direction) of the cup body 21 when the upper end of the cup body 21 is above the substrate W held by the substrate holding device 10. The lower cup position is the height position of the cup body 21 when the upper end of the cup body 21 is below the substrate W held by the substrate holding device 10.

[0025] The nozzle device 30 includes a fluid nozzle 31 and a fluid supply system 32. The fluid nozzle 31 is located at a predetermined position above the substrate holding device 10 and the cup device 20. The fluid nozzle 31 is fixed so that its discharge port faces the rotation center SC of the spin base 11 in the substrate holding device 10. The fluid supply system 32 supplies cleaning fluid to the fluid nozzle 31 during the cleaning process of the substrate W. This supplies cleaning fluid to the upper surface of the substrate W held by the substrate holding device 10. The cleaning fluid is, for example, pure water (deionized water). In addition to pure water, carbonated water, ozonated water, hydrogen water, electrolyzed ionized water, SC1 (a mixed solution of ammonia and hydrogen peroxide), or TMAH (tetramethylammonium hydroxide) can also be used as the cleaning fluid. Furthermore, the nozzle device 30 may be configured to spray gas such as an inert gas from the fluid nozzle 31. Moreover, the nozzle device 30 may have a plurality of fluid nozzles 31 capable of discharging or spraying different fluids from each other.

[0026] The brush arm device 40 includes a brush arm 41, a guide rail 43, an arm support 44, an arm horizontal drive unit 45, and an arm vertical drive unit 46. Within the chamber CH, the guide rail 43 is provided so as to be adjacent to the substrate holding device 10 in the Y direction. The guide rail 43 extends in the X direction.

[0027] The arm support 44 is provided so as to be movable in the X direction along the guide rail 43. The arm horizontal drive unit 45 in this example includes a motor and moves the arm support 44 in the X direction based on the control of the control unit 900, which will be described later. The brush arm 41 is supported by the arm support 44 so as to be movable (up and down) in the Z direction. The arm lifting drive unit 46 in this example includes a motor and moves the brush arm 41 in the Z direction based on the control of the control unit 900, which will be described later.

[0028] The brush arm 41 has a substantially rectangular parallelepiped shape and extends in the Y direction from the arm support portion 44 toward the substrate holding device 10. The tip of the brush arm 41 is configured to support a brush device 80 used for cleaning the substrate W as a brush support portion 42. In the substrate cleaning device 1 of Figure 1, the brush support portion 42 is located on a virtual straight line L1 that passes through the rotation center SC of the spin base 11 and extends in the X direction in a plan view.

[0029] The brushing device 80 includes a brush and has a cleaning surface that can contact the upper surface of the substrate W. The brush is formed of, for example, a PVA (polyvinyl alcohol) sponge or a PVA sponge in which abrasive particles are dispersed.

[0030] In a plan view, the standby pod 71 and the substrate holding device 10 are aligned on a virtual straight line L1. The standby pod 71 is configured to accommodate the brush device 80 supported by the brush support section 42.

[0031] The brush cleaning device 72 is configured to spray cleaning fluid into the standby pod 71. With the brush device 80 housed in the standby pod 71, cleaning fluid is sprayed from the brush cleaning device 72 into the standby pod 71. This cleans the brush device 80.

[0032] As shown by the thick dotted line frame in Figure 1, in the substrate cleaning apparatus 1, the standby position SP is set at a position that overlaps with the standby pod 71 in a plan view. The control unit 900 controls the operation of each part of the substrate cleaning apparatus 1. Details of the control unit 900 will be described later.

[0033] 2. Basic processing flow in a circuit board cleaning system Figure 2 is a flowchart showing the basic processing flow performed by the control unit 900 in the substrate cleaning apparatus 1 shown in Figure 1. In the initial state, the brush device 80 is housed in the standby pod 71.

[0034] When the power to the substrate cleaning device 1 is turned on and there is no substrate W in the chamber CH, the control unit 900 determines whether or not a substrate W has been loaded, as shown in Figure 2 (step S11). Whether or not a substrate W has been loaded can be determined based on the operating status of a robot outside the chamber CH (such as the main robot 844 in Figure 18, which will be described later).

[0035] If no substrate W is loaded, the process in step S11 is repeated. On the other hand, if a substrate W is loaded, the control unit 900 controls the substrate holding device 10 shown in Figure 1, etc., to receive the substrate W loaded into the chamber CH (step S12). As a result, the substrate W is placed on the substrate holding device 10 and held therein.

[0036] During or after the processing in step S12, the control unit 900 controls the brush cleaning device 72 shown in Figure 1 to spray cleaning fluid onto the brush device 80 housed in the standby pod 71, thereby cleaning the brush device 80 (step S13).

[0037] After cleaning the brush device 80, the control unit 900 stops spraying cleaning fluid onto the brush device 80 and performs a brush pressing force adjustment process (step S14). The brush arm 41 in Figure 1 is capable of applying a downward pressing force (load) to the brush device 80, which is supported by the brush support unit 42. This allows the brush arm 41 to press the brush device 80 against the substrate W while being held at a predetermined height position (position in the Z direction) during the substrate W cleaning process.

[0038] The brush pressure adjustment process is a process that adjusts the operating conditions of the air cylinder device 110 (Figure 4), which will be described later, so that the brush device 80 is pressed against the substrate W with a predetermined pressure during the subsequent substrate W cleaning process. Details of the brush pressure adjustment process will be described later.

[0039] Next, the control unit 900 performs a cleaning process on the substrate W by controlling the nozzle device 30 and brush arm device 40 shown in Figure 1 (step S15). After the cleaning process on the substrate W, the control unit 900 passes the substrate W to a robot outside the chamber CH (such as the main robot 844 shown in Figure 18, which will be described later) by controlling the substrate holding device 10 shown in Figure 1 (step S16). This returns the process to step S11. In the above series of processes, the process in step S14 may be performed before the process in step S13, or it may be performed simultaneously with the process in step S12.

[0040] Figure 3 is a diagram illustrating an example of the operation of the substrate cleaning apparatus 1 shown in Figure 1 during the cleaning process of a substrate W. In Figure 3, the upper part shows a schematic plan view of the substrate cleaning apparatus 1. The lower part shows a schematic one-sided side view of the substrate cleaning apparatus 1 as seen in the -Y direction.

[0041] As described above, immediately before the cleaning process of the substrate W, the brush pressure adjustment process is performed with the brush device 80 housed in the standby pod 71. Therefore, even in the initial state of the cleaning process of the substrate W, the brush device 80 is housed in the standby pod 71. Also, in the initial state, the cup body 21 is in the lower cup position, and the discharge of cleaning liquid by the fluid nozzle 31 is stopped.

[0042] When the cleaning process for the substrate W begins, the substrate W, held by the substrate holding device 10, is rotated at a predetermined rotational speed. The cup body 21 is also held in the cup-up position. Furthermore, cleaning liquid is discharged from the fluid nozzle 31 toward the rotating substrate W.

[0043] In this state, the horizontal arm drive unit 45 and the vertical arm drive unit 46 in Figure 1 operate, causing the brush arm 41 to move in the Z and X directions. As a result, the brush device 80, supported by the brush support unit 42, is lifted from the standby pod 71 and pressed against the upper surface of the rotating substrate W. In this state, as shown by the thick dashed arrows a1 and a2 in Figure 3, the brush device 80 moves along a virtual straight line L1 extending in the X direction in a plan view. In this way, the upper surface of the substrate W is cleaned.

[0044] Once the top surface of the substrate W is cleaned, the brush device 80 is returned to its initial position. At the same time, the discharge of cleaning fluid from the fluid nozzle 31 stops, and the rotation of the substrate W by the substrate holder 10 stops. Furthermore, the cup body 21 moves from the upper cup position to the lower cup position. This completes the cleaning process of the substrate W.

[0045] In the example shown in Figure 3, the brush device 80 moves back and forth between the outer edge of the substrate W and the rotation center SC of the spin base 11. However, the substrate W may also be cleaned by moving along a virtual straight line L1 from one end to the other. Alternatively, the brush device 80 may clean the substrate W by moving only once between the outer edge of the substrate W and the rotation center SC of the spin base 11.

[0046] 3. Configuration of the brush arm 41 Figure 4 is a schematic plan view of the brush arm 41 in Figure 1, viewed in the -Z direction. Figure 5 is a schematic side view of the brush arm 41 in Figure 1, viewed in the +X direction. Figure 6 is a schematic other side view of the brush arm 41 in Figure 1, viewed in the -X direction. Figure 7 is a schematic end view of the brush arm 41 in Figure 1, viewed in the +Y direction.

[0047] The brush arm 41 according to this embodiment has a configuration in which a plurality of members are housed within a housing H. The housing H includes a base member 101 and a cover member 102. The base member 101 is composed of a rectangular long plate member, and one end thereof is attached to the arm support portion 44 in Figure 1. As a result, the base member 101 is supported by the arm support portion 44 with an extension from the arm support portion 44 in the -Y direction. In the brush arm 41 of Figures 4 to 7, the end of the base member 101 facing the +Y direction is the attachment portion to the arm support portion 44.

[0048] The cover member 102 has a box-like shape with an open lower end and is configured to be attachable to the base member 101. When the cover member 102 is attached to the base member 101, a space for housing multiple components is formed on the base member 101. In Figures 4 to 7, the cover member 102 is shown with a dashed line to facilitate understanding of the internal structure of the brush arm 41. Additionally, some components within the housing H are omitted from the illustration as appropriate.

[0049] The base member 101 has a rectangular, flat top surface. As shown in Figure 4, an air cylinder device 110 is provided on the top surface of the base member 101 via a cylinder base 119 at a position offset in the +Y direction from the central portion of the base member 101. As shown in Figure 5, the air cylinder device 110 includes a cylinder body 111 and a cylinder rod 112. The cylinder body 111 is fixed on the cylinder base 119 such that its axis extends in the Z direction.

[0050] A piston (not shown) is provided inside the cylinder body 111. The cylinder rod 112 is connected to the piston and extends upward from the piston towards the cylinder body 111. A portion of the cylinder rod 112, including its upper end, protrudes above the cylinder body 111 and is exposed.

[0051] An air cylinder drive unit 113, located outside the brush arm 41, is connected to the cylinder body 111 via piping (not shown). The air cylinder drive unit 113 includes, for example, one or more electro-pneumatic regulators. The air cylinder drive unit 113 operates based on the control of the control unit 900 in Figure 1 and supplies air to the cylinder body 111. In this case, the pressure inside the cylinder body 111 is regulated, and a force corresponding to the regulated pressure is generated in the cylinder rod 112.

[0052] Above the air cylinder device 110, a beam member 122 is provided, which constitutes part of the pressing mechanism 120. The pressing mechanism 120 will now be described. The pressing mechanism 120 includes a support member 121, a beam member 122, and a connecting shaft 123.

[0053] The support member 121 is attached to the approximate center of the upper surface of the base member 101 and extends in the +Z direction from the upper surface of the base member 101 to a position near the upper end of the housing H. The beam member 122 is made of a rod-shaped member with high rigidity. The central part of the beam member 122 is attached to the upper end of the support member 121 via a connecting shaft 123 that extends in the X direction. In this state, the beam member 122 is supported so as to be rotatable in a plane perpendicular to the X direction (vertical plane). As a result, the pressing mechanism 120 has a seesaw structure in which the beam member 122 is supported with the connecting shaft 123 as a fulcrum.

[0054] In the pressing mechanism 120, the beam member 122 is supported either along the Y direction or inclined within a range of several tens of degrees (e.g., 30°) or less with respect to the Y direction. In the following description, the end of the beam member 122 facing the +Y direction will be referred to as the first end 122a, and the end facing the -Y direction will be referred to as the second end 122b.

[0055] The lower end of the first end 122a of the beam member 122 is in contact with or close to the upper end of the cylinder rod 112 when the air cylinder device 110 is not operating. Also, the lower end of the second end 122b of the beam member 122 is in contact with or close to the upper end of the load transmission member 130, which will be described later, when the air cylinder device 110 is not operating.

[0056] With this configuration, when the air cylinder device 110 operates and generates an upward (+Z direction) force on the cylinder rod 112, the first end 122a is pressed upward (+Z direction) by the cylinder rod 112. At this time, the beam member 122 rotates with respect to the connecting shaft 123. As a result, the second end 122b presses the load transmission member 130 downward (-Z direction).

[0057] The load transmission member 130 is composed of a single member made of, for example, a material with high rigidity. As shown in Figure 7, the load transmission member 130 in this example is a member that has an inverted L shape when viewed in the Y direction, and has a portion that extends in the X direction and a portion that extends in the Z direction. In the following description, the portion of the load transmission member 130 that extends in the X direction will be called the load receiving portion 131. The portion of the load transmission member 130 that extends in the Z direction will be called the lifting support portion 132.

[0058] Here, at the brush support portion 42 at the tip of the brush arm 41, a through hole 103 is formed in the base member 101 that connects the internal space of the housing H with the space below the housing H. The brush device 80 is supported by a brush support shaft 81 at a position below the base member 101. The brush support shaft 81 is provided to extend in the Z direction through the through hole 103 of the base member 101. As a result, the upper part of the brush support shaft 81 is located inside the brush arm 41, and the lower part of the brush support shaft 81 is located below the base member 101.

[0059] The load transmission member 130 is positioned above the through hole 103 such that a portion of the load receiving portion 131 overlaps with the through hole 103 in the Z direction. An upper bearing portion 420 is provided on a portion of the load receiving portion 131.

[0060] The upper bearing section 420 is connected to the load transmission member 130 such that one end (upper end) of the brush support shaft 81 is rotatable around its axis, and the brush support shaft 81 cannot be moved in the Z direction relative to the load transmission member 130.

[0061] Inside the housing H, a self-weight-countering mechanism 490 is mounted on the brush support shaft 81 so as to rotate together with the brush support shaft 81. The self-weight-countering mechanism 490 includes a coil spring extending in the Z direction, with its upper end fixed to a portion of the brush support shaft 81. On the other hand, the lower end of the self-weight-countering mechanism 490 is not fixed to the brush support shaft 81 in the Z direction.

[0062] A pulley 521 is further mounted on the brush support shaft 81 so as to rotate together with the brush support shaft 81. The pulley 521, like the lower end of the self-weight countermeasure mechanism 490, is not fixed to the brush support shaft 81 in the Z direction.

[0063] A lower bearing portion 410 is provided in the part of the base member 101 in which the through hole 103 is formed. The lower bearing portion 410 supports the pulley 521 on the base member 101 so that it can rotate around the axis of the brush support shaft 81. The lower bearing portion 410 also supports the pulley 521 on the base member 101 so that it cannot move relative to the base member 101 in the Z direction, while allowing the brush support shaft 81 to move in the Z direction.

[0064] As described above, the upper end of the self-weight counteracting mechanism 490 is fixed to a part of the brush support shaft 81. In this state, the lower end of the self-weight counteracting mechanism 490 is supported on the base member 101 via the pulley 521 and the lower bearing portion 410 in the Z direction. As a result, a load corresponding to the sum of the weights of the brush device 80, brush support shaft 81, and load transmission member 130, which are integrally connected in the Z direction, acts on the coil spring of the self-weight counteracting mechanism 490. In the following description, the load corresponding to the sum of the weights of the brush device 80, brush support shaft 81, and load transmission member 130 will be referred to as the brush weight.

[0065] The coil spring of the self-weight counteracting mechanism 490 is selected to provide an elastic force corresponding to the weight of the brush. Furthermore, the coil spring of the self-weight counteracting mechanism 490 is selected so that the reaction force corresponding to the expansion and contraction of the coil spring does not affect the accuracy of load transmission from the air cylinder device 110 to the brush device 80. With the coil spring appropriately selected, the configuration of the brush arm 41, including the brush device 80, brush support shaft 81, and load transmission member 130, is supported on the base member 101 so as to float at a predetermined height.

[0066] A support member 140 is provided on the upper surface of the base member 101 at a position offset in the +X direction from the lower bearing portion 410. The support member 140 extends a fixed length upward (in the +Z direction) from the upper surface of the base member 101. The support member 140 is connected to the lifting support portion 132 of the load transmission member 130 via a linear guide 200.

[0067] The linear guide 200 includes a straight rail 210 and a slider 220. The slider 220 is attached to the rail 210 so as to be movable in the direction in which the rail 210 extends and so as not to be movable in any other direction.

[0068] In this embodiment, the rail 210 is fixed to the support member 140 so as to extend in the Z direction. On the other hand, the slider 220 is fixed to the lifting support portion 132 of the load transmission member 130. As a result, the linear guide 200 restricts the movement direction of the load transmission member 130 to the Z direction.

[0069] The pulley 521 provided on the brush support shaft 81 is used to rotate the brush device 80 around its Z-axis, that is, to rotate the brush device 80 on its own axis. By rotating the brush device 80 during the cleaning process of the substrate W, the efficiency of the cleaning process of the substrate W is improved. In order to rotate the brush device 80, in addition to the pulley 521, a motor 510, a pulley 522, and a belt 523 are provided inside the brush arm 41. Furthermore, a motor drive unit 520 for operating the motor 510 is provided outside the brush arm 41.

[0070] Specifically, as shown in Figure 4, the motor 510 is provided on the upper surface of the base member 101 at a position between the load transmission member 130 and the support member 121 in the Y direction, and offset in the +X direction from the beam member 122.

[0071] As shown in Figure 6, the motor 510 is fixed to the upper surface of the base member 101 by a motor fixing piece 511 such that its rotating shaft protrudes downward. A pulley 522 is attached to the tip of the rotating shaft of the motor 510. The pulley 522 is fixed at the same height as the pulley 521. The belt 523 is stretched between the two pulleys 521 and 522.

[0072] A motor drive unit 520 is connected to the motor 510. The motor drive unit 520 supplies current to the motor 510 based on the control of the control unit 900, which will be described later, and rotates the motor 510.

[0073] When the motor 510 is operating, the rotational force generated by the motor 510 is transmitted from the motor 510's rotating shaft to the brush support shaft 81 through pulley 522, belt 523, and pulley 521. As described above, pulley 521 is not fixed to the brush support shaft 81 in the Z direction. Therefore, even if the brush support shaft 81 moves in the Z direction, this movement does not affect the transmission of rotational force from the motor 510 to the brush support shaft 81.

[0074] The force generated on the cylinder rod 112 when the air cylinder device 110 is in operation is converted by the pressing mechanism 120 into a pressing force that presses the load transmission member 130 downward (in the -Z direction). The pressing force in the Z direction acting on the load transmission member 130 is transmitted to the brush device 80 through the load transmission member 130, the upper bearing portion 420, and the brush support shaft 81.

[0075] The pressing force of the brush device 80 against the substrate W varies depending on the type of substrate W to be processed and the cleaning method. Therefore, the pressing force of the brush device 80 against the substrate W is set in advance for each substrate W. In the following explanation, the pressing force of the brush device 80 set for each substrate W will be referred to as the set pressing force.

[0076] If the pressing force applied to the substrate W by the brush device 80 deviates significantly from the set pressing force during cleaning of the substrate W, the desired cleaning process cannot be performed. Therefore, a load sensor 310 is provided on the brush arm 41. Based on the detection result of the load sensor 310, the actual pressing force (load) transmitted to the brush device 80 when the air cylinder device 110 is operating is detected.

[0077] Specifically, in this embodiment, a Roberval-type load cell is used as the load sensor 310. The load sensor 310 is fixed to the base member 101 via a sensor base 320, as shown in Figure 5, at a position offset in the -X direction from the motor 510. A plate-shaped contact member 311 is attached to a part of the load sensor 310. The tip of the contact member 311 is located below the load receiving portion 131 of the load transmission member 130.

[0078] As shown in Figure 7, when the air cylinder device 110 is not operating, a relatively large gap is formed between the load receiving portion 131 and the contact member 311. Therefore, when no pressing force from the air cylinder device 110 is acting on the load transmission member 130, the load sensor 310 does not detect any pressing force acting on the load transmission member 130. On the other hand, when the air cylinder device 110 operates, the load transmission member 130 is pressed downward, and the lower end of the load receiving portion 131 comes into contact with the contact member 311, the load sensor 310 detects the pressing force acting on the load transmission member 130.

[0079] 4. Brush pressure adjustment process and substrate W cleaning process Figure 8 is a diagram illustrating the brush pressure adjustment process. In Figure 8, the left portion shows a schematic one-sided end view of the brush arm 41 in a stopped state before the brush pressure adjustment process. The center portion shows a schematic one-sided end view of the brush arm 41 during the brush pressure adjustment process. Furthermore, the right portion shows a schematic one-sided end view of the brush arm 41 during the cleaning process of the substrate W. In each schematic one-sided end view, the cover member 102 is indicated by a dashed line, similar to the schematic one-sided end view in Figure 7.

[0080] Here, the portion of the load transmission member 130 that faces the second end 122b of the beam member 122 in the Z direction is called the first force transmission point P1. The portion of the load transmission member 130 that faces the contact member 311 connected to the load sensor 310 in the Z direction is called the second force transmission point P2. Furthermore, the portion of the load transmission member 130 to which the brush support shaft 81 is connected (the mounting portion of the upper bearing portion 420) is called the third force transmission point P3.

[0081] In the stopped state, the air cylinder device 110 in Figure 4 is assumed to be inactive. As a result, the first force transmission point P1 of the load transmission member 130 does not receive a downward pressing force from the second end 122b of the beam member 122. At this time, as shown in the left portion of Figure 8, the brush device 80, brush support shaft 81, and load transmission member 130, which are connected to each other, are supported by the elastic force of the coil spring of the self-weight offsetting mechanism 490, with the second force transmission point P2 separated by a distance d1 from the contact member 311. In this embodiment, the distance d1 is, for example, about 5 cm.

[0082] When the brush pressing force adjustment process is initiated, the air cylinder device 110 shown in Figure 4 is driven under predetermined operating conditions based on the set pressing force. As a result, the first force transmission point P1 of the load transmission member 130 is pressed downward, and the brush device 80, brush support shaft 81, and load transmission member 130, which are connected to each other, descend, as shown in the central part of Figure 8. Furthermore, the descent of the brush device 80, brush support shaft 81, and load transmission member 130 stops when the second force transmission point P2 of the load transmission member 130 comes into contact with the contact member 311. At this time, the brush device 80 is located at a distance d1 minutes below its height position when it is stopped.

[0083] In this state, the pressing force acting from the second end 122b of the beam member 122 to the first force transmission point P1 of the load transmission member 130 is detected by the load sensor 310 in Figure 4 as the actual pressing force (load) transmitted to the brush device 80.

[0084] The control unit 900 in Figure 1 modifies the operating conditions of the air cylinder device 110 so that the detection result of the load sensor 310 matches or nearly matches the set pressing force. In other words, the control unit 900 performs feedback control of the air cylinder drive unit 113 in Figure 4. Subsequently, the brush pressing force adjustment process is completed when the detection result of the load sensor 310 matches or nearly matches the set pressing force.

[0085] Subsequently, during the cleaning process of the substrate W, the brush arm 41 is moved while the air cylinder device 110 operates according to the adjusted operating conditions, and the brush device 80 is pressed against the upper surface of the substrate W. At this time, the set pressing force acting on the second force transmission point P2 of the load transmission member 130 acts on the substrate W from the third force transmission point P3 of the load transmission member 130 through the brush support shaft 81 and the brush device 80. In this way, the brush device 80 is pressed against the substrate W with the set pressing force. As a result, the load transmission member 130 rises and disengages from the contact member 311, and the pressing force acting on the contact member 311 is released. Also, depending on the positional relationship between the brush arm 41 and the substrate W, the second force transmission point P2 of the load transmission member 130 and the contact member 311 are separated, as shown in the right portion of Figure 8.

[0086] 5. Moment acting on the linear guide 200 As described above, in the brush arm 41, a linear guide 200 is used to restrict the direction of movement of the load transmission member 130, which is pressed by the beam member 122, in the Z direction. The linear guide 200 has a configuration in which a slider 220 is attached to a rail 210.

[0087] Let's consider the case where a downward pressing force acts on the first force transmission point P1 of the load transmission member 130. In this case, a moment may be generated in the linear guide 200. Depending on the direction of the moment generated in the linear guide 200, the connection state between the rail 210 and the slider 220 may change. Specifically, a displacement may occur in the positional relationship between the rail 210 and the slider 220.

[0088] Such fluctuations in the connection state between the rail 210 and the slider 220 cause the pressing force applied from the beam member 122 to the load transmission member 130 to be dispersed in directions other than the Z direction. When the pressing force applied to the load transmission member 130 is dispersed in directions other than the Z direction, it becomes impossible to accurately detect the pressing force acting on the load transmission member 130 during the brush pressing force adjustment process.

[0089] Figure 9 is a diagram for defining the moments that may occur in the linear guide 200. In Figure 9, the top row shows an external perspective view of the support member 140 and the linear guide 200. The second row from the top shows a schematic plan view of a part of the brush arm 41, the third row from the top shows a schematic one-sided side view of a part of the brush arm 41, and the bottom row shows a schematic one-sided end view of the brush arm 41. In the second, third, and fourth rows, the linear guide 200 is marked with a dot pattern to facilitate identification of the linear guide 200.

[0090] As shown by the thick dashed arrows in the top and second rows of Figure 9, a moment may be generated around the Z axis in the linear guide 200. This moment is called the first moment M1. As shown by the thick solid arrows in the top and third rows of Figure 9, a moment may be generated around the X axis in the linear guide 200. This moment is called the second moment M2. As shown by the thick dotted arrows in the top and bottom rows of Figure 9, a moment may be generated around the Y axis in the linear guide 200. This moment is called the third moment M3.

[0091] We will examine the generation of the first moment M1 during the brush pressure adjustment process. During the brush pressure adjustment process, the brush device 80 does not come into contact with the substrate W. Furthermore, no pressing force is applied to the load transmission member 130 in the X and Y directions. Therefore, the linear guide 200 does not generate the first moment M1 during the brush pressure adjustment process.

[0092] Next, we will consider the generation of a second moment M2 during the brush pressure adjustment process. As shown in Figure 4, the first force transmission point P1, the second force transmission point P2, and the linear guide 200 coincide with a virtual straight line L11 extending in the X direction in a plan view. According to this positional relationship, even if the second force transmission point P2 of the load transmission member 130 contacts the contact member 311 of the load sensor 310 during the brush pressure adjustment process, a second moment M2 is not generated.

[0093] Next, we will consider the generation of a third moment M3 during the brush pressing force adjustment process. As shown in Figure 4, the first force transmission point P1 and the second force transmission point P2 are spaced apart from each other in a plan view. Furthermore, a pressing force acting in the -Z direction acts on the first force transmission point P1 of the load transmission member 130, while a force acting in the +Z direction acts on the second force transmission point P2 of the load transmission member 130. Therefore, a third moment M3 is generated in the linear guide 200.

[0094] Thus, in the brush arm 41 according to this embodiment, the first moment M1 and the second moment M2 are not generated during the brush pressing force adjustment process. This prevents fluctuations in the connection state between the rail 210 and the slider 220 caused by the generation of the first moment M1 and the second moment M2 in the linear guide 200. Therefore, during the brush pressing force adjustment process, discrepancies between the pressing force applied to the load transmission member 130 by the air cylinder device 110 and the pressing force value detected by the load sensor 310 are suppressed.

[0095] As a result, the reliability of the detection results of the load sensor 310 in the brush pressing force adjustment process is improved, and the accuracy of cleaning the substrate W using the brush device 80 is improved.

[0096] As shown in Figure 4, in a plan view, the distance between the first force transmission point P1 and the second force transmission point P2 is smaller than the distance between the first force transmission point P1 and the third force transmission point P3. Also, in a plan view, the distance between the first force transmission point P1 and the second force transmission point P2 is smaller than 1 / 3 of the length of the load transmission member 130 in the X direction. In other words, in a plan view, the distance between the first force transmission point P1 and the second force transmission point P2 is relatively small. This suppresses the increase of the third moment M3 generated in the linear guide 200.

[0097] 6. Structure and mounting direction of the linear guide 200 Figure 10 is a plan view of the linear guide 200 built into the brush arm 41 of Figure 1. Figure 11 is a schematic one-sided side view of the linear guide 200 of Figure 10 as seen in the +Y direction. Figure 12 is a cross-sectional view taken along the QQ line of Figure 11. As shown in Figures 10 to 12, the linear guide 200 according to this embodiment includes a plurality of balls BA in addition to the rail 210 and slider 220 described above. Details of each component will be described below.

[0098] As shown in Figure 10, the rail 210 is provided to extend linearly in the Z direction and has a first side portion 211 and a second side portion 212 facing opposite directions. Specifically, the first side portion 211 faces the -Y direction and the second side portion 212 faces the +Y direction. Guide grooves gr1 and gr2 extending in the Z direction are formed in each of the first side portion 211 and the second side portion 212.

[0099] The slider 220 includes a rail overlap portion 230, a first mounting portion 240, a second mounting portion 250, and a pair of end caps 260, 270. The rail overlap portion 230, the first mounting portion 240, and the second mounting portion 250 are made from a single, integrally molded component.

[0100] In the following description, the single component consisting of the rail overlap portion 230, the first mounting portion 240, and the second mounting portion 250 will be referred to as the slider body as appropriate. End caps 260 and 270 are attached to one end and the other end of the slider body in the Z direction, respectively.

[0101] As shown in Figure 12, the cross-section of the slider body perpendicular to the Z direction is formed in an inverted U shape so that it can clamp a portion of the rail 210. The first mounting portion 240 corresponds to the first side portion 211 of the rail 210, and the second mounting portion 250 corresponds to the second side portion 212 of the rail 210. As a result, when the slider 220 is attached to the rail 210, a portion of the first mounting portion 240 faces the first side portion 211, and a portion of the second mounting portion 250 faces the second side portion 212. The rail overlap portion 230 overlaps the rail 210 in the X direction.

[0102] A guide groove gr3 extending in the Z direction is formed in the portion of the first mounting portion 240 that faces the first side portion 211 of the rail 210. This creates a space extending in the Z direction between the guide groove gr1 of the first side portion 211 and the guide groove gr3 of the first mounting portion 240. In addition, a through hole bp1 is formed in the first mounting portion 240 near the guide groove gr3, penetrating the first mounting portion 240 in the Z direction.

[0103] A guide groove gr4 extending in the Z direction is formed in the portion of the second mounting portion 250 that faces the second side portion 212 of the rail 210. This creates a space extending in the Z direction between the guide groove gr2 of the second side portion 212 and the guide groove gr4 of the second mounting portion 250. In addition, a through hole bp2 is formed in the second mounting portion 250 near the guide groove gr4, penetrating the second mounting portion 250 in the Z direction.

[0104] As shown in Figure 10, the end cap 260 has a guide path that connects the internal space of the through hole bp1 formed in the first mounting portion 240 with the space formed by the guide grooves gr1 and gr3. The end cap 260 also has a guide path that connects the internal space of the through hole bp2 formed in the second mounting portion 250 with the space formed by the guide grooves gr2 and gr4. Similarly, the end cap 270 also has a guide path that connects the internal space of the through hole bp1 with the space formed by the guide grooves gr1 and gr3. The end cap 270 also has a guide path that connects the internal space of the through hole bp2 with the space formed by the guide grooves gr2 and gr4.

[0105] The guide groove gr1 of the rail 210, the guide groove gr3 of the first mounting portion 240, the through hole bp1 of the first mounting portion 240, and the guide paths of the end caps 260 and 270 form one circulation passage through which multiple balls BA can circulate. In addition, the guide groove gr2 of the rail 210, the guide groove gr4 of the second mounting portion 250, the through hole bp2 of the second mounting portion 250, and the guide paths of the end caps 260 and 270 form another circulation passage through which multiple balls BA can circulate. Multiple balls BA are filled into each circulation passage.

[0106] In the linear guide 200 having the above configuration, multiple balls BA roll and move within each circulation path, causing the slider 220 to move smoothly along the rail 210.

[0107] Here, as shown in the enlarged view within the callout in Figure 12, the ball BA, located between the rail 210 and the slider body, basically contacts the groove (gr2) of the rail 210 at two points. Furthermore, the ball BA also basically contacts the groove (gr4) of the slider body at two points. In other words, the ball BA is supported at four points by the rail 210 and the slider body, as indicated by the four white arrows within the callout in Figure 12.

[0108] In linear guides equipped with multiple ball bearings (BA), it is known that the magnitude of differential slip generated in each ball differs depending on whether it makes two-point contact with the rail and slider or four-point contact. Specifically, it is known that the differential slip generated in a ball making two-point contact with the rail and slider is smaller than the differential slip generated in a ball making four-point contact with the rail and slider.

[0109] Focusing on this point, if a force in the Y direction acts between the rail 210 and the slider body, and some of the balls BA are firmly gripped at four points, it is thought that relatively large differential slip will occur in those balls BA. In other words, it is thought that large fluctuations are likely to occur in the connection state between the rail 210 and the slider 220.

[0110] On the other hand, consider the case where a force in the X direction acts between the rail 210 and the slider body, generating a shear force between the rail 210 and the slider body that holds some of the balls BA. In this case, some of the balls BA will be supported at virtually two points by the rail 210 and the slider body, which are moving relative to each other in the X direction. As a result, when a force in the X direction acts between the rail 210 and the slider body, the differential slip generated in each ball BA is expected to be smaller compared to when a force in the Y direction acts between the rail 210 and the slider body. In other words, it is expected that large fluctuations in the connection state between the rail 210 and the slider 220 will be less likely to occur.

[0111] In the linear guide 200, when the second moment M2 shown in Figure 9 occurs, a force in the Y direction acts between the rail 210 and the slider body. Also, in the linear guide 200, when the first moment M1 and the second moment M2 shown in Figure 9 occur, a force in the X direction acts between the rail 210 and the slider body.

[0112] As described above, in the brush arm 41 according to this embodiment, due to the positional relationship between the first force transmission point P1, the second force transmission point P2, and the linear guide 200, the first moment M1 and the second moment M2 are not generated during the brush pressing force adjustment process. Therefore, no force in the Y direction acts on the linear guide 200 between the rail 210 and the slider body. Consequently, it is considered that large fluctuations in the connection state between the rail 210 and the slider 220 are unlikely to occur during the brush pressing force adjustment process. In other words, it is considered that the load applied to the load transmission member 130 can be detected with high accuracy during the brush pressing force adjustment process.

[0113] To verify whether the above considerations were correct, the inventors conducted the following pressure detection experiment. First, the inventors prepared the brush arm 41 shown in Figure 4 as the brush arm 41 for the embodiment. The inventors also operated the air cylinder device 110 intermittently multiple times under operating conditions corresponding to a set pressure of 250g. Furthermore, the inventors recorded the pressure (load) detected by the load sensor 310.

[0114] Furthermore, the inventors prepared a comparative example brush arm with some configuration differences from the brush arm 41 of the embodiment. Figure 13 is a schematic plan view of the comparative example brush arm as seen in the -Z direction. Figure 14 is a schematic side view of the brush arm 41X of Figure 13 as seen in the +X direction.

[0115] The brush arm 41X in the comparative example has a different configuration of the load transmission member 130 compared to the embodiment. As shown in Figures 13 and 14, the load transmission member 130 in this example has a supported piece 133 in addition to the load receiving portion 131 and the lifting support portion 132. The supported piece 133 is formed to extend a certain distance in the +Y direction from a part of the lifting support portion 132, bend, and extend a certain distance in the +X direction. The contact member 311 of the load sensor 310 is positioned below the supported piece 133 so as to overlap the tip of the supported piece 133 in a plan view.

[0116] With this configuration, in the brush arm 41X of the comparative example, when the load transmission member 130 is pressed and moves downward, the supported piece 133 comes into contact with the contact member 311 and is supported. As a result, the pressing force applied to the load transmission member 130 is detected by the load sensor 310. Therefore, in the brush arm 41X, the portion of the load transmission member 130 that is the supported piece 133 facing the contact member 311 in the Z direction becomes the second force transmission point P2.

[0117] In this case, the second force transmission point P2 deviates from the virtual straight line L11 in a plan view (see Figure 13). Therefore, when the load sensor 310 detects the pressing force applied to the load transmission member 130, a second moment M2 is generated around the virtual straight line L11 (see Figure 9).

[0118] The inventors used the comparative example brush arm 41X to intermittently operate the air cylinder device 110 multiple times under operating conditions corresponding to a set pressing force of 250g. Furthermore, the inventors recorded the pressing force (load) detected by the load sensor 310.

[0119] Figure 15 shows the results of the pressure detection experiment. In Figure 15, the upper part shows the results of the pressure detection experiment for the example, and the lower part shows the results of the pressure detection experiment for the comparative example, also in graph form. In each graph, the vertical axis represents the pressure (load) detected by the load sensor 310, and the horizontal axis represents time.

[0120] As shown in the upper part of Figure 15, according to the results of the pressure detection experiment in the embodiment, a pressure of approximately 250g was detected each time the air cylinder device 110 operated. Furthermore, there was almost no variation in the multiple pressures detected over several trials (23 times in this example).

[0121] On the other hand, according to the results of the pressure detection experiment related to the comparative example, the detected pressure value fluctuated significantly each time the air cylinder device 110 operated. Furthermore, there were cases where no pressure was detected even when the air cylinder device 110 was operating. As a result, the multiple pressure values ​​detected over several trials (15 trials in this example) showed large variations exceeding a range of 10g centered around 250g (the range of the white arrows in the lower part of Figure 15).

[0122] These results confirm that the observation that the load applied to the load transmission member 130 can be detected with high accuracy during the brush pressing force adjustment process, as shown by the brush arm 41 in Figure 4, is likely correct.

[0123] 7. Control system for substrate cleaning device 1 The control system of the substrate cleaning apparatus 1 will be described along with the configuration of the control unit 900 shown in Figure 1. Figure 16 is a block diagram showing the configuration of the control system of the substrate cleaning apparatus 1 shown in Figure 1. As shown in Figure 16, the control unit 900 includes a CPU (Central Processing Unit) 901, RAM (Random Access Memory) 902, ROM (Read-Only Memory) 903, and a storage device 904.

[0124] RAM 902 is used as the working area for CPU 901. ROM 903 stores the system program. The storage device 904 includes a storage medium such as a hard disk or semiconductor memory and stores a substrate cleaning program for cleaning the substrate W and a load adjustment program for adjusting the brush pressing force. Furthermore, the storage device 904 stores the set pressing force and the operating conditions of the air cylinder device 110 determined therefrom.

[0125] The substrate cleaning program and load adjustment program may be provided stored on a recording medium such as a CD-ROM 909 and installed in ROM 903 or storage device 904. Alternatively, the substrate cleaning program and load adjustment program may be distributed via a communication network from a server outside the substrate cleaning device 1 and installed in ROM 903 or storage device 904.

[0126] The CPU 901 executes a substrate cleaning program and a load adjustment program, thereby controlling the operation of each part of the substrate cleaning apparatus 1. Specifically, the control unit 900 controls the substrate holding drive unit 13. As a result, the control unit 900 changes the state of the multiple holding pins 12 from the open state to the held state, thereby holding the substrate W that is brought into the substrate cleaning apparatus 1 in the substrate holding device 10. The control unit 900 also changes the state of the multiple holding pins 12 from the held state to the released state in order to remove the substrate W from the substrate cleaning apparatus 1. Furthermore, the control unit 900 controls the substrate rotation drive unit 14. As a result, the substrate W held by the substrate holding device 10 rotates during the substrate cleaning process.

[0127] Furthermore, the control unit 900 controls the cup lifting drive unit 22. As a result, during the cleaning process of the substrate W, the cup body 21 shown in Figure 1 moves between the upper cup position and the lower cup position. The control unit 900 also controls the fluid supply system 32. As a result, during the cleaning process of the substrate W, cleaning liquid is discharged onto the substrate W from the fluid nozzle 31 shown in Figure 1.

[0128] Furthermore, the control unit 900 controls the arm horizontal drive unit 45 and the arm vertical drive unit 46. As a result, the brush arm 41 moves within the chamber CH during the cleaning process of the substrate W.

[0129] In this embodiment, each of the arm horizontal drive unit 45 and the arm lifting drive unit 46 is equipped with a motor that incorporates an encoder as a power source. The control unit 900 then acquires the X and Z positions of the brush arm 41 based on the outputs of the encoders of the arm horizontal drive unit 45 and the arm lifting drive unit 46. As a result, the control unit 900 can determine the positional relationship between the brush arm 41 and the floor surface CHB of the chamber CH. Alternatively, it can determine the positional relationship between the brush arm 41 and the substrate W held by the substrate holding device 10.

[0130] Furthermore, the control unit 900 controls the motor drive unit 520. As a result, during the cleaning process of the substrate W, the control unit 900 operates the motor 510 built into the brush arm 41, causing the brush device 80 to rotate at a predetermined rotational speed.

[0131] Furthermore, during the brush pressing force adjustment process, the control unit 900 controls the air cylinder drive unit 113 based on the set pressing force stored in the storage device 904 and the operating conditions of the air cylinder device 110. In addition, during the brush pressing force adjustment process, the control unit 900 adjusts the operating conditions of the air cylinder device 110 based on the pressing force detection result from the load sensor 310. As a result, during the cleaning process of the substrate W, the brush device 80 is pressed against each part of the upper surface of the substrate W with a predetermined set pressing force.

[0132] As shown in Figure 16, the substrate cleaning apparatus 1 further includes an operating unit 990. The operating unit 990 includes a keyboard and a pointing device and is configured to be operable by the user. By operating the operating unit 990, the user can input various information such as the set pressing force and the corresponding operating conditions of the air cylinder device 110. When various information is input, the control unit 900 stores the input information in the storage device 904.

[0133] 8. Flowchart for adjusting brush pressure Figure 17 is a flowchart of the brush pressure adjustment process. As shown in the example in Figure 2, the brush pressure adjustment process is performed after the substrate W is loaded into the chamber CH of the substrate cleaning apparatus 1, but before the cleaning process of the substrate W begins.

[0134] Here, it is assumed that the memory device 904 in Figure 16 stores an allowable range corresponding to the set pressing force. The allowable range is a predetermined width centered on the set pressing force value. For example, if the set pressing force is 250g, the allowable range is a range of 10g centered on 250g (245g or more and 255g or less).

[0135] When the brush pressing force adjustment process is started, the control unit 900 controls the air cylinder drive unit 113 to operate the air cylinder device 110 according to preset operating conditions (step S21).

[0136] Next, the control unit 900 detects the pressing force (load) applied to the load transmission member 130 based on the output signal of the load sensor 310 (step S22). Then, the control unit 900 determines whether the detection result is within an acceptable range (step S23). If the detection result is within an acceptable range, the control unit 900 terminates the process.

[0137] On the other hand, if the detection result is not within the acceptable range, the control unit 900 adjusts the pressing force by adjusting the operating conditions and controlling the air cylinder drive unit 113 so that the detection result approaches the set pressing force (step S24). The process then proceeds to step S23.

[0138] 9. Substrate processing apparatus equipped with substrate cleaning device 1 Figure 18 is a schematic plan view showing an example of a substrate processing apparatus equipped with the substrate cleaning apparatus 1 shown in Figure 1. As shown in Figure 18, the substrate processing apparatus 800 in this example has an indexer block 801 and a processing block 802. The indexer block 801 and the processing block 802 are arranged adjacent to each other.

[0139] The indexer block 801 includes multiple (four in this example) carrier mounting tables 810 and transport units 820. The multiple carrier mounting tables 810 are connected to the transport units 820 and are arranged in a row with some space between them. A carrier C that holds multiple substrates W is placed on each carrier mounting table 810.

[0140] The transport unit 820 is equipped with an indexer robot 831 and a control device 832. The indexer robot 831 includes a plurality (e.g., four) of hands and is configured to hold and transport the substrate W. The control device 832 includes a CPU and memory or a microcomputer and controls each component within the substrate processing apparatus 800.

[0141] As shown in Figure 18, the processing block 802 includes cleaning units 841, 842 and a transport unit 843. The cleaning units 841, 843, and 842 are arranged adjacent to the transport unit 820 and in this order. In each cleaning unit 841, 842, multiple (for example, four) substrate cleaning devices 1 are stacked vertically. These substrate cleaning devices 1 are the substrate cleaning devices 1 shown in Figure 1. That is, in the substrate processing apparatus 800 of Figure 18, the substrate cleaning device 1 of Figure 1 is provided as one processing unit constituting the substrate processing apparatus 800.

[0142] The transport unit 843 is equipped with a main robot 844. The main robot 844 includes multiple (for example, four) hands and is configured to hold and transport the substrate W.

[0143] Between the indexer block 801 and the processing block 802, multiple substrate mounting sections PASS are stacked vertically to facilitate the transfer of the substrate W between the indexer robot 831 and the main robot 844.

[0144] In the substrate processing apparatus 800, the indexer robot 831 takes an unprocessed substrate W from one of the carriers C placed on the carrier mounting stage 810. The indexer robot 831 then places the unprocessed substrate W onto one of the substrate mounting sections PASS. Furthermore, the indexer robot 831 receives the processed substrate W placed on one of the substrate mounting sections PASS and places it into an empty carrier C.

[0145] The main robot 844 receives multiple unprocessed substrates W placed on multiple substrate placement sections PASS. The main robot 844 then transports the multiple unprocessed substrates W to multiple substrate cleaning devices 1 in the cleaning sections 841 and 842. Furthermore, the main robot 844 unloads the multiple processed substrates W from the multiple substrate cleaning devices 1. Finally, the main robot 844 places the processed substrates W onto one of the multiple substrate placement sections PASS.

[0146] Each substrate cleaning device 1 in the cleaning units 841 and 842 cleans the upper surface of the substrate W that is brought in. In each substrate cleaning device 1, the upper surface of the substrate W is properly cleaned with a set pressing force. This suppresses the occurrence of cleaning defects on the substrate W.

[0147] 10. Effects (a) In the substrate cleaning apparatus 1 described above, the air cylinder device 110 applies a pressing force to the first force transmission point P1 of the load transmission member 130, causing the load transmission member 130 to move in the -Z direction. At this time, the pressing force applied to the load transmission member 130 is transmitted to the brush device 80 through the load transmission member 130 and the brush support shaft 81. Therefore, during the cleaning process of the substrate W, the pressing force generated from the air cylinder device 110 can press the brush device 80 against the substrate W.

[0148] The load sensor 310 detects the pressing force when the second force transmission point P2 of the load transmission member 130 comes into contact with the contact member 311, and a pressing force acting on the contact member 311 in the -Z direction. Based on the pressing force detection result from the load sensor 310, the magnitude of the pressing force applied from the air cylinder device 110 to the load transmission member 130 can be adjusted.

[0149] Here, the first force transmission point P1 of the load transmission member 130, the second force transmission point P2 of the load transmission member 130, and the linear guide 200 coincide with a virtual straight line L11 extending in the X direction in a plan view. Therefore, when a downward pressing force is applied to the first force transmission point P1 of the load transmission member 130 and the first force transmission point P1 of the load transmission member 130 is in contact with the contact member 311, no moment is generated in the linear guide 200 around the virtual straight line L11.

[0150] In this case, the generation of a moment in the linear guide 200 suppresses large fluctuations in the connection state between the rail 210 of the linear guide 200 and the slider 220. Therefore, the discrepancy between the pressing force applied from the air cylinder device 110 to the first force transmission point P1 of the load transmission member 130 and the pressing force acting from the second force transmission point P2 of the load transmission member 130 to the contact member 311 is suppressed. As a result, the detection accuracy of the pressing force by the load sensor 310 is improved. Consequently, the magnitude of the pressing force applied from the air cylinder device 110 to the load transmission member 130 can be adjusted with high precision based on the detection result of the load sensor 310. As a result, the accuracy of cleaning the substrate W using the brush device 80 is improved.

[0151] (b) During the cleaning process of the substrate W, a reaction force acts on the third force transmission point P3 of the load transmission member 130 from the substrate W through the brush device 80 and the brush support shaft 81. Even in this case, the third force transmission point P3 coincides with the virtual straight line L11 in a plan view. As a result, no moment is generated in the linear guide 200 around the virtual straight line L11. Consequently, during the cleaning process of the substrate W, the force applied from the air cylinder device 110 to the load transmission member 130 can be transmitted to the brush device 80 more accurately.

[0152] (c) The linear guide 200 described above has a configuration in which the first mounting portion 240 and the second mounting portion 250 of the slider 220 are attached to the first side portion 211 and the second side portion 212 of the rail 210 via a plurality of balls BA. In this way, in the linear guide 200 that moves the slider 220 relative to the rail 210 by rolling a plurality of balls BA, pressure can be applied in advance to the plurality of rolling elements. This makes it easy to improve the accuracy of the movement of the slider 220 relative to the rail 210.

[0153] Furthermore, the linear guide 200 is fixed to the support member 140 such that the rail 210 extends in the Z direction. In this state, the first side portion 211 and the second side portion 212 of the rail 210 are aligned in the Y direction. In this case, if a force in the Y direction acts between the rail 210 and the slider body, there is a high possibility that differential slip will occur in some of the balls BA among the multiple balls BA.

[0154] However, in the brush arm 41 described above, no moment is generated in the linear guide 200 around the virtual straight line L11, that is, no moment around the axis along the X direction. Therefore, a force in the Y direction is less likely to act between the rail 210 and the slider body. As a result, fluctuations are less likely to occur in the connection state between the rail 210 and the slider 220 in the linear guide 200.

[0155] 11. Other Embodiments (a) In the substrate cleaning apparatus 1 according to the above embodiment, the brush arm 41 may have the following configuration instead of the configuration shown in Figures 4 to 7. Figure 19 is a diagram showing an example of a brush arm 41 according to another embodiment. In Figure 19, a schematic plan view of the brush arm 41 is shown in the upper section. A schematic side view of the brush arm 41 is shown in the lower section. In the plan view and side view of Figure 19, only the components necessary to explain the features of this example are shown among the multiple components in the brush arm 41.

[0156] As shown in Figure 19, in the brush arm 41 of this example, an air cylinder device 110 is provided inside and above the housing H via a bracket (not shown). In this state, the cylinder rod 112 of the air cylinder device 110 extends downward from the lower end of the air cylinder device 110.

[0157] A load transmission member 130 is provided directly below the air cylinder device 110. As shown in the lower part of Figure 19, the load transmission member 130 in this example includes a load receiving portion 131, a lifting support portion 132, and a load transfer portion 134. The load receiving portion 131 has a plate shape and is arranged parallel to the horizontal plane (a plane parallel to the X and Y directions). The load receiving portion 131 is also connected to the tip (lower end) of the cylinder rod 112 of the air cylinder device 110. The lifting support portion 132 extends downward from a part of the load receiving portion 131 by a predetermined distance. The lifting support portion 132 is connected to the housing H via a linear guide 200.

[0158] The load transfer section 134 is formed to bend in the Y direction from the lower end of the lifting support section 132. The load transfer section 134 has a plate shape and faces the lower surface of the load receiving section 131. The upper end of the brush support shaft 81 is connected to the load transfer section 134. A self-weight offsetting mechanism (not shown) is provided inside the housing H to support the brush device 80, the brush support shaft 81, and the load transmission member 130.

[0159] A load sensor 310 is provided on the side of the load transmission member 130. The contact member 311 connected to the load sensor 310 is positioned between the load receiving portion 131 and the load transfer portion 134 in the Z direction, so as to be separated from the lower surface of the load receiving portion 131 by a predetermined distance.

[0160] In the load transmission member 130 described above, the portion of the load receiving portion 131 to which the cylinder rod 112 is connected is called the first force transmission point P1. The portion of the load receiving portion 131 that faces the contact member 311 connected to the load sensor 310 in the Z direction is called the second force transmission point P2. The portion of the load transfer portion 134 to which the brush support shaft 81 is connected is called the third force transmission point P3.

[0161] When the air cylinder device 110 operates, the force generated in the cylinder rod 112 is applied as a pressing force to the first force transmission point P1 of the load transmission member 130. In this case, the pressing force applied to the first force transmission point P1 is transmitted from the third force transmission point P3 to the brush device 80 through the brush support shaft 81, while the second force transmission point P2 of the load transmission member 130 is separated from the contact member 311. On the other hand, the pressing force applied to the first force transmission point P1 acts from the second force transmission point P2 to the contact member 311, while the second force transmission point P2 of the load transmission member 130 is in contact with the contact member 311. As a result, the pressing force applied to the load transmission member 130 is detected by the load sensor 310.

[0162] In this configuration, the first force transmission point P1, the second force transmission point P2, and the third force transmission point P3, which transmit pressing force between multiple members, are located on a virtual straight line L12 passing through the axis of the brush support shaft 81. The linear guide 200 is also located on the virtual straight line L12.

[0163] In this case, when a pressing force is applied to the load transmission member 130 from the air cylinder device 110, no moment is generated in the linear guide 200. Therefore, during the brush pressing force adjustment process, there is no discrepancy between the pressing force applied to the load transmission member 130 by the air cylinder device 110 and the pressing force value detected by the load sensor 310. Also, during the cleaning process of the substrate W, there is no discrepancy between the pressing force applied to the load transmission member 130 by the air cylinder device 110 and the actual pressing force applied to the substrate W from the brush device 80.

[0164] Furthermore, as shown by the dotted line in the lower part of Figure 19, the linear guide 200 may be positioned outside the virtual straight line L12. Even in this case, almost no moment is generated in the linear guide 200. Therefore, the pressing force can be detected with high accuracy. In addition, the desired pressing force can be applied to the substrate W with high accuracy.

[0165] (b) In the brush arm 41 according to the above embodiment, the force generated in the cylinder rod 112 of the air cylinder device 110 is applied to the load transmission member 130 via the pressing mechanism 120, but the present invention is not limited thereto. As explained in the example in Figure 19, the force generated in the cylinder rod 112 of the air cylinder device 110 may be applied directly to the load transmission member 130. In this case, the pressing mechanism 120 is unnecessary, making it possible to miniaturize the brush arm 41 and reduce the number of parts of the brush arm 41.

[0166] (c) In the brush arm 41 according to the above embodiment, a bearing (so-called rolling bearing) with a plurality of balls BA is used in the linear guide 200. Furthermore, the linear guide 200 has a two-row structure in which the rail 210 has two guide grooves gr1 and gr2. However, the present invention is not limited thereto. A rolling bearing having a four-row structure in which the rail 210 has four guide grooves may also be used in the linear guide 200.

[0167] (d) In the brush arm 41 according to the above embodiment, a rolling bearing is used for the linear guide 200, but the present invention is not limited thereto. Other bearings, such as sliding bearings, may be used for the linear guide 200 instead of rolling bearings.

[0168] (e) The load transmission member 130 according to the above embodiment is composed of a single member, but the present invention is not limited thereto. The load transmission member 130 may have a configuration in which multiple members are connected to each other. Furthermore, in the brush arm 41 according to the above embodiment, the force generated in the air cylinder device 110 acts to press the first force transmission point P1 of the load transmission member 130 downward by the pressing mechanism 120, but the present invention is not limited thereto. The brush arm 41 may be configured such that the force generated in the air cylinder device 110 presses the first force transmission point P1 of the load transmission member 130 upward.

[0169] Figure 20 shows another example of a brush arm 41 according to yet another embodiment. In Figure 20, the upper section shows a schematic plan view of the brush arm 41. The lower section shows a schematic side view of the brush arm 41. In the plan view and side view of Figure 20, only the components necessary to explain the features of this example are shown from among the multiple components within the brush arm 41.

[0170] In the brush arm 41 shown in Figure 20, similar to the example of the brush arm 41 in the above embodiment, an air cylinder device 110 is provided via a cylinder base 119 at a position offset in the +Y direction from the central portion of the base member 101.

[0171] A support member 140 is further provided on the base member 101 at a position offset in the -Y direction from the air cylinder device 110. The support member 140 extends a certain length upward (in the +Z direction) from the upper surface of the base member 101.

[0172] A buoyancy-generating member 630 is attached to a support member 140 via a linear guide 200. Specifically, the linear guide 200 includes a rail 210 and a slider 220. The rail 210 is attached to the support member 140, and the slider 220 is attached to the buoyancy-generating member 630. As a result, the buoyancy-generating member 630 is supported so as to be movable in the vertical direction relative to the support member 140. In this example, the rail 210 is fixed to the support member 140 so as to extend in the Z direction. In this state, the first side portion 211 (Figure 10) and the second side portion 212 (Figure 10) of the rail 210 are aligned in the X direction.

[0173] The buoyancy-providing member 630 is a single member including a sensor support portion 631, a vertical portion 632, and a horizontal portion 633. The vertical portion 632 is the part to which the slider 220 of the linear guide 200 is attached, and extends vertically when the buoyancy-providing member 630 is attached to the support member 140. The sensor support portion 631 is formed to protrude a certain length in the -Y direction from a position near the upper end of the vertical portion 632. The horizontal portion 633 is formed to extend a certain length in the +Y direction from the upper end of the vertical portion 632. The tip of the horizontal portion 633 (the end of the horizontal portion 633 facing the +Y direction) is located in the +Y direction relative to the air cylinder device 110.

[0174] A load sensor 310 is provided below the tip of the horizontal section 633. The load sensor 310 is fixed to the base member 101 via a sensor base 320. The load sensor 310 in this example is a Roberval type load cell. The load sensor 310 detects the load received from the horizontal section 633 (the load obtained by canceling the force generated by the air cylinder device 110 from the weight of the load transmission member 600, which will be described later) when the tip of the horizontal section 633 comes into contact with the load detection portion of the load sensor 310.

[0175] A load sensor 620 is attached to the tip of the sensor support portion 631 (the end of the sensor support portion 631 facing the -Y direction). In this example, the load sensor 620 is a Roberval type load cell. A brush support member 610 is attached to the load detection portion of the load sensor 620. As a result, the load sensor 620 detects the load received from the brush support member 610.

[0176] As described above, the brush support member 610 is connected to the buoyancy-applying member 630 via the load sensor 620. In this state, the brush support member 610 is located at the brush support portion 42 of the brush arm 41.

[0177] The brush support member 610 is a single component including a main body 611, a support portion 612, and a connecting portion 613. The connecting portion 613 is attached to the load detection portion of the load sensor 620 and extends a certain length in the -Y direction from the load sensor 620. The support portion 612 extends downward from the tip of the connecting portion 613. The main body 611 is connected to the lower end of the support portion 612. In this state, the main body 611 is spaced apart from the upper surface of the base member 101.

[0178] The main body 611 in this example has a block shape with a fixed length in the X, Y, and Z directions. A bearing 614 and a motor 615 are held inside the main body 611. A portion of the brush support shaft 81, which supports the brush device 80, is inserted into the bearing 614 from below the housing H through a through hole 103 formed in the base member 101. As a result, the brush device 80 is rotatably supported on the brush support member 610 by the brush support shaft 81 and the bearing 614.

[0179] A portion of the brush support shaft 81 (the upper end of the brush device 80 in the example of Figure 20) and the rotating shaft of the motor 615, which is held by the main body portion 611 of the brush support member 610, are connected by two pulleys and a belt. The motor 615 is operated by the control of a control unit (not shown). When the motor 615 is operating, the rotational force generated by the motor 615 is transmitted from the rotating shaft of the motor 615 through the two pulleys and the belt to the brush support shaft 81, causing the brush device 80 to rotate.

[0180] In the brush arm 41 of Figure 20, the brush support member 610, load sensor 620, and buoyancy-granting member 630 can be handled integrally, as shown by the thick dashed-dotted frame in the lower part of Figure 20. Therefore, in the brush arm 41 of Figure 20, the configuration including the brush support member 610, load sensor 620, and buoyancy-granting member 630 can be considered as the load transmission member 600 corresponding to the load transmission member 130 according to the above embodiment.

[0181] According to the above configuration, the load transmitted from the load transmission member 600 to the brush device 80 is adjusted by the air cylinder device 110 pressing a portion of the load transmission member 600 upward. For example, if the air cylinder device 110 presses the load transmission member 600 with a force equivalent to the weight of the load transmission member 600, the pressing force of the brush device 80 against the substrate W can be made approximately zero. On the other hand, if the air cylinder device 110 does not press the load transmission member 600, the pressing force of the brush device 80 against the substrate W becomes approximately equal to the weight of the load transmission member 600. The load detection results from the load sensors 310 and 620 are used to adjust the pressing force of the brush device 80 in this way.

[0182] In the brush arm 41 of Figure 20, the portion of the buoyancy-granting member 630 that is in contact with the cylinder rod 112 of the air cylinder device 110 corresponds to the first force transmission point P1 according to the above embodiment. Furthermore, the portion of the buoyancy-granting member 630 that is in contact with the load sensor 310 corresponds to the second force transmission point P2 according to the above embodiment. In addition, the portion of the brush support member 610 to which the brush support shaft 81 is connected via the bearing 614 corresponds to the third force transmission point P3 according to the above embodiment.

[0183] Therefore, even in the example shown in Figure 20, if a force in the Z direction acts on any of the first force transmission point P1, the second force transmission point P2, or the third force transmission point P3, a rotational moment may be generated in the linear guide 200 due to the force acting on any of these points.

[0184] In this regard, as shown in the upper part of Figure 20, in the brush arm 41 of this example, the first force transmission point P1, the second force transmission point P2, and the linear guide 200 are arranged so as to coincide with a virtual straight line L13 extending in the Y direction in a plan view.

[0185] According to this positional relationship, whether the first force transmission point P1 of the load transmission member 130 contacts the cylinder rod 112 of the air cylinder device 110, or the second force transmission point P2 of the load transmission member 130 contacts the contact member 311 of the load sensor 310, no rotational moment about an axis parallel to the virtual straight line L13 is generated in the linear guide 200. Therefore, the magnitude of the pressing force applied from the air cylinder device 110 to the load transmission member 600 can be precisely adjusted based on the detection result of the load sensor 310.

[0186] Furthermore, in this example as well, the third force transmission point P3 coincides with a virtual straight line L13 extending in the Y direction in a plan view. Due to this positional relationship, no rotational moment is generated in the linear guide 200 about an axis parallel to the virtual straight line L13 during the cleaning process of the substrate W. As a result, it becomes possible to transmit the force applied from the air cylinder device 110 to the load transmission member 130 to the brush device 80 more accurately during the cleaning process of the substrate W.

[0187] (f) In the brush arm 41 according to the above embodiment, the brush support shaft 81 is connected to the load transmission member 130 via the upper bearing portion 420, but the present invention is not limited thereto. The brush support shaft 81 and the load transmission member 130 may be provided so as to be separable from each other. That is, the load transmission member 130 may contact the upper end of the brush support shaft 81 only when it receives a load from the air cylinder device 110, and transmit a pressing force to the brush support shaft 81.

[0188] (g) The brush device 80 according to the above embodiment is supported on the brush support shaft 81 so as to be able to rotate, but the present invention is not limited thereto. The brush device 80 may be supported on the brush support shaft 81 so as not to rotate. In this case, it is not necessary to provide a motor 510 or the like inside the brush arm 41. Therefore, it becomes possible to miniaturize the brush arm 41 and reduce the number of parts of the brush arm 41.

[0189] (h) In the substrate cleaning apparatus 1 according to the above embodiment, the substrate holding device 10 has a so-called mechanical chuck configuration in which a plurality of holding pins 12 contact the outer peripheral edge of the substrate W to hold the substrate W, but the present invention is not limited thereto. The substrate holding device 10 may also have a suction configuration in which the central part of the lower surface of the substrate W is held by suction.

[0190] 12. Correspondence between each component of the claim and each part of the embodiment The following describes examples of the correspondence between each component of the claims and each element of the embodiments, but the present invention is not limited to the following examples. Various other elements having the configuration or function described in the claims can also be used as each component of the claims.

[0191] In the above embodiment, the brush device 80 is an example of a cleaning tool, the first force transmission point P1 of the load transmission member 130 is an example of a first part of a force transmission body, the second force transmission point P2 of the load transmission member 130 is an example of a second part of a force transmission body, the load transmission member 130 is an example of a force transmission body, the -Z direction is an example of a first direction, and the +Z direction is an example of a second direction.

[0192] Furthermore, the linear guide 200 is an example of a linear guide, the air cylinder device 110 and the pressing mechanism 120 are examples of force application parts, the contact member 311 is an example of a contact part, the load sensor 310 is an example of a force detection part, the virtual straight lines L11 and L13 are examples of virtual straight lines, and the substrate cleaning device 1 and the substrate processing device 800 are examples of substrate processing devices.

[0193] Furthermore, the lower end of the brush support shaft 81 is an example of the first end of the support shaft, the upper end of the brush support shaft 81 is an example of the second end of the support shaft, the brush support shaft 81 is an example of the support shaft, the third force transmission point P3 of the load transmission member 130 is an example of the third part of the force transmission body, the base member 101 is an example of the base member, the lower bearing portion 410, the upper bearing portion 420, the self-weight cancellation mechanism 490 and the pulley 521 are examples of the shaft support mechanism, and the coil spring of the self-weight cancellation mechanism 490 is an example of the self-weight cancellation member.

[0194] Furthermore, multiple balls BA are examples of multiple rolling elements, the first side portion 211 of rail 210 is an example of the first side portion of rail, the second side portion 212 of rail 210 is an example of the second side portion of rail, rail 210 is an example of rail, the first mounting portion 240 of slider body is an example of the first mounting portion of slider, and the second mounting portion 250 of slider body is an example of the second mounting portion of slider.

[0195] Furthermore, slider 220 is an example of a slider, the two guide grooves gr1 and gr2 of rail 210 are examples of guide grooves formed on the first and second sides of the rail, and the Y direction shown in Figures 4 to 7 and the X direction shown in Figure 20 are examples of a third direction.

[0196] 13. Summary of Embodiments (Paragraph 1) The substrate processing apparatus relating to Paragraph 1 is: A cleaning tool for cleaning circuit boards, A force transmission body having a first part and a second part, A linear guide supports the force transmission body so as to be movable in a first direction and a second direction opposite to the first direction, A force-applying unit that applies a force in the first direction or a force in the second direction to the first portion of the force transmission body, The device comprises a contact portion that can contact the second portion, and a force detection unit that detects a force acting from the second portion to the contact portion in the first direction, The force transmission body is capable of transmitting the force applied from the force application unit to the first part to the cleaning tool. The first portion, the second portion, and the linear guide overlap with a virtual straight line that intersects the first and second directions when viewed in the first direction.

[0197] In this substrate processing apparatus, the force application unit applies force to a first portion of the force transmission body, causing the force transmission body to move in a first or second direction via a linear guide. Alternatively, the force transmission body is maintained stationary in either the first or second direction. At this time, the force applied from the force application unit to the force transmission body is transmitted to the cleaning tool. Therefore, the substrate can be cleaned while the cleaning tool is pressed against the substrate with a force corresponding to the force generated from the force application unit.

[0198] The force detection unit detects a force acting in a first direction on the contact point when the second part of the force transmission body comes into contact with the contact point. Therefore, when the second part of the force transmission body comes into contact with the contact point while a force is applied to the force transmission body from the force application unit, the force detection unit detects a force corresponding to the force applied to the force transmission body from the force application unit. This allows the magnitude of the force applied to the force transmission body from the force application unit to be adjusted based on the detection result of the force detection unit.

[0199] Here, the first part, the second part, and the linear guide coincide with a virtual straight line that intersects the first and second directions when viewed in the first direction. Therefore, when a force is applied from the force application unit to the first part of the force transmission body and the second part of the force transmission body is in contact with the contact part, no moment is generated in the linear guide about the virtual straight line. Consequently, the discrepancy between the force applied from the force application unit to the first part and the force acting from the second part on the contact part, which would otherwise be caused by a moment generated in the linear guide about the virtual straight line, is suppressed. This improves the accuracy of force detection by the force detection unit. Based on the detection result of the force detection unit, the magnitude of the force applied from the force application unit to the force transmission body can be adjusted with high precision. As a result, the accuracy of cleaning the substrate using the cleaning tool is improved.

[0200] (Paragraph 2) In the substrate processing apparatus described in Paragraph 1, The substrate processing apparatus is Having a first end and a second end, extending in the first and second directions, and further comprising a support shaft at the first end for supporting the cleaning tool, The force transmission body further has a third portion connected to the second end of the support shaft, The third portion may overlap the virtual line when viewed in the first direction.

[0201] According to the above configuration, the third part of the force transmission body is connected to the cleaning tool via a support shaft. When force is applied from the force application unit to the first part of the force transmission body, the force applied to the first part acts on the cleaning tool through the support shaft from the third part. Therefore, the substrate can be cleaned while the cleaning tool is pressed against the substrate with a force corresponding to the force generated from the force application unit.

[0202] During the cleaning of the substrate described above, a reaction force acts on the third part through the cleaning tool and support shaft from the substrate. Even in this case, the third part coincides with a virtual straight line when viewed in the first direction. As a result, no moment is generated in the linear guide around the virtual straight line. Consequently, during substrate cleaning, it becomes possible to accurately transmit the force applied from the force application part to the force transmission part to the cleaning tool.

[0203] (3) In the substrate processing apparatus described in paragraph 2, The substrate processing apparatus is A base member that supports the linear guide, The system further comprises a shaft support mechanism that supports the support shaft on the base member so that it can move in the first direction and the second direction, The force-applying unit applies a force in the first direction to the first portion of the force transmission body. The first direction is the direction from top to bottom. The second direction mentioned above is the direction from bottom to top. The shaft support mechanism may include a self-weight-countering member that applies an upward force to the support shaft.

[0204] In this case, with the force-applying unit not applying force to the first part of the force-transmitting body, no force is transmitted from the force-applying unit to the support shaft and the cleaning tool. As a result, the support shaft and the cleaning tool are supported at a specific height position on the base member by the self-weight-countering member.

[0205] Meanwhile, when the force application unit applies force to the first part of the force transmission unit, the force from the force application unit is transmitted to the support shaft and the cleaning tool. As a result, the support shaft and the cleaning tool move in the vertical direction. At this time, the substrate is cleaned when the cleaning tool comes into contact with it. If the cleaning tool does not come into contact with the substrate, the second part of the force transmission unit comes into contact with the contact part of the force detection unit, and the force acting on the contact part is detected.

[0206] (Article 4) In the substrate processing apparatus described in any one of paragraphs 1 to 3, At least two of the first portion, the second portion, and the linear guide may overlap when viewed in the first direction.

[0207] In this case, the moment generated in the linear guide can be reduced within a single virtual plane that includes a virtual straight line and extends in both the first and second directions. In this case, the discrepancy between the force applied from the force application part to the first part and the force acting from the second part to the contact part is further suppressed.

[0208] (Article 5) In the substrate processing apparatus described in any one of paragraphs 1 to 4, The linear guide is Multiple rolling elements, A rail having a first side and a second side facing opposite directions, extending in a straight line, A slider having a first mounting portion and a second mounting portion corresponding to the first side portion and the second side portion, respectively. Each of the first and second sides of the rail has a guide groove formed to allow each of the plurality of rolling elements to move in the direction in which the rail extends. The slider is configured to be movable along the rail by having the first mounting portion attached to the first side of the rail via a portion of the plurality of rolling elements, and the second mounting portion attached to the second side of the rail via another portion of the plurality of rolling elements. The force transmission body is attached to the slider, The rail may be fixed in such a state that it extends in the first direction and the second direction, and that the first side and the second side are aligned in a third direction intersecting the first direction, the second direction, and the imaginary straight line.

[0209] With the above configuration, no moment acts between the first side and the multiple rolling elements and slider in other virtual planes intersecting the virtual straight line. Also, no moment acts between the second side and the multiple rolling elements and slider in other virtual planes. As a result, fluctuations in the connection state between the rail and the slider in the linear guide are less likely to occur.

[0210] Furthermore, with the linear guide described above, the accuracy of the slider's movement relative to the rail can be easily improved by applying pressure to multiple rolling elements in advance. [Explanation of Symbols]

[0211] 1...Substrate cleaning device, 10...Substrate holding device, 11...Spin base, 12...Holding pin, 13...Substrate holding drive unit, 14...Substrate rotation drive unit, 20...Cup device, 21...Cup body, 22...Cup lifting drive unit, 30...Nozzle device, 31...Fluid nozzle, 32...Fluid supply system, 40...Brush arm device, 41, 41X...Brush arm, 42...Brush support unit, 43...Guide rail, 44...Arm support unit, 45...Arm horizontal drive unit, 46...Arm lifting drive unit, 71...Standby pod, 72...Brush cleaning device, 80...Brush device, 81...Brush support shaft, 101...Base member, 102 ...Cover member, 103...Through hole, 110...Air cylinder device, 111...Cylinder body, 112...Cylinder rod, 113...Air cylinder drive unit, 119...Cylinder base, 120...Pressing mechanism, 121, 140...Support column member, 122...Beam member, 122a...First end, 122b...Second end, 123...Connecting shaft, 130, 600...Load transmission member, 131...Load receiving part, 132...Lifting support part, 133...Supported piece, 134...Load transfer part, 200...Linear guide, 210...Rail, 211...First side, 212...Second side, 220...Slider, 230...Rail overlap Part, 240...First mounting part, 250...Second mounting part, 260, 270...End cap, 310, 620...Load sensor, 311...Contact member, 320...Sensor base, 410...Lower bearing part, 420...Upper bearing part, 490...Self-weight countermeasure mechanism, 510, 615...Motor, 511...Motor fixing piece, 520...Motor drive unit, 521, 522...Pulley, 523...Belt, 610...Brush support member, 611...Main body part, 612...Support part, 613...Connecting part, 614...Bearing, 630...Buoyancy-granting member, 631...Sensor support part, 632...Vertical part, 633...Horizontal part, 800...Substrate processing device, 801…Indexer block, 802…Processing block, 810…Carrier mounting platform, 820, 843…Transportation unit, 831…Indexer robot, 832…Control device, 841, 842…Washing unit, 844…Main robot, 900…Control unit, 901…CPU, 902…RAM, 903…ROM, 904…Storage device, 909…CD-ROM, 990…Operation unit, BA…Ball, C…Carrier, CH…Chamber, CHB…Floor surface, H…Housing, L1, L11, L12, L13…Virtual line, M1…First moment, M2…Second moment, M3…Third moment,P1...First force transmission point, P2...Second force transmission point, P3...Third force transmission point, PASS...Substrate mounting area, SC...Center of rotation, SP...Standby position, W...Substrate, a1, a2...Arrows, bp1, bp2...Through holes, d1...Distance, gr1, gr2, gr3, gr4...Guide grooves

Claims

1. A cleaning tool for cleaning circuit boards, A force transmission body having a first part and a second part, A linear guide supports the force transmission body so as to be movable in a first direction and a second direction opposite to the first direction, A force-applying unit that applies a force in the first direction or a force in the second direction to the first portion of the force transmission body, The device comprises a contact portion that can contact the second portion, and a force detection unit that detects a force acting from the second portion to the contact portion in the first direction, The force transmission body is capable of transmitting the force applied from the force application unit to the first part to the cleaning tool. A substrate processing apparatus wherein the first part, the second part, and the linear guide overlap a virtual straight line that intersects the first direction and the second direction when viewed in the first direction.

2. Having a first end and a second end, extending in the first and second directions, and further comprising a support shaft at the first end for supporting the cleaning tool, The force transmission body further has a third portion connected to the second end of the support shaft, The substrate processing apparatus according to claim 1, wherein the third portion coincides with the virtual straight line when viewed in the first direction.

3. A base member that supports the linear guide, The system further comprises a shaft support mechanism that supports the support shaft on the base member so that it can move in the first direction and the second direction, The force-applying unit applies a force in the first direction to the first portion of the force transmission body. The first direction is the direction from top to bottom. The second direction is the direction from bottom to top. The substrate processing apparatus according to claim 2, wherein the shaft support mechanism includes a self-weight-countering member that applies an upward force to the support shaft.

4. The substrate processing apparatus according to any one of claims 1 to 3, wherein at least two of the first portion, the second portion, and the linear guide overlap when viewed in the first direction.

5. The linear guide is Multiple rolling elements, A rail having a first side and a second side facing opposite directions, extending in a straight line, A slider having a first mounting portion and a second mounting portion corresponding to the first side portion and the second side portion, respectively. Each of the first and second sides of the rail has a guide groove formed to allow each of the plurality of rolling elements to move in the direction in which the rail extends. The slider is configured to be movable along the rail by having the first mounting portion attached to the first side of the rail via a portion of the plurality of rolling elements, and the second mounting portion attached to the second side of the rail via another portion of the plurality of rolling elements. The force transmission body is attached to the slider, The substrate processing apparatus according to any one of claims 1 to 3, wherein the rail is fixed in such a state that it extends in the first direction and the second direction, and the first side portion and the second side portion are aligned in the first direction, the second direction and a third direction intersecting the virtual straight line.

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