Carbon dioxide capture system

Abstract

This invention provides a carbon dioxide capture system that reduces installation space and increases the flexibility of equipment capacity. [Solution] The carbon dioxide recovery system 10 includes a processing tower 11 configured to separate and recover carbon dioxide from a carbon dioxide-containing gas supplied from an external source. The processing tower 11 includes a cartridge-type carbon dioxide absorber 21 that can absorb carbon dioxide contained in a gas into a carbon dioxide absorption solution by bringing the carbon dioxide-containing gas supplied from an external source into gas-liquid contact with the carbon dioxide-absorbing solution supplied from an external source, and a cartridge-type carbon dioxide diffuser 22 that can release carbon dioxide from the carbon dioxide-absorbing solution that has absorbed the carbon dioxide supplied from an external source. The carbon dioxide absorber 21 and the carbon dioxide diffuser 22 are arranged side by side in the vertical direction.

Description

Technical Field

[0001] The present invention relates to a carbon dioxide recovery system.

Background Art

[0002] Conventionally, as disclosed in Patent Document 1 and Patent Document 2, a carbon dioxide recovery system for separating and recovering carbon dioxide from a gas generated in a gas source such as combustion equipment is known. The carbon dioxide recovery systems disclosed in these patent documents include a carbon dioxide absorption tower that absorbs carbon dioxide contained in the gas into a carbon dioxide absorption solution, and a carbon dioxide emission tower (sometimes referred to as a carbon dioxide regeneration tower) that emits (releases) carbon dioxide from the carbon dioxide absorption solution. The carbon dioxide recovery system is configured such that the gas generated in the gas source is fed to the carbon dioxide absorption tower, and the carbon dioxide absorption solution circulates between the carbon dioxide absorption tower and the carbon dioxide emission tower.

[0003] In order to enhance the carbon dioxide absorption capacity in the carbon dioxide absorption tower and the carbon dioxide emission capacity in the carbon dioxide emission tower, it is necessary to increase the size of the carbon dioxide absorption tower. For this reason, the area required for installing the carbon dioxide absorption tower and the carbon dioxide emission tower becomes large. Also, in a conventional carbon dioxide recovery system, it is difficult to change the carbon dioxide absorption capacity in the carbon dioxide absorption tower or the carbon dioxide emission capacity in the carbon dioxide emission tower. Therefore, when the gas flow rate is low relative to the carbon dioxide absorption capacity in the carbon dioxide absorption tower or the carbon dioxide emission capacity in the carbon dioxide emission tower, the energy efficiency becomes low.

Prior Art Documents

Patent Documents

[0004]

Patent Document 1

Patent Document 2

Summary of the Invention

[0005] (Problems that the invention aims to solve) In view of the above circumstances, one of the objectives of the present invention is to provide a carbon dioxide capture system that is easy to improve energy efficiency and does not require a large installation area even if the processing capacity is increased. In other words, to provide a carbon dioxide capture system that can be miniaturized.

[0006] (Means for solving the problem) The carbon dioxide capture system related to this disclosure is A carbon dioxide absorber configured to absorb carbon dioxide contained in a gas by bringing a gas containing carbon dioxide introduced from an external source into a gas-liquid contact with a carbon dioxide absorption solution introduced from an external source, A carbon dioxide diffuser configured to release carbon dioxide from an externally introduced carbon dioxide absorption solution by bringing the introduced carbon dioxide absorption solution into gas-liquid contact with steam introduced from the outside, The system is equipped with such a mechanism, in which either the carbon dioxide absorber or the carbon dioxide emitter is cartridge-shaped, and multiple cartridge-shaped carbon dioxide absorbers or multiple cartridge-shaped carbon dioxide emitters are stacked vertically.

[0007] According to the carbon dioxide capture system described herein, a single device having the function of a conventional carbon dioxide absorption tower is formed by stacking cartridge-type carbon dioxide absorption towers vertically. Alternatively, a single device having the function of a conventional carbon dioxide emission tower is formed by stacking cartridge-type carbon dioxide emission towers vertically. Furthermore, if the processing tower is formed by stacking cartridge-type carbon dioxide absorbers or cartridge-type carbon dioxide emission units vertically, the appropriate processing capacity can be provided to the single device by increasing or decreasing the number of carbon dioxide absorbers or carbon dioxide emission units. Also, if the single device is formed by stacking cartridge-type carbon dioxide absorbers or cartridge-type carbon dioxide emission units, the appropriate processing capacity can be provided to the single device by increasing or decreasing the number of carbon dioxide absorbers or carbon dioxide emission units. Therefore, according to this disclosure, it is possible to provide a carbon dioxide capture system that can improve energy efficiency and can increase processing capacity without increasing the installation area. [Brief explanation of the drawing]

[0008] [Figure 1A] Figure 1A is a perspective view showing the configuration of the processing tower. [Figure 1B] Figure 1B is a side view showing the configuration of the processing tower. [Figure 2] Figure 2 is a perspective view showing the configuration of a carbon dioxide absorber. [Figure 3] Figure 3 is a schematic cross-sectional view showing the configuration of a carbon dioxide absorber. [Figure 4] Figure 4 is a perspective view showing an example of the configuration of the first distribution member. [Figure 5] Figure 5 is a schematic cross-sectional view showing the configuration of a carbon dioxide emitter. [Figure 6] Figure 6 is a schematic diagram showing an example of the interrelationships between the various components of the processing tower and an example of the configuration of the carbon dioxide capture system. [Figure 7]Figure 7 is a schematic diagram showing other examples of the interrelationships of the components in the processing tower, and other examples of the configuration of the carbon dioxide capture system. [Modes for carrying out the invention]

[0009] Embodiments of the present invention will be described below. In the following description, "carbon dioxide capture system" will be abbreviated as "capture system," and "carbon dioxide absorption solution" will be abbreviated as "solution." The gas that is the target of carbon dioxide capture by the capture system (i.e., a gas containing carbon dioxide) will be referred to as the "target gas," and the source of the target gas will be referred to as the "target gas source." Applicable target gas sources include metal melting furnaces and carburizing furnaces that utilize the combustion heat of fossil fuels (i.e., use fossil fuels as fuel). In this case, the combustion exhaust gas of fossil fuels is the target gas. Applicable solutions include aqueous amine solutions.

[0010] Figures 1A and 1B show the configuration of the main parts of the processing tower 11 applied to the recovery system 10 according to this embodiment. Figure 1A is a perspective view of the main parts of the processing tower 11, and Figure 1B is a side view of the main parts of the processing tower 11. In each figure, the upper side of the processing tower 11 is indicated by the arrow Up, and the lower side is indicated by the arrow Dw.

[0011] The processing tower 11 is a device that combines the functions of a carbon dioxide absorption tower and a carbon dioxide emission tower in a conventional carbon dioxide capture system. As shown in Figures 1A and 1B, the processing tower 11 comprises an outer frame 20, a predetermined number of carbon dioxide absorbers 21, a predetermined number of carbon dioxide emitters 22, a first heat exchanger 23, and a second heat exchanger 24. In the following description, carbon dioxide absorbers 21 will be abbreviated as "absorber 21" and carbon dioxide emitters 22 will be abbreviated as "emissioner 22". The absorber 21 is a device that has the function equivalent to a carbon dioxide absorption tower in a conventional carbon dioxide capture system. The emissioner 22 is a device that has the function equivalent to a carbon dioxide emission tower in a conventional carbon dioxide capture system.

[0012] The absorber 21, the diffuser 22, the first heat exchanger 23, and the second heat exchanger 24 are cartridge-type (modularized) components. The absorber 21, the diffuser 22, the first heat exchanger 23, and the second heat exchanger 24 are stacked vertically (or can be arranged in series vertically) and supported by the outer frame 20. In this embodiment, the processing tower 11 is shown to have two absorbers 21, one first heat exchanger 23, one diffuser 22, and one second heat exchanger 24, but the number of these components is not limited. Since the absorber 21, the diffuser 22, the first heat exchanger 23, and the second heat exchanger 24 are cartridge-type, they can be attached to and detached from the processing tower 11. By attaching and detaching them, the number of these components can be increased or decreased.

[0013] The outer frame 20 comprises an outer frame foundation 201, one outer frame shaft 202, multiple outer frame support columns 203, and an outer frame upper beam 204. The outer frame foundation 201 is a member attached to the location where the processing tower 11 is installed (such as a foundation or floor surface), and is a member having a roughly circular disc shape. The outer frame shaft 202 and the outer frame support columns 203 are both cylindrical or cylindrical members and are fixed (erected) to the outer frame foundation 201 so as to extend upward from the outer frame foundation 201. The outer frame shaft 202 is positioned approximately at the center of the outer frame foundation 201 when viewed from above. The multiple outer frame support columns 203 are arranged at roughly equal intervals in the circumferential direction on a circle with the axis of the outer frame shaft 202 as the center when viewed from above. The number of outer frame support columns 203 is not particularly limited. The upper outer frame beam 204 is a member configured to connect the upper end of one outer frame shaft 202 and the upper ends of multiple outer frame support columns 203 to each other.

[0014] In the following explanation, unless otherwise specified, the "center" of the processing tower 11 and each component and piece of equipment of the processing tower 11 refers to the axis of the outer frame axis 202 (the center of the outer frame axis 202 when viewed in the vertical direction, which is a hypothetical straight line approximately parallel to the vertical direction). Similarly, unless otherwise specified, the "radial direction," "inner circumference," and "outer circumference" of the processing tower 11 and each component and piece of equipment of the processing tower 11 refer to the "radial direction," "inner circumference," and "outer circumference," respectively, of a circle centered on the axis of the outer frame axis 202 when viewed in the vertical direction.

[0015] Figure 2 is a perspective view showing the configuration of the absorber 21. Figure 3 is a schematic cross-sectional view showing the configuration of the absorber 21. The absorber 21 is configured to absorb carbon dioxide contained in the target gas into the solution by bringing the target gas and the solution into gas-liquid contact. As shown in Figures 2 and 3, the absorber 21 comprises a cartridge frame 30, a rotating container 31, a rotating body 32, a rotating power source 33, a first liquid introduction path 34, a second liquid introduction path 35, a liquid outlet path 36, a first gas introduction path 27, a second gas introduction path 38, and a gas outlet path 39.

[0016] The cartridge frame 30 is a member (structure) that supports the rotating body container 31, which will be described later, and also rotatably supports the rotating body 32, which will be described later. The cartridge frame 30 comprises a cartridge shaft 301, an upper cartridge plate portion 302, a lower cartridge plate portion 303, and a predetermined number of cartridge support columns 304.

[0017] The cartridge shaft 301 is a substantially cylindrical member (or a hollow shaft-shaped member), and is configured such that the outer frame shaft 202 of the outer frame 20 can be inserted through its inner circumference. The cartridge shaft 301 is arranged with its axial direction substantially parallel to the vertical direction. The cartridge upper plate portion 302 and the cartridge lower plate portion 303 are both substantially disc-shaped members provided with through-holes through which the outer frame shaft 202 can be inserted at their central portions when viewed in the vertical direction. The cartridge upper plate portion 302 and the cartridge lower plate portion 303 are arranged with their thickness directions substantially parallel to the vertical direction and spaced apart from each other in the vertical direction. The upper end portion of the cartridge shaft 301 is inserted into the through-hole of the cartridge upper plate portion 302, and the lower end portion of the cartridge shaft 301 is inserted into the through-hole of the cartridge lower plate portion 303. The cartridge upper plate portion 302 and the cartridge lower plate portion 303 are fixed (fastened) to the cartridge shaft 301. A predetermined number of cartridge support columns 304 are substantially rod-shaped members. The upper end portion of each cartridge support column 304 is fixed (fastened) to the outer peripheral edge portion of the cartridge upper plate portion 302 or its vicinity, and the lower end portion of each cartridge support column 304 is fixed (fastened) to the outer peripheral edge portion of the cartridge lower plate portion 303 or its vicinity. The number of the cartridge support columns 304 is not particularly limited.

[0018] Note that the outer diameters of the cartridge upper plate portion 302 and the cartridge lower plate portion 303 are substantially the same. Also, the upper surface of the cartridge upper plate portion 302 and the lower surface of the cartridge lower plate portion 303 are substantially flat. Therefore, the cartridge frames 30 can be arranged to be stacked coaxially with each other in the vertical direction.

[0019] The rotating body container 31 is a member (structure) fixed to the cartridge frame 30, and is configured to accommodate the gas-liquid contact portion 322 of the rotating body 32 described later. The rotating body container 31 has a substantially cylindrical shape (or a disc shape with a certain thickness), and its axis is arranged with its direction substantially parallel to the vertical direction. A space is provided inside the rotating body 32, and openings (through-holes) are provided at the central portions of the upper and lower surfaces.

[0020] The rotating container 31 comprises a container top plate portion 311, a container bottom plate portion 312, and a container side plate portion 313. The container top plate portion 311 is a substantially disc-shaped member with a substantially circular through hole (opening) in the center. The container top plate portion 311 is positioned between the cartridge upper plate portion 302 and the cartridge lower plate portion 303 of the cartridge frame 30, and is coaxial with the cartridge shaft 301, close to the cartridge upper plate portion 302. The container bottom plate portion 312 has a substantially disc shape with a substantially circular through hole (opening) in the center. The container bottom plate portion 312 also has a tray-like structure and is configured to store solution on its upper side. The container bottom plate portion 312 is positioned below the container top plate portion 311 and directly above the cartridge lower plate portion 303, coaxial with the cartridge shaft 301. The outer periphery of the container top plate 311 and the container bottom plate 312 are fixed to the cartridge support column 304 (i.e., fixed to the cartridge frame 30). The through holes provided in the container top plate 311 and the container bottom plate 312 are configured to allow the rotation shaft 321 of the rotating body 32, which will be described later, to pass through.

[0021] The container side plate portion 313 is a substantially cylindrical member (it can also be described as a substantially annular member). The container side plate portion 313 is positioned between the container top plate portion 311 and the container bottom plate portion 312. Furthermore, the container side plate portion 313 is coaxial with the cartridge shaft 301 and is positioned along the outer peripheral edges of the container top plate portion 311 and the container bottom plate portion 312. The upper edge of the container side plate portion 313 and the container top plate portion 311 are in contact without any gaps to prevent fluid from passing between them. Similarly, the lower edge of the container side plate portion 313 and the container bottom plate portion 312 are in contact without any gaps to prevent fluid from passing between them.

[0022] The rotating body 32 is a component that is rotatably supported with respect to the cartridge frame 30. The rotating body 32 comprises a rotating shaft 321 and a gas-liquid contact portion 322 that rotates integrally with the rotating shaft 321.

[0023] The rotating shaft 321 is a substantially cylindrical portion, rotatably positioned relative to the cartridge frame 30 with its axial direction substantially parallel to the vertical direction. Specifically, the cartridge shaft 301 is inserted through the inner circumference of the rotating shaft 321. A radial bearing is positioned between the rotating shaft 321 and the cartridge shaft 301, and a thrust bearing is positioned between the lower end of the rotating shaft 321 and the cartridge lower plate portion 303 of the cartridge frame 30. A pulley 323 is provided near the upper end of the rotating shaft 321 to receive rotational power from the rotational power source 33.

[0024] The gas-liquid contact section 322 is configured to absorb carbon dioxide contained in the target gas into the solution by bringing the target gas and the solution into gas-liquid contact. The gas-liquid contact section 322 has a roughly cylindrical shape (or can be described as a disc shape with a certain thickness) and is arranged with its axial direction substantially parallel to the vertical direction. The gas-liquid contact section 322 is provided with a plurality of annular reaction chambers 402, 403. The plurality of annular reaction chambers 402, 403 are arranged so as to be aligned in the radial direction of a circle centered on the axis of the rotation axis 321 when viewed from above (can also be described as being provided coaxially). In this embodiment, a configuration in which two reaction chambers 402, 403 are provided in the gas-liquid contact section 322 is shown. In the following description, the reaction chamber 402 on the side closer to the rotation axis 321 may be referred to as the first reaction chamber 402, and the reaction chamber 403 located on its outer circumference may be referred to as the second reaction chamber 403 to distinguish them.

[0025] The gas-liquid contact section 322 comprises a reaction chamber upper plate section 404, a reaction chamber lower plate section 405, a reaction chamber periphery plate section 406, a reaction chamber outer periphery plate section 407, and a reaction chamber partition plate section 408. The reaction chamber upper plate section 404 and the reaction chamber lower plate section 405 have a substantially circular flat plate structure and are arranged spaced apart from each other in the vertical direction with their thickness direction substantially parallel to the vertical direction. Through holes are provided at the center of the reaction chamber upper plate section 404 and the reaction chamber lower plate section 405 when viewed in the vertical direction, into which a rotating shaft 321 can be inserted. The rotating shaft 321 is inserted into these through holes, and the reaction chamber upper plate section 404 and the reaction chamber lower plate section 405 are fixed to the rotating shaft 321 so as to rotate integrally with the rotating shaft 321.

[0026] The reaction chamber perimeter plate portion 406, the reaction chamber partition plate portion 408, and the reaction chamber outer perimeter plate portion 407 are members having a substantially cylindrical shape with different diameters from each other. They are arranged coaxially with respect to the rotation axis 321, in the order of reaction chamber perimeter plate portion 406, reaction chamber partition plate portion 408, and reaction chamber outer perimeter plate portion 407, starting from the side closest to the rotation axis 321. The upper ends (upper sides) of the reaction chamber perimeter plate portion 406, the reaction chamber partition plate portion 408, and the reaction chamber outer perimeter plate portion 407 are all joined to the reaction chamber upper plate portion 404, and the lower ends (lower sides) of all are joined to the reaction chamber lower plate portion 405. The space between the reaction chamber perimeter plate portion 406 and the reaction chamber partition plate portion 408 is the first reaction chamber 402, and the space between the reaction chamber partition plate portion 408 and the reaction chamber outer perimeter plate portion 407 is the second reaction chamber 403.

[0027] The first reaction chamber 402 is provided with a first distribution member 409 and a first spacer 410, and the second reaction chamber 403 is provided with a second distribution member 411 and a second spacer 412. The first distribution member 409 and the second distribution member 411 are substantially annular members and are configured to disperse the solution in the circumferential and vertical directions (details will be described later). The first spacer 410 and the second spacer 412 are both substantially cylindrical members and are configured to allow the solution to pass through in the radial direction. For example, the first spacer 410 and the second spacer 412 are made of perforated metal or wire mesh.

[0028] Figure 4 is a perspective view showing the configuration of the first distribution member 409. The second distribution member 411 differs in dimensions from the first distribution member 409, but has substantially the same configuration. The first distribution member 409 and the second distribution member 411 each comprise an outer perimeter plate 431, a plurality of partition plates 432, and a plurality of guide plates 433. The outer perimeter plate 431 is a substantially cylindrical member. The plurality of partition plates 432 are arranged on the inner perimeter side of the outer perimeter plate 431 at substantially equal intervals in the circumferential direction. The plurality of partition plates 432 are substantially flat members and extend from the inner circumferential surface of the outer perimeter plate 431 toward the center. The plurality of partition plates 432 are arranged in a direction that extends in the vertical and radial directions. The guide plates 433 are provided between adjacent partition plates 432 in the circumferential direction. The guide plates 433 are arranged in a direction that extends substantially perpendicular to the vertical direction. Each guide plate 433 is positioned at various locations in the vertical direction. As shown in Figure 4, the vertical positions of at least adjacent guide plates 433 in the circumferential direction are different from each other. Furthermore, the outer peripheral plate 431 is provided with radially penetrating path holes 434 located directly above each guide plate 433.

[0029] The first distribution member 409 is positioned on the outer circumference of the reaction chamber periphery plate portion 406 so as to be coaxial with and in contact with the reaction chamber periphery plate portion 406. The first spacer 410 is provided coaxially with the reaction chamber periphery plate portion 408 at a position spaced inward from the reaction chamber periphery plate portion 408 (but close to the reaction chamber periphery plate portion 408) so as to form an annular space along the inner circumference of the reaction chamber periphery plate portion 408. The second distribution member 411 is positioned on the outer circumference of the reaction chamber periphery plate portion 408 so as to be coaxial with and in contact with the reaction chamber periphery plate portion 408. The second spacer 412 is provided coaxially with the reaction chamber periphery plate portion 407 at a position spaced inward from the reaction chamber periphery plate portion 407 (but close to the reaction chamber periphery plate portion 407) so as to form an annular space along the inner circumference of the reaction chamber periphery plate portion 407.

[0030] The reaction chamber upper plate 404 is provided with a plurality of first liquid inlet holes 420, a plurality of second liquid inlet holes 421, a plurality of first gas outlet holes 422, and a plurality of second gas outlet holes 423. The first liquid inlet holes 420, the second liquid inlet holes 421, the first gas outlet holes 422, and the second gas outlet holes 423 are all through holes that penetrate the reaction chamber upper plate 404 in the vertical direction.

[0031] Multiple first liquid inlet holes 420 are arranged on a circumference centered on the axis of the rotation shaft 321, between the reaction chamber periphery plate portion 406 and the outer periphery plate 431 of the first distribution member 409, when viewed from above. Multiple second liquid inlet holes 421 are arranged on a circumference centered on the axis of the rotation shaft 321, between the reaction chamber compartment plate portion 408 and the outer periphery plate 431 of the second distribution member 411, when viewed from above. The spaces between adjacent compartment plates 432 in the circumferential direction on the first distribution member 409 are all connected to the space above the reaction chamber upper plate portion 404 through one of the multiple first liquid inlet holes 420. Similarly, the spaces between adjacent compartment plates 432 in the circumferential direction on the second distribution member 411 are all connected to the space above the reaction chamber upper plate portion 404 through one of the multiple second liquid inlet holes 421.

[0032] The first gas outlet hole 422 is provided on the outer circumference of the first distribution member 409, in the position closest to the first distribution member 409, when viewed in the vertical direction, and is aligned on the circumference of a circle centered on the axis of the rotation shaft 321. The second gas outlet hole 423 is provided on the outer circumference of the second distribution member 411, in the position closest to the second distribution member 411, when viewed in the vertical direction, and is aligned on the circumference of a circle centered on the axis of the rotation shaft 321.

[0033] The lower plate portion 405 of the reaction chamber is provided with a predetermined number (preferably more than one) of first liquid outlet holes 425, a predetermined number of second liquid outlet holes 426, a predetermined number of first gas inlet holes 427, and a predetermined number of second gas inlet holes 428. The first liquid outlet holes 425, the second liquid outlet holes 426, the first gas inlet holes 427, and the second gas inlet holes 428 are all through holes that penetrate the lower plate portion 405 of the reaction chamber in the vertical direction. The predetermined number of first liquid outlet holes 425 are arranged on a circumference centered on the axis of the rotation shaft 321, between the reaction chamber partition plate portion 408 and the first spacer 410 when viewed in the vertical direction. The predetermined number of second liquid outlet holes 426 are arranged on a circumference centered on the axis of the rotation shaft 321, between the outer periphery plate portion 407 of the reaction chamber and the second spacer 412 when viewed in the vertical direction. The first gas inlet 427 is provided on the inner circumference side of the first spacer 410, in the position closest to the first spacer 410, in a vertical view, and is aligned on the circumference of a circle centered on the axis of the rotation shaft 321. The second gas inlet 428 is provided on the inner circumference side of the second spacer 412, in the position closest to the second spacer 412, in a vertical view, and is aligned on the circumference of a circle centered on the axis of the rotation shaft 321.

[0034] Then, a packing material 440 is filled inside the first reaction chamber 402 between the first distribution member 409 and the first spacer 410, and inside the second reaction chamber 403 between the second distribution member 411 and the second spacer 412. The packing material 440 is configured to allow a solution (liquid) to penetrate its interior and for the target gas (gas) to pass through its interior. For example, the packing material 440 may be a molded body made of porous metal or a molded body made by shaping metal wire into a predetermined shape (e.g., spherical or cylindrical).

[0035] Furthermore, the gas-liquid contact portion 322 is provided with a first lower compartment 413, a second lower compartment 414, and a third lower compartment 415. The first lower compartment 413, the second lower compartment 414, and the third lower compartment 415 are substantially cylindrical members with different diameters from each other, and are provided coaxially with the rotation axis 321 (i.e., coaxial with each other) and extending downward from the lower surface of the reaction chamber lower plate portion 405. The first lower compartment 413 is provided on the inner circumference side (closer to the rotation axis 321) of the first gas inlet hole 427. The second lower compartment 414 is provided on the outer circumference side of the first liquid outlet hole 425 and on the inner circumference side of the second gas inlet hole 428. The third lower compartment 415 is provided near the outer circumference edge of the reaction chamber lower plate portion 405 and on the outer circumference side of the second gas inlet hole 428.

[0036] When the rotating body 32 is rotatably assembled to the cartridge frame 30, the gas-liquid contact portion 322 of the rotating body 32 is housed inside the rotating body container 31. In this state, the container bottom plate portion 312 of the rotating body container 31 is located below the gas-liquid contact portion 322 of the rotating body 32. That is, the absorber 21 is configured to store the solution below the gas-liquid contact portion 322 of the rotating body 32 (the region that overlaps the gas-liquid contact portion 322 of the rotating body 32 in a vertical view). The pulley 323 provided on the rotating shaft 321 is located on the outside of the rotating body container 31 (specifically, above the container top plate portion 311).

[0037] Furthermore, when the rotating body 32 is assembled to the cartridge frame 30, the space between the inner circumferential surface of the through-hole in the container top plate portion 311 of the rotating body container 31 and the inner circumferential surface of the through-hole in the container bottom plate portion 312 and the outer circumferential surface of the rotating shaft 321 is sealed so that the target gas and solution cannot pass through. For example, a ring-shaped sealing member or the like is placed between the inner circumferential surface of the through-hole in the container top plate portion 311 of the rotating body container 31 and the outer circumferential surface of the rotating shaft 321, and between the inner circumferential surface of the through-hole in the container bottom plate portion 312 and the outer circumferential surface of the rotating shaft 321. In this way, the absorber 21 is provided with a space surrounded by the rotating body container 31 and the rotating shaft 321 of the rotating body 32. The gas-liquid contact portion 322 of the rotating body 32 is located inside this space.

[0038] The rotary power source 33 is mounted on the outer circumference of the cartridge frame 30 when viewed in the vertical direction. The configuration of the rotary power source 33 is not particularly limited, and various conventionally known electric motors can be used. A pulley 331 is attached to the output shaft of the rotary power source 33, and a belt is wrapped around the pulley 323 of the rotating body 32 and the pulley 331 of the rotary power source 33. The rotational power output by the rotary power source 33 is transmitted to the rotating body 32 via these pulleys 323, 331 and the belt.

[0039] The first liquid introduction path 34 and the second liquid introduction path 35 are paths configured to introduce a solution into the rotating container 31 from outside the absorber 21. The inlets (one end) of the first liquid introduction path 34 and the second liquid introduction path 35 are each located in positions accessible from outside the absorber 21 (preferably from the side). The outlet (other end) of the first liquid introduction path 34 is located directly above the first liquid introduction hole 420 of the gas-liquid contact section 322, and is configured to allow the solution to flow down (drop) towards the first liquid introduction hole 420. The outlet (other end) of the second liquid introduction path 35 is located directly above the second liquid introduction hole 421 of the gas-liquid contact section 322, and is configured to allow the solution to flow down towards the second liquid introduction hole 421. The first liquid introduction path 34 and the second liquid introduction path 35 are provided with flow rate control valves, etc. (not shown), for adjusting the flow rate of the solution.

[0040] The liquid discharge path 36 is a path configured to discharge (discharge) the solution (liquid) from the inside of the rotating container 31 of the absorber 21 to the outside of the absorber 21. The outlet (one end) of the liquid discharge path 36 is located in a position accessible from the outside of the absorber 21. The inlet (the other end) of the liquid discharge path 36 is located in the container bottom plate portion 312 and is configured to allow the solution accumulated on the upper side of the container bottom plate portion 312 to flow in.

[0041] The first gas introduction path 27 and the second gas introduction path 38 are paths configured to introduce the target gas (gas) into the rotating container 31 of the absorber 21 from outside the absorber 21. The inlets (one end) of the first gas introduction path 27 and the second gas introduction path 38 are each located in positions accessible from outside the absorber 21. The outlet (the other end) of the first gas introduction path 27 is located above the liquid level of the solution accumulated on the upper side of the container bottom plate 312 in the space between the first lower compartment 413 and the second lower compartment 414 of the rotating body 32, and is configured to introduce the target gas into this space. The outlet (the other end) of the second gas introduction path 38 is located above the liquid level of the solution accumulated on the upper side of the container bottom plate 312 in the space between the second lower compartment 414 and the third lower compartment 415 of the rotating body 32, and is configured to introduce the target gas into this space. Furthermore, the first gas introduction path 27 and the second gas introduction path 38 are equipped with flow control valves, etc. (not shown in the diagram), to adjust the flow rate of the target gas.

[0042] The gas discharge path 39 is a path configured to discharge (extract) the target gas from inside the rotating body container 31 of the absorber 21 to the outside of the absorber 21. The outlet (one end) of the gas discharge path 39 is located in a position accessible from outside the absorber 21. The inlet (the other end) of the gas discharge path 39 is located inside the rotating body container 31 of the absorber 21, above the gas-liquid contact portion 322 of the rotating body 32.

[0043] Thus, the absorber 21 is a cartridge in which predetermined components and equipment (components and equipment necessary for the absorber 21 to function) are assembled onto a cartridge frame 30. In other words, the components and equipment constituting the absorber 21 are integrally combined by being assembled onto the cartridge frame 30. A single cartridge-type absorber 21 then possesses the functions of a conventional carbon dioxide absorption tower.

[0044] Next, the diffuser 22 will be described. Figure 5 is a schematic cross-sectional view showing the configuration of the diffuser 22. Components identical to those of the absorber 21 are denoted by the same reference numerals as those of the absorber 21, and their descriptions are omitted. Compared to the absorber 21, the diffuser 22 differs in that it has two liquid outlet paths (first liquid outlet path 36a and second liquid outlet path 36b), a high-temperature fluid introduction path 40, and a carbon dioxide emission section 324 instead of a gas-liquid contact section 322.

[0045] The configurations of the first liquid outlet path 36a and the second liquid outlet path 36b are substantially the same as those of the liquid outlet path 36 of the absorber 21. The high-temperature fluid introduction path 40 is a path that allows a mixture of the solution and steam heated in the first heat exchanger (described later) to be introduced into the interior of the rotating container 31 (above the container bottom plate portion 312).

[0046] The carbon dioxide emission section 324 of the diffuser 22 is configured to release carbon dioxide from the solution by bringing the solution into gas-liquid contact with the vapor generated by heating the solution (causing a reaction in which the solution releases carbon dioxide). The carbon dioxide emission section 324 differs from the gas-liquid contact section 322 of the rotating body 32 of the absorber 21 in that it does not have a first lower compartment 413, a second lower compartment 414, and a third lower compartment 415. That is, the space below the rotating body 32 is not partitioned and is in communication with the space above the rotating body 32. Furthermore, the carbon dioxide emission section 324 differs from the gas-liquid contact section 322 of the rotating body 32 of the absorber 21 in that it does not have the first gas outlet hole 422 and the second gas outlet hole 423, the first gas inlet hole 427, and the second gas inlet hole 428 of the gas-liquid contact section 322. Furthermore, in the lower plate portion 405 of the reaction chamber of the carbon dioxide emission section 324, a third gas outlet hole 429 is provided instead of the first gas inlet hole 427 and the second gas inlet hole 428. The third gas outlet hole 429 is a through hole that penetrates the lower plate portion 405 of the reaction chamber in the vertical direction, and is provided at multiple locations in the circumferential and radial directions of the lower plate portion 405 of the reaction chamber.

[0047] The diffuser 22, like the absorber 21, is a cartridge in which predetermined components and equipment (components and equipment necessary to function as an absorber 21) are assembled onto a cartridge frame 30. In other words, the components and equipment constituting the diffuser 22 are integrally joined by being assembled onto the cartridge frame 30. Thus, a single cartridge-type diffuser 22 provides the functions of a conventional carbon dioxide diffusion tower. The cartridge upper plate portion 302 and cartridge lower plate portion 303 of the diffuser 22's cartridge frame 30 are approximately the same shape and size as the cartridge upper plate portion 302 and cartridge lower plate portion 303 of the absorber 21's cartridge frame 30.

[0048] The first heat exchanger 23 is configured to heat the solution (solution that has absorbed carbon dioxide) supplied from the absorber 21 to the diffuser 22, and to heat the solution (solution that has released carbon dioxide) supplied from the absorber 21 to the diffuser 22. The second heat exchanger 24 is configured to generate steam by heating the solution supplied from the diffuser 22.

[0049] Both the first heat exchanger 23 and the second heat exchanger 24 are equipped with high-temperature fluid paths 231, 241 and low-temperature fluid paths 232, 242, and are configured to exchange heat between the fluid flowing through the high-temperature fluid paths 231, 241 and the fluid flowing through the low-temperature fluid paths 232, 242. Both the first heat exchanger 23 and the second heat exchanger 24 have a substantially circular disc-shaped or cylindrical configuration when viewed from above. In the center when viewed from above, a through hole is provided that penetrates vertically and through which the outer frame shaft 202 can be inserted. The inlets and outlets of the high-temperature fluid paths 231, 241 and the inlets and outlets of the low-temperature fluid paths 232, 242 are located in positions accessible from the side. For example, conventionally known spiral heat exchangers are applied to the first heat exchanger 23 and the second heat exchanger 24.

[0050] The first heat exchanger 23 and the second heat exchanger 24 are also cartridgeized. Specifically, the first heat exchanger 23 is equipped with a cartridge frame 233, and the "components constituting the heat exchanger," including a high-temperature fluid path 231 and a low-temperature fluid path 232, are assembled to this cartridge frame 233. Similarly, the second heat exchanger 24 is equipped with a cartridge frame 243, and the "components constituting the heat exchanger," including a high-temperature fluid path 241 and a low-temperature fluid path 242, are assembled to this cartridge frame 243. These cartridge frames 233, 243, like the cartridge frames 30 of the absorber 21 and the diffuser 22, are equipped with cartridge upper plates 234, 244, cartridge lower plates 235, 245, and cartridge supports 236, 246. Furthermore, the upper cartridge plates 234, 244 and the lower cartridge plates 235, 245 are substantially the same shape and size as the upper cartridge plate 302 and the lower cartridge plate 303 of the cartridge frame 30 of the absorber 21 and the diffuser 22, respectively.

[0051] The heating device 80 is configured to supply a heating medium (e.g., a fluid such as oil) that has heat to heat and vaporize the solution to the second heat exchanger 24. The heating device 80 only needs to be configured to heat the heating medium, and its specific configuration is not particularly limited. Furthermore, the recovery system 10 may be configured without the heating device 80 (as described later).

[0052] As shown in Figures 1A and 1B, the upper absorber 21, lower absorber 21, first heat exchanger 23, diffuser 22, and second heat exchanger 24 are stacked in that order from top to bottom (arranged in series in the vertical direction). The outer frame shafts 202 of the outer frame 20 are inserted through through holes provided in the center of the absorber 21, first heat exchanger 23, diffuser 22, and second heat exchanger 24. Multiple outer frame shafts 202 surround and support each of the absorber 21, first heat exchanger 23, diffuser 22, and second heat exchanger 24 from the outer periphery. The upper outer frame beams 204 are attached to the upper ends of the outer frame shafts 202 and the upper ends of the outer frame support columns 203. In this way, the two absorbers 21, first heat exchanger 23, diffuser 22, and second heat exchanger 24 are fixed to the outer frame 20.

[0053] Next, the relationships between the components of the processing tower 11 and the configuration of the recovery system 10 to which this processing tower 11 is applied will be described. Figure 6 is a schematic diagram showing the relationships between the components of the processing tower 11 and the configuration of the recovery system 10 to which this processing tower 11 is applied.

[0054] As shown in Figure 6, the inlets of the first gas introduction path 27 and the second gas introduction path 38 of the lower absorber 21 are connected to the target gas source 90 by the first target gas path 50. A target gas pump 51 is positioned on the first target gas path 50. The target gas pump 51 is configured to supply the target gas generated in the target gas source 90 to the lower absorber 21 when it operates. The outlet of the gas discharge path 39 of the lower absorber 21 is connected to the inlets of the first gas introduction path 27 and the second gas introduction path 38 of the upper absorber 21 by the second target gas path 52. The outlet of the gas discharge path 39 of the upper absorber 21 is connected to one end of the third target gas path 53. The other end of the third target gas path 53 is open to the atmosphere, for example.

[0055] The outlet of the liquid discharge path 36 of the upper absorber 21 and the inlets of the first liquid introduction path 34 and the second liquid introduction path 35 of the lower absorber 21 are connected by a first solution path 60. A first solution pump 61 is located on the first solution path 60. The first solution pump 61 is configured to supply solution from the upper absorber 21 to the lower absorber 21 by operating. The outlet of the lower liquid discharge path 36 and the inlet of the cryogenic fluid path 232 of the first heat exchanger 23 are connected by a second solution path 62. A second solution pump 63 is located on the second solution path 62. The second solution pump 63 is configured to supply solution from the lower absorber 21 to the first heat exchanger 23 by operating. The outlet of the cryogenic fluid path 232 of the first heat exchanger 23 and the inlets of the first liquid introduction path 34 and the second liquid introduction path 35 of the diffuser 22 are connected by a third solution path 64. A third solution pump 65 is positioned on the third solution path 64. The third solution pump 65 is configured to supply solution from the first heat exchanger 23 to the diffuser 22 by operating.

[0056] The outlet of the first liquid outlet path 36a of the diffuser 22 and the inlet of the high-temperature fluid path 231 of the first heat exchanger 23 are connected by a fourth solution path 66. A fourth solution pump 67 is located on the fourth solution path 66. The fourth solution pump 67 is configured to supply solution from the diffuser 22 through the first heat exchanger 23 to the upper absorber 21 by operating. The outlet of the high-temperature fluid path 231 of the first heat exchanger 23 and the inlets of the first liquid introduction path 34 and the second liquid introduction path 35 of the upper absorber 21 are connected by a fifth solution path 68. The gas outlet path 39 of the diffuser 22 is connected to one end of the carbon dioxide recovery path 54. The other end of the carbon dioxide recovery path 54 is connected to equipment 91 (e.g., a storage tank) for recovering carbon dioxide.

[0057] The second liquid outlet path 36b of the diffuser 22 and the inlet of the low-temperature fluid path 242 of the second heat exchanger 24 are connected by the first heating path 70. A heating pump 71 is located on the first heating path 70. The heating pump 71 is configured to supply the solution from the diffuser 22 to the low-temperature fluid path 242 of the second heat exchanger 24 by operating. The outlet of the low-temperature fluid path 242 of the second heat exchanger 24 and the inlets of the first gas introduction path 37 and the second gas introduction path 38 of the diffuser 22 are connected by the second heating path 72.

[0058] The inlet and outlet of the high-temperature fluid path 241 of the second heat exchanger 24 are connected to the heating device 80 by a medium path 81. A medium pump 82 is placed on the medium path 81. The medium pump 82 is configured to circulate the heating medium between the second heat exchanger 24 and the heating device 80 when it operates. As mentioned above, the recovery system 10 may be configured without a heating device 80. In this case, a configuration can be applied in which the heating medium is heated by the heat generated by the target gas source 90, and the heated heating medium is supplied to the second heat exchanger 24. More specifically, a configuration can be applied in which a heat exchanger is provided in the target gas source 90 to exchange heat between the exhaust gas (target gas) and the heating medium, and this heat exchanger and the second heat exchanger 24 are connected so that the heating medium circulates between this heat exchanger and the second heat exchanger 24.

[0059] Next, the operation of the recovery system 10 will be described. The target gas generated at the target gas source 90 is supplied (pressurized) to the lower absorber 21 through the first target gas path 50. The target gas then passes sequentially through the lower absorber 21, the second target gas path 52, the upper absorber 21, and the third target gas path 53. While the target gas passes through the lower and upper absorbers 21, the carbon dioxide contained in the target gas is absorbed into the solution (described later). After that, the target gas is released into the atmosphere through the third target gas path 53.

[0060] Through the operation of the first solution pump 61, the second solution pump 63, the third solution pump 65, and the fourth solution pump 67, the solution circulates in the following order: upper absorber 21, first solution path 60, lower absorber 21, second solution path 62, low-temperature fluid path 232 of the first heat exchanger 23, third solution path 64, diffuser 22, fourth solution path 66, high-temperature fluid path 231 of the first heat exchanger 23, and fifth solution path 68.

[0061] The operation of the medium pump 82 causes the heating medium heated in the heating device 80 to be supplied to the high-temperature fluid path 241 of the second heat exchanger 24, and the heating medium that has passed through the high-temperature fluid path 241 of the second heat exchanger 24 is returned to the heating device 80. In addition, the operation of the heating pump 71 causes a portion of the solution accumulated in the bottom plate portion 312 of the rotating container 31 of the diffuser 22 to flow into the low-temperature fluid path 242 of the second heat exchanger 24 through the first heating path 70. The solution that flows into the low-temperature fluid path 242 of the second heat exchanger 24 is heated and vaporized by the heat of the heating medium passing through the high-temperature fluid path 241 of the second heat exchanger 24. The vapor of the solution then flows into the first gas introduction path 37 and the second gas introduction path 38 of the diffuser 22 through the second heating path 72.

[0062] The solution then absorbs carbon dioxide from the target gas as it passes through the upper and lower absorbers 21. The carbon dioxide-absorbing solution then passes through the low-temperature fluid path 232 of the first heat exchanger 23 and flows into the diffuser 22. The solution that flows into the diffuser 22 is then heated by the steam that flows into the diffuser 22 from the second heat exchanger 24. As a result, carbon dioxide is released from the solution in the diffuser 22 (described later).

[0063] The carbon dioxide released from the solution in the diffuser 22 is sent to equipment 91 outside the diffuser 22 (i.e., outside the recovery system 10) via the carbon dioxide recovery path 54. The solution from which carbon dioxide has been released in the diffuser 22 flows into the high-temperature fluid path 231 of the first heat exchanger 23 via the fourth solution path 66. Then, in the first heat exchanger 23, the solution that flows from the lower absorber 21 to the low-temperature fluid path 232 via the second solution path 62 and the solution that has been sent from the diffuser 22 to the high-temperature fluid path 231 via the third solution path 64 exchange heat. As a result, the solution that flows in from the lower absorber 21 is heated (preheated) by the heat of the solution that flows in from the diffuser 22. The heated solution is then sent to the diffuser 22 via the third solution path 64. On the other hand, the solution that flows in from the diffuser 22 cools down (is cooled) by transferring heat to the solution that flows in from the lower absorber 21. The solution whose temperature has decreased is supplied to the upper absorber 21.

[0064] In this manner, the solution circulates in the following order: the upper absorber 21 of the processing tower 11, the lower absorber 21, the low-temperature fluid path 232 of the first heat exchanger 23, the diffuser 22, and the high-temperature fluid path 231 of the first heat exchanger 23. While the solution circulates, the reaction of absorbing carbon dioxide in the upper absorber 21 and the lower absorber 21, and then releasing the absorbed carbon dioxide in the diffuser 22, is repeated.

[0065] Next, the operation of the absorber 21 will be described. The rotating body 32 rotates due to the rotational power transmitted from the rotational power source 33. The solution supplied from outside the absorber 21 to the first liquid introduction path 34 flows down from the outlet of the first liquid introduction path 34 and flows through the first liquid introduction hole 420 to the upper surface of each guide plate 433 located inside the first reaction chamber 402, between the partition plates 432 of the first distribution member 409. The solution that has flowed down to the upper surface of each guide plate 433 moves to the outer circumference due to the centrifugal force of the rotating body 32, passes through the path holes 434 provided in the outer peripheral plate 431 and flows into the packing material 440, moving through the packing material 440 while diffusing and permeating from the inner circumference to the outer circumference. Then it passes through the first spacer 410 and flows into the space between the first spacer 410 and the reaction chamber partition plate section 408, and flows down from the first liquid outlet hole 425 due to gravity. The flowed-down solution accumulates on the upper side of the container bottom plate section 312.

[0066] The solution supplied from outside the absorber 21 to the second liquid introduction path 35 flows down from the outlet of the second liquid introduction path 35 and flows through the second liquid introduction hole 421 to the upper surface of the guide plate 433 located inside the second reaction chamber 403, between the partition plates 432 of the second distribution member 411. The solution that has flowed down to the upper surface of each guide plate 433 moves outward due to the centrifugal force of the rotating body 32, passes through the path holes 434 provided in the outer peripheral plate 431 and flows into the packing material 440, where it moves through the packing material 440, diffusing and permeating from the inner peripheral side to the outer peripheral side. Then it passes through the second spacer 412 and flows into the space between the second spacer 412 and the reaction chamber outer peripheral plate portion 407, and flows down from the second liquid outlet hole 426 due to gravity. The flowed-down solution accumulates on the upper side of the container bottom plate portion 312. The solution accumulated on the upper side of the container bottom plate portion 312 is discharged to the outside of the absorber 21 through the liquid outlet path 36.

[0067] The target gas supplied from outside the absorber 21 to the first gas introduction path 27 flows from the outlet of the first gas introduction path 27 into the space between the first lower compartment 413 and the second lower compartment 414. The target gas that has flowed into this space then flows into the first reaction chamber 402 through the first gas introduction hole 427 of the gas-liquid contact section 322. The target gas that has flowed into the first reaction chamber 402 passes through the packing material 440 filling the first reaction chamber 402 from the outer circumference to the inner circumference and flows out of the first reaction chamber 402 through the first gas outlet hole 422 provided in the reaction chamber upper plate section 404.

[0068] The target gas supplied from outside the absorber 21 to the second gas introduction path 38 flows from the outlet of the second gas introduction path 38 into the space between the second lower compartment 414 and the third lower compartment 415. The target gas that has flowed into this space then flows into the second reaction chamber 403 through the second gas introduction hole 428 of the gas-liquid contact section 322. The target gas that has flowed into the second reaction chamber 403 passes through the packing material 440 filling the second reaction chamber 403 from the outer circumference to the inner circumference and flows out from the first reaction chamber 402 through the second gas outlet hole 423 provided in the reaction chamber upper plate 404. The target gas that has flowed out from the first reaction chamber 402 and the target gas that has flowed out from the second reaction chamber 403 are led out to the outside of the absorber 21 through the gas outlet path 39.

[0069] Furthermore, the lower ends of the first lower compartment 413, the second lower compartment 414, and the third lower compartment 415 are immersed in the solution accumulated above the container bottom plate 312. For this reason, the space between the first lower compartment 413 and the second lower compartment 414, and the space between the second lower compartment 414 and the third lower compartment 415 are not directly connected (they are connected through the first reaction chamber 402 and the second reaction chamber 403). Consequently, by adjusting the flow rate of the target gas passing through the first gas introduction path 27, the flow rate of the target gas passing through the first reaction chamber 402 can be adjusted, and by adjusting the flow rate of the target gas passing through the second gas introduction path 38, the flow rate of the target gas passing through the second reaction chamber 403 can be adjusted.

[0070] Thus, in both the first reaction chamber 402 and the second reaction chamber 403, the solution moving from the inner side to the outer side and the target gas moving from the outer side to the inner side come into gas-liquid contact (countercurrent contact). Consequently, the carbon dioxide contained in the target gas is absorbed into the solution.

[0071] Next, the operation of the diffuser 22 will be described. When the diffuser 22 is operated, the solution accumulated in the bottom plate portion 312 of the container of the diffuser 22 is discharged to the outside of the diffuser 22 through the second liquid discharge path 36b, the discharged solution is heated in the second heat exchanger 24, and the mixture of the heated solution and the steam generated by the heating is introduced into the diffuser 22 through the high-temperature fluid introduction path 40.

[0072] The rotating body 32 rotates due to the rotational power transmitted from the rotational power source 33. The flow of the solution is the same as in the absorber 21. When the heated solution and steam flow into the rotating body container 31 through the high-temperature fluid introduction path 40, the heated solution and the heat it possesses heat the carbon dioxide release section 324. The solution, as it moves through the first reaction chamber 402 and the second reaction chamber 403 of the carbon dioxide release section 324, permeating and diffusing from the inner circumference to the outer circumference, releases carbon dioxide due to the heating (i.e., a reaction occurs in which the solution releases carbon dioxide). In addition, some of the steam that flows into the rotating body container 31 through the high-temperature fluid introduction path 40 and the steam generated inside the rotating body container 31 flow into the first reaction chamber 402 and the second reaction chamber 403. Therefore, the solution, as it moves through the first reaction chamber 402 and the second reaction chamber 403, permeating and diffusing, may also be heated by the steam that flows into the first reaction chamber 402 and the second reaction chamber 403. Carbon dioxide released from the solution inside the first reaction chamber 402 and the second reaction chamber 403 flows out to the outside of the first reaction chamber 402 and the second reaction chamber 403 through the third gas outlet 429, and further flows out to the outside of the diffuser 22 through the gas outlet path 39.

[0073] As described above, according to this embodiment, compared to a conventional configuration in which the carbon dioxide absorption tower does not have a rotating body 32, the opportunities for gas-liquid contact between the target gas and the solution can be increased, thereby increasing the carbon dioxide absorption capacity of the absorber 21. Also, compared to a conventional configuration in which the carbon dioxide diffusion tower does not have a rotating body 32, fluttering of the solution in the packing material 440 can be prevented or suppressed, making it easier to heat the solution uniformly. Therefore, the carbon dioxide diffusion capacity of the diffuser 22 can be increased. Accordingly, the processing capacity can be improved without increasing the size of the recovery system 10. Alternatively, the recovery system 10 can be miniaturized without decreasing the recovery capacity.

[0074] Furthermore, the rotating body 32 is provided with multiple reaction chambers 402, 403 arranged radially. This configuration enhances the carbon dioxide absorption capacity of the absorber 21 and the carbon dioxide emission capacity of the diffuser 22 compared to a configuration with a single reaction chamber. In other words, with a configuration in which the solution permeates radially outward from the center of the rotating body 32, the amount of solution per unit volume of packing material 440 decreases as you move outward from the center of the rotating body 32. As a result, flattening (uneven distribution) of the solution is more likely to occur towards the outer circumference of the rotating body 32. When flattening occurs, the opportunities for gas-liquid contact between the target gas and the solution decrease in the absorber 21, and uneven heating (temperature unevenness) of the solution is more likely to occur in the diffuser 22.

[0075] In contrast, according to this embodiment, a plurality of coaxial reaction chambers 402, 403 are provided inside the rotating body 32, and a solution is supplied to each of the plurality of reaction chambers 402, 403 from the inner circumference side. With this configuration, the ratio of the flow rate of the solution to the flow rate of the target gas can be adjusted to a preferred ratio inside each reaction chamber 402, 403 of the absorber 21. In particular, since the difference in the flow rate of the solution between the inner circumference side and the outer circumference side can be reduced inside each reaction chamber 402, 403, the ratio of the flow rate of the solution to the flow rate of the target gas, and the ratio of the flow rate of the solution to the flow rate of the vapor can be adjusted to a preferred ratio over a wide area of ​​each reaction chamber 402, 403. Furthermore, the occurrence of flattening is prevented or suppressed inside each reaction chamber 402, 403 of the diffuser 22. As a result, the carbon dioxide absorption capacity of the absorber 21 and the carbon dioxide emission capacity of the diffuser 222 can be increased.

[0076] Furthermore, with a configuration in which a first distribution member 409 and a second distribution member 411 are provided in each reaction chamber 402, 403, the solution can be dispersed and flowed into a wide area on the inner circumference side of the packing material 440. That is, the solution that flows down onto the upper surface of the guide plate 433 between the partition plates 432 flows into the interior of the packing material 440 through a plurality of path holes 434 in the outer peripheral plate 431. The plurality of path holes 434 are provided over the entire circumference of the outer peripheral plate 431 and are dispersed in the vertical direction. Therefore, the solution can be dispersed and flowed into a wide area on the inner circumference side of the packing material 440. Consequently, the effect of preventing or suppressing solution flattening can be enhanced.

[0077] Furthermore, if a first spacer 410 and a second spacer 412 are provided in each reaction chamber 402, 403, the accumulation of solution near the outer periphery of the packing material 440 is prevented or suppressed. Specifically, the solution that has passed from the inner periphery to the outer periphery of the packing material 440 in each reaction chamber 402, 403 passes from the inner periphery to the outer periphery of the first spacer 410 and the second spacer 412, and flows into the space on the outer periphery of the first spacer 410 or the second spacer 412 without accumulating on the inner periphery of the first spacer 410 or the second spacer 412. With this configuration, the flow of the target gas at the outer periphery of the packing material 440 is not obstructed, so the target gas flows more easily into the interior of the packing material 440, and as a result, the opportunities for gas-liquid contact between the target gas and the solution are increased.

[0078] Furthermore, according to this embodiment, the absorber 21, the first heat exchanger 23, the diffuser 22, and the second heat exchanger 24 can be stacked vertically, thus reducing the space required for installing the recovery system 10. Also, since the absorber 21, the first heat exchanger 23, the diffuser 22, and the second heat exchanger 24 are cartridge-type, it is easy to increase or decrease the number of absorber 21, the first heat exchanger 23, the diffuser 22, and the second heat exchanger 24. Therefore, a recovery system 10 with appropriate capacity can be constructed according to the amount of carbon dioxide supplied from the target gas source 90. In addition, by increasing the number of absorbers 21 and diffusers 22, the processing capacity can be increased without increasing the installation space.

[0079] Furthermore, in this embodiment, the processing tower 11 is equipped with a first heat exchanger 23, which reduces heat loss during heat exchange between solutions. That is, if the first heat exchanger 23 is located separately from the processing tower 11, the lengths of the second solution path 62, third solution path 64, fourth solution path 66, and fifth solution path 68 become longer. When these paths become longer, the amount of heat released from the solutions supplied through these paths (i.e., heat loss) increases. In contrast, according to this embodiment, these paths can be shortened, thus reducing heat loss. Similarly, if the processing tower is equipped with a second heat exchanger 24, the lengths of the first heating path 70 and the second heating path 72 can be shortened, thus reducing the amount of heat released from the solutions (or solutions and steam) supplied through these paths.

[0080] Next, a modified recovery system 10a will be described. Figure 7 is a schematic diagram showing the configuration of the first modified recovery system 10a. In the above embodiment, the heating device 80 was shown to be provided separately from the processing tower 11, but as shown in Figure 7, the heating device 80 may be assembled to the processing tower 11. In this case, the heating device 80 only needs to be configured to include a cartridge frame. Even with such a configuration, the same effects as in the above embodiment can be achieved. Furthermore, with such a configuration, the installation space for the heating device 80 can be omitted, so the recovery system 10a can be further miniaturized. In addition, with such a configuration, the heating device 80 and the second heat exchanger 24 can be placed in close proximity, so the heat loss of the heating device 80 can be reduced.

[0081] Furthermore, although the above embodiment shows a configuration in which the two absorbers 21 are connected by a second target gas path 52, that is, a configuration in which the target gas passes sequentially through the two absorbers 21, the system is not limited to this configuration. For example, as shown in Figure 7, each of the two absorbers 21 may be connected to a target gas source 90, and the target gas may be distributed from the target gas source 90 to each of the two absorbers 21.

[0082] Furthermore, although the above embodiment shows a configuration in which the processing tower 11 includes an absorber 21, a diffuser 22, a first heat exchanger 23, and a second heat exchanger 24, the configuration is not limited to this. For example, the processing tower 11 may be configured to include only an absorber 21 or a diffuser 22. A configuration in which the processing tower 11 includes only an absorber 21 can be described as "a configuration in which the carbon dioxide absorption tower is formed by cartridge-type absorbers 21." With such a configuration, the processing tower 11 can be given an appropriate capacity by increasing or decreasing the number of absorbers 21 included in the processing tower 11 (carbon dioxide absorption tower) according to the flow rate of the target gas. Therefore, the energy efficiency of the processing tower 11 can be increased. In addition, the processing capacity of the processing tower 11 can be increased by increasing the number of absorbers 21 included in the processing tower 11 without increasing the installation area of ​​the processing tower 11. Therefore, even if the processing capacity is increased, the installation area does not increase.

[0083] Similarly, the treatment tower 11 may be configured to consist only of a diffuser 22. A configuration in which the treatment tower 11 consists only of a diffuser 22 can be described as "a configuration in which the carbon dioxide absorption tower is formed by a cartridge-type diffuser 22." Even with such a configuration, the same effects as the above-described configuration in which the treatment tower 11 consists only of a diffuser 22 can be achieved.

[0084] Furthermore, the processing tower 11 may be equipped with an absorber 21 and a diffuser 22, but may not be equipped with a first heat exchanger 23, a second heat exchanger 24, and a heating device 80. Such a configuration can be described as a "configuration that combines the functions of a conventional carbon dioxide absorption tower and a carbon dioxide emission tower." It can also be described as a "configuration in which a conventional carbon dioxide absorption tower and a carbon dioxide emission tower are integrated." With such a configuration, the installation space of the recovery system can be reduced compared to a configuration in which a carbon dioxide absorption tower and a carbon dioxide emission tower are separate.

[0085] In this way, by cartridgeizing each component and piece of equipment that make up the recovery system 10, the functions and capabilities of the processing tower 11 can be set as appropriate.

[0086] <Summary of Embodiments> (1) A carbon dioxide absorber 21 is configured to absorb carbon dioxide contained in a gas (target gas) introduced from an external source into a carbon dioxide absorption solution by bringing the gas-liquid contact between the gas (target gas) and the carbon dioxide absorption solution introduced from an external source, A carbon dioxide diffuser is configured to release carbon dioxide from a carbon dioxide absorption solution by heating the carbon dioxide absorption solution with the heat of an externally introduced carbon dioxide absorption solution and a high-temperature fluid (the carbon dioxide absorption solution and its vapor), and A carbon dioxide recovery system comprising a carbon dioxide absorber and a carbon dioxide emitter, wherein one of the carbon dioxide absorbers and the carbon dioxide emitters is cartridge-type, and multiple cartridge-type carbon dioxide absorbers or multiple cartridge-type carbon dioxide emitters are stacked vertically.

[0087] A device (processing tower 11) with the functions of a conventional carbon dioxide absorption tower is formed by stacking cartridge-type carbon dioxide absorbers 21 in a vertical direction. Alternatively, a device (processing tower 11) with the functions of a conventional carbon dioxide emission tower is formed by stacking cartridge-type carbon dioxide emitters 22 in a vertical direction. When the processing tower is formed by stacking cartridge-type carbon dioxide absorbers 21 or cartridge-type carbon dioxide emitters 22, the processing tower 11 can be given an appropriate processing capacity by increasing or decreasing the number of carbon dioxide absorbers 21 or carbon dioxide emitters 22. Therefore, the energy efficiency of the processing tower 11 can be increased. Furthermore, even when the number of carbon dioxide absorbers 21 or carbon dioxide emitters 22 is increased to increase the processing capacity of the processing tower 11, the installation area does not increase if the carbon dioxide absorbers 21 or carbon dioxide emitters 22 are stacked in a vertical direction. Therefore, the processing capacity of the processing tower 11 can be increased without increasing the installation area of ​​the processing tower 11.

[0088] (2) Both the carbon dioxide absorber 21 and the carbon dioxide emitter 22 are cartridge-type. A configuration is applied in which the cartridge-type carbon dioxide absorber 21 and the carbon dioxide emitter 22 are stacked vertically.

[0089] With this configuration, a single device (processing tower 11) is formed that combines the functions of a conventional carbon dioxide absorption tower and a conventional carbon dioxide emission tower. Therefore, compared to the conventional configuration which has separate carbon dioxide absorption towers and carbon dioxide emission towers, the space required for installing the carbon dioxide recovery systems 10, 10a can be reduced. In addition, since the carbon dioxide absorbers 21 and carbon dioxide emitters 22 are cartridge-type, the processing capacity of the carbon dioxide recovery system 10 can be changed by increasing or decreasing the number of carbon dioxide absorbers 21 and carbon dioxide emitters 22 in the processing tower 11. Furthermore, by arranging an appropriate number of carbon dioxide absorbers 21 and carbon dioxide emitters 22 according to the flow rate of the target gas, energy efficiency can be increased.

[0090] (3) A first heat exchanger 23 and a second heat exchanger 24 are provided with high-temperature fluid paths 231, 241 and low-temperature fluid paths 232, 242, and are configured to exchange heat between the fluid flowing through the high-temperature fluid paths 231, 241 and the fluid flowing through the low-temperature fluid paths 232, 242. A heater (heating device 80) configured to heat the incoming heat transfer medium and allow the heated heat transfer medium to flow out, Equipped with, The carbon dioxide absorber 21, the carbon dioxide emitter 22, the first heat exchanger 23, and the second heat exchanger 24 are cartridge-shaped and arranged in a stacked manner in a substantially vertical direction. The carbon dioxide absorber 21 and the first heat exchanger 23 are connected such that the carbon dioxide absorption solution that flows out of the first heat exchanger 23 after passing through the high-temperature fluid path 231 of the first heat exchanger 23 flows into the carbon dioxide absorber 21, and the carbon dioxide absorption solution that has absorbed carbon dioxide in the carbon dioxide absorber 21 flows into the low-temperature fluid path 232 of the first heat exchanger 23. The first heat exchanger 23 and the carbon dioxide diffuser 22 are connected such that the carbon dioxide absorption solution that has passed through the low-temperature fluid path 232 of the first heat exchanger 23 flows into the carbon dioxide diffuser 22, and the carbon dioxide absorption solution that has flowed out of the carbon dioxide diffuser 22 flows into the high-temperature fluid path 231 of the first heat exchanger 23. The carbon dioxide evaporator 22 and the second heat exchanger 24 are connected such that the fluid inside the carbon dioxide evaporator 22 flows into the low-temperature fluid path 242 of the second heat exchanger 24, and the carbon dioxide absorption solution heated while passing through the low-temperature fluid path 242 of the second heat exchanger 24 and the steam generated by the heating flow into the carbon dioxide evaporator 22. The second heat exchanger 24 and the heater (heating device 80) are connected such that the heating medium heated in the heater (heating device 80) flows into the high-temperature fluid path 241 of the second heat exchanger 24.

[0091] With this configuration, the installation space for the first heat exchanger 23 and the second heat exchanger 24 can be omitted, thus further reducing the installation space required for the carbon dioxide recovery systems 10 and 10a. In addition, since the carbon dioxide absorber 21 and carbon dioxide diffuser 22 and the first heat exchanger 23 and the second heat exchanger 24 are arranged in close proximity, the path connecting the carbon dioxide absorber 21 and carbon dioxide diffuser 22 to the first heat exchanger 23 and the second heat exchanger 24 so that the carbon dioxide absorption solution can flow can be shortened. This reduces the energy required to supply (circulate) the carbon dioxide absorption solution. Furthermore, the amount of heat lost by the carbon dioxide absorption solution while flowing through the path can be reduced.

[0092] (4) The carbon dioxide capture system is The system comprises multiple carbon dioxide absorbers 21, Multiple carbon dioxide absorbers 21 are arranged in series such that they are adjacent to each other. The carbon dioxide absorber 21 located at one end of a plurality of carbon dioxide absorbers 21 arranged in series and the first heat exchanger 23 are connected such that the carbon dioxide absorption solution that flows out of the first heat exchanger 23 after passing through the high-temperature fluid path 231 of the first heat exchanger 23 flows into the carbon dioxide absorber 21. The carbon dioxide absorber 21 located at the other end of the plurality of carbon dioxide absorbers 21 arranged in series and the first heat exchanger 23 are connected such that the carbon dioxide absorption solution that has absorbed carbon dioxide in the plurality of carbon dioxide absorbers 21 flows into the low-temperature fluid path 232 of the first heat exchanger 23. A configuration can be applied in which the multiple carbon dioxide absorbers 21 are connected such that the carbon dioxide absorbing solution passes sequentially from the carbon dioxide absorber 21 located at one end to the carbon dioxide absorber 21 located at the other end.

[0093] In this configuration, where multiple carbon dioxide absorbers 21 are stacked vertically and the carbon dioxide absorption solution flows sequentially through the stacked carbon dioxide absorbers 21, the amount of carbon dioxide remaining unabsorbed from the gas (target gas) can be reduced without increasing the installation space. Therefore, the carbon dioxide recovery capacity of the carbon dioxide recovery systems 10 and 10a can be increased.

[0094] (5) The carbon dioxide absorber 2 is Frame (cartridge frame 30), A rotating body 32 is provided with a gas-liquid contact section 322 through which gas can pass and liquid can permeate and diffuse, and is rotatably positioned relative to the frame (cartridge frame 30), A rotational power source 33 is attached to the aforementioned frame (cartridge frame 30) and rotates the rotating body 32, A liquid introduction path (first liquid introduction path 34, second liquid introduction path 35) is attached to the frame (cartridge frame 30) and configured to supply the carbon dioxide absorption solution flowing in from the outside to the gas-liquid contact section 322, A configuration can be applied in which a gas introduction path (first gas introduction path 37, second gas introduction path 38) is attached to the frame (cartridge frame 30) and configured to supply gas flowing in from the outside to the gas-liquid contact section 322.

[0095] If a rotating body 32 is provided inside the carbon dioxide absorber 21, and the gas (target gas) and the carbon dioxide absorption solution come into gas-liquid contact at the gas-liquid contact portion 322 of the rotating body 32, the opportunities for gas-liquid contact between the gas (target gas) and the carbon dioxide absorption solution can be increased compared to a configuration without the rotating body 32. Therefore, the carbon dioxide absorption capacity of the carbon dioxide absorber 21 can be increased and the carbon dioxide absorber 21 can be miniaturized. And because the carbon dioxide absorber 21 can be miniaturized, the recovery system 10 can also be miniaturized.

[0096] (6) The carbon dioxide capture systems 10, 10a are equipped with a plurality of carbon dioxide absorbers 21, Each of the gas-liquid contact portions 322 of the multiple carbon dioxide absorbers 21 is It is equipped with multiple reaction chambers (first reaction chamber 402, second reaction chamber 403) arranged substantially coaxially with respect to the center of rotation, Each of the plurality of reaction chambers (first reaction chamber 402, second reaction chamber 403) can be configured such that the carbon dioxide absorption solution supplied through the liquid introduction path (first liquid introduction path 34, second liquid introduction path 35) flows in from the end closer to the center of rotation of the reaction chamber (first reaction chamber 402, second reaction chamber 403) and flows out from the end far from the center of rotation, and the gas supplied through the gas introduction path (first gas introduction path 37, second gas introduction path 38) flows in from the end far from the center of rotation of the reaction chamber (first reaction chamber 402, second reaction chamber 403) and flows out from the end closer to the center of rotation.

[0097] With this configuration, the ratio of the solution flow rate to the target gas flow rate can be adjusted to a preferred ratio within each reaction chamber (first reaction chamber 402, second reaction chamber 403). In particular, since the difference in solution flow rates between the inner and outer sides of each reaction chamber (first reaction chamber 402, second reaction chamber 403) can be reduced, the ratio of the carbon dioxide absorption solution flow rate to the gas (target gas) flow rate can be adjusted to a preferred ratio over a wide area of ​​each reaction chamber. Therefore, the occurrence of flooding can be prevented or suppressed, and the carbon dioxide absorption capacity of the carbon dioxide absorber 21 can be increased.

[0098] Although embodiments and modifications of the present invention have been described above, the technical scope of the present invention is not limited to the embodiments and modifications described above. The present invention can be modified in various ways without departing from its spirit, and these modifications are also included in the technical scope of the present invention.

[0099] For example, in the above embodiment, the rotating body 32 of the carbon dioxide absorber 21 and carbon dioxide diffuser 22 was shown to have two reaction chambers (first reaction chamber 402 and second reaction chamber 403), but the number of reaction chambers 402 and 403 provided in the rotating body 32 of the carbon dioxide absorber 21 and carbon dioxide diffuser 22 is not limited to two. The carbon dioxide absorber 21 and carbon dioxide diffuser 22 may also be configured to have three or more reaction chambers.

[0100] Furthermore, although the above embodiment shows a configuration in which the carbon dioxide capture system 10 is equipped with two carbon dioxide absorbers 21, the number of carbon dioxide absorbers 21 equipped in the carbon dioxide capture system 10 is not limited to two. Specifically, the carbon dioxide capture system 10 may be equipped with one carbon dioxide absorber 21, or it may be equipped with three or more carbon dioxide absorbers 21.

[0101] Similarly, although the above embodiment showed a configuration in which the carbon dioxide capture system 10 is equipped with one carbon dioxide diffuser 22, the number of carbon dioxide diffusers 22 equipped in the carbon dioxide capture system 10 is not limited to one. That is, the carbon dioxide capture system 10 may be equipped with two or more carbon dioxide diffusers 22. [Explanation of Symbols]

[0102] 10...Carbon dioxide capture system (capture system), 11...Processing tower, 20...Outer frame, 21...Carbon dioxide absorber, 22...Carbon dioxide emitter, 23...First heat exchanger, 24...Second heat exchanger, 30...Cartridge frame, 31...Rotating body container, 32...Rotating body, 33...Rotating power source, 34...First liquid introduction path, 35...Second liquid introduction path, 36...Liquid outlet path, 37...First gas introduction path, 38...Second gas introduction path, 39...Gas outlet path, 322...Gas-liquid contact section, 402...First reaction chamber, 403...Second reaction chamber, 80...Heating device, 90...Target gas source

Claims

1. A carbon dioxide absorber configured to absorb carbon dioxide contained in a gas by bringing a gas containing carbon dioxide introduced from an external source into a gas-liquid contact with a carbon dioxide absorption solution introduced from an external source, A carbon dioxide diffuser is configured to release carbon dioxide from a carbon dioxide absorption solution by heating the carbon dioxide absorption solution introduced from an external source with the heat of a high-temperature fluid introduced from an external source, A carbon dioxide recovery system comprising a carbon dioxide absorber and a carbon dioxide emitter, wherein one of the carbon dioxide absorbers and the carbon dioxide emitters is cartridge-type, and multiple cartridge-type carbon dioxide absorbers or multiple cartridge-type carbon dioxide emitters are stacked vertically.

2. A carbon dioxide capture system according to claim 1, Both the carbon dioxide absorber and the carbon dioxide emitter are cartridge-type. A carbon dioxide capture system in which the carbon dioxide absorber and carbon dioxide emitter, which are cartridge-type, are stacked vertically.

3. A carbon dioxide capture system according to claim 2, A first heat exchanger and a second heat exchanger are provided, each having a high-temperature fluid path and a low-temperature fluid path, and configured to exchange heat between the fluid flowing in the high-temperature fluid path and the fluid flowing in the low-temperature fluid path. A heater configured to heat an incoming heat transfer medium and allow the heated heat transfer medium to flow out, Equipped with, The carbon dioxide absorber, the carbon dioxide emitter, the first heat exchanger, and the second heat exchanger are cartridge-shaped and arranged in a stacked manner in a substantially vertical direction. The carbon dioxide absorber and the first heat exchanger are connected such that the carbon dioxide absorption solution that flows out of the first heat exchanger after passing through the high-temperature fluid path of the first heat exchanger flows into the carbon dioxide absorber, and the carbon dioxide absorption solution that has absorbed carbon dioxide in the multiple carbon dioxide absorbers is connected such that it flows into the low-temperature fluid path of the first heat exchanger. The first heat exchanger and the carbon dioxide diffuser are connected such that the carbon dioxide absorption solution that has passed through the low-temperature fluid path of the first heat exchanger flows into the carbon dioxide diffuser, and the carbon dioxide absorption solution that has flowed out of the carbon dioxide diffuser flows into the high-temperature fluid path of the first heat exchanger. The carbon dioxide evaporator and the second heat exchanger are connected such that the fluid inside the carbon dioxide evaporator flows into the low-temperature fluid path of the second heat exchanger, and the carbon dioxide absorption solution heated while passing through the low-temperature fluid path of the second heat exchanger and the steam generated by the heating flow into the carbon dioxide evaporator. The second heat exchanger and the heater are connected such that the heating medium heated in the heater flows into the high-temperature fluid path of the second heat exchanger. Carbon dioxide capture system.

4. A carbon dioxide capture system according to claim 3, Equipped with multiple carbon dioxide absorbers, Multiple carbon dioxide absorbers are arranged in series such that they are adjacent to each other. The carbon dioxide absorber located at one end of a plurality of carbon dioxide absorbers arranged in series and the first heat exchanger are connected such that the carbon dioxide absorption solution that flows out of the first heat exchanger after passing through the high-temperature fluid path of the first heat exchanger flows into the carbon dioxide absorber. The carbon dioxide absorber located at the other end of the plurality of carbon dioxide absorbers arranged in series and the first heat exchanger are connected such that the carbon dioxide absorption solution that has absorbed carbon dioxide in the plurality of carbon dioxide absorbers flows into the low-temperature fluid path of the first heat exchanger. A carbon dioxide recovery system in which a plurality of carbon dioxide absorbers are connected to each other such that a carbon dioxide absorption solution passes sequentially from a carbon dioxide absorber located at one end of the plurality of carbon dioxide absorbers to a carbon dioxide absorber located at the other end.

5. A carbon dioxide capture system according to claim 3, The carbon dioxide absorber is, Frame and, A rotating body is provided with a gas-liquid contact section through which gas can pass and liquid can permeate and diffuse, and is rotatably positioned relative to the frame, A rotational power source attached to the frame and used to rotate the rotating body, A liquid introduction path is attached to the frame and configured to supply a carbon dioxide absorption solution flowing in from the outside to the gas-liquid contact area, A gas introduction path is attached to the frame and configured to supply gas flowing in from the outside to the gas-liquid contact area, A carbon dioxide capture system equipped with this feature.

6. A carbon dioxide capture system according to claim 5, Equipped with multiple carbon dioxide absorbers, Each of the gas-liquid contact parts of the plurality of carbon dioxide absorbers is It is equipped with multiple reaction chambers arranged substantially coaxially with respect to the center of rotation, A carbon dioxide recovery system in which each of the plurality of reaction chambers is configured such that a carbon dioxide absorption solution supplied through the liquid introduction path flows in from the end of the gas-liquid contact section closer to the center of rotation and flows out from the end of the gas-liquid contact section further from the center of rotation, and a gas supplied through the gas introduction path flows in from the end of the gas-liquid contact section further from the center of rotation and flows out from the end of the gas-liquid contact section closer to the center of rotation.

Images