Resist composition and method for producing resist patterns and salt
The use of a resist composition with a specific salt and resin structure addresses the issue of poor line edge roughness in resist patterns, improving microfabrication quality and precision.
JP2026109593APending Publication Date: 2026-07-01SUMITOMO CHEM CO LTD
Patent Information
- Application Number
- JP2025258074
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2024-12-19
- Filing Date
- 2025-12-17
- Publication Date
- 2026-07-01
AI Technical Summary
Technical Problem
Existing resist compositions form resist patterns with poor line edge roughness (LER), which affects the quality and precision of microfabrication processes.
Method used
A resist composition containing a specific salt represented by formula (I) is used, which includes an acid generator with a particular structure, along with a resin containing specific structural units and an acid-unstable group, to improve line edge roughness.
Benefits of technology
The resist patterns produced exhibit improved line edge roughness (LER), enhancing the quality and precision of microfabrication processes.
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Smart Images
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Abstract
The objective is to provide acid generators, resist compositions, etc., that can produce resist patterns with good line edge roughness. [Solution] A resist composition containing an acid generator comprising a salt represented by formula (I). TIFF2026109593000164.tif2476[where, X 1 L represents a group such as -O-, -CO-, or a combination thereof. 2 R represents a single bond or an alkanediyl group, and the -CH2- contained in the group may be replaced by -O- or -CO-. 1 R represents an alicyclic hydrocarbon group having a halogen atom or a haloalkyl group, and the -CH2- contained in the alicyclic hydrocarbon group may be replaced with -O-, -S-, etc., and the alicyclic hydrocarbon group may have substituents other than halogen atoms and haloalkyl groups. 3 represents a halogen atom, nitro group, cyano group, or substituted / unsubstituted hydrocarbon group. m3 represents an integer from 0 to 4, and mn1 represents an integer from 1 to 5. + This represents an organic cation.
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Citation Information
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