Method for manufacturing an anti-reflective coating, and transfer apparatus

Abstract

Reduces variations in the in-plane film thickness of the anti-reflective layer. [Solution] The method for manufacturing an anti-reflective material uses a lamination-type transfer apparatus comprising a first suction unit, a second suction unit, and a rotation mechanism for rotating the second suction unit between a first state in which the suction surface of the second suction unit faces upward and a second state in which the suction surface of the second suction unit faces downward and faces the suction surface of the first suction unit. The method involves placing a substrate on the suction surface of the first suction unit, applying an uncured resin composition to the surface of the substrate, placing a film mold on the suction sheet of the second suction unit in the first state, rotating the second suction unit from the first state to the second state to bring the fine uneven structure of the film mold into contact with the substrate, and bonding the film mold to the substrate via the resin composition using the rollers of the second suction unit, thereby transferring the fine uneven structure of the film mold to the resin composition.

Description

Technical Field

[0001] The present invention relates to a method for manufacturing an antireflection body and a transfer device.

Background Art

[0002] An electronic device in which a sensor element is mounted on a mounting substrate is provided in, for example, a mobile terminal such as a smartphone, an automobile, a monitoring system, or the like. In an electronic device, in order to improve the sensitivity of the sensor element, the sensor element is covered with a cover glass having an antireflection function.

[0003] As a cover glass having an antireflection function, a cover glass provided with an antireflection layer made of resin having a fine uneven structure has been developed. As a technique for forming such a fine uneven structure, for example, in Patent Document 1, a fine structure pattern having a fine uneven pattern is pressed vertically against a photocurable resin dropped on a substrate to spread the photocurable resin, and then the photocurable resin is irradiated with light to be hardened.

Prior Art Documents

Patent Documents

[0004]

Patent Document 1

Summary of the Invention

Problems to be Solved by the Invention

[0005] However, in the conventional technique of pressing a mold vertically from above an uncured resin composition as described in Patent Document 1 above, air bubbles and dust are likely to be mixed into the resin composition. For this reason, in the conventional technique, there has been a problem that variations occur in the film thickness in the plane of the antireflection layer.

[0006] Therefore, the present invention has been made in view of the above problems, and the object of the present invention is to provide a method for manufacturing an anti-reflective body and a transfer apparatus that can reduce variations in the in-plane film thickness of the anti-reflective layer. [Means for solving the problem]

[0007] To solve the above problems, according to one aspect of the present invention, A method for manufacturing an anti-reflective material, comprising manufacturing an anti-reflective material using a lamination transfer device, The transfer device is, First adsorption unit and The second adsorption unit, A rotation mechanism rotates the second adsorption unit around a pivot axis between a first state in which the adsorption surface of the second adsorption unit faces upward and a second state in which the adsorption surface of the second adsorption unit faces downward and faces the adsorption surface of the first adsorption unit, Equipped with, The second adsorption unit is, A flexible adsorption sheet is provided on the adsorption surface of the second adsorption unit, A roller is positioned inside the suction sheet and is configured to be movable in directions perpendicular and parallel to the suction surface of the second suction unit. It has, The method for manufacturing the anti-reflective body is as follows: A first step of placing the anti-reflective substrate on the adsorption surface of the first adsorption unit, A second step involves applying an uncured resin composition onto the surface of the substrate, A third step involves placing a film mold having a fine uneven structure on the adsorption sheet of the second adsorption unit in the first state, A fourth step involves rotating the second suction unit from the first state to the second state using the rotation mechanism, thereby bringing the fine uneven structure of the film mold adsorbed by the second suction unit and the substrate adsorbed by the first suction unit into opposition. A fifth step involves extending the roller of the second suction unit toward the first suction unit, pressing the film mold toward the substrate via the suction sheet with the roller, and moving the roller from one side of the substrate to the other while rotating it, thereby spreading the resin composition between the substrate and the film mold, and bonding the film mold to the substrate via the resin composition, thereby transferring the fine uneven structure of the film mold to the resin composition. A method for manufacturing an anti-reflective material is provided, including the following.

[0008] A sixth step is to release the film mold from the second suction unit by the second suction unit, and then rotate the second suction unit from the second state to the first state using the rotation mechanism, thereby peeling the film mold attached to the substrate from the suction surface of the second suction unit. A seventh step involves curing the resin composition while the film mold is bonded to the substrate via the resin composition, An eighth step of peeling the film mold from the cured product of the resin composition, It may also include the following:

[0009] The process may further include a step of performing a silane coupling treatment on the substrate prior to the first step.

[0010] The process further includes, prior to the first step, attaching a protective film to the back surface of the substrate, In the first step, the substrate to which the protective film is attached may be placed on the suction surface of the first suction unit with the back side facing downwards.

[0011] In the fifth step described above, The pressing force of the roller is 0.1 MPa or more and 0.5 MPa or less. The movement speed of the roller (transfer speed: lamination speed) is 5 mm / s or more and 100 mm / s or less. The hardness of the roller may be 40 or more and 90 or less in Shore A hardness.

[0012] The root mean square deviation Rms of the wavefront aberration in the plane of the antireflection body may be λ / 4 or less.

[0013] The thickness of the cured product of the resin composition of the antireflection body may be 0.5 μm or more and 2 μm or less.

[0014] The optical loss of the antireflection body may be 0.3% or less.

[0015] The standard deviation of the in-plane distribution of part or all of the root mean square deviation Rms of the wavefront aberration in the plane of the antireflection body, the thickness of the cured product of the resin composition of the antireflection body, the optical loss of the antireflection body, and the transmittance of the antireflection body may be 0.1 or less.

[0016] In order to solve the above problems, according to one aspect of the present invention, A laminating transfer device for transferring the fine concavo-convex structure of a film mold to a resin composition applied on a substrate of an antireflection body, A first adsorption unit, A second adsorption unit, A rotation mechanism for rotating the second adsorption unit around a rotation axis between a first state in which the adsorption surface of the second adsorption unit faces upward and a second state in which the adsorption surface of the second adsorption unit faces downward and faces the adsorption surface of the first adsorption unit, Comprising, The second adsorption unit, An adsorption sheet provided on the adsorption surface of the second adsorption unit and having flexibility, A roller disposed inside the adsorption sheet and configured to be movable in a direction perpendicular and parallel to the adsorption surface of the second adsorption unit, Having, The first adsorption unit adsorbs the substrate disposed on the adsorption surface, The second adsorption unit in the first state adsorbs the film mold placed on the adsorption sheet, The rotation mechanism rotates the second suction unit from the first state to the second state, thereby bringing the fine uneven structure of the film mold adsorbed by the second suction unit and the substrate adsorbed by the first suction unit facing each other. A transfer apparatus is provided, wherein the second suction unit extends its roller toward the first suction unit, and while pressing the film mold toward the substrate via the suction sheet with the roller, rotates the roller and moves it from one side of the substrate to the other, thereby spreading the resin composition between the substrate and the film mold, and bonding the film mold to the substrate via the resin composition, thereby transferring the fine uneven structure of the film mold to the resin composition. [Effects of the Invention]

[0017] As described above, the present invention makes it possible to reduce variations in the film thickness within the plane of the anti-reflective layer. [Brief explanation of the drawing]

[0018] [Figure 1] This is a schematic cross-sectional view showing an anti-reflective body according to the first embodiment of the present invention. [Figure 2] This is a schematic diagram showing the first state of the transfer apparatus according to the first embodiment. [Figure 3] This is a schematic diagram showing a second state of the transfer apparatus according to the first embodiment. [Figure 4] This is an exploded perspective view showing the first adsorption unit of the transfer apparatus according to the first embodiment. [Figure 5] This is an exploded perspective view showing the second adsorption unit in the first state of the transfer apparatus according to the first embodiment. [Figure 6] This is a flowchart illustrating the method for manufacturing an anti-reflective body according to the first embodiment. [Figure 7]This is a process diagram illustrating the cleaning and pretreatment process, the silane coupling treatment process, and the protection process according to the first embodiment. [Figure 8] This is a process diagram illustrating the second, fourth, and fifth steps according to the first embodiment. [Figure 9] This is a diagram illustrating the details of the fifth step according to the first embodiment. [Figure 10] This is a process diagram illustrating the seventh and eighth steps according to the first embodiment. [Figure 11] This is a flowchart illustrating the second step according to the second embodiment of the present invention. [Figure 12] This is a process diagram illustrating steps (1), (2), and (3) according to the second embodiment. [Figure 13] This figure illustrates the method for applying the uncured resin composition in the second step according to an example of the second embodiment. [Modes for carrying out the invention]

[0019] Preferred embodiments of the present invention will be described in detail below with reference to the attached drawings. In this specification and drawings, components having substantially the same functional configuration are denoted by the same reference numerals, and redundant descriptions will be omitted.

[0020] [First Embodiment] [1. Structure of the anti-reflective material] First, the configuration of the anti-reflective body 1 according to the first embodiment of the present invention will be described with reference to Figure 1. Figure 1 is a schematic cross-sectional view showing the anti-reflective body 1 according to this embodiment.

[0021] As shown in Figure 1, the anti-reflective body 1 comprises, for example, a substrate 10 and an anti-reflective layer 11. The anti-reflective layer 11 is provided on the substrate 10. The anti-reflective layer 11 has a fine uneven structure 12 on its surface. The fine uneven structure 12 has a plurality of fine protrusions 13 or recesses 14 arranged at a pitch of visible light wavelength (for example, 380 nm or more and 830 nm or less).

[0022] The substrate 10 constitutes the base material for the anti-reflective body 1. The substrate 10 is formed of, for example, a transparent material. "Transparent" means that the transmittance of light having wavelengths belonging to the visible light range (for example, 380 nm or more and 830 nm or less) is high, and for example, the visible light transmittance may be 70% or more, preferably 90% or more. The visible light transmittance can be measured by a spectrophotometer. The measurement results can be calculated, for example, according to JIS R 3106:1998, by calculating the transmittance from wavelengths from 380 nm to 900 nm, and the visible light transmittance can be calculated as the average of the transmittances in these wavelength ranges. The substrate 10 is formed of, for example, a transparent material such as alkali-free glass, borosilicate glass, quartz, or sapphire. The substrate 10 is, for example, a glass substrate. The shape of the substrate 10 is not limited, but for example, it may be circular or rectangular.

[0023] The anti-reflective layer 11 is a layer laminated on the substrate 10. The anti-reflective layer 11 is formed of a resin. The resin is preferably transparent and transmits energy rays such as ultraviolet rays, infrared rays, and electron beams. Examples include energy ray curing resins, thermoplastic resins, and thermosetting resins, which are resins that harden when exposed to ultraviolet rays, infrared rays, or electron beams. The anti-reflective layer 11 is formed, for example, from a cured product of an uncured resin composition. The uncured resin composition includes, for example, an energy ray polymerization component and an energy ray polymerization initiator. The energy ray polymerization component includes, for example, an acrylate monomer.

[0024] Furthermore, a micro-textured structure 12 having fine irregularities (protrusions 13 and recesses 14) is formed on the surface of the anti-reflective layer 11. The protrusions 13 and recesses 14 of the micro-textured structure 12 are arranged in the X and Y directions on the surface 10A of the substrate 10.

[0025] The micro-textured structure 12 may be, for example, a structure having nano-order fine irregularities formed on the surface of the substrate 10 (a so-called moth-eye structure). The pitch (average period) of the irregularities in the micro-textured structure 12 is less than or equal to the wavelength of visible light. The micro-textured structure 12 has the function of preventing light reflection on the surface of the anti-reflective body 1 (anti-reflective function). By providing such a micro-textured structure 12, the anti-reflective body 1 acquires an anti-reflective function.

[0026] The micro-textured surface 12 is provided on at least one surface of the substrate 10. In the example shown in Figure 1, the micro-textured surface 12 is provided only on one surface of the substrate 10 (i.e., surface 10A). However, the example is not limited to this, and for example, the micro-textured surface 12 may be provided on both surfaces of the substrate 10 (i.e., surface 10A and back surface 10B).

[0027] The micro-textured structure 12 has a plurality of protrusions 13 and a plurality of recesses 14. The protrusions 13 are projection-like structures that protrude perpendicularly from the surface of the substrate 10. The recesses 14 are the recessed portions between adjacent protrusions 13. The size and arrangement pitch of the protrusions 13 are, for example, on the order of nanometers (tens of nanometers or more and hundreds of nanometers or less).

[0028] In order to exhibit the anti-reflective function of visible light, etc., by the micro-textured structure 12, the bumps of the micro-textured structure 12 are arranged on the surface of the substrate 10 at a pitch smaller than or equal to the wavelength of visible light. In other words, the pitch of the multiple protrusions 13 constituting the micro-textured structure 12 is smaller than or equal to the wavelength of visible light. For example, if the wavelength range of visible light (i.e., the visible light range) is, for example, 380 nm or more and 830 nm or less, then the pitch is 380 nm or less.

[0029] By providing a micro-rough structure 12 consisting of multiple protrusions 13 arranged at the minute pitch described above on the surface of the anti-reflective layer 11, a moth-eye structure with excellent visible light anti-reflection properties can be formed on the surface of the anti-reflective body 1. This creates an effective refractive index gradient at the interface between the anti-reflective layer 11 and the outside air. Therefore, light (e.g., visible light) incident on the surface of the anti-reflective body 1 and passing through the micro-rough structure 12 is gently refracted, and surface reflection is suppressed.

[0030] Furthermore, as shown in Figure 1, the fine uneven structure 12 may be formed only on one surface (surface 10A) of the substrate 10, and not on the other surface (back surface 10B). This suppresses the reflection of incident light on surface 10A of the substrate 10, and suppresses the reflection of incident light on one surface of the anti-reflective body 1.

[0031] Furthermore, although not shown in the figures, if a fine uneven structure 12 is formed on both surfaces of the substrate 10 (front surface 10A and back surface 10B), the reflection of incident and outgoing light on the front surface 10A and back surface 10B of the substrate 10 can be suppressed. Although not shown in the figures, the fine uneven structure 12 may be provided on one surface of the substrate 10, and a multilayer anti-reflective film may be provided on the other surface.

[0032] [2. Method for manufacturing an anti-reflective material] Next, the method for manufacturing the anti-reflective body 1 according to this embodiment will be described with reference to Figures 2 to 10. In the method for manufacturing the anti-reflective body 1 according to this embodiment, the anti-reflective body 1 is manufactured using a lamination-type transfer device 100. Here, first, an overview of the transfer device 100 will be described, followed by a detailed description of the method for manufacturing the anti-reflective body 1 according to this embodiment.

[0033] [2.1. Overview of the Transfer Device] Figure 2 is a schematic diagram showing the first state of the transfer apparatus 100 according to this embodiment. Figure 3 is a schematic diagram showing the second state of the transfer apparatus 100 according to this embodiment. Figure 4 is an exploded perspective view showing the first adsorption unit 110 of the transfer apparatus 100 according to this embodiment. Figure 5 is an exploded perspective view showing the second adsorption unit 120 in the first state of the transfer apparatus 100 according to this embodiment. Note that in Figures 3 to 5, the first adsorption / desorption device 118 and the second adsorption / desorption device 128 are omitted for ease of understanding.

[0034] As shown in Figures 2 and 3, the transfer apparatus 100 according to this embodiment comprises a first adsorption unit 110, a second adsorption unit 120, and a rotation mechanism 150.

[0035] The first suction unit 110 has a suction surface 110a. A substrate 10 is placed on the suction surface 110a. The first suction unit 110 adsorbs the substrate 10 placed on the suction surface 110a.

[0036] The second suction unit 120 has an suction surface 120a. A film mold 50 is placed on the suction surface 120a. The second suction unit 120 adsorbs the film mold 50 placed on the suction surface 120a.

[0037] The film mold 50 has a fine uneven structure 52. The pitch between the multiple protrusions (or the pitch between the multiple recesses) of the fine uneven structure 52 of the film mold 50 corresponds to the average period of the fine uneven structure 12 of the anti-reflective layer 11 of the anti-reflective body 1. The film mold 50 is preferably formed from a material that can transmit energy rays (e.g., ultraviolet rays). The film mold 50 is preferably flexible. In addition to flexibility, the film mold 50 may also be stretchable. A release agent may be applied to the surface on which the fine uneven structure 52 of the film mold 50 is formed. The release agent may include, for example, a fluorine compound.

[0038] In this embodiment, instead of the film mold 50, a protective film 20 (not shown in Figure 2; see Figure 7) is placed on the suction surface 120a. The second suction unit 120 adsorbs the protective film 20 placed on the suction surface 120a. The protective film 20 protects one surface of the substrate 10.

[0039] The protective film 20 in this embodiment may consist of a single layer of substrate (protective film substrate), or it may further include an adhesive layer in addition to the protective film substrate. A resin film is preferred as the protective film substrate, and more specifically, a film mainly composed of polyolefins such as polyethylene and polypropylene, polyesters such as polyethylene terephthalate and polyethylene naphthalate, polyimide, or polycarbonate is preferred. When used as a single layer of protective film substrate, a self-adhesive film is preferred. The components of the adhesive layer are not particularly limited, but examples include rubber-based adhesives, acrylic-based adhesives, polyvinyl ether-based adhesives, urethane-based adhesives, and silicone-based adhesives. More specifically, examples include acrylic resins, urethane-based resins, ethylene-vinyl acetate copolymer resins, and polyolefin-based resins.

[0040] The rotation mechanism 150 rotates the second suction unit 120 between the first and second states around the rotation axis 152, as shown by the white arrows in Figures 2 and 3. The first state, shown in Figure 2, is when the suction surface 120a of the second suction unit 120 is facing upward (in the +Z direction in Figure 2). As shown in Figure 3, the second state is when the suction surface 120a of the second suction unit 120 is facing downward (in the -Z direction in Figure 3), and the suction surface 120a of the second suction unit 120 and the suction surface 110a of the first suction unit 110 are facing each other.

[0041] The rotation mechanism 150 includes, for example, an arm 154 and an actuator (not shown). The arm 154 is connected to the end of the second suction unit 120 on the first suction unit 110 side. The arm 154 is provided with a pivot shaft 152. The actuator rotates the arm 154 around the pivot shaft 152, thereby rotating the second suction unit 120 between a first state and a second state.

[0042] [2.1.1. Configuration of the first adsorption unit] As shown in Figures 2 to 4, the first adsorption unit 110 includes, for example, a first housing 112, a first lid 114, a first adsorption sheet 116, and a first adsorption / desorption device 118. The first housing 112 is, for example, box-shaped. The first housing 112 is installed on the stand 102 such that the opening 112a of the first housing 112 faces upward (in the +Z direction in Figures 2 to 4).

[0043] The first lid 114 seals the opening 112a of the first housing 112. The suction surface 110a of the first suction unit 110 is provided on the upper surface of the first lid 114 (the surface in the +Z direction in Figures 2 to 4). An opening 114a is also formed on the upper surface of the first lid 114. The opening 114a is smaller than the upper surface of the first lid 114.

[0044] The first suction sheet 116 is provided so as to cover the opening 114a. In other words, the first suction sheet 116 is provided on the suction surface 110a. The first suction sheet 116 is made of a harder material than the second suction sheet 126, which will be described later. The substrate 10 is placed on the first suction sheet 116.

[0045] The first adsorption / desorption device 118 adsorbs the substrate 10 onto the first adsorption sheet 116. The first adsorption / desorption device 118 also releases the substrate 10 from the first adsorption sheet 116.

[0046] The first adsorption / desorption device 118, for example, uses vacuum suction to adsorb the substrate 10 onto the first adsorption sheet 116, and to release the substrate 10 from the first adsorption sheet 116. In this case, the first adsorption sheet 116 is composed of, for example, a mesh-like sheet having a plurality of holes. Furthermore, when the first adsorption / desorption device 118 adsorbs the substrate 10 by vacuum suction, it is preferable that the first adsorption / desorption device 118 includes a first suction pump that sucks air from inside the first housing 112. When the first suction pump is operated, an airflow is generated from the outside into the first housing 112 through the plurality of holes in the first adsorption sheet 116. As a result, the substrate 10 placed on the first adsorption sheet 116 is adsorbed onto the first adsorption sheet 116. When the first suction pump is stopped, air flows into the first housing 112 from the outside through the plurality of holes in the first adsorption sheet 116. As a result, the adsorption of the substrate 10 to the first adsorption sheet 116 is released.

[0047] The first adsorption / desorption device 118 only needs to be able to adsorb the substrate 10 onto the first adsorption sheet 116 and release the adsorption of the substrate 10 onto the first adsorption sheet 116, and the adsorption / desorption method by the first adsorption / desorption device 118 is not limited to vacuum adsorption. For example, the first adsorption / desorption device 118 may use static electricity to adsorb the substrate 10 onto the first adsorption sheet 116 and release the adsorption of the substrate 10 onto the first adsorption sheet 116 (electrostatic adsorption).

[0048] [2.1.2. Configuration of the second adsorption unit] As shown in Figures 2, 3, and 5, the second suction unit 120 includes, for example, a second housing 122, a second lid 124, a second suction sheet 126, a second suction / desorption device 128, and a roller 130. The second housing 122 is, for example, box-shaped. In the first state, the second housing 122 is installed on the stand 102 such that the opening 122a of the second housing 122 faces upward (in the +Z direction in Figures 2 and 5).

[0049] The second lid 124 seals the opening 122a of the second housing 122. The suction surface 120a of the second suction unit 120 is provided on the upper surface of the second lid 124 in the first state (the surface in the +Z direction in Figures 2 and 5). Also, an opening 124a is formed on the upper surface of the second lid 124 in the first state. The opening 124a is smaller than the upper surface of the second lid 124.

[0050] The second suction sheet 126 (suction sheet) is provided so as to close the opening 124a. In other words, the second suction sheet 126 is provided on the suction surface 120a. Preferably, the second suction sheet 126 is a flexible sheet. In addition to flexibility, the second suction sheet 126 may also be stretchable. A protective film 20 or film mold 50 is placed on the second suction sheet 126.

[0051] The second adsorption / desorption device 128 attaches the protective film 20 or film mold 50 to the second suction sheet 126. The second adsorption / desorption device 128 also releases the protective film 20 or film mold 50 from the second suction sheet 126.

[0052] The second suction / desorption device 128, for example, uses vacuum suction to adsorb the protective film 20 or film mold 50 onto the second suction sheet 126, or to release the suction of the protective film 20 or film mold 50 from the second suction sheet 126. In this case, the second suction sheet 126 is composed of, for example, a mesh-like sheet having multiple holes. Furthermore, when the second suction / desorption device 128 adsorbs the protective film 20 or film mold 50 using vacuum suction, it is preferable that the second suction / desorption device 128 includes a second suction pump that sucks air into the second housing 122. When the second suction pump is operated, air flows from the outside into the second housing 122 through the multiple holes in the second suction sheet 126. As a result, the protective film 20 or film mold 50 placed on the second suction sheet 126 is adsorbed onto the second suction sheet 126. When the second suction pump is stopped, air flows into the second housing 122 from the outside through the multiple holes in the second suction sheet 126. This releases the protective film 20 or film mold 50 from adsorption to the second adhesive sheet 126.

[0053] Furthermore, the second adsorption / desorption device 128 only needs to be able to adsorb the protective film 20 or film mold 50 onto the second adsorption sheet 126, or release the adsorption of the protective film 20 or film mold 50 onto the second adsorption sheet 126, and the adsorption / desorption method by the second adsorption / desorption device 128 is not limited to vacuum adsorption. For example, the second adsorption / desorption device 128 may adsorb the protective film 20 or film mold 50 onto the second adsorption sheet 126 or release the adsorption of the protective film 20 or film mold 50 onto the second adsorption sheet 126 by electrostatics (electrostatic adsorption).

[0054] The roller 130 is positioned inside the second suction sheet 126. In this embodiment, the roller 130 is positioned inside the second housing 122. The roller 130 is a cylinder extending in the ±Y directions in Figures 2, 3, and 5. The length of the roller 130 (length in the Y direction in Figures 2, 3, and 5) is less than the length of the opening 124a of the second lid 124 (length in the Y direction in Figures 2, 3, and 5).

[0055] The hardness of roller 130 is, for example, 40 or more and 90 or less on the Shore A hardness scale, preferably 60 or more and 90 or less, and more preferably 80 or more and 90 or less. The Shore A hardness is calculated, for example, based on JIS K 6253-3:2012 "Vulcanized rubber and thermoplastic rubber - Method for determining hardness - Part 3: Durometer hardness".

[0056] The roller 130 is configured to be movable in a direction perpendicular to the suction surface 120a of the second suction unit 120 (±Z direction in Figures 2, 3, and 5) and in a direction parallel to it (±X direction in Figures 2, 3, and 5) by an actuator (not shown).

[0057] [2.2. Details of the manufacturing method for anti-reflective materials] Figure 6 is a flowchart illustrating the manufacturing method of the anti-reflective body 1 according to this embodiment. Figure 7 is a process diagram illustrating the washing and pretreatment step S110, the silane coupling treatment step S120, and the protection step S130 according to this embodiment. Figure 8 is a process diagram illustrating the second step S150, the fourth step S170, and the fifth step S180 according to this embodiment. Figure 9 is a diagram illustrating the details of the fifth step S180 according to this embodiment. Figure 10 is a process diagram illustrating the seventh step S200 and the eighth step S210 according to this embodiment.

[0058] As shown in Figure 6, the method for manufacturing the anti-reflective body 1 according to this embodiment includes, for example, a first step S140, a second step S150, a third step S160, a fourth step S170, and a fifth step S180. The method for manufacturing the anti-reflective body 1 according to this embodiment may also include a sixth step S190, a seventh step S200, and an eighth step S210 after the fifth step S180. Furthermore, the method for manufacturing the anti-reflective body 1 according to this embodiment may include a silane coupling treatment step S120 before the first step S140. Furthermore, the method for manufacturing the anti-reflective body 1 according to this embodiment may include a protection step S130 before the first step S140. Furthermore, the method for manufacturing the anti-reflective body 1 according to this embodiment may include a washing and pre-treatment step S110 before the silane coupling treatment step S120. The protection step S130, the first step S140, the second step S150, the third step S160, the fourth step S170, the fifth step S180, and the sixth step S190 are performed, for example, using the transfer apparatus 100 described above. Each step will be described below.

[0059] [2.2.1. Washing and pretreatment process S110] First, the substrate 10 is cleaned. Then, as shown in Figure 7, the surface of the substrate 10 (for example, the front surface 10A and the back surface 10B) is subjected to pretreatment. Examples of pretreatment include plasma surface treatment, corona discharge surface treatment, blast surface treatment, excimer surface treatment, flame surface treatment, etching, and polishing.

[0060] [2.2.2. Silane Coupling Process S120] After the cleaning and pretreatment step S110, the silane coupling treatment step S120 is performed. In the silane coupling treatment step S120, the surface of the substrate 10 (for example, the front surface 10A and the back surface 10B) is subjected to silane coupling treatment. The silane coupling treatment is a treatment that modifies the surface of the substrate 10 using a silane coupling agent. The silane coupling treatment includes, for example, a vapor treatment in which the vapor of the silane coupling agent is deposited onto the surface of the substrate 10. Alternatively, the silane coupling treatment may be performed by spin-coating the surface of the substrate 10 with the silane coupling agent and heating it. Examples of silane coupling agents are the products "KBM5103", "KBM603", "KBM403", and "X-12-1048" manufactured by Shin-Etsu Chemical Co., Ltd.

[0061] [2.2.3. Protection process S130] After the silane coupling treatment process S120, the protection process S130 is performed. In the protection process S130, a protective film 20 is attached to one surface of the substrate 10 (for example, the back surface 10B).

[0062] In the protection step S130, first, the second adsorption unit 120 is rotated by the rotation mechanism 150 of the transfer device 100 to the first state. Then, the substrate 10 is placed on the adsorption surface 110a (first adsorption sheet 116) of the first adsorption unit 110. At this time, the substrate 10 is placed on the adsorption surface 110a of the first adsorption unit 110 so that the back surface 10B of the substrate 10 faces upward (in the +Z direction in Figure 2). Then, the first adsorption / desorption device 118 adsorbs the substrate 10 onto the first adsorption sheet 116.

[0063] Next, the protective film 20 is placed on the second suction sheet 126 of the second suction unit 120 in the first state. At this time, the protective film 20 is placed on the second suction sheet 126 so that the adhesive surface on which the adhesive layer is formed faces upwards (in the +Z direction in Figure 2). Then, the second suction / desorption device 128 is used to adsorb the protective film 20 onto the second suction sheet 126.

[0064] Next, the rotation mechanism 150 rotates the second suction unit 120 from the first state to the second state, so that the adhesive surface of the protective film 20 adsorbed by the second suction unit 120 faces the back surface 10B of the substrate 10 adsorbed by the first suction unit 110.

[0065] Then, the roller 130 of the second suction unit 120 is extended toward the first suction unit 110 in the -Z direction in Figures 3 and 7, and the roller 130 presses the protective film 20 toward the substrate 10 via the second suction sheet 126, while rotating the roller 130 and moving it from one side of the substrate 10 to the other (in the +X direction in Figures 3 and 7). As a result, the protective film 20 is attached to the back surface 10B of the substrate 10.

[0066] Once the protective film 20 has been attached to the back surface 10B of the substrate 10, the second suction / desorption device 128 releases the suction of the protective film 20 by the second suction unit 120. Then, the rotating mechanism 150 rotates the second suction unit 120 from the second state to the first state, thereby peeling the protective film 20 attached to the substrate 10 from the suction surface 120a of the second suction unit 120.

[0067] [2.2.4. 1st process S140] After the protection process S130 is performed, the first process S140 is carried out. In the first process S140, first, the suction of the substrate 10 by the first adsorption / desorption device 118 is released. Then, the substrate 10 with the protective film 20 attached is placed on the adsorption surface 110a of the first adsorption unit 110 with the back side 10B (protective film 20 side) facing downwards. The substrate 10 is then adsorbed onto the first adsorption sheet 116 by the first adsorption / desorption device 118.

[0068] [2.2.5.Second process S150] After the first step S140 is performed, the second step S150 is carried out. In the second step S150, the uncured resin composition 30 is applied to the surface 10A of the substrate 10. As shown in Figure 8, for example, in the second step S150, the uncured resin composition 30 is applied to the surface 10A of the substrate 10 using a dispenser 160. As the dispenser 160, for example, the product name "SRS-S403" manufactured by San-ei Tech Co., Ltd. can be used. In this embodiment, the application pattern of the uncured resin composition 30 is not limited as long as the resin composition 30 can be applied evenly to the surface 10A of the substrate 10.

[0069] [2.2.6. Third step S160] After the second step S150 is performed, the third step S160 is carried out. In the third step S160, a film mold 50 having a fine uneven structure 52 is placed on the second adsorption sheet 126 of the second adsorption unit 120 in the first state. At this time, the film mold 50 is placed on the second adsorption sheet 126 so that the surface on which the fine uneven structure 52 is formed faces upward (the +Z direction in Figure 2). Then, the second adsorption / desorption device 128 adsorbs the film mold 50 onto the second adsorption sheet 126.

[0070] [2.2.7. 4th step S170] After the third step S160 is performed, the fourth step S170 is carried out. In the fourth step S170, the second suction unit 120 is rotated from the first state to the second state by the rotation mechanism 150, so that the fine uneven structure 52 of the film mold 50 adsorbed by the second suction unit 120 and the surface 10A of the substrate 10 adsorbed by the first suction unit 110 are facing each other, as shown in Figure 8.

[0071] [2.2.8. 5th step S180] After the fourth step S170 is performed, the fifth step S180 is carried out. In the fifth step S180, as shown in the upper diagrams of Figures 8 and 9, the roller 130 of the second suction unit 120 is extended toward the first suction unit 110 in the -Z direction in Figures 8 and 9, and the roller 130 presses the film mold 50 toward the substrate 10 via the second suction sheet 126, while rotating the roller 130 and moving it from one side to the other side of the substrate 10 (in the +X direction in Figure 9), as shown in the lower diagram of Figure 9. This spreads the resin composition 30 between the substrate 10 and the film mold 50, and the film mold 50 is bonded to the substrate 10 via the resin composition 30, transferring the fine uneven structure 52 of the film mold 50 to the resin composition 30.

[0072] In step S180, the pressing force of the roller 130 is, for example, 0.1 MPa or more and 0.5 MPa or less, preferably 0.2 MPa or more and 0.5 MPa or less, and more preferably 0.3 MPa or more and 0.45 MPa or less.

[0073] Furthermore, in the fifth step S180, the moving speed of the roller 130 is, for example, 5 mm / s (seconds) or more and 100 mm / s or less, preferably 5 mm / s or more and 50 mm / s or less, more preferably 5 mm / s or more and 30 mm / s or less, and even more preferably 5 mm / s or more and 10 mm / s or less.

[0074] Furthermore, the movement speed of the roller 130 can also be described as the transfer speed of the fine uneven structure 52 of the film mold 50 to the resin composition 30. Alternatively, the movement speed of the roller 130 can also be described as the lamination speed of the film mold 50 to the resin composition 30.

[0075] [2.2.9. 6th step S190] After the fifth step S180 is performed, the sixth step S190 is carried out. In the sixth step S190, first, the second suction / desorption device 128 releases the suction of the film mold 50 by the second suction unit 120. Then, the rotating mechanism 150 rotates the second suction unit 120 from the second state to the first state, thereby peeling the film mold 50 attached to the substrate 10 from the suction surface 120a (second suction sheet 126) of the second suction unit 120.

[0076] [2.2.10. 7th step S200] After the sixth step S190 is performed, the seventh step S200 is carried out. The seventh step S200 is performed by a curing apparatus (not shown). In the seventh step S200, as shown in Figure 10, the resin composition 30 is cured while the film mold 50 is bonded to the substrate 10 via the resin composition 30. As described above, in this embodiment, the film mold 50 is formed of a material that can transmit energy rays. Therefore, as shown in Figure 10, the resin composition 30 is cured by irradiating the resin composition 30 with energy rays from above the film mold 50 while the film mold 50 is bonded to the substrate 10 via the resin composition 30.

[0077] [2.2.11. 8th step S210] After the seventh step S200 is performed, the eighth step S210 is carried out. In the eighth step S210, the film mold 50 is peeled off from the cured resin composition. In this way, an anti-reflective layer 11 is formed on the surface 10A of the substrate 10, which is made of the cured resin composition and has a fine uneven structure 12 in which the average period of the unevenness is less than or equal to the wavelength of visible light.

[0078] In this embodiment, the protective film 20 may be peeled off from the back surface 10B of the substrate 10, and then the above-described protection step S130 may be performed on the front surface 10A (anti-reflective layer 11) of the substrate 10, and the above-described first step S140 to eighth step S210 may be performed on the back surface 10B of the substrate 10. This makes it possible to manufacture an anti-reflective body 1 in which the anti-reflective layer 11 is formed on both surfaces of the substrate 10 (front surface 10A and back surface 10B). However, the invention is not limited to this example, and the anti-reflective layer 11 may be formed on only one surface of the substrate 10.

[0079] [3. Characteristics of anti-reflective materials] Next, the characteristics of the anti-reflective body 1 according to this embodiment will be described. The anti-reflective body 1 according to this embodiment has, for example, the following characteristics (A) to (C).

[0080] (A) Mean squared deviation of wavefront aberration Rms The mean square deviation Rms of wavefront aberration in the plane of the anti-reflective body 1 is, for example, λ / 4 or less, preferably 0.1λ or less, more preferably 0.06λ or less, and even more preferably 0.04λ or less. Furthermore, the mean square deviation Rms of the average wavefront aberration in the plane of the anti-reflective body 1 is, for example, 0.01λ or more. The wavefront aberration is transmitted wavefront aberration. A smaller mean square deviation Rms of wavefront aberration indicates better flatness. "λ" is the wavelength of light used when measuring wavefront aberration, for example, 633 nm. Wavefront aberration is calculated, for example, based on JIS C5935:2005 "Test Method for Optical Transmission Lenses". Wavefront aberration is measured, for example, by a laser interferometer "Verifire® 6" manufactured by Zygo Corporation.

[0081] Furthermore, the standard deviation of the in-plane distribution of the mean squared deviation Rms of wavefront aberration within the plane of the anti-reflective body 1 is, for example, 0.1 or less, preferably 0.05 or less, more preferably 0.025 or less, and even more preferably 0.010 or less. The standard deviation of the in-plane distribution of the mean squared deviation Rms of wavefront aberration within the plane of the anti-reflective body 1 is, for example, 0.0001 or more.

[0082] (B) Thickness of the cured resin composition The thickness (film thickness) of the cured resin composition of the anti-reflective body 1 is, for example, 0.5 μm or more and 2 μm or less, preferably 0.75 μm or more and 1.5 μm or less, and more preferably 1.00 μm or more and 1.25 μm or less. The thickness of the cured resin composition of the anti-reflective body 1, i.e., the film thickness T of the anti-reflective layer 11, is the length from the surface 10A of the substrate 10 to the top of the protrusion 13 in the anti-reflective layer 11 (see Figure 1).

[0083] The standard deviation of the thickness of the cured product of the resin composition of the anti-reflective body 1 is, for example, 0.2 or less, preferably 0.1 or less. The standard deviation of the thickness of the cured product of the resin composition of the anti-reflective body 1 is, for example, 0.0001 or more.

[0084] (C) Optical Loss The optical loss of the anti-reflective body 1 is, for example, 0.30% or less, preferably 0.25% or less, and more preferably 0.20% or less. Furthermore, the optical loss of the anti-reflective body 1 is, for example, greater than 0.0%. The optical loss can be calculated using the following formula (1). Optical loss [%] = 100 [%] - (Total light transmittance [%] + Reflectance [%]...Equation (1)) In equation (1) above, the total light transmittance and reflectance are calculated, for example, based on JIS K7375:2008 "Plastics - Method for determining total light transmittance and total light reflectance". The total light transmittance and reflectance are measured, for example, by a "UV-Vis-Near-Infrared Spectrophotometer V-770" manufactured by JASCO Corporation. The measurement wavelength is, for example, 400 nm to 1000 nm.

[0085] The standard deviation of the in-plane distribution of transmittance (total light transmittance) [%] of the anti-reflective material 1 is 0.12 or less, preferably 0.1 or less, more preferably 0.05 or less, and even more preferably 0.03 or less. The standard deviation of the in-plane distribution of transmittance (total light transmittance) [%] of the anti-reflective material 1 is, for example, 0.0001 or more.

[0086] Furthermore, the standard deviation of the in-plane distribution of optical loss of the anti-reflective body 1 is, for example, 0.1 or less, preferably 0.07 or less, more preferably 0.05 or less, and even more preferably 0.03 or less. The standard deviation of the in-plane distribution of optical loss of the anti-reflective body 1 is, for example, 0.0001 or more.

[0087] [4. Examples of anti-reflective coating applications] Next, we will describe an example of the application of the anti-reflective body 1 according to this embodiment.

[0088] The anti-reflective body 1 described above excels in anti-reflective function, uniformity of the film thickness T within the plane of the anti-reflective layer 11, and flatness within the plane of the anti-reflective layer 11. For this reason, the anti-reflective body 1 can be applied to cover glass covering the light-receiving surface of sensor elements such as image sensors and LiDAR. The image sensor is, for example, a visible light image sensor, an infrared image sensor, an ultraviolet image sensor, or an X-ray image sensor. The image sensor may be, for example, a CCD image sensor or a CMOS image sensor.

[0089] [5. Summary] The anti-reflective body 1 according to this embodiment has been described above.

[0090] The manufacturing method for the anti-reflective body 1 according to this embodiment, which uses a laminating transfer apparatus 100 to manufacture the anti-reflective body 1, comprises a first suction unit 110, a second suction unit 120, and a rotation mechanism 150 that rotates the second suction unit 120 around a rotation axis 152 between a first state in which the suction surface 120a of the second suction unit 120 faces upward and a second state in which the suction surface 120a of the second suction unit 120 faces downward and faces the suction surface 110a of the first suction unit 110. The second suction unit 120 has a flexible suction sheet 126 provided on the suction surface 120a of the second suction unit 120, and a roller 130 positioned inside the suction sheet 126 and configured to move in directions perpendicular and parallel to the suction surface 120a of the second suction unit 120. The method for manufacturing the anti-reflective body 1 is a first step S140 of placing the substrate 10 of the anti-reflective body 1 on the suction surface 110a of the first suction unit 110, and a second step of applying an uncured resin composition 30 to the surface of the substrate 10. Step S150, Step S160 is a third step in which a film mold 50 having a fine uneven structure 52 is placed on the suction sheet 126 of the second suction unit 120 in the first state, Step S170 is a fourth step in which the second suction unit 120 is rotated from the first state to the second state by the rotation mechanism 150 so that the fine uneven structure 52 of the film mold 50 adsorbed by the second suction unit 120 and the substrate 10 adsorbed by the first suction unit 110 are facing each other, and Step S170 is a fourth step in which the roller 130 of the second suction unit 120 is first adsorbed The fifth step S180 includes extending the film mold 50 toward the substrate 10 via the suction sheet 126 using the roller 130, and moving the roller 130 from one side to the other of the substrate 10 while rotating it, thereby spreading the resin composition 30 between the substrate 10 and the film mold 50, and bonding the film mold 50 to the substrate 10 via the resin composition 30, thereby transferring the fine uneven structure 52 of the film mold 50 to the resin composition 30.

[0091] Furthermore, the transfer apparatus 100 according to this embodiment is a lamination-type transfer apparatus 100 that transfers the fine uneven structure 52 of the film mold 50 to the resin composition 30 coated on the substrate 10 of the anti-reflective body 1, and comprises a first suction unit 110, a second suction unit 120, a first state in which the suction surface 120a of the second suction unit 120 faces upward, and a second state in which the suction surface 120a of the second suction unit 120 faces downward and faces the suction surface 110a of the first suction unit 110. The first suction unit 110 is located on the suction surface 110a. The first suction unit 110 is located on the suction surface 110a. The first suction unit 110 is located on the suction surface 110a. The first suction unit 110 is located on the suction surface 110a. The first suction unit 110 is located on the suction surface 110a. The second suction unit 120, in its first state, adsorbs the substrate 10 placed on the suction sheet 126, and the rotating mechanism 150 rotates the second suction unit 120 from the first state to the second state, so that the fine uneven structure 52 of the film mold 50 adsorbed by the second suction unit 120 and the substrate 10 adsorbed by the first suction unit 110 are facing each other. The second suction unit 120 then extends the roller 130 toward the first suction unit 110, and while the roller 130 presses the film mold 50 toward the substrate 10 via the suction sheet 126, it moves from one side to the other of the substrate 10 while rotating the roller 130, thereby spreading the resin composition 30 between the substrate 10 and the film mold 50, and bonding the film mold 50 to the substrate 10 via the resin composition 30, thereby transferring the fine uneven structure 52 of the film mold 50 to the resin composition 30.

[0092] The method for manufacturing the anti-reflective body 1 according to this embodiment uses a lamination-type transfer apparatus 100. Therefore, compared to the first conventional technique in which a mold is pressed vertically onto an uncured resin composition, the method for manufacturing the anti-reflective body 1 according to this embodiment can suppress the incorporation of air bubbles and dust into the resin composition 30. Therefore, the method for manufacturing the anti-reflective body 1 according to this embodiment can reduce variations in the film thickness T within the plane of the anti-reflective layer 11. Consequently, the method for manufacturing the anti-reflective body 1 according to this embodiment can improve the surface flatness of the anti-reflective layer 11. Surface flatness refers to the uniformity of the film thickness T of the entire anti-reflective layer 11. Furthermore, compared to the first conventional technique, the method for manufacturing the anti-reflective body 1 according to this embodiment allows for easier control of the film thickness.

[0093] Furthermore, in the first prior art, it was difficult to spread the resin composition to the edges of the substrate 10. In contrast, the method for manufacturing the anti-reflective body 1 according to this embodiment uses a laminating transfer device 100, which makes it possible to spread the resin composition 30 evenly from one side to the other of the substrate 10. Therefore, the method for manufacturing the anti-reflective body 1 according to this embodiment makes it possible to form a film of the resin composition 30 over the entire surface of the substrate 10, and to evenly transfer the fine uneven structure 52 of the film mold 50 to the resin composition 30 formed over the entire surface of the substrate 10. For this reason, the method for manufacturing the anti-reflective body 1 according to this embodiment can suppress uneven transfer to the resin composition 30 compared to the first prior art.

[0094] Furthermore, in the second conventional technology, which does not include a second suction unit 120 and a rotating mechanism 150, and uses a conventional lamination-type transfer device in which a film mold is placed on a substrate and a roller is pressed against the film mold, it was difficult to align the film mold and the substrate. In contrast, the transfer device 100 according to this embodiment can position the resin composition 30 on the substrate 10 and the film mold 50 facing each other in the vertical direction by rotating the second suction unit 120 without moving the first suction unit 110. Therefore, the transfer device 100 according to this embodiment can accurately and easily align the film mold 50 and the substrate 10. Moreover, in the transfer device 100 according to this embodiment, it is preferable that the rotating mechanism 150 is set so that the film mold 50 and the substrate 10 face each other in parallel. As a result, the transfer device 100 according to this embodiment can form a certain gap between the film mold 50 and the substrate 10 with high precision. Therefore, the transfer apparatus 100 according to this embodiment can spread the resin composition 30 to a uniform thickness from one side to the other of the substrate 10 using the roller 130. As a result, the transfer apparatus 100 according to this embodiment can achieve uniformity of the in-plane film thickness of the transferred resin composition 30 and improve the surface flatness of the transferred resin composition 30. Furthermore, since the transfer apparatus 100 according to this embodiment can easily adjust the gap between the substrate 10 and the film mold 50, it is possible to easily thin the resin composition 30.

[0095] Furthermore, in the transfer apparatus 100 according to this embodiment, the second adsorption unit 120 that adsorbs the film mold 50 is rotated, while the first adsorption unit 110 that adsorbs the substrate 10 coated with the resin composition 30 is not rotated. Therefore, the transfer apparatus 100 according to this embodiment can suppress the scattering of the resin composition 30 coated on the substrate 10. In addition, the transfer apparatus 100 according to this embodiment can prevent the substrate 10 from falling off.

[0096] Furthermore, it is preferable that the second suction sheet 126 of the transfer apparatus 100 according to this embodiment is flexible. This allows the transfer apparatus 100 according to this embodiment to deform the second suction sheet 126 to follow the roller 130 when transferring the fine uneven structure 52 of the film mold 50 to the resin composition 30.

[0097] Furthermore, it is preferable that the film mold 50 of the transfer apparatus 100 according to this embodiment is flexible. This allows the transfer apparatus 100 according to this embodiment to deform the film mold 50 in accordance with the roller 130, in addition to the second adsorption sheet 126, when transferring the fine uneven structure 52 of the film mold 50 to the resin composition 30. Therefore, the transfer apparatus 100 according to this embodiment can further suppress uneven transfer to the resin composition 30.

[0098] The method for manufacturing the anti-reflective body 1 according to this embodiment may further include: a sixth step S190 in which, after releasing the adsorption of the film mold 50 by the second adsorption unit 120, the second adsorption unit 120 is rotated from the second state to the first state by the rotation mechanism 150 to peel the film mold 50 attached to the substrate 10 from the adsorption surface 120a of the second adsorption unit 120; a seventh step S200 in which the resin composition 30 is cured while the film mold 50 remains attached to the substrate 10 via the resin composition 30; and an eighth step S210 in which the film mold 50 is peeled off the cured resin composition.

[0099] As a result, the manufacturing method of the anti-reflective body 1 according to this embodiment allows for the suitable formation of an anti-reflective layer 11 on the substrate 10.

[0100] The method for manufacturing the anti-reflective body 1 according to this embodiment may further include a step S120 in which a silane coupling treatment is performed on the substrate 10 before the first step S140.

[0101] As a result, in the manufacturing method of the anti-reflective body 1 according to this embodiment, the adhesion between the substrate 10 and the uncured resin composition 30 can be improved.

[0102] The method for manufacturing the anti-reflective body 1 according to this embodiment further includes a step S130 in which a protective film 20 is attached to the back surface 10B of the substrate 10 before the first step S140, and in the first step S140, the substrate 10 with the protective film 20 attached may be placed on the suction surface 110a of the first suction unit 110 with the back surface 10B facing downwards.

[0103] As a result, in the manufacturing method of the anti-reflective body 1 according to this embodiment, the back surface 10B of the substrate 10 can be protected, and the leakage of the uncured resin composition 30 to the back surface 10B of the substrate 10 can be suppressed. Therefore, in the manufacturing method of the anti-reflective body 1 according to this embodiment, a decrease in the surface flatness of the transferred resin composition 30 can be suppressed. In addition, by attaching the protective film 20 to the back surface 10B of the substrate 10, the substrate 10 can be supported.

[0104] In step S180 of the manufacturing method for the anti-reflective body 1 according to this embodiment, the pressing force of the roller may be 0.1 MPa or more and 0.5 MPa or less, the moving speed of the roller may be 5 mm / s or more and 100 mm / s or less, and the hardness of the roller may be 40 or more and 90 or less on the Shore A hardness scale.

[0105] As a result, the manufacturing method of the anti-reflective body 1 according to this embodiment can reduce the thickness of the anti-reflective layer 11. Furthermore, the manufacturing method of the anti-reflective body 1 according to this embodiment can produce an anti-reflective body 1 having a low mean square deviation Rms of wavefront aberration. Moreover, the manufacturing method of the anti-reflective body 1 according to this embodiment can produce an anti-reflective body 1 having low optical loss.

[0106] The mean squared deviation Rms of wavefront aberration in the plane of the anti-reflective material 1 may be less than or equal to λ / 4.

[0107] As a result, the method for manufacturing the anti-reflective body 1 according to this embodiment can produce an anti-reflective body 1 with better surface flatness.

[0108] The thickness of the cured resin composition of the anti-reflective material 1 may be 0.5 μm or more and 2 μm or less.

[0109] As a result, the manufacturing method of the anti-reflective body 1 according to this embodiment can form an anti-reflective layer 11 having stable optical properties.

[0110] The optical loss of the anti-reflective material 1 may be 0.3% or less.

[0111] As a result, the manufacturing method of the anti-reflective body 1 according to this embodiment can better achieve both anti-reflective function and light transmission function.

[0112] It is preferable that the mean square deviation Rms of the wavefront aberration in the plane of the anti-reflective body 1, the thickness of the cured resin composition of the anti-reflective body 1, the optical loss of the anti-reflective body 1, and the standard deviation of some or all of the in-plane distributions of the transmittance of the anti-reflective body 1 are 0.1 or less.

[0113] As a result, the manufacturing method of the anti-reflective body 1 according to this embodiment can further reduce in-plane variations in the flatness of the surface of the anti-reflective body 1. Furthermore, the manufacturing method of the anti-reflective body 1 according to this embodiment can further suppress in-plane variations in the film thickness T of the anti-reflective layer 11. In addition, the manufacturing method of the anti-reflective body 1 according to this embodiment can further achieve both anti-reflective function and light transmission function. Furthermore, the manufacturing method of the anti-reflective body 1 according to this embodiment can further improve the light transmission function.

[0114] [Second Embodiment] A method for manufacturing the anti-reflective body 1 according to a second embodiment of the present invention will be described with reference to Figures 11 and 12. Components substantially equivalent to those described in the first embodiment, such as the anti-reflective body 1 and the transfer apparatus 100, are denoted by the same reference numerals and their descriptions are omitted. Similarly, steps substantially equivalent to those described in the first embodiment for manufacturing the anti-reflective body 1 are denoted by the same reference numerals and their descriptions are omitted.

[0115] The method for manufacturing the anti-reflective body 1 according to this embodiment includes, for example, at least the second step S150 and the fifth step S180 described above.

[0116] Furthermore, the method for manufacturing the anti-reflective body 1 according to this embodiment may include a sixth step S190, a seventh step S200, and an eighth step S210 after the fifth step S180. Furthermore, the method for manufacturing the anti-reflective body 1 according to this embodiment may include a third step S160 and a fourth step S170 between the second step S150 and the fifth step S180. Furthermore, the method for manufacturing the anti-reflective body 1 according to this embodiment may include a first step S140 before the second step S150. Furthermore, the method for manufacturing the anti-reflective body 1 according to this embodiment may include a silane coupling treatment step S120 before the first step S140. Furthermore, the method for manufacturing the anti-reflective body 1 according to this embodiment may include a protection step S130 before the first step S140. Furthermore, the method for manufacturing the anti-reflective body 1 according to this embodiment may include a washing and pre-treatment step S110 before the silane coupling treatment step S120.

[0117] Furthermore, if the method for manufacturing the anti-reflective body 1 according to this embodiment includes a protection step S130, a first step S140, a second step S150, a third step S160, a fourth step S170, a fifth step S180, and a sixth step S190, these steps may be performed, for example, using the transfer apparatus 100 described above. In addition, the second step S150 and the fifth step S180 of the method for manufacturing the anti-reflective body 1 according to this embodiment may be performed using a lamination-type transfer apparatus in which a film mold 50 is placed on a substrate 10 and a roller 130 is pressed over the film mold 50, instead of the transfer apparatus 100 described above.

[0118] Figure 11 is a flowchart illustrating the second step S150 according to this embodiment. Figure 12 is a process diagram illustrating (1) step S150-1, (2) step S150-3, and (3) step S150-5. In Figure 12, the substrate 10 is shown with a dashed line for ease of understanding.

[0119] As shown in Figure 11, the second step S150 according to this embodiment includes, for example, (1) step S150-1, (2) step S150-3, and (3) step S150-5. The execution order of (1) step S150-1, (2) step S150-3, and (3) step S150-5 is not limited. Each step will be described below.

[0120] [61.(1) Process S150-1] The substrate 10 of the anti-reflective body 1 according to this embodiment is circular. As shown in Figure 12, in step (1) S150-1, the uncured resin composition 30 is applied along the first coating line L1. For example, in step (1) S150-1, the resin composition 30 is applied on the first coating line L1. The first coating line L1 is a hypothetical straight line that passes through the center point P of the substrate 10 and extends in the direction of movement of the roller 130 (the +X direction in Figure 12). If the substrate 10 is not a perfect circle or ellipse, the center point P of the substrate 10 may be the center of gravity of the substrate 10.

[0121] The first coating line L1 includes at least the range from a first virtual base point L1a located near one edge E of the substrate 10 to the center point P of the substrate 10. The first virtual base point L1a is provided at a predetermined position within the substrate 10. The first virtual base point L1a is provided at a position shifted by a first length M1 toward the center point P of the substrate 10 from one edge E of the substrate 10. In other words, the length between one edge E of the substrate 10 and the first virtual base point L1a is the first length M1. The first length M1 is, for example, greater than 0 mm and 2 mm or less.

[0122] Furthermore, the first coating line L1 may include a range from the first virtual base point L1a to a length M2 that is 3 / 4 of the diameter D of the substrate 10, preferably including a range from the first virtual base point L1a to a length of 1 / 2 to 3 / 4 of the diameter D of the substrate 10, and more preferably including a range from the first virtual base point L1a to a length of 2 / 3 of the diameter D of the substrate 10.

[0123] Since the first coating line L1 includes a range from the first virtual base point L1a to a length M2 that is 3 / 4 of the diameter D of the substrate 10, the resin composition 30 can be spread more evenly to the central part and other sides of the substrate 10 in the fifth step S180. In addition, the overflow of the resin composition 30 from the substrate 10 can be further suppressed in the fifth step S180.

[0124] (1) In step S150-1, the resin composition 30 may be applied in a straight line along the first coating line L1, or in a straight line along the dotted line. Alternatively, in step S150-1, the resin composition 30 may be applied in a wavy line (a meandering line) along the first coating line L1.

[0125] [6.2.(2) Process S150-3] As shown in Figure 12, in step (2) S150-3, the resin composition 30 is applied along the second coating line L2. For example, in step (2) S150-3, the resin composition 30 is applied on the second coating line L2. The second coating line L2 is a V-shaped virtual line that extends away from the first virtual base point L1a in the direction away from the first coating line L1. It is preferable that the second coating line L2 is V-shaped and symmetrical with respect to the first coating line L1.

[0126] Furthermore, both ends L2a and L2b of the second coating line L2 are located between a virtual line K passing through the center point P of the substrate 10 and perpendicular to the direction of movement of the roller 130 (±X direction in Figure 12), and one end of the substrate 10. This allows the resin composition 30 to be spread evenly on both sides of the substrate 10 in the fifth step S180 described above.

[0127] Furthermore, the ends L2a and L2b of the second coating line L2 are located at a distance of, for example, 2 / 7 of the diameter D of the substrate 10, or more (M3) in the direction of movement of the roller 130, from one end of the substrate 10 toward the virtual line K, preferably at a distance of 1 / 2 of the diameter D of the substrate 10 (located on the virtual line K). This further suppresses the overflow of the resin composition 30 from the substrate 10 in the fifth step S180 described above.

[0128] Furthermore, the bending angle α of the second coating line L2 is, for example, 90 degrees or more and 110 degrees or less, preferably 90 degrees. This allows the resin composition 30 to be spread more evenly on both sides of the substrate 10 in the fifth step S180 described above. In addition, it is possible to further suppress the overflow of the resin composition 30 from the substrate 10 in the fifth step S180 described above.

[0129] In step (2) S150-3, the resin composition 30 may be applied in a straight line along the second coating line L2, similar to step (1) S150-1, or it may be applied in a straight line along the dotted line. Alternatively, in step (2) S150-3, the resin composition 30 may be applied in a wavy line along the second coating line L2.

[0130] [6.3.(3) Process S150-5] As shown in Figure 12, in step (3) S150-5, the resin composition 30 is applied along the third coating line L3. For example, in step (3) S150-5, the resin composition 30 is applied on the third coating line L3. The third coating line L3 is a virtual arc-shaped line along one side edge E of the substrate 10. The third coating line L3 is an arc shape extending on both sides from a second virtual base point L3a located near one side edge E of the substrate 10. The second virtual base point L3a is located at a position shifted by a second length M4 from one side edge E of the substrate 10 toward the center point P of the substrate 10. In other words, the length between one side edge E of the substrate 10 and the second virtual base point L3a is the second length M4. The second length M4 is, for example, greater than 0 mm and less than or equal to 1 mm. Note that the first virtual base point L1a and the second virtual base point L3a may be located at the same position or at different positions.

[0131] The third coating line L3 is, for example, an arc shape along a range of ±60 degrees or more and less than ±80 degrees with respect to the second virtual base point L3a, and preferably an arc shape along a range of ±70 degrees with respect to the second virtual base point L3a. This allows the resin composition 30 to be spread more evenly on one and both sides of the substrate 10 in the fifth step S180 described above. In addition, it is possible to further suppress the overflow of the resin composition 30 from the substrate 10 in the fifth step S180 described above.

[0132] [6.4. Others] Furthermore, as shown in the bottom diagram of Figure 12, it is preferable that the other end L1b of the first coating line L1, both ends L2a and L2b of the second coating line L2, and both ends L3b and L3c of the third coating line are separated from each other. This allows the resin composition 30 to be spread more evenly on one and both sides of the substrate 10 in the fifth step S180. In addition, it is possible to further suppress the overflow of the resin composition 30 from the substrate 10 in the fifth step S180.

[0133] Furthermore, it is preferable that the amount of resin composition 30 applied in step (3) S150-5 is greater than the amount of resin composition 30 applied in step (1) S150-1 and the amount of resin composition 30 applied in step (2) S150-3.

[0134] [7. Summary] The anti-reflective body 1 according to this embodiment has been described above.

[0135] Another method for manufacturing an anti-reflective body 1 using a laminating transfer apparatus 100 according to this embodiment includes a second step S150 in which an uncured resin composition 30 is applied to the surface 10A of a circular substrate 10 of the anti-reflective body 1, and a fifth step S180 in which the film mold 50 having a fine uneven structure 52 is pressed toward the substrate 10 by the roller 130 of the transfer apparatus 100, and the roller 130 is rotated and moved from one side to the other side of the substrate 10, thereby spreading the resin composition 30 between the substrate 10 and the film mold 50, and bonding the film mold 50 to the substrate 10 via the resin composition 30, thereby transferring the fine uneven structure 52 of the film mold 50 to the resin composition 30, wherein the second step S150 is applied to the center point of the substrate 10 The process includes (1) step S150-1, which involves applying the resin composition 30 along a straight first coating line L1 that passes through P and extends in the direction of movement of the roller 130; (2) step S150-3, which involves applying the resin composition 30 along a V-shaped second coating line L2; and (3) step S150-5, which involves applying the resin composition 30 along an arc-shaped third coating line L3 that runs along one side edge of the substrate 10. The first coating line L1 includes at least the range from a first virtual base point L1a located near one side edge E of the substrate 10 to the center point P of the substrate 10; the second coating line L2 is V-shaped, extending away from the first virtual base point L1a in the direction away from the first coating line L1; and the third coating line L3 is arc-shaped, extending on both sides from a second virtual base point L3a located near one side edge E of the substrate 10.

[0136] The method for manufacturing the anti-reflective body 1 according to this embodiment uses a lamination-type transfer apparatus. Therefore, compared to the first conventional technique in which a mold is pressed vertically onto an uncured resin composition, the method for manufacturing the anti-reflective body 1 according to this embodiment can suppress the incorporation of air bubbles and dust into the resin composition 30. Therefore, the method for manufacturing the anti-reflective body 1 according to this embodiment can reduce variations in the film thickness T within the plane of the anti-reflective layer 11. Consequently, the method for manufacturing the anti-reflective body 1 according to this embodiment can improve the surface flatness of the anti-reflective layer 11. Surface flatness refers to the uniformity of the film thickness T of the entire anti-reflective layer 11. Furthermore, the method for manufacturing the anti-reflective body 1 according to this embodiment allows for easier control of the film thickness compared to the first conventional technique.

[0137] Furthermore, in the first prior art, it was difficult to spread the resin composition to the edges of the substrate 10. In contrast, the method for manufacturing the anti-reflective body 1 according to this embodiment uses a laminating transfer device 100, which makes it possible to spread the resin composition 30 evenly from one side to the other of the substrate 10. Therefore, the method for manufacturing the anti-reflective body 1 according to this embodiment makes it possible to form a film of the resin composition 30 over the entire surface of the substrate 10, and to evenly transfer the fine uneven structure 52 of the film mold 50 to the resin composition 30 formed over the entire surface of the substrate 10. For this reason, the method for manufacturing the anti-reflective body 1 according to this embodiment can suppress uneven transfer to the resin composition 30 compared to the first prior art.

[0138] Furthermore, in the manufacturing method of the anti-reflective body 1 according to this embodiment, in the second step S150, the uncured resin composition 30 is applied along the first coating line L1, the second coating line L2, and the third coating line L3. As a result, in the manufacturing method of the anti-reflective body 1 according to this embodiment, in the fifth step S180, the resin composition 30 can be spread more evenly on the substrate 10. Therefore, the surface flatness of the film thickness of the resin composition 30 can be further improved.

[0139] Furthermore, in the manufacturing method of the anti-reflective body 1 according to this embodiment, the excess resin composition 30 from the substrate 10 can be further suppressed in the fifth step S180. Therefore, the manufacturing method of the anti-reflective body 1 according to this embodiment can reduce the amount of burrs of cured resin composition that may form around the substrate 10. Therefore, the manufacturing method of the anti-reflective body 1 according to this embodiment can reduce the effort required for deburring. In addition, peeling or deformation of the anti-reflective layer 11 at the edge of the substrate 10 due to deburring can be suppressed. Consequently, the portion of the substrate 10 that cannot be used as the anti-reflective body 1 can be reduced.

[0140] (3) The amount of resin composition 30 applied in step S150-5 may be greater than the amount of resin composition 30 applied in step (1) S150-1 and the amount of resin composition 30 applied in step (2) S150-3.

[0141] As a result, in the manufacturing method of the anti-reflective body 1 according to this embodiment, the resin composition 30 can be spread evenly on the substrate 10 in the fifth step S180.

[0142] The other end L1b of the first coating line L1, both ends L2a and L2b of the second coating line L2, and both ends L3b and L3c of the third coating line L3 may be separated from each other.

[0143] As a result, the method for manufacturing the anti-reflective body 1 according to this embodiment can further suppress the leakage of the resin composition 30 from the substrate 10 in the fifth step S180.

[0144] The second coating line L2 may be V-shaped, symmetrical to the first coating line L1.

[0145] As a result, in the manufacturing method of the anti-reflective body 1 according to this embodiment, the resin composition 30 can be spread symmetrically on both sides of the substrate 10 in the fifth step S180. [Examples]

[0146] Next, an anti-reflective body 1 according to an embodiment of the present invention will be described. It should be noted that the following embodiment is merely an example to demonstrate the effects and feasibility of the anti-reflective body 1 according to the present invention, and the present invention is not limited to the following embodiment.

[0147] [Example of the first embodiment] Anti-reflective materials 1 for Examples 1 to 4 and an anti-reflective material for Comparative Example 1 were prepared. In Examples 1 to 4, a glass substrate with a diameter of 300 mm and a thickness of 0.4 mm was used as the substrate 10. In Comparative Example 1, a glass substrate with a square of 100 mm and a thickness of 0.4 mm was used as the substrate. In Examples 1 to 4 and Comparative Example 1, vapor treatment was performed at 150°C for 1 hour and 30 minutes in the silane coupling treatment step S120.

[0148] In Examples 1 to 4, the transfer apparatus 100 described above was used to perform steps 1 through 5 (S140 to S180). Subsequently, steps 6 through 8 (S190 to S210) were performed. In Examples 1 to 4, the uncured resin composition 30 was a resin composition containing an acrylate monomer and a photoradical initiator. As the acrylate monomer, dipentaerythritol hexaacrylate, 2-[5-ethyl-5-[(acryloyloxy)methyl]-1,3-dioxan-2-yl]-2,2-dimethylethyl acrylate, and phenylethyl acrylate were used. As the dipentaerythritol hexaacrylate, the product name "DPHA" manufactured by Nippon Kayaku Co., Ltd. was used. As 2-[5-ethyl-5-[(acryloyloxy)methyl]-1,3-dioxan-2-yl]-2,2-dimethylethyl acrylate, we used "KAYARAD R-604" manufactured by Nippon Kayaku Co., Ltd. Phenylate acrylate was obtained from Osaka Organic Chemical Industry Co., Ltd. As a photoradical initiator, we used "Irgacure184" manufactured by IGM Resins BV.

[0149] In the fourth step S170, the gap between the film mold 50 and the substrate 10 was set to 0 mm. Also, in the fifth step S180, the pressing force of the roller 130 was set to 0.4 MPa.

[0150] Note that the transfer speed (movement speed of roller 130) in the fifth step S180 differs in Examples 1 to 4. In Example 1, the transfer speed was 5 mm / s. In Example 2, the transfer speed was 10 mm / s. In Example 3, the transfer speed was 30 mm / s. In Example 4, the transfer speed was 50 mm / s.

[0151] Furthermore, in Examples 1 to 4, in step 7 S200, a UV-LED device was used to expose the image for 60 seconds at 255 gradations.

[0152] In Comparative Example 1, the fine uneven structure of the mold was transferred to the uncured resin composition on the substrate using a conventional imprint apparatus that presses the mold vertically onto the uncured resin composition. Comparative Example 1 used the same resin composition as Examples 1 to 4. In Comparative Example 1, the gap between the mold and the substrate was 0 mm. Also, in Comparative Example 1, the pressing force of the mold was 100 MPa.

[0153] Then, the anti-reflective material 1 from Examples 1 to 4 was divided into nine parts to obtain nine samples, and the mean square deviation of wavefront aberration Rms, the thickness of the cured resin composition, optical loss, and transmittance were measured for each sample. The mean value ave and standard deviation σ of the nine samples were then calculated.

[0154] Furthermore, the mean squared deviation of wavefront aberration (Rms), the thickness of the cured resin composition, the optical loss, and the transmittance of the anti-reflective material of Comparative Example 1 were measured.

[0155] Wavefront aberration was measured using a Verifire® 6 laser interferometer manufactured by Zygo Corporation. A 10 mm square area was used as the measurement range for wavefront aberration in the anti-reflective materials of Examples 1 to 4 and Comparative Example 1. Transmittance and reflectance were measured using a V-770 UV-Vis-Near-Infrared Spectrophotometer manufactured by JASCO Corporation. In this measurement, the transmittance and reflectance were measured at an incident angle of 10°.

[0156] [Rms (mean squared deviation of wavefront aberration)] Table 1 shows the mean square deviation Rms of wavefront aberration and the thickness of the cured resin composition for the anti-reflective materials 1 of Examples 1 to 4 and Comparative Example 1.

[0157] [Table 1]

[0158] As shown in Table 1, in Example 1, the average value ave of the mean square deviation Rms of wavefront aberration was 0.038λ, in Example 2, the average value ave of the mean square deviation Rms of wavefront aberration was 0.042λ, in Example 3, the average value ave of the mean square deviation Rms of wavefront aberration was 0.058λ, and in Example 4, the average value ave of the mean square deviation Rms of wavefront aberration was 0.097λ. From these results, it was confirmed that the average value ave of the mean square deviation Rms of wavefront aberration decreased as the transfer speed decreased. Therefore, it was found that the surface flatness of the anti-reflective material 1 improved as the transfer speed decreased.

[0159] On the other hand, in Comparative Example 1, the mean square deviation Rms of wavefront aberration was 0.489λ. From this result, it was confirmed that the surface flatness of the anti-reflective body was significantly reduced in the conventional imprint apparatus compared to the transfer apparatus 100 described above. In other words, it was confirmed that the transfer apparatus 100 described above can produce an anti-reflective body 1 with high surface flatness compared to the conventional imprint apparatus.

[0160] Furthermore, as shown in Table 1, in Example 1, the standard deviation σ of the mean squared deviation Rms of wavefront aberration was 0.006, in Example 2, the standard deviation σ of the mean squared deviation Rms of wavefront aberration was 0.007, in Example 3, the standard deviation σ of the mean squared deviation Rms of wavefront aberration was 0.010, and in Example 4, the standard deviation σ of the mean squared deviation Rms of wavefront aberration was 0.022. From these results, it was confirmed that the standard deviation σ of the mean squared deviation Rms of wavefront aberration decreases as the transfer speed decreases. Therefore, it was found that the in-plane variation in the flatness of the surface of the anti-reflective material 1 decreases as the transfer speed decreases.

[0161] [Thickness of cured resin composition] The refractive index n of the cured resin composition was 1.56. As shown in Table 1, in Example 1, the thickness of the cured resin composition (film thickness T of the anti-reflective layer 11) was below the detection limit. In Example 2, the average value ave of the film thickness T of the anti-reflective layer 11 was 0.99 μm, in Example 3, the average value ave of the film thickness T of the anti-reflective layer 11 was 1.45 μm, and in Example 4, the average value ave of the film thickness T of the anti-reflective layer 11 was 2.02 μm. From these results, it was confirmed that the average value ave of the film thickness T of the anti-reflective layer 11 decreases as the transfer speed decreases. Therefore, it was found that the stability of the optical properties of the anti-reflective body 1 improves as the transfer speed decreases.

[0162] On the other hand, in Comparative Example 1, the thickness of the cured resin composition was 2.0 μm. From this result, it was confirmed that the conventional imprint apparatus resulted in a thicker cured resin composition compared to Examples 1 to 3. Therefore, it was found that the transfer apparatus 100 can produce a much thinner cured resin composition compared to the conventional imprint apparatus.

[0163] As shown in Table 1, in Example 2, the standard deviation σ of the film thickness T of the anti-reflective layer 11 was 0.10, in Example 3, the standard deviation σ of the film thickness T of the anti-reflective layer 11 was 0.10, and in Example 4, the standard deviation σ of the film thickness T of the anti-reflective layer 11 was 0.19. From these results, it was confirmed that when the transfer speed is 30 mm / s or less, the standard deviation σ of the film thickness T of the anti-reflective layer 11 is smaller compared to when it is 50 mm / s. Therefore, it was found that by setting the transfer speed to 30 mm / s or less, the in-plane variation in the film thickness T of the anti-reflective layer 11 can be further reduced.

[0164] [Optical loss] Table 2 shows the optical loss and transmittance of the anti-reflective material 1 of Examples 1 to 4 and the anti-reflective material of Comparative Example 1.

[0165] [Table 2]

[0166] As shown in Table 2, the average optical loss ave was 0.22% in Example 1, 0.20% in Example 2, 0.20% in Example 3, and 0.23% in Example 4. From these results, it was confirmed that the average optical loss ave was low, less than 0.25%, regardless of the transfer speed.

[0167] On the other hand, in Comparative Example 1, the optical loss was 0.25%. From these results, it was confirmed that the conventional imprint device had reduced anti-reflective and light-transmitting functions of the anti-reflective material compared to the transfer device 100 described above. In other words, it was confirmed that the transfer device 100 could improve the anti-reflective and light-transmitting functions of the anti-reflective material 1 compared to the conventional imprint device.

[0168] As shown in Table 2, the standard deviation of optical loss σ was 0.044 in Example 1, 0.029 in Example 2, 0.061 in Example 3, and 0.067 in Example 4. From these results, it was confirmed that the standard deviation of optical loss σ was low, less than 0.07, regardless of the transfer speed. Therefore, it was found that the in-plane variation of the anti-reflective function and light transmission function of the anti-reflective body 1 can be reduced regardless of the transfer speed.

[0169] [Transmittance] As shown in Table 2, the average transmittance ave was 95.2% in Example 1, 95.3% in Example 2, 95.2% in Example 3, and 95.2% in Example 4. From these results, it was confirmed that the average transmittance ave was high, above 95.0%, regardless of the transfer speed. In Comparative Example 1, the transmittance was 95.2%.

[0170] As shown in Table 2, the standard deviation of transmittance σ was 0.041 in Example 1, 0.039 in Example 2, 0.025 in Example 3, and 0.119 in Example 4. From these results, it was confirmed that when the transfer speed is 30 mm / s or less, the standard deviation of transmittance σ is smaller compared to when it is 50 mm / s. Therefore, it was found that by setting the transfer speed to 30 mm / s or less, the in-plane variation in the light transmission function of the anti-reflective material 1 can be further reduced.

[0171] [Example of the second embodiment] Anti-reflective material 1 of Example 10 and anti-reflective materials of Comparative Examples 11 to 17 were prepared. In Example 10 and Comparative Examples 11 to 17, only the coating pattern of the uncured resin composition 30 in the second step S150 differed; everything else was the same.

[0172] In Example 10 and Comparative Examples 11 to 17, a glass substrate with a diameter of 300 mm and a thickness of 0.4 mm was used as the substrate 10. In the silane coupling treatment step S120, vapor treatment was performed at 150°C for 1 hour and 30 minutes. Then, using the transfer apparatus 100 described above, steps 1 through 5 (S140 to S180) were performed. Subsequently, steps 6 through 8 (S190 to S210) were performed. In addition, a resin composition containing an acrylate monomer and a photoradical initiator was used as the uncured resin composition 30. The composition of the uncured resin composition 30 was the same as in Examples 1 to 4 described above.

[0173] In the fourth step, S170, the gap between the film mold 50 and the substrate 10 was set to 0 mm. In the fifth step, S180, the pressing force of the roller 130 was set to 0.4 MPa and the transfer speed to 10 mm / s. Then, in the seventh step, S200, exposure was performed for 60 seconds using a UV-LED device with 255 gradations.

[0174] Figure 13 illustrates the coating pattern of the uncured resin composition 30 in the second step S150 according to an example of the second embodiment. As shown in Figure 13, in Example 10, the resin composition 30 was applied linearly along the first coating line L1, the second coating line L2, and the third coating line L3. The coating speed on the first coating line L1 and the second coating line L2 was 50 mm / s. The coating speed on the third coating line L3 was 30 mm / s.

[0175] As shown in Figure 13, in Comparative Example 11, eleven straight lines extending perpendicular to the direction of movement of the roller 130 were placed at equal intervals from one side of the substrate 10 to the center point P of the substrate 10, and the resin composition 30 was applied linearly along these eleven lines. The application speed was 30 mm / s.

[0176] In Comparative Example 12, in addition to the lines in Comparative Example 11, a third coating line L3 was added, and the resin composition 30 was applied linearly along these 12 lines. The coating speed was 30 mm / s. In Comparative Example 13, six linear lines extending perpendicular to the direction of movement of the roller 130 were arranged at equal intervals from one side of the substrate 10 to the center point P of the substrate 10, and a third coating line L3 was also added. The resin composition 30 was applied linearly along these seven lines. The coating speed was 30 mm / s.

[0177] In Comparative Example 14, six straight lines extending perpendicular to the direction of movement of the roller 130 were placed at equal intervals from one side of the substrate 10 to the center point P of the substrate 10, and the resin composition 30 was applied in a dotted line pattern along these six lines. The dot application time was 0.2 s. In Comparative Example 15, eleven straight lines extending perpendicular to the direction of movement of the roller 130 were placed at equal intervals from one side of the substrate 10 to the other side of the substrate 10, and the resin composition 30 was applied in a dotted line pattern along these eleven lines. The dot application time was 0.2 s.

[0178] In Comparative Example 16, the resin composition 30 was applied linearly along a zigzag line from one side of the substrate 10 to the other side of the substrate 10. The application speed was 80 mm / s. In Comparative Example 17, the resin composition 30 was applied linearly along a zigzag line from one side of the substrate 10 to the center point P of the substrate 10. The application speed was 80 mm / s.

[0179] Then, the mean square deviation of wavefront aberration Rms, the thickness of the cured resin composition, optical loss, and transmittance were measured for the anti-reflective body 1 of Example 10 and the anti-reflective bodies of Comparative Examples 11 to 17.

[0180] Wavefront aberration was measured using the Verifire® 6 laser interferometer manufactured by Zygo Corporation. Transmittance was measured using the V-770 UV-Vis-Near-Infrared Spectrophotometer manufactured by JASCO Corporation.

[0181] [State of the resin composition after application] In Example 10, no overflow of the resin composition 30 from the substrate 10 was observed. On the other hand, in Comparative Example 11, it was confirmed that the resin composition 30 did not spread along the outer circumference of the substrate 10 on one side, and that a large amount of the resin composition 30 overflowed on the other side of the substrate 10. In Comparative Examples 12 and 13, it was confirmed that the resin composition 30 spread along the outer circumference of the substrate 10 on one side, but that a large amount of the resin composition 30 overflowed on the other side of the substrate 10. In Comparative Examples 14 to 17, it was confirmed that the resin composition 30 did not spread along the outer circumference of the substrate 10 on one side, and that a large amount of the resin composition 30 overflowed on the other side of the substrate 10.

[0182] [Rms (mean squared deviation of wavefront aberration)] The mean square deviation Rms of wavefront aberration in Example 10 was 0.042λ. On the other hand, the mean square deviation Rms of wavefront aberration in Comparative Example 11 was 0.09λ, in Comparative Example 12 it was 0.089λ, in Comparative Example 13 it was 0.063λ, in Comparative Example 14 it was 0.094λ, in Comparative Example 15 it was 0.114λ, in Comparative Example 16 it was 0.095λ, and in Comparative Example 17 it was 0.080λ. From these results, it was confirmed that Example 10 had a lower mean square deviation Rms of wavefront aberration compared to Comparative Examples 11 to 17. Therefore, it was found that Example 10 can further improve the surface flatness of the anti-reflective material 1 compared to Comparative Examples 11 to 17.

[0183] [Thickness of cured resin composition] The thickness of the cured resin composition of Example 10 (film thickness T of the anti-reflective layer 11) was 0.99 μm. The film thickness T of the anti-reflective layer 11 of Comparative Example 11 was 1.00 μm, the film thickness T of the anti-reflective layer 11 of Comparative Example 12 was 1.10 μm, the film thickness T of the anti-reflective layer 11 of Comparative Example 13 was 0.99 μm, the film thickness T of the anti-reflective layer 11 of Comparative Example 14 was 1.15 μm, the film thickness T of the anti-reflective layer 11 of Comparative Example 15 was 0.94 μm, the film thickness T of the anti-reflective layer 11 of Comparative Example 16 was 1.00 μm, and the film thickness T of the anti-reflective layer 11 of Comparative Example 17 was 1.04 μm. From these results, it was confirmed that the film thickness T of the anti-reflective layer 11 of Example 10 and Comparative Examples 11 to 17 is preferably 1.15 μm or less.

[0184] [Optical loss] The optical loss in Example 10 was 0.20%. The optical loss in Comparative Example 11 was 0.22%, in Comparative Example 12 it was 0.22%, in Comparative Example 13 it was 0.20%, in Comparative Example 14 it was 0.23%, in Comparative Example 15 it was 0.21%, in Comparative Example 16 it was 0.22%, and in Comparative Example 17 it was 0.20%. From these results, it was confirmed that the optical losses of Example 10 and Comparative Examples 11-17 were 0.23% or less, which is preferable.

[0185] [Transmittance] The transmittance of Example 10 was 95.3%. The transmittance of Comparative Example 11 was 95.2%, the transmittance of Comparative Example 12 was 95.1%, the transmittance of Comparative Example 13 was 95.3%, the transmittance of Comparative Example 14 was 94.9%, the transmittance of Comparative Example 15 was 95.0%, the transmittance of Comparative Example 16 was 95.1%, and the transmittance of Comparative Example 17 was 95.0%. From these results, it was confirmed that the transmittances of Example 10 and Comparative Examples 11-17 were 94.9% or higher, which is preferable.

[0186] Although preferred embodiments of the present invention have been described in detail above with reference to the attached drawings, the present invention is not limited to these examples. It is clear to any person with ordinary skill in the art to which the present invention belongs that various modifications or alterations can be conceived within the scope of the technical idea described in the claims, and these are also understood to fall within the technical scope of the present invention. [Explanation of symbols]

[0187] 1 Anti-reflective body 10 circuit boards 10A surface 10B back side 11 Anti-reflection layer 12 Fine uneven structure 20 protective films 30 Resin composition 50 Film Molds 52 Fine uneven structure 100 Transfer device 110 First Adsorption Unit 110a Adsorption surface 120 Second Adsorption Unit 120a Adsorption surface 126. Second Adhesive Sheet (Adhesive Sheet) 130 Rollers 150 Rotating Mechanism 152 Rotary shaft

Claims

1. A method for manufacturing an anti-reflective material, comprising manufacturing an anti-reflective material using a lamination transfer device, The transfer device is, First adsorption unit and The second adsorption unit, A rotation mechanism rotates the second adsorption unit around a pivot axis between a first state in which the adsorption surface of the second adsorption unit faces upward and a second state in which the adsorption surface of the second adsorption unit faces downward and faces the adsorption surface of the first adsorption unit, Equipped with, The second adsorption unit is, A flexible adsorption sheet is provided on the adsorption surface of the second adsorption unit, A roller is positioned inside the suction sheet and is configured to be movable in directions perpendicular and parallel to the suction surface of the second suction unit. It has, The method for manufacturing the anti-reflective body is as follows: A first step is to place the substrate of the anti-reflective material on the adsorption surface of the first adsorption unit, A second step involves applying an uncured resin composition onto the surface of the substrate, A third step involves placing a film mold having a fine uneven structure on the adsorption sheet of the second adsorption unit in the first state, A fourth step involves rotating the second suction unit from the first state to the second state using the rotation mechanism, thereby bringing the fine uneven structure of the film mold adsorbed by the second suction unit and the substrate adsorbed by the first suction unit into opposition. A fifth step involves extending the roller of the second suction unit toward the first suction unit, pressing the film mold toward the substrate via the suction sheet with the roller, and moving the roller from one side of the substrate to the other while rotating it, thereby spreading the resin composition between the substrate and the film mold, and bonding the film mold to the substrate via the resin composition, thereby transferring the fine uneven structure of the film mold to the resin composition. A method for manufacturing an anti-reflective material, including

2. A sixth step is to release the film mold from the second suction unit by the second suction unit, and then rotate the second suction unit from the second state to the first state using the rotation mechanism, thereby peeling the film mold attached to the substrate from the suction surface of the second suction unit. A seventh step involves curing the resin composition while the film mold is bonded to the substrate via the resin composition, An eighth step of peeling the film mold from the cured product of the resin composition, A method for manufacturing an anti-reflective body according to claim 1, further comprising:

3. A method for manufacturing an anti-reflective body according to claim 1, further comprising the step of performing a silane coupling treatment on the substrate prior to the first step.

4. The process further includes, prior to the first step, attaching a protective film to the back surface of the substrate, The method for manufacturing an anti-reflective body according to claim 1, wherein in the first step, the substrate to which the protective film is attached is placed on the adsorption surface of the first adsorption unit with the back side facing downwards.

5. In the fifth step described above, The pressing force of the roller is 0.1 MPa or more and 0.5 MPa or less. The moving speed of the roller is 5 mm / s or more and 100 mm / s or less. The method for manufacturing an anti-reflective body according to claim 1, wherein the hardness of the roller is 40 or more and 90 or less on a Shore A hardness scale.

6. The method for manufacturing an anti-reflective body according to claim 1, wherein the mean square deviation Rms of the wavefront aberration in the plane of the anti-reflective body is λ / 4 or less.

7. The method for producing an anti-reflective body according to claim 1, wherein the thickness of the cured product of the resin composition of the anti-reflective body is 0.5 μm or more and 2 μm or less.

8. The method for manufacturing an anti-reflective body according to claim 1, wherein the optical loss of the anti-reflective body is 0.3% or less.

9. The method for manufacturing an anti-reflective body according to claim 1, wherein the mean square deviation Rms of the wavefront aberration in the plane of the anti-reflective body, the thickness of the cured product of the resin composition of the anti-reflective body, the optical loss of the anti-reflective body, and the standard deviation of the in-plane distribution of some or all of the transmittance of the anti-reflective body are 0.1 or less.

10. A lamination-type transfer apparatus for transferring the fine uneven structure of a film mold to a resin composition coated on a substrate of an anti-reflective material, First adsorption unit and The second adsorption unit, A rotation mechanism rotates the second adsorption unit around a pivot axis between a first state in which the adsorption surface of the second adsorption unit faces upward and a second state in which the adsorption surface of the second adsorption unit faces downward and faces the adsorption surface of the first adsorption unit, Equipped with, The second adsorption unit is, A flexible adsorption sheet is provided on the adsorption surface of the second adsorption unit, A roller is positioned inside the suction sheet and is configured to be movable in directions perpendicular and parallel to the suction surface of the second suction unit. It has, The first adsorption unit adsorbs the substrate placed on the adsorption surface, The second adsorption unit in the first state adsorbs the film mold placed on the adsorption sheet, The rotation mechanism rotates the second suction unit from the first state to the second state, thereby bringing the fine uneven structure of the film mold adsorbed by the second suction unit and the substrate adsorbed by the first suction unit facing each other. A transfer apparatus comprising: the second suction unit extending the roller toward the first suction unit, pressing the film mold toward the substrate via the suction sheet with the roller, and moving the roller from one side to the other of the substrate while rotating it, thereby spreading the resin composition between the substrate and the film mold, and bonding the film mold to the substrate via the resin composition, thereby transferring the fine uneven structure of the film mold to the resin composition.

Images