OLED rear authentication

Abstract

A photoelectronic device (112) is disclosed, which comprises the following components. At least one pattern illumination source (114) configured to illuminate at least one infrared light pattern having multiple infrared light spots, wherein the number of infrared light spots is 4000 or less, At least one flood illumination source (116) configured to emit infrared flood light, and At least one image generation unit (118) configured to generate at least one pattern image while a pattern illumination source (114) is illuminating an infrared light pattern, and to generate at least one flood image while a flood illumination source (116) is emitting infrared flood light. Here, the relative distance between the flood light source (116) and the pattern light source (114) is 3.0 mm or less.

Description

Technical Field

[0001] The present invention relates to optoelectronic devices, the use of optoelectronic devices, devices for authenticating users, and methods for authenticating users of devices. The present invention further relates to computer programs, computer-readable storage media, and non-transitory computer-readable media. The devices, methods, and uses according to the present invention can be specifically employed, for example, in various fields such as daily life, security technology, games, transportation technology, production technology, art, photography for digital or video photographs for document or technical purposes, security technology, information technology, agriculture, crop protection, maintenance, cosmetics, medical technology, or science. However, other uses are also possible.

Background Art

[0002] Authentication systems available in mobile devices such as smartphones and tablets include cameras. The mobile device usually has a front display such as an organic light emitting diode (OLED) area. In order to incorporate a camera, a notch in the display is required at the position of the camera. Such a notch reduces the available display area, a so-called notch, and as a result, reduces the display area available to the user. Usually, since the notch is an unpleasant function for the user, the camera is restricted to the outermost possible position in order to avoid dark areas such as the central part of the display.

[0003] Thus, currently available portable terminals have the drawback that the display area is reduced for the camera and the position of the camera cannot be adapted to improve processing efficiency. There is a desire to change the position of the camera while improving the user experience.

[0004] Furthermore, to further enhance the security of biometric authentication, such as facial recognition, active image processing is increasingly being employed in addition to passive image processing. This improves the detection of forged authentication attempts. Active methods can utilize laser-based projection techniques to enrich the scene with additional information. Such methods generally require that the optical paths of the camera (Rx) and laser projector (Tx) remain unaffected. For example, established active methods such as structured light, active stereo, and time-of-flight typically use light passing through the clearest protective glass possible to reconstruct the three-dimensional structure of the illuminated scene from the captured image. For example, a CMOS camera sensitive to the near-infrared spectral range and a laser projector emitting light in the near-infrared spectral range can be used, for example, to ensure the invisibility of the method to the user. As outlined above, when using a smartphone, for example to perform secure biometric unlocking of the smartphone, such a setup requires an additional notch in the display, for example, to be used with a selfie camera that may operate in the visible spectral range.

[0005] Laser projectors can be configured to operate behind a transflective OLED display. This reduces the number and size of notches in the display. Transflective OLED displays typically have an OLED-pixel structure, which is defined in particular by an optically opaque cathode. By using transparent conductive tracks and designing the drive electronics, (semi)transparent areas between OLED pixels can be achieved. In passive operation, such as a selfie camera, adequate transparency is ensured, but light from a laser projector suffers diffraction loss. Therefore, in active systems, the effective transmittance may be as low as 3% to 20%. Such diffraction loss occurs not only in emission (Tx) but also in photodetection (Rx). Furthermore, diffraction loss can be visible in recorded images as artifacts such as reduced contrast. Thus, known methods and devices face the following drawbacks: Light obtained in photodetection is significantly reduced because it passes through the display twice. Diffraction artifacts can further degrade the remaining image quality. The usable laser power required to compensate for such losses is limited by requirements for eye safety (maximum dose after emission from the display) and display stability (maximum thermal dose).

[0006] WO 2021 / 259923 A1 describes a projector and illumination module configured for scene illumination and pattern projection. The projector and illumination module comprises at least one array of a plurality of individual emitters and at least one optical system. Each of the individual emitters is configured to produce at least one illumination light beam. The optical system has at least one array of a plurality of transfer devices. The array of transfer devices has at least one transfer device for each of the individual emitters. The array of transfer devices has at least two groups of transfer devices. The transfer devices of the two groups differ in at least one characteristic. The transfer devices of one group are configured to produce at least one illumination pattern in response to an illumination light beam incident on the transfer device. The transfer devices of the other group are configured to produce a divergent light beam in response to an illumination light beam incident on the transfer device.

[0007] CN 114 779 491 A describes a terminal display module having a display panel and a 3D image processing module.

[0008] WO 2022 / 101429 A1 describes a display device having the following components: at least one illumination source configured to project at least one illumination beam onto at least one scene; at least one optical sensor having at least one photosensitive area, wherein the optical sensor is configured to measure at least one reflected light beam generated by the scene in response to illumination by the illumination beam; at least one translucent display configured to display information, wherein the illumination source and optical sensor are positioned in front of the display in the direction of propagation of the illumination light beam; and at least one control unit configured to turn off the display in the area of ​​the illumination source during illumination and / or in the area of ​​the optical sensor during measurement. [Prior art documents] [Patent Documents]

[0009] [Patent Document 1] WO 2021 / 259923 A1 [Patent Document 2] CN 114 779 491 A [Patent Document 3] WO 2022 / 101429 A1 [Overview of the project] [Problems that the invention aims to solve]

[0010] Therefore, an object of the present invention is to provide an apparatus and method that addresses the aforementioned technical problems of known apparatuses and methods. Specifically, an object of the present invention is to provide an apparatus and method that not only improves the operation of an active authentication technique using an apparatus behind a display, but also enables the repositioning of a camera. [Means for solving the problem]

[0011] This problem is solved by the present invention having the features of an independent claim. Advantageous variations of the present invention, which can be realized individually or in combination, are shown in the dependent claims and / or the following specification and detailed embodiments.

[0012] In a first aspect of the present invention, a photoelectron device is disclosed. The photoelectron device comprises the following components:

[0013] At least one pattern illumination source configured to emit at least one infrared light pattern having multiple infrared light spots, wherein the number of infrared light spots is 4000 or less or 4000 spots, At least one flood illumination source configured to emit infrared flood light, and At least one image generation unit configured to generate at least one pattern image while a pattern illumination source emits an infrared light pattern, and at least one flood image while a flood illumination source emits infrared flood light.

[0014] The relative distance between the flood light source and the pattern light source is less than 3.0 mm.

[0015] As used herein, the term “optoelectronic device” is a broad term, and is intended to have the usual and conventional meanings for those skilled in the art, and is not limited to any special or customized meaning. Specifically, the term may refer to devices or systems that operate using light and electric current, but is not limited to these.

[0016] As used herein, the term “light” is a broad term and should be given its usual, conventional meaning to those skilled in the art, and should not be limited to any special or customized meaning. Specifically, the term can refer to electromagnetic emissions in one or more spectral ranges of infrared, visible light, and ultraviolet light, but not limited to these. Here, the term “ultraviolet spectral range” generally refers to electromagnetic emission lines having wavelengths of 1 nm–380 nm, preferably 100 nm–380 nm. Furthermore, in accordance with a portion of the ISO-21348 standard in effect as of the date of this specification, the term “visible spectral range” generally refers to the spectral range from 380 nm to 760 nm. The term “infrared spectral range” (IR) generally refers to electromagnetic emissions from 760 nm to 1000 μm. The range from 760 nm to 1.5 μm is commonly referred to as the "near-infrared spectral range" (NIR), the range from 1.5 μm to 15 μm as the "mid-infrared spectral range" (MidIR), and the range from 15 μm to 1000 μm as the "far-infrared spectral range" (FIR). Preferably, the light used for typical purposes of the present invention is light in the infrared (IR) spectral range, more preferably light in the near-infrared (NIR) and / or mid-infrared spectral range (MidIR), and in particular light having wavelengths of 1 μm–5 μm, preferably 1 μm–3 μm.

[0017] As used herein, the term “irradiate” is a broad term and should be given its usual idiomatic meaning to those skilled in the art, and should not be limited to any special or customized meaning. Specifically, the term may refer to the process of exposing at least one element to light, but is not limited to that. As used herein, the term “illumination source” is a broad term and should be given its usual idiomatic meaning to those skilled in the art, and should not be limited to any special or customized meaning. Specifically, the term may refer to any device configured to generate or provide light in the sense defined above.

[0018] As used herein, the term “pattern illumination source” is a broad term and should be given its usual idiomatic meaning to those skilled in the art, and not limited to any special or customized meaning. The term may refer to any device configured to produce or provide at least one light pattern, in particular at least one infrared light pattern, though not particularly limited. As used herein, the term “light pattern” is a broad term and should be given its usual idiomatic meaning to those skilled in the art, and not limited to any special or customized meaning. The term may refer to at least one arbitrary pattern having multiple light spots, though not particularly limited. The light spots may be at least partially spatially extended. At least one spot or any spot may have any shape. In some cases, a circular shape for at least one spot or any spot may be preferred. The spots may be arranged considering the structure of a display comprising a device further comprising optoelectronic devices. Typically, the arrangement of an OLED-pixel structure of a display can be considered. As used herein, the term “infrared light pattern” is a broad term and should be given its usual idiomatic meaning to those skilled in the art, and not limited to any special or customized meaning. This term may refer to a light pattern having spots in the infrared spectral range, although this is not particularly limited. An infrared light pattern may also be a near-infrared light pattern.

[0019] Infrared light may be coherent. The infrared light pattern may be a coherent infrared light pattern.

[0020] The pattern illumination source may be configured to emit light of a single wavelength, for example, in the near-infrared region. In other embodiments, the pattern illumination source may be adapted to emit light of multiple wavelengths, for example, to enable additional measurements in other wavelength channels.

[0021] An infrared light pattern may have at least one regular and / or constant and / or periodic pattern, such as a triangular pattern, a rectangular pattern, a hexagonal pattern, or a pattern with a convex slope. For example, an infrared light pattern may be a hexagonal pattern, preferably a hexagonal infrared light pattern, preferably a 2 / 5 hexagonal infrared light pattern. As used herein, the terms “triangular,” “rectangular,” and “hexagonal” are broad terms and should be given their usual idiomatic meanings to those skilled in the art, and should not be limited to any special or customized meanings. The terms may, but are not particularly limited, refer to a two-dimensional distribution of spots, in particular to the unit cells of a pattern. In a triangular pattern, the unit cells are triangles. A triangular pattern may have multiple groups of spots, each group having at least three spots that form a triangle. In a rectangular pattern, the spots in the rows and columns are rectangles relative to each other, for example, square unit cells, rectangular unit cells, or central rectangular unit cells. A hexagonal pattern has multiple groups of spots, each group having at least four spots that form a hexagonal unit cell; for example, three hexagonal cells form a hexagonal prism. In a hexagonal pattern, a 120° angle is formed between adjacent spots in a row and column. Different packing densities and ratios are possible for the pattern. For example, a 2 / 5 packing density is possible for a hexagonal pattern. By using a periodic 2 / 5 hexagonal pattern, it is possible to distinguish between artifacts and usable signals.

[0022] The infrared light pattern may include at least one dot pattern. The infrared light pattern has a low dot density. The number of infrared light spots is 4000 spots or less. The infrared light pattern may have 3000 spots or less or 3000 spots, preferably 2000 spots or less or 2000 spots. The number of spots may be less than 2000 and / or more than 0, preferably more than 5, more preferably more than 10, and most preferably more than 100. The infrared light pattern can have a low dot density, particularly as compared to other structured light technologies that typically have a dot density of 10k - 30k in a 55x38° field of view. By using such a low dot density, the above-mentioned diffraction loss can be compensated. By reducing the number of spots projected onto the object and / or the user, the contrast of the pattern image can be increased. When the number of dots increases, the emission illuminance per dot decreases. When the number of spots decreases, the emission illuminance of the spots increases, and as a result, the contrast of the projected pattern image of the infrared light pattern may increase. The infrared light pattern may have a periodic dot pattern with a reduced number of spots, and each spot has a high luminance. Such a light pattern can ensure an improvement in authentication using an illumination source behind the display and an image generation unit. Furthermore, since the number of spots is small, the eye safety requirements and stability requirements can be reliably met. The allowable dose can be divided among the spots of the light pattern.

[0023] At least one of the infrared light spots can be associated with a beam divergence of 0.2° - 0.5°, preferably 0.1° - 0.3°. The term "beam divergence" as used herein is a broad term and is given its ordinary and customary meaning to those skilled in the art and is not limited to a special meaning or a customized meaning. This term specifically, but not limited to, may refer to at least one measure of an increase in at least one diameter, such as a radius, and / or at least one diameter equivalent value associated with the distance from the optical aperture from which the beam exits. The measured value may be an angle or an angle equivalent value. In the context of the present invention, typically, the beam divergence is 1 / e 2It may be decided by that.

[0024] A pattern illumination source may include at least one pattern projector configured to generate an infrared light pattern. A pattern illumination source, such as a pattern projector, may have at least one emitter, and in particular more than one emitter. As used herein, the term “emitter” is a broad term and should be given the usual idiomatic meaning to those skilled in the art, and should not be limited to any special or customized meaning. The term may refer to at least one arbitrary device configured to provide at least one light beam, which may generate an infrared light pattern. The emitter may include at least one element selected from the group consisting of at least one laser light source, such as at least one semiconductor laser, at least one double heterostructure laser, at least one external resonator laser, at least one isolated confinement heterostructure laser, at least one quantum cascade laser, at least one distributed Bragg reflector laser, at least one polariton laser, at least one hybrid silicon laser, at least one extended resonator diode laser, at least one quantum dot laser, at least one volume Bragg grating laser, at least one indium arsenide laser, at least one gallium arsenide laser, at least one transistor laser, at least one diode-excited laser, at least one distributed feedback laser, at least one quantum well laser, at least one interband cascade laser, at least one semiconductor ring laser, at least one vertical resonator surface-emitting laser (VCSEL), or at least one non-laser light source, such as at least one LED or at least one light bulb. For example, a pattern projector may have at least one VCSEL, preferably multiple VCSELs. Multiple VCSELs may be arranged, for example, in at least one array having a matrix of VCSELs. The VCSELs may be arranged on the same substrate or on different substrates. As used herein, the term “vertical-cavity surface-emitting laser” is a broad term, given to those skilled in the art in its ordinary and conventional meaning, and is not limited to any special or customized meaning.This term, although not particularly limited, may refer to a semiconductor laser diode configured for emitting a laser beam perpendicular to the upper surface. Examples of VCSELs are described, for example, at en.wikipedia.org / wiki / Verticalcavity_surface-emitting_laser. VCSELs are generally known to those skilled in the art from, for example, WO 2017 / 222618 A, and each of the VCSELs is configured to generate at least one light beam. The VCSEL or a plurality of VCSELs may be configured to generate a desired number of spots of 4000 spots or less, preferably 3000 spots or less, more preferably 2000 spots or less. The plurality of generated spots may be associated with an infrared light pattern. The VCSEL may be configured to emit a light beam in a wavelength range of 800 - 1000 nm. For example, the VCSEL may be configured to emit a light beam of 808 nm, 850 nm, 940 nm, and / or 980 nm. For example, as described in CIE photometry, preferably the VCSEL emits light at 940 nm because the terrestrial solar irradiance is locally minimized at this wavelength.

[0025] A pattern illumination source may include at least one optical element configured to increase the number of spots, for example, by duplicating spots generated by a pattern projector. The pattern illumination source, in particular the optical element, may have at least one diffractive optical element (DOE) and / or at least one metasurface element. The DOE and / or metasurface element may be configured to generate multiple light beams from a single incident light beam. For example, the number of spots can be duplicated using a VCSEL that projects up to 2000 spots and an optical element consisting of multiple metasurface elements. Further arrangements are also possible, in particular, having a different number of projecting VCSELs and / or at least one different optical element configured to increase the number of spots. Other multiplication factors are also possible. For example, generated laser spots may be duplicated by using a VCSEL or multiple VCSELs and at least one DOE.

[0026] The pattern illumination source may include at least one transfer device. The term “transfer device” as used herein, also “transfer system,” is a broad term and should be given the usual, conventional meaning to those skilled in the art, and not limited to any special or customized meaning. The term can, without limitation, refer to one or more optical elements adapted to modify a light beam, particularly a light beam used to generate at least a portion of an infrared light pattern, such as by changing one or more of the beam parameters, beam width, or direction of the light beam. The transfer device may have at least one imaging optical device. Specifically, the transfer device may have one or more of the following: These include at least one lens, for example, selected from the group consisting of at least one focusable lens, at least one aspherical lens, at least one spherical lens, and at least one Fresnel lens; at least one diffractive optical element; at least one concave mirror; at least one beam deflection element, preferably at least one mirror; at least one beam splitting element, preferably at least one beam splitting cube or beam splitting mirror; at least one multi-lens system; at least one holographic optical element; and at least one meta-optical element. Specifically, the transfer device may have at least one refractive optical lens stack. Thus, the transfer device may have a multi-lens system having refractive properties.

[0027] The light beam generated by the pattern illumination source may propagate parallel to the optical axis. The pattern illumination source may include at least one reflecting element, preferably at least one prism, for deflecting the light beam onto the optical axis. For example, the angle between the light beam, such as a laser beam, and the optical axis may be less than 10°, preferably less than 5°, and even less than 2°. However, other embodiments are also possible. Furthermore, the light beam may be on the optical axis or off-axis. For example, the light beam may be parallel to the optical axis, or coincide with the optical axis, at a distance of less than 10 mm, preferably less than 5 mm, or even less than 1 mm from the optical axis.

[0028] As used herein, the term “flood illumination source” is a broad term and should be given its usual idiomatic meaning to those skilled in the art, and should not be limited to any special or customized meaning. The term may refer to at least one arbitrary device configured to provide substantially continuous spatial illumination, though not particularly limited. As used herein, the term “flood light” is a broad term and should be given its usual idiomatic meaning to those skilled in the art, and should not be limited to any special or customized meaning. The term may refer to substantially continuous spatial illumination, particularly diffuse and / or uniform illumination, though not particularly limited. Flood light has wavelengths in the infrared region, particularly the near-infrared region. A flood illumination source may have at least one LED or at least one VCSEL, preferably multiple VCSELs. As used herein, the term “substantially continuous spatial illumination” is a broad term and should be given its usual idiomatic meaning to those skilled in the art, and should not be limited to any special or customized meaning. Specifically, the term refers to uniform spatial illumination, although non-uniform areas are also possible. The area illuminated by the flood light source, for example, the user, part of the user, and / or the area covering the user's face, may be continuous. The power may be spread across the entire field of illumination. In contrast, the illumination provided by a light pattern may consist of at least two continuous areas, in particular multiple continuous areas, and / or the power may be concentrated in a small area of ​​the field of illumination (compared to the entire field of illumination). Infrared flood lighting is suitable for illuminating continuous areas, in particular one continuous area. Infrared pattern lighting is suitable for illuminating at least two continuous areas.

[0029] A flood illumination source can illuminate a measurement area, such as a user, a part of the user, and / or the user's face, with a substantially constant illumination intensity. As used herein, the term “constant” is broad and given its usual idiomatic meaning to those skilled in the art, and is not limited to any special or customized meaning. This term may, but is not limited to, a temporal aspect during exposure time. Flood light may vary over time and / or be substantially constant over time. As used herein, the term “substantially constant” is broad and should be given its usual idiomatic meaning to those skilled in the art, and should not be limited to any special or customized meaning. This term may, but is not limited to, perfectly constant illumination and embodiments where the deviation from constant illumination is ±10%, preferably ±5%, more preferably ±2%.

[0030] The relative distance between the flood illumination source and the pattern illumination source is less than 3.0 mm. The distance between the flood illumination source and the pattern illumination source can be defined as the distance between the furthest points of the flood illumination source and the pattern illumination source. The relative distance between the flood illumination source and the pattern illumination source can be less than 2.5 mm, preferably less than 2.0 mm. The lower limit of the relative distance is 50 μm, preferably 60 μm, more preferably 70 μm, even more preferably 80 μm, and most preferably 100 μm.

[0031] Pattern illumination sources and flood illumination sources can be combined into a single module. For example, pattern illumination sources and flood illumination sources can be placed on the same substrate, particularly with a minimum relative distance between them. The minimum relative distance can be defined by the physical extension of the flood illumination source and the pattern illumination source. By placing pattern illumination sources and flood illumination sources with a relative distance of less than 3.0 mm, the space requirements for the two illumination sources can be reduced. In particular, the illumination sources can be combined into a single module. This reduction in space requirements can reduce the amount of transparent area of ​​the display required for the illumination source to operate behind the display.

[0032] The emission of infrared flood light and the illumination of an infrared light pattern can be performed sequentially or at least partially overlapping. For example, the infrared flood and the infrared light pattern may be emitted simultaneously. For example, one of the flood light or the infrared light pattern may be emitted at a lower intensity than the other.

[0033] In one embodiment, the pattern illumination source and the flood illumination source may have at least one VCSEL, preferably more than one VCSEL. The pattern illumination source may have more than one first VCSEL mounted on a first platform. The flood illumination source may have more than one second VCSEL mounted on a second platform. The second platform may be located next to the first platform. The optoelectronic device may include a heat sink. A first increment having the first platform may be mounted on the heat sink. A second increment having the second platform may be mounted on the heat sink. The second increment may be different from the first increment. Thus, the first platform may be further away from optical elements configured to increase the number of spots, for example, to duplicate them. The second platform may be located closer to the optical elements. The beams emitted from the second VCSELs are defocused, resulting in overlapping spots. This results in substantially continuous illumination, or flood illumination.

[0034] The VCSELs of the pattern illumination source mounted on the first platform form the first VCSEL chip. The VCSELs of the flood illumination source mounted on the second platform form the second VCSEL chip.

[0035] The optoelectronic device may include at least one optical element having deflection properties. As outlined above, the VCSEL of the pattern illumination source is mounted on a first platform to form a first VCSEL chip. The VCSEL of the flood illumination source is mounted on a second platform to form a second VCSEL chip. The optical element may be configured to deflect the light emitted by the pattern illumination source, and the light emitted by the flood illumination source may be deflected in a different way.

[0036] For example, the optical element may consist of at least two different regions associated with at least two different deflection operations. Light emitted from a VCSEL chip can be deflected by the optical element depending on the region of the optical element that the light illuminates. For example, a first VCSEL chip may illuminate a first region of the optical element and deflect it by a first angle. A second VCSEL chip may illuminate a second region of the optical element and deflect it by a second angle. For example, the optoelectronic device comprises at least two optical elements, for example, one of the optical elements arranged to be illuminated by a pattern illumination source, in particular by a first VCSEL chip, and the other of the optical elements arranged to be illuminated by a flood illumination source, in particular by a second VCSEL chip. For example, the optical elements may have wavelength dependence. The optical elements may have structures that deflect light of different wavelengths in different ways. A VCSEL emitter associated with a pattern illumination source may be associated with a different wavelength than a VCSEL emitter associated with a flood illumination source. Additionally or alternatively, the two light beams may have different beam widths. For example, an optical element may be configured to deflect light of different beam widths in different ways. The two light beams produced by the pattern illumination source and the flood illumination source may have different beam widths. Therefore, the light from the pattern illumination source and the flood illumination source may be deflected in different ways.

[0037] Different embodiments are possible for pattern illumination sources and flood illumination sources. For example, the VCSELs of the pattern illumination source and the VCSELs of the flood illumination source may be arranged on opposite sides. For example, the optoelectronic device may have the following components.

[0038] (1) at least one first vertical cavity surface-emitting laser, wherein the first vertical cavity surface-emitting laser has an active area located at the bottom surface of the first vertical cavity surface-emitting laser, (2) at least one second vertical cavity surface-emitting laser, the second vertical cavity surface-emitting laser having an active region located on the upper surface of the second vertical cavity surface-emitting laser, the upper surface being located on the opposite side from the lower surface of the second vertical cavity surface-emitting laser, and (3) At least one support member.

[0039] Here, the first vertical-cavity surface-emitting laser is positioned on the support member along with its base, and the second vertical-cavity surface-emitting laser is positioned on the support member along with its base.

[0040] As used herein, the term “active region” is a broad term, given to those skilled in the art in its usual and conventional meaning, and is not limited to any special or customized meaning. The term may, but is not particularly limited, refer to a region from which illumination light is generated. Typically, an active region may have one or more quantum wells and / or one or more quantum dots from which illumination light is generated. An electric current can be applied to the active region to generate illumination light.

[0041] As used herein, the term “top” is a broad term and should be given the usual conventional meaning to those skilled in the art, and should not be limited to any special or customized meaning. This term may refer to the uppermost layer of the element, but is not particularly limited. The top may be the part of the element that is exposed or visible in a top view. As used herein, the term “bottom” is a broad term and should be given the usual conventional meaning to those skilled in the art, and should not be limited to any special or customized meaning. This term may refer to the lowermost layer of the element, but is not particularly limited. The bottom may be the part of the element that is exposed or visible in a bottom view.

[0042] Generally, a vertical-cavity surface-emitting laser has multiple layers. The upper surface of the vertical-cavity surface-emitting laser is on a different side from the lower surface of the vertical-cavity surface-emitting laser. The upper and lower surfaces may be paired.

[0043] The optical element includes at least one support member, the first vertical-cavity surface-emitting laser being positioned on the support member with a bottom surface, and the second vertical-cavity surface-emitting laser being positioned on the support member with a bottom surface. The first vertical-cavity surface-emitting laser and the second vertical-cavity surface-emitting laser may be positioned on the same support member.

[0044] As used herein, the term “support member” is a broad term, given to those skilled in the art in its usual and conventional meaning, and is not limited to any special or customized meaning. Specifically, the term can refer to at least one structural element that is designed to support a load and / or provides support to at least one further structural element. In particular, according to the present invention, a support member can carry and / or support at least one of a first vertical-cavity surface-emitting laser and a second vertical-cavity surface-emitting laser.

[0045] To position the lower surface of the first vertical-cavity surface-emitting laser on the support member, the lower surface of the first vertical-cavity surface-emitting laser may be fixed to the support member. To position the upper surface of the second vertical-cavity surface-emitting laser, which is positioned on the support member, on the support member, the upper surface of the second vertical-cavity surface-emitting laser may be fixed to the support member.

[0046] As used herein, the term “fixed” or its grammatical variations are broad terms, given to those skilled in the art their usual and idiomatic meanings, and not limited to any special or customized meanings. Specifically, the term may, but not limited to, stabilizing and / or fixing a first element to a second element. A stabilized and / or fixed first element may be in a predetermined relative position to the second element in such a manner that the first and second elements maintain their relative positions and can withstand at least one force and / or at least one stress acting on at least one of the first and second elements.

[0047] At least one of the following must be placed and / or fixed to the support member: A first vertical-cavity surface-emitting laser, and Second vertical cavity surface-emitting laser, This can be done by at least one of the following:

[0048] Soldering process, Bonding process, and Diffusion bonding process.

[0049] The support member is at least one of the following:

[0050] heat sink, Electrical connectors, especially printed circuit boards, and Reinforcement element.

[0051] As used herein, the term “heat sink” is a broad term, given to those skilled in the art in its usual and conventional meaning, and is not limited to any special or customized meaning. Specifically, the term can refer to any heat exchanger configured to dissipate heat generated by at least one component, but is not limited thereto. Typically, a heat sink may be a passive heat exchanger. A heat sink may transfer heat from its components to a fluid medium, typically air. A heat sink can dissipate heat from one or more of a first vertical-cavity surface-emitting laser and a second vertical-cavity surface-emitting laser.

[0052] As used herein, the term “electrical connector” is a broad term, given to those skilled in the art in its usual and conventional meaning, and is not limited to any special or customized meaning. Specifically, the term can refer to any electronic device configured to form at least one electrical connection between multiple parts of an electrical circuit or between different electrical circuits, but is not limited to this.

[0053] As used herein, the term “reinforcement element” is a broad term and should be given its usual, conventional meaning to those skilled in the art, and should not be limited to any special or customized meaning. The term may refer to any element configured for reinforcement, particularly a support member, but is not limited to any specific meaning.

[0054] As used herein, the term “printed circuit board” is a broad term and should be given the usual idiomatic meaning to those skilled in the art, and should not be limited to any special or customized meaning. Specifically, the term may refer to an element configured to connect multiple electronic components to one another, but is not limited to this. Typically, a printed circuit board has a laminated sandwich structure of conductive and insulating layers. Electrical components may be fixed to conductive pads on the outer layer of the printed circuit board so that those electrical components are electrically connected to conductive pads. In particular, a printed circuit board may include at least one conductive pad, to which electrical wires may be electrically connected.

[0055] The optical element may further include at least one optical lens. The first vertical-cavity surface-emitting laser and / or the second vertical-cavity surface-emitting laser may be configured to emit illumination light through the optical lens. The first distance between the first vertical-cavity surface-emitting laser, specifically the active region of the first vertical-cavity surface-emitting laser, and at least one optical lens may be different from the second distance between the second vertical-cavity surface-emitting laser, specifically the active region of the second vertical-cavity surface-emitting laser, and at least one optical lens.

[0056] As used herein, the term “optical lens” is a broad term, given to those skilled in the art in its ordinary and conventional meaning, and is not limited to any special or customized meaning. The term may, but is not limited to, a medium that is at least partially transparent and configured to bend and / or focus light rays.

[0057] An optical lens may have at least one focal length, where the first or second distance is equal to the focal length. In particular, each optical lens produces a sharp image because it is at the focal point of the optical lens and generates illumination light having an infrared light pattern in particular. In particular, each optical lens produces a blurred image because it is not at the focal point of the optical lens and generates illumination light having an infrared flood in particular.

[0058] As used herein, the term “focal length” is a broad term and should be given its usual, conventional meaning to those skilled in the art, and should not be limited to any special or customized meaning. Specifically, the term may refer to, but not limited to, the degree to which an optical system, specifically an optical lens, focuses and / or diverges light rays. An optical system may refer to the reciprocal of the optical power of the optical system. Typically, the focal length of an optical system can be calculated by considering and / or evaluating the image formation of an object. The focal length f can be evaluated using known lens formulas.

[0059]

number

[0060] Here, v relates to the image distance and u relates to the object distance. The optical lens may have one or more different focal lengths.

[0061] The first distance and the second distance may differ depending on the thickness of the first vertical cavity surface-emitting laser or the thickness of the second vertical cavity surface-emitting laser.

[0062] As used herein, the term “thickness” is a broad term, given to those skilled in the art in its usual and conventional meaning, and is not limited to any special or customized meaning. The term may, but is not limited to, the distance between two opposing surfaces of an element, such as a vertical-cavity surface-emitting laser. Thickness may also be the shortest distance between the top and bottom surfaces of each vertical-cavity surface-emitting laser. Distance may also be length.

[0063] The first vertical-cavity surface-emitting laser and the second vertical-cavity surface-emitting laser may be parallel. In particular, the geometric central axis of the first vertical-cavity surface-emitting laser and the geometric central axis of the second vertical-cavity surface-emitting laser may be parallel. As used herein, the term “geometric central axis” is a broad term and is given to those skilled in the art in its usual and conventional meaning, and is not limited to any special or customized meaning. The term may refer to a virtual axis passing through the center of an object such as a vertical-cavity surface-emitting laser, although this is not particularly limited. The center may be the geometric center of the object.

[0064] The first vertical-cavity surface-emitting laser and the second vertical-cavity surface-emitting laser may be coaxial. In particular, the geometric center axis of the first vertical-cavity surface-emitting laser and the geometric center axis of the second vertical-cavity surface-emitting laser may be coaxial.

[0065] The first vertical-cavity surface-emitting laser and the second vertical-cavity surface-emitting laser may be coaxial. In particular, the geometric central axis of the first vertical-cavity surface-emitting laser and / or the geometric central axis of the second vertical-cavity surface-emitting laser may be parallel to the geometric central axis of at least one optical lens.

[0066] A first vertical-cavity surface-emitting laser having an active region located at the bottom may be configured to emit illumination light at least partially in the direction of the top surface of the first vertical-cavity surface-emitting laser. By emitting illumination light at least partially in the direction of the top surface of the vertical-cavity surface-emitting laser, the illumination light may be emitted in such a manner that the illumination light is directed toward an optical lens, and in particular in such a manner that the illumination light propagates at least partially through the optical lens. The first vertical-cavity surface-emitting laser and the second vertical-cavity surface-emitting laser may emit illumination light in the same direction.

[0067] Various light sources and optical paths are distinguished. In the context of this invention, firstly, a nomenclature is used to refer to the light propagating from an optical element, particularly a vertical-cavity surface-emitting laser, to an object as "illumination light." Secondly, the light propagating from the object to the detector is referred to as "detection light." Detection light is generated during the process of illuminating an object with illumination light. The generated detection light comprises at least one of the following: illumination light reflected by the object, illumination light scattered by the object, illumination light transmitted by the object, and emission light generated by the object, such as phosphorescence or fluorescence generated by the object after the object is optically, electrically, or acoustically excited by the illumination light. Thus, detection light can be generated directly or indirectly through the illumination of an object with illumination light.

[0068] At least one further component of the first vertical-cavity surface-emitting laser may be at least partially transparent to the illumination light emitted by the first vertical-cavity surface-emitting laser.

[0069] At least one further component of the first vertical cavity surface-emitting laser may be a substrate for the first vertical cavity surface-emitting laser.

[0070] For example, the pattern illumination source and the flood illumination source may be elements of the light-emitting structure. The pattern illumination source may consist of a first array of light-emitting elements, and the flood illumination source may consist of a second array of light-emitting elements. The photoelectronic device may include a base that provides a single plane for mounting the light-emitting elements. The photoelectronic device may have at least one system of optical elements having a plurality of optical elements. The system of optical elements may be configured to focus the emitted infrared light pattern onto a focal plane. The optical element system may cover the light-emitting structure. The photoelectronic device may further include at least one flood photooptic element configured to defocus the light emitted by the light-emitting elements of the flood illumination source, thereby forming overlapping light spots, the flood photooptic element being configured not to affect the emitted infrared light pattern.

[0071] As used herein, the term “base” is a broad term and should be given its usual idiomatic meaning to those skilled in the art, and should not be limited to any special or customized meaning. The term may refer to a carrier on which at least one further element, in particular a light-emitting structure, can be mounted, but is not particularly limited. The base may consist of a plurality of cavities on which a light-emitting structure can be mounted. The base may have any shape, such as rectangular, circular, or hexagonal. This shape may refer to the sides of the base oriented perpendicular to the direction in which the height is measured. The base may have at least one semiconductor substrate. The base may be an element and / or additional element of the light-emitting structure. The base may be a thermally conductive printed circuit board (PCB) and / or may have a PCB.

[0072] The light-emitting element of the light-emitting element structure may be formed as a light-emitting element chip, for example, a VCSEL die cut from a wafer. Such a light-emitting element chip may be mounted on a base, for example, using at least one thermally conductive adhesive. The base may have at least one thermally conductive material. The base can be the bottom of an optoelectronic device, for example, the bottom of the housing of the optoelectronic device. Therefore, the dimensions of the base may be determined by the dimensions of the optical components and the housing. Alternatively, the base and the housing may be separate elements. For example, the light-emitting element chip may be mounted on a base, for example, a PCB, using at least one thermally conductive adhesive, and the housing may be applied to this combined element.

[0073] The base may have at least one thermally conductive material, in particular a thermally conductive material. The thermally conductive material may be configured as a heat exchanger. The thermally conductive material may be configured to regulate the temperature of the light-emitting element. The thermally conductive material may be configured to move heat generated by the light-emitting element away from the light-emitting element. For example, the thermally conductive material may have at least one composite material. The light-emitting structure may be attached to the thermally conductive material.

[0074] As used herein, the term “plane” is a broad term and should be given its usual idiomatic meaning to those skilled in the art, and not limited to any special or customized meaning. The term may, but is not limited to, a base surface. Surfaces may be continuous. Planes may be planes. Planes may be designed without curvature and / or steps. As used herein, the term “provides” a single plane is a broad term and should be given its usual idiomatic meaning to those skilled in the art, and not limited to any special or customized meaning. Specifically, the term may, but is not limited to, include, have, be usable, or function as a surface on which a light-emitting element structure can be mounted.

[0075] As used herein, the term “light-emitting structure” is a broad term and should be given its usual idiomatic meaning to those skilled in the art, and is not limited to any special or customized meaning. The term may, but is not limited to, an assembly of at least four light-emitting elements. A light-emitting structure has multiple light-emitting elements. The term “light-emitting element,” also abbreviated as “emitter,” as used herein, is a broad term and should be given its usual idiomatic meaning to those skilled in the art, and is not limited to any special or customized meaning. The term may, but is not limited to, at least one arbitrary device configured to provide at least one light beam. The light beam may generate an infrared light pattern.

[0076] As used herein, the term “array” is a broad term, given to those skilled in the art in its ordinary and conventional meaning, and is not limited to any special or customized meaning. The term can refer to, but is not limited to, a one-dimensional array, for example, a row array, or a two-dimensional array, particularly an array in a matrix having m rows and n columns, where m and n are independently positive integers. The light-emitting elements of the light-emitting element structure may be arranged in a periodic pattern. The light-emitting elements of the light-emitting element structure may be arranged in one or more of the following: a grid pattern, a hexagonal pattern, a shifted hexagonal pattern, etc. Multiple light-emitting elements of the light-emitting element structure may form a first array of light-emitting elements, and multiple light-emitting elements of the light-emitting element structure, different from the light-emitting elements of the first array, may form a second array of light-emitting elements. The light-emitting element structure may consist of two light-emitting element arrays, for example, two VCSEL arrays. The arrays are arranged in a single plane. For example, the emitters of the first and second arrays may be manufactured directly on a plane as a single die, or the emitters of the first and second arrays may be manufactured separately and mounted side by side on a plane. However, embodiments are also possible in which more arrays are used, configured to provide different functions, for example.

[0077] For example, the first and second arrays may be arranged side by side on a plane, particularly adjacent to each other. For instance, the plane may have the first array first, followed by the second array, along a direction perpendicular to the optical axis of the optoelectronic device. However, other arrangements are also possible.

[0078] For example, the cavities of the light-emitting elements of the first array and the cavities of the light-emitting elements of the second array can form a coupled pattern in which they are arranged alternately, for example, row by row or column by column.

[0079] The light-emitting elements of the pattern illumination source and the light-emitting elements of the flood illumination source may be activated at different times.

[0080] As used herein, the term “system” is a broad term and should be given the usual idiomatic meaning to those skilled in the art, and should not be limited to any special or customized meaning. The term may refer to any set of interacting or interdependent components that form a whole, though not particularly limited. Specifically, the components can interact with each other to perform at least one common function. At least two components may be treated independently, or they may be coupled or connectable. As used herein, the term “system of optical elements” is a broad term and should be given the usual idiomatic meaning to those skilled in the art, and should not be limited to any special or customized meaning. The term may refer to a system having at least two optical elements, though not particularly limited. A system of optical elements may include one or more of the following: at least one refractive lens, multiple refractive lenses, at least one diffractive optical element (DOE), multiple DOEs, or multiple metalenses. For example, a system of optical elements may have at least one refractive lens and at least one optical element configured to increase, for example, duplicate, the number of spots, for example, the spots generated by the light-emitting elements of a pattern illumination source. The optical element system may include at least one diffractive optical element (DOE) and / or at least one metasurface element. The DOE and / or metasurface element may be configured to generate multiple light beams from a single incident light beam. For example, an optical element having a VCSEL that projects up to 2000 spots and multiple metasurface elements can be used to duplicate the number of spots. Further arrangements are also possible, in particular, having different numbers of projecting VCSELs and / or at least one different optical element configured to increase the number of spots. Other multiplication factors are also possible. For example, by using a VCSEL or multiple VCSELs and at least one DOE, the generated laser spots can be duplicated.

[0081] The optical element system covers the light-emitting structure. As used herein, the term “covers the light-emitting structure” is a broad term and should be given in the ordinary, conventional sense to those skilled in the art, and should not be limited to any special or customized meaning. The term may, but is not particularly limited, refer to completely or at least partially covering the light-emitting structure, for example, at least a first light-emitting array. The optical element system may be designed and / or positioned to cover the light-emitting structure. For example, the first array may be covered only by the optical element system. For example, both the first and second arrays may be covered by the optical element system. The light-emitting structure may be positioned at the focal point of the optical element system. Such an arrangement allows the light emitted from the light-emitting elements, particularly those of a pattern illumination source, to be parallel light.

[0082] As used herein, the term “flood photo-optical element” is a broad term and should be given the usual conventional meaning to those skilled in the art, and should not be limited to any special or customized meaning. Specifically, the term may refer to, but is not limited to, an optical element assigned to a flood illumination source and configured to defocus the light emitted by the light-emitting elements of the flood illumination source, thereby forming overlapping light spots. A flood light source combined with a flood photo-optical element is configured to produce flood light, particularly diffuse illumination. A flood photo-optical element may have at least one element selected from the group consisting of at least one plate with a refractive index greater than 1.4, e.g., a glass plate, at least one diffuser plate, at least one lens, at least one microlens, at least one prisma, at least one Fresnel lens, at least one diffractive optical element (DOE), and at least one metalens. A second array may be completely covered by the flood photo-optical element. For example, a photoelectronic device may have a single flood photo-optical element covering all the light-emitting elements of a second array. For example, a photoelectronic device may have multiple flood photo-optical elements. For instance, each light-emitting element in a second array may have at least one assigned flood photo-optical element. As outlined above, the second array may be positioned at the focal point of the optical element system. Thus, the light generated by the second array will also be in focus. However, the optical image is modified by additional flood photo-optical elements so that the cavity is not properly collimated. This allows for the generation of diffuse flood illumination.

[0083] Flood photo-optical elements are configured to leave the emitted infrared light pattern unaffected. The term “unaffected” as used herein is a broad term and should be given its usual idiomatic meaning to those skilled in the art, and should not be limited to any special or customized meaning. The term may, but is not particularly limited, refer to the fact that the flood photo-optical elements are positioned and / or designed such that the light produced by the pattern illumination source does not interact with the flood photo-optical elements. For example, a flood photo-optical element may be positioned and / or designed to omit and / or exclude the pattern illumination source from being covered by the flood photo-optical element. In particular, the pattern illumination source is not covered by the flood photo-optical element.

[0084] As used herein, the term “image generation unit” is a broad term and should be given the usual idiomatic meaning to those skilled in the art, and should not be limited to any special or customized meaning. The term may refer to at least one unit of an optoelectronic device configured to generate at least one image, though not particularly limited. Images may be generated via hardware and / or software interfaces and can be considered an image generation unit. As used herein, the term “image generation” is a broad term and should be given the usual idiomatic meaning to those skilled in the art, and should not be limited to any special or customized meaning. Specifically, the term may refer to capturing and / or generating and / or determining and / or recording at least one image using an image generation unit, though not particularly limited. Image generation may include capturing and / or recording an image. Image generation may include capturing a single image and / or multiple images, such as a series of images. When images are generated via hardware and / or software interfaces, the capturing and / or generating and / or determining and / or recording of images may be triggered and / or initiated by the hardware and / or software interfaces. For example, image generation may include sequentially recording a series of images, such as a video or movie. Image generation may be initiated by user action, or it may be initiated automatically, for example, when it is automatically detected that at least one object or user is present in the field of view and / or in a given sector of the field of view of the image generation unit.

[0085] The image generation unit may comprise at least one optical sensor, in particular at least one pixelated optical sensor. The image generation unit may have at least one CMOS sensor or at least one CCD chip. For example, the image generation unit may have at least one CMOS sensor sensitive to the infrared spectral range. As used herein, the term “image” is a broad term and should be given in the usual idiomatic sense to those skilled in the art, and is not limited to any special or customized sense. Specifically, the term may refer to data recorded using an optical sensor, such as multiple electronic readouts from a CMOS or CCD chip, but is not limited to this. The image may include raw image data or a pre-processed image. For example, pre-processing may include applying at least one filter to the raw image data and / or applying at least one background correction and / or at least one background subtraction.

[0086] For example, the image generation unit may have one or more of the following: at least one monochrome camera including monochrome pixels, at least one color (e.g., RGB) camera including color pixels, and at least one IR camera. The camera may be a CMOS camera. The camera may have at least one monochrome camera chip, e.g., a CMOS chip. The camera may have at least one color camera chip, e.g., an RGB CMOS chip. The camera may have at least one IR camera chip, e.g., an IR CMOS chip. For example, the camera may include monochrome pixels, e.g., black and white pixels and color pixels. The color pixels and monochrome pixels are combined inside the camera. The camera may generally have a one-dimensional or two-dimensional array of image sensors such as pixels.

[0087] As outlined above, the image generation unit may consist of at least one camera. For example, the camera may be an internal camera and / or an external camera of the device having an optoelectronic device. As mentioned above, the internal camera and / or external camera of the device may be accessible via a hardware and / or software interface included in the optoelectronic device used as the image generation unit. If the device is a smartphone, or has a smartphone, the image generation unit may be a front camera, such as a selfie camera, and / or the smartphone's back camera.

[0088] The image generation unit may have a field of view between 10°x10° and 75°x75°, preferably between 55°x65°. For example, the field of view may be between 20°x20° and 65°x65°, more preferably between 30°x30° and 60°x60°, and most preferably between 55°x65°. The image generation unit may have a resolution of less than 2MP, preferably between 0.3MP and 1.5MP.

[0089] The image generation unit may include one or more optical elements, such as one or more lenses. For example, the optical sensor may be a fixed-focus camera having at least one lens fixedly adjusted relative to the camera. Alternatively, the camera may have one or more variable lenses that are automatically or manually adjusted. The camera may include at least one optical filter, such as at least one bandpass filter. The bandpass filter can be tuned to the spectrum of the light source. However, other cameras are also possible.

[0090] As used herein, the term “pattern image” is a broad term, given to those skilled in the art in its ordinary and conventional meaning, and is not limited to any special or customized meaning. Specifically, the term may, but not limited to, an image on, for example, an object and / or a user, generated by an image generation unit while the user is illuminated with an infrared light pattern. A pattern image may include an image showing at least a portion of the user, particularly the user’s face, and in particular an image on each region of interest, while the user is illuminated with the infrared light pattern. A pattern image may be generated by capturing and / or recording light reflected by the object and / or user being illuminated by the infrared light pattern. A pattern image showing a user may have at least a portion of the illuminated infrared light pattern on at least a portion of the user. For example, illumination by a pattern light source and imaging using a photosensor may be synchronized, for example, using at least one control unit of the optoelectronic device.

[0091] As used herein, the term “flood image” is a broad term and should be given its usual, conventional meaning to those skilled in the art, and should not be limited to any special or customized meaning. Specifically, the term may, but not limited to, an image generated by an image generation unit while an illumination source is emitting infrared flood light onto, for example, an object and / or a user. A flood image may include an image showing a user, particularly the user’s face, while the user is illuminated by the flood light. A flood image can be generated by capturing and / or recording light reflected by an object and / or user that is illuminated by the flood light. A flood image showing a user may have at least a portion of the flood light on at least a portion of the user. For example, illumination by a flood illumination source and imaging using a photosensor may be synchronized, for example, using at least one control unit of the optoelectronic device.

[0092] The image generation unit may be configured to capture and / or record pattern images and flood images simultaneously or at different timings. The image generation unit may be configured to capture and / or record pattern images and flood images in at least partially overlapping measurement areas or areas corresponding to measurement areas.

[0093] The optoelectronic device may be included within the apparatus. In particular, the optoelectronic device is part of the apparatus. The apparatus may include at least one display, wherein an infrared light pattern is emitted from a pattern illumination source and traverses the display, and / or infrared flood light is emitted from a flood illumination source and traverses the display.

[0094] As used herein, the term “display” is a broad term, given to those skilled in the art in its ordinary and conventional meaning, and is not limited to any special or customized meaning. The term may refer to any shape of device configured to display items of information, though not particularly limited. Items of information may be any information, such as at least one image, at least one diagram, at least one histogram, at least one graphic, text, a number, at least one symbol, or an operating menu. A display may be at least one screen, or may have at least one screen. A display may have any shape, for example, a rectangular shape. A display may be a front display of a device.

[0095] The display may have at least one organic light-emitting diode (OLED) display, or may have an organic light-emitting diode (OLED) display. As used herein, the term “organic light-emitting diode” is a broad term and is given the usual conventional meaning to those skilled in the art, and is not limited to any special or customized meaning. The term may also refer to a light-emitting diode (LED), which is a film of an organic compound in which the light-emitting electroluminescent layer is configured to emit light in response to an electric current. The OLED display may be configured to emit visible light.

[0096] The display, in particular the display area, may be made of glass and / or covered with glass. In particular, the display may have at least one glass cover.

[0097] The display may be at least partially transparent. The term “at least partially transparent” as used herein is a broad term and should be given its usual idiomatic meaning to those skilled in the art, and not limited to any special or customized meaning. Specifically, the term can refer, without limitation, to the property of a display that allows at least partially the transmission of light, particularly in a certain wavelength range, such as the infrared spectral region, especially the near-infrared spectral region. For example, a display may be semi-transparent in the near-infrared region. For example, a display may have 20%–50% transparency in the near-infrared region. A display may have different transparency in other wavelength regions. The present invention can propose an optoelectronic device including an image generation unit and two illumination sources that can be positioned behind the display of the device. Transparent areas of the display can allow the operation of the optoelectronic device behind the display. The display may be at least partially transparent, as described above. The display may have a reduced pixel density and / or a reduced pixel size, and / or may include at least one transparent conducting path. The transparent areas of the display may have a pixel density of 300-440 PPI (pixels per inch), more preferably 350-450 PPI. Other areas of the display, such as the opaque areas, may have a pixel density higher than 400 PPI, for example, 450-500 PPI.

[0098] The display has a display area. As used herein, the term “display area” is a broad term and should be given the usual idiomatic meaning to those skilled in the art, and should not be limited to any special or customized meaning. The term may, but is not particularly limited, refer to the active area of ​​the display, in particular the activatable area. The display may have additional areas such as recesses or cutouts. The display may be at least partially transparent in at least one continuous area, preferably at least two continuous areas. At least one continuous area may at least partially cover the image generation unit and / or pattern illumination source and / or flood illumination source. The pattern illumination source, flood illumination source and image generation unit may be positioned in front of the display in the direction of propagation of the infrared light pattern. As described above, the pattern illumination source and flood illumination source may be combined into a single module. This can reduce the transparent area of ​​the display.

[0099] The display may have a first region associated with a first pixel density (Pixels per inch (PPI)) value and a second region associated with a second pixel density value. The first pixel density value may be lower than the second pixel density value. The first pixel density value may be 450 PPI or less, preferably 300-440 PPI, more preferably 350-450 PPI. The second pixel density value may be 400-500 PPI, preferably 450-500 PPI. The first pixel density value may be associated with at least one continuous region being at least partially transparent. In one embodiment, the display may have a first region associated with a first pixel density value and a second region associated with a second pixel density value, where the first pixel density value is less than 350 pixels / inch and the second region is 400 pixels / inch or more.

[0100] As mentioned above, known displays that meet these requirements have low user appeal, and it is desirable to reduce the transparent area. Furthermore, when the image generation unit is covered with such a display, the contrast may be low because the light transmittance of the transparent area is typically 15%-50%. Contrast can be defined as the difference between the signal and the backlight. In this case, it can be thought that the contrast is reduced by transmittance. However, contrast can also be defined as the ratio of the signal to the background. In this case, the contrast may be reduced not only by transmittance but also by diffraction in the spot pattern projection, because higher-order spots provide additional intensity on top of the 0th-order intensity. Also, due to the structure of the display wiring, further diffraction may occur, further reducing the emitted illuminance. In addition, the spot pattern projected through the display may have higher-order spots, which can reduce the intensity of the main spot corresponding to the pattern before it crosses the display area. Due to the combined effects of these factors, the emitted illuminance can drop to about 3-5% of the initial emitted illuminance, resulting in the presence of undesirable additional spots within the pattern. In particular, this effect can occur when exiting the device (first pass through the display) and when entering the device (second pass through the display). The present invention makes it possible to provide sufficient emitted illumination and, consequently, contrast to the pattern image. Contrast can be increased by reducing the number of spots projected onto the user. This increases the emitted illumination of the spots and thus increases the contrast of the projected image of the spot pattern. Furthermore, it is also possible to reduce the transparent area of ​​the display. The transparent area of ​​the display can be reduced by integrating the pattern illumination source and flood illumination source used for user authentication into a single module. Using such an optoelectronic device, for example, the camera position can be repositioned from the outermost position of the display. Such repositioning allows for further optimization of the position of the image generation unit, thus optimizing the wiring. This can reduce the amount of wiring used or improve battery operation.

[0101] In a further aspect of the present invention, the use of an optoelectronic device according to the present invention for authenticating a user of a device having the device is disclosed.

[0102] In a further aspect of the present invention, a device for authenticating a user of a device in order to perform at least one operation on the device that requires authentication is disclosed.

[0103] The device has the following components:

[0104] At least one flood illumination source configured to emit infrared flood light, At least one pattern illumination source configured to emit at least one infrared light pattern having multiple infrared light spots, wherein the number of infrared light spots is 4000 or less, and the relative distance between the flood illumination source and the pattern illumination source is less than 3.0 mm. At least one image generation unit configured to generate at least one pattern image while a pattern illumination source emits an infrared light pattern, and to generate at least one flood image while a flood illumination source emits infrared flood light. A flood light source, a pattern light source, and at least one display that partially covers the image generation unit, and At least one authentication unit configured to perform at least one authentication process for a user using a flood image and a pattern image.

[0105] In particular, the apparatus has at least one optoelectronic device according to the present invention. Therefore, for details, options and definitions, refer to the apparatus and optoelectronic devices described above or in more detail below.

[0106] The device may be selected from a group consisting of television equipment, game consoles, personal computers, mobile devices, especially mobile phones and / or smartphones, and / or tablet computers, and / or laptops and / or tablets, and / or virtual reality devices and / or wearables such as smartwatches, or other types of portable computers.

[0107] As used herein, the term “authenticate” is a broad term, given to those skilled in the art in its ordinary and idiomatic meaning, and is not limited to any special or customized meaning. Specifically, the term may, but not limited to, verify the identity of a user. Specifically, authentication may include distinguishing a user from other people or objects, in particular distinguishing between authorized and unauthorized access. Authentication may include verifying the identity of each user and / or assigning an identity to a user. Authentication may include generating and / or providing identification information to other devices or units, such as at least one authorization unit for authorization to provide access to the device. Identity information may be proven by authentication. For example, ID information may and / or have at least one ID token. If authentication is successful, the facial image recorded by the image generation unit is verified to be the facial image of the user and / or the user's identity is verified. Authentication may be performed using at least one authentication process. The authentication process may have multiple steps, such as detecting at least one face on the flood image, assigning an ID to the detected face, and / or performing at least one ID check and / or verifying the user's ID.

[0108] As used herein, the term “authentication unit” is a broad term and is given to those skilled in the art in its usual and conventional meaning, and is not limited to any special or customized meaning. The term may, but is not particularly limited, refer to at least one unit configured to perform at least one authentication process of a user. An authentication unit may be at least one processor, or may have at least one processor. A processor may be any logic circuit configured to perform the basic operations of a computer or system, and / or, generally, a device configured to perform calculations or logical operations. In particular, a processor may be configured to process basic instructions that drive a computer or system. As an example, a processor may have at least one arithmetic logic unit (ALU), at least one floating-point unit (FPU), such as a mathematical coprocessor or numeric coprocessor, a number of registers, specifically registers configured to supply operands to the ALU and store the results of calculations, and memory such as L1 cache memory and L2 cache memory. In particular, a processor may be a multi-core processor. Specifically, a processor may be a central processing unit (CPU), or may have a central processing unit (CPU). Additionally or alternatively, the processor may be a microprocessor or have a microprocessor, and therefore specifically, the elements of the processor may be contained in a single integrated circuit (IC) chip. Additionally or alternatively, the processor may be one or more chips, such as one or more application-specific integrated circuits (ASICs) and / or one or more field-programmable gate arrays (FPGAs) and / or one or more tensor processing units (TPUs) and / or dedicated chips optimized for machine learning. Specifically, the processor may be configured to perform one or more evaluation operations, such as by software programming. At least one or any component of a computer program configured to perform the authentication process may be executed by the processing device.Alternatively or additionally, the authentication unit may be or have a connection interface. The connection interface may be configured to transfer data from a device to a remote device, or vice versa. At least one or any component of a computer program configured to perform the authentication process may be executed by the remote device.

[0109] For example, an authentication unit can perform at least one face detection using flood images. Face detection can be performed locally on the device. However, face identification, i.e., assigning an ID to the detected face, can be performed remotely, for example, in the cloud, especially when identification is required and verification is not the only task. User templates can be stored on a remote device, for example, in the cloud, and do not need to be stored locally. This can be advantageous from a storage space and security standpoint.

[0110] The authentication unit may be configured to identify a user based on a flood image. In particular, the authentication unit may therefore transfer data to a remote device. Alternatively or additionally, the authentication unit may perform user identification based on a flood image, in particular by running an appropriate computer program having the respective function. The term “identify” as used herein is a broad term and should be given in the ordinary idiomatic sense to those skilled in the art, and should not be limited to any special or customized sense. Specifically, the term may mean, but not limited to, assigning an identity to a detected face and / or verifying at least one identity and / or verifying the identity of the user.

[0111] The authentication process may have multiple steps. For example, the authentication process may include performing at least one face detection. The face detection step may include analyzing the flood image. Furthermore, for example, the authentication process may include identification. Identification may include assigning an ID to the detected face and / or performing at least one ID check and / or verifying the user's ID. Identification may include performing face verification to determine whether the captured face is the user's face. User identification may include, for example, matching a flood image showing the contours of a part of the user, particularly a part of the user's face, to a template. User identification may include determining whether the captured face is the user's face, in particular whether the captured face corresponds to at least one image of the user's face stored, for example, in at least one memory of the device.

[0112] The analysis of a flood image may include one or more of the following: filtering, selection of at least one region of interest, formation of a difference image between the flood image and at least one offset, inversion of the flood image, background correction, decomposition into color channels, decomposition into hue, saturation, and brightness channels, frequency decomposition, singular value decomposition, application of a Canny edge detector, application of the Laplacian of a Gaussian filter, application of a difference Gaussian filter, application of the Sobel operator, application of the Laplace operator, application of the Shah operator, application of the Priwitt operator, application of the Roberts operator, application of the Kirsch operator, application of a high-pass filter, application of a low-pass filter, application of a Fourier transform, application of the Radon transform, application of the Huff transform, application of a wavelet transform, thresholding, and creation of a binary image. The region of interest may be determined manually by the user or automatically, such as by recognizing a user in the image. In particular, the analysis of a flood image may involve using at least one image recognition technique, in particular a face recognition technique. The image recognition technique may have at least one process for identifying a user in the image. Image recognition involves using at least one technique selected from techniques such as color-based image recognition using features like template matching, segmentation and / or blob analysis using size and shape, and machine learning and / or deep learning using at least one convolutional neural network.

[0113] Analysis of flood images may include determining multiple facial features. Analysis may include comparing the determined facial features with template features, in particular matching them. Template features may be features extracted from at least one template. Templates may be, or have, at least one image generated in a registration process, such as when initializing a device. Templates may be images of authenticated users. Template features and / or facial features may consist of vectors. Feature matching includes determining the distance between vectors. User identification consists of comparing the distance between vectors to at least one predefined limit value, and if the distance is at least within an acceptable range and less than or equal to the predefined limit value, the user is successfully identified. Otherwise, the user is declined and / or rejected.

[0114] For example, image recognition involves using a trained model that includes at least one model, particularly at least one face recognition model. Flood image analysis is performed by using a face recognition system such as FaceNet, as described in Florian Schroff, Dmitry Kalenichenko, James Philbin, "FaceNet: A Unified Embedding for Face Recognition and Clustering," arXiv:1503.03832. The trained model has at least one convolutional neural network. For example, the convolutional neural network can be designed as described in MD Zeiler and R. Fergus, "Visualizing and understanding convolutional networks," CoRR, abs / 1311.2901, 2013, or C. Szegedy et al., "Going deeper with convolutions," CoRR, abs / 1409.4842, 2014. For more details on convolutional neural networks for face recognition systems, see Florian Schroff, Dmitry Kalenichenko, James Philbin, "FaceNet: A Unified Embedding for Face Recognition and Clustering", arXiv:1503.03832. Labeled image data from image databases can be used as training data.Specifically, data can be obtained from one or more of the YouTube® Faces Database or the Google® Facial Expression Comparison dataset, as described in GB Huang, M. Ramesh, T. Berg, and E. Learned-Miller, "Labeled faces in the wild: A database for studying face recognition in unconstrained environments", Technical Report 07-49, University of Massachusetts, Amhersy, October 2007; L. Wolf, T. Hassner, and I. Maoz, "Face recognition in unconstrained videos with matched background similarity", in IEEE Conf. on CVPR, 2011. Training of the convolutional neural network can be performed as described in Florian Schroff, Dmitry Kalenichenko, and James Philbin, "FaceNet: A Unified Embedding for Face Recognition and Clustering", arXiv:1503.03832.

[0115] The authentication unit may be further configured to determine material data based on the pattern image. Therefore, the authentication unit may, in particular, transfer the data to a remote device. Alternatively or additionally, the authentication unit may perform material determination based on the pattern image, in particular by running appropriate computer programs having their respective functions. In particular, by considering the material as a parameter for verifying the authentication process, the authentication process can be made more robust against being circumvented by using user-recorded images.

[0116] The authentication unit is configured to extract material data from the pattern image by beam profile analysis of the light spots. Regarding beam profile analysis, WO 2018 / 091649 A1, WO 2018 / 091638 A1, and WO 2018 / 091640 A1 are referenced, and their entire contents are included by reference. * Beam profile analysis enables reliable classification of scenes based on a small number of light spots. Each of the light spots in the pattern image may have a beam profile. As used herein, the term “beam profile” may generally refer to at least one intensity distribution of a light spot on an optical sensor as a function of pixels. The beam profile may be selected from the group consisting of trapezoidal beam profiles, triangular beam profiles, conical beam profiles, and linear combinations of Gaussian beam profiles.

[0117] The authentication unit may be configured to delegate at least one step of the authentication process, such as user identification, and / or at least one step of the verification process, such as reviewing material data, to a remote device, specifically a server and / or a cloud server. The device and the remote device may be part of a computer network, particularly the internet. This may cause the device to be used as a field device used by the user to generate data required in the authentication process and / or its verification. The device can transmit the generated data and / or data related to intermediate steps of the authentication process and / or its verification to the remote device. In such a scenario, the authentication unit may be a connection interface configured to transmit information to the remote device, and / or may have a connection interface. Data generated by the remote device used in the authentication process and / or its verification may be further transmitted to the device. This data may be received by a connection interface configured by the device. The connection interface may be configured, in particular, for the transmission or exchange of information. In particular, the connection interface may provide a data transfer connection. As an example, the connection interface may be or have at least one port, including one or more of a network or internet port, a USB port, and a disk drive.

[0118] It is emphasized that data from a device may be sent to a specific remote device depending on at least one circumstance, such as the date, day, or load of a particular remote device. The specific remote device is not selected by the field device. Rather, a further device may select which specific remote device to send the data to. The authentication process and / or the generation of verification data may involve the use of multiple different entities of the remote device. At least one entity may generate intermediate data and send the intermediate data to at least one further entity.

[0119] It is emphasized that data from a device may be sent to a specific remote device depending on at least one circumstance, such as the date, day, or load of a particular remote device. The specific remote device is not selected by the field device. Rather, a further device may choose which specific remote device to send data to. The authentication process and / or the generation of verification data may involve the use of multiple different entities of the remote device. At least one entity may generate intermediate data, and this intermediate data may be sent to at least one further entity.

[0120] The authentication unit is configured to use a facial recognition authentication process that operates on flood images, pattern images, and / or extracted material data. The authentication unit may also be configured to extract material data from pattern images.

[0121] In one embodiment, extracting material data from a pattern image may include generating material type and / or data derived from the material type. Preferably, the extraction of material data may be based on the pattern image. The material data may be extracted by using at least one model. The extraction of material data may include providing the pattern image to the model and / or receiving material data from the model.

[0122] Providing an image to the model may include, and may follow, receiving a pattern image in the model's input layer or via the model's loss function. The model may be a data-driven model. A data-driven model may have an encoder-decoder structure such as a convolutional neural network and / or an autoencoder. Other examples for generating representations may be FFT, wavelets, deep learning such as CNNs, energy models, normalization flows, GANs, visual transformers, or transformers used in natural language processing, autoregressive image modeling, normalization flows, deep autoencoders, or deep energy-based models. Supervised or unsupervised schemes are applicable to generating representations, and embeddings such as cosine or Euclidean metrics in ML languages ​​are also possible. A data-driven model may be parametricated according to a training dataset containing at least one image and material data, preferably at least one pattern image and material data. In another embodiment, extracting material data may include providing an image to the model and / or receiving material data from the model. In another embodiment, a data-driven model may be trained according to a training dataset containing at least one image and material data. In another embodiment, the data-driven model may be parametricized according to a training dataset containing at least one image and material data. The data-driven model may be parametricized according to a training dataset for receiving an image and providing material data based on the received image. The data-driven model may be trained according to a training dataset to receive an image and provide material data as output based on the received image. The training dataset may have at least one image and material data, preferably material data associated with at least one image. The image may include a representation of the image. The representation may be a low-dimensional representation of the image. The representation may have at least some of the data or information associated with the image. The representation of the image may have feature vectors.In embodiments, determining representations, particularly low-dimensional representations, may be based on principal component analysis (PCA) mapping or emission basis function (RBF) mapping. Determining representations may also be called generating representations. Generating representations based on PCA mapping may include clustering based on features of pattern images and / or sub-images. Additionally or alternatively, generating representations may be based on a neural network structure suitable for dimensionality reduction. A neural network structure suitable for dimensionality reduction may consist of an encoder and / or decoder. In one example, the neural network structure may be an autoencoder. In one example, the neural network structure may have a convolutional neural network (CNN). The CNN may include at least one convolutional layer and / or at least one pooling layer. The CNN can reduce the dimensionality of sub-images and / or images, for example, by applying convolutions based on the convolutional layer and / or by pooling. Applying convolutions may be suitable for selecting features related to material information in pattern images.

[0123] In one embodiment, the model is suitable for determining output based on input. In particular, the model may be suitable for determining material data based on an image as input. The model may be a deterministic model, a data-driven model, or a hybrid model. A deterministic model preferably reflects a physical phenomenon in mathematical form, including, for example, a first-principles model. A deterministic model may have a set of equations that describe the interaction between matter and patterned electromagnetic emission, thereby yielding state measurements, vital sign measurements, etc. A data-driven model may be a classification model. A hybrid model may be a classification model that includes at least one machine learning architecture having deterministic or statistical adaptations and model parameters. Statistical or deterministic adaptations can be introduced to improve the quality of results because they provide a systematic relationship between empiricism and theory. In one embodiment, the data-driven model may be a classification model. The classification model has at least one machine learning architecture and model parameters. For example, a machine learning architecture may be one or more of the following: linear regression, logistic regression, random forest, piecewise linear, nonlinear classifier, support vector machine, naive Bayes classification, nearest neighbor classification, neural network, convolutional neural network, generative adversarial network, support vector machine, or gradient boosting algorithm. In the case of a neural network, the model may be, but not limited to, a multiscale neural network or a recurrent neural network (RNN) such as a gated recurrent unit (GRU) recurrent neural network or a long-short-slow-memory (LSTM) recurrent neural network. A data-driven model may be parameterized according to a training dataset. A data-driven model may be trained based on a training dataset. Training a model may include parametricating the model. The term training may also be written as learning.This term may refer, but is not limited to, the process of building a classification model, particularly the process of determining and / or updating the parameters of the classification model. Updating the parameters of a classification model may also be called retraining. Retraining may be included when training is referred to herein. In embodiments, the training dataset may include at least one image and material information.

[0124] In embodiments, extracting material data from an image using a data-driven model may include providing the image to the data-driven model. Additionally or alternatively, extracting material data from an image using a data-driven model may include generating image-related embeddings based on the data-driven model. Embeddings may refer to low-dimensional representations associated with the image, such as feature vectors. Feature vectors may be suitable for suppressing background while preserving material signatures that indicate material data. In this context, background may refer to information independent of material signatures and / or material data. Furthermore, background may refer to information related to biometric features, such as facial features. Material data may be determined using a data-driven model based on image-related embeddings. Additionally or alternatively, extracting material data from an image by providing the image to a data-driven model may include transforming the image into material data, particularly material feature vectors that indicate material data. Thus, material data may further include material feature vectors, and / or material feature vectors may be used to determine material data.

[0125] In the embodiment, the authentication process may be verified based on extracted material data.

[0126] In one embodiment, verification based on extracted material data may include determining whether the extracted material data matches desired material data. Determining whether the extracted material data matches desired material data may be referred to as verification. Allowing or denying a user and / or object to perform at least one operation on a device that requires authentication based on material data may include verifying authentication or an authentication process. Verification can be performed based on material data and / or images. Determining whether the extracted material data corresponds to desired material data may include determining the similarity between the extracted material data and the desired material data. Determining the similarity between the extracted material data and the desired material data may include comparing the extracted material data with the desired material data. The desired material data may refer to a given material data. For example, the desired material data may be skin. It may be determined whether the material data corresponds to desired material data. For example, the material data may be a non-skin material or silicone. Determining whether the material data corresponds to desired material data may include comparing the material data with the desired material data. The comparison of material data with desired material data may allow and / or deny the user and / or object the execution of at least one operation requiring authentication. For example, skin as desired material data may be compared with non-skin material or silicone as material data, and since silicone or non-skin material may differ from skin, the result may be a rejection.

[0127] In one embodiment, the authentication process or verification may include generating at least one feature vector from material data and matching the material feature vector with an associated reference template vector for the material.

[0128] The authentication unit may be configured to authenticate a user if it can identify the user and / or if the material data matches the desired material data. The device may include at least one authentication unit configured to allow the user to perform at least one operation on the device, for example, unlock the device, if authentication is successful, or to deny the user the ability to perform at least one operation on the device if authentication fails. This allows the user to know the result of authentication.

[0129] In a further embodiment, the present invention discloses a method for authenticating a user of a device in order to perform at least one operation on the device that requires authentication.

[0130] The device includes a display and the following method: a. A step of illuminating a user with at least one infrared light pattern having multiple infrared light spots from at least one pattern illumination source of a device, wherein the number of infrared light spots is 4000 or less, b. A step of illuminating a user with infrared flood light from at least one flood light source of the apparatus, wherein the distance between the flood light source and the pattern light source is less than 3.0 mm, c. While the user is illuminated with an infrared light pattern, the image generation unit of the device generates at least one pattern image showing at least a portion of the user, particularly the user's face; while the user is illuminated with infrared flood light, the image generation unit of the device generates at least one image showing the user, wherein the image generation unit and / or the flood light and pattern illumination source are at least partially covered by the display of the device. d. A step of identifying a user based on a flood image using at least one authentication unit of the device. e. A step of extracting material data from at least one pattern image using an authentication unit, and f. A step that enables the user to perform at least one operation on the apparatus that requires authentication based on material data and identification.

[0131] The method steps may be performed in a predetermined order or in a different order. Furthermore, there may be one or more additional method steps that are not listed. Furthermore, one, two or more, or all of the method steps may be repeated. For details, options, and definitions, refer to the optoelectronic devices and apparatus described above. Thus, specifically, the method may involve using an apparatus according to the present invention, such as one or more embodiments given above or given in more detail below.

[0132] User identification may involve matching flood images with templates.

[0133] The method may involve using a facial recognition authentication process operating on flood images, pattern images, and / or extracted material data. The pattern images and / or images showing the user while the user is illuminated with infrared flood light may show at least a portion of the user's face.

[0134] All method steps described can be performed using the apparatus. Therefore, a single processing unit may be configured to exclusively execute at least one computer program used in at least one embodiment of the method according to the present invention, in particular at least one line of computer program code configured to execute at least one algorithm. Here, the computer program executed on the single processing unit may include all instructions that cause the computer to execute the method. Alternatively, or additionally, at least one method step may be performed using at least one remote device, selected from at least one server or cloud server, in particular when the apparatus and remote device may be part of a computer network. In this case, the computer program may include at least one remote component executed by the at least one remote processing unit to execute at least one method step. The remote component may have the functionality to perform user identification and / or material data extraction. Furthermore, the computer program may include at least one interface configured to transfer data to and / or receive data from at least one remote component of the computer program.

[0135] The method may include allowing or denying a user to perform at least one operation on the device. In one embodiment, allowing or denying a user to perform at least one operation on the device that requires authentication based on material data may include allowing the user to perform at least one operation that requires authentication on the device if the material data matches desired material data and / or authentication is likely to succeed. The desired material data may be predetermined material data. Authentication may succeed if the user can be identified and / or the material data matches the desired material data. Furthermore, allowing or denying an object to perform at least one operation on the device that requires authentication based on material data may include denying the object to perform at least one operation on the device that requires authentication if the material data does not match desired material data and / or authentication is likely to fail. Authentication may fail if the pattern image does not match the image template and / or the material data does not match desired material data.

[0136] At least one operation on a device requiring authentication may be access to the device, for example, unlocking the device, and / or preferably accessing an application associated with the device, and / or preferably accessing a portion of an application associated with the device. In embodiments, enabling a user to access a resource may include enabling the user to perform at least one operation on the device and / or system. Resources may be a device, a system, a function of a device, a function of a system, and / or entities. Additionally and / or alternatively, enabling a user to access a resource may include enabling the user to access an entity. Entities may be physical entities and / or virtual entities. A virtual entity may be, for example, a database. A physical entity may be an area with restricted access. An area with restricted access may be one of the following: a security area, a room, an apartment, a vehicle, or some of the examples above. The device and / or system may be locked. The device and / or system may be unlocked only by authorized users.

[0137] As used herein, the term “user” is a broad term, given to those skilled in the art in its ordinary and conventional meaning, and is not limited to any special or customized meaning. In particular, the term may refer to any person who intends to use the apparatus and / or who uses the apparatus.

[0138] This method may be implemented on a computer. As used herein, the term “computer implementation” is a broad term and should be given the usual, conventional meaning to those skilled in the art, and should not be limited to any special or customized meaning. Specifically, this term may refer to a method comprising, but not limited to, at least one computer and / or at least one computer network. The computer and / or computer network may include at least one processor configured to perform at least one of the method steps of the method according to the present invention. Specifically, each method step is performed by the computer and / or computer network. This method may be performed entirely automatically, specifically without user intervention.

[0139] Further disclosed and proposed herein are computer programs that include computer-executable instructions for performing a method according to the present invention in one or more embodiments contained herein, when the program is executed on a computer or computer network. Specifically, the computer program may be stored on a computer-readable data carrier and / or on a computer-readable storage medium. The computer program may be executed on at least one processor comprising an optoelectronic device and / or apparatus. The computer program may generate input data by accessing and / or controlling at least one unit of the optoelectronic device and / or apparatus, such as a pattern illumination source and / or a flood illumination source and / or an image generation unit. The computer program may generate result data based on the input data, in particular by using an authentication unit.

[0140] In this specification, the terms “computer-readable data carrier” and “computer-readable storage medium” may, in particular, refer to non-temporary data storage means such as hardware storage media on which computer-executable instructions are stored. Stored computer-executable instructions can be associated with computer programs. Specifically, a computer-readable data carrier or storage medium may be, or have, a storage medium such as random access memory (RAM) and / or read-only memory (ROM).

[0141] Therefore, specifically, one, one or more, or even all of the above-described method steps a. through f. can be carried out using a computer or computer network, preferably using a computer program.

[0142] Further disclosed and proposed herein are computer program products having program code means for performing a method according to the present invention in one or more embodiments included herein when the program is executed on a computer or computer network. Specifically, the program code means may be stored on a computer-readable data carrier and / or a computer-readable storage medium.

[0143] Further disclosed and proposed herein are data carriers having data structures stored thereon, which, after being loaded into the working memory or main memory of a computer or computer network, for example, can be used to perform methods according to one or more embodiments disclosed herein.

[0144] Further disclosed and proposed herein are computer program products having program code means stored on a machine-readable carrier for executing methods according to one or more embodiments disclosed herein when the program is executed on a computer or computer network. In this specification, a computer program product means a program as a tradable product. The product can generally exist in any form, such as on a paper format, on a computer-readable data carrier, and / or on a computer-readable storage medium. Specifically, computer program products may be distributed via data networks.

[0145] Furthermore, disclosed and proposed herein is a non-temporary computer-readable medium that, when executed by one or more processors, contains instructions causing one or more processors to perform a method according to one or more embodiments disclosed herein.

[0146] Finally, disclosed and proposed herein are modulated data signals containing instructions readable by a computer system or computer network for carrying out methods according to one or more embodiments disclosed herein.

[0147] Referring to the computer implementation aspects of the present invention, one or more method steps, or even all of the method steps, of the methods according to one or more embodiments disclosed herein can be performed using a computer or computer network. Therefore, generally, any method step involving data provision and / or manipulation is performed using a computer or computer network. Generally, these method steps may include any of the method steps except those requiring manual intervention, such as certain aspects of sample provision and / or the performance of actual measurements.

[0148] Specifically, the following constituent elements are further disclosed herein: - A computer or computer network comprising at least one processor, wherein the processor is adapted to perform a method according to one of the embodiments described herein. - A computer-loadable data structure adapted to perform the method according to one of the embodiments described herein while the data structure is being executed on a computer, - A computer program which, while the computer program is running on a computer, is adapted to perform a method according to one of the embodiments described herein. - A computer program, including programming means for performing a method according to one of the embodiments described herein, while the computer program is running on a computer or on a computer network. - A computer program including the program means according to the above embodiment, wherein the program means is stored in a computer-readable storage medium, - A storage medium wherein a data structure is stored in the storage medium and is adapted to perform a method according to one of the embodiments described herein after the data structure has been loaded into the main and / or working memory of a computer or computer network, and - A computer program product having program code means, wherein the program code means can be stored in or is stored in a storage medium to perform a method according to one of the embodiments described herein when executed on a computer or on a computer network.

[0149] As used herein, the terms “have,” “comprise,” “include,” or any grammatical variations thereof are used in a non-exclusive manner. Thus, these terms can refer to both situations in which the entity described in this context has no further features other than those introduced by these terms, and situations in which one or more further features exist. For example, the expressions “A has B,” “A comprises B,” and “A includes B” may refer to both situations in which there are no other elements in A besides B (i.e., A consists only of B), and situations in which, in addition to B, one or more further elements exist in entity A, such as element C, elements C and D, or even other elements.

[0150] Furthermore, it should be noted that the terms “at least one,” “one or more,” or similar expressions indicating that a feature or element may exist once or more times, are typically used only once when introducing each feature or element. In most cases, when referring to each feature or element, the expressions “at least one” or “one or more” are not repeated, regardless of the fact that each feature or element may exist once or more times.

[0151] Furthermore, in this specification, terms such as “preferably,” “more preferably,” “particularly,” “more especially,” “specifically,” and “more specifically” are used in combination with any feature without limiting substitutability. Thus, features introduced by these terms are arbitrary features and are not intended to limit the scope of the claims in any way. The present invention can be carried out using alternative features as will be recognized by those skilled in the art. Similarly, features introduced by “in one embodiment of the present invention” or similar expressions are intended to be arbitrary features without any limitation on alternative embodiments of the present invention, without any limitation on the scope of the present invention, and without any further constraint on the possibility of combining such introduced features with other arbitrary or non-arbitrary features of the present invention.

[0152] Overall, in the context of the present invention, the following embodiments are considered preferred: In one embodiment, an optoelectronic device is disclosed, which includes the following components: At least one pattern illumination source configured to emit at least one infrared light pattern consisting of multiple infrared light spots, wherein the number of infrared light spots is 4000 or less. At least one flood illumination source configured to emit infrared flood light, and At least one image generation unit configured to generate at least one pattern image while a pattern illumination source emits an infrared light pattern, and at least one flood image while a flood illumination source emits infrared flood light.

[0153] Here, the relative distance between the flood light source and the pattern light source is less than 3.0 mm.

[0154] In one embodiment, the photoelectronic device may be configured within the device, the device may include at least one display, an infrared light pattern may traverse the display while being emitted from a pattern illumination source, and / or infrared flood light may traverse the display while being emitted from a flood illumination source.

[0155] In one embodiment, the relative distance between the flood illumination source and the pattern illumination source may be less than 2.5 mm, preferably less than 2.0 mm.

[0156] In one embodiment, the infrared light may be coherent, and the infrared light pattern may be a coherent infrared light pattern.

[0157] In one embodiment, the infrared light pattern may be a hexagonal pattern, preferably a 2 / 5 hexagonal infrared light pattern.

[0158] In one embodiment, at least one of the infrared light spots may be associated with a beam divergence of 0.2°–0.5°, preferably 0.1°–0.3°.

[0159] In one embodiment, the infrared light pattern may be a near-infrared light pattern.

[0160] In one embodiment, the infrared light pattern may have 3000 or fewer spots, preferably 2000 or fewer spots.

[0161] In one embodiment, the infrared light pattern may have at least one dot pattern, and the infrared light pattern may have a low dot density. The infrared light pattern may have 2000 or fewer dots and / or 0 or more, preferably 5 or more, more preferably 10 or more, and most preferably 100 or more.

[0162] In one embodiment, the image generation unit may have a field of view between 10°x10° and 75°x75°, preferably between 20°x20° and 65°x65°, more preferably between 30°x30° and 60°x60°, and most preferably 55°x65°.

[0163] In one embodiment, the image generation unit may have a resolution of less than 2MP, preferably between 0.3MP and 1.5MP.

[0164] In one embodiment, the image generation unit may include at least one CMOS sensor or at least one CCD chip.

[0165] In one embodiment, the pattern illumination source may include at least one pattern projector configured to generate an infrared light pattern.

[0166] In one embodiment, a pattern illumination source, such as a pattern projector, may have at least one vertical cavity surface-emitting laser (VCSEL), preferably a plurality of VCSELs.

[0167] In one embodiment, the pattern illumination source may include at least one optical element configured to increase the number of spots, and the optical element may include at least one diffractive optical element (DOE) and / or at least one metasurface element.

[0168] In one embodiment, the flood lighting source may have at least one VCSEL, preferably a plurality of VCSELs.

[0169] In one embodiment, the pattern illumination source may have a plurality of first VCSELs mounted on a first platform, and the flood illumination source may have a plurality of second VCSELs mounted on a second platform.

[0170] In one embodiment, the photoelectron device may include a heat sink, a first increment having a first platform may be mounted above the heat sink, and a second increment having a second platform may be mounted above the heat sink.

[0171] In one embodiment, the emission of infrared flood light and the illumination of an infrared light pattern may be performed successively or at least partially in overlap.

[0172] In one embodiment, the photoelectronic device may include at least one optical element having at least two distinct regions associated with two different deflection operations, wherein light emitted from a pattern illumination source and light emitted from a flood illumination source may be deflected differently by the optical element depending on the region of the optical element illuminated by the light.

[0173] In one embodiment, the pattern illumination source may emit light having a first wavelength, and the flood illumination source may emit light having a second wavelength different from the first wavelength, and the photoelectronic device may include at least one optical element, the optical element having wavelength dependence.

[0174] In one embodiment, the pattern illumination source may emit at least one light beam having a first beam width, and the flood illumination source may emit at least one light beam having a second beam width different from the first beam width, and the photoelectronic device may include at least one optical element, the optical element may be configured to deflect light of different beam widths in different ways.

[0175] In one embodiment, the optoelectronic device has the following components: (1) at least one first vertical cavity surface-emitting laser, the first vertical cavity surface-emitting laser comprising an active area located on the bottom surface of the first vertical cavity surface-emitting laser, (2) at least one second vertical cavity surface-emitting laser, the second vertical cavity surface-emitting laser comprising an active region located on the upper surface of the second vertical cavity surface-emitting laser, the upper surface being located on the opposite side of the bottom surface of the second vertical cavity surface-emitting laser, and (3) At least one support member.

[0176] Here, the first vertical cavity surface-emitting laser can have its bottom surface placed on a support member, and the second vertical cavity surface-emitting laser can have its bottom surface placed on a support member.

[0177] In one embodiment, the optoelectronic device has the following components: A light-emitting element structure comprising multiple light-emitting elements, wherein a first light-emitting element array among the multiple light-emitting elements forms a pattern illumination source, and a second light-emitting element array different from the first light-emitting element array among the multiple light-emitting elements forms a flood illumination source. A base that provides a single plane for mounting a light-emitting element. An optical element system having a plurality of optical elements, wherein the optical element system is configured to focus an emitted infrared light pattern at a focal plane, and the optical element system covers the light-emitting structure, and A flood photo-optic element comprising at least one element configured to defocus light emitted by a light-emitting element of a flood illumination source, thereby forming overlapping light spots, wherein the flood photo-optic element is configured such that the emitted infrared light pattern is unaffected.

[0178] In one embodiment, a use of the optoelectronic device according to the present invention for authenticating a user of a device having the optoelectronic device is disclosed, as disclosed in any one of the embodiments.

[0179] In one embodiment, a device for authenticating a user of a device in order to perform at least one operation on the device that requires authentication, the device comprising the following components: At least one flood illumination source configured to emit infrared flood light, At least one pattern illumination source configured to emit at least one infrared light pattern having multiple infrared light spots, wherein the number of infrared light spots is 4000 or less, and the relative distance between the flood illumination source and the pattern illumination source is less than 3.0 mm. At least one image generation unit configured to generate at least one pattern image while a pattern illumination source emits an infrared light pattern, and to generate at least one flood image while a flood illumination source emits infrared flood light. A flood light source, a pattern light source, and at least one display that partially covers the image generation unit, and At least one authentication unit configured to perform at least one user authentication process using a flood image and a pattern image.

[0180] In one embodiment, the display may be at least one organic light-emitting diode (OLED) display, or may have an organic light-emitting diode (OLED) display.

[0181] In one embodiment, the display may be at least partially transparent.

[0182] In one embodiment, the display may include a display area.

[0183] In one embodiment, the display may be made of glass and / or covered with glass.

[0184] In one embodiment, the display of the device may be at least partially transparent in at least one continuous region, preferably at least two continuous regions, and at least one of the continuous regions may at least partially cover the image generation unit and / or pattern illumination source and / or flood illumination source.

[0185] In one embodiment, the display may have a first region associated with a first pixel density value and a second region associated with a second pixel density value, the first pixel density value may be lower than the second pixel density value, and preferably the first pixel density value is 450 PPI or less.

[0186] In one embodiment, the display may have a first region associated with a first pixel density value and a second region associated with a second pixel density value, wherein the first pixel density value may be less than 350 pixels / inch, and the second region has a pixel density value of 400 or more pixels / inch.

[0187] In one embodiment, the first pixel density value can be associated with at least one continuous region that is at least partially transparent.

[0188] In one embodiment, the first pixel density value is less than 350 pixels / inch, and the second region has a value of 400 pixels / inch or more.

[0189] In one embodiment, the apparatus may be selected from the group consisting of television equipment, game consoles, personal computers, mobile devices, particularly mobile phones and / or smartphones, and / or tablet computers, and / or laptops and / or tablets, and / or virtual reality devices and / or wearables such as smartwatches, or other types of portable computers.

[0190] In one embodiment, the authentication unit may be configured to use a facial recognition authentication process that operates on flood images, pattern images, and / or extracted material data.

[0191] In one embodiment, the apparatus may have at least one photoelectron device according to the present invention, for example, a photoelectron device according to any one of the prior embodiments that reference a photoelectron device.

[0192] In one embodiment, a method is disclosed for authenticating a user of a device to perform at least one operation on the device that requires authentication, the device including a display, and the method includes the following steps: a. A step of illuminating a user with at least one infrared light pattern including multiple infrared light spots from at least one pattern illumination source of the device, wherein the number of infrared light spots is 4000 or less. b. A step of illuminating a user with infrared flood light from at least one flood illumination source of the apparatus, wherein the distance between the flood illumination source and the pattern illumination source is less than 3.0 mm. c. The steps of generating at least one pattern image in an image generation unit of an apparatus representing a user while the user is illuminated with an infrared light pattern, and generating at least one image in an image generation unit of an apparatus representing a user while the user is illuminated with infrared flood light, wherein the image generation unit and / or the flood light source and the pattern light source are at least partially covered by the display of the apparatus. d. A step of identifying a user based on a flood image using at least one authentication unit of the device. e. A step of extracting material data from at least one pattern image using an authentication unit, and f. A step that enables a user to perform at least one operation on an apparatus that requires authentication based on material data and identification.

[0193] In one embodiment, the method may include using a facial recognition authentication process operating on flood images, pattern images, and / or extracted material data.

[0194] In one embodiment, user identification may involve matching a flood image with a template.

[0195] In one embodiment, this method is implemented in a computer.

[0196] In one embodiment, a computer program is disclosed which, when executed by a device according to any one of the prior embodiments that reference the device, causes the device to perform a method according to any one of the prior embodiments that references the method.

[0197] In one embodiment, a computer-readable storage medium is disclosed which, when an instruction is executed by a device according to any one of the prior embodiments referring to the device, causes the device to perform a method according to any one of the prior embodiments referring to the method.

[0198] In one embodiment, a non-temporary computer-readable medium is disclosed that, when executed by one or more processors, includes instructions causing one or more processors to perform a method according to any one of the prior embodiments that reference the method. [Brief explanation of the drawing]

[0199] Further optional details and features of the present invention will become apparent from the following description of preferred exemplary embodiments, in conjunction with the dependent claims. In this context, certain features may be implemented alone or in combination with other features. The present invention is not limited to exemplary embodiments. Exemplary embodiments are schematically shown in the figures. The same reference numbers in the individual figures refer to the same elements, elements having the same function, or elements corresponding to each other with respect to function. [Figure 1] An embodiment of the apparatus according to the present invention is shown. [Figure 2] One embodiment of the method according to the present invention is shown. [Figure 3] Figures 3A and 3B show one embodiment of an optical element having deflection characteristics. [Figure 4] This is a schematic diagram of an exemplary optical element in a side view. [Figure 5] Figures 5A and 5B show one embodiment of the optoelectronic device. [Figure 6] Figures 6A and 6B show one embodiment of the optoelectronic device. [Modes for carrying out the invention]

[0200] Figure 1 provides a highly schematic representation of an embodiment of the apparatus 110 of the present invention. For example, the apparatus 110 may be selected from the group consisting of television equipment, game consoles, personal computers, mobile devices, particularly mobile phones, and / or smartphones, and / or tablet computers, and / or laptops, and / or tablets, and / or virtual reality devices, and / or wearables such as smartwatches, or other types of portable computers.

[0201] In this embodiment, the apparatus 110 includes a photoelectron device 112 according to the present invention. The photoelectron device 112 includes at least one pattern illumination source 114 configured to emit at least one infrared light pattern having a plurality of infrared light spots. The number of infrared light spots is 4000 or less.

[0202] The pattern illumination source 114 may be configured to generate or provide at least one light pattern, in particular at least one infrared light pattern. The light pattern may have multiple light spots. The light spots may be at least partially spatially extended. The infrared light pattern may be a near-infrared light pattern. The infrared light may be coherent. The infrared light pattern may be a coherent infrared light pattern. The pattern illumination source 114 may be configured to emit light of a single wavelength, for example, in the near-infrared region. In other embodiments, the pattern illumination source 114 may be adapted to emit light of multiple wavelengths, for example, to enable additional measurements in other wavelength channels. The infrared light pattern may have at least one regular and / or constant and / or periodic pattern, such as a triangular pattern, a rectangular pattern, a hexagonal pattern, or a pattern including further convex inclines. For example, the infrared light pattern may be a hexagonal pattern, preferably a hexagonal infrared light pattern, more preferably a 2 / 5 hexagonal infrared light pattern. By using a periodic 2 / 5 hexagonal pattern, it is possible to distinguish between artifacts and usable signals.

[0203] The infrared light pattern may include at least one dot pattern. The infrared light pattern has a low dot density. The number of infrared spots is 4000 or less. The infrared light pattern may have 3000 or fewer spots, preferably 2000 or fewer. The spots may be circular. Further shapes are also possible. The infrared light pattern can have a lower dot density, in particular, compared to other structured light techniques, which typically have a dot density of 10k-30k in a 55x38° field of view. By using such a low dot density, the diffraction loss described above can be compensated for. The contrast of the pattern image can be increased by reducing the number of spots projected onto an object and / or user. Increasing the number of spots reduces the emitted illuminance per spot. Decreasing the number of spots increases the emitted illuminance of the spots, which may result in increased contrast of the pattern image of the infrared light pattern projection. The infrared light pattern may have a periodic dot pattern with a reduced number of spots, where each spot has a high emitted illuminance. Such a light pattern can ensure improved authentication using a pattern illumination source 114, at least one flood illumination source 116 as described above, at least one image generation unit 118, and behind the display 120. Furthermore, the small number of spots ensures compliance with eye safety and stability requirements. The permissible dose may be divided among the spots of the light pattern.

[0204] At least one of the infrared light spots is associated with a beam divergence of 0.2°–0.5°, preferably 0.1°–0.3°.

[0205] The pattern illumination source 114 may have at least one pattern projector configured to generate an infrared light pattern. The pattern illumination source 114, for example, the pattern projector, may have at least one emitter, in particular multiple emitters. The emitter may have at least one element selected from the group consisting of at least one semiconductor laser, at least one double heterostructure laser, at least one external cavity laser, at least one isolated confinement heterostructure laser, at least one quantum cascade laser, at least one distributed Bragg reflector laser, at least one polariton laser, at least one hybrid silicon laser, at least one extended cavity diode laser, at least one quantum dot laser, at least one volume Bragg grating laser, at least one indium arsenide laser, at least one gallium arsenide laser, at least one transistor laser, at least one diode-excited laser, at least one distributed feedback laser, at least one quantum well laser, at least one interband cascade laser, at least one semiconductor ring laser, at least one vertical cavity surface-emitting laser (VCSEL), at least one non-laser light source such as at least one LED or at least one light bulb. For example, the pattern illumination source 114, e.g., the pattern projector, has at least one VCSEL, preferably multiple VCSELs. Multiple VCSELs may be arranged at least in an array, for example, having a matrix of VCSELs. VCSELs may be arranged on a common substrate or on different substrates. Examples of VCSELs are described at en.wikipedia.org / wiki / Verticalcavity_surface-emitting_laser, etc. VCSELs are generally known to those skilled in the art from WO 2017 / 222618 A, etc. Each VCSEL is configured to generate at least one light beam. A VCSEL or a group of VCSELs may be configured to generate a desired number of spots, preferably 4000 spots or less, preferably 3000 spots or less, and more preferably 2000 spots or less.VCSELs can be configured to emit light beams in the wavelength range of 800–1000 nm. For example, a VCSEL can be configured to emit light beams at 808 nm, 850 nm, 940 nm, or 980 nm. Preferably, the VCSEL emits light at 940 nm. This is because, as described, for example, in CIE 085-1989, "Solar spectral Irradiance," the emission intensity of solar emission on the ground is locally minimum at this wavelength.

[0206] The pattern illumination source 114 may have at least one optical element (not shown herein) configured to increase, for example, duplicate, the number of spots, for example, the spots generated by the pattern projector. The pattern illumination source 114 may have at least one diffractive optical element (DOE) and / or at least one metasurface element. The DOE and / or metasurface element may be configured to generate multiple light beams from a single incident light beam. For example, the number of spots can be duplicated using a VCSEL that projects up to 2000 spots and an optical element having multiple metasurface elements. Other duplications are also possible. For example, generated laser spots can be duplicated by using a VCSEL or multiple VCSELs and at least one DOE.

[0207] The pattern illumination source 114 may have at least one transfer device, which is not shown here. The transfer device may have at least one imaging optical device. Specifically, the transfer device may have one or more of the following: at least one lens, for example, selected from the group consisting of at least one focusable lens, at least one aspherical lens, at least one spherical lens, and at least one Fresnel lens; at least one diffractive optical element; at least one concave mirror; at least one beam deflection element, preferably at least one mirror; at least one beam splitting element, preferably at least one beam splitting cube or beam splitting mirror; at least one multi-lens system; at least one holographic optical element; and at least one meta-optical element. Specifically, the transfer device has at least one refractive optical lens stack. Therefore, the transfer device may have a multi-lens system having refractive properties.

[0208] The photoelectronic device 112 includes at least one flood illumination source 116 configured to emit infrared flood light.

[0209] The flood illumination source 116 can be configured to provide substantially continuous spatial illumination. The flood light may be substantially continuous spatial illumination, particularly diffuse illumination and / or uniform illumination. The flood light has wavelengths in the infrared region, particularly the near-infrared region. The flood illumination source 116 has at least one VCSEL, preferably multiple VCSELs.

[0210] The relative distance between the flood illumination source 116 and the pattern illumination source 114 is less than 3.0 mm. The relative distance between the flood illumination source 116 and the pattern illumination source 114 is less than 2.5 mm, preferably less than 2.0 mm. The pattern illumination source 114 and the flood illumination source 116 may be combined into a single module. For example, the pattern illumination source 114 and the flood illumination source 116 may be arranged on the same substrate, particularly with a minimum relative distance between them. The minimum relative distance can be defined by the physical extension of the flood illumination source 116 and the pattern illumination source 114. By arranging the pattern illumination source 114 and the flood illumination source 116 with a relative distance of less than 3.0 mm, the required space for the two illumination sources 114 and 116 is reduced. In particular, the illumination sources 114 and 116 can be combined into a single module. Such reduction in space requirements can reduce the transparent area within the display required for the operation of the illumination sources 114 and 116 behind the display 120.

[0211] In one embodiment, the pattern illumination source 114 and the flood illumination source 116 may have at least one VCSEL, preferably more than one VCSEL. The pattern illumination source 114 may have more than one first VCSEL mounted on a first platform. The flood illumination source 116 may have more than one second VCSEL mounted on a second platform. The second platform may be located next to the first platform. The photoelectronic device 112 may have a heat sink. A first increment having the first platform may be mounted on the heat sink. A second increment having the second platform may be mounted on the heat sink. The second increment may be different from the first increment. Thus, the first platform may be further away from optical elements configured to increase the number of spots, for example, to duplicate them. The second platform may be located closer to the optical elements. The beams emitted from the second VCSELs are defocused, resulting in the formation of overlapping spots. This effectively creates continuous lighting, resulting in flood lighting.

[0212] The photoelectronic device 112 includes at least one image generation unit 118 configured to generate at least one pattern image while a pattern illumination source 114 emits an infrared light pattern, and at least one flood image while a flood illumination source 116 emits infrared flood light.

[0213] The image generation unit 118 may be at least one unit of the optoelectronic device 112 configured to generate at least one image. Image generation may include capturing and / or generating and / or determining and / or recording at least one image using the image generation unit 118. Image generation may include capturing and / or recording an image. Image generation may include capturing multiple images, such as a single image and / or a series of images. For example, image generation may include recording a series of images sequentially, such as a video or movie. Image generation may be initiated by user action, or it may be initiated automatically, for example, when it is automatically detected that at least one object or user is present in the field of view and / or in a predetermined sector of the field of view of the image generation unit.

[0214] The image generation unit 118 may have at least one optical sensor, in particular at least one pixelated optical sensor. The image generation unit 118 may have at least one CMOS sensor or at least one CCD chip. For example, the image generation unit 118 may have at least one CMOS sensor that is sensitive in the infrared spectral range. The image may be image data recorded using the optical sensor, such as multiple electronic readouts from the CMOS or CCD chip. The image may be raw image data or a pre-processed image. For example, pre-processing may include applying at least one filter to the raw image data and / or applying at least one background correction and / or at least one background subtraction.

[0215] For example, the image generation unit 118 may have a monochrome camera having, for example, monochrome pixels. For example, the image generation unit 118 may have a color camera having, for example, color pixels. The image generation unit may have a color CMOS camera. For example, the camera may have monochrome pixels and color pixels. The color pixels and monochrome pixels may be combined within the camera. The image generation unit 118 may have at least one color camera (e.g., RGB) and / or at least one monochrome camera such as a monochrome CMOS. The camera may have at least one monochrome CMOS chip. The camera may generally have a one-dimensional or two-dimensional array of image sensors such as pixels.

[0216] As outlined above, the image generation unit 118 may be at least one color camera, for example, an RGB camera. For example, the color camera may be a selfie camera on a smartphone.

[0217] The image generation unit 118 may have a field of view between 10°x10° and 75°x75°, preferably between 55°x65°. The image generation unit may have a resolution of less than 2MP, preferably between 0.3MP and 1.5MP.

[0218] The image generation unit 118 may have one or more optical elements, such as one or more lenses. For example, the optical sensor may be a fixed-focus camera having at least one lens fixedly adjusted relative to the camera. Alternatively, the camera may include one or more variable lenses that are automatically or manually adjusted. However, other cameras are also feasible.

[0219] The pattern image may be an image generated by the image generation unit 118 while illuminating, for example, an object and / or a user with an infrared light pattern. The pattern image may include an image showing the user, particularly at least a portion of the user's face, while the user is being illuminated by the infrared light pattern. The pattern image may also be generated by capturing and / or recording light reflected by the object and / or user being illuminated by the infrared light pattern. For example, illumination by the pattern illumination source 114 and imaging using a light sensor may be synchronized, for example, using at least one control unit of the photoelectronic device 112.

[0220] The flood image may be an image generated by the image generation unit 118 while the illumination source is emitting infrared flood light, for example, onto an object and / or the user. The flood image may have an image showing the user, particularly the user's face, while the user is illuminated by the flood light. The flood image can be generated by capturing and / or recording the light reflected by the object and / or user that is illuminated by the flood light. For example, illumination by the flood illumination source 116 and imaging using a photosensor may be synchronized, for example, by using at least one control unit of the photoelectronic device 112.

[0221] The image generation unit 118 may be configured to capture and / or record pattern images and flood images simultaneously or at different times.

[0222] The photoelectronic device 112 may be configured within the device 110. The device 110 may comprise at least one display 120, wherein an infrared light pattern is emitted from a pattern illumination source 114 and traverses the display 120, and / or infrared flood light is emitted from a flood illumination source 116 and traverses the display 120.

[0223] The display 120 may be a device of any shape configured to display items of information. The items of information may be any information such as at least one image, at least one diagram, at least one histogram, at least one graphic, text, a number, at least one code, or an operation menu. The display 120 may be at least one screen or may have at least one screen. The display 120 may have any shape, for example, a rectangular shape. The display 120 may be the front display of the device 110.

[0224] The display 120 may be at least one organic light-emitting diode (OLED) display, or may have at least one organic light-emitting diode (OLED) display. The OLED display may be configured to emit visible light.

[0225] The display 120 may be made of glass and / or covered with glass. In particular, the display 120 may have at least one glass cover.

[0226] The display 120 may be at least partially transparent. For example, the display 120 may be semi-transparent in the near-infrared region. For example, the display 120 may have 20%-50% transparency in the near-infrared region. The display 120 may have different transparency in other wavelength regions. The present invention can propose a photoelectronic device 112 having an image generation unit 118 and two illumination sources 114, 116, which can be positioned behind the display 120 of the device 110. The transparent area of ​​the display 120 allows the photoelectronic device 112 to operate behind the display 120. The display 120 can be at least partially transparent, as described above. The display 120 may have a reduced pixel density and / or a reduced pixel size, and / or at least one transparent conductive path. The transparent area of ​​the display 120 may have a pixel density of 300-440 PPI (pixels / inch), more preferably 350-450 PPI. Other areas of the display 120, such as the non-transparent areas, can have a pixel density higher than 400 PPI, for example, 450-500 PPI.

[0227] The display 120 has a display area. The display area may be the active area of ​​the display 120, particularly the activatable area. The display 120 may have additional areas such as recesses or cutouts. The display 120 may be at least partially transparent in at least one continuous area, preferably at least two continuous areas. At least one of the continuous areas may at least partially cover the image generation unit and / or pattern illumination source 114 and / or flood illumination source 116. The pattern illumination source 114, the flood illumination source 116 and the image generation unit 118 may be arranged in front of the display 120 in the direction of propagation of the infrared light pattern. As described above, the pattern illumination source 114 and the flood illumination source 116 may be combined into a single module. This can reduce the transparent area of ​​the display 120.

[0228] The display 120 may have a first region associated with a first pixel density value and a second region associated with a second pixel density value. The first pixel density value may be lower than the second pixel density value. The first pixel density value may be 450 PPI or less, preferably 300-440 PPI, and more preferably 350-450 PPI. The second pixel density value may be 400-500 PPI, preferably 450-500 PPI. The first pixel density value is associated with at least one continuous region being at least partially transparent.

[0229] As mentioned above, known displays that meet these requirements have low user appeal, and it is desirable to reduce the transparent area. Furthermore, when the image generation unit is covered with such a display, the contrast may be low because the light transmittance of the transparent area is typically 15%-50%. Contrast can be defined as the difference between the signal and the backlight. In this case, it can be thought that the contrast is reduced by transmittance. However, contrast can also be defined as the ratio of the signal to the background. In this case, the contrast may be reduced not only by transmittance but also by diffraction in spot pattern projection.

[0230] Higher-order illuminances provide additional intensity on top of the zero-order intensity. Due to the structure of the display wiring, diffraction can occur, further reducing the emitted illuminance. Furthermore, the spot pattern projected through the display may experience a decrease in the intensity of the main spot corresponding to the pattern before it crosses the display area due to the generation of higher-order spots. Both effects result in a reduction of the emitted illuminance to approximately 3-5% of the initial emitted illuminance, and the presence of undesirable additional spots within the pattern. The present invention can provide sufficient emitted illuminance and, consequently, contrast in the pattern image. Contrast can be increased by reducing the number of spots projected to the user. This allows for an increase in the emitted illuminance of the spots and an increase in the contrast of the projected image of the spot pattern. Furthermore, it is also possible to reduce the transparent area of ​​the display. By combining the pattern illumination source 114 and the flood illumination source 116 used for user authentication into a single module, the transparent area of ​​the display can be reduced. Using such a photoelectronic device 112, for example, the camera position can be repositioned from the outermost position of the display. Such repositioning allows for further optimization of the position, such as the image generation unit 118, thus optimizing the wiring. This can reduce the amount of wiring used or improve battery performance.

[0231] Device 110 is configured to authenticate a user of Device 110 in order to perform at least one operation on Device 110 that requires authentication. Authentication may consist of verifying the user's identity. Specifically, authentication may consist of distinguishing the user from other people or objects, in particular distinguishing between authorized and unauthorized access. Authentication may consist of verifying the identity of each user and / or assigning an identity to the user. Authentication may also consist of generating and / or providing identification information to other devices or units, such as at least one authorization unit for authorization to provide access to Device 110. The identification information may be proven by authentication. For example, the identification information may be at least one identification token and / or consist of at least one identification token. If authentication is successful, the facial image recorded by the image generation unit 118 is verified to be the facial image of the user and / or the user's identity is verified.

[0232] User authentication can be performed using at least one authentication unit 122. The authentication unit 122 may be configured to perform at least one user authentication process. The authentication unit 122 may have at least one processor. The processor may be any logic circuit configured to perform the basic operations of the computer or system, and / or, generally, a device configured to perform calculations or logical operations. In particular, the processor may be configured to process basic instructions that drive the computer or system. As an example, the processor may have at least one arithmetic logic unit (ALU), at least one floating-point unit (FPU) such as an arithmetic coprocessor or numeric coprocessor, a number of registers, specifically registers configured to supply operands to the ALU and store the results of calculations, and memory such as L1 cache memory and L2 cache memory. In particular, the processor may be a multi-core processor. Specifically, the processor may be a central processing unit (CPU) or may have a central processing unit (CPU). Additionally or alternatively, the processor may be a microprocessor or have a microprocessor, and therefore specifically, the elements of the processor may be contained on a single integrated circuit (IC) chip. Additionally or alternatively, the processor may be one or more chips, such as one or more application-specific integrated circuits (ASICs) and / or one or more field-programmable gate arrays (FPGAs) and / or one or more tensor processing units (TPUs) and / or dedicated machine learning optimization chips. Specifically, the processor may be configured to perform one or more evaluation operations, such as by software programming.

[0233] The authentication unit 122 is configured to identify a user based on the flood image. Identification may include assigning an ID to the detected face and / or performing at least one ID check and / or verifying the user's ID. The authentication process may have multiple steps. For example, the authentication process may include performing at least one face detection. The face detection step may include analyzing the flood image. Furthermore, for example, the authentication process may include identification. Identification may include assigning an ID to the detected face and / or performing at least one ID check and / or verifying the user's ID. Identification may consist of performing face verification to determine whether the captured face is the user's face. Identifying a user may include, for example, matching a flood image showing the contours of a part of the user, particularly a part of the user's face, with a template. Identifying a user may include determining whether the captured face is the user's face, in particular whether the captured face corresponds to at least one image of the user's face stored, for example, in at least one memory of the device.

[0234] The analysis of a flood image may include one or more of the following: filtering, selection of at least one region of interest, formation of a difference image between the flood image and at least one offset, inversion of the flood image, background correction, decomposition into color channels, decomposition into hue, saturation, and brightness channels, frequency decomposition, singular value decomposition, application of a Canny edge detector, application of the Laplacian of a Gaussian filter, application of a difference Gaussian filter, application of the Sobel operator, application of the Laplace operator, application of the Shah operator, application of the Priwitt operator, application of the Roberts operator, application of the Kirsch operator, application of a high-pass filter, application of a low-pass filter, application of a Fourier transform, application of the Radon transform, application of the Huff transform, application of a wavelet transform, thresholding, and creation of a binary image. The region of interest may be determined manually by the user or automatically, such as by recognizing a user in the image. In particular, the analysis of a flood image may involve using at least one image recognition technique, in particular a face recognition technique. The image recognition technique consists of at least one process that identifies a user in the image. Image recognition may include using at least one technique selected from techniques such as color-based image recognition using features like template matching, image segmentation and / or blob analysis using size and shape, and machine learning and / or deep learning using at least one convolutional neural network.

[0235] Analysis of flood images may include determining multiple facial features. Analysis may include comparing the determined facial features with template features, in particular matching them. Template features may be features extracted from at least one template. A template may be, or include, at least one image generated in a registration process, such as when initializing device 110. A template may be an image of an authenticated user. Template features and / or facial features may have vectors. Feature matching may involve determining the distance between vectors. User identification involves comparing the distance between vectors to at least one predefined limit value, and if the distance is at least within an acceptable range and less than or equal to the predefined limit value, the user is successfully identified. Otherwise, the user is declined and / or rejected.

[0236] For example, image recognition may involve using a trained model that includes at least one model, particularly at least one face recognition model. Flood image analysis may be performed using a face recognition system such as FaceNet, as described, for example, in Florian Schroff, Dmitry Kalenichenko, James Philbin, "FaceNet: A Unified Embedding for Face Recognition and Clustering", arXiv:1503.03832. The trained model may have at least one convolutional neural network. For example, the convolutional neural network may be designed as described in MD Zeiler and R. Fergus, "Visualizing and understanding convolutional networks", CoRR, abs / 1311.2901, 2013, or C. Szegedy et al., "Going deeper with convolutions", CoRR, abs / 1409.4842, 2014. For more information on convolutional neural networks for face recognition systems, see Florian Schroff, Dmitry Kalenichenko, James Philbin, "FaceNet: A Unified Embedding for Face Recognition and Clustering", arXiv:1503.03832. Labeled image data from an image database can be used as training data.Specifically, labeled faces are taken from one or more of the following datasets: the YouTube@Faces Databases disclosed in GB Huang, M. Ramesh, T. Berg, and E. Learned-Miller, "Labeled faces in the wild: A database for studying face recognition in unconstrained environments", Technical Report 07-49, University of Massachusetts, Amherst, October 2007; L. Wolf, T. Hassner, and I. Maoz, "Face recognition in unconstrained videos with matched background similarity", in IEEE Conf. on CVPR, 2011; or the Google@Facial Expression Comparison dataset. The convolutional neural network can be trained as described in Florian Schroff, Dmitry Kalenichenko, and James Philbin, "FaceNet: A Unified Embedding for Face Recognition and Clustering", arXiv:1503.03832.

[0237] The authentication unit 122 is configured to use a facial recognition authentication process that operates on the flood image, pattern image, and / or extracted material data. The authentication unit 122 may also be configured to extract material data from the pattern image.

[0238] The authentication unit 122 may be configured to extract material data from the pattern image by beam profile analysis of the light spots. Regarding beam profile analysis, WO 2018 / 091649 A1, WO 2018 / 091638 A1, and WO 2018 / 091640 A1 are referenced, and their entire contents are included by reference. Beam profile analysis can enable reliable classification of the scene based on a small number of light spots. Each light spot in the pattern image may have a beam profile. Extraction of material data based on the pattern image may be performed using at least one model.

[0239] The authentication process may include verification based on extracted material data. Verification based on extracted material data may include determining whether the extracted material data matches desired material data. Determining whether the extracted material data matches desired material data may be referred to as verification. Allowing or denying a user and / or object to perform at least one operation on the device 110 that requires authentication based on material data may constitute verification of authentication or the authentication process. Verification may be based on material data and / or images. Determining whether the extracted material data corresponds to desired material data may include determining the similarity between the extracted material data and the desired material data. Determining the similarity between the extracted material data and the desired material data may include comparing the extracted material data with the desired material data. The desired material data may refer to a given material data. For example, the desired material data may be skin. It may be determined whether the material data corresponds to desired material data. For example, the material data may be a non-skin material or silicone. Determining whether the material data corresponds to desired material data may involve comparing the material data with the desired material data. The comparison of material data with desired material data may allow and / or deny the user and / or object the execution of at least one operation requiring authentication. In an example, skin as desired material data is compared with non-skin material or silicon as material data, and since silicon or non-skin material may differ from skin, the result may be denial. In one embodiment, the authentication process or verification may include generating at least one feature vector from the material data and matching the material feature vector with an associated reference template vector for the material.

[0240] The authentication unit 122 may be configured to authenticate a user if it can identify the user and / or if the material data matches the desired material data. The device 110 may include at least one authentication unit 124 configured to allow the user to perform at least one operation on the device 110, for example, unlock the device 110, if the user authentication is successful, or to deny the user the ability to perform at least one operation on the device 110 if authentication is unsuccessful.

[0241] Figure 2 shows an exemplary embodiment of a method for authenticating a user of device 110 in order to perform at least one operation on device 110 that requires authentication.

[0242] This method includes the following steps: a. (Reference No. 126) A step of illuminating a user with at least one infrared light pattern having multiple infrared light spots from at least one pattern illumination source 114 of the device 110, wherein the number of infrared light spots is 4000 or less. b. (Reference No. 128) A step of illuminating a user with infrared flood light from at least one flood illumination source 116 of the apparatus 110, wherein the distance between the flood illumination source 116 and the pattern illumination source 114 is less than 3.0 mm. c. (Reference No. 130) The steps of generating at least one pattern image showing at least a portion of the user, particularly the user's face, in the image generation unit 118 of the apparatus 110 while the user is illuminated with an infrared light pattern, and generating at least one image showing the user in the image generation unit 118 of the apparatus 110 while the user is illuminated with infrared flood light, wherein the image generation unit 118 and / or illumination sources 114, 116 are at least partially covered by the display 120 of the apparatus 110. d. (Reference number 132) A step of identifying a user based on a flood image using at least one authentication unit 122 of the device 110, e. (Reference number 134) A step of extracting material data from at least one pattern image using the authentication unit 122, and f. (Reference number 136) A step that enables the user to perform at least one operation on the apparatus 110 that requires authentication based on material data and identification.

[0243] The method steps may be performed in a predetermined order or in a different order. Furthermore, there may be one or more additional method steps that are not enumerated. Furthermore, one, one or more, or all of the method steps may be repeated. The pattern image and / or image showing the user while the user is illuminated with infrared flood light may show at least a portion of the user's face.

[0244] This method may be implemented on a computer.

[0245] The photoelectronic device 112 may include at least one optical element 138 having deflection characteristics. As outlined above, the VCSEL of the pattern illumination source 114 is mounted on a first platform to form a first VCSEL chip. The VCSEL of the flood illumination source 116 is mounted on a second platform to form a second VCSEL chip. The optical element 138 may be configured to deflect the light emitted by the pattern illumination source 114, and the light emitted by the flood illumination source 116 may be deflected in a different way. Figures 3A and 3B show embodiments of the optical element 138 having deflection characteristics.

[0246] In the embodiment shown in Figure 3A, the optical element 138 may have at least two different regions associated with at least two different deflection behaviors. Light emitted from the VCSEL chip can be deflected by the optical element 138 depending on the region of the optical element 138 illuminated by the light. For example, a first VCSEL chip associated with a pattern illumination source 114 may illuminate a first region 140 of the optical element 138 and be deflected by a first angle. A second VCSEL chip associated with a flood illumination source 116 may illuminate a second region 142 of the optical element 138 and be deflected by a second angle. The optical element 138 may be embodied as a single optical element having two different deflection characteristics, or the optoelectronic device 112 may have at least two optical elements 138, for example, one of the optical elements 140 being arranged to be illuminated by a pattern illumination source 114, in particular by a first VCSEL chip, and the other of the optical elements 142 being arranged to be illuminated by a flood illumination source 116, in particular by a second VCSEL chip.

[0247] In the embodiment of Figure 3B, the optical element 138 may be wavelength-dependent. The optical element 138 may be structured to deflect light of different wavelengths in different ways. The VCSEL emitter associated with the pattern illumination source 114 may be associated with a different wavelength than the VCSEL emitter associated with the flood illumination source 116. Additionally or alternatively, the two light beams may have different beam widths. For example, the optical element 138 may be configured to deflect light of different beam widths in different ways. The two light beams produced by the pattern illumination source 114 and the flood illumination source 116 may have different beam widths. Therefore, the light from the pattern illumination source 114 and the flood illumination source 116 can be deflected in different ways.

[0248] Figure 4 shows a schematic side view of an exemplary optoelectronic device 210. For details of the optoelectronic device 210, refer to the optoelectronic device 112 shown and described in Figures 1-3. Below, only the features will be described in comparison with the optoelectronic device 112.

[0249] The photoelectronic device 210 has the following components: (1) at least one first vertical cavity surface-emitting laser 212, the first vertical cavity surface-emitting laser comprising an active region 214 located on the bottom surface 216 of the first vertical cavity surface-emitting laser 212, (2) at least one second vertical cavity surface-emitting laser 218, the second vertical cavity surface-emitting laser 218 comprising an active region 220 located on the upper surface 222 of the second vertical cavity surface-emitting laser 218, the upper surface 222 being located on the opposite side of the lower surface 124 of the second vertical cavity surface-emitting laser 218, and (3) At least one support member 226.

[0250] Here, the first vertical cavity surface-emitting laser 222 is positioned together with the bottom surface 216 on the support member 226, and the second vertical cavity surface-emitting laser 118 is positioned together with the bottom surface 224 on the support member 226. The first vertical cavity surface-emitting laser 222 and the second vertical cavity surface-emitting laser 218 may be positioned on the same support member 226.

[0251] The support member 226 is at least one of the following: Heatsink 227, Electrical connector 229, particularly printed circuit boards, and Reinforcement element.

[0252] The photoelectron device 210 may further include at least one optical lens 228. The first vertical cavity surface-emitting laser 212 and / or the second vertical cavity surface-emitting laser 218 may be configured to emit illumination light 244, 246 through the optical lens. The first distance 230 between the active region 214 of the first vertical cavity surface-emitting laser 212 and at least one optical lens 228 is different from the second distance 232 between the active region 220 of the second vertical cavity surface-emitting laser 218 and at least one optical lens 228.

[0253] The optical lens 228 may have at least one focal length, where the first distance 230 or the second distance 232 is equal to the focal length. The first distance 230 and the second distance 232 may differ depending on the thickness 232 of the first vertical-cavity surface-emitting laser 212 or the thickness of the second vertical-cavity surface-emitting laser 218. The thickness of the first vertical-cavity surface-emitting laser 212 and the thickness of the second vertical-cavity surface-emitting laser 218 may be the same.

[0254] The geometric central axis 238 of the first vertical-cavity surface-emitting laser 212 and the geometric central axis 240 of the second vertical-cavity surface-emitting laser 218 may be parallel. The normal vector to the emission surface of the first vertical-cavity surface-emitting laser 12 and the normal vector to the emission surface of the second vertical-cavity surface-emitting laser 218 may be parallel. The normal vector to the emission surface of the first vertical-cavity surface-emitting laser 212 and / or the normal vector to the emission surface of the second vertical-cavity surface-emitting laser 218 may be parallel to the central rays of the emission cones of the respective vertical-cavity surface-emitting lasers 212 and 218. The emission surfaces may constitute an active region. The geometric central axis 238 of the first vertical-cavity surface-emitting laser 212 and the geometric central axis 240 of the second vertical-cavity surface-emitting laser 218 may be coaxial. The geometric central axis 238 of the first vertical cavity surface-emitting laser 212 and / or the geometric central axis 240 of the second vertical cavity surface-emitting laser 218 may be parallel to the geometric central axis 242 of at least one optical lens 228.

[0255] The first vertical-cavity surface-emitting laser 212 may have an active region 214 located on the bottom surface 216. The active region may be configured to emit illumination light 244 at least partially in the direction of the top surface 247 of the first vertical-cavity surface-emitting laser 212. At least one further component 248 of the first vertical-cavity surface-emitting laser 212 may be at least partially transparent to the illumination light 244 emitted by the first vertical-cavity surface-emitting laser 212. At least one further component 248 of the first vertical-cavity surface-emitting laser 212 may be the substrate 250 of the vertical-cavity surface-emitting laser 212.

[0256] Figures 5A, 5B, and 6A, 6B provide a highly schematic representation of further embodiments of the photoelectron device 312. For further details of the photoelectron device 312, refer to the photoelectron devices 112 and 212 shown and described with respect to Figures 1-4.

[0257] The photoelectronic device 312 may have the following components: A light-emitting element structure 314 having a plurality of light-emitting elements 316, wherein a first array 318 of the light-emitting elements 316 forms a pattern illumination source 320 configured to emit an infrared light pattern, and a second array 322 of the light-emitting elements 316 forms a flood illumination source 324 configured to emit infrared flood light, wherein light-emitting elements different from those in the first array 318 are configured to emit infrared flood light. A base 325 provides a single plane for mounting the light-emitting element 316. An optical element system 326 having multiple optical elements, wherein the optical element system 326 is configured to focus the emitted infrared light pattern to the focal plane, and the optical element system 326 covers the light-emitting element structure 314, and At least one flood photo-optical element 330 configured to defocus the light emitted by the light-emitting element of the flood illumination source 324, thereby forming overlapping light spots, wherein the flood photo-optical element 330 is configured such that the emitted infrared light pattern is not affected.

[0258] The base 325 may have a plurality of cavities to which the light-emitting structure 314 can be attached. The base 325 may have any shape, such as rectangular, circular, or hexagonal. This shape may refer to the sides of the base facing perpendicular to the direction in which the height is measured. The base 325 may have at least one semiconductor substrate. The base 325 may be an element and / or additional element of the light-emitting structure. The base 325 may be a thermally conductive printed circuit board (PCB) and / or may have a thermally conductive printed circuit board (PCB).

[0259] The light-emitting element 316 of the light-emitting element structure 314 can form a light-emitting element chip, for example, a VCSEL die cut from a wafer. Such a light-emitting element chip 316 may be attached to a base, for example, by using at least one thermally conductive adhesive. The base 325 may have at least one thermally conductive material. The base 325 can be the bottom of the optoelectronic device 312, for example, the bottom of the housing of the optoelectronic device 312. Thus, the dimensions of the base 325 may be determined by the dimensions of the optical components and the housing. Alternatively, the base 325 and the housing may be separate elements. For example, the chip of the light-emitting element 316 may be mounted on the base 325, for example, a PCB, using at least one thermally conductive adhesive, and the housing may be applied to this combined element.

[0260] The base 325 may have at least one thermally conductive material, in particular a thermally conductive material. The thermally conductive material may be configured as a heat exchanger. The thermally conductive material may be configured to regulate the temperature of the light-emitting element. The thermally conductive material may be configured to move heat generated by the light-emitting element away from the light-emitting element. For example, the thermally conductive material may have at least one composite material. The light-emitting structure may be attached to the thermally conductive material.

[0261] Each of the light-emitting elements 316 may have at least one vertical-cavity surface-emitting laser (VCSEL). The light-emitting elements 316 may be configured to emit light in the near-infrared spectral range, preferably with wavelengths of 760 nm–1.5 μm, preferably above 940 nm, 1140 nm, or 1400 nm.

[0262] The light-emitting element 316 of the pattern illumination source 320 and the light-emitting element 316 of the flood illumination source 324 may be activated at different times.

[0263] The light-emitting elements 316 of the light-emitting element structure 314 may be arranged in a periodic pattern. The light-emitting elements 316 of the light-emitting element structure 314 may be arranged in one or more of the following: a grid pattern, a hexagonal pattern, a shifted hexagonal pattern, etc. Multiple light-emitting elements 316 of the light-emitting element structure 314 may form a first array 318 of light-emitting elements 316, and multiple light-emitting elements 316 of the light-emitting element structure 314, different from the light-emitting elements 316 of the first array 318, may form a second array 322 of light-emitting elements 316. The light-emitting element structure 314 may have two light-emitting element arrays (318, 322), for example, two VCSEL arrays. The arrays (318, 322) are arranged on a single plane.

[0264] The first array 318 and the second array 322 of the emitter 316 may be manufactured directly as a single die on a plane, or the first array 318 and the second array 322 of the emitter 316 may be manufactured separately and installed side by side, for example, on a plane. However, embodiments in which more arrays, for example configured to provide different functions, are used are also possible.

[0265] The optical element system 326 can include one or more of at least one refractive lens, a plurality of refractive lenses, at least one diffractive optical element (DOE), a plurality of DOEs, and a plurality of metasurfaces. For example, the optical element system 326 can include at least one refractive lens and at least one optical element configured to increase, for example, duplicate, the number of spots, such as the spots generated by the light-emitting elements of a pattern illumination source. In particular, the optical element system 326 can have at least one diffractive optical element (DOE) and / or at least one metasurface element. The DOE and / or the metasurface element may be configured to generate a plurality of light beams from a single incident light beam. For example, using a VCSEL that projects up to 2000 spots and an optical element having a plurality of metasurface elements, the number of spots can be doubled. In particular, further arrangements are possible having different numbers of projected VCSELs and / or at least one different optical element configured to increase the number of spots. Other magnification factors are also possible. For example, a VCSEL or a plurality of VCSELs may be used, and the generated laser spots may be replicated by using at least one DOE.

[0266] The optical element system 326 covers the light emitter structure 314. The optical element system 326 may be designed and / or arranged to cover the light emitting element structure 314. For example, the first array 318 may be covered only by the optical element system 326. For example, both the first array 318 and the second array 322 may be covered by the optical element system 326. The light emitter structure 314 may be disposed at the focal point of the optical element system 326. Such an arrangement may enable the emitted light of the light emitting element 316, particularly the light emitting element 316 of the pattern illumination source 320, to be collimated.

[0267] The floodlight optical element 330 can be configured to defocus the light emitted by the light emitting element 316 of the flood illumination source 324, thereby forming an overlapping light spot. The combination of the flood illumination source 324 and the floodlight optical element 330 is configured to generate floodlight, particularly diffused illumination. The floodlight optical element 330 may have at least one element selected from the group consisting of at least one plate having a refractive index greater than 1.4, such as a glass plate, at least one diffuser plate, at least one lens, at least one microlens, at least one prism, at least one Fresnel lens, at least one diffractive optical element (DOE), at least one metasurface. The second array 322 may be completely covered by the floodlight optical element 330.

[0268] Figures 5A and 5B show examples in which the first array 318 and the second array 322 may be arranged side by side on a plane, particularly adjacent to each other. Figure 5A is a top view of an exemplary layout of the light-emitting element structure 314. In this embodiment, the light-emitting element structure 314 may have two VCSEL arrays 318, 322. The VCSEL arrays 318, 322 are arranged side by side on a single plane. Figure 5B shows one embodiment of the operation of the photoelectron device 312 with respect to the layout of the light-emitting element structure 314 of Figure 5A. On the left side of Figure 5B, the photoelectron device 312 is shown with an activated illumination source 320. On the right side of Figure 5B, the photoelectron device 312 is shown with an activated flood illumination source 324. The plane of the base 325 may have the first array 318 first, followed by the second array 322, along a direction perpendicular to the optical axis of the photoelectron device 312. The VCSEL array 318 may define a dot pattern, or a periodic, regular pattern such as a simple grid pattern, a hexagonal pattern, or a shifted hexagonal pattern. The VCSEL array 318 may be positioned at the focal point of the optical element system 326, i.e., all cavities are collimated. A second array 322 can be responsible for flood illumination, particularly diffuse illumination. This array 322 may be completely covered by a flood photo-optical element 330. As shown in Figure 5B, the second array 322 may also be located at the focal point of the optical element system 326. Therefore, the light generated by the second array 322 is also at the focal point. However, the optical image is modified by the additional flood photo-optical element 330 so that the cavities are not properly collimated. This allows for the generation of diffuse flood illumination. The flood photo-optical element 330 is configured so that the emitted infrared light pattern is not affected. The VCSEL array 318 does not have to be covered by this flood photo-optical element 330.

[0269] As shown in Figure 5B, the photoelectron device 312 has a single flood photo-optical element 330 that covers all the light-emitting elements of the second array 322. Other embodiments are also possible, for example, as shown in Figure 6B.

[0270] In Figure 6B, for example, the photoelectron device 312 has a plurality of flood photo-optical elements 330. For example, each light-emitting element 316 of the second array 322 has at least one assigned flood photo-optical element 330.

[0271] Figure 6A is a top view of an exemplary layout of the light-emitting element structure 314. In this embodiment, the light-emitting element structure 314 may have two VCSEL arrays 318 and 322. The VCSEL arrays 318 and 322 are arranged on a single plane. Figures 6A and 6B show an example in which the cavities of the light-emitting elements 316 of the first array 318 and the cavities of the light-emitting elements 316 of the second array 322 may form a coupled pattern. Here, the cavities of the light-emitting elements 316 of the first array 318 and the cavities of the light-emitting elements 316 of the second array 322 are arranged alternately, for example, line by line. In Figure 6A, white circles indicate cavities of the illumination source 320, and black circles indicate cavities of the flood illumination source 324, each having, for example, additional microlenses. On the left side of Figure 6B, the photoelectronic device 312 is shown together with the activated illumination source 320. On the right side of Figure 6B, the photoelectron device 312 is shown together with the activated flood illumination source 324. [Explanation of symbols]

[0272] 110 Equipment 112 Optoelectronic devices 114 Pattern Lighting Sources 116 Floodlight Sources 118 Image Generation Unit 120 displays 122 Authentication Units 124 Authentication Units 126 Step of irradiating the user with an infrared light pattern 128 Step of irradiating the user with infrared flood light 130 Steps to generate at least one pattern image and at least one flood image. 132 User Identification Step 134 Steps to extract material data 136 Permitting step 138 Optical element with polarization characteristics 140 First region 142 Second region 210 Optoelectronic device 212 First vertical cavity surface emitting laser 214 Active region 216 Bottom surface 218 Second vertical cavity surface emitting laser 220 Active region 222 Top surface 224 Bottom surface 226 Support member 227 Heat sink 228 Optical lens 229 Electrical connector 230 First distance 232 Second distance 234 Thickness 236 Thickness 238 Central axis 240 Central axis 242 Central axis 244 Illumination light 246 Illumination light 247 Top surface 248 Component 250 Substrate​​​​​​​​​​​​​​​​​​​​

Claims

1. A photoelectronic device (112), comprising the following components: At least one pattern illumination source (114) configured to emit at least one infrared light pattern having multiple infrared light spots, wherein the number of infrared light spots is 4000 or less. At least one flood illuminator (116) configured to emit infrared flood light, and The system comprises at least one image generation unit (118) configured to generate at least one pattern image while the pattern illumination source (114) emits an infrared light pattern, and at least one flood image while the flood illumination source (116) emits infrared flood light, The relative distance between the flood illumination source (116) and the pattern illumination source (114) is less than 3.0 mm, in the photoelectronic device (112).

2. The photoelectronic device (112) according to claim 1, wherein the photoelectronic device (112) is configured within a device (110), the device (110) comprises at least one display (120), the infrared light pattern passes through the display (120) while being emitted from the pattern illumination source (114), and / or the infrared flood light passes through the display (120) while being emitted from the flood illumination source (116).

3. The photoelectronic device (112) according to claim 1 or 2, wherein the relative distance between the flood illumination source (116) and the pattern illumination source (114) is less than 2.5 mm, preferably less than 2.0 mm.

4. The photoelectronic device (112) according to claim 1 or 2, wherein the infrared light pattern is a hexagonal pattern, preferably a 2 / 5 hexagonal infrared light pattern, and / or at least one of the infrared light spots is associated with a beam divergence of 0.2° to 0.5°, preferably 0.1° to 0.3°.

5. The photoelectronic device (112) according to claim 1 or 2, wherein the infrared light pattern has 3,000 spots or less, preferably 2,000 spots or less.

6. The optoelectronic device (112) according to claim 1 or 2, wherein the pattern illumination source (114) has at least one vertical cavity surface-emitting laser (VCSEL), preferably a plurality of VCSELs, and / or the pattern illumination source has at least one optical element configured to increase the number of spots, the optical element having at least one diffractive optical element (DOE), and / or at least one metasurface element.

7. The photoelectronic device (112) according to claim 1 or 2, wherein the pattern illumination source (114) has a plurality of first VCSELs mounted on a first platform, the flood illumination source (116) has a plurality of second VCSELs mounted on a second platform, and the photoelectronic device (112) comprises a heat sink, a first increment having the first platform mounted above the heat sink, and a second increment having the second platform mounted above the heat sink.

8. A method of using the photoelectron device (112) according to claim 1 or 2 for authenticating a user of the device (110) having the photoelectron device (112).

9. A device (110) for authenticating a user of a device (110) in order to perform at least one operation on the device (110) that requires authentication, the device (110) comprising the following components: At least one flood illuminator (116) configured to emit infrared flood light, At least one pattern illumination source (114) configured to emit at least one infrared light pattern having multiple infrared light spots, wherein the number of infrared light spots is 4000 or less, and the relative distance between the flood illumination source (116) and the pattern illumination source (114) is less than 3.0 mm. The pattern illumination source (114) is configured to generate at least one pattern image while emitting an infrared light pattern, and the flood illumination source (116) is configured to generate at least one flood image while emitting infrared flood light, At least one display (120) that partially covers the flood illumination source (116), the pattern illumination source (114), and the image generation unit (118), and At least one authentication unit configured to perform at least one user authentication process using the flood image and the pattern image, Apparatus (110) having

10. The apparatus (110) according to claim 2 or 9, wherein the display (120) is at least one organic light-emitting diode (OLED) display or has at least one organic light-emitting diode (OLED) display.

11. The apparatus (110) according to claim 2 or 9, wherein the display (120) has a first region associated with a first pixel density value and a second region associated with a second pixel density value, the first pixel density value being less than 350 pixels / inch and the second region being 400 pixels / inch or more.

12. The apparatus (110) according to claim 2 or 9, wherein the apparatus (110) is selected from the group consisting of a television set, a game console, a personal computer, a mobile device, in particular a mobile phone, and / or a smartphone, and / or a tablet computer, and / or a laptop, and / or a tablet, and / or a virtual reality device, and / or a wearable such as a smartwatch, or another type of portable computer.

13. A method for authenticating a user of a device (110) to perform at least one operation on the device (110) that requires authentication, wherein the device (110) has a display (120), and the method is the following steps: a. (126) A step of illuminating a user with an infrared light pattern having multiple infrared light spots from a pattern illumination source (114) of the device (110), wherein the number of infrared light spots is 4000 or less. b. (128) A step of illuminating a user with infrared flood light from a flood illumination source (116) of the apparatus, wherein the distance between the flood illumination source (116) and the pattern illumination source (114) is less than 3.0 mm. c. (130) The step of generating at least one pattern image representing the user in the image generation unit (118) of the apparatus (110) while the user is illuminated with the infrared light pattern, and generating at least one image representing the user in the image generation unit (118) of the apparatus while the user is illuminated with the infrared flood light, wherein the image generation unit (118) and / or the flood and pattern illumination sources (114, 116) are at least partially covered by the display (120) of the apparatus (110). d. (132) A step of identifying a user based on the flood image using at least one authentication unit (122) of the device (110), e. (134) The step of extracting material data from the at least one pattern image using the authentication unit (122), and f. (136) A step that enables a user to perform at least one operation on the apparatus (110) that requires authentication, based on the material data and identification. A method having

14. A computer program that includes instructions to cause the device (110) to perform the method described in claim 13, relating to the method, when the program is executed by the device (110) according to claim 10 relating to the device (110).

15. A computer-readable storage medium comprising, when an instruction is executed by the device (110) according to claim 10 relating to the device (110), an instruction causing the device (110) to perform the method according to claim 13 relating to the method.

16. A non-temporary computer-readable medium that, when executed by one or more processors, includes instructions causing one or more processors to perform the method according to claim 13 of the method.

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