Superconductor deposition apparatus
The superconductor deposition apparatus with multiple chambers and winding mechanisms addresses slow wire movement and maintenance issues, enhancing deposition rates and productivity by increasing deposition time and enabling rapid chamber maintenance.
JP2026517831APending Publication Date: 2026-06-02MARU L&C CO LTD
Patent Information
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- MARU L&C CO LTD
- Filing Date
- 2023-11-21
- Publication Date
- 2026-06-02
Smart Images
Figure 2026517831000001_ABST
Abstract
The present invention relates to a superconductor deposition apparatus, characterized by including an extraction section on which a wire is wound, a plurality of chamber sections spaced apart to allow the wire discharged from the extraction section to pass through and perform individual deposition processes, and a recovery section for recovering the wire that has passed through the chamber sections. As a result, the wire drawn from the extraction section is recovered in the recovery section and can be deposited while sequentially passing through the plurality of chamber sections arranged between the extraction section and the recovery section. At this time, since the wire is wound into the chamber section one or more times, the deposition time for the wire in the limited internal space of the chamber section is increased, and the overall size of the equipment can be reduced.
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