Optical Components

Abstract

To provide a technique that can perform patterning with high precision even when patterning a thin film on a curved optical surface of an optical member, and can also suppress the complexity of processing steps for patterning. [Solution] An optical component comprising an optical substrate having a curved optical surface, a thin film formed on the optical surface of the optical substrate, and a pattern portion formed by partially removing the thin film, wherein the pattern portion is configured by arranging a plurality of identically shaped portions on the optical surface, and the underlying surface exposed by the removal of the thin film has laser processing marks along the traces of scanning caused by irradiating the thin film with laser light to partially remove the thin film.

Description

[Technical field]

[0001] The present invention relates to a method for producing an optical member and to an optical member. [Background technology]

[0002] In recent years, some eyeglass lenses have been patterned with a predetermined pattern on a thin film (such as a SnO2 film or a Cr film) on the optical surface of a lens substrate. The patterning to obtain the predetermined pattern is performed, for example, by forming a resist pattern on the optical surface by an inkjet recording method, forming a thin film thereon, and then removing the resist pattern to partially peel off the thin film (see, for example, Patent Document 1). [Prior art documents] [Patent documents]

[0003] [Patent Document 1] JP 2018-180168 A Summary of the Invention [Problem to be solved by the invention]

[0004] In the case of eyeglass lenses, the optical surface is curved, so that when patterning a thin film, it is necessary to form a resist pattern on the curved surface. When forming a resist pattern by inkjet recording, the resist landing varies within the optical surface, so that the resist pattern is not formed accurately on the optical surface, and as a result, there is a risk that high-precision patterning cannot be performed. In addition, since the formation and removal of the resist pattern are required, the processing steps for patterning may become complicated.

[0005] The present invention aims to provide a technology that can perform patterning with high precision even when patterning a thin film on a curved optical surface of an optical component, and that can suppress the complexity of the processing steps for patterning. [Means for solving the problem]

[0006] The present invention has been devised to achieve the above object. The first aspect of the present invention is a film forming step of forming a thin film on an optical surface of an optical substrate having a curved optical surface; a removing step of partially removing the thin film on the optical surface to pattern the thin film, In the removing step, the thin film is removed by irradiating it with laser light. A method for manufacturing an optical member.

[0007] A second aspect of the present invention is In the removing step, the laser beam is irradiated using a laser processing machine that supports three-dimensional control of the focal position of the laser beam. A method for producing the optical member according to the first aspect.

[0008] A third aspect of the present invention is The laser light irradiated in the removal step is a laser light having a wavelength in a wavelength range in which the difference between the transmittance of the optical substrate and the transmittance of the thin film is 1% or more. A method for producing the optical member according to the first or second aspect.

[0009] A fourth aspect of the present invention is a non-removable film forming step of forming a film made of a material different from that of the thin film as a non-removable film between the optical substrate and the thin film, The laser light irradiated in the removal step has a wavelength in a wavelength range in which the difference in transmittance for the non-removed film from the transmittance for the thin film is 1% or more in addition to the transmittance for the optical substrate. A method for producing the optical member according to the third aspect.

[0010] A fifth aspect of the present invention is The optical member is a spectacle lens. A method for producing the optical member according to any one of the first to fourth aspects.

[0011] A sixth aspect of the present invention is a method for producing a composition comprising the steps of: The thin film is an absorbing metal oxide film or a metal film. A method for producing the optical member according to any one of the first to fifth aspects.

[0012] A seventh aspect of the present invention is The pattern portion formed by the patterning in the removing step is configured by arranging a plurality of identically shaped portions on the optical surface, and the dimensional variation of each of the identically shaped portions is ±10% or less. A method for producing the optical member according to any one of the first to sixth aspects.

[0013] An eighth aspect of the present invention is a method for producing a composition comprising the steps of: An optical substrate having a curved optical surface; A thin film formed on the optical surface of the optical substrate; a pattern portion formed by partially removing the thin film; The pattern portion is configured by arranging a plurality of identically shaped portions on the optical surface. It is an optical component.

[0014] A ninth aspect of the present invention is a method for producing a composition comprising the steps of: The pattern portion has a dimensional variation of ±10% or less among the plurality of identically shaped portions. An optical member according to an eighth aspect.

[0015] A tenth aspect of the present invention is a method for producing a composition comprising the steps of: The pattern portion has a dimensional variation of ±10% or less between the identically shaped portion disposed near the center of the optical surface and the identically shaped portion disposed near the periphery of the optical surface. The optical member according to a ninth aspect.

[0016] An eleventh aspect of the present invention is a method for producing a composition comprising the steps of: The pattern portion constitutes a dot pattern, The identically shaped portions constitute dots in the dot pattern. The optical member according to any one of the eighth to tenth aspects.

[0017] A twelfth aspect of the present invention is a method for producing a composition comprising the steps of: The pattern portion has a laser processing mark on the base surface exposed by removing the thin film. The optical member according to any one of the eighth to eleventh aspects.

[0018] A thirteenth aspect of the present invention is a method for producing a composition comprising the steps of: The optical member is a spectacle lens. The optical member according to any one of the eighth to twelfth aspects.

[0019] A fourteenth aspect of the present invention is a method for producing a composition comprising the steps of: The thin film is an absorbing metal oxide film or a metal film. The optical member according to any one of the eighth to thirteenth aspects. Effect of the Invention

[0020] According to the present invention, even when patterning is performed on a thin film on a curved optical surface of an optical component, the patterning can be performed with high precision and the processing steps for patterning can be prevented from becoming complicated. [Brief description of the drawings]

[0021] [Figure 1] 1 is a plan view showing an example of the configuration of a spectacle lens according to an embodiment of the present invention. [Diagram 2] 1 is a cross-sectional view showing an example of the configuration of a spectacle lens according to an embodiment of the present invention. [Diagram 3] FIG. 2 is a flow chart showing an example of a procedure for a method of manufacturing a spectacle lens according to an embodiment of the present invention. [Figure 4]FIG. 1 is an explanatory diagram showing the relationship between the wavelength of laser light and the transmittance for each component of a spectacle lens, where (a) is a diagram showing the relationship for a first lens substrate having a refractive index of 1.50, (b) is a diagram showing the relationship for a second lens substrate having a refractive index of 1.60, and (c) is a diagram showing the relationship for a third lens substrate having a refractive index of 1.67. [Diagram 5] 1A and 1B are partially enlarged views showing a specific example of a pattern portion in a spectacle lens according to one embodiment of the present invention, in which (a) shows the results of microscopic observation of the pattern portion according to this embodiment, and (b) shows the results of microscopic observation of the pattern portion obtained using an inkjet recording method, which is a comparative example. [Figure 6] FIG. 2 is an explanatory diagram showing a specific example of an observation result of a pattern portion of a spectacle lens according to an embodiment of the present invention, using a laser microscope. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0022] Hereinafter, an embodiment of the present invention will be described with reference to the drawings.

[0023] (1) Overview of eyeglass lens structure First, a schematic configuration of a spectacle lens taken as an example in this embodiment will be described. FIG. 1 is a plan view showing an example of the configuration of a spectacle lens according to the present embodiment, and FIG. 2 is a cross-sectional view thereof.

[0024] (Overall composition) The eyeglass lens 10 has an object-side surface and an eyeball-side surface as optical surfaces. The "object-side surface" is the surface that is located on the object side when eyeglasses equipped with the eyeglass lens 10 are worn by a wearer. The "eyeball-side surface" is the opposite, that is, the surface that is located on the eyeball side when eyeglasses equipped with the eyeglass lens 10 are worn by a wearer. The object-side surface is generally a convex surface and the eyeball-side surface is generally a concave surface, that is, the eyeglass lens 10 is a meniscus lens.

[0025] 1, the eyeglass lens 10 in this embodiment has a plurality of fine dots 21 arranged isotropically and uniformly on at least one of the object side surface and the eyeball side surface, and the dots 21 form a predetermined pattern. In this embodiment, an example is shown in which the predetermined pattern is formed on the entire surface of the eyeglass lens 10, but the predetermined pattern may be formed partially. Furthermore, the predetermined pattern does not have to be formed by a plurality of fine dots 21, and may be formed by, for example, characters, figures, etc.

[0026] The dots 21 constituting the predetermined pattern are each formed in the same shape (for example, a circle). The dots 21 are "isotropically and uniformly arranged" means that the adjacent dots 21 are arranged at a constant pitch P.

[0027] As shown in Fig. 2, the eyeglass lens 10 having such a predetermined pattern is configured to include a lens substrate 11, which is an optical substrate, a hard coat film (HC film) 12 formed on both sides (i.e., the object side surface and the eyeball side surface), a patterned thin film 13 formed on the HC film 12 on one side (specifically, the object side surface), and an anti-reflection film (AR film) 14 formed on both sides. Here, the case where the patterned thin film 13 is disposed on the object side surface is taken as an example, but this is not limited thereto, and it is sufficient that the patterned thin film 13 is disposed on at least one surface. Furthermore, the eyeglass lens 10 may be one in which other films are formed in addition to the HC film 12, the patterned thin film 13, and the AR film 14.

[0028] (Lens substrate) The lens substrate 11 is made of a general resin material used for optical lenses and is molded into a predetermined lens shape. That is, the lens substrate 11 has optical surfaces for forming the predetermined lens shape on both the object side surface and the eyeball side surface. The predetermined lens shape may be any of a single-focus lens, a multifocal lens, a progressive power lens, and the like. In any case of the lens shape, at least one of the optical surfaces of the lens substrate 11 (generally both) is curved. The resin material constituting the lens substrate 11 has a refractive index (nD) of, for example, about 1.50 to 1.74. Examples of such resin materials include allyl diglycol carbonate, urethane resin, polycarbonate, thiourethane resin, and episulfide resin. The lens substrate 11 may be made of other resin materials that can provide a desired refractive index, instead of the above-mentioned resin materials, or may be made of inorganic glass.

[0029] (HC membrane) The HC film 12 is, for example, made of a curable material containing a silicon compound, and is a film formed to a thickness of about 3 μm to 4 μm. The refractive index (nD) of the HC film 12 is close to the refractive index of the material of the lens substrate 11 described above, for example, about 1.49 to 1.74, and the film configuration is selected according to the material of the lens substrate 11. By covering the eyeglass lens 10 with such a HC film 12, it is possible to improve the durability of the eyeglass lens 10.

[0030] (Patterning thin film) The patterned thin film 13 is formed on the optical surface of the lens substrate 11 via the HC film 12, and is, for example, composed of a thin film having a thickness of about several nm to several tens of nm. The material constituting the patterned thin film 13 is, for example, a metal or metal oxide having a property of absorbing laser light, which will be described later. That is, the patterned thin film 13 is a metal oxide film or a metal film having absorption. Such a film is, for example, a film containing at least one metal or metal oxide selected from chromium (Cr), tantalum (Ta), niobium (Nb), titanium (Ti), zirconium (Zr), gold (Au), silver (Ag), tin (Sn) and aluminum (Al), and is preferably a tin dioxide (SnO2) film or a Cr film. In the following description, the case where the patterned thin film 13 is a SnO2 film or a Cr film will be mainly taken as an example.

[0031] The patterned thin film 13 also has a pattern portion 20 formed by partially removing the thin film. The pattern portion 20 constitutes the above-mentioned predetermined pattern. Specifically, the pattern portion 20 is configured by arranging a plurality of identically shaped portions 21. The identically shaped portions 21 are formed by partially removing the thin film, and correspond to the above-mentioned dots 21. That is, in this embodiment, the pattern portion 20 constitutes a dot pattern, which is a predetermined pattern, and the identical shape portion 21 constitutes the dots 21 in the dot pattern.

[0032] (AR film) The AR film 14 has a multi-layer structure in which films with different refractive indices are laminated, and is a film that prevents light reflection by interference. However, it does not necessarily have to be a multi-layer structure, and a single-layer structure is also acceptable as long as the anti-reflection effect of light is obtained. When the AR film 14 has a multi-layer structure of low and high refractive index layers, the low refractive index film is made of, for example, silicon dioxide (SiO2) with a refractive index of about 1.43 to 1.47. The high refractive index film is made of a material having a higher refractive index than the low refractive index film, and is made of metal oxides such as niobium oxide (Nb2O5), tantalum oxide (Ta2O5), titanium oxide (TiO2), zirconium oxide (ZrO2), yttrium oxide (Y2O3), and aluminum oxide (Al2O3) in an appropriate ratio. By covering the eyeglass lens 10 with the AR film 14, the visibility of the image passing through the eyeglass lens 10 can be improved.

[0033] (2) Manufacturing method of eyeglass lenses Next, a procedure for manufacturing the eyeglass lens 10 having the above-mentioned configuration, that is, an example of a procedure for the method for manufacturing an eyeglass lens according to this embodiment, will be specifically described. FIG. 3 is a flow chart showing an example of the procedure of the manufacturing method according to this embodiment.

[0034] (Basic steps outline) In manufacturing the eyeglass lens 10, the first step is to prepare a lens substrate 11, which is an optical substrate (step 101, hereinafter step will be abbreviated as "S").

[0035] After the lens substrate 11 is prepared, the second step is to form the HC film 12 on both sides of the lens substrate 11 (S102). The HC film 12 may be formed, for example, by a dipping method using a solution in which a curable material containing a silicon compound is dissolved. The formed HC film 12 is not removed in a step described later. Therefore, the step of forming the HC film 12 corresponds to a "non-removable film forming step" in which a film of a different material from the patterned thin film 13 is formed as a non-removable film between the lens substrate 11 and the patterned thin film 13 formed in a step described later.

[0036] After the HC film 12 is formed, a third step is performed in which a thin film 13a of SnO2 film or Cr film, which will become the patterned thin film 13, is formed on the optical surface of the lens substrate 11 via the HC film 12 (S103). Specifically, for the convex surface side, which is the surface on the object side, a thin film 13a of SnO2 film or Cr film is formed on the HC film 12. Such a thin film 13a may be formed by, for example, vacuum deposition or sputtering. This step corresponds to a "film formation step" of forming a thin film 13a on a curved optical surface.

[0037] After the thin film 13a is formed, the fourth step is performed (S104), in which the thin film 13a is partially removed to form the pattern portion 20. This step corresponds to a "removal step" in which the thin film 13a is patterned by partially removing the thin film 13a. In this embodiment, the thin film 13a is patterned by irradiating it with a laser beam, the details of which will be described later. When the thin film 13a is patterned, a patterned thin film 13 having the pattern portion 20 is formed on the HC film 12 on the convex side.

[0038] After the patterned thin film 13 is formed, a fifth step is performed in which a cleaning step is performed to remove residues and adhering matter (foreign matter) remaining from the patterning process (S105).

[0039] Thereafter, in the sixth step, the AR film 14 is formed on each of the convex surface side, which is the surface on the object side, and the concave surface side, which is the surface on the eyeball side (S106). When the AR film 14 has a multi-layer structure, a low refractive index layer and a high refractive index layer are alternately laminated from the bottom side. This film formation may be performed, for example, by applying ion-assisted deposition.

[0040] (Details of the removal process) Here, the removal step (S104) performed as the fourth step will be described in more detail.

[0041] As described above, it is known that patterning to obtain a predetermined pattern is performed by forming a resist pattern on an optical surface by inkjet recording and utilizing the resist pattern. However, since the optical surface of the eyeglass lens 10 is curved, when the resist pattern is formed by inkjet recording, the resist pattern is not accurately formed on the optical surface, and as a result, there is a risk that high-precision patterning cannot be performed. Therefore, in this embodiment, patterning to obtain a predetermined pattern (i.e., the pattern portion 20) is performed by laser processing using irradiation of laser light.

[0042] Specifically, in this embodiment, in the removal process (S104), when forming the pattern portion 20, laser light is selectively irradiated only to the portion of the thin film 13a to be removed, and the energy of the laser light is utilized to partially remove the thin film 13a.

[0043] (Three-dimensional control of laser beam focal position) The laser beam irradiation at this time is performed using a laser processing machine that supports three-dimensional control of the focal position of the laser beam.

[0044] The laser processing machine used includes a laser oscillator that emits laser light, a laser optical system that collects and irradiates the laser light from the laser oscillator, and a table section on which an object to be irradiated with the laser light (in this embodiment, a lens substrate after thin film formation) is fixed. A laser head may be formed by integrating the laser oscillator and the laser optical system. In a laser processing machine configured in this way, "capable of three-dimensional control of the focal position of the laser light" means that the focal position of the laser light irradiated to the object to be irradiated can be changed not only in the XY directions along the surface of the table section but also in the Z direction along the optical axis of the laser light by at least one of moving the relative position between the laser optical system and the table section or adjusting the optical path by the laser optical system, and the manner of change can be controlled.

[0045] Specifically, the three-dimensional control of the focal position of the laser beam is performed as follows. First, pattern data for the pattern portion 20 to be formed and surface data for the pattern forming surface of the lens substrate 11 on which the pattern portion 20 is to be formed are acquired. Then, the focal position of the laser beam is varied in the XY directions in accordance with the acquired pattern data, and the focal position of the laser beam is also varied in the Z direction in accordance with the acquired surface data. Such three-dimensional control of the focal position of the laser beam may be performed using a control computer device connected to the laser processing machine.

[0046] If such three-dimensional control of the focal position of the laser beam is supported, the patterning can be performed with high accuracy even when the thin film 13a on the curved optical surface is patterned. Moreover, since the thin film 13a can be patterned directly by using the laser beam, the formation and removal of a resist pattern can be omitted.

[0047] (laser light wavelength) Incidentally, the laser light irradiated in the removal step (S104) is intended to partially remove the thin film 13a, and it is desirable not to cause damage or the like due to irradiation to the lens substrate 11 and the HC film 12 other than the thin film 13a. Therefore, in this embodiment, laser light having the following wavelengths is used for irradiating the laser light in the removal step (S104).

[0048] Fig. 4 is an explanatory diagram showing the relationship between the wavelength of laser light and the transmittance of eyeglass lens components. Fig. 4(a) shows a specific example of the change in transmittance when the wavelength of laser light is changed for each of the lens substrate 11 alone (see the black dashed line in the figure), the lens substrate 11 + HC film 12 (see the gray solid line in the figure), the lens substrate 11 + HC film 12 + AR film 14 (see the black dotted line in the figure), and the lens substrate 11 + thin film 13a (see the black solid line in the figure) in the case where a lens substrate (first lens substrate) 11 with a refractive index of 1.50 is used. 4(b) shows a specific example of the change in transmittance when the wavelength of the laser light is changed for each of the lens substrate 11 alone (see black dashed line in the figure), the lens substrate 11 + HC film 12 (see gray solid line in the figure), the lens substrate 11 + HC film 12 + AR film 14 (see black dotted line in the figure), and the lens substrate 11 + thin film 13a (see black solid line in the figure) when a lens substrate (second lens substrate) 11 with a refractive index of 1.60 is used. Also, FIG. 4(c) shows a specific example of the change in transmittance when the wavelength of the laser light is changed for each of the lens substrate 11 alone (see black dashed line in the figure), the lens substrate 11 + HC film 12 (see gray solid line in the figure), the lens substrate 11 + HC film 12 + AR film 14 (see black dotted line in the figure), and the lens substrate 11 + thin film 13a (see black solid line in the figure) when a lens substrate (third lens substrate) 11 with a refractive index of 1.67 is used.

[0049] 4(a) to 4(c) show that in all cases, the transmittance increases sharply from the ultraviolet region to the visible region of the laser light wavelength, and that in the visible region (e.g., 380 nm to 780 nm) and some near-infrared wavelength regions (e.g., 780 nm to 1150 nm), there is a large difference in transmittance between lens substrate 11+thin film 13a and lens substrate 11 alone or lens substrate 11+HC film 12, but that the difference becomes smaller once these wavelength regions are exceeded.

[0050] When the transmittance is high, even if the laser light is irradiated, the energy of the laser light is not easily absorbed by the irradiated member (i.e., the laser light is easily transmitted), and damage to the member can be suppressed. On the other hand, when the transmittance is low, the absorption rate of the energy of the irradiated laser light is high, and processing etc. utilizing the energy absorption (for example, partial removal of a member) can be efficiently performed. Therefore, if the difference in transmittance between stacked members is large, it becomes possible to perform processing etc. using laser light on only one of the members.

[0051] In consideration of this, in this embodiment, as the laser light irradiated in the removal step (S104), a laser light having a wavelength belonging to a wavelength band in which the difference between the transmittance for the lens substrate 11 and the transmittance for the thin film 13a is 1% or more, preferably 3% or more, more preferably 5% or more, and even more preferably 10% or more is used. Furthermore, in addition to the transmittance for the lens substrate 11, a laser light having a wavelength belonging to a wavelength band in which the difference between the transmittance for the thin film 13a and the HC film 12, which is a non-removed film, is 1% or more, preferably 3% or more, more preferably 5% or more, and even more preferably 10% or more is used. In addition, a laser light having a wavelength belonging to a wavelength band in which the difference between the transmittance for the thin film 13a and the AR film 14, which is another non-removed film, may be used. Note that the transmittances of the lens substrate 11, the HC film 12, and the AR film 14 may include the transmittances for these laminates.

[0052] 4(a)-(c), an example of a wavelength band where the transmittance difference is 5% or more (i.e., a more preferable transmittance difference) is a wavelength band of 380 nm to 1150 nm. In the removal step (S104), a laser beam having a wavelength of, for example, 1064 nm is irradiated as a laser beam having a wavelength belonging to such a wavelength band. This is because a laser beam having a wavelength of 1064 nm has a transmittance difference of 10% or more, and the transmittance of the lens substrate 11 and the HC film 12 is 90% or more, making it possible to suppress the effect of the laser beam on the lens substrate 11.

[0053] In this way, by making the transmittance difference at least 1%, when irradiated with laser light, it is possible to realize that the laser light passes through the lens substrate 11, the HC film 12, etc. (but does not cause damage), but the thin film 13a has a high absorption rate, so that only the irradiated portion is removed. In other words, it is possible to directly pattern the thin film 13a by using laser irradiation. In addition, if the transmittance difference is preferably 3% or more, more preferably 5% or more, and even more preferably 10% or more, direct patterning by using laser irradiation can be ensured. The upper limit of the transmittance difference is about 50%, taking into consideration that the lens substrate 11, the HC film 12, the thin film 13a, etc. all have light transmittance.

[0054] (Predetermined pattern) Here, pattern portion 20 formed by patterning in the removing step (S104) will be described with a specific example.

[0055] As described above, the pattern portion 20 is formed by laser processing, and the laser processing is performed in accordance with three-dimensional control of the focal position of the laser light. Therefore, the pattern portion 20 is patterned with high precision, specifically, with the precision described below.

[0056] Fig. 5 is a partially enlarged view showing a specific example of a pattern portion in a spectacle lens according to this embodiment. In this example, the pattern portion 20 is a dot pattern composed of a plurality of dots (same-shaped portions) 21, and the microscopic observation results of a dot pattern arranged near the center of the optical surface of the spectacle lens 10 and a dot pattern arranged near the periphery of the optical surface are shown side by side. Fig. 5(a) shows an example of a dot pattern according to this embodiment obtained by laser processing, while Fig. 5(b) shows an example of a dot pattern obtained by using an inkjet recording method as a comparative example.

[0057] As shown in FIG. 5(a), the pattern portion 20, which is the dot pattern of this embodiment, is configured by arranging dots (identical shaped parts) 21 on the optical surface, and the dimensional variation of each dot 21 is within ±10%, preferably within 6%, and more preferably within 2%. Furthermore, when comparing the dots 21 constituting the dot pattern arranged near the center of the optical surface of the eyeglass lens 10 with the dots 21 constituting the dot pattern arranged near the periphery of the same optical surface, the dimensional variation between them is less than ±10%, preferably less than 6%, and more preferably less than 2%. The "dimensional variation" referred to here refers to at least one of, and preferably both of, (1) the variation in the diameter between each dot 21 that is substantially circular when viewed in a plane, and (2) the variation in the vertical and horizontal diameter dimensions (aspect ratio) of a certain dot 21. Specifically, with regard to (1) above, the variation in the diameter of each dot 21 is, for example, 440±44 μm or less, preferably 440±26 μm or less, and more preferably 440±8 μm or less, both near the center and near the periphery of the optical surface. Also, with regard to (2) above, the variation in the aspect ratio of each dot 21 is, for example, 440±44 μm or less, preferably 440±26 μm or less, and more preferably 440±8 μm or less.

[0058] On the other hand, in the dot pattern obtained using the inkjet recording method shown in Fig. 5(b), the dimensional variation of each dot exceeds ±10%, specifically, exceeds 440±44 μm. In particular, near the periphery of the optical surface, there is a high tendency for the aspect ratio to vary widely, as there is a risk of dots joining together or satellites (small dots) appearing around the original dots due to the time difference between ink landing.

[0059] That is, when the optical surface is curved, for example, in the inkjet recording method, dimensional variations exceeding ±10% and collapse of the dot shape (variation in aspect ratio) may occur. In contrast, as described in the present embodiment, if patterning is performed by irradiating a laser beam while responding to three-dimensional control of the focal position, the dimensional variations of the pattern portion 20 formed thereby can be suppressed to ±10% or less, preferably 6% or less, and more preferably 2% or less. In particular, the degree of improvement in the aspect ratio of (2) above is higher than that in the inkjet recording method. Therefore, even when a dot pattern consisting of a plurality of dots 21 arranged on a curved optical surface is formed, the dot pattern is formed with very high precision, and as a result, stable quality of the eyeglass lens 10 can be ensured.

[0060] In particular, when the optical surface is curved, there is a high possibility that the maximum dimensional variation occurs between the vicinity of the center and the vicinity of the periphery of the optical surface, but as described in this embodiment, if the patterning is performed by irradiating the laser light while responding to three-dimensional control of the focal position, the maximum dimensional variation can be suppressed to ±2% or less. Therefore, for example, even if a dot pattern is arranged over the entire surface of a curved optical surface, the dot pattern is formed with extremely high precision, and as a result, stable quality of the eyeglass lens 10 can be ensured.

[0061] Moreover, since the pattern portion 20 is formed by laser processing, the underlying surface exposed when the thin film 13a is removed has laser processing marks that can be observed with a laser microscope. FIG. 6 is an explanatory diagram showing a specific example of the observation result of the pattern portion of the eyeglass lens according to the present embodiment by a laser microscope. As shown in the figure, when the pattern portion 20 formed by laser processing is observed with a laser microscope, it can be recognized that there are laser processing marks on the base surface exposed after the thin film 13a is removed, along the scanning marks when the laser light was irradiated in the removal step (S104). In other words, if each dot 21 constituting the pattern portion 20 has a laser processing mark, it is recognized that each dot 21 is clearly formed by partially removing the thin film 13a by irradiating it with laser light.

[0062] Such pattern portion 20 (i.e., dots 21 formed by laser processing) can be formed with extremely high precision even when formed through patterning of thin film 13a on a curved optical surface. Therefore, each dot 21 constitutes, for example, a dot pattern formed with extremely high precision, and as a result, stable quality of the eyeglass lens 10 can be ensured.

[0063] In the above description, specific values ​​have been given as examples of the diameter dimensions of the dots 21, but the present invention is not necessarily limited to these values. The diameter DD of the dot 21 is, for example, 0.01 mm or more, more preferably 0.05 mm or more, and even more preferably 0.1 mm or more, and may be, for example, 5.0 mm or less, preferably 2.0 mm or less, more preferably 1.0 mm or less, and even more preferably 0.5 mm or less. In addition, the distance AD ​​from the center of one dot 21 to the center of another adjacent dot 21 is, for example, 0.1 mm or more, preferably 0.2 mm or more, more preferably 0.3 mm or more, and it is considered to be, for example, 5.0 mm or less, preferably 3.0 mm or less, more preferably 1.0 mm or less. The spacing AD / diameter DD is preferably greater than 1.0, more preferably 1.1 or more, even more preferably 1.2 or more, and is preferably 2.0 or less, more preferably 1.8 or less, even more preferably 1.5 or less. In either case, in this embodiment, the dimensional variation is suppressed to ±10% or less, preferably 6% or less, and more preferably 2% or less.

[0064] (3) Effects of this embodiment According to this embodiment, one or more of the following advantages can be obtained.

[0065] (a) In this embodiment, in the removal step (S104), patterning is performed using laser light. Therefore, patterning of the thin film 13a on the curved optical surface can be performed with high precision, and stable quality can be ensured for the manufactured eyeglass lenses 10. In addition, since patterning can be performed directly on the thin film 13a by using laser light, formation and removal of a resist pattern can be omitted, and the processing steps for patterning can be prevented from becoming complicated.

[0066] (b) In particular, as described in this embodiment, if the laser beam is irradiated using a laser processing machine that supports three-dimensional control of the focal position of the laser beam, this is extremely suitable for patterning the thin film 13a on a curved optical surface.

[0067] (c) In this embodiment, the laser light irradiated in the removal step (S104) has a wavelength in a wavelength range in which the difference between the transmittance of the lens substrate 11 and the transmittance of the thin film 13a is 1% or more, preferably 3% or more, more preferably 5% or more, and even more preferably 10% or more. By making the transmittance difference at least 1%, it is possible to achieve the following when irradiating the laser light: the lens substrate 11 is penetrated (but does not cause damage), but the thin film 13a has a high absorptance, so that only the irradiated portion is removed. In other words, it is possible to directly pattern the thin film 13a by utilizing laser irradiation.

[0068] (d) In the present embodiment, the laser light irradiated in the removal step (S104) has a wavelength in a wavelength range in which the difference in transmittance between the lens substrate 11 and the thin film 13a is 1% or more, preferably 3% or more, more preferably 5% or more, and even more preferably 10% or more, not only for the lens substrate 11 but also for the HC film 12. Therefore, even if the HC film 12 is formed on the optical surface of the lens substrate 11, it is possible to directly pattern the thin film 13a by utilizing laser irradiation.

[0069] (e) As described in this embodiment, when the optical substrate is a lens substrate 11 and the optical member is a spectacle lens 10, the spectacle lens 10 generally has a curved optical surface. Even in this case, however, since highly accurate patterning can be performed, stable quality of the spectacle lens 10 can be ensured.

[0070] (f) As explained in this embodiment, if the thin film 13a is a SnO2 film or a Cr film, it is possible to obtain a patterning effect (ensuring the visibility of a predetermined pattern, etc.) while ensuring the light transmittance of the optical member, which is extremely suitable for application to the eyeglass lens 10. However, the thin film 13a is not limited to a SnO2 film or a Cr film, and other metal oxide films or metal films can be applied in exactly the same way as long as they are metal oxide films or metal films having absorption, and the same effect can be obtained even in that case.

[0071] (g) In the eyeglass lens 10 obtained by the manufacturing method of this embodiment, the dots 21, which are the multiple identically shaped portions that make up the pattern portion 20, are each formed with approximately the same shape and size with high precision. In other words, even if the optical surface is curved, high-precision patterning is performed. Therefore, stable quality of the eyeglass lens 10 can be ensured.

[0072] (h) In the spectacle lens 10 obtained by the manufacturing method of this embodiment, the pattern portion 20 has a dimensional variation of each dot 21 constituting the pattern portion 20 of ±10% or less, preferably 6% or less, and more preferably 2% or less. When the optical surface is curved, for example, inkjet recording method causes a dimensional variation of more than ±10%, but if patterning is performed by irradiating laser light while responding to three-dimensional control of the focal position, the dimensional variation can be suppressed to ±10% or less, preferably 6% or less, and more preferably 2% or less. Therefore, even if the pattern portion 20 is configured by arranging multiple dots 21, the patterning can be performed with high precision. In particular, when the optical surface is curved, there is a high possibility that maximum dimensional variation will occur especially near the center and near the periphery of the optical surface; however, by restricting this maximum dimensional variation to ±10% or less, preferably 6% or less, and more preferably 2% or less, high precision patterning of the thin film 13a can be achieved, which is extremely advantageous in ensuring stable quality of the eyeglass lens 10.

[0073] (i) In the eyeglass lens 10 obtained by the manufacturing method of this embodiment, the pattern portion 20 constitutes a dot pattern. For the dot pattern, the uniformity of each dot is very important in obtaining the effect of the dot pattern (for example, the effect of suppressing the amount of transmitted light). Even in that case, as explained in this embodiment, if the dimensional variation of each dot is ±10% or less, the effect of the dot pattern can be obtained reliably.

[0074] (j) In the eyeglass lens 10 obtained by the manufacturing method of this embodiment, the pattern portion 20 has laser processing marks on the base surface exposed after the thin film 13a is removed. If the pattern portion 20 has laser processing marks, it is clear that the pattern portion 20 was formed by partially removing the thin film 13a by irradiating it with laser light. If the pattern portion 20 is formed using laser light, it is possible to perform patterning with high precision even when patterning is performed on the thin film 13a on a curved optical surface by corresponding to three-dimensional control of the focal position when irradiating the laser light. Therefore, it is very suitable for ensuring stable quality of the eyeglass lens 10.

[0075] (4) Modifications, etc. Although the embodiments of the present invention have been described above, the above disclosure shows exemplary embodiments of the present invention. In other words, the technical scope of the present invention is not limited to the above exemplary embodiments, and various modifications are possible without departing from the gist of the present invention.

[0076] In the above embodiment, the patterning thin film 13 is formed on the HC film 12, but the present invention is not limited to this. In other words, the patterning thin film 13 may be formed directly on the lens substrate 11 without the HC film 12, or may be formed with a film of another type other than the HC film 12 interposed therebetween.

[0077] In the above embodiment, the pattern portion 20 is a dot pattern composed of a plurality of dots (same-shaped portions) 21, but the present invention is not limited to this. That is, the pattern portion 20 may be composed of, for example, characters, figures, etc., instead of the dots 21. The pattern portion 20 may be formed not on the entire optical surface of the eyeglass lens 10, but on a part of it. Furthermore, a collection of minute dots 21 may form characters, figures, etc. [Explanation of symbols]

[0078] 10... eyeglass lens (optical member), 11... lens substrate (optical substrate), 12... HC film (non-removable film), 13... patterned thin film, 13a... thin film, 14... AR film, 20... pattern portion, 21... dot (same shape portion)

Claims

1. An optical substrate having a curved optical surface; A hard coat film formed on the optical surface of the optical substrate; a thin film formed on the optical surface via the hard coat film, the thin film being made of a material different from the hard coat film; a pattern portion in which the thin film is partially removed without removing the hard coat film; an anti-reflection film that covers the thin film and the pattern portion; The thin film is an absorbing metal oxide film or a metal film, the pattern portion is configured by arranging a plurality of identically shaped portions on the optical surface, and has laser processing marks on a base surface exposed by removing the thin film; In the wavelength range of 380 nm to 1150 nm, the difference in transmittance between the thin film formed on the optical substrate and the hard coat film formed on the optical substrate is 5% or more, and the laser processing marks are present along the traces of scanning when irradiating the thin film with laser light to partially remove the thin film. Optical components.

2. The pattern portion has a dimensional variation of ±10% or less among the plurality of identically shaped portions. The optical member according to claim 1 .

3. The pattern portion has a dimensional variation of ±10% or less between the identically shaped portion disposed near the center of the optical surface and the identically shaped portion disposed near the periphery of the optical surface. The optical member according to claim 2 .

4. The pattern portion constitutes a dot pattern, The identically shaped portions constitute dots in the dot pattern. The optical member according to claim 1 .

5. The optical member is a spectacle lens. The optical member according to claim 1 .

6. The hard coat film is a film containing a silicon compound. The optical member according to claim 1 .

7. The thin film is made of SnO ２ or Cr The optical member according to claim 1 .

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