Substrate processing system and teaching method for transfer device

Abstract

To provide a substrate processing system that transports a substrate in consideration of the positional deviation of a mounting portion, and a teaching method for a transport device.SOLUTION: A teaching method for a transport device in a substrate processing system includes: teaching a position where a first transfer device receives a substrate in a load lock chamber (S101); teaching a position where the first transfer device transfers the substrate to a processing chamber (S102); measuring a deviation amount between a mounting portion of the processing chamber and the mounted substrate (S103); and correcting a position where a second transfer device transfers the substrate to the mounting portion of the load lock chamber on the basis of the measured deviation amount (S104).SELECTED DRAWING: Figure 5

Description

[Technical field]

[0001] The present disclosure relates to a substrate processing system and a teaching method for a transport device. [Background technology]

[0002] Patent document 1 discloses a substrate processing system including a load lock chamber having multiple mounting portions, a processing chamber having multiple mounting portions, and a transport device that transports multiple substrates mounted on the mounting portions of the load lock chamber to the mounting portions of the processing chamber. [Prior art documents] [Patent documents]

[0003] [Patent Document 1] JP 2020-61472 A Summary of the Invention [Problem to be solved by the invention]

[0004] Incidentally, the position of the mounting portion in the processing chamber has an individual error with respect to a design value, and the error differs from processing chamber to processing chamber.

[0005] One aspect of the present disclosure provides a substrate processing system and a teaching method for a transfer device that transfers a substrate taking into account positional misalignment of a placement unit. [Means for solving the problem]

[0006] According to an aspect of the present disclosure, there is provided a substrate processing system comprising: a load lock chamber having a plurality of mounting units; The system comprises a processing chamber having a plurality of mounting portions, a vacuum transfer chamber connecting the load lock chamber and the processing chamber, a first transfer device provided in the vacuum transfer chamber and transferring a plurality of substrates from the mounting portion of the load lock chamber to the mounting portion of the processing chamber, a second transfer device transferring substrates to the mounting portion of the load lock chamber, and a control unit, wherein the control unit is configured to be able to execute the steps of teaching the load lock chamber a position at which the first transfer device receives the substrate, teaching the processing chamber a position at which the first transfer device transfers the substrate, measuring an amount of misalignment between the mounting portion of the processing chamber and the substrate to be placed thereon, and correcting the position at which the second transfer device transfers the substrate to the mounting portion of the load lock chamber based on the measured amount of misalignment. Effect of the Invention

[0007] According to one aspect of the present disclosure, it is possible to provide a substrate processing system and a teaching method for a transport device that transport a substrate taking into account positional misalignment of a mounting part. [Brief description of the drawings]

[0008] [Figure 1] 1 is a plan view showing an example of a configuration of a substrate processing system according to an embodiment; [Diagram 2] 1 is a plan view showing an example of a configuration of a substrate processing system according to an embodiment; [Diagram 3] FIG. 13 is a perspective view illustrating an example of an operation of placing a wafer on a placement portion of a processing chamber. [Figure 4] FIG. 13 is a perspective view illustrating an example of an operation of placing a wafer on a placement portion of a processing chamber. [Diagram 5] 5 is an example of a flowchart illustrating a teaching method for a transfer device in the substrate processing system according to the first embodiment. [Figure 6] 13 is an example of a flowchart illustrating a teaching method for a transfer device in a substrate processing system according to a second embodiment. [Figure 7] 13 is an example of a plan view illustrating the amount of misalignment in each mounting portion of the processing chamber. FIG. [Figure 8]13 is a plan view illustrating an example of a correction amount for each mounting portion of a load lock chamber. FIG. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0009] Hereinafter, an embodiment of the present disclosure will be described with reference to the drawings. In the drawings, the same components are denoted by the same reference numerals, and duplicated descriptions may be omitted.

[0010] <Substrate processing system> An example of the overall configuration of a substrate processing system according to an embodiment will be described with reference to Figs. 1 and 2. Figs. 1 and 2 are plan views showing an example of the configuration of a substrate processing system according to an embodiment. Fig. 1 shows an example of a state in which a wafer W has been loaded into a processing chamber PM1. Fig. 2 shows an example of a state before the wafer W is unloaded from a load lock chamber LLM. The wafer W is illustrated with dotted hatching.

[0011] 1 is a cluster structure (multi-chamber type) system. The substrate processing system includes process modules PM (Process Modules) 1-6, a vacuum transfer module VTM (Vacuum Transfer Module), a load lock module LLM (Load Lock Module), loader modules LM (Loader Modules) 1-2, load ports LP (Load Ports) 1-4, and a control unit 100.

[0012] The processing chambers PM1-6 are depressurized to a predetermined vacuum atmosphere, and perform a desired process (etching process, film formation process, cleaning process, ashing process, etc.) on a semiconductor wafer W (hereinafter also referred to as "wafer W"). The processing chambers PM1-6 are disposed adjacent to the transfer chamber VTM. The processing chambers PM1-6 and the transfer chamber VTM are communicated with each other by opening and closing gate valves GV1-6. ​​The processing chamber PM1 has mounting parts 11-14 on which a total of four wafers W are mounted in a 2×2 matrix in a plan view. Similarly, the processing chambers PM2-6 each have a mounting part on which four wafers W are mounted. The operation of each part for processing in the processing chambers PM1-6 is controlled by the control unit 100.

[0013] The transfer chamber VTM is depressurized to a predetermined vacuum atmosphere. A transfer device ARM1 for transferring a wafer W is provided inside the transfer chamber VTM. The transfer device ARM1 transfers the wafer W between the processing chambers PM1-6 and the transfer chamber VTM in response to the opening and closing of gate valves GV1-6. ​​The transfer device ARM1 transfers the wafer W between the load lock chamber LLM and the transfer chamber VTM in response to the opening and closing of gate valve GV7. The operation of the transfer device ARM1 and the opening and closing of gate valves GV1-7 are controlled by a control unit 100.

[0014] The transport device ARM1 is configured as a multi-joint arm including a base 21, a first link 22, a second link 23, and an end effector 24. One end of the first link 22 is attached to the base 21 so as to be rotatable around a rotation axis in the vertical direction. The base 21 is also configured to be able to raise and lower the first link 22 in the vertical direction. One end of the second link 23 is attached to the other end of the first link 22 so as to be rotatable around a rotation axis in the vertical direction. The base end of the end effector 24 is attached to the other end of the second link 23 so as to be rotatable around a rotation axis in the vertical direction. The tip end of the end effector 24 is provided with a plurality of holding parts for holding the wafer W. The actuators for driving the lifting and lowering of the first link 22, the joint between the base 21 and the first link 22, the joint between the first link 22 and the second link 23, and the joint between the second link 23 and the end effector 24 are controlled by the control unit 100.

[0015] The end effector 24 is formed in a fork shape with a branched tip, and has a base end 240 and two blades (fork branches) 241, 242 extending from the base end 240. The blades 241, 242 extend in the same direction from the base end 240 and are formed at the same height. The blade 241 has holders 243, 244 that hold multiple wafers W along the longitudinal direction of the blade 241. The blade 242 has holders 245, 246 that hold multiple wafers W along the longitudinal direction of the blade 242. In this way, the four wafers W held by the end effector 24 are held at the same height (on the same plane).

[0016] Further, sensors S0 to S7 for detecting the wafer W are provided inside the transfer chamber VTM. The sensor S0 detects whether or not the wafer W is held by the holders 243 to 246 when the end effector 24 of the transfer device ARM1 is located at the reference position (see FIG. 2). The sensor S1 detects whether or not the wafer W is held and the amount of eccentricity of the held wafer W when the transfer device ARM1 loads the wafer W into the processing chamber PM1 or unloads the wafer W from the processing chamber PM1. The detection method of the sensor S1 will be described later with reference to FIG. 3. Similarly, the sensors S2 to S6 detect whether or not the wafer W is held and the amount of eccentricity of the held wafer W when the transfer device ARM1 loads the wafer W into the processing chambers PM2 to 6 or unloads the wafer W from the processing chambers PM2 to 6. When the transfer device ARM1 loads or unloads the wafer W into or from the load lock chamber LLM, the sensor S7 detects whether or not the wafer W is being held and the amount of eccentricity of the held wafer W. For example, an optical passing sensor can be used as the sensors S0 to 7. The detection values ​​of the sensors S0 to 7 are input to the control unit 100.

[0017] The load lock chamber LLM is provided between the transfer chamber VTM and the loader modules LM1-2. The load lock chamber LLM can be switched between an atmospheric atmosphere and a vacuum atmosphere. The load lock chamber LLM and the transfer chamber VTM in a vacuum atmosphere are communicated by opening and closing a gate valve GV7. The load lock chamber LLM and the loader module LM1 in an atmospheric atmosphere are communicated by opening and closing a door valve GV8. The load lock chamber LLM and the loader module LM2 in an atmospheric atmosphere are communicated by opening and closing a door valve GV9. The load lock chamber LLM has placement units 31-34 on which a total of four wafers W are placed in a 2×2 matrix in plan view. The placement units 31-34 of the processing chambers PM1-6 are arranged in the same manner as the placement units 31-34 of the load lock chamber LLM. The switching between the vacuum atmosphere and the atmospheric atmosphere in the load lock chamber LLM is controlled by the control unit 100.

[0018] The loader modules LM1-2 are in an atmospheric state, and for example, a downflow of clean air is formed. A transfer device ARM2 for transferring a wafer W is provided inside the loader module LM1. The transfer device ARM2 transfers the wafer W between the load lock chamber LLM and the loader module LM1 in response to the opening and closing of a door valve GV8. Similarly, a transfer device ARM3 for transferring a wafer W is provided inside the loader module LM2. The transfer device ARM3 transfers the wafer W between the load lock chamber LLM and the loader module LM2 in response to the opening and closing of a door valve GV9. A transfer unit (not shown) for placing the wafer W is provided below the load lock chamber LLM. The transfer devices ARM2 and 3 can transfer the wafer W via the transfer unit. The operations of the transfer devices ARM2 and 3 and the opening and closing of the door valves GV8 and 9 are controlled by a control unit 100.

[0019] The transport device ARM2 is configured as a multi-joint arm including a base 41, a first link 42, a second link 43, and an end effector 44. One end of the first link 42 is attached to the base 41 so as to be rotatable around a rotation axis in the vertical direction. The base 41 is also configured to be able to raise and lower the first link 42 in the vertical direction. One end of the second link 43 is attached to the other end of the first link 42 so as to be rotatable around a rotation axis in the vertical direction. The base end of the end effector 44 is attached to the other end of the second link 43 so as to be rotatable around a rotation axis in the vertical direction. The tip end of the end effector 44 is provided with a holder 441 for holding the wafer W. The actuators for driving the lifting and lowering of the first link 42, the joint between the base 41 and the first link 42, the joint between the first link 42 and the second link 43, and the joint between the second link 43 and the end effector 44 are controlled by the control unit 100. The transport device ARM3 is configured as a multi-joint arm similar to the transport device ARM2.

[0020] Load ports LP1 and LP2 are provided on a wall surface of the loader module LM1. Load ports LP3 and LP4 are provided on a wall surface of the loader module LM2. Carriers C accommodating wafers W or empty carriers C are attached to the load ports LP1 to LP4. As the carriers C, for example, FOUPs (Front Opening Unified Pods) can be used.

[0021] The transfer device ARM2 can hold the wafer W accommodated in the load port LP1,2 with a holder 441 of the transfer device ARM2 and remove the wafer W. Also, the wafer W held in the holder 441 can be accommodated in the load port LP1,2. Similarly, the transfer device ARM3 can hold the wafer W accommodated in the load port LP3,4 with a holder of the transfer device ARM3 and remove the wafer W. Also, the transfer device ARM3 can accommodate the wafer W held in the holder in the load port LP3,4.

[0022] The control unit 100 has a central processing unit (CPU), a read only memory (ROM), a random access memory (RAM), and a hard disk drive (HDD). The control unit 100 may have other storage areas such as a solid state drive (SSD) instead of a HDD. The HDD, RAM, and other storage areas store recipes in which process procedures, process conditions, and transport conditions are set.

[0023] The CPU controls the processing of the wafer W in each processing chamber PM according to a recipe, and controls the transfer of the wafer W. The HDD and RAM may store programs for executing the processing of the wafer W in each processing chamber PM and the transfer of the wafer W. The programs may be provided by being stored in a storage medium, or may be provided from an external device via a network.

[0024] <Operation of the substrate processing system> Next, an example of the operation of the substrate processing system will be described. Here, as an example of the operation of the substrate processing system, an operation in which a wafer W accommodated in a carrier C attached to a load port LP1 is processed in a processing chamber PM1 and then accommodated in an empty carrier C attached to a load port LP3 will be described. At the start of the operation, the gate valves GV1-9 are closed, and the inside of the load lock chamber LLM is an atmospheric air.

[0025] The control unit 100 controls the transfer device ARM2 to take out the first wafer W from the carrier C of the load port LP1 and place it on a transfer unit (not shown). Also, the control unit 100 controls the transfer device ARM2 to take out the second wafer W from the carrier C of the load port LP1 and place it on a transfer unit (not shown).

[0026] The control unit 100 opens the door valves GV8 and 9. The control unit 100 controls the transfer device ARM3 to remove the first wafer W placed on the transfer unit (not shown) and place it on the placement unit 31 of the load lock chamber LLM. At the same time, the control unit 100 controls the transfer device ARM2 to remove the third wafer W from the carrier C of the load port LP1 and place it on the placement unit 33 of the load lock chamber LLM.

[0027] Furthermore, the control unit 100 controls the transfer device ARM3 to take out the second wafer W placed on the transfer unit (not shown) and place it on the placement unit 32 of the load lock chamber LLM. At the same time, the control unit 100 controls the transfer device ARM2 to take out the fourth wafer W from the carrier C of the load port LP1 and place it on the placement unit 34 of the load lock chamber LLM. Here, when placing the wafer W on the placement units 31 to 34, the control unit 100 controls the transfer devices ARM2 and 3 based on the corrected teaching positions (S104, S206) described later, and places the wafer W on the placement units 31 to 34. When the four wafers W are placed on the placement units 31 to 34 of the load lock chamber LLM and the transfer devices ARM2 and 3 are evacuated from the load lock chamber LLM, the control unit 100 closes the door valves GV8 and 9.

[0028] The control unit 100 controls an exhaust device (not shown) of the load lock chamber LLM to exhaust the air inside the chamber, and switches the load lock chamber LLM from an air atmosphere to a vacuum atmosphere.

[0029] The control unit 100 controls the transfer device ARM1 to move the end effector 24 to the reference position. The control unit 100 confirms by the sensor S0 that the wafer W is not held on the blades 241, 242. The control unit 100 opens the gate valve GV7. The control unit 100 controls the transfer device ARM1 to insert the blades 241, 242 of the end effector 24 into the load lock chamber LLM to a preset teaching position of the load lock chamber LLM, hold the wafer W placed on the placement units 31 to 34 of the load lock chamber LLM, and transfer it to the transfer chamber VTM. Here, when receiving the wafer W from the placement units 31 to 34, the control unit 100 controls the transfer device ARM1 based on the teaching positions (S101, S201) described later, and receives the wafer W from the placement units 31 to 34. The arrangement of the placement parts 31-34 in the load lock chamber LLM is the same as the arrangement of the placement parts 31-34 in the processing chamber PM1. Therefore, the arrangement of the wafer W held by the blades 241, 242 of the end effector 24 is approximately the same as the arrangement of the placement part 31 in the processing chamber PM1. When the end effector 24 is retracted from the load lock chamber LLM, the control unit 100 closes the gate valve GV7.

[0030] The control unit 100 opens the gate valve GV1. The control unit 100 controls the transfer device ARM1 to insert the blades 241, 242 of the end effector 24 into the processing chamber PM1 to a preset teaching position of the processing chamber PM1, and place the held wafer W on the placement parts 11-14 of the processing chamber PM1. When placing the wafer W on the placement parts 11-14, the control unit 100 controls the transfer device ARM1 based on the teaching positions (S102, S205) described below, and places the wafer W on the placement parts 11-14. When the end effector 24 retreats from the processing chamber PM1, the control unit 100 closes the gate valve GV1.

[0031] The control unit 100 controls the processing chamber PM1 to perform a desired processing on the wafer W.

[0032] When the processing of the wafer W is completed, the control unit 100 opens the gate valve GV1. The control unit 100 controls the transfer device ARM1 to insert the blades 241, 242 of the end effector 24 into the processing chamber PM1 to a preset teaching position of the processing chamber PM1, hold the wafer W placed on the placement units 11 to 14 of the processing chamber PM1, and transfer it to the transfer chamber VTM. When the end effector 24 retreats from the processing chamber PM1, the control unit 100 closes the gate valve GV1.

[0033] The control unit 100 opens the gate valve GV7. The control unit 100 controls the transfer device ARM1 to insert the blades 241, 242 of the end effector 24 into the load lock chamber LLM to a preset teaching position of the load lock chamber LLM, and places the held wafer W on the placement units 31 to 34 of the load lock chamber LLM. When the end effector 24 retreats from the load lock chamber LLM, the control unit 100 closes the gate valve GV7.

[0034] The control unit 100 controls an intake device (not shown) of the load lock chamber LLM to supply, for example, clean air into the chamber, and switches the atmosphere of the load lock chamber LLM from a vacuum atmosphere to an air atmosphere.

[0035] The control unit 100 opens the door valves GV8 and 9. The control unit 100 controls the transfer device ARM3 to remove the first wafer W placed on the placement unit 31 of the load lock chamber LLM and store it in the carrier C of the load port LP3. At the same time, the control unit 100 controls the transfer device ARM2 to remove the third wafer W placed on the placement unit 33 of the load lock chamber LLM and place it on a transfer unit (not shown).

[0036] Furthermore, the control unit 100 controls the transfer device ARM3 to remove the second wafer W placed on the placement unit 32 of the load lock chamber LLM and store it in the carrier C of the load port LP3. At the same time, the control unit 100 controls the transfer device ARM2 to remove the fourth wafer W placed on the placement unit 34 of the load lock chamber LLM and place it on a transfer unit (not shown). When the four wafers W have been removed from the placement units 31-34 of the load lock chamber LLM and the transfer devices ARM2 and ARM3 have retreated from the load lock chamber LLM, the control unit 100 closes the door valves GV8 and 9.

[0037] The control unit 100 controls the transfer device ARM3 to take out the third wafer W from the transfer unit (not shown) and store it in the carrier C of the load port LP3. Also, the control unit 100 controls the transfer device ARM3 to take out the fourth wafer W from the transfer unit (not shown) and store it in the carrier C of the load port LP3.

[0038] Although an example of transferring the wafer W to and from the processing chamber PM1 has been described above, the wafer W may be transferred to and from the processing chambers PM2 to 6 in a similar manner. In addition, the wafer W that has been processed in the processing chamber PM1 may be transferred to, for example, the processing chamber PM2, where the wafer W may be further processed.

[0039] <Operation of Placing Wafer W in Processing Chamber PM1> Next, an example of the operation of placing the wafer W held by the transfer device ARM1 on the placement parts 11-14 of the processing chamber PM1 will be further described with reference to Figures 3 and 4. Figures 3 and 4 are perspective views for explaining an example of the operation of placing the wafer W on the placement parts 11-14 of the processing chamber PM1. Note that in Figures 3 and 4, only the end effector 24, the placement parts 11-14, the sensor S1, and the wafer W are shown, and other components are omitted from the illustration. In addition, the direction in which the end effector 24 is inserted into the processing chamber PM1 is referred to as the forward direction, and the direction in which the end effector 24 is removed from the processing chamber PM1 is referred to as the backward direction.

[0040] As shown in FIG. 3(a), the control unit 100 controls the actuators of the joints of the transport device ARM1 to move the end effector 24 so that the placement units 31 to 34 are positioned in the extending direction of the blades 241, 242.

[0041] Here, the sensor S1 has sensor units 51 and 52. The number of sensor units is equal to the number of blades of the end effector 24. The sensor unit 51 is disposed on the path where the blade 241 enters the processing chamber PM1. The sensor unit 52 is disposed on the path where the blade 242 enters the processing chamber PM1.

[0042] The sensor unit 51 has two sensor elements 51a and 51b arranged at a distance from each other. The sensor elements 51a and 51b are, for example, optical passing sensors having a light-projecting section and a light-receiving section, and detect whether or not an object is present by irradiating light from the light-projecting section and detecting the light reflected from the object with the light-receiving section. The distance between the sensor elements 51a and 51b is wider than the width of the blade 241 and narrower than the diameter of the wafer W. Similarly, the sensor unit 52 has two sensor elements 52a and 52b.

[0043] As shown in FIG. 3B, the control unit 100 controls the actuators of the joints of the transport device ARM1 to advance the end effector 24. At this time, the blade 241 passes between the sensor elements 51a and 51b when viewed from above. When the holder 244 of the blade 241 is positioned above the sensor unit 51, the sensor elements 51a and 51b of the sensor unit 51 detect the wafer W, and the control unit 100 can determine whether or not the wafer W is present in the holder 244 based on the detection value of the sensor unit 51. Similarly, when the holder 246 is positioned above the sensor unit 52, the sensor elements 52a and 52b of the sensor unit 52 detect the wafer W, and the control unit 100 can determine whether or not the wafer W is present in the holder 246 based on the detection value of the sensor unit 52.

[0044] Further, the control unit 100 acquires the position of the end effector 24 when the sensor element 51a starts to detect the wafer W, the position of the end effector 24 when the sensor element 51a stops detecting the wafer W, the position of the end effector 24 when the sensor element 51b starts to detect the wafer W, and the position of the end effector 24 when the sensor element 51b stops detecting the wafer W. The control unit 100 can detect the position of the wafer W held by the holder 244 from the position information of these four points. This allows the control unit 100 to detect the deviation (amount of eccentricity) between the reference point of the holder 244 and the center of the wafer W held by the holder 244 based on the detection value of the sensor unit 51. Similarly, the control unit 100 can detect the deviation (amount of eccentricity) between the reference point of the holder 246 and the center of the wafer W held by the holder 246 based on the detection value of the sensor unit 52.

[0045] 3(c), the control unit 100 controls the actuators of the joints of the transfer device ARM1 to further advance the end effector 24. At this time, when the holder 243 of the blade 241 is positioned above the sensor unit 51, the sensor elements 51a and 51b of the sensor unit 51 detect the wafer W, and the control unit 100 can determine whether or not the wafer W is present in the holder 243 based on the detection value of the sensor unit 51. Similarly, when the holder 245 is positioned above the sensor unit 52, the sensor elements 52a and 52b of the sensor unit 52 detect the wafer W, and the control unit 100 can determine whether or not the wafer W is present in the holder 245 based on the detection value of the sensor unit 52.

[0046] Furthermore, based on the detection value of sensor unit 51, control unit 100 can detect the misalignment (amount of eccentricity) between the reference point of holding unit 243 and the center of wafer W held by holding unit 243. Similarly, based on the detection value of sensor unit 52, control unit 100 can detect the misalignment (amount of eccentricity) between the reference point of holding unit 245 and the center of wafer W held by holding unit 245.

[0047] 3(d), the control unit 100 controls the actuators of the joints of the transfer device ARM1 to further advance the end effector 24. Also, based on the positional deviation of the wafer W detected by the sensor S1, the control unit 100 corrects the movement trajectory of the transfer device ARM1 until the operation is completed, and transfers the wafer W after correcting the positional deviation. As a result, the wafer W held by the holders 243-246 is positioned above the placement units 11-14.

[0048] Here, the placement units 11 to 14 have lift pins 11a to 14a. The lift pins 11a and 12a are disposed at positions different from the position where the blade 241 passes when viewed from above. Also, the lift pins 13a and 14a are disposed at positions different from the position where the blade 242 passes when viewed from above. Thereby, as shown in FIG. 4(a), when the lift pins 11a to 14a are raised, the lift pins 11a to 14a do not come into contact with the blades 241 and 242, and lift the four wafers W held by the end effector 24. Here, since the heights of the blades 241 and 242 are equal, the four wafers W are held by the end effector 24 at the same height. For this reason, the lift pins 11a to 14a may be configured to be lifted simultaneously by one lifter.

[0049] Next, the control unit 100 controls the actuators of the joints of the transfer device ARM1 to move the end effector 24 backward. Here, as shown in FIG. 4(b), when the end effector 24 reaches the same position as in FIG. 3(c), it is confirmed that the sensor S1 does not detect the wafer W. That is, the control unit 100 confirms that the wafer W is not present in the holders 243 and 245 based on the detection value of the sensor S1. Note that in FIG. 4(b) and FIG. 4(c), the position where the wafer W was placed is indicated by a dashed line.

[0050] Next, the control unit 100 controls the actuators of the joints of the transfer device ARM1 to further retract the end effector 24. Here, as shown in Fig. 4(c), when the end effector 24 reaches the same position as in Fig. 3(b), it is confirmed that the sensor S1 does not detect the wafer W. That is, the control unit 100 confirms that the wafer W is not present in the holders 244, 246 based on the detection value of the sensor S1.

[0051] 4(d), the end effector 24 is retreated from the processing chamber PM1. Thereafter, the lift pins 11a to 14a are lowered to place the wafer W on the placement portions 11 to 14.

[0052] An example of transferring the wafer W to the processing chamber PM1 has been described above, but when transferring the wafer W out of the processing chamber PM1, the steps shown in Fig. 3(a) to Fig. 4(d) can be carried out in reverse, and therefore a description thereof will be omitted. The same applies when transferring the wafer W to and from the processing chambers PM2 to PM6 or the load lock chamber LLM, and therefore a description thereof will be omitted.

[0053] <Teaching method> Next, a teaching method for the transfer devices ARM1 to ARM3 will be described below. Fig. 5 is an example of a flowchart illustrating a teaching method for the transfer devices ARM1 to ARM3 in the substrate processing system according to the first embodiment.

[0054] In step S101, the control unit 100 teaches the transfer devices ARM1 to ARM3 to the load lock chamber LLM.

[0055] Here, the control unit 100 teaches the position of the end effector 44 of the transfer device ARM3 when the transfer device ARM3 delivers the wafer W to the mounting part 31 of the load lock chamber LLM or when the transfer device ARM3 receives the wafer W from the mounting part 31 of the load lock chamber LLM. For example, a wafer-shaped inspection device with a camera (not shown) is placed on the end effector 44 and transferred above the mounting part 31, and the control unit 100 teaches the position where the center of the wafer-shaped inspection device and the center of the mounting part 31 coincide with each other.

[0056] Similarly, the control unit 100 teaches the position of the end effector 44 of the transfer device ARM3 when the transfer device ARM3 delivers the wafer W to the mounting part 32 of the load lock chamber LLM or when the transfer device ARM3 receives the wafer W from the mounting part 32 of the load lock chamber LLM. Also, the control unit 100 teaches the position of the end effector 44 of the transfer device ARM2 when the transfer device ARM2 delivers the wafer W to the mounting part 33 of the load lock chamber LLM or when the transfer device ARM2 receives the wafer W from the mounting part 33 of the load lock chamber LLM. Also, the control unit 100 teaches the position of the end effector 44 of the transfer device ARM2 when the transfer device ARM2 delivers the wafer W to the mounting part 34 of the load lock chamber LLM or when the transfer device ARM2 receives the wafer W from the mounting part 34 of the load lock chamber LLM.

[0057] Furthermore, the control unit 100 teaches the position of the end effector 24 of the transfer device ARM1 when the transfer device ARM1 receives the wafer W from the placement parts 31-34 of the load lock chamber LLM or when the transfer device ARM1 delivers the wafer W to the placement parts 31-34 of the load lock chamber LLM. For example, a wafer-shaped inspection device (not shown) with a camera is placed on the holders 243-246 of the end effector 24 and transferred above the placement parts 31-34, and the control unit 100 teaches the position where the center of the wafer-shaped inspection device and the center of the placement parts 31-34 coincide with each other.

[0058] In step S102, the control unit 100 teaches the transfer device ARM1 to the processing chamber PM1.

[0059] Here, the control unit 100 teaches the position of the end effector 24 of the transfer device ARM1 when the transfer device ARM1 delivers the wafer W to the placement parts 11-14 of the processing chamber PM1 or when the transfer device ARM1 receives the wafer W from the placement parts 11-14 of the processing chamber PM1. For example, a wafer-shaped inspection device (not shown) with a camera is placed on the holders 243-246 of the end effector 24 and transferred above the placement parts 11-14, and the control unit 100 teaches the position where the center of the wafer-shaped inspection device and the center of the placement parts 11-14 coincide with each other.

[0060] In step S103, the control unit 100 measures the amount of misalignment of the wafer W in the processing chamber PM1 when the wafer W is transferred from the load lock chamber LLM to the processing chamber PM1.

[0061] Here, the positions of the mounting portions 11 to 14 have individual errors with respect to the design values, and therefore, when the wafer W is placed on the mounting portions 11 to 14, a deviation occurs between the center of each of the mounting portions 11 to 14 and the center of the placed wafer W.

[0062] The control unit 100 controls the transfer device ARM1 to receive the four wafers W from the placement units 31-34 at the teaching positions of the load lock chamber LLM set in step S101, and measures the amount of misalignment between the centers of the placement units 11-14 and the centers of the wafers W when the four wafers W are delivered to the placement units 11-14 at the teaching positions of the processing chamber PM1 set in step S102. For example, a wafer-shaped inspection device (not shown) equipped with a camera is placed on the placement units 31-34 and transferred to the placement units 11-14 by the transfer device ARM1, and the amount of misalignment between the center of the wafer-shaped inspection device and the center of the placement units 11-14 is measured.

[0063] However, the method of measuring the amount of misalignment is not limited to this. For example, the wafers W are placed on the placement parts 11-14 so that the centers of the placement parts 11-14 and the wafers W coincide with each other. Next, the wafers W are transferred from the placement parts 11-14 to the holders 243-246 of the end effector 24, and the four wafers W are passed over the sensor S1. In this way, the position of the edge of the wafer W is detected, and the center position of the wafer W is calculated, thereby measuring the amount of misalignment of each placement part 11-14.

[0064] In step S104, the control unit 100 corrects the position (teaching position) where the transfer device ARM2 or the transfer device ARM3 delivers the wafer W to the placement units 31 to 34 of the load lock chamber LLM, based on the amount of deviation measured in step S103.

[0065] That is, the position (teaching position) where the transfer device ARM3 delivers the wafer W to the mounting part 31 of the load lock chamber LLM is corrected based on the amount of misalignment in the mounting part 11. Here, the position (teaching position) where the wafer W is delivered to the mounting part 31 is corrected so as to reduce the amount of misalignment or cancel the amount of misalignment.

[0066] Similarly, the position (teaching position) where the transfer device ARM3 transfers the wafer W to the placement part 32 of the load lock chamber LLM is corrected based on the amount of misalignment at the placement part 12. Moreover, the position (teaching position) where the transfer device ARM2 transfers the wafer W to the placement part 33 of the load lock chamber LLM is corrected based on the amount of misalignment at the placement part 13. Moreover, the position (teaching position) where the transfer device ARM2 transfers the wafer W to the placement part 34 of the load lock chamber LLM is corrected based on the amount of misalignment at the placement part 14.

[0067] As a result, when the transfer devices ARM2, 3 transfer the wafers W from the carrier C to the processing chamber PM1, the wafers W are placed on the placement parts 31-34 taking into consideration the error from the design values ​​of the placement parts 11-14 of the processing chamber PM1. Then, the four wafers W placed on the placement parts 31-34 are transferred to the placement parts 11-14. As a result, the error between the centers of the placement parts 11-14 and the centers of the placed wafers W can be reduced.

[0068] The control unit 100 also stores the correction values ​​corresponding to the processing chambers PM1 to PM6. The control unit 100 then controls the transfer devices ARM2, 3 to place the wafer W on the placement parts 31 to 34 at positions corrected using the correction values ​​corresponding to the destination processing chambers PM1 to PM6. This allows the wafer W to be placed according to the amount of misalignment of the placement parts 11 to 14 for each of the processing chambers PM1 to PM6.

[0069] Next, another teaching method for the transfer devices ARM1 to ARM3 will be described. Fig. 6 is an example of a flowchart for explaining the teaching method for the transfer devices ARM1 to ARM3 in the substrate processing system according to the second embodiment.

[0070] In step S201, the control unit 100 teaches the transfer devices ARM1 to ARM3 to the load lock chamber LLM.

[0071] In step S202, the control unit 100 teaches the transfer device ARM1 to the processing chamber PM1.

[0072] In step S203, the control unit 100 measures the amount of misalignment of the wafer W in the processing chamber PM1 when the wafer W is transferred from the load lock chamber LLM to the processing chamber PM1.

[0073] The processes from step S201 to step S203 are similar to the processes from step S101 to step S103, and therefore a duplicated description will be omitted.

[0074] In step S204, the control unit 100 separates the misalignment components into a common misalignment component and an individual misalignment component for the four wafers W placed on the placement units 11 to 14 based on the misalignment amount measured in step S103.

[0075] Here, the amount of misalignment on each of the mounting portions 11 to 14 will be described with reference to Fig. 7. Fig. 7 is an example of a plan view illustrating the amount of misalignment on each of the mounting portions 11 to 14 of the processing chamber PM1.

[0076] The actual amount of misalignment 101 on placement unit 11 measured in step S203 is indicated by a solid arrow. Similarly, the actual amount of misalignment 102 on placement unit 12 is indicated by a solid arrow. Moreover, the actual amount of misalignment 103 on placement unit 13 is indicated by a solid arrow. Moreover, the actual amount of misalignment 104 on placement unit 14 is indicated by a solid arrow.

[0077] Here, the control unit 100 calculates the misalignment component 200 common to the misalignment amounts 101 to 104 and the individual misalignment components 301 to 304 based on the misalignment amounts 101 to 104 measured in step S203. Here, the sum of the common misalignment component 200 and the individual misalignment component 301 becomes the misalignment amount 101. The sum of the common misalignment component 200 and the individual misalignment component 302 becomes the misalignment amount 102. The sum of the common misalignment component 200 and the individual misalignment component 303 becomes the misalignment amount 103. The sum of the common misalignment component 200 and the individual misalignment component 304 becomes the misalignment amount 104. The common misalignment component 200 is indicated by a dashed-dotted arrow. The individual misalignment components 301 to 304 are indicated by dashed lines.

[0078] For example, the control unit 100 calculates the common deviation component 200 so as to reduce the maximum one of the individual deviation components 301 to 304. That is, the control unit 100 calculates the common deviation component 200 so as to reduce the amount of correction in step S206 described later.

[0079] It should be noted that the method of calculating the common deviation component 200 and the individual deviation components 301 to 304 is not limited to this.

[0080] Returning to FIG. 6, in step S205, the control unit 100 corrects the position (teaching position) at which the transfer device ARM1 delivers the wafer W to the placement units 11 to 14 of the processing chamber 1, based on the common deviation component 200 calculated in step S204.

[0081] That is, the position (teaching position) where the transfer device ARM1 delivers the wafer W to the mounting parts 11-14 of the processing chamber PM1 is corrected based on the common deviation component 200. Here, the delivery position (teaching position) is corrected so as to cancel out the common deviation component 200.

[0082] In step S206, the control unit 100 corrects the positions (teaching positions) at which the transfer device ARM2 or the transfer device ARM3 delivers the wafer W to the placement units 31-34 of the load lock chamber LLM, based on the individual deviation components 301-304 calculated in step S204.

[0083] That is, the position (teaching position) where the transfer device ARM3 delivers the wafer W to the mounting part 31 of the load lock chamber LLM is corrected based on the individual deviation components 301 in the mounting part 11. Here, the position (teaching position) where the wafer W is delivered to the mounting part 31 is corrected so as to cancel out the individual deviation components 301.

[0084] Similarly, the position (teaching position) where the transfer device ARM3 delivers the wafer W to the placement part 32 of the load lock chamber LLM is corrected based on the individual deviation component 302 in the placement part 12. Moreover, the position (teaching position) where the transfer device ARM2 delivers the wafer W to the placement part 33 of the load lock chamber LLM is corrected based on the individual deviation component 303 in the placement part 13. Moreover, the position (teaching position) where the transfer device ARM2 delivers the wafer W to the placement part 34 of the load lock chamber LLM is corrected based on the individual deviation component 304 in the placement part 14.

[0085] Fig. 8 is an example of a plan view illustrating the correction amount in each of the mounting parts 31 to 34 of the load lock chamber LLM. The correction amount 401 in the mounting part 31 is set so as to cancel the individual deviation component 301 shown in Fig. 7. For example, the correction amount 401 is opposite to and has the same absolute value as the individual deviation component 301.

[0086] Similarly, the correction amount 402 in the mounting unit 32 is set so as to cancel out the individual misalignment component 302 shown in Fig. 7. Moreover, the correction amount 403 in the mounting unit 33 is set so as to cancel out the individual misalignment component 303 shown in Fig. 7. Moreover, the correction amount 404 in the mounting unit 34 is set so as to cancel out the individual misalignment component 304 shown in Fig. 7.

[0087] As a result, when the transfer devices ARM2, 3 transfer the wafers W from the carrier C to the processing chamber PM1, the wafers W are placed on the placement parts 31-34 taking into consideration the individual misalignment components 301-304 on the placement parts 11-14 of the processing chamber PM1. Then, when the transfer device ARM1 transfers the four wafers W placed on the placement parts 31-34 to the placement parts 11-14, the wafers W are placed on the placement parts 11-14 taking into consideration the common misalignment component 200. This makes it possible to reduce the error between the centers of the placement parts 11-14 and the centers of the placed wafers W.

[0088] The control unit 100 also stores the correction values ​​corresponding to the processing chambers PM1 to PM6. The control unit 100 then controls the transfer devices ARM2, 3 to place the wafer W on the placement parts 31 to 34 at positions corrected using the correction values ​​corresponding to the destination processing chambers PM1 to PM6. This allows the wafer W to be placed according to the amount of misalignment of the placement parts 11 to 14 for each of the processing chambers PM1 to PM6.

[0089] Furthermore, according to the teaching method for the transport devices ARM1 to ARM3 in the substrate processing system according to the second embodiment, the deviation can be divided into a common deviation amount handled by the transport device ARM1 and an individual deviation amount handled by the transport devices ARM2 and 3. As a result, even for deviation amounts larger than the correctable range of the transport devices ARM1 to ARM3, the correctable range can be expanded by dividing the deviation amount into a common deviation amount handled by the transport device ARM1 and an individual deviation amount handled by the transport devices ARM2 and 3. Furthermore, since the correction amount of each of the transport devices ARM1 to ARM3 can be reduced, high correction accuracy can be maintained.

[0090] The substrate processing system has been described above, but the present disclosure is not limited to the above-described embodiments, and various modifications and improvements are possible within the scope of the gist of the present disclosure described in the claims. [Explanation of symbols]

[0091] PM1~6 treatment room VTM Transport Room LLM Load Lock Chamber LM1~2 Loader Module LP1~4 Loading port W wafer GV1~9 Gate valves S0 Sensor S1~S7 Sensors ARM1 Transport device (First transport device) ARM2,3 conveyor (second conveyor) 11~14 Placement section 24 End effector 240 Proximal end 241,242 Blades 243~246 Holding part 31~34 Placement section 51,52 Sensor unit 51a, 51b, 52a, 52b Sensor elements 100 Control section

Claims

1. a load lock chamber having a plurality of mounting portions; a processing chamber having a plurality of mounting portions; a vacuum transfer chamber connecting the load lock chamber and the processing chamber; a first transfer device provided in the vacuum transfer chamber and configured to transfer a plurality of substrates from a placement portion of the load lock chamber to a placement portion of the processing chamber; a second transfer device that transfers the substrate to the placement portion of the load lock chamber; A control unit, The control unit is teaching a position at which the first transfer device receives the substrate relative to the load lock chamber; teaching a position at which the first transfer device transfers the substrate to the processing chamber; measuring an amount of misalignment between a mounting portion of the processing chamber and the substrate to be mounted; and correcting a position at which the second transfer device transfers the substrate to a placement part of the load lock chamber based on the measured amount of deviation. Substrate processing system.

2. a load lock chamber having a plurality of mounting portions; a processing chamber having a plurality of mounting portions; a vacuum transfer chamber connecting the load lock chamber and the processing chamber; a first transfer device provided in the vacuum transfer chamber and configured to transfer a plurality of substrates from a placement portion of the load lock chamber to a placement portion of the processing chamber; a second transfer device that transfers the substrate to the placement portion of the load lock chamber; A control unit, The control unit is teaching a position at which the first transfer device receives the substrate relative to the load lock chamber; teaching a position at which the first transfer device transfers the substrate to the processing chamber; measuring an amount of misalignment between a mounting portion of the processing chamber and the substrate to be mounted; calculating a common deviation component and an individual deviation component for the plurality of mounting portions of the processing chamber based on the measured deviation amounts; correcting a position at which the first transfer device transfers the substrate with respect to the processing chamber based on the calculated common deviation component; and correcting a position at which the second transport device delivers the substrate to a mounting part of the load lock chamber based on the calculated individual deviation components. Substrate processing system.

3. 1. A method for teaching a transfer device in a substrate processing system, the method comprising: a load lock chamber having a plurality of mounting portions; a processing chamber having a plurality of mounting portions; a vacuum transfer chamber connecting the load lock chamber and the processing chamber; a first transfer device provided in the vacuum transfer chamber and configured to transfer a plurality of substrates from the mounting portions of the load lock chamber to the mounting portions of the processing chamber; a second transfer device configured to transfer substrates to the mounting portions of the load lock chamber; and a control unit, the method comprising: teaching a position at which the first transfer device receives the substrate relative to the load lock chamber; teaching a position at which the first transfer device transfers the substrate to the processing chamber; measuring an amount of misalignment between a mounting portion of the processing chamber and the substrate to be mounted; and correcting a position at which the second transport device transfers the substrate to a mounting part of the load lock chamber based on the measured amount of deviation. A teaching method for a transport device.

4. The step of correcting a position at which the second transfer device delivers the substrate to a mounting part of the load lock chamber includes: correcting the misalignment based on the amount of misalignment of a mounting part of the processing chamber corresponding to the mounting part of the load lock chamber; 4. The teaching method for a conveying device according to claim 3.

5. correcting a position at which the first transfer device transfers the substrate relative to the processing chamber; The step of correcting a position at which the first transfer device transfers the substrate with respect to the processing chamber includes: Correcting the measured deviation amounts based on a deviation component common to the measured deviation amounts; The step of correcting a position at which the second transfer device delivers the substrate to a mounting part of the load lock chamber includes: correcting the misalignment based on an individual amount of misalignment of a mounting part of the processing chamber corresponding to the mounting part of the load lock chamber; 4. The teaching method for a conveying device according to claim 3.

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