Polarizer nanoimprint lithography

Abstract

To provide a polarizer which has high contrast and high percent transmission of one polarization, can endure high temperature, and is resistant to physical damage.SOLUTION: A method of making a polarizer can comprise: applying an uncured thin film onto a substrate, where the uncured thin film is a liquid with solid inorganic nanoparticles dispersed throughout a continuous phase; curing the uncured thin film into a cured thin film, where the cured thin film includes a solid interconnecting network of the solid inorganic nanoparticles; applying a reflective thin film onto the substrate; and etching the cured thin film and the reflective thin film to form polarization structures.SELECTED DRAWING: Figure 1

Description

[Technical field]

[0001] This application relates generally to polarizers. [Background technology]

[0002] A polarizer can split light into two different polarization states. One polarization state can pass through the polarizer and the other can be absorbed or reflected. The effectiveness or performance of a polarizer is based on a very high percent transmission of one polarization (e.g., Tp) and a minimum transmission of the opposite polarization (e.g., Ts). It can also be beneficial to have a high contrast (e.g., Tp / Ts). The contrast can be improved by increasing the transmission of the primarily transmitted polarization (e.g., increasing Tp) and by decreasing the transmission of the opposite polarization (e.g., decreasing Ts).

[0003] Polarizers may be used in high temperature applications, such as projectors. As projectors decrease in size and increase in brightness due to user demand, the need for polarizers that can withstand high temperature environments also increases. Selective absorptive polarizers absorb most of the incident light and are therefore susceptible to damage, especially in high light intensity projectors. Such polarizers generally have a wire that includes a reflective portion (e.g., aluminum) and an absorbing portion (e.g., silicon). The absorbing portion can absorb about 80% of one polarization of light, and thus about 40% of the total amount of light. Much of the heat of this absorbed light is transferred to the reflective portion of the wire, which can melt, thus destroying the polarizer. Therefore, it may be considered to improve the high temperature durability of selective absorptive polarizers.

[0004] The ribs or wires of the polarizer can have small and delicate ribs with nanometer-sized pitch, wire width, and wire height, especially for the polarization of visible or ultraviolet light. Polarizers are used in systems that require high performance (e.g., projectors, semiconductor inspection tools, etc.). Small defects in the polarizer, such as broken ribs, can significantly reduce system performance (e.g., distorting the image from the projector). Therefore, it can be considered to protect the ribs from physical damage, such as from contact, and to avoid the ribs melting due to excessive heat.

[0005] Manufacturing the polarizer can be difficult and expensive due to the small size of the ribs. Some materials are more difficult to pattern and etch than others for polarizers. Manufacturability and reduced manufacturing costs may be considered.

[0006] The optical properties can be improved by reducing the surface roughness of the thin film surfaces of the polarizer. Reducing such surface roughness can be a consideration in the manufacture of polarizers. Summary of the Invention

[0007] It has been recognized that it would be advantageous to provide a polarizer that has high contrast (e.g., Tp / Ts), has a high percent transmission of one polarization, can withstand high temperatures, and is resistant to physical damage. It has also been recognized that it would be advantageous to improve the manufacturability and reduce the manufacturing costs of such polarizers. It has also been recognized that reducing the surface roughness of the thin film surfaces of the polarizers can be helpful. The present invention relates to various methods of making polarizers that meet these needs. Each embodiment may meet one, some, or all of these needs.

[0008] The method may comprise: (i) applying an uncured imprintable layer on a substrate; (ii) imprinting a pattern of polarizing structures into the uncured imprintable layer, some longitudinal dimensions of the polarizing structures extending in a first direction and other longitudinal dimensions of the polarizing structures extending in a second direction, the first direction and the second direction being parallel to a first side of the substrate, and the first direction being different from the second direction; and (iii) curing the uncured imprintable layer into a solid cured imprint layer.

[0009] In one embodiment, the uncured imprintable layer can be a liquid having solid inorganic nanoparticles dispersed throughout a continuous phase, and the cured print layer can include a solid interconnected network of inorganic nanoparticles. In another embodiment, the uncured imprintable layer can be a colloidal suspension including a dispersed phase and a continuous phase, and curing the uncured imprintable layer can include removing the continuous phase to form a solid cured print layer. In another embodiment, the uncured imprintable layer can be a solution including molecules in a solvent, the solvent including water and an organic liquid, the molecules including metal atoms bonded to reactive groups, each reactive group being independently selected from -Cl, -OR 2 , -OCOR 2 , or -N(R 2 ) 2 Including R 2 is an alkyl group, and curing can include reacting the molecules with one another to form a solid body of metal atoms interconnected to define the cured print layer. [Brief description of the drawings]

[0010] (Drawings may not be drawn to scale.)

[0011] [Figure 1] 10, step 10 in a method of making a polarizer, includes a schematic cross-sectional side view of a polarizing device 15 on a substrate 11 and an overcoat layer 14 on a surface 15s of polarizing device 15 furthest from substrate 11, in accordance with one embodiment of the present invention.

[0012] [Diagram 2] FIG. 1 is a schematic perspective view of a polarizer 20 having a polarizing structure 12, which can be an array of wires on a substrate 11, according to one embodiment of the present invention.

[0013] [Diagram 3] 1 is step 30 in a method of making a polarizer that can follow step 10 and includes a schematic cross-sectional side view of an uncured cover layer 34 on a surface 14s of the overcoat layer 14 farthest from the polarizing device 15, in accordance with one embodiment of the present invention.

[0014] [Figure 4] 3A is a step 40 in a method of making a polarizer, which may follow step 30, and includes a schematic cross-sectional side view of an uncured cover layer 34 being formed into a cured cover layer 44, in accordance with one embodiment of the present invention.

[0015] [Diagram 5] 5A is a step 50 in a method of making a polarizer that can follow step 30 and includes a schematic cross-sectional side view of a second substrate 11b on an uncured cover layer 34, according to one embodiment of the present invention.

[0016] [Figure 6] 5 is a step 60 in a method of making a polarizer, which may follow step 50, and includes a schematic cross-sectional side view of an uncured cover layer 34 being formed onto a cured cover layer 44, in accordance with one embodiment of the present invention.

[0017] [Figure 7] 10A-10D are steps 70 and 80 in a method of making a polarizer, which may follow step 30, and include schematic cross-sectional side views of imprinting a pattern of structures 84 into uncured cover layer 34, in accordance with one embodiment of the present invention. [Figure 8] 10A-10D are steps 70 and 80 in a method of making a polarizer, which may follow step 30, and include schematic cross-sectional side views of imprinting a pattern of structures 84 into uncured cover layer 34, in accordance with one embodiment of the present invention.

[0018] [Figure 9] 9 is a step 90 in a method of making a polarizer that may follow step 80 and includes a schematic cross-sectional side view of an uncured cover layer 34 being formed onto a cured cover layer 44, in accordance with one embodiment of the present invention.

[0019] [Figure 10a] 1 illustrates a step 100a in a method of making a polarizer, including a schematic cross-sectional side view of a polarizing structure 12 on a substrate 11, according to one embodiment of the present invention.

[0020] [Figure 10b] FIG. 1 is a schematic perspective view of a polarizer 100b including a schematic cross-sectional side view of a polarizing structure 12 on a substrate 11 according to one embodiment of the present invention, showing that the polarizing structure 12 can include an array of wires, each of which includes a reflective wire 102 and an absorbing rib 101.

[0021] [Figure 11a] Step 110 in a method of making a polarizer, which may follow step 100a, includes a schematic cross-sectional side view of an uncured filler layer 134 on top of the polarizing structures 12 and extending into the channels 13 between the polarizing structures 12, according to one embodiment of the present invention.

[0022] [Figure 11b] Step 110 in a method of making a polarizer, which may follow step 100a, includes a schematic cross-sectional side view of an uncured filler layer 134 in the channels 13 between the polarizing structures 12 but not on top of the polarizing structures 12, in accordance with one embodiment of the present invention.

[0023] [Figure 12a] 120a in a method of making a polarizer, which may follow step 110a, includes a schematic cross-sectional side view of an uncured filler layer 134 being formed into a cured filler layer 144, in accordance with one embodiment of the present invention.

[0024] [Figure 12b] 12b in a method of making a polarizer, which may follow step 110b, includes a schematic cross-sectional side view of uncured filler layer 134 being formed into cured filler layer 144, in accordance with one embodiment of the present invention.

[0025] [Figure 13] 10A-10C are schematic cross-sectional side views of steps 130 and 140 in a method of making a polarizer, which may follow step 110a, of imprinting a pattern of structure 84 in uncured fill layer 134, according to one embodiment of the present invention. [Figure 14] 10A-10C are schematic cross-sectional side views of steps 130 and 140 in a method of making a polarizer, which may follow step 110a, of imprinting a pattern of structure 84 in uncured fill layer 134, according to one embodiment of the present invention.

[0026] [Figure 15] 10 is a step 150 in a method of making a polarizer, which may follow step 140, and includes a schematic cross-sectional side view of uncured filler layer 134 being formed on cured filler layer 144, in accordance with one embodiment of the present invention.

[0027] [Figure 16] 10A is a step 160 in a method of making a polarizer that may follow step 110a and includes a schematic cross-sectional side view of a second substrate 11b on an uncured fill layer 134, according to one embodiment of the present invention.

[0028] [Figure 17] 170 in a method of making a polarizer, which may follow step 160, and includes a schematic cross-sectional side view of uncured filler layer 134 being formed on cured filler layer 144, in accordance with one embodiment of the present invention.

[0029] [Figure 18]1A-1C are schematic cross-sectional side views of steps 180 and 190 in a method of making a polarizer, including an uncured imprintable layer 184 on a substrate 11 and imprinting a pattern of a polarizing structure 12 into the uncured imprintable layer 184, in accordance with one embodiment of the present invention. [Figure 19] 1A-1C are schematic cross-sectional side views of steps 180 and 190 in a method of making a polarizer, including an uncured imprintable layer 184 on a substrate 11 and imprinting a pattern of a polarizing structure 12 into the uncured imprintable layer 184, in accordance with one embodiment of the present invention.

[0030] [Figure 20] 2 is a step 200 in a method of making a polarizer, which may follow step 190, and includes a schematic cross-sectional side view of an uncured imprintable layer 184 being formed on a cured imprintable layer 204, in accordance with one embodiment of the present invention.

[0031] [Figure 21] FIG. 21 is a schematic top view of the polarizer of FIG. 19 or FIG. 20 in accordance with one embodiment of the present invention.

[0032] [Figure 22] 2A and 2B show steps 220 and 230 in a method for making a polarizer, according to one embodiment of the present invention, and a schematic cross-sectional side view of a polarizing device 15 disposed on a first side 11f of a substrate 11, an uncured backside layer 234 on an opposing second side 11s of the substrate 11, and imprinting a pattern of structure 84 into the uncured backside layer 234. [Figure 23] 2A and 2B show steps 220 and 230 in a method for making a polarizer, according to one embodiment of the present invention, and a schematic cross-sectional side view of a polarizing device 15 disposed on a first side 11f of a substrate 11, an uncured backside layer 234 on an opposing second side 11s of the substrate 11, and imprinting a pattern of structure 84 into the uncured backside layer 234.

[0033] [Figure 24]2 is a step 240 in a method of making a polarizer, which may follow step 230, and includes a schematic cross-sectional side view showing uncured backside layer 234 being formed into cured backside layer 244, in accordance with one embodiment of the present invention.

[0034] [Diagram 25] 2A includes a schematic cross-sectional side view of a step 250 in a method of making a polarizer, illustrating the application of an uncured bottom film 251L onto a substrate 11, in accordance with one embodiment of the present invention.

[0035] [Figure 26] 2 is a schematic cross-sectional side view of step 260 in a method of making a polarizer, which may follow step 250, illustrating curing an uncured bottom film 251L into a cured bottom film 261L, in accordance with one embodiment of the present invention.

[0036] [Figure 27] 2 includes a schematic cross-sectional side view of step 270 in a method of making a polarizer, which may follow step 260, showing the application of a reflective thin film 272 over the undercured thin film 261L, in accordance with one embodiment of the present invention.

[0037] [Figure 28a] 2 includes a schematic cross-sectional side view of step 280a in a method of making a polarizer, which may follow step 270, showing etching a reflective thin film 272 to form a polarizing structure 12, in accordance with one embodiment of the present invention.

[0038] [Figure 28b] 2B, which includes a schematic cross-sectional side view of step 280b in a method of making a polarizer that may follow step 270, showing etching of reflective thin film 272 and cured thin film 261L to form polarizing structure 12, in accordance with one embodiment of the present invention.

[0039] [Figure 29]2 includes a schematic cross-sectional side view of step 290 in a method of making a polarizer, which may follow step 270, showing the application of an uncured top thin film 251U over a reflective thin film 272, in accordance with one embodiment of the present invention.

[0040] [Diagram 30] 3A is a step 300 in a method of making a polarizer, which may follow step 290, and includes a schematic cross-sectional side view illustrating curing an uncured top film 251U into a cured top film 261U, in accordance with one embodiment of the present invention.

[0041] [Diagram 31] 3 includes a schematic cross-sectional side view of step 310 in a method of making a polarizer, which may follow step 300, showing etching the cured thin film 261U and the reflective thin film 272 to form the polarizing structure 12, in accordance with one embodiment of the present invention.

[0042] [Diagram 32] 3A includes a schematic cross-sectional side view of step 320 in a method of making a polarizer, which may follow step 300, showing etching the cured upper thin film 261U, the reflective thin film 272, and the cured lower thin film 261L to form a polarizing structure 12, in accordance with one embodiment of the present invention.

[0043] [Diagram 33] 3A includes a schematic cross-sectional side view of step 330 in a method of making a polarizer, showing application of a reflective thin film 272 onto a substrate 11 and application of an uncured bottom thin film 251L onto the reflective thin film 272, in accordance with one embodiment of the present invention.

[0044] [Diagram 34] 3A includes a schematic cross-sectional side view of step 340 in a method of making a polarizer, which may follow step 330, illustrating curing uncured top film 251U into cured top film 261U, in accordance with one embodiment of the present invention.

[0045] [Diagram 35]3A includes a schematic cross-sectional side view of step 350 in a method of making a polarizer, which may follow step 340, showing etching the cured thin film 261U and the reflective thin film 272 to form the polarizing structure 12, in accordance with one embodiment of the present invention.

[0046] [Diagram 36] 3A illustrates a step 360 in a method of making a polarizer, which involves imprinting isolated pixels according to one embodiment of the present invention.

[0047] [Figure 37] Step 370 in a method of making a polarizer includes sputter depositing a thin film 375 onto an uncured layer 374, according to one embodiment of the present invention.

[0048] [Figure 38] A step 380 in a method of making a polarizer includes sputter depositing a thin film 375 onto a hardened fill layer 384, according to one embodiment of the present invention.

[0049] DEFINITIONS As used herein, the term "contrast" refers to the fraction of transmission of a WGP of the predominantly transmitted polarization (e.g., Tp) divided by the fraction of transmission of the WGP of the opposite polarization (e.g., Ts). For example, contrast is Tp / Ts.

[0050] As used herein, the term “longitudinal dimension” refers to the length of the first side 11 of the substrate 11. f By "polarizing beam," we mean the longest dimension of the polarizing structure 12 that is parallel to the axis of polarization.

[0051] As used herein, the term "metal atoms" includes both true metals and metalloids such as silicon and germanium. As used herein, the term "nanometer-sized" means dimensions of 1000 nm or less.

[0052] As used herein, the term "nanoparticles" refers to particles having a width or diameter of 1000 nm or less. If expressly stated in the claims, the nanoparticles can have a width or diameter of 500 nm or less, 100 nm or less, 50 nm or less, or 10 nm or less. If expressly stated in the claims, the aforementioned width or diameter can be the maximum width or diameter of all nanoparticles. If expressly stated in the claims, the nanoparticles can also have a width or diameter of 0.1 nm or more, 1 nm or more, or 5 nm or more. If expressly stated in the claims, the aforementioned width or diameter can be the minimum width or diameter of all nanoparticles.

[0053] As used herein, the term "nm" means nanometer(s) and the term "mm" means millimeter(s).

[0054] As used herein, the terms "on," "located on," "located at," and "located over" mean located directly on or over some other solid material. The terms "located directly on," "adjoin," "adjoins," and "adjoining" mean that there is no direct and immediate contact between other solid materials.

[0055] As used herein, the term "perpendicular" means exactly perpendicular or within 20 degrees of exactly perpendicular.

[0056] As used herein, the term "pixels" refers to different regions of an optical device that intentionally have different optical characteristics.

[0057] As used herein, the term "parallel" means exactly parallel, parallel within standard manufacturing tolerances, or nearly parallel, whereby any deviation from exactly parallel will have a negligible effect on the normal use of the device.

[0058] As used herein, the term "rpm" means revolutions per minute.

[0059] Materials used in optical constructions can absorb some light, reflect some light, and transmit some light. The following definitions distinguish between materials that are primarily absorptive, primarily reflective, or primarily transmissive. Each material can be considered to be absorptive, reflective, or transmissive in a particular wavelength range (e.g., ultraviolet, visible, or infrared spectrum) and can have different properties in different wavelength ranges. Thus, whether a material is absorptive, reflective, or transmissive depends on the wavelength range it is intended to be used with. Materials are classified as absorptive, reflective, and transmissive based on the reflectance R, the real part of the refractive index n, and the imaginary part of the refractive index / extinction coefficient k. Equation 1 is used to determine the reflectance R of an interface between air and a uniform slab of material at normal incidence.

number

[0060] Unless otherwise expressly specified in this specification, a material with k≦0.1 within a particular wavelength range is a “transparent” material, a material with k>0.1 and R≦0.6 within a particular wavelength range is an “absorptive” material, and a material with k>0.1 and R>0.6 within a particular wavelength range is a “reflective” material. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0061] First Method - Cover Layer 34 / 44 on Overcoat Layer 14 As illustrated in Figures 1-9, the first method of making a polarizer can include some or all of the following steps, which can be performed in the following order: There may also be additional steps not described below. These additional steps may be before, between, or after those described.

[0062] As illustrated in Figure 1, one step 10 in the first method can include providing a polarizing device 15 on a substrate 11. The substrate 11 can be transparent. The polarizing device 15 can include objects or materials arranged in a pattern relative to the polarization of light. For example, the polarizing device 15 can be an array of parallel wires such as the polarizing structure 12 shown in Figure 2, where the polarizing structure 12 extends in different directions as shown in Figures 19-21, or a film polarizer.

[0063] The overcoat layer 14 is disposed on the surface 15 of the polarizing device 15 furthest from the substrate 11. s The overcoat layer 14 can be applied or disposed over the polarizing device 15. The overcoat layer 14 can be a single layer of a single material or can be multiple layers of different materials. The overcoat layer 14 can be applied by sputtering, atomic layer deposition or other methods onto the polarizing device 15. The overcoat layer 14 can be applied as described in patent publication US 2010 / 0103517.

[0064] If the polarizing device 15 includes an array of wires with channels 13 between adjacent wires, the overcoat layer 14 can extend into and fill the channels 13. Alternatively, the channels 13 can be free of the overcoat layer 14. The channels 13 can be partially filled with the overcoat layer 14, such as, for example, 10% or more filled, 25% or more filled, or 40% or more filled and 60% or less filled, 80% or less filled, or 90% or less filled.

[0065] 2 illustrates a schematic perspective view of a polarizer 20 having elongated wires on a substrate 11 in accordance with one embodiment of the present invention. The polarizing structures 12 of the various embodiments described herein can be elongated as well. As used herein, the term "elongated" refers to the length L of the wires. 12 is the wire width W 12 or wire thickness Th 12 means substantially greater than (e.g., L 12 is the wire width W 12 and / or wire thickness Th 12 (It can be 10 times, 100 times, 1000 times, or 10,000 times larger than L.) For example, L 12 can be 1 mm or more or 10 mm or more, and W 12 can be 200 nm or less or 100 nm or less, and Th 12 can be 500 nm or less or 1000 nm or less.

[0066] As illustrated in FIG. 3, another step 30 in the first method is to apply an uncured cover layer 34 to the outer surface 14 of the overcoat layer 14 furthest from the polarizing device 15. s Step 30 may follow step 10.

[0067] As illustrated in FIG. 5, the substrate 11 is a first substrate 11 a The first method further includes applying a second substrate 11 onto the uncured cover layer 34. b Step 50 may follow step 30.

[0068] As illustrated in Figures 7-8, other steps 70 and 80 in the first method can include imprinting a pattern of structures 84 into the uncured cover layer 34. A stamp 55 can imprint the structures 84 into the uncured cover layer 34. The structures 84 can be sized and shaped to reduce reflection of incident light, increase heat conduction away from the polarizer, or both. For example, the structures 84 can be shaped like ribs or pillars to increase surface area for heat conduction, reduce reflection, or both. Steps 70 and 80 can follow step 30.

[0069] As illustrated in Figures 4, 6, and 9, each of steps 40, 60, and 90 in the first method can include curing (i.e., chemically reacting therein) the uncured cover layer 34 to form the cured cover layer 44. The properties of the uncured cover layer 34, the properties of the cured cover layer 44, and the curing are described in the "Additional Features Applicable to All Methods" section below. Step 40 can follow step 30, step 60 can follow step 50, and step 90 can follow step 80.

[0070] When the polarizing device 15 includes channels 13 between adjacent polarizing structures 12, it can be difficult to manufacture an overcoat layer 14 with sufficient integrity to keep the uncured cover layer 34, and therefore also the cured cover layer 44, out of the channels 13. If the uncured cover layer 34 enters only some of the channels 13, tension forces in the uncured cover layer 34, the cured cover layer 44, or both, can cause the polarizing structures 12 to collapse, thus damaging the polarized light. Also, the polarized light will not be uniform across the polarizer if the cured cover layer 44 is in only some of the channels 13.

[0071] One method of retaining the uncured cover layer 34 outside the channel 13 is to remove all or at least the outer surface 14 of the overcoat layer 14. sThe objective of the present invention is to select a compound for the uncured cover layer 34 that is repellent with respect to the compounds of the overcoat layer 14 or the outer surface 14 of the overcoat layer 14. s The material of the uncured cover layer 34 may have a relatively low surface energy, and the solvent of the uncured cover layer 34 may have a relatively high surface tension. s For example, if the uncured cover layer 34 contains water as a solvent, then the surface energy of the outer surface 14 of the overcoat layer 14 may be greater than that of the outer surface 14 of the overcoat layer 14. s Another method for keeping the uncured cover layer 34 outside the channel 13 is to use larger nanoparticles.

[0072] Uncured cover layer 34 and outer surface 14 s Appropriate selection of the compound and the size of the large nanoparticles can result in channels 13 between adjacent polarizing structures 12 that are free of uncured cover layers 34 and free of cured cover layers 44, or that are substantially free of uncured cover layers 34 and cured cover layers 44. For example, 98% or more, 99% or more, or 99.9% or more of the total volume of the channels 13 can be free of uncured cover layers 34 and cured cover layers 44.

[0073] Polarizers made by the first method can have some or all of the following properties: high contrast (e.g., Tp / Ts), ability to withstand high temperatures, resistance to physical damage, and relative ease of manufacture.

[0074] Second Method - Filling Layer 134 / 144 in Channel 13 As illustrated in Figures 10a-17, the second method of making a polarizer can comprise some or all of the following steps, which can be performed in the following order: There can also be additional steps that are not described below. These additional steps can be before, between, or after those described.

[0075] As illustrated in FIG. 10a, one step 10 in the second method can be to provide a polarizer. The polarizer can include a polarizing structure 12 on a substrate 11. The substrate 11 can be transmissive. The polarizing structure 12 can be arranged in a pattern for polarizing light. For example, the polarizing structure 12 can be an array of parallel elongated wires with channels 13 between adjacent wires. Alternatively, the polarizing structure 12 can extend in different directions, as described below and shown in FIGS. 19-21. The polarizing structure 12 can be arranged at a proximal end 12 close to the substrate 11, and at a lateral end 13 close to the substrate 11. p and a distal end 12 further from the substrate 11 d The polarizing structure 12 can include a material for polarizing light.

[0076] As illustrated in FIG. 10b, a polarizer 100b is shown with a polarizing structure 12 comprising an array of wires. Each wire includes a reflective wire 102 and an absorbing rib 101. On the polarizer 100b, the reflective wires 102 are sandwiched between the absorbing rib 101 and the substrate 11. The reverse order of the absorbing rib 101 sandwiched between the reflective wires 102 and the substrate 11 is within the scope of the invention herein. The polarizing structure 12 of any of the methods described herein can include a reflective wire 102 and an absorbing rib 101, however, this embodiment may be particularly suitable for the second method when the stiffening cover layer 44 is used as a heat sink or for thermal conduction of heat away from the polarizing structure 12.

[0077] 11a, another step 110a in the second method can be to apply an uncured filler layer 134 on top of the polarizing structures 12 and extending into the channels 13 between the polarizing structures 12. Step 110a can follow step 100a. Step 110a can use a polarizer 100b.

[0078] 11b, another step 110b in the second method can be to apply an uncured filler layer 134 in the channels 13 between the polarizing structures 12, but not on top of the polarizing structures 12. Step 110b can follow step 100a. Step 110b can use a polarizer 100b.

[0079] As illustrated in Figures 14-15, other steps 140 and 150 in the second method can include imprinting a pattern of structures 84 in the uncured fill layer 134. A stamp 55 can be used to imprint the structures 84. The structures 84 can be sized and shaped to reduce reflection of the incident light, increase heat conduction away from the polarizer, or both. For example, the structures 84 can be shaped like ribs or pillars to increase surface area for heat conduction, reduce reflection, or both. Steps 140 and 150 can follow step 110.

[0080] As illustrated in FIG. 16, the substrate 11 includes a first substrate 11 a The second method further includes applying a second substrate 11 onto the uncured filler layer 134. b Step 160 may follow step 110.

[0081] As illustrated in Figures 12a, 12b, 15, and 17, each of steps 120a, 120b, 150, and 170 in the second method can include curing (i.e., chemically reacting therein) the uncured filler layer 134 to form the cured filler layer 144. The properties of the uncured filler layer 134, the properties of the cured filler layer 144, and the curing are described in the "Additional Features Applicable to All Methods" section below. Step 120a can follow step 110a, step 120b can follow step 110b, step 150 can follow step 140, and step 170 can follow step 160.

[0082] In a second approach, completely or nearly completely filling the channels 13 with the stiffening fill layer 144 can account for the optical properties of the polarizer and can account for the structural support of the polarizing structure 12. For example, the stiffening fill layer 144 can fill 75% or more, 90% or more, 95% or more, or 98% or more of the channels 13.

[0083] Filling the channel with the uncured fill layer 134 facilitates filling the channel with the cured fill layer 144. One way to aid in filling the channel 13 is to select a compound of the uncured fill layer 134 that is attractive with respect to the compound of the outer surface of the polarizing structure 12. For example, the uncured fill layer 134 can be primarily an aqueous solution, and the outer surface of the polarizing structure 12 can be hydrophilic, such as an oxide. The material of the outer surface of the polarizing structure 12 can have a relatively high surface energy, and the solvent of the uncured fill layer 134 can have a relatively low surface tension. The surface energy of the outer surface of the polarizing structure 12 can be greater than the surface tension of the uncured fill layer 134. For example, the surface energy of the surface of the polarizing structure 12 can be two times greater, five times greater, or ten times greater than the surface tension of the uncured fill layer 134. For example, if the uncured fill layer 134 includes water as a solvent, then the outer surface of the polarizing structure 12 can include a hydrophilic coating. Another method to aid in filling the channels 13 with the uncured fill layer 134 is to use smaller nanoparticles.

[0084] Polarizers made by the second method can have some or all of the following properties: high contrast (e.g., Tp / Ts), ability to withstand high temperatures, resistance to physical damage, and relative ease of manufacture. This embodiment can be particularly useful for its high temperature resistance due to the stiffened filler layer 144 in the channel 13. The stiffened filler layer 144 can be an effective heat sink or thermally conductive path to draw heat away from the polarizing structure 12.

[0085] Third Method - Imprintable Layer 184 and Printed Layer 204 As illustrated in Figures 18-21, the third method of making a polarizer can comprise some or all of the following steps, which can be performed in the following order: There may also be additional steps not described below. These additional steps may be before, between, or after those described.

[0086] 18, one step 180 in the third method may include providing a substrate 11 that is transparent. An uncured imprintable layer 184 may be formed on a first side 11 of the substrate 11. f 18-19, steps 180 and 190 in the third method may include imprinting a pattern of polarizing structures 12 in an uncured imprintable layer 184.

[0087] 20, another step 200 in the method may include curing (i.e., chemically reacting therein) the uncured imprintable layer 184 to form a cured print layer 204. The properties of the uncured imprintable layer 184, the properties of the cured print layer 204, and the curing are described below in the section "Additional Features Applicable to All Methods." Step 200 may follow step 190.

[0088] The characteristics of the polarizing structure 12 are shown in Figures 19 to 21 and can include the following: Several longitudinal dimensions L of the polarizing structure 12 are parallel to each other in a first direction D 1 The other longitudinal dimension L of the polarizing structure 12 can extend in a second direction D. 2 The first direction D 1 and the second direction D 2 The first side surface 11 of the substrate 11 f The first direction D 1 is the second direction D 2 The first direction D can be different from the first direction D. 1 is the second direction D 2The longitudinal dimensions L of some of the polarizing structures 12 may extend in at least three different directions or at least four different directions.

[0089] The polarizing structure 12 is disposed perpendicular to the longitudinal dimension L and on a first side 11 of the substrate 11. f The first direction D may have a width W parallel to the first direction D. 1 At least some of the polarizing structures 12 extend in a width W and a second direction D. 2 The width W of at least some of the polarizing structures 12 extending across the axial direction can be 100 nm or less, 500 nm or less, or 1000 nm or less.

[0090] The polarizing structure 12 can have a number of different thicknesses Th. The thickness Th is determined by the thickness of the first side 11 of the substrate 11. f For example, the polarizing structure can have 2 or more, 3 or more, 4 or more, or 5 or more different thicknesses Th. Each of these different thicknesses Th can differ from one another, such as by 5 nm or more, 10 nm or more, 20 nm or more, or 40 nm or more, and / or by 60 nm or less, 120 nm or less, or 500 nm or less.

[0091] The substrate 11 and the polarizing structure 12 can be made of the same material. For example, the substrate 11 and the polarizing structure 12 can both be dielectric. The material composition of the substrate 11 and the polarizing structure 12 can be or include glass.

[0092] One distinct property of the third method polarizer is its ability to transmit 50% or more of the incident unpolarized light as a single polarization. For example, the polarizer may transmit 50% or more, 60% or more, 70% or more, or 80% or more of the incident light as a single polarization.

[0093] Exemplary extinction ratios for the third method polarizers can be 2 or greater, 3 or greater, 5 or greater, or even 10 or greater. The extinction ratio refers to the amount of incident light transmitted as the predominantly transmitted polarization divided by the amount of incident light transmitted as the opposite polarization.

[0094] Polarizers made from the third method can have a high percent transmission of one polarization and are relatively easy to manufacture.

[0095] 22-24, a fourth method of making a polarizer can include some or all of the following steps, which can be performed in the following order: There may also be additional steps not described below. These additional steps may be before, between, or after those described.

[0096] As illustrated in FIG. 22, one step 220 in the fourth method is to f and the first aspect 11 f and the opposite second side 11 s The polarizing device 15 may include providing a polarizer using a substrate 11 having a first side 11 of the substrate 11. The substrate 11 may be transmissive. f Polarizing device 15 can include objects or materials arranged in a pattern relative to the polarization of light. Polarizing device 15 can be any of those described herein or other types of polarizers.

[0097] As illustrated in FIGS. 22-23, steps 220 and 230 in the fourth method include: s The process can include applying an uncured backside layer 234 to the polarizer and imprinting a pattern of structures 84 into the uncured backside layer 234. A stamp 55 can be used to imprint the structures 84. The structures 84 can be sized and shaped to reduce reflection of incident light, increase heat conduction away from the polarizer, or both. For example, the structures 84 can be shaped like ribs or pillars to increase surface area for heat conduction, reduce reflection, or both.

[0098] 24, another step 240 in the fourth method can include curing (i.e., chemically reacting therein) the uncured backside layer 234 to form a cured backside layer 244. The properties of the uncured backside layer 234, the properties of the cured backside layer 244, and the curing are described in the "Additional Features Applicable to All Methods" section below. Step 240 can follow step 230.

[0099] Polarizers made by the fourth method may have some or all of the following properties: a high percent transmission of one polarization, the ability to withstand high temperatures due to the imprinted structures 84, and relative ease of manufacture.

[0100] Fifth Method - Thin Films 251 / 261 As illustrated in Figures 25-35, a fifth method of making a polarizer can include some or all of the following steps, which can be performed in the following order: There may also be additional steps not described below. These additional steps may be before, between, or after those described.

[0101] As illustrated in Figures 25, 29, and 33, the method may further comprise applying an uncured thin film 251 onto the substrate 11. As illustrated in Figures 26, 30, and 34, another step in the fifth method may include curing (i.e., chemically reacting therein) the uncured thin film 251 to form a cured thin film 261. The properties of the uncured thin film 251, the properties of the cured thin film 261, and the curing are described in the "Additional Features Applicable to All Methods" section below.

[0102] As illustrated in Figures 27 and 33, the method may further comprise applying a reflective thin film 272 onto the substrate 11. As illustrated in Figures 28a, 28b, 31, 32, and 35, the method may also include etching the reflective thin film, and in some embodiments the cured thin film(s) 261, to form the polarizing structure 12.

[0103] As illustrated in FIG. 25, the uncured thin film 251 is an underlying uncured thin film 251 that is applied to the substrate 11 prior to application of the reflective thin film 272. L As illustrated in FIG. 26, the lower uncured thin film 251 L 261 Hardened Thin Film L As illustrated in FIG. 27, the reflective film 272 can be cured to form the underlying cured film 261. L As illustrated in Figure 28a, the reflective thin film 272 can be etched to form the polarizing structure 12, which can consist of a polarizing structure 282 of the reflective thin film.

[0104] As illustrated in FIG. 28b, the lower hardened membrane 261 L and the reflective thin film 272 is polarized by the polarizing structure 282 of the reflective thin film and the polarizing structure 281 of the hardened thin film below. L 3. The cured thin film can be etched to form the polarizing structure 12 including the polarizing structure 281 below. L can be sandwiched between the reflective thin film polarizing structure 282 and the substrate 11. L can be aligned with a corresponding reflective thin film polarizing structure 282.

[0105] As illustrated in FIG. 29, step 290 can follow step 270, and includes removing the uncured thin film 251 from the top. U can be applied over the reflective thin film 272. As illustrated in FIG. U 261 Hardened Thin Film on U As illustrated in FIG. 31, the upper hardened film 261 U The reflective thin film 272 is then etched away to form the polarizing structure 281 in the hardened thin film above. U 32, a polarizing structure 12 can be formed that includes a polarizing structure 282 of a cured thin film 261 on the upper side. U , the reflective thin film 272, and the underlying hardened thin film 261 LThe polarizing structure 281 is etched and hardened on the thin film. U , the polarizing structure of the reflective thin film 282, and the polarizing structure of the hardened thin film below 281 L The reflective thin film polarizing structure 282 can be formed by applying a polarizing beam to the cured thin film polarizing structure 281 on the cured thin film. U and the polarization structure of the hardened thin film below 281 L The polarizing structure of the hardened thin film below can be sandwiched between the L , the polarizing structure of the reflective thin film 282, and the polarizing structure of the hardened thin film 281 above. U Each of the can be aligned together.

[0106] As illustrated in FIG. 33, the uncured thin film 251 is U The reflective thin film 272 can be a thin, uncured thin film 251 on the U As illustrated in FIG. 34, the uncured thin film 251 on the substrate 11 may be applied before applying the U 261 Hardened Thin Film on U As illustrated in FIG. 35, the upper hardened film 261 U The reflective thin film 272 is then etched away to form the polarizing structure 281 in the hardened thin film above. U and a reflective thin film polarizing structure 282. The reflective thin film polarizing structure 282 can be formed by combining the above cured thin film polarizing structure 281. U and substrate 11. A cured thin film polarizing structure 281 on each of them. U can be aligned with a corresponding reflective thin film polarizing structure 282.

[0107] ADDITIONAL FEATURES APPLICABLE TO ALL METHODS In the following description, the uncured cover layer 34, the uncured filler layer 134, the uncured imprintable layer 184, the uncured backside layer 234, and the uncured thin film(s) 251 will be referred to as uncured layers. In the following description, the cured cover layer 44, the cured filler layer 144, the cured print layer 204, the cured backside layer 244, and the cured thin film(s) 261 will be referred to as cured layers.

[0108] In one embodiment, the uncured layer can be a liquid having solid inorganic nanoparticles dispersed throughout a continuous phase. Curing or chemically reacting within the uncured layer can include forming the uncured layer into a solid interconnected network of inorganic nanoparticles that defines the cured layer.

[0109] In another aspect, the uncured layer can be a colloidal suspension including a dispersed phase and a continuous phase. Curing or chemically reacting therein the colloidal suspension can include removing the continuous phase to form a solid that defines the cured layer. The solid can be inorganic.

[0110] The inorganic nanoparticles, the dispersed phase, or both, can include several metal atoms bound to organic moieties. In one embodiment, each metal atom can be bound to no more than one organic moiety. An example of an organic moiety is -CH 3 and -CH 2 CH 3 As a result, the curable layer can include embedded organic moieties that can be useful for modifying the properties of the curable layer, such as changing its optical properties and hardness.

[0111] In another embodiment, the uncured layer can be a solution containing the molecules in a solvent. The solvent can include water and organic liquids. The molecules can include reactive groups R 1 Each reactive group can independently include a metal atom bonded to -Cl, -OR 2 , -OCOR 2 , or -N(R 2 ) 2 R 2 is an alkyl group. The alkyl group can have at least one carbon atom, but can be small, such as 2 or fewer carbon atoms, 3 or fewer carbon atoms, 5 or fewer carbon atoms, or 10 or fewer carbon atoms. For example, an alkyl group can be -CH 3 or -CH 2 CH 3The solid inorganic nanoparticles referred to above can include metal atoms as described in this paragraph.

[0112] In certain embodiments, all or all but one of the bonds of each of the metal atoms can be to these reactive groups. For example, these molecules can be (CH 3 )Si(R 1 ) 3 , Si(R 1 ) 4 , Al(R 1 ) 3 , (CH 3 )Al(R 1 ) 2 , (CH 3 )Ti(R 1 ) 3 , Ti(R 1 ) 4 or a combination thereof. Curing or chemically reacting in the solution can include reacting the molecules to form a solid that defines a cured layer having metal atoms interconnected to one another. The solid can be inorganic. In an embodiment, the molecules can have a relatively small molecular weight, for example, 70 g / mol or more, 80 g / mol or more, 90 g / mol or more, 100 g / mol or more, or 110 g / mol or more and 125 g / mol or less, 150 g / mol or less, 175 g / mol or less, or 200 g / mol or less.

[0113] Forming the uncured layer into a cured layer can include evaporating at least some of the liquid. In one embodiment, all of the liquid in the initially uncured layer is either reacted to form a solid (the cured layer) or evaporated. Forming the uncured layer into a cured layer can include the use of ultraviolet light, heat, or both. The integrity of the cured layer can be improved by, for example, 30 minutes. o C or higher, 50 o C or above, or 100 o C or above, and 150 o Below C, 200 o Below C, 250 o C or below, or 300 oThis can be improved by curing at relatively low temperatures such as

[0114] The uncured layer, the cured layer, or both can have a low refractive index for improved optical performance. This can be particularly beneficial for embodiments having a cured layer in the channel 13 between the polarizing structures 12. For example, the refractive index of the uncured layer, the cured layer, or both can be 1.1 or less, 1.2 or less, 1.3 or less, or 1.4 or less. In one embodiment, the refractive index of the uncured layer, the cured layer, or both can be 1.0 or greater.

[0115] One way to achieve this low refractive index is to include small voids or cavities in the cured layer. These small voids, filled with air, lower the overall refractive index of the cured layer. For example, the cured layer can include silicon dioxide, which has a refractive index of about 1.4 to 1.5, but with voids, the overall refractive index can be 1.4 or less. These voids can be created by using a solvent in the uncured layer that has large molecules. For example, the solvent in the uncured layer can have a molecular weight of 70 g / mol or more, 80 g / mol or more, 90 g / mol or more, 100 g / mol or more, or 110 g / mol or more. As another example, the chemical in the solvent can have a large number of atoms, such as 15 atoms or more, 20 atoms or more, or 25 atoms or more. It can be considered that the solvent does not have an excessively high molecular weight so that it can be sufficiently volatile. Thus, the solvent can have a molecular weight of 125 g / mol or less, 150 g / mol or less, 175 g / mol or less, 200 g / mol or less, or 300 g / mol or less. The solvent can also have 30 atoms or less, 50 atoms or less, or 75 atoms or less. Additionally, the solvent can have large space occupying structures, such as aryl molecules or molecules that otherwise have double bonds. For example, the uncured layer can include benzene or xylene.

[0116] The inorganic nanoparticles, the resulting solids resulting from the removal of the continuous phase, and the metal atoms mentioned above can comprise aluminum, titanium, silicon, germanium, tin, lead, zirconium, or combinations thereof. The stiffening layer can include aluminum oxide, titanium oxide, silicon oxide, germanium oxide, tin oxide, lead oxide, zirconium oxide, or combinations thereof. Aluminum oxide can be particularly useful when the primary function of the stiffening layer is to conduct heat away from the polarizing structure 12. Silicon dioxide can be particularly useful due to its low refractive index. Titanium dioxide can be particularly useful due to its high refractive index.

[0117] The inorganic nanoparticles can be sized to keep them outside of the channel 13. For example, 90% or more, 95% or more, or 99% or more of the inorganic nanoparticles can have a diameter of 1 nm or more, 10 nm or more, or 50 nm or more. Alternatively, the inorganic nanoparticles can be sized to optimally fill the channel 13. For example, 90% or more, 95% or more, or 99% or more of the inorganic nanoparticles can have a diameter of 2 nm or less, 1 nm or less, or 0.5 nm or less.

[0118] As illustrated in Figures 7-9, 13-15, 18-20, and 22-24, and as described above, the method may include imprinting a pattern of structures. As illustrated in Figure 36, such imprinting may also include a step 360 of imprinting isolated pixels. Although Figure 36 shows different pixels with different wire directions from each other, the pixels may differ from each other in other ways.

[0119] As illustrated in Figures 37-38, any of the above methods may further include sputter deposition of a thin film 375 onto the uncured layer, the cured layer, or both, represented by reference numbers 374 and 384, respectively. The thin film 375 may be any material having the desired optical properties, polarizer protection properties, or both. The thin film 265 may be a dielectric. Sputter deposition of the thin film 375 may reduce voids in the uncured layer 374, the cured layer 384, or both. Thus, this sputter deposition step is particularly useful for embodiments where it is desirable for the uncured layer 374 and the cured layer 384 to fill the channel 13.

[0120] The following can be used to improve the application of the uncured layer and the formation of the uncured layer in the cured layer in any of the above-mentioned methods. The following steps can be performed in the following order: spin-coating the uncured layer onto the polarizing device or substrate 11 to define a first spin-coating, baking the polarizer or coated substrate 11 to define a first bake, spin-coating the uncured layer onto the first spin-coating to define a second spin-coating, and then baking the polarizer or coated substrate 11 to define a second bake. The spin-coating and baking steps can be repeated three, four, or more times. The uniformity of the cured layer can be improved with multiple repetitions of these spin-coating and baking steps, but each repetition also increases the cost. Thus, the uniformity specification can be compared against the cost in determining the number of repetitions, if any.

[0121] The time for each spin coat depends on the desired thickness and the spin coater, with exemplary times including 2 seconds or more, 4 seconds or more, or 6 seconds or more and 10 seconds or less, 20 seconds or less, or 30 seconds or less for each spin coat.

[0122] Examples of speeds for the first spin coating, second spin coating, or additional spin coating include 100 rpm or more, 500 rpm or more, 1000 rpm or more, or 1500 rpm or more, and 2500 rpm or less, 3000 rpm or less, 4000 rpm or less, or 8000 rpm or less. Examples of temperatures for the first bake, second bake, or other bake include 30 o C or higher, 50 o C or higher, 100 o C or above, or 150 o C or above and 250 o Below C, 300 o C or below, or 400 o Includes C and below.

[0123] The uncured layer, the cured layer, or both, can be relatively thick, depending on the compounds and methods of application described herein. For example, the average thickness of the layer, Th, the minimum thickness of the layer, Th min , maximum layer thickness Th max can have the following values ​​as specified in the claims: ≧10 nm, ≧50 nm, ≧100 nm, ≧200 nm and ≦300 nm, ≦600 nm, or ≦1000 nm.

[0124] The methods can be combined. For example, an overcoat layer 14 and a hardened cover layer 44 can be applied over a polarizer as shown in Figures 10a-15 or Figures 18-35 and described above. A hardened filler layer 144 can be formed on top of the polarizing structures 12 and extend into the channels 13 between the polarizing structures 12 as shown in Figures 18-21 and Figures 25-35 and described above. A hardened backside layer 244 can be applied to the second side 11 of the substrate 11 of any of the polarizers shown in Figures 22-24 and described herein as described above. s The stiffened thin film(s) 251, the stiffened thin film polarizing structure 281, or both, can be used with any of the polarizers shown in the figures and described herein. (Other possible items) (Item 1) 1. A method for making a polarizer, comprising the steps of: Providing a transparent substrate; applying an uncured imprintable layer onto a first side of the substrate, the uncured imprintable layer being a liquid having inorganic nanoparticles dispersed throughout a continuous phase; imprinting a pattern of polarizing structures into the uncured imprintable layer, some longitudinal dimensions of the polarizing structures extending in a first direction and other longitudinal dimensions of the polarizing structures extending in a second direction, the first direction and the second direction being parallel to the first side of the substrate, and the first direction being different than the second direction; curing the uncured imprintable layer into a cured print layer, the cured print layer comprising a solid interconnected network of the inorganic nanoparticles. (Item 2) a width of at least some of the polarizing structures extending in the first direction and a width of at least some of the polarizing structures extending in the second direction are less than or equal to 500 nm, the widths being perpendicular to the longitudinal dimension of the substrate and parallel to the first side. The method according to item 1. (Item 3) the substrate and the polarizing structure are dielectric; 3. The method according to item 1 or 2. (Item 4) The first direction is perpendicular to the second direction. 4. The method according to any one of items 1 to 3. (Item 5) the polarizing structure has three or more distinct thicknesses, the thicknesses being a dimension perpendicular to the first side of the substrate; 5. The method according to any one of items 1 to 4. (Item 6) The substrate has a second side opposite the first side, and the method further comprises: applying an uncured backside layer to the second side of the substrate, the uncured backside layer being a liquid having solid inorganic nanoparticles dispersed throughout a continuous phase; and curing the uncured backside layer to form a hardened backside layer, the hardened backside layer comprising a solid interconnected network of the inorganic nanoparticles. 6. The method according to any one of items 1 to 5. (Item 7) applying an uncured filler layer on top of the polarizing structures and extending into the channels between the polarizing structures, the uncured filler layer being a liquid having solid inorganic nanoparticles dispersed throughout a continuous phase, and a compound in the uncured filler layer and a compound at the surface of the polarizing structures being mutually attractive; curing the uncured fill layer to form a cured fill layer, the cured fill layer comprising a solid interconnected network of the inorganic nanoparticles. 6. The method according to any one of items 1 to 5. (Item 8) applying an overcoat layer over the cured print layer; applying an uncured cover layer to an outer surface of the overcoat layer furthest from the substrate, the uncured cover layer being a liquid having solid inorganic nanoparticles dispersed throughout a continuous phase, the compounds of the uncured cover layer and the compounds of the outer surface of the overcoat layer being mutually repellent; curing the uncured cover layer to form a cured cover layer, the cured cover layer comprising a solid interconnected network of the inorganic nanoparticles. 6. The method according to any one of items 1 to 5. (Item 9) The inorganic nanoparticles include metal atoms bonded to reactive groups, each reactive group being independently selected from the group consisting of -Cl, -OR 2 , -OCOR 2 , or -N(R 2 ) 2 and R 2 is an alkyl group, wherein the curing step comprises reacting molecules to form a solid of the metal atoms interconnected to each other as the solid interconnected network of the inorganic nanoparticles. 9. The method according to any one of items 1 to 8. (Item 10) 1. A method for making a polarizer, comprising the steps of: Providing a transparent substrate; applying an uncured imprintable layer to a first side of the substrate, the uncured imprintable layer being a colloidal suspension comprising a dispersed phase and a continuous phase; imprinting a pattern of polarizing structures into the uncured imprintable layer, some longitudinal dimensions of the polarizing structures extending in a first direction and other longitudinal dimensions of the polarizing structures extending in a second direction, the first direction and the second direction being parallel to the first side of the substrate, and the first direction being different than the second direction; and curing the uncured imprintable layer by removing the continuous phase to form a solid defining a cured imprint layer. (Item 11) imprinting the pattern of the polarizing structure comprises imprinting discrete pixels. The method according to item 10. (Item 12) applying an uncured filler layer on top of the polarizing structures to extend into the channels between the polarizing structures, the uncured filler layer being a colloidal suspension including a dispersed phase and a continuous phase, compounds of the uncured filler layer and compounds at a surface of the polarizing structures being attractive to each other, and a surface energy of the surface of the polarizing structures being greater than a surface tension of the uncured filler layer; and curing the uncured filler layer by removing the continuous phase to form a solid defining a cured filler layer. 12. The method according to item 10 or 11. (Item 13) applying an overcoat layer over the cured print layer; applying an uncured cover layer to an outer surface of the overcoat layer furthest from a polarizing device, the uncured cover layer being a colloidal suspension including a disperse phase and a continuous phase; placing a second substrate onto the uncured cover layer; and curing the uncured cover layer by removing the continuous phase to form a solid defining a cured cover layer. 12. The method according to item 10 or 11. (Item 14) 1. A method for making a polarizer, comprising the steps of: Providing a transparent substrate; applying an uncured imprintable layer to a first side of the substrate, the uncured imprintable layer being a solution comprising molecules in a solvent, the solvent including water and organic liquids, the molecules comprising metal atoms bonded to reactive groups, each reactive group being independently selected from the group consisting of -Cl, -OR 2 , -OCOR 2 , or -N(R 2 ) 2 and R 2 is an alkyl group; imprinting a pattern of polarizing structures into the uncured imprintable layer, some longitudinal dimensions of the polarizing structures extending in a first direction and other longitudinal dimensions of the polarizing structures extending in a second direction, the first direction and the second direction being parallel to the first side of the substrate, and the first direction being different than the second direction; and reacting the molecules to form a solid body of the metal atoms interconnected with one another to define a cured print layer. (Item 15) applying an uncured filler layer on top of the polarizing structures and extending into the channels between the polarizing structures, the uncured filler layer being a solution including molecules in a solvent, the solvent including water and organic liquids, the molecules including metal atoms bonded to reactive groups, each reactive group being independently selected from -Cl, -OR 2 , -OCOR 2 , or -N(R 2 ) 2 and R 2 is an alkyl group, and the compound of the uncured fill layer and the compound at the surface of the polarizing structure are mutually attractive; and reacting the molecules with one another to form a solid of the metal atoms interconnected to define a hardened fill layer. Item 15. The method according to item 14. (Item 16) further comprising disposing a second substrate on the uncured fill layer. Item 16. The method according to item 15. (Item 17) every bond of said metal atom is independently bonded to one of said reactive groups; 17. The method according to any one of items 14 to 16. (Item 18) The metal atom is Si(R 1 ) 4 , Al(R 1 ) 3 , Ti(R 1 ) 4 , or a combination thereof, each R 1 is independently one of the reactive groups, 18. The method according to any one of items 14 to 17. (Item 19) The molecule has a molecular weight of 80 g / mol or more and 150 g / mol or less. 19. The method according to any one of items 14 to 18. (Item 20) imprinting the pattern of the polarizing structure comprises imprinting discrete pixels. 20. The method according to any one of items 14 to 19.

Claims

1. 1. A method for making a polarizer, comprising the steps of: applying an uncured thin film directly onto a substrate, said uncured thin film being a liquid having solid inorganic nanoparticles dispersed throughout a continuous phase; curing the uncured thin film into a cured thin film, the cured thin film comprising a solid interconnected network of the solid inorganic nanoparticles; applying a reflective thin film to the substrate; and etching the cured thin film and the reflective thin film to form a polarizing structure. method.

2. 10. The method of claim 1, wherein the method steps are performed in the following order: directly applying the uncured thin film, curing the uncured thin film into the cured thin film, applying the reflective thin film, and then etching the cured thin film and the reflective thin film such that the polarizing structure of the cured thin film is sandwiched between the polarizing structure of the reflective thin film and the substrate, and the reflective thin film is applied directly onto the cured thin film.

3. The method of claim 1 , wherein the refractive index of the cured film is less than or equal to 1.

4.

4. The method of claim 1 , wherein the cured film has a refractive index of 1.3 or less.

5. The method of claim 4 , wherein the refractive index is reduced by air-filled cavities in the cured thin film.

6. The liquid includes a molecule containing a reactive group, water, and an organic liquid, each reactive group being independently -OR ２ , -OCOR ２ , or -N(R ２ ) ２ and R ２ is an alkyl group, 10. The method of claim 1, wherein the solid inorganic nanoparticles comprise metal atoms bonded to organic moieties, the metal atoms comprising aluminum and titanium.

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