Resin composition, compound (Z), optical filter and use thereof

Abstract

An embodiment of the present invention pertains to a resin composition, a compound (Z), an optical filter, or a solid-state imaging device and optical sensor device using the optical filter. The resin composition contains a resin, and a compound (Z) represented by formula (I) and having a maximum absorption wavelength that falls within the wavelength range of 850-1100 nm.　(I): Cn+An- [Cn+ represents a monovalent cation represented by formula (II), and An- represents a monovalent anion.] [YA and YD each independently represent a hydrogen atom, a halogen atom, or a group having at least one selected from a carbon atom, a sulfur atom, an oxygen atom, a nitrogen atom, and a phosphorus atom, ZA-ZC and YB-YC each independently represent a hydrogen atom, a halogen atom, or a group having at least one selected from a carbon atom, a sulfur atom, an oxygen atom, a nitrogen atom, a phosphorus atom, and a silicon atom, or two adjacent ones of ZA-ZC may be linked together to form a ring, YB and YC are optionally linked together to form a ring, units A and B each independently represent a group having a complex aromatic ring, some groups in unit A may be linked to YA to form a ring, and some groups in unit B may be linked to YD to form a ring.]

Description

[Technical field]

[0001] One embodiment of the present invention relates to a resin composition, a compound (Z), an optical filter, or a solid-state imaging device and an optical sensor device using the optical filter. [Background technology]

[0002] Solid-state imaging devices such as video cameras, digital still cameras, and mobile phones with camera functions use CCD and CMOS image sensors, which are solid-state imaging elements for color images. These solid-state imaging elements use silicon photodiodes in their light receiving sections that are sensitive to near-infrared light that cannot be detected by the human eye. Silicon photodiodes and the like are also used in optical sensor devices. For example, solid-state imaging elements require visibility correction to make colors appear natural to the human eye, and optical filters (e.g., near-infrared cut filters) that selectively transmit or cut light in a specific wavelength range are often used.

[0003] As such near-infrared cut filters, those manufactured by various methods have been used in the past. For example, a near-infrared cut filter using a resin as a base material and containing a near-infrared absorbing dye in the resin is known (see, for example, Patent Document 1). However, the near-infrared cut filter described in Patent Document 1 may not necessarily have sufficient near-infrared absorbing properties.

[0004] In addition, many mobile devices in recent years have been equipped with security authentication functions (e.g. iris authentication, face authentication) that use near-infrared light with wavelengths of around 800 to 1000 nm, but the near-infrared light used for this authentication can have adverse effects on camera images, such as flare and ghosting. For this reason, there is a need for a device that can cut out light rays in the relatively long wavelength range of near-infrared light.

[0005] Furthermore, in distance measurement technologies using lasers, unnecessary light must be cut out as it causes noise, but as the wavelength of laser light sources becomes longer, there is an increasing need to cut out a wide wavelength range from the visible to near-infrared region.

[0006] As the near-infrared absorbing dye, polymethine-based, squarylium-based, porphyrin-based, dithiol metal complex-based, phthalocyanine-based, diimonium-based dyes and the like have conventionally been used. Among these, diimonium-based dyes are widely used because they have high near-infrared absorption ability at wavelengths of 900 nm or more and high transparency in the visible light region.

[0007] Furthermore, for example, the diimonium-based compound described in Patent Document 2 exhibits a wide and uniform absorption efficiency in the near infrared region and an excellent transmission characteristic in the visible light region. [Prior art documents] [Patent documents]

[0008] [Patent Document 1] Japanese Patent Application Publication No. 6-200113 [Patent Document 2] Special Publication No. 2014-506252 Summary of the Invention [Problem to be solved by the invention]

[0009] However, it was found that when diimonium dyes were used to sufficiently cut off the light of the desired wavelength in the near infrared region, the visible light transmittance was reduced.In addition, the absorption waveform of diimonium dyes is gentle and the absorption band is wide, so they are not suitable for selectively cutting off light of a specific wavelength in the near infrared region. On the other hand, polymethine dyes such as cyanine or croconium dyes are suitable as dyes that have a steep waveform and selectively cut light in the near-infrared region with wavelengths of 850 nm or more, but these dyes do not have sufficient resistance to heat or ultraviolet light.

[0010] The present invention provides a resin composition that can sufficiently cut light having wavelengths of 850 nm or more in the near-infrared region that is desired to be cut, with a sharp absorption waveform, while suppressing a decrease in visible light transmittance and having sufficient resistance to heat and ultraviolet rays. [Means for solving the problem]

[0011] The present inventors have conducted extensive research to solve the above problems. Configuration examples of the present invention are shown below. In the present invention, the expression "A to B" or the like expressing a numerical range is synonymous with "A or more, B or less", and includes A and B in the numerical range. In addition, in the present invention, a wavelength of A to B nm represents characteristics at a wavelength resolution of 1 nm in a wavelength region of wavelengths of Am or more and wavelengths of B nm or less.

[0012] [1] Resin; A compound (Z) represented by the following formula (I) and having an absorption maximum wavelength in the range of 850 to 1100 nm. A resin composition comprising: Cn + An - (I) [In formula (I), Cn + is a monovalent cation represented by the following formula (II), and An - is a monovalent anion.

[0013] [ka] [In formula (II), Y A and Y D each independently represents a group having at least one atom selected from a carbon atom, a sulfur atom, an oxygen atom, a nitrogen atom and a phosphorus atom, a hydrogen atom or a halogen atom, Z A ~Z C and Y B ~Y C each independently represents a group having at least one atom selected from a carbon atom, a sulfur atom, an oxygen atom, a nitrogen atom, a phosphorus atom, and a silicon atom, a hydrogen atom, or a halogen atom, or Z A ~ZC adjacent two of Y may be bonded to each other to form a ring; B and Y C may be bonded to each other to form a ring, Unit A and unit B each independently represent a group having a heteroaromatic ring, Some of the groups in unit A are Y A and may be bonded to form a cyclic hydrocarbon group having 5 or 6 carbon atoms, and some of the groups in the unit B may be bonded to Y D may be bonded to form a cyclic hydrocarbon group having 5 or 6 carbon atoms, Z B is a halogen atom or a group represented by any one of the following formulas (A-1) to (A-2), and Y B and Y C and R are bonded to each other to form a 5-membered alicyclic hydrocarbon group, and in the 5-membered alicyclic hydrocarbon group, Z B and all of the substituents other than the above are hydrogen atoms, the unit A is not a group represented by the following formula (A-3), and the unit B is not a group represented by the following formula (A-4), Z B is a chlorine atom, and Y B and Y C and R are bonded to each other to form a 6-membered alicyclic hydrocarbon group, and in the 6-membered alicyclic hydrocarbon group, Z B and all of the substituents other than the above are hydrogen atoms, the unit A is not a group represented by the following formula (A-5), and the unit B is not a group represented by the following formula (A-6), Z B is a group represented by the following formula (A-7), and Y B and Y C and R are bonded to each other to form a 5-membered alicyclic hydrocarbon group, and in the 5-membered alicyclic hydrocarbon group, Z B and all of the substituents other than the above are hydrogen atoms, unit A is not a group represented by the following formula (A-8), and unit B is not a group represented by the following formula (A-9).

[0014] [ka]

[0015] [ka] [In formulas (A-3) to (A-4), Y a1 are independently substituted or unsubstituted alkyl groups having 8 to 20 carbon atoms, and -* in formula (A-3) represents Y in formula (II), A In formula (A-4), =** indicates that Y in formula (II) is bonded to a carbon atom to which it is bonded. D indicates that the carbon atom is double-bonded to the carbon atom to which it is bonded.

[0016] [ka] [In formulas (A-5) to (A-6), Y a2 is an n-butyl group, and -* in formula (A-5) represents Y in formula (II). A In formula (A-6), =** indicates that Y in formula (II) is bonded to a carbon atom to which it is bonded. D indicates that the carbon atom is double-bonded to the carbon atom to which it is bonded.

[0017] [ka] [In formula (A-7), Rx and Ry each independently represent a hydrogen atom, a methyl group, an ethyl group, a propyl group, an isopropyl group, an isopropenyl group, a 1-propenyl group, a 2-propenyl group, a 2-propynyl group, a butyl group, an isobutyl group, a sec-butyl group, a tert-butyl group, a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cyclohexenyl group, a cycloheptyl group, a cyclooctyl group, a phenyl group, an o-tolyl group, a m-tolyl group, a p-tolyl group, a xylyl group, a mesityl group, an o-cumenyl group, a m-cumenyl group, a p-cumenyl group, a biphenylyl group, a methoxy group, an ethoxy group, a propoxy group, a fluoro group, a chloro group, a bromo group, an iodo group, a cyano group, or a nitro group.]

[0018] [ka] [In formulas (A-8) to (A-9), Y a3 are independently a linear or branched alkyl group having 1 to 5 carbon atoms, and -* in formula (A-8) represents Y in formula (II). A In formula (A-9), =** indicates that the Y in formula (II) is bonded to a carbon atom to which the Y is bonded. D indicates that the carbon atom is double-bonded to the carbon atom to which it is bonded.

[0019] [2] The unit A is a group represented by any one of the following formulas (AI) to (A-III): The unit B is a group represented by any one of the following formulae (BI) to (B-III): The above Y A and Y D each independently represents a hydrogen atom, a halogen atom, or a hydrocarbon group having 1 to 8 carbon atoms, Said Z A ~Z C and Y B ~Y C are each independently a hydrogen atom, a halogen atom, a hydroxyl group, a carboxyl group, a nitro group, -NR g R h group, amide group, imide group, cyano group, silyl group, -Q 1 , -N=NQ 1 , -SQ 2 , -SSQ 2 , or -SO2Q 3 and Z A ~Z C adjacent two of these may be bonded to each other to form an aromatic hydrocarbon group having 6 to 14 carbon atoms, a 5- to 6-membered alicyclic group which may contain at least one nitrogen atom, oxygen atom or sulfur atom, or a heteroaromatic group having 3 to 14 carbon atoms and containing at least one nitrogen atom, oxygen atom or sulfur atom, and these alicyclic groups, aromatic hydrocarbon groups and heteroaromatic groups may have an aliphatic hydrocarbon group having 1 to 9 carbon atoms or a halogen atom, Y B and Y Cmay be bonded to each other to form an aromatic hydrocarbon group having 6 to 14 carbon atoms, a 5- to 6-membered alicyclic group which may contain at least one nitrogen atom, oxygen atom or sulfur atom, or a heteroaromatic group having 3 to 14 carbon atoms and containing at least one nitrogen atom, oxygen atom or sulfur atom, and these alicyclic groups, aromatic hydrocarbon groups and heteroaromatic groups may have an aliphatic hydrocarbon group having 1 to 9 carbon atoms or a halogen atom, R g and R h are each independently a hydrogen atom, -C(O)R i Group or the following L b ~L f Q 1 is as follows: b ~L g Q 2 is a hydrogen atom or the following L b ~L f Q 3 is a hydroxyl group or the following L b ~L f Either i is the following L b ~L f Either The resin composition according to [1].

[0020] [ka] [In formulae (AI) to (A-III), -* represents Y in formula (II). A indicates that the carbon atom is bonded to a single bond, In the formulas (BI) to (B-III), =** represents Y in the formula (II). D indicates that the carbon atom is double bonded to the carbon atom to which it is bonded, In formulae (AI) to (B-III), X independently represents an oxygen atom, a sulfur atom, a selenium atom, a tellurium atom, or -N(R 8 )-and R 1 ~R 6 each independently represents a hydrogen atom, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxy group, a phosphate group, -NR g R hGroup, -SR i Group, -SO2R i Group, -OSO2R i group, -C(O)R i Group or the following L b ~L i Either R 1 ~R 6 adjacent two of these may be bonded to each other to form a cyclic hydrocarbon group having 5 or 6 carbon atoms, R in formula (A-III) 1 or R 4 represents Y in the formula (II). A may be bonded to form a cyclic hydrocarbon group having 5 or 6 carbon atoms, R in formula (B-III) 1 or R 4 represents Y in the formula (II). D may be bonded to form a cyclic hydrocarbon group having 5 or 6 carbon atoms, R 8 is a hydrogen atom, a halogen atom, -C(O)R i Group L below b ~L i Either R g and R h are each independently a hydrogen atom, -C(O)R i Group or the following L b ~L f Either R i is the following L b ~L f Either (L b ): an aliphatic hydrocarbon group having 1 to 15 carbon atoms (L c ): Halogen-substituted alkyl group (L d ): Alicyclic hydrocarbon group (L e ): Aromatic hydrocarbon group (L f ): Heterocyclic group (L g ):-OR (R is a hydrocarbon group) (L h): an acyl group which may have a substituent L (L i ): an alkoxycarbonyl group which may have a substituent L The substituent L is b ~L f At least one selected from the following.

[0021] [3] The resin composition according to [1] or [2], wherein the compound (Z) satisfies the following requirement (A): Requirement (A): In a transmission spectrum measured using a solution of the compound (Z) dissolved in dichloromethane (wherein the transmission spectrum is a spectrum in which the transmittance at the absorption maximum wavelength is 10%), the average value of the transmittance of light having a wavelength of 430 to 580 nm is 70% or more.

[0022] [4] The resin composition according to any one of [1] to [3], wherein the compound (Z) satisfies the following requirements (C) and (D): Requirement (C): In a transmission spectrum measured using a solution in which the compound (Z) is dissolved in dichloromethane (provided that the transmission spectrum is a spectrum in which the transmittance at the absorption maximum wavelength is 10%), the compound (Z) has a wavelength in the range of 950 to 1150 nm in which the transmittance is 85%. Requirement (D): In a transmission spectrum measured using a solution of the compound (Z) dissolved in dichloromethane (wherein the transmission spectrum is a spectrum in which the transmittance at the maximum absorption wavelength is 10%), the absolute value of the difference between the shortest wavelength (Wa) at which the transmittance is 20% and the shortest wavelength (Wb) at which the transmittance is 70% is 10 to 60 nm in wavelengths longer than the maximum absorption wavelength.

[0023] [5] The resin composition according to any one of [1] to [4], wherein the resin is at least one resin selected from the group consisting of cyclic (poly)olefin-based resins, aromatic polyether-based resins, polyimide-based resins, polyester-based resins, polycarbonate-based resins, polyamide-based resins, polyarylate-based resins, polysulfone-based resins, polyethersulfone-based resins, polyparaphenylene-based resins, polyamideimide-based resins, polyethylene naphthalate-based resins, fluorinated aromatic polymer-based resins, (modified) acrylic-based resins, epoxy-based resins, allyl ester-based curable resins, silsesquioxane-based ultraviolet-curable resins, acrylic-based ultraviolet-curable resins, and vinyl-based ultraviolet-curable resins.

[0024] [6] An optical filter comprising a substrate (i) including a resin layer containing a compound (Z) formed from the resin composition according to any one of [1] to [5], and a dielectric multilayer film. [7] The substrate (i) a substrate comprising a resin layer containing the compound (Z); A substrate comprising two or more resin layers, at least one of which is a resin layer containing the compound (Z), or A substrate comprising a glass support and a resin layer containing the compound (Z). The optical filter according to [6],

[0025] [8] The optical filter according to [6] or [7], which is a near-infrared cut filter that satisfies the following characteristics (a) and (b): Characteristic (a): In the wavelength range of 430 to 580 nm, the average transmittance measured from the vertical direction of the optical filter is 75% or more. Characteristic (b): In the wavelength range of 850 to 1200 nm, the average transmittance measured from the vertical direction of the optical filter is 5% or less.

[0026] [9] The optical filter according to [6] or [7], which is a visible light / near infrared selective transmission filter that satisfies the following characteristics (c) and (d): Characteristic (c): In the wavelength range of 430 to 580 nm, the average transmittance measured from the vertical direction of the optical filter is 75% or more. Characteristic (d): In the wavelength region of 650 nm or more, it has a light blocking band Za, a light transmission band Zb, and a light blocking band Zc, and the center wavelength of each band is Za <Zb<Zcであり、 The minimum transmittances at Za and Zc as measured in the perpendicular direction of the optical filter are 15% or less, The maximum transmittance of the optical filter in Zb measured from the vertical direction is 55% or more.

[0027]

[10] The optical filter according to [6] or [7], which is a near-infrared transmitting filter that satisfies the following properties (e) and (f): Characteristic (e): In the wavelength range of 380 to 700 nm, the average transmittance measured from the vertical direction of the optical filter is 10% or less. Characteristic (f): A light transmission band Ya is present in a wavelength region of 750 nm or more, and the maximum transmittance (T IR ) is 45% or more

[0028]

[11] The optical filter according to any one of [6] to

[10] , which is for use in a solid-state imaging device.

[12] The optical filter according to any one of [6] to

[10] , which is for use in an optical sensor device.

[0029]

[13] A solid-state imaging device comprising the optical filter according to any one of [6] to

[10] .

[14] An optical sensor device comprising the optical filter according to any one of [6] to

[10] .

[0030]

[15] A compound (Z) represented by the following formula (I) and having an absorption maximum wavelength in the wavelength range of 850 to 1100 nm. Cn + An - (I) [In formula (I), Cn +is a monovalent cation represented by the following formula (II), and An - is a monovalent anion.

[0031] [ka] In formula (II), unit A is a group represented by any one of the following formulae (AI) to (A-III): Unit B is a group represented by any one of the following formulae (BI) to (B-III): Y A and Y D each independently represents a hydrogen atom, a halogen atom, or a hydrocarbon group having 1 to 8 carbon atoms, Z A ~Z C and Y B ~Y C each independently represents a hydrogen atom, a halogen atom, a hydroxyl group, a carboxyl group, a nitro group, -NR g R h group, amide group, imide group, cyano group, silyl group, -Q 1 , -N=NQ 1 , -SQ 2 , -SSQ 2 , or -SO2Q 3 and Z A ~Z C adjacent two of these may be bonded to each other to form an aromatic hydrocarbon group having 6 to 14 carbon atoms, a 5- to 6-membered alicyclic group which may contain at least one nitrogen atom, oxygen atom or sulfur atom, or a heteroaromatic group having 3 to 14 carbon atoms and containing at least one nitrogen atom, oxygen atom or sulfur atom, and these alicyclic groups, aromatic hydrocarbon groups and heteroaromatic groups may have an aliphatic hydrocarbon group having 1 to 9 carbon atoms or a halogen atom, Y B and Y Cmay be bonded to each other to form an aromatic hydrocarbon group having 6 to 14 carbon atoms, a 5- to 6-membered alicyclic group which may contain at least one nitrogen atom, oxygen atom or sulfur atom, or a heteroaromatic group having 3 to 14 carbon atoms and containing at least one nitrogen atom, oxygen atom or sulfur atom, and these alicyclic groups, aromatic hydrocarbon groups and heteroaromatic groups may have an aliphatic hydrocarbon group having 1 to 9 carbon atoms or a halogen atom, R g and R h are each independently a hydrogen atom, -C(O)R i Group or the following L b ~L f Q 1 is as follows: b ~L g Q 2 is a hydrogen atom or the following L b ~L f Q 3 is a hydroxyl group or the following L b ~L f Either i is the following L b ~L f Either Z B is a halogen atom or a group represented by any one of the following formulas (A-1) to (A-2), and Y B and Y C and R are bonded to each other to form a 5-membered alicyclic hydrocarbon group, and in the 5-membered alicyclic hydrocarbon group, Z B and all of the substituents other than the above are hydrogen atoms, the unit A is not a group represented by the following formula (A-3), and the unit B is not a group represented by the following formula (A-4), Z B is a chlorine atom, and Y B and Y C and R are bonded to each other to form a 6-membered alicyclic hydrocarbon group, and in the 6-membered alicyclic hydrocarbon group, Z B and all of the substituents other than the above are hydrogen atoms, the unit A is not a group represented by the following formula (A-5), and the unit B is not a group represented by the following formula (A-6), ZB is a group represented by the following formula (A-7), and Y B and Y C and R are bonded to each other to form a 5-membered alicyclic hydrocarbon group, and in the 5-membered alicyclic hydrocarbon group, Z B and all of the substituents other than the above are hydrogen atoms, unit A is not a group represented by the following formula (A-8), and unit B is not a group represented by the following formula (A-9).

[0032] [ka] [In formulae (AI) to (A-III), -* represents Y in formula (II). A indicates that the carbon atom is bonded to a single bond, In the formulas (BI) to (B-III), =** represents Y in the formula (II). D indicates that the carbon atom is double bonded to the carbon atom to which it is bonded, In formulae (AI) to (B-III), X independently represents an oxygen atom, a sulfur atom, a selenium atom, a tellurium atom, or -N(R 8 )-and R 1 ~R 6 each independently represents a hydrogen atom, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxy group, a phosphate group, -NR g R h Group, -SR i Group, -SO2R i Group, -OSO2R i group, -C(O)R i Group or the following L b ~L i Either R 1 ~R 6 adjacent two of these may be bonded to each other to form a cyclic hydrocarbon group having 5 or 6 carbon atoms, R in formula (A-III) 1 or R 4 represents Y in the formula (II). A may be bonded to form a cyclic hydrocarbon group having 5 or 6 carbon atoms, R in formula (B-III) 1 or R4 represents Y in the formula (II). D may be bonded to form a cyclic hydrocarbon group having 5 or 6 carbon atoms, R 8 is a hydrogen atom, a halogen atom, -C(O)R i Group L below b ~L i Either R g and R h are each independently a hydrogen atom, -C(O)R i Group or the following L b ~L f Either R i is the following L b ~L f Either (L b ): an aliphatic hydrocarbon group having 1 to 15 carbon atoms (L c ): Halogen-substituted alkyl group (L d ): Alicyclic hydrocarbon group (L e ): Aromatic hydrocarbon group (L f ): Heterocyclic group (L g ):-OR (R is a hydrocarbon group) (L h ): an acyl group which may have a substituent L (L i ): an alkoxycarbonyl group which may have a substituent L The substituent L is b ~L f At least one selected from the following.

[0033] [ka]

[0034] [ka] [In formulas (A-3) to (A-4), Y a1are independently substituted or unsubstituted alkyl groups having 8 to 20 carbon atoms, and -* in formula (A-3) represents Y in formula (II), A In formula (A-4), =** indicates that Y in formula (II) is bonded to a carbon atom to which it is bonded. D indicates that the carbon atom is double-bonded to the carbon atom to which it is bonded.

[0035] [ka] [In formulas (A-5) to (A-6), Y a2 is an n-butyl group, and -* in formula (A-5) represents Y in formula (II). A In formula (A-6), =** indicates that Y in formula (II) is bonded to a carbon atom to which it is bonded. D indicates that the carbon atom is double-bonded to the carbon atom to which it is bonded.

[0036] [ka] [In formula (A-7), Rx and Ry each independently represent a hydrogen atom, a methyl group, an ethyl group, a propyl group, an isopropyl group, an isopropenyl group, a 1-propenyl group, a 2-propenyl group, a 2-propynyl group, a butyl group, an isobutyl group, a sec-butyl group, a tert-butyl group, a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cyclohexenyl group, a cycloheptyl group, a cyclooctyl group, a phenyl group, an o-tolyl group, a m-tolyl group, a p-tolyl group, a xylyl group, a mesityl group, an o-cumenyl group, a m-cumenyl group, a p-cumenyl group, a biphenylyl group, a methoxy group, an ethoxy group, a propoxy group, a fluoro group, a chloro group, a bromo group, an iodo group, a cyano group, or a nitro group.]

[0037] [ka] [In formulas (A-8) to (A-9), Y a3 are independently a linear or branched alkyl group having 1 to 5 carbon atoms, and -* in formula (A-8) represents Y in formula (II). AIn formula (A-9), =** indicates that the Y in formula (II) is bonded to a carbon atom to which the Y is bonded. D indicates that the carbon atom is double-bonded to the carbon atom to which it is bonded. Effect of the Invention

[0038] According to one embodiment of the present invention, it is possible to provide a resin composition that can sufficiently cut light having a wavelength of 850 nm or more in the near infrared region to be cut with a sharp absorption waveform while suppressing a decrease in visible light transmittance and has sufficient resistance (durability) against heat and ultraviolet rays. Furthermore, according to one embodiment of the present invention, it is possible to provide an optical filter having these properties. In the present invention, having sufficient resistance to heat and ultraviolet light means that the optical properties do not change significantly before and after application of heat or irradiation with ultraviolet light.

[0039] Furthermore, as described in Patent Document 2, diimonium dyes exhibit a wide range of absorption characteristics in the near-infrared region, and therefore, when attempting to form, for example, a visible light-near-infrared selective transmission filter (DBPF) or a near-infrared transmission filter (IRPF) using a diimonium dye, it is not easy to transmit only near-infrared light of a desired wavelength. Furthermore, for example, polymethine dyes have sharp absorption peaks in the near infrared region, but these conventional dyes have poor durability, so their use has been limited.

[0040] On the other hand, the compound (Z) used in one embodiment of the present invention not only has sharp absorption in the wavelength region of 850 nm or more, but also has excellent durability. Therefore, according to one embodiment of the present invention, not only near-infrared cut filters (NIR-CFs) but also optical filters such as DBPFs and IRPFs can be easily produced. [Brief description of the drawings]

[0041] [Figure 1] FIG. 1 is a diagram showing the spectral characteristics of the substrate obtained in Example 1. [Diagram 2]FIG. 2 is a diagram showing the spectral characteristics of the optical filter obtained in Example 1. [Diagram 3] FIG. 3 is a diagram showing the spectral characteristics of the substrate obtained in Comparative Example 2. [Figure 4] FIG. 4 is a diagram showing the spectral characteristics of the optical filter obtained in Comparative Example 2. As shown in FIG. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0042] ≪Resin composition≫ The resin composition according to one embodiment of the present invention (hereinafter also referred to as "the composition") is not particularly limited as long as it contains a resin and the compound (Z). Examples of the form of such a resin composition include a resin film (resin layer, resin substrate) containing compound (Z); a resin film (resin layer) containing compound (Z) formed on a support (e.g., resin support, glass support); and a liquid composition containing a resin, compound (Z) and a solvent. The present composition may contain two or more types of resins, and may contain two or more types of compounds (Z).

[0043] <Compound (Z)> Compound (Z) contained in the present composition and compound (Z) according to one embodiment of the present invention are represented by the following formula (I) and have a maximum absorption wavelength in the wavelength range of 850 to 1100 nm. Such compound (Z) has high near-infrared cut performance and high visible light transmittance near the absorption maximum at wavelengths of 850 nm or more, and has sufficient resistance to heat and ultraviolet rays. In addition, the compound (Z) has a sharp absorption peak (sharp absorption waveform). Cn + An - (I) [In formula (I), Cn + is a monovalent cation represented by the following formula (II), and An - is a monovalent anion.

[0044] [ka] [In formula (II), Y A and Y D each independently represents a group having at least one atom selected from a carbon atom, a sulfur atom, an oxygen atom, a nitrogen atom and a phosphorus atom, a hydrogen atom or a halogen atom, Z A ~Z C and Y B ~Y C each independently represents a group having at least one atom selected from a carbon atom, a sulfur atom, an oxygen atom, a nitrogen atom, a phosphorus atom, and a silicon atom, a hydrogen atom, or a halogen atom, or Z A ~Z C adjacent two of Y may be bonded to each other to form a ring; B and Y C may be bonded to each other to form a ring, Unit A and unit B each independently represent a group having a heteroaromatic ring, Some of the groups in unit A are Y A and may be bonded to form a cyclic hydrocarbon group having 5 or 6 carbon atoms, and some of the groups in the unit B may be bonded to Y D may be bonded to form a cyclic hydrocarbon group having 5 or 6 carbon atoms, Z B is a halogen atom or a group represented by any one of the following formulas (A-1) to (A-2), and Y B and Y C and R are bonded to each other to form a 5-membered alicyclic hydrocarbon group, and in the 5-membered alicyclic hydrocarbon group, Z B and all of the substituents other than the above are hydrogen atoms, the unit A is not a group represented by the following formula (A-3), and the unit B is not a group represented by the following formula (A-4), Z B is a chlorine atom, and Y B and Y C and R are bonded to each other to form a 6-membered alicyclic hydrocarbon group, and in the 6-membered alicyclic hydrocarbon group, Z Band all of the substituents other than the above are hydrogen atoms, the unit A is not a group represented by the following formula (A-5), and the unit B is not a group represented by the following formula (A-6), Z B is a group represented by the following formula (A-7), and Y B and Y C and R are bonded to each other to form a 5-membered alicyclic hydrocarbon group, and in the 5-membered alicyclic hydrocarbon group, Z B and all of the substituents other than the above are hydrogen atoms, unit A is not a group represented by the following formula (A-8), and unit B is not a group represented by the following formula (A-9).

[0045] [ka]

[0046] [ka] [In formulas (A-3) to (A-4), Y a1 are independently substituted or unsubstituted alkyl groups having 8 to 20 carbon atoms, and -* in formula (A-3) represents Y in formula (II), A In formula (A-4), =** indicates that Y in formula (II) is bonded to a carbon atom to which it is bonded. D indicates that the carbon atom is double-bonded to the carbon atom to which it is bonded.

[0047] [ka] [In formulas (A-5) to (A-6), Y a2 is an n-butyl group, and -* in formula (A-5) represents Y in formula (II). A In formula (A-6), =** indicates that Y in formula (II) is bonded to a carbon atom to which it is bonded. D indicates that the carbon atom is double-bonded to the carbon atom to which it is bonded.

[0048] [ka] [In formula (A-7), Rx and Ry each independently represent a hydrogen atom, a methyl group, an ethyl group, a propyl group, an isopropyl group, an isopropenyl group, a 1-propenyl group, a 2-propenyl group, a 2-propynyl group, a butyl group, an isobutyl group, a sec-butyl group, a tert-butyl group, a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cyclohexenyl group, a cycloheptyl group, a cyclooctyl group, a phenyl group, an o-tolyl group, a m-tolyl group, a p-tolyl group, a xylyl group, a mesityl group, an o-cumenyl group, a m-cumenyl group, a p-cumenyl group, a biphenylyl group, a methoxy group, an ethoxy group, a propoxy group, a fluoro group, a chloro group, a bromo group, an iodo group, a cyano group, or a nitro group.]

[0049] [ka] [In formulas (A-8) to (A-9), Y a3 are independently a linear or branched alkyl group having 1 to 5 carbon atoms, and -* in formula (A-8) represents Y in formula (II). A In formula (A-9), =** indicates that the Y in formula (II) is bonded to a carbon atom to which the Y is bonded. D indicates that the carbon atom is double-bonded to the carbon atom to which it is bonded.

[0050] The unit A is preferably a group represented by any one of the following formulae (AI) to (A-III), and the unit B is preferably a group represented by any one of the following formulae (BI) to (B-III).

[0051] [ka] [In formulae (AI) to (A-III), -* represents Y in formula (II). A indicates that the carbon atom is bonded to a single bond, In the formulas (BI) to (B-III), =** represents Y in the formula (II). D indicates that the carbon atom is double bonded to the carbon atom to which it is bonded, In formulae (AI) to (B-III), X independently represents an oxygen atom, a sulfur atom, a selenium atom, a tellurium atom, or -N(R 8 )-and R 1 ~R 6 each independently represents a hydrogen atom, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxy group, a phosphate group, -NR g R h Group, -SR i Group, -SO2R i Group, -OSO2R i group, -C(O)R i Group or the following L b ~L i Either R 1 ~R 6 adjacent two of these may be bonded to each other to form a cyclic hydrocarbon group having 5 or 6 carbon atoms, R in formula (A-III) 1 or R 4 represents Y in the formula (II). A may be bonded to form a cyclic hydrocarbon group having 5 or 6 carbon atoms, R in formula (B-III) 1 or R 4 represents Y in the formula (II). D may be bonded to form a cyclic hydrocarbon group having 5 or 6 carbon atoms, R 8 is a hydrogen atom, a halogen atom, -C(O)R i Group L below b ~L i Either R g and R h are each independently a hydrogen atom, -C(O)R i Group or the following L b ~L f Either R i is the following L b ~L f Either (L b ): an aliphatic hydrocarbon group having 1 to 15 carbon atoms (L c): Halogen-substituted alkyl group (L d ): Alicyclic hydrocarbon group (L e ): Aromatic hydrocarbon group (L f ): Heterocyclic group (L g ):-OR (R is a hydrocarbon group) (L h ): an acyl group which may have a substituent L (L i ): an alkoxycarbonyl group which may have a substituent L The substituent L is b ~L f At least one selected from the following.

[0052] In addition, the above-mentioned -N(R 8 )- is a group represented by the following formula (a), g R h The -SR group is a group represented by the following formula (b): i The -SO2R group is a group represented by the following formula (c): i The -OSO2R group is a group represented by the following formula (d): i The -C(O)R group is a group represented by the following formula (e): i The group is a group represented by the following formula (f):

[0053] [ka]

[0054] In addition, when the unit A is the formula (AI) and the unit B is the formula (BI), Cn + is represented by the following formula (II-1). That is, the single bond (-) of "*-" in the formulas (AI) to (A-III) is A corresponds to a single bond between the carbon atom to which Y is bonded and unit A, and the double bond (=) of "**=" in the formulas (BI) to (B-III) corresponds to a single bond between the carbon atom to which Y is bonded and unit A in the formula (II). D corresponds to the double bond between the carbon atom to which it is attached and unit B.

[0055] [ka]

[0056] The above "Some groups in unit A are Y A The phrase "may be bonded to form a cyclic hydrocarbon group having 5 or 6 carbon atoms" preferably refers to R 1 or R 4 In the formula (II), Y A may be bonded to form a cyclic hydrocarbon group having 5 or 6 carbon atoms, The above "Some groups in unit B are Y D The phrase "may be bonded to form a cyclic hydrocarbon group having 5 or 6 carbon atoms" preferably refers to R 1 or R 4 In the formula (II), Y D and may be bonded to form a cyclic hydrocarbon group having 5 or 6 carbon atoms.

[0057] The above Y A and Y D are each independently preferably a hydrogen atom, a halogen atom, or a hydrocarbon group having 1 to 8 carbon atoms, more preferably a hydrogen atom, a chlorine atom, a fluorine atom, a bromine atom, a methyl group (Me), an ethyl group (Et), an n-propyl group (n-Pr), an isopropyl group (i-Pr), an n-butyl group (n-Bu), a sec-butyl group, a tert-butyl group (t-Bu), a cyclohexyl group, or a phenyl group (Ph), still more preferably a hydrogen atom, a chlorine atom, a fluorine atom, a bromine atom, a methyl group, an ethyl group, an n-propyl group, or an isopropyl group, and particularly preferably a hydrogen atom, a chlorine atom, a fluorine atom, a bromine atom, a methyl group, or an ethyl group.

[0058] The above Y B and Y C are each independently preferably a hydrogen atom, a halogen atom, a hydroxyl group, a carboxy group, a nitro group, -NR g R hgroup, amide group, imide group, cyano group, silyl group, -Q 1 , -N=NQ 1 , -SQ 2 , -SSQ 2 , -SO2Q 3 , or Y B and Y C may be bonded to each other to form an aromatic hydrocarbon group having 6 to 14 carbon atoms; a 5- to 6-membered alicyclic group which may contain at least one nitrogen atom, oxygen atom or sulfur atom; or a heteroaromatic group having 3 to 14 carbon atoms and containing at least one nitrogen atom, oxygen atom or sulfur atom; and these alicyclic groups, aromatic hydrocarbon groups and heteroaromatic groups may have an aliphatic hydrocarbon group having 1 to 9 carbon atoms or a halogen atom, R g and R h are each independently a hydrogen atom, -C(O)R i Group or the L b ~L f Q 1 The L b ~L g Q 2 is a hydrogen atom or the L b ~L f Q 3 is a hydroxyl group or the L b ~L f Either i is the above L b ~L f Either:

[0059] -SSQ 2 Ha-SSQ 2 The -SOQ 3 In the group represented by formula (d), R i Q 3 This is a group replaced by

[0060] The above Y B and Y Care each independently preferably a hydrogen atom, a chlorine atom, a fluorine atom, a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, a sec-butyl group, a tert-butyl group, B and Y C a 5- or 6-membered alicyclic hydrocarbon group formed by mutually bonding (the alicyclic hydrocarbon group is a group having a substituent R selected from a hydrogen atom, an aliphatic hydrocarbon group having 1 to 9 carbon atoms, and a halogen atom); 9 ) is particularly preferably a hydrogen atom, a methyl group, a tert-butyl group, Y B and Y C A five-membered alicyclic hydrocarbon group formed by bonding together, Y B and Y C The substituent R formed by bonding 9 is a 6-membered alicyclic hydrocarbon group having the formula: In addition, Y B and Y C When Y is a 5- or 6-membered alicyclic hydrocarbon group formed by bonding with each other, the formula (II) can be preferably represented by the following formula (CI) or (C-II). B and Y C When they are bonded to each other to form a structure represented by the following formula (CI), Y B Enter CI in the column. B and Y C The same applies to the case where they are bonded to each other to form a structure represented by the following formula (C-II). In addition, in the above-mentioned "5-membered alicyclic hydrocarbon group, Z B The term "wherein all the substituents other than Z are hydrogen atoms" refers to the case represented by the following formula (C-II), and B The term "wherein all the substituents other than R are hydrogen atoms" refers to the following formula (CI): 9 is represented by a hydrogen atom.

[0061] [ka]

[0062] In formula (CI), R 9 is preferably a hydrogen atom, a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, a sec-butyl group, a tert-butyl group, or a cyclohexyl group, and more preferably a hydrogen atom, a methyl group, an ethyl group, or a tert-butyl group.

[0063] [ka]

[0064] Said Z A ~Z C are each independently preferably a hydrogen atom, a halogen atom, a hydroxyl group, a carboxy group, a nitro group, -NR g R h group, amide group, imide group, cyano group, silyl group, -Q 1 , -N=NQ 1 , -SQ 2 , -SSQ 2 , -SO2Q 3 , or Z A ~Z C adjacent two of the above may be bonded to each other to form an aromatic hydrocarbon group having 6 to 14 carbon atoms; a 5- to 6-membered alicyclic group which may contain at least one nitrogen atom, oxygen atom or sulfur atom; or a heteroaromatic group having 3 to 14 carbon atoms and containing at least one nitrogen atom, oxygen atom or sulfur atom; and these alicyclic groups, aromatic hydrocarbon groups and heteroaromatic groups may have an aliphatic hydrocarbon group having 1 to 9 carbon atoms or a halogen atom, R g and R h are each independently a hydrogen atom, -C(O)R i Group or the L b ~L f Q 1 The L b ~L g Q 2 is a hydrogen atom or the L b ~L f Q 3 is a hydroxyl group or the L b ~Lf Either i is the above L b ~L f Either:

[0065] Said Z A and Z C are each independently more preferably a hydrogen atom. Said Z B is more preferably a hydrogen atom, a chlorine atom, a dimethylamino group, a diethylamino group, a dibutylamino group, a diphenylamino group (NPh2), a methylphenylamino group, a methyl group, a phenyl group, a 4-methylphenoxy group (O-(4-tolyl)), -S-(4-tolyl )、 These are 2-pyridyl, 3-pyridyl, 4-pyridyl, 2-furyl, 3-furyl, 2-thienyl, and 3-thienyl.

[0066] Said L b is preferably a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, a sec-butyl group, a tert-butyl group, a pentyl group (Pent), a hexyl group (Hex), a 1,1-dimethylbutyl group, an octyl group (Oct), a nonyl group, a decyl group, or a dodecyl group, and more preferably a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, a sec-butyl group, a tert-butyl group, a pentyl group, a hexyl group, a 1,1-dimethylbutyl group, or an octyl group.

[0067] Said L b may be an alkenyl group such as a vinyl group, a 1-propenyl group, a 2-propenyl group, a butenyl group, a 1,3-butadienyl group, a 2-methyl-1-propenyl group, a 2-pentenyl group, or a hexenyl group; or an alkynyl group such as an ethynyl group, a propynyl group, a butynyl group, a 2-methyl-1-propynyl group, or a hexynyl group.

[0068] Said L cExamples of the halogen-substituted alkyl group in the formula (I) include alkyl groups having 1 to 15 carbon atoms in which at least one hydrogen atom is substituted with a halogen atom, and preferred examples include a trichloromethyl group, a trifluoromethyl group, a 1,1-dichloroethyl group, a pentachloroethyl group, a pentafluoroethyl group, a heptachloropropyl group, and a heptafluoropropyl group.

[0069] Said L d Examples of the alicyclic hydrocarbon group in include alicyclic hydrocarbon groups having 3 to 14 carbon atoms, and preferred examples include cycloalkyl groups such as a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a 4-pentylcyclohexyl group, a cycloheptyl group, and a cyclooctyl group; and polycyclic alicyclic groups such as a norbornane group, an adamantyl group, and a 1-adamantylmethyl group.

[0070] Said L e Examples of the aromatic hydrocarbon group in include aromatic hydrocarbon groups having 6 to 14 carbon atoms, and preferred are a phenyl group, a tolyl group, a xylyl group, a mesityl group, a cumenyl group, a 1-naphthyl group, a 2-naphthyl group, an anthracenyl group, a phenanthryl group, and a benzyl group (CHPh).

[0071] Said L f Examples of the heterocyclic group in the formula (I) include heterocyclic groups having 3 to 14 carbon atoms, and preferred are furan, thiophene, pyrrole, indole, indoline, indolenine, benzofuran, benzothiophene, morpholine, and pyridine.

[0072] Said L g In the above formula, examples of the hydrocarbon group (R) include hydrocarbon groups having 1 to 12 carbon atoms, and -OR is preferably a methoxy group (OMe), an ethoxy group, a propoxy group, an isopropoxy group, a butoxy group (OBu), a methoxymethyl group, a methoxyethyl group, a pentyloxy group, a hexyloxy group, an octyloxy group, a phenoxy group, a 4-methylphenoxy group, or a cyclohexyloxy group.

[0073] Said Lh Examples of the acyl group which may have a substituent L in the above formula include acyl groups having 1 to 9 carbon atoms, and preferred examples include an acetyl group, a propionyl group, a butyryl group, an isobutyryl group, a benzoyl group, a 4-propylbenzoyl group, and a trifluoromethylcarbonyl group.

[0074] Said L i Examples of the alkoxycarbonyl group which may have a substituent L in the formula (I) include an alkoxycarbonyl group having 1 to 9 carbon atoms, and preferred examples include a methoxycarbonyl group, an ethoxycarbonyl group, a propoxycarbonyl group, an isopropoxycarbonyl group, a butoxycarbonyl group, a 2-trifluoromethylethoxycarbonyl group, and a 2-phenylethoxycarbonyl group.

[0075] The X is preferably an oxygen atom, a sulfur atom, or -N(R 8 )-, and when the unit A or B is represented by the formula (AI), (A-III), (BI) or (B-III), it is particularly preferably an oxygen atom or a sulfur atom, and when the unit A or B is represented by the formula (A-II) or (B-II), it is particularly preferably -N(R 8 )-.

[0076] In formula (II), the left and right units A and B may be the same or different, but it is preferred that they are the same for ease of synthesis. Here, the combinations in which the units A and B are the same are those of formula (AI) and formula (BI), formula (A-II) and formula (B-II), and formula (A-III) and formula (B-III).

[0077] R 1 ~R 6are each independently preferably a hydrogen atom, a chlorine atom, a fluorine atom, a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, a sec-butyl group, a tert-butyl group, a cyclohexyl group, a 1,1-dimethylbutyl group, a 1-adamantyl group, a 1-adamantylmethyl group, a 4-pentylcyclohexyl group, a phenyl group, a hydroxyl group, an amino group, a dimethylamino group, a diethylamino group (NEt2), a dibutylamino group (NBu2), a cyano group, a nitro group, an acetylamino group, a propionylamino group, an N-methylacetylamino group, a trifluoromethanoylamino group, a pentafluoroethanoylamino group, a tert-butanoylamino group, a cyclohexynoylamino group, an n-butylsulfonyl group, a benzyl group, a diphenylmethyl group, a trifluoromethyl group, a difluoromethyl group, or a methoxy group. ,workman and more preferably a hydrogen atom, a chlorine atom, a fluorine atom, a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, a sec-butyl group, a tert-butyl group, a cyclohexyl group, a 1,1-dimethylbutyl group, a 1-adamantyl group, a 1-adamantylmethyl group, a 4-pentylcyclohexyl group, a phenyl group, an amino group, a dimethylamino group, a diethylamino group, a dibutylamino group, a benzyl group, a diphenylmethyl group, a trifluoromethyl group, a difluoromethyl group, a methoxy group, or a butoxy group. Also, R 1 ~R 6 Adjacent two of these may be bonded to each other to form a cyclic hydrocarbon group having 5 or 6 carbon atoms.

[0078] R 8 is preferably a hydrogen atom, a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an n-octyl group, a benzyl group, an n-pentyl group, an n-hexyl group, or a tert-butyl group, and more preferably a hydrogen atom, a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an n-octyl group, an n-hexyl group, or a benzyl group.

[0079] The above-mentioned An -There is no particular limitation on the monovalent anion, but preferably, the anion is a chloride ion, a bromide ion, an iodide ion, or a PF4 - , perchlorate anion, tristrifluoromethanesulfonylmethide anion, tetrafluoroborate anion, hexafluorophosphate anion, bis(trifluoromethanesulfonyl)imide anion, trifluoromethanesulfonate anion, tetrakis(pentafluorophenyl)borate anion, tetrakis(3,5-bis(trifluoromethyl)phenyl)borate anion, and the like. More preferred are bis(trifluoromethanesulfonyl)imide anion, trifluoromethanesulfonate anion, tristrifluoromethanesulfonylmethide anion, tetrakis(pentafluorophenyl)borate anion, and the like. Among these, the tetrakis(pentafluorophenyl)borate anion and the tetrakis(3,5-bis(trifluoromethyl)phenyl)borate anion are more preferable, and from the viewpoint of being able to easily obtain a compound (Z) having superior heat resistance, the bis(trifluoromethanesulfonyl)imide anion, the tristrifluoromethanesulfonylmethide anion, the tetrakis(pentafluorophenyl)borate anion and the tetrakis(3,5-bis(trifluoromethyl)phenyl)borate anion are more preferable, and the tetrakis(pentafluorophenyl)borate anion is particularly preferable.

[0080] Specific examples of the compound represented by formula (I) include compounds (z-1) to (z-368) shown in Tables 1 to 7 below. Specifically, these compounds (Z) can be synthesized, for example, by the methods described in the following examples.

[0081] [Table 1]

[0082] [Table 2]

[0083] [Table 3]

[0084] [Table 4]

[0085] [Table 5]

[0086] [Table 6]

[0087] [Table 7]

[0088] Compound (Z) is preferably a compound soluble in an organic solvent, and particularly preferably a compound soluble in dichloromethane. Here, "soluble in an organic solvent" refers to the case where 0.1 g or more of compound (Z) dissolves in 100 g of an organic solvent at 25°C.

[0089] The compound (Z) is preferably a compound that satisfies the following requirement (A). Requirement (A): In a transmission spectrum (wherein the transmission spectrum is a spectrum in which the transmittance at the absorption maximum wavelength is 10%. Hereinafter, this transmission spectrum is also referred to as "the transmission spectrum of compound (Z)") measured using a solution in which compound (Z) is dissolved in dichloromethane, the average transmittance of light at wavelengths of 430 to 580 nm is preferably 70% or more, more preferably 85% or more, even more preferably 90% or more, and particularly preferably 93.0% or more. Since a higher average transmittance is preferable, the upper limit is not particularly limited and may be 100%. When the compound (Z) satisfies the requirement (A), it is possible to sufficiently block light having a wavelength in the near-infrared region that is desired to be blocked, while further suppressing a decrease in the visible light transmittance.

[0090] In the present invention, the average transmittance for wavelengths A to B nm is a value calculated by measuring the transmittance at each wavelength from Anm to B nm in 1 nm increments and dividing the sum of the transmittances by the number of measured transmittances (wavelength range, B-A+1).

[0091] The compound (Z) is characterized by satisfying the following requirement (B). Requirement (B): The absorption maximum wavelength is in the range of 850 to 1100 nm. The absorption maximum wavelength of the compound (Z) is preferably 855 to 1095 nm, and more preferably 860 to 1090 nm. The maximum absorption wavelength refers to the wavelength at which the transmittance value is smallest in a transmission spectrum measured using a solution of compound (Z) dissolved in dichloromethane. By the absorption maximum wavelength of the compound (Z) being within the above range, an optical filter having high light blocking ability even in the relatively long wavelength region (wavelength region of 850 nm or more) of near infrared rays can be easily obtained. In particular, an optical filter having an optical density (OD value) of about 4 or more in the wavelength region of 900 nm or more, specifically, in the wavelength region of 940 nm, can be easily obtained.

[0092] The compound (Z) is preferably a compound that satisfies the following requirement (C). Requirement (C): In the transmission spectrum of compound (Z), it is preferable that the compound (Z) has a wavelength within the wavelength range of 950 to 1150 nm at which the transmittance is 85%, and it is more preferable that the compound (Z) has a wavelength within the wavelength range of 950 to 1150 nm at which the transmittance is 90%. Compound (Z) having a maximum absorption wavelength in the above range and satisfying requirement (C) has a sharp absorption peak. Therefore, by using such compound (Z), it is possible to easily prepare not only an NIR-CF that can sufficiently cut light having a wavelength in the near-infrared region that is to be cut, but also optical filters such as DBPF and IRPF that transmit near-infrared light of a desired wavelength that is to be transmitted.

[0093] The compound (Z) is preferably a compound that satisfies the following requirement (D). Requirement (D): Among wavelengths longer than the maximum absorption wavelength in the transmission spectrum of compound (Z), the absolute value of the difference between the shortest wavelength (Wa) at which the transmittance is 20% and the shortest wavelength (Wb) at which the transmittance is 70% is preferably 10 to 60 nm, more preferably 15 to 58 nm, and particularly preferably 20 to 56 nm. The fact that compound (Z) satisfies this requirement (D) indicates that the absorption peak of compound (Z) is sharp. By using compound (Z) that satisfies this requirement (D), it is possible to easily produce not only NIR-CFs that can sufficiently cut light in the near-infrared region that you want to cut, but also optical filters such as DBPFs and IRPFs that transmit near-infrared light of the desired wavelength.

[0094] The content of compound (Z) in the present composition is preferably 0.02 to 1.0 part by mass, more preferably 0.02 to 0.80 parts by mass, and particularly preferably 0.03 to 0.60 parts by mass, relative to 100 parts by mass of the resin. When the content of compound (Z) is within the above range, near infrared rays in the wavelength range of 850 to 1100 nm can be efficiently blocked, and a composition having excellent visible light transmittance can be easily obtained.

[0095] <Resin> The resin used in the present composition is not particularly limited, and any conventionally known resin can be used. The resin used in the present composition may be one type alone or two or more types.

[0096] The resin is not particularly limited as long as it does not impair the effects of the present invention, but examples thereof include resins having a glass transition temperature (Tg) of preferably 110 to 380° C., more preferably 110 to 370° C., and particularly preferably 120 to 360° C., from the viewpoints of being excellent in thermal stability and moldability into a film (plate) shape, and being able to easily obtain a film capable of forming a dielectric multilayer film by high-temperature deposition at a deposition temperature of about 100° C. or higher. Furthermore, resins having a Tg of 140° C. or higher are particularly preferred, since a film capable of forming a dielectric multilayer film by deposition at a higher temperature can be obtained.

[0097] The resin that can be used is one that provides a total light transmittance (JIS K 7375:2008) of a 0.1 mm-thick resin plate made of the resin of interest of preferably 75 to 95%, more preferably 78 to 95%, and particularly preferably 80 to 95%. By using a resin having a total light transmittance within the above range, a resin composition or optical filter having excellent transparency can be easily obtained.

[0098] The resin has a polystyrene-equivalent weight average molecular weight (Mw) of usually 15,000 to 350,000, preferably 30,000 to 250,000, and a number average molecular weight (Mn) of usually 10,000 to 150,000, preferably 20,000 to 100,000, as measured by gel permeation chromatography (GPC).

[0099] Examples of the resin include cyclic (poly)olefin resins, aromatic polyether resins, polyimide resins, polyester resins, polycarbonate resins, polyamide (aramid) resins, polyarylate resins, polysulfone resins, polyethersulfone resins, polyparaphenylene resins, polyamideimide resins, polyethylene naphthalate (PEN) resins, fluorinated aromatic polymer resins, (modified) acrylic resins, epoxy resins, allyl ester curable resins, silsesquioxane ultraviolet curable resins, acrylic ultraviolet curable resins, and vinyl ultraviolet curable resins.

[0100] [Cyclic (poly)olefin resin] As the cyclic (poly)olefin resin, a resin obtained by using at least one monomer selected from the group consisting of a monomer represented by the following formula (X0) and a monomer represented by the following formula (Y0), and a resin obtained by hydrogenating the resin are preferred.

[0101] [ka]

[0102] In formula (X0), R x1 ~R x4 each independently represents an atom or group selected from the following (i') to (ix'), x , m x and p x each independently represents an integer of 0 to 4. (i') Hydrogen atom (ii') Halogen atom (iii') trialkylsilyl group (iv') a substituted or unsubstituted hydrocarbon group having 1 to 30 carbon atoms and having a linking group containing an oxygen atom, a sulfur atom, a nitrogen atom or a silicon atom. (v') a substituted or unsubstituted hydrocarbon group having 1 to 30 carbon atoms (vi') Polar groups (excluding (ii') and (iv')). (vii')R x1 and R x2 or R x3 and R x4 and R which are bonded to each other to form an alkylidene group (provided that R x1 ~R x4 each independently represents an atom or group selected from (i') to (vi'). (viii')R x1 and R x2 or R x3 and R x4 and R are bonded to each other to form a monocyclic or polycyclic hydrocarbon ring or a heterocyclic ring (provided that R x1 ~R x4each independently represents an atom or group selected from (i') to (vi'). (ix')R x2 and R x3 and R are bonded to each other to form a monocyclic hydrocarbon ring or heterocyclic ring (provided that R x1 and R x4 each independently represents an atom or group selected from (i') to (vi').

[0103] [ka]

[0104] In formula (Y0), R y1 and R y2 each independently represents an atom or group selected from (i') to (vi') above, or R y1 and R y2 and represent a monocyclic or polycyclic alicyclic hydrocarbon, aromatic hydrocarbon, or heterocycle formed by bonding with each other, and k y and p y each independently represents an integer of 0 to 4.

[0105] [Aromatic polyether resin] The aromatic polyether resin preferably has at least one structural unit selected from the group consisting of a structural unit represented by the following formula (1) and a structural unit represented by the following formula (2).

[0106] [ka]

[0107] In formula (1), R 1 ~R 4 each independently represents a monovalent organic group having 1 to 12 carbon atoms, and a to d each independently represent an integer of 0 to 4.

[0108] [ka]

[0109] In formula (2), R 1 ~R 4 and a to d each independently represent R in formula (1). 1 ~R 4 and a to d, Y represents a single bond, -SO2- or -CO-, R 7 and R 8 each independently represents a halogen atom, a monovalent organic group having 1 to 12 carbon atoms, or a nitro group; g and h each independently represent an integer of 0 to 4; and m represents 0 or 1. However, when m is 0, R 7 is not a cyano group.

[0110] The aromatic polyether resin may further have at least one structural unit selected from the group consisting of a structural unit represented by the following formula (3) and a structural unit represented by the following formula (4).

[0111] [ka]

[0112] In formula (3), R 5 and R 6 each independently represents a monovalent organic group having 1 to 12 carbon atoms; Z represents a single bond, -O-, -S-, -SO2-, -CO-, -CONH-, -COO- or a divalent organic group having 1 to 12 carbon atoms; e and f each independently represent an integer of 0 to 4; and n represents 0 or 1.

[0113] [ka]

[0114] In formula (4), R 7 , R 8 , Y, m, g and h each independently represent R 7 , R 8 , Y, m, g and h; R 5 , R 6, Z, n, e and f each independently represent R 5 , R 6 , Z, n, e and f.

[0115] [Polyimide resin] The polyimide resin is not particularly limited, and may be any polymeric compound containing imide bonds in the repeating unit, and may be synthesized by the methods described in, for example, JP-A-2006-199945 and JP-A-2008-163107.

[0116] [Polyester resin] The polyester resin is not particularly limited, and can be synthesized, for example, by the method described in JP-A-2010-285505 or JP-A-2011-197450.

[0117] [Polycarbonate resin] The polycarbonate-based resin is not particularly limited, and can be synthesized, for example, by the method described in JP-A-2008-163194.

[0118] [Fluorinated aromatic polymer resin] The fluorinated aromatic polymer resin is not particularly limited, but is preferably a polymer containing an aromatic ring having at least one fluorine atom and a repeating unit containing at least one bond selected from the group consisting of an ether bond, a ketone bond, a sulfone bond, an amide bond, an imide bond and an ester bond, and can be synthesized, for example, by the method described in JP-A-2008-181121.

[0119] [UV-curable acrylic resin] The acrylic ultraviolet-curable resin is not particularly limited, but examples thereof include those synthesized from a resin composition containing a compound having one or more acrylic or methacrylic groups in the molecule and a compound that decomposes when exposed to ultraviolet light to generate active radicals. The acrylic ultraviolet-curable resin can be suitably used as a curable resin that can be used when forming a resin layer such as the main resin layer described below or the overcoat layer described below.

[0120] [Commercially available products] Examples of commercially available products of the resin include the following commercially available products. Examples of commercially available products of cyclic (poly)olefin resins include Arton manufactured by JSR Corporation, Zeonor manufactured by Nippon Zeon Co., Ltd., APEL manufactured by Mitsui Chemicals, Inc., and TOPAS manufactured by Polyplastics Co., Ltd. Examples of commercially available products of polyethersulfone resins include Sumikaexcel PES manufactured by Sumitomo Chemical Co., Ltd. Examples of commercially available products of polyimide resins include Neoprim L manufactured by Mitsubishi Gas Chemical Co., Ltd. Examples of commercially available products of polycarbonate resins include PureAce manufactured by Teijin Co., Ltd., Panlite SP-3810 manufactured by Teijin Co., Ltd., and Iupizeta EP-5000 manufactured by Mitsubishi Gas Chemical Co., Ltd. Examples of commercially available products of fluorene polyester resins include OKP4HT manufactured by Osaka Gas Chemical Co., Ltd. Examples of commercially available products of acrylic resins include Acriview manufactured by Nippon Shokubai Co., Ltd. An example of a commercially available silsesquioxane-based ultraviolet-curable resin is Silplus manufactured by Nippon Steel Chemical & Material Corporation.

[0121] <Other ingredients> The present composition may further contain other components such as a compound (X) other than the compound (Z) [an absorber other than an ultraviolet absorber], an antioxidant, an ultraviolet absorber, a fluorescence quencher, and a metal complex compound, within the scope of not impairing the effects of the present invention. Each of these other components may be used alone or in combination of two or more.

[0122] These other components may be mixed with the resin when preparing the composition, or may be added when synthesizing the resin. The amount of the other components added may be appropriately selected depending on the desired properties, etc., but is usually 0.01 to 5.0 parts by mass, and preferably 0.05 to 2.0 parts by mass, relative to 100 parts by mass of the resin.

[0123] [Compound (X)] The present composition may contain one or more compounds (X) [absorbing agents other than ultraviolet absorbing agents] other than the compound (Z). Examples of the compound (X) include squarylium-based compounds, phthalocyanine-based compounds, polymethine-based compounds, naphthalocyanine-based compounds, croconium-based compounds, octaphylline-based compounds, diimonium-based compounds, perylene-based compounds, and metal dithiolate-based compounds.

[0124] The compound (X) preferably includes a squarylium-based compound, and more preferably includes one or more squarylium-based compounds and one or more other compounds (X'). The other compounds (X') are particularly preferably phthalocyanine-based compounds and polymethine-based compounds.

[0125] The squarylium compound has a sharp absorption peak, excellent visible light transmittance, and a high molar extinction coefficient, but may generate fluorescence that causes scattered light when absorbing light. In this case, the squarylium compound can be used in combination with the compound (X') to suppress scattered light. When scattered light is suppressed in this way, the obtained camera image quality is improved when an optical filter obtained from the composition is used in an imaging device or the like.

[0126] The absorption maximum wavelength of the compound (X) is preferably 600 to 800 nm, more preferably 620 to 780 nm, further preferably 650 to 760 nm, and particularly preferably 660 to 750 nm. By using the compound (X) having a maximum absorption wavelength within the above range, the incidence angle dependency of colors near red is improved, and an optical filter with excellent luminous efficiency correction can be easily obtained.

[0127] [Ultraviolet absorber] Examples of the ultraviolet absorber include azomethine compounds, indole compounds, benzotriazole compounds, triazine compounds, anthracene compounds, and compounds described in JP-A-2019-014707.

[0128] [Antioxidants] Examples of the antioxidant include 2,6-di-tert-butyl-4-methylphenol, 2,2'-dioxy-3,3'-di-tert-butyl-5,5'-dimethyldiphenylmethane, and tetrakis[methylene-3-(3,5-di-tert-butyl-4-hydroxyphenyl)propionate]methane.

[0129] <Additives> The present composition may further contain additives such as an organic solvent, a release agent, a surfactant, an antistatic agent, an adhesion aid, and a light diffusing material, provided the effects of the present invention are not impaired. Each of these additives may be used alone or in combination of two or more.

[0130] In particular, when the present composition is made into a liquid composition, it is preferable to use an organic solvent. Examples of the organic solvent are preferably solvents capable of dissolving resins, and specific examples thereof include esters, ketones, aromatic hydrocarbons, and halogen-containing compounds. Furthermore, when the resin layer is produced by cast molding, which will be described later, the production of the resin layer can be facilitated by using a leveling agent or an antifoaming agent.

[0131] Optical Filter An optical filter according to one embodiment of the present invention (hereinafter also referred to as "the present filter") has a substrate (i) including a resin layer (hereinafter also referred to as "the present resin layer") containing the compound (Z) formed from the present composition, and a dielectric multilayer film. Specific examples of such a filter include a near-infrared cut filter (NIR-CF), a visible light-near-infrared selective transmission filter (DBPF), and a near-infrared transmission filter (IRPF) from the viewpoint of more effectively exerting the effects of the present invention. These filters may have a conventionally known configuration except that they have the present resin layer and the dielectric multilayer film.

[0132] The thickness of the present filter may be appropriately selected depending on the desired application, but in accordance with the recent trend toward thinner, lighter solid-state imaging devices, it is preferable that the thickness of the present filter is also thin. The present filter can be made thin because it contains the base material (i).

[0133] The thickness of the present filter is preferably 300 μm or less, more preferably 250 μm or less, further preferably 200 μm or less, particularly preferably 150 μm or less, and although there is no particular lower limit, it is desirable that the thickness is, for example, 20 μm.

[0134] <nir-cf> The NIR-CF is preferably an optical filter that has excellent cutting performance in the wavelength region of 850 to 1200 nm and excellent transmittance in the visible wavelength region. The dielectric multilayer film used in this NIR-CF is preferably a near-infrared reflective film.

[0135] When NIR-CF is used in a solid-state imaging device, it is preferable that the transmittance in the near-infrared wavelength region is low. In particular, it is known that the light receiving sensitivity of solid-state imaging devices is relatively high in the wavelength region of 850 to 1200 nm, and by reducing the transmittance in this wavelength region, it is possible to effectively perform visibility correction between the camera image and the human eye, and to achieve excellent color reproducibility. Furthermore, by reducing the transmittance in the wavelength region of 850 to 1200 nm, it is possible to effectively prevent near-infrared light used for security authentication function from reaching an image sensor, etc.

[0136] The average transmittance of the NIR-CF, measured in the vertical direction of the filter in the wavelength region of 850 to 1200 nm, is preferably 5% or less, more preferably 4% or less, even more preferably 3% or less, and particularly preferably 2% or less. When the average transmittance for wavelengths of 850 to 1200 nm is in this range, near infrared rays can be sufficiently blocked and excellent color reproducibility can be achieved, which is preferable.

[0137] When the NIR-CF is used in a solid-state imaging device, etc., it is preferable that the visible light transmittance is high. Specifically, in the wavelength region of 430 to 580 nm, the average transmittance measured from the vertical direction of the filter is preferably 75% or more, more preferably 80% or more, even more preferably 83% or more, and particularly preferably 85% or more. When the average transmittance at wavelengths of 430 to 580 nm is within this range, excellent imaging sensitivity can be achieved.

[0138] <dbpf> The DBPF is not particularly limited as long as it is an optical filter that transmits visible light and near-infrared light of a wavelength that is desired to be transmitted and cuts near-infrared light of a wavelength that is desired to be cut. The dielectric multilayer film used in this DBPF is preferably a film that transmits visible light and near-infrared light of wavelengths that are desired to be transmitted, and blocks near-infrared light of wavelengths that are desired to be blocked.

[0139] Like NIR-CF, when DBPF is used in a solid-state imaging device or the like, it is preferable that the visible light transmittance is high. For the same reasons as described above, it is preferable that the average transmittance at wavelengths of 430 to 580 nm is in the same range as that of NIR-CF.

[0140] In addition, it is preferable that the DBPF satisfies the following characteristic (d) from the viewpoint of being able to sufficiently transmit visible light and near-infrared light of wavelengths that are desired to be transmitted, and being able to sufficiently block near-infrared light of wavelengths that are desired to be blocked. Characteristic (d): In the wavelength region of 650 nm or more, it has a light blocking band Za, a light transmission band Zb, and a light blocking band Zc, and the center wavelength of each band is Za <Zb<Zcであり、 the minimum transmittances at Za and Zc measured in the perpendicular direction of the filter are preferably 15% or less, more preferably 5% or less, The maximum transmittance at Zb as measured in the perpendicular direction of the present filter is preferably 55% or more, more preferably 60% or more.

[0141] Za refers to the wavelength band from Za1, the shortest wavelength at which the transmittance of this filter, when measured from the vertical direction, falls between 20% and 20% or less, to Za2, the longest wavelength at which the transmittance falls between less than 20% and 20% or more, in the wavelength range of 650 nm to 900 nm. The center wavelength of Za is (Za1 + Za2) / 2 nm.

[0142] Zb refers to the wavelength band from the shortest wavelength Zb1 where the transmittance of this filter, measured from the vertical direction, falls between 40% and over 40% in the wavelength range of 750 nm to 1050 nm, to the longest wavelength Zb2 where the transmittance falls between over 40% and 40%. The center wavelength of Zb is (Zb1+Zb2) / 2 nm.

[0143] Zc refers to the wavelength band from Zc1, the shortest wavelength at which the transmittance of this filter, measured from the vertical direction, falls from more than 20% to 20% or less at wavelengths of 820 nm or more, to Zc2, which is Zc1 + 200 nm. The center wavelength of Zc is (Zc1 + Zc2) / 2 nm.

[0144] <irpf> The IRPF is not particularly limited as long as it is an optical filter that blocks visible light and transmits near-infrared light of a desired wavelength. The dielectric multilayer film used in this IRPF is preferably a film that cuts off light of a wavelength that is to be cut off (a part of visible light and / or near infrared light). The IRPF may also use a visible light absorber to block visible light.

[0145] IRPF can be suitably used in optical systems such as infrared surveillance cameras, vehicle-mounted infrared cameras, infrared communications, various sensing systems, infrared warning devices, and night vision devices. When used for these applications, it is preferable for the transmittance of light of wavelengths other than the near-infrared light that is to be transmitted to be low. In particular, in the wavelength region of 380 to 700 nm, the average transmittance when measured in the perpendicular direction of the present filter is preferably 10% or less, and more preferably 5% or less.

[0146] In addition, it is preferable that the IRPF has a high transmittance of the near infrared ray to be transmitted. Specifically, the IRPF has a light transmission band Ya in a wavelength region of 750 nm or more, and has a maximum transmittance (T IR ) is preferably 45% or more, more preferably 50% or more.

[0147] <Base material (i)> The substrate (i) may be a single layer or a multilayer, and may have the present resin layer. The substrate (i) may have two or more present resin layers, and in this case, the two or more present resin layers may be the same or different. When the substrate (i) is a single layer, the substrate (i) is composed of the present resin layer, that is, the present resin layer (resin substrate) is the substrate (i). When the substrate (i) is a multilayer substrate, examples of the substrate (i) include a substrate comprising two or more resin layers, at least one of which is the present resin layer, and a substrate comprising the present resin layer and a glass support. Examples of the substrate (i) include a substrate (A) comprising a laminate in which the present resin layer is laminated on a support such as a glass support or a base resin support, and a substrate (B) comprising a laminate in which a resin layer, such as an overcoat layer made of a curable resin or the like, is laminated on the present resin layer. In terms of production costs, ease of adjusting optical properties, ability to achieve the scratch-removing effect of the resin layer, and improvement in scratch resistance of the substrate (i), the substrate (B) is particularly preferred as the substrate (i).

[0148] In addition, the resin layer such as the overcoat layer in the resin support or the substrate (B) refers to a resin layer that does not contain the compound (Z). The resin layer that does not contain the compound (Z) is not particularly limited as long as it contains a resin, and examples of the resin include the same resins as those described in the section on the present composition. In addition, the resin layer that does not contain the compound (Z) may be the following other functional film.

[0149] The thickness of the substrate (i) can be appropriately selected depending on the desired application and is not particularly limited, but is preferably 10 to 250 μm, more preferably 15 to 230 μm, and particularly preferably 20 to 150 μm. When the thickness of the substrate (i) is within the above range, the present filter using the substrate (i) can be made thin and lightweight, and can be suitably used for various applications such as solid-state imaging devices. In particular, when the single-layer substrate (i) is used in a lens unit such as a camera module, it is preferable because the lens unit can be made low-profile and lightweight.

[0150] In the wavelength region of 850 to 1200 nm, the lowest transmittance (Ta) measured in the perpendicular direction to the substrate (i) is preferably 0.1 to 40%, more preferably 0.5 to 35%, and particularly preferably 1 to 30%.

[0151] In the wavelength region of 430 to 580 nm, the average transmittance (Tb) measured in the perpendicular direction to the substrate (i) is preferably 80% or more, and more preferably 81.0% or more.

[0152] When (Ta) and (Tb) of the substrate (i) are within the above ranges, an optical filter that sufficiently blocks light having a wavelength in the near-infrared region that is to be blocked while exhibiting high visible light transmittance can be easily obtained, and an optical filter that provides good camera images with little flare or ghosting can be easily obtained.

[0153] [Method for producing substrate (i)] The resin layer, the resin support, and the resin layer such as the overcoat layer can be formed, for example, by melt molding or cast molding, and further, if necessary, after molding, a coating agent such as an antireflection agent, a hard coat agent, and / or an antistatic agent may be coated.

[0154] When the substrate (i) is a substrate (A), for example, the present composition is melt-molded or cast-molded onto the support, preferably by a method such as spin coating, slit coating, or inkjet, and then the solvent is dried and removed, and if necessary, light irradiation or heating is further performed, thereby producing a substrate having the present resin layer formed on the support.

[0155] Melt molding Specific examples of the melt molding include a method of melt-kneading the present composition to obtain pellets and melt-molding the pellets, a method of melt-molding the present composition, a method of removing the solvent from the present composition in a liquid state containing the solvent and melt-molding the pellets, etc. Examples of the melt molding method include injection molding, melt extrusion molding, blow molding, etc.

[0156] Cast molding Examples of the cast molding include a method in which a liquid present composition containing a solvent is cast onto a suitable support and the solvent is removed; and a method in which a curable present composition containing a photocurable resin and / or a thermosetting resin as the resin is cast onto a suitable support and the solvent is removed, followed by curing by a suitable method such as ultraviolet irradiation or heating. When the substrate (i) is the single-layer substrate (i), the substrate (i) can be obtained by peeling off the coating film from the support after cast molding, and when the substrate (i) is the substrate (A), the substrate (i) can be obtained by not peeling off the coating film after cast molding.

[0157] Examples of the suitable support include a glass plate, a steel belt, a steel drum, and a support made of a resin (for example, a polyester film, a cyclic olefin resin film).

[0158] Furthermore, the resin layer can be formed on an optical component such as a glass plate, quartz, or plastic by coating the liquid composition and drying the solvent, or by coating the curable composition and curing and drying it.

[0159] When the resin support and the resin layer such as the overcoat layer are formed by melt molding or cast molding, a desired composition containing a resin (but not containing compound (Z)) may be used in place of the present composition in the melt molding or cast molding section.

[0160] The amount of residual solvent in the resin layer, the resin support, the overcoat layer, and other resin layers is preferably as small as possible. Specifically, the amount of residual solvent is preferably 3% by mass or less, more preferably 1% by mass or less, and even more preferably 0.5% by mass or less, based on the weight of the resin layer. When the amount of the residual solvent is within the above range, a resin layer that is resistant to deformation and changes in properties and can easily exhibit the desired functions can be obtained. When the substrate (i) is used in an optical filter, it is preferable to suppress the solvent content in the resin layers, such as the present resin layer, the resin support and the overcoat layer, to 100 ppm by mass or less.

[0161] <Dielectric multilayer film> The filter of the present invention comprises the substrate (i) and a dielectric multilayer film, such as a laminate in which layers of a material with a high refractive index and layers of a material with a low refractive index are alternately laminated. The dielectric multilayer film may be provided on one side or both sides of the substrate (i). When provided on one side, it is possible to obtain an optical filter that is excellent in manufacturing cost and ease of manufacturing, and when provided on both sides, it is possible to obtain an optical filter that has high strength and is less prone to warping or twisting. When the present filter is used in a solid-state imaging device or the like, it is preferable that the filter has less warping or twisting, so it is preferable to provide the dielectric multilayer film on both sides of the substrate (i).

[0162] The material constituting the high refractive index material layer includes a material having a refractive index of 1.7 or more, and a material having a refractive index of 1.7 to 2.5 is usually selected. Examples of such materials include those containing titanium oxide, zirconium oxide, tantalum pentoxide, niobium pentoxide, lanthanum oxide, yttrium oxide, zinc oxide, zinc sulfide, indium oxide, or the like as a main component, and containing a small amount (for example, 0 to 10 mass % of the main component) of titanium oxide, tin oxide, and / or cerium oxide, or the like.

[0163] The low refractive index material layer may be made of a material having a refractive index of 1.6 or less, and a material having a refractive index of 1.2 to 1.6 is usually selected. Examples of such materials include silica, alumina, lanthanum fluoride, magnesium fluoride, and sodium aluminum hexafluoride.

[0164] The method for laminating the high refractive index material layer and the low refractive index material layer is not particularly limited as long as a dielectric multilayer film is formed by laminating these material layers. For example, a dielectric multilayer film in which high refractive index material layers and low refractive index material layers are alternately laminated can be formed directly on the substrate (i) by a CVD method, a sputtering method, a vacuum deposition method, an ion-assisted deposition method, an ion plating method, or the like.

[0165] The thickness of each of the high refractive index material layer and the low refractive index material layer is preferably 0.1λ to 0.5λ, where λ (nm) is the near infrared wavelength to be blocked. In the case of NIR-CF, the value of λ (nm) is, for example, 700 to 1400 nm, preferably 750 to 1300 nm. When the thickness of each of the high refractive index material layer and the low refractive index material layer is within this range, the optical film thickness, which is the product (n×d) of the refractive index (n) and the film thickness (d), is approximately the same value as λ / 4, and the blocking and transmission of a specific wavelength tends to be easily controlled based on the relationship of the optical properties of reflection and refraction.

[0166] For example, in the case of NIR-CF, the total number of layers of high refractive index material layers and low refractive index material layers in the dielectric multilayer film is preferably 16 to 70 layers in the entire optical filter, and more preferably 20 to 60. When the thickness of each layer, the thickness of the dielectric multilayer film as the entire optical filter, and the total number of layers are within the above ranges, sufficient manufacturing margins can be ensured, and warping of the optical filter and cracks in the dielectric multilayer film can be reduced.

[0167] In this filter, by appropriately selecting the type of materials constituting the high refractive index material layer and the low refractive index material layer, the thickness of each of the high refractive index material layers and the low refractive index material layers, the order of lamination, and the number of laminations in accordance with the absorption characteristics, etc. of compound (Z), it is possible to ensure sufficient light transmittance in the wavelength range to be transmitted (e.g., the visible range), while having sufficient light blocking characteristics in the near-infrared wavelength range to be blocked, and to reduce the reflectance when near-infrared light is incident from an oblique direction.

[0168] Here, in order to optimize the conditions of the dielectric multilayer film, for example, optical thin film design software (e.g., Essential Macleod, manufactured by Thin Film Center) may be used to set parameters so as to achieve both an anti-reflection effect in the wavelength range (e.g., visible range) to be transmitted and a light blocking effect in the near-infrared range to be blocked. In the case of the above software, for example, when forming a dielectric multilayer film of NIR-CF, a parameter setting method may be such that the target transmittance for wavelengths of 400 to 700 nm is set to 100% and the Target Tolerance value is set to 1, and the target transmittance for wavelengths of 705 to 950 nm is set to 0% and the Target Tolerance value is set to 0.5. These parameters can also be used to change the Target Tolerance value by dividing the wavelength range into smaller sections in accordance with various characteristics of the base material (i).

[0169] <Other functional films> In the present filter, a functional film such as an anti-reflection film, a hard coat film or an anti-static film may be appropriately provided between the substrate (i) and the dielectric multilayer film, on the surface of the substrate (i) opposite to the surface on which the dielectric multilayer film is provided, or on the surface of the dielectric multilayer film opposite to the surface on which the substrate (i) is provided, for the purposes of improving the surface hardness of the substrate (i) or the dielectric multilayer film, improving the chemical resistance, preventing static electricity and removing scratches, etc., within a range that does not impair the effects of the present invention.

[0170] The present filter may include one layer of the functional membrane, or may include two or more layers. When the present filter includes two or more layers of the functional membrane, the functional membrane may include two or more layers of the same membrane, or two or more layers of different membranes.

[0171] The method for laminating the functional film is not particularly limited, but examples thereof include a method in which a coating agent such as an antireflection agent, a hard coat agent and / or an antistatic agent is melt-molded or cast-molded onto the substrate (i) or the dielectric multilayer film in the same manner as described above.

[0172] Alternatively, the film can be produced by applying a curable composition containing the coating agent or the like onto the substrate (i) or the dielectric multilayer film with a bar coater or the like, and then curing the composition by exposure to ultraviolet light or the like.

[0173] Examples of the coating agent include ultraviolet (UV) / electron beam (EB) curable resins and thermosetting resins, and more specifically, examples thereof include vinyl compounds, urethane-based, urethane acrylate-based, acrylate-based, epoxy-based and epoxy acrylate-based resins. The coating agent may be used alone or in combination of two or more kinds. Examples of the curable compositions containing these coating agents include vinyl-based, urethane-based, urethane acrylate-based, acrylate-based, epoxy-based and epoxy acrylate-based curable compositions.

[0174] The curable composition may contain a polymerization initiator. As the polymerization initiator, a known photopolymerization initiator or a thermal polymerization initiator may be used, and a photopolymerization initiator and a thermal polymerization initiator may be used in combination. The polymerization initiator may be used alone or in combination of two or more kinds.

[0175] The blending ratio of the polymerization initiator in the curable composition is preferably 0.1 to 10 mass%, more preferably 0.5 to 10 mass%, and further preferably 1 to 5 mass%, when the total amount of the curable composition is taken as 100 mass%. When the blending ratio of the polymerization initiator is within the above range, a curable composition excellent in curing characteristics and handling properties can be easily obtained, and a functional film such as an antireflection film, a hard coat film, or an antistatic film having a desired hardness can be easily obtained.

[0176] Furthermore, the curable composition may contain an organic solvent as a solvent, and a known solvent may be used as the organic solvent.Specific examples of the organic solvent include alcohols such as methanol, ethanol, isopropanol, butanol, and octanol; ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone, and cyclohexanone; esters such as ethyl acetate, butyl acetate, ethyl lactate, γ-butyrolactone, propylene glycol monomethyl ether acetate, and propylene glycol monoethyl ether acetate; ethers such as ethylene glycol monomethyl ether and diethylene glycol monobutyl ether; aromatic hydrocarbons such as benzene, toluene, and xylene; and amides such as dimethylformamide, dimethylacetamide, and N-methylpyrrolidone. These solvents may be used alone or in combination of two or more.

[0177] The thickness of the functional film is preferably 0.1 to 20 μm, more preferably 0.5 to 10 μm, and particularly preferably 0.7 to 5 μm.

[0178] In addition, for the purpose of increasing the adhesion between the substrate (i) and the functional film and / or the dielectric multilayer film, or between the functional film and the dielectric multilayer film, the surface of the substrate (i), the functional film or the dielectric multilayer film may be subjected to a surface treatment such as a corona treatment or a plasma treatment.

[0179] [Optical filter applications] This filter is excellent in, for example, the ability to cut off light of a wavelength in the region to be cut off and the ability to transmit light of a wavelength to be transmitted. Therefore, it is useful for correcting the visibility of solid-state imaging elements such as CCD and CMOS image sensors in camera modules. In particular, it is useful for digital still cameras, smartphone cameras, mobile phone cameras, digital video cameras, cameras for wearable devices, PC cameras, surveillance cameras, automobile cameras, infrared cameras, televisions, car navigation systems, personal digital assistants, video game consoles, portable game consoles, fingerprint authentication systems, digital music players, various sensing systems, infrared communications, etc. Furthermore, it is also useful as a heat-cutting filter to be attached to glass plates of automobiles, buildings, etc.

[0180] <Solid-state imaging device> A solid-state imaging device according to an embodiment of the present invention includes the filter. Here, the solid-state imaging device refers to a device equipped with a solid-state imaging element such as a CCD or CMOS image sensor, and specific examples include digital still cameras, cameras for smartphones, cameras for mobile phones, cameras for wearable devices, and digital video cameras.

[0181] <Optical sensor device> The optical sensor device according to one embodiment of the present invention is not particularly limited as long as it includes the present filter, and may have a conventionally known configuration. For example, a device having a light receiving element and the present filter can be mentioned, and specifically, a device having a light receiving element (semiconductor substrate), a protective film, the present filter, another filter, etc. can be mentioned. EXAMPLES

[0182] The present invention will be described in more detail below with reference to examples, but the present invention is not limited to these examples in any way.

[0183] <Molecular weight> The molecular weight of the resin was measured by the following method (a) or (b), taking into consideration the solubility of each resin in a solvent, etc. (a) The weight average molecular weight (Mw) and number average molecular weight (Mn) in terms of standard polystyrene were measured using a gel permeation chromatography (GPC) apparatus manufactured by WATERS (150C type, column: Tosoh H-type column, developing solvent: o-dichlorobenzene). (b) The weight average molecular weight (Mw) and number average molecular weight (Mn) in terms of standard polystyrene were measured using a Tosoh Corporation GPC apparatus (HLC-8220 type, column: TSKgel α-M, developing solvent: THF).

[0184] For the resin synthesized in Resin Synthesis Example 3 described later, the inherent viscosity was measured by the following method (c) instead of the molecular weight measurement by the above method. (c) A portion of the polyimide solution was poured into anhydrous methanol to precipitate the polyimide, which was then separated from the unreacted monomer by filtration and vacuum dried for 12 hours at 80° C. 0.1 g of the resulting polyimide was dissolved in 20 mL of N-methyl-2-pyrrolidone (dilute polyimide solution), and the logarithmic viscosity (μ) at 30° C. was calculated using a Cannon-Fenske viscometer according to the following formula: μ={ln(ts / t0)} / C t0: Flow time of the solvent (N-methyl-2-pyrrolidone) ts: Flow time of dilute polyimide solution C: 0.5 g / dL

[0185] <Glass transition temperature (Tg)> The glass transition temperature of the resin was measured using a differential scanning calorimeter (DSC6200) manufactured by Hitachi High-Tech Science Corporation at a temperature rise rate of 20° C. per minute under a nitrogen gas flow.

[0186] <Spectral transmittance> The transmittance of the substrate and the optical filter in the near infrared region with a wavelength of 850 to 1200 nm and the visible light transmittance with a wavelength of 430 to 580 nm were measured using a spectrophotometer (V-7200) manufactured by JASCO Corporation. This transmittance was measured using the spectrophotometer under the condition that light was incident perpendicularly to the substrate or the optical filter. The parameters measured using this device are as follows.

[0187] Xa: The wavelength of light at which the transmittance measured from the perpendicular direction of the substrate is the lowest in the wavelength range of 850 to 1200 nm Ta: The minimum transmittance measured perpendicular to the substrate at wavelengths of 850 to 1200 nm Tb: Average transmittance of light with wavelengths of 430 to 580 nm measured from the perpendicular direction of the substrate Tc: The minimum transmittance of light with wavelengths of 850 to 1200 nm after a heating test, measured from the perpendicular direction of the substrate Td: Average transmittance of light with wavelengths of 430 to 580 nm measured from the vertical direction of the substrate after the heating test Te: The minimum transmittance of light with a wavelength of 850 to 1200 nm after UV irradiation, measured from the perpendicular direction of the substrate. Tf: Average transmittance of light with wavelengths of 430 to 580 nm after UV irradiation, measured from the vertical direction of the substrate Tg: Average transmittance of light with wavelengths of 850 to 1200 nm measured from the vertical direction of the optical filter Th: Average transmittance of light with wavelengths of 430 to 580 nm measured from the vertical direction of the optical filter

[0188] [Compound synthesis example] The compounds (X) and (Z) used in the following examples were synthesized based on generally known synthesis methods. Compound (X) can be synthesized based on the methods described in, for example, Japanese Patent No. 3366697, Japanese Patent No. 2846091, Japanese Patent No. 2864475, Japanese Patent No. 3703869, JP-A-60-228448, JP-A-1-146846, JP-A-1-228960, Japanese Patent No. 4081149, JP-A-63-124054, "Phthalocyanine -Chemistry and Function-" (IPC, 1997), JP-A-2007-169315, JP-A-2009-108267, JP-A-2010-241873, Japanese Patent No. 3699464, and Japanese Patent No. 4740631.

[0189] Compound (Z) can be synthesized based on the methods described in, for example, JP 2009-108267 A, JP 5-59291 A, JP 2014-95007 A, JP 2011-52218 A, WO 2007 / 114398 A, JP 2003-246940 A, Chemistry of Heterocyclic Compounds: The Cyanine Dyes and Related Compounds, Volume 18 (Wiley, 1964), and Near-Infrared Dyes for High Technology Applications (Springer, 1997). Specifically, it can be synthesized by the following method.

[0190] [Intermediate synthesis example 1] [ka]

[0191] Phosphoryl chloride (66.4 g) was added dropwise to DMF (250 mL) under ice cooling, and the mixture was stirred for 1 hour. Cyclohexanone (25.0 g) was then added, and the mixture was heated at 80°C for 3 hours. After cooling to room temperature, ice water was added, and the mixture was left overnight. The mixture was filtered to obtain the pale yellow target compound c-1 (37.4 g). The target compound was identified using NMR and LC-MS (liquid chromatography mass spectrometry).

[0192] [Intermediate synthesis example 2] [ka]

[0193] Under ice cooling, phenylmagnesium bromide (PhMgBr)·tetrahydrofuran solution (1 mol / L, 330 mL) was added dropwise to a solution of cyclopentanone (25.4 g) in THF (200 mL) and stirred at room temperature for 1 hour. Then, methanol (10 mL) was slowly added, followed by concentrated hydrochloric acid (10 mL). After removing tetrahydrofuran using an evaporator, the mixture was separated with ethyl acetate and water, dried over sodium sulfate, and concentrated. The resulting solution was purified by silica gel column chromatography to obtain compound c-2 (29.6 g). Phosphoryl chloride (54.7 g) was added dropwise to DMF (200 mL) under ice cooling, and the mixture was stirred for 1 hour. Compound c-2 (29.6 g) was then added, and the mixture was heated at 80° C. for 3 hours. After cooling at room temperature, ice water was added, and the mixture was left overnight. The mixture was filtered to obtain the pale yellow target compound c-3 (35.7 g). The target compound was identified using NMR and LC-MS.

[0194] [Intermediate synthesis example 3] [ka]

[0195] Phosphoryl chloride (81.1 g) was added dropwise to DMF (250 mL) under ice cooling, and the mixture was stirred for 1 hour. Cyclopentanone (25.0 g) was then added, and the mixture was heated at 80°C for 3 hours. After cooling to room temperature, ice water was added, and the mixture was left overnight. The mixture was filtered to obtain the pale yellow target compound c-4 (41.9 g). The target compound was identified using NMR and LC-MS.

[0196] [Intermediate synthesis example 4] [ka]

[0197] Diphenylamine (25.1 g) and 42% aqueous tetrafluoroboric acid solution (46.6 g) were added to a solution (150 mL) of cyclopentanone (25.0 g), refluxed for 2 hours, and then cooled. The precipitated solid was filtered and washed with cold methanol to obtain compound c-5 (82.6 g). Compound c-5 (82.6 g) and ethyl N-phenylformimidate (80.1 g) were refluxed in butyronitrile (250 mL) for 2 hours, and then allowed to cool to room temperature. Diethyl ether (1 L) was added to precipitate a solid, which was filtered and dissolved in methanol (200 mL). Toluene (1 L) was added to precipitate a solid. The solid was filtered and dried to obtain the target compound c-6 (90.7 g). The target compound was identified using NMR and LC-MS.

[0198] [Intermediate synthesis example 5] [ka]

[0199] Under ice cooling, phenylmagnesium bromide-tetrahydrofuran solution (1 mol / L, 250 mL) was added dropwise to a solution of 4-methylcyclohexanone (25.0 g) in THF (100 mL) and stirred at room temperature for 1 hour. Then, methanol (10 mL) was slowly added, followed by concentrated hydrochloric acid (10 mL). After removing tetrahydrofuran using an evaporator, the mixture was separated with ethyl acetate and water, dried over sodium sulfate, and concentrated. The resulting solution was purified by silica gel column chromatography to obtain compound c-7 (26.1 g). Phosphoryl chloride (33.0 g) was added dropwise to DMF under ice cooling and stirred for 1 hour. Compound c-7 (26.1 g) was then added and heated at 80°C for 3 hours. After cooling to room temperature, ice water was added and left overnight. The mixture was filtered to obtain the pale yellow target compound c-8 (24.6 g). The target compound was identified using NMR and LC-MS.

[0200] [Intermediate Synthesis Example 6] [ka]

[0201] Phosphoryl chloride (89.0 g) was added dropwise to DMF (250 mL) under ice cooling, and the mixture was stirred for 1 hour. Then, 3-pentanone (25.0 g) was added, and the mixture was heated at 80°C for 3 hours. After cooling to room temperature, ice water was added, and the mixture was left overnight. The mixture was filtered to obtain the pale yellow target compound c-9 (9.3 g). The target compound was identified using NMR and LC-MS.

[0202] [Intermediate Synthesis Example 7] [ka]

[0203] Phosphoryl chloride (45.0 g) was added dropwise to DMF (250 mL) under ice cooling, and the mixture was stirred for 1 hour. Then, 2,2,6,6-tetramethylheptan-4-one (25.0 g) was added, and the mixture was heated at 80°C for 3 hours. After cooling to room temperature, ice water was added, and the mixture was left overnight. The mixture was filtered to obtain the pale yellow target compound c-10 (7.2 g). The target compound was identified using NMR and LC-MS.

[0204] [Intermediate synthesis example 8] [ka]

[0205] Compound e-1 (20.0 g) synthesized by the method described in Bioorganic and Medicinal Chemistry, 2013, vol.21, #11, p.2826-2831 was dissolved in t-BuOH (150 mL) and ethyl pivalate (52.0 g) was added. Then, sodium hydride (60%, dispersion in paraffin liquid) 9.6 g was added, and the mixture was stirred at 80°C for 3 hours. The mixture was then cooled to room temperature and 20 mL of concentrated hydrochloric acid was added. After separation and washing with ethyl acetate and water, sodium sulfate was added to dry the mixture, and the solvent was removed using an evaporator to obtain compound e-2. Compound e-2 was not purified, and 15 mL of concentrated hydrochloric acid was added and stirred at 40°C. After 1 hour, the reaction solution was ice-cooled and neutralized by adding 1N aqueous sodium hydroxide solution. After separation and washing with ethyl acetate and water, sodium sulfate was added to dry, and the solvent was removed using an evaporator. The resulting mixture was purified by silica gel column chromatography to obtain compound e-3 (11.5 g). The compound was identified by LC-MS and 1 This was analyzed by H-NMR. Compound e-3 (11.5 g) and 90 mL of tetrahydrofuran were ice-cooled while stirring. After 5 minutes of ice-cooling, a methylmagnesium iodide-diethyl ether solution (1 mol / L, 50 mL) was added dropwise, and the mixture was heated to 35°C and stirred for 2 hours. The reaction solution was then ice-cooled, and 90 mL of 20% aqueous perchloric acid was added. The precipitated solid was filtered, washed with 60 mL of water, and dried under reduced pressure at 50°C to obtain compound e-4 (10.5 g). The compound was identified as follows: 1 This was analyzed by H-NMR.

[0206] [Intermediate Synthesis Example 9] [ka]

[0207] Compound e-1 (20.0 g) synthesized by the method described in Bioorganic and Medicinal Chemistry, 2013, vol.21, #11, p.2826-2831 was dissolved in t-BuOH (150 mL) and ethyl isobutyrate (50.0 g) was added, followed by the addition of 9.6 g of sodium hydride (60%, dispersion in paraffin liquid), and the mixture was stirred at 80°C for 3 hours. The mixture was then cooled to room temperature and 20 mL of concentrated hydrochloric acid was added. After separation and washing with ethyl acetate and water, the mixture was dried by adding sodium sulfate, and the solvent was removed using an evaporator to obtain compound e-5. Compound e-5 was not purified, and 15 mL of concentrated hydrochloric acid was added and stirred at 40°C. After 1 hour, the reaction solution was ice-cooled and neutralized by adding 1N aqueous sodium hydroxide solution. After separation and washing with ethyl acetate and water, sodium sulfate was added to dry, and the solvent was removed using an evaporator. The resulting mixture was purified by silica gel column chromatography to obtain compound e-6 (10.4 g). The compound was identified by LC-MS and 1 This was analyzed by H-NMR. Compound E-6 (10.4 g) and 90 mL of tetrahydrofuran were ice-cooled while stirring. After 5 minutes of ice-cooling, a methylmagnesium iodide-diethyl ether solution (1 mol / L, 50 mL) was added dropwise, and the mixture was heated to 35°C and stirred for 2 hours. The reaction solution was then ice-cooled, and 90 mL of 20% aqueous perchloric acid was added. The precipitated solid was filtered, washed with 60 mL of water, and dried under reduced pressure at 50°C to obtain compound E-7 (8.3 g). The compound was identified as follows: 1 This was analyzed by H-NMR.

[0208] [Intermediate Synthesis Example 10] [ka]

[0209] Compound e-8 can be synthesized using the method described in Organic Letters, 2015, vol. 17, #13, p. 3306-3309.

[0210] [Intermediate Synthesis Example 11] [ka]

[0211] Compound e-9 can be synthesized using the method described in European Journal of Organic Chemistry, 2018, vol.2018, #2, p.240-246.

[0212] [Intermediate Synthesis Example 12] [ka]

[0213] Compound e-10 can be synthesized by the method described in Journal of Organic Chemistry, 2000, vol. 65, #7, p. 2236-2238, PF6.

[0214] [Intermediate Synthesis Example 13] [ka]

[0215] Ethyl pivalate (45.0 g) was added to a solution of compound e-11 (20.0 g) in t-BuOH (150 mL), and then 9.6 g of sodium hydride (60%, dispersion in paraffin liquid) was added, followed by stirring at 80°C for 3 hours. The mixture was then cooled to room temperature, and 20 mL of concentrated hydrochloric acid was added. After separation and washing with ethyl acetate and water, sodium sulfate was added for drying, and the solvent was removed using an evaporator to obtain compound e-12. Compound e-12 was not purified, and 15 mL of concentrated hydrochloric acid was added and stirred at 40°C. After 1 hour, the reaction solution was ice-cooled and neutralized by adding 1N aqueous sodium hydroxide solution. After separation and washing with ethyl acetate and water, sodium sulfate was added to dry, and the solvent was removed using an evaporator. The resulting mixture was purified by silica gel column chromatography (hexane / ethyl acetate = 4 / 1) to obtain compound e-13 (19.1 g). The compound was identified by LC-MS and 1 This was analyzed by H-NMR. Compound E-13 (19.1 g) and 90 mL of tetrahydrofuran were ice-cooled while stirring. After 5 minutes of ice-cooling, a methylmagnesium iodide-diethyl ether solution (1 mol / L, 50 mL) was added dropwise, and the mixture was heated to 35°C and stirred for 2 hours. The reaction solution was then ice-cooled, and 30 mL of 20% aqueous perchloric acid was added. The precipitated solid was filtered, washed with 60 mL of water, and dried under reduced pressure at 50°C to obtain compound E-14 (16.8 g). The compound was identified as follows: 1 This was analyzed by H-NMR.

[0216] [Intermediate Synthesis Example 14] [ka]

[0217] Compound e-15 can be synthesized using the method described in Journal of the American Chemical Society, 2015, vol.137, #14, p.4759-4765.

[0218] [Intermediate Synthesis Example 15] [ka]

[0219] Compound e-16 can be synthesized using the method described in Journal of the Chemical Society. Perkin Transactions 1 (2001), 2000, #4, p.599-603.

[0220] [Intermediate Synthesis Example 16] [ka]

[0221] In dichloromethane (100 mL), compound e-17 (20.0 g), oxalyl dichloride (22.0 g), pyridine (13.7 g) and DMF (1 mL) were stirred at room temperature for 1 hour. Dichloromethane was removed by an evaporator to obtain a mixture containing compound e-18. The resulting mixture was added with acetonitrile (200 mL), 5-methyl-2-hydroxyacetophenone (21.3 g) and triethylamine (15.1 g) and stirred at room temperature. The acetonitrile was removed using an evaporator, and the mixture was separated with ethyl acetate and water, after which the organic layer was dried over sodium sulfate. The ethyl acetate in the organic layer was removed using an evaporator to obtain compound e-19. This was dissolved in t-BuOH (100 mL) without purification, and 6.3 g of sodium hydride (60%, dispersion in paraffin liquid) was added, followed by stirring at 80°C for 3 hours. Then, it was cooled to room temperature, and 20 mL of concentrated hydrochloric acid was added. After separation and washing with ethyl acetate and water, sodium sulfate was added for drying, and the solvent was removed using an evaporator to obtain compound e-20. Compound e-20 was not purified, and 20 mL of concentrated hydrochloric acid was added and stirred at 40°C. After 1 hour, the reaction solution was ice-cooled and neutralized by adding 1N aqueous sodium hydroxide solution. After separation and washing with ethyl acetate and water, sodium sulfate was added to dry, and the solvent was removed using an evaporator. The resulting mixture was purified by silica gel column chromatography to obtain compound e-21 (27.3 g). The compound was identified by LC-MS and 1 This was analyzed by H-NMR. Compound E-21 (27.3 g) and 90 mL of tetrahydrofuran were ice-cooled while stirring. After 5 minutes of ice-cooling, methylmagnesium iodide-diethyl ether solution (1 mol / L, 50 mL) was added dropwise, heated to 35°C, and stirred for 2 hours. The reaction solution was then ice-cooled, and 90 mL of 20% aqueous perchloric acid was added. The precipitated solid was filtered, washed with 60 mL of water, and dried under reduced pressure at 50°C to obtain compound E-22 (16.2 g). The compound was identified as follows: 1 This was analyzed by H-NMR.

[0222] [Intermediate Synthesis Example 17] [ka]

[0223] In dichloromethane (100 mL), compound e-23 (20.0 g), oxalyl dichloride (21.4 g), pyridine (13.4 g) and DMF (1 mL) were stirred at room temperature for 1 hour. Dichloromethane was removed by an evaporator to obtain a mixture containing compound e-24. The resulting mixture was added with acetonitrile (200 mL), 5-methyl-2-hydroxyacetophenone (20.8 g) and triethylamine (14.8 g) and stirred at room temperature. The acetonitrile was removed using an evaporator, and the mixture was separated with ethyl acetate and water, after which the organic layer was dried over sodium sulfate. The ethyl acetate in the organic layer was removed using an evaporator to obtain compound e-25. This was dissolved in t-BuOH (100 mL) without purification, and 6.1 g of sodium hydride (60%, dispersion in paraffin liquid) was added, followed by stirring at 80°C for 3 hours. Then, it was cooled to room temperature, and 20 mL of concentrated hydrochloric acid was added. After separation and washing with ethyl acetate and water, sodium sulfate was added and dried. The solvent was removed using an evaporator to obtain compound e-26. Compound e-26 was not purified, and 30 mL of concentrated hydrochloric acid was added and stirred at 40°C. After 1 hour, the reaction solution was ice-cooled and neutralized by adding 1N aqueous sodium hydroxide solution. After separation and washing with ethyl acetate and water, sodium sulfate was added to dry, and the solvent was removed using an evaporator. The resulting mixture was purified by silica gel column chromatography to obtain compound e-27 (27.0 g). The compound was identified by LC-MS and 1 This was analyzed by H-NMR. Compound E-27 (27.0 g) and 90 mL of tetrahydrofuran were ice-cooled while stirring. After 5 minutes of ice-cooling, methylmagnesium iodide-diethyl ether solution (1 mol / L, 50 mL) was added dropwise, heated to 35°C, and stirred for 2 hours. The reaction solution was then ice-cooled, and 90 mL of 20% aqueous perchloric acid was added. The precipitated solid was filtered, washed with 60 mL of water, and dried under reduced pressure at 50°C to obtain compound E-28 (15.9 g). The compound was identified as follows: 1 This was analyzed by H-NMR.

[0224] [Intermediate Synthesis Example 18] [ka]

[0225] Ethyl pivalate (50.0 g) was added to a solution of compound e-29 (25.0 g) in t-BuOH (150 mL), and then 6.7 g of sodium hydride (60%, dispersion in paraffin liquid) was added, followed by stirring at 80°C for 3 hours. The mixture was then cooled to room temperature, and 15 mL of concentrated hydrochloric acid was added. After separation and washing with ethyl acetate and water, sodium sulfate was added for drying, and the solvent was removed using an evaporator to obtain compound e-30. Compound e-30 was not purified, and 30 mL of concentrated hydrochloric acid was added and stirred at 40°C. After 1 hour, the reaction solution was ice-cooled and neutralized by adding 1N aqueous sodium hydroxide solution. After separation and washing with ethyl acetate and water, sodium sulfate was added to dry, and the solvent was removed using an evaporator. The resulting mixture was purified by silica gel column chromatography to obtain compound e-31 (16.2 g). The compound was identified by LC-MS and 1 This was analyzed by H-NMR. Compound E-31 (16.2 g) and 90 mL of tetrahydrofuran were ice-cooled while stirring. After 5 minutes of ice-cooling, methylmagnesium iodide-diethyl ether solution (1 mol / L, 50 mL) was added dropwise, heated to 35°C, and stirred for 2 hours. The reaction solution was then ice-cooled, and 90 mL of 20% aqueous perchloric acid was added. The precipitated solid was filtered, washed with 60 mL of water, and dried under reduced pressure at 50°C to obtain compound E-32 (12.9 g). The compound was identified as follows: 1 This was analyzed by H-NMR.

[0226] [Intermediate Synthesis Example 19] [ka]

[0227] To a solution of compound e-11 (25.0 g) in t-BuOH (150 mL), ethyl isobutyrate (52.0 g) and sodium hydride (60%, dispersion in paraffin liquid) (7.3 g) were added, and the mixture was stirred at 80°C for 3 hours. The mixture was then cooled to room temperature, and 20 mL of concentrated hydrochloric acid was added. After separation and washing with ethyl acetate and water, sodium sulfate was added to dry the mixture, and the solvent was removed using an evaporator to obtain compound e-33. Compound e-33 was not purified, and 20 mL of concentrated hydrochloric acid was added and stirred at 40°C. After 1 hour, the reaction solution was ice-cooled and neutralized by adding 1N aqueous sodium hydroxide solution. After separation and washing with ethyl acetate and water, sodium sulfate was added to dry, and the solvent was removed using an evaporator. The resulting mixture was purified by silica gel column chromatography to obtain compound e-34 (17.1 g). The compound was identified by LC-MS and 1 This was analyzed by H-NMR. Compound E-34 (17.1 g) and 90 mL of tetrahydrofuran were ice-cooled while stirring. After 5 minutes of ice-cooling, a methylmagnesium iodide-diethyl ether solution (1 mol / L, 50 mL) was added dropwise, and the mixture was heated to 35°C and stirred for 2 hours. The reaction solution was then ice-cooled, and 90 mL of 20% aqueous perchloric acid was added. The precipitated solid was filtered, washed with 60 mL of water, and dried under reduced pressure at 50°C to obtain compound E-35 (14.6 g). The compound was identified as follows: 1 This was analyzed by H-NMR.

[0228] [Intermediate Synthesis Example 20] [ka]

[0229] To a solution of compound e-36 (25.0 g) in t-BuOH (150 mL), ethyl 2-methylbutyrate (55.0 g) was added, and then 6.0 g of sodium hydride (60%, dispersion in paraffin liquid) was added, followed by stirring at 80°C for 3 hours. The mixture was then cooled to room temperature, and 20 mL of concentrated hydrochloric acid was added. After separation and washing with ethyl acetate and water, sodium sulfate was added to dry the mixture, and the solvent was removed using an evaporator to obtain compound e-37. Compound e-37 was not purified, and 60 mL of concentrated hydrochloric acid was added and stirred at 40°C. After 1 hour, the reaction solution was ice-cooled and neutralized by adding 1N aqueous sodium hydroxide solution. After separation and washing with ethyl acetate and water, sodium sulfate was added to dry, and the solvent was removed using an evaporator. The resulting mixture was purified by silica gel column chromatography to obtain compound e-38 (15.9 g). The compound was identified by LC-MS and 1 This was analyzed by H-NMR. Compound E-38 (15.9 g) and 90 mL of tetrahydrofuran were ice-cooled while stirring. After 5 minutes of ice-cooling, methylmagnesium iodide-diethyl ether solution (1 mol / L, 50 mL) was added dropwise, heated to 35°C and stirred for 2 hours. The reaction solution was then ice-cooled, 90 mL of 20% aqueous perchloric acid was added, and the precipitated solid was filtered off, washed with 60 mL of water, and dried under reduced pressure at 50°C to obtain compound E-39 (13.8 g). The compound was identified as follows: 1 This was analyzed by H-NMR.

[0230] [Intermediate Synthesis Example 21] [ka]

[0231] Compound e-40 (25.0 g), synthesized by the method described in Helvetica Chimica Acta, 1981, vol. 64, #5, p.1672-1681, was added with anhydrous aluminum chloride (29.1 g) and heated at 130°C for 2 hours. The mixture was then allowed to cool to room temperature, and ice water and 1 L of ethyl acetate were added under ice cooling. After separation and washing with ethyl acetate and water, sodium sulfate was added to dry, and the solvent was removed using an evaporator. The resulting mixture was purified by silica gel column chromatography to obtain compound e-41 (20.0 g). Ethyl pivalate (50.0 g) was added to a solution of compound e-41 (20.0 g) in t-BuOH (150 mL), and then 5.5 g of sodium hydride (60%, dispersion in paraffin liquid) was added, followed by stirring at 80°C for 3 hours. The mixture was then cooled to room temperature, and 20 mL of concentrated hydrochloric acid was added. After separation and washing with ethyl acetate and water, sodium sulfate was added to dry the mixture, and the solvent was removed using an evaporator to obtain compound e-42. Compound e-42 was not purified, and 60 mL of concentrated hydrochloric acid was added and stirred at 40°C. After 1 hour, the reaction solution was ice-cooled and neutralized by adding 1N aqueous sodium hydroxide solution. After separation and washing with ethyl acetate and water, sodium sulfate was added to dry, and the solvent was removed using an evaporator. The resulting mixture was purified by silica gel column chromatography to obtain compound e-43 (15.4 g). The compound was identified by LC-MS and 1 This was analyzed by H-NMR. Compound E-43 (15.4 g), phenylboronic acid (11.7 g), tetrakis(triphenylphosphine)palladium (1.0 g), and potassium carbonate (60.0 g) were dissolved in a mixture of 50 mL of toluene and 50 mL of water, and heated at 110°C for 12 hours with vigorous stirring. After cooling to room temperature, the mixture was separated and washed with toluene and water, sodium sulfate was added to the organic layer to dry it, and the solvent was removed using an evaporator. The resulting mixture was purified by silica gel column chromatography to obtain compound E-44 (12.4 g). Compound E-44 (12.4 g) and 90 mL of tetrahydrofuran were ice-cooled while stirring. After 5 minutes of ice-cooling, methylmagnesium iodide-diethyl ether solution (1 mol / L, 50 mL) was added dropwise, heated to 35°C, and stirred for 2 hours. The reaction solution was then ice-cooled, and 90 mL of 20% aqueous perchloric acid was added. The precipitated solid was filtered, washed with 60 mL of water, and dried under reduced pressure at 50°C to obtain compound E-45 (10.4 g). The compound was identified as follows: 1 This was analyzed by H-NMR.

[0232] [Intermediate Synthesis Example 22] [ka]

[0233] Trifluoromethanesulfonic acid (10 g) was added to a mixed solution of methylenecyclohexane (5.2 g) and 1-adamantanecarbonyl chloride (Ad-COCl, 22 g) at 0°C, and then heated at 90°C for 10 minutes. The reaction solution was then cooled to 0°C, and 150 mL of hexane, 50 mL of ether, and 50 mL of water were added and stirred. The precipitated solid was filtered, washed with hexane, and dried under reduced pressure to obtain compound e-46 (4.2 g). The compound was identified as follows: 1 This was analyzed by H-NMR.

[0234] [Dye synthesis example 1] [ka]

[0235] Compound e-4 (5.0 g) and compound c-1 (1.0 g) were heated in toluene (20 mL) / methanol (20 mL) at 70° C. for 1 hour. After cooling at room temperature, the solvent was removed using an evaporator, and the mixture was purified by silica gel column chromatography (mobile phase: hexane / ethyl acetate=3 / 1) to obtain compound d-1 (2.7 g). Compound d-1 was identified as follows: 1 H-NMR and LC-MS were performed. Compound d-1 (2.7 g) and lithium tetrakis(pentafluorophenyl)borate diethyl ether complex (3.8 g) were stirred in dichloromethane (30 mL) / water (30 mL) at room temperature for 8 hours, and purified by silica gel column chromatography (mobile phase: dichloromethane) to obtain compound z-25 (4.4 g). Compound z-25 was identified as follows: 1 H-NMR, 19 F-NMR and LC-MS were used.

[0236] [Dye synthesis example 2] [ka]

[0237] Compound e-7 (5.0 g) and compound c-3 (1.2 g) were heated in toluene (20 mL) / methanol (20 mL) at 70° C. for 1 hour. After cooling at room temperature, the solvent was removed using an evaporator, and the mixture was purified by silica gel column chromatography (mobile phase: hexane / ethyl acetate = 3 / 1) to obtain compound d-2 (2.6 g). Compound d-2 was identified as follows: 1 H-NMR and LC-MS were performed. Compound d-2 (2.6 g) and lithium tetrakis(pentafluorophenyl)borate diethyl ether complex (3.7 g) were stirred in dichloromethane (30 mL) / water (30 mL) at room temperature for 8 hours, and purified by silica gel column chromatography (mobile phase: dichloromethane) to obtain compound z-130 (4.2 g). Compound z-130 was identified as follows: 1 H-NMR, 19 F-NMR and LC-MS were used.

[0238] [Dye synthesis example 3] [ka]

[0239] Compound E-8 (5.0 g) and compound C-4 (1.1 g) were heated in toluene (20 mL) / methanol (20 mL) at 90° C. for 1 hour. After cooling at room temperature, the solvent was removed using an evaporator, and the residue was purified by silica gel column chromatography (mobile phase: hexane / ethyl acetate=3 / 1) to obtain compound D-3 (2.6 g). Compound D-3 was identified as follows: 1 H-NMR and LC-MS were performed. Compound d-3 (2.6 g) and lithium tetrakis(pentafluorophenyl)borate diethyl ether complex (4.3 g) were stirred in dichloromethane (30 mL) / water (30 mL) at room temperature for 8 hours, and purified by silica gel column chromatography (mobile phase: dichloromethane) to obtain compound z-184 (4.5 g). Compound z-184 was identified as follows: 1 H-NMR, 19 F-NMR and LC-MS were used.

[0240] [Dye synthesis example 4] [ka]

[0241] Compound e-9 (5.0 g) and compound c-1 (1.1 g) were heated in toluene (20 mL) / methanol (20 mL) at 60° C. for 1 hour. After cooling at room temperature, the solvent was removed using an evaporator, and the mixture was purified by silica gel column chromatography (mobile phase: hexane / ethyl acetate=3 / 1) to obtain compound d-4 (3.2 g). Compound d-4 was identified as follows: 1 H-NMR and LC-MS were performed. Compound d-4 (3.2 g) and lithium tetrakis(pentafluorophenyl)borate diethyl ether complex (4.9 g) were stirred in dichloromethane (30 mL) / water (30 mL) at room temperature for 8 hours, and purified by silica gel column chromatography (mobile phase: dichloromethane) to obtain compound z-191 (4.9 g). Compound z-191 was identified as follows: 1 H-NMR, 19 F-NMR and LC-MS were used.

[0242] [Dye synthesis example 5] [ka]

[0243] Compound E-10 (5.0 g) and compound C-4 (0.98 g) were heated in toluene (20 mL) / methanol (20 mL) at 50° C. for 1 hour. After cooling at room temperature, the solvent was removed using an evaporator, and the mixture was purified by silica gel column chromatography (mobile phase: hexane / ethyl acetate = 3 / 1) to obtain compound D-5 (3.5 g). Compound D-5 was identified as follows: 1 H-NMR and LC-MS were performed. Compound d-5 (3.5 g) and lithium tetrakis(pentafluorophenyl)borate diethyl ether complex (4.7 g) were stirred in dichloromethane (30 mL) / water (30 mL) at room temperature for 8 hours, and purified by silica gel column chromatography (mobile phase: dichloromethane) to obtain compound z-211 (5.3 g). Compound z-211 was identified as follows: 1 H-NMR, 19 F-NMR and LC-MS were used.

[0244] [Dye synthesis example 6] [ka]

[0245] Compound E-14 (5.0 g), compound C-6 (3.5 g) and sodium acetate (1.4 g) were heated in acetic anhydride (30 mL) at 100° C. for 1 hour. After cooling at room temperature, the solvent was removed using an evaporator, and the mixture was purified by silica gel column chromatography (mobile phase: methanol) to obtain compound D-6 (3.7 g). Compound D-6 was identified as follows: 1 H-NMR and LC-MS were performed. Compound d-6 (3.7 g) and lithium tetrakis(pentafluorophenyl)borate diethyl ether complex (4.9 g) were stirred in dichloromethane (30 mL) / water (30 mL) at room temperature for 8 hours, and purified by silica gel column chromatography (mobile phase: dichloromethane) to obtain compound z-273 (5.5 g). Compound z-273 was identified as follows: 1 H-NMR, 19 F-NMR and LC-MS were used.

[0246] [Dye synthesis example 7] [ka]

[0247] Compound e-15 (5.0 g), compound c-6 (2.8 g) and sodium acetate (1.1 g) were heated in acetic anhydride (30 mL) at 100° C. for 1 hour. After cooling at room temperature, the solvent was removed using an evaporator, and the mixture was purified by silica gel column chromatography (mobile phase: methanol) to obtain compound d-7 (3.7 g). Compound d-7 was identified as follows: 1 H-NMR and LC-MS were performed. Compound d-7 (3.7 g) and lithium tetrakis(pentafluorophenyl)borate diethyl ether complex were stirred in dichloromethane (30 mL) / water (30 mL) at room temperature for 8 hours, and purified by silica gel column chromatography (mobile phase: dichloromethane) to obtain compound z-277 (5.4 g). Compound z-277 was identified as follows: 1 H-NMR, 19 F-NMR and LC-MS were used.

[0248] [Dye synthesis example 8] [ka]

[0249] Compound e-16 (5.0 g), compound c-6 (4.0 g) and sodium acetate (1.5 g) were heated in acetic anhydride (30 mL) at 100° C. for 1 hour. After cooling at room temperature, the solvent was removed using an evaporator, and the mixture was purified by silica gel column chromatography (mobile phase: methanol) to obtain compound d-8 (3.5 g). Compound d-8 was identified as follows: 1 H-NMR and LC-MS were performed. Compound d-8 (3.5 g) and lithium tetrakis(pentafluorophenyl)borate diethyl ether complex (5.1 g) were stirred in dichloromethane (30 mL) / water (30 mL) at room temperature for 8 hours, and purified by silica gel column chromatography (mobile phase: dichloromethane) to obtain compound z-298 (5.6 g). Compound z-298 was identified as follows: 1 H-NMR, 19 F-NMR and LC-MS were used.

[0250] [Dye synthesis example 9] [ka]

[0251] Compound E-22 (5.0 g) and compound C-1 (1.0 g) were heated in toluene (20 mL) / methanol (20 mL) at 60° C. for 1 hour. After cooling at room temperature, the solvent was removed using an evaporator, and the mixture was purified by silica gel column chromatography (mobile phase: hexane / ethyl acetate = 3 / 1) to obtain compound D-9 (2.9 g). Compound D-9 was identified as follows: 1 H-NMR and LC-MS were performed. Compound d-9 (2.9 g) and lithium tetrakis(pentafluorophenyl)borate diethyl ether complex (4.0 g) were stirred in dichloromethane (30 mL) / water (30 mL) at room temperature for 8 hours, and purified by silica gel column chromatography (mobile phase: dichloromethane) to obtain compound z-311 (4.5 g). Compound z-311 was identified as follows: 1 H-NMR, 19 F-NMR and LC-MS were used.

[0252] [Dye synthesis example 10] [ka]

[0253] Compound E-28 (5.0 g) and compound C-1 (1.0 g) were heated in toluene (20 mL) / methanol (20 mL) at 60° C. for 1 hour. After cooling at room temperature, the solvent was removed using an evaporator, and the mixture was purified by silica gel column chromatography (mobile phase: hexane / ethyl acetate = 3 / 1) to obtain compound D-10 (3.0 g). Compound D-10 was identified by 1 H-NMR and LC-MS were performed. Compound d-10 (3.0 g) and lithium tetrakis(pentafluorophenyl)borate diethyl ether complex (4.1 g) were stirred in dichloromethane (30 mL) / water (30 mL) at room temperature for 8 hours, and purified by silica gel column chromatography (mobile phase: dichloromethane) to obtain compound z-332 (4.1 g). Compound z-332 was identified as follows: 1 H-NMR, 19 F-NMR and LC-MS were used.

[0254] [Dye synthesis example 11] [ka]

[0255] Compound E-32 (5.0 g) and compound C-1 (1.1 g) were heated in toluene (20 mL) / methanol (20 mL) at 60° C. for 1 hour. After cooling at room temperature, the solvent was removed using an evaporator, and the mixture was purified by silica gel column chromatography (mobile phase: hexane / ethyl acetate = 3 / 1) to obtain compound D-11 (3.0 g). Compound D-11 was identified by 1 H-NMR and LC-MS were performed. Compound d-11 (3.0 g) and lithium tetrakis(pentafluorophenyl)borate diethyl ether complex (4.5 g) were stirred in dichloromethane (30 mL) / water (30 mL) at room temperature for 8 hours, and purified by silica gel column chromatography (mobile phase: dichloromethane) to obtain compound z-359 (4.8 g). Compound z-359 was identified as follows: 1 H-NMR, 19 F-NMR and LC-MS were used.

[0256] [Dye synthesis example 12] [ka]

[0257] Compound E-35 (5.0 g) and compound C-4 (1.1 g) were heated in toluene (20 mL) / methanol (20 mL) at 60° C. for 1 hour. After cooling at room temperature, the solvent was removed using an evaporator, and the mixture was purified by silica gel column chromatography (mobile phase: hexane / ethyl acetate = 3 / 1) to obtain compound D-12 (2.6 g). Compound D-12 was identified by 1 H-NMR and LC-MS were performed. Compound d-12 (2.6 g) and lithium tetrakis(pentafluorophenyl)borate diethyl ether complex (4.4 g) were stirred in dichloromethane (30 mL) / water (30 mL) at room temperature for 8 hours, and purified by silica gel column chromatography (mobile phase: dichloromethane) to obtain compound z-128 (4.6 g). Compound z-128 was identified by 1 H-NMR, 19 F-NMR and LC-MS were used.

[0258] [Dye synthesis example 13] [ka]

[0259] Compound e-9 (5.0 g) and compound c-4 (1.1 g) were heated in toluene (20 mL) / methanol (20 mL) at 60° C. for 1 hour. After cooling at room temperature, the solvent was removed using an evaporator, and the mixture was purified by silica gel column chromatography (mobile phase: hexane / ethyl acetate = 3 / 1) to obtain compound d-13 (3.1 g). Compound d-13 was identified by 1 H-NMR and LC-MS were performed. Compound d-13 (3.1 g) and lithium tetrakis(pentafluorophenyl)borate diethyl ether complex (4.8 g) were stirred in dichloromethane (30 mL) / water (30 mL) at room temperature for 8 hours, and purified by silica gel column chromatography (mobile phase: dichloromethane) to obtain compound z-199 (4.9 g). Compound z-199 was identified as follows: 1 H-NMR, 19 F-NMR and LC-MS were used.

[0260] [Dye synthesis example 14] [ka]

[0261] Compound E-8 (5.0 g) and compound C-1 (1.0 g) were heated in toluene (20 mL) / methanol (20 mL) at 90° C. for 1 hour. After cooling at room temperature, the solvent was removed using an evaporator, and the mixture was purified by silica gel column chromatography (mobile phase: hexane / ethyl acetate = 3 / 1) to obtain compound D-14 (3.0 g). Compound D-14 was identified by 1 H-NMR and LC-MS were performed. Compound d-14 (3.0 g) and lithium tetrakis(pentafluorophenyl)borate diethyl ether complex (4.7 g) were stirred in dichloromethane (30 mL) / water (30 mL) at room temperature for 8 hours, and purified by silica gel column chromatography (mobile phase: dichloromethane) to obtain compound z-153 (5.0 g). Compound z-153 was identified as follows: 1 H-NMR, 19 F-NMR and LC-MS were used.

[0262] [Dye synthesis example 15] [ka]

[0263] Compound E-39 (5.0 g) and compound C-8 (2.5 g) were heated in toluene (20 mL) / methanol (20 mL) at 90° C. for 1 hour. After cooling at room temperature, the solvent was removed using an evaporator, and the mixture was purified by silica gel column chromatography (mobile phase: hexane / ethyl acetate = 3 / 1) to obtain compound D-15 (3.5 g). Compound D-15 was identified by 1 H-NMR and LC-MS were performed. Compound d-15 (3.5 g) and lithium tetrakis(pentafluorophenyl)borate diethyl ether complex (4.7 g) were stirred in dichloromethane (30 mL) / water (30 mL) at room temperature for 8 hours, and purified by silica gel column chromatography (mobile phase: dichloromethane) to obtain compound z-72 (5.3 g). Compound z-72 was identified as follows: 1 H-NMR, 19 F-NMR and LC-MS were used.

[0264] [Dye synthesis example 16] [ka]

[0265] Compound E-45 (5.0 g) and compound C-1 (0.9 g) were heated in toluene (20 mL) / methanol (20 mL) at 90° C. for 1 hour. After cooling at room temperature, the solvent was removed using an evaporator, and the mixture was purified by silica gel column chromatography (mobile phase: hexane / ethyl acetate = 3 / 1) to obtain compound D-16 (6.0 g). Compound D-16 was identified by 1 H-NMR and LC-MS were performed. Compound d-16 (6.0 g) and lithium tetrakis(pentafluorophenyl)borate diethyl ether complex (7.3 g) were stirred in dichloromethane (30 mL) / water (30 mL) at room temperature for 8 hours, and purified by silica gel column chromatography (mobile phase: dichloromethane) to obtain compound z-360 (8.7 g). Compound z-360 was identified as follows: 1 H-NMR, 19 F-NMR and LC-MS were used.

[0266] [Dye synthesis example 17] [ka]

[0267] Compound e-28 (5.0 g), glutaconaldehyde dianil hydrochloride (5.4 g) and sodium acetate (1.2 g) were heated in acetic anhydride (30 mL) at 100° C. for 1 hour. After cooling at room temperature, the solvent was removed using an evaporator, and the mixture was purified by silica gel column chromatography (mobile phase: methanol) to obtain compound d-17 (5.4 g). Compound d-17 was identified as follows: 1 H-NMR and LC-MS were performed. Compound d-17 (5.4 g) and lithium tetrakis(pentafluorophenyl)borate diethyl ether complex (8.4 g) were stirred in dichloromethane (30 mL) / water (30 mL) at room temperature for 8 hours, and purified by silica gel column chromatography (mobile phase: dichloromethane) to obtain compound z-362 (8.7 g). Compound z-362 was identified as follows: 1 H-NMR, 19 F-NMR and LC-MS were used.

[0268] [Dye synthesis example 18] [ka]

[0269] Compound e-45 (5.0 g), glutaconaldehyde dianil hydrochloride (4.7 g) and sodium acetate (1.1 g) were heated in acetic anhydride (30 mL) at 100° C. for 1 hour. After cooling at room temperature, the solvent was removed using an evaporator, and the mixture was purified by silica gel column chromatography (mobile phase: methanol) to obtain compound d-18 (4.7 g). Compound d-18 was identified by 1 H-NMR and LC-MS were performed. Compound d-18 (4.7 g) and lithium tetrakis(pentafluorophenyl)borate diethyl ether complex (6.3 g) were stirred in dichloromethane (30 mL) / water (30 mL) at room temperature for 8 hours, and purified by silica gel column chromatography (mobile phase: dichloromethane) to obtain compound z-363 (7.0 g). Compound z-363 was identified as follows: 1 H-NMR, 19 F-NMR and LC-MS were used.

[0270] [Dye synthesis example 19] [ka]

[0271] Compound e-46 (5.0 g) and compound c-4 (0.6 g) were heated in toluene (20 mL) / methanol (20 mL) at 90° C. for 1 hour. After cooling at room temperature, the solvent was removed using an evaporator, and the mixture was purified by silica gel column chromatography (mobile phase: hexane / ethyl acetate = 3 / 1) to obtain compound d-19 (6.0 g). Compound d-19 was identified by 1H-NMR and LC-MS. Compound d-19 (6.1 g) and lithium tetrakis(pentafluorophenyl)borate diethyl ether complex (5.6 g) were stirred in dichloromethane (30 mL) / water (30 mL) at room temperature for 8 hours, and purified by silica gel column chromatography (mobile phase: dichloromethane) to obtain compound z-364 (8.5 g). Compound z-364 was identified as follows: 1 H-NMR, 19 F-NMR and LC-MS were used.

[0272] [Dye synthesis example 20] [ka]

[0273] Compound e-28 (5.0 g) and compound c-9 (0.9 g) were heated in toluene (20 mL) / methanol (20 mL) at 90° C. for 1 hour. After cooling at room temperature, the solvent was removed with an evaporator, and the mixture was purified by silica gel column chromatography (mobile phase: hexane / ethyl acetate = 3 / 1) to obtain compound d-20 (6.7 g). Compound d-20 was identified by 1H-NMR and LC-MS. Compound d-20 (6.7 g) and lithium tetrakis(pentafluorophenyl)borate diethyl ether complex (9.5 g) were stirred in dichloromethane (30 mL) / water (30 mL) at room temperature for 8 hours, and purified by silica gel column chromatography (mobile phase: dichloromethane) to obtain compound z-365 (11.1 g). Compound z-365 was identified as follows: 1 H-NMR, 19 F-NMR and LC-MS were used.

[0274] [Dye synthesis example 21] [ka]

[0275] Compound E-45 (5.0 g) and compound C-9 (0.8 g) were heated in toluene (20 mL) / methanol (20 mL) at 90° C. for 1 hour. After cooling at room temperature, the solvent was removed using an evaporator, and the mixture was purified by silica gel column chromatography (mobile phase: hexane / ethyl acetate = 3 / 1) to obtain compound D-21 (5.9 g). Compound D-21 was identified by 1 H-NMR and LC-MS were performed. Compound d-21 (5.9 g) and lithium tetrakis(pentafluorophenyl)borate diethyl ether complex (7.3 g) were stirred in dichloromethane (30 mL) / water (30 mL) at room temperature for 8 hours, and purified by silica gel column chromatography (mobile phase: dichloromethane) to obtain compound z-366 (8.5 g). Compound z-366 was identified as follows: 1 H-NMR, 19 F-NMR and LC-MS were used.

[0276] [Dye synthesis example 22] [ka]

[0277] Compound E-28 (5.0 g) and compound C-10 (1.4 g) were heated in toluene (20 mL) / methanol (20 mL) at 90° C. for 1 hour. After cooling at room temperature, the solvent was removed using an evaporator, and the mixture was purified by silica gel column chromatography (mobile phase: hexane / ethyl acetate = 3 / 1) to obtain compound D-22 (5.3 g). Compound D-22 was identified as follows: 1 H-NMR and LC-MS were performed. Compound d-22 (5.3 g) and lithium tetrakis(pentafluorophenyl)borate diethyl ether complex (6.8 g) were stirred in dichloromethane (30 mL) / water (30 mL) at room temperature for 8 hours, and purified by silica gel column chromatography (mobile phase: dichloromethane) to obtain compound z-367 (8.4 g). Compound z-367 was identified as follows: 1 H-NMR, 19 F-NMR and LC-MS were used.

[0278] [Dye synthesis example 23] [ka]

[0279] Compound E-45 (5.0 g) and compound C-10 (1.3 g) were heated in toluene (20 mL) / methanol (20 mL) at 90° C. for 1 hour. After cooling at room temperature, the solvent was removed using an evaporator, and the mixture was purified by silica gel column chromatography (mobile phase: hexane / ethyl acetate = 3 / 1) to obtain compound D-23 (4.3 g). Compound D-23 was identified as follows: 1 H-NMR and LC-MS were performed. Compound d-23 (4.3 g) and lithium tetrakis(pentafluorophenyl)borate diethyl ether complex (5.4 g) were stirred in dichloromethane (30 mL) / water (30 mL) at room temperature for 8 hours, and purified by silica gel column chromatography (mobile phase: dichloromethane) to obtain compound z-368 (6.7 g). Compound z-368 was identified as follows: 1 H-NMR, 19 F-NMR and LC-MS were used.

[0280] [Resin synthesis example 1] 8-Methyl-8-methoxycarbonyltetracyclo[4.4.0.1] represented by the following formula (a) 2,5 .1 7,10 100 parts by mass of dodeca-3-ene (hereinafter also referred to as "DNM"), 18 parts by mass of 1-hexene (molecular weight regulator), and 300 parts by mass of toluene (solvent for ring-opening polymerization reaction) were charged into a nitrogen-substituted reaction vessel, and the solution was heated to 80°C. Next, 0.2 parts by mass of a toluene solution of triethylaluminum (0.6 mol / L) and 0.9 parts by mass of a toluene solution of methanol-modified tungsten hexachloride (concentration 0.025 mol / L) were added as polymerization catalysts to the solution in the reaction vessel, and the solution was heated and stirred at 80°C for 3 hours to cause a ring-opening polymerization reaction, thereby obtaining a ring-opened polymer solution. The polymerization conversion rate in this polymerization reaction was 97%.

[0281] [ka]

[0282] 1,000 parts by mass of the ring-opened polymer solution obtained above was charged into an autoclave, and 0.12 parts by mass of RuHCl(CO)[P(C6H5)3]3 was added to this ring-opened polymer solution, and the mixture was heated under a hydrogen gas pressure of 100 kg / cm 2 The mixture was heated and stirred for 3 hours at a reaction temperature of 165°C to carry out a hydrogenation reaction. The resulting reaction solution (hydrogenated polymer solution) was cooled, and the hydrogen gas pressure was released. The resulting reaction solution was poured into a large amount of methanol to separate and recover a coagulated product, which was then dried to obtain a hydrogenated polymer (hereinafter also referred to as "resin A"). The resulting resin A had a number average molecular weight (Mn) of 32,000, a weight average molecular weight (Mw) of 137,000, and a glass transition temperature (Tg) of 165°C.

[0283] [Resin synthesis example 2] In a 3L four-neck flask, 35.12g (0.253mol) of 2,6-difluorobenzonitrile, 87.60g (0.250mol) of 9,9-bis(4-hydroxyphenyl)fluorene, 41.46g (0.300mol) of potassium carbonate, 443g of N,N-dimethylacetamide, and 111g of toluene were added. Then, a thermometer, a stirrer, a three-way cock with a nitrogen inlet tube, a Dean-Stark tube, and a cooling tube were attached to the four-neck flask. Next, after replacing the inside of the flask with nitrogen, the obtained solution was reacted at 140°C for 3 hours, and the generated water was removed from the Dean-Stark tube as needed. When the generation of water was no longer observed, the temperature was gradually increased to 160°C, and the reaction was continued at that temperature for 6 hours. Then, it was cooled to room temperature (25°C), the generated salt was removed with filter paper, the filtrate was poured into methanol for reprecipitation, and the filtrate (residue) was isolated by filtration. The residue was vacuum dried overnight at 60°C to obtain a white powder (hereinafter also referred to as "Resin B") (yield 95%). The obtained Resin B had a number average molecular weight (Mn) of 75,000, a weight average molecular weight (Mw) of 188,000, and a glass transition temperature (Tg) of 285°C.

[0284] [Resin synthesis example 3] In a 500 mL five-neck flask equipped with a thermometer, a stirrer, a nitrogen inlet tube, a dropping funnel with a side tube, a Dean-Stark tube, and a cooling tube, 27.66 g (0.08 mol) of 1,4-bis(4-amino-α,α-dimethylbenzyl)benzene and 7.38 g (0.02 mol) of 4,4'-bis(4-aminophenoxy)biphenyl were placed under a nitrogen stream and dissolved in 68.65 g of γ-butyrolactone and 17.16 g of N,N-dimethylacetamide. The resulting solution was cooled to 5°C using an ice-water bath, and while maintaining the same temperature, 22.62 g (0.1 mol) of 1,2,4,5-cyclohexanetetracarboxylic dianhydride and 0.50 g (0.005 mol) of triethylamine, an imidization catalyst, were added all at once. After the addition was completed, the temperature was raised to 180°C, and the mixture was refluxed for 6 hours while distilling off the distillate as needed. After the reaction was completed, the mixture was air-cooled until the internal temperature reached 100°C, and then 143.6 g of N,N-dimethylacetamide was added to dilute the mixture, and the mixture was cooled with stirring to obtain 264.16 g of a polyimide solution with a solid content of 20 mass%. A part of this polyimide solution was poured into 1 L of methanol to precipitate the polyimide. The filtered polyimide was washed with methanol and then dried in a vacuum dryer at 100°C for 24 hours to obtain a white powder (hereinafter also referred to as "resin C"). The IR spectrum of the obtained resin C was measured, and it was found to have a peak at 1704 cm specific to the imide group. -1 , 1770cm -1 Resin C had a glass transition temperature (Tg) of 310° C., and its inherent viscosity was measured to be 0.87.

[0285] [Example 1] [Preparation of substrate] In a container, 100 parts by mass of resin A obtained in Resin Synthesis Example 1, 0.04 parts by mass of the following compound (z-25) (maximum absorption wavelength in dichloromethane 933 nm) as compound (Z), 0.06 parts by mass of the following compound (x-1) (maximum absorption wavelength in dichloromethane 711 nm) as compound (X), 0.07 parts by mass of the following compound (x-2) (maximum absorption wavelength in dichloromethane 738 nm), and dichloromethane were added to prepare a solution with a resin concentration of 20% by mass. The obtained solution was cast on a smooth glass plate, dried at 20 ° C. for 8 hours, and then peeled off from the glass plate. The peeled coating film was further dried under reduced pressure at 100 ° C. for 8 hours to obtain a resin layer (1) having a thickness of 0.1 mm, a length of 210 mm, and a width of 210 mm.

[0286] ·Compound (z-25) [ka]

[0287] ·Compound (x-1) [ka]

[0288] ·Compound (x-2) [ka]

[0289] The following resin composition (1) was applied to one side of the obtained resin layer (1) using a bar coater so that the thickness of the obtained resin layer (2) was 3 μm, and the coating was heated in an oven at 70° C. for 2 minutes to volatilize and remove the solvent. Next, the coating was exposed (exposure dose 500 mJ / cm 2 ) using a UV conveyor-type exposure machine (manufactured by Eye Graphics Co., Ltd., Eye ultraviolet curing device, model US2-X0405, 60 Hz). 2 , Illuminance: 200mW / cm 2 ) was carried out to cure the resin composition (1) and form a resin layer (2) on the resin layer (1). In the same manner, a resin layer (2) made of the resin composition (1) was formed on the other surface of the resin layer (1). This resulted in a substrate having a resin layer (2) not containing the compound (Z) on both surfaces of the resin layer (1) containing the compound (Z).

[0290] Resin composition (1): A composition containing 60 parts by mass of tricyclodecane dimethanol acrylate, 40 parts by mass of dipentaerythritol hexaacrylate, 5 parts by mass of 1-hydroxycyclohexyl phenyl ketone, and methyl ethyl ketone (solvent, used so that the solids concentration in the resulting composition is 30% by mass).

[0291] The spectroscopic characteristics of the compound (z-25) in a dichloromethane solution and Xa, Ta, and Tb of the obtained substrate were measured. The results are shown in Tables 10 and 11, respectively. The spectroscopic characteristics of the obtained substrate are shown in FIG. 1.

[0292] Requirements (A) to (D) in Table 10 refer to requirements (A) to (D) in the column for <Compound (Z)>. In Table 10, in the transmission spectrum (wherein the transmission spectrum is a spectrum with a transmittance of 10% at the absorption maximum wavelength) measured using a solution in which each compound is dissolved in dichloromethane, a compound having a wavelength with a transmittance of 85% in the wavelength range of 950 to 1150 nm is marked with an O, and a compound not having such a wavelength is marked with an X.

[0293] <Heat resistance evaluation> The substrate obtained by the above-mentioned substrate preparation was heated for 7 hours in an oven preheated to 155° C., and the Tc and Td of the substrate after this heating test were measured. The results are shown in Table 11.

[0294] <UV resistance evaluation> The substrate obtained by the above-mentioned substrate preparation was exposed to a UV exposure machine (Iwasaki Electric Co., Ltd., Eye UV curing device US2-KO4501, illuminance: 180 mW / cm 2 , Irradiation amount: 560mJ / cm 2 The Te and Tf of the substrate after UV irradiation were measured. The results are shown in Table 11.

[0295] [Preparation of Optical Filter] A dielectric multilayer film (I) was formed on one surface of the substrate obtained by the above-mentioned substrate preparation, and a dielectric multilayer film (II) was further formed on the other surface of the substrate, to obtain an optical filter having a thickness of about 0.110 mm. The spectral transmittance of the obtained optical filter was measured in the vertical direction, and Tg and Th were calculated. The results are shown in FIG.

[0296] The dielectric multilayer film (I) is a laminate in which silica (SiO2) layers and titania (TiO2) layers are alternately laminated at a deposition temperature of 100°C (total of 28 layers). The dielectric multilayer film (II) is a laminate in which silica (SiO2) layers and titania (TiO2) layers are alternately laminated at a deposition temperature of 100°C (total of 24 layers). In both dielectric multilayer films (I) and (II), silica layers and titania layers were alternately laminated in the following order from the substrate side: titania layer, silica layer, titania layer, ...silica layer, titania layer, silica layer, with the silica layer being the outermost layer of the optical filter.

[0297] The thickness and number of each layer were optimized using optical thin film design software (Essential Macleod, Thin Film Center) in accordance with the wavelength-dependent characteristics of the refractive index of the substrate and the absorption characteristics of the compounds (Z) and (X) used, so as to achieve good transmittance in the visible range and reflectance performance in the near-infrared range. When performing optimization, the input parameters (target values) to the software in this embodiment were as shown in Table 8 below.

[0298] [Table 8]

[0299] As a result of optimizing the film configuration, the dielectric multilayer film (I) is a multilayer deposition film with 28 layers, in which a silica layer with a physical thickness of about 32 to 159 nm and a titania layer with a physical thickness of about 9 to 94 nm are alternately laminated, and the dielectric multilayer film (II) is a multilayer deposition film with 24 layers, in which a silica layer with a physical thickness of about 39 to 193 nm and a titania layer with a physical thickness of about 12 to 117 nm are alternately laminated. An example of the optimized film configuration is shown in Table 9 below.

[0300] [Table 9]

[0301] [Example 2] A substrate was obtained in the same manner as in Example 1, except that 0.04 parts by mass of the following compound (z-130) (maximum absorption wavelength in dichloromethane: 939 nm) was used instead of 0.04 parts by mass of compound (z-25), 0.06 parts by mass of the following compound (x-3) (maximum absorption wavelength in dichloromethane: 700 nm) was used instead of 0.06 parts by mass of compound (x-1), 0.07 parts by mass of the following compound (x-4) (maximum absorption wavelength in dichloromethane: 732 nm) was used instead of 0.07 parts by mass of compound (x-2), and resin B was used instead of resin A. The spectroscopic characteristics of compound (z-130) in dichloromethane were measured, and Xa and Ta to Tf of the obtained substrate were measured in the same manner as in Example 1. The results are shown in Tables 10 and 11, respectively.

[0302] ·Compound (z-130) [ka]

[0303] ·Compound (x-3) [ka]

[0304] ·Compound (x-4) [ka]

[0305] Next, in the same manner as in Example 1, a dielectric multilayer film (I) having a total of 28 layers was formed on one side of the obtained substrate by alternately stacking silica (SiO2) layers and titania (TiO2) layers, and a dielectric multilayer film (II) having a total of 24 layers was formed on the other side of the substrate by alternately stacking silica (SiO2) layers and titania (TiO2) layers, thereby obtaining an optical filter having a thickness of approximately 0.110 mm. The dielectric multilayer film was designed using the same design parameters as in Example 1, taking into consideration the wavelength dependency of the refractive index of the substrate, as in Example 1. The spectral transmittance of the obtained optical filter was measured in the vertical direction, and Tg and Th were calculated. The results are shown in Table 11.

[0306] [Example 3] A substrate was obtained in the same manner as in Example 1, except that 0.05 parts by mass of the following compound (z-184) (maximum absorption wavelength in dichloromethane: 1065 nm) was used instead of 0.04 parts by mass of compound (z-25), 0.07 parts by mass of compound (x-4) was used instead of 0.07 parts by mass of compound (x-2), and resin C was used instead of resin A. The spectroscopic characteristics of compound (z-184) in dichloromethane were measured, and Xa and Ta to Tf of the obtained substrate were measured in the same manner as in Example 1. The results are shown in Tables 10 and 11, respectively.

[0307] ·Compound (z-184) [ka]

[0308] Next, in the same manner as in Example 1, a dielectric multilayer film (I) having a total of 28 layers was formed on one side of the obtained substrate by alternately stacking silica (SiO2) layers and titania (TiO2) layers, and a dielectric multilayer film (II) having a total of 24 layers was formed on the other side of the substrate by alternately stacking silica (SiO2) layers and titania (TiO2) layers, thereby obtaining an optical filter having a thickness of approximately 0.110 mm. The dielectric multilayer film was designed using the same design parameters as in Example 1, taking into consideration the wavelength dependency of the refractive index of the substrate, as in Example 1. The spectral transmittance of the obtained optical filter was measured in the vertical direction, and Tg and Th were calculated. The results are shown in Table 11.

[0309] [Example 4] A substrate was obtained in the same manner as in Example 1, except that 0.05 parts by mass of the following compound (z-191) (maximum absorption wavelength in dichloromethane: 861 nm) was used instead of 0.04 parts by mass of compound (z-25), 0.06 parts by mass of compound (x-3) was used instead of 0.06 parts by mass of compound (x-1), and Acriview manufactured by Nippon Shokubai Co., Ltd. was used instead of resin A. The spectroscopic characteristics of compound (z-191) in dichloromethane were measured, and Xa and Ta to Tf of the obtained substrate were measured in the same manner as in Example 1. The results are shown in Tables 10 and 11, respectively.

[0310] ·Compound (z-191) [ka]

[0311] Next, in the same manner as in Example 1, a dielectric multilayer film (I) having a total of 28 layers was formed on one side of the obtained substrate by alternately stacking silica (SiO2) layers and titania (TiO2) layers, and a dielectric multilayer film (II) having a total of 24 layers was formed on the other side of the substrate by alternately stacking silica (SiO2) layers and titania (TiO2) layers, thereby obtaining an optical filter having a thickness of approximately 0.110 mm. The dielectric multilayer film was designed using the same design parameters as in Example 1, taking into consideration the wavelength dependency of the refractive index of the substrate, as in Example 1. The spectral transmittance of the obtained optical filter was measured in the vertical direction, and Tg and Th were calculated. The results are shown in Table 11.

[0312] [Example 5] A substrate was obtained in the same manner as in Example 1, except that 0.05 parts by mass of the following compound (z-211) (maximum absorption wavelength in dichloromethane: 976 nm) was used instead of 0.04 parts by mass of compound (z-25) in Example 1, and Pure Ace manufactured by Teijin Limited was used instead of Resin A. The spectroscopic characteristics of compound (z-211) in dichloromethane were measured, and Xa and Ta to Tf of the obtained substrate were measured in the same manner as in Example 1. The results are shown in Tables 10 and 11, respectively.

[0313] ·Compound (z-211) [ka]

[0314] Next, in the same manner as in Example 1, a dielectric multilayer film (I) having a total of 28 layers was formed on one side of the obtained substrate by alternately stacking silica (SiO2) layers and titania (TiO2) layers, and a dielectric multilayer film (II) having a total of 24 layers was formed on the other side of the substrate by alternately stacking silica (SiO2) layers and titania (TiO2) layers, thereby obtaining an optical filter having a thickness of approximately 0.110 mm. The dielectric multilayer film was designed using the same design parameters as in Example 1, taking into consideration the wavelength dependency of the refractive index of the substrate, as in Example 1. The spectral transmittance of the obtained optical filter was measured in the vertical direction, and Tg and Th were calculated. The results are shown in Table 11.

[0315] [Example 6] A substrate was obtained in the same manner as in Example 1, except that the compound (x-1) and the compound (x-2) were not used. Xa and Ta to Tf of the obtained substrate were determined in the same manner as in Example 1. The results are shown in Table 11.

[0316] Next, in the same manner as in Example 1, a dielectric multilayer film (I) having a total of 28 layers was formed on one side of the obtained substrate by alternately stacking silica (SiO2) layers and titania (TiO2) layers, and a dielectric multilayer film (II) having a total of 24 layers was formed on the other side of the substrate by alternately stacking silica (SiO2) layers and titania (TiO2) layers, thereby obtaining an optical filter having a thickness of approximately 0.110 mm. The dielectric multilayer film was designed using the same design parameters as in Example 1, taking into consideration the wavelength dependency of the refractive index of the substrate, as in Example 1. The spectral transmittance of the obtained optical filter was measured in the vertical direction, and Tg and Th were calculated. The results are shown in Table 11.

[0317] [Example 7] A substrate was obtained in the same manner as in Example 2, except that the compound (x-3) and the compound (x-4) were not used. Xa and Ta to Tf of the obtained substrate were determined in the same manner as in Example 2. The results are shown in Table 11.

[0318] Next, in the same manner as in Example 1, a dielectric multilayer film (I) having a total of 28 layers was formed on one side of the obtained substrate by alternately stacking silica (SiO2) layers and titania (TiO2) layers, and a dielectric multilayer film (II) having a total of 24 layers was formed on the other side of the substrate by alternately stacking silica (SiO2) layers and titania (TiO2) layers, thereby obtaining an optical filter having a thickness of approximately 0.110 mm. The dielectric multilayer film was designed using the same design parameters as in Example 1, taking into consideration the wavelength dependency of the refractive index of the substrate, as in Example 1. The spectral transmittance of the obtained optical filter was measured in the vertical direction, and Tg and Th were calculated. The results are shown in Table 11.

[0319] [Example 8] A substrate was obtained in the same manner as in Example 3, except that the compound (x-1) and the compound (x-4) were not used. Xa and Ta to Tf of the obtained substrate were determined in the same manner as in Example 3. The results are shown in Table 11.

[0320] Next, in the same manner as in Example 1, a dielectric multilayer film (I) having a total of 28 layers was formed on one side of the obtained substrate by alternately stacking silica (SiO2) layers and titania (TiO2) layers, and a dielectric multilayer film (II) having a total of 24 layers was formed on the other side of the substrate by alternately stacking silica (SiO2) layers and titania (TiO2) layers, thereby obtaining an optical filter having a thickness of approximately 0.110 mm. The dielectric multilayer film was designed using the same design parameters as in Example 1, taking into consideration the wavelength dependency of the refractive index of the substrate, as in Example 1. The spectral transmittance of the obtained optical filter was measured in the vertical direction, and Tg and Th were calculated. The results are shown in Table 11.

[0321] [Example 9] A substrate was obtained in the same manner as in Example 4, except that 0.06 parts by mass of the following compound (z-273) (maximum absorption wavelength in dichloromethane: 868 nm) was used instead of 0.05 parts by mass of compound (z-191). The spectroscopic characteristics of compound (z-273) in dichloromethane were measured, and Xa and Ta to Tf of the obtained substrate were measured in the same manner as in Example 4. The results are shown in Tables 10 and 11, respectively.

[0322] ·Compound (z-273) [ka]

[0323] Next, in the same manner as in Example 1, a dielectric multilayer film (I) having a total of 28 layers was formed on one side of the obtained substrate by alternately stacking silica (SiO2) layers and titania (TiO2) layers, and a dielectric multilayer film (II) having a total of 24 layers was formed on the other side of the substrate by alternately stacking silica (SiO2) layers and titania (TiO2) layers, thereby obtaining an optical filter having a thickness of approximately 0.110 mm. The dielectric multilayer film was designed using the same design parameters as in Example 1, taking into consideration the wavelength dependency of the refractive index of the substrate, as in Example 1. The spectral transmittance of the obtained optical filter was measured in the vertical direction, and Tg and Th were calculated. The results are shown in Table 11.

[0324] [Example 10] A substrate was obtained in the same manner as in Example 5, except that 0.05 parts by mass of the following compound (z-277) (maximum absorption wavelength in dichloromethane: 892 nm) was used instead of 0.05 parts by mass of the compound (z-211). The spectroscopic characteristics of compound (z-277) in dichloromethane were measured, and Xa and Ta to Tf of the obtained substrate were measured in the same manner as in Example 5. The results are shown in Tables 10 and 11, respectively.

[0325] ·Compound (z-277) [ka]

[0326] Next, in the same manner as in Example 1, a dielectric multilayer film (I) having a total of 28 layers was formed on one side of the obtained substrate by alternately stacking silica (SiO2) layers and titania (TiO2) layers, and a dielectric multilayer film (II) having a total of 24 layers was formed on the other side of the substrate by alternately stacking silica (SiO2) layers and titania (TiO2) layers, thereby obtaining an optical filter having a thickness of approximately 0.110 mm. The dielectric multilayer film was designed using the same design parameters as in Example 1, taking into consideration the wavelength dependency of the refractive index of the substrate, as in Example 1. The spectral transmittance of the obtained optical filter was measured in the vertical direction, and Tg and Th were calculated. The results are shown in Table 11.

[0327] [Example 11] A substrate was obtained in the same manner as in Example 1, except that 0.04 parts by mass of the following compound (z-298) (maximum absorption wavelength in dichloromethane: 1016 nm) was used instead of 0.04 parts by mass of the compound (z-25) in Example 1. The spectroscopic characteristics of compound (z-298) in dichloromethane were measured, and Xa and Ta to Tf of the obtained substrate were measured in the same manner as in Example 1. The results are shown in Tables 10 and 11, respectively.

[0328] ·Compound (z-298) [ka]

[0329] Next, in the same manner as in Example 1, a dielectric multilayer film (I) having a total of 28 layers was formed on one side of the obtained substrate by alternately stacking silica (SiO2) layers and titania (TiO2) layers, and a dielectric multilayer film (II) having a total of 24 layers was formed on the other side of the substrate by alternately stacking silica (SiO2) layers and titania (TiO2) layers, thereby obtaining an optical filter having a thickness of approximately 0.110 mm. The dielectric multilayer film was designed using the same design parameters as in Example 1, taking into consideration the wavelength dependency of the refractive index of the substrate, as in Example 1. The spectral transmittance of the obtained optical filter was measured in the vertical direction, and Tg and Th were calculated. The results are shown in Table 11.

[0330] [Example 12] A substrate was obtained in the same manner as in Example 2, except that 0.04 parts by mass of the following compound (z-311) (maximum absorption wavelength in dichloromethane: 933 nm) was used instead of 0.04 parts by mass of the compound (z-130). The spectroscopic characteristics of compound (z-311) in dichloromethane were measured, and Xa and Ta to Tf of the obtained substrate were measured in the same manner as in Example 2. The results are shown in Tables 10 and 11, respectively.

[0331] ·Compound (z-311) [ka]

[0332] Next, in the same manner as in Example 1, a dielectric multilayer film (I) having a total of 28 layers was formed on one side of the obtained substrate by alternately stacking silica (SiO2) layers and titania (TiO2) layers, and a dielectric multilayer film (II) having a total of 24 layers was formed on the other side of the substrate by alternately stacking silica (SiO2) layers and titania (TiO2) layers, thereby obtaining an optical filter having a thickness of approximately 0.110 mm. The dielectric multilayer film was designed using the same design parameters as in Example 1, taking into consideration the wavelength dependency of the refractive index of the substrate, as in Example 1. The spectral transmittance of the obtained optical filter was measured in the vertical direction, and Tg and Th were calculated. The results are shown in Table 11.

[0333] [Example 13] A substrate was obtained in the same manner as in Example 3, except that 0.04 parts by mass of the following compound (z-332) (maximum absorption wavelength in dichloromethane: 932 nm) was used instead of 0.05 parts by mass of compound (z-184). The spectroscopic characteristics of compound (z-332) in dichloromethane were measured, and Xa and Ta to Tf of the obtained substrate were measured in the same manner as in Example 3. The results are shown in Tables 10 and 11, respectively.

[0334] ·Compound (z-332) [ka]

[0335] Next, in the same manner as in Example 1, a dielectric multilayer film (I) having a total of 28 layers was formed on one side of the obtained substrate by alternately stacking silica (SiO2) layers and titania (TiO2) layers, and a dielectric multilayer film (II) having a total of 24 layers was formed on the other side of the substrate by alternately stacking silica (SiO2) layers and titania (TiO2) layers, thereby obtaining an optical filter having a thickness of approximately 0.110 mm. The dielectric multilayer film was designed using the same design parameters as in Example 1, taking into consideration the wavelength dependency of the refractive index of the substrate, as in Example 1. The spectral transmittance of the obtained optical filter was measured in the vertical direction, and Tg and Th were calculated. The results are shown in Table 11.

[0336] [Example 14] A substrate was obtained in the same manner as in Example 1, except that 0.04 parts by mass of the following compound (z-359) (maximum absorption wavelength in dichloromethane: 933 nm) was used instead of 0.04 parts by mass of the compound (z-25). The spectroscopic characteristics of compound (z-359) in dichloromethane were measured, and Xa and Ta to Tf of the obtained substrate were measured in the same manner as in Example 1. The results are shown in Tables 10 and 11, respectively.

[0337] ·Compound (z-359) [ka]

[0338] Next, in the same manner as in Example 1, a dielectric multilayer film (I) having a total of 28 layers was formed on one side of the obtained substrate by alternately stacking silica (SiO2) layers and titania (TiO2) layers, and a dielectric multilayer film (II) having a total of 24 layers was formed on the other side of the substrate by alternately stacking silica (SiO2) layers and titania (TiO2) layers, thereby obtaining an optical filter having a thickness of approximately 0.110 mm. The dielectric multilayer film was designed using the same design parameters as in Example 1, taking into consideration the wavelength dependency of the refractive index of the substrate, as in Example 1. The spectral transmittance of the obtained optical filter was measured in the vertical direction, and Tg and Th were calculated. The results are shown in Table 11.

[0339] [Example 15] A substrate was obtained in the same manner as in Example 1, except that 0.04 parts by mass of the following compound (z-360) (maximum absorption wavelength in dichloromethane: 943 nm) was used instead of 0.04 parts by mass of the compound (z-25) in Example 1, and 0.06 parts by mass of the compound (x-3) was used instead of 0.06 parts by mass of the compound (x-1). The spectroscopic characteristics of the compound (z-360) in dichloromethane were measured, and Xa and Ta to Tf of the obtained substrate were measured in the same manner as in Example 1. The results are shown in Tables 10 and 11, respectively.

[0340] ·Compound (z-360) [ka]

[0341] Next, in the same manner as in Example 1, a dielectric multilayer film (I) having a total of 28 layers was formed on one side of the obtained substrate by alternately stacking silica (SiO2) layers and titania (TiO2) layers, and a dielectric multilayer film (II) having a total of 24 layers was formed on the other side of the substrate by alternately stacking silica (SiO2) layers and titania (TiO2) layers, thereby obtaining an optical filter having a thickness of approximately 0.110 mm. The dielectric multilayer film was designed using the same design parameters as in Example 1, taking into consideration the wavelength dependency of the refractive index of the substrate, as in Example 1. The spectral transmittance of the obtained optical filter was measured in the vertical direction, and Tg and Th were calculated. The results are shown in Table 11.

[0342] [Example 15-1] A substrate was obtained in the same manner as in Example 1, except that 0.04 parts by mass of the following compound (z-362) (maximum absorption wavelength in dichloromethane: 893 nm) was used instead of 0.04 parts by mass of the compound (z-25) in Example 1, and Pure Ace manufactured by Teijin Limited was used instead of Resin A. The spectroscopic characteristics of compound (z-362) in dichloromethane were measured, and Xa and Ta to Tf of the obtained substrate were measured in the same manner as in Example 1. The results are shown in Tables 10 and 11, respectively.

[0343] ·Compound (z-362) [ka]

[0344] Next, in the same manner as in Example 1, a dielectric multilayer film (I) having a total of 28 layers was formed on one side of the obtained substrate by alternately stacking silica (SiO2) layers and titania (TiO2) layers, and a dielectric multilayer film (II) having a total of 24 layers was formed on the other side of the substrate by alternately stacking silica (SiO2) layers and titania (TiO2) layers, thereby obtaining an optical filter having a thickness of approximately 0.110 mm. The dielectric multilayer film was designed using the same design parameters as in Example 1, taking into consideration the wavelength dependency of the refractive index of the substrate, as in Example 1. The spectral transmittance of the obtained optical filter was measured in the vertical direction, and Tg and Th were calculated. The results are shown in Table 11.

[0345] [Example 15-2] A substrate was obtained in the same manner as in Example 1, except that 0.04 parts by mass of the following compound (z-363) (maximum absorption wavelength in dichloromethane: 898 nm) was used instead of 0.04 parts by mass of the compound (z-25). The spectroscopic characteristics of compound (z-363) in dichloromethane were measured, and Xa and Ta to Tf of the obtained substrate were measured in the same manner as in Example 1. The results are shown in Tables 10 and 11, respectively.

[0346] ·Compound (z-363) [ka]

[0347] Next, in the same manner as in Example 1, a dielectric multilayer film (I) having a total of 28 layers was formed on one side of the obtained substrate by alternately stacking silica (SiO2) layers and titania (TiO2) layers, and a dielectric multilayer film (II) having a total of 24 layers was formed on the other side of the substrate by alternately stacking silica (SiO2) layers and titania (TiO2) layers, thereby obtaining an optical filter having a thickness of approximately 0.110 mm. The dielectric multilayer film was designed using the same design parameters as in Example 1, taking into consideration the wavelength dependency of the refractive index of the substrate, as in Example 1. The spectral transmittance of the obtained optical filter was measured in the vertical direction, and Tg and Th were calculated. The results are shown in Table 11.

[0348] [Example 15-3] A substrate was obtained in the same manner as in Example 1, except that 0.04 parts by mass of the following compound (z-364) (maximum absorption wavelength in dichloromethane: 941 nm) was used instead of 0.04 parts by mass of the compound (z-25) in Example 1, and resin B was used instead of resin A. The spectroscopic characteristics of compound (z-364) in dichloromethane were measured, and Xa and Ta to Tf of the obtained substrate were measured in the same manner as in Example 1. The results are shown in Tables 10 and 11, respectively.

[0349] ·Compound (z-364) [ka]

[0350] Next, in the same manner as in Example 1, a dielectric multilayer film (I) having a total of 28 layers was formed on one side of the obtained substrate by alternately stacking silica (SiO2) layers and titania (TiO2) layers, and a dielectric multilayer film (II) having a total of 24 layers was formed on the other side of the substrate by alternately stacking silica (SiO2) layers and titania (TiO2) layers, thereby obtaining an optical filter having a thickness of approximately 0.110 mm. The dielectric multilayer film was designed using the same design parameters as in Example 1, taking into consideration the wavelength dependency of the refractive index of the substrate, as in Example 1. The spectral transmittance of the obtained optical filter was measured in the vertical direction, and Tg and Th were calculated. The results are shown in Table 11.

[0351] [Example 15-4] A substrate was obtained in the same manner as in Example 1, except that 0.04 parts by mass of the following compound (z-365) (maximum absorption wavelength in dichloromethane: 934 nm) was used instead of 0.04 parts by mass of the compound (z-25) in Example 1, and resin C was used instead of resin A. The spectroscopic characteristics of compound (z-365) in dichloromethane were measured, and Xa and Ta to Tf of the obtained substrate were measured in the same manner as in Example 1. The results are shown in Tables 10 and 11, respectively.

[0352] ·Compound (z-365) [ka]

[0353] Next, in the same manner as in Example 1, a dielectric multilayer film (I) having a total of 28 layers was formed on one side of the obtained substrate by alternately stacking silica (SiO2) layers and titania (TiO2) layers, and a dielectric multilayer film (II) having a total of 24 layers was formed on the other side of the substrate by alternately stacking silica (SiO2) layers and titania (TiO2) layers, thereby obtaining an optical filter having a thickness of approximately 0.110 mm. The dielectric multilayer film was designed using the same design parameters as in Example 1, taking into consideration the wavelength dependency of the refractive index of the substrate, as in Example 1. The spectral transmittance of the obtained optical filter was measured in the vertical direction, and Tg and Th were calculated. The results are shown in Table 11.

[0354] [Example 15-5] In Example 1, 0.04 parts by mass of the following compound (z-366) (maximum absorption wavelength in dichloromethane: 939 nm) was used in place of 0.04 parts by mass of the compound (z-25). And so on Other than that, the substrate was obtained in the same manner as in Example 1. The spectroscopic characteristics of compound (z-366) in dichloromethane were measured, and Xa and Ta to Tf of the obtained substrate were measured in the same manner as in Example 1. The results are shown in Tables 10 and 11, respectively.

[0355] ·Compound (z-366) [ka]

[0356] Next, in the same manner as in Example 1, a dielectric multilayer film (I) having a total of 28 layers was formed on one side of the obtained substrate by alternately stacking silica (SiO2) layers and titania (TiO2) layers, and a dielectric multilayer film (II) having a total of 24 layers was formed on the other side of the substrate by alternately stacking silica (SiO2) layers and titania (TiO2) layers, thereby obtaining an optical filter having a thickness of approximately 0.110 mm. The dielectric multilayer film was designed using the same design parameters as in Example 1, taking into consideration the wavelength dependency of the refractive index of the substrate, as in Example 1. The spectral transmittance of the obtained optical filter was measured in the vertical direction, and Tg and Th were calculated. The results are shown in Table 11.

[0357] [Example 15-6] In Example 1, 0.04 parts by mass of the following compound (z-367) (maximum absorption wavelength in dichloromethane: 942 nm) was used in place of 0.04 parts by mass of the compound (z-25). And so on Other than that, the substrate was obtained in the same manner as in Example 1. The spectroscopic characteristics of compound (z-367) in dichloromethane were measured, and Xa and Ta to Tf of the obtained substrate were measured in the same manner as in Example 1. The results are shown in Tables 10 and 11, respectively.

[0358] ·Compound (z-367) [ka]

[0359] Next, in the same manner as in Example 1, a dielectric multilayer film (I) having a total of 28 layers was formed on one side of the obtained substrate by alternately stacking silica (SiO2) layers and titania (TiO2) layers, and a dielectric multilayer film (II) having a total of 24 layers was formed on the other side of the substrate by alternately stacking silica (SiO2) layers and titania (TiO2) layers, thereby obtaining an optical filter having a thickness of approximately 0.110 mm. The dielectric multilayer film was designed using the same design parameters as in Example 1, taking into consideration the wavelength dependency of the refractive index of the substrate, as in Example 1. The spectral transmittance of the obtained optical filter was measured in the vertical direction, and Tg and Th were calculated. The results are shown in Table 11.

[0360] [Example 15-7] In Example 1, 0.04 parts by mass of the following compound (z-368) (maximum absorption wavelength in dichloromethane: 945 nm) was used in place of 0.04 parts by mass of the compound (z-25). And so on Other than that, the substrate was obtained in the same manner as in Example 1. The spectroscopic characteristics of compound (z-368) in dichloromethane were measured, and Xa and Ta to Tf of the obtained substrate were measured in the same manner as in Example 1. The results are shown in Tables 10 and 11, respectively.

[0361] ·Compound (z-368) [ka]

[0362] Next, in the same manner as in Example 1, a dielectric multilayer film (I) having a total of 28 layers was formed on one side of the obtained substrate by alternately stacking silica (SiO2) layers and titania (TiO2) layers, and a dielectric multilayer film (II) having a total of 24 layers was formed on the other side of the substrate by alternately stacking silica (SiO2) layers and titania (TiO2) layers, thereby obtaining an optical filter having a thickness of approximately 0.110 mm. The dielectric multilayer film was designed using the same design parameters as in Example 1, taking into consideration the wavelength dependency of the refractive index of the substrate, as in Example 1. The spectral transmittance of the obtained optical filter was measured in the vertical direction, and Tg and Th were calculated. The results are shown in Table 11.

[0363] [Example 16] A container was charged with 100 parts by mass of resin A obtained in Resin Synthesis Example 1, 0.56 parts by mass of compound (x-1) as compound (X), 0.68 parts by mass of compound (x-2), and dichloromethane to prepare a solution with a resin concentration of 20% by mass. The solution was then filtered through a Millipore filter having a pore size of 5 μm to obtain a resin solution (E16-1). Similarly, 100 parts by mass of resin A, 0.42 parts by mass of the following compound (z-128) (maximum absorption wavelength in dichloromethane: 942 nm) as compound (Z), and dichloromethane were added to prepare a solution with a resin concentration of 20% by mass, and the solution was filtered through a Millipore filter having a pore size of 5 μm to obtain a resin solution (E16-2).

[0364] ·Compound (z-128) [ka]

[0365] The following resin composition (2) was applied by spin coating to both sides of a transparent glass support "OA-10G" (thickness 200 μm) manufactured by Nippon Electric Glass Co., Ltd., cut to a size of 200 mm x 200 mm, so that the film thickness after drying would be approximately 1 μm, and then heated on a hot plate at 80° C. for 2 minutes to volatilize and remove the solvent, thereby forming an adhesive layer that functions as an adhesive layer between the glass support and the coating resin layer (1) and coating resin layer (2) described below.

[0366] Next, a resin solution (E16-1) was applied to one side of the glass support on which the adhesive layer was formed, using a spin coater, so that the film thickness after drying would be 10 μm, and the coating resin layer (2) was formed by heating on a hot plate at 80 ° C for 5 minutes to volatilize and remove the solvent. Furthermore, a resin solution (E16-2) was applied to the other side of the glass support on which the adhesive layer was formed, using a spin coater, so that the film thickness after drying would be 10 μm, and the coating resin layer (1) was formed by heating on a hot plate at 80 ° C for 5 minutes to volatilize and remove the solvent. As a result, a substrate having a thickness of 222 μm was obtained, in which a resin layer containing the compound (Z) was laminated on one side of the glass support and a resin layer not containing the compound (Z) was laminated on the other side. The spectroscopic characteristics of compound (z-128) in dichloromethane were measured, and Xa and Ta to Tf of the obtained base material were determined in the same manner as in Example 1. The results are shown in Tables 10 and 12.

[0367] Resin composition (2): 30 parts by mass of isocyanuric acid ethylene oxide modified triacrylate (trade name: Aronix M-315, manufactured by Toa Gosei Co., Ltd.), 20 parts by mass of 1,9-nonanediol diacrylate, 20 parts by mass of methacrylic acid, 30 parts by mass of glycidyl methacrylate, 5 parts by mass of 3-glycidoxypropyltrimethoxysilane, 5 parts by mass of 1-hydroxycyclohexylbenzophenone (trade name: IRGACURE184, manufactured by BASF Japan Ltd.), and 1 part by mass of San-Aid SI-110 base agent (manufactured by Sanshin Chemical Industry Co., Ltd.) were mixed and dissolved in propylene glycol monomethyl ether acetate to a solid content concentration of 50% by mass, and then filtered through a Millipore filter having a pore size of 0.2 μm.

[0368] Next, in the same manner as in Example 1, a dielectric multilayer film (I) having a total of 28 layers was formed on one side of the obtained substrate by alternately stacking silica (SiO2) layers and titania (TiO2) layers, and a dielectric multilayer film (II) having a total of 24 layers was formed on the other side of the substrate by alternately stacking silica (SiO2) layers and titania (TiO2) layers, thereby obtaining an optical filter having a thickness of approximately 0.226 mm. The dielectric multilayer film was designed using the same design parameters as in Example 1, taking into consideration the wavelength dependency of the refractive index of the substrate, as in Example 1. The spectral transmittance of the obtained optical filter was measured in the vertical direction, and Tg and Th were calculated. The results are shown in Table 12.

[0369] [Example 17] A container was charged with 100 parts by mass of resin A obtained in Resin Synthesis Example 1, 0.68 parts by mass of compound (x-2) as compound (X), 0.55 parts by mass of compound (x-3), and dichloromethane to prepare a solution with a resin concentration of 20% by mass, and the solution was filtered through a Millipore filter having a pore size of 5 μm to obtain a resin solution (E17-1). Similarly, 100 parts by mass of resin A, 0.45 parts by mass of the following compound (z-199) (maximum absorption wavelength in dichloromethane: 884 nm) as compound (Z), and dichloromethane were added to prepare a solution with a resin concentration of 20% by mass, and the solution was filtered through a Millipore filter having a pore size of 5 μm to obtain a resin solution (E17-2).

[0370] ·Compound (z-199) [ka]

[0371] Resin solution (E17-1) was applied to one side of a resin support (ZEONORFILM ZF-16, Zeon Corporation, 100 μm thick) so that the thickness after drying was 10 μm, and the solution was dried at 80 ° C for 8 hours, and then further dried in a vacuum at 150 ° C for 8 hours to form a coating resin layer (2). Furthermore, resin solution (E17-2) was applied to the other side of the resin support so that the thickness after drying was 10 μm, and the solution was dried at 80 ° C for 8 hours, and then further dried in a vacuum at 150 ° C for 8 hours to form a coating resin layer (1). As a result, a substrate having a thickness of 120 μm, which has a resin layer containing compound (Z) on one side of the resin support and a resin layer not containing compound (Z) on the other side, was obtained. The spectroscopic characteristics of the compound (z-199) in dichloromethane were measured, and Xa and Ta to Tf of the obtained substrate were determined in the same manner as in Example 1. The results are shown in Tables 10 and 12.

[0372] Next, in the same manner as in Example 1, a dielectric multilayer film (I) having a total of 28 layers was formed by alternately stacking silica (SiO2) layers and titania (TiO2) layers on one side of the obtained substrate, and a dielectric multilayer film (II) having a total of 24 layers was formed by alternately stacking silica (SiO2) layers and titania (TiO2) layers on the other side of the substrate, thereby obtaining an optical filter having a thickness of approximately 0.124 mm. The dielectric multilayer film was designed using the same design parameters as in Example 1, taking into consideration the wavelength dependency of the refractive index of the substrate, as in Example 1. The spectral transmittance of the obtained optical filter was measured in the vertical direction, and Tg and Th were calculated. The results are shown in Table 12.

[0373] [Example 18] A container was charged with 100 parts by mass of resin A obtained in Resin Synthesis Example 1, 0.52 parts by mass of the following compound (z-153) (maximum absorption wavelength in dichloromethane: 1054 nm) as compound (Z), and dichloromethane to prepare a solution with a resin concentration of 20% by mass. The solution was then filtered through a Millipore filter having a pore size of 5 μm to obtain resin solution (E18).

[0374] ·Compound (z-153) [ka]

[0375] The resin composition (2) was applied by spin coating to one side of an absorption-type glass support "BS-6" (thickness 200 μm) manufactured by Matsunami Glass Industry Co., Ltd., cut to a size of 200 mm x 200 mm, so that the film thickness after drying would be approximately 1 μm, and then heated on a hot plate at 80° C. for 2 minutes to volatilize and remove the solvent, thereby forming an adhesive layer that functions as an adhesive layer between the absorption-type glass support and the coating resin layer (1) described later.

[0376] Next, the resin solution (E18) was applied onto the adhesive layer using a spin coater so that the film thickness after drying would be 10 μm, and the solution was heated on a hot plate at 80° C. for 5 minutes to volatilize and remove the solvent, forming a coating resin layer (1). As a result, a substrate having a thickness of 211 μm was obtained in which a resin layer containing compound (Z) was laminated on one side of an absorption-type glass support. The spectroscopic characteristics of compound (z-153) in dichloromethane were measured, and Xa and Ta to Tf of the obtained base material were determined in the same manner as in Example 1. The results are shown in Tables 10 and 12.

[0377] Next, in the same manner as in Example 1, a dielectric multilayer film (I) having a total of 28 layers was formed by alternately stacking silica (SiO2) layers and titania (TiO2) layers on one side of the obtained substrate, and a dielectric multilayer film (II) having a total of 24 layers was formed by alternately stacking silica (SiO2) layers and titania (TiO2) layers on the other side of the substrate, thereby obtaining an optical filter having a thickness of approximately 0.215 mm. The dielectric multilayer film was designed using the same design parameters as in Example 1, taking into consideration the wavelength dependency of the refractive index of the substrate, as in Example 1. The spectral transmittance of the obtained optical filter was measured in the vertical direction, and Tg and Th were calculated. The results are shown in Table 12.

[0378] [Example 19] A container was charged with 100 parts by mass of resin A obtained in Resin Synthesis Example 1, 0.57 parts by mass of compound (x-3) as compound (X), 0.68 parts by mass of compound (x-4), and dichloromethane to prepare a solution with a resin concentration of 20% by mass. The solution was then filtered through a Millipore filter having a pore size of 5 μm to obtain a resin solution (E19-1). Similarly, 100 parts by mass of resin A, 0.52 parts by mass of compound (z-211) as compound (Z), and dichloromethane were added to prepare a solution with a resin concentration of 20% by mass, and the solution was filtered through a Millipore filter having a pore size of 5 μm to obtain resin solution (E19-2).

[0379] The resin composition (2) was applied by spin coating to both sides of a transparent glass support "OA-10G" (thickness 200 μm) manufactured by Nippon Electric Glass Co., Ltd., cut to a size of 200 mm × 200 mm, so that the film thickness after drying would be about 1 μm, and then heated on a hot plate at 80 ° C. for 2 minutes to volatilize and remove the solvent, and the glass support and the film described later were combined. Ruko An adhesive layer was formed to function as an adhesive layer between the coating resin layer (1) and the coating resin layer (2).

[0380] Next, a resin solution (E19-1) was applied to one side of the glass support on which the adhesive layer was formed using a spin coater so that the film thickness after drying would be 10 μm, and the coating was heated on a hot plate at 80 ° C for 5 minutes to volatilize and remove the solvent, forming a coating resin layer (2). Furthermore, a resin solution (E19-2) was applied to the other side of the glass support on which the adhesive layer was formed using a spin coater so that the film thickness after drying would be 10 μm, and the coating was heated on a hot plate at 80 ° C for 5 minutes to volatilize and remove the solvent, forming a coating resin layer (1). As a result, a resin layer containing the compound (Z) was laminated on one side of the glass support, and a resin layer not containing the compound (Z) was laminated on the other side to obtain a substrate having a thickness of 222 μm. Xa and Ta to Tf of the obtained substrate were determined in the same manner as in Example 1. The results are shown in Table 12.

[0381] Next, in the same manner as in Example 1, a dielectric multilayer film (I) having a total of 28 layers was formed on one side of the obtained substrate by alternately stacking silica (SiO2) layers and titania (TiO2) layers, and a dielectric multilayer film (II) having a total of 24 layers was formed on the other side of the substrate by alternately stacking silica (SiO2) layers and titania (TiO2) layers, thereby obtaining an optical filter having a thickness of approximately 0.226 mm. The dielectric multilayer film was designed using the same design parameters as in Example 1, taking into consideration the wavelength dependency of the refractive index of the substrate, as in Example 1. The spectral transmittance of the obtained optical filter was measured in the vertical direction, and Tg and Th were calculated. The results are shown in Table 12.

[0382] [Example 20] A container was charged with 100 parts by mass of resin A obtained in Resin Synthesis Example 1, 0.57 parts by mass of compound (x-3) as compound (X), 0.68 parts by mass of compound (x-4), and dichloromethane to prepare a solution with a resin concentration of 20% by mass. The solution was then filtered through a Millipore filter having a pore size of 5 μm to obtain a resin solution (E20-1). Similarly, 100 parts by mass of resin A, 0.42 parts by mass of the following compound (z-72) (maximum absorption wavelength in dichloromethane: 937 nm) as compound (Z), and dichloromethane were added to prepare a solution with a resin concentration of 20% by mass. The solution was filtered through a Millipore filter having a pore size of 5 μm to obtain a resin solution (E20-2).

[0383] ·Compound (z-72) [ka]

[0384] Resin solution (E20-1) was applied to one side of a resin support (ZEONORFILM ZF-16, Zeon Corporation, 100 μm thick) so that the thickness after drying was 10 μm, and then dried at 80 ° C for 8 hours, and then further dried in a vacuum at 150 ° C for 8 hours to obtain a coating resin layer (2). Furthermore, resin solution (E20-2) was applied to the other side of the resin support so that the thickness after drying was 10 μm, and then dried at 80 ° C for 8 hours, and then further dried in a vacuum at 150 ° C for 8 hours to form a coating resin layer (1). As a result, a substrate having a thickness of 120 μm, which has a resin layer containing compound (Z) on one side of the resin support and a resin layer not containing compound (Z) on the other side, was obtained. The spectroscopic characteristics of compound (z-72) in dichloromethane were measured, and Xa and Ta to Tf of the obtained substrate were determined in the same manner as in Example 1. The results are shown in Tables 10 and 12.

[0385] Next, in the same manner as in Example 1, a dielectric multilayer film (I) having a total of 28 layers was formed by alternately stacking silica (SiO2) layers and titania (TiO2) layers on one side of the obtained substrate, and a dielectric multilayer film (II) having a total of 24 layers was formed by alternately stacking silica (SiO2) layers and titania (TiO2) layers on the other side of the substrate, thereby obtaining an optical filter having a thickness of approximately 0.124 mm. The dielectric multilayer film was designed using the same design parameters as in Example 1, taking into consideration the wavelength dependency of the refractive index of the substrate, as in Example 1. The spectral transmittance of the obtained optical filter was measured in the vertical direction, and Tg and Th were calculated. The results are shown in Table 12.

[0386] [Example 21] A container was charged with 100 parts by mass of resin A obtained in Resin Synthesis Example 1, 0.56 parts by mass of compound (x-1) as compound (X), 0.68 parts by mass of compound (x-2), and dichloromethane to prepare a solution with a resin concentration of 20% by mass, and the solution was filtered through a Millipore filter having a pore size of 5 μm to obtain a resin solution (E21-1). Similarly, 100 parts by mass of resin A, 0.45 parts by mass of compound (z-311) as compound (Z), and dichloromethane were added to prepare a solution with a resin concentration of 20% by mass, and the solution was filtered through a Millipore filter having a pore size of 5 μm to obtain resin solution (E21-2).

[0387] The resin composition (2) was applied by spin coating to both sides of a transparent glass support "OA-10G" (thickness 200 μm) manufactured by Nippon Electric Glass Co., Ltd., cut to a size of 200 mm x 200 mm, so that the film thickness after drying would be approximately 1 μm, and then heated on a hot plate at 80° C. for 2 minutes to volatilize and remove the solvent, thereby forming an adhesive layer that functions as an adhesive layer between the glass support and the coating resin layer (1) and coating resin layer (2) described below.

[0388] Next, a resin solution (E21-1) was applied to one side of the glass support on which the adhesive layer was formed using a spin coater so that the film thickness after drying would be 10 μm, and the coating resin layer (2) was formed by heating on a hot plate at 80 ° C for 5 minutes to volatilize and remove the solvent. Furthermore, a resin solution (E21-2) was applied to the other side of the glass support on which the adhesive layer was formed using a spin coater so that the film thickness after drying would be 10 μm, and the coating resin layer (1) was formed by heating on a hot plate at 80 ° C for 5 minutes to volatilize and remove the solvent. As a result, a substrate having a thickness of 222 μm was obtained in which a resin layer containing the compound (Z) was laminated on one side of the glass support and a resin layer not containing the compound (Z) was laminated on the other side. Xa and Ta to Tf of the obtained substrate were determined in the same manner as in Example 1. The results are shown in Tables 10 and 12.

[0389] Next, in the same manner as in Example 1, a dielectric multilayer film (I) having a total of 28 layers was formed on one side of the obtained substrate by alternately stacking silica (SiO2) layers and titania (TiO2) layers, and a dielectric multilayer film (II) having a total of 24 layers was formed on the other side of the substrate by alternately stacking silica (SiO2) layers and titania (TiO2) layers, thereby obtaining an optical filter having a thickness of approximately 0.226 mm. The dielectric multilayer film was designed using the same design parameters as in Example 1, taking into consideration the wavelength dependency of the refractive index of the substrate, as in Example 1. The spectral transmittance of the obtained optical filter was measured in the vertical direction, and Tg and Th were calculated. The results are shown in Table 12.

[0390] [Comparative Example 1] A substrate was obtained in the same manner as in Example 1, except that the compound (Z) was not used. Except for using this substrate, Xa and Ta to Tf were determined in the same manner as in Example 1. The results are shown in Table 11.

[0391] Next, in the same manner as in Example 1, a dielectric multilayer film (I) having a total of 28 layers was formed on one side of the obtained substrate by alternately stacking silica (SiO2) layers and titania (TiO2) layers, and a dielectric multilayer film (II) having a total of 24 layers was formed on the other side of the substrate by alternately stacking silica (SiO2) layers and titania (TiO2) layers, thereby obtaining an optical filter having a thickness of approximately 0.110 mm. The dielectric multilayer film was designed using the same design parameters as in Example 1, taking into consideration the wavelength dependency of the refractive index of the substrate, as in Example 1. The spectral transmittance of the obtained optical filter was measured in the vertical direction, and Tg and Th were calculated. The results are shown in Table 11.

[0392] [Comparative Example 2] A substrate was obtained in the same manner as in Example 2, except that no compound (Z) was used, and 0.06 parts by mass of compound (x-1), 0.07 parts by mass of compound (x-4), and 0.06 parts by mass of compound (x-5) (maximum absorption wavelength in dichloromethane: 1095 nm) were used as compound (X). The spectroscopic properties of compound (x-5) in dichloromethane were measured, and Xa and Ta to Tf of the obtained substrate were determined in the same manner as in Example 2. The results are shown in Tables 10 and 11, respectively. The spectroscopic properties of the obtained substrate are shown in FIG.

[0393] ·Compound (x-5) [ka]

[0394] Next, in the same manner as in Example 1, a dielectric multilayer film (I) having a total of 28 layers was formed on one side of the obtained substrate by alternately stacking silica (SiO2) layers and titania (TiO2) layers, and a dielectric multilayer film (II) having a total of 24 layers was formed on the other side of the substrate by alternately stacking silica (SiO2) layers and titania (TiO2) layers, thereby obtaining an optical filter having a thickness of approximately 0.110 mm. The dielectric multilayer film was designed using the same design parameters as in Example 1, taking into consideration the wavelength dependency of the refractive index of the substrate, as in Example 1. The spectral transmittance of the obtained optical filter was measured in the vertical direction, and Tg and Th were calculated. The results are shown in Table 11. The spectral characteristics of the obtained optical filter are shown in FIG.

[0395] [Comparative Example 3] A substrate was obtained in the same manner as in Example 3, except that no compound (Z) was used, and 0.07 parts by mass of compound (x-2), 0.06 parts by mass of compound (x-3), and 0.05 parts by mass of compound (x-6) (maximum absorption wavelength in dichloromethane: 835 nm) were used as compound (X). The spectroscopic characteristics of compound (x-6) in dichloromethane were measured, and Xa and Ta to Tf of the obtained substrate were determined in the same manner as in Example 3. The results are shown in Tables 10 and 11, respectively.

[0396] ·Compound (x-6) [ka]

[0397] Next, in the same manner as in Example 1, a dielectric multilayer film (I) having a total of 28 layers was formed on one side of the obtained substrate by alternately stacking silica (SiO2) layers and titania (TiO2) layers, and a dielectric multilayer film (II) having a total of 24 layers was formed on the other side of the substrate by alternately stacking silica (SiO2) layers and titania (TiO2) layers, thereby obtaining an optical filter having a thickness of approximately 0.110 mm. The dielectric multilayer film was designed using the same design parameters as in Example 1, taking into consideration the wavelength dependency of the refractive index of the substrate, as in Example 1. The spectral transmittance of the obtained optical filter was measured in the vertical direction, and Tg and Th were calculated. The results are shown in Table 11.

[0398] [Comparative Example 4] A container was charged with 100 parts by mass of resin A obtained in Resin Synthesis Example 1, 0.29 parts by mass of compound (x-1) as compound (X), 0.32 parts by mass of compound (x-4), and 0.30 parts by mass of compound (x-5), as well as dichloromethane, to prepare a solution with a resin concentration of 20% by mass. The solution was then filtered through a Millipore filter having a pore size of 5 μm to obtain resin solution (H4-1).

[0399] The resin composition (2) was applied by spin coating to both sides of a transparent glass support "OA-10G" (thickness 200 μm) manufactured by Nippon Electric Glass Co., Ltd., cut to a size of 200 mm x 200 mm, so that the film thickness after drying would be approximately 1 μm, and then heated on a hot plate at 80° C. for 2 minutes to volatilize and remove the solvent, thereby forming an adhesive layer that functions as an adhesive layer between the glass support and the coating resin layer (1) and coating resin layer (2) described below.

[0400] Next, a resin solution (H4-1) was applied to one side of the adhesive layer using a spin coater so that the film thickness after drying would be 10 μm, and the coating was heated on a hot plate at 80 ° C for 5 minutes to volatilize and remove the solvent, forming a coating resin layer (1). Furthermore, a resin solution (H4-1) was applied to the other side of the glass support on which the adhesive layer was formed using a spin coater so that the film thickness after drying would be 10 μm, and the coating was heated on a hot plate at 80 ° C for 5 minutes to volatilize and remove the solvent, forming a coating resin layer (2). As a result, a substrate having a thickness of 222 μm was obtained in which a resin layer not containing compound (Z) was laminated on both sides of the glass support. Xa and Ta to Tf of the obtained substrate were determined in the same manner as in Example 1. The results are shown in Table 12.

[0401] Next, in the same manner as in Example 1, a dielectric multilayer film (I) having a total of 28 layers was formed on one side of the obtained substrate by alternately stacking silica (SiO2) layers and titania (TiO2) layers, and a dielectric multilayer film (II) having a total of 24 layers was formed on the other side of the substrate by alternately stacking silica (SiO2) layers and titania (TiO2) layers, thereby obtaining an optical filter having a thickness of approximately 0.226 mm. The dielectric multilayer film was designed using the same design parameters as in Example 1, taking into consideration the wavelength dependency of the refractive index of the substrate, as in Example 1. The spectral transmittance of the obtained optical filter was measured in the vertical direction, and Tg and Th were calculated. The results are shown in Table 12.

[0402] [Comparative Example 5] A container was charged with 100 parts by mass of resin A obtained in Resin Synthesis Example 1, 0.27 parts by mass of compound (x-3) as compound (X), 0.31 parts by mass of compound (x-4), and dichloromethane to prepare a solution with a resin concentration of 20% by mass. The solution was then filtered through a Millipore filter having a pore size of 5 μm to obtain a resin solution (H5-1).

[0403] Resin solution (H5-1) was applied to one side of a resin support (ZEONORFILM ZF-16, Zeon Corporation, 100 μm thick) so that the thickness after drying was 10 μm, and the solution was dried at 80° C. for 8 hours, and then further dried in a vacuum at 150° C. for 8 hours to form a coating resin layer (1). Furthermore, resin solution (H5-1) was applied to the other side of the resin support so that the thickness after drying was 10 μm, and the solution was dried at 80° C. for 8 hours, and then further dried in a vacuum at 150° C. for 8 hours to form a coating resin layer (2). As a result, a substrate having a thickness of 120 μm and a resin layer not containing compound (Z) on both sides of a transparent resin substrate was obtained. Xa and Ta to Tf of the obtained substrate were determined in the same manner as in Example 1. The results are shown in Table 12.

[0404] Next, in the same manner as in Example 1, a dielectric multilayer film (I) having a total of 28 layers was formed by alternately stacking silica (SiO2) layers and titania (TiO2) layers on one side of the obtained substrate, and a dielectric multilayer film (II) having a total of 24 layers was formed by alternately stacking silica (SiO2) layers and titania (TiO2) layers on the other side of the substrate, thereby obtaining an optical filter having a thickness of approximately 0.124 mm. The dielectric multilayer film was designed using the same design parameters as in Example 1, taking into consideration the wavelength dependency of the refractive index of the substrate, as in Example 1. The spectral transmittance of the obtained optical filter was measured in the vertical direction, and Tg and Th were calculated. The results are shown in Table 12.

[0405] [Table 10]

[0406] [Table 11]

[0407] [Table 12] < / irpf> < / dbpf>

Claims

1. Resin and A compound (Z) represented by the following formula (I) and having a maximum absorption wavelength in the range of 850 to 1100 nm; An optical filter comprising a substrate (i) including a resin layer containing a compound (Z) formed from a resin composition containing the compound (Z), and a dielectric multilayer film. Cn + An - (I) [In formula (I), Cn + is a monovalent cation represented by the following formula (II), An - is a monovalent anion (provided that when unit A and unit B are groups represented by the following formulae (A-II) and (B-II), respectively, An - is the tetrakis(pentafluorophenyl)borate anion. 【Chemistry 1】 [In formula (II), Y A and Y D each independently represents a hydrogen atom, a halogen atom, or a hydrocarbon group having 1 to 8 carbon atoms, Z A ~Z C adjacent two of the above may be bonded to each other to form an aromatic hydrocarbon group having 6 to 14 carbon atoms, a 5- to 6-membered alicyclic group which may contain at least one nitrogen atom, oxygen atom or sulfur atom, or a heteroaromatic group having 3 to 14 carbon atoms and containing at least one nitrogen atom, oxygen atom or sulfur atom, and these alicyclic groups, aromatic hydrocarbon groups and heteroaromatic groups may contain an aliphatic hydrocarbon group having 1 to 9 carbon atoms or a halogen atom, Y B and Y C may be bonded to each other to form an aromatic hydrocarbon group having 6 to 14 carbon atoms, a 5- to 6-membered alicyclic group which may contain at least one nitrogen atom, oxygen atom or sulfur atom, or a heteroaromatic group having 3 to 14 carbon atoms and containing at least one nitrogen atom, oxygen atom or sulfur atom, and these alicyclic groups, aromatic hydrocarbon groups and heteroaromatic groups may have an aliphatic hydrocarbon group having 1 to 9 carbon atoms or a halogen atom, Unit A and unit B are groups represented by the following formulae (AI) and (BI), groups represented by the following formulae (A-II) and (B-II), or groups represented by the following formulae (A-III) and (B-III), respectively: When unit A and unit B are groups represented by the following formulae (AI) and (BI), respectively: Said Z A , Z C and Y B ~Y C each independently represents a hydrogen atom, a halogen atom, a hydroxyl group, a carboxyl group, a nitro group, or -NR g R h group, amide group, imide group, cyano group, silyl group, -Q 1 , -N=N-Q 1 , -S-Q 2 , -SSQ 2 , or -SO 2 Q 3 and Said Z Ｂ each independently represents a hydrogen atom, a halogen atom, a hydroxyl group, a carboxyl group, a nitro group, an amido group, an imido group, a cyano group, a silyl group, -Q 1 , -N=N-Q 1 , -S-Q 2 , -SSQ 2 , or -SO 2 Q 3 and The R g and R h each independently represents a hydrogen atom, -C(O)R i Group or the following L b ~L f Q 1 is the following L b ~L g Q 2 is a hydrogen atom or the following L b ~L f Q 3 is a hydroxyl group or the following L b ~L f R i is the following L b ~L f Either (L b ): an aliphatic hydrocarbon group having 1 to 15 carbon atoms (L c ): halogen-substituted alkyl group (L d ): Alicyclic hydrocarbon group (L e ): Aromatic hydrocarbon group (L f ): Heterocyclic group (L g ):-OR (R is a hydrocarbon group) (L h ): an acyl group which may have a substituent L (L i ): an alkoxycarbonyl group which may have a substituent L The substituent L is b ~L f At least one selected from the following: When unit A and unit B are groups represented by the following formulae (A-II) and (B-II) or groups represented by the following formulae (A-III) and (B-III), respectively: Said Z A ~Z C and Y B ~Y C each independently represents a hydrogen atom, a halogen atom, a hydroxyl group, a carboxyl group, a nitro group, or -NR g R h group, amide group, imide group, cyano group, silyl group, -Q 1 , -N=N-Q 1 , -S-Q 2 , -SSQ 2 , or -SO 2 Q 3 and The R g and R h each independently represents a hydrogen atom, -C(O)R i Group or the following L b ~L f Q 1 is the following L b ~L g Q 2 is a hydrogen atom or the following L b ~L f Q 3 is a hydroxyl group or the following L b ~L f R i is the following L b ~L f Either (L b ): an aliphatic hydrocarbon group having 1 to 15 carbon atoms (L c ): halogen-substituted alkyl group (L d ): Alicyclic hydrocarbon group (L e ): Aromatic hydrocarbon group (L f ): Heterocyclic group (L g ):-OR (R is a hydrocarbon group) (L h ): an acyl group which may have a substituent L (L i ): an alkoxycarbonyl group which may have a substituent L The substituent L is b ~L f At least one selected from the following: Z B is a halogen atom or a group represented by any one of the following formulas (A-1) to (A-2), and Y B and Y C and R are bonded to each other to form a 5-membered alicyclic hydrocarbon group, and in the 5-membered alicyclic hydrocarbon group, Z Ｂ and all of the substituents other than the above are hydrogen atoms, unit A is not a group represented by formula (A-3) below, and unit B is not a group represented by formula (A-4) below, Z B is a chlorine atom, and Y B and Y C and R are bonded to each other to form a 6-membered alicyclic hydrocarbon group, and in the 6-membered alicyclic hydrocarbon group, Z Ｂ and all of the substituents other than the above are hydrogen atoms, unit A is not a group represented by the following formula (A-5), and unit B is not a group represented by the following formula (A-6), Z B is a group represented by the following formula (A-7), and Y B and Y C and R are bonded to each other to form a 5-membered alicyclic hydrocarbon group, and in the 5-membered alicyclic hydrocarbon group, Z Ｂ and all of the substituents other than the above are hydrogen atoms, unit A is not a group represented by formula (A-8) below, and unit B is not a group represented by formula (A-9) below. 【Chemistry 2】 (A-1) (A-2) 【Chemistry 3】 (A-3) (A-4) [In formulas (A-3) to (A-4), Y a1 are independently substituted or unsubstituted alkyl groups having 8 to 20 carbon atoms, and -* in formula (A-3) represents Y in formula (II). A represents a single bond to the carbon atom to which the group is bonded, and =** in formula (A-4) represents the Y D indicates that the carbon atom is double-bonded to the carbon atom to which it is bonded. 【Chemistry 4】 (A-5) (A-6) [In formulas (A-5) to (A-6), Y a2 is an n-butyl group, and -* in formula (A-5) represents Y in formula (II). A represents a single bond to the carbon atom to which the group is bonded, and =** in formula (A-6) represents the Y D indicates that the carbon atom is double-bonded to the carbon atom to which it is bonded. 【Chemistry 5】 [In formula (A-7), Rx and Ry each independently represent a hydrogen atom, a methyl group, an ethyl group, a propyl group, an isopropyl group, an isopropenyl group, a 1-propenyl group, a 2-propenyl group, a 2-propynyl group, a butyl group, an isobutyl group, a sec-butyl group, a tert-butyl group, a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cyclohexenyl group, a cycloheptyl group, a cyclooctyl group, a phenyl group, an o-tolyl group, a m-tolyl group, a p-tolyl group, a xylyl group, a mesityl group, an o-cumenyl group, a m-cumenyl group, a p-cumenyl group, a biphenylyl group, a methoxy group, an ethoxy group, a propoxy group, a fluoro group, a chloro group, a bromo group, an iodo group, a cyano group, or a nitro group.] 【Chemistry 6】 (A-8) (A-9) [In formulas (A-8) to (A-9), Y ａ３ are independently a linear or branched alkyl group having 1 to 5 carbon atoms, and -* in formula (A-8) represents Y in formula (II) A represents a single bond to the carbon atom to which the group is bonded, and =** in formula (A-9) represents the Y D indicates that the carbon atom is double-bonded to the carbon atom to which it is bonded. 【Chemistry 7】 [In formula (AI), -* represents Y in formula (II) A indicates that the carbon atom is bonded to a single bond, In formula (BI), =** represents Y in formula (II). D indicates that the carbon atom is double bonded to the carbon atom to which it is bonded, In formulas (AI) and (BI), X is independently an oxygen atom, a sulfur atom, a selenium atom, or a tellurium atom; R 1 , R ３ , R ５ and R 6 each independently represents a hydrogen atom, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxy group, a phosphate group, -NR g R h Group, -SR i Group, -SO 2 R i Group, -OSO 2 R i group, -C(O)R i Group or the L b ~L i Either R ２ is a hydrogen atom, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxy group, a phosphate group, -NR g R h Group, -SR i Group, -SO 2 R i Group, -OSO 2 R i group, -C(O)R i Group or the L b ~L ｄ and L ｆ ~L i Either R ４ is a hydrogen atom, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxy group, a phosphate group, -SR i Group, -SO 2 R i Group, -OSO 2 R i group, -C(O)R i Group or the L b ~L i Either R 1 ~R 6 adjacent two of these may be bonded to each other to form a cyclic hydrocarbon group having 5 or 6 carbon atoms, R g and R h each independently represents a hydrogen atom, -C(O)R i Group or the L b ~L f Either R i is the above L b ~L f Either 【Chemistry 8】 [In formula (A-II), -* represents Y in formula (II). A indicates that the carbon atom is bonded to a single bond, In formula (B-II), =** represents Y in formula (II). D indicates that the carbon atom is double bonded to the carbon atom to which it is bonded, In formulas (A-II) and (B-II), X is independently an oxygen atom, a sulfur atom, a selenium atom, a tellurium atom, or -N(R 8 ) - and R 1 ~R 6 each independently represents a hydrogen atom, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxy group, a phosphate group, -NR g R h Group, -SR i Group, -SO 2 R i Group, -OSO 2 R i group, -C(O)R i Group or the L b ~L i Either R 1 ~R 6 adjacent two of these may be bonded to each other to form a cyclic hydrocarbon group having 5 or 6 carbon atoms, R 8 is a hydrogen atom, a halogen atom, -C(O)R i group, the above L ｂ ~L i Either R g and R h each independently represents a hydrogen atom, -C(O)R i Group or the L b ~L f Either R i is the above L b ~L f Either 【Chemistry 9】 [In formula (A-III), -* represents Y in formula (II). A indicates that the carbon atom is bonded to a single bond, In formula (B-III), =** represents Y in formula (II). D indicates that the carbon atom is double bonded to the carbon atom to which it is bonded, In formulas (A-III) and (B-III), X is independently an oxygen atom, a sulfur atom, a selenium atom, or a tellurium atom; R 1 and R ４ each independently represents a hydrogen atom, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxy group, a phosphate group, -NR g R h Group, -SR i Group, -SO 2 R i Group, -OSO 2 R i group, -C(O)R i Group or the L b ~L i Either R ２ and R ３ each independently represents a hydrogen atom, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxy group, a phosphate group, -NR g R h Group, -SR i Group, -SO 2 R i Group, -OSO 2 R i group, -C(O)R i Group or the L b ~L ｄ and L ｆ ~L i Either R 1 ~R 4 adjacent two of these may be bonded to each other to form a cyclic hydrocarbon group having 5 or 6 carbon atoms, R in formula (A-III) 1 Or R 4 represents Y in the formula (II). A may be bonded to form a cyclic hydrocarbon group having 5 or 6 carbon atoms, R in formula (B-III) 1 Or R 4 represents Y in the formula (II). D may be bonded to form a cyclic hydrocarbon group having 5 or 6 carbon atoms, R g and R h each independently represents a hydrogen atom, -C(O)R i Group or the L b ~L f Either R i is the above L b ~L f Either

2. The optical filter according to claim 1 , wherein the compound (Z) satisfies the following requirement (A): Requirement (A): In a transmission spectrum measured using a solution of the compound (Z) dissolved in dichloromethane (wherein the transmission spectrum is a spectrum having a transmittance of 10% at the absorption maximum wavelength), the average transmittance of light at wavelengths of 430 to 580 nm is 70% or more.

3. The optical filter according to claim 1 or 2, wherein the compound (Z) satisfies the following requirements (C) and (D): Requirement (C): In a transmission spectrum measured using a solution of the compound (Z) dissolved in dichloromethane (wherein the transmission spectrum is a spectrum having a transmittance of 10% at the absorption maximum wavelength), the compound (Z) has a wavelength in the range of 950 to 1150 nm at which the transmittance is 85%. Requirement (D): In a transmission spectrum measured using a solution of the compound (Z) dissolved in dichloromethane (wherein the transmission spectrum is a spectrum in which the transmittance at the maximum absorption wavelength is 10%), the absolute value of the difference between the shortest wavelength (Wa) at which the transmittance is 20% and the shortest wavelength (Wb) at which the transmittance is 70% is 10 to 60 nm in wavelengths longer than the maximum absorption wavelength.

4. The optical filter according to any one of claims 1 to 3, wherein the resin is at least one resin selected from the group consisting of cyclic (poly)olefin-based resins, aromatic polyether-based resins, polyimide-based resins, polyester-based resins, polycarbonate-based resins, polyamide-based resins, polyarylate-based resins, polysulfone-based resins, polyethersulfone-based resins, polyparaphenylene-based resins, polyamideimide-based resins, polyethylene naphthalate-based resins, fluorinated aromatic polymer-based resins, (modified) acrylic-based resins, epoxy-based resins, allyl ester-based curable resins, silsesquioxane-based ultraviolet-curable resins, acrylic-based ultraviolet-curable resins, and vinyl-based ultraviolet-curable resins.

5. The substrate (i) is A substrate comprising a resin layer containing the compound (Z); A substrate comprising two or more resin layers, at least one of which is a resin layer containing the compound (Z), or A substrate comprising a glass support and a resin layer containing the compound (Z). The optical filter according to any one of claims 1 to 4,

6. The optical filter according to any one of claims 1 to 5, which is a near-infrared cut filter that satisfies the following properties (a) and (b): Characteristic (a): In the wavelength region of 430 to 580 nm, the average transmittance measured from the perpendicular direction of the optical filter is 75% or more. Characteristic (b): In the wavelength region of 850 to 1200 nm, the average transmittance measured from the perpendicular direction of the optical filter is 5% or less.

7. 6. The optical filter according to claim 1, which is a visible light / near infrared selective transmission filter that satisfies the following properties (c) and (d): Characteristic (c): In the wavelength region of 430 to 580 nm, the average transmittance measured from the perpendicular direction of the optical filter is 75% or more. Characteristic (d): In the wavelength region of 650 nm or more, it has a light blocking band Za, a light transmission band Zb, and a light blocking band Zc, and the center wavelengths of the respective bands are Za<Zb<Zc. The minimum transmittances Za and Zc as measured in the perpendicular direction of the optical filter are each 15% or less, The maximum transmittance of the optical filter in Zb measured in the vertical direction is 55% or more.

8. The optical filter according to any one of claims 1 to 5, which is a near-infrared transmission filter that satisfies the following properties (e) and (f): Characteristic (e): In the wavelength region of 380 to 700 nm, the average transmittance measured from the vertical direction of the optical filter is 10% or less. Characteristic (f): A light transmission band Ya is present in a wavelength region of 750 nm or more, and the maximum transmittance (T IR ) is 45% or more

9. The optical filter according to any one of claims 1 to 8, which is for use in a solid-state imaging device.

10. The optical filter according to any one of claims 1 to 8, which is for use in an optical sensor device.

11. A solid-state imaging device comprising the optical filter according to any one of claims 1 to 8.

12. An optical sensor device comprising the optical filter according to any one of claims 1 to 8.

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