Washing device and coating device

Abstract

To prevent dust emission in operation for initialization of an applicator.SOLUTION: A washing device 13 washes a preliminary coating surface 51 which is aligned in a work region 7 where an applicator 11 applies liquid L to a substrate W. The washing device 13 comprises: a washing movable body 60 which removes the liquid L which is preliminarily discharged by the applicator 11 to the preliminary coating surface 51, in a non-contact manner to the preliminary coating surface 51; and a drive mechanism 64 for maintaining the non-contact state to the preliminary coating surface 51, and for relatively moving the washing movable body 60 and the preliminary coating surface 51 along the preliminary coating surface 51. The washing movable body 60 comprises: a first nozzle 61 discharging washing fluid P to the preliminary coating surface 51 to which the liquid L is applied; and a second nozzle 62 for sucking the liquid L and the washing fluid P on the preliminary coating surface 51.SELECTED DRAWING: Figure 1

Description

Technical Field

[0001] The present invention relates to a cleaning device for cleaning a preliminary coating surface used for initializing a coater before applying a liquid to a substrate by the coater, and a coating device including the cleaning device.

Background Art

[0002] For example, in the manufacturing process of semiconductors, a functional material in a liquid state (hereinafter simply referred to as "liquid") is applied to a semiconductor wafer. Spin coating is known as a technique for applying a liquid to a semiconductor wafer, but in the case of spin coating, the utilization efficiency of the liquid is poor. Therefore, in recent years, as a device for applying a liquid to a substrate such as a semiconductor wafer, a coating device including a coater has been used. The coater has a long slit in one direction, and while relatively moving the coater and the semiconductor wafer, the liquid is discharged from the slit to form a coating film on the semiconductor wafer.

[0003] In the coating device as described above, in the coating on the substrate, coating defects may occur in which the thickness of the coating film becomes uneven. Therefore, before coating, initialization is performed in which the liquid is discharged from the slit of the coater to a region different from the substrate to align the liquid levels at the open ends of the slit. Patent Document 1 discloses a coating device that performs initialization. In this coating device, the liquid is discharged from the slit of the coater to a preliminary coating sheet different from the substrate for initialization.

Prior Art Documents

Patent Documents

[0004]

Patent Document 1

Summary of the Invention

Problems to be Solved by the Invention

[0005] As other means of initialization as described above, there are means for discharging a liquid from the slit of the applicator onto a rotating roll different from the base material, or means for wiping the tip surface of the applicator with rubber or the like. When using a rotating roll, scattering of the liquid becomes an issue. In the case of wiping with rubber, generation of dust becomes an issue. Particularly in the case of semiconductor manufacturing, since a high degree of cleanliness is required, wiping with rubber is unsuitable.

[0006] Also, means for discharging a liquid from the slit of the applicator onto a preliminary coating plate different from the base material, and then sucking while scraping the liquid on the preliminary coating plate with a scraper can be considered. Thereby, regeneration (reuse) of the preliminary coating plate becomes possible. However, also in this case, generation of dust due to contact of the scraper with the preliminary coating plate becomes an issue. That is, in the case of a contact-type cleaning device in which a member such as a scraper contacts the tip surface of the applicator or the preliminary coating plate for initialization, there is a possibility that the cleanliness in the working area where the applicator applies to the base material cannot be maintained due to generation of dust.

[0007] Therefore, in the present disclosure, an object is to prevent generation of dust in the operation for initializing the applicator.

Means for Solving the Problems

[0008] (1) The present disclosure is a cleaning device for cleaning a preliminary coating surface provided side by side with a working area where an applicator applies a liquid to a base material, the cleaning device including: a cleaning moving body that removes the liquid preliminarily discharged by the applicator onto the preliminary coating surface in a non-contact state with the preliminary coating surface; and a drive mechanism that maintains a non-contact state with the preliminary coating surface and relatively moves the cleaning moving body and the preliminary coating surface along the preliminary coating surface, wherein the cleaning moving body has a first nozzle that discharges a cleaning liquid onto the preliminary coating surface coated with the liquid, and a second nozzle that sucks a solution of the liquid and the cleaning liquid on the preliminary coating surface.

[0009] According to the cleaning device of the present disclosure, when the cleaning moving body moves relatively along the pre-coated surface coated with the liquid, the cleaning liquid is discharged from the first nozzle onto the pre-coated surface, and then the solution of the liquid and the cleaning liquid is sucked and removed from the pre-coated surface by the second nozzle. In order to remove the solution, since the cleaning moving body is non-contact with the pre-coated surface, there is no dust generation as in the case of a conventional contact-type cleaning device. Therefore, it is possible to maintain the cleanliness in the working area where the applicator applies the coating to the substrate.

[0010] (2) Preferably, the second nozzle has a tip surface where a suction port for sucking the solution opens, and the tip surface is close to the pre-coated surface so that the height of the tip surface is equal to or lower than the height of the liquid surface of the solution. In this case, the tip surface of the second nozzle contacts the solution on the pre-coated surface, and by the relative movement, it is possible to suck the solution from the suction port of the second nozzle while forming a bead of the solution between the tip surface and the pre-coated surface. Therefore, it is possible to remove the solution from the pre-coated surface even without, for example, a scraper.

[0011] (3) Preferably, the second nozzle has a tip surface where a suction port for sucking the solution opens, and is provided with a support mechanism that supports the second nozzle so that the height of the tip surface can be changed and maintains the height of the second nozzle at the changed position. In this case, it is possible to align the tip surface of the second nozzle according to the height of the liquid surface of the solution on the pre-coated surface. The state where the tip surface of the second nozzle is close to the pre-coated surface is maintained, and by the relative movement, it is possible to suck the solution from the second nozzle while forming a bead of the solution between the tip surface of the second nozzle and the pre-coated surface.

[0012] (4) Preferably, the first nozzle has a first tip surface at which a discharge port for discharging the cleaning liquid opens, the second nozzle has a second tip surface at which a suction port for sucking the solution opens, and the second tip surface is closer to the preliminary coating surface than the first tip surface, or the distances from the preliminary coating surface are the same for the first tip surface and the second tip surface. In this case, a state in which the second tip surface of the second nozzle is close to the preliminary coating surface can be obtained. It becomes possible to suck the solution from the second nozzle while forming a bead of the solution between the tip surface of the second nozzle and the preliminary coating surface.

[0013] (5) Preferably, the drive mechanism can reciprocate the cleaning moving body relative to the preliminary coating surface, the first nozzle discharges the cleaning liquid during the forward movement of the cleaning moving body, and the second nozzle sucks the solution during the backward movement of the cleaning moving body. In this case, it becomes possible to once apply the cleaning liquid to the liquid applied to the preliminary coating surface and then, after a lapse of time, suck the solution of the liquid and the cleaning liquid. By taking such a time interval, the liquid is more likely to be affected by the cleaning liquid, and a more effective removal operation becomes possible.

[0014] (6) Further, the coating apparatus of the present disclosure includes a coater that relatively moves with respect to a substrate and applies a liquid to the substrate, a preliminary coating surface provided side by side in a working area where the coater applies the liquid to the substrate, and the cleaning apparatus that cleans the preliminary coating surface. According to the coating apparatus of the present disclosure, before the coater applies a liquid to the substrate, by applying the liquid to the preliminary coating surface, the coater can be initialized. After the initialization, the liquid applied to the preliminary coating surface is removed by the cleaning apparatus, and the preliminary coating surface can be regenerated (reused). In this removal, when the cleaning moving body moves relatively along the pre-coated surface to which the liquid is applied, the cleaning liquid is discharged from the first nozzle onto the pre-coated surface, and then the solution of the liquid and the cleaning liquid is sucked and removed from the pre-coated surface by the second nozzle. In order to remove the solution, since the cleaning moving body is non-contact with the pre-coated surface, there is no dust generation as in the case of a conventional contact-type cleaning device. Therefore, it is possible to maintain the cleanliness in the working area where the applicator applies the coating to the substrate.

[0015] (7) Preferably, the coating device includes an outer wall surrounding the working area and the installation area of the pre-coated surface, and a supply mechanism that supplies gas to a space inside the outer wall, which is part of the cleaning device or in the vicinity of the cleaning device, when the cleaning device cleans the pre-coated surface. In this case, when the cleaning device cleans the pre-coated surface, the second nozzle sucks the solution, which may cause a pressure drop in the space inside the outer wall and affect the subsequent coating on the substrate. However, according to the supply mechanism, it is possible to suppress the pressure drop and suppress the influence on the coating on the substrate.

[0016] (8) In the coating device of (7) above, the cleaning device includes a cover covering the cleaning moving body, and the supply mechanism includes a flow path connecting the cover and the outer wall for supplying the gas into the cover. In this case, the second nozzle sucks the solution inside the cover, and gas is supplied into the cover. It is possible to more effectively suppress the pressure fluctuation in the space inside the outer wall.

Advantages of the Invention

[0017] When cleaning the pre-coated surface used for initializing the applicator before applying the liquid to the substrate by the applicator, there is no dust generation.

Brief Description of the Drawings

[0018]

Figure 1

Figure 2

Figure 3

Figure 4

Figure 5

Figure 6

Mode for Carrying Out the Invention

[0019] 〔Configuration of Coating Device〕 FIG. 1 is a schematic configuration diagram showing an example of a coating device. The coating device 10 shown in FIG. 1 is a device for applying a liquid L to a substrate W. The coating device 10 includes an applicator 11 having a long discharge port 23 in one direction, which will be described later, and discharges the liquid L from the discharge port 23 while relatively moving the applicator 11 and the substrate W. Thereby, the liquid L is applied to the substrate W. To perform such coating, the coating device 10 includes an applicator 11, a moving mechanism 12, a supply mechanism 15, a stage 16, and a control device 14. The control device 14 includes a computer and controls the operations of the respective mechanisms of the coating device 10.

[0020] The coating device 10 shown in FIG. 1 includes a preliminary coating plate 50 and a cleaning device 13. The preliminary coating plate 50 is provided side by side in the working area 7 where the applicator 11 applies the liquid L to the substrate W. The working area 7 is an area on the stage 16, and the liquid L is applied to the substrate W by the applicator 11 in the working area 7.

[0021] The upper surface of the preliminary coating plate 50 is a preliminary coating surface 51. Before coating the substrate W, a preliminary coating of the liquid L is performed on the preliminary coating surface 51 by the applicator 11. The cleaning device 13 cleans the preliminary coating surface 51 to which the liquid L has been applied. The preliminary coating plate 50 may be made of metal, but is preferably made of glass (float glass) or resin in order to increase the contact angle with the liquid L, that is, to enhance the liquid repellency of the liquid L.

[0022] Before the liquid L is applied to the base material W by the applicator 11, the applicator 11 is initialized by applying the liquid L (pre-application) to the pre-application surface 51. Initialization means a process of discharging the liquid L from the discharge port 23 of the applicator 11 to the pre-application surface 51, which is an area different from the upper surface of the base material W, and leveling the liquid level at the discharge port 23 (the opening end of the slit 22). By initializing the applicator 11, it is possible to suppress the occurrence of coating defects such that the thickness of the coating film becomes non-uniform in the coating on the base material W. The initialization and the cleaning device 13 will be described later.

[0023] 〔Configuration for applying the liquid L to the base material W〕 The applicator 11, the pre-application plate 50, and the cleaning device 13 are covered by the outer wall 18, and a clean room is formed as a space closed by the outer wall 18. Note that the outer wall 18 is provided with a filter (not shown) that allows the intake of outside air. The coating device 10 is used in an environment where the pressure inside the outer wall 18 is adjusted to be constant.

[0024] Figure 2 is a perspective view showing an example of the applicator 11 and the substrate W. The applicator 11, also called a slit die, is a member long in one direction. The applicator 11 is mounted on a support portion 17 (see FIG. 1) provided in the coating apparatus 10. Inside the applicator 11, a liquid reservoir space 21 for storing liquid and a slit 22 are formed. The liquid reservoir space 21 and the slit 22 are formed long and linearly. One side of the slit 22 opens into the liquid reservoir space 21 and is connected to the liquid reservoir space 21. The other side of the slit 22 opens at the tip surface 24 of the applicator 11. The opening of the slit 22 is a discharge port 23 for discharging the liquid L. The liquid L supplied to the applicator 11 and temporarily stored in the liquid reservoir space 21 is discharged from the discharge port 23 to the external space through the slit 22. The tip surface 24 of the applicator 11 faces the substrate W, and the liquid L discharged from the discharge port 23 is applied to the substrate W. The substrate W in the present embodiment is a circular plate like a general semiconductor wafer as shown in FIG. 2. Note that the substrate W may have a shape other than circular. Also, the applicator 11 may be a stripe nozzle instead of a slit die.

[0025] In FIG. 1, the moving mechanism 12 relatively moves the applicator 11 and the substrate W. In the present disclosure, the stage 16 holding the substrate W is in a stationary state, and the applicator 11 moves relative to the stage 16. The moving direction of the applicator 11 with respect to the substrate W is the "coating progress direction", and the coating progress direction is a direction orthogonal to the longitudinal direction of the applicator 11. Each figure shows orthogonal coordinates based on the XYZ axes. The X-axis direction is the longitudinal direction of the applicator 11, the Y-axis direction is the coating progress direction of the applicator 11, and the Z direction is the vertical direction.

[0026] The moving mechanism 12 will be specifically described. The applicator 11 and the support portion 17 are provided so as to be movable back and forth along the Y-axis. The moving mechanism 12 has an actuator 26 that moves the support portion 17. The actuator 26 is, for example, a linear actuator. By the moving mechanism 12, the applicator 11 can pass above the substrate W and can move to a region above the precoating plate 50. The operation of the moving mechanism 12 is controlled by the control device 14. Contrary to the configuration of the present embodiment, the applicator 11 may be in a stationary state while the stage 16 and the preliminary coating plate 50 move.

[0027] In FIG. 1, a cleaning moving body 60 of the cleaning device 13 is described on the preliminary coating plate 50. When the applicator 11 moves to the area above the preliminary coating plate 50, the cleaning moving body 60 exists at the retracted position on one side in the X-axis direction, and the applicator 11 does not interfere with the cleaning moving body 60.

[0028] In the working area 7, while the applicator 11 moves with respect to the base material W, the liquid L is discharged from the discharge port 23 of the applicator 11, and capillary coating is performed. In order to adjust the distance (gap) between the discharge port 23 of the applicator 11 and the base material W, the applicator 11 is movably supported in the Z-axis direction orthogonal to the upper surface (coated surface) of the base material W and is mounted on the support portion 17.

[0029] The supply mechanism 15 includes a tank 31 for storing the liquid L, a pipe 32 forming a flow path connecting the applicator 11 and the tank 31, a valve 33 provided in the pipe 32, and a pressure regulating means 34 for reducing the pressure of the liquid L in the tank 31 and adjusting the pressure of the liquid L. The valve 33 is a valve that opens and closes. When it is in the open state, the liquid L can flow between the applicator 11 and the tank 31 through the pipe 32.

[0030] The pressure regulating means 34 includes a suction pump (vacuum pump) 35 and a regulator 36. The suction pump 35 reduces the pressure of the liquid L stored in the tank 31 by reducing the pressure inside the tank 31. The regulator 36 adjusts the pressure of the liquid L in the tank 31. By the pressure regulating means 34, the liquid L in the tank 31 becomes a negative pressure with respect to the pressure (for example, atmospheric pressure) inside the outer wall 18. In that state, when the valve 33 is in the open state, the liquid L in the applicator 11 also becomes a negative pressure with respect to the pressure inside the outer wall 18.

[0031] The applicator 11 is provided with a pressure sensor 39, and the pressure sensor 39 detects the pressure of the liquid L in the applicator 11. The control device 14 acquires the measured value of the pressure sensor 39 and controls the regulator 36 based on the measured value. The pressure sensor 39 is used to adjust the pressure of the liquid L stored in the tank 31 by the pressure regulating means 34 so that the pressure of the liquid L in the applicator 11 is maintained at a predetermined value (negative pressure). The pressure regulating means 34 can adjust the pressure of the liquid L in the applicator 11 to a negative pressure with respect to the pressure in the outer wall 18, thereby enabling capillary coating by the applicator 11. In addition to the operation of the pressure regulating means 34, the opening and closing operation of the valve 33 is controlled by the control device 14. Note that if capillary coating by the applicator 11 is possible, the supply mechanism 15 may have other configurations.

[0032] 〔Regarding the initialization and cleaning device 13〕 In the case of coating using the applicator 11, in the application of the liquid L to the substrate W, the thickness of the coating film may be uneven. Therefore, as described above, before applying the liquid to the substrate W, initialization is performed to discharge the liquid from the slit 22 of the applicator 11 onto the preliminary coating surface 51 and align the liquid levels at the open ends of the slit 22. The initialization is performed before each application process to the substrate W. That is, every time the substrate W is replaced from above the stage 16, the applicator 11 is initialized, and then the application to the replaced substrate W is performed. For this reason, each time initialization is performed, the cleaning device 13 cleans the preliminary coating surface 51. Thereby, the preliminary coating surface 51 is regenerated (reused).

[0033] The cleaning device 13 will be described. The cleaning device 13 includes a cleaning moving body 60 and a drive mechanism 64. The cleaning moving body 60 removes the liquid L preliminarily discharged by the applicator 11 onto the preliminary coating surface 51 in a non-contact state with the preliminary coating surface 51 for the above-mentioned initialization. The drive mechanism 64 maintains the non-contact state with the preliminary coating surface 51 and relatively moves the cleaning moving body 60 and the preliminary coating surface 51 along the preliminary coating surface 51. In the present embodiment, since the preliminary coating plate 50 is fixed to the apparatus base 19, the cleaning moving body 60 moves with respect to the preliminary coating surface 51.

[0034] FIG. 3 is a perspective view showing a part of the cleaning device 13. The cleaning moving body 60 has a first nozzle 61 and a second nozzle 62. The first nozzle 61 and the second nozzle 62 are provided side by side and are integrally configured. The first nozzle 61 and the second nozzle 62 are each configured to be long in the Y-axis direction and are provided side by side in the X-axis direction. The applicator 11 (see FIG. 1) performs preliminary coating of the liquid L on the preliminary coating surface 51 while moving along the Y-axis. As shown in FIG. 3, a coating film S that is longer in the X-axis direction than in the Y-axis direction is formed on the preliminary coating surface 51. The cleaning moving body 60 cleans the preliminary coating surface 51 while moving along the X-axis.

[0035] FIG. 4 is a perspective view of the first nozzle 61 and the second nozzle 62 viewed from below. The first nozzle 61 discharges the cleaning liquid P onto the preliminary coating surface 51 on which the liquid L is applied. The cleaning liquid P contains a solvent of the liquid L. A pipe 65 extending from a supply device (not shown) is connected to the first nozzle 61, and the cleaning liquid P supplied by the supply device is supplied to the first nozzle 61. An enlarged space 67 and a discharge port for discharging the cleaning liquid P are provided in the first nozzle 61. In the form shown in FIG. 4, the discharge port is constituted by a plurality of holes 66 provided side by side in the Y-axis direction. By making the discharge port a small hole 66, it is possible to increase the flow rate of the discharged cleaning liquid P. The first nozzle 61 discharges the cleaning liquid P from the enlarged space 67 through the plurality of holes 66 onto the preliminary coating surface 51 while moving in the direction along the X-axis by the drive mechanism 64. The cleaning liquid P is mixed with the liquid L applied to the preliminary coating surface 51 to form a solution Q.

[0036] The second nozzle 62 sucks the solution Q of the liquid L and the cleaning liquid P on the preliminary coating surface 51. A pipe 75 extending from a suction device (not shown) is connected to the second nozzle 62, and the solution Q on the preliminary coating surface 51 is sucked by the suction device through the second nozzle 62. The second nozzle 62 is provided with a suction port. In the form shown in FIG. 4, the suction port is constituted by a slit 76 that is long in the Y-axis direction. The length of the slit 76 in the Y-axis direction is larger than the coating width (width in the Y-axis direction) of the solution Q on the preliminary coating surface 51. By setting the suction port as the slit 76, it becomes possible to suck the solution Q on the preliminary coating surface 51 over the entire width. The second nozzle 62 sucks the solution Q while moving in a direction along the X-axis by a drive mechanism 64.

[0037] FIG. 5 is an explanatory diagram showing the first nozzle 61, the second nozzle 62, the preliminary coating plate 50, and the surrounding configuration. The first nozzle 61 has a first tip surface 81 at which a discharge port (hole 66) for discharging the cleaning liquid P is opened. The second nozzle 62 has a second tip surface 82 at which a suction port (slit 76) for sucking the solution Q is opened. In the form shown in FIG. 5, the first tip surface 81 and the second tip surface 82 are set at the same position in the Z-axis direction, that is, at the same height position. For this reason, the distances from the preliminary coating surface 51 are the same for the first tip surface 81 and the second tip surface 82. As a modification, the second tip surface 82 may be closer to the preliminary coating surface 51 than the first tip surface 81. In any case, the second tip surface 82 is in a state of being close to the preliminary coating surface 51.

[0038] As will be described later, the height position of the cleaning moving body 60 is adjustable. Therefore, by performing the adjustment, the first tip surface 81 and the second tip surface 82 are brought close to the preliminary coating surface 51. Specifically, the second tip surface 82 is close to the preliminary coating surface 51 such that the height of the second tip surface 82 is equal to or lower than the height of the liquid surface of the solution Q on the preliminary coating surface 51. The height of the second tip surface 82 from the preliminary coating surface 51 is, for example, 500 micrometers or less, preferably 200 micrometers or less. The second tip surface 82 is non-contact with the preliminary coating surface 51. Note that, by supplying the cleaning liquid P to the liquid L (coating film S) on the preliminary coating surface 51, the liquid surface of the solution Q becomes slightly higher than the upper surface of the coating film S.

[0039] The drive mechanism 64 may be configured to move the cleaning moving body 60, and various types of actuators can be adopted. For example, the drive mechanism 64 has a configuration including a linear servo motor. Note that it is preferable that the actuator performs non-contact driving in terms of suppressing dust generation. Alternatively, as an actuator other than the linear servo motor, an actuator including a DC servo motor and a ball screw may be used, or an actuator including a DC servo motor and a timing belt may be used. In this case, since dust may be generated from sliding parts such as screws and belts, it is preferable that the drive mechanism 64 further has a mechanism for sucking and discharging dust in the vicinity of the actuator. The drive mechanism 64 has a moving block 69 (see FIG. 6) that can move integrally with the cleaning moving body 60, and the moving block 69 can reciprocate along the X axis by the actuator.

[0040] In FIG. 3, a cleaning moving body 60 including a first nozzle 61 and a second nozzle 62 is supported by a support member 70. The support member 70 is integrated with a moving block 69 (see FIG. 6) of a drive mechanism 64. Therefore, when the moving block 69 moves, the cleaning moving body 60 moves in a direction along the X-axis. The drive mechanism 64 enables the cleaning moving body 60 to reciprocate along the X-axis. FIG. 5 shows a state in which the first nozzle 61 discharges a cleaning liquid P and the second nozzle 62 sucks a solution Q during the movement of the forward or return path. Differently, the cleaning moving body 60 may be operated such that the first nozzle 61 discharges the cleaning liquid P during the "forward path" movement of the cleaning moving body 60, and the second nozzle 62 sucks the solution Q during the "return path" movement of the cleaning moving body 60.

[0041] Although not shown, a preliminary coating plate 50 may be movable, and the cleaning moving body 60 may be in a fixed state. That is, the drive mechanism 64 only needs to be able to reciprocate the cleaning moving body 60 relative to the preliminary coating surface 51.

[0042] FIG. 6 is a diagram for explaining the attachment structure of the support member 70 to the moving block 69. The cleaning device 13 of the present embodiment includes a support mechanism 55 that enables adjustment of the height of the cleaning moving body 60, that is, the position of the cleaning moving body 60 in the Z-axis direction.

[0043] In the present embodiment, as the support mechanism 55, there are a long hole 72 provided in a part of the support member 70, a screw hole 73 provided in the moving block 69, and a set screw 74 tightened into the screw hole 73. The specific configuration of the support mechanism 55 will be described. A long hole 72 that is long in the Z-axis direction is provided in a plate piece 71 of the support member 70. A screw hole 73 is provided in a part of the moving block 69.

[0044] The set screw 74 passes through the long hole 72 and is tightened into the threaded hole 73. Thereby, the support member 70 is fixed to the moving block 69. When the set screw 74 is loosened, the support member 70 can move in the Z-axis direction due to the long hole 72. Thereby, the support member 70 and the cleaning moving body 60 can change their positions in the Z-axis direction. By tightening the set screw 74 at an arbitrary position, the support member 70 and the cleaning moving body 60 can be fixed at that position.

[0045] In the form shown in FIG. 6, two support members 70 are provided. The first nozzle 61 is supported by one support member 70, and the second nozzle 62 is supported by the other support member 70. One support member 70 and the other support member 70 can move independently in the Z-axis direction with respect to the moving block 69, and can independently change their positions in the Z-axis direction.

[0046] As described above, the support mechanism 55 can change the height of the cleaning moving body 60 and support the cleaning moving body 60, and can maintain (fix) the height of the cleaning moving body 60 at the changed position. The cleaning moving body 60 includes the first nozzle 61 and the second nozzle 62 (see FIG. 3). Therefore, the support mechanism 55 can change the height of the first tip surface 81 of the first nozzle 61 and support the first nozzle 61, and can maintain the height of the first nozzle 61 at the changed position. Further, the support mechanism 55 can change the height of the second tip surface 82 of the second nozzle 62 and support the second nozzle 62, and can maintain the height of the second nozzle 62 at the changed position.

[0047] In the present embodiment, each of the first nozzle 61 and the second nozzle 62 is individually mounted on a different support member 70, and the support mechanism 55 is configured such that the height can be individually changed. As a modification thereof, although not shown, the first nozzle 61 and the second nozzle 62 may be mounted on a common support member 70, and the support mechanism 55 may be configured such that the positions of the first nozzle 61 and the second nozzle 62 are changed simultaneously.

[0048] As described above (see Fig. 1), the coating apparatus 10 includes an outer wall 18 that surrounds the working area 7 and the installation area 8 of the preliminary coating surface 51. The coating apparatus 10 includes a supply mechanism 40 that supplies gas to the space inside the outer wall 18 when the cleaning device 13 cleans the preliminary coating surface 51 (see Fig. 5). The supply mechanism 40 supplies gas to the space inside the outer wall 18 and in part of the cleaning device 13 or in the vicinity of the cleaning device 13 when the cleaning device 13 cleans the preliminary coating surface 51. In this embodiment, as shown in Fig. 5, gas is supplied to part of the cleaning device 13. The gas to be supplied is the ambient gas inside the outer wall 18. The supply mechanism 40 will be described below.

[0049] The cleaning device 13 includes a cover 41 that covers the cleaning moving body 60. The cover 41 is mounted on a support member 70 (see Fig. 3) and moves integrally with the cleaning moving body 60. In Fig. 3, the cover 41 is omitted for the purpose of explaining the cleaning moving body 60. The supply mechanism 40 supplies gas into the cover 41. As shown in Fig. 5, the supply mechanism 40 includes a pipe 42 as a flow path connecting the cover 41 and the outer wall 18 in order to supply gas into the cover 41. Outside the outer wall 18, a gas supply device (not shown) is provided, and gas is supplied from the gas supply device through the pipe 42 between the cleaning moving body 60 and the cover 41. The functions of the supply mechanism 40 and the cover 41 will be described later.

[0050] 〔Regarding the coating apparatus 10 and the cleaning device 13 of this embodiment〕 As described above, the coating apparatus 10 according to this embodiment (see Fig. 1) includes a coater 11 that relatively moves in relation to the substrate W and applies the liquid L to the substrate W. The coating apparatus 10 includes a preliminary coating surface 51 and a cleaning device 13 that cleans the preliminary coating surface 51. The preliminary coating surface 51 is provided side by side with the working area 7 where the coater 11 applies the liquid L to the substrate W.

[0051] The cleaning device 13 includes a cleaning moving body 60 and a drive mechanism 64 that moves the cleaning moving body 60 along the preliminary coating surface 51 with respect to the preliminary coating surface 51. The cleaning moving body 60 removes the liquid L preliminarily discharged by the applicator 11 onto the preliminary coating surface 51 in a non-contact state with respect to the preliminary coating surface 51. The drive mechanism 64 maintains a non-contact state with respect to the preliminary coating surface 51 and relatively moves the cleaning moving body 60 and the preliminary coating surface 51 along the preliminary coating surface 51.

[0052] As shown in FIG. 5, the cleaning moving body 60 has a first nozzle 61 and a second nozzle 62. The first nozzle 61 discharges the cleaning liquid P onto the preliminary coating surface 51 where the liquid L is applied. The second nozzle 62 sucks the solution Q of the liquid L and the cleaning liquid P on the preliminary coating surface 51. The first nozzle 61, the second nozzle 62, and the support member 70 that supports them are non-contact with the preliminary coating surface 51. The cleaning moving body 60 has a non-contact configuration.

[0053] According to the coating device 10 of the present embodiment, before the applicator 11 applies the liquid L to the base material W, by applying the liquid L to the preliminary coating surface 51, the initialization of the applicator 11 becomes possible. After the initialization, the liquid L applied to the preliminary coating surface 51 is removed by the cleaning device 13, and the preliminary coating surface 51 is regenerated (reused). In the removal, when the cleaning moving body 60 moves along the preliminary coating surface 51 where the liquid L is applied, the cleaning liquid P is discharged from the first nozzle 61 onto the preliminary coating surface 51, and then the solution Q of the liquid L and the cleaning liquid P is sucked and removed from the preliminary coating surface 51 by the second nozzle 62. In order to remove the solution Q, since the cleaning moving body 60 is non-contact with the preliminary coating surface 51, there is no dust generation as in the case of a conventional contact-type cleaning device. Therefore, it is possible to maintain the cleanliness in the working area 7 where the applicator 11 applies the coating to the base material W.

[0054] In this embodiment (see FIG. 5), in the second nozzle 62, the second tip surface 82 where the slit 76 opens is close to the pre-application surface 51 such that the height of the second tip surface 82 is equal to or lower than the height of the liquid surface of the solution Q. Then, with the second tip surface 82 being equal to or lower than the height of the liquid surface of the solution Q on the pre-application surface 51, the second nozzle 62 starts sucking the solution Q and maintains that height. For this reason, the second tip surface 82 comes into contact with the solution Q on the pre-application surface 51, and as the cleaning moving body 60 moves, it is possible to suck the solution Q from the slit 76 while forming a bead B of the solution Q between the second tip surface 82 and the pre-application surface 51. For this reason, it is possible to cleanly remove the solution Q from the pre-application surface 51 even if, for example, there is no scraper or the like that contacts the pre-application surface 51.

[0055] In this embodiment, the cleaning device 13 includes a support mechanism 55 that supports a cleaning moving body 60 having a second nozzle 62 (see FIG. 6). The support mechanism 55 is configured to support the second nozzle 62 such that the height of the second tip surface 82 can be changed and to maintain the height of the second nozzle 62 at the changed position. With this configuration, it is possible to align the second tip surface 82 according to the height of the liquid surface of the solution Q on the pre-application surface 51. The state where the second tip surface 82 is close to the pre-application surface 51 is maintained, and as the cleaning moving body 60 moves, it is possible to suck the solution Q from the slit 76 of the second nozzle 62 while forming a bead B of the solution Q between the second tip surface 82 and the pre-application surface 51.

[0056] As described above, in the process of cleaning the solution Q on the pre-application surface 51, the first nozzle 61 discharges the cleaning liquid P during the movement of the cleaning moving body 60 in the "forward path", and the second nozzle 62 can suck the solution Q during the movement of the cleaning moving body 60 in the "return path". In this operation, it is possible to once apply the cleaning liquid P to the liquid L applied to the pre-application surface 51 and then, after a certain time, suck the solution Q of the liquid L and the cleaning liquid P. By taking such a time interval, the liquid L is more likely to be affected by the action of the cleaning liquid P, and a more effective removal operation becomes possible.

[0057] Note that the process of cleaning the solution Q on the preliminary coating surface 51 may be performed by another method. For example, as shown in FIG. 5, during one-way stroke operation in the forward (or return) path of the cleaning moving body 60, the first nozzle 61 can discharge the cleaning liquid P, and the second nozzle 62 can suck the solution Q. In this case, it is preferable to set the moving speed of the cleaning moving body 60 to be slow. Also, the interval in the X-axis direction between the first nozzle 61 and the second nozzle 62 may be set to be large. Even in this case, it is possible to provide a time gap from the supply of the cleaning liquid P to the liquid L to the suction of the solution Q, and the liquid L is likely to be affected by the cleaning liquid P, enabling a more effective removal operation.

[0058] The coating apparatus 10 of the present embodiment is an apparatus that performs capillary coating as described above. In the case of capillary coating, the pressure settings inside and outside the coater 11 affect the discharge operation of the liquid L and the coating quality. Further, as shown in FIG. 1, the working area 7 where coating is performed on the substrate W and the installation area 8 of the preliminary coating surface 51 used for initialization of the coater 11 are surrounded by the outer wall 18. Pressure fluctuations in the space inside the outer wall 18 are likely to affect the coating quality. In particular, when the preliminary coating surface 51 is cleaned by the cleaning apparatus 13, the second nozzle 62 sucks the solution Q. For this reason, the pressure in the space inside the outer wall 18 decreases, which may affect the subsequent capillary coating on the substrate W. However, in the present embodiment, when the cleaning apparatus 13 cleans the preliminary coating surface 51, a supply mechanism 40 that supplies gas to a part of the cleaning apparatus 13 in the space inside the outer wall 18 is provided (see FIG. 5). According to the supply mechanism 40, it is possible to suppress a decrease in pressure and suppress the influence on the capillary coating on the substrate W.

[0059] In the form shown in FIG. 5, the cleaning device 13 includes a cover 41 that covers the cleaning moving body 60. The supply mechanism 40 includes a pipe 42 as a flow path connecting the cover 41 and the outer wall 18, and supplies gas into the cover 41 through the pipe 42. According to this configuration, while the second nozzle 62 sucks the solution Q inside the cover 41, gas is supplied into the cover 41. Therefore, it is possible to more effectively suppress pressure fluctuations in the space inside the outer wall 18. During the cleaning process, the cover 41 is non-contact with the pre-coated surface 51.

[0060] The cover 41 may be omitted. In this case, for example, when the cleaning device 13 cleans the pre-coated surface 51, the supply mechanism 40 may supply gas in the space inside the outer wall 18 near the cleaning device 13. It is preferable that the supply mechanism 40 supplies gas at a position closer to the pre-coated surface 51 than the working area 7. For example, an opening may be provided in an area adjacent to the pre-coated surface 51, and gas may be supplied from the opening.

[0061] In the above embodiment, as the support mechanism 55 (see FIG. 6) for supporting the second nozzle 62 (cleaning moving body 60), the case having the long hole 72 provided in the support member 70, the screw hole 73 provided in the moving block 69, and the set screw 74 tightened in the screw hole 73 has been described. In this case, the height adjustment of the second nozzle 62 (cleaning moving body 60) is by the operation of the operator. The support mechanism 55 may be of another type. The member forming the long hole 72 may be other. Further, the support mechanism 55 may be configured to include an actuator that enables adjustment of the height of the support member 70 that supports the cleaning moving body 60, in addition to the configuration including the member in which the long hole 72 is formed. The actuator may be manual or electric. In the support mechanism 55 shown in FIG. 6, the support member 70 is movable and position-adjustable in the Z-axis direction with respect to the moving block 69. As another configuration, the first nozzle 61 and the second nozzle 62 may be configured to be movable and position-adjustable in the Z-axis direction with respect to the support member 70.

[0062] Alternatively, although not shown, the height of the preliminary coating plate 50 may be made adjustable. That is, the cleaning device 13 may have a lifting adjustment mechanism that changes the distance between the second tip surface 82 of the second nozzle 62 and the preliminary coating surface 51 and maintains the changed distance.

[0063] The embodiments disclosed this time are illustrative in all respects and not restrictive. The scope of the rights of the present invention is not limited to the above-described embodiments, but includes all modifications within the scope equivalent to the configurations described in the scope of the claims.

Explanation of Reference Numerals

[0064] 7 Working area 8 Installation area 10 Coating device 11 Coater 13 Cleaning device 18 Outer wall 40 Supply mechanism 41 Cover 42 Pipe (flow path) 51 Preliminary coating surface 55 Support mechanism 60 Cleaning moving body 61 First nozzle 62 Second nozzle 64 Driving mechanism 66 Hole (discharge port) 76 Slit (suction port) 81 First tip surface 82 Second tip surface L Liquid P Cleaning liquid Q Solution W Substrate

Claims

1. A cleaning device for cleaning a preliminary coating surface provided side by side with a working area where a coater applies a liquid to a base material, a cleaning moving body that removes the liquid preliminarily discharged by the coater onto the preliminary coating surface in a non-contact state with respect to the preliminary coating surface, and a drive mechanism that maintains a non-contact state with respect to the preliminary coating surface and relatively moves the cleaning moving body and the preliminary coating surface along the preliminary coating surface, wherein the cleaning moving body has a first nozzle that discharges a cleaning liquid onto the preliminary coating surface coated with the liquid, and a second nozzle that sucks a solution of the liquid and the cleaning liquid on the preliminary coating surface, and the second nozzle has a slit that opens with a width larger than the coating width of the solution on the preliminary coating surface and sucks the solution in a direction perpendicular to the preliminary coating surface, a cleaning device.

2. The second nozzle has a tip surface where the slit for sucking the solution opens, and the tip surface is close to the preliminary coating surface such that the height of the tip surface is equal to or lower than the height of the liquid surface of the solution. The cleaning device according to claim 1.

3. The second nozzle has a tip surface where the slit for sucking the solution opens, and is provided with a support mechanism that enables the height of the second nozzle to be changed and maintains the height of the second nozzle at the changed position. The cleaning device according to claim 1 or claim 2.

4. The support mechanism has a function of enabling the heights of the first nozzle and the second nozzle to be individually changed, and the tip surface of the second nozzle is close to the preliminary coating surface such that the height of the tip surface of the second nozzle is equal to or lower than the height of the liquid surface of the solution. The cleaning device according to claim 3.

5. The first nozzle has a first tip surface where a discharge port for discharging the cleaning liquid opens, the second nozzle has a second tip surface where the slit for sucking the solution opens, and the second tip surface is closer to the preliminary coating surface than the first tip surface, or the distances from the preliminary coating surface are the same for the first tip surface and the second tip surface. The cleaning device according to any one of claims 1 to 4.

6. The drive mechanism is capable of reciprocating the cleaning moving body relative to the preliminary coating surface, and the first nozzle discharges the cleaning liquid during the forward movement of the cleaning moving body, The cleaning apparatus according to any one of claims 1 to 5, wherein the second nozzle sucks the solution when the cleaning moving body moves on the return path.

7. An applicator that relatively moves in relation to a substrate to apply a liquid to the substrate, A preliminary coating surface provided side by side in a working area where the applicator applies a liquid to the substrate, A cleaning apparatus for cleaning the preliminary coating surface, An outer wall surrounding the installation areas of the working area and the preliminary coating surface, A supply mechanism that supplies gas to a space inside the outer wall and in a part of or in the vicinity of the cleaning apparatus when the cleaning apparatus cleans the preliminary coating surface, A coating apparatus comprising: The cleaning apparatus is A cleaning moving body that removes the liquid preliminarily discharged by the applicator onto the preliminary coating surface in a non-contact state with the preliminary coating surface, A drive mechanism that maintains a non-contact state with the preliminary coating surface and relatively moves the cleaning moving body and the preliminary coating surface along the preliminary coating surface, The cleaning moving body is A first nozzle that discharges a cleaning liquid onto the preliminary coating surface coated with the liquid, A second nozzle that sucks a solution of the liquid and the cleaning liquid on the preliminary coating surface, having Coating apparatus.

8. The cleaning apparatus includes a cover that covers the cleaning moving body, The coating apparatus according to claim 7, wherein the supply mechanism includes a flow path connecting the cover and the outer wall for supplying the gas into the cover.

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