Supply method and supply device

Abstract

A sponge cleaning device 200 comprises: a sponge cleaning tank 210; a sponge 220 capable of retaining a detergent LQ2 (liquid substance); a sample retention structure 230 for retaining a model material MD (sample); a movement mechanism 240 capable of moving the sample retention structure 230 freely back and forth with respect to the sponge 220; a detergent supply mechanism 250 for supplying the detergent LQ2 to the sponge cleaning tank 210; a rinse supply mechanism 260 for supplying a rinse solution LQ5 to the sponge cleaning tank 210; a waste liquid holding tank 270 for holding wastewater from the sponge cleaning tank 210; a liquid surface sensor 280 provided to the sponge cleaning tank 210; and a control mechanism 290 for controlling the mechanisms 240-260.

Description

[Technical Field]

[0001] The present invention provides Supply method and supply device Regarding. [Background technology]

[0002] Three-dimensional modeling is a technology that uses three-dimensional shape data to build up thin films of thermoplastic resin, photocurable resin, powdered resin, powdered metal, etc., by fusing and hardening them using melt extrusion, inkjet, laser light, electron beam, etc. to create the desired three-dimensional object. Because it is possible to obtain objects directly from shape data and to mold complex shapes such as hollow or mesh shapes, it is being used in a wide range of fields, including the creation of test models that require small-lot or custom-made manufacturing, as well as in the medical field, the aircraft industry, and industrial robots.

[0003] Three-dimensional modeling devices known as 3D printers are commonly used to obtain three-dimensional objects. Specific examples include inkjet UV-curing 3D printers using acrylic photocurable inks, such as Stratasys' Objet (registered trademark) and Keyence's AGILISTA (registered trademark), fused deposition modeling 3D printers using acrylonitrile butadiene styrene resin, polycarbonate resin, polyphenylsulfone resin, polyetherimide resin, and the like, such as Stratasys' FORTUS, Dimension, and uPrint, powder lithography 3D printers, such as 3D Systems' SLS, and stereolithography 3D printers, such as 3D Systems' SLA and DWS' DigitalWax.

[0004] 3D printing can create complex 3D objects, but to create hollow structures, a support structure is required at the base of the object to temporarily support the resin being molded and prevent the object from deforming under its own weight. In the case of powder 3D printers, which bond or fuse powdered raw materials, the unbound or unfused powder acts as a support, supporting the structure. After fabrication, the 3D object can be obtained by simply brushing off the excess powder. Similarly, in stereolithography 3D printers, which gradually harden photosensitive resin using laser light, the unhardened photosensitive resin supports the structure, allowing the support to be removed simply by lifting the 3D object from the photosensitive resin vat. On the other hand, when using the widely used fused deposition modeling and inkjet printing methods for 3D printing, the 3D object made from the model material and the support made from the support material are simultaneously formed, necessitating a process for removing the support material after fabrication.

[0005] However, when using fused deposition modeling or inkjet printing to create three-dimensional objects, removing support material is no easy task. Because the support material is fused, bonded, or adhered to the model material, removing it from the model material typically requires manual methods such as using a spatula or brush, or blowing it away with a water jet. However, due to the risk of damaging the three-dimensional object, careful work is required, which is a significant burden.

[0006] Therefore, materials that can be dissolved in water or organic solvents, thermoplastic resins, water-swellable gels, etc. are used as support materials, and separation methods such as heating, dissolution, chemical reactions, power washing such as water pressure washing, electromagnetic wave irradiation, and thermal expansion differentials have been proposed depending on the properties of the support material (Patent Documents 1 and 2).Specifically, simplification of support material removal has been proposed by using resins that are easy to separate from the model material (Patent Documents 3 and 4), or by using wax as the support material and melting and removing it with heat (Patent Document 5). [Prior art documents] [Patent documents]

[0007] [Patent Document 1] Japanese Patent Application Laid-Open No. 2005-035299 [Patent Document 2] Japanese Patent Application Laid-Open No. 2012-096428 [Patent Document 3] U.S. Patent No. 5,503,785 [Patent Document 4] WO2001-068375 publication [Patent Document 5] Japanese Patent Application Laid-Open No. 2004-255839 Summary of the Invention [Problem to be solved by the invention]

[0008] However, even when using support materials that easily peel off from the model material, it is extremely difficult to efficiently remove support materials that have become lodged in microstructures (holes, grooves, etc.). In particular, the more complex the shape of the model material, the longer the time required for removal. Furthermore, when using a thermal melting and removal method, excessive heating of the model material can lead to deformation of the model material. Therefore, it is necessary to perform melting and removal while suppressing thermal deformation. Furthermore, if painting is to be performed in the next process (for example, if the three-dimensional object is a figurine), remaining oil (from the support material, etc.) can cause poor painting.

[0009] Thus, in three-dimensional modeling, it has been desired to establish a method for cleaning support materials that allows cleaning of model materials with attached support materials and that can be done in a short time, and this problem is serious when it comes to three-dimensional objects with fine structures.

[0010] Furthermore, not only in the case of cleaning three-dimensional objects, but also in the case of three-dimensional objects with fine structures (holes, grooves, etc.), when trying to bring a liquid with a specified function into contact with the fine structures, there are many cases where the liquid cannot be supplied to the fine structures, causing problems. [Means for solving the problem]

[0011] The present invention relates to a supply device for supplying a liquid substance to an opening formed in a sample, and includes a gas-liquid supply mechanism for supplying a liquid substance containing bubbles to the opening, and the gas-liquid supply mechanism is repetitively switchable between a liquid contact state in which the sample is in contact with the liquid substance and a liquid contact retraction state in which the sample is retracted from the liquid contact state. The gas / liquid supply mechanism includes an elastic sponge, a tank that contains the sponge, and a sponge deformation mechanism that deforms the sponge, the sponge having an open-cell structure, and in the liquid-contact retracted state, a portion of the sponge in the tank is exposed above the liquid surface and contains the liquid substance, the sponge deformation mechanism deforms the sponge so that the contacting portion is recessed while the opening of the sample remains in contact with the sponge, and is capable of retracting the opening of the sample from the sponge so that the deformation is released, and the liquid-contact state is achieved by the deformation of the sponge, and the liquid-contact retracted state is achieved by the release of the deformation of the sponge. It is characterized by:

[0012] The sponge preferably has a slit formed therein so that the sample can be accommodated in the slit. The sponge is preferably formed in a cylindrical shape and disposed so as to surround the sample. The sponge is preferably in a sheet shape and disposed so as to surround the sample. Furthermore, it is preferable that the sponge has a sheet-shaped sponge body, which has a first engagement portion and a second engagement portion formed at a position away from the first engagement portion, the first engagement portion being engageable with and detachable from the second engagement portion, and when the first engagement portion engages with the second engagement portion, the sponge body is arranged to surround the sample. It is preferable that the sponge deformation mechanism is such that the entire tank is deformable, or a portion of the tank is deformable, and the sponge is arranged in the tank so that it can deform together with the deformation of the deformable portion. The sponge deformation structure is provided with a moving mechanism that allows the sample to be moved freely toward and away from the sponge, and the moving mechanism allows the sponge to be freely switched between a pressed-in state in which it is pressed by the sample and a pressed-in and retracted state in which it is retracted from the pressed-in state, and it is preferable that the sponge is in the liquid-contact state when in the pressed-in state and in the liquid-contact and retracted state when in the pressed-in and retracted state. The cleaning agent has fluidity in a range above the melting point of the support material and below the melting point of the model material, and is provided with a temperature control mechanism that adjusts the temperature so that the cleaning agent exhibits fluidity, the temperature control mechanism including an outer bath that contains the bath, the liquid substance, and the sample, and a temperature control unit that adjusts the temperature of the internal space of the outer bath, and the moving mechanism including a shaft, a drive device that rotates the shaft, and a cam mechanism that converts the rotational motion of the shaft into linear motion of the sample, and it is preferable that the drive device is arranged outside the outer bath and the shaft is passed through a hole formed in the outer bath.

[0013] The present invention provides A supply method for supplying a liquid substance to an opening formed in a sample, comprising: a bubble generation step for generating bubbles of the liquid substance; and a liquid contact switching step for repeatedly switching between a liquid contact state in which the sample is in contact with the liquid substance and a liquid contact retraction state in which the sample is retracted from the liquid contact state. The method uses an elastic sponge and a tank for accommodating the sponge, wherein the sponge has an open-cell structure, and in the liquid contact retraction state, a portion of the sponge in the tank is exposed above the liquid surface and contains the liquid substance. The liquid contact switching step includes a deformation step for deforming the sponge so that the contact portion remains in contact with the sponge and is recessed, so as to transition from the liquid contact retraction state to the liquid contact state, and a deformation release step for releasing the deformation so as to transition from the liquid contact state to the liquid contact retraction state. These steps are alternately performed, and the deformation release step and the bubble generation step are performed simultaneously.

[0014] In the liquid contact switching step, it is preferable that the sample is switched from the liquid contact retracted state to the liquid contacted state by deformation of the bath, and that the sample is switched from the liquid contacted state to the liquid contact retracted state by release of the deformation of the bath. It is preferable that a moving mechanism capable of moving the sample toward and away from the sponge is used, and in the liquid contact switching step, the sponge is alternately switched by the moving mechanism between a pressed-in state in which the sponge is pressed by an opening formed in the sample and a pressed-in retracted state in which the sponge is retracted from the pressed-in state, so that the sponge is in the liquid contacted state when in the pressed-in state and the liquid contact retracted state when in the pressed-in retracted state. [Effects of the Invention]

[0015] According to the present invention, it is possible to provide a method and a device for supplying a cleaning liquid that can thoroughly clean an object having a polymer compound attached thereto and that can shorten the cleaning time. Furthermore, it is possible to provide a method and a device for supplying a liquid to a microstructure, not limited to a cleaning agent. Furthermore, according to the present invention, it is possible to provide a cleaning agent that can be applied to the method and the device. [Brief explanation of the drawings]

[0016] [Figure 1] 1 is a flowchart showing an outline of a cleaning method. [Figure 2] FIG. 1 is a perspective view showing an overview of a cleaning device. [Figure 3] FIG. 1 is a cross-sectional view showing an outline of a cleaning device. [Figure 4] 3A to 3C are cross-sectional views showing an outline of a cleaning device in each step of a cleaning method. [Figure 5] FIG. 10 is a partial cross-sectional view showing an outline of a sealing unit applicable to the cleaning device. [Figure 6]FIG. 2 is a block diagram showing the connection between a controller and each unit. [Figure 7] 1 is a flowchart showing an outline of a cleaning method. [Figure 8] FIG. 1 is an explanatory diagram showing an overview of a sponge-type cleaning device. [Figure 9] FIG. 2 is an exploded perspective view showing an overview of a sponge, a model material, and a sample holding structure. [Figure 10] FIG. 10 is a cross-sectional view showing an outline of the forward and backward movement of the model material in the sponge-type cleaning tank. [Figure 11] FIG. 2 is an explanatory diagram illustrating an overview of a model material. [Figure 12A] FIG. 1 is an explanatory diagram showing an overview of a sponge-type cleaning device. [Figure 12B] FIG. 1 is a perspective view showing an overview of a sponge. [Figure 12C] FIG. 1 is a perspective view showing an overview of a sponge. [Figure 12D] FIG. 1 is a perspective view showing an overview of a sponge. [Figure 12E] FIG. 2 is a plan view showing an outline of the sponge. [Figure 12F] FIG. 2 is a side view showing an overview of the sponge. [Figure 12G] FIG. 1 is an explanatory diagram showing an overview of a sponge-type cleaning device. [Figure 13A] FIG. 1 is an explanatory diagram showing an overview of a water wheel type cleaning device. [Figure 13B] FIG. 1 is an explanatory diagram showing an overview of a water wheel type cleaning device. [Figure 14] FIG. 10 is an explanatory diagram showing an outline of the movement of a model material in a water wheel type cleaning device. [Figure 15] FIG. 1 is an explanatory diagram showing an overview of a water wheel type cleaning device. [Figure 16] FIG. 2 is a side view showing an outline of the sealed cleaning container. [Figure 17] FIG. 2 is a cross-sectional view showing an outline of a sealed cleaning container. [Figure 18A] FIG. 2 is a cross-sectional view showing an outline of a sealed cleaning container. [Figure 18B] FIG. 2 is a cross-sectional view showing an outline of a sealed cleaning container. [Figure 18C]FIG. 2 is a cross-sectional view showing an outline of a sealed cleaning container. [Figure 18D] FIG. 2 is a cross-sectional view showing an outline of a sealed cleaning container. [Figure 19] FIG. 2 is a cross-sectional view showing an outline of a sealed cleaning container. [Figure 20] FIG. 2 is a cross-sectional view showing an outline of a sealed cleaning container. [Figure 21] FIG. 2 is a cross-sectional view showing an outline of a sealed cleaning container. DETAILED DESCRIPTION OF THE INVENTION

[0017] 1, the cleaning method 100 removes the supporting material SP (polymer compound) from the model material MD (object) to which the supporting material SP is attached, and includes a preliminary cleaning step 110 in which the sample, i.e., the model material MD to which the supporting material SP is attached, is immersed in a preliminary cleaning agent LQ1, a cleaning step 120 that is performed after the preliminary cleaning step 110 in which the sample is immersed in a cleaning agent LQ2, and a rinsing step 130 that is performed after the cleaning step 120 in which the sample is immersed in water (rinse liquid). Note that, if necessary, a coating step 140 that is performed after the rinsing step 130 in which the model material MD is coated with a coating liquid LQ3 may be performed.

[0018] Model materials MD are materials used in fused deposition modeling and inkjet printing, and include, for example, ultraviolet-curable resins, thermosetting resins, and thermoplastic resins. More specifically, they include acrylonitrile-butadiene-styrene resins, polycarbonate resins, polyphenylsulfone resins, polyetherimide resins, acrylic resins, and polypropylene resins. Commercially available models include VisiJet (registered trademark; the same applies below) MX, VisiJet EX200, VisiJet SR200, VisiJet HR200, VisiJet DP200, VisiJet CPX200, and VisiJet M2R-CL (3D Systems Japan).

[0019] In addition, AR-G1L (Keyence Corporation) can also be used as the model material MD. AR-G1L Ingredients: Silicone 65% by weight Acrylic monomer 30-35% by weight Organic phosphorus compounds 1-5% by weight Phenone compounds 1-5% by weight

[0020] The support material SP can be an aliphatic alcohol. The aliphatic alcohol preferably has 1 to 24 carbon atoms. An example of an aliphatic alcohol is stearyl alcohol (CAS number 112-95-5). An example of a commercially available aliphatic alcohol is VisiJet200 (3D Systems Japan).

[0021] In addition, AR-S1 (Keyence Corporation) can also be used as the support material SP. AR-S1 Ingredients: Acrylic monomer 10-25% by weight Polypropylene glycol 70-90% by weight Photopolymerization initiator 1 to 5% by weight Support material SP density: 1.03 (g / cm 3 )

[0022] The preliminary cleaning agent LQ1 is preferably hydrophobic overall and easily dissolves the support material SP. The preliminary cleaning agent LQ1 is preferably a fatty acid ester used as a base oil, and particularly preferably a fatty acid ester derived from vegetable oil. The melting point of the fatty acid ester is preferably lower than the melting point of the support material SP.

[0023] The melting point was measured according to JIS K 0064-1992 (the same applies hereinafter).

[0024] Furthermore, the preliminary cleaning agent LQ1 preferably solidifies (gels) at a relatively low temperature (for example, below the melting point of the support material SP). For this reason, the preliminary cleaning agent LQ1 may contain another compound in addition to the fatty acid ester. That is, the melting point or softening temperature of the mixture containing the fatty acid ester and the other compound is preferably higher than that of the fatty acid ester. This allows the preliminary cleaning agent LQ1 to liquefy or soften when heated during use, while losing its fluidity when not in use, making it easier to handle. The concentration of the fatty acid ester in the preliminary cleaning agent LQ1 is not particularly limited as long as the effects of the invention are achieved. However, for example, the lower limit is preferably 30% by weight or more, more preferably 50% by weight or more, and particularly preferably 80% by weight or more. Examples of the other compound include solid paraffin (CAS number 8002-74-2, English name: Paraffin wax), the same compound as the support material SP, or a compound that shares components with the support material SP. These may be used alone or in combination. The upper limit of the concentration of solid paraffin is not particularly limited as long as the effects of the invention are achieved, but is, for example, 80% by weight, preferably 70% by weight, and more preferably 60% by weight. Therefore, the preliminary cleaning agent LQ1 that was previously used in the preliminary cleaning step 110 can be reused in the preliminary cleaning step 110 as long as the effects of the invention are achieved.

[0025] The softening temperature is measured according to JIS K 7206-1991 (hereinafter the same).

[0026] Detergent LQ2 is preferably water-soluble as a whole and contains a solvent and a surfactant. Detergent LQ2 may contain additives as needed.

[0027] The solvent is preferably water or alcohol. The water is preferably distilled water. Examples of alcohol that can be used include methanol, ethanol, propanol, butanol, pentanol, ethylene glycol, and glycerin. The concentration of the solvent is not particularly limited as long as it achieves the effects of the invention, but is preferably 10% by weight or more and 99% by weight or less, more preferably 50% by weight or more and 99% by weight or less, and even more preferably 60% by weight or more and 99% by weight or less.

[0028] The surfactant is preferably one that acts to remove the support material SP from the model material MD. Examples of surfactants include anionic surfactants, cationic surfactants, nonionic surfactants, and amphoteric surfactants.

[0029] Examples of anionic surfactants include sodium or potassium salts of fatty acids, alkylbenzene sulfonates, higher alcohol sulfate salts, polyoxyalkylene monoalkyl ether salts, α-sulfofatty acid esters, α-olefin sulfonates, monoalkyl phosphate ester salts, and alkanesulfonates.

[0030] Examples of cationic surfactants include alkyltrimethylammonium salts, dialkyldimethylammonium salts, alkyldimethylbenzylammonium salts, and amine salts (for example, N-methylbishydroxyethylamine fatty acid ester hydrochloride).

[0031] Examples of amphoteric surfactants include alkylamino fatty acid salts, alkyl betaines, and alkyl amine oxides.

[0032] Examples of nonionic surfactants include polyoxyethylene alkyl ethers, polyoxyethylene alkylphenol ethers, alkyl glucosides, polyoxyethylene fatty acid esters, sucrose fatty acid esters, sorbitan fatty acid esters, polyoxyethylene sorbitan fatty acid esters, and fatty acid alkanolamides.

[0033] Specific examples of surfactants include those containing an amino group and a hydrophilic group (excluding the amino group). Examples of hydrophilic groups (excluding the amino group) include hydroxyl groups, carboxyl groups, carbonyl groups, and sulfo groups. Specific examples include ethanolamines (monoethanolamine, diethanolamine, and triethanolamine). Polyoxyalkylene monoalkyl ether (CAS number 77029-64-2) and the like can also be used.

[0034] The concentration of the surfactant is not particularly limited as long as it is at a level that produces the effects of the invention, but it is preferably 1% by weight or more and 40% by weight or less, more preferably 1% by weight or more and 30% by weight or less, and even more preferably 1% by weight or more and 25% by weight or less, based on the total weight.

[0035] Furthermore, to improve foaming, a surfactant other than the one added to act on the removal of the support material SP from the model material MD may be added. The surfactant is preferably selected appropriately from the surfactants described above. The concentration of the surfactant used to improve foaming is not particularly limited as long as it achieves the effects of the invention, but is preferably 1% by weight or more and 30% by weight or less, more preferably 1% by weight or more and 20% by weight or less, and even more preferably 1% by weight or more and 10% by weight or less.

[0036] Examples of additives include metal ion builders, alkali builders, dispersion and anti-redeposition builders, enzymes, fluorescent brighteners, bleaching agents, foam control agents, and other auxiliary agents, such as sodium xylene sulfonate (CAS No. 1300-72-7) and sodium silicate (CAS No. 6834-92-0). There are no particular limitations on the concentration of the additives as long as they achieve the effects of the invention, but a concentration of 1% by weight or more and 20% by weight or less is preferred.

[0037] The coating liquid LQ3 may be any liquid as long as it is capable of forming a light-transmitting coating layer on the surface of the model material MD. The coating liquid LQ3 preferably contains an alcohol having an amino group. Examples of alcohols having an amino group include ethanolamines (monoethanolamine (CAS 141-43-5), diethanolamine (CAS 111-42-2), and triethanolamine (CAS 102-71-6)). An aqueous solution of an ethanolamine is preferred. The concentration of the ethanolamine is not particularly limited as long as it is sufficient to produce the effects of the invention, but is preferably 10% by weight or more and 40% by weight or less. Polypropylene glycol or stearic acid may also be used as the coating liquid LQ3.

[0038] The coating liquid LQ3 may contain components in common with the cleaning agent LQ2.

[0039] As shown in FIGS. 2 and 3 , the cleaning device 2 is used to perform the preliminary cleaning steps 110 to 120 of the cleaning method 100, and includes a preliminary cleaning tank 11 that contains a preliminary cleaning agent LQ1, a cleaning tank 12 that contains a cleaning agent LQ2, an outer container 21 that contains the preliminary cleaning tank 11 and the cleaning tank 12, a temperature adjustment unit 30 that adjusts the temperature of the water WT contained in the outer container 2, an ultrasonic unit 40 that applies ultrasonic waves to the preliminary cleaning agent LQ1 and the cleaning agent LQ2 via the water WT, the preliminary cleaning tank 11, and the cleaning tank 12, and a controller 80 that controls each unit.

[0040] Both the preliminary cleaning tank 11 and the cleaning tank 12 are made of a material with good thermal conductivity (e.g., metal). The outer container 21 contains water WT. The preliminary cleaning tank 11 and the cleaning tank 12 are immersed in the water WT from their middle to bottom. An engagement portion 12K is provided on the opening edge of the cleaning tank 12. By engaging the engagement portion 12K with the opening edge of the outer container 21, the cleaning tank 12 can be maintained spaced apart from the bottom of the outer container 21. An engagement portion 11K is provided on the opening edge of the preliminary cleaning tank 11. By engaging the engagement portion 11K with the opening edge of the cleaning tank 12, the preliminary cleaning tank 11 can be maintained spaced apart from the bottom of the outer container 21. The engagement portion 11K may also be engaged with the opening edge of the outer container 21.

[0041] The engagement portion 11K of the preliminary cleaning tank 11 and the engagement portion 12K of the cleaning tank 12 also function as a cover to prevent foreign matter such as the first and second liquids LQ1-2 from getting mixed into the water WT.

[0042] The temperature adjustment unit 30 includes a temperature sensor 31 that detects the temperature of the water WT contained in the outer container 21, and a heater 32 that heats the water WT contained in the outer container 21.

[0043] The ultrasonic unit 40 includes a control box 41 disposed outside the outer container 21, an oscillator 42 disposed in the water WT of the outer container 21, and a cable 43 connecting the control box 41 and the oscillator 42. The frequency of the ultrasonic waves emitted by the ultrasonic unit 40 is not particularly limited, but is preferably, for example, 30 Hz or more and 60 Hz or less. The duration of application of the ultrasonic waves is also not particularly limited.

[0044] A cover 21S that covers the heater is provided on the outer container 21. The cover 21S separates the outer container 21 except for the bottom portion. This allows heat from the heater 32 to be transferred to the preliminary cleaning agent and the cleaning agent, and also prevents damage to the heater 32 due to application of ultrasonic waves.

[0045] The controller 80 is electrically connected to the temperature sensor 31, the heater 32, the control box 41, and the like.

[0046] Next, the cleaning method 100 will be described with reference to FIG.

[0047] (Pre-cleaning step 110) Under the control of the controller 80, the temperature adjustment unit 30 adjusts the temperatures of the preliminary cleaning agents LQ1 and LQ2 to a temperature lower than the melting point of the model material and equal to or higher than the melting point of the support material. At this time, the preliminary cleaning agents LQ1 and LQ2 are both liquid and have fluidity. Furthermore, under the control of the controller 80, the ultrasonic unit 40 is powered on, and ultrasonic waves are applied to the preliminary cleaning agents LQ1 and LQ2.

[0048] Next, the model material MD with the supporting material SP attached is placed in the preliminary cleaning agent LQ1 (Fig. 4(A)). Because preliminary cleaning agent LQ1 contains components that are compatible with the supporting material SP, most of the supporting material SP dissolves in the preliminary cleaning agent LQ1 (Fig. 4(B)). After a predetermined time has passed, the model material MD is removed from the preliminary cleaning agent LQ1. In this way, most of the supporting material SP is removed from the model material MD by the effects of preliminary cleaning agent LQ1, temperature, and ultrasound.

[0049] When the model material MD is removed from the preliminary cleaning material LQ1, part of the support material SP remains on the model material MD.

[0050] (Cleaning process 120) Next, the model material MD with the supporting material SP attached is placed in the liquid cleaning solution LQ2 (Fig. 4(C)). Due to the action of the components of the cleaning solution LQ2 (particularly the surfactant), most of the remaining supporting material SP is removed from the model material MD and remains in the cleaning solution LQ2.

[0051] When the model material MD is removed from the cleaning agent LQ2, almost no support material SP remains on the model material MD. At this time, the surfactant contained in the cleaning agent LQ2 makes it easy to wash away the remaining support material SP with water or an aqueous solution.

[0052] (rinsing step 130) The model material MD is removed from the cleaning agent LQ2 and placed in water (FIG. 4(D)). The water temperature may be room temperature, but it is more preferable that it be lower than the melting point of the model material and higher than the melting point of the support material SP. The water is preferably distilled water.

[0053] In the rinsing step 130, a separate tank containing hot water at a predetermined temperature may be placed in the outer container 21, and ultrasonic waves may be applied to the model material MD while it is immersed in the hot water. Also, in the rinsing step 130, instead of distilled water, an aqueous solution in which another compound (e.g., alcohol) is dissolved in distilled water, or a solution in which another compound is dispersed in distilled water may be used. In other words, the rinsing liquid used in the rinsing step 130 is preferably compatible with the cleaning agent LQ2.

[0054] (Coating process 140) If necessary, the model material MD is placed in the coating liquid LQ3. After a predetermined time has elapsed, the model material MD is pulled out of the coating liquid LQ3. As a result, the coating liquid LQ3 is applied to the surface layer of the model material MD. After that, after a predetermined time has elapsed, a coating layer is formed on the surface layer of the model material MD.

[0055] As described above, according to the present invention, liquids such as the preliminary cleaning agent LQ1 and the cleaning agent LQ2 are used, so even if the model material MD has a complex shape, the liquid can reach deep into the shape, making it possible to remove the support material SP located deep inside the shape.

[0056] Here, consider the case where model material MD having supporting materials SP attached thereto is subjected to the cleaning step 120 without undergoing the preliminary cleaning step 110. When the model material MD is brought into contact with the cleaning agent LQ2 in the cleaning step 120, the supporting materials SP attached to the model material MD can be removed by the action of the surfactant contained in the cleaning agent LQ2. However, since the extent of the surfactant's ability to remove supporting materials SP is greatly affected by the amount of surfactant, if the cleaning step 120 is performed on a model material MD having a large amount of supporting materials SP attached thereto without undergoing the preliminary cleaning step 110, a large amount of supporting materials SP will be contained in the cleaning agent LQ2. In this state, the cleaning agent LQ2 cannot be expected to have much of an effect of removing supporting materials SP.

[0057] It can be assumed that the factors behind the decrease in the removal effect of the support material SP are a decrease in the removal effect due to a decrease in the concentration of the cleaning agent LQ2 in the cleaning tank 12 and an increase in viscosity due to an increase in the concentration of the support material SP in the cleaning tank 12.

[0058] Therefore, in order to maintain the effect of removing the support material SP in the cleaning process 120, it is necessary to add new cleaning agent LQ2.

[0059] In the present invention, the model material MD is brought into contact with a preliminary cleaning agent LQ1, which dissolves the supporting material SP, before being brought into contact with a cleaning agent LQ2, which can remove the supporting material SP. This reduces the amount of supporting material SP adhering to the model material MD as much as possible at the start of the cleaning process 120. This maintains the effectiveness of the cleaning agent LQ2 in removing the supporting material SP in the cleaning process 120. Furthermore, the removal of the supporting material SP by the preliminary cleaning agent LQ1 is not due to the action of a surfactant, as in the cleaning agent LQ2, but rather to its compatibility with the supporting material SP. This maintains the removal effect of the supporting material SP even when a large amount of supporting material SP remains in the preliminary cleaning agent LQ1. In this way, the combination of the preliminary cleaning process 110 and the cleaning process 120 makes it possible to maintain the removal effect of the supporting material SP.

[0060] Furthermore, when the model material MD is removed from the cleaning agent LQ2, almost no supporting material SP remains on the model material MD. At this time, the supporting material SP remaining on the model material MD can be easily washed away with water or an aqueous solution due to the action of the surfactant contained in the cleaning agent LQ2. Therefore, by performing the rinsing step 130 after the cleaning step 120, the supporting material SP can be removed from the model material MD.

[0061] The mixture of the preliminary cleaning agent LQ1 and the support material SP only needs to have fluidity in the preliminary cleaning step 110, and preferably loses fluidity at a lower temperature (for example, room temperature). This makes it easier to handle the mixture as waste. Furthermore, the mixture can be used as general waste and as fuel.

[0062] A layer consisting of a mixture of the preliminary cleaning agent LQ1 and the supporting material SP is formed on the surface of the model material MD that has been pulled out of the preliminary cleaning agent LQ1. If this mixture is left at a temperature lower than the melting point of the supporting material SP (for example, room temperature), it will solidify (gel). If it is heated to a temperature higher than the melting point of the supporting material SP, it will dissolve. Therefore, the layer consisting of the mixture of the preliminary cleaning agent LQ1 and the supporting material SP can also be used as a protective layer for the model material.

[0063] On the other hand, the mixture of cleaning agent LQ2 and support material SP is liquid in the cleaning process 120, but is water-soluble and therefore relatively safe. This makes it easy to manage this mixture as waste. Furthermore, it is sufficient for the mixture of cleaning agent LQ2 and support material SP to have fluidity in the cleaning process 120, and it is preferable that it loses fluidity at lower temperatures (for example, room temperature).

[0064] Furthermore, some materials of the model material MD are sensitive to heat. In such cases, the model material MD may be deformed due to a rise in temperature. In such cases, if the model material MD is heated in air, the model material is likely to deform due to its own weight. According to the present invention, the model material MD is heated in liquid, and therefore, compared to heating in air, buoyancy comes into play, thereby suppressing deformation of the model material due to its own weight.

[0065] If it is desired to impart gloss to the model material MD after the rinsing step 130, a coating step 140 is carried out to form a light-transmitting coating layer using the coating liquid LQ3, which increases the gloss and improves the appearance.

[0066] The reason why the coating layer increases gloss and improves the appearance is presumed to be as follows: The surface of the model material MD may contain stripes of layering marks from the modeling process. If the support material SP is removed, the gloss will be lost and the surface will appear cloudy due to reflections from the layering marks from the modeling process. On the other hand, if a coating layer is formed on top of the layering marks from the modeling process, the reflections from the coating layer will increase gloss and improve the appearance.

[0067] In the above embodiment, the application step 140 is performed in the cleaning method 100, but the present invention is not limited to this. If you do not want to leave any foreign matter (such as the supporting material SP or a coating layer of the application liquid LQ3) on the surface of the model material MD, or if you do not need to improve the appearance, the application step 140 may be omitted.

[0068] It is preferable that the density of the solvent in the cleaning agent LQ2 is different from the density of the supporting material SP. For example, if the density of the supporting material SP is greater than the density of the solvent in the cleaning agent LQ2, the supporting material SP will separate from the cleaning agent LQ2 in the second immersion step due to the difference in density and sink to the bottom of the cleaning tank 12. Therefore, when attempting to pull out the model material MD from the cleaning agent LQ2, the removed supporting material SP will be less likely to reattach to the model material MD.

[0069] In the above embodiment, the pre-cleaning step 110 is performed in the cleaning method 100, but the present invention is not limited to this. If the amount of supporting material adhering to the model material MD is small, the pre-cleaning step 110 may be omitted.

[0070] In the above embodiment, the cleaning step 120 is performed with the openings of the preliminary cleaning tank 11 and the cleaning tank 12 open to the atmosphere, but the present invention is not limited to this. For example, the cleaning step 120 may be performed with each opening sealed from the atmosphere.

[0071] In addition to the above-described configuration, the cleaning device 2 may also include a sealed unit 60 that houses the preliminary cleaning tank 11 and the cleaning tank 12, a pump 70 that reduces the pressure in the internal space of the sealed unit 60, and a temperature adjustment unit 75 (Figures 5-6).

[0072] The sealing unit 60 comprises a container 61, a lid 62 capable of closing the opening of the container 61, a packing 63 attached to the lid 62, and a release valve 64. The container 61 has a container space 61KX capable of accommodating the preliminary cleaning tank 11 and the cleaning tank 12. The opening of the container space 61KX opens upward. When the opening of the container space 61KX is closed using the lid 62, the container space 61KX is sealed by the packing 63 (FIG. 5(B)). Under the control of the controller 80, the release valve 64 can be switched between an open state in which the container space 61KX is connected to the outside space and a closed state in which the container space 61KX is disconnected from the outside space.

[0073] The pump 70 includes a pump body 71 having an intake port 71A and an exhaust port 71B, a pipe 72 connecting the intake port 71A and the accommodation space 61KX, and a pressure gauge 73 for measuring the pressure in the accommodation space 61KX. The controller 80 drives the pump body 71 while reading the measurement value of the pressure gauge 73. As a result, the pump 70 can adjust the internal air pressure of the accommodation space 61KX to a predetermined range under the control of the controller 80.

[0074] The temperature adjustment unit 75 includes a temperature sensor 75S that detects the temperatures of the cleaning agents LQ1 to LQ2 contained in the preliminary cleaning tank 11 and the cleaning tank 12, respectively, and an induction heater 75H provided on the inner bottom surface of the container 61.

[0075] Under the control of the controller 80, the temperature adjustment unit 75 adjusts the temperatures of the preliminary cleaning agent LQ1 and the cleaning agent LQ2 so that they are lower than the melting point of the model material and higher than the melting point of the support material. At this time, both the preliminary cleaning agent LQ1 and the cleaning agent LQ2 are in liquid form.

[0076] If necessary, under the control of the controller 80, an ultrasonic unit 40 (FIG. 3) may be used to apply ultrasonic waves to the preliminary cleaning agent LQ1 and the cleaning agent LQ2.

[0077] Next, a method of using the sealed unit 60 will be described.

[0078] (Pre-cleaning step 110) As shown in Fig. 5(A), the preliminary cleaning tank 11 is placed in the accommodation space 61KX. The model material MD with the supporting material SP attached thereto is placed in the preliminary cleaning material LQ1. Under the control of the controller 80, the temperature adjustment unit 75 adjusts the temperature of the preliminary cleaning material LQ1 to be lower than the melting point of the model material MD and higher than the melting point of the supporting material SP.

[0079] Next, the release valve 64 is closed. When the opening of the storage space 61KX is closed with the lid 62, the storage space 61KX becomes a sealed space with the packing 63 (FIG. 5(B)). Under the control of the controller 80, the pump 70 adjusts the internal air pressure of the storage space 61KX to be within a predetermined range.

[0080] Because the preliminary cleaning agent LQ1 contains components that are compatible with the supporting material SP, most of the supporting material SP dissolves in the preliminary cleaning agent LQ1. Furthermore, by placing the model material MD with the supporting material SP attached in an environment with a pressure lower than atmospheric pressure, gas present inside the supporting material SP and at the boundary with the model material MD is released to the outside. As a result of this air exchange, the removal of the supporting material SP from the model material MD progresses. After a predetermined time has passed, the pump 70 is stopped, the release valve 64 is opened, the lid 62 is opened, and the model material MD is lifted up from the preliminary cleaning agent LQ1.

[0081] (Cleaning process 120) Next, the model material MD that has been pulled out of the preliminary cleaning material LQ1 is placed in the cleaning liquid LQ2. Under the control of the controller 80, the temperature adjustment unit 75 adjusts the temperature of the cleaning material LQ2 so that it is lower than the melting point of the model material MD and higher than the melting point of the supporting material SP.

[0082] Next, when the release valve 64 is closed and the opening of the storage space 61KX is blocked with the lid 62, the storage space 61KX becomes a sealed space with the packing 63 (FIG. 5(B)). Under the control of the controller 80, the pump 70 adjusts the internal air pressure of the storage space 61KX to be within a predetermined range.

[0083] Due to the action of the surfactant in the cleaning liquid LQ2, the remaining supporting material SP is removed from the model material MD and remains in the cleaning liquid LQ2. Furthermore, by placing the model material MD with the supporting material SP attached in an environment with a pressure lower than atmospheric pressure, the removal of the supporting material SP from the model material MD progresses. As a result, only a small amount of supporting material SP remains on the model material MD. After a predetermined time has elapsed, the pump 70 is stopped, the release valve 64 is opened, the lid 62 is opened, and the model material MD is pulled up from the cleaning liquid LQ2.

[0084] Here, when the preliminary cleaning step 110 or the cleaning step 120 is performed in an environment with a pressure lower than atmospheric pressure, the reason for promoting the removal of the supporting material SP from the model material MD is presumed to be as follows.

[0085] At the time when modeling of the model material MD is completed, a certain amount of gas exists inside the supporting material SP and at the boundary with the model material MD. However, even if the preliminary cleaning process 110 or the cleaning process 120 is performed in an environment with approximately the same air pressure as during modeling, the gas remains inside. However, if the preliminary cleaning process 110 or the cleaning process 120 is performed using the pump 70 in an environment with a lower pressure than during modeling, the difference in air pressure makes the gas more likely to escape into the external space. As a result of this air exchange, the removal of the supporting material SP from the model material MD is promoted.

[0086] It is preferable that the pump 70 reduces the internal air pressure of the accommodation space 61KX to the extent that the cleaning liquid LQ2 reaches a boiling state. The boiling phenomenon promotes air exchange, and as a result, removal of the supporting material SP from the model material MD progresses.

[0087] (rinsing step 130) Thereafter, the model material MD removed from the cleaning agent LQ2 is placed in a beaker containing hot water for rinsing step 130. The temperature of the hot water is preferably adjusted to a temperature lower than the melting point of the model material MD and equal to or higher than the melting point of the supporting material SP. The ultrasonic unit 40 may be driven to apply ultrasonic waves to the hot water contained in the beaker.

[0088] In this way, by performing the preliminary cleaning process 110 and the cleaning process 120 in an environment with a pressure lower than atmospheric pressure, the removal of the supporting material SP from the model material MD is promoted. In order to obtain the effect of removing the supporting material SP from the model material MD, a higher temperature is required, but by performing the preliminary cleaning process 110 and the cleaning process 120 in an even lower pressure environment, the effect of removing the supporting material SP from the model material MD can be obtained without creating a higher temperature environment. Therefore, if the material of the model material MD is sensitive to heat, thermal deformation can be avoided by performing the preliminary cleaning process 110 and the cleaning process 120 in an environment with a pressure lower than atmospheric pressure. It is possible to obtain the effect of removing the support material SP while maintaining the same.

[0089] Between the preliminary cleaning process 110 in the sealed unit 60 and the cleaning process 120 in the sealed unit 60, or after the cleaning process 120 in the sealed unit 60, the preliminary cleaning process 110 or the cleaning process 120 may be performed while driving the ultrasonic unit 40 in an environment open to the external space, such as the cleaning device 2 shown in Figures 2 and 3.

[0090] Furthermore, depending on the desired degree of cleanliness, the pre-cleaning step 110 may be omitted.

[0091] However, when a microstructure is formed in the model material MD, it may be impossible to remove the supporting material SP that has entered the microstructure. Examples of the microstructure include through-holes and grooves. The size of the through-holes is, for example, preferably 2 mm or less, more preferably 1 mm or less, and even more preferably 0.5 mm or less. The width of the grooves is, for example, preferably 2 mm or less, more preferably 1 mm or less, and even more preferably 0.5 mm or less.

[0092] In the cleaning method 100 for a model material MD having such a microstructure, it is preferable to perform a cleaning step (hereinafter referred to as a reduced pressure cleaning step) 221 using a sealed unit 60 instead of the cleaning step 120, and a sponge type cleaning step 222 using a sponge type cleaning device 200, which is performed after the reduced pressure cleaning step 221 (FIG. 7). Furthermore, it is preferable to perform a sponge type rinsing step 132 instead of the rinsing step 130.

[0093] In some cases, the reduced pressure cleaning step 121 may be omitted. Also, instead of the reduced pressure cleaning step 121, the cleaning step 120 using the cleaning device 2 may be performed.

[0094] Furthermore, if necessary, an application step 140 may be performed after the rinsing step 130 or the sponge mold rinsing step 132, in which the model material MD is applied to the application liquid LQ3.

[0095] Next, the sponge-type cleaning device 200 will be described with reference to FIGS.

[0096] For convenience of explanation, a predetermined direction on a horizontal plane is referred to as the X direction, a direction perpendicular to the X direction on the horizontal plane is referred to as the Y direction, and a direction perpendicular to the X and Y directions is referred to as the Z direction.

[0097] As shown in Figures 8 and 9, the sponge-type cleaning device 200 includes a sponge-type cleaning tank 210 (tank), a sponge 220 capable of holding a cleaning agent LQ2 (liquid substance), a sample holding structure 230 that holds a model material MD (sample) having a support material SP attached thereto, a moving mechanism 240 (moving mechanism) that can freely move the sample holding structure 230 back and forth relative to the sponge 220, a cleaning agent supply mechanism 250 that supplies the cleaning agent LQ2 to the sponge-type cleaning tank 210, a rinsing liquid supply mechanism 260 that supplies a rinsing liquid LQ5 to the sponge-type cleaning tank 210, a waste liquid storage tank 270 that stores wastewater from the sponge-type cleaning tank 210, a liquid level sensor 280 provided in the sponge-type cleaning tank 210, and a control mechanism 290 that controls each of the mechanisms 240 to 260.

[0098] The sponge-type cleaning tank 210 is capable of containing a cleaning agent LQ2 (liquid substance) and a rinsing liquid LQ5. A sponge 220 is placed on the bottom of the sponge-type cleaning tank 210.

[0099] The sponge 220 has an open-cell structure and may be made of natural or synthetic resin, or similar materials, as long as it is capable of holding the cleaning agent LQ2. Examples of sponge 220 include urethane sponge, cellulose sponge, silicone sponge, and rubber sponge. It is also preferable that the sponge 220 be elastic. The shape of the sponge 220 is a rectangular parallelepiped, with ridges extending in the X, Y, and Z directions.

[0100] The model material MD (sample) is placed on the upper surface of the sponge 220. The model material MD (sample) has a rectangular parallelepiped shape, with ridgelines extending in the X, Y, and Z directions. A through-hole MDX extending in the up-down direction is formed in the model material MD. A first opening (lower side) of the through-hole MDX faces directly toward the sponge 220. A second opening (upper side) of the through-hole MDX is open to the outside.

[0101] The liquid level sensors 280 are arranged in the sponge-type cleaning tank 210 at predetermined intervals in the height direction.

[0102] The sample holding structure 230 includes a frame 231 and a mesh member 232 provided in the hollow portion of the frame 231. The frame 231 is arranged horizontally. The mesh member 232 is formed from metal, plastic, or the like. The outer size of the mesh member 232 may be large enough to cover the upper surface of the model material MD. The mesh size of the mesh member 232 may be large enough to allow the cleaning agent LQ2 and the rinsing liquid LQ5 to pass through.

[0103] The moving mechanism 240 comprises a frame body holding member 241 that holds the frame body 231, a vertical arm 242 that is formed to extend in the vertical direction (Z direction) and holds the frame body holding member 241 at its lower part, an arm holding member 243 that is fixed to the sponge-type cleaning tank 210 and holds the upper part of the vertical arm 242 so that the vertical arm 242 can move freely in the vertical direction, and a motor 244 that drives the sliding movement of the vertical arm 242 relative to the arm holding member 243.

[0104] It is preferable that the frame body holding member 241 detachably holds the frame body 231. With the frame body 231 released from the frame body holding member 241, the model material MD and the sponge 220 are placed in predetermined positions. Thereafter, the frame body 231 is held by the frame body holding member 241, whereby predetermined cleaning can be performed.

[0105] The motor 244 is driven under the control of the control mechanism 290. By driving the motor 244, the vertical arm 242 moves up and down relative to the sponge-type cleaning tank 210. As a result, the frame 231 held by the frame-holding member 241 moves up and down relative to the sponge-type cleaning tank 210. Therefore, the frame 231 can move forward and backward freely relative to the sponge 220.

[0106] The cleaning agent supply mechanism 250 supplies the cleaning agent LQ2 to the sponge-type cleaning tank 210, and includes a cleaning agent tank 251 that stores the cleaning agent LQ2, a cleaning agent temperature sensor 252 that measures the temperature of the cleaning agent LQ2 stored in the cleaning agent tank 251, a cleaning agent temperature regulator 253 that adjusts the temperature of the cleaning agent LQ2 stored in the cleaning agent tank 251, a cleaning agent pipe 254 that supplies the cleaning agent LQ2 from the cleaning agent tank 251 to the sponge-type cleaning tank 210, and a cleaning agent pump 255 and a cleaning agent valve 256 that are provided in the cleaning agent pipe 254.

[0107] The control mechanism 290 measures the temperature of the cleaning agent LQ2 contained in the cleaning agent tank 251 using the cleaning agent temperature sensor 252, and drives the cleaning agent temperature regulator 253 based on the measured temperature. As a result, the cleaning agent temperature regulator 253 adjusts the temperature of the cleaning agent LQ2 to a range lower than the melting point of the model material and equal to or higher than the melting point of the support material.

[0108] Inlet 254A of cleaning agent pipe 254 opens into the liquid of cleaning agent LQ2 contained in cleaning agent tank 251, and outlet 254B of cleaning agent pipe 254 opens facing downward in the upper part of sponge-type cleaning tank 210. Outlet 254B of cleaning agent pipe 254 is preferably located above sponge 220 placed in sponge-type cleaning tank 210.

[0109] The control mechanism 290 detects the liquid level in the sponge-type cleaning tank 210 while reading the measurement value of the liquid level sensor 280. Furthermore, the control mechanism 290 drives the cleaning agent pump 255 and opens the cleaning agent valve 256. As a result, a predetermined amount of cleaning agent LQ2 is sent from the cleaning agent tank 251, and a predetermined amount of cleaning agent LQ2 is supplied from the outlet 254B of the cleaning agent pipe 254 toward the sponge-type cleaning tank 210. The control mechanism 290 then reads the measurement value of the liquid level sensor 280, and when the liquid level reaches a predetermined height, stops driving the cleaning agent pump 255 and closes the cleaning agent valve 256.

[0110] The rinsing liquid supply mechanism 260 supplies the rinsing liquid LQ5 to the sponge-type cleaning tank 210, and includes a rinsing liquid tank 261 that contains the rinsing liquid LQ5, a rinsing liquid temperature sensor 262 that measures the temperature of the rinsing liquid LQ5 contained in the rinsing liquid tank 261, a rinsing liquid temperature regulator 263 that adjusts the temperature of the rinsing liquid LQ5 contained in the rinsing liquid tank 261, a rinsing liquid pipe 264 that supplies the rinsing liquid LQ5 from the rinsing liquid tank 261 to the sponge-type cleaning tank 210, and a rinsing liquid valve 265 provided in the rinsing liquid pipe 264. A pump may be provided in the rinsing liquid pipe 264.

[0111] The control mechanism 290 measures the temperature of the rinsing liquid LQ5 contained in the rinsing liquid tank 261 using the rinsing liquid temperature sensor 262, and drives the rinsing liquid temperature regulator 263 based on the measured temperature. As a result, the rinsing liquid temperature regulator 263 adjusts the temperature of the rinsing liquid LQ5 to a temperature lower than the melting point of the model material and equal to or higher than the melting point of the support material.

[0112] An inlet 264A of the rinsing liquid pipe 264 opens in the rinsing liquid LQ5 contained in the rinsing liquid tank 261, and an outlet 264B of the rinsing liquid pipe 264 opens at the inner wall of the sponge-type cleaning tank 210. The inlet 264A of the rinsing liquid pipe 264 is preferably located higher than the outlet 264B of the rinsing liquid pipe 264. The outlet 264B of the rinsing liquid pipe 264 is preferably located higher than the liquid level of the cleaning agent LQ2.

[0113] The control mechanism 290 detects the liquid level in the sponge-type cleaning tank 210 while reading the measurement value of the liquid level sensor 280. Furthermore, the control mechanism 290 opens the rinsing liquid valve 265. As a result, a predetermined amount of rinsing liquid LQ5 is sent from the rinsing liquid tank 261, and a predetermined amount of rinsing liquid LQ5 is supplied from the outlet 264B of the rinsing liquid piping 264 toward the sponge-type cleaning tank 210. Then, the control mechanism 290 reads the measurement value of the liquid level sensor 280, and closes the rinsing liquid valve 265 when the liquid level reaches a predetermined height.

[0114] The waste liquid storage tank 270 stores wastewater from the sponge-type cleaning tank 210, and is disposed at a lower position than the sponge-type cleaning tank 210. In the sponge-type cleaning tank 210, a discharge port 210E is formed at a position lower than the outlet 264B of the rinsing liquid pipe 264. A discharge pipe 271 extends from the discharge port 210E toward the waste liquid storage tank 270. A discharge valve 273 is provided on the discharge pipe 271.

[0115] Next, how to use the sponge-type cleaning device 200 will be described.

[0116] (Sponge type cleaning process) The control mechanism 290 opens the discharge valve 273 and reads the sensing signal from the liquid level sensor 280. Thereafter, the control mechanism 290 closes the discharge valve 273 when the liquid level reaches a predetermined level (for example, when the liquid level reaches zero). In this way, the sponge-type cleaning tank 210 becomes empty.

[0117] Next, in the sponge-type cleaning tank 210, the frame 231 is released from the frame holding member 241. Next, the model material MD and the sponge 220 are placed in a predetermined position. Thereafter, the frame 231 is held by the frame holding member 241. At this time, the frame 231 and the mesh member 232 are separated from the model material MD.

[0118] Next, the control mechanism 290 supplies the cleaning agent LQ2 from the cleaning agent tank 251 to the sponge-type cleaning tank 210 until the liquid level reaches a predetermined level while reading the sensing signal from the liquid level sensor 280 through driving the cleaning agent pump 255 and controlling the opening and closing of the cleaning agent valve 256. As a result, the cleaning agent LQ2 supplied to the sponge-type cleaning tank 210 is absorbed by the sponge 220. At this time, the upper part of the sponge 220 is exposed above the liquid surface, and the lower part is in the cleaning agent LQ2, so that the cleaning agent LQ2 is present below the sponge 220 (liquid contact retracted state).

[0119] Thereafter, the control mechanism 290 drives the motor 244. As a result, the sample holding structure 230 moves toward and away from the sponge 220. When the sample holding structure 230 moves toward the sponge 220, the model material MD is sandwiched between the mesh member 232 and the sponge 220 (FIG. 10(A)). Furthermore, when the sample holding structure 230 approaches the sponge 220, the model material MD enters a pressed-in state in which it presses the sponge 220 (FIG. 10(B)). When the sponge 220 is pressed by the model material MD, the cleaning agent LQ2 in the sponge 220 is supplied to the upper surface of the sponge 220. In this way, the cleaning agent LQ2 enters the through-hole MDX of the model material MD (liquid contact state).

[0120] Here, in consideration of the ease with which the cleaning agent LQ2 penetrates into the microstructure, the cleaning agent LQ2 that enters the through-holes MDX of the model material MD is preferably in the form of bubbles. The size of the bubbles is preferably smaller than the size of the through-holes MDX.

[0121] After the sample retention structure 230 is pressed in by a predetermined amount, the sample retention structure 230 moves away from the sponge 220. As a result, the sponge 220 tries to return to its original shape due to its elasticity. When the sponge 220 returns to its original shape (pressed-in and retracted state), the top of the sponge 220 is exposed above the liquid surface. At this time, the cleaning agent LQ2 in the sponge-type cleaning tank 210 and the air around the sponge 220 are sucked into the sponge 220, which tries to return to its original shape.

[0122] In this way, repeated forward and backward movement of the sample holding structure 230 relative to the sponge 220 causes the sponge 220 to repeatedly undergo elastic deformation and restoration. The repeated elastic deformation and restoration of the sponge 220 generates foam of the cleaning agent LQ2 and allows the foamed cleaning agent LQ2 to be supplied to the through-hole MDX of the model material MD. Continuing to supply the foamed cleaning agent LQ2 to the through-hole MDX of the model material MD causes the foamed cleaning agent LQ2 that entered from the first opening (lower side) of the through-hole MDX to flow out from the second opening (upper side) of the through-hole MDX. The cleaning agent LQ2 that enters the through-hole MDX contains cleaning components of the support material, which promotes the removal of the target substance that remained in the through-hole MDX.

[0123] It is preferable that the stroke length of the forward and backward movement be adjusted by the volume between the first opening and the second opening of the through-hole MDX, the height of the first opening and the second opening, and the like.

[0124] Furthermore, the relationship between the height (Z direction) of the sponge 220 and the height (Z direction) of the liquid surface of the cleaning agent LQ2 may be within a range in which foamy cleaning agent LQ2 can be generated and supplied, but considering the ease of air intake, it is preferable that the height (Z direction) of the sponge 220 be higher than the height (Z direction) of the liquid surface of the cleaning agent LQ2.

[0125] (Sponge type rinsing process) Thereafter, the control mechanism 290 opens the discharge valve 273 and reads the sensing signal from the liquid level sensor 280. Thereafter, the control mechanism 290 closes the discharge valve 273 when the liquid level reaches a predetermined level (for example, when the liquid level reaches zero). In this way, the sponge-type cleaning tank 210 becomes empty.

[0126] Next, the control mechanism 290 supplies the rinsing liquid LQ5 from the rinsing liquid tank 261 to the sponge-type cleaning tank 210 until the liquid level reaches a predetermined level while reading the sensing signal from the liquid level sensor 280 through the opening and closing control of the rinsing liquid valve 265. As a result, the rinsing liquid LQ5 supplied to the sponge-type cleaning tank 210 is absorbed by the sponge 220. Thereafter, the control mechanism 290 drives the motor 244. As a result, the model material MD moves back and forth relative to the sponge 220. This movement causes a mixture of the remaining cleaning agent LQ2 and the rinsing liquid LQ5 to flow through the through-holes MDX of the model material MD.

[0127] Thereafter, the control mechanism 290 opens the discharge valve 273, and after emptying the sponge type cleaning tank 210, again supplies the rinsing liquid LQ5 from the rinsing liquid tank 261 to the sponge type cleaning tank 210, causing the model material MD to move back and forth relative to the sponge 220. By repeating this process, the sponge type rinsing process 132 can be performed. The behavior of the rinsing liquid LQ5 in the sponge type rinsing process 132 is similar to the behavior of the cleaning agent LQ2 in the sponge type cleaning process 122, and therefore, removal of the removal target substance and cleaning agent LQ2 that have remained in the through-holes MDX is promoted.

[0128] Here, in consideration of the ease with which the rinsing liquid LQ5 penetrates into the microstructure, the rinsing liquid LQ5 that enters the through-holes MDX of the model material MD is preferably in the form of foam.

[0129] In the above embodiment, the shape of the sponge 220 is a rectangular parallelepiped, but the present invention is not limited to this and may be another shape such as a column, a sphere, a cone, etc. Furthermore, it is preferable that the height (Z direction) of the sponge 220 is greater than the heights of the first opening and the second opening of the through hole MDX formed in the model material MD.

[0130] In the above embodiment, the shape of the through hole MDX formed in the model material MD was linear (Figure 10), but the present invention is not limited to this, and the through hole MDX may be formed from the top surface to the bottom surface of the model material MD, such as in a crank shape (Figure 11(A)), and the through hole MDX may be open to both the top and bottom surfaces.

[0131] The two openings of through hole MDX may also be formed on one surface (the bottom surface in the drawing) as in a U-shape (FIG. 11(B)). In this case, the two openings of through hole MDX may be abutted against sponge 220, or one of the two openings of through hole MDX may be abutted against sponge 220 and the other may be open to the outside. Although not shown in the drawings, through hole MDX may also be L-shaped.

[0132] Furthermore, the through-hole MDX does not have to have a constant hole size. For example, as shown in Fig. 11(C), the hole size of the middle portion MDXc of the through-hole MDX may be larger or smaller than that of the end portion MDXe.

[0133] Although the shape of the model material MD is a rectangular parallelepiped, the present invention is not limited to this, and the model material MD may be another shape such as a cylinder, a sphere, a cone, or other shapes.

[0134] In the above embodiment, the model material MD is placed on the sponge 220, but the present invention is not limited to this, and the sponge 220 may be placed on the model material MD within the scope of the present invention.

[0135] In the above embodiment, the model material MD is moved relative to the sponge 220, but the present invention is not limited to this, and the sponge 220 may be moved in the vertical direction relative to the model material MD.

[0136] In the above embodiment, the up-down direction (vertical direction) was used as the relative movement direction between the sponge 220 and the model material MD, but the present invention is not limited to this, and the horizontal direction or diagonal direction may also be used within the scope of the present invention.

[0137] In the above embodiment, a sponge-type cleaning device 200 including a sample holding structure 230 and a moving mechanism 240 was used for the relative movement of the sponge 220 and the model material MD, but the present invention is not limited to this, and the relative movement of the sponge 220 containing the cleaning liquid LQ2 and the model material MD may also be performed manually.

[0138] In the above embodiment, the movement mechanism 240 functions as a sponge deformation structure, but the present invention is not limited to this.

[0139] Next, we will explain a modified example of the sponge-type cleaning device 200. As shown in Figure 12A, the sponge-type cleaning device 600 includes a bag 610 (tank), a detergent LQ2 contained in the bag 610, and a sponge 220 contained in the bag 610.

[0140] The temperature of the cleaning agent LQ2 is adjusted to a predetermined temperature range. The temperature adjustment of the cleaning agent LQ2 may be performed before or after supplying the cleaning agent LQ2 to the closed cleaning container 800.

[0141] Bag 610 is made of a soft material and can be deformed by the application of an external force. In other words, the entire bag 610 is deformable. It is preferable that deformation of bag 610 can also deform sponge 220 contained in bag 610. Bag 610 is preferably made of plastic, and preferably has translucency. Furthermore, it is preferable that bag 610 is thin in thickness to facilitate deformation.

[0142] The cleaning agent LQ2 contained in the bag 610 is entirely held by the sponge 220.

[0143] 12B, the sponge 220 is formed in a rectangular parallelepiped shape, and has a notch 220K formed in the upper surface thereof. A model material MD (specimen) having a supporting material SP attached thereto is inserted into the notch 220K.

[0144] By applying an external force to the bag 610 using a hand, the bag 610 is deformed. This causes the sponge 220 contained in the bag 610 to elastically deform. On the other hand, when the external force is released, the sponge 220 returns to its original shape. In this way, by repeatedly applying and releasing an external force, the sponge 220 repeatedly undergoes elastic deformation and restoration. By repeating the elastic deformation and restoration, the sponge 220 generates foam of the cleaning agent LQ2 and can supply the foamed cleaning agent LQ2 to the through-holes of the model material MD. By continuing to supply the foamed cleaning agent LQ2 to the through-holes of the model material MD, removal of the target substance that has remained in the through-holes is promoted.

[0145] In the above embodiment, rectangular parallelepiped sponge 220 is used, but the present invention is not limited to this. For example, a cylindrical sponge 220 (FIG. 12C) may be used. Then, with a sample contained in hollow portion 220X of cylindrical sponge 220, sponge 220 containing detergent LQ2 may be repeatedly elastically deformed and restored.

[0146] The sponge may be a sheet-like sponge 220 (FIG. 12D). With the sheet-like sponge 220 surrounding the sample, the sponge 220 may be repeatedly elastically deformed and restored.

[0147] Furthermore, the sheet-like sponge 220 may include a sheet-like sponge body 220B, one end 220BA of the sponge body 221 on which a protrusion 220T (first engagement portion) is formed, and the other end 220BB of the sponge body 221 on which a notch 220K (second engagement portion) is formed (FIG. 12E). The protrusion 220T is engageable with and detachable from the notch 220K. When the protrusion 220T is engaged with the notch 220K, the sponge body 220B becomes cylindrical (FIG. 12F). A sample may be placed in the hollow portion 220X.

[0148] It is noted that a portion of the detergent LQ2 contained in the bag 610 may be held in the sponge 220, and the remainder may be stored in the bag 610 (FIG. 12G).

[0149] In the above embodiment, an example of the sponge-type cleaning step 122 has been described, but the rinsing liquid LQ5 can also be used in the sponge-type rinsing step 132. That is, the behavior of the rinsing liquid LQ5 in the sponge-type rinsing step 132 is similar to the behavior of the cleaning agent LQ2 in the sponge-type cleaning step 122, and therefore the removal of the target substances to be removed and the cleaning agent LQ2 that have remained in the through-holes is promoted.

[0150] In the above embodiment, the entire bag 610 is deformable, but the present invention is not limited to this, and the deformable part may be a part of the bag 610, or a deformable part may be provided in a part of the above-mentioned sponge-type cleaning tank 210, and the sponge 200 contained in the sponge-type cleaning tank 210 may be deformed by changing the deformable part.

[0151] In the cleaning method 100 for a sample having a microstructure (FIG. 7), the sponge cleaning step 222 may be replaced by a water wheel cleaning step using a water wheel cleaning device 300. Also, the sponge rinsing step 223 may be replaced by a water wheel rinsing step using a water wheel cleaning device 300.

[0152] Next, the water wheel type cleaning device 300 will be described.

[0153] As shown in FIGS. 13A and 13B, the washing machine includes a water wheel type washing tank unit 310, a water wheel type rinsing tank unit 320, and a lid unit 330.

[0154] The water wheel type cleaning tank unit 310 includes a water wheel type cleaning tank 312 that contains the cleaning agent LQ2, and a cleaning agent temperature regulator 314 that regulates the temperature of the cleaning agent LQ2 contained in the water wheel type cleaning tank 312.

[0155] The water wheel type rinsing tank unit 320 includes a water wheel type rinsing tank 322 that contains the rinsing liquid LQ5, and a cleaning agent temperature regulator 324 that adjusts the temperature of the cleaning agent LQ2 contained in the water wheel type cleaning tank 312.

[0156] The lid unit 330 comprises a lid 332, a water wheel arm 333 extending downward from the underside of the lid 332, a horizontal shaft 334 rotatably mounted at the tip of the water wheel arm 333, a water wheel 336 axially attached to the horizontal shaft 334, chuck members 337 mounted at predetermined intervals on the periphery of the water wheel 336, a motor 338 that rotates or pivots the horizontal shaft 334 around its axis, and a control mechanism 339 that controls each part.

[0157] The lid 332 closes the opening of the water wheel type washing tank 312 and the water wheel type rinsing tank 322, and is detachable from the opening of the water wheel type washing tank 312 and the water wheel type rinsing tank 322.

[0158] The water wheel type rinsing tub 322 has a structure similar to that of the water wheel type cleaning tub 312, and therefore the following detailed description of the lid unit 330 will be given using the water wheel type cleaning tub 312.

[0159] When the lid 332 is attached to the opening of the water wheel type cleaning tank 312, the water wheel arm 333 extends toward the water wheel type cleaning tank 312, and the horizontal shaft 334 faces horizontally.

[0160] The chuck member 337 is capable of holding and releasing the model material MD.

[0161] When the control mechanism 339 drives the motor 338, the water wheel 336 rotates or turns in forward and reverse directions around the horizontal shaft 334. The movement trajectory of the model material MD held by the chuck member 337 is circular or arc-shaped around the horizontal shaft 334. The liquid surface of the cleaning agent LQ2 contained in the water wheel type cleaning device 300 intersects with the movement trajectory of the model material MD. That is, by driving the motor 338, the model material MD can be freely switched between an immersed state in the cleaning agent LQ2 and a retracted state in which it has retracted from the immersed state. Note that when the model material MD approaches the liquid surface, it is preferable that the opening of the through hole MDX approaches the liquid surface.

[0162] (Water wheel type washing and rinsing process) When the lid 332 is attached to the waterwheel-type cleaning tank 312 containing the cleaning agent LQ2, the lower part of the waterwheel 336 is immersed in the cleaning agent LQ2, and the upper part is above the liquid surface of the cleaning agent LQ2. When the motor 338 is driven under the control of the control mechanism 339, the waterwheel 336 rotates or turns in the forward and reverse directions (FIG. 14). As a result, the model material MD held by the chuck member 337 can be freely switched between an immersed state in the cleaning agent LQ2 and a retracted state in which it is retracted from the immersed state. When the model material MD enters the liquid surface of the cleaning agent LQ2, air present near the liquid surface of the cleaning agent LQ2 mixes with the liquid, generating bubbles near the liquid surface of the cleaning agent LQ2. The foamy cleaning agent LQ2 enters the lower hole of the through-hole MDX provided in the model material MD (FIGS. 14(A) to 14(B)). Thereafter, the model material MD moves through the cleaning agent LQ2 (FIG. 14(C)), and then exits the cleaning agent LQ2 (FIG. 14(D)). At this time, the cleaning agent LQ2 that entered the through-hole MDX flows out from the hole below. In this way, cleaning of the through-hole MDX is performed.

[0163] (Water wheel type rinsing process) When the lid 332 is attached to the waterwheel-type rinsing tank 322 containing the rinsing liquid LQ5, the lower portion of the waterwheel 336 is immersed in the rinsing liquid LQ5, and the upper portion is above the surface of the rinsing liquid LQ5. When the motor 338 is driven under the control of the control mechanism 339, the waterwheel 336 rotates or turns in the forward and reverse directions. As a result, the model material MD held by the chuck member 337 can be freely switched between an immersed state in the rinsing liquid LQ5 and a retracted state in which it is retracted from the immersed state. When the model material MD enters the surface of the rinsing liquid LQ5, air present near the surface of the rinsing liquid LQ5 mixes with the liquid, generating bubbles near the surface of the rinsing liquid LQ5. The foamed rinsing liquid LQ5 enters the lower hole of the through-hole MDX provided in the model material MD. Thereafter, the model material MD moves through the rinsing liquid LQ5 (FIG. 14(C)), and then comes out of the rinsing liquid LQ5. At this time, the rinsing liquid LQ5 that entered the through-hole MDX flows out from the hole below. In this way, rinsing in the through-hole MDX is performed.

[0164] In the water wheel type washing and rinsing process and the water wheel type washing and rinsing process of the above embodiment, the lid 332 is provided on the water wheel type rinsing tank 322 or the water wheel type washing tank 312. However, the present invention is not limited to this and can be used for an ultrasonic cleaner 410 with a built-in heater, as shown in FIG. 15 . In this case, instead of the water wheel type rinsing tank 322 or the water wheel type washing tank 312, the lid 332 may be attached to an outer cylinder 420 arranged to surround the ultrasonic cleaner 410. When the lid 332 is attached, the lower portion of the water wheel 336 is immersed in the cleaning agent LQ2 or the rinsing liquid LQ5 in the ultrasonic cleaner 410, and the upper portion is above the liquid surface. In this state, the motor 338 is driven under the control of the control mechanism 339, thereby performing the water wheel type washing and rinsing process.

[0165] In the above embodiment, the sample's movement trajectory is circular or arc-shaped around the horizontal axis 334, but it may be linear as long as it can be switched between being in the liquid and being out of the liquid, that is, as long as part of the movement trajectory is inside the liquid substance and the rest is outside the liquid substance. For example, within the spirit of the present invention, the sample may reciprocate in the vertical direction (Z direction) or in an oblique direction.

[0166] In the cleaning method 100 (FIG. 7) for the model material MD having a microstructure, a sealed cleaning step using a sealed cleaning vessel 800 may be performed instead of the water wheel type cleaning step using the water wheel type cleaning apparatus 300. Also, a sealed rinsing step using the sealed cleaning vessel 800 may be performed instead of the water wheel type rinsing step using the water wheel type cleaning apparatus 300.

[0167] As shown in Figures 16 and 17, the sealed cleaning container 800 includes a lower tank 811 that contains cleaning agent LQ2, an upper tank 812 that is disposed above the lower tank 811, and filters 815 and 816 for holding a model material MD (specimen) having a supporting material attached thereto.

[0168] The lower tank 811 and the upper tank 812 are cylindrical bodies with bottoms. The upper tank 812 is located above the lower tank 811. The opening of the lower tank 811 faces upward, and the opening of the upper tank 812 faces downward. The openings of the lower tank 811 and the upper tank 812 have the same shape and dimensions, so an airtight container is formed by arranging the openings of the lower tank 811 and the upper tank 812 directly opposite each other.

[0169] The filter 815 is provided in the storage space of the lower tank 811. The filter 815 divides the storage space of the lower tank 811 and the upper tank 812 into two storage spaces. The storage space below the filter 815 is defined as the first storage space K1, and the storage space above the filter 815 is defined as the second storage space K2. The filter 816 is provided in the second storage space K2. The filters 815 and 816 are each formed in a sheet shape, and their mesh size is smaller than that of the model material MD. Therefore, the filters 815 and 816 allow the cleaner LQ2 to pass through while restricting the passage of the model material MD. When the opening of the lower tank 811 and the opening of the upper tank 812 are placed directly opposite each other, the filters 815 and 816 face each other at a predetermined distance.

[0170] The filter 815 is held by a lower tank holding member 817 provided in the lower tank 811. The lower tank holding member 817 is provided with a rail groove extending in the Z direction. The rail groove allows the filter 815 to move freely in the Z direction. Furthermore, a coil spring (filter biasing member) is provided in the rail groove. In this case, the filter 815 is biased upward in the Z direction. Similarly, the filter 816 is held by an upper tank holding member 818 provided in the upper tank 812. The upper tank holding member 818 is provided with a rail groove extending in the Z direction. The rail groove allows the filter 816 to move freely in the Z direction. Furthermore, a coil spring (filter biasing member) is provided in the rail groove. Therefore, the filter 816 is biased downward in the Z direction. Note that if a coil spring is not provided in the rail groove, a fixing device for positioning the filter may be provided.

[0171] The temperature of the cleaning agent LQ2 is adjusted to a predetermined temperature range. The temperature adjustment of the cleaning agent LQ2 may be performed before or after supplying the cleaning agent LQ2 to the closed cleaning container 800.

[0172] When the sealed cleaning container 800 is held by hand and shaken up and down, the cleaning agent LQ2 moves back and forth between the lower tank 811 and the upper tank 812 via the filters 815 and 816. The model material MD collides with the reciprocating cleaning agent LQ2. When the model material MD enters the liquid surface of the cleaning agent LQ2, air near the cleaning agent LQ2 mixes with the liquid, resulting in the cleaning agent LQ2 becoming liquid and containing bubbles. Furthermore, if the filter has fine mesh, bubbles are also generated when the cleaning agent LQ2 passes through the filter. The foamed cleaning agent LQ2 is then supplied to the through-holes provided in the model material MD, where cleaning is performed at the through-holes.

[0173] Either one of the filters 815 and 816 may be a plate-like member instead of a filter.

[0174] 18A and 18B, a sealed cleaning container 820 includes a cylindrical container 821 with a bottom, a lid 822 for opening and closing an opening 821X formed in the cylindrical container 821, a filter 815 provided in the cylindrical container 821, a lower tank holding member 817 for fixing the filter 815, a filter 816 for fixing a model material MD (specimen), and a filter fixing member 825 for fixing the filter 816.

[0175] The filter 815 is provided midway through the storage space K of the cylindrical container 821. The filter 815 divides the storage space of the cylindrical container 821 into a storage space K1 below the filter 815 and a storage space K2 above the filter 815. A model material MD (specimen) is stored in the storage space K2. A cleaning agent LQ2 is stored in the cylindrical container 821.

[0176] Filter fixing device 825 includes protruding cylinder 825A that stands up from the inner surface of lid 822, coil spring 825B housed in protruding cylinder 825A, and rod 825C with its base end inserted into the opening of protruding cylinder 825A. With its base end inserted into protruding cylinder 825A, rod 825C is movable in the Z direction. Coil spring 825B biases rod 825C downward (in the direction in which the tip of rod 825C moves away from lid 822).

[0177] When the lid 822 is attached to the opening 821X, the filter 816 comes into contact with the model material MD. Because the filter 816 is biased downward by the coil spring 825B, when the lid 822 is attached to the opening 821X, the filter 816 presses the model material MD against the filter 815. As a result, the model material MD is held by the filter 815 and the filter 816.

[0178] When the sealed cleaning container 820 is held by hand and shaken up and down, the cleaning agent LQ2 moves back and forth between the storage spaces K1 and K2. The model material MD collides with the reciprocating cleaning agent LQ2. When the model material MD enters the liquid surface of the cleaning agent LQ2, air near the cleaning agent LQ2 mixes with the liquid, resulting in the cleaning agent LQ2 becoming liquid and containing bubbles. If the filter has fine mesh, bubbles are also generated when the cleaning agent LQ2 passes through the filter. The foamed cleaning agent LQ2 is then supplied to the through-holes provided in the model material MD, cleaning the through-holes.

[0179] Alternatively, the arrangement may be as shown in FIG. 18C. The model material MD is fixed in a sealed cleaning container 820 by filters 815 and 186. The position where the model material MD is fixed is set at a slightly lower position, so that the model material MD is immersed in the cleaning agent LQ2. In this state, cleaning is performed with the cleaning agent LQ2. Furthermore, the sealed cleaning container 820 is placed in a large tank S that stores water W, and an ultrasonic cleaner US is used to promote cleaning. In this case, the sealed cleaning container 820 is preferably made of a material that transmits ultrasonic waves, such as glass. Next, as shown in FIG. 18D, when the sealed cleaning container 820 is turned upside down and placed in the large tank S, the model material MD rises above the liquid surface of the cleaning agent LQ2. In this way, by switching the sealed cleaning container 820 between the forward orientation (FIG. 18C) and the reverse orientation (FIG. 18D), the cleaning is promoted by the movement of the cleaning agent LQ2 and the resulting generation of bubbles.

[0180] Note that providing a linear movement mechanism 850 in the sealed cleaning container 820 enables automation of the sealed cleaning process. As shown in FIG. 19 , the linear movement mechanism 850 includes a motor 851, a rotating shaft 852 that rotates when driven by the motor 851, a holding mechanism 853 that holds the sealed cleaning container 820, and a cam mechanism 855. The cam mechanism 855 converts the rotational motion of the rotating shaft 852 into reciprocating motion of the holding mechanism 853 in the Z direction. Driven by the motor 831, the sealed cleaning container 820 reciprocates in the Z direction. As a result, the cleaning agent LQ2 reciprocates between the containing spaces K1 and K2 via the filters 815 and 816. The foamed cleaning agent LQ2 is supplied to through-holes formed in the model material MD, thereby cleaning the through-holes.

[0181] Incidentally, by providing a rotational movement mechanism 830 in the sealed cleaning container 820, the sealed cleaning process can be automated. As shown in FIG. 20 , the rotational movement mechanism 830 includes a motor 831 and a rotational shaft 832 that rotates when driven by the motor 831. The rotational shaft 832 extends in the Y direction. When driven by the motor 831, the rotational shaft 832 rotates around the Y axis. As a result, when driven by the motor 831, the sealed cleaning container 820 rotates around the Y axis to such an extent that the cleaning agent LQ2 moves back and forth between the storage spaces K1 and K2. As a result, the foamed cleaning agent LQ2 cleans the through-holes formed in the model material MD. When orbital movement of the sealed cleaning container is required, an arm extending radially from the rotational shaft 832 may be provided, and the sealed cleaning container may be attached to the tip of the arm.

[0182] In the above embodiment, the closed-type cleaning process and the closed-type rinsing process were performed manually using a closed-type cleaning container. However, they may be automated. In this case, it is preferable to use a predetermined moving mechanism. For example, as shown in FIG. 21 , when a closed-type cleaning container 820 is used in a thermostatic bath 880 including an outer bath 881 and a temperature control unit 882 that controls the temperature of the inner space of the outer bath 881, a hole is formed in a wall 881W of the outer bath 881, and a rotating shaft 832 is passed through the hole. The closed-type cleaning container 820 is then housed in the inner space of the outer bath. Then, by connecting the rotating shaft 832 to the closed-type cleaning container 820, the closed-type cleaning container 820 can rotate on its own axis in a predetermined temperature environment.

[0183] The above-described rotational movement mechanism 830 and linear movement mechanism 850 can be applied not only to the sealed cleaning container 800 and the sealed cleaning container 820, but also to the sponge-type cleaning device 200, the water wheel-type cleaning device 300, and the bag 610. Also, when a predetermined process is performed in the thermostatic bath 880, as in the case shown in Fig. 21 , a hole can be formed in the wall 881W of the outer bath 881 and a rotating shaft can be passed through the hole, so that the power of a motor disposed outside the outer bath 881 can be transmitted to the sponge-type cleaning device 200, the water wheel-type cleaning device 300, and the bag 610 via the rotating shaft.

[0184] The cleaning effect is improved by using a liquid containing carbon dioxide (for example, carbonated water) in the cleaning agent LQ2. Similarly, the rinsing effect is improved by using a liquid containing carbon dioxide (for example, carbonated water) or a mixture of a liquid containing carbon dioxide (for example, carbonated water) and another liquid as the rinsing liquid LQ5.

[0185] The object to be cleaned is not limited to the model material MD. The substance to be removed may be a support material SP, a pre-cleaning agent, or any other substance that can be cleaned by the cleaning components contained in the cleaning agent. For example, if the substance to be removed is a general oil stain, a neutral detergent may be used.

[0186] In the sponge-type cleaning device 200 and the waterwheel-type cleaning device 300 described above, a predetermined process is performed on a liquid to generate foam, but the present invention is not limited to this, and foam may be supplied directly to the object to be cleaned (such as model material MD).

[0187] The behavior of the coating liquid LQ3 is also similar to that of the cleaning agent LQ2 in the sponge-type cleaning step 122, and therefore, by using the above-described means, it becomes possible to apply the coating liquid LQ3 to the inner walls of the through-holes.

[0188] In the above embodiment, the present invention is used to remove the support material SP, but is not limited to this. For example, the present invention may be applied to the removal of a buffing material (a mirror-finishing agent for metals and non-ferrous metals) made by mixing chromium oxide into an oily material (paraffin-based wax).

[0189] In the above embodiment, a material used in a fused deposition modeling method, an inkjet method, or the like is used as the model material MD, but the present invention is not limited to this. A workpiece made of metal (e.g., iron or non-ferrous metal) may also be used as the model material MD. The present invention may be used to remove support material adhering to a metal workpiece, or for purposes described below.

[0190] However, since cutting oil remains on metal workpieces after cutting, it is necessary to remove the cutting oil if the workpiece is to be used as is. Removable cutting oils include oil-based cutting oils and water-soluble cutting oils. In addition, metal workpieces such as iron are susceptible to rust, so they must be coated with anti-rust oil during transportation and storage.

[0191] In such a case, a part of the cleaning method 100 may be performed on the metal workpiece. In the preliminary cleaning step 110, the metal workpiece is immersed in the preliminary cleaning agent LQ1. This causes most of the oil-based cutting oil adhering to the metal workpiece to dissolve in the preliminary cleaning agent LQ1. As a result, most of the oil-based cutting oil can be removed from the metal workpiece.

[0192] Next, in the cleaning process 120, the metal workpiece is immersed in the cleaning agent LQ2. This forms a coating layer of the cleaning agent LQ2 on the surface of the metal workpiece. This coating layer functions as an anti-rust layer. After the cleaning process 120, the rinsing process 130 and the coating process 140 do not need to be performed.

[0193] As the preliminary cleaning agent LQ1 for removing the oily cutting oil, the same one as that used for dissolving the support material SP can be used.

[0194] The cleaning agent LQ2 that forms the anti-rust layer is water-soluble overall and contains a solvent and an anti-rust component.

[0195] The solvent is preferably water or alcohol. The concentration of the solvent is not particularly limited as long as it is sufficient to achieve the effects of the invention, but is preferably 5% by weight or more and 100% by weight or less, more preferably 50% by weight or more and 100% by weight or less, and particularly preferably 80% by weight or more and 100% by weight or less.

[0196] The anti-rust component preferably contains an amino group and a hydrophilic group (excluding the amino group). Examples of hydrophilic groups (excluding the amino group) include a hydroxy group, a carboxy group, a carbonyl group, and a sulfo group. Specific examples include ethanolamines (monoethanolamine, diethanolamine, and triethanolamine). The concentration of the cleaning component is not particularly limited as long as it achieves the effects of the invention, but is preferably 10% by weight or more and 40% by weight or less.

[0197] In the above embodiment, the removal of cutting oil from a metal workpiece has been described, but the present invention is not limited to this. The present invention can also be applied to grease other than cutting oil.

[0198] <Example> Experiments A1 to A15 were conducted.

[0199] (Experiment A1) A 3D printer (VisiJet series manufactured by 3D Systems) was used to create a three-dimensional object X from model material MD and support material SP. Of the three-dimensional object X, the model material MD was a rectangular parallelepiped (length: 50 mm, width: 30 mm, height: 30 mm). The rectangular parallelepiped model material MD had five linear through-holes (diameter φ: 1.0 mm, length: 30 mm) penetrating from the top to the bottom. The support material SP was attached to each surface of the model material MD with a uniform thickness (approximately 10 to 15 mm) and filled all of the through-holes.

[0200] VisiJet Crystal EX200 Plastic Material (3D Systems Japan, Inc.) was used as the model material MD. Model material MD components: Urethane acrylate oligomer 20-40% by weight Ethoxylated Bisphenol A Diacrylate (CAS No. 64401-02-01) 15 ~35% by weight Tripropylene glycol acrylate (CAS number 42978-66-5) 1.5 to 3% by weight

[0201] VisiJet200 (3D Systems Japan, Inc.) was used as the support material SP. Support material SP component: Hydroxylated wax (CAS number 112-95-5) Support material SP melting point: 55-65℃ Support material SP density: 0.85 to 0.91 (g / cm 3 )

[0202] The three-dimensional object X was subjected to the cleaning method 100.

[0203] The ingredients of the pre-cleaning agent used were as follows: Fatty acid ester 70% by weight Solid paraffin (CAS number 8002-74-2) 30% by weight

[0204] The components of the cleaning agent used are as follows: Water 70% by weight Triethanolamine (CAS number 102-71-6) 20% by weight Polyoxyalkylene alkyl ether 10% by weight

[0205] (Pre-cleaning process) A preliminary cleaning process was carried out in the sealed unit 60 shown in FIG. 5. The temperature T1 of the preliminary cleaning agent was maintained at 70°C. The three-dimensional model X was submerged in the preliminary cleaning agent LQ1 (250 cc), the release valve 64 was closed, and the opening of the accommodation space 61KX was blocked with the lid 62. The accommodation space 61KX was depressurized using the pump 70. The amount of pressure reduction ΔP1 from atmospheric pressure was 0.08 MPa. The preliminary cleaning process was carried out under these conditions. The time S1 during which the preliminary cleaning process was carried out was 9 minutes.

[0206] (Cleaning process) Next, a cleaning process was performed in the sealed unit 60. The temperature T2A of the cleaning agent was maintained at 65°C. The three-dimensional model X was submerged in the cleaning agent LQ2 (250 cc), the release valve 64 was closed, and the opening of the accommodation space 61KX was blocked with the lid 62. The pump 70 was used to reduce the pressure in the accommodation space 61KX. The decompression operation was stopped when the cleaning agent LQ2 started to boil. The amount of pressure reduction ΔP2 from atmospheric pressure when boiling started was 0.07 MPa. As described above, the cleaning process was performed using the boiled cleaning agent LQ2. The time S2A for this cleaning process was 2 minutes.

[0207] Next, a cleaning step was performed in the cleaning device 2 shown in FIG. 2. The temperature T2B of the cleaning agent was maintained at 65°C. The three-dimensional object X was submerged in the cleaning agent LQ2 (250 cc), and ultrasonic waves were applied to the cleaning agent LQ2 by the ultrasonic unit 40. The frequency f2 of the applied ultrasonic waves was 40 KHz. The time S2B during which this cleaning step was performed was 2 minutes.

[0208] (rinsing process) Next, a beaker was placed in the outer container 21 of the cleaning device 2. 250 cc of water was poured into the beaker. The water temperature T3 was maintained at 65°C. The three-dimensional object X was submerged in hot water, and ultrasonic waves were applied to the water by the ultrasonic unit 40. The frequency f3 of the applied ultrasonic waves was 40 KHz. The time S3 for this rinsing step was 3 minutes.

[0209] (Experiments A2-15) In Experiments A2, A6-7, and A11-12, the support material cleaning method was performed on three-dimensional object X in the same manner as in Experiment A1, except for the conditions described in Table 1. In the table, "straight" in terms of hole shape refers to that shown in Figure 10, "crank" refers to that shown in Figure 11(A), and "U-shaped" refers to that shown in Figure 11(B). [Table 1]

[0210] In experiment A3, instead of the cleaning step using the cleaning device 2 shown in FIG. 2, a sponge-type cleaning step using the sponge-type cleaning device 200 shown in FIG. 8 was performed. The temperature T2C of the cleaning agent was maintained at 65°C. The time S2C during which this cleaning step was performed was 1 minute. Then, instead of the rinsing step in experiment A1, a sponge-type rinsing step using the sponge-type cleaning device 200 shown in FIG. 8 was performed. The temperature T3B of the rinsing liquid was maintained at 65°C. The time S3B during which this cleaning step was performed was 3 minutes.

[0211] In Experiments A4, A8 to A9, and A13 to A14, a sponge-type cleaning process was performed using the sponge-type cleaning device 200 shown in Fig. 8 instead of the cleaning process using the cleaning device 2 shown in Fig. 2. Then, instead of the rinsing process in Experiment A1, a sponge-type rinsing process was performed using the sponge-type cleaning device 200 shown in Fig. 8. Except for the conditions listed in Table 1, the sponge-type cleaning process and the sponge-type cleaning process were performed under the same conditions as Experiment A3.

[0212] In experiment A5, instead of the cleaning process using the cleaning device 2 shown in FIG. 2, a water wheel type cleaning process was performed using the water wheel type cleaning device 300 shown in FIG. 13A. The temperature T2D of the cleaning agent was maintained at 65°C. The time S2D during which this cleaning process was performed was 1 minute. Then, instead of the rinsing process in experiment A1, a water wheel type rinsing process was performed using the water wheel type cleaning device 300 shown in FIG. 13A. The temperature T3C of the rinsing liquid was maintained at 65°C. The time S3C during which this cleaning process was performed was 3 minutes.

[0213] In Experiments A10 and A15, a water wheel type cleaning process was performed using the water wheel type cleaning device 300 shown in Fig. 13A instead of the cleaning process using the cleaning device 2 shown in Fig. 2. Then, instead of the rinsing process in Experiment A1, a water wheel type rinsing process was performed using the water wheel type cleaning device 300 shown in Fig. 13A. Except for the conditions listed in Table 1, the water wheel type cleaning process and the water wheel type rinsing process were performed under the same conditions as Experiment A5.

[0214] After the experiments A1 to A15, the three-dimensional object X (model material) was evaluated according to the criteria described below. The evaluation results are shown in Table 1.

[0215] 1. Cleaning degree evaluation (surface) The surface (excluding the through-holes) of the three-dimensional object X (model material) after Experiments A1 to A15 was evaluated. The evaluation criteria are as follows: 1: Visual inspection revealed that most of the support material remained. 2: Visual inspection revealed that a small amount of support material remained. 3: Visual inspection revealed that no support material remained.

[0216] 2. Cleaning degree evaluation (holes) After experiments A1 to A15, the through-holes in the three-dimensional object X (model material) were evaluated. The evaluation criteria are as follows: 1: Visual inspection revealed that most of the support material remained. 2: Visual inspection revealed that a small amount of support material remained. 3: Visual inspection revealed that no support material remained.

[0217] (Experiment B1) The model material MD after experiment A3 was performed using water was set in the sponge-type cleaning device 200 shown in Fig. 8. Water was poured up to half the height of the sponge 220, and the model material MD was used to repeatedly elastically deform and restore the sponge 220 for one minute, but no water entered the through-holes of the model material MD.

[0218] (Experiment B2) Using water containing a neutral detergent (concentration: 2% by weight), elastic deformation and restoration of the sponge 220 was repeated for 1 minute using the model material MD in the same manner as in experiment B2. Foamy liquid overflowed from the through-holes (upper side) of the model material MD.

[0219] The present invention is not limited to the above-described embodiment, and it goes without saying that various modifications can be made without departing from the spirit of the present invention. [Explanation of symbols]

[0220] 2. Cleaning equipment 100 Cleaning method for polymer compounds 110 Pre-cleaning process 120 Cleaning process 130 Rinsing process 200 Sponge-type cleaning device 210 Sponge-type cleaning tank 210E Outlet 220 Sponge 221 Decompression type cleaning process 222 Sponge type cleaning process 223 Sponge type rinsing process 230 Sample holding structure 240 Moving mechanism 250 Detergent supply mechanism 260 Liquid supply mechanism 270 Waste liquid storage tank 280 Liquid level sensor 290 Control Mechanism 300 Water wheel type cleaning device 310 Waterwheel type cleaning tank unit 320 Waterwheel type rinsing tank unit 330 Lid Unit 410 Ultrasonic Cleaner 420 outer cylinder

Claims

1. A supply device that supplies a liquid substance to an opening formed in a sample, a gas-liquid supply mechanism that supplies a liquid substance containing bubbles to the opening; the gas / liquid supply mechanism is repeatedly switchable between a liquid contact state in which the sample is in contact with the liquid substance and a liquid contact / retract state in which the sample is retracted from the liquid contact state, The gas / liquid supply mechanism includes: an elastic sponge; a tank containing the sponge; a sponge deformation structure that deforms the sponge, The sponge has an open-cell structure, In the liquid contact retracted state, the sponge in the tank is partially exposed above the liquid surface and contains the liquid substance; the sponge deformation structure is capable of deforming the sponge so that the abutting portion of the opening of the sample is recessed while the opening is in contact with the sponge, and of retracting the opening of the sample from the sponge so that the deformation is released; The supply device is characterized in that the sponge is brought into the liquid-contact state by deformation thereof, and is brought into the liquid-contact retracted state by release of the deformation thereof.

2. The sponge has a notch formed therein, 2. The supplying device according to claim 1, wherein the notch is capable of containing the sample.

3. 2. The supplying device according to claim 1, wherein the sponge is formed into a cylindrical body and is arranged so as to surround the sample.

4. 2. The supplying device according to claim 1, wherein the sponge is in the form of a sheet and is arranged so as to surround the sample.

5. The sponge has a sheet-like sponge body, The sponge body is A first engagement portion; a second engaging portion formed at a position spaced apart from the first engaging portion, the first engagement portion is engageable with and disengageable from the second engagement portion, 2. The supplying device according to claim 1, wherein the sponge body is arranged to surround the sample when the first engaging portion is engaged with the second engaging portion.

6. The sponge deformation structure is such that the entire tank is deformable, or a part of the tank is deformable, 6. The supply device according to claim 1, wherein the sponge is disposed in the tank so as to be deformable together with the deformation of the deformable portion.

7. the sponge deformation structure includes a movement mechanism that allows the sample to be moved back and forth relative to the sponge; the moving mechanism allows the sponge to be switched between a pressed state in which the sponge is pressed by the sample and a pressed-out state in which the sponge is retracted from the pressed state, 6. The supply device according to claim 1, wherein the liquid contact state is achieved when the supply device is in the pushed-in state, and the liquid contact retracted state is achieved when the supply device is in the pushed-in retracted state.

8. The moving mechanism Axle and a drive unit that rotates the shaft; 8. The supply device according to claim 7, further comprising a cam mechanism for converting the rotational movement of said shaft into a linear movement of said sample.

9. A supply method for supplying a liquid substance to an opening formed in a sample, comprising: a foam generating step of generating foam from the liquid substance; a liquid contact switching step of alternately and repeatedly switching between a liquid contact state in which the sample is in contact with the liquid substance and a liquid contact retraction state in which the sample is retracted from the liquid contact state, an elastic sponge; a tank containing the sponge; The sponge has an open-cell structure, In the liquid contact retracted state, the sponge in the tank is partially exposed above the liquid surface and contains the liquid substance; In the liquid contact switching step, a deformation step of deforming the sponge so that the contact portion is recessed while the opening of the sample remains in contact with the sponge, so as to transition from the liquid-contact retracted state to the liquid-contacted state, and a deformation release step of releasing the deformation so as to transition from the liquid-contacted state to the liquid-contact retracted state, are alternately repeated; The method of claim 1, wherein the deformation release step and the foam generation step are performed simultaneously.

10. In the liquid contact switching step, The deformation of the tank switches the sample from the liquid-contact retracted state to the liquid-contacted state, 10. The supply method according to claim 9, wherein the sample is switched from the liquid-contacting state to the liquid-contacting withdrawn state by releasing the deformation of the tank.

11. a moving mechanism that can move the sample toward and away from the sponge; In the liquid contact switching step, The moving mechanism alternately switches the sponge between a pressed state in which the sponge is pressed into the opening formed in the sample and a pressed-out state in which the sponge is retracted from the pressed state, 10. The supply method according to claim 9, wherein the liquid contact state is achieved when the pushing state is in the pushed-in state, and the liquid contact retraction state is achieved when the pushing-retraction state is in the pushed-in retraction state.

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