Method and system for treating an object with plasma

Abstract

To provide a processing method of an objet by a plasma, and a system for executing the method.SOLUTION: The present disclosure provides a processing method of an object by a plasma. The method contains the steps of: supplying a gas into a discharge part of a plasma generation device; generating the plasma from the gas in the discharge part; irradiating inside of the discharge part with an electromagnetic wave; and exposing the object arranged in the discharge part to the plasma and the electromagnetic wave by the irradiation. The generation of the plasma from the gas in the discharge part generates the plasma from the gas in the discharge part under an atmospheric pressure.SELECTED DRAWING: Figure 4A

Description

[Technical Field]

[0001] The present disclosure relates to a method and system for treating an object with a plasma. [Background technology]

[0002] It is known to use plasma to treat objects. Summary of the Invention [Problem to be solved by the invention]

[0003] There is a need for new methods and systems that utilize plasma to perform any process on an object, such as sterilization or surface treatment. [Means for solving the problem]

[0004] As a result of extensive research, the present inventors have developed a novel method and system for efficiently treating an object by combining plasma and electromagnetic waves. In one aspect, the method disclosed herein includes supplying a gas into a discharge unit of a plasma generating device, generating plasma from the gas in the discharge unit, and irradiating electromagnetic waves into the discharge unit, thereby exposing an object placed in the discharge unit to the plasma and the electromagnetic waves.

[0005] Thus, the present disclosure provides: (Item 1) 1. A method for treating an object with plasma, the method comprising: supplying a gas into a discharge portion of a plasma generating device; generating plasma from the gas in the discharge unit and irradiating electromagnetic waves into the discharge unit, thereby exposing an object placed in the discharge unit to the plasma and the electromagnetic waves; A method comprising: (Item 2) The method according to any one of the preceding items, wherein generating the plasma from the gas in the discharge unit comprises generating the plasma from the gas in the discharge unit under atmospheric pressure. (Item 3) The method according to any one of the preceding items, wherein generating the plasma from the gas in the discharge unit generates the plasma from the gas by dielectric barrier discharge in the discharge unit. (Item 4) The plasma generator includes: a first planar electrode and a second planar electrode facing each other; at least one dielectric member disposed between the first electrode and the second electrode; an inlet through which the gas can be supplied and an outlet through which the gas can be discharged, 2. The method according to claim 1, wherein the discharge portion is a space formed between the first electrode and the second electrode and between the inlet and the outlet. (Item 5) 2. The method according to claim 1, wherein the first electrode has a portion that allows the electromagnetic wave to pass through. (Item 6) The method according to any of the preceding items, wherein the portion of the first electrode that allows the electromagnetic wave to pass through is a conductive portion, and the conductive portion has a transparency of at least about 10% for the electromagnetic wave. (Item 7) 10. The method according to claim 1, wherein the first electrode includes a plurality of portions that allow the electromagnetic waves to pass through, and the plurality of portions that allow the electromagnetic waves to pass through are uniformly arranged within the first electrode. (Item 8) The method according to any one of the preceding items, characterized in that the irradiating of the electromagnetic waves is performed by irradiating the electromagnetic waves to the object to be treated through a portion of the first electrode that allows the electromagnetic waves to pass through. (Item 9) the second electrode has a portion that allows the electromagnetic wave to pass through; The irradiation of electromagnetic waves includes: irradiating the electromagnetic wave onto the object to be processed through a portion of the first electrode that allows the electromagnetic wave to pass through; irradiating the electromagnetic wave onto the object to be processed through a portion of the second electrode through which the electromagnetic wave passes; The method according to any one of the preceding items, comprising: (Item 10) The irradiation of electromagnetic waves includes: Irradiating the object to be treated with electromagnetic waves having a first wavelength through a portion of the first electrode that allows the electromagnetic waves to pass through; irradiating the object to be treated with electromagnetic waves having a second wavelength through a portion of the second electrode that allows the electromagnetic waves to pass therethrough; The method according to any one of the preceding items, comprising: (Item 11) The method according to any one of the preceding items, wherein generating the plasma from the gas in the discharge unit is performed by supplying a frequency voltage of about 50 Hz to about 500 kHz between the first electrode and the second electrode. (Item 12) The method according to any of the preceding items, wherein the distance between the first electrode and the second electrode is about 0.1 mm to about 20 mm. (Item 13) 10. The method of claim 1, wherein at least the first electrode is configured to transmit visible light. (Item 14) Item 10. The method according to any one of the preceding items, wherein the electromagnetic wave is a laser. (Item 15) 2. The method according to any of the preceding items, wherein the plasma comprises ozone. (Item 16) The method according to any one of the preceding items, wherein the electromagnetic wave is ultraviolet light. (Item 17) The method according to any one of the preceding items, wherein the ultraviolet light has a wavelength of about 260 to about 300 nm. (Item 18) The method according to any one of the preceding items, which is a method for sterilizing, surface treating, or gas decomposition treating the object. (Item 19) 2. The method according to any one of the preceding items, wherein the electromagnetic waves are infrared rays. (Item 20) 2. The method according to any one of the preceding items, which is a surface treatment method for adhesion of the object. (Item 21) 1. A plasma processing system, comprising: a plasma generating unit that generates plasma; a gas supply unit that supplies gas to the plasma generating unit; an electromagnetic wave generating unit that generates electromagnetic waves; an electromagnetic wave irradiation unit that irradiates the plasma generation unit with the electromagnetic waves; A system comprising: (Item 22) The plasma generating unit is a first planar electrode and a second planar electrode facing each other; at least one dielectric member disposed between the first electrode and the second electrode; an inlet through which the gas can be supplied and an outlet through which the gas can be discharged, a discharge section is formed between the first electrode and the second electrode and between the inlet and the outlet, and the plasma is generated in the discharge section; The system described in the preceding item, wherein at least the first electrode has a portion that allows the electromagnetic waves to pass through. (Item 23) The system described in any of the above items, characterized in that the electromagnetic wave irradiation unit is arranged to irradiate the electromagnetic waves to the plasma generation unit through a portion of the first electrode that allows the electromagnetic waves to pass through. (Item 24) A system according to any one of the above items for carrying out the method according to any one of items 1 to 20. [Effects of the Invention]

[0006] The methods and systems of the present disclosure allow for efficient processing of objects using plasma and electromagnetic waves. [Brief explanation of the drawings]

[0007] [Figure 1] FIG. 1 shows an overview of a processing method using plasma and electromagnetic waves according to the present disclosure. [Figure 2] FIG. 2 shows an example of the configuration of a processing system using plasma and electromagnetic waves according to the present disclosure. [Figure 3] FIG. 3 shows a flowchart of a method for treating an object with plasma according to the present disclosure. [Figure 4A] FIG. 4A shows a perspective view of an exemplary plasma generation device according to the present disclosure. [Figure 4B] FIG. 4B shows a cross-sectional view of an exemplary plasma generation device according to the present disclosure. [Figure 5A] FIG. 5A shows a first modification of an exemplary plasma generation device according to the present disclosure. [Figure 5B] FIG. 5B illustrates a second modification of an exemplary plasma generation device according to the present disclosure. [Figure 6] FIG. 6 is an exemplary flowchart of a method for treating an object with atmospheric pressure plasma using a plasma generating device. [Figure 7] FIG. 7 is an exemplary flowchart of a method for treating an object using atmospheric pressure plasma and ultraviolet light in a plasma generating device. [Figure 8] FIG. 8 is an exemplary flowchart of a method for performing surface treatment for bonding of an object using atmospheric pressure plasma and infrared rays in a plasma generating device. [Figure 9] FIG. 9 is an exemplary flowchart of a method for performing localized treatment of an object using atmospheric pressure plasma and a laser in a plasma generating device. [Figure 10] FIG. 10 is an exemplary flowchart of a method for measuring activated species in plasma using a laser in a plasma generating device. DETAILED DESCRIPTION OF THE INVENTION

[0008] The present disclosure will now be described, illustrating the best mode thereof. Throughout this specification, singular expressions should be understood to include the plural concept unless otherwise specified. Thus, singular articles (e.g., "a," "an," "the," etc. in English) should be understood to include the plural concept unless otherwise specified. Furthermore, terms used in this specification should be understood to have the meaning commonly used in the art unless otherwise specified. Therefore, unless otherwise defined, all technical and scientific terms used in this specification have the same meaning as commonly understood by one of ordinary skill in the art to which this disclosure belongs. In the event of conflict, the present specification (including definitions) will prevail.

[0009] The following provides definitions of terms particularly used in this specification and / or explains basic technical content as appropriate.

[0010] In this specification, "atmospheric pressure" in the context of generating plasma means that the pressure is not increased or decreased significantly, and is not limited to standard atmospheric pressure (1 atm), but is in the range of about 0.5 to about 1.5 atm. "Atmospheric pressure plasma" refers to plasma generated under such atmospheric pressure.

[0011] In this specification, the term "substantially planar" refers not only to a completely planar shape, but also to a shape that can be considered to be roughly planar (a shape that includes partial protrusions, depressions, or holes).

[0012] In this specification, the term "about" refers to a range of ±10% of the following number.

[0013] DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, embodiments of the present invention will be described with reference to the drawings. Note that the same reference numerals are used to refer to the same components throughout the specification.

[0014] (1. Overview of the processing method) FIG. 1 shows an overview of a method for treating a plasma using electromagnetic waves, and a method for treating an object using a plasma and electromagnetic waves.

[0015] The method according to the present disclosure uses plasma and electromagnetic waves. The method is carried out by using plasma generated from a plasma source 1 and electromagnetic waves generated from an electromagnetic wave source 2.

[0016] The plasma processing method according to the present disclosure includes irradiating the plasma with electromagnetic waves of a specific wavelength, which can change the state and / or properties of substances (molecules, atoms, ions, etc.) in the plasma.

[0017] The plasma generation source 1 generates plasma. The environment in which the plasma generation source 1 generates plasma may be atmospheric pressure or a low pressure (e.g., about 1 / 1000 atmosphere) such as a vacuum state. In a preferred embodiment, the plasma of the present invention may be atmospheric pressure plasma generated under atmospheric pressure. Use of atmospheric pressure plasma eliminates the need for processes and devices for reduced or increased pressure, allowing plasma to be generated easily.

[0018] The generated plasma may be high temperature (for example, about 5000°C) or low temperature (for example, about -100°C to about 300°C). In a preferred embodiment, the temperature of the generated plasma may be about 10 to about 90°C. By generating plasma at this temperature, the physical effect on the electrode is reduced, and it may be easier to configure the electrode as an electrode that is transparent to electromagnetic waves, such as a liquid electrode, which will be described later.

[0019] The method for generating plasma using the plasma generation source 1 may be any method known to those skilled in the art, and may include, for example, dielectric barrier discharge, glow discharge, arc discharge, corona discharge, Penning discharge, high-frequency discharge (capacitively coupled discharge, inductively coupled discharge), electron cyclotron resonance, direct current magnetron discharge, surface wave discharge, laser ablation, etc. Dielectric barrier discharge capable of generating low-temperature plasma at atmospheric pressure is preferred.

[0020] The plasma used in the present method can be generated from any gas, including, for example, helium, neon, argon, oxygen, hydrogen, water (water vapor), nitrogen, carbon dioxide, carbon tetrafluoride, carbon tetrachloride, ammonia, air, etc. The gas that generates the plasma can be selected depending on the application of the method.

[0021] The plasma generated in this method may be composed of any material (atoms, molecules, ions, electrons, etc.) depending on the gas that is the source of the plasma.

[0022] The electromagnetic wave generating source 2 generates electromagnetic waves. The electromagnetic wave generating source 2 may be configured to irradiate a specific type of electromagnetic wave (e.g., ultraviolet light, X-rays, infrared light, visible light, etc.), or may be configured to irradiate electromagnetic waves with wavelengths spanning multiple types of electromagnetic waves. The electromagnetic wave generating source 2 may irradiate the electromagnetic waves radially, may be controlled by an optical system, or may irradiate them as a laser (directional light).

[0023] The electromagnetic waves used in the present method can be of any wavelength, including, for example, ultraviolet light, infrared light, visible light, radio waves (microwaves, millimeter waves, long waves, short waves, etc.), and radiation (X-rays, gamma rays, etc.).

[0024] In one embodiment, the electromagnetic waves may be ultraviolet rays. Ultraviolet rays have the property of decomposing or ionizing certain substances. By irradiating plasma with ultraviolet rays, atoms, molecules, ions, etc. in the plasma can be activated by decomposing, exciting, ionizing, etc.

[0025] In another embodiment, the electromagnetic wave may be a laser. The plasma generated by the plasma generation source 1 may contain substances that do not emit light. In order to measure these substances, the plasma can be irradiated with a laser to excite activated species in the plasma and cause them to emit light.

[0026] The method for treating an object with plasma according to the present disclosure may include exposing the object to plasma and irradiating the plasma-exposed object with electromagnetic waves. This can improve the performance of plasma-based sterilization and surface treatments of the object. The method for treating an object using a combination of plasma and electromagnetic waves according to the present disclosure can treat a wider area of the object than treatment using electromagnetic waves alone, for example, by allowing the plasma to contact areas of the object that are difficult to reach when irradiated with electromagnetic waves. Furthermore, because treatment using electromagnetic waves is more powerful than plasma and can perform treatments on the object different from those performed with plasma, the method for treating an object using a combination of plasma and electromagnetic waves according to the present disclosure can treat the object more effectively than treatment using plasma alone.

[0027] Treatment of an object according to the present invention refers to any treatment that alters the state of an object, and specific examples include, but are not limited to, sterilization and virus inactivation of an object or air, modification of the surface of an object (for example, improving adhesion), surface coating, decomposition of gases such as exhaust gases, generation of new gas molecules, and generation of new particles.

[0028] The objects to be treated by the present invention may include, for example, fluororesin, rubber, acrylic, polyethylene, polypropylene, polycarbonate, biomaterials, paper, metal, semiconductor, and gas.

[0029] In one embodiment, the electromagnetic wave may be ultraviolet light. When plasma is irradiated with ultraviolet light, substances in the plasma absorb the light energy and are thereby excited, ionized, and dissociated. These substances become, for example, chemically reactive or mobile. Through this mechanism, ultraviolet light can activate substances in the plasma and improve the sterilizing ability of the plasma. Therefore, by exposing an object to plasma and irradiating the object exposed to the plasma with ultraviolet light, the object can be efficiently sterilized by both the ultraviolet light and the plasma, whose sterilizing ability has been improved by the ultraviolet light irradiation.

[0030] In one embodiment, the electromagnetic waves may be infrared radiation. The object can be heated by irradiating the object with infrared radiation. Plasma is used, for example, for surface treatment to improve the adhesiveness of the object. The inventors have discovered that preheating the object can further improve the adhesiveness of the object with plasma. Therefore, by exposing the object to plasma and irradiating the plasma-exposed object with infrared radiation, the object can be heated and treated with plasma simultaneously, thereby enhancing the effectiveness of the treatment and efficiently improving adhesiveness.

[0031] In one embodiment, the electromagnetic wave may be a laser. A laser can provide energy to excite materials in the plasma. Therefore, by exposing an object to the plasma and irradiating the object with a laser, the plasma can be locally excited and localized processing of the object can be performed.

[0032] (2. Processing System 10) 2 is a block diagram of a processing system 10 using plasma and electromagnetic waves according to the present disclosure. System 10 can be used to implement the plasma processing method and the method for treating an object with plasma described above. System 10 includes a plasma generation unit 100, an electromagnetic wave generation unit 200, an electromagnetic wave irradiation unit 300, a gas supply source 400, and a power supply 500.

[0033] In the system 10, the plasma generation source 1 is embodied as a plasma generation unit 100. The plasma generation unit 100 is configured to generate plasma. The plasma generation unit 100 may be configured to generate plasma by any method known to those skilled in the art, and may include the necessary components for generating plasma by that method (e.g., electrode material, electrode arrangement, distance between electrodes, presence or absence of components other than electrodes, operating temperature, operating voltage, operating frequency, etc.).

[0034] In one embodiment, the plasma generating unit 100 is configured to generate plasma by dielectric barrier discharge and may include at least two electrodes (a first electrode and a second electrode), at least one dielectric member, and a gas inlet and outlet. A discharge unit may be formed between the at least two electrodes, and the plasma generating unit 100 may generate plasma within this discharge unit. With this configuration, the plasma generating unit 100 can stably and continuously generate low-temperature atmospheric pressure plasma. Furthermore, by combining this plasma generating unit 100 with the electromagnetic wave generating unit 200 and electromagnetic wave irradiating unit described below, the efficiency of treatments using low-temperature atmospheric pressure plasma (sterilization treatment, surface treatment, etc.) can be improved.

[0035] In one embodiment, the plasma generating unit 100 is configured to allow electromagnetic waves to pass into the plasma generating unit 100. This allows electromagnetic waves to pass from the outside into the plasma generating unit 100, and the electromagnetic waves can be irradiated onto the plasma and the target object simultaneously with plasma generation. This allows the target object to be exposed to the plasma and electromagnetic waves while reducing plasma loss, thereby improving the efficiency of target object treatment.

[0036] In one example, the first electrode of the plasma generating unit 100 includes a portion that transmits electromagnetic waves, and the electromagnetic waves are irradiated into the plasma generating unit 100 through the portion of the first electrode that transmits electromagnetic waves. By including a portion of the first electrode that transmits electromagnetic waves, it is not necessary to provide a structure for transmitting electromagnetic waves in portions of the plasma generating unit 100 other than the electrode. This increases the proportion of the plasma generating unit 100 occupied by the electrode, allowing plasma to be generated over a wider area. The portion that transmits electromagnetic waves may be formed of a material with high electromagnetic wave transparency different from the conductive portion of the electrode. Alternatively, the portion that transmits electromagnetic waves may be formed by the first electrode having multiple metal wires arranged in a mesh pattern with gaps between them, or may be formed as multiple holes (spaces) penetrating the first electrode, like a punched plate. Preferably, the first electrode includes multiple portions that transmit electromagnetic waves, and the multiple portions that transmit electromagnetic waves are uniformly arranged within the first electrode, so as to generate plasma uniformly within the plasma generating unit 100 and enable electromagnetic waves to be uniformly irradiated from outside into the plasma generating unit 100.

[0037] In another embodiment, the portion that transmits electromagnetic waves is a conductive portion, and the conductive portion is made of a material that is electromagnetically transparent. In this case, the electromagnetic waves can be transmitted through the conductive portion and irradiated into the plasma generation unit 100. This allows the entire first electrode to be formed of a conductive portion, allowing discharge to occur across the entire first electrode and increasing the amount of plasma generated. When the portion that transmits electromagnetic waves is a conductive portion, the conductive portion may have a transmittance of at least about 10%, preferably about 50%, and most preferably about 90% for electromagnetic waves.

[0038] In one embodiment, each of the first electrode and the second electrode of the plasma generating unit 100 includes a portion that allows electromagnetic waves to pass through. This allows electromagnetic waves to be irradiated from two sides of the discharge unit in the plasma generating unit, improving the efficiency and effectiveness of the reaction between the plasma and the electromagnetic waves and the treatment of the target object using that reaction. Preferably, the portion of each electrode that allows electromagnetic waves to pass through is a conductive portion, and the conductive portion of each electrode may have a transparency of at least about 10%.

[0039] In one embodiment, the first electrode and / or the second electrode are configured to transmit visible light in addition to or instead of the irradiated electromagnetic waves, which allows a user of the plasma generating unit 100 to perform processing while visually checking the state of the plasma inside the plasma generating unit 100 (inside the discharge unit) and the placement of the target object, thereby improving the accuracy and efficiency of the processing.

[0040] In one embodiment, the plasma generating unit 100 has two electrodes, and generates plasma by supplying a voltage with a frequency of about 50 Hz to about 10 kHz between the two electrodes, thereby enabling efficient generation of low-temperature atmospheric pressure plasma.

[0041] In one embodiment, the distance between the first electrode and the second electrode of the plasma generating unit 100 is about 2 mm to about 10 mm. By setting the inter-electrode distance within this range, it is possible to ensure that a sufficient amount of plasma is generated while maximizing the space for placing the target object.

[0042] The electromagnetic wave generating unit 200 is configured to generate electromagnetic waves. The electromagnetic wave generating unit 200 may be configured as any device capable of generating electromagnetic waves, such as a lamp, a light-emitting diode, a discharge lamp, a fluorescent lamp, a laser generator, or the like. The electromagnetic waves generated by the electromagnetic wave generating unit 200 may include electromagnetic waves of any wavelength, such as ultraviolet light, infrared light, visible light, radio waves (e.g., millimeter waves, microwaves, long waves, short waves, etc.), and radiation (X-rays, gamma rays, etc.). The electromagnetic waves generated by the electromagnetic wave generating unit 200 may be selected based on the process to be performed using the system 10 and / or the gas used in the plasma generating unit 110, the plasma to be generated, etc.

[0043] The electromagnetic wave irradiation unit 300 is configured to irradiate the electromagnetic waves generated by the electromagnetic wave generation unit 200 to the plasma generation unit 110, where the electromagnetic waves are generated by the plasma generation unit 100. The electromagnetic wave irradiation unit 300 may be configured to irradiate the electromagnetic waves to plasma present inside the plasma generation unit 100 and / or an object, or to irradiate the electromagnetic waves to plasma generated by the plasma generation unit 100 and released outside the plasma generation unit 100 and / or an object located outside the plasma generation unit 110. However, to prevent the plasma from being lost due to mixing with the atmosphere, the electromagnetic wave irradiation unit 300 is preferably configured to irradiate the electromagnetic waves to plasma present inside the plasma generation unit 100 (e.g., within the discharge unit of the plasma generation unit 100). In one example, the electromagnetic wave irradiation unit 300 may be incorporated into the electromagnetic wave generation unit 200. In another example, the electromagnetic wave irradiation unit 300 may also be incorporated into the plasma generation unit 110 as an electromagnetic wave irradiation unit, as described below.

[0044] As described above, when the electrode of the plasma generating unit 100 has a portion that transmits electromagnetic waves, the electromagnetic wave irradiating unit 300 is configured to irradiate the inside of the plasma generating unit 100 with electromagnetic waves through the portion of the electrode that transmits electromagnetic waves. In this case, when the electromagnetic wave irradiating unit 300 is a scanning type, the electromagnetic wave irradiating unit 300 can scan along the electrode and irradiate electromagnetic waves to a desired position (position on the xy plane) in the plasma generating unit 100. Furthermore, when the electromagnetic wave irradiating unit 300 is disposed over the entire electrode and irradiates uniform electromagnetic waves, the electromagnetic wave irradiating unit 300 can perform uniform treatment in the plasma generating unit 100.

[0045] The gas supply source 400 is configured to supply gas to the plasma generation unit 100. The gas supplied from the gas supply source 400 to the plasma generation unit 100 is a gas to be converted into plasma. The gas may be, for example, helium, neon, argon, oxygen, hydrogen, water (water vapor), nitrogen, carbon dioxide, air, or the like. As shown in FIG. 2, the gas supply source 400 may be connected to the plasma generation unit 100. The gas supply source 400 may include one or more gas tanks for storing gas.

[0046] The power supply 500 is configured to supply power to the plasma generating unit 100. The power supply may be a DC power supply, an AC power supply, or a power supply that supplies both DC and AC. However, it is preferable that the power supply be capable of supplying at least AC so that dielectric barrier discharge can be generated in the plasma generating unit 100. The power supply 500 can be connected to the electrodes of the plasma generating unit 100.

[0047] (3. Method for treating objects using plasma) 3 is an exemplary flowchart of a method 300 for treating an object with plasma. The method 300 is performed in a discharge section of a plasma generating section. The method 300 can be performed by the system 10.

[0048] In step 301, a gas is supplied into the discharge section of the plasma generating unit. The gas can be supplied from the gas supply unit 400 into the discharge section of the plasma generating unit 100, for example.

[0049] In step 302, the plasma generating unit generates plasma from the gas in the discharge unit and irradiates electromagnetic waves into the discharge unit, thereby exposing an object placed in the discharge unit to the plasma and electromagnetic waves.

[0050] The plasma generating unit can generate plasma from a gas in the discharge unit by any method. In one example, the plasma generating unit 100 generates plasma from a gas in a discharge unit under atmospheric pressure. In this example, it is not necessary to create a reduced pressure or high pressure state in the discharge unit, thereby reducing the cost of implementing the method. In another example, the plasma generating unit 100 generates plasma from a gas in the discharge unit by dielectric barrier discharge. Dielectric barrier discharge can generate relatively low-temperature plasma (e.g., approximately -100°C to approximately 300°C) under atmospheric pressure. The plasma generating unit 100 generates plasma from a gas in the discharge unit by receiving a voltage from the power supply 500. In one example, the plasma generating unit 100 can generate plasma from a gas in the discharge unit by receiving a voltage with a frequency of approximately 50 Hz to 10 kHz from its electrodes. The frequency of the voltage supplied from the power supply 500 can be determined depending on the plasma generation method.

[0051] The plasma generating unit 100 can generate plasma and irradiate the electromagnetic waves generated by the electromagnetic wave generating unit 200 via the electromagnetic wave irradiating unit 300. In one example, the electromagnetic wave irradiating unit 300 can irradiate the electromagnetic waves from outside the plasma generating unit 100 into the discharge unit of the plasma generating unit 100 via a portion of the electrode of the plasma generating unit 100 that allows electromagnetic waves to pass through.

[0052] By exposing an object to plasma and electromagnetic waves according to method 300, various treatments (eg, surface treatment, sterilization treatment, etc.) can be performed on the object.

[0053] (4. Plasma Generator) Next, an exemplary plasma generation device 110 will be described as one embodiment of the plasma generation section 100 in the system 10. Figure 4A shows a perspective view of the exemplary plasma generation device 110. Figure 4B is a cross-sectional view of the exemplary plasma generation device 110 taken along line AA shown in Figure 4A.

[0054] 4A includes a first electrode 121, a second electrode 122, a first dielectric member 131, a second dielectric member 132, and two spacer members 114. The plasma generator 110 is formed by stacking the first electrode 121, the first dielectric member 131, the two spacer members 114, the second dielectric member 132, and the second electrode 122 from top to bottom in the z direction.

[0055] The first electrode 121 and the second electrode 122 may be disposed opposite each other and may be substantially parallel to each other. Each of the first electrode 121 and the second electrode 122 is planar and has an area. The surface constituting the electrode may have any shape, but may preferably be substantially planar. The distance between the first electrode 121 and the second electrode 122 is a distance sufficient to generate plasma under atmospheric pressure, and may be at least about 0.1 mm to about 20 mm. Each of the first electrode 121 and the second electrode 122 may be made of any material capable of generating a discharge to generate plasma. A voltage is applied to the first electrode 121 and the second electrode 122 from a power source, causing a discharge between them.

[0056] In the plasma generator 110 shown in FIG. 4A, the first electrode 121 is configured to transmit electromagnetic waves. For example, the first electrode 121 may have a transmittance of at least about 10%, preferably about 50% or more, and most preferably about 90% or more for the electromagnetic waves used to treat an object with plasma. This allows the electromagnetic wave irradiation unit 310 to irradiate the electromagnetic waves into the discharge section 113 through the first electrode 121. Furthermore, the first electrode 121 is preferably configured to transmit visible light in addition to the electromagnetic waves used to treat the object. For example, the first electrode 121 may have a transmittance of at least about 10%, preferably about 50% or more, and most preferably about 90% or more for visible light. This allows the operator to irradiate the object with electromagnetic waves to treat it while visually observing the interior of the plasma generator 110 (the discharge section 113) through the first electrode 121.

[0057] The first electrode 121 can be any solid, liquid, or fluid that is electrically conductive and capable of transmitting electromagnetic waves. The first electrode 121 can be, for example, a sodium chloride solution. A first electrode 121 composed of an approximately 20% sodium chloride solution can transmit approximately 80% of electromagnetic waves having wavelengths in the range of approximately 220 nm to approximately 950 nm, including the dielectric member 131, which can be glass. When the first electrode 121 is a liquid, the liquid electrode is surrounded by an insulating frame 121a, defining the area of the electrode. The liquid is then retained within the frame 121a by the upper surface of the first dielectric member 131, which is disposed below the electrode 121. In another example, the frame 121a can be embodied as a planar member having a recess, with the liquid electrode filled within the recess. In this case, the bottom of the recess can be made of a material capable of conducting a discharge, such as a dielectric.

[0058] The first dielectric member 131 and the second dielectric member 132 may be any dielectric material shaped into a substantially planar shape, such as glass, plastic, mica, ceramic, alumina, or a polymer film. The first dielectric member 131 and the second dielectric member 132 may suppress localized concentration of discharge at the first electrode 121 and the second electrode 122, thereby preventing the discharge from developing into a glow discharge or an arc discharge. The first dielectric member 131 and the second dielectric member 132 may have a thickness of approximately 0.1 micron to several mm. In one embodiment, the dielectric member may be coated on adjacent electrodes.

[0059] The first dielectric member 131 is configured to transmit electromagnetic waves, similar to the first electrode 121, so as to allow the electromagnetic waves to be irradiated into the discharge portion 113. In one example, when the electromagnetic waves are irradiated at an angle that is not perpendicular to the plane in which the first electrode 121 and the first dielectric member 131 extend (i.e., the xy plane), the first dielectric member 131 can be made of a material having a refractive index equivalent to that of the first electrode 121 in order to reduce the degree of refraction of the electromagnetic waves between the first electrode 121 and the first dielectric member 131.

[0060] 4A, the plasma generator 110 includes two dielectric members, but the plasma generator may include one dielectric member on only one side of the discharge section. Only the dielectric member adjacent to the first electrode 121 may be present, or only the dielectric member adjacent to the second electrode 122 may be present.

[0061] In the plasma generation device 110 shown in FIG. 4A, two spacer members 114 are disposed between a first dielectric member 131 and a second dielectric member 132. The spacer members 114 are disposed to separate the two dielectric members and the two electrodes to form a discharge region for generating plasma. When the plasma generation device 110 includes one dielectric member adjacent to the first electrode 121, the two spacer members 114 are disposed between the dielectric member and the second electrode 122. When the plasma generation device 110 includes one dielectric member adjacent to the second electrode 122, the two spacer members 114 are disposed between the dielectric member and the first electrode 121. The spacer members 114 are formed of any insulating material. In one example, the spacer members 114 may be a dielectric material and may be integral with the first dielectric member 131 and the second dielectric member 132.

[0062] The plasma generator 110 includes an inlet 111 through which a gas can be supplied and an outlet 112 through which the gas can be discharged. A space (discharge region) in which a discharge occurs is formed between the inlet 111 and the outlet 112 and between the first dielectric member 131 and the second dielectric member 132 (i.e., between the first electrode 121 and the second electrode 122). In the example shown in FIGS. 4A and 4B, a discharge region 113 is formed between the first dielectric member 131 and the second dielectric member 132, which are disposed inside the two opposing electrodes. A gas is supplied into the discharge region 113, and the plasma generator 110 generates plasma in the discharge region 113 from the supplied gas. The thickness (dimension in the z direction) of the discharge region can be determined so as to enable plasma to be generated at atmospheric pressure to treat an object within the discharge region, and may be preferably about 0.1 mm to about 20 mm, and most preferably about 0.5 mm to about 5 mm. The upper limit of the thickness of the discharge part may be based on the distance between the electrodes required to generate plasma, and the lower limit of the thickness of the discharge part may depend on the thickness required to place the target object.

[0063] With the above configuration, the plasma generator 110 generates plasma in the discharge unit 116 by dielectric barrier discharge. The voltage frequency applied to the plasma generator 110 to perform the dielectric barrier discharge may preferably be in the range of about 50 Hz to about 500 kHz, and most preferably about 50 Hz to about 30 kHz, and the temperature of the generated plasma is in the range of about -100°C to about 300°C. Since the plasma generator 110 does not need to be equipped with a vacuum device, the costs of installation and operation can be reduced.

[0064] The plasma generator 110 further includes an electromagnetic wave irradiation unit 310. The electromagnetic wave irradiation unit 310 is realized by incorporating the electromagnetic wave irradiation section 300 in the system 10 described above into the plasma generator 110. The electromagnetic wave irradiation unit 310 may be fixed relative to the plasma generator 110 or configured to be movable relative to the plasma generator 110. When the electromagnetic wave irradiation unit 310 is configured to be movable relative to the plasma generator 110, the electromagnetic wave irradiation unit 310 can scan along the first electrode 121, which is configured to transmit electromagnetic waves, and irradiate electromagnetic waves to a desired position (position on the xy plane) in the discharge section 113. Furthermore, when the electromagnetic wave irradiation unit 310 is disposed over the entire first electrode 121 and irradiates uniform electromagnetic waves, the electromagnetic wave irradiation unit 310 can perform uniform treatment on an object placed in the discharge section 113.

[0065] Configuring the first electrode 121 itself to be electromagnetically transparent and irradiating the discharge unit of the plasma generator 110 with electromagnetic waves through the first electrode 121 allows for more uniform plasma generation over a wider area within the plasma generator 110 than when an electromagnetically transparent member (an insulating member or a low-conductivity member) other than the electrode is provided within or around the electrode and the electromagnetic waves are irradiated through that member. Furthermore, configuring the first electrode 121 itself to be electromagnetically transparent eliminates the need for separate windows for transmitting electromagnetic waves in areas other than the electrode, allowing for electrodes to be provided over the largest possible area within the plasma generator 110 and increasing the amount of plasma generated. In particular, in a device that generates plasma under atmospheric pressure by dielectric barrier discharge, such as the plasma generator 110, the distance between electrodes must be minimized to generate a discharge. Therefore, because the overall thickness (z direction) of the device is configured to be small, it is difficult to install a window for transmitting electromagnetic waves on the surface of the device in the thickness direction (z direction). Even if such a window were installed, it would be difficult to irradiate the entire plasma generated within the device with electromagnetic waves. Therefore, by configuring the electrodes, which may constitute most of the surface facing the outside of the plasma generating device 110, to be transparent to electromagnetic waves, it becomes possible to process objects using both plasma and electromagnetic waves throughout the entire device.

[0066] 4A and 4B, plasma generated by electrostatic barrier discharge and an object exposed to the plasma can be efficiently irradiated with electromagnetic waves in the discharge unit 113. The size of the discharge unit 113 of the plasma generator 110 in the z direction is limited (for example, about 20 mm or less) due to the inter-electrode distance required for dielectric barrier discharge, while the sizes in the x and y directions can be set relatively freely (for example, several centimeters to several meters in each direction). Therefore, it is possible to advantageously perform treatment using plasma and electromagnetic waves simultaneously on a planar object that is small in thickness and has a base area that is sufficiently large compared to the thickness.

[0067] (5. Modified Examples of Plasma Generator) 4A, the first electrode 121 is configured as an electrode that is transparent to electromagnetic waves, and the second electrode 122 is configured as an electrode that is not transparent to electromagnetic waves. However, both the first electrode 121 and the second electrode 122 may be transparent to electromagnetic waves. In this case, by providing electromagnetic wave irradiation units on both the first electrode 121 side and the second electrode 122 side of the plasma generator 110, it is possible to irradiate electromagnetic waves from both sides of the discharge section. This can improve the processing efficiency of the target object in the discharge section.

[0068] FIG. 5A shows a first modified example of the plasma generation device 110. In the example shown in FIG. 5A, both the first electrode 121 and the second electrode 122′ are transparent to electromagnetic waves. FIG. 5A shows a cross-sectional view of the plasma generation device 110′ on the yz plane. The plasma generation device shown in FIG. 5A includes a first electrode 121 that is a liquid and a second electrode 122′ that is a liquid, where the liquid of the first electrode 121 is supported by a first dielectric member 131, and the liquid of the second electrode 122′ is supported by a second dielectric member 132.

[0069] The plasma generator 110' includes a first electromagnetic wave irradiation unit 310 and a second electromagnetic wave irradiation unit 310'. The first electromagnetic wave irradiation unit 310 irradiates electromagnetic waves into the discharge unit through the first electrode 121, and the second electromagnetic wave irradiation unit irradiates electromagnetic waves into the discharge unit through the second electrode 122'. The plasma generator 110' is configured to irradiate electromagnetic waves into the discharge unit 113' from two opposing sides of the discharge unit 113', thereby improving the efficiency and effectiveness of the reaction between plasma and electromagnetic waves and the treatment of an object using that reaction. For example, the plasma generator 110' can simultaneously treat the side of the object facing the first electrode 121 and the side of the object facing the second electrode 122', eliminating the need to change the orientation of the object within the discharge unit 113' to treat both sides of the object.

[0070] Furthermore, the first electromagnetic wave irradiation unit 310 and the second electromagnetic wave irradiation unit 310' may be configured to irradiate the same electromagnetic wave or different electromagnetic waves. For example, an object treatment method performed in the plasma generator 110' may include the first electromagnetic wave irradiation unit 310 irradiating an electromagnetic wave having a first wavelength (e.g., ultraviolet light) and the second electromagnetic wave irradiation unit 310 irradiating an electromagnetic wave having a second wavelength (e.g., infrared light). For example, ultraviolet light and infrared light are irradiated through electrodes from opposite sides into the discharge section 113 of the plasma generator 110', thereby heating a portion of the object with the infrared light and performing surface treatment of that portion of the object with active species in the plasma activated by the ultraviolet light, thereby increasing the efficiency and effectiveness of the treatment of the object.

[0071] 5A, both the first electrode 121 and the second electrode 122' are made of a liquid having the electromagnetic wave transmittance required for treating the object. In particular, the upper surface of the second electrode 122' is exposed to the discharge unit 113'. By exposing the liquid constituting the electrodes to the discharge unit 113', moisture can be supplied from the liquid electrode to the plasma in the discharge unit 113', which can increase the number of active species in the plasma and improve the efficiency and effectiveness of treating the object. Furthermore, by reacting the liquid constituting the electrodes with substances in the plasma, it is possible to generate new materials or purify the liquid electrode itself.

[0072] FIG. 5B shows a cross-sectional view of a second modified example of a plasma generator 110″ taken along the y-z plane. The plasma generator 110″ includes a first electrode 121 made of an electromagnetically transparent liquid, a dielectric member 131 positioned below the first electrode 121, a second electrode 122 made of solid metal, and an electromagnetically transparent liquid layer 142. The liquid in the liquid layer 142, like the liquid in the first electrode 121, is held by a member below the liquid layer (the second electrode 122) and a frame surrounding the liquid. Similar to the plasma generator 110′, the plasma generator 110″ is capable of irradiating electromagnetic waves from both the first electrode 121 side and the second electrode 122 side to the discharge unit 113″ by electromagnetic wave irradiation units 310 and 310′.

[0073] The liquid layer 142 faces the discharge unit 113'', and the liquid constituting the liquid layer 142 on the upper surface thereof is exposed to the plasma in the discharge unit 113''. The plasma generator 110'' can supply water from a liquid electrode to the plasma in the discharge unit 113' by reacting the liquid in the liquid layer 142 with substances in the plasma, similar to the plasma generator 110'. This can increase the number of activated species in the plasma and improve the efficiency and effectiveness of the treatment of the target object. Furthermore, by reacting the liquid in the liquid layer 142 with substances in the plasma, it is possible to generate new materials, purify the liquid, and clean the second electrode 122 with the liquid that has reacted with the substances in the plasma. Furthermore, the liquid layer 142 may be connected to a liquid supply mechanism and a liquid discharge mechanism, and configured to allow new liquid to flow into the liquid layer 142 during operation of the plasma generator 110''. In this case, the flow of new liquid can further increase the reaction efficiency between the liquid and the plasma.

[0074] (Method for treating an object with atmospheric pressure plasma and electromagnetic waves using a plasma generator) 6 is an exemplary flowchart of a method 600 for treating an object with atmospheric pressure plasma and electromagnetic waves using a plasma generating device. Method 600 can be implemented, for example, in the plasma generating device 110 shown in FIGS. 4A and 4B.

[0075] In step 601, a gas is supplied into the discharge section of the plasma generating device. The gas can be supplied through a gas inlet of the plasma generating device.

[0076] In step 602, the plasma generator generates atmospheric pressure plasma from the gas in the discharge section by dielectric barrier discharge, and also irradiates electromagnetic waves into the discharge section through the first electrode 121, thereby exposing an object placed in the discharge section to the plasma and electromagnetic waves. As a result, the object is treated by active species in the plasma, active species excited or activated by the electromagnetic waves, and / or the electromagnetic waves themselves.

[0077] According to method 600, plasma generation and electromagnetic wave irradiation are performed substantially simultaneously within the discharge section of the plasma generating device. Therefore, method 600 can reduce plasma loss and improve the effectiveness of combining plasma and electromagnetic waves compared to when the object is exposed to plasma and electromagnetic waves at time intervals, or when the object is exposed to plasma generated by the plasma generating device and then delivered to the outside, and electromagnetic waves. This allows for efficient treatment of the object. After plasma generation within the discharge section, the gas is discharged to the outside of the plasma generating device through an outlet.

[0078] (Method for treating an object using atmospheric pressure plasma and ultraviolet light in a plasma generator) 7 is an exemplary flowchart of a method 700 for treating an object using atmospheric pressure plasma and ultraviolet light in a plasma generating device. Method 700 can be implemented, for example, in the plasma generating device 110 shown in FIGS. 4A and 4B.

[0079] In step 701, a gas is supplied into the discharge section of the plasma generator. The gas may be supplied through a gas inlet of the plasma generator. The gas supplied in method 700 may contain any substance, such as oxygen, nitrogen, carbon, etc. In one example, the gas supplied may contain oxygen, air, and / or water to generate activated species such as ozone within the plasma generator 110. In another example, the gas supplied may contain nitrogen to generate activated species such as nitrogen dioxide and nitric oxide. In yet another example, the gas supplied may contain carbon dioxide to generate activated species such as ozone, formic acid, and performic acid.

[0080] In step 702, the plasma generator generates atmospheric pressure plasma from the gas in the discharge section by dielectric barrier discharge, and irradiates ultraviolet light into the discharge section through the first electrode, thereby exposing an object placed in the discharge section to the plasma and ultraviolet light.

[0081] In step 703, the object is sterilized or the surface of the object is treated by the active species in the ultraviolet-activated atmospheric pressure plasma. The treatment performed in step 703 may include, for example, surface hardening, surface activation, and molecular crosslinking. After plasma is generated in the discharge section, the gas is discharged to the outside of the plasma generator through an outlet.

[0082] For example, the plasma generated in method 700 may contain, for example, ozone. In particular, ultraviolet light having a wavelength of approximately 260 nm to approximately 300 nm can decompose ozone, generating activated species with higher oxidizing power. These activated species can perform sterilization and / or surface treatment more efficiently and powerfully than treatments using plasma alone. Furthermore, as described above, sterilization and / or surface treatment of objects can also be performed using nitrogen dioxide and nitric oxide generated from nitrogen, and formic acid and performic acid generated from carbon dioxide.

[0083] The objects to be sterilized and surface treated by method 700 are not particularly limited. For example, they may be fluororesin, rubber, acrylic, polyethylene, polypropylene, polycarbonate, biomaterials, paper, metal, semiconductor, or gas. Method 700 may also be performed in combination with exhaust gas decomposition treatment in a plasma generator. In this case, method 700 may be performed using gases generated by decomposing the exhaust gases.

[0084] (Method for performing surface treatment for adhesion of objects using atmospheric pressure plasma and infrared rays in a plasma generator) 8 is an exemplary flowchart of a method 800 for performing surface treatment for bonding of an object using atmospheric pressure plasma and infrared radiation in a plasma generating device. Method 800 can be performed, for example, in the plasma generating device 110 shown in FIGS. 4A and 4B.

[0085] In step 801, a gas is supplied into the discharge section of a plasma generator. The gas may be supplied through a gas inlet of the plasma generator. The gas supplied in method 800 may include any substance that can be activated by plasma, and may contain, for example, nitrogen and / or carbon dioxide. The gas may further contain water vapor. Using a gas in which water vapor is mixed with nitrogen and / or carbon dioxide can improve the efficiency of the surface treatment in step 803, which will be described later.

[0086] In step 802, the plasma generating device heats an object placed in a discharge section by irradiating the object with infrared rays through a first electrode, and generates plasma from a gas in the discharge section by dielectric barrier discharge, exposing the object to the plasma.

[0087] In step 803, the surface of the object is treated with plasma. The infrared rays heat the surface of the object, improving the efficiency of the surface treatment of the object, and as a result, further improving the adhesion of the object. After plasma is generated in the discharge section, the gas is discharged to the outside of the plasma generator through an outlet.

[0088] In another embodiment, the method 800 may be implemented using millimeter waves rather than infrared.

[0089] (Method for locally treating an object using atmospheric pressure plasma and a laser in a plasma generating device) 9 is an exemplary flowchart of a method 900 for performing localized treatment of an object using atmospheric plasma and a laser in a plasma generating device. Method 900 can be performed, for example, in the plasma generating device 110 shown in FIGS. 4A and 4B.

[0090] In step 901, a gas is supplied into the discharge section of the plasma generating device. The gas can be supplied through a gas inlet of the plasma generating device.

[0091] In step 902, the plasma generator generates plasma from the gas in the discharge unit by dielectric barrier discharge, and irradiates the first portion of the object placed in the discharge unit with a laser through the first electrode, thereby performing surface treatment of the first portion of the object. This activates only the substances in the plasma around the first portion irradiated with the laser, among the plasma in the discharge unit, and enables highly efficient surface treatment of the first portion.

[0092] In step 903, the laser irradiation unit of the plasma generating device is moved along the first electrode, thereby switching the laser irradiation target from the first portion of the target to the second portion.

[0093] In step 904, the plasma generator generates plasma from the gas in the discharge unit by dielectric barrier discharge, and irradiates the second portion of the object placed in the discharge unit with a laser through the first electrode, thereby performing surface treatment of the second portion of the object. This activates only the substances in the plasma around the second portion irradiated with the laser, among the plasma in the discharge unit, and enables highly efficient surface treatment of the second portion.

[0094] According to the method 900, localized surface treatment can be performed by irradiating a laser into the plasma to locally activate materials in the plasma. This can be advantageous, for example, in performing surface treatment on objects with complex surface shapes (e.g., objects with rough surfaces) or objects requiring treatment of only specific areas. After plasma is generated in the discharge section, the gas is discharged to the outside of the plasma generating device through an outlet.

[0095] Although the method 900 has been described as moving the laser irradiation unit along the first electrode in step 903, the method of switching the laser irradiation target from the first portion of the object to the second portion is not limited thereto. For example, if the laser irradiation unit is an LED array that is fixed relative to the first electrode and includes multiple LEDs that extend from the first portion to the second portion of the object, step 903 is performed by switching the LEDs that are turned on.

[0096] (Method for measuring activated species in plasma using a laser in a plasma generating device) The plasma generating device according to the present disclosure can also treat the plasma itself with electromagnetic waves. An example of a method for treating plasma with electromagnetic waves is shown below.

[0097] 10 is an exemplary flowchart of a method 1000 for measuring activated species in a plasma using a laser in a plasma generating device. Method 1000 can be implemented, for example, in the plasma generating device 110 shown in FIGS. 4A and 4B.

[0098] In step 1001, a gas is supplied into the discharge section of the plasma generating device. The gas can be supplied through a gas inlet of the plasma generating device.

[0099] In step 1002, plasma is generated from the gas in the discharge section by dielectric barrier discharge, and activated species in the plasma are excited and made to emit light by irradiating the plasma with a laser through a first electrode disposed in the discharge section. Some activated species in the plasma may not be in an emitting state when the plasma is generated. By irradiating such activated species with a laser, it is possible to excite the activated species and make them emit light.

[0100] The emitted active species is measured through the first electrode in step 1003. The active species can be measured by, for example, spectroscopic analysis using a spectrometer.

[0101] According to the method 1000, the presence and / or content of activated species in the plasma, which do not emit light when the plasma is generated, can be detected by making them emit light.

[0102] Another example of a plasma treatment method is decomposing exhaust gas. For example, exhaust gas is introduced into a plasma generator, which converts the exhaust gas into plasma in a discharge section of the plasma generator. Further irradiation of the plasma-converted exhaust gas with ultraviolet light can decompose the exhaust gas and generate a gas with reduced toxicity. An example of the exhaust gas can be nitrogen oxides (NOX). The gas generated by decomposing the exhaust gas can be further used to treat an object in the plasma generator.

[0103] As described above, the present invention has been illustrated using preferred embodiments of the present invention, but the present invention should not be construed as being limited to these embodiments. It is understood that the scope of the present invention should be interpreted only by the claims. Those skilled in the art will understand that from the description of specific preferred embodiments of the present disclosure, they can implement equivalent scopes based on the description of the present disclosure and common technical knowledge. It is understood that the contents of the documents cited in this specification should be incorporated by reference into this specification as if the contents themselves were specifically set forth in this specification. [Industrial Applicability]

[0104] The present invention is useful in providing a method and system capable of efficiently processing an object using plasma and electromagnetic waves. [Explanation of symbols]

[0105] 1. Plasma source 2. Electromagnetic wave sources 10. System for simultaneous use of plasma and electromagnetic waves 100 Plasma generating unit 200 Electromagnetic wave generator 300 Electromagnetic wave irradiation section 400 Gas Source 500 power supply

Claims

1. 1. A method for treating an object with plasma, the method comprising: supplying a gas into a discharge portion of a plasma generating device; generating plasma from the gas in the discharge unit and irradiating electromagnetic waves into the discharge unit, thereby exposing an object placed in the discharge unit to the plasma and the electromagnetic waves; Including, The plasma generator includes: a first planar electrode and a second planar electrode facing each other; at least one dielectric member disposed between the first electrode and the second electrode; an inlet through which the gas can be supplied and an outlet through which the gas can be discharged, the discharge portion is a space formed between the first electrode and the second electrode and between the inlet and the outlet, the first electrode has a portion that allows the electromagnetic wave to pass through, the second electrode has a portion that allows the electromagnetic wave to pass through; The irradiation of electromagnetic waves includes: irradiating the electromagnetic wave onto the object through a portion of the first electrode that allows the electromagnetic wave to pass through; irradiating the electromagnetic wave onto the object through a portion of the second electrode that allows the electromagnetic wave to pass through; A method comprising:

2. 2. The method of claim 1, wherein generating the plasma from the gas in the discharge section comprises generating the plasma from the gas in the discharge section at atmospheric pressure.

3. 3. The method according to claim 1, wherein generating the plasma from the gas in the discharge section comprises generating the plasma from the gas by dielectric barrier discharge in the discharge section.

4. 2. The method of claim 1, wherein the electromagnetic wave-passing portion of the first electrode is an electrically conductive portion, the electrically conductive portion having a transparency of at least about 10% for the electromagnetic wave.

5. The method of claim 1 , wherein the first electrode comprises a plurality of portions that are transparent to the electromagnetic waves, the plurality of portions being uniformly disposed within the first electrode.

6. The method according to any one of claims 1 to 5, wherein the irradiating of the electromagnetic waves is performed by irradiating the electromagnetic waves to the object through a portion of the first electrode that allows the electromagnetic waves to pass through.

7. The irradiation of electromagnetic waves includes: irradiating the object with electromagnetic waves having a first wavelength through a portion of the first electrode that allows the electromagnetic waves to pass therethrough; irradiating the object with electromagnetic waves having a second wavelength through a portion of the second electrode that allows the electromagnetic waves to pass therethrough; The method of claim 1 , comprising:

8. The method according to any one of claims 1 to 7, wherein generating the plasma from the gas in the discharge section is performed by supplying a voltage having a frequency of about 50 Hz to about 500 kHz between the first electrode and the second electrode.

9. The method of any one of claims 1 to 8, wherein the distance between the first electrode and the second electrode is from about 0.1 mm to about 20 mm.

10. The method of any one of claims 1 to 9, wherein at least the first electrode is configured to transmit visible light.

11. The method according to any one of claims 1 to 10, wherein the electromagnetic wave is a laser.

12. The method of any one of claims 1 to 11, wherein the plasma comprises ozone.

13. The method according to any one of claims 1 to 12, wherein the electromagnetic wave is ultraviolet radiation.

14. The method of claim 13, wherein the ultraviolet light has a wavelength of about 260 to about 300 nm.

15. The method according to any one of claims 1 to 14, which is a method for sterilizing, surface treating, or gas decomposition treating the object.

16. The method according to any one of claims 1 to 15, wherein the electromagnetic waves are infrared waves.

17. The method according to claim 15, which is a surface treatment method for adhesion of the object.

18. 1. A plasma processing system, comprising: a plasma generating unit that generates plasma; a gas supply unit that supplies gas to the plasma generating unit; an electromagnetic wave generating unit that generates electromagnetic waves; an electromagnetic wave irradiation unit that irradiates the plasma generation unit with the electromagnetic waves; Equipped with The plasma generating unit is a first planar electrode and a second planar electrode facing each other; at least one dielectric member disposed between the first electrode and the second electrode; an inlet through which the gas can be supplied and an outlet through which the gas can be discharged, a discharge section is formed between the first electrode and the second electrode and between the inlet and the outlet, and the plasma is generated in the discharge section; At least the first electrode has a portion that allows the electromagnetic wave to pass through; the second electrode has a portion that allows the electromagnetic wave to pass through; The electromagnetic wave irradiation unit is arranged to irradiate the electromagnetic waves to the plasma generation unit through a portion of the first electrode that passes the electromagnetic waves, and is also arranged to irradiate the electromagnetic waves to the plasma generation unit through a portion of the second electrode that passes the electromagnetic waves.

19. A system according to claim 18 for carrying out the method according to any one of claims 1 to 17.

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