Light source device, lithography apparatus, and method for manufacturing an article

Abstract

To provide a light source apparatus that can suppress a reduction in light illuminance.SOLUTION: A light source apparatus configured to emit light includes a condenser unit configured to reflect and condense light from a light source, a light blocking unit configured to block light from the condenser unit, and a reflector unit disposed between the condenser unit and the light blocking unit and configured to reflect the light from the condenser unit.SELECTED DRAWING: Figure 2

Description

[Technical Field]

[0001] The present invention relates to a light source device, a lithography apparatus, and a method for manufacturing an article. [Background technology]

[0002] 2. Description of the Related Art A light source device equipped with a light source such as a lamp is incorporated into an exposure apparatus used in a lithography process for manufacturing devices such as semiconductor devices and display devices.

[0003] Patent document 1 discloses a light source device having a lamp with a base, a focusing mirror that focuses light from the lamp, lead wires connected to the base, and a nozzle that sprays gas to cool the base. [Prior art documents] [Patent documents]

[0004] [Patent Document 1] Japanese Patent Application Laid-Open No. 2011-187335 Summary of the Invention [Problem to be solved by the invention]

[0005] However, in the light source device of Patent Document 1, the light from the condenser mirror may be blocked by the lead wires, nozzle, etc., which may reduce the illuminance of the light emitted from the light source device.

[0006] An object of the present invention is to provide a light source device that can suppress a reduction in the illuminance of light. [Means for solving the problem]

[0007] A light source device according to one aspect of the present invention is a light source device that emits light, and reflects light from a light source. At the focal point The light-collecting part and the light from the light-collecting part placed on the optical path of The light-shielding portion and the reflecting portion are disposed between the light-collecting portion and the light-shielding portion and reflect the light from the light-collecting portion. The reflecting portion is arranged so that the reflected light is focused at a focusing point by the focusing portion. It is characterized by the following. [Effects of the Invention]

[0008] According to the present invention, it is possible to provide a light source device that can suppress a reduction in the illuminance of light. [Brief explanation of the drawings]

[0009] [Figure 1] FIG. 1 is a configuration diagram of an exposure apparatus according to a first embodiment. [Figure 2] 1 is a configuration diagram of a lamp irradiation device according to a first embodiment. [Figure 3] FIG. 2 is a diagram showing the arrangement of nozzles and reflecting elements in the first embodiment. [Figure 4] FIG. 2 is a diagram showing a reflective element having retroreflective performance according to the first embodiment. [Figure 5] FIG. 2 is a diagram for explaining the effect of the configuration of the first embodiment. [Figure 6] FIG. 10 is a configuration diagram of a lamp irradiation device according to a second embodiment. [Figure 7] FIG. 10 is a configuration diagram of a lamp irradiation device according to a third embodiment. [Figure 8] FIG. 10 is a configuration diagram of a lamp irradiation device according to a fourth embodiment. [Figure 9] FIG. 1 is a configuration diagram of an exposure apparatus according to an embodiment of the lithography apparatus. DETAILED DESCRIPTION OF THE INVENTION

[0010] DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. In the drawings, the same reference numerals are used to designate the same components, and redundant explanations will be omitted. First Embodiment 1 is a configuration diagram of an exposure apparatus 100 of this embodiment. In the example of Fig. 1, the Z-axis direction (vertical direction, up-down direction) is the direction along the optical axis O of the collector mirror 2 (described later) (optical axis direction), and the XY plane (horizontal plane) is a plane perpendicular to the optical axis direction of the collector mirror 2. The exposure apparatus 100 has a lamp irradiation device (light source device) 110, a shutter device 120, an illumination optical system 130, an original holder 140, a projection optical system 150, and a substrate holder 160.

[0011] The lamp irradiation device 110 includes a holder 20 that holds a lamp (light source) 1. The original holder 140 holds an original 142 and is positioned by an original positioning mechanism (not shown). The substrate holder 160 holds a substrate 162 on which a resist (photosensitive material) has been applied by a resist coating device and is positioned by a substrate positioning mechanism (not shown).

[0012] The shutter device 120 is disposed in the optical path between the lamp irradiation device 110 and the original holder 140 so as to be able to block the light beam. The illumination optical system 130 illuminates the original 142 using light from the lamp irradiation device 110. The projection optical system 150 projects the pattern of the original 142 illuminated by the illumination optical system 130 onto the substrate 162. This exposes the substrate 162, and a latent image pattern is formed in the resist applied to the substrate 162. The latent image pattern is developed by a developing device (not shown). This forms a resist pattern on the substrate 162.

[0013] 1, the optical axis direction of the collector mirror 2 is the Z-axis direction, but this is not limited to this. For example, the lamp irradiation device 110 may be arranged so that the direction along the optical axis O of the collector mirror 2 is the X-axis direction, and the lamp irradiation device 110 may emit light along the X-axis direction to the illumination optical system 130.

[0014] FIG. 2 is a structural diagram of a lamp irradiation device 110 according to this embodiment. The lamp irradiation device 110 includes a lamp 1, a condensing mirror (condensing portion) 2, nozzles 5a and 5b, piping 6, an air supply device 7, and a reflecting element (reflecting portion) 8a. In this embodiment, the lamp 1 is a mercury lamp, but it may also be a short-arc lamp such as a xenon lamp or a metal halide lamp. The lamp 1 includes lead wires 3a and 3b, an anode base (base portion) 11a, a cathode base 11b, an anode 12a, a cathode 12b, and an arc tube 13. The anode base 11a and the anode 12a, and the cathode base 11b and the cathode 12b are connected by molybdenum foil (not shown). The arc tube 13 contains a rare gas such as neon or xenon, mercury, sodium, scandium, or a mixture thereof. The anode base 11a is connected to the lamp power supply 4 via lead wire 3a. The cathode base 11b is connected to the lamp power supply 4 via lead wire 3b. When power is supplied between the anode 12a and the cathode 12b via the lead wires 3a and 3b, an arc discharge occurs between the anode 12a and the cathode 12b. This causes the lamp 1 to emit light. The condenser mirror 2 is, for example, an elliptical mirror with two focal points. It is positioned so that the bright spot of the lamp 1 is located near the first focal point 21. It reflects light from the lamp 1 and condenses the light at the second focal point (condensing point) 22. The lamp 1 is positioned along the optical axis O of the condenser mirror 2, i.e., the axis connecting the first focal point 21 and the second focal point 22. The nozzles 5a and 5b are connected to an air supply device 7 via piping 6. High-pressure air supplied from the air supply device 7 is blown onto the anode base 11a and the cathode base 11b, respectively, for cooling. Furthermore, the nozzle 5a is disposed at a position where it blocks a part of the effective light beam 23 (light from the collector mirror 2). In this embodiment, air is used for cooling, but another cooling medium (for example, gas such as nitrogen or helium) may also be used. The reflecting element 8a is disposed between the collector mirror 2 and the nozzle 5a (light blocking portion).

[0015] FIG. 3 is a diagram showing the arrangement of the nozzle 5a and the reflective element 8a. As shown in FIG. 3(a), the reflective element 8a may be supported by the nozzle 5a via a holding member 811, or as shown in FIG. 3(b), it may be supported by a holding member 822 fastened to the structure 9 via the holding member 811. The reflective element 8a corresponds to a part of a sphere centered on the second focal point 22 at which the light from the collecting mirror 2 is collected. In this embodiment, the reflective element 8a is a mirror as shown in FIGS. 3(a) and 3(b), and the mirror lower surface 813 is a reflective surface. Note that the mirror lower surface 813 may be a transmitting surface, and the mirror upper surface 814 may be a reflective surface.

[0016] 3(c), the reflective element 8a may be a Fresnel mirror 833 having a discontinuous spherical surface. The reflective element 8a may have a retroreflection property that reflects light from the collector mirror 2 back to the collector mirror 2.

[0017] Fig. 4 is a diagram showing a reflective element 8a having retroreflective properties. As shown in Fig. 4(a), the reflective element 8a may include at least one corner cube 844 having a reflective surface that reflects light from the collector mirror 2 back to the collector mirror 2. In Fig. 4(a), the multiple corner cubes 844 are arranged on a plane. The light reflected by the collector mirror 2 is reflected by the corner cube 844 having retroreflective properties and returns to the collector mirror 2.

[0018] 4(b), the reflective element 8a may include a reflector 855 and at least one spherical lens 856. In FIG. 4(b), the plurality of spherical lenses 856 are arranged on a plane. The light reflected by the collector mirror 2 is reflected by the reflector 855 and the spherical lens 856 and returns to the collector mirror 2.

[0019] Alternatively, the reflective element 8a may include a reflector 855 and at least one gradient index lens 857, as shown in Fig. 4(b). In Fig. 4(c), multiple gradient index lenses 857 are arranged on a plane. The light reflected by the collector mirror 2 is reflected by the reflector 855 and the gradient index lens 857, and returns to the collector mirror 2.

[0020] Since light reflected by the reflective element 8a having retroreflective properties always returns to the original optical path, it is easy to adjust the position of the reflective element 8a, and a mechanism for adjusting the optical axis is not required. Furthermore, if the reflective element 8a is a Fresnel mirror or has retroreflective properties, the thickness of the reflective element 8a in the vertical direction can be made thin, making it easy to arrange the reflective element 8a when space is limited.

[0021] 5 is a diagram illustrating the effect of the configuration of this embodiment. In this embodiment, by providing the reflective element 8a, light that would conventionally be blocked by the nozzle 5a is reflected by the collector mirror 2, passes through the first focal point 21, is reflected by the collector mirror 2, and is collected at the second focal point 22. This makes it possible to suppress a reduction in illuminance at the second focal point 22. Second Embodiment 6 is a configuration diagram of a lamp irradiation device 110 of this embodiment. The lamp irradiation device 110 of this embodiment differs from the first embodiment only in the arrangement of the reflective elements, and other configurations are the same as those of the first embodiment.

[0022] The lead wire 3a connected to the lamp 1 is positioned to block a portion of the effective luminous flux 23 (light from the collecting mirror 2). The reflective element 8b is positioned between the collecting mirror 2 and the lead wire 3a (light blocking portion). The reflective element 8b may be supported by the lead wire 3a, or may be supported by a holding member fastened to the structure 9. The reflective element 8b corresponds to a portion of a sphere centered on the second focal point 22. The reflective element 8b may have retroreflective properties that reflect light from the collecting mirror 2 back to the collecting mirror 2.

[0023] In this embodiment, by providing the reflective element 8b, light that would conventionally be blocked by the lead wire 3a is reflected by the collecting mirror 2, passes through the first focal point 21, is reflected by the collecting mirror 2, and is collected at the second focal point 22. This makes it possible to suppress a reduction in illuminance at the second focal point 22. Third Embodiment 7 is a configuration diagram of a lamp irradiation device 110 of this embodiment. The lamp irradiation device 110 of this embodiment differs from the first embodiment only in the arrangement of the reflective elements, and other configurations are the same as those of the first embodiment.

[0024] The anode base 11a of the lamp 1 is disposed in a position that blocks part of the effective luminous flux 23 (light from the collector mirror 2). The reflective element 8c is disposed between the collector mirror 2 and the anode base 11a (light-blocking portion). The reflective element 8c may be configured integrally with the anode base 11a. The reflective element 8c corresponds to part of a sphere centered on the second focal point 22. The reflective element 8c may have retroreflective properties that reflect light from the collector mirror 2 back to the collector mirror 2.

[0025] In this embodiment, by providing the reflective element 8c, light that would conventionally be blocked by the anode-side base 11a is reflected by the collector mirror 2, passes through the first focal point 21, is reflected by the collector mirror 2, and is collected at the second focal point 22. This makes it possible to suppress a reduction in illuminance at the second focal point 22. <Fourth embodiment> 8 is a configuration diagram of a lamp irradiation device 110 of this embodiment. The lamp irradiation device 110 of this embodiment differs from the second embodiment only in the arrangement of the nozzles 5a, 5b, the piping 6, and the air supply device 7, and the other configurations are the same as those of the second embodiment.

[0026] When viewed from the second focal point 22 (the side where the light from the lamp 1 is reflected by the collecting mirror 2), the lead wire 3a and the nozzle 5a are arranged so as to overlap each other. The lead wire 3a and the nozzle 5a may be arranged either above or below. That is, in this embodiment, the lead wire 3a is arranged on the side closer to the collecting mirror 2, but the nozzle 5a may also be arranged on the side closer to the collecting mirror 2. The reflective element 8b is arranged on the bottom side of the lead wire 3a or the nozzle 5a. The reflective element 8b may be supported by the lead wire 3a or the nozzle 5a, or may be supported by a holding member fastened to the structure 9.

[0027] In this embodiment, by providing the reflective element 8b, light that would conventionally be blocked by the lead wire 3a and the nozzle 5a is reflected by the collecting mirror 2, passes through the first focal point 21, is reflected by the collecting mirror 2, and is collected at the second focal point 22. This makes it possible to suppress a reduction in illuminance at the second focal point 22.

[0028] In addition, in this embodiment, the lead wire 3a and the nozzle 5a are arranged to overlap when viewed from the second focal point 22, which reduces elements that block light and enables the integration of reflective elements. In other words, the configuration can be simplified. <Embodiment of Lithography Apparatus> A lithography apparatus according to an embodiment of the present invention will be described. In this embodiment, an exposure apparatus that exposes a substrate to light to form a pattern on the substrate will be described as an example of the lithography apparatus, but the present invention is not limited to this. For example, the present invention can also be applied to lithography apparatuses such as an imprint apparatus that forms a pattern of an imprint material on a substrate using a mold, or a drawing apparatus that irradiates a substrate with a charged particle beam to form a pattern on the substrate.

[0029] 9 is a diagram showing the configuration of an exposure apparatus 100 of this embodiment. The exposure apparatus 100 is an exposure apparatus that exposes the substrate W by projecting an image of the pattern of a mask M onto the substrate W via a projection optical system 54. Here, the direction parallel to the optical axis of the projection optical system 54 is defined as the Z-axis direction, and two directions that are orthogonal to each other in a plane perpendicular to the Z-axis direction are defined as the X-axis direction and the Y-axis direction. Furthermore, the directions of rotation around the X-axis, the Y-axis, and the Z-axis are defined as θX, θY, and θZ, respectively.

[0030] The exposure apparatus 100 also has a light source device 51, an illumination optical system 52, a mask stage 53, a projection optical system 54, a substrate stage 55, and a main controller 56. The exposure apparatus 100 also has a first driver 61 that drives the mask stage 53, a second driver 62 that drives an optical element (lens) 54a of the projection optical system 54, and a third driver 63 that drives the substrate stage 55. The first driver 61, the second driver 62, and the third driver 63 are mechanisms that perform at least part of the process of forming a pattern on the substrate W, and are controlled by a mask stage controller 71, a projection controller 72, and a substrate stage controller 73, respectively. The main controller 56 also has, for example, a CPU (processor), a storage device, etc., and controls the mask stage controller 71, the projection controller 72, and the substrate stage controller 73, thereby controlling the entire exposure apparatus 100 (each part of the exposure apparatus 100).

[0031] The light source device 51 emits exposure light. The illumination optical system 52 illuminates the mask M using the light emitted from the light source device 51. The mask stage 53 holds the mask M and can be configured to be movable by a first drive unit 61, for example, within a plane perpendicular to the optical axis of the projection optical system 54, i.e., within the XY plane. The projection optical system 54 projects an image of the pattern of the mask M illuminated by the illumination optical system 52 onto the substrate. The substrate stage 55 holds the substrate W and can be configured to be movable by a third drive unit 63, for example, within the XY plane and rotatable in a rotational direction θZ. <Embodiments of manufacturing methods of articles> The method for manufacturing an article according to an embodiment of the present invention is suitable for manufacturing articles such as microdevices such as semiconductor devices, elements having microstructures, and flat panel displays. The method for manufacturing an article according to this embodiment includes a step of forming a pattern on a substrate using the above-described lithography apparatus, and a step of manufacturing an article from the substrate processed in this step. Furthermore, this manufacturing method may include well-known steps (exposure, oxidation, film formation, vapor deposition, doping, planarization, etching, resist stripping, dicing, bonding, packaging, etc.). The method for manufacturing an article according to this embodiment is advantageous over conventional methods in at least one of the performance, quality, productivity, and production cost of the article.

[0032] Although the preferred embodiments of the present invention have been described above, the present invention is not limited to these embodiments and various modifications and changes are possible within the scope of the gist of the present invention. [Explanation of symbols]

[0033] 1. Lamp (light source) 2. Condenser mirror (condenser) 3a Lead wire (light-shielding part) 5a Nozzle (light-shielding part) 8a,8b,8c Reflective element (reflective part) 11a Anode side cap (light-shielding part) 110 Lamp irradiation device (light source device)

Claims

1. A light source device that emits light, a focusing unit that reflects light from the light source and focuses the light at a focusing point; a light blocking portion disposed on an optical path of light from the light collecting portion; a reflecting portion disposed between the light collecting portion and the light blocking portion and configured to reflect light from the light collecting portion; The light source device is characterized in that the reflecting portion is disposed so that the reflected light is focused at the focusing point by the focusing portion.

2. 2. The light source device according to claim 1, further comprising the light source.

3. 3. The light source device according to claim 2, wherein the light source is a lamp having a base.

4. 4. The light source device according to claim 3, wherein the lamp is a mercury lamp.

5. 5. The light source device according to claim 3, wherein the reflecting portion is disposed between the light collecting portion and the base portion.

6. Further, a lead wire connected to the base portion is provided.

6. The light source device according to claim 3, wherein the reflecting portion is disposed between the light collecting portion and the lead wire.

7. Further, a nozzle for blowing gas to cool the nozzle portion is provided, 7. The light source device according to claim 3, wherein the reflecting portion is disposed between the light collecting portion and the nozzle.

8. a lead wire connected to the base portion; a nozzle for blowing gas to cool the nozzle portion, 8. The light source device according to claim 3, wherein the lead wire and the nozzle are arranged to overlap each other when viewed from the side where the light from the light source is reflected by the light collecting portion.

9. 9. The light source device according to claim 1, wherein the reflecting portion corresponds to a part of a sphere having the light condensing point as a center.

10. 10. The light source device according to claim 1, wherein the reflecting portion is a Fresnel mirror.

11. 11. The light source device according to claim 1, wherein the reflecting portion has a retroreflective property for reflecting light from the light collecting portion back to the light collecting portion.

12. 12. The light source device according to claim 11, wherein the reflecting portion includes at least one corner cube having a reflecting surface that reflects the light from the light collecting portion toward the light collecting portion.

13. The light source device according to claim 11, wherein the reflecting portion includes a reflector and at least one spherical lens.

14. The light source device according to claim 11, wherein the reflecting portion includes a reflector and at least one gradient index lens.

15. 1. A lithographic apparatus for forming a pattern on a substrate, comprising: A lithography apparatus comprising a light source device according to any one of claims 1 to 14.

16. forming a pattern on a substrate using a lithographic apparatus according to claim 15; and manufacturing an article from the substrate on which the pattern is formed.

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