Substrate transport device

Abstract

To provide a substrate carrier device capable of preventing or suppressing the formation of a space outside a movement range of an arm near the rear wall of a transfer chamber in an interior space of the transfer chamber without increasing the footprint of the transfer chamber.SOLUTION: A substrate carrier device includes a transfer chamber 1, and a substrate transfer robot 2 arranged in a transfer chamber space 1S to transfer a substrate W between a FOUP 3 and a substrate processing device 5, and defines a rear side boundary of a substrate transfer space 13S by a rear wall 13 provided in a posture facing the front wall 11 and a rearward protruding wall 14 protruding toward the substrate processing device 5 from the rear wall 13, and sets the base end of an arm 22 of the substrate transport robot 2 or a pivot axis 2A near the base end on the same plane as the rear wall 13 or at a position closer to the rear protruding wall 14 than the rear wall 13.SELECTED DRAWING: Figure 2

Description

[Technical Field]

[0001] The present invention relates to a substrate transport apparatus. [Background technology]

[0002] In semiconductor manufacturing, wafers are processed in clean rooms to improve yield and quality. In recent years, a "mini-environment system" has been adopted to further improve the cleanliness of only the localized space around the wafer, and wafer transport and other processing methods have been adopted. In the mini-environment system, important factors are a wafer transport chamber (hereinafter referred to as the "transfer chamber") with a nearly enclosed transport space inside, and a load port (hereinafter referred to as the "load port") located adjacent to the transport chamber, forming part of the wall of the transport chamber, and capable of opening and closing the FOUP (Front-Opening Unified Pod) door (hereinafter referred to as the "FOUP door"), a container that stores wafers in the highly clean transport chamber space.

[0003] Furthermore, in a transfer chamber that is generally kept clean by a downflow, a transfer robot is disposed to transfer precision-machined workpieces, such as wafers used in semiconductor manufacturing, as workpieces. As disclosed in Patent Document 1 below, many transfer robots are configured as articulated robots with arms in which a base configured to be able to move up and down is used as a base point, and multiple arm elements are connected in sequence and capable of horizontal rotation. Specifically, a first arm element is rotatably mounted on the base, and a second arm element is rotatably mounted at the tip of this first arm. Furthermore, two hands are mounted at the tip of the second arm so that they are parallel to one another and can rotate around the same axis. Such articulated robots are also widely used in applications other than semiconductor manufacturing, such as transporting glass substrates.

[0004] Patent Document 2 below discloses a configuration in which the pivot axis of the first arm element, which is the base end of the arm of a transfer robot connected to a base, is positioned closer to the rear wall of the transfer chamber. This configuration increases the operating range of the transfer robot within the transfer chamber and prevents interference of the arm with the rear wall. [Prior art documents] [Patent documents]

[0005] [Patent Document 1] Japanese Patent Application Laid-Open No. 2015-123551 [Patent Document 2] JP 2008-028134 A (Patent No. 4098338 A) Summary of the Invention [Problem to be solved by the invention]

[0006] The pivot axis of the base end of the arm relative to the base is set on the base. Even the configuration described in Patent Document 2, in which the pivot axis of the base end of the arm is set near the rear wall of the transfer chamber, is subject to such design constraints. An opening for substrate transfer is provided in the rear wall of the transfer chamber, and a processing device (specifically, a load lock) is connected to this opening, so that the tip of the arm can enter and exit the load lock through this opening.

[0007] As shown in FIG. 5( a), the rear wall 13 of a conventional transfer chamber is configured to be linearly aligned in a plan view, including the area where the substrate transfer opening 13a is provided. This configuration also applies to the configuration described in Patent Document 2. In a configuration in which the rear boundary of the internal space 1S (transfer space 13S) of the transfer chamber 1 is defined solely by the linear rear wall 13, the entire base 21 of the transfer robot 2 is disposed within the transfer space 13S. Therefore, the pivot axis 2A of the base end of the arm 22 relative to the base 21 is set at a position spaced forward from the rear wall 13. As a result, the maximum length of the arm 22 is set in consideration of the distance between the rear wall 13 and the pivot axis 2A in the forward-rear direction D within the transfer space 13S. The operating range of the arm 22 is determined under these design constraints. As shown in the same figure (a), the space between the rear wall 13 and the rotation axis 2A in the forward / backward direction D in the transport space 13S becomes a dead space outside the operating range of the arm 22, and in a configuration in which a large number of load ports (four in the illustrated example) are arranged on the front wall 11 of the transport chamber 1, when attention is paid to the operating range of the arm 22 when loading and unloading the substrate W from the load ports at both ends, a space outside the operating range of the arm 22 (dead space 1SD) similar to the above-mentioned dead space is formed near the rear wall 13.

[0008] In order to increase the arm length to expand the arm's operating range within the above-mentioned design constraints, it is necessary to expand the depth (front-to-back direction) of the transfer space. However, expanding the depth (front-to-back direction) of the transfer space increases the area (footprint) occupied by the transfer room, which reduces the efficiency of equipment layout within the clean room.

[0009] The present invention has been made in response to these problems, and its main purpose is to provide a substrate transport device that can prevent or suppress the formation of a space outside the arm's operating range near the rear wall of the transport chamber within the interior space of the transport chamber, without increasing the footprint of the transport chamber. [Means for solving the problem]

[0010] That is, the present invention relates to a substrate transport device comprising: a transfer chamber having an internal space that is substantially closed with a load port connected to a front wall opening provided in the front wall; and a substrate transport robot disposed in the internal space of the transfer chamber, which is the internal space of the transfer chamber, and transporting substrates between a substrate storage container placed on the load port and a processing device arranged on the rear side of the transfer chamber; the transfer chamber defines the rear boundary of the internal space of the transfer chamber by a rear wall provided opposite the front wall and a rearward-protruding wall that protrudes further toward the processing device than the rear wall; and the substrate transport robot is an articulated robot having an arm having a plurality of arm elements connected in sequence to be horizontally rotatable around a base configured to be able to be raised and lowered, and the base-end pivot axis, which is the pivot axis at or near the base end of the arm, is set on the same plane as the rear wall or at a position closer to the rearward-protruding wall than the rear wall. Here, the "base end pivot axis of the arm" in this invention refers to the pivot axis that is set closest to the base end of the arm (closest to the base) among the multiple pivot axes when the arm, which has multiple arm elements and has multiple pivot axes set, is in the most extended state relative to the base.

[0011] After extensive research, the inventor has found that by adopting a configuration that satisfies both requirements i) and ii), i) the rear boundary of the internal space of the transport chamber (inside transport chamber space) is defined by a rear wall that is arranged in an orientation facing the front wall and a rear-protruding wall that protrudes further toward the processing device than the rear wall, and ii) the base-end pivot axis, which is the pivot axis at the base end of the arm or near the base end, is set on the same plane as the rear wall (i.e., on the same straight line as the rear wall in a plan view) or at a position closer to the rear-protruding wall than the rear wall, the rear wall can be set at a position closer to the front of the rear-protruding wall. As a result, as shown in Figure 5, in a known transport chamber in which the rear boundary of the substrate transport space is defined only by a rear wall that is parallel or approximately parallel to the front wall and is linear in plan view, it was found that, compared to a configuration in which the base end rotation axis of the arm relative to the base is set closer to the rear wall (see Figure 5(a)), the substrate transport device of the present invention, as shown in Figure 5(b), can prevent or suppress the formation of dead space 1SD near the rear wall 13, which is outside the operating range of the arm 22, while reducing the footprint of the transport chamber 1.

[0012] With such a substrate transport device according to the present invention, the base end pivot axis of the arm is no longer restricted by the position of the rear wall, making it possible to freely determine the arm length. Furthermore, even when increasing the arm length to expand the arm's operating range, there is no need to expand the depth direction (front-to-back direction) of the entire space within the transport chamber, thereby avoiding an increase in the footprint of the transport chamber.

[0013] The substrate transfer device according to the present invention is a type having a substrate transfer opening in the rear wall to which the load lock of the processing device is connected (see FIG. 2). 、8、13 ) or rearward projecting wall Main unit The type with a substrate transfer opening to which the load lock of the processing equipment is connected (Fig. 6 、10 (see below), and encompasses both of these types. The rearward-protruding wall main body is provided at a position connecting the rear ends of a pair of rearward-protruding side walls extending rearward from the rear wall, thereby constituting the rearward-protruding wall main body and forming an offset space that communicates with the interior space of the transport chamber.

[0014] Furthermore, in the substrate transport device of the present invention, if the transport chamber is provided with an offset opening that allows the base to be positioned in front of the rear protruding wall and on the same plane as the rear wall, the base can be positioned behind the rear wall (towards the processing device) using the offset opening.

[0015] In particular, in a substrate transport apparatus according to the present invention, in a configuration in which multiple load ports are arranged side by side on the front wall of the transfer chamber, the rear wall can be moved closer to the front wall so that the space between the rear wall and the arm movement range when substrates are loaded or unloaded from the load ports at both ends (dead space) is zero or close to zero, thereby effectively reducing the footprint of the transfer chamber.A substrate transport apparatus that employs a layout in which three or more load ports can be arranged at a predetermined pitch along the width direction of the transfer chamber can be cited as a configuration that further demonstrates these advantageous effects. [Effects of the Invention]

[0016] According to the present invention, by adopting a configuration that satisfies the requirements that the rear boundary of the space within the transport chamber be defined by a rear wall that is arranged in an orientation opposite the front wall and a rearward protruding wall that protrudes further toward the processing device than the rear wall, and that the base end rotation axis of the arm relative to the base be set on the same plane as the rear wall (i.e., on the same straight line as the rear wall in a plan view) or at a position closer to the rearward protruding wall than the rear wall, the rear wall of the rear wall and the rearward protruding wall that define the rear boundary of the space within the transport chamber can be set at a position closer to the front of the rearward protruding wall. As a result, as shown in Figure 5, in a known transfer chamber in which the rear boundary of the transfer chamber space is defined only by a rear wall that is parallel or approximately parallel to the front wall and is linear in plan view, the base end rotation axis of the arm relative to the base is set closer to the rear wall (Figure 5(a)), compared to this configuration, an example of which is shown in Figure 5(b) of the transfer substrate device of the present invention, can reduce the footprint of the transfer chamber while preventing or suppressing the formation of dead space near the rear wall in the transfer chamber space that is outside the operating range of the arm.Depending on the configuration and arrangement of the equipment, it is possible to provide a substrate transfer device that can reduce the footprint of the entire substrate manufacturing apparatus, including the transfer chamber and processing equipment. [Brief explanation of the drawings]

[0017] [Figure 1] FIG. 2 is a side view schematically showing the substrate transport apparatus according to the first embodiment of the present invention, to which a load port is connected. [Figure 2] FIG. 2 is a plan view schematically showing the substrate transfer device according to the embodiment to which the substrate processing apparatus is connected. [Figure 3] FIG. 2 is an overall external view of the substrate transport robot according to the embodiment. [Figure 4] FIG. 2 is a schematic cross-sectional side view of the substrate transport robot according to the embodiment. [Figure 5] 3A and 3B are explanatory views for comparing the substrate transfer apparatus according to the embodiment with a known substrate transfer apparatus; [Figure 6] FIG. 3 is a diagram showing a substrate transfer device according to a second embodiment of the present invention, corresponding to FIG. 2; [Figure 7]3A and 3B are explanatory views for comparing the substrate transfer apparatus according to the embodiment with a known substrate transfer apparatus; [Figure 8] FIG. 10 is a diagram showing a substrate transfer device according to a third embodiment of the present invention, corresponding to FIG. 2; [Figure 9] 3A and 3B are explanatory views for comparing the substrate transfer apparatus according to the embodiment with a known substrate transfer apparatus; [Figure 10] FIG. 10 is a view corresponding to FIG. 2 showing a substrate transfer device according to a fourth embodiment of the present invention. [Figure 11] 3A and 3B are explanatory views for comparing the substrate transfer apparatus according to the embodiment with a known substrate transfer apparatus; [Figure 12] FIG. 11 is a view showing a substrate transfer device according to a fifth embodiment of the present invention, corresponding to FIG. [Figure 13] 3 is a diagram showing the substrate transfer device according to the embodiment, corresponding to FIG. 2; FIG. DETAILED DESCRIPTION OF THE INVENTION

[0018] A first embodiment of the present invention will be described below with reference to the drawings.

[0019] First Embodiment As shown in Figures 1 and 2, the substrate transport device X of this embodiment is an apparatus that, in a semiconductor manufacturing process, includes a transport chamber 1 arranged in a clean room and a substrate transport robot 2 arranged in an inner space 1S of the transport chamber 1, and moves substrates W (semiconductor wafers) between a substrate storage container (FOUP 3) on a load port 4 (described later) and a substrate processing device 5 that performs semiconductor processing.

[0020] The transfer chamber 1 is configured so that a load port 4 can be connected to a front opening 11a (see FIG. 2) provided in the front wall 11. In this embodiment, four front openings 11a are provided at a predetermined pitch in the width direction on the front wall 11, which is linear in plan view, and each front opening 11a is connected to a load port 4. In FIG. 2, the front openings 11a are schematically shown by a relatively thick two-dot chain line.

[0021] The transfer chamber 1 defines the front boundary of the transfer chamber space 1S, which is the internal space of the transfer chamber 1, with its front wall 11. The load port 4 is placed tightly in the front opening 11a, thereby closing off the open space toward the front of the transfer chamber space 1S of the transfer chamber 1, and so the load port 4 can also be considered a part that defines the front boundary of the transfer chamber space 1S. In other words, the load port 4 forms part of the wall surface (front wall 11) of the transfer chamber 1, and in the semiconductor manufacturing process, the load port 4 and transfer chamber 1 placed in a clean room constitute an EFEM (Equipment Front End Module).

[0022] 1, the FOUP 3 placed on the load port 4 includes a FOUP body 32 whose internal space 3S can be opened only backward through a loading / unloading port 31, and a FOUP door 33 that can open the loading / unloading port 31. The FOUP 3 is a known structure that has multiple slots formed therein, each slot capable of accommodating a substrate W to be transported, and that allows these substrates W to be loaded and unloaded through the loading / unloading port 31. The upward surface of the FOUP body 32 is provided with a flange portion 34 that can be gripped by a device that automatically transports the FOUP 3 (for example, an overhead transport (OHT)). The FOUP 3 is placed on a mounting table 45 of the load port 4.

[0023] As shown in FIG. 1, the load port 4 of this embodiment comprises a plate-shaped frame 42 that forms part of the front wall 11 of the transfer chamber 1 and has an opening 41 formed therein for opening the internal space of the transfer chamber 1 (transfer chamber interior space 1S), a load port door 43 that opens and closes the opening 41 in the frame 42, a door opening / closing mechanism 44 that opens the opening 41 in the frame 42 by moving the load port door 43 to a door open position retracted toward the transfer chamber 1, and a mounting table 45 that is mounted on the frame 42 in an approximately horizontal position.

[0024] The frame 42 is arranged in an upright position and has a generally rectangular plate shape with an opening 41 large enough to communicate with the loading / unloading opening of the FOUP 3 placed on the mounting table 45. The opening 41 of the frame 42 is shown schematically in FIG.

[0025] The mounting table 45 is provided on top of a horizontal base 451 (support base) that is disposed in a substantially horizontal position slightly above the center of the frame 42 in the height direction, and is capable of mounting a FOUP 3 with the FOUP door 33, which opens and closes the internal space 3S of the FOUP body 32, facing the load port door 43. The mounting table 45 is configured to be movable toward and away from the frame 42 between a predetermined docking position where the FOUP door 33 approaches the opening 41 of the frame 42, and a position (see FIG. 1) where the FOUP door 33 is spaced a predetermined distance from the frame 42 beyond the docking position. In this embodiment, in the front-to-rear direction D (see FIG. 1, etc.) in which the FOUP 3 mounted on the mounting table 45 and the frame 42 are aligned, the FOUP 3 side is defined as the front, and the frame 42 side is defined as the rear.

[0026] The load port door 43 is configured to be movable integrally with the FOUP door 33 by a door opening / closing mechanism 44 between a fully closed position in which the opening 41 of the frame 42 is sealed, a door open position in which the door is retracted toward the transfer chamber 1 from the fully closed position, and a fully open position in which the opening space of the opening 41 is fully open to the rear while maintaining an engaged state with the FOUP door 33.

[0027] The load port 4 of this embodiment is equipped with a purge device (not shown) that can inject a purge gas made of an inert gas such as nitrogen into the internal space 3S of the FOUP 3 and replace the gas atmosphere in the internal space 3S of the FOUP 3 with the purge gas. Note that the present invention may also apply to a load port that does not have a purge device.

[0028] The substrate transfer device X according to this embodiment has a plurality of such load ports 4 (four in the illustrated example) arranged side by side on the front wall 11 of the transfer chamber 1, a substrate processing apparatus 5 (see FIG. 2) provided at the rear of the transfer chamber 1, and is configured so that substrates W can be transferred between the FOUP 3 and the substrate processing apparatus 5 by a substrate transfer robot 2 provided in the internal space of the transfer chamber 1 (transfer chamber space 1S). Note that in FIG. 2, the load ports 4 are omitted, but the substrates W in the FOUP 3 placed on the mounting table 45 are shown by imaginary lines. Also, as shown in the same figure, within the transfer chamber space 1S, a predetermined area close to the front wall 11 and communicating with the front-side opening 11a is defined in the SEMI standard as a movable area 1R for moving each load port door 43 to an open position.

[0029] 1 to 3, the substrate transfer robot 2 is an articulated robot installed in a clean room, in which a plurality of arm elements 23, 24 constituting an arm 22 and hands 25, 26 are connected to a base 21 so as to be rotatable in sequence. In Fig. 2, a state (configuration) in which the entire arm 22, including the hands 25, 26 facing directly ahead while holding a substrate W, is shown by solid lines within the transfer chamber space 1S, and various other configurations are shown by imaginary lines. In this embodiment, the direction in which the arm 22 extends is defined as the front side (tip side), and the opposite side is defined as the rear side (base side).

[0030] As shown in FIGS. 3 and 4 (FIG. 4 is a side cross-sectional view of the substrate transfer robot 2, and the parallel diagonal lines (hatching) applied to the cross-sectional portion have been omitted in this figure), the base 21 includes a fixed base 211 and a movable base 212 supported by the fixed base 211 so as to be able to move up and down. The first arm element 23 is supported at its base end on the movable base 212 and is rotatable about a pivot axis 2A set in the vertical direction. This pivot axis 2A corresponds to the "base end pivot axis that is the pivot axis at or near the base end of the arm" in this invention. In this embodiment, the lift axis 2D of the movable base 212 relative to the fixed base 211 and the base end pivot axis 2A are set on the same vertical line.

[0031] At the tip of first arm element 23, second arm element 24 is supported at its base end, and is rotatable about pivot axis 2B set in the vertical direction. Furthermore, at the tip of second arm element 24, lower hand 25 and upper hand 26 are arranged parallel to each other above and below, and are supported rotatable about the same pivot axis 2C. Lower hand 25 and upper hand 26 can each hold a substrate W individually.

[0032] As shown in Fig. 4, the movable base 212 is configured to be movable up and down by an elevating mechanism 2E provided inside the fixed base 211. The first arm element 23 is rotatably supported by the movable base 212 and is rotatable about a base-end pivot axis 2A by a drive mechanism 23R provided inside the movable base 212. A second arm element 24 is supported at the tip of the first arm element 23 so as to be rotatable about a pivot axis 2B, and a drive mechanism 24R for rotating this is housed inside the first arm element 23. A lower hand 25 and an upper hand 26 are supported at the tip of the second arm element 24 so as to be rotatable about the same pivot axis 2C, and drive mechanisms 25R and 26R for rotating these hands are housed inside the second arm element 24. Each of the hands 25 and 26 is equipped with a clamping mechanism.

[0033] The substrate transport device X of this embodiment is configured so that such a substrate transport robot 2 is placed in the internal space of the transport chamber 1 (inside transport chamber space 1S), and the height position of the arm 22 can be changed, or the state of the arm 22 can be changed from a folded state to an appropriate extended state or bent state, thereby enabling the substrate W to be transported into a FOUP 3 or a substrate processing device 5.

[0034] 1 and 2, the transfer chamber 1 of this embodiment defines a front boundary of the transfer chamber interior space 1S by a front wall 11, a side boundary of the transfer chamber interior space 1S by a pair of left and right side walls 12, and a rear boundary of the transfer chamber interior space 1S by a rear wall 13 disposed opposite the front wall 11 and a rearward-protruding wall 14 protruding further toward the substrate processing apparatus 5 than the rear wall 13. In this embodiment, as shown in FIG. 2, the left and right side portions of the rear boundary of the transfer chamber interior space 1S are defined by the left and right rear walls 13, and the central portion of the rear boundary is defined by the rearward-protruding wall 14. Each of the left and right rear walls 13 is provided with a substrate transfer opening 13a, which is individually connected to a load lock 51 of the substrate processing apparatus 5. That is, the substrate processing apparatus 5 of this embodiment is configured to include a pair of left and right load locks 51, and to transport substrates W to the substrate processing apparatus main body 52 via the load locks 51 for appropriate processing.

[0035] The rearward protruding wall 14 is provided between the left and right rear walls 13 and has an offset space 14S therein that is recessed from the rear walls 13 in the front-rear direction D. As shown in FIG. 2 , the rearward protruding wall 14 of this embodiment includes rearward protruding side walls 141 extending rearward from the center edges of the left and right rear walls 13, and a rearward protruding wall main body 142 provided at a position connecting the rear ends of the rearward protruding side walls 141. The offset space 14S surrounded by the rearward protruding side walls 141 and the rearward protruding wall main body 142 communicates with a transfer space 13S that is a space in front of the rear wall 13. An offset opening 14a is formed at the boundary between the offset space 14S and the transfer space 13S, i.e., in a position in front of the rearward protruding wall 14 and on the same plane as the rear wall 13, allowing a part or all of the base 21 of the substrate transfer robot 2 (in the illustrated example, the rear end portion of the base 21) to be placed in the offset space 14S (see FIG. 2 ). Therefore, the horizontal dimension (width dimension) of the rearward protruding wall 14 in this embodiment is at least equal to or greater than the width dimension of the base 21 of the substrate transfer robot 2 and less than the overall length of the arm 22 of the substrate transfer robot 2. FIG. 2 illustrates an example in which the width dimension of the rearward protruding wall 14 is set to be smaller than the length of the longest arm element among the multiple arm elements 23, 24 (the overall length of the entire arm elements when the arm elements 23, 24 are folded so as to overlap each other; this definition applies hereinafter). The width dimension of the rearward protruding wall 14 may be set to any appropriate dimension as long as it does not adversely affect the operation of the arm 22 when the arm 22 is in operation. For example, the width dimension of the rearward protruding wall 14 may be set to be equal to or greater than the width dimension of the base 21 of the substrate transfer robot 2 and greater than the length of the longest arm element among the multiple arm elements 23, 24. In this case, the width dimension of the rearward protruding wall 14 may be set to be smaller than the sum of the length of the longest arm element among the multiple arm elements 23, 24 and the overall length of the hands 25, 26 with the wafer W loaded thereon. The width of the rearward protruding wall 14 may be set larger than the length of the longest arm element among the arm elements 23, 24 plus the total length of the hands 25, 26 with the wafer W placed thereon.In this embodiment, the offset opening 14a is formed on the same plane as the rear wall 13 (that is, on the same straight line as the rear wall 13 in a plan view). In this embodiment, the ceiling surface 143 of the offset space 14S is set lower than the ceiling surface 15 of the transport space 13S under conditions that do not adversely affect the up and down movement of the substrate transport robot 2 (see FIG. 1).

[0036] In the substrate transport device X of this embodiment, the base end pivot axis 2A of the arm 22 is set to be on the same plane as the rear wall 13 (i.e., on the same straight line as the rear wall 13 in a plan view) or at a position slightly rearward from the position on the same plane as the rear wall 13 (a position slightly rearward from the position on the same straight line as the rear wall 13 in a plan view).

[0037] In the substrate transport apparatus X according to this embodiment, with the load port door 43 open, the movable base 212 of the substrate transport robot 2 is raised and lowered, and the arm 22 is appropriately operated. This allows the substrate W removed from the FOUP 3 to be transferred to the load lock 51 via the transfer chamber space 1S, or the substrate W processed by the substrate processing apparatus 5 to be transported from the load lock 51 and stored in the FOUP 3 via the transfer chamber space 1S. In this embodiment, the substrate W does not pass through the offset space 14S during transport. In addition, in the substrate transport apparatus X according to this embodiment, a fan filter unit (not shown) provided in the transfer chamber space 1S can be driven to generate a downward air current in the transfer chamber space 1S, allowing a highly clean inert gas (environmental gas) such as nitrogen to be circulated in the substrate transport space 13S. The present invention is not limited to a circulation type, and also includes a substrate transport apparatus having a general configuration that simply generates a downward air current.

[0038] In particular, according to the substrate transport device X of this embodiment, a transport chamber 1 is used that has a rearward protruding wall 14 that protrudes toward the substrate processing device 5 more than the rear wall 13, and the base end rotation axis 2A of the arm 22 relative to the base 21 of the substrate transport robot 2 is set on the same plane as the rear wall 13 (i.e., on the same straight line as the rear wall 13 in a plan view) or at a position slightly further rearward than the rear wall 13.Therefore, of the rear wall 13 and the rearward protruding wall 14 that define the rear side boundary of the transport chamber interior space 1S, the rear wall 13 can be set at a position closer to the front than the rearward protruding wall 14. As a result, in the substrate transport device X of this embodiment shown in Figure 5(b), the position of the rear wall 13 can be set closer to the front by a distance L in the figure, compared to the known substrate transport device shown in the same figure(a), i.e., a substrate transport device in which the base end pivot axis 2A of the arm 22 relative to the base 21 is set closer to the rear wall 13 in a transport chamber 1 in which the rear boundary of the transport chamber interior space 1S is defined only by a rear wall 13 that is linear in a plan view and parallel or approximately parallel to the front wall 11. This makes it possible to reduce the footprint of the transport chamber 1 while preventing or suppressing the formation of a dead space 1SD (see Figure 5(a)) in the transport chamber interior space 1S near the rear wall 13, which is outside the operating range of the arm 22.

[0039] Thus, according to the substrate transport device X of this embodiment, by locating the rear protruding wall 14 at a position rearward of the rear wall 13, the base end rotation axis 2A of the arm 22 is no longer restricted by the position of the rear wall 13, making it possible to freely determine the arm length. Furthermore, even when increasing the arm length to expand the operating range of the arm 22, there is no need to expand the depth direction (front-to-back direction D) of the entire transport chamber interior space 1S of the transport chamber 1, and therefore it is possible to avoid increasing the footprint of the transport chamber 1.

[0040] In addition, as shown in FIG. 2, the substrate transport device X according to this embodiment is configured such that a pair of left and right rear walls 13 are each provided with a substrate transfer opening 13a, and each substrate transfer opening 13a is connected to a load lock 51 of the substrate processing apparatus 5. Therefore, the rear protruding wall 14 can be placed in the free space formed between the left and right load locks 51 on the rear side of the transport chamber 1, thereby enabling effective use of space.

[0041] Furthermore, in the substrate transport device X of this embodiment, an offset opening 14a is provided in which the base 21 of the substrate transport robot 2 can be positioned in front of the rear protruding wall 14 and on the same plane as the rear wall 13, so that the base 21 can be positioned behind the rear wall 13 (towards the substrate processing device 5) using the offset opening 14a.

[0042] Second Embodiment Next, a second embodiment of the present invention will be described with reference to FIG. The substrate transfer device X of this embodiment differs from the first embodiment described above in that, as shown in FIG. 6, the substrate processing device 5 (load lock 51) is connectable only to the central portion in the width direction on the rear side of the transfer chamber 1.

[0043] That is, in the transfer chamber 1 of this embodiment, the rear boundary of the transfer chamber inner space 1S is defined by a rear wall 13 provided in an orientation facing the front wall 11 and a rear-protruding wall 14 that protrudes further toward the substrate processing apparatus 5 than the rear wall 13. The rear wall 13 does not have a substrate transfer opening 13a, but the rear-protruding wall 14 (specifically, the rear-protruding wall main body 142) has a substrate transfer opening 14b. The rear-protruding wall 14 is provided between the left and right rear walls 13 and has an offset space 14S therein that is recessed from the rear walls 13 in the front-to-rear direction D. The offset opening 14a is formed at the boundary between the offset space 14S and the transfer space 13S, that is, in front of the rear-protruding wall 14 and on the same plane as the rear wall 13.

[0044] 7(b) 。 In the substrate transport apparatus X according to this embodiment, the base end pivot axis 2A of the arm 22 is set to be on the same plane as the rear wall 13 (i.e., on the same straight line as the rear wall 13 in a plan view) or at a position slightly rearward of the rear wall 13. Therefore, the substrate transport apparatus X according to this embodiment shown in FIG. 7(b) has the same effects as the substrate transport apparatus X according to the first embodiment described above, and compared to the known substrate transport apparatus shown in FIG. 7(a) , that is, the substrate transport apparatus in which the base end pivot axis 2A of the arm 22 relative to the base 21 is set to be closer to the rear wall 13 in a transport chamber 1 in which the rear boundary of the substrate transport space 13S is defined only by the rear wall 13 that is parallel or substantially parallel to the front wall 11 in a straight line in a plan view, the substrate transport apparatus X according to this embodiment shown in FIG. 7(b) can reduce the footprint of the transport chamber 1 and prevent or suppress the formation of a dead space 1SD (see FIG. 7(a)) outside the operating range of the arm 22 near the rear wall 13 in the interior space 1S of the transport chamber.

[0045] In particular, the substrate transfer apparatus X according to this embodiment is configured such that the substrate transfer opening 14b is provided only in the rear protruding wall main body 142, and the load lock 51 of the substrate processing apparatus 5 is connected to the substrate transfer opening 14b. In this configuration, the rear wall 13 can be set to a position forward of the rear protruding wall 14, so that the maintenance work area (the area surrounded by the dashed dotted line in the figure) formed on both sides of the load lock 51 located in the center of the width direction on the rear side of the transfer chamber 1 can be expanded in the front-rear direction D, contributing to improved efficiency of maintenance and inspection work. In the substrate transfer apparatus X according to this embodiment, the substrate transfer opening 14b is provided only in the rear protruding wall main body 142, and the substrate W passes through the offset space 14S when being transferred by the substrate transfer robot 2, which also differs from the first embodiment in this respect.

[0046] Third Embodiment Next, a third embodiment of the present invention will be described with reference to FIG. The substrate transport device X according to this embodiment has a configuration similar to that of the first embodiment, but differs from the first embodiment in that five front side openings 11a are provided at a predetermined pitch in the width direction on a front wall 11 that is linear in plan view, and a load port 4 can be connected to each of the front side openings 11a. The substrate transport apparatus X of this embodiment, in which five load ports 4 are connected to the front wall 11, can further reduce the space required in the front-to-rear direction D from the front wall 11 to the rear wall 13, compared to the substrate transport apparatus X of the first embodiment, in which four load ports 4 are connected to the front wall 11. That is, in a known transport chamber 1 in which the rear boundary of the substrate transport space 13S is defined only by the rear wall 13 that is linear in plan view and parallel or substantially parallel to the front wall 11, the dead space 1SD (see FIG. 9(a)) generated near the rear wall 13 tends to increase as the number of load ports 4 connectable to the front wall 11 increases. The substrate transport apparatus X of this embodiment is configured so that the rear wall 13 can be located forward of the rear protruding wall 14, making it possible to reduce this dead space 1SD to nearly zero. As a result, even if the substrate transport device X of this embodiment shown in Figure 9(b) is configured with a transport chamber 1 that can accommodate a large number of load ports side by side, which would increase the dead space 1SD, it is possible to avoid an increase in the dead space 1SD and reduce the footprint of the transport chamber 1 by shortening the distance between the front wall 11 and the rear wall 13 of the transport chamber 1 within a range that does not adversely affect the forward and backward movement of the arm 22.

[0047] Furthermore, in the substrate transport apparatus X according to this embodiment, the base end pivot axis 2A of the arm 22 is set at a position closer to the rear protruding wall 14 than the rear wall 13 (a position rearward of the position on the same line as the rear wall 13). In particular, in the substrate transport apparatus X according to this embodiment, the base end pivot axis 2A of the arm 22 is set at a position spaced rearward from the rear wall 13, as compared to the first embodiment. By adopting such a configuration in which the base end pivot axis 2A of the arm 22 is set at a position that enters the offset space 14S, it is possible to further reduce the footprint of the transport chamber 1 (see FIGS. 7 and 9).

[0048] Fourth Embodiment Next, a fourth embodiment of the present invention will be described with reference to FIG. The substrate transport device X according to this embodiment has a configuration similar to that of the second embodiment, and differs from the second embodiment in that five front side openings 11a are provided at a predetermined pitch in the width direction on a front wall 11 that is linear in plan view, and a load port 4 can be connected to each of the front side openings 11a.

[0049] Furthermore, according to the substrate transport device X of this embodiment, in which five load ports 4 are connected to the front wall 11, similar to the substrate transport device X of the third embodiment, the distance between the rear wall 13 and the front wall 11 of the transport chamber 1 can be shortened compared to the substrate transport device X of the second embodiment, in which four load ports 4 are connected to the front wall 11, thereby avoiding an increase in dead space 1SD and achieving a further reduction in the footprint of the transport chamber 1 (see FIG. 11).

[0050] Furthermore, in the substrate transport apparatus X according to this embodiment, the base end pivot axis 2A of the arm 22 is set at a position closer to the rear protruding wall 14 than the rear wall 13 (a position rearward of the position on the same line as the rear wall 13). In particular, in the substrate transport apparatus X according to this embodiment, the base end pivot axis 2A of the arm 22 is set at a position spaced rearward from the rear wall 13, as compared to the second embodiment. By adopting such a configuration in which the base end pivot axis 2A of the arm 22 is set at a position that enters the offset space 14S, it is possible to further reduce the footprint of the transport chamber 1 (see FIGS. 9 and 11).

[0051] Fifth Embodiment Next, a fifth embodiment of the present invention will be described with reference to FIGS. The substrate transport device X according to this embodiment has a configuration similar to that of the first embodiment, but differs from the first embodiment in that the base 21 of the substrate transport robot 2 includes a base main body 21A and a base arm 21B (offset arm) fixed on the upper surface of the base main body 21A in a position protruding into the offset space 14S, the base main body 21A of the base 21 is not disposed in the offset space 14S, and only the base arm 21B (offset arm) is disposed in the offset space 14S, and the base end pivot axis 2A of the arm 22 relative to the base arm 21B (offset arm) is set at a position closer to the rear protruding wall 14 than the rear wall 13 (a position rearward of the position on the same line as the rear wall 13). By adopting such a configuration, the base end pivot axis 2A and the lift axis 2D of the arm 22 are set at a position offset from each other in the front-to-rear direction D, without overlapping on the same vertical line.

[0052] The substrate transport device X of this embodiment has the same effects as the substrate transport device X of the first embodiment described above, and since there is no need to place the base main body 21A in the offset space 14S, as shown in FIG. 12, compared to the substrate transport device X of the first embodiment, the bottom wall 144 that defines the bottom boundary of the offset space 14S can be set at a position higher than the bottom wall 16 that defines the bottom boundary of the transport space 13S under conditions that do not interfere with the base arm 21B (offset arm). This makes it possible to effectively utilize the space below the bottom wall 144 that defines the bottom boundary of the offset space 14S and further reduce the footprint of the transport chamber 1.

[0053] The configuration according to this embodiment is also applicable to the substrate transport apparatus X according to the second to fourth embodiments described above.

[0054] The present invention is not limited to the above-described embodiments. For example, while the above-described embodiments illustrate a configuration in which four or five load ports are connected to the front wall of the transfer chamber, a configuration in which three or fewer or six or more load ports are connected can also be adopted. The number of front openings formed in the front wall can be adjusted depending on the number of load ports to be connected.

[0055] Furthermore, in the above-described embodiments, a configuration in which one or two load locks are connected to the rear of the transfer chamber has been exemplified, but a configuration in which three or more load locks are connected can also be adopted. The number of substrate transfer openings formed in the rear wall or rear protruding wall can be adjusted depending on the number of load locks to be connected. Processing device components other than the load locks (such as an aligner or a temporary stage) of the substrate processing device may also be connected to the substrate transfer openings.

[0056] The amount of rearward protrusion (protrusion dimension) of the rearward protruding wall relative to the rear wall may be set to be changeable and adjustable as appropriate. The shape of the rearward protruding wall is not limited to the shapes exemplified in the above-mentioned embodiments, and for example, the offset space may be set to a polygonal shape other than a square in plan view, or a semicircular or elliptical shape in plan view. Furthermore, the left and right rear walls positioned forward of the rearward protruding wall may be shaped such that they are not on the same line, for example, they may be shaped to gradually slope rearward toward the rearward protruding wall.

[0057] Regarding the substrate transport robot, the number and shape of arm elements, the shape and presence of hands, the shape of the base, the position of the lifting axis, etc. can be changed or selected as appropriate.

[0058] Furthermore, a storage container other than a FOUP can also be used as the substrate storage container.

[0059] Furthermore, the specific configuration of each part is not limited to the above embodiment, and various modifications are possible within the scope of the present invention. [Explanation of symbols]

[0060] 1...Transportation room 11…Front wall 11a…Front side opening 13…Back wall 13a, 14b...Openings for transferring substrates 14...Rear protruding wall 14a...Offset opening 1S: Transport room space 2...Substrate transport robot 21...Bass 22...Arm 23, 24...Arm elements (first arm element, second arm element) 2A...Base end pivot axis 3...Floor-Up Uprights (FOUP) 4. Loading port 5...Substrate processing equipment 51...Load Lock X...Substrate transport device

Claims

1. a transfer chamber having an internal space that is substantially closed with a load port connected to at least a front side opening provided in a front wall; a substrate transport robot that is disposed in an interior space of the transfer chamber, which is an internal space of the transfer chamber, and that transports substrates between a substrate storage container placed on the load port and a processing device disposed on a rear side of the transfer chamber, the transfer chamber defines a rear boundary of an interior space of the transfer chamber by a rear wall provided opposite to a front wall and a rear-protruding wall protruding further toward the processing apparatus than the rear wall, and the rear wall is provided with a substrate transfer opening to which a load lock of the processing apparatus is connected; The substrate transport robot A multi-joint robot having an arm with a plurality of arm elements connected in sequence so as to be horizontally rotatable, with a base configured to be able to be raised and lowered as a base point, A substrate transport device characterized in that the base end pivot axis, which is the pivot axis at or near the base end of the arm, is set on the same plane as the rear wall or at a position closer to the rear protruding wall than the rear wall.

2. a transfer chamber having an internal space that is substantially closed with a load port connected to at least a front side opening provided in a front wall; a substrate transport robot that is disposed in an interior space of the transfer chamber, which is an internal space of the transfer chamber, and that transports substrates between a substrate storage container placed on the load port and a processing device disposed on a rear side of the transfer chamber, the transfer chamber defines a rear boundary of an interior space of the transfer chamber by a rear wall provided opposite to a front wall and a rear protruding wall protruding further toward the processing device than the rear wall, the rearward-projecting wall has a pair of rearward-projecting side walls extending rearward from the rear wall, and a rearward-projecting wall main body provided at a position connecting rear ends of the rearward-projecting side walls, and a substrate transfer opening to which a load lock of the processing apparatus is connected is provided only in the rearward-projecting wall main body; The substrate transport robot A multi-joint robot having an arm with a plurality of arm elements connected in sequence so as to be horizontally rotatable, with a base configured to be able to be raised and lowered as a base point, A substrate transport device characterized in that the base end pivot axis, which is the pivot axis at or near the base end of the arm, is set on the same plane as the rear wall or at a position closer to the rear protruding wall main body than the rear wall.

3. The substrate transport apparatus according to claim 2 , wherein the rearwardly protruding wall body is provided substantially parallel to the rear wall.

4. a transfer chamber having an internal space that is substantially closed with a load port connected to at least a front side opening provided in a front wall; a substrate transport robot that is disposed in an interior space of the transfer chamber, which is an internal space of the transfer chamber, and that transports substrates between a substrate storage container placed on the load port and a processing device disposed on a rear side of the transfer chamber, the transfer chamber defines a rear boundary of a space within the transfer chamber by a rear wall provided opposite a front wall and a rearward protruding wall protruding toward the processing device beyond the rear wall, and an offset opening is provided in front of the rearward protruding wall and on the same plane as the rear wall, allowing a base to be disposed therein; The substrate transport robot a multi-joint robot including an arm having a plurality of arm elements connected in sequence so as to be horizontally rotatable, the arm having the base configured to be able to be raised and lowered as a base point, A substrate transport device characterized in that the base end pivot axis, which is the pivot axis at or near the base end of the arm, is set on the same plane as the rear wall or at a position closer to the rear protruding wall than the rear wall.

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