Ion beam irradiation equipment

The ion beam irradiation device improves efficiency and reduces connection errors by using a movable holding member to manage multiple power supply members, ensuring safe and efficient operation.

JP7821398B2Active Publication Date: 2026-02-27NISSIN ION EQUIPMENT CO LTD
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Patent Information

Application Number
JP2022131162
Authority / Receiving Office
JP · JP
Patent Type
Patents
Current Assignee / Owner
Filing Date
2022-08-19
Publication Date
2026-02-27
Estimated Expiration
2042-08-19

AI Technical Summary

Technical Problem

The manual connection and disconnection of multiple power supply members to and from ion sources in ion beam irradiation devices is inefficient and prone to errors, especially with larger substrates and ion sources, requiring significant workspace and increasing the risk of connection errors and damage.

Method used

An ion beam irradiation device with a movable holding member that collectively holds multiple power supply members, allowing them to transition between a connection position and a retracted position, and is supported by a shaft member for easy rotation along a predetermined trajectory, preventing damage and interference.

Benefits of technology

This configuration enhances work efficiency and reduces the time required for connecting and disconnecting power supply members, while minimizing the risk of damage and ensuring smooth ion source transportation.

✦ Generated by Eureka AI based on patent content.

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Abstract

To provide an ion beam irradiation device in which work to connect a power supply member to an ion source and work to remove a power supply member from an ion source can be efficiently performed.SOLUTION: An ion beam irradiation device includes: an ion source 10; a plurality of power supply members 50 supplying power to the ion source 10; and a holding member 60 collectively holding the plurality of power supply members 50. The holding member 60 is provided to be movable between a connection position P where the power supply members 50 are connected to the ion source 10 and an evacuation position Q where the holding member is evacuated from the connection position P to disconnect the power supply members 50 and the ion source 10.SELECTED DRAWING: Figure 7
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Description

[Technical Field]

[0001] The present invention relates to an ion beam irradiation device. [Background technology]

[0002] When assembling an ion beam irradiation device or after maintenance of the ion source, the ion source attached to the device body needs to be connected to a power supply member such as an electric cable in order to supply power to the filament as shown in Patent Document 1. Conventionally, after the ion source is attached to the device body, an operator manually connects multiple power supply members to the ion source one by one.

[0003] Recently, as the substrates to be processed have become larger, the ion sources have also become larger, and therefore the number of filaments used in the ion sources has increased, resulting in a greater number of power supply members that must be connected than before.

[0004] Therefore, if a worker manually connects the power supply members one by one as has been done up until now, the work efficiency is low and the possibility of connection errors increases.

[0005] Furthermore, when the ion source is attached to the main body of the device, it is brought in next to the main body of the device on a dolly, and then lifted by a lifting unit and attached to the main body of the device. Therefore, it is necessary to secure a working space for these operations near the main body of the device.

[0006] Therefore, before installing the ion source in the main body of the apparatus, the operator must move the power supply members out of the work space. After installing the ion source in the main body of the apparatus, the operator must then route the power supply members to the ion source and connect them to the ion source. This process of manually routing the power supply members one by one is inefficient.

[0007] These various problems occur not only when the ion source is attached, but also when the power supply member is removed from the ion source when the ion source is removed from the main body of the apparatus. [Prior art documents] [Patent documents]

[0008] [Patent Document 1] Japanese Patent Application Publication No. 2019-067488 Summary of the Invention [Problem to be solved by the invention]

[0009] SUMMARY OF THE INVENTION It is therefore a main object of the present invention to enable efficient operation of connecting a power supply member to an ion source and detaching the power supply member from the ion source. [Means for solving the problem]

[0010] That is, the ion beam irradiation device according to the present invention comprises an ion source, a plurality of power supply members that supply power to the ion source, and a holding member that holds the plurality of power supply members together, and is characterized in that the holding member is movable between a connection position where the power supply members are connected to the ion source and a retracted position where the holding member is retracted from the connection position and the power supply members are disconnected from the ion source. In this specification, the term "connection position where the power supply member is connected to the ion source" refers not only to a position where the power supply member is connected to the ion source at the same time as the holding member is moved to the connection position, but also to a position where the power supply member is connected to the ion source through a separate operation after the holding member is moved to the connection position.

[0011] According to the ion beam irradiation device configured in this manner, a holding member that holds multiple power supply members together is arranged to be movable between a connection position and a retracted position, thereby improving work efficiency compared to the conventional case in which an operator had to pull out the power supply members one by one, and also shortening the work time around the ion source.

[0012] However, if the holding member is allowed to move freely between the connected position and the retracted position, there is a risk that the power supply member may come into contact with surrounding structures and be damaged. Therefore, it is preferable that the holding member moves along a predetermined trajectory between the connection position and the retracted position. With this configuration, by determining a path that prevents the power supply member from coming into contact with the structure, it is possible to prevent the power supply member from being damaged.

[0013] Moreover, the ion beam irradiation device according to the present invention preferably includes a shaft member that supports the holding member rotatably along a horizontal circular orbit. If the holding member is configured in this way so that it can rotate along a horizontal circular orbit, the worker does not need to lift the holding member, and since the load of the power supply member and the holding member is supported by the shaft member, the worker can easily move the holding member even by hand.

[0014] Furthermore, it is preferable that the ion beam irradiation device according to the present invention further comprises an ion source transport mechanism for attaching the ion source to the device main body or for detaching the ion source from the device main body, and that the retracted position is set at a position that avoids a transport path of the ion source transported by the ion source transport mechanism. With this configuration, the holding member in the retracted position does not interfere with the transportation of the ion source, and workability in the transportation of the ion source can be ensured.

[0015] It is preferable that the holding member has a pressure-receiving portion provided at the tip end opposite the base end supported by the shaft member, and that the distance from the shaft member to the pressure-receiving portion is longer than the distance from the shaft member to the power supply terminal portion of the power supply member. With this configuration, when an operator presses the pressed portion, the moment that rotates the holding member is greater than when the operator presses the area near the power supply terminal portion, making it easier to move the holding member. [Effects of the Invention]

[0016] According to the present invention configured as described above, the efficiency of the work of connecting the power supply member to the ion source and the work of removing the power supply member from the ion source is improved. [Brief explanation of the drawings]

[0017] [Figure 1] 1 is a schematic diagram showing the overall configuration of an ion beam irradiation apparatus according to an embodiment of the present invention. [Figure 2] FIG. 2 is a schematic diagram showing the configuration of an ion source according to the embodiment. [Figure 3] FIG. 2 is a schematic diagram showing the peripheral structure of the ion source according to the embodiment. [Figure 4] 5A and 5B are schematic diagrams showing the configurations of a power supply member and a holding member of the embodiment; [Figure 5] FIG. 2 is a schematic diagram showing an internal configuration of a holding member of the embodiment. [Figure 6] 5A to 5C are schematic diagrams showing the operation of the holding member of the embodiment. [Figure 7] 5A and 5B are schematic diagrams showing a connection position and a retracted position of the holding member of the embodiment; [Figure 8] 10A and 10B are schematic diagrams showing the configuration of a holding member in another embodiment. DETAILED DESCRIPTION OF THE INVENTION

[0018] An embodiment of an ion beam irradiation apparatus according to the present invention will be described below with reference to the drawings.

[0019] 1, the ion beam irradiation apparatus 100 of this embodiment is an ion implantation apparatus used to irradiate the surface of a substrate A with an ion beam IB to implant ions into the substrate A and to modify the characteristics of the substrate A to desired values. The substrate A is, for example, for a flat panel display (FPD), and specifically, is a glass substrate or a synthetic resin substrate. Note that the ion beam irradiation apparatus 100 is not limited to an ion implantation apparatus, and may be, for example, an ion beam etching apparatus or the like.

[0020] This ion beam irradiation device 100 performs mass analysis on an ion beam IB extracted from an ion source 10 using a mass analyzer 20, and then irradiates the ion beam IB onto a substrate A held by a substrate holder 30, thereby implanting desired ion species into the substrate A.

[0021] As shown in FIG. 2, the ion source 10 includes a plasma generating vessel 11, an extraction electrode system 12 consisting of a plurality of electrodes that extracts an ion beam IB from the plasma generating vessel 11, a plurality of magnets 13 that form a cusp magnetic field inside the plasma generating vessel 11, and a plurality of filaments 14 that emit electrons into the plasma generating vessel 11.

[0022] This ion source 10 is attached to the apparatus main body X as shown in FIG. 3 during ion beam irradiation, and is removed from the apparatus main body X during maintenance or the like, although this is not shown in the drawing.

[0023] Therefore, the ion beam irradiation device 100 of this embodiment is provided with an ion source transport mechanism 40 for attaching the ion source 10 to the device body X or for removing the ion source 10 from the device body X, as shown in FIG.

[0024] To briefly explain the installation and removal of the ion source 10, when installing the ion source 10, an operator first places the ion source 10 in a lying position on a dolly Z and carries it to the side of the apparatus main body X.

[0025] Next, the operator drives the ion source transport mechanism 40 to raise the ion source 10 on the cart Z, transport it to a predetermined mounting position in the apparatus main body X, and fasten the ion source 10 in the raised position to the apparatus main body X.

[0026] On the other hand, when removing the ion source 10, the operator drives the ion source transport mechanism 40 again and removes the ion source 10 in the upright position from the apparatus main body X while hanging it from the ion source transport mechanism 40.

[0027] Next, the operator transports the ion source 10 removed from the apparatus main body X to above the cart Z using the ion source transport mechanism 40, places the ion source 10 on the cart Z while tilting it over, and transports it to a location away from the apparatus main body X.

[0028] To perform such an operation, the ion source transport mechanism 40 suspends the ion source 10 and moves the ion source 10 up and down and horizontally.

[0029] More specifically, as shown in FIG. 3 , the ion source transport mechanism 40 includes a first moving member 41 for moving the ion source 10 up and down, a second moving member 42 for moving the ion source 10 horizontally, a plurality of support columns 43 for supporting the first moving member 41 and the second moving member 42, and a drive source (not shown) for moving the first moving member 41 and the second moving member 42.

[0030] In this embodiment, four pillars 43 are arranged near the device main body X so that they are positioned at each vertex of a quadrangle when viewed from above, and the above-mentioned cart Z can enter and exit the area S surrounded by these pillars 43.

[0031] The first moving member 41 directly or indirectly supports the ion source 10 and moves up and down along the support 43 .

[0032] This first moving member 41 has an elongated shape that extends, for example, along the direction in which the ion source 10 is advanced and retreated relative to the apparatus body X (hereinafter also referred to as the advancing and retreating direction), and here, a pair of first moving members 41 spaced apart in the width direction of the ion source 10 are each supported by two support pillars 43.

[0033] The second moving member 42 directly or indirectly supports the ion source 10 and moves the ion source 10 at least in the forward and backward direction. The second moving member 42 may also move in the width direction of the ion source 10.

[0034] This second moving member 42 has an elongated shape extending, for example, along the width direction of the ion source 10, and here it is bridged between the pair of first moving members 41 described above and supported by these first moving members 41.

[0035] With this configuration, at least a part of the transport path of the ion source 10 transported by the ion source transport mechanism 40 is set within the area S surrounded by the four support columns 43.

[0036] Furthermore, the ion beam irradiation device 100 of this embodiment includes a cabinet C that houses the ion source 10 attached to the device body X and serves as a radiation-shielding room, as shown in Fig. 3. For ease of explanation, Fig. 3 shows only one wall C1 constituting the cabinet C, and omits the illustration of the other walls.

[0037] The cabinet C also houses the first moving member 41, the second moving member 42, and the plurality of support columns 43 that constitute the ion source transport mechanism 40 described above.

[0038] In this configuration, the ion beam irradiation device 100 of this embodiment is characterized by the structure for supplying power to the ion source 10 and its peripheral structure, which will be described in detail below.

[0039] As shown in FIGS. 3 and 4, the ion beam irradiation device 100 of this embodiment further includes a plurality of power supply members 50 and a holding member 60 that holds these power supply members 50.

[0040] As shown in FIG. 4, the power supply member 50 is used to supply power to components of the ion source 10, such as the extraction electrode system 12 and the filament 14, and is provided with a power receiving terminal T1 at one end for receiving power from a power supply and a power supply terminal T2 at the other end for supplying the power to the ion source 10.

[0041] More specifically, as shown in FIG. 5, the power supply member 50 is composed of a wiring member 51, an intermediate terminal portion 52 electrically connected to both ends of the wiring member 51, and a power receiving terminal portion T1 and a power supply terminal portion T2 electrically connected to the intermediate terminal portion 52 at both ends of the wiring member 51.

[0042] In this embodiment, the wiring member 51 is an electric wire, and the intermediate terminal portions 52 are round terminals crimped to both ends of the wiring member 51. The power receiving terminal portion T1 and the power supply terminal portion T2 are both plate-shaped conductive members, and one end functions as a male terminal. In addition, the other end of the power receiving terminal portion T1 and the power supply terminal portion T2 is formed with a through hole that enables them to be fastened together with the intermediate terminal portion 52, which is a round terminal, using a fastener 53, which is a bolt.

[0043] Terminal blocks (not shown) with embedded nuts are disposed at both ends of the holding member 60. In the terminal blocks, the through-hole of the power receiving terminal portion T1 and the hole of the intermediate terminal portion 52 are aligned at the position of the nuts, and then the terminal blocks are fastened with bolts to electrically connect the power receiving terminal portion T1 and the intermediate terminal portion 52. Note that the terminal blocks may be configured such that, for example, embedded bolts are disposed with their screw grooves exposed to the outside. In this case, the fastening portion 53 serves as a nut for fastening the power receiving terminal portion T1 and the intermediate terminal portion 52 together via the bolts.

[0044] 5 illustrates the power receiving terminal portion T1 side of the power supply member 50, and for ease of explanation, only a portion of each of the wire member 51, the intermediate terminal portion 52, and the fastener 52 is shown. The configuration in which the power supply terminal portion T2 and the intermediate terminal portion 52 are electrically connected is the same as the configuration in which the power receiving terminal portion T1 and the intermediate terminal portion 52 are electrically connected as described above.

[0045] Furthermore, the configuration of the power supply member 50 is not limited to that of the present embodiment. For example, a bus bar having fastening holes formed at both ends may be used instead of the wiring member 51 and the intermediate terminal portion 52. In this case, for example, the wiring member 51, the power receiving terminal portion T1, and the power supply terminal portion T2 are fastened together by fasteners 53 via the fastening holes of the bus bar and holes in the power receiving terminal portion T1 and the power supply terminal portion T2.

[0046] 6 and 7, the power receiving terminal T1 is connected to a power supply side terminal T3 that is provided on or connected to a power supply. In this embodiment, the power supply side terminal T3 is provided on the outside of the cabinet C. More specifically, a window W that connects the inside of the cabinet C to the outside is provided in a wall C1 of the cabinet C, and the power supply side terminal T3 is provided on the outside of the cabinet C so as to face this window W.

[0047] 7, the power supply terminal T2 is connected to an ion source-side terminal T4 provided in the plasma generating vessel 11. In this embodiment, the ion source-side terminal T4 is provided on the back surface of the plasma generating vessel 11, facing away from the apparatus main body X. More specifically, a plurality of ion source-side terminals T4 corresponding to the extraction electrode system 12 and the plurality of filaments 14 constituting the ion source 10 are provided together, for example, below the center on the back surface of the plasma generating vessel 11. In this way, by providing the ion source-side terminals T4 below the center on the back surface of the plasma generating vessel 11, an operator can work at a lower position, thereby ensuring workability.

[0048] 4, the holding member 60 collectively holds a plurality of power supply members 50, and here has a cylindrical shape that can accommodate a plurality of power supply members 50. However, the shape of the holding member 60 is not limited to this, and may be changed as appropriate, for example, to a plate shape or a box shape.

[0049] In this embodiment, a plurality of holding members 60 are provided, with a first holding member 60 holding some (e.g., half) of the power supply members 50, and a second holding member 60 holding the remaining power supply members 50. However, only one holding member 60 may be provided, or three or more holding members 60 may be provided.

[0050] The holding member 60 is provided to be movable between a connection position P where the power supply member 50 is connected to the ion source 10 and a retracted position Q where the holding member 60 is retracted from the connection position P to disconnect the power supply member 50 from the ion source 10. In this embodiment, the multiple holding members 60 are connected to move integrally, but the multiple holding members 60 may also move independently.

[0051] The connection position P is a position where the power supply members 50 can be electrically connected to the ion source 10. In this embodiment, plate-shaped male terminals are used as the power receiving terminal portion T1 and the power supply terminal portion T2, and clip-shaped female terminals that clamp the male terminals are used as the power supply side terminal portion T3 and the ion source side terminal portion T4. When the operator moves the holding member 60 to the connection position P, the power receiving terminal portions T1 of the multiple power supply members 50 are simultaneously inserted into the corresponding power supply side terminal portions T3, and the power supply terminal portions T2 of the multiple power supply members 50 are simultaneously inserted into the corresponding ion source side terminal portions T4.

[0052] In this configuration, the power receiving terminal T1 and the power supply terminal T2, which are male terminals, are inserted into the power supply side terminal T3 and the ion source side terminal T4, which are female terminals. Therefore, the power receiving terminal T1 and the power supply terminal T2 are repeatedly inserted and removed during maintenance work on the ion source 10, and as a result, they are worn out, for example, the plating on their surfaces is peeled off, and they need to be replaced from time to time.

[0053] Therefore, in this embodiment, as shown in Figures 5 and 6, a detachable cover 61 that can be attached to and detached from the main body of the holding member 60 is provided at the base end of the holding member 60 on the power receiving terminal portion T1 side and at the tip end of the holding member 60 on the power supply terminal portion T2 side.

[0054] By removing this detachable cover 61, it is possible to access the inside of the holding member 60, and by releasing the fastening between the intermediate terminal portion 52 and the power receiving terminal portion T1 and the power supply terminal portion T2, it is possible to replace the used power receiving terminal portion T1 and the power supply terminal portion T2 with new ones. In addition, the detachable cover 61 in this embodiment is configured to be able to open the area above the position where the intermediate terminal portion 52, the power receiving terminal portion T1, and the power supply terminal portion T2 are fastened, but in addition to this, it may also be configured to be able to open the sides as well.

[0055] The retracted position Q is a position where the power receiving terminal T1 and the power supply side terminal T3 of the power supply member 50 are disconnected, and where the power supply terminal T2 and the ion source side terminal T4 of the power supply member 50 are disconnected. This retracted position Q is set at a position that avoids the transport path of the ion source 10 transported by the ion source transport mechanism 40, and more specifically, is provided outside the area S surrounded by the above-mentioned four support columns 43. In other words, the holding member 60 at the retracted position Q is arranged at a position that does not interfere with the ion source 10 transported by the ion source transport mechanism 40, and here, is stored in the above-mentioned cabinet C.

[0056] As shown in FIG. 7, the holding member 60 of this embodiment moves between the connection position P and the retracted position Q along a predetermined trajectory L, where the trajectory L is a partial arc.

[0057] More specifically, the ion beam irradiation device 100 further includes a shaft member 70 that supports the holding member 60 rotatably along a horizontal circular orbit L, as shown in FIG.

[0058] The shaft member 70 rotatably supports the power supply member 50 together with the holding member 60, and in this embodiment, the holding member 60 can be rotated manually (by pushing and pulling by hand) using this shaft member 70 as a rotation axis.

[0059] As shown in FIGS. 6 and 7, the shaft member 70 is provided outside the cabinet C and supports the holding member 60 in the vicinity of the power receiving terminal portion T1.

[0060] In such a configuration, the rotatable angle range of the holding member 60, in other words, the expansion angle from the connection position P to the retracted position Q centered on the shaft member 70, is set to, for example, 90 degrees or an angle slightly larger than 90 degrees (for example, 92 degrees).

[0061] According to the ion beam irradiation device 100 configured in this manner, the holding member 60 that collectively holds the multiple power supply members 50 is provided to be movable between the connection position P and the retracted position Q. This improves work efficiency and shortens the work time around the ion source 10 compared to the conventional case where the power supply members 50 are routed one by one. As a result, the work time required for attaching and detaching the ion source 10 to and from the device body X is shortened compared to the conventional case.

[0062] Furthermore, since the holding member 60 can move along a predetermined trajectory L between the connection position P and the retracted position Q, the trajectory L is set so that the power supply member 50 does not come into contact with the structure, thereby preventing the power supply member 50 from being damaged.

[0063] Furthermore, since the shaft member 70 supports the holding member 60 rotatably along a horizontal circular orbit, there is no need to lift the holding member 60, and since the loads of the power supply member 50 and the holding member 60 are supported by the shaft member 70, the holding member 60 can be easily moved even by hand.

[0064] Furthermore, since the retracted position Q is set at a position that avoids the transport path of the ion source 10 transported by the ion source transport mechanism 40, the holding member 60 at the retracted position Q does not interfere with the transport of the ion source 10, ensuring workability in the transport operation of the ion source 10.

[0065] The present invention is not limited to the above-described embodiment.

[0066] For example, as shown in FIG. 8, the holding member 60 may have a pressed portion 80 provided at the tip end opposite to the base end supported by the shaft member 70. In this configuration, it is preferable that the distance H2 from the shaft member 70 to the pressed portion 80 is longer than the distance H1 from the shaft member 70 to the power supply terminal portion T2. With this configuration, pressing the pressed portion 80 generates a larger moment for rotating the holding member 60 than pressing the vicinity of the power supply terminal portion T2. ​​This reduces the force that an operator applies to the holding member 60 when moving the holding member 60, and ultimately reduces the force required when inserting or removing the power supply member 50 into or from the ion source 10.

[0067] Furthermore, in the above embodiment, when the holding member 60 is moved to the connection position P, the power receiving terminal T1 is inserted into the power supply side terminal T3, and the power supply terminal T2 is inserted into the ion source side terminal T4. These terminals do not necessarily need to be inserted, and the ion beam irradiation device 100 may be configured such that the power receiving terminal T1 is disposed adjacent to the power supply side terminal T3, and the power supply terminal T2 is disposed adjacent to the ion source side terminal T4. In this case, for example, the ion beam irradiation device 100 may be configured such that the power receiving terminal T1 and the power supply side terminal T3, and the power supply terminal T2 and the ion source side terminal T4 are positioned so as to face each other, and then are electrically connected by separately prepared conductive members such as electric wires or bus bars. Even in this case, the work efficiency is improved compared to the conventional case in which the power supply members 50 are routed one by one.

[0068] Furthermore, after the holding member 60 is moved to the connection position P, the power supply side terminal portion T3 may move toward the power receiving terminal portion T1, or the ion source side terminal portion T4 may move toward the power supply terminal portion T2, thereby connecting the power receiving terminal portion T1 and the power supply side terminal portion T3, and also connecting the power supply terminal portion T2 and the ion source side terminal portion T4.

[0069] The trajectory L along which the holding member 60 moves may be, in addition to the circular trajectory of the above embodiment, an elliptical trajectory, a curved trajectory, a straight trajectory, or a trajectory that combines these various trajectories, for example, using gears, cams, arm members, etc.

[0070] Furthermore, in the above embodiment, the trajectory L along which the holding member 60 moves is a trajectory along the horizontal direction, but it may be a trajectory that includes a horizontal component and a vertical component, or it may be a trajectory along the vertical direction.

[0071] Furthermore, the trajectory L along which the holding member 60 is moved does not need to be predetermined, and the holding member 60 may be made to be able to move along a free trajectory, for example, manually.

[0072] In the above embodiment, the plurality of holding members 60 are connected so as to move integrally, but the plurality of holding members 60 may be provided independently of each other so as to move separately. In this case, multiple power supply members 50 can be connected to or removed from the ion source 10 in multiple batches, so the insertion / removal force required for each operation of inserting or removing a power supply member 50 from the ion source 10 is less than the insertion / removal force required for inserting or removing multiple power supply members 50 from the ion source 10 all at once.

[0073] In the above embodiment, the holding member 60 is configured to be manually rotatable, but it may also be configured to be automatically rotatable using, for example, a motor.

[0074] Furthermore, the present invention is not limited to the above-described embodiment, and it goes without saying that various modifications are possible without departing from the spirit of the present invention. [Explanation of symbols]

[0075] 100 Ion beam irradiation device 10 Ion source 14... Filament X...Equipment body 40 Ion source transport mechanism Z... Cart 41 First moving member 42 Second moving member 43...post S...area C···Cabinet C1 Wall W ···Window 50 Power supply member T1: Power receiving terminal T2: Power supply terminal 60 Holding member T3...Power supply side terminal section T4: Ion source terminal P Connection position Q...Evacuation position L...orbital 70...Shaft member 80 Pressurized portion

Claims

1. an ion source; a plurality of power supply members for supplying power to the ion source; a holding member that collectively holds the plurality of power supply members, an ion beam irradiation device, wherein the holding member is movable between a connection position where the power supply member is connected to the ion source and a retracted position where the holding member is retracted from the connection position to disconnect the power supply member from the ion source.

2. The ion beam irradiation device according to claim 1 , wherein the holding member moves along a predetermined trajectory between the connection position and the retracted position.

3. 3. The ion beam irradiation device according to claim 2, further comprising a shaft member that supports said holding member rotatably along a horizontal circular orbit.

4. an ion source transport mechanism for attaching the ion source to a main body of the apparatus or for removing the ion source from the main body of the apparatus; 2. The ion beam irradiation device according to claim 1, wherein the retracted position is set at a position that avoids a transport path of the ion source transported by the ion source transport mechanism.

5. the holding member has a pressed portion provided at a tip end portion opposite to a base end portion supported by the shaft member, 4. The ion beam irradiation device according to claim 3, wherein the distance from the shaft member to the pressed portion is longer than the distance from the shaft member to the power supply terminal portion of the power supply member.

Citation Information

Patent Citations

  • Ion implantation equipment

    JP1989501025A

  • Ion source device

    JP2006147226A

  • Ion source support base

    JP2019057385A

  • Ion source and ion implanter

    JP2019067488A

  • Ion source support member

    KR101922352B1