Photosensitive coloring composition, cured product, partition wall, organic electroluminescent device, and image display device

Abstract

Provided is a photosensitive colored composition which is less apt to roughen the electrode surface through a heat treatment. This photosensitive colored composition is characterized by comprising (a) a colorant, (b) an alkali-soluble resin, (c) a photopolymerization initiator, (d) an ethylenically unsaturated compound, (e) one or more nitrogenous aromatic compounds, and (f) a dispersant, the nitrogenous aromatic compounds including a compound represented by formula (1) or (2).

Description

[Technical Field]

[0001] The present invention relates to a photosensitive coloring composition, a cured product, a partition wall, an organic electroluminescent device, and an image display device. This application claims priority based on Japanese Patent Application No. 2021-024489, filed on February 18, 2021, the contents of which are incorporated herein by reference. [Background technology]

[0002] Liquid crystal displays (LCDs) utilize the property that liquid crystal molecules change their alignment when a voltage is applied to the liquid crystal. Many of the components that make up LCD cells are formed using photosensitive compositions, typically photolithography. These photosensitive compositions are finding wider application because they are easy to form into fine structures and can be easily processed on substrates for large screens.

[0003] Image display devices including organic electroluminescent elements (also called organic EL) are attracting attention as the next generation of flat panel displays (FPDs) because they offer excellent visibility such as contrast and viewing angle, responsiveness, and the ability to reduce power consumption, thinness and weight, and to make the display body flexible. An organic electroluminescent element has a structure in which an organic layer including a light-emitting layer or various functional layers is sandwiched between a pair of electrodes, at least one of which is light-transmitting. An image display device displays images by driving a panel in which an organic electroluminescent element is arranged for each pixel. Conventionally, such organic electroluminescent devices are manufactured by forming partition walls (banks) on a substrate, and then laminating a light-emitting layer or various functional layers within the area surrounded by the partition walls.

[0004] To form a film of a light-emitting layer or the like in the region surrounded by the partition wall, a vapor deposition method is mainly used, in which a material is sublimated in a vacuum state and deposited on a substrate to form a film. In recent years, methods for forming films using wet processes such as casting, spin coating, and inkjet printing have attracted attention. Inkjet printing, in particular, is suitable as a method for forming organic layers in large panels because it can reduce unevenness in film thickness when applied to a large area, and it can also achieve high-definition displays by applying different colors during application, reduce the amount of material used, and improve yield.

[0005] A known method for easily forming the partition wall is to form it by photolithography using a photosensitive composition. Also, a known method for imparting light-shielding properties to the partition wall and suppressing light leakage between pixels is to include a colorant in the photosensitive composition.

[0006] Patent Document 1 describes a colored photosensitive resin composition that uses a specific organic black pigment and an alkali-soluble resin to suppress the generation of outgassing.

[0007] Patent Document 2 describes a photosensitive resin composition for forming a protective film, which contains benzotriazole or a derivative thereof as a rust inhibitor. [Prior art documents] [Patent documents]

[0008] [Patent Document 1] International Publication No. 2018 / 101314 [Patent Document 2] Japanese Patent Application Publication No. 2018-72789 Summary of the Invention [Problem to be solved by the invention]

[0009] Organic electroluminescent devices are available in top-emission and bottom-emission panel configurations. In the case of top-emission devices, a reflective electrode such as silver is used as the electrode, and a cured product such as a partition wall is formed on top of it. However, during heat treatment, components in the photosensitive composition may act to cause corrosion or migration of the metal electrode. If unevenness occurs on the electrode surface (hereinafter also referred to as surface roughness), a light-emitting layer cannot be formed uniformly in that area, and when an organic electroluminescent device is fabricated, this may cause display defects due to short circuits or the like.

[0010] The present inventors have conducted studies and found that the colored photosensitive resin composition described in Patent Document 1 causes surface roughness of the electrode, which is problematic in practical use. In addition, the photosensitive resin composition described in Patent Document 2 does not contain a colorant or dispersant, and therefore does not have the problem of surface roughness.

[0011] The present invention has been made in view of the above circumstances, and aims to provide a photosensitive coloring composition that is less likely to cause surface roughness of an electrode after heat treatment, and to provide an organic light-emitting element and an image display device that are free from display defects and have high reliability. [Means for solving the problem]

[0012] As a result of extensive research, the present inventors have found that the above problems can be solved by using a specific nitrogen-containing aromatic compound, and have thus completed the present invention. That is, the gist of the present invention is as follows.

[0013] As the photosensitive coloring composition of the first aspect of the present invention, [1] A photosensitive coloring composition comprising (a) a colorant, (b) an alkali-soluble resin, (c) a photopolymerization initiator, (d) an ethylenically unsaturated compound, (e) a nitrogen-containing aromatic compound, and (f) a dispersant, A photosensitive coloring composition, wherein the (e) nitrogen-containing aromatic compound contains a compound represented by the following general formula (1) and / or the following general formula (2):

[0014] [ka]

[0015] (In formula (1), X represents -CH= or -N=, and R 1 represents an alkyl group, a carboxy group, or a nitro group, and R 2 represents a hydroxyl group or a hydrogen atom, and l represents an integer of 0 to 4.

[0016] [ka]

[0017] (In formula (2), R 3 , R 4 each independently represents an alkyl group, and m and n each independently represent an integer of 0 to 4.

[0018] [2] The photosensitive coloring composition according to [1], wherein the (e) nitrogen-containing aromatic compound comprises a compound represented by the general formula (1). [3] The photosensitive coloring composition according to [2], wherein the (e) nitrogen-containing aromatic compound contains benzotriazole. [4] The photosensitive coloring composition according to any one of [1] to [3], wherein the content of the (e) nitrogen-containing aromatic compound is 0.01 mass % or more and 5 mass % or less relative to the total solid mass of the photosensitive coloring composition.

[0019] As the photosensitive coloring composition of the second aspect of the present invention, [5] A photosensitive coloring composition comprising (a) a colorant, (b) an alkali-soluble resin, (c) a photopolymerization initiator, (d) an ethylenically unsaturated compound, (e) a nitrogen-containing aromatic compound, and (f) a dispersant, In a coating film having a thickness of 2.0 μm obtained by curing the photosensitive resin composition, the amount of the (e) nitrogen-containing aromatic compound component, calculated as toluene, detected by a thermal evolved gas analysis method is 0.01 to 0.50 μg / cm 2 A photosensitive coloring composition characterized by:

[0020] [6] The photosensitive coloring composition according to any one of [1] to [5], wherein the (a) colorant comprises at least one selected from the group consisting of a red pigment and an orange pigment, and at least one selected from the group consisting of a blue pigment and a violet pigment. [7] The photosensitive coloring composition according to any one of [1] to [6], wherein the (a) colorant contains an organic black pigment. [8] The photosensitive coloring composition according to [7], wherein the organic black pigment comprises at least one selected from the group consisting of a compound represented by the following general formula (a1), a geometric isomer thereof, a salt thereof, and a salt of the geometric isomer:

[0021] [ka]

[0022] (In formula (a1), R 11 and R 16 each independently represents a hydrogen atom, CH3, CF3, a fluorine atom, or a chlorine atom; R 12 , R 13 , R 14 , R 15 , R 17 , R 18 , R 19 and R 20 are each independently a hydrogen atom, a halogen atom, or R 21 , COOH, COOR 21 , COO - , CONH2, CONHR 21 ,CONR 21 R 22 , CN, OH, OR 21 , COCR 21 , OOCNH2, OOCNHR 21 , OOCNR 21 R 22 , NO2, NH2, NHR 21 , N.R. 21 R 22 , NHCOR 22 , N.R. 21 COR 22 , N=CH2, N=CHR 21 , N=CR 21 R 22 , S.H., S.R.21 , SOR 21 , SO2R 21 , SO3R 21 , SO3H, SO3 - , SO2NH2, SO2NHR 21 or SO2NR 21 R 22 represents; R 12 and R 13 , R 13 and R 14 , R 14 and R 15 , R 17 and R 18 , R 18 and R 19 , and R 19 and R 20 may be directly bonded to each other, or may be bonded to an oxygen atom, a sulfur atom, NH, or NR 21 may be joined together by bridges; R 21 and R 22 each independently represents an alkyl group having 1 to 12 carbon atoms, a cycloalkyl group having 3 to 12 carbon atoms, an alkenyl group having 2 to 12 carbon atoms, a cycloalkenyl group having 3 to 12 carbon atoms, or an alkynyl group having 2 to 12 carbon atoms.

[0023] [9] The photosensitive coloring composition according to any one of [1] to [8], wherein the content of the colorant (a) is 10% by mass or more relative to the total solid content of the photosensitive coloring composition.

[10] The photosensitive coloring composition according to any one of [1] to [9], wherein the optical density of the cured coating film per 1 μm of film thickness is 0.5 or more.

[11] The photosensitive coloring composition according to any one of [1] to

[10] , which is used to form a partition wall of an organic electroluminescent device.

[12] A cured product obtained by curing the photosensitive coloring composition according to any one of [1] to

[11] .

[13] A partition wall obtained by curing the photosensitive coloring composition according to any one of [1] to

[11] .

[14] An organic electroluminescent device comprising the cured product of

[12] .

[15] An image display device including the organic electroluminescent device according to

[14] . [Effects of the Invention]

[0024] According to the present invention, it is possible to provide a photosensitive coloring composition that is less likely to cause surface roughness on an electrode after heat treatment. DETAILED DESCRIPTION OF THE INVENTION

[0025] The following describes in detail the embodiments of the present invention, but the present invention is not limited to the following embodiments and can be implemented with various modifications within the scope of the gist thereof. In the present invention, "(meth)acrylic" means "acrylic and / or methacrylic", and the same applies to "(meth)acrylate" and "(meth)acryloyl". In the present invention, the term "acrylic resin" refers to a (co)polymer containing (meth)acrylic acid, or a (co)polymer containing a (meth)acrylic acid ester having a carboxy group. In the present invention, the term "total solids" means all components in the photosensitive resin composition other than the solvent. Even if a component other than the solvent is liquid at room temperature, that component is not included in the solvent but is included in the total solids. The term "(co)polymer" includes both homopolymers and copolymers, and the terms "acid (anhydride)" and "(anhydrous)...acid" include both acids and their anhydrides. In the present invention, the term "monomer" is the opposite of a so-called high molecular substance (polymer), and includes not only a monomer in the narrow sense but also a dimer, trimer, and oligomer. In the present invention, the term "weight average molecular weight" refers to the weight average molecular weight (Mw) calculated in terms of polystyrene by GPC (gel permeation chromatography). In the present invention, unless otherwise specified, the "amine value" refers to the amine value calculated as the effective solid content, and is a value expressed as the mass of KOH equivalent to the amount of base per 1 g of solid content of the dispersant. The measurement method will be described later. Unless otherwise specified, the "acid value" refers to the acid value calculated as the effective solid content, and is calculated by neutralization titration. With respect to pigments, "CI" means Color Index. In this specification, percentages and parts expressed by "mass" have the same meaning as percentages and parts expressed by "weight".

[0026] In the present invention, unless otherwise specified, the "colored photosensitive resin composition of the present invention" refers to both the colored photosensitive resin composition related to the first aspect and the colored photosensitive resin composition related to the second aspect.

[0027] [Photosensitive coloring composition] The photosensitive coloring composition of the present invention comprises: (a) Colorant (b) Alkali-soluble resin (c) Photopolymerization initiator (d) Ethylenically unsaturated compounds (e) Nitrogen-containing aromatic compounds (f) Dispersant Contains as an essential component.

[0028] <(a) Colorant> The photosensitive coloring composition of the present invention contains (a) a colorant. By containing (a) a colorant, it is possible to obtain appropriate light absorption properties, particularly appropriate light blocking properties when used for forming a light blocking member such as a partition wall.

[0029] The colorant (a) that can be used in the photosensitive coloring composition of the present invention is not particularly limited, and may be a pigment or a dye. From the viewpoint of durability, it is preferable to use a pigment.

[0030] The pigment contained in the (a) colorant may be one type alone or two or more types, but from the viewpoint of achieving both uniform light blocking in the visible region and OD per unit film thickness, two or more types are preferred. (a) Pigments that can be used as the colorant are not particularly limited, but examples thereof include organic color pigments and black pigments. Here, the organic color pigment means an organic pigment that exhibits a color other than black, and examples thereof include red pigments, orange pigments, blue pigments, purple pigments, green pigments, and yellow pigments.

[0031] As for the pigment, organic pigments are preferred from the viewpoint of high dielectric constant and low dielectric constant. From the viewpoint of suppressing ultraviolet absorption, high curability, and easy control of the shape of the cured product, organic coloring pigments are preferred. From the viewpoint of light blocking properties, black pigments are preferred.

[0032] The organic color pigment may be used alone or in combination of two or more. In particular, it is more preferable to use a combination of organic color pigments of different colors, and it is even more preferable to use a combination of organic color pigments that exhibit a color close to black when combined.

[0033] The chemical structure of these organic color pigments is not particularly limited, but examples include azo, phthalocyanine, quinacridone, benzimidazolone, isoindolinone, dioxazine, indanthrene, and perylene. Specific examples of pigments that can be used are listed below by pigment number. The "CI" in "CI Pigment Red 2" and other names listed below stands for color index.

[0034] Red pigments include CI Pigment Red 1, 2, 3, 4, 5, 6, 7, 8, 9, 12, 14, 15, 16, 17, 21, 22, 23, 31, 32, 37, 38, 41, 47, 48, 48:1, 48:2, 48:3, 48:4, 49, 49:1, 49:2, 50:1, 52:1, 52:2, 53, 53:1, 53:2, 53:3, 57, 57:1, 57:2, 58:4, 60, 63, 63:1, 63:2, 64, 64:1, 68, 69, 81, 81:1, 81:2, 81:3, 81:4, 83, 88, 90:1, 101, 101:1, 104, 108, 108:1, 109, 112, 113, 114, 122, 123, 144, 146, 147, 149, 15 1, 166, 168, 169, 170, 172, 173, 174, 175, 176, 177, 178, 179, 181, 184, 185, 187, 188, 190, 193, 194, 200, 202, 206, 207, 208, 209, 210, 214, 216, 220, 221, 224, 230, 231, 232, 233, 234, 235, 236, 237, 238, 239, 240, 241, 242, 243, 244, 245, 246, 247, 248, 249, 250, 251, 252, 253, 254, 255, 256, 257, 258, 259, 260, 261, 262, 263, 264, 265, 266, 267, 268, 269, 270, 271, 272, 273, 274, 275, 276, 277, 278, 279, 280, 281, 282, 283, 284, 285, 286, 287, 288, 289, 290, 300, 301, 302, 303, 304, 305, 306, 307, 30 5, 236, 237, 238, 239, 242, 243, 245, 247, 249, 250, 251, 253, 254, 255, 256, 257, 258, 259, 260, 262, 263, 264, 265, 266, 267, 268, 269, 270, 271, 272, 273, 274, 275, and 276. In terms of light-blocking properties and dispersibility, preferred are CI Pigment Red 48:1, 122, 149, 168, 177, 179, 194, 202, 206, 207, 209, 224, 242, and 254, and more preferred are CI Pigment Red 177, 209, 224, and 254. In terms of dispersibility and light-blocking properties, it is preferable to use CI Pigment Red 177, 254, or 272. When the photosensitive coloring composition is cured with ultraviolet light, it is preferable to use a red pigment with low ultraviolet absorption rate, and from this point of view, it is more preferable to use CI Pigment Red 254 or 272.

[0035] Examples of orange pigments include CI Pigment Orange 1, 2, 5, 13, 16, 17, 19, 20, 21, 22, 23, 24, 34, 36, 38, 39, 43, 46, 48, 49, 61, 62, 64, 65, 67, 68, 69, 70, 71, 72, 73, 74, 75, 77, 78, and 79. From the viewpoint of dispersibility and light-blocking properties, it is preferable to use CI Pigment Orange 13, 43, 64, and 72. When the photosensitive coloring composition is cured with ultraviolet light, it is preferable to use an orange pigment with low ultraviolet absorption rate, and from this viewpoint, it is more preferable to use CI Pigment Orange 64 and 72.

[0036] Examples of blue pigments include CI Pigment Blue 1, 1:2, 9, 14, 15, 15:1, 15:2, 15:3, 15:4, 15:6, 16, 17, 19, 25, 27, 28, 29, 33, 35, 36, 56, 56:1, 60, 61, 61:1, 62, 63, 66, 67, 68, 71, 72, 73, 74, 75, 76, 78, and 79. From the viewpoint of light-blocking properties, preferred examples include CI Pigment Blue 15, 15:1, 15:2, 15:3, 15:4, 15:6, and 60, and more preferred is CI Pigment Blue 15:6. Note that, from the viewpoints of dispersibility and light-blocking properties, it is preferable to use CI Pigment Blue 15:6, 16, and 60. When the photosensitive coloring composition is cured by ultraviolet light, it is preferable to use a blue pigment that has a low ultraviolet absorption rate, and from this point of view, it is more preferable to use CI Pigment Blue 60.

[0037] Examples of purple pigments include CI Pigment Violet 1, 1:1, 2, 2:2, 3, 3:1, 3:3, 5, 5:1, 14, 15, 16, 19, 23, 25, 27, 29, 31, 32, 37, 39, 42, 44, 47, 49, and 50. From the viewpoint of light-blocking properties, preferred examples include CI Pigment Violet 19, 23, and 29, and more preferred examples include CI Pigment Violet 23. From the viewpoint of dispersibility and light-blocking properties, it is preferable to use CI Pigment Violet 23 or 29. When the photosensitive coloring composition is cured with ultraviolet light, it is preferable to use a purple pigment with low ultraviolet absorptance, and from this viewpoint, it is more preferable to use CI Pigment Violet 29.

[0038] Examples of green pigments include CI Pigment Green 1, 2, 4, 7, 8, 10, 13, 14, 15, 17, 18, 19, 26, 36, 45, 48, 50, 51, 54, 55, 58, and 59. Preferred examples include CI Pigment Green 7 and 36.

[0039] Yellow pigments include CI Pigment Yellow 1, 1:1, 2, 3, 4, 5, 6, 9, 10, 12, 13, 14, 16, 17, 24, 31, 32, 34, 35, 35:1, 36, 36:1, 37, 37:1, 40, 41, 42, 43, 48, 53, 55, 61, 62, 62:1, 63, 65, 73, 74, 75, 81, 83, 87, 93, 94, 95, 97, 100, 101, 104, 105, 108, 109, 110, 111, 116, 117, 119, 120, 126, 127, 127:1, 128, 129, 133, 134, 1 36, 138, 139, 142, 147, 148, 150, 151, 153, 154, 155, 157, 158, 159, 160, 161, 162, 163, 164, 165, 166, 167, 168, 169, 170, 172, 173, 174, 175, 176, 180, 181, 182, 183, 184, 185, 188, 189, 190, 191, 191:1, 192, 193, 194, 195, 196, 197, 198, 199, 200, 202, 203, 204, 205, 206, 207, and 208 can be mentioned. Preferred are CI Pigment Yellow 83, 117, 129, 138, 139, 150, 154, 155, 180, and 185, and more preferred are CI Pigment Yellow 83, 138, 139, 150, and 180.

[0040] From the viewpoint of the light-blocking properties of the cured product and shape control, it is preferable to use at least one pigment selected from the group consisting of red pigments, orange pigments, blue pigments and purple pigments.

[0041] From the viewpoint of the light-blocking properties of the cured product and shape control, it is preferable to contain at least one of the following pigments. Red pigment: CI Pigment Red 177, 254, 272 Orange pigment: CI Pigment Orange 43, 64, 72 Blue pigment: CI Pigment Blue 15:6, 60 Purple pigment: CI Pigment Violet 23, 29

[0042] When two or more organic color pigments are used in combination, the combination of the organic color pigments is not particularly limited. However, from the viewpoint of light-blocking properties, it is preferable to contain at least one selected from the group consisting of red pigments and orange pigments, and at least one selected from the group consisting of blue pigments and purple pigments. The color combination is not particularly limited, but from the viewpoint of light-blocking properties, examples include a combination of a red pigment and a blue pigment, a combination of a blue pigment and an orange pigment, and a combination of a blue pigment, an orange pigment and a purple pigment.

[0043] The black pigment may be an organic black pigment or an inorganic black pigment, of which the organic black pigment is preferred from the viewpoint of light-shielding properties, high electrical resistance, and low dielectric constant. From the viewpoint of suppressing ultraviolet absorption and facilitating shape control in organic black pigments, it is preferable to use an organic black pigment containing at least one member selected from the group consisting of a compound represented by the following general formula (a1) (hereinafter may be referred to as "compound (a1)"), a geometric isomer of compound (a1), a salt of compound (a1), and a salt of a geometric isomer of compound (a1) (hereinafter may be referred to as "organic black pigment represented by general formula (a1)").

[0044] [ka]

[0045] In formula (a1), R 11 and R 16 each independently represents a hydrogen atom, CH3, CF3, a fluorine atom, or a chlorine atom; R 12 , R 13 , R 14 , R 15 , R 17 , R 18 , R 19 and R 20 are each independently a hydrogen atom, a halogen atom, or R 21 , COOH, COOR 21 , COO - , CONH2, CONHR 21,CONR 21 R 22 , CN, OH, OR 21 , COCR 21 , OOCNH2, OOCNHR 21 , OOCNR 21 R 22 , NO2, NH2, NHR 21 , N.R. 21 R 22 , NHCOR 22 , N.R. 21 COR 22 , N=CH2, N=CHR 21 , N=CR 21 R 22 , S.H., S.R. 21 , SOR 21 , SO2R 21 , SO3R 21 , SO3H, SO3 - , SO2NH2, SO2NHR 21 or SO2NR 21 R 22 represents; R 12 and R 13 , R 13 and R 14 , R 14 and R 15 , R 17 and R 18 , R 18 and R 19 , and R 19 and R 20 may be directly bonded to each other, or may be bonded to an oxygen atom, a sulfur atom, NH, or NR 21 may be joined together by bridges; R 21 and R 22 each independently represents an alkyl group having 1 to 12 carbon atoms, a cycloalkyl group having 3 to 12 carbon atoms, an alkenyl group having 2 to 12 carbon atoms, a cycloalkenyl group having 3 to 12 carbon atoms, or an alkynyl group having 2 to 12 carbon atoms.

[0046] Compound (a1) and the geometric isomers of compound (a1) have the following core structure (where the substituents in the structural formula are omitted), and the trans-trans isomer is probably the most stable.

[0047] [ka]

[0048] When compound (a1) is anionic, it is preferably a salt whose charge is compensated with any known suitable cation, for example, a metal, organic, inorganic, or metal-organic cation, specifically, an alkali metal, alkaline earth metal, transition metal, primary ammonium, secondary ammonium, tertiary ammonium such as trialkylammonium, quaternary ammonium such as tetraalkylammonium, or an organometallic complex. When a geometric isomer of compound (a1) is anionic, it is preferably a similar salt.

[0049] The following substituents in formula (a1) and their definitions tend to have a high shielding rate, and are therefore preferred because they are thought to have no absorption and do not affect the hue of the pigment: R 12 , R 14 , R 15 , R 17 , R 19 and R 20 are each independently preferably a hydrogen atom, a fluorine atom, or a chlorine atom, and more preferably a hydrogen atom. R 13 and R 18 are each independently preferably a hydrogen atom, NO2, OCH3, OC2H5, a bromine atom, a chlorine atom, CH3, C2H5, N(CH3)2, N(CH3)(C2H5), N(C2H5)2, α-naphthyl, β-naphthyl, SO3H or SO3 - is more preferably a hydrogen atom or SO3H, and particularly preferably a hydrogen atom.

[0050] R 11 and R 16 are each independently preferably a hydrogen atom, CH3 or CF3, more preferably a hydrogen atom. Preferably, R 11 and R 16 , R12 and R 17 , R 13 and R 18 , R 14 and R 19 , and R 15 and R 20 At least one combination selected from the group consisting of 11 is R 16 is identical to R 12 is R 17 is identical to R 13 is R 18 is identical to R 14 is R 19 is identical to and R 15 is R 20 is the same as

[0051] Examples of the alkyl group having 1 to 12 carbon atoms include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, a sec-butyl group, an isobutyl group, a tert-butyl group, a 2-methylbutyl group, an n-pentyl group, a 2-pentyl group, a 3-pentyl group, a 2,2-dimethylpropyl group, an n-hexyl group, an n-heptyl group, an n-octyl group, a 1,1,3,3-tetramethylbutyl group, a 2-ethylhexyl group, a nonyl group, a decyl group, an undecyl group, and a dodecyl group.

[0052] Examples of the cycloalkyl group having 3 to 12 carbon atoms include a cyclopropyl group, a cyclopropylmethyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cyclohexylmethyl group, a trimethylcyclohexyl group, a thujyl group, a norbornyl group, a bornyl group, a norcaryl group, a caryl group, a menthyl group, a norpinyl group, a pinyl group, an adamantan-1-yl group, and an adamantan-2-yl group.

[0053] Examples of the alkenyl group having 2 to 12 carbon atoms include a vinyl group, an allyl group, a 2-propen-2-yl group, a 2-buten-1-yl group, a 3-buten-1-yl group, a 1,3-butadien-2-yl group, a 2-penten-1-yl group, a 3-penten-2-yl group, a 2-methyl-1-buten-3-yl group, a 2-methyl-3-buten-2-yl group, a 3-methyl-2-buten-1-yl group, a 1,4-pentadien-3-yl group, a hexenyl group, an octenyl group, a nonenyl group, a decenyl group, and a dodecenyl group.

[0054] Examples of the cycloalkenyl group having 3 to 12 carbon atoms include a 2-cyclobuten-1-yl group, a 2-cyclopenten-1-yl group, a 2-cyclohexen-1-yl group, a 3-cyclohexen-1-yl group, a 2,4-cyclohexadien-1-yl group, a 1-p-menthen-8-yl group, a 4(10)-thujen-10-yl group, a 2-norbornen-1-yl group, a 2,5-norbornadien-1-yl group, a 7,7-dimethyl-2,4-norcaradien-3-yl group, and a camphenyl group.

[0055] Examples of the alkynyl group having 2 to 12 carbon atoms include a 1-propyn-3-yl group, a 1-butyn-4-yl group, a 1-pentyn-5-yl group, a 2-methyl-3-butyn-2-yl group, a 1,4-pentadiyn-3-yl group, a 1,3-pentadiyn-5-yl group, a 1-hexyn-6-yl group, a cis-3-methyl-2-penten-4-yn-1-yl group, a trans-3-methyl-2-penten-4-yn-1-yl group, a 1,3-hexadiyn-5-yl group, a 1-octyn-8-yl group, a 1-nonyn-9-yl group, a 1-decyn-10-yl group, and a 1-dodecyn-12-yl group.

[0056] The halogen atom is, for example, a fluorine atom, a chlorine atom, a bromine atom or an iodine atom.

[0057] The organic black pigment represented by formula (a1) is preferably an organic black pigment containing at least one compound selected from the group consisting of a compound represented by the following general formula (a2) (hereinafter also referred to as "compound (a2)") and a geometric isomer of compound (a2):

[0058] [ka]

[0059] An example of such an organic black pigment is Irgaphor (registered trademark) Black S 0100 CF (manufactured by BASF). This organic black pigment is preferably dispersed using a dispersant, solvent, and method described below before use. Furthermore, the presence of a sulfonic acid derivative of compound (a1), particularly a sulfonic acid derivative of compound (a2), during dispersion can improve dispersibility and storage stability, so it is preferred that the organic black pigment contain these sulfonic acid derivatives.

[0060] Examples of organic black pigments other than the organic black pigment represented by formula (a1) include aniline black and perylene black.

[0061] On the other hand, from the viewpoint of higher light-shielding properties, it is preferable to use an inorganic black pigment. Examples of inorganic black pigments include carbon black, acetylene black, lamp black, bone black, graphite, iron black, cyanine black, and titanium black. Carbon black is preferably used from the viewpoint of light-shielding properties and image characteristics. Examples of carbon black include the following carbon blacks.

[0062] Mitsubishi Chemical Corporation: MA7, MA8, MA11, MA77, MA100, MA100R, MA100S, MA220, MA230, MA600, MCF88, #5, #10, #20, #25, #30, #32, #33, #40, #44, #45, #47, #50, #52, #55, #650, #750, #850, #900, #950, # 960, #970, #980, #990, #1000, #2200, #2300, #2350, #2400, #2600, #2650, #3030, #3050, #31 50, #3250, #3400, #3600, #3750, #3950, #4000, #4010, OIL7B, OIL9B, OIL11B, OIL30B, OIL31B Manufactured by Degussa: Printex (registered trademark, same hereinafter) 3, Printex3OP, Printex30, Printex30OP, Printex40, Printex45, Printex55, Printex60, Printex75, Printex80, Printex85, Printex90, Printex A, Printex L, Printex G, Printex P, Printex U, Printex V, PrintexG, SpecialBlack550, SpecialBlack350, SpecialBlack250, SpecialBlack100, SpecialBlack6, SpecialBlack5, SpecialBlack4, Color Black FW1, Color Black FW2, Color Black FW2V, Color Black FW18, Color Black FW18, Color Black FW200, Color Black S160, Color Black S170 Cabot Corporation: Monarch (registered trademark, the same applies hereinafter) 120, Monarch 280, Monarch 460, Monarch 800, Monarch 880, Monarch 900, Monarch 1000, Monarch 1100, Monarch 1300, Monarch 1400, Monarch 4630, REGAL (registered trademark, the same applies hereinafter) 99, REGAL 99R, REGAL 415, REGAL 415R, REGAL 250, REGAL 250R, REGAL 330, REGAL 400R, REGAL 55R0, REGAL 660R, BLACK PEARLS 480, PEARLS 130, VULCAN (registered trademark, the same applies hereinafter) XC72R, ELFTEX (registered trademark)-8 Biller: RAVEN (registered trademark, the same applies hereinafter) 11, RAVEN 14, RAVEN 15, RAVEN 16, RAVEN 22, RAVEN 30, RAVEN 35, RAVEN 40, RAVEN 410, RAVEN 420, RAVEN 450, RAVEN 500, RAVEN 780, RAVEN 850, RAVEN 890H, RAVEN 1000, RAVEN 1020, RAVEN 1040, RAVEN 1060U, RAVEN 1080U, RAVEN 1170, RAVEN 1190U, RAVEN 1250, RAVEN 1500, RAVEN 2000, RAVEN 2500U, RAVEN 3500, RAVEN 5000, RAVEN 5250, RAVEN 5750, RAVEN 7000

[0063] Carbon black may be coated with a resin. The use of resin-coated carbon black has the effect of improving adhesion to the glass substrate and volume resistivity. Carbon black described in Japanese Patent Application Laid-Open No. 09-71733 can be preferably used as the resin-coated carbon black. Resin-coated carbon black is preferably used in terms of volume resistivity and dielectric constant.

[0064] The carbon black to be subjected to resin coating treatment preferably has a total Na and Ca content of 100 ppm or less. Carbon black typically contains Na, which is mixed in from raw material oil, combustion oil (or gas), reaction stop water, granulation water, and even reactor materials during production, as well as ash composed of Ca, K, Mg, Al, Fe, etc., on the order of percent. Of these, Na and Ca are typically contained in amounts of several hundred ppm or more each, but reducing their content tends to inhibit their penetration into the transparent electrode (ITO) and other electrodes, thereby preventing electrical short circuits.

[0065] Methods for reducing the content of ash containing Na and Ca include carefully selecting raw material oil, fuel oil (or gas), and reaction quench water for producing carbon black that contain as little of these substances as possible, and minimizing the amount of alkaline substances added to adjust the structure. Another method includes washing the carbon black produced in the furnace with water or hydrochloric acid to dissolve and remove the Na and Ca.

[0066] Specifically, after carbon black is mixed and dispersed in water, hydrochloric acid, or hydrogen peroxide, a solvent that is poorly soluble in water is added. The carbon black migrates to the solvent and is completely separated from the water, and most of the Na and Ca present in the carbon black are dissolved in the water or acid and removed. While it may be possible to reduce the total amount of Na and Ca to 100 ppm or less using only the carbon black manufacturing process with carefully selected raw materials or the water or acid dissolution method alone, it is even easier to reduce the total amount of Na and Ca to 100 ppm or less by using both methods in combination.

[0067] The resin-coated carbon black is preferably so-called acidic carbon black with a pH of 6 or less. This is advantageous because the dispersion diameter (agglomerate diameter) in water is small, making it possible to coat even the finest units. Furthermore, the average particle diameter is preferably 40 nm or less. Furthermore, the dibutyl phthalate (DBP) absorption is preferably 140 ml / 100 g or less. By keeping the average particle size and DBP absorption within the above ranges, a coating film with good light-blocking properties tends to be obtained. The average particle diameter means the number average particle diameter, and refers to the circle-equivalent diameter determined by particle image analysis in which photographs of several fields of view are taken at tens of thousands of magnifications using an electron microscope, and approximately 2,000 to 3,000 particles in these photographs are counted using an image processing device.

[0068] The method for preparing the resin-coated carbon black is not particularly limited. For example, after appropriately adjusting the blending amounts of the carbon black and the resin, 1. A method in which a resin is mixed with a solvent such as cyclohexanone, toluene, or xylene, and heated to dissolve the resin solution, and then this is mixed and stirred with a suspension of carbon black and water, and the carbon black and water are separated. After that, the water is removed, and the resulting composition is heated and kneaded, and then molded into a sheet, pulverized, and then dried; 2. A method in which the resin solution and suspension prepared in the same manner as above are mixed and stirred to granulate the carbon black and resin, and the resulting granules are then separated and heated to remove the remaining solvent and water; 3. A method in which a carboxylic acid such as maleic acid or fumaric acid is dissolved in the above-mentioned solvent, carbon black is added, mixed, dried, and the solvent is removed to obtain carboxylic acid-impregnated carbon black, to which a resin is then added and dry-blended; 4. A method in which a reactive group-containing monomer component constituting the resin to be coated and water are stirred at high speed to prepare a suspension, which is then polymerized and cooled to obtain a reactive group-containing resin from the polymer suspension, to which carbon black is then added and kneaded to react the carbon black with the reactive group (to graft the carbon black), followed by cooling and pulverization; etc. can be adopted.

[0069] The type of resin used for the coating treatment is not particularly limited, but synthetic resins are common, and resins having a benzene ring in their structure are preferred from the standpoint of dispersibility and dispersion stability because they have a stronger amphoteric surfactant-like effect. Specific examples of synthetic resins that can be used include thermosetting resins such as phenolic resin, melamine resin, xylene resin, diallyl phthalate resin, glyptal resin, epoxy resin, and alkylbenzene resin, as well as thermoplastic resins such as polystyrene, polycarbonate, polyethylene terephthalate, polybutylene terephthalate, modified polyphenylene oxide, polysulfone, polyparaphenylene terephthalamide, polyamideimide, polyimide, polyaminobismaleimide, polyethersulfopolyphenylene sulfone, polyarylate, and polyetheretherketone. The amount of resin coated on carbon black is preferably 1 to 30% by mass based on the total amount of carbon black and resin. Amounts equal to or greater than the lower limit tend to ensure sufficient coating. Amounts equal to or less than the upper limit tend to prevent adhesion between resins and improve dispersibility.

[0070] Carbon black coated with a resin in this manner can be used as a light-blocking material for colored spacers in a conventional manner, and color filters incorporating these colored spacers as components can be produced in a conventional manner. The use of such carbon black tends to enable the production of colored spacers with high light-blocking efficiency and low surface reflectance at low cost. It is also believed that coating the carbon black surface with a resin also serves to trap Ca and Na within the carbon black.

[0071] These pigments are preferably dispersed and used so that the average particle size is preferably 1 μm or less, more preferably 0.5 μm or less, and even more preferably 0.25 μm or less, where the average particle size is determined by the number of pigment particles. In the photosensitive coloring composition of the present invention, the average particle size of the pigment is a value determined from the pigment particle size measured by dynamic light scattering (DLS). The particle size measurement is performed on a sufficiently diluted photosensitive coloring composition (usually diluted to a pigment concentration of about 0.005 to 0.2 mass %; however, if a concentration recommended by the measuring instrument is available, that concentration should be followed) at 25°C.

[0072] In addition to the above-mentioned organic color pigments and black pigments, dyes may also be used. Examples of dyes that can be used as colorants include azo dyes, anthraquinone dyes, phthalocyanine dyes, quinoneimine dyes, quinoline dyes, nitro dyes, carbonyl dyes, and methine dyes.

[0073] Examples of azo dyes include CI Acid Yellow 11, CI Acid Orange 7, CI Acid Red 37, CI Acid Red 180, CI Acid Blue 29, CI Direct Red 28, CI Direct Red 83, CI Direct Yellow 12, CI Direct Orange 26, CI Direct Green 28, CI Direct Green 59, CI Reactive Yellow 2, CI Reactive Red 17, CI Reactive Red 120, CI Reactive Black 5, CI Disperse Orange 5, CI Disperse Red 58, CI Disperse Blue 165, CI Basic Blue 41, CI Basic Red 18, CI Mordant Red 7, CI Mordant Yellow 5, and CI Mordant Black 7.

[0074] Examples of anthraquinone dyes include CI Vat Blue 4, CI Acid Blue 40, CI Acid Green 25, CI Reactive Blue 19, CI Reactive Blue 49, CI Disperse Red 60, CI Disperse Blue 56, and CI Disperse Blue 60.

[0075] An example of a phthalocyanine dye is CI Vat Blue 5. Examples of quinoneimine dyes include CI Basic Blue 3 and CI Basic Blue 9. Examples of quinoline dyes include CI Solvent Yellow 33, CI Acid Yellow 3, and CI Disperse Yellow 64. Examples of nitro dyes include CI Acid Yellow 1, CI Acid Orange 3, and CI Disperse Yellow 42.

[0076] <(b) Alkali-soluble resin> The alkali-soluble resin (b) used in the present invention is not particularly limited as long as it is a resin that exhibits alkali solubility, and examples thereof include resins containing a carboxy group or a hydroxyl group, and more specific examples thereof include epoxy (meth)acrylate resins, acrylic resins, carboxy group-containing epoxy resins, carboxy group-containing urethane resins, novolac resins, and polyvinylphenol resins. (b1) Epoxy (meth)acrylate resin (b2) Acrylic copolymer resin These can be used alone or in combination of two or more.

[0077] <(b1) Epoxy (meth)acrylate resin> (b1) Epoxy (meth)acrylate resins are resins obtained by reacting an epoxy compound (epoxy resin) with an α,β-unsaturated monocarboxylic acid and / or an α,β-unsaturated monocarboxylic acid ester having a carboxy group in the ester moiety to generate hydroxyl groups, and then reacting the hydroxyl groups with a compound having two or more substituents capable of reacting with hydroxyl groups, such as a polybasic acid and / or anhydride thereof. The (b1) epoxy (meth)acrylate resin also includes a resin obtained by reacting a compound having two or more substituents capable of reacting with a hydroxyl group with the polybasic acid and / or anhydride thereof, followed by the reaction of the polybasic acid and / or anhydride with the hydroxyl group.

[0078] Resins obtained by reacting the carboxyl group of the resin obtained by the above reaction with a compound having a functional group that can further react are also included in (b1) epoxy (meth)acrylate resins. Epoxy (meth)acrylate resins have substantially no epoxy groups in their chemical structure, and are not limited to "(meth)acrylates." However, since epoxy compounds (epoxy resins) are used as raw materials and "(meth)acrylates" are a representative example, they are named as such according to convention.

[0079] As the epoxy (meth)acrylate resin (b1) used in the present invention, an epoxy (meth)acrylate resin (b1-1) and / or an epoxy (meth)acrylate resin (b1-2) (hereinafter sometimes referred to as a "carboxy group-containing epoxy (meth)acrylate resin") is preferably used from the viewpoint of developability and reliability. As the (b1) epoxy (meth)acrylate resin, from the viewpoint of outgassing, it is more preferable to use one having an aromatic ring in the main chain.

[0080] <Epoxy (meth)acrylate resin (b1-1)> An alkali-soluble resin obtained by adding an α,β-unsaturated monocarboxylic acid or an α,β-unsaturated monocarboxylic acid ester having a carboxy group to an epoxy resin, and then reacting it with a polybasic acid and / or its anhydride. <Epoxy (meth)acrylate resin (b1-2)> An alkali-soluble resin obtained by adding an α,β-unsaturated monocarboxylic acid or an α,β-unsaturated monocarboxylic acid ester having a carboxy group to an epoxy resin, and then reacting the resulting resin with a polyhydric alcohol and a polybasic acid and / or its anhydride.

[0081] Here, the term "epoxy resin" refers to raw material compounds before they are thermoset to form a resin, and the epoxy resin can be appropriately selected from known epoxy resins. Furthermore, the epoxy resin can be a compound obtained by reacting a phenolic compound with an epihalohydrin. The phenolic compound is preferably a compound having a divalent or more than divalent phenolic hydroxyl group, and may be a monomer or a polymer. Suitable types of epoxy resins that can be used as raw materials include, for example, cresol novolac epoxy resins, phenol novolac epoxy resins, bisphenol A epoxy resins, bisphenol F epoxy resins, trisphenolmethane epoxy resins, biphenyl novolac epoxy resins, naphthalene novolac epoxy resins, epoxy resins that are reaction products of epihalohydrin with a polyaddition reaction product of dicyclopentadiene and phenol or cresol, adamantyl group-containing epoxy resins, and fluorene epoxy resins, and more preferably those that have an aromatic ring in the main chain.

[0082] Examples of epoxy resins include bisphenol A type epoxy resins (e.g., "jER (registered trademark, the same applies hereinafter) 828," "jER1001," "jER1002," and "jER1004" manufactured by Mitsubishi Chemical Corporation), epoxy resins obtained by reacting an alcoholic hydroxyl group of a bisphenol A type epoxy resin with epichlorohydrin (e.g., "NER-1302" manufactured by Nippon Kayaku Co., Ltd. (epoxy equivalent: 323, softening point: 76°C)), and bisphenol F type resins (e.g., "jER 807, "EP-4001", "EP-4002", "EP-4004", etc.), epoxy resins obtained by reacting the alcoholic hydroxyl group of bisphenol F type epoxy resin with epichlorohydrin (for example, "NER-7406" manufactured by Nippon Kayaku Co., Ltd. (epoxy equivalent: 350, softening point: 66°C)), bisphenol S type epoxy resin, biphenyl glycidyl ether (for example, "YX-4000" manufactured by Mitsubishi Chemical Corporation), phenol novolac type epoxy resin (for example, "EPPN -201" manufactured by Mitsubishi Chemical Corporation, "EP-152" and "EP-154" manufactured by Dow Chemical Company, and "DEN-438" manufactured by Dow Chemical Company), (o, m, p-)cresol novolac type epoxy resins (for example, "EOCN (registered trademark, the same applies hereinafter)-102S", "EOCN-1020", and "EOCN-104S" manufactured by Nippon Kayaku Co., Ltd.), triglycidyl isocyanurate (for example, "TEPIC (registered trademark)" manufactured by Nissan Chemical Co., Ltd.), trisphenolmethane type epoxy resins (for example, "EPPN (registered trademark)" manufactured by Nippon Kayaku Co., Ltd.), Suitable epoxy resins that can be used include those represented by the following general formulas (B1) to (B4): cycloaliphatic epoxy resins (Daicel Corporation's "CELLOXIDE (registered trademark, the same applies hereinafter) 2021P" and "CELLOXIDE EHPE"); epoxy resins obtained by glycidylating phenolic resins obtained by reacting dicyclopentadiene with phenol (for example, DIC Corporation's "EXA-7200" and Nippon Kayaku Co., Ltd.'s "NC-7300"); and epoxy resins represented by the following general formulas (B1) to (B4).Specific examples include "XD-1000" manufactured by Nippon Kayaku Co., Ltd. as an epoxy resin represented by the following general formula (B1); "NC-3000" manufactured by Nippon Kayaku Co., Ltd. as an epoxy resin represented by the following general formula (B2); "E-201" manufactured by Osaka Organic Chemical Industry Ltd. as an epoxy resin represented by the following general formula (B3); and "ESF-300" manufactured by Nippon Steel & Sumikin Chemical Co., Ltd. as an epoxy resin represented by the following general formula (B4).

[0083] [ka]

[0084] In formula (B1), a is an average value and represents a number from 0 to 10, and R 111 each independently represents a hydrogen atom, a halogen atom, an alkyl group having 1 to 8 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, a phenyl group, a naphthyl group, or a biphenyl group. 111 may be the same or different.

[0085] [ka]

[0086] In formula (B2), b1 and b2 each independently represent an average value and a number from 0 to 10; 121 each independently represents a hydrogen atom, a halogen atom, an alkyl group having 1 to 8 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, a phenyl group, a naphthyl group, or a biphenyl group. 121 may be the same or different.

[0087] [ka]

[0088] In formula (B3), X represents a linking group represented by the following general formula (B3-1) or (B3-2), provided that the molecular structure contains one or more adamantane structures.

[0089] [ka]

[0090] In formulas (B3-1) and (B3-2), R 131 ~R 134 and R 135 ~R 137 each independently represents an adamantyl group which may have a substituent, a hydrogen atom, an alkyl group of 1 to 12 carbon atoms which may have a substituent, or a phenyl group which may have a substituent, and * represents a bond.

[0091] [ka]

[0092] In formula (B4), p and q each independently represent an integer of 0 to 4; 141 and R 142 each independently represents an alkyl group having 1 to 4 carbon atoms or a halogen atom, and R 143 and R 144 each independently represents an alkylene group having 1 to 4 carbon atoms, and x and y each independently represent an integer of 0 or greater.

[0093] As the epoxy resin, it is preferable to use an epoxy resin represented by any one of formulas (B1) to (B4).

[0094] Examples of α,β-unsaturated monocarboxylic acids or α,β-unsaturated monocarboxylic acid esters having a carboxy group include monocarboxylic acids such as (meth)acrylic acid, crotonic acid, o-, m- or p-vinylbenzoic acid, and (meth)acrylic acid substituted with haloalkyl, alkoxyl, halogen, nitro or cyano at the α-position; 2-(meth)acryloyloxyethyl succinic acid, 2-(meth)acryloyloxyethyl adipate, 2-(meth)acryloyloxyethyl phthalate, 2-(meth)acryloyloxyethyl hexahydrophthalate, 2-(meth)acryloyloxyethyl maleate, 2-(meth)acryloyloxypropyl succinic acid, 2-(meth)acryloyloxypropyl adipate, 2-(meth)acryloyloxypropyl tetrahydrophthalic acid, 2-(meth)acryloyloxyethyl methyl esters; Examples of suitable monomers include 2-(meth)acryloyloxypropyl phthalate, 2-(meth)acryloyloxypropyl maleate, 2-(meth)acryloyloxybutyl succinate, 2-(meth)acryloyloxybutyl adipic acid, 2-(meth)acryloyloxybutyl hydrophthalate, 2-(meth)acryloyloxybutyl phthalate, 2-(meth)acryloyloxybutyl maleate (meth), and monomers obtained by adding lactones such as ε-caprolactone, β-propiolactone, γ-butyrolactone, and δ-valerolactone to acrylic acid; or monomers obtained by adding acids (anhydrides) such as succinic acid anhydride, phthalic acid anhydride, and maleic acid anhydride to hydroxyalkyl (meth)acrylate or pentaerythritol tri(meth)acrylate; and (meth)acrylic acid dimers. From the viewpoint of sensitivity, (meth)acrylic acid is preferred.

[0095] A known method can be used to add an α,β-unsaturated monocarboxylic acid or an α,β-unsaturated monocarboxylic acid ester having a carboxy group to an epoxy resin. For example, an α,β-unsaturated monocarboxylic acid or an α,β-unsaturated monocarboxylic acid ester having a carboxy group can be reacted with an epoxy resin in the presence of an esterification catalyst at a temperature of 50 to 150°C. Examples of the esterification catalyst that can be used here include tertiary amines such as triethylamine, trimethylamine, benzyldimethylamine, and benzyldiethylamine, and quaternary ammonium salts such as tetramethylammonium chloride, tetraethylammonium chloride, and dodecyltrimethylammonium chloride.

[0096] The epoxy resin, the α,β-unsaturated monocarboxylic acid or the α,β-unsaturated monocarboxylic acid ester having a carboxy group, and the esterification catalyst may be used singly or in combination of two or more. The amount of α,β-unsaturated monocarboxylic acid or α,β-unsaturated monocarboxylic acid ester having a carboxy group used is preferably 0.5 to 1.2 equivalents, more preferably 0.7 to 1.1 equivalents, per equivalent of epoxy group in the epoxy resin. By using an amount of α,β-unsaturated monocarboxylic acid or α,β-unsaturated monocarboxylic acid ester having a carboxy group that is equal to or greater than the lower limit, it is possible to prevent a shortage of unsaturated groups from being introduced, and the subsequent reaction with the polybasic acid and / or its anhydride tends to be more satisfactory. By using an amount equal to or less than the upper limit, it is possible to prevent the remaining unreacted α,β-unsaturated monocarboxylic acid or α,β-unsaturated monocarboxylic acid ester having a carboxy group, and it is possible to improve curing properties.

[0097] Examples of polybasic acids and / or anhydrides thereof include maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, trimellitic acid, benzophenonetetracarboxylic acid, methylhexahydrophthalic acid, endomethylenetetrahydrophthalic acid, chlorendic acid, methyltetrahydrophthalic acid, biphenyltetracarboxylic acid, and anhydrides thereof.

[0098] Preferred are maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, trimellitic acid, biphenyltetracarboxylic acid, or anhydrides thereof, and particularly preferred are tetrahydrophthalic acid, biphenyltetracarboxylic acid, tetrahydrophthalic anhydride, or biphenyltetracarboxylic dianhydride.

[0099] The addition reaction of a polybasic acid and / or its anhydride can be carried out using known techniques, and the target product can be obtained by continuing the reaction under conditions similar to those of the addition reaction of an α,β-unsaturated monocarboxylic acid or an α,β-unsaturated monocarboxylic acid ester having a carboxy group to an epoxy resin. The amount of polybasic acid and / or its anhydride component added is preferably such that the acid value of the resulting carboxy-containing epoxy (meth)acrylate resin is 10 to 150 mg KOH / g, more preferably 20 to 140 mg KOH / g. By adjusting the amount to be equal to or greater than the lower limit, alkaline developability tends to be improved. By adjusting the amount to be equal to or less than the upper limit, curing performance tends to be improved.

[0100] During the addition reaction of the polybasic acid and / or its anhydride, a polyfunctional alcohol (polyhydric alcohol) such as trimethylolpropane, ditrimethylolpropane, pentaerythritol, dipentaerythritol, trimethylolethane, or 1,2,3-propanetriol may be added to introduce a multi-branched structure. In this case, there are no particular restrictions on the order in which the polybasic acid and / or its anhydride and the polyfunctional alcohol are mixed. By heating, the polybasic acid and / or its anhydride undergoes an addition reaction with any hydroxyl group present in the mixture of the reaction product of the epoxy resin with an α,β-unsaturated monocarboxylic acid or an α,β-unsaturated monocarboxylic acid ester having a carboxy group and the polyfunctional alcohol.

[0101] The use of polyhydric alcohols increases the molecular weight of the (b1) epoxy (meth)acrylate resin, allowing for the introduction of branching into the molecule, which tends to balance the molecular weight and viscosity. It also increases the rate of acid group introduction into the molecule, which tends to make it easier to balance sensitivity, adhesion, and other properties.

[0102] In addition to the above-mentioned carboxyl group-containing epoxy (meth)acrylate resins, for example, those described in Korean Patent Publication No. 10-2013-0022955 can be mentioned.

[0103] The weight-average molecular weight (Mw) of the carboxyl group-containing epoxy (meth)acrylate resin, measured by gel permeation chromatography (GPC) in terms of polystyrene, is preferably 1,000 or more, more preferably 1,500 or more, even more preferably 2,000 or more, even more preferably 3,000 or more, particularly preferably 4,000 or more, and particularly preferably 5,000 or more. It is also preferably 30,000 or less, more preferably 20,000 or less, and even more preferably 15,000 or less. The above upper and lower limits can be arbitrarily combined. For example, 1,000 to 30,000 is preferred, 1,500 to 20,000 is more preferred, 1,500 to 15,000 is even more preferred, and 2,000 to 15,000 is even more preferred. Setting the Mw at or above the lower limit tends to prevent excessive solubility in the developer. Setting the Mw at or below the upper limit tends to facilitate good solubility in the developer.

[0104] The acid value of the carboxyl group-containing epoxy (meth)acrylate resin is not particularly limited, but is preferably 20 mgKOH / g or more, more preferably 40 mgKOH / g or more, even more preferably 60 mgKOH / g or more, even more preferably 80 mgKOH / g or more, and particularly preferably 100 mgKOH / g or more. Also, it is preferably 200 mgKOH / g or less, more preferably 150 mgKOH / g or less, even more preferably 130 mgKOH / g or less, and particularly preferably 120 mgKOH / g or less. The above upper and lower limits can be arbitrarily combined. For example, it is preferably 20 mgKOH / g to 200 mgKOH / g, more preferably 60 mgKOH / g to 150 mgKOH / g, even more preferably 80 mgKOH / g to 130 mgKOH / g, and even more preferably 100 mgKOH / g to 130 mgKOH / g. By setting the acid value at or above the lower limit, the developer solubility is improved, and the resolution tends to be good. By making the content equal to or less than the upper limit, the remaining film rate of the photosensitive coloring composition tends to be good.

[0105] The chemical structure of the epoxy(meth)acrylate resin is not particularly limited, but from the viewpoint of developability and reliability, it is preferable to contain an epoxy(meth)acrylate resin having a partial structure represented by the following general formula (b1-I) (hereinafter may be abbreviated as "(b1-I) epoxy(meth)acrylate resin") and / or an epoxy(meth)acrylate resin having a partial structure represented by the following general formula (b1-II) (hereinafter may be abbreviated as "(b1-II) epoxy(meth)acrylate resin"):

[0106] [ka]

[0107] In formula (b1-I), R 11 represents a hydrogen atom or a methyl group, and R 12 represents a divalent hydrocarbon group which may have a substituent, k represents 1 or 2, and * represents a bond. The benzene ring in formula (b1-I) may be further substituted with any substituent.

[0108] [ka]

[0109] In formula (b1-II), R 13 each independently represents a hydrogen atom or a methyl group, R 14 represents a divalent hydrocarbon group having a cyclic hydrocarbon group as a side chain, and R 15 and R 16 each independently represents a divalent aliphatic group which may have a substituent, m and n each independently represents an integer of 0 to 2, and * represents a bond.

[0110] <(b1-I) Epoxy (meth)acrylate resin>

[0111] [ka]

[0112] In formula (b1-I), R 11 represents a hydrogen atom or a methyl group, and R 12 represents a divalent hydrocarbon group which may have a substituent, k represents 1 or 2, and * represents a bond. The benzene ring in formula (b1-I) may be further substituted with any substituent.

[0113] (R 12 ) In the formula (b1-I), R 12 represents a divalent hydrocarbon group which may have a substituent. Examples of the divalent hydrocarbon group include a divalent aliphatic group, a divalent aromatic ring group, and a group in which one or more divalent aliphatic groups are linked with one or more divalent aromatic ring groups.

[0114] Examples of the divalent aliphatic group include linear, branched, and cyclic aliphatic groups. From the viewpoint of development solubility, linear aliphatic groups are preferred. On the other hand, from the viewpoint of reducing penetration of the developer into the exposed area, cyclic aliphatic groups are preferred. The number of carbon atoms is preferably 1 or more, more preferably 3 or more, and even more preferably 6 or more. Also, it is preferably 20 or less, more preferably 15 or less, and even more preferably 10 or less. The above upper and lower limits can be arbitrarily combined. For example, 1 to 20 is preferred, 1 to 15 is more preferred, and 1 to 10 is even more preferred. By setting the number at or above the lower limit, a strong film is more likely to be obtained, surface roughness during development is less likely to occur, and adhesion to the substrate tends to be good. By setting the number at or below the upper limit, it is easier to suppress deterioration in sensitivity and film loss during development, and resolution tends to be improved.

[0115] Examples of the divalent linear aliphatic group include a methylene group, an ethylene group, an n-propylene group, an n-butylene group, an n-pentylene group, an n-hexylene group, and an n-heptylene group. From the viewpoint of the rigidity of the skeleton, a methylene group is preferred. Examples of the divalent branched aliphatic group include a structure in which the above-mentioned divalent linear aliphatic group has, as a side chain, for example, a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, or a tert-butyl group. The number of rings in the divalent cyclic aliphatic group is not particularly limited, but is preferably 1 or more, more preferably 2 or more. It is also preferably 12 or less, more preferably 10 or less. The upper and lower limits above can be combined arbitrarily. For example, 1 to 12 is preferred, 1 to 10 is more preferred, and 2 to 10 is even more preferred. By setting the number at or above the lower limit, a strong film tends to be formed, and substrate adhesion tends to be good. By setting the number at or below the upper limit, deterioration in sensitivity and film loss during development tend to be suppressed, and resolution tends to be improved. Examples of the divalent cyclic aliphatic group include groups in which two hydrogen atoms have been removed from a ring such as a cyclohexane ring, a cycloheptane ring, a cyclodecane ring, a cyclododecane ring, a norbornane ring, an isobornane ring, an adamantane ring, a cyclododecane ring, a dicyclopentadiene ring, or a dicyclopentane ring. From the viewpoint of skeletal rigidity, groups in which two hydrogen atoms have been removed from a dicyclopentadiene ring, a dicyclopentane ring, or an adamantane ring are preferred.

[0116] Examples of the substituent that the divalent aliphatic group may have include an alkoxy group having 1 to 5 carbon atoms, such as a methoxy group or an ethoxy group; a hydroxyl group; a nitro group; a cyano group; and a carboxy group. From the viewpoint of ease of synthesis, it is preferable that the divalent aliphatic group is unsubstituted.

[0117] Examples of divalent aromatic ring groups include divalent aromatic hydrocarbon ring groups and divalent aromatic heterocyclic groups. The number of carbon atoms is not particularly limited, but is preferably 4 or more, more preferably 5 or more, and even more preferably 6 or more. It is also preferably 20 or less, more preferably 15 or less, and even more preferably 10 or less. The above upper and lower limits can be arbitrarily combined. For example, 4 to 20 is preferred, 5 to 15 is more preferred, and 6 to 10 is even more preferred. By setting the number at or above the lower limit, a strong film tends to be easily obtained, surface roughness during development is less likely to occur, and adhesion to the substrate tends to be good. By setting the number at or below the upper limit, deterioration of sensitivity and film loss during development are easily suppressed, and resolution tends to be improved.

[0118] The aromatic hydrocarbon ring in the divalent aromatic hydrocarbon ring group may be a single ring or a condensed ring. Examples of the divalent aromatic hydrocarbon ring group include a benzene ring, a naphthalene ring, an anthracene ring, a phenanthrene ring, a perylene ring, a tetracene ring, a pyrene ring, a benzpyrene ring, a chrysene ring, a triphenylene ring, an acenaphthene ring, a fluoranthene ring, and a fluorene ring, each of which has two free valences. The aromatic heterocycle in the divalent aromatic heterocyclic group may be a single ring or a condensed ring. Examples of the divalent aromatic heterocyclic group include a furan ring, a benzofuran ring, a thiophene ring, a benzothiophene ring, a pyrrole ring, a pyrazole ring, an imidazole ring, an oxadiazole ring, an indole ring, a carbazole ring, a pyrroloimidazole ring, a pyrrolopyrazole ring, a pyrrolopyrrole ring, a thienopyrrole ring, a thienothiophene ring, a furopyrrole ring, a furofuran ring, a thienofuran ring, a benzisoxazole ring, a benzisothiazole ring, a benzimidazole ring, a pyridine ring, a pyrazine ring, a pyridazine ring, a pyrimidine ring, a triazine ring, a quinoline ring, an isoquinoline ring, a cinnoline ring, a quinoxaline ring, a phenanthridine ring, a benzimidazole ring, a perimidine ring, a quinazoline ring, a quinazolinone ring, and an azulene ring, each of which has two free valences. From the viewpoint of patterning properties, a benzene ring or a naphthalene ring having two free valences is preferred, and a benzene ring having two free valences is more preferred.

[0119] Examples of the substituent that the divalent aromatic ring group may have include a hydroxy group, a methyl group, a methoxy group, an ethyl group, an ethoxy group, a propyl group, and a propoxy group. From the viewpoint of solubility in development, unsubstituted groups are preferred.

[0120] Examples of the group in which one or more divalent aliphatic groups are linked to one or more divalent aromatic ring groups include groups in which one or more of the above-mentioned divalent aliphatic groups are linked to one or more of the above-mentioned divalent aromatic ring groups. The number of divalent aliphatic groups is not particularly limited, but is preferably 1 or more, more preferably 2 or more, preferably 10 or less, more preferably 5 or less, and even more preferably 3 or less. The above upper and lower limits can be combined arbitrarily. For example, 1 to 10 is preferred, 1 to 5 is more preferred, 1 to 3 is even more preferred, and 2 to 3 is particularly preferred. By setting the number at or above the lower limit, a strong film is more likely to be obtained, surface roughness during development is less likely to occur, and adhesion to the substrate tends to be good. By setting the number at or below the upper limit, deterioration of sensitivity and film loss during development are more likely to be suppressed, and resolution tends to be improved. The number of divalent aromatic ring groups is not particularly limited, but is preferably 1 or more, more preferably 2 or more, preferably 10 or less, more preferably 5 or less, and even more preferably 3 or less. The above upper and lower limits can be combined arbitrarily. For example, 1 to 10 is preferred, 1 to 5 is more preferred, 1 to 3 is even more preferred, and 2 to 3 is particularly preferred. By setting the number at or above the lower limit, a strong film is more likely to be obtained, surface roughness during development is less likely to occur, and adhesion to the substrate tends to be good. By setting the number at or below the upper limit, deterioration of sensitivity and film loss during development are more likely to be suppressed, and resolution tends to be improved.

[0121] Examples of the group formed by linking one or more divalent aliphatic groups with one or more divalent aromatic ring groups include groups represented by the following formulae (b1-IA) to (b1-IF). From the viewpoints of skeleton rigidity and film hydrophobicity, the group represented by the following formula (b1-IA) is preferred.

[0122] [ka]

[0123] In formula (b1-I), k represents 1 or 2. From the viewpoint of adhesion and patterning properties, k is preferably 1. From the viewpoint of NMP resistance, k is preferably 2. Furthermore, the epoxy (meth)acrylate (b1-I) may contain both a partial structure in which k is 1 and a partial structure in which k is 2.

[0124] The benzene ring in formula (b1-I) may be further substituted with any substituent. Examples of the substituent include a hydroxy group, a methyl group, a methoxy group, an ethyl group, an ethoxy group, a propyl group, and a propoxy group. The number of substituents is not particularly limited, and may be one or two or more. From the viewpoint of patterning properties, it is preferably unsubstituted.

[0125] The partial structure represented by formula (b1-I) is preferably a partial structure represented by the following general formula (b1-I-1) from the viewpoint of ease of synthesis.

[0126] [ka]

[0127] In formula (b1-I-1), R 11 , R 12 and k are defined as in formula (b1-I), and R X represents a hydrogen atom or a polybasic acid residue, and * represents a bond. The benzene ring in formula (b1-I-1) may be further substituted with any substituent.

[0128] The polybasic acid residue refers to a monovalent group obtained by removing one OH group from a polybasic acid. Examples of polybasic acids include maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, trimellitic acid, benzophenonetetracarboxylic acid, methylhexahydrophthalic acid, endomethylenetetrahydrophthalic acid, chlorendic acid, methyltetrahydrophthalic acid, and biphenyltetracarboxylic acid. From the viewpoint of patterning properties, preferred are maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, trimellitic acid, and biphenyltetracarboxylic acid, and more preferred are tetrahydrophthalic acid, biphenyltetracarboxylic acid, and biphenyltetracarboxylic acid.

[0129] The benzene ring in formula (b1-I-1) may be further substituted with any substituent. As the substituent, those exemplified for the benzene ring in formula (b1-I) can be preferably used.

[0130] The partial structure represented by formula (b1-I-1) contained in one molecule of the epoxy (meth)acrylate resin (b1-I) may be one type or two or more types, and for example, R X is a hydrogen atom, and R X However, polybasic acid residues may be present in the mixture.

[0131] The number of partial structures represented by formula (b1-I) contained in one molecule of the epoxy (meth)acrylate resin (b1-I) is not particularly limited, but is preferably 1 or more, more preferably 3 or more. It is also preferably 20 or less, and even more preferably 15 or less. The above upper and lower limits can be arbitrarily combined. It is preferably 1 to 20, more preferably 1 to 15, and even more preferably 3 to 15. By setting it to equal to or greater than the lower limit, a strong film tends to be easily obtained, and surface roughness that occurs during development tends to be less likely to occur. By setting it to equal to or less than the upper limit, it is easy to suppress deterioration in sensitivity and film loss during development, and resolution tends to be improved.

[0132] The weight average molecular weight (Mw) of the (b1-I) epoxy (meth)acrylate resin, measured by gel permeation chromatography (GPC) in terms of polystyrene, is not particularly limited, but is preferably 1000 or more, more preferably 1500 or more, even more preferably 2000 or more, even more preferably 3000 or more, particularly preferably 4000 or more, and most preferably 5000 or more, and is preferably 30000 or less, more preferably 20000 or less, and even more preferably 15000 or less. The above upper and lower limits can be arbitrarily combined. For example, 1000 to 30000 is preferred, 1500 to 2000 is more preferred, 1500 to 15000 is even more preferred, and 2000 to 1500 is even more preferred. By setting the Mw at or above the lower limit, the film remaining rate of the photosensitive coloring composition tends to be good. By setting the Mw at or below the upper limit, the solubility in the developer tends to be good.

[0133] The acid value of the (b1-I) epoxy (meth)acrylate resin is not particularly limited, but is preferably 20 mgKOH / g or more, more preferably 40 mgKOH / g or more, even more preferably 60 mgKOH / g or more, even more preferably 80 mgKOH / g or more, and particularly preferably 100 mgKOH / g or more. Also, it is preferably 200 mgKOH / g or less, more preferably 150 mgKOH / g or less, even more preferably 130 mgKOH / g or less, and particularly preferably 120 mgKOH / g or less. The above upper and lower limits can be arbitrarily combined. For example, it is preferably 20 mgKOH / g to 200 mgKOH / g, more preferably 60 mgKOH / g to 150 mgKOH / g, even more preferably 80 mgKOH / g to 130 mgKOH / g, and even more preferably 100 mgKOH / g to 130 mgKOH / g. By setting the acid value at or above the lower limit, the developer solubility is improved, and the resolution tends to be good. By making the content equal to or less than the upper limit, the remaining film rate of the photosensitive coloring composition tends to be good.

[0134] Specific examples of (b1-I) epoxy (meth)acrylate resins are listed below. In the examples, * indicates a bond.

[0135] [ka]

[0136] [ka]

[0137] [ka]

[0138] [ka]

[0139] <(b1-II) Epoxy (meth)acrylate resin>

[0140] [ka]

[0141] In formula (b1-II), R 13 each independently represents a hydrogen atom or a methyl group, R 14 represents a divalent hydrocarbon group having a cyclic hydrocarbon group as a side chain, and R 15 and R 16 each independently represents a divalent aliphatic group which may have a substituent, m and n each independently represents an integer of 0 to 2, and * represents a bond.

[0142] (R 14 ) In formula (b1-II), R 14 represents a divalent hydrocarbon group having a cyclic hydrocarbon group as a side chain. The cyclic hydrocarbon group may be an aliphatic cyclic group or an aromatic cyclic group.

[0143] The number of rings in the aliphatic cyclic group is not particularly limited, but is preferably 1 or more, more preferably 2 or more. It is also preferably 10 or less, more preferably 5 or less, and even more preferably 3 or less. The upper and lower limits above can be combined arbitrarily. For example, 1 to 10 is preferred, 1 to 5 is more preferred, 1 to 3 is even more preferred, and 2 to 3 is particularly preferred. By setting the number at or above the lower limit, a strong film tends to be obtained, and surface roughness during development tends to be less likely to occur. By setting the number at or below the upper limit, it is easier to suppress deterioration in sensitivity and film loss during development, and resolution tends to be improved. The number of carbon atoms in the aliphatic cyclic group is not particularly limited, but is preferably 4 or more, more preferably 6 or more, and even more preferably 8 or more. It is also preferably 40 or less, more preferably 30 or less, even more preferably 20 or less, and particularly preferably 15 or less. The upper and lower limits above can be combined arbitrarily. For example, 4 to 40 is preferred, 4 to 30 is more preferred, 6 to 20 is more preferred, and 8 to 15 is particularly preferred. By setting the carbon atom number at or above the lower limit, a strong film tends to be obtained, and surface roughness during development tends to be less likely to occur. By setting the carbon atom number at or below the upper limit, it is easy to suppress deterioration in sensitivity and film loss during development, and resolution tends to be improved. Examples of the aliphatic ring in the aliphatic ring group include a cyclohexane ring, a cycloheptane ring, a cyclodecane ring, a cyclododecane ring, a norbornane ring, an isobornane ring, an adamantane ring, and a cyclododecane ring. From the viewpoint of the film remaining rate and resolution of the photosensitive coloring composition, an adamantane ring is preferred.

[0144] The number of rings in the aromatic ring group is not particularly limited, but is preferably 1 or more, more preferably 2 or more, and even more preferably 3 or more. It is also preferably 10 or less, more preferably 5 or less, and even more preferably 4 or less. The upper and lower limits above can be combined arbitrarily. For example, 1 to 10 is preferred, 1 to 5 is more preferred, 1 to 4 is even more preferred, 2 to 4 is even more preferred, and 3 to 4 is particularly preferred. By setting the number at or above the lower limit, a strong film tends to be obtained, and surface roughness during development tends to be less likely to occur. By setting the number at or below the upper limit, it is easier to suppress deterioration in sensitivity and film loss during development, and resolution tends to be improved. Examples of the aromatic ring group include an aromatic hydrocarbon ring group and an aromatic heterocyclic group. The number of carbon atoms in the aromatic ring group is not particularly limited, but is preferably 4 or more, more preferably 6 or more, even more preferably 8 or more, even more preferably 10 or more, and particularly preferably 12 or more. It is also preferably 40 or less, more preferably 30 or less, even more preferably 20 or less, and particularly preferably 15 or less. The above upper and lower limits can be arbitrarily combined. For example, 4 to 40 is preferred, 6 to 40 is more preferred, 8 to 30 is more preferred, 10 to 20 is even more preferred, and 12 to 15 is particularly preferred. By setting the number at or above the lower limit, a strong film is more likely to be obtained, and surface roughness during development tends to be less likely to occur. By setting the number at or below the upper limit, patterning properties tend to be improved. Examples of the aromatic ring in the aromatic ring group include a benzene ring, a naphthalene ring, an anthracene ring, a phenanthrene ring, a perylene ring, a tetracene ring, a pyrene ring, a benzpyrene ring, a chrysene ring, a triphenylene ring, an acenaphthene ring, a fluoranthene ring, and a fluorene ring. From the viewpoint of patterning properties, a fluorene ring is preferred.

[0145] The divalent hydrocarbon group in the divalent hydrocarbon group having a cyclic hydrocarbon group as a side chain is not particularly limited, and examples thereof include a divalent aliphatic group, a divalent aromatic ring group, and a group in which one or more divalent aliphatic groups are linked to one or more divalent aromatic ring groups.

[0146] Examples of the divalent aliphatic group include linear, branched, and cyclic aliphatic groups. From the viewpoint of development solubility, linear aliphatic groups are preferred, while cyclic aliphatic groups are preferred from the viewpoint of reducing penetration of the developer into the exposed area. The number of carbon atoms is not particularly limited, but is preferably 1 or more, more preferably 3 or more, and even more preferably 6 or more. It is also preferably 25 or less, more preferably 20 or less, and even more preferably 15 or less. The above upper and lower limits can be arbitrarily combined. For example, 1 to 25 is preferred, 3 to 20 is more preferred, and 6 to 15 is even more preferred. By setting the carbon atom number at or above the lower limit, a strong film is more likely to be obtained, surface roughness during development is less likely to occur, and adhesion to the substrate tends to be good. By setting the carbon atom number at or below the upper limit, deterioration of sensitivity and film loss during development are more likely to be suppressed, and resolution tends to be improved.

[0147] Examples of the divalent linear aliphatic group include a methylene group, an ethylene group, an n-propylene group, an n-butylene group, an n-pentylene group, an n-hexylene group, and an n-heptylene group. From the viewpoint of the rigidity of the skeleton, a methylene group is preferred. Examples of the divalent branched aliphatic group include a structure in which the above-mentioned divalent linear aliphatic group has a methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, sec-butyl group, or tert-butyl group as a side chain. The number of rings in the divalent cyclic aliphatic group is not particularly limited, but is preferably 1 or more, more preferably 2 or more. It is also preferably 10 or less, more preferably 5 or less, and even more preferably 3 or less. The upper and lower limits above can be combined arbitrarily. For example, 1 to 10 is preferred, 1 to 5 is more preferred, 1 to 3 is even more preferred, and 2 to 3 is particularly preferred. By setting the number at or above the lower limit, a strong film tends to be formed, and substrate adhesion tends to be good. Furthermore, by setting the number at or below the upper limit, deterioration in sensitivity and film loss during development are easily suppressed, and resolution tends to be improved. Examples of the divalent cyclic aliphatic group include a cyclohexane ring, a cycloheptane ring, a cyclodecane ring, a cyclododecane ring, a norbornane ring, an isobornane ring, an adamantane ring, and a cyclododecane ring, each of which has had two hydrogen atoms removed from it. From the viewpoint of the rigidity of the skeleton, a group in which two hydrogen atoms have been removed from an adamantane ring is preferred.

[0148] Examples of the substituent that the divalent aliphatic group may have include an alkoxy group having 1 to 5 carbon atoms, such as a methoxy group or an ethoxy group; a hydroxyl group; a nitro group; a cyano group; and a carboxy group. From the viewpoint of ease of synthesis, it is preferable that the divalent aliphatic group is unsubstituted.

[0149] Examples of divalent aromatic ring groups include divalent aromatic hydrocarbon ring groups and divalent aromatic heterocyclic groups. The number of carbon atoms is not particularly limited, but is preferably 4 or more, more preferably 5 or more, and even more preferably 6 or more. It is also preferably 30 or less, more preferably 20 or less, and even more preferably 15 or less. The above upper and lower limits can be arbitrarily combined. For example, 4 to 30 is preferred, 5 to 20 is more preferred, and 6 to 15 is even more preferred. By setting the number at or above the lower limit, a strong film tends to be easily obtained, surface roughness during development is less likely to occur, and adhesion to the substrate tends to be good. By setting the number at or below the upper limit, deterioration of sensitivity and film loss during development are easily suppressed, and resolution tends to be improved.

[0150] The aromatic hydrocarbon ring in the divalent aromatic hydrocarbon ring group may be a single ring or a condensed ring. Examples of the divalent aromatic hydrocarbon ring group include a benzene ring, a naphthalene ring, an anthracene ring, a phenanthrene ring, a perylene ring, a tetracene ring, a pyrene ring, a benzpyrene ring, a chrysene ring, a triphenylene ring, an acenaphthene ring, a fluoranthene ring, and a fluorene ring, each of which has two free valences. The aromatic heterocycle in the divalent aromatic heterocyclic group may be a single ring or a condensed ring. Examples of the divalent aromatic heterocyclic group include a furan ring, a benzofuran ring, a thiophene ring, a benzothiophene ring, a pyrrole ring, a pyrazole ring, an imidazole ring, an oxadiazole ring, an indole ring, a carbazole ring, a pyrroloimidazole ring, a pyrrolopyrazole ring, a pyrrolopyrrole ring, a thienopyrrole ring, a thienothiophene ring, a furopyrrole ring, a furofuran ring, a thienofuran ring, a benzisoxazole ring, a benzisothiazole ring, a benzimidazole ring, a pyridine ring, a pyrazine ring, a pyridazine ring, a pyrimidine ring, a triazine ring, a quinoline ring, an isoquinoline ring, a cinnoline ring, a quinoxaline ring, a phenanthridine ring, a benzimidazole ring, a perimidine ring, a quinazoline ring, a quinazolinone ring, and an azulene ring, each of which has two free valences. From the viewpoint of patterning properties, a benzene ring or a naphthalene ring having two free valences is preferred, and a benzene ring having two free valences is more preferred.

[0151] Examples of the substituent that the divalent aromatic ring group may have include a hydroxy group, a methyl group, a methoxy group, an ethyl group, an ethoxy group, a propyl group, and a propoxy group. From the viewpoint of solubility in development, unsubstituted groups are preferred.

[0152] Examples of the group in which one or more divalent aliphatic groups are linked to one or more divalent aromatic ring groups include groups in which one or more of the above-mentioned divalent aliphatic groups are linked to one or more of the above-mentioned divalent aromatic ring groups. The number of divalent aliphatic groups is not particularly limited, but is preferably 1 or more, more preferably 2 or more, preferably 10 or less, more preferably 5 or less, and even more preferably 3 or less. The above upper and lower limits can be combined arbitrarily. For example, 1 to 10 is preferred, 1 to 5 is more preferred, 1 to 3 is even more preferred, and 2 to 3 is particularly preferred. By setting the number at or above the lower limit, a strong film is more likely to be obtained, surface roughness during development is less likely to occur, and adhesion to the substrate tends to be good. By setting the number at or below the upper limit, deterioration of sensitivity and film loss during development are more likely to be suppressed, and resolution tends to be improved. The number of divalent aromatic ring groups is not particularly limited, but is preferably 1 or more, more preferably 2 or more, preferably 10 or less, more preferably 5 or less, and even more preferably 3 or less. The above upper and lower limits can be combined arbitrarily. For example, 1 to 10 is preferred, 1 to 5 is more preferred, 1 to 3 is even more preferred, and 2 to 3 is particularly preferred. By setting the number at or above the lower limit, a strong film is more likely to be obtained, surface roughness during development is less likely to occur, and adhesion to the substrate tends to be good. By setting the number at or below the upper limit, deterioration of sensitivity and film loss during development are more likely to be suppressed, and resolution tends to be improved.

[0153] Examples of the group formed by linking one or more divalent aliphatic groups with one or more divalent aromatic ring groups include the groups represented by the above formulae (b1-IA) to (b1-IF). From the viewpoints of the rigidity of the skeleton and the hydrophobicity of the film, the group represented by formula (b1-IC) is preferred.

[0154] The bonding mode of the cyclic hydrocarbon group as a side chain to these divalent hydrocarbon groups is not particularly limited, but examples include a mode in which one hydrogen atom of an aliphatic group or aromatic ring group is substituted with the cyclic hydrocarbon group as a side chain, and a mode in which one carbon atom of an aliphatic group is included to form the cyclic hydrocarbon group as a side chain.

[0155] (R 15 , R 16 ) In formula (b1-II), R 15 and R 16 each independently represents a divalent aliphatic group which may have a substituent.

[0156] Examples of the divalent aliphatic group include linear, branched, and cyclic aliphatic groups. From the viewpoint of development solubility, linear aliphatic groups are preferred, while cyclic aliphatic groups are preferred from the viewpoint of reducing penetration of the developer into the exposed area. The number of carbon atoms is not particularly limited, but is preferably 1 or more, more preferably 3 or more, and even more preferably 6 or more. It is also preferably 20 or less, more preferably 15 or less, and even more preferably 10 or less. The above upper and lower limits can be arbitrarily combined. For example, 1 to 20 is preferred, 3 to 15 is more preferred, and 6 to 10 is even more preferred. By setting the number at or above the lower limit, a strong film is more likely to be obtained, surface roughness during development is less likely to occur, and adhesion to the substrate tends to be good. By setting the number at or below the upper limit, it is easier to suppress deterioration in sensitivity and film loss during development, and resolution tends to be improved.

[0157] Examples of the divalent linear aliphatic group include a methylene group, an ethylene group, an n-propylene group, an n-butylene group, an n-pentylene group, an n-hexylene group, and an n-heptylene group. From the viewpoint of the rigidity of the skeleton, a methylene group is preferred. Examples of the divalent branched aliphatic group include a structure in which the above-mentioned divalent linear aliphatic group has, as a side chain, for example, a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, or a tert-butyl group. The number of rings in the divalent cyclic aliphatic group is not particularly limited, but is preferably 1 or more, more preferably 2 or more. It is also preferably 12 or less, more preferably 10 or less. The upper and lower limits above can be combined arbitrarily. For example, 1 to 12 is preferred, and 2 to 10 is more preferred. By setting the number at or above the lower limit, a strong film tends to be formed, and substrate adhesion tends to be good. By setting the number at or below the upper limit, deterioration in sensitivity and film loss during development tend to be suppressed, and resolution tends to be improved. Examples of the divalent cyclic aliphatic group include groups in which two hydrogen atoms have been removed from a cyclohexane ring, a cycloheptane ring, a cyclodecane ring, a cyclododecane ring, a norbornane ring, an isobornane ring, an adamantane ring, a cyclododecane ring, or a dicyclopentadiene ring. From the viewpoint of skeleton rigidity, groups in which two hydrogen atoms have been removed from a dicyclopentadiene ring or an adamantane ring are preferred.

[0158] Examples of the substituent that the divalent aliphatic group may have include an alkoxy group having 1 to 5 carbon atoms, such as a methoxy group or an ethoxy group; a hydroxyl group; a nitro group; a cyano group; and a carboxy group. From the viewpoint of ease of synthesis, it is preferable that the divalent aliphatic group is unsubstituted.

[0159] (m, n) In formula (b1-II), m and n each independently represent an integer of 0 to 2. By setting the m and n to be equal to or greater than the lower limit, patterning suitability is improved and surface roughness during development tends to be less likely to occur, while by setting the m and n to be equal to or less than the upper limit, developability tends to be improved. From the viewpoint of developability, it is preferable that m and n are 0. From the viewpoint of patterning suitability and suppressing surface roughness during development, it is preferable that m and n are 1 or greater.

[0160] The partial structure represented by formula (b1-II) is preferably a partial structure represented by the following general formula (b1-II-1) from the viewpoint of adhesion to a substrate.

[0161] [ka]

[0162] In formula (b1-II-1), R 13 , R 15 , R 16 , m and n are defined as in formula (b1-II), and R α represents a monovalent cyclic hydrocarbon group which may have a substituent, p represents an integer of 1 or greater, and * represents a bond. The benzene ring in formula (b1-II-1) may be further substituted with any substituent.

[0163] (R α ) In formula (b1-II-1), R α represents an optionally substituted monovalent cyclic hydrocarbon group. The cyclic hydrocarbon group may be an aliphatic cyclic group or an aromatic cyclic group.

[0164] The number of rings in the aliphatic cyclic group is not particularly limited, but is preferably 1 or more, more preferably 2 or more. Also, it is preferably 6 or less, more preferably 4 or less, and even more preferably 3 or less. The upper and lower limits above can be combined arbitrarily. For example, 1 to 6 is preferred, 1 to 4 is more preferred, 1 to 3 is even more preferred, and 2 to 3 is particularly preferred. By setting the number at or above the lower limit, a strong film tends to be obtained, and surface roughness during development tends to be less likely to occur. By setting the number at or below the upper limit, patterning properties tend to be improved. The number of carbon atoms in the aliphatic cyclic group is not particularly limited, but is preferably 4 or more, more preferably 6 or more, and even more preferably 8 or more. It is also preferably 40 or less, more preferably 30 or less, even more preferably 20 or less, and particularly preferably 15 or less. The upper and lower limits above can be combined arbitrarily. For example, 4 to 40 is preferred, 4 to 30 is more preferred, 6 to 20 is more preferred, and 8 to 15 is particularly preferred. By setting the number at or above the lower limit, a strong film tends to be obtained, and surface roughness during development tends to be less likely to occur. By setting the number at or below the upper limit, patterning properties tend to be improved. Examples of the aliphatic ring in the aliphatic ring group include a cyclohexane ring, a cycloheptane ring, a cyclodecane ring, a cyclododecane ring, a norbornane ring, an isobornane ring, an adamantane ring, and a cyclododecane ring. From the viewpoint of strong film properties, an adamantane ring is preferred.

[0165] The number of rings in the aromatic ring group is not particularly limited, but is preferably 1 or more, more preferably 2 or more, and more preferably 3 or more. It is also preferably 10 or less, more preferably 5 or less. The upper and lower limits above can be combined arbitrarily. For example, 1 to 10 is preferred, 1 to 5 is more preferred, 2 to 5 is even more preferred, and 3 to 5 is particularly preferred. By setting the number at or above the lower limit, a strong film tends to be easily obtained, and surface roughness during development tends to be less likely to occur. By setting the number at or below the upper limit, patterning properties tend to be improved. Examples of the aromatic ring group include an aromatic hydrocarbon ring group and an aromatic heterocyclic group. The number of carbon atoms in the aromatic ring group is not particularly limited, but is preferably 4 or more, more preferably 5 or more, and even more preferably 6 or more. The number is preferably 30 or less, more preferably 20 or less, and even more preferably 15 or less. The above upper and lower limits can be arbitrarily combined. For example, 4 to 30 is preferred, 5 to 20 is more preferred, and 6 to 15 is even more preferred. By setting the number at or above the lower limit, a strong film is more likely to be obtained, and surface roughness during development tends to be less likely to occur. By setting the number at or below the upper limit, patterning properties tend to be improved. Examples of the aromatic ring in the aromatic ring group include a benzene ring, a naphthalene ring, an anthracene ring, a phenanthrene ring, and a fluorene ring. From the viewpoint of solubility in development, a fluorene ring is preferred.

[0166] Examples of the substituent that the cyclic hydrocarbon group may have include alkyl groups having 1 to 5 carbon atoms, such as methyl, ethyl, n-propyl, isopropyl, n-butyl, sec-butyl, tert-butyl, amyl, and isoamyl; alkoxy groups having 1 to 5 carbon atoms, such as methoxy and ethoxy; hydroxyl; nitro; cyano; and carboxy. From the viewpoint of ease of synthesis, unsubstituted groups are preferred.

[0167] p represents an integer of 1 or more, preferably 2 or more, and preferably 3 or less. For example, 1 to 3 is preferred, and 2 to 3 is more preferred. By setting it to the lower limit or more, the film hardness and film remaining rate tend to be good. By setting it to the upper limit or less, the developability tends to be good.

[0168] From the viewpoint of strong film hardness, R α is preferably a monovalent aliphatic cyclic group, more preferably an adamantyl group.

[0169] The benzene ring in formula (b1-II-1) may be further substituted with any substituent. Examples of the substituent include a hydroxy group, a methyl group, a methoxy group, an ethyl group, an ethoxy group, a propyl group, and a propoxy group. The number of substituents is not particularly limited, and may be one or two or more. From the viewpoint of patterning properties, it is preferably unsubstituted.

[0170] Specific examples of the partial structure represented by formula (b1-II-1) are listed below.

[0171] [ka]

[0172] [ka]

[0173] [ka]

[0174] [ka]

[0175] [ka]

[0176] The partial structure represented by formula (b1-II) is preferably a partial structure represented by the following general formula (b1-II-2) from the viewpoints of skeleton rigidity and membrane hydrophobicity.

[0177] [ka]

[0178] In formula (b1-II-2), R 13 , R 15 , R 16 , m and n are defined as in formula (b1-II), and R β represents a divalent cyclic hydrocarbon group which may have a substituent, and * represents a bond. The benzene ring in formula (b1-II-2) may be further substituted with any substituent.

[0179] (R β ) In formula (b1-II-2), R β represents a divalent cyclic hydrocarbon group which may have a substituent. The cyclic hydrocarbon group may be an aliphatic cyclic group or an aromatic cyclic group.

[0180] The number of rings in the aliphatic cyclic group is not particularly limited, but is preferably 1 or more, more preferably 2 or more. It is also preferably 10 or less, more preferably 5 or less. The upper and lower limits can be arbitrarily combined. For example, 1 to 10 is preferred, and 2 to 5 is more preferred. By setting the number at or above the lower limit, a strong film tends to be easily obtained, and surface roughness during development tends to be less likely to occur. By setting the number at or below the upper limit, it is easy to suppress deterioration in sensitivity and film loss during development, and resolution tends to be improved. The number of carbon atoms in the aliphatic cyclic group is preferably 4 or more, more preferably 6 or more, and even more preferably 8 or more. It is also preferably 40 or less, more preferably 35 or less, and even more preferably 30 or less. The upper and lower limits above can be combined arbitrarily. For example, 4 to 40 is preferred, 6 to 35 is more preferred, and 8 to 30 is even more preferred. By setting the carbon atom number at or above the lower limit, roughening of the film surface during development tends to be suppressed. By setting the carbon atom number at or below the upper limit, deterioration of sensitivity and film loss during development tend to be suppressed, and resolution tends to be improved. Examples of the aliphatic ring in the aliphatic ring group include a cyclohexane ring, a cycloheptane ring, a cyclodecane ring, a cyclododecane ring, a norbornane ring, an isobornane ring, an adamantane ring, and a cyclododecane ring. From the viewpoints of film loss during development and resolution, an adamantane ring is preferred.

[0181] The number of rings in the aromatic ring group is not particularly limited, but is preferably 1 or more, more preferably 2 or more, and even more preferably 3 or more. It is also preferably 10 or less, and more preferably 5 or less. The upper and lower limits can be arbitrarily combined. For example, 1 to 10 is preferred, 1 to 5 is more preferred, 2 to 5 is even more preferred, and 3 to 5 is particularly preferred. By setting the number at or above the lower limit, a strong film tends to be easily obtained, and surface roughness during development tends to be less likely to occur. By setting the number at or below the upper limit, it is easy to suppress deterioration in sensitivity and film loss, and resolution tends to be improved. Examples of the aromatic ring group include an aromatic hydrocarbon ring group and an aromatic heterocyclic group. The number of carbon atoms in the aromatic ring group is preferably 4 or more, more preferably 6 or more, even more preferably 8 or more, and even more preferably 10 or more. It is also preferably 40 or less, more preferably 30 or less, even more preferably 20 or less, and particularly preferably 15 or less. The above upper and lower limits can be combined arbitrarily. For example, 4 to 40 is preferred, 6 to 30 is more preferred, 8 to 20 is more preferred, and 10 to 15 is particularly preferred. By setting it to the above lower limit or more, a strong film tends to be easily obtained, and surface roughness that occurs during development tends to be less likely to occur. By setting it to the above upper limit or less, it is easy to suppress deterioration in sensitivity and film loss, and resolution tends to be improved. Examples of the aromatic ring in the aromatic ring group include a benzene ring, a naphthalene ring, an anthracene ring, a phenanthrene ring, and a fluorene ring. From the viewpoint of developability, a fluorene ring is preferred.

[0182] Examples of the substituent that the cyclic hydrocarbon group may have include alkyl groups having 1 to 5 carbon atoms, such as methyl, ethyl, n-propyl, isopropyl, n-butyl, sec-butyl, tert-butyl, amyl, and isoamyl; alkoxy groups having 1 to 5 carbon atoms, such as methoxy and ethoxy; hydroxyl; nitro; cyano; and carboxy. From the viewpoint of ease of synthesis, unsubstituted groups are preferred.

[0183] From the viewpoint of suppressing film loss and improving resolution, R β is preferably a divalent aliphatic ring group, and more preferably a divalent adamantane ring group. β is preferably a divalent aromatic ring group, and more preferably a divalent fluorene ring group.

[0184] The benzene ring in formula (b1-II-2) may be further substituted with any substituent. Examples of the substituent include a hydroxy group, a methyl group, a methoxy group, an ethyl group, an ethoxy group, a propyl group, and a propoxy group. The number of substituents is not particularly limited, and may be one or two or more. In addition, the two benzene rings in formula (b1-II-2) are R β In addition, they may be linked via a substituent to form a tricyclic structure. In this case, examples of the substituent include divalent groups such as -O-, -S-, -NH-, and -CH2-. For example, the formation of a tricyclic structure by linking via -O- means that R β This means that the carbon atoms at the ortho positions of the carbon atom bonded to the carbon atom bonded to the xanthene skeleton are linked via -O-. From the viewpoint of patterning properties, it is preferably unsubstituted, and from the viewpoint of preventing film loss and the like, it is preferably substituted with a methyl group.

[0185] Specific examples of the partial structure represented by formula (b1-II-2) are shown below. In the examples, * indicates a bond.

[0186] [ka]

[0187] [ka]

[0188] [ka]

[0189] [ka]

[0190] The partial structure represented by formula (b1-II) is preferably a partial structure represented by the following general formula (b1-II-3) from the viewpoint of the coating film remaining rate and patterning characteristics.

[0191] [ka]

[0192] In formula (b1-II-3), R 13 , R 14 , R 15 , R 16 , m and n are defined as in formula (b1-II), and R Z represents a hydrogen atom or a polybasic acid residue.

[0193] The polybasic acid residue refers to a monovalent group obtained by removing one OH group from a polybasic acid. In addition, when another OH group is removed, the R Z It may be shared with R Z A plurality of formula (b1-II-3) may be linked via the following. Examples of polybasic acids include maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, trimellitic acid, benzophenonetetracarboxylic acid, methylhexahydrophthalic acid, endomethylenetetrahydrophthalic acid, chlorendic acid, methyltetrahydrophthalic acid, and biphenyltetracarboxylic acid. From the viewpoint of patterning properties, preferred are maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, trimellitic acid, and biphenyltetracarboxylic acid, and more preferred are tetrahydrophthalic acid, biphenyltetracarboxylic acid, and biphenyltetracarboxylic acid.

[0194] The partial structure represented by formula (b1-II-3) contained in one molecule of the epoxy (meth)acrylate resin (b1-II) may be one type or two or more types, and for example, R Z is a hydrogen atom, and R Z However, polybasic acid residues may be present in the mixture.

[0195] The number of partial structures represented by formula (b1-II) contained in one molecule of the (b1-II) epoxy (meth)acrylate resin is not particularly limited, but is preferably 1 or more, more preferably 3 or more. It is also preferably 20 or less, more preferably 15 or less, and even more preferably 10 or less. The upper and lower limits above can be arbitrarily combined. For example, 1 to 20 is preferred, 1 to 15 is more preferred, and 3 to 10 is even more preferred. By setting the number at or above the lower limit, a strong film tends to be obtained, and surface roughness during development tends to be less likely to occur. By setting the number at or below the upper limit, it is easier to suppress deterioration in sensitivity and film loss, and resolution tends to be improved.

[0196] The weight-average molecular weight (Mw) of the (b1-II) epoxy (meth)acrylate resin, measured by gel permeation chromatography (GPC) in terms of polystyrene, is not particularly limited, but is preferably 1,000 or more, more preferably 1,500 or more, even more preferably 2,000 or more, even more preferably 3,000 or more, particularly preferably 4,000 or more, and particularly preferably 5,000 or more. It is also preferably 10,000 or less, more preferably 8,000 or less, and even more preferably 7,000 or less. The above upper and lower limits can be arbitrarily combined. For example, it is preferably 1,000 to 10,000, more preferably 1,500 to 10,000, more preferably 1,500 to 8,000, even more preferably 2,000 to 8,000, and particularly preferably 2,000 to 7,000. By setting it to the lower limit or more, the film retention rate of the photosensitive coloring composition tends to be good. By setting it to the upper limit or less, the solubility in the developer tends to be good.

[0197] The acid value of the (b1-II) epoxy (meth)acrylate resin is not particularly limited, but is preferably 20 mgKOH / g or more, more preferably 40 mgKOH / g or more, even more preferably 60 mgKOH / g or more, even more preferably 80 mgKOH / g or more, and particularly preferably 100 mgKOH / g or more. Also, it is preferably 200 mgKOH / g or less, more preferably 150 mgKOH / g or less, even more preferably 130 mgKOH / g or less, and particularly preferably 120 mgKOH / g or less. The above upper and lower limits can be arbitrarily combined. For example, it is preferably 20 mgKOH / g to 200 mgKOH / g, more preferably 60 mgKOH / g to 150 mgKOH / g, even more preferably 80 mgKOH / g to 130 mgKOH / g, and even more preferably 100 mgKOH / g to 130 mgKOH / g. By setting it to the above lower limit or more, the developer solubility is improved, and the resolution tends to be good. By making the content equal to or less than the upper limit, the remaining film rate of the photosensitive coloring composition tends to be good.

[0198] The carboxyl group-containing epoxy (meth)acrylate resin may be used alone or in combination of two or more resins. Furthermore, a portion of the carboxyl group-containing epoxy (meth)acrylate resin may be replaced with another binder resin. That is, the carboxyl group-containing epoxy (meth)acrylate resin may be used in combination with another binder resin. In this case, the proportion of the carboxyl group-containing epoxy (meth)acrylate resin in the alkali-soluble resin (b) is preferably 50% by mass or more, more preferably 60% by mass or more, even more preferably 70% by mass or more, and particularly preferably 80% by mass or more, and may be 100% by mass or less.

[0199] As the alkali-soluble resin (b), from the viewpoint of compatibility with pigments, dispersants, etc., it is preferable to use an acrylic copolymer resin (b2), and those described in JP 2014-137466 A can be preferably used.

[0200] Examples of the (b2) acrylic copolymer resin include a copolymer of an ethylenically unsaturated monomer having one or more carboxy groups (hereinafter referred to as "unsaturated monomer (b2-1)") and another copolymerizable ethylenically unsaturated monomer (hereinafter referred to as "unsaturated monomer (b2-2)"). Examples of the unsaturated monomer (b2-1) include unsaturated monocarboxylic acids such as (meth)acrylic acid, crotonic acid, α-chloroacrylic acid, and cinnamic acid; unsaturated dicarboxylic acids or anhydrides thereof such as maleic acid, maleic anhydride, fumaric acid, citraconic acid, citraconic anhydride, and mesaconic acid; mono[(meth)acryloyloxyalkyl] esters of divalent or higher polyvalent carboxylic acids such as succinic acid mono[2-(meth)acryloyloxyethyl] and phthalic acid mono[2-(meth)acryloyloxyethyl]; mono(meth)acrylates of polymers having a carboxy group and a hydroxyl group at both ends, such as ω-carboxypolycaprolactone mono(meth)acrylate; and p-vinylbenzoic acid. These unsaturated monomers (b2-1) can be used alone or in combination of two or more.

[0201] Examples of the unsaturated monomer (b2-2) include N-substituted maleimides such as N-phenylmaleimide and N-cyclohexylmaleimide; Aromatic vinyl compounds such as styrene, α-methylstyrene, p-hydroxystyrene, p-hydroxy-α-methylstyrene, p-vinylbenzyl glycidyl ether, and acenaphthylene;

[0202] Methyl (meth)acrylate, n-butyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, allyl (meth)acrylate, benzyl (meth)acrylate, polyethylene glycol (degree of polymerization 2-10) methyl ether (meth)acrylate, polypropylene glycol (degree of polymerization 2-10) methyl ether (meth)acrylate, polyethylene glycol (degree of polymerization 2-10) mono(meth)acrylate, polypropylene glycol (degree of polymerization 2-10) mono(meth)acrylate, cyclohexyl (meth)acrylate, isobornyl (meth)acrylate, tricyclo[5.2.1.0] 2,6 ] (meth)acrylic acid esters such as decan-8-yl (meth)acrylate, dicyclopentenyl (meth)acrylate, glycerol mono(meth)acrylate, 4-hydroxyphenyl (meth)acrylate, ethylene oxide-modified (meth)acrylate of para-cumylphenol, glycidyl (meth)acrylate, 3,4-epoxycyclohexylmethyl (meth)acrylate, 3-[(meth)acryloyloxymethyl]oxetane, and 3-[(meth)acryloyloxymethyl]-3-ethyloxetane;

[0203] Cyclohexyl vinyl ether, isobornyl vinyl ether, tricyclo[5.2.1.0 2,6 ] Vinyl ethers such as decan-8-yl vinyl ether, pentacyclopentadecanyl vinyl ether, and 3-(vinyloxymethyl)-3-ethyloxetane; Examples include macromonomers having a mono(meth)acryloyl group at the end of the polymer molecular chain, such as polystyrene, polymethyl(meth)acrylate, poly-n-butyl(meth)acrylate, and polysiloxane. These unsaturated monomers (b2-2) can be used alone or in combination of two or more.

[0204] In the copolymer of the unsaturated monomer (b2-1) and the unsaturated monomer (b2-2), the copolymerization ratio of the unsaturated monomer (b2-1) is preferably 5 to 50 mass%, more preferably 10 to 40 mass%. By copolymerizing the unsaturated monomer (b2-1) in such a range, it tends to be possible to obtain a photosensitive coloring composition excellent in alkali developability and storage stability.

[0205] Examples of the copolymer of the unsaturated monomer (b2-1) and the unsaturated monomer (b2-2) include the copolymers disclosed in Japanese Patent Application Laid-Open Nos. 7-140654, 8-259876, 10-31308, 10-300922, 11-174224, 11-258415, 2000-56118, and 2004-101728. The copolymer of the unsaturated monomer (b2-1) and the unsaturated monomer (b2-2) can be produced by known methods. For example, the structure, Mw, and Mw / Mn (Mn is the number average molecular weight) can be controlled by the methods disclosed in JP 2003-222717 A, JP 2006-259680 A, and WO 2007 / 029871 A.

[0206] Resins described in WO 2016 / 194619 and WO 2017 / 154439 may also be used.

[0207] <(c) Photopolymerization initiator> (c) Photopolymerization initiator is a component that directly absorbs light, causes a decomposition reaction or a hydrogen abstraction reaction, and generates polymerization-active radicals. If necessary, additives such as a polymerization accelerator (chain transfer agent) and a sensitizing dye may be added. Examples of the photopolymerization initiator include metallocene compounds including titanocene compounds described in JP-A-59-152396 and JP-A-61-151197; hexaarylbiimidazole derivatives described in JP-A-2000-56118; halomethylated oxadiazole derivatives and halomethyl-s-triazine derivatives described in JP-A-10-39503; α-aminoalkylphenone derivatives; and oxime ester compounds described in JP-A-2000-80068 and JP-A-2006-36750.

[0208] Examples of the metallocene compound include dicyclopentadienyltitanium dichloride, dicyclopentadienyltitanium bisphenyl, dicyclopentadienyltitanium bis(2,3,4,5,6-pentafluorophenyl), dicyclopentadienyltitanium bis(2,3,5,6-tetrafluorophenyl), dicyclopentadienyltitanium bis(2,4,6-trifluorophenyl), dicyclopentadienyltitanium di(2,6-difluorophenyl), dicyclopentadienyltitanium di(2,4-difluorophenyl), di(methylcyclopentadienyl)titanium bis(2,3,4,5,6-pentafluorophenyl), di(methylcyclopentadienyl)titanium bis(2,6-difluorophenyl), and dicyclopentadienyltitanium[2,6-difluoro-3-(pyrro-1-yl)phenyl].

[0209] Examples of hexaarylbiimidazole derivatives include 2-(2'-chlorophenyl)-4,5-diphenylimidazole dimer, 2-(2'-chlorophenyl)-4,5-bis(3'-methoxyphenyl)imidazole dimer, 2-(2'-fluorophenyl)-4,5-diphenylimidazole dimer, 2-(2'-methoxyphenyl)-4,5-diphenylimidazole dimer, and (4'-methoxyphenyl)-4,5-diphenylimidazole dimer.

[0210] Examples of halomethylated oxadiazole derivatives include 2-trichloromethyl-5-(2'-benzofuryl)-1,3,4-oxadiazole, 2-trichloromethyl-5-[β-(2'-benzofuryl)vinyl]-1,3,4-oxadiazole, 2-trichloromethyl-5-[β-(2'-(6''-benzofuryl)vinyl)]-1,3,4-oxadiazole, and 2-trichloromethyl-5-furyl-1,3,4-oxadiazole.

[0211] Examples of halomethyl-s-triazine derivatives include 2-(4-methoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4-methoxynaphthyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4-ethoxynaphthyl)-4,6-bis(trichloromethyl)-s-triazine, and 2-(4-ethoxycarbonylnaphthyl)-4,6-bis(trichloromethyl)-s-triazine.

[0212] Examples of α-aminoalkylphenone derivatives include 2-methyl-1[4-(methylthio)phenyl]-2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butanone-1, 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)butan-1-one, 2-dimethylamino-2-(4-methylbenzyl)-1-(4-morpholinophenyl)butan-1-one, and 3,6-bis(2-methyl-2-morpholinopropionyl)-9-octylcarbazole.

[0213] As the photopolymerization initiator, an oxime ester compound is particularly effective in terms of sensitivity and plate-making properties, and when an alkali-soluble resin containing a phenolic hydroxyl group is used, for example, an oxime ester compound with such excellent sensitivity is particularly useful. Since the oxime ester compound has a structure that absorbs ultraviolet light, a structure that transmits light energy, and a structure that generates radicals, it has high sensitivity even in a small amount and is stable against thermal reactions, and it is possible to obtain a highly sensitive photosensitive coloring composition with a small amount.

[0214] Examples of the oxime ester compounds include compounds represented by the following general formula (IV).

[0215] [ka]

[0216] In formula (IV), R 21a represents a hydrogen atom, an alkyl group which may have a substituent, or an aromatic ring group which may have a substituent. R 21b represents an optional substituent containing an aromatic ring. R 22a represents an alkanoyl group which may have a substituent, or an aryloyl group which may have a substituent. n represents an integer of 0 or 1.

[0217] R 21a In the formula, the number of carbon atoms in the alkyl group is not particularly limited, but from the viewpoint of solubility in a solvent and sensitivity, it is preferably 1 or more, more preferably 2 or more, and is preferably 20 or less, more preferably 15 or less, and even more preferably 10 or less. Examples of the alkyl group include a methyl group, an ethyl group, a propyl group, and a cyclopentylethyl group. Examples of the substituent that the alkyl group may have include an aromatic ring group, a hydroxyl group, a carboxyl group, a halogen atom, an amino group, an amide group, a 4-(2-methoxy-1-methyl)ethoxy-2-methylphenyl group, and an N-acetyl-N-acetoxyamino group. From the viewpoint of ease of synthesis, it is preferable that the alkyl group is unsubstituted.

[0218] R 21a Examples of the aromatic ring group in include an aromatic hydrocarbon ring group and an aromatic heterocyclic group. The number of carbon atoms in the aromatic ring group is not particularly limited, but is preferably 5 or more from the viewpoint of solubility in the photosensitive coloring composition. From the viewpoint of developability, the number of carbon atoms is preferably 30 or less, more preferably 20 or less, and even more preferably 12 or less. For example, the number is preferably 5 to 30, more preferably 5 to 20, and even more preferably 5 to 12.

[0219] Examples of the aromatic ring group include a phenyl group, a naphthyl group, a pyridyl group, and a furyl group. From the viewpoint of developability, a phenyl group or a naphthyl group is preferred, and a phenyl group is more preferred. Examples of the substituent that the aromatic ring group may have include a hydroxyl group, a carboxyl group, a halogen atom, an amino group, an amide group, an alkyl group, an alkoxy group, and a group in which these substituents are linked. From the viewpoint of developability, an alkyl group, an alkoxy group, or a group in which these substituents are linked is preferred, and a linked alkoxy group is more preferred. From the viewpoint of developability, R 21a is preferably an aromatic ring group which may have a substituent, and more preferably an aromatic ring group which has a linked alkoxy group as a substituent.

[0220] R 21b Examples of the alkyl group include an optionally substituted carbazolyl group, an optionally substituted thioxanthonyl group, an optionally substituted diphenyl sulfide group, an optionally substituted fluorenyl group, and an optionally substituted indolyl group. From the viewpoint of sensitivity, an optionally substituted carbazolyl group is preferred. From the viewpoint of electrical reliability, an optionally substituted diphenyl sulfide group is preferred.

[0221] R 22a Although the number of carbon atoms in the alkanoyl group is not particularly limited, from the viewpoint of solubility in a solvent and sensitivity, it is preferably 2 or more, and is preferably 20 or less, more preferably 15 or less, even more preferably 10 or less, and particularly preferably 5 or less. Examples of the alkanoyl group include an acetyl group, a propanoyl group, and a butanoyl group. Examples of the substituent that the alkanoyl group may have include an aromatic ring group, a hydroxyl group, a carboxyl group, a halogen atom, an amino group, and an amide group. From the viewpoint of ease of synthesis, it is preferable that the alkanoyl group is unsubstituted.

[0222] R 22a Although the number of carbon atoms in the aryloyl group is not particularly limited, from the viewpoints of solubility in a solvent and sensitivity, it is preferably 7 or more, more preferably 8 or more, and is preferably 20 or less, more preferably 15 or less, and even more preferably 10 or less. Examples of the aryloyl group include a benzoyl group and a naphthoyl group. Examples of the substituent that the aryloyl group may have include a hydroxyl group, a carboxyl group, a halogen atom, an amino group, an amide group, and an alkyl group. From the viewpoint of ease of synthesis, it is preferable that the aryloyl group is unsubstituted. From a sensitivity perspective, R 22a is preferably an alkanoyl group which may have a substituent, more preferably an unsubstituted alkanoyl group, and even more preferably an acetyl group.

[0223] For example, Japanese Patent No. 4454067, International Publication No. 2002 / 100903, International Publication No. 2012 / 45736, International Publication No. 2015 / 36910, International Publication No. 2006 / 18973, International Publication No. 2008 / 78678, Japanese Patent No. 4818458, International Publication No. 2005 / 803 Photopolymerization initiators described in International Publication No. 38, International Publication No. 2008 / 75564, International Publication No. 2009 / 131189, International Publication No. 2009 / 131189, International Publication No. 2010 / 133077, International Publication No. 2010 / 102502, and International Publication No. 2012 / 68879 can be used.

[0224] The initiators described in JP 2016-133574 A can also be suitably used because they reduce contamination by colorants.

[0225] The photopolymerization initiator may be used alone or in combination of two or more kinds. The photopolymerization initiator may contain a sensitizing dye and a polymerization accelerator according to the wavelength of the image exposure light source, if necessary, for the purpose of increasing sensitivity. Examples of the sensitizing dye include xanthene dyes described in JP-A-4-221958 and JP-A-4-219756, coumarin dyes having a heterocycle described in JP-A-3-239703 and JP-A-5-289335, 3-ketocoumarin compounds described in JP-A-3-239703 and JP-A-5-289335, pyrromethene dyes described in JP-A-6-19240, JP-A-47-2528, JP-A-54-155292, and JP-A-54-155293. Examples of dyes having a dialkylaminobenzene skeleton include those described in JP-B No. 45-37377, JP-A No. 48-84183, JP-A No. 52-112681, JP-A No. 58-15503, JP-A No. 60-88005, JP-A No. 59-56403, JP-A No. 2-69, JP-A No. 57-168088, JP-A No. 5-107761, JP-A No. 5-210240, and JP-A No. 4-288818.

[0226] The sensitizing dye is preferably an amino group-containing sensitizing dye, and more preferably a compound having an amino group and a phenyl group in the same molecule. Examples thereof include benzophenone compounds such as 4,4'-dimethylaminobenzophenone, 4,4'-diethylaminobenzophenone, 2-aminobenzophenone, 4-aminobenzophenone, 4,4'-diaminobenzophenone, 3,3'-diaminobenzophenone, and 3,4-diaminobenzophenone; 2-(p-dimethylaminophenyl)benzoxazole, 2-(p-diethylaminophenyl)benzoxazole, 2-(p-dimethylaminophenyl)benzo[4,5]benzoxazole, 2-(p-dimethylaminophenyl)benzo[6,7]benzoxazole, 2,5-bis(p-diethylaminophenyl)-1,3,4-oxazole, and 2-(p-dimethylaminophenyl)benzo[4,5]benzoxazole.

[0043] A p-dialkylaminophenyl group-containing compound such as 4,4'-dialkylaminophenyl)benzothiazole, 2-(p-diethylaminophenyl)benzothiazole, 2-(p-dimethylaminophenyl)benzimidazole, 2-(p-diethylaminophenyl)benzimidazole, 2,5-bis(p-diethylaminophenyl)-1,3,4-thiadiazole, (p-dimethylaminophenyl)pyridine, (p-diethylaminophenyl)pyridine, (p-dimethylaminophenyl)quinoline, (p-diethylaminophenyl)quinoline, (p-dimethylaminophenyl)pyrimidine, or (p-diethylaminophenyl)pyrimidine is preferred, and 4,4'-dialkylaminobenzophenone is particularly preferred. The sensitizing dyes may be used alone or in combination of two or more.

[0227] Examples of the polymerization accelerator include aromatic amines such as ethyl p-dimethylaminobenzoate and 2-dimethylaminoethyl benzoate, aliphatic amines such as n-butylamine and N-methyldiethanolamine, and mercapto compounds described below. One type of polymerization accelerator may be used alone, or two or more types may be used in combination.

[0228] <(d) Ethylenically unsaturated compounds> The photosensitive coloring composition of the present invention contains (d) an ethylenically unsaturated compound. By containing (d) an ethylenically unsaturated compound, sensitivity is improved. The ethylenically unsaturated compound (d) used in the present invention is a compound having at least one ethylenically unsaturated group in the molecule, and specific examples thereof include (meth)acrylic acid, (meth)acrylic acid alkyl esters, acrylonitrile, styrene, carboxylic acids having one ethylenically unsaturated bond, and monoesters of polyhydric or monohydric alcohols.

[0229] In the present invention, it is particularly preferable to use a polyfunctional ethylenic monomer having two or more ethylenically unsaturated groups in one molecule. The number of ethylenically unsaturated groups in the polyfunctional ethylenic monomer is not particularly limited, but is preferably two or more, more preferably four or more, even more preferably five or more, and preferably eight or less, and more preferably seven or less. The above upper and lower limits can be arbitrarily combined. For example, 2 to 8 groups are preferred, 2 to 7 are more preferred, 4 to 7 are even more preferred, and 5 to 7 are particularly preferred. Setting the number at or above the lower limit tends to result in high sensitivity. Setting the number at or below the upper limit tends to result in improved solubility in solvents. Examples of polyfunctional ethylenic monomers include esters of aliphatic polyhydroxy compounds and unsaturated carboxylic acids; esters of aromatic polyhydroxy compounds and unsaturated carboxylic acids; and esters obtained by esterification reactions of polyhydric hydroxy compounds such as aliphatic polyhydroxy compounds and aromatic polyhydroxy compounds with unsaturated carboxylic acids and polybasic carboxylic acids.

[0230] Examples of esters of aliphatic polyhydroxy compounds and unsaturated carboxylic acids include acrylic acid esters of aliphatic polyhydroxy compounds such as ethylene glycol diacrylate, triethylene glycol diacrylate, trimethylolpropane triacrylate, trimethylolethane triacrylate, pentaerythritol diacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, and glycerol acrylate; methacrylic acid esters in which these acrylates are replaced with methacrylate; itaconic acid esters in which these acrylates are replaced with itaconate; crotonate esters in which these acrylates are replaced with crotonate; and maleic acid esters in which these acrylates are replaced with maleate.

[0231] Examples of esters of aromatic polyhydroxy compounds and unsaturated carboxylic acids include acrylic acid esters and methacrylic acid esters of aromatic polyhydroxy compounds such as hydroquinone diacrylate, hydroquinone dimethacrylate, resorcinol diacrylate, resorcinol dimethacrylate, and pyrogallol triacrylate.

[0232] The ester obtained by the esterification reaction of a polybasic carboxylic acid and an unsaturated carboxylic acid with a polyvalent hydroxy compound is not necessarily a single compound, but examples thereof include a condensate of acrylic acid, phthalic acid, and ethylene glycol, a condensate of acrylic acid, maleic acid, and diethylene glycol, a condensate of methacrylic acid, terephthalic acid, and pentaerythritol, and a condensate of acrylic acid, adipic acid, butanediol, and glycerin.

[0233] Other examples of the polyfunctional ethylenic monomer used in the present invention include urethane (meth)acrylates obtained by reacting a polyisocyanate compound with a hydroxyl group-containing (meth)acrylic acid ester or a polyisocyanate compound with a polyol and a hydroxyl group-containing (meth)acrylic acid ester; epoxy acrylates such as the addition reaction product of a polyfunctional epoxy compound with a hydroxy (meth)acrylate or (meth)acrylic acid; acrylamides such as ethylene bisacrylamide; allyl esters such as diallyl phthalate; and vinyl group-containing compounds such as divinyl phthalate.

[0234] Examples of urethane (meth)acrylates include DPHA-40H, UX-5000, UX-5002D-P20, UX-5003D, and UX-5005 (manufactured by Nippon Kayaku Co., Ltd.), U-2PPA, U-6LPA, U-10PA, U-33H, UA-53H, UA-32P, and UA-1100H (manufactured by Shin-Nakamura Chemical Co., Ltd.), UA-306H, UA-510H, and UF-8001G (manufactured by Kyoeisha Chemical Co., Ltd.), and UV-1700B, UV-7600B, UV-7605B, UV-7630B, and UV7640B (manufactured by Mitsubishi Chemical Corporation).

[0235] From the viewpoint of curability, it is preferable to use, as the (d) ethylenically unsaturated compound, a urethane (meth)acrylate obtained by reacting a (meth)acrylic acid alkyl ester, a polyisocyanate compound with a hydroxyl group-containing (meth)acrylic acid ester, or a polyisocyanate compound with a polyol and a hydroxyl group-containing (meth)acrylic acid ester, and it is more preferable to use a polyisocyanate compound with a hydroxyl group-containing (meth)acrylic acid ester. These may be used alone or in combination of two or more.

[0236] <(e) Nitrogen-containing aromatic compounds> The photosensitive coloring composition of the present invention contains (e) a nitrogen-containing aromatic compound. (e) It is presumed that nitrogen-containing aromatic compounds have the effect of protecting metals such as silver from gas components that corrode the metal by coordinating with the metal. By adding them to the photosensitive coloring composition, it is thought that they sublimate from the coating film during the heating and baking process of the partition wall, protecting the metal used as the anode material, thereby suppressing structural deformation of the electrode that could lead to poor lighting of the panel. The nitrogen-containing aromatic compound (e) in the photosensitive coloring composition according to the first embodiment of the present invention includes a compound represented by the following general formula (1) and / or the following general formula (2).

[0237] [ka]

[0238] In formula (1), X represents -CH= or -N=, and R 1 represents an alkyl group, a carboxy group, or a nitro group, and R 2 represents a hydroxyl group or a hydrogen atom, and l represents an integer of 0 to 4.

[0239] R 1 The alkyl group in is not particularly limited, but examples thereof include a methyl group, an ethyl group, a propyl group, and an isopropyl group. From the viewpoint of surface roughness, R 1 is preferably a methyl group. From the viewpoint of surface roughness, R 2 is preferably a hydrogen atom. From the viewpoint of suppressing surface roughness, l is preferably 0 to 1, and 0, that is, no substitution, is more preferable.

[0240] Examples of the compound represented by formula (1) include benzotriazole, 5-methyl-1H-benzotriazole, benzimidazole, 5-methylbenzimidazole, 1-hydroxybenzotriazole, 4-nitrobenzotriazole, and 5-nitrobenzotriazole. Benzotriazole is preferred from the viewpoint of preventing surface roughness.

[0241] [ka]

[0242] In formula (2), R 3 , R 4 each independently represents an alkyl group; m and n each independently represents an integer of 0 to 4;

[0243] R 3 , R 4 is not particularly limited as long as it is an alkyl group, and examples thereof include a methyl group, an ethyl group, a propyl group, and an isopropyl group. From the viewpoint of suppressing surface roughness, a methyl group is preferred. From the viewpoint of suppressing surface roughness, m and n are each preferably 0 to 1, and more preferably 0, that is, no substitution.

[0244] Specific examples of the compound represented by formula (2) include 2,2'-bipyridine, 4,4'-bipyridine, 6-methyl-2,2'-bipyridine, 4,4'-dimethyl-2,2'-bipyridine, and 4,4',6,6'-tetramethyl-2,2'-bipyridine. From the viewpoint of suppressing surface roughness, 2,2'-bipyridine is preferred.

[0245] Of the compounds represented by formula (1) or formula (2), benzotriazole is preferred from the viewpoint of suppressing surface roughness. (e) The nitrogen-containing aromatic compounds may be used alone or in combination of two or more.

[0246] As the nitrogen-containing aromatic compound (e) in the photosensitive coloring composition according to the second embodiment of the present invention, for example, a nitrogen-containing heterocyclic 1- to 3-membered ring compound is preferred. Examples of single-membered ring compounds include pyrazole, imidazole, pyridine, bipyridine, pyridazine, pyrimidine, pyrazine, triazine, and tetrazine. Examples of two-membered ring compounds include indole, isoindole, benzimidazole, benzotriazole, purine, quinoline, isoquinoline, quinoxaline, quinazoline, pteridine, and fusalazine. Examples of three-membered ring compounds include acridine, phenanthridine, and phenazine. The nitrogen-containing aromatic compound (e) in the photosensitive coloring composition of the second aspect of the present invention may have a substituent, and examples of the substituent include an alkyl group, a carboxy group, or a nitro group. The alkyl group is not particularly limited, but examples thereof include a methyl group, an ethyl group, a propyl group, and an isopropyl group. Of these, from the viewpoint of suppressing surface roughness, one-membered ring compounds or two-membered ring compounds are preferred, benzotriazole and bipyridine are more preferred, and benzotriazole is even more preferred.

[0247] The nitrogen-containing aromatic compound (e) in the photosensitive coloring composition according to the second aspect of the present invention may be used alone or in combination of two or more.

[0248] <(f) Dispersant> In order to ensure the stability of quality, the photosensitive coloring composition of the present invention contains (f) a dispersant to finely disperse (a) the colorant and stabilize the dispersed state. As the (f) dispersant, a polymer dispersant having a functional group is preferred, and furthermore, from the viewpoint of dispersion stability, a polymer dispersant having a functional group such as a carboxyl group, a phosphate group, a sulfonic acid group, or a base thereof, a primary, secondary, or tertiary amino group, a quaternary ammonium base, or a group derived from a nitrogen-containing heterocycle such as pyridine, pyrimidine, or pyrazine is preferred. In particular, a polymer dispersant having a basic functional group such as a primary, secondary, or tertiary amino group, a quaternary ammonium base, or a group derived from a nitrogen-containing heterocycle such as pyridine, pyrimidine, or pyrazine is particularly preferred from the viewpoint that the pigment can be dispersed with a small amount of dispersant.

[0249] Examples of polymeric dispersants include urethane-based dispersants, acrylic-based dispersants, polyethyleneimine-based dispersants, polyallylamine-based dispersants, dispersants consisting of a monomer and a macromonomer having an amino group, polyoxyethylene alkyl ether-based dispersants, polyoxyethylene diester-based dispersants, polyether phosphate-based dispersants, polyester phosphate-based dispersants, sorbitan aliphatic ester-based dispersants, and aliphatic-modified polyester-based dispersants.

[0250] Examples of such dispersants include, by trade name, EFKA (registered trademark, manufactured by BASF), DISPERBYK (registered trademark, manufactured by BYK-Chemie), DISPARLON (registered trademark, manufactured by Kusumoto Chemicals Co., Ltd.), SOLSPERSE (registered trademark, manufactured by Lubrizol Corporation), KP (manufactured by Shin-Etsu Chemical Co., Ltd.), Polyflow (manufactured by Kyoeisha Chemical Co., Ltd.), and AJISPER (registered trademark, manufactured by Ajinomoto Co., Inc.). The polymer dispersant may be used alone or in combination of two or more kinds.

[0251] From the viewpoint of pigment dispersibility, the (f) dispersant preferably contains either or both of a urethane-based polymer dispersant having a functional group and an acrylic-based polymer dispersant, and it is particularly preferable that the (f) dispersant contains an acrylic-based polymer dispersant. From the viewpoint of dispersibility and storage stability, polymer dispersants having a basic functional group and either or both of a polyester bond and a polyether bond are preferred.

[0252] Examples of urethane-based and acrylic-based polymer dispersants include DISPERBYK-160 to 167, 182 series (all urethane-based), DISPERBYK-2000, 2001, BYK-LPN21116 (all acrylic-based) (all manufactured by BYK-Chemie).

[0253] The amine value of the polymer dispersant having a basic functional group is not particularly limited, but is preferably 1 mgKOH / g or more, more preferably 10 mgKOH / g or more, even more preferably 20 mgKOH / g or more, even more preferably 40 mgKOH / g or more, and particularly preferably 50 mgKOH / g or more. It is also preferably 140 mgKOH / g or less, more preferably 120 mgKOH / g or less, even more preferably 100 mgKOH / g or less, even more preferably 90 mgKOH / g or less, and particularly preferably 80 mgKOH / g or less. The above upper and lower limits can be arbitrarily combined. For example, it is preferably 1 to 140 mgKOH / g, more preferably 10 to 120 mgKOH / g, even more preferably 20 to 100 mgKOH / g, even more preferably 40 to 90 mgKOH / g, and particularly preferably 50 to 80 mgKOH / g. By setting the amine value at or above the lower limit, surface roughness of the electrode tends to be suppressed. By adjusting the content to the upper limit or less, compatibility with the alkali-soluble resin (b) tends to be good.

[0254] From the viewpoint of dispersibility, the acrylic dispersant is preferably an AB or BAB block copolymer composed of an A block having the above-mentioned functional group and a B block not having the above-mentioned functional group. In this case, in addition to the partial structure derived from the unsaturated group-containing monomer having the above-mentioned functional group, the A block may also contain a partial structure derived from the unsaturated group-containing monomer not having the above-mentioned functional group, and these may be contained in the A block in the form of either random copolymerization or block copolymerization. The content of the partial structure not having a functional group in the A block is preferably 80% by mass or less, more preferably 50% by mass or less, even more preferably 30% by mass or less, even more preferably 10% by mass or less, and particularly preferably 0% by mass.

[0255] From the viewpoint of dispersibility, the B block is preferably composed only of a partial structure derived from an unsaturated group-containing monomer that does not contain the above-mentioned functional group, and one B block may contain partial structures derived from two or more types of monomers, and these may be contained in the B block in either a random copolymerization or block copolymerization mode. The AB or BAB block copolymer is prepared, for example, by the living polymerization method shown below. Living polymerization methods include anionic living polymerization methods, cationic living polymerization methods, and radical living polymerization methods. Of these, anionic living polymerization methods use anions as the active species for polymerization, and are represented, for example, by the following scheme.

[0256] [ka]

[0257] In the above scheme, Ar 1 is a monovalent organic group, and Ar 2 Ar 1 M is a metal atom, and s and t are each an integer of 1 or more.

[0258] In the radical living polymerization method, the active species for polymerization are radicals, and for example, the method is shown in the following scheme.

[0259] [ka]

[0260] In the above scheme, Ar 1 is a monovalent organic group, and Ar 2 Ar 1 j and k are each an integer of 1 or more, and R a is a hydrogen atom or a monovalent organic group, and R b is R a is a hydrogen atom or a monovalent organic group different from

[0261] In synthesizing this acrylic dispersant, the following methods are used: Japanese Patent Application Laid-Open No. 9-62002; P. Lutz, P. Masson et al., Polym. Bull. 12, 79 (1984); BC Anderson, GD Andrews et al., Macromolecules, 14, 1601 (1981); K. Hatada, K. Ute, et al. al, Polym. J. 17, 977 (1985), 18, 1037 (1986); Koichi Migite and Koichi Hatada, Polymer Processing, 36, 366 (1987); Toshinobu Higashimura and Mitsuo Sawamoto, Polymer Research Papers, 46, 189 (1989); M. Kuroki, T. Aida, J. Am. Chem. Sic, 109, 4737 (1987); Takuzo Aida and Shohei Inoue, Organic Synthesis Chemistry, 43, 300 (1985); DY Sogoh, W. R. Hertler et al, Macromolecules, 20, 1473 (1987), and other known methods can be employed.

[0262] The acrylic dispersant usable in the present invention may be an AB block copolymer or a BAB block copolymer, and the A block / B block ratio constituting the copolymer is not particularly limited, but is preferably 1 / 99 to 80 / 20 (mass ratio), and more preferably 5 / 95 to 60 / 40 (mass ratio). By keeping the ratio within this range, it tends to be easier to ensure a balance between dispersibility and storage stability. The amount of quaternary ammonium salt group per gram of the AB block copolymer or BAB block copolymer that can be used in the present invention is preferably 0.1 to 10 mmol. By keeping it within this range, good dispersibility tends to be easily ensured.

[0263] Such an acrylic dispersant may contain an amino group. The amine value of the acrylic dispersant is preferably 1 mgKOH / g or more, more preferably 10 mgKOH / g or more, even more preferably 20 mgKOH / g or more, even more preferably 40 mgKOH / g or more, and particularly preferably 50 mgKOH / g or more. It is also preferably 140 mgKOH / g or less, more preferably 120 mgKOH / g or less, even more preferably 100 mgKOH / g or less, even more preferably 90 mgKOH / g or less, and particularly preferably 80 mgKOH / g or less. The above upper and lower limits can be arbitrarily combined. For example, it is preferably 1 to 140 mgKOH / g, more preferably 10 to 120 mgKOH / g, even more preferably 20 to 100 mgKOH / g, even more preferably 40 to 90 mgKOH / g, and particularly preferably 50 to 80 mgKOH / g. By adjusting the amine value to be equal to or greater than the lower limit, dispersibility tends to be improved. By adjusting the content to the upper limit or less, compatibility with the alkali-soluble resin (b) tends to be good. Here, the amine value of the acrylic dispersant is expressed as the mass of KOH equivalent to the amount of base per gram of solids excluding the solvent in the dispersant sample, and is measured by the following method. Accurately weigh out 0.5-1.5 g of dispersant sample into a 100 mL beaker and dissolve in 50 mL of acetic acid. Using an automatic titrator equipped with a pH electrode, neutralize this solution with a 0.1 mol / L HClO4 acetic acid solution. The inflection point on the titration pH curve is used as the titration endpoint, and the amine value is calculated using the following formula.

[0264] Amine value [mgKOH / g] = (561 × V) / (W × S) (W: weight of dispersant sample [g], V: titration volume at the end of titration [mL], S: solids concentration of the dispersant sample [mass %].)

[0265] The weight-average molecular weight (Mw) of the acrylic dispersant is not particularly limited, but is preferably 1,000 or more, more preferably 3,000 or more, even more preferably 4,000 or more, and particularly preferably 5,000 or more. It is also preferably 50,000 or less, more preferably 20,000 or less, and even more preferably 15,000 or less. The above upper and lower limits can be arbitrarily combined. For example, it is preferably 1,000 to 50,000, more preferably 3,000 to 50,000, even more preferably 4,000 to 20,000, and particularly preferably 5,000 to 15,000. Setting it to equal to or greater than the lower limit tends to improve dispersibility, while setting it to equal to or less than the upper limit tends to reduce viscosity changes.

[0266] When the acrylic dispersant has a quaternary ammonium salt group as a functional group, the chemical structure of the repeating unit containing the quaternary ammonium salt group is not particularly limited. From the viewpoint of dispersibility, it is preferable that the acrylic dispersant has a repeating unit represented by the following general formula (V) (hereinafter, sometimes referred to as "repeating unit (V)").

[0267] [ka]

[0268] In formula (V), R 31 ~R 33 are each independently a hydrogen atom, an optionally substituted alkyl group, an optionally substituted aryl group, or an optionally substituted aralkyl group, and R 31 ~R 33 Two or more of R may be bonded to each other to form a cyclic structure. 34 is a hydrogen atom or a methyl group; X is a divalent linking group; Y - is the counteranion.

[0269] R in formula (V) 31 ~R 33The alkyl group, which may have a substituent, may be either linear or branched. It may also have a cyclic structure, such as a cyclohexyl group or a cyclohexylmethyl group. The number of carbon atoms in the alkyl group is not particularly limited, but is preferably 1 or more, and is preferably 10 or less, more preferably 6 or less, even more preferably 4 or less, and particularly preferably 2 or less. For example, 1 to 10 is preferred, 1 to 6 is more preferred, 1 to 4 is still more preferred, and 1 to 2 is particularly preferred. Examples of the alkyl group include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, and an octyl group. Of these, a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, and a hexyl group are preferred, a methyl group, an ethyl group, a propyl group, and a butyl group are more preferred, and a methyl group and an ethyl group are even more preferred.

[0270] R in formula (V) 31 ~R 33 The number of carbon atoms in the aryl group which may have a substituent is not particularly limited, but is preferably 6 or more, and is preferably 16 or less, and more preferably 12 or less. For example, 6 to 16 is preferred, and 6 to 12 is more preferred. Examples of the aryl group include a phenyl group, a methylphenyl group, an ethylphenyl group, a dimethylphenyl group, a diethylphenyl group, a naphthyl group, and an anthracenyl group, with a phenyl group, a methylphenyl group, an ethylphenyl group, a dimethylphenyl group, and a diethylphenyl group being preferred, and a phenyl group, a methylphenyl group, and an ethylphenyl group being more preferred.

[0271] R in formula (V) 31 ~R 33The number of carbon atoms in the aralkyl group, which may have a substituent, is not particularly limited, but is preferably 7 or more, and is preferably 16 or less, more preferably 12 or less, even more preferably 10 or less, and particularly preferably 8 or less. For example, 7 to 16 is preferred, more preferably 7 to 12, even more preferably 7 to 10, and particularly preferably 7 to 8. Examples of the aralkyl group include a phenylmethyl group, a phenylethyl group, a phenylpropyl group, a phenylbutyl group, and a phenylisopropyl group, with the phenylmethyl group, phenylethyl group, phenylpropyl group, and phenylbutyl group being preferred, and the phenylmethyl group and phenylethyl group being more preferred.

[0272] From the perspective of variance, R 31 ~R 33 are each independently an alkyl group or an aralkyl group, and R 31 ~R 33 are preferably each independently a methyl group or a phenylmethyl group. In formula (V), Y - Examples include Cl - , Br - , I - , ClO4 - , BF4 - , CH3COO - , P.F. - Examples include: Additionally, aromatic dicarboxylic acid imide anions, aromatic sulfonic acid anions, aromatic phosphonic acid anions, and aromatic carboxylic acid anions described in WO 2018 / 079659; and alkyl sulfate anions and alkyl sulfonic acid anions described in WO 2019 / 107020; can also be suitably used. Y - From the viewpoint of development form, - From the viewpoint of suppressing surface roughness, alkylsulfonate anions are preferred.

[0273] When the polymer dispersant has a tertiary amine as a functional group, it preferably has a repeating unit represented by the following general formula (VI) (hereinafter sometimes referred to as "repeating unit (VI)") from the viewpoint of dispersibility and suppressing surface roughness.

[0274] [ka]

[0275] In formula (VI), R 35 and R 36 are each independently a hydrogen atom, an optionally substituted alkyl group, an optionally substituted aryl group, or an optionally substituted aralkyl group, and R 35 and R 36 may be bonded to each other to form a ring structure. 37 is a hydrogen atom or a methyl group. Z is a divalent linking group.

[0276] R in formula (VI) 35 and R 36 In the formula (V), the alkyl group which may have a substituent is R 31 ~R 33 The examples given below can be preferably used. R in formula (VI) 35 and R 36 In the formula (V), the aryl group which may have a substituent is R 31 ~R 33 The examples given below can be preferably used. R in formula (VI) 35 and R 36 In the formula (V), the aralkyl group which may have a substituent is R 31 ~R 33 The examples given below can be preferably used.

[0277] From the viewpoint of dispersibility and suppression of surface roughness, R 35 and R 36are each independently preferably an alkyl group which may have a substituent, and more preferably a methyl group or an ethyl group.

[0278] R in formula (V) 31 ~R 33 and R of formula (VI) 35 and R 36 Examples of the substituent that the alkyl group, aralkyl group or aryl group in the formula (I) may have include a halogen atom, an alkoxy group, a benzoyl group and a hydroxyl group.

[0279] X in formula (V) and Z in formula (VI) are each, for example, an alkylene group having 1 to 10 carbon atoms, an arylene group having 6 to 12 carbon atoms, -CONH-R 43 -group, -COOR 44 - group (wherein R 43 and R 44 is a single bond, an alkylene group having 1 to 10 carbon atoms, or an ether group (alkyloxyalkyl group) having 2 to 10 carbon atoms, and preferably —COO—R 44 - group, more preferably a -COO-C2H4- group.

[0280] The content of repeating unit (V) is not particularly limited, but from the viewpoint of dispersibility and suppressing surface roughness, it is preferably 60 mol% or less, more preferably 50 mol% or less, even more preferably 40 mol% or less, and particularly preferably 35 mol% or less, based on the total content of repeating unit (V) and repeating unit (VI). It is also preferably 5 mol% or more, more preferably 8 mol% or more, even more preferably 10 mol% or more, and particularly preferably 12 mol% or more. The above upper and lower limits can be arbitrarily combined. For example, 5 to 60 mol% is preferred, 8 to 50 mol% is more preferred, 10 to 40 mol% is even more preferred, and 12 to 35 mol% is particularly preferred.

[0281] The content of the repeating unit (V) in the total repeating units of the dispersant is not particularly limited, but from the viewpoint of dispersibility, it is preferably 1 mol% or more, more preferably 3 mol% or more, even more preferably 5 mol% or more, and particularly preferably 8 mol% or more. It is also preferably 50 mol% or less, more preferably 30 mol% or less, even more preferably 20 mol% or less, and particularly preferably 15 mol% or less. The above upper and lower limits can be arbitrarily combined. For example, it is preferably 1 to 50 mol%, more preferably 3 to 30 mol%, even more preferably 5 to 20 mol%, and particularly preferably 8 to 15 mol%.

[0282] The content of the repeating unit (VI) is not particularly limited, but from the viewpoint of dispersibility and suppressing surface roughness, it is preferably 100 mol% or less, more preferably 95 mol% or less, even more preferably 90 mol% or less, and particularly preferably 85 mol% or less, based on the total content of the repeating unit (V) and the repeating unit (VI). It is also preferably 10 mol% or more, more preferably 30 mol% or more, even more preferably 50 mol% or more, and particularly preferably 60 mol% or more. The above upper and lower limits can be arbitrarily combined. For example, 10 to 100 mol% is preferred, 30 to 95 mol% is more preferred, 50 to 90 mol% is even more preferred, and 60 to 85 mol% is particularly preferred.

[0283] The content of the repeating unit (VI) in the total repeating units of the dispersant is not particularly limited, but from the viewpoint of dispersibility and suppressing surface roughness, it is preferably 5 mol% or more, more preferably 10 mol% or more, even more preferably 15 mol% or more, and particularly preferably 20 mol% or more. It is also preferably 60 mol% or less, more preferably 40 mol% or less, even more preferably 30 mol% or less, and particularly preferably 25 mol% or less. The above upper and lower limits can be arbitrarily combined. For example, it is preferably 5 to 60 mol%, more preferably 10 to 40 mol%, even more preferably 15 to 30 mol%, and particularly preferably 20 to 25 mol%.

[0284] From the viewpoint of increasing compatibility with binder components such as solvents and improving dispersion stability, the acrylic dispersant preferably has a repeating unit represented by the following general formula (VII) (hereinafter sometimes referred to as "repeating unit (VII)").

[0285] [ka]

[0286] In formula (VII), R 40 is an ethylene group or a propylene group, and R 41 is an alkyl group which may have a substituent, and R 42 is a hydrogen atom or a methyl group, and n is an integer of 1 to 20.

[0287] R in formula (VII) 41 The alkyl group in the formula (I) may have a substituent, and may be either linear or branched. It may also contain a cyclic structure such as a cyclohexyl group or a cyclohexylmethyl group. The number of carbon atoms in the alkyl group is not particularly limited, but is preferably 1 or more, more preferably 2 or more. It is also preferably 10 or less, more preferably 6 or less, and even more preferably 4 or less. Examples of the alkyl group include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, and an octyl group. Methyl group, ethyl group, propyl group, butyl group, pentyl group, and hexyl group are preferred, and methyl group, ethyl group, propyl group, and butyl group are more preferred.

[0288] In terms of compatibility and dispersibility in binder components such as solvents, n in formula (VII) is preferably 1 or more, more preferably 2 or more. Also, n is preferably 10 or less, more preferably 5 or less. The upper and lower limits can be arbitrarily combined. For example, n is preferably 1 to 10, more preferably 2 to 5.

[0289] The content of repeating unit (VII) in all repeating units of the dispersant is not particularly limited, but is preferably 1 mol% or more, more preferably 2 mol% or more, and even more preferably 4 mol% or more. It is also preferably 30 mol% or less, more preferably 20 mol% or less, and even more preferably 10 mol% or less. The above upper and lower limits can be arbitrarily combined. For example, it is preferably 1 to 30 mol%, more preferably 2 to 20 mol%, and even more preferably 4 to 10 mol%. Within the above ranges, compatibility with binder components such as solvents and dispersion stability tend to be compatible.

[0290] From the viewpoint of increasing the compatibility of the dispersant with binder components such as solvents and improving dispersion stability, the acrylic dispersant preferably has a repeating unit represented by the following general formula (VIII) (hereinafter, sometimes referred to as "repeating unit (VIII)"):

[0291] [ka]

[0292] In formula (VIII), R 38 R is an alkyl group which may have a substituent, an aryl group which may have a substituent, or an aralkyl group which may have a substituent. 39 is a hydrogen atom or a methyl group.

[0293] R in formula (VIII) 38The alkyl group, which may have a substituent, in the formula (I) may be either linear or branched. It may also contain a cyclic structure such as a cyclohexyl group or a cyclohexylmethyl group. The number of carbon atoms in the alkyl group is not particularly limited, but is preferably 1 or more, more preferably 2 or more, and even more preferably 4 or more. It is also preferably 10 or less, more preferably 8 or less. Examples of the alkyl group include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, and a 2-ethylhexyl group. Of these, a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, and a 2-ethylhexyl group are preferred, and a methyl group, an ethyl group, a propyl group, a butyl group, and a 2-ethylhexyl group are more preferred.

[0294] R in formula (VIII) 38 In the formula (I), the number of carbon atoms in the aryl group, which may have a substituent, is not particularly limited, but is preferably 6 or more. Also, it is preferably 16 or less, more preferably 12 or less, and even more preferably 8 or less. For example, 6 to 16 is preferred, 6 to 12 is more preferred, and 6 to 8 is still more preferred. Examples of the aryl group include a phenyl group, a methylphenyl group, an ethylphenyl group, a dimethylphenyl group, a diethylphenyl group, a naphthyl group, and an anthracenyl group. Of these, a phenyl group, a methylphenyl group, an ethylphenyl group, a dimethylphenyl group, and a diethylphenyl group are preferred, and a phenyl group, a methylphenyl group, and an ethylphenyl group are more preferred.

[0295] R in formula (VIII) 38The number of carbon atoms in the aralkyl group which may have a substituent is not particularly limited, but is preferably 7 or more, and is preferably 16 or less, more preferably 12 or less, and even more preferably 10 or less. For example, 7 to 16 is preferred, more preferably 7 to 12, and even more preferably 7 to 10. Examples of the aralkyl group include a phenylmethyl group, a phenylethyl group, a phenylpropyl group, a phenylbutyl group, and a phenylisopropyl group. A phenylmethyl group, a phenylethyl group, a phenylpropyl group, or a phenylbutyl group is preferred, and a phenylmethyl group or a phenylethyl group is more preferred.

[0296] From the viewpoint of solvent compatibility and dispersion stability, R 38 is preferably an alkyl group or an aralkyl group, and more preferably a methyl group, an ethyl group, a butyl group, a 2-ethylhexyl group or a phenylmethyl group. R 38 In the formula (R), examples of the substituent that the alkyl group may have include a halogen atom and an alkoxy group. Examples of the substituent that the aryl group or aralkyl group may have include a chain alkyl group, a halogen atom, and an alkoxy group. 38 The chain alkyl group represented by the formula (I) includes both straight chain and branched chain alkyl groups.

[0297] From the viewpoint of dispersibility, the content of repeating units (VIII) in all repeating units of the dispersant is preferably 30 mol% or more, more preferably 40 mol% or more, and even more preferably 50 mol% or more. Also, it is preferably 80 mol% or less, more preferably 70 mol% or less. The above upper and lower limits can be arbitrarily combined. For example, it is preferably 30 to 80 mol%, more preferably 40 to 80 mol%, and even more preferably 50 to 70 mol%.

[0298] The acrylic dispersant may have a repeating unit other than the repeating unit (V), the repeating unit (VI), the repeating unit (VII), and the repeating unit (VIII). Examples of such a repeating unit include a styrene-based monomer such as styrene or α-methylstyrene; a (meth)acrylate-based monomer such as (meth)acrylic acid chloride; a (meth)acrylamide-based monomer such as (meth)acrylamide or N-methylolacrylamide; and a repeating unit derived from a monomer such as vinyl acetate, acrylonitrile, allyl glycidyl ether, crotonic acid glycidyl ether, or N-methacryloylmorpholine.

[0299] From the viewpoint of further improving dispersibility, the acrylic dispersant is preferably a block copolymer having an A block having repeating units (V) and (VI) and a B block having no repeating units (V) and (VI). The block copolymer is preferably an AB block copolymer or a BAB block copolymer. Surprisingly, by introducing not only a quaternary ammonium base but also a tertiary amino group into the A block, the dispersing ability of the dispersant tends to be significantly improved. Furthermore, it is preferable that the B block has repeating units (VII), and more preferably has repeating units (VIII).

[0300] In the A block, the repeating unit (V) and the repeating unit (VI) may be contained in either a random copolymerization or a block copolymerization manner. Furthermore, two or more types of each of the repeating unit (V) and the repeating unit (VI) may be contained in one A block, and in this case, each repeating unit may be contained in the A block in either a random copolymerization or a block copolymerization manner.

[0301] The A block may contain repeating units other than the repeating units (V) and (VI), such as the repeating units derived from the (meth)acrylic acid ester monomers described above. The content of repeating units other than the repeating units (V) and (VI) in the A block is preferably 0 to 50 mol %, more preferably 0 to 20 mol %, and it is particularly preferred that no such repeating units are contained in the A block.

[0302] The B block may contain repeating units other than the repeating units (VII) and (VIII), and examples of such repeating units include styrene-based monomers such as styrene and α-methylstyrene; (meth)acrylate-based monomers such as (meth)acrylic acid chloride; (meth)acrylamide-based monomers such as (meth)acrylamide and N-methylolacrylamide; and repeating units derived from monomers such as vinyl acetate, acrylonitrile, allyl glycidyl ether, crotonate glycidyl ether, and N-methacryloylmorpholine. The content of repeating units other than the repeating units (VII) and (VIII) in the B block is preferably 0 to 50 mol %, more preferably 0 to 20 mol %, and it is particularly preferred that such repeating units are not contained in the B block. These acrylic dispersants may be used alone or in combination of two or more.

[0303] <Other ingredients of the photosensitive coloring composition> In addition to the above-mentioned components, the photosensitive coloring composition of the present invention may appropriately contain additives such as adhesion improvers such as silane coupling agents, surfactants, pigment derivatives, photoacid generators, crosslinking agents, mercapto compounds, and polymerization inhibitors.

[0304] (1) Adhesion improver The photosensitive coloring composition of the present invention may contain an adhesion improver to improve adhesion to the substrate. Preferred adhesion improvers are silane coupling agents and phosphoric acid group-containing compounds. As the silane coupling agent, for example, various types such as epoxy-based, (meth)acrylic-based, and amino-based agents may be used alone or in combination of two or more.

[0305] Examples of silane coupling agents include (meth)acryloxysilanes such as 3-methacryloxypropylmethyldimethoxysilane and 3-methacryloxypropyltrimethoxysilane, epoxysilanes such as 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldiethoxysilane and 3-glycidoxypropyltriethoxysilane, ureidosilanes such as 3-ureidopropyltriethoxysilane, and isocyanatesilanes such as 3-isocyanatepropyltriethoxysilane. Epoxysilane silane coupling agents are particularly preferred. As the phosphoric acid group-containing compound, (meth)acryloyl group-containing phosphates are preferred, and those represented by the following general formula (g1), (g2) or (g3) are preferred.

[0306] [ka]

[0307] In formulas (g1), (g2) and (g3), R 51 represents a hydrogen atom or a methyl group; l and l' are integers of 1 to 10; and m is 1, 2, or 3. These phosphate group-containing compounds may be used alone or in combination of two or more.

[0308] (2) Surfactants The photosensitive coloring composition of the present invention may contain a surfactant to improve the coating properties.

[0309] As the surfactant, various types of surfactants can be used, such as anionic, cationic, nonionic, amphoteric surfactants, etc. Nonionic surfactants are preferred because they are less likely to adversely affect various properties, and fluorine-based or silicone-based surfactants are more preferred in terms of coatability. Examples of such surfactants include TSF4460 (manufactured by Momentive Performance Materials), DFX-18 (manufactured by Neos), BYK-300, BYK-325, BYK-330 (manufactured by BYK-Chemie), KP340 (manufactured by Shin-Etsu Silicones), F-470, F-475, F-478, F-554, F-559 (manufactured by DIC), SH7PA (manufactured by Dow Corning Toray), DS-401 (manufactured by Daikin), L-77 (manufactured by Nippon Unicar Co., Ltd.), and FC4430 (manufactured by 3M). The surfactant may be used alone or in combination of two or more kinds.

[0310] (3) Pigment derivatives The photosensitive coloring composition of the present invention may contain a pigment derivative as a dispersing aid in order to improve dispersibility and storage stability. Examples of pigment derivatives include azo-based, phthalocyanine-based, quinacridone-based, benzimidazolone-based, quinophthalone-based, isoindolinone-based, dioxazine-based, anthraquinone-based, indanthrene-based, perylene-based, perinone-based, diketopyrrolopyrrole-based, and dioxazine-based derivatives, with phthalocyanine-based and quinophthalone-based derivatives being preferred. Examples of the substituent of the pigment derivative include a sulfonic acid group, a sulfonamide group and its quaternary salts, a phthalimidomethyl group, a dialkylaminoalkyl group, a hydroxyl group, a carboxyl group, and an amide group bonded to the pigment skeleton directly or via, for example, an alkyl group, an aryl group, or a heterocyclic group, and a sulfonic acid group is preferred. A single pigment skeleton may be substituted with multiple substituents, or may be substituted with multiple types of substituents.

[0311] Examples of pigment derivatives include sulfonic acid derivatives of phthalocyanine, sulfonic acid derivatives of quinophthalone, sulfonic acid derivatives of anthraquinone, sulfonic acid derivatives of quinacridone, sulfonic acid derivatives of diketopyrrolopyrrole, and sulfonic acid derivatives of dioxazine. These may be used alone or in combination of two or more.

[0312] (4) Mercapto compounds A mercapto compound can also be added as a polymerization accelerator and to improve adhesion to the substrate.

[0313] Examples of the mercapto compound include 2-mercaptobenzothiazole, 2-mercaptobenzoxazole, 2-mercaptobenzimidazole, hexanedithiol, decanedithiol, 1,4-dimethylmercaptobenzene, butanediol bisthiopropionate, butanediol bisthioglycolate, ethylene glycol bisthioglycolate, trimethylolpropane tristhioglycolate, butanediol bisthiopropionate, trimethylolpropane tristhiopropionate, trimethylolpropane tristhioglycolate, pentaerythritol tetrakisthiopropionate, pentaerythritol tetrakisthioglycolate, trishydroxyethyl tristhiopropionate, ethylene glycol bis( Examples of suitable mercapto compounds include mercapto compounds having a heterocycle, such as 1,3,5-tris(3-mercaptobutyloxyethyl)-1,3,5-triazine-2,4,6(1H,3H,5H)-trione, butanediol bis(3-mercaptobutyrate), butanediol bis(3-mercaptobutyrate), 1,4-bis(3-mercaptobutyryloxy)butane, trimethylolpropane tris(3-mercaptobutyrate), pentaerythritol tetrakis(3-mercaptobutyrate), pentaerythritol tris(3-mercaptobutyrate), ethylene glycol bis(3-mercaptoisobutyrate), butanediol bis(3-mercaptoisobutyrate), trimethylolpropane tris(3-mercaptoisobutyrate), and 1,3,5-tris(3-mercaptobutyloxyethyl)-1,3,5-triazine-2,4,6(1H,3H,5H)-trione. These compounds may be used singly or in combination of two or more.

[0314] (5) Polymerization inhibitor The photosensitive coloring composition of the present invention may contain a polymerization inhibitor from the viewpoint of controlling the shape of the cured product. By containing a polymerization inhibitor, it is thought that the radical polymerization of the lower layer of the coating film is inhibited, and therefore the taper angle (the angle between the support and the cured product in the cross section of the cured product) can be controlled. Examples of the polymerization inhibitor include hydroquinone, hydroquinone monomethyl ether, methylhydroquinone, methoxyphenol, and 2,6-di-tert-butyl-4-cresol (BHT). From the viewpoint of shape control, 2,6-di-tert-butyl-4-cresol is preferred. From the viewpoint of particularly excellent safety to the human body, hydroquinone monomethyl ether and methylhydroquinone are preferred. The polymerization inhibitor may be used alone or in combination of two or more kinds. (b) When producing an alkali-soluble resin, a polymerization inhibitor may be contained in the resin, and this may be used as the polymerization inhibitor of the present invention. Alternatively, in addition to the polymerization inhibitor in the resin, a polymerization inhibitor identical to or different from the polymerization inhibitor may be added when producing the photosensitive coloring composition.

[0315] When the photosensitive coloring composition contains a polymerization inhibitor, its content is not particularly limited, but is preferably 0.0005% by mass or more, more preferably 0.001% by mass or more, and even more preferably 0.01% by mass or more, relative to the total solid content of the photosensitive coloring composition. It is also preferably 0.3% by mass or less, more preferably 0.2% by mass or less, and even more preferably 0.1% by mass or less. The upper and lower limits can be arbitrarily combined. For example, 0.0005% by mass to 0.3% by mass is preferred, 0.001% by mass to 0.2% by mass is more preferred, and 0.01% by mass to 0.1% by mass is even more preferred. By setting the content at or above the lower limit, the shape of the cured product tends to be more controllable. By setting the content at or below the upper limit, the required sensitivity tends to be maintained.

[0316] <Solvent> The photosensitive coloring composition of the present invention preferably contains a solvent. By containing a solvent, the colorant can be dispersed or dissolved in the solvent, and application becomes easy. The photosensitive coloring composition of the present invention is used in a state where, for example, (a) colorant, (b) alkali-soluble resin, (c) photopolymerization initiator, (d) ethylenically unsaturated compound, (e) nitrogen-containing aromatic compound, (f) dispersant, and other various materials used as needed are dissolved or dispersed in a solvent. From the viewpoint of dispersibility and coating property, an organic solvent is preferred.

[0317] From the viewpoint of coatability, it is preferable to select an organic solvent having a boiling point of 100 to 300° C., more preferably 120 to 280° C. The boiling point here means the boiling point at a pressure of 1013.25 hPa, and the same applies to all boiling points hereinafter.

[0318] Examples of such organic solvents include glycol monoalkyl ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol mono-n-butyl ether, propylene glycol-t-butyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol mono-n-butyl ether, methoxymethyl pentanol, dipropylene glycol monoethyl ether, dipropylene glycol monomethyl ether, 3-methoxybutanol, 3-methyl-3-methoxybutanol, triethylene glycol monomethyl ether, triethylene glycol monoethyl ether, and tripropylene glycol methyl ether; glycol dialkyl ethers such as ethylene glycol dimethyl ether, ethylene glycol diethyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol dipropyl ether, diethylene glycol dibutyl ether, and dipropylene glycol dimethyl ether;

[0319] glycol alkyl ether acetates such as ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, ethylene glycol mono-n-butyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, propylene glycol monobutyl ether acetate, methoxybutyl acetate, 3-methoxybutyl acetate, methoxypentyl acetate, diethylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether acetate, diethylene glycol mono-n-butyl ether acetate, dipropylene glycol monomethyl ether acetate, triethylene glycol monomethyl ether acetate, triethylene glycol monoethyl ether acetate, and 3-methyl-3-methoxybutyl acetate; glycol diacetates such as ethylene glycol diacetate, 1,3-butylene glycol diacetate, and 1,6-hexanol diacetate; alkyl acetates such as cyclohexanol acetate; ethers such as amyl ether, diethyl ether, dipropyl ether, diisopropyl ether, dibutyl ether, diamyl ether, ethyl isobutyl ether, and dihexyl ether;

[0320] ketones such as acetone, methyl ethyl ketone, methyl amyl ketone, methyl isopropyl ketone, methyl isoamyl ketone, diisopropyl ketone, diisobutyl ketone, methyl isobutyl ketone, cyclohexanone, ethyl amyl ketone, methyl butyl ketone, methyl hexyl ketone, methyl nonyl ketone, and methoxymethyl pentanone; monohydric or polyhydric alcohols such as ethanol, propanol, butanol, hexanol, cyclohexanol, ethylene glycol, propylene glycol, butanediol, diethylene glycol, dipropylene glycol, triethylene glycol, methoxymethylpentanol, glycerin, and benzyl alcohol; Aliphatic hydrocarbons such as n-pentane, n-octane, diisobutylene, n-hexane, hexene, isoprene, dipentene, and dodecane; Alicyclic hydrocarbons such as cyclohexane, methylcyclohexane, methylcyclohexene, and bicyclohexyl;

[0321] Aromatic hydrocarbons such as benzene, toluene, xylene, and cumene; Chain or cyclic esters such as amyl formate, ethyl formate, ethyl acetate, butyl acetate, propyl acetate, amyl acetate, methyl isobutyrate, ethylene glycol acetate, ethyl propionate, propyl propionate, butyl butyrate, isobutyl butyrate, methyl isobutyrate, ethyl caprylate, butyl stearate, ethyl benzoate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, propyl 3-methoxypropionate, butyl 3-methoxypropionate, and γ-butyrolactone; Alkoxycarboxylic acids such as 3-methoxypropionic acid and 3-ethoxypropionic acid; Halogenated hydrocarbons such as butyl chloride and amyl chloride; ether ketones such as methoxymethylpentanone; Nitriles such as acetonitrile and benzonitrile;

[0322] Examples of commercially available organic solvents that can be used include mineral spirits, Balsol #2, Apco #18 Solvent, Apco Thinner, Socal Solvent No. 1 and No. 2, Solvesso #150, Shell TS28 Solvent, Carbitol, ethyl carbitol, butyl carbitol, methyl cellosolve ("Cellosolve" is a registered trademark; the same applies hereinafter), ethyl cellosolve, ethyl cellosolve acetate, methyl cellosolve acetate, and diglyme (all of which are trade names). These organic solvents may be used alone or in combination of two or more kinds.

[0323] When the partition walls are formed by photolithography, the organic solvent to be selected preferably has a boiling point of 100 to 240°C, more preferably 120 to 200°C, and even more preferably 120 to 170°C.

[0324] Glycol alkyl ether acetates are preferred because they have a good balance of application properties, surface tension, etc., and the solubility of the components in the composition is relatively high. The glycol alkyl ether acetates may be used alone or in combination of two or more. Glycol alkyl ether acetates may be used alone or in combination with other organic solvents. Glycol monoalkyl ethers are preferred as the organic solvent. Propylene glycol monomethyl ether is preferred in terms of the solubility of the components in the composition. Glycol monoalkyl ethers have high polarity, and if the amount added is too large, the pigment tends to aggregate, and the storage stability tends to decrease, such as the viscosity of the photosensitive coloring composition obtained later increasing. Therefore, the proportion of glycol monoalkyl ethers in the solvent is preferably 5% by mass to 30% by mass, and more preferably 5% by mass to 20% by mass.

[0325] The use of an organic solvent with a boiling point of 150°C or higher (hereinafter sometimes referred to as a "high-boiling solvent") in combination makes the photosensitive coloring composition less likely to dry, but it can also be used in combination because it has the effect of preventing the uniform dispersion of the pigment in the composition from being destroyed by rapid drying. For example, it has the effect of preventing the occurrence of foreign matter defects caused by precipitation and solidification of colorants, etc. at the tip of a slit nozzle. Because of this high effect, when using a high-boiling solvent in combination, it is preferable to use diethylene glycol mono-n-butyl ether, diethylene glycol mono-n-butyl ether acetate, or diethylene glycol monoethyl ether acetate in combination.

[0326] When a high-boiling-point solvent is used in combination, the content of the high-boiling-point solvent in the organic solvent is preferably 3% by mass to 50% by mass, more preferably 5% by mass to 40% by mass, and particularly preferably 5% by mass to 30% by mass. By setting the content at or above the lower limit, it tends to be possible to prevent, for example, the colorant or the like from precipitating and solidifying at the tip of the slit nozzle, which could cause foreign matter defects. By setting the content at or below the upper limit, it tends to be possible to prevent the drying time of the composition from becoming too long, and to prevent problems such as poor tact time in the reduced-pressure drying process and pin marks during pre-baking.

[0327] The high-boiling point solvent may be a glycol alkyl ether acetate or a glycol alkyl ether, in which case it is not necessary to separately add a high-boiling point solvent. Preferred high-boiling point solvents include, for example, diethylene glycol mono-n-butyl ether acetate, diethylene glycol monoethyl ether acetate, dipropylene glycol methyl ether acetate, 1,3-butylene glycol diacetate, 1,6-hexanol diacetate, and triacetin.

[0328] <Content ratio of each component in the photosensitive coloring composition> The content of the (a) colorant in the photosensitive coloring composition of the present invention is not particularly limited, but is preferably 5% by mass or more, more preferably 10% by mass or more, even more preferably 15% by mass or more, and even more preferably 20% by mass or more, based on the total solid content of the photosensitive coloring composition. Also, it is preferably 50% by mass or less, more preferably 40% by mass or less, even more preferably 30% by mass or less, and particularly preferably 25% by mass or less. The above upper and lower limits can be arbitrarily combined. For example, it is preferably 5 to 50% by mass, more preferably 10 to 40% by mass, even more preferably 15 to 40% by mass, even more preferably 15 to 30% by mass, and particularly preferably 15 to 25% by mass. By setting it to the lower limit or more, light-blocking properties tend to be ensured. By setting it to the upper limit or less, the amount of dispersant can be reduced, which tends to suppress surface roughness.

[0329] When the photosensitive coloring composition of the present invention contains an organic coloring pigment, its content is not particularly limited, but is preferably 5% by mass or more, more preferably 20% by mass or more, even more preferably 30% by mass or more, and particularly preferably 35% by mass or more, based on the total solid content of the photosensitive coloring composition. Also, it is preferably 70% by mass or less, more preferably 60% by mass or less, and particularly preferably 50% by mass or less. The above upper and lower limits can be arbitrarily combined. For example, it is preferably 5 to 70% by mass, more preferably 20 to 70% by mass, even more preferably 20 to 60% by mass, and particularly preferably 20 to 50% by mass. By setting it at or above the lower limit, light-blocking properties tend to be improved while suppressing loss of UV light required for curing. By setting it at or below the upper limit, NMP resistance tends to be improved.

[0330] When the (a) colorant contains a red pigment and / or an orange pigment, the total content of the red pigment and the orange pigment is not particularly limited, but is preferably 5% by mass or more, more preferably 8% by mass or more, even more preferably 10% by mass or more, and particularly preferably 12% by mass or more in the (a) colorant. Also, it is preferably 40% by mass or less, more preferably 30% by mass or less, and particularly preferably 20% by mass or less. The above upper and lower limits can be arbitrarily combined. For example, it is preferably 5 to 40% by mass, more preferably 8 to 40% by mass, even more preferably 10 to 30% by mass, and particularly preferably 12 to 20% by mass. Setting it to be equal to or greater than the lower limit tends to produce a color tone close to black. Setting it to be equal to or less than the upper limit tends to result in high sensitivity.

[0331] When the (a) colorant contains a blue pigment and / or a violet pigment, the total content of the blue pigment and the violet pigment is not particularly limited, but is preferably 30% by mass or more, more preferably 50% by mass or more, even more preferably 70% by mass or more, and particularly preferably 80% by mass or more in the (a) colorant. Also, it is preferably 95% by mass or less, more preferably 92% by mass or less, and particularly preferably 90% by mass or less. The above upper and lower limits can be arbitrarily combined. For example, it is preferably 30 to 95% by mass, more preferably 50 to 95% by mass, even more preferably 70 to 92% by mass, and particularly preferably 80 to 90% by mass. By setting it to the lower limit or more, light-blocking properties tend to be improved. By setting it to the upper limit or less, NMP resistance tends to be improved.

[0332] When the photosensitive coloring composition of the present invention contains a black pigment, its content is not particularly limited, but is preferably 2% by mass or more, more preferably 3% by mass or more, even more preferably 5% by mass or more, even more preferably 10% by mass or more, and particularly preferably 20% by mass or more, based on the total solid content of the photosensitive coloring composition. Also, it is preferably 60% by mass or less, more preferably 50% by mass or less, and particularly preferably 40% by mass or less. The above upper and lower limits can be arbitrarily combined. For example, it is preferably 2 to 60% by mass, more preferably 5 to 60% by mass, even more preferably 10 to 50% by mass, and particularly preferably 20 to 40% by mass. By setting it to the lower limit or more, light-blocking properties tend to be improved. By setting it to the upper limit or less, NMP resistance tends to be improved.

[0333] When the photosensitive coloring composition of the present invention contains an organic black pigment, its content is not particularly limited, but is preferably 2% by mass or more, more preferably 3% by mass or more, even more preferably 5% by mass or more, even more preferably 10% by mass or more, and particularly preferably 20% by mass or more, based on the total solid content of the photosensitive coloring composition. Also, it is preferably 60% by mass or less, more preferably 50% by mass or less, and particularly preferably 40% by mass or less. The above upper and lower limits can be arbitrarily combined. For example, it is preferably 2 to 60% by mass, more preferably 5 to 60% by mass, even more preferably 10 to 50% by mass, and particularly preferably 20 to 40% by mass. By setting it to the lower limit or more, light-blocking properties tend to be improved. By setting it to the upper limit or less, NMP resistance tends to be improved.

[0334] When the (a) colorant contains an organic black pigment, its content is not particularly limited, but is preferably 5% by mass or more, more preferably 10% by mass or more, even more preferably 15% by mass or more, and particularly preferably 20% by mass or more in the (a) colorant. It is also preferably 100% by mass or less, more preferably 80% by mass or less, and particularly preferably 70% by mass or less. The above upper and lower limits can be arbitrarily combined. For example, it is preferably 5 to 100% by mass, more preferably 10 to 100% by mass, even more preferably 15 to 80% by mass, and particularly preferably 20 to 70% by mass. By setting it to the lower limit or more, light-blocking properties tend to be improved. By setting it to the upper limit or less, NMP resistance tends to be improved.

[0335] When the (a) colorant contains carbon black as an inorganic black pigment, its content is not particularly limited, but is preferably 5% by mass or more, more preferably 10% by mass or more, and even more preferably 15% by mass or more in the (a) colorant. It is also preferably 60% by mass or less, more preferably 50% by mass or less, and particularly preferably 40% by mass or less. The above upper and lower limits can be arbitrarily combined. For example, it is preferably 5 to 60% by mass, more preferably 10 to 50% by mass, and even more preferably 15 to 40% by mass. By setting it to the lower limit or more, light-blocking properties tend to be improved. By setting it to the upper limit or less, NMP resistance tends to be improved.

[0336] When the (a) colorant contains an organic color pigment and a black pigment, the total content ratio thereof is not particularly limited, but is preferably 5% by mass or more, more preferably 10% by mass or more, and even more preferably 15% by mass or more in the (a) colorant. Also, it is preferably 100% by mass or less, more preferably 70% by mass or less, and particularly preferably 50% by mass or less. The above upper and lower limits can be arbitrarily combined. For example, it is preferably 5 to 100% by mass, more preferably 10 to 70% by mass, and even more preferably 15 to 50% by mass. By setting it to the lower limit or more, light-blocking properties tend to be improved. By setting it to the upper limit or less, NMP resistance tends to be improved.

[0337] The content of (b) alkali-soluble resin is not particularly limited, but is preferably 5% by mass or more, more preferably 10% by mass or more, even more preferably 20% by mass or more, even more preferably 30% by mass or more, and particularly preferably 40% by mass or more, based on the total solids content of the photosensitive coloring composition of the present invention. It is also preferably 85% by mass or less, more preferably 80% by mass or less, even more preferably 70% by mass or less, even more preferably 60% by mass or less, and particularly preferably 55% by mass or less. The above upper and lower limits can be arbitrarily combined. For example, 5 to 80% by mass is preferred, 10 to 70% by mass is more preferred, 20 to 60% by mass is even more preferred, 30 to 60% by mass is even more preferred, 30 to 55% by mass is particularly preferred, and 40 to 55% by mass is particularly preferred. By ensuring that the content is equal to or greater than the lower limit, it is possible to suppress a decrease in the solubility of the unexposed portion in the developer, thereby tending to suppress development defects. By setting the content to the upper limit or less, it is possible to maintain appropriate sensitivity, to prevent the exposed area from being dissolved by a developer, and to prevent deterioration in the sharpness and adhesion of the pattern.

[0338] When the photosensitive coloring composition of the present invention contains (b1) an epoxy (meth)acrylate resin, the content of the (b1) epoxy (meth)acrylate resin is not particularly limited, but is preferably 5% by mass or more, more preferably 10% by mass or more, even more preferably 15% by mass or more, even more preferably 20% by mass or more, particularly preferably 30% by mass or more, and particularly preferably 40% by mass or more, based on the total solid content of the photosensitive coloring composition of the present invention. It is also preferably 80% by mass or less, more preferably 70% by mass or less, even more preferably 60% by mass or less, and particularly preferably 55% by mass or less. The above upper and lower limits can be arbitrarily combined. For example, 5 to 80% by mass is preferred, 10 to 70% by mass is more preferred, 20 to 60% by mass is even more preferred, 30 to 60% by mass is even more preferred, 30 to 55% by mass is particularly preferred, and 40 to 55% by mass is particularly preferred. By setting the content at or above the lower limit, the solubility of the unexposed portion in the developer tends to be ensured. By setting the content to the upper limit or less, appropriate sensitivity can be maintained, dissolution of exposed areas by a developer can be suppressed, and deterioration in the sharpness and adhesion of the pattern can be suppressed.

[0339] When the (b) alkali-soluble resin contains the (b1) epoxy (meth)acrylate resin, the content of the (b1) epoxy (meth)acrylate resin in the (b) alkali-soluble resin is not particularly limited, but is preferably 20% by mass or more, more preferably 30% by mass or more, even more preferably 40% by mass or more, and is preferably 100% by mass or less, more preferably 90% by mass or less, and even more preferably 80% by mass or less. The upper and lower limits can be arbitrarily combined. For example, 20 to 90% by mass is preferred, 30 to 80% by mass is more preferred, and 40 to 80% by mass is even more preferred. Setting the content at or above the lower limit tends to ensure the solubility of the unexposed portion in the developer. Setting the content at or below the upper limit tends to maintain appropriate sensitivity, suppress dissolution of the exposed portion in the developer, and suppress deterioration of the sharpness and adhesion of the pattern.

[0340] The content of the (c) photopolymerization initiator is not particularly limited, but is preferably 0.1% by mass or more, more preferably 0.5% by mass or more, even more preferably 1% by mass or more, even more preferably 2% by mass or more, particularly preferably 3% by mass or more, relative to the total solid content of the photosensitive coloring composition of the present invention. It is also preferably 15% by mass or less, more preferably 10% by mass or less, even more preferably 8% by mass or less, and particularly preferably 6% by mass or less. The upper and lower limits can be arbitrarily combined. For example, 0.1 to 15% by mass is preferred, 0.5 to 15% by mass is more preferred, 1 to 10% by mass is even more preferred, 2 to 8% by mass is even more preferred, and 3 to 6% by mass is particularly preferred. By setting the content at or above the lower limit, sensitivity degradation tends to be suppressed. By setting the content at or below the upper limit, solubility of unexposed areas in the developer is suppressed, and development defects tend to be suppressed.

[0341] When a polymerization accelerator is used together with the (c) photopolymerization initiator, the content of the polymerization accelerator is not particularly limited, but is preferably 0.05% by mass or more, and preferably 10% by mass or less, more preferably 5% by mass or less, relative to the total solid content of the photosensitive coloring composition of the present invention. For example, 0.05 to 10% by mass is preferred, and 0.05 to 5% by mass is more preferred. The polymerization accelerator is preferably used in an amount of 0.1 to 50 parts by mass, and more preferably 0.1 to 20 parts by mass, relative to 100 parts by mass of the (c) photopolymerization initiator. By setting the content of the polymerization accelerator at or above the lower limit, a decrease in sensitivity to exposure light tends to be suppressed. By setting the content at or below the upper limit, a decrease in the solubility of the unexposed portion in the developer tends to be suppressed, and development defects tend to be suppressed. (c) When a sensitizing dye is used together with the photopolymerization initiator, the content of the sensitizing dye is not particularly limited, but from the viewpoint of sensitivity, it is preferably 20% by mass or less, more preferably 15% by mass or less, and even more preferably 10% by mass or less, based on the total solid content in the photosensitive coloring composition.

[0342] The content of the (d) ethylenically unsaturated compound is not particularly limited, but is preferably 1% by mass or more, more preferably 5% by mass or more, even more preferably 10% by mass or more, and particularly preferably 15% by mass or more, relative to the total solid content of the photosensitive coloring composition of the present invention. It is also preferably 30% by mass or less, more preferably 25% by mass or less, and even more preferably 20% by mass or less. The upper and lower limits can be arbitrarily combined. For example, 1 to 30% by mass is preferred, 5 to 20% by mass is more preferred, and 10 to 20% by mass is even more preferred. By setting the content at or above the lower limit, proper sensitivity can be maintained, dissolution of exposed areas by the developer can be suppressed, and a decrease in pattern sharpness and adhesion can be suppressed. By setting the content at or below the upper limit, increased penetration of the developer into exposed areas can be suppressed, which tends to make it easier to obtain a good image.

[0343] The content of the (e) nitrogen-containing aromatic compound is not particularly limited, but is preferably 0.01% by mass or more, more preferably 0.05% by mass or more, even more preferably 0.1% by mass or more, and particularly preferably 0.5% by mass or more, relative to the total solids content of the photosensitive coloring composition of the present invention. It is also preferably 10% by mass or less, more preferably 5% by mass or less, and even more preferably 2% by mass or less. The upper and lower limits can be arbitrarily combined. For example, 0.01 to 10% by mass is preferred, 0.01 to 5% by mass is more preferred, 0.05 to 5% by mass is even more preferred, and 0.1 to 2% by mass is particularly preferred. By setting the content at or above the lower limit, the effect of protecting the electrode surface is exhibited and erosion tends to be suppressed. By setting the content at or below the upper limit, the development time of the unexposed areas does not become too fast, and it tends to be easier to obtain a good image.

[0344] The content of (f) dispersant is not particularly limited, but is preferably 1% by mass or more, more preferably 2% by mass or more, and even more preferably 3% by mass or more, relative to the total solid content of the photosensitive coloring composition. It is also preferably 20% by mass or less, more preferably 15% by mass or less, even more preferably 10% by mass or less, and even more preferably 7% by mass or less. The upper and lower limits can be arbitrarily combined. For example, 1 to 20% by mass is preferred, 2 to 15% by mass is more preferred, 3 to 10% by mass is even more preferred, and 3 to 7% by mass is particularly preferred. By setting the content at or above the lower limit, sufficient dispersibility tends to be easily obtained. By setting the content at or below the upper limit, surface roughness of the electrode surface tends to be suppressed.

[0345] The content ratio of (e) nitrogen-containing aromatic compound per 100 parts by mass of (f) dispersant is not particularly limited, but is preferably 0.1 parts by mass or more, more preferably 1.0 parts by mass or more, even more preferably 10 parts by mass or more, even more preferably 20 parts by mass or more, and is preferably 50 parts by mass or less, preferably 30 parts by mass or less, and even more preferably 25 parts by mass or less. The above upper and lower limits can be arbitrarily combined. For example, 0.1 to 50 parts by mass is preferred, 1.0 to 30 parts by mass is more preferred, 10 to 25 parts by mass is more preferred, and 20 to 25 parts by mass is particularly preferred. By setting the content at or above the lower limit, surface roughness of the electrode surface tends to be suppressed. By setting the content at or below the upper limit, the amount of outgassing tends to be suppressed.

[0346] The content ratio of (f) dispersant relative to 100 parts by mass of (a) colorant is not particularly limited, but is preferably 5 parts by mass or more, more preferably 10 parts by mass or more, even more preferably 15 parts by mass or more, and is preferably 50 parts by mass or less, more preferably 30 parts by mass or less. The above upper and lower limits can be arbitrarily combined. For example, 5 to 50 parts by mass is preferred, more preferably 10 to 50 parts by mass, and even more preferably 15 to 30 parts by mass. By setting the content at or above the lower limit, sufficient dispersibility tends to be easily obtained. By setting the content at or below the upper limit, surface roughness of the electrode surface tends to be suppressed.

[0347] The content ratio of (b) alkali-soluble resin relative to 100 parts by mass of (d) ethylenically unsaturated compound is not particularly limited, but is preferably 100 parts by mass or more, more preferably 200 parts by mass or more, even more preferably 250 parts by mass or more, even more preferably 300 parts by mass or more, and particularly preferably 350 parts by mass or more. Also, it is preferably 700 parts by mass or less, more preferably 500 parts by mass or less, even more preferably 450 parts by mass or less, and particularly preferably 400 parts by mass or less. The above upper and lower limits can be arbitrarily combined. For example, it is preferably 100 to 700 parts by mass, more preferably 200 to 700 parts by mass, even more preferably 250 to 500 parts by mass, even more preferably 250 to 450 parts by mass, and particularly preferably 250 to 400 parts by mass. Setting it at or above the lower limit tends to result in an appropriate dissolution and development state without peeling, etc. Setting it at or below the upper limit tends to result in an appropriate dissolution time in the developer.

[0348] When an adhesion improver is used, its content is not particularly limited, but is preferably 0.1 to 5 mass %, more preferably 0.2 to 3 mass %, and even more preferably 0.4 to 2 mass %, relative to the total solid content of the photosensitive coloring composition. By setting it to the lower limit or more, it tends to be possible to sufficiently obtain the effect of improving adhesion. By setting it to the upper limit or less, it tends to be possible to suppress a decrease in sensitivity and defects caused by residue remaining after development.

[0349] When a surfactant is used, its content is not particularly limited, but is preferably 0.001 to 10 mass%, more preferably 0.005 to 1 mass%, even more preferably 0.01 to 0.5 mass%, and particularly preferably 0.03 to 0.3 mass%, relative to the total solid content of the photosensitive coloring composition. By setting the content at or above the lower limit, smoothness and uniformity of the coating film tend to be easily achieved. By setting the content at or below the upper limit, smoothness and uniformity of the coating film tend to be easily achieved, and deterioration of other properties also tends to be suppressed.

[0350] The photosensitive coloring composition of the present invention is prepared by using a solvent so that the total solid content is preferably 5% by mass or more, more preferably 10% by mass or more, even more preferably 15% by mass or more, and preferably 50% by mass or less, more preferably 30% by mass or less, and even more preferably 25% by mass or less. The above upper and lower limits can be combined arbitrarily. For example, the composition is prepared so that the total solid content is preferably 5 to 50% by mass, more preferably 10 to 30% by mass, and even more preferably 15 to 25% by mass.

[0351] The photosensitive coloring composition of the present invention preferably has a low content of chlorine atoms. By reducing the content of chlorine atoms in the photosensitive coloring composition, it is thought that corrosion or migration to a metal electrode such as silver caused by decomposition, volatilization, or sublimation of chlorine atoms in the photosensitive coloring composition during heat treatment, particularly during baking, can be suppressed, and surface roughness can be suppressed. The chlorine atoms in the photosensitive coloring composition are mainly contained in the constituent materials such as (a) colorant, (b) alkali-soluble resin, and (f) dispersant, but may also be contained in other materials. In order to bring the content of chlorine atoms into the numerical range specified in the present invention, the chlorine content of one constituent material may be reduced, or the chlorine content of each material may be reduced to be designed to fall within the specified numerical range.

[0352] The content of chlorine atom in photosensitive coloring composition is not particularly limited, but is preferably 0.05 mass % or less, more preferably 0.04 mass % or less, even more preferably 0.03 mass % or less, and even more preferably 0.01 mass % or less, based on the total solid content of photosensitive coloring composition.By making it below the upper limit, the surface roughness of electrode tends to be suppressed. The lower limit is not particularly limited, but is preferably 0.0005% by mass or more, more preferably 0.001% by mass or more, and even more preferably 0.002% by mass or more. By setting the content at or above the lower limit, refinement during production of each constituent material can be relaxed. The upper and lower limits can be combined in any way. For example, the content is preferably 0.0005 to 0.05% by mass, more preferably 0.0005 to 0.04% by mass, even more preferably 0.001 to 0.03% by mass, and particularly preferably 0.002 to 0.01% by mass.

[0353] The content of chlorine atoms in the photosensitive coloring composition is preferably 100 μg / g or less, more preferably 80 μg / g or less, even more preferably 50 μg / g or less, even more preferably 30 μg / g or less, particularly preferably 10 μg / g or less, based on the total mass of the photosensitive coloring composition including the solvent.By making it below the upper limit, the surface roughness of the electrode tends to be suppressed. The lower limit is not particularly limited, but is preferably 0.5 μg / g or more, more preferably 1.0 μg / g or more, and even more preferably 2.0 μg / g or more. By setting the lower limit or more, the purification during production of each constituent material can be relaxed. The upper and lower limits can be combined arbitrarily. For example, 0.5 to 100 μg / g is preferable, 0.5 to 80 μg / g is more preferable, 1.0 to 50 μg / g is even more preferable, 1.0 to 30 μg / g is still more preferable, and 2.0 to 10 μg / g is particularly preferable.

[0354] The content of chlorine atoms in the photosensitive coloring composition is preferably 0.20% by mass or less, more preferably 0.15% by mass or less, even more preferably 0.10% by mass or less, even more preferably 0.05% by mass or less, and particularly preferably 0.03% by mass or less, relative to 100% by mass of the content of the colorant (a) in the photosensitive coloring composition. By keeping the content below the upper limit, there is a tendency that the surface roughness of the electrode can be suppressed. The lower limit is not particularly limited, but is preferably 0.001% by mass or more, more preferably 0.005% by mass or more, and even more preferably 0.01% by mass. By setting the content at or above the lower limit, it is effective in that the refining process during the production of each constituent material can be relaxed. The upper and lower limits can be combined in any way. For example, the content is preferably 0.001 to 0.20 mass%, more preferably 0.001 to 0.15 mass%, even more preferably 0.005 to 0.10 mass%, even more preferably 0.005 to 0.05 mass%, and particularly preferably 0.01 to 0.03 mass%.

[0355] The content of chlorine atoms in the photosensitive coloring composition can be measured, for example, by combustion ion chromatography.

[0356] <Physical Properties of Photosensitive Coloring Composition> The optical density (OD) per μm of the coating film of the photosensitive coloring composition of the present invention is not particularly limited, but is preferably 0.2 or more, more preferably 0.5 or more, even more preferably 0.7 or more, even more preferably 0.9 or more, and is preferably 4.0 or less, more preferably 3.0 or less, even more preferably 2.0 or less, and particularly preferably 1.5 or less. The above upper and lower limits can be arbitrarily combined. For example, 0.2 to 4.0 is preferred, 0.5 to 4.0 is more preferred, 0.5 to 3.0 is even more preferred, 0.5 to 2.0 is even more preferred, 0.7 to 2.0 is particularly preferred, and 0.9 to 1.5 is particularly preferred. By setting the OD at or above the lower limit, sufficient light-blocking properties tend to be obtained. By setting the OD at or below the upper limit, surface roughness of the electrode tends to be suppressed. The optical density (OD) per 1 μm of coating film thickness can be measured using a coating film obtained by curing the photosensitive coloring composition of the present invention, and can be measured using a coating film of about 0.5 to 1.5 μm thick that has been heat-cured at 230°C for 20 minutes. Optical density refers to the transmission optical density, which is the spectral sensitivity characteristic of the light receiving section, as indicated by the ISO visual density in the ISO 5-3 standard. The light source typically used is the A illuminant specified by the CIE (International Commission on Illumination). An example of a measuring instrument that can be used to measure transmission optical density is the X-Rite 361T(V) manufactured by Sakata Inx Engineering.

[0357] <Second aspect> A colored photosensitive resin composition according to a second aspect of the present invention is a photosensitive coloring composition containing (a) a colorant, (b) an alkali-soluble resin, (c) a photopolymerization initiator, (d) an ethylenically unsaturated compound, (e) a nitrogen-containing aromatic compound, and (f) a dispersant, wherein the amount of the nitrogen-containing aromatic compound component (e) converted into toluene, as detected by thermal evolved gas analysis, in a coating film having a thickness of 2.0 μm obtained by curing is 0.01 to 0.50 μg / cm 2 is. When the content of component (e) detected by thermal evolved gas analysis is within the above range, the surface of the electrode tends to be less prone to roughening after the photosensitive coloring composition is heat-treated. Although the mechanism is unclear, it is presumed that when a photosensitive coloring composition containing component (e) is heat-treated, the sublimated nitrogen-containing aromatic compound (e) can protect the electrode surface, making it less likely to become rough on the electrode surface.

[0358] Thermal evolved gas analysis can be performed, for example, by Temperature Programmed Desorption-Mass Spectrometry (TPD-MS). In TPD-MS, a mass spectrometer (MS) is directly connected to a special heating device with a temperature controller, and the change in concentration of gas evolved from a heated sample is tracked as a function of temperature or time according to a predetermined heating program. Because this is an online analysis, it is possible to simultaneously detect inorganic and organic components in a single measurement. In addition, organic components can be qualitatively analyzed by GC / MS analysis of the trapped material. The substrate for gas amount measurement can be prepared by applying a photosensitive resin composition to a support, drying, exposing, and optionally developing, as described below. The gas amount is measured when the coating film obtained by curing the photosensitive resin composition has a thickness of 2.0 μm and an area of ​​1 cm. 2 However, when measuring, the measurement may be performed using a sample that matches the detection sensitivity of the instrument, and the measurement may be converted into a gas amount value per unit film thickness and unit area. After calculating the area of ​​the detected peak component, the peak area was measured using toluene with a known concentration and a calibration curve was used to calculate the amount of gas converted to toluene (μg / cm 2 ) can be calculated. In the present invention, the amount of gas converted to toluene per unit area (μg / cm) is calculated from the area of ​​the peak component corresponding to (e) nitrogen-containing aromatic compounds among the detected peak components. 2 ) can be calculated. The amount of gas converted to toluene is 0.01 μg / cm 2 More than 0.03 μg / cm is preferable. 2 More preferably, 0.10 μg / cm 2 More preferably, 0.20 μg / cm 2 More preferably, 0.30 μg / cm 2 More than 0.50 μg / cm is particularly preferred. 2 Preferably less than 0.45 μg / cm 2 Less than 0.40 μg / cm is more preferable. 2 The following is even more preferred: The upper and lower limits can be arbitrarily combined. For example, 0.01 to 0.50 μg / cm 2 is preferred, and 0.03 to 0.45 μg / cm 2 More preferably, 0.10 to 0.45 μg / cm 2 is more preferably 0.20 to 0.40 μg / cm 2 is even more preferably 0.30 to 0.40 μg / cm 2 is particularly preferred. By setting the content at or above the lower limit, the surface roughness of the electrode tends to improve, while by setting the content at or below the upper limit, the amount of outgassing tends to be suppressed.

[0359] <Method for producing photosensitive coloring composition> The photosensitive coloring composition of the present invention is produced in accordance with a conventional method. The (a) colorant is preferably dispersed in advance using a paint conditioner, sand grinder, ball mill, roll mill, stone mill, jet mill, homogenizer, etc. The (a) colorant is microparticulated by the dispersion treatment, thereby improving the coating properties of the photosensitive coloring composition.

[0360] The dispersion treatment is preferably carried out in a system using (a) a colorant, (f) a dispersant, and a solvent, and part or all of (b) an alkali-soluble resin in combination, or in a system using (a) a colorant, (f) a dispersant, and a solvent, and part or all of (b) an alkali-soluble resin in combination (hereinafter, the composition obtained by the dispersion treatment may be referred to as a "pigment dispersion"). In particular, using a polymer dispersant as the (f) dispersant is preferred because it inhibits the resulting pigment dispersion and photosensitive coloring composition from thickening over time, i.e., it has excellent dispersion stability. As the (a) colorant, (f) dispersant and solvent that can be used in the pigment dispersion, those that can be used in the photosensitive coloring composition can be preferably used. As the content ratio of each colorant of the (a) colorant in the pigment dispersion, those that can be used in the photosensitive coloring composition can be preferably used.

[0361] When a dispersion treatment is carried out on a liquid containing all the components to be blended in the photosensitive coloring composition, the heat generated during the dispersion treatment may cause the highly reactive components to denature. Therefore, it is preferable to carry out the dispersion treatment in a system containing a polymer dispersant. When dispersing the (a) colorant using a sand grinder, glass beads or zirconia beads with a particle size of approximately 0.1 to 8 mm are preferably used. Regarding dispersion conditions, a temperature of 0 to 100°C is preferred, with room temperature to 80°C being more preferred. The dispersion time varies depending on the liquid composition and the size of the dispersion treatment device, and should be adjusted accordingly. A guideline for dispersion is to control the gloss of the pigment dispersion so that the 20° specular gloss (JIS Z8741) of the photosensitive coloring composition is in the range of 50 to 300. When the gloss of the photosensitive coloring composition is low, the dispersion treatment is often insufficient, leaving coarse pigment (colorant) particles, which can result in insufficient developability, adhesion, resolution, and other properties. If the dispersion treatment is performed until the gloss value exceeds the above range, the pigment will be crushed, producing a large number of ultrafine particles, which tends to actually impair dispersion stability. The particle size of the pigment dispersed in the pigment dispersion is preferably 0.03 to 0.3 μm, and can be measured by a dynamic light scattering method.

[0362] Next, the pigment dispersion obtained by the above-mentioned dispersion treatment and the other components contained in the photosensitive coloring composition are mixed to make a uniform solution or dispersion.In the manufacturing process of the photosensitive coloring composition, fine dust may be mixed in the liquid, so it is desirable to filter the obtained photosensitive coloring composition with a filter or the like.

[0363] [Cured product] The cured product of the present invention can be obtained by curing the photosensitive coloring composition of the present invention. The cured product obtained by curing the photosensitive coloring composition of the present invention can be suitably used as a partition wall.

[0364] [Bulkhead] The photosensitive coloring composition of the present invention can be suitably used to form partition walls, particularly partition walls for separating organic layers of organic electroluminescent devices. Examples of organic layers used in organic electroluminescent devices include organic layers used as hole injection layers, hole transport layers, or hole transport layers on hole injection layers, as described in JP 2016-165396 A.

[0365] Next, the partition walls using the photosensitive coloring composition of the present invention will be described according to the method for producing the same.

[0366] (1) Support The material of the support for forming the partition walls is not particularly limited as long as it has adequate strength. Substrates are mainly used, and examples of materials include polyester resins such as polyethylene terephthalate, polyolefin resins such as polypropylene and polyethylene, thermoplastic resin sheets such as polycarbonate, polymethyl methacrylate, and polysulfone, thermosetting resin sheets such as epoxy resins, unsaturated polyester resins, and poly(meth)acrylic resins, and various types of glass. Glass and heat-resistant resins are preferred from the perspective of heat resistance. In addition, transparent electrodes such as ITO and IZO, or metal electrodes such as silver, gold, platinum, aluminum, and magnesium may be formed on the surface of the substrate. In addition to the above-mentioned substrates, they can also be formed on TFT arrays.

[0367] If necessary, the support may be subjected to, for example, corona discharge treatment, ozone treatment, or thin film formation treatment using a silane coupling agent or various resins such as urethane resins in order to improve surface properties such as adhesiveness. The thickness of the substrate is preferably in the range of 0.05 to 10 mm, more preferably 0.1 to 7 mm. When a thin film of various resins is formed, the thickness is preferably in the range of 0.01 to 10 μm, more preferably 0.05 to 5 μm.

[0368] (2) Bulkhead The photosensitive coloring composition of the present invention is used for the same purpose as the known photosensitive coloring composition for color filter. Hereinafter, when used as a partition wall, the photosensitive coloring composition of the present invention will be described according to a specific example of the method for forming a partition wall.

[0369] The photosensitive coloring composition is applied in the form of a film or a pattern by a method such as coating onto a substrate on which partition walls are to be formed, and the solvent is dried. Subsequently, a pattern is formed by a method such as photolithography, which involves exposure and development. Thereafter, partition walls are formed on the substrate by performing additional exposure or heat curing treatment as necessary.

[0370] (3) Formation of partitions [1] Supply method to the board The photosensitive coloring composition of the present invention is preferably applied to a substrate in a state dissolved or dispersed in a solvent. The application method can be a conventionally known method, such as a spinner method, a wire bar method, a flow coating method, a die coating method, a roll coating method, or a spray coating method. It may also be applied in a pattern by, for example, an inkjet method or a printing method. The die coating method is preferred from an overall viewpoint, since it significantly reduces the amount of coating solution used, is completely free from the influence of mist or the like that adheres when using a spin coating method, and suppresses the generation of foreign matter.

[0371] The amount of coating varies depending on the application, but in the case of barrier ribs, for example, the coating is preferably applied so that the dry film thickness is 0.5 μm to 10 μm, more preferably 1 μm to 9 μm, and particularly preferably 1 μm to 7 μm. It is important that the dry film thickness or the height of the finally formed barrier ribs is uniform across the entire substrate. By minimizing the variation, the light-emitting layer can be formed uniformly, and display defects during light emission can be suppressed.

[0372] When partition walls having different heights are formed at once by photolithography using the photosensitive coloring composition of the present invention, the heights of the partition walls finally formed will be different.

[0373] The substrate may be a known substrate such as a glass substrate, an array substrate, etc. The substrate surface is preferably flat.

[0374] [2] Drying method After the photosensitive coloring composition is applied to the substrate, the composition is preferably dried using a hot plate, an IR oven, or a convection oven. A reduced pressure drying method in which the composition is dried in a reduced pressure chamber without increasing the temperature may also be used in combination.

[0375] Drying conditions can be appropriately selected depending on the type of solvent component, the performance of the dryer used, etc. The drying time is selected depending on the type of solvent component, the performance of the dryer used, etc., preferably within the range of 15 seconds to 5 minutes at a temperature of 40°C to 130°C, and more preferably within the range of 30 seconds to 3 minutes at a temperature of 50°C to 110°C.

[0376] [3] Exposure method Exposure is carried out by superimposing a negative mask pattern on the coating film of the photosensitive coloring composition and irradiating it with a light source of ultraviolet or visible light through this mask pattern. When exposure is carried out using an exposure mask, a method in which the exposure mask is brought close to the coating film of the photosensitive coloring composition, or a method in which the exposure mask is placed at a position away from the coating film of the photosensitive coloring composition and exposure light is projected through the exposure mask may be used. A scanning exposure method using laser light without using a mask pattern may also be used. If necessary, in order to prevent a decrease in the sensitivity of the photopolymerizable layer due to oxygen, exposure may be carried out in a deoxygenated atmosphere, or after forming an oxygen-blocking layer such as a polyvinyl alcohol layer on the photopolymerizable layer.

[0377] In a preferred embodiment of the present invention, when partition walls of different heights are simultaneously formed by photolithography, for example, an exposure mask is used that has a light-shielding portion (light transmittance 0%) and a plurality of openings, each of which has a lower average light transmittance (intermediate-transmittance openings) than the opening with the highest average light transmittance (full-transmittance openings). This method causes a difference in the remaining film rate due to the difference in average light transmittance between the intermediate-transmittance openings and the full-transmittance openings, i.e., the difference in exposure dose. A known method for creating the intermediate transmission aperture is to use a matrix-shaped light-shielding pattern having minute polygonal light-shielding units, while a known method for creating the absorber is to use a film of a chromium-based, molybdenum-based, tungsten-based, or silicon-based material to control the light transmittance.

[0378] The light source used for exposure is not particularly limited. Examples of the light source include lamp light sources such as xenon lamps, halogen lamps, tungsten lamps, high-pressure mercury lamps, ultra-high-pressure mercury lamps, metal halide lamps, medium-pressure mercury lamps, low-pressure mercury lamps, carbon arcs, and fluorescent lamps, and laser light sources such as argon ion lasers, YAG lasers, excimer lasers, nitrogen lasers, helium cadmium lasers, blue-violet semiconductor lasers, and near-infrared semiconductor lasers. When using light of a specific wavelength, an optical filter can also be used.

[0379] The optical filter may be, for example, a thin film type capable of controlling the light transmittance at the exposure wavelength, and in this case, examples of the material include Cr compounds (such as oxides, nitrides, oxynitrides, and fluorides of Cr), MoSi, Si, W, and Al.

[0380] The exposure dose is not particularly limited, but is preferably 1 mJ / cm 2 More than 5mJ / cm 2 More preferably, 10 mJ / cm 2 or more, and preferably 300 mJ / cm 2 Less than or equal to 200 mJ / cm 2 or less, more preferably 150 mJ / cm 2 The following is the result. In the case of the proximity exposure method, the distance between the object to be exposed and the mask pattern is not particularly limited, but is preferably 10 μm or more, more preferably 50 μm or more, even more preferably 75 μm or more, and is preferably 500 μm or less, more preferably 400 μm or less, even more preferably 300 μm or less.

[0381] [4] Development method After the exposure, an image pattern can be formed on the substrate by development using an aqueous solution of an alkaline compound or an organic solvent. The aqueous solution of the alkaline compound may further contain, for example, a surfactant, an organic solvent, a buffer, a complexing agent, a dye, or a pigment.

[0382] Examples of alkaline compounds include inorganic alkaline compounds such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, sodium bicarbonate, potassium bicarbonate, sodium silicate, potassium silicate, sodium metasilicate, sodium phosphate, potassium phosphate, sodium hydrogen phosphate, potassium hydrogen phosphate, sodium dihydrogen phosphate, potassium dihydrogen phosphate, and ammonium hydroxide; and organic alkaline compounds such as mono-, di-, or triethanolamine, mono-, di-, or trimethylamine, mono-, di-, or triethylamine, mono- or diisopropylamine, n-butylamine, mono-, di-, or triisopropanolamine, ethyleneimine, ethylenediimine, tetramethylammonium hydroxide (TMAH), and choline. These alkaline compounds may be used alone or in combination of two or more.

[0383] Examples of surfactants include nonionic surfactants such as polyoxyethylene alkyl ethers, polyoxyethylene alkylaryl ethers, polyoxyethylene alkyl esters, sorbitan alkyl esters, and monoglyceride alkyl esters; anionic surfactants such as alkylbenzenesulfonates, alkylnaphthalenesulfonates, alkyl sulfates, alkylsulfonates, and sulfosuccinate salts; and amphoteric surfactants such as alkylbetaines and amino acids.

[0384] Examples of organic solvents include isopropyl alcohol, benzyl alcohol, ethyl cellosolve, butyl cellosolve, phenyl cellosolve, propylene glycol, and diacetone alcohol. Two or more of these organic solvents may be used in combination. Furthermore, the organic solvent may be used alone or in combination with water or an aqueous solution of an alkaline compound.

[0385] The conditions for the development treatment are not particularly limited, and the development temperature is preferably 10 to 50° C., more preferably 15 to 45° C., and even more preferably 20 to 40° C. The development method can be, for example, an immersion development method, a spray development method, a brush development method, or an ultrasonic development method.

[0386] [5] Post-exposure and heat-hardening treatment If necessary, the developed substrate may be subjected to additional exposure using a method similar to the above-mentioned exposure method. After development or additional exposure, a thermal curing treatment (also called baking) may be performed. The thermal curing conditions are preferably a temperature of 100°C to 280°C, more preferably 150°C to 250°C, and a time of 5 to 60 minutes.

[0387] When the present invention is used as a partition wall, the size, shape, etc. are appropriately adjusted depending on the specifications of the organic electroluminescent device to which it is applied, but the height of the partition wall formed from the photosensitive coloring composition of the present invention is preferably about 0.5 to 10 μm. From the viewpoint of light-shielding properties, the optical density (OD) per 1 μm of the partition walls of the present invention is preferably 0.7 or more, more preferably 1.2 or more, even more preferably 1.5 or more, and particularly preferably 1.8 or more. It is also preferably 4.0 or less, more preferably 3.0 or less. For example, it is preferably 0.7 to 4.0, more preferably 1.2 to 4.0, even more preferably 1.5 to 3.0, and particularly preferably 1.8 to 3.0. Here, the optical density (OD) is a value measured by the method described below.

[0388] [Organic electroluminescent device] The organic electroluminescent device of the present invention comprises a cured product, such as a partition wall, formed from the photosensitive coloring composition of the present invention. For example, various organic electroluminescent devices are manufactured using a substrate having a partition wall pattern manufactured by the above-described method. Although the method for forming the organic electroluminescent device is not particularly limited, the organic electroluminescent device is preferably manufactured by forming a partition wall pattern on a substrate by the above-described method, and then forming organic layers such as pixels by a vapor deposition method in which a functional material is sublimated in a vacuum and deposited in the area surrounded by the partition walls on the substrate to form a film, or by a wet process such as a casting method, a spin coating method, or an inkjet printing method.

[0389] The types of organic electroluminescent devices include bottom emission types and top emission types. A bottom-emission type is fabricated, for example, by forming a partition wall on a glass substrate on which a transparent electrode is laminated, and then laminating a hole transport layer, a light-emitting layer, an electron transport layer, and a metal electrode layer in an opening surrounded by the partition wall, whereas a top-emission type is fabricated, for example, by forming a partition wall on a glass substrate on which a metal electrode layer is laminated as a reflective layer, and then laminating an electron transport layer, a light-emitting layer, a hole transport layer, and a transparent electrode layer in an opening surrounded by the partition wall. Examples of the light-emitting layer include organic electroluminescent layers such as those described in Japanese Patent Application Laid-Open No. 2009-146691 and Japanese Patent No. 5734681. Quantum dots such as those described in Japanese Patent No. 5653387 and Japanese Patent No. 5653101 may also be used.

[0390] The layer structure is not limited to this, and for example, each of the hole transport layer and the electron transport layer may have a laminate structure consisting of two or more layers from the viewpoint of luminous efficiency. The thickness of each layer is not particularly limited, but is preferably 1 to 500 nm from the viewpoint of luminous efficiency and brightness.

[0391] The organic electroluminescent element may be formed with each RGB color separated for each opening, or two or more colors may be laminated in one opening. The organic electroluminescent element may have a sealing layer to improve reliability. The sealing layer has the function of preventing moisture in the air from being adsorbed onto the organic electroluminescent element and reducing luminous efficiency. The organic electroluminescent element may have a low-reflection film at the interface with air to improve light extraction efficiency. By disposing the low-reflection film at the interface between air and the element, it is expected that the refractive index gap will be reduced and reflection at the interface will be suppressed. For example, moth-eye structure and super multilayer film technology can be applied to such a low-reflection film.

[0392] When an organic electroluminescent element is used as a pixel of an image display device, it is necessary to prevent light from the light-emitting layer of a pixel from leaking to other pixels. Furthermore, when electrodes or the like are made of metal, it is necessary to prevent deterioration in image quality due to reflection of external light. Therefore, it is preferable to impart light-shielding properties to the partition walls constituting the organic electroluminescent element. In an organic electroluminescent device, since it is necessary to provide electrodes on the upper and lower surfaces of the partition walls, the partition walls preferably have high resistance and low dielectric constant from the viewpoint of insulating properties. Therefore, when a colorant is used to provide the partition walls with light-shielding properties, it is preferable to use the above-mentioned organic pigment having high resistance and low dielectric constant.

[0393] [Image display device] The image display device of the present invention can include an organic EL display device having a partition wall or an organic electroluminescent element containing the cured product of the present invention. The organic EL display device is not particularly limited in type or structure as an image display device as long as it includes the above-mentioned organic electroluminescent elements, and can be assembled, for example, by a conventional method using active-drive organic electroluminescent elements. For example, it can be formed by a method such as that described in "Organic EL Display" (Ohmsha, published August 20, 2004, by Tokito Shizuo, Adachi Chinaya, and Murata Hideyuki). For example, an image can be displayed by combining an organic electroluminescent element that emits white light with a color filter, or by combining organic electroluminescent elements that emit different colors such as RGB.

[0394] [illumination] The organic electroluminescent device containing the cured product of the present invention can be used for lighting. There are no particular limitations on the type or structure of the lighting, and it can be assembled according to a conventional method using the organic electroluminescent device containing the cured product of the present invention. The organic electroluminescent device may be of a simple matrix drive type or an active matrix drive type. In order to make the illumination emit white light, an organic electroluminescent element that emits white light may be used. Alternatively, organic electroluminescent elements that emit different colors may be combined to mix the colors to produce white, or the color mixing ratio may be adjusted to provide a color adjustment function. [Example]

[0395] The present invention will be explained in more detail below with reference to examples and comparative examples, but the present invention is not limited to the following examples as long as it does not depart from the gist of the invention. The components of the photosensitive coloring compositions used in the following Examples and Comparative Examples, and the methods for evaluating them, are as follows:

[0396] <Alkali-soluble resin-I> "ZCR-8035H" manufactured by Nippon Kayaku Co., Ltd. (weight average molecular weight Mw = 7000, acid value = 82 mgKOH / g). Has partial structures represented by the following general formula (C-1) and the following general formula (C-2).

[0397] [ka]

[0398] In the formula, ** represents a connection point.

[0399] <Alkali-soluble resin-II> [ka]

[0400] 240 parts by mass of the epoxy compound (epoxy equivalent: 264) having the above structure, 68.3 parts by mass of acrylic acid, 263.1 parts by mass of methoxybutyl acetate, 6.4 parts by mass of triphenylphosphine, and 0.16 parts by mass of paramethoxyphenol were placed in a flask equipped with a thermometer, a stirrer, and a condenser, and reacted with stirring at 90°C for 12 hours until the acid value reached 5 mgKOH / g or less. Next, 9.2 parts by mass of trimethylolpropane (TMP), 115.6 parts by mass of biphenyltetracarboxylic dianhydride (BPDA), and 25.1 parts by mass of tetrahydrophthalic anhydride (THPA) were added to the reaction liquid obtained by the above reaction in a flask equipped with a thermometer, a stirrer, and a condenser, and the temperature was slowly raised to 105°C while stirring to allow the reaction to occur, thereby obtaining alkali-soluble resin-II having a solid acid value of 104 mgKOH / g and a weight average molecular weight (Mw) of 13,000 in terms of polystyrene as measured by GPC.

[0401] <Pigment-I> Irgaphor (registered trademark) Black S 0100 CF manufactured by BASF (having a chemical structure represented by the following formula (II))

[0402] [ka]

[0403] <Pigment-II> CI Pigment Orange 64 <Pigment-III> CI Pigment Violet 29 <Pigment-IV> CI Pigment Blue 60

[0404] <Dispersant-I> A methacrylic copolymer having an amine value of 60 mg KOH / g and having repeating units represented by the following formulas (1) and (2): (The content of the repeating units represented by the following formulas (1) and (2) in the total repeating units is 11.6 mol % and 4.6 mol %, respectively.)

[0405] [ka]

[0406] <Solvent-I> PGMEA: Propylene glycol monomethyl ether acetate <Solvent-II> MB: 3-methoxy-1-butanol <Solvent-III> MBA: 3-Methoxy-butyl acetate

[0407] <Photopolymerization initiator-I> Oxime ester photopolymerization initiator with the following chemical structure

[0408] [ka]

[0409] <Ethylenically unsaturated compounds> DPHA-40H: Urethane acrylate manufactured by Nippon Kayaku Co., Ltd.

[0410] <Surfactant> DIC Megafack F-559

[0411] <Nitrogen-containing aromatic compounds-I> Benzotriazole: manufactured by Tokyo Chemical Industry Co., Ltd. The compound has the following structure and corresponds to the structure of general formula (1).

[0412] [ka]

[0413] <Nitrogen-containing aromatic compound-II> 2,2'-Bipyridine: manufactured by Tokyo Chemical Industry Co., Ltd. This compound has the following structure and corresponds to the structure of general formula (2).

[0414] [ka]

[0415] <Nitrogen-containing aromatic compounds-III> TINUVIN384-2: UV absorber manufactured by BASF. This compound is represented by the following structural formula, and does not correspond to the structures of general formulas (1) and (2).

[0416] [ka]

[0417] In the above structural formula, m represents 7 to 9.

[0418] <Measurement of optical density per unit film thickness (unit OD value)> The optical density per unit film thickness was measured by the following procedure. First, the prepared photosensitive coloring composition was applied to a glass substrate using a spin coater so that the film thickness after baking would be 1.5 μm, and after drying under reduced pressure for 1 minute, it was dried on a hot plate at 100 ° C for 120 seconds. The obtained coating film was exposed to light without using an exposure mask. The irradiation light source had an intensity of 40 mW / cm at a wavelength of 365 nm. 2 A high-pressure mercury lamp was used, and the exposure dose was 50 mJ / cm 2 Subsequently, the resist was cured by heating in an oven at 230° C. for 30 minutes, thereby obtaining a resist-coated substrate 1. The optical density (OD value) of the obtained resist-coated substrate 1 was measured using an X-Rite 361T(V) transmission densitometer (color temperature of illumination light source: approximately 2850K (equivalent to CIE standard illuminant A), spectral sensitivity characteristics of the light-receiving section: ISO visual density according to ISO 5-3 standard). The film thickness was measured using a non-contact surface / layer cross-sectional shape measurement system, VertScan(R) 2.0, manufactured by Ryoka Systems Co., Ltd., and the optical density (unit OD value) per unit film thickness (1 μm) was calculated from the optical density (OD value) and film thickness. The OD value is a value that indicates the light-blocking ability, with a higher value indicating a higher light-blocking ability.

[0419] <Electrode surface roughness evaluation> Each photosensitive coloring composition was applied to a glass substrate using a spin coater so that the film thickness after baking would be 1.5 μm. After drying under reduced pressure for 1 minute, the substrate was dried on a hot plate at 100°C for 120 seconds. The resulting substrate bearing the photosensitive coloring composition coating and an electrode substrate with a 60 nm-thick silver thin film vapor-deposited over the entire surface of the glass substrate were placed so that the silver surface and the photosensitive coloring composition coating surface faced each other and were separated by 50 μm, and then heated in an oven at 230°C for 30 minutes. The surface roughness (Sa: arithmetic mean height) of the resulting electrode substrate was measured using a non-contact surface / layer cross-sectional shape measurement system, VertScan® 2.0, manufactured by Ryoka Systems Co., Ltd. A smaller surface roughness value indicates less surface roughness. The evaluation was made as follows: A indicates the best. A: Surface roughness (Sa) 1.0nm or less. B: Surface roughness (Sa) greater than 1.0 nm and less than 1.8 nm. C: Surface roughness (Sa) greater than 1.8 nm.

[0420] <Preparation of pigment dispersions 1 and 2> The pigment, dispersant, alkali-soluble resin, and solvent shown in Table 1 were mixed in the mass ratio shown in Table 1. This mixture was subjected to a dispersion treatment using a paint shaker at a temperature range of 25 to 45°C for 3 hours. Zirconia beads with a diameter of 0.5 mm were used, and 2.5 times the mass of the dispersion was added. After dispersion was completed, the beads and dispersion were separated using a filter. Pigment dispersions 1 and 2 were prepared. The amount of solvent in Table 1 includes the amount of solvent derived from the dispersant and alkali-soluble resin.

[0421] [Table 1]

[0422] [Examples 1 to 4, Comparative Examples 1 and 2] In Examples 1 to 3 and Comparative Examples 1 to 2, Dispersant-I was further added to Pigment Dispersion 1, and each component was added so that the solid content ratio of each component in the total solid content was the value shown in Table 2, and further PGMEA / MB / MBA=72 / 20 / 8, and a solvent was added so that the content ratio of the total solid content was 17 mass%, and the mixture was stirred and dissolved to prepare the photosensitive coloring compositions of Examples 1 to 4 and Comparative Examples 1 to 2. The evaluation results of the unit OD value and electrode surface roughness are shown in Table 2.

[0423] [Example 5] The same procedure as in Example 4 was carried out except that Pigment Dispersion Liquid 1 was changed to Pigment Dispersion Liquid 2 and each component was added so as to obtain the values ​​shown in Table 2, thereby preparing a photosensitive coloring composition of Example 5. The evaluation results of the unit OD value and electrode surface roughness are shown in Table 2.

[0424] Comparative Example 3 A photosensitive composition of Comparative Example 3 was prepared by carrying out the same operation as in Example 1, except that Pigment Dispersion Liquid 1 was not used, and each component was added so as to obtain the values ​​shown in Table 2.

[0425] [Table 2]

[0426] In Comparative Example 1, which did not contain a nitrogen-containing aromatic compound, irregularities were formed on the electrode (silver) surface, resulting in a large surface roughness. This is thought to be due to the electrode surface being corroded by gas components generated when the photosensitive coloring composition coating film was heated at 230°C. In Examples 1 to 5, which contain a compound represented by formula (1) or a compound represented by formula (2) as the nitrogen-containing aromatic compound, all of them have a low surface roughness, and it has been confirmed that the addition of a nitrogen-containing aromatic compound to a photosensitive coloring composition has the effect of suppressing erosion of the electrode surface. This is thought to be because when the compound represented by formula (1) or the compound represented by formula (2) is heated at 230 ° C, it sublimes from the surface of the photosensitive coloring composition coating film and coordinates to the surface of the silver electrode on the opposite side, thereby exerting the effect of protecting the electrode surface from gas components generated from the coating film and suppressing erosion of the electrode. In Comparative Example 2, in which a nitrogen-containing aromatic compound other than the compounds represented by formula (1) or formula (2) was added as the nitrogen-containing aromatic compound, it is believed that the nitrogen-containing aromatic compound was difficult to sublimate and did not exhibit the effect of protecting the electrode surface, resulting in a large value of surface roughness. In Comparative Example 3, the change in the surface roughness of the electrode surface was small, and it is clear that the problem of the present invention does not arise in the first place with a composition that does not contain a pigment dispersion.

[0427] <Measurement of gas volume during firing> The photosensitive coloring compositions of Example 1, Example 2, and Comparative Example 2 were applied to a glass substrate using a spin coater so that the film thickness after curing would be 2.0 μm, dried under reduced pressure for 1 minute, and then dried on a hot plate at 100°C for 120 seconds. The resulting coating was exposed to 40 mJ / cm of high-pressure mercury lamp light without using a mask. 2 The light intensity at a wavelength of 365 nm was 40 mW / cm 2 It was.

[0428] The amount of gas during firing was measured by thermal evolved gas analysis as follows: The prepared gas amount measurement substrates (5 mm × 10 mm, 1 to 10 sheets) were heated in a heating furnace at 230°C for 30 minutes to generate gas, which was then collected by cooling with liquid nitrogen. The trapped gas was analyzed by GC / MS (manufactured by Agilent Technologies, product name "5973N") to measure the outgassing amount of nitrogen-containing aromatic compounds. Of the detected peak components, the areas of the peak components corresponding to nitrogen-containing aromatic compounds I to III were calculated. The peak areas were measured in advance using toluene with a known concentration to create a calibration curve. The obtained peak areas corresponding to nitrogen-containing aromatic compounds I to III were converted into the amount of toluene, which was then divided by the measured substrate area to obtain the amount of gas converted into toluene per unit area (μg / cm 2 ) was calculated. The results were as follows:

[0429] Photosensitive coloring composition of Example 1 Target substance: Nitrogen-containing aromatic compound-I Gas amount: 0.39 μg / cm 2 Photosensitive coloring composition of Example 2 Target substance: Nitrogen-containing aromatic compound-II Gas amount: 0.03 μg / cm 2 Photosensitive coloring composition of Comparative Example 2 Target substance: Nitrogen-containing aromatic compound-III Gas amount: Not detected (0.01 μg / cm 2 less than)

[0430] In Examples 1 and 2, nitrogen-containing aromatic compounds I and II, which correspond to the (e) nitrogen-containing aromatic compound of the present invention, produced a large amount of gas during firing, and Table 2 shows that the roughness of the electrode surface was low. This is presumably because the (e) nitrogen-containing aromatic compound sublimated during firing was able to adequately protect the electrode surface. On the other hand, in Comparative Example 2, no components derived from the (e) nitrogen-containing aromatic compound were detected, and it is therefore expected that the electrode surface could not be protected and roughness occurred. Since Example 1 had a larger gas amount and less roughening of the electrode surface than Example 2, it is more preferable to use a larger amount of (e) nitrogen-containing aromatic compound gas.

Claims

1. A photosensitive coloring composition comprising (a) a colorant, (b) an alkali-soluble resin, (c) a photopolymerization initiator, (d) an ethylenically unsaturated compound, (e) a nitrogen-containing aromatic compound, and (f) a dispersant, The (e) nitrogen-containing aromatic compound includes a compound represented by the following general formula (1) and / or the following general formula (2), A photosensitive coloring composition characterized in that the content ratio of the nitrogen-containing aromatic compound (e) is 0.5 mass % or more and 2 mass % or less based on the total solid content mass of the photosensitive coloring composition. 【Chemistry 1】 (In formula (1), X represents -CH= or -N=, and R １ represents an alkyl group, a carboxy group, or a nitro group; R ２ represents a hydroxyl group or a hydrogen atom, and l represents an integer of 0 to 4. 【Chemistry 2】 (In formula (2), R ３ , R ４ each independently represents an alkyl group, and m and n each independently represent an integer of 0 to 4.

2. The photosensitive coloring composition according to claim 1, wherein the nitrogen-containing aromatic compound (e) comprises a compound represented by the general formula (1).

3. The photosensitive coloring composition according to claim 2 , wherein the nitrogen-containing aromatic compound (e) comprises benzotriazole.

4. A photosensitive coloring composition according to any one of claims 1 to 3, wherein in a coating film having a thickness of 2.0 μm obtained by curing the photosensitive resin composition, the toluene-equivalent amount of the (e) nitrogen-containing aromatic compound component detected by thermal evolved gas analysis is 0.01 to 0.50 μg / cm 2.

5. A photosensitive coloring composition comprising (a) a colorant, (b) an alkali-soluble resin, (c) a photopolymerization initiator, (d) an ethylenically unsaturated compound, (e) a nitrogen-containing aromatic compound, and (f) a dispersant, In a coating film having a thickness of 2.0 μm obtained by curing the photosensitive resin composition, the amount of the nitrogen-containing aromatic compound component (e) converted into toluene, as detected by a thermal evolved gas analysis method, is 0.01 to 0.50 μg / cm ２ and A photosensitive coloring composition, characterized in that the content ratio of the nitrogen-containing aromatic compound (e) is 0.5 mass % or more and 2 mass % or less relative to the total solid content mass of the photosensitive coloring composition.

6. The (a) colorant is selected from the group consisting of at least one red pigment and an orange pigment, and at least one selected from the group consisting of a blue pigment and a purple pigment. The photosensitive coloring composition according to any one of claims 1 to 5.

7. The photosensitive coloring composition according to any one of claims 1 to 6, wherein the colorant (a) comprises an organic black pigment.

8. The photosensitive coloring composition according to claim 7, wherein the organic black pigment comprises at least one selected from the group consisting of a compound represented by the following general formula (a1), a geometric isomer thereof, a salt thereof, and a salt of the geometric isomer thereof: 【Transformation 3】 (In formula (a1), R 11 and R 16 are each independently a hydrogen atom, CH 3 , C.F. 3 , a fluorine atom or a chlorine atom; R 12 , R 13 , R 14 , R 15 , R 17 , R 18 , R 19 and R 20 are each independently a hydrogen atom, a halogen atom, R 21 , COOH, COOR 21 , COO - , C.O.N.H. 2 , CONHR 21 , C.O.R. 21 R 22 , CN, OH, OR 21 , COCR 21 , OOCNH 2 , OOCNHR 21 , OOCNR 21 R 22 , NO 2 , N.H. 2 , N.H.R. 21 , N.R. 21 R 22 , NHCOR 22 , N.R. 21 COR 22 , N=CH 2 , N=CHR 21 , N=CR 21 R 22 , S.H., S.R. 21 , SOR 21 , S.O. 2 R 21 , S.O. 3 R 21 , S.O. 3 H, SO 3 - , S.O. 2 NH 2 , S.O. 2 NHR 21 or SO 2 NR 21 R 22 represents; R 12 and R 13 , R 13 and R 14 , R 14 and R 15 , R 17 and R 18 , R 18 and R 19 , and R 19 and R 20 may be directly bonded to each other or may be bonded to an oxygen atom, a sulfur atom, an NH or an NR 21 may be joined together by bridges; R 21 and R 22 each independently represents an alkyl group having 1 to 12 carbon atoms, a cycloalkyl group having 3 to 12 carbon atoms, an alkenyl group having 2 to 12 carbon atoms, a cycloalkenyl group having 3 to 12 carbon atoms, or an alkynyl group having 2 to 12 carbon atoms.

9. The photosensitive coloring composition according to any one of claims 1 to 8, wherein the content of the (a) colorant is 10 mass% or more relative to the total solid content of the photosensitive coloring composition.

10. The photosensitive coloring composition according to any one of claims 1 to 9, wherein the optical density of the cured coating film per 1 µm of film thickness is 0.5 or more.

11. The photosensitive coloring composition according to any one of claims 1 to 10, which is used for forming a partition wall of an organic electroluminescent device.

12. A cured product obtained by curing the photosensitive coloring composition according to any one of claims 1 to 11.

13. A partition wall obtained by curing the photosensitive coloring composition according to any one of claims 1 to 11.

14. An organic electroluminescent device comprising the cured product according to claim 12.

15. An image display device comprising the organic electroluminescent device according to claim 14.

Images