Exposure method, exposure apparatus, measurement method, program, and article manufacturing method

Abstract

To provide a technique advantageous for shortening a time necessary for focus control to improve a through-put.SOLUTION: An exposure method for performing focus control on the basis of data transferred from a detector having a light receiving range for receiving measurement light applied to a substrate by oblique incidence and reflected by the substrate includes: a step of transferring first data detected in a first range within the light receiving range from the detector to a treatment part in a first exposure treatment for exposing a first substrate, and causing the treatment part to compute a height of the first substrate on the basis of the first data; a step of determining a second range narrower than the first range within the light receiving range on the basis of the height of the first substrate; a step of transferring second data detected in the second range within the light receiving range for a second exposure treatment for exposing the second substrate from the detector to the treatment part, and causing the treatment part to compute a height of the second substrate on the basis of the second data; a step of performing focus control on the basis of the height of the second substrate, and exposing the second substrate.SELECTED DRAWING: Figure 4

Description

[Technical Field]

[0001] The present invention relates to an exposure method, an exposure apparatus, a measurement method, a program, and an article manufacturing method. [Background technology]

[0002] In an exposure apparatus that transfers a pattern from an original onto a substrate, measurement light is irradiated onto the substrate at an oblique incidence, and focus control can be performed based on the position at which the measurement light reflected by the substrate enters the light-receiving area of ​​a detector. Patent Document 1 describes a method of detecting the wafer position, including rough detection, and then correcting the wafer surface position to the vicinity of the exposure image plane based on the detection result. Then, focus measurement for each shot is performed by limiting the focus detection area to a range corresponding to a position near the exposure image plane. Limiting the focus detection area in this way reduces the calculation load and the time required for focus control. [Prior art documents] [Patent documents]

[0003] [Patent Document 1] Japanese Patent Application Publication No. 10-284393 Summary of the Invention [Problem to be solved by the invention]

[0004] In a configuration in which focus control is performed using data transferred from a detector that receives measurement light to a processing unit, the time required to transfer data from the detector to the processing unit cannot be ignored, which prevents the time required for focus control from being reduced.

[0005] The present invention provides an advantageous technique for shortening the time required for focus control and improving throughput. [Means for solving the problem]

[0006] One aspect of the present invention relates to an exposure method that performs focus control based on data transferred from a detector having a light-receiving range that receives measurement light that is irradiated at an oblique incidence onto a substrate and reflected by the substrate, and the exposure method includes: in a first exposure process that exposes a first substrate, a step of transferring first data detected in a first range of the light-receiving range from the detector to a processing unit, and the processing unit determining the height of the first substrate based on the first data; a step of determining a second range of the light-receiving range that is narrower than the first range based on the height of the first substrate; and for a second exposure process that exposes a second substrate, a step of transferring second data detected in the second range of the light-receiving range from the detector to the processing unit, and the processing unit determining the height of the second substrate based on the second data; and a step of performing focus control based on the height of the second substrate and exposing the second substrate. [Effects of the Invention]

[0007] According to the present invention, an advantageous technique is provided for shortening the time required for focus control and improving throughput. [Brief explanation of the drawings]

[0008] [Figure 1] FIG. 1 is a diagram showing the configuration of an exposure apparatus according to a first embodiment. [Figure 2] FIG. 4 is a diagram illustrating data transferred from a detector to a processing unit. [Figure 3] 10A and 10B are diagrams comparing the time required for focus measurement in a comparative example and the present embodiment. [Figure 4] 3A to 3C are diagrams for explaining an exposure method according to the first embodiment. [Figure 5] FIG. 2 is a diagram showing a schematic example of signal exchange between a detector, a processing unit, and a control unit. [Figure 6] FIG. 4 is a diagram illustrating an example of the amount of data transferred from a detector to a processing unit. [Figure 7] FIG. 10 is a diagram illustrating data transferred from a detector to a processing unit. [Figure 8] 8A to 8C are diagrams for explaining an exposure method according to a second embodiment. [Figure 9]FIG. 10 is a diagram illustrating data transferred from a detector to a processing unit. [Figure 10] FIG. 10 is a diagram illustrating data transferred from a detector to a processing unit. [Figure 11] 10A to 10C are diagrams for explaining an exposure method according to a third embodiment. [Figure 12] FIG. 10 is a diagram illustrating the operation of the third embodiment. DETAILED DESCRIPTION OF THE INVENTION

[0009] Hereinafter, embodiments will be described in detail with reference to the accompanying drawings. Note that the following embodiments do not limit the scope of the invention claimed. Although multiple features are described in the embodiments, not all of these multiple features are necessarily essential to the invention, and multiple features may be combined arbitrarily. Furthermore, in the accompanying drawings, the same reference numerals are used to designate the same or similar components, and redundant explanations will be omitted. First Embodiment An exposure apparatus, exposure method, and measurement method according to a first embodiment will be described. FIG. 1 shows the configuration of an exposure apparatus 100 according to the first embodiment. The exposure apparatus 100 can execute the exposure method or measurement method according to the first embodiment. However, the measurement method may also be applied to other devices, such as lithography apparatuses or microscopes, other than exposure apparatuses. The exposure apparatus 100 can be configured to transfer a pattern (e.g., a circuit pattern) of an original 1 onto a substrate 5 using, for example, a step-and-repeat or step-and-scan method. In this specification and the accompanying drawings, directions are described by referring to the direction parallel to the optical axis direction (typically the vertical direction) of the projection optical system 4 included in the exposure apparatus 100 as the Z axis, the scanning direction during exposure in a plane perpendicular to the Z axis as the Y axis, and the non-scanning direction perpendicular to the Y axis as the X axis.

[0010] The exposure apparatus 100 may include, for example, an illumination system 3, an original stage 2, a projection optical system 4, a substrate stage 7, a measurement device 22, and a control unit 23. The illumination system 3 illuminates the original 1 with light (e.g., laser light or UV light) during exposure of the substrate 5. The original stage 2 holds the original 1. The projection optical system 4 projects the pattern of the original 1 onto the substrate 5, thereby exposing the substrate 5. The substrate stage 7 has a chuck 6 that holds the substrate 5 and can be driven by a driving mechanism (not shown), for example, in directions parallel to the X-axis, Y-axis, and Z-axis, and for rotation about each of these axes. The position and rotation of the substrate stage 7 can be determined using, for example, a laser interferometer 9 and a mirror 8 installed on the substrate stage 7, and the control unit 23 can position the substrate stage 7 with high precision. The substrate stage 7 may be positioned in the Z-axis direction using a micro linear encoder.

[0011] The measurement device 22 may be configured to detect the surface position (height position in the Z-axis direction) of the substrate 5 placed on the chuck 6 of the substrate stage 7. The measurement device 22 may include a light source 10, a light projection system 19, a light receiving system 13, a detector 14, and a processing unit 15. The light source 10 may generate light having a wavelength in the range of 500 to 1200 nm, for example. The light projection system 19 may include, for example, a condenser lens (not shown), a light blocking member 11 having an opening (such as a slit), and a projection lens 12. The projection system 19 may project or irradiate the measurement light 16, which is light from the light source 10 condensed by the condenser lens, onto the surface of the substrate 5 via the light blocking member 11 and the projection lens 12. The measurement light 16 may be irradiated obliquely toward the surface of the substrate 5 at an incident angle θ. The light receiving system 13 may guide the measurement light 17 reflected by the substrate 5 to the detector 14. In this specification and FIG. 1, the measurement light irradiated onto the substrate 5 is referred to as measurement light 16, and the measurement light reflected by the substrate 5 is referred to as measurement light 17, but this is merely a convenient way of expressing them. The detector 14 may include, for example, a line sensor or an image sensor having a predetermined light-receiving range (detection range). The line sensor or image sensor may be a CCD sensor or a MOS sensor. The detector 14 detects the measurement light 17 and transfers data detected within a specified range of the light-receiving range to the processing unit 15. The processing unit 15 calculates the surface position based on the data transferred from the detector 14.

[0012] The control unit 23 can control each of the above-mentioned components of the exposure apparatus 100. Alternatively, the control unit 23 may be understood as a component that controls the operation of the exposure apparatus. The control unit 23 may be configured, for example, by a PLD (Programmable Logic Device) such as an FPGA (Field Programmable Gate Array), an ASIC (Application Specific Integrated Circuit), a general-purpose or dedicated computer with a program installed, or a combination of all or part of these. Such programs and memory media storing them may also be recognized as inventions. In this example, a processing unit 15 is provided in addition to the control unit 23, but the processing unit 15 may be considered part of the control unit 23. The control unit 23 may be configured to be integrated with other parts of the exposure apparatus 100, or may be configured to be separate from other parts of the exposure apparatus 100.

[0013] Next, a measurement method performed by the measurement device 22 will be described. In one example, light from the light source 10 may be split into multiple beams by an opening in the light-shielding member 11 to form the measurement light 16. The measurement light 17 (multiple beams) reflected by the substrate 5 may enter the light-receiving area of ​​the detector 14 through the light-receiving system 13. The measurement light 17 detected in the detection area of ​​the detector 14 may have multiple peaks corresponding to the multiple beams, as illustrated in FIG. 2 . The processing unit 15 determines the positions of the multiple peaks and converts each position into a focus measurement value. The focus measurement value may include information indicating the height of (the surface of) the substrate 5 and / or information indicating the tilt of (the surface of) the substrate 5. The processing unit 15 processes data representing the multiple peaks detected by the detector 14 according to a predetermined algorithm to obtain the focus measurement value. Note that the measurement and control related to height described below may also include measurement and control related to tilt.

[0014] The number of pixels in the measurement direction of the detector 14 is N [pixels], and the data transfer rate from the detector 14 to the processing unit 15 is P [Hz]. The acquisition time T (seconds), which is the time required for the processing unit 15 to receive all of the data transferred from the detector 14, is expressed by equation (1).

[0015] T = N / P (1) The acquisition time T defined by equation (1) becomes longer as the amount of data to be transferred (the number of pixels of the data to be transferred) increases, and also becomes longer as the transfer rate decreases. Here, the transfer rate is determined by the hardware, and using a high-performance detector 14 to achieve a high transfer rate increases the cost of the measurement device 22 or exposure apparatus 100. However, the amount of data to be transferred (the number of pixels of the data to be transferred) can be reduced if the range of the light-receiving range to which data is to be transferred is limited to the area where measurement light 16 necessary for calculating the focus measurement value is incident.

[0016] Next, we will explain substrate processing in semiconductor manufacturing facilities. In semiconductor manufacturing facilities, a lot consisting of multiple substrates can be treated as a processing unit. Multiple substrates in the same lot undergo similar manufacturing processes, so their topography can be roughly the same. By utilizing this, it is possible to limit the area where measurement light 16 is projected onto detector 14.

[0017] In the following description, a lot consists of multiple substrates, with the first substrate being, for example, the first substrate in the lot, and the second substrate being, for example, the substrate next to the first substrate or any subsequent substrate. A lot may include a first group consisting of at least two substrates including the first substrate, and a second group consisting of at least two substrates following the last substrate in the first group. In this case, the at least two substrates in the first group may be understood as the first substrates, and the at least two substrates in the second group may be understood as the second substrates.

[0018] Also, in the following description, one substrate may have multiple shot areas. The first shot area may be, for example, the shot area that is exposed first on the substrate. The second shot area may be, for example, the shot area that is exposed next to the first shot area or a shot area that is exposed thereafter. The multiple shot areas on one substrate may include a first group consisting of at least two shot areas including the shot area that is exposed first, and a second group consisting of at least two shot areas that are exposed after the exposure of the last shot area in the first group. In this case, the at least two shot areas that make up the first group may be understood as the first shot areas, and the at least two shot areas that make up the second group may be understood as the second shot areas.

[0019] When shot areas of different substrates are expressed by the same name, such as a first shot area of ​​a first substrate and a first shot area of ​​a second substrate, those shot areas are shot areas that are in the same relative position on the substrate. For example, the relative position of the first shot area of ​​the first substrate on the first substrate is the same as the relative position of the first shot area of ​​the second substrate on the second substrate.

[0020] Furthermore, "data" accompanied by an ordinal number, such as first data, second data, etc., is identified by the ordinal number, but the ordinal number does not have any special meaning such as order, and when there is no need to distinguish between them, they can simply be expressed as "data."

[0021] FIG. 4 shows the exposure method of this embodiment. The exposure method shown in FIG. 4 is executed in exposure apparatus 100 under control of control unit 23. In the exposure method of this embodiment, control unit 23 performs focus control based on data transferred from detector 14, which has a light-receiving area that receives measurement light that is irradiated at oblique incidence onto the substrate and reflected by the substrate. In step S401, control unit 23 determines whether the substrate to be exposed is the first substrate that constitutes a lot, and if it is the first substrate, it may execute steps S402 to S406, or if not (i.e., if it is the second substrate), it may execute steps S407 to S410. Steps S402 to S406 may be a first exposure process for exposing the first substrate, and steps S407 to S410 may be a second exposure process for exposing the second substrate.

[0022] In step S402, the control unit 23 may cause the detector 14 to detect the measurement light 17 in order to measure the height of the first substrate (in other words, to perform focus control of the first substrate). This may be an operation of accumulating charges generated by photoelectric conversion of the measurement light 17 incident on the light-receiving range of the detector 14 in each pixel of the detector 14. In step S403, the control unit 23 may cause the detector 14 to transfer first data detected in a first range of the light-receiving range of the detector 14 to the processing unit 15. Here, the first range may or may not be the same as the light-receiving range of the detector 14. In step S404, the processing unit 15 may calculate the height of the first substrate based on the first data, and the control unit 23 may acquire the height of the first substrate calculated by the processing unit 15. In step S405, the control unit 23 may determine a second range of the light-receiving range of the detector 14 that is narrower than the first range, based on the height of the first substrate. In step S406, the control unit 23 can perform focus control based on the height of the first substrate, and control the operation of exposing the first substrate.

[0023] In step S407, the control unit 23 may cause the detector 14 to detect the measurement light 17 in order to measure the height of the second substrate (in other words, to perform focus control of the second substrate). This may be an operation of accumulating, in each pixel of the detector 14, electric charges generated by photoelectric conversion of the measurement light 17 incident on the light-receiving range of the detector 14. In step S408, the control unit 23 may cause the detector 14 to transfer second data detected in a second range of the light-receiving range of the detector 14 to the processing unit 15. Here, the second range is the range determined in step S405. In step S409, the processing unit 15 may calculate the height of the second substrate based on the second data, and the control unit 23 may acquire the height of the second substrate calculated by the processing unit 15. In step S410, the control unit 23 may perform focus control based on the height of the second substrate and control the operation of exposing the second substrate.

[0024] The above step S405, i.e., the step of determining the second range, may include the step of determining the end of the data transferred from the detector 14 to the processing unit 15. The step of determining the second range may also include the step of determining the beginning of the data transferred from the detector 14 to the processing unit 15.

[0025] Each substrate constituting a lot may have multiple shot areas. Thus, steps S402 to S406 may be performed for each of the multiple shot areas on the first substrate, and steps S407 to S410 may be performed for each of the multiple shot areas on the second substrate. More specifically, the multiple shot areas on the first substrate may be sequentially exposed by performing steps S402 to S406 for one shot area on the first substrate, and then performing steps S402 to S406 for the next shot area on the first substrate. Similarly, the multiple shot areas on the second substrate may be sequentially exposed by performing steps S407 to S410 for one shot area on the second substrate, and then performing steps S407 to S410 for the next shot area on the second substrate.

[0026] In the process of exposing the first shot area of ​​the first substrate, in order to determine the height of the first shot area of ​​the first substrate, in step S403, the control unit 23 may cause the detector 14 to transfer third data detected in a first range of the light-receiving range of the detector 14 to the processing unit 15. In the subsequent step S404, the processing unit 15 may determine the height of the first shot area of ​​the first substrate based on the third data, and in step S405, the control unit 23 may determine a second range based on the height of the first shot area. Here, the control unit 23 may determine the second range based on the heights of the multiple first shot areas, assuming that multiple shot areas are the first shot area. In step S406, the control unit 23 may perform focus control based on the height of the first shot area of ​​the first substrate, and expose the first shot area.

[0027] The second range determined based on the height of at least one first shot area on the first substrate may be used to measure the height of the second shot area for exposing the second shot area on the first substrate. Specifically, in the process of exposing the second shot area on the first substrate, in order to determine the height of the second shot area on the first substrate, in step S403, the control unit 23 may transfer fourth data detected in a second range of the light-receiving range of the detector 14 from the detector 14 to the processing unit 15. In this case, in step S404, the processing unit 15 may determine the height of the second shot area based on the fourth data, and in step S406, the control unit 23 may perform focus control based on the height of the second shot area on the first substrate and expose the second shot area. In such control, step S405 may be omitted or may be performed to fine-tune the already determined second range.

[0028] The second range in the light-receiving range may be determined for each shot area. For example, a second range used when measuring the height of the first shot area of ​​the second substrate may be determined based on the height of the first shot area of ​​the first substrate. Specifically, in the process of exposing the first shot area of ​​the first substrate, in order to determine the height of the first shot area of ​​the first substrate, the control unit 23 may cause the detector 14 to transfer third data detected in the first range of the light-receiving range of the detector 14 to the processing unit 15 in step S403. In the subsequent step S404, the processing unit 15 may determine the height of the first shot area of ​​the first substrate based on the third data, and in step S405, the control unit 23 may determine the second range based on the height of the first shot area of ​​the first substrate. Then, in the process of exposing the second substrate, the control unit 23 may cause the detector 14 to transfer fifth data for the first shot area of ​​the second substrate, detected in the second range determined based on the height of the first shot area of ​​the first substrate, to the processing unit 15 in step S408. In this case, in step S409, the processing unit 15 obtains the height of the first shot area of ​​the second substrate based on the fifth data.

[0029] Furthermore, a second range for measuring the height of the first shot region of the second substrate may be determined based on the height of the first shot region of the first substrate, and a second range for measuring the height of the second shot region of the second substrate may be determined based on the height of the second shot region of the first substrate. Specifically, in the process of exposing the first shot region of the first substrate, in order to determine the height of the first shot region of the first substrate, the control unit 23 may cause the detector 14 to transfer sixth data detected in a first range of the light-receiving range of the detector 14 to the processing unit 15 in step S403. In the subsequent step S404, the processing unit 15 may determine the height of the first shot region of the first substrate based on the sixth data, and in step S405, the control unit 23 may determine the second range based on the height of the first shot region of the first substrate. Then, in the process of exposing the second substrate, the control unit 23 may cause the detector 14 to transfer seventh data for the first shot region of the second substrate, detected in the second range determined based on the height of the first shot region of the first substrate, to the processing unit 15 in step S408. In this case, in step S409, the processing unit 15 determines the height of the first shot area of ​​the second substrate based on the seventh data. Furthermore, in the process of exposing the second shot area of ​​the first substrate, in order to determine the height of the second shot area of ​​the first substrate, the control unit 23 may cause the detector 14 to transfer seventh data detected in a first range of the light-receiving range of the detector 14 to the processing unit 15 in step S403. In the subsequent step S404, the processing unit 15 may determine the height of the second shot area of ​​the first substrate based on the seventh data, and in step S405, the control unit 23 may determine the second range based on the height of the second shot area of ​​the first substrate. Then, in the process of exposing the second substrate, the control unit 23 may cause the detector 14 to transfer eighth data detected in the second range determined based on the height of the second shot area of ​​the first substrate to the processing unit 15 in step S408. In this case, in step S409, the processing unit 15 determines the height of the second shot area of ​​the second substrate based on the eighth data.

[0030] A method for determining the second range in the light receiving range will be described with reference to FIG. 2. FIG. 2 illustrates data transferred from the detector 14 to the processing unit 15. The horizontal axis indicates the pixel (number or position), and the vertical axis indicates the data transferred from the detector 14 to the processing unit 15 (output of the detector 14). In one example, the peak waveform width G illustrated in FIG. 2, the center position C of the peak latest output from the detector 14 among the multiple peaks, and the allowable movement amount F of the peak position due to fluctuations in the topography of the substrate can be taken into consideration. The peak waveform width G may be, for example, the waveform width of any one of the multiple peaks, or may be the average value of the waveform widths of at least two peaks. In one example, the start position of the second range is the beginning position of the data transferred from the detector 14 to the processing unit 15, and the end position of the second range is position D shown below.

[0031] D=C+G / 2+F[pixels] Setting the end position of the second range to position D is an example of determining the end position of the second range so that there is a difference between the end position of the second range and the end position of the first range. By determining the end position of the second range so that there is a difference between the end position of the second range and the end position of the first range, the time required to transfer data from the detector 14 to the processing unit 15 can be shortened.

[0032] The difference in the time required for focus measurement between this embodiment and the comparative example will be described with reference to FIG. 3. T1 is the timing when charge accumulation by photoelectric conversion in the detector 14 begins. T2 (the timing corresponding to the aforementioned position A) is the timing when charge accumulation in the detector 14 ends. The period T1-T2 is the charge accumulation period in the detector 14. T3 (the timing corresponding to the aforementioned position B) is the timing when the detector 14 ends the process of transferring data corresponding to signals accumulated during the charge accumulation period to the processing unit 15 in the comparative example. The period T2-T3 is the transfer time required for the detector 14 to transfer data corresponding to signals accumulated during the charge accumulation period to the processing unit 15 in the comparative example. This embodiment aims to shorten this transfer time. T4 (the timing corresponding to the aforementioned position D) is the timing when the detector 14 ends the process of transferring data corresponding to signals from pixels in a second range of the detection range of the detector 14 to the processing unit 15 in this embodiment. In this embodiment, the transfer time for exposure of one shot area is shortened by the period T4-T3 compared to the comparative example, thereby improving throughput.

[0033] 5 schematically illustrates an example of signal exchange between the detector 14, the processing unit 15, and the control unit 23. In one example, the detector 14 is configured as a CCD sensor, and the processing unit 15 can control charge transfer in the detector 14 and transfer of data PD from the detector 14 to the processing unit 15 by supplying shift pulses SP to the detector 14. The detector 14 can transfer data PD of a number of pixels corresponding to the number of shift pulses SP supplied from the processing unit 15 to the processing unit 15. The control unit 23 can determine the number of pulses corresponding to each of the first and second ranges, and control the processing unit 15 to supply shift pulses SP of that number to the detector 14. Alternatively, the shift pulses SP may be provided to the detector 14 from the control unit 23.

[0034] 6(a) shows an example in which the number of pulses of the shift pulse PS is controlled so that data in a first range is transferred from the detector 14 to the processing unit 15. FIG. 6(b) shows an example in which the number of pulses of the shift pulse PS is controlled so that data in a second range is transferred from the detector 14 to the processing unit 15. Second Embodiment A second embodiment will be described below. Matters not mentioned in the second embodiment may follow the first embodiment. FIG. 7 illustrates data transferred from the detector 14 to the processing unit 15. The horizontal axis indicates the pixel (number or position), and the vertical axis indicates the data transferred from the detector 14 to the processing unit 15 (the output of the detector 14). In the second embodiment, the mounting position of the detector 14 or the light-receiving system 13 may be adjusted so that information indicating the substrate height (peak) appears near the beginning of the data transferred from the detector 14 to the processing unit 15. The mounting position of the detector 14 or the light-receiving system 13 may be automatically adjusted so that information indicating the substrate height (peak) appears near the beginning of the data transferred from the detector 14 to the processing unit 15. Such adjustment means reducing the number of pixels F from the beginning of the data transferred from the detector 14 to the processing unit 15 to the base of the first peak in FIG. 7. However, it is difficult to set the number of pixels F to 0. Therefore, the number of pixels F may be determined by taking into account, for example, the amount of focus fluctuation (topography) within the substrate surface and the width of the peak waveform. If the fluctuation width of the first peak, which depends on the topography within the substrate surface, is within the range of pixel number F, the attachment position of detector 14 or light receiving system 13 can be adjusted so that the peak appears after the position of pixel number F from the first pixel of detector 14. The first range can be the range from A to B, and the second range can be the range from A to D. This can speed up focus measurement and focus control after the second range is determined.

[0035] However, narrowing the second range may increase the possibility that the required peak will not fall within the second range. Therefore, in the second embodiment, the exposure method may be improved as follows. FIG. 8 shows the exposure method of the second embodiment. The exposure method shown in FIG. 8 is executed in exposure apparatus 100 under the control of controller 23. The exposure method shown in FIG. 8 adds steps S801 to S811 to the exposure method shown in FIG. 4. Note that in the exposure method shown in FIG. 8, the process branches in step S401 depending on whether the substrate to be exposed is the first substrate or the second substrate, but it is also possible to determine the second range in advance and execute the processes from step S407 onwards for all substrates.

[0036] Step S801 may be executed between step S408 and step S409. In step S801, the control unit 23 may determine whether the height of the substrate (or shot area) can be calculated based on the data of the second range transferred from the detector 14 to the processing unit 15 in step S408. For example, if the transferred data of the second range includes a predetermined number of peaks, the control unit 23 may determine that the height of the second substrate (or shot area) can be calculated. If the control unit 23 determines that the height of the second substrate (or shot area) can be calculated, it may execute steps S409 and S410 in the same manner as in the first embodiment.

[0037] On the other hand, if the control unit 23 determines that the height of the substrate (or shot area) cannot be calculated, it may execute the processes from step S802 onward. In step S802, the control unit 23 may cause the detector 14 to detect the measurement light 17 in order to measure the height of the second substrate (in other words, to perform focus control for the second substrate). This may be an operation in which charges generated by photoelectric conversion of the measurement light 17 incident on the light-receiving range of the detector 14 are accumulated in each pixel of the detector 14. In step S803, the control unit 23 may cause the detector 14 to transfer data detected in a third range of the light-receiving range of the detector 14 that is wider than the second range to the processing unit 15. Here, the third range may be the same as the first range, or may not be the same. In other words, in the second embodiment, if the height of the second substrate cannot be calculated based on the data in the second range, the control unit 23 changes the setting so that data in a range of the light-receiving range that is wider than the second range is transferred from the detector 14 to the processing unit 15. Thereafter, the control unit 23 executes the process of calculating the height of the second substrate again.

[0038] In step S804, the control unit 23 may determine whether the height of the substrate (or shot area) can be calculated based on the data of the first range transferred from the detector 14 to the processing unit 15 in step S803. For example, if the transferred data of the first range includes a predetermined number of peaks, the control unit 23 may determine that the height of the second substrate (or shot area) can be calculated. If the control unit 23 determines that the height of the substrate (or shot area) can be calculated, the control unit 23 may execute steps S805 and S806. On the other hand, if the control unit 23 determines that the height of the second substrate (or shot area) cannot be calculated, the control unit 23 may execute the processing of step S807 and subsequent steps.

[0039] In step S805, the control unit 23 can cause the processing unit 15 to determine the height of the second substrate based on the data transferred from the detector 14 in step S803, and can acquire the height of the second substrate determined by the processing unit 15. In step S806, the control unit 23 can perform focus control based on the height of the second substrate, and control the operation of exposing the second substrate.

[0040] In step S807, the control unit 23 can move the substrate stage 7 using a drive mechanism (not shown) so that the height of the second substrate can be measured using the detector 14. For example, the data obtained in step S803 may have a peak near the end of the detection range of the detector 14, as illustrated in FIG. 9. In this case, the control unit 23 can move the substrate stage 7 using a drive mechanism (not shown) so that the peak moves toward the beginning of the detection range and falls within the detection range (third range) of the detector 14. Conversely, the data obtained in step S803 may have a peak near the beginning of the detection range of the detector 14, as illustrated in FIG. 10. In this case, the control unit 23 can move the substrate stage 7 using a drive mechanism (not shown) so that the peak moves toward the end of the detection range and falls within the detection range (first range) of the detector 14.

[0041] In step S808, the control unit 23 may cause the detector 14 to detect the measurement light 17 to measure the height of the second substrate (in other words, to perform focus control for the second substrate). This is an operation of accumulating charges generated by photoelectric conversion of the measurement light 17 incident on the light-receiving range of the detector 14 in each pixel of the detector 14. In step S809, the control unit 23 may cause the detector 14 to transfer second data detected in a third range of the light-receiving range of the detector 14 to the processing unit 15. In step S810, the processing unit 15 may calculate the height of the second substrate based on the second data, and the control unit 23 may acquire the height of the second substrate calculated by the processing unit 15. In step S811, the control unit 23 may perform focus control based on the height of the second substrate and control the operation of exposing the second substrate. That is, in the second embodiment, if the height of the second substrate cannot be calculated based on the data in the second range, the control unit 23 changes the height of the second substrate by changing the height of the substrate stage 7, and then executes the step of calculating the heights of the first two substrates again. Third Embodiment The third embodiment will be described below. Matters not mentioned in the third embodiment may follow the first or second embodiment. FIG. 11 shows an exposure method of the third embodiment. FIG. 12 shows the operation of the third embodiment. The exposure method shown in FIG. 11 is executed in exposure apparatus 100 under control of controller 23. In the exposure method shown in FIG. 11, step S405 in the exposure method shown in FIG. 4 is changed to step S405', and step S450 is added. Note that in the exposure method shown in FIG. 11, the process branches in step S401 depending on whether the substrate to be exposed is the first substrate or the second substrate. However, the second range and the drive amount of the substrate stage 7 may be determined in advance, and the processes from step S450 onwards may be executed for all substrates.

[0042] In the third embodiment, in step S405', the control unit 23 can determine a second range, which is narrower than the first range, within the light receiving range of the detector 14, based on the height of the first substrate. Also, in step S405', the control unit 23 can determine the drive amount of the substrate stage 7 for moving the substrate stage 7 so that information (peak) indicating the height of the substrate appears near the beginning of the data transferred from the detector 14 to the processing unit 15, as exemplified in FIG.

[0043] In the process for exposing the second substrate, in step S450, the control unit 23 causes the drive mechanism (not shown) to drive the substrate stage 7 according to the drive amount determined in step S405'. According to this method, the second range can be made narrower than in the first embodiment, thereby shortening the time required for focus measurement or focus control and improving throughput. <Product manufacturing method> An article manufacturing method for manufacturing an article using the above-described exposure apparatus will be described below. The article manufacturing method may include an exposure step of exposing a substrate using the exposure apparatus, a development step of developing the substrate that has undergone the exposure step, and a step of obtaining an article from the substrate that has undergone the development step. A photosensitive material (photoresist) is coated on the substrate provided to the exposure apparatus. The exposure step transfers the pattern of the master to the photosensitive material as a latent image pattern. In the development step, this latent image pattern is converted into a physical device pattern. The step of obtaining an article from the substrate that has undergone the development step may include, for example, a step of patterning an underlying layer using the device pattern. The step of obtaining an article from the substrate that has undergone the development step may also include a step of dicing the substrate.

[0044] The disclosure of this specification includes the following exposure method, exposure apparatus, measurement method, program, and article manufacturing method. (Item 1) 1. An exposure method for performing focus control based on data transferred from a detector having a light-receiving range that receives measurement light that is irradiated onto a substrate at oblique incidence and reflected by the substrate, comprising: a step of transferring first data detected in a first range of the light receiving range from the detector to a processing unit in a first exposure process of exposing a first substrate, and the processing unit determining a height of the first substrate based on the first data; determining a second range of the light receiving range that is narrower than the first range based on the height of the first substrate; a step of transferring second data detected in the second range from the detector to the processing unit for a second exposure process of exposing a second substrate, and the processing unit determining the height of the second substrate based on the second data; performing focus control based on the height of the second substrate and exposing the second substrate; An exposure method comprising: (Item 2) determining the second range includes determining the end of data transferred from the detector to the processing unit; 2. The exposure method according to item 1, (Item 3) the step of determining the height of the first substrate includes a step of transferring third data detected in the first range of the light receiving range from the detector to the processing unit in a process of exposing a first shot area of ​​the first substrate, and the processing unit determining the height of the first shot area of ​​the first substrate based on the third data; determining the second range includes determining the second range based on a height of the first shot area. 2. The exposure method according to item 1, (Item 4) The first exposure process for exposing the first substrate includes: transferring fourth data detected in the second range from the detector to the processing unit in order to expose a second shot area of ​​the first substrate, and the processing unit determining a height of the second shot area based on the fourth data; performing focus control based on the height of the second shot area and exposing the second shot area of ​​the first substrate; 4. The exposure method according to item 3, comprising: (Item 5) the step of determining the height of the second substrate includes a step of transferring fifth data detected in the second range for the first shot area of ​​the second substrate from the detector to the processing unit, and the processing unit determining the height of the first shot area of ​​the second substrate based on the fifth data; the step of exposing the second substrate includes a step of performing focus control based on a height of the first shot area of ​​the second substrate and exposing the first shot area of ​​the second substrate. 4. The exposure method according to item 3, (Item 6) The step of determining the height of the first substrate includes: a step of transferring sixth data detected in the first range of the light receiving range from the detector to the processing unit in a first exposure process of exposing a first shot area of ​​the first substrate, and the processing unit determining a height of the first shot area of ​​the first substrate based on the sixth data; in a process of exposing a second shot area of ​​the first substrate, transferring seventh data detected in the first range of the light receiving range from the detector to the processing unit, and the processing unit determining a height of the second shot area of ​​the first substrate based on the seventh data, The step of determining the second range includes: determining the second range for the first shot area of ​​the second substrate based on a height of the first shot area of ​​the first substrate; determining the second range for the second shot area of ​​the second substrate based on a height of the second shot area of ​​the first substrate; 2. The exposure method according to item 1, (Item 7) The step of determining the height of the second substrate includes: transferring eighth data detected in the second range for the first shot area of ​​the second substrate from the detector to the processing unit, and the processing unit determining a height of the first shot area of ​​the second substrate based on the eighth data; transferring ninth data detected in the second range for the second shot area of ​​the second substrate from the detector to the processing unit, and the processing unit determining a height of the second shot area of ​​the second substrate based on the ninth data, The step of exposing the second substrate includes: performing focus control based on the height of the first shot area of ​​the second substrate, and exposing the first shot area of ​​the second substrate; performing focus control based on the height of the second shot area of ​​the second substrate, and exposing the second shot area of ​​the second substrate; 7. The exposure method according to item 6, (Item 8) When the height of the second substrate cannot be determined based on the second data, the setting is changed so that data of a range of the light receiving range that is wider than the second range is transferred from the detector to the processing unit, and then the step of determining the height of the second substrate is executed again. 8. The exposure method according to any one of items 1 to 7. (Item 9) When the height of the second substrate cannot be determined based on the second data, the height of the second substrate is changed by changing the height of a substrate stage, and then the step of determining the height of the second substrate is executed again. 9. The exposure method according to any one of items 1 to 8. (Item 10) the first range is equal to the light receiving range; 10. The exposure method according to any one of items 1 to 9. (Item 11) A measurement method in which a control unit determines a height of a substrate based on data transferred from a detector having a light receiving range that receives measurement light that is irradiated onto a substrate at oblique incidence and reflected by the substrate, the method comprising: a step of irradiating a first substrate with measurement light at an oblique incidence, detecting first data in a first range of the light receiving range, and transferring the first data from the detector to a processing unit, and the processing unit determining the height of the first substrate based on the first data; determining a second range of the light receiving range that is narrower than the first range based on the height of the first substrate; a step of irradiating a second substrate with measurement light at an oblique incidence, detecting second data in the second range of the light receiving range, and transferring the second data from the detector to the processing unit, and the processing unit determining the height of the second substrate based on the second data; A measuring method comprising: (Item 12) 11. A program for operating a control unit that controls an exposure apparatus so that the exposure method according to any one of items 1 to 10 is performed. (Item 13) An exposure apparatus for exposing a substrate, a detector having a light receiving area that irradiates a substrate with measurement light at an oblique incidence and receives the measurement light reflected by the substrate; a processing unit that detects the height of the substrate based on data transferred from the detector; a control unit that controls the processing unit, The control unit In a first exposure process for exposing a first substrate, first data detected in a first range of the light receiving range is transferred from the detector to a processing unit, and the processing unit is caused to calculate a height of the first substrate based on the first data; determining a second range of the light receiving range that is narrower than the first range based on a height of the first substrate; For a second exposure process for exposing a second substrate, second data detected in the second range is transferred from the detector to the processing unit, and the processing unit is caused to calculate the height of the second substrate based on the second data. An exposure apparatus comprising: (Item 14) an exposure step of exposing a substrate according to the exposure method according to any one of items 1 to 10; a developing step of developing the substrate that has been subjected to the exposure step; obtaining an article from the substrate that has undergone the developing step; A method for manufacturing an article, comprising:

[0045] The invention is not limited to the above-described embodiments, and various changes and modifications can be made without departing from the spirit and scope of the invention. Accordingly, the following claims are appended to apprise the public of the scope of the invention. [Explanation of symbols]

[0046] 100: exposure device, 14: detector, 15: processing unit, 22: measurement device, 23: control unit

Claims

1. 1. An exposure method for performing focus control based on data transferred from a detector having a light-receiving range that receives measurement light that is irradiated onto a substrate at oblique incidence and reflected by the substrate, comprising: a step of transferring first data detected in a first range of the light receiving range from the detector to a processing unit in a first exposure process of exposing a first substrate, and the processing unit determining a height of the first substrate based on the first data; determining a second range of the light receiving range that is narrower than the first range based on the height of the first substrate; a step of transferring second data detected in the second range of the light receiving range from the detector to the processing unit for a second exposure process of exposing a second substrate, and the processing unit determining the height of the second substrate based on the second data; performing focus control based on the height of the second substrate and exposing the second substrate; An exposure method comprising:

2. determining the second range includes determining the end of data transferred from the detector to the processing unit; 2. The exposure method according to claim 1.

3. the step of determining the height of the first substrate includes a step of transferring third data detected in the first range of the light receiving range from the detector to the processing unit in a process of exposing a first shot area of ​​the first substrate, and the processing unit determining the height of the first shot area of ​​the first substrate based on the third data; determining the second range includes determining the second range based on a height of the first shot area.

2. The exposure method according to claim 1.

4. The first exposure process for exposing the first substrate includes: transferring fourth data detected in the second range from the detector to the processing unit in order to expose a second shot area of ​​the first substrate, and the processing unit determining a height of the second shot area based on the fourth data; performing focus control based on the height of the second shot area and exposing the second shot area of ​​the first substrate; 4. The exposure method according to claim 3, further comprising:

5. the step of determining the height of the second substrate includes a step of transferring fifth data detected in the second range for the first shot area of ​​the second substrate from the detector to the processing unit, and the processing unit determining the height of the first shot area of ​​the second substrate based on the fifth data; the step of exposing the second substrate includes a step of performing focus control based on a height of the first shot area of ​​the second substrate and exposing the first shot area of ​​the second substrate.

4. The exposure method according to claim 3.

6. The step of determining the height of the first substrate includes: a step of transferring sixth data detected in the first range of the light receiving range from the detector to the processing unit in a first exposure process of exposing a first shot area of ​​the first substrate, and the processing unit determining a height of the first shot area of ​​the first substrate based on the sixth data; in a process of exposing a second shot area of ​​the first substrate, transferring seventh data detected in the first range of the light receiving range from the detector to the processing unit, and the processing unit determining a height of the second shot area of ​​the first substrate based on the seventh data, The step of determining the second range includes: determining the second range for the first shot area of ​​the second substrate based on a height of the first shot area of ​​the first substrate; determining the second range for the second shot area of ​​the second substrate based on a height of the second shot area of ​​the first substrate; 2. The exposure method according to claim 1.

7. The step of determining the height of the second substrate includes: transferring eighth data detected in the second range for the first shot area of ​​the second substrate from the detector to the processing unit, and the processing unit determining a height of the first shot area of ​​the second substrate based on the eighth data; transferring ninth data detected in the second range for the second shot area of ​​the second substrate from the detector to the processing unit, and the processing unit determining a height of the second shot area of ​​the second substrate based on the ninth data, The step of exposing the second substrate includes: performing focus control based on the height of the first shot area of ​​the second substrate, and exposing the first shot area of ​​the second substrate; performing focus control based on the height of the second shot area of ​​the second substrate, and exposing the second shot area of ​​the second substrate; 7. The exposure method according to claim 6.

8. When the height of the second substrate cannot be determined based on the second data, the setting is changed so that data of a range of the light receiving range that is wider than the second range is transferred from the detector to the processing unit, and then the step of determining the height of the second substrate is executed again.

2. The exposure method according to claim 1.

9. When the height of the second substrate cannot be determined based on the second data, the height of the second substrate is changed by changing the height of a substrate stage, and then the step of determining the height of the second substrate is executed again.

2. The exposure method according to claim 1.

10. the first range is equal to the light receiving range; 10. The exposure method according to claim 1.

11. A measurement method in which a control unit determines a height of a substrate based on data transferred from a detector having a light receiving range that receives measurement light that is irradiated onto a substrate at oblique incidence and reflected by the substrate, the method comprising: a step of irradiating a first substrate with measurement light at an oblique incidence, detecting first data in a first range of the light receiving range, and transferring the first data from the detector to a processing unit, and the processing unit determining a height of the first substrate based on the first data; determining a second range of the light receiving range that is narrower than the first range based on the height of the first substrate; a step of irradiating a second substrate with measurement light at an oblique incidence, detecting second data in the second range of the light receiving range, and transferring the second data from the detector to the processing unit, and the processing unit determining the height of the second substrate based on the second data; A measuring method comprising:

12. 2. A program for causing a control unit that controls an exposure apparatus to operate so that the exposure method according to claim 1 is performed.

13. An exposure apparatus for exposing a substrate, a detector having a light receiving area that irradiates a substrate with measurement light at an oblique incidence and receives the measurement light reflected by the substrate; a processing unit that detects the height of the substrate based on data transferred from the detector; a control unit that controls the processing unit, The control unit In a first exposure process for exposing a first substrate, first data detected in a first range of the light receiving range is transferred from the detector to a processing unit, and the processing unit is caused to calculate a height of the first substrate based on the first data; determining a second range of the light receiving range that is narrower than the first range based on a height of the first substrate; For a second exposure process for exposing a second substrate, second data detected in the second range is transferred from the detector to the processing unit, and the processing unit is caused to calculate the height of the second substrate based on the second data. An exposure apparatus comprising:

14. an exposure step of exposing a substrate according to the exposure method of claim 1; a developing step of developing the substrate that has been subjected to the exposure step; obtaining an article from the substrate that has undergone the developing step; A method for manufacturing an article, comprising:

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