Adsorbent and method of use thereof

Abstract

An adsorbent according to the present disclosure removes an adsorbate from a moisture-containing gas, which is air that includes moisture and the adsorbate, the adsorbent being characterized in that: the adsorbent includes a metal organic framework; the metal organic framework includes trimesic acid, an aromatic carboxylic-acid-based compound, and at least one type of metal ion selected from the group consisting of aluminum ions, iron ions, and copper ions; and the aromatic carboxylic-acid-based compound is a benzoic-acid-based compound expressed by formula (1) or an isophthalic-acid-based compound expressed by formula (2). R in formulas (1) and (2) is any one of a methyl group, a fluoro group, a chloro group, an iodo group, or a bromo group.

Description

Technical Field

[0001] The present disclosure relates to adsorbents and methods of using the same.

Background Art

[0002] Patent Document 1 discloses a technique for removing dimethyl sulfide from a gas containing dimethyl sulfide by bringing the gas into contact with a metal-organic framework composed of copper ions and trimesic acid.

Prior Art Documents

Patent Documents

[0003]

Patent Document 1

Non-Patent Documents

[0004]

Non-Patent Document 1

Non-Patent Document 2

Non-Patent Document 3

Summary of the Invention

Problems to be Solved by the Invention

[0005] The present disclosure provides an adsorbent capable of reducing the filling amount of the adsorbent filled in an adsorber and downsizing the adsorber.

Means for Solving the Problems

[0006] The adsorbent in this disclosure is an adsorbent that removes adsorbate from a water-containing gas which is a gas containing water and adsorbate, and the adsorbent comprises a metal-organic structure, the metal-organic structure comprises at least one metal ion selected from aluminum ions, iron ions, and copper ions, trimesic acid, and an aromatic carboxylic acid compound, the aromatic carboxylic acid compound is a benzoic acid compound represented by formula (1) or an isophthalic acid compound represented by formula (2).

[0007] [ka] [Effects of the Invention]

[0008] The adsorbent in this disclosure is composed of a metal-organic structure having hydrophobic functional groups such as methyl groups, fluoro groups, chloro groups, iodine groups, and bromo groups, which are of a size equal to or smaller than that of a carboxyl group.

[0009] This reduces the amount of moisture adsorbed by the metal-organic structure by inhibiting the penetration of moisture into the metal-organic structure, without causing a decrease in specific surface area due to pore blockage. Even if the gas containing the adsorbate contains moisture, it is possible to suppress the decrease in adsorption capacity due to the deterioration of the metal-organic structure by moisture.

[0010] Therefore, it is possible to provide an adsorbent that reduces the amount of adsorbent packed into the adsorbent, thereby enabling miniaturization of the adsorbent. [Brief explanation of the drawing]

[0011] [Figure 1] Schematic diagram showing the configuration of the adsorber in Embodiment 1 [Figure 2] Characteristic diagram showing the X-ray diffraction pattern of Cu-BTC in Embodiment 1 [Figure 3] Characteristic diagram showing the nitrogen adsorption isotherm of Cu-BTC in Embodiment 1 [Figure 4] Characteristic diagram showing the water adsorption isotherm of Cu-BTC in Embodiment 1

Mode for Carrying Out the Invention

[0012] (Knowledge, etc. on which the present disclosure is based) When the inventors arrived at the present disclosure, as an adsorbent for removing sulfur compounds from a gas containing sulfur compounds, there was Ag zeolite in which Ag ions were introduced into the ion exchange sites of zeolite.

[0013] As a result, even sulfur compounds that are difficult to adsorb could be effectively removed. However, since the raw material Ag is expensive, there remained a problem in terms of cost.

[0014] On the other hand, as an adsorbent for removing sulfur compounds from a gas containing sulfur compounds, there was a metal-organic framework having copper ions and trimesic acid, which was disclosed in Patent Document 1.

[0015] This material has a large content of copper ions in its structure and a high specific surface area, so it can effectively remove even sulfur compounds that are difficult to adsorb, and it is a material with a lower cost compared to Ag zeolite.

[0016] However, as disclosed in Non-Patent Document 1, the metal-organic framework having copper ions and trimesic acid has low moisture resistance and water resistance, and the crystal structure is destroyed by moisture, water vapor, or water. When exposed to moisture for a long time, there is a problem that the gas storage performance deteriorates. <G

[0017] Therefore, in Non-Patent Document 2, it was proposed to reduce the hygroscopicity and improve the moisture resistance by treating the surface of the metal-organic framework with a binder such as silicone. However, when doing so, there is a problem that the adsorption capacity of the metal-organic framework decreases with the complexation with the binder.

[0018] Furthermore, Non-Patent Document 3 proposed reducing the amount of water adsorbed by a metal-organic structure by introducing hydrophobic functional groups such as naphthalene into the organic portion of the metal-organic structure. However, this approach has the drawback that the introduction of bulky functional groups reduces the specific surface area of ​​the metal-organic structure, thereby decreasing the adsorption capacity of the target adsorbate.

[0019] Under these circumstances, the inventors conceived the idea that by introducing hydrophobic functional groups with low steric hindrance into the structure of the metal-organic structure, it would be possible to reduce the amount of water adsorbed by the metal-organic structure without causing a decrease in adsorption capacity due to pore blockage, thereby suppressing the deterioration of the metal-organic structure due to moisture.

[0020] Furthermore, in order to realize this idea and miniaturize the adsorbent, the inventors found that simply introducing hydrophobic functional groups with low steric hindrance into a metal-organic structure composed of terephthalic acid and metal oxide clusters, as in Non-Patent Document 3, would not be sufficient to create a hydrophobic atmosphere near the metal ion sites that serve as adsorption active sites, thus failing to achieve adequate hydrophobicity. Therefore, they identified the challenge of designing the metal-organic structure so that the hydrophobic functional groups and metal ion sites are in close proximity, and this led to the creation of the subject matter of this disclosure.

[0021] Therefore, this disclosure provides an adsorbent that can be miniaturized and a method for using the same.

[0022] (Embodiment 1) Embodiment 1 will be described below using Figures 1 to 4 and Tables 1 to 3.

[0023] [1-1. Structure] As shown in Figure 1, the metal-organic structure 4 used as the adsorbent in this embodiment is filled (mounted) inside the containment container 1. The containment container 1 has an inlet 2 at one end in the longitudinal direction for allowing a water-containing gas, which is a gas containing water and adsorbate, to flow into the containment container 1, and an outlet 3 at the other end for allowing the water-containing gas, from which the adsorbate has been removed by the metal-organic structure 4, to flow out of the containment container 1.

[0024] The adsorbent 5 is configured such that a water-containing gas, which is a gas containing water and adsorbate, flows into the inlet 2 of the containment container 1, which is filled (mounted) with a metal-organic structure 4, and the water-containing gas, from which the adsorbate has been removed by the metal-organic structure 4 filled (mounted) inside the containment container 1, flows out from inside the containment container 1 to the outlet 3.

[0025] The metal-organic structure 4 in this embodiment is a metal-organic structure comprising at least one metal ion selected from aluminum ions, iron ions, and copper ions, trimesic acid (C9H6O6), which has a structure in which a carboxylic acid is bonded to the 1,3,5 positions of the benzene ring and is also called 1,3,5-benzenetricarboxylic acid, and an aromatic carboxylic acid compound.

[0026] In this embodiment, the aromatic carboxylic acid compound is either a benzoic acid compound represented by formula (1) or an isophthalic acid compound represented by formula (2).

[0027] [ka] Metal-organic structure 4 is a metal-organic structure called MOF-199, which is composed of metal ions and trimesic acid, in which a portion of the trimesic acid is substituted with a benzoic acid-based compound represented by formula (1) or an isophthalic acid-based compound represented by formula (2).

[0028] The metal-organic structure 4 may be in powder form. The powder may be, for example, 1000 ml 2 It is preferable that the BET specific surface area is greater than or equal to / g. The average particle size of the primary particles of the metal-organic structure 4 is not particularly limited, but for example, it is between 1 μm and 30 μm.

[0029] Metal-organic structures have a high specific surface area because they possess a uniform skeletal structure in which the molecules constituting their three-dimensional framework are regularly arranged. By appropriately selecting and combining organic ligands and metal ions, physical or chemical properties such as pore size, pore structure, and surface function can be precisely set. Therefore, compared to conventional adsorbents such as zeolites, metal-organic structures offer a very high degree of design freedom.

[0030] In order to achieve both the maintenance of the specific surface area of ​​the metal-organic structure and the imparting of hydrophobicity, the inventors decided to introduce hydrophobic functional groups such as methyl groups, fluoro groups, chloro groups, iodine groups, and bromo groups, which have less steric hindrance compared to carboxyl groups, into the metal-organic structure.

[0031] As a method for introducing hydrophobic functional groups, we focused on benzoic acid, in which a carboxylic acid is coordinated to the benzene ring in three ways, and isophthalic acid compounds, in which a carboxylic acid is coordinated to the benzene ring in two ways, compared to trimesic acid, in which a carboxylic acid is coordinated to the benzene ring in one way.

[0032] In metal-organic structure 4, a portion of the trimesic acid contained in the MOF-199 structure is substituted by a benzoic acid-based compound or isophthalic acid-based compound substitution containing one of the following: a methyl group, a fluoro group, a chloro group, an iodine group, or a bromo group. Therefore, metal-organic structure 4 maintains the MOF-199 structure while possessing one of the following: a methyl group, a fluoro group, a chloro group, an iodine group, or a bromo group.

[0033] [1-2. Operation] The operation and function of the adsorber 5 of this embodiment, configured as described above, will now be explained.

[0034] A metal-organic structure 4 containing one of the following groups—methyl, fluoro, chloro, iodine, or bromo—is housed (filled) inside the container 1 of the adsorber 5.

[0035] Then, a water-containing gas, which is a gas containing water and adsorbate, is supplied to the inlet 2 from a water-containing gas supply source (not shown). The water-containing gas supplied to the inlet 2 then passes through the containment container 1, coming into contact with the metal-organic structure 4 inside the container 1. As the adsorbate is removed from the water-containing gas by the metal-organic structure 4, the water-containing gas from which the adsorbate has been removed is discharged from the outlet 3.

[0036] Examples of water-containing gases in this embodiment include city gas, natural gas, or hydrocarbon fuels such as LPG. For safety purposes, sulfur-based adsorbents are added to these hydrocarbon fuels to enable rapid detection in the event of a leak. An example of an adsorbent contained in the water-containing gas is tetrahydrothiophene (THT).

[0037] The functional groups contained in metal-organic structure 4, such as methyl, fluoro, chloro, iodine, and bromo groups, are all about the same size as or smaller than carboxyl groups. In some locations where carboxyl groups were present in conventional metal-organic structures containing only metal ions and trimesic acid, metal-organic structure 4 contains hydrophobic functional groups that are about the same size as or smaller than carboxyl groups.

[0038] Therefore, it is conceivable that the metal-organic structure 4 inhibits the penetration of water into the metal-organic structure more effectively than conventional metal-organic structures containing only metal ions and trimesic acid, without causing a decrease in specific surface area due to pore blockage.

[0039] When metal-organic structures are exposed to moisture for a long period of time, their crystalline structure collapses, and the adsorption capacity of the adsorbate decreases as the specific surface area decreases. Therefore, it is assumed that the metal-organic structures of this disclosure can suppress the deterioration of the metal-organic structures due to moisture in moisture-containing gases.

[0040] [1-3. Effects, etc.] As described above, in this embodiment, the metal-organic structure 4 is an adsorbent that removes adsorbate from a water-containing gas which is a gas containing water and adsorbate, and has at least one hydrophobic functional group such as a methyl group, fluoro group, chloro group, iodine group, or bromo group, which is about the same size as or smaller than a carboxyl group.

[0041] The metal-organic structure 4 comprises at least one metal ion selected from aluminum ions, iron ions, and copper ions, trimesic acid, and an aromatic carboxylic acid compound, wherein the aromatic carboxylic acid compound is a benzoic acid compound represented by formula (1) or an isophthalic acid compound represented by formula (2).

[0042] [ka] This reduces the amount of moisture adsorbed by the metal-organic structure 4 by inhibiting the penetration of moisture into the metal-organic structure 4, without causing a decrease in specific surface area due to pore blockage. Even if the gas containing the adsorbate contains moisture, it is possible to suppress the decrease in adsorption capacity due to the deterioration of the metal-organic structure 4 by moisture.

[0043] Therefore, it is possible to provide an adsorbent that can reduce the amount of adsorbent (metal-organic structure 4) packed into the adsorbent 5, thereby enabling miniaturization of the adsorbent 5. [Examples]

[0044] The following describes some examples.

[0045] (Synthesis method) Many metal-organic structures can be synthesized by known solvothermal methods (i.e., hydrothermal synthesis methods). For example, a solution of the starting material is prepared by adding a metal ion source and an organic ligand to a solvent such as ethylene glycol.

[0046] Next, the starting material solution is heated to grow crystals of the metal-organic structure. Examples of metal ion sources include copper sulfate hydrate and iron sulfate hydrate. The synthesized product containing the metal-organic structure is washed with a washing solution to remove any remaining raw materials from the product. Examples of washing solutions include methanol, which has low viscosity and boiling point. After washing, the product undergoes solid-liquid separation and drying to obtain a powdered metal-organic structure.

[0047] The following describes in detail an example of a synthesis method for a metal-organic structure in Embodiment 1. In this embodiment, we will describe Cu-BTC-CH3-BA synthesized using copper sulfate pentahydrate as the metal source and 4-methylbenzoic acid as the benzoic acid compound.

[0048] For Cu-BTC-CH3-BA, the raw material solution was prepared by mixing anhydrous copper sulfate (3.6 mmol), trimesic acid (1.6 mmol), and 4-methylbenzoic acid (0.48 mmol) with ethylene glycol (40 mL).

[0049] In the starting solution, the molar ratio of 4-methylbenzoic acid to trimesic acid was 30%. The starting solution was poured into a sealed container and then heated at 120°C for 24 hours to obtain the product. Furthermore, a precipitate was obtained by suction filtration of the obtained product. The obtained precipitate was added to a methanol solution and washed by stirring for 24 hours, and a precipitate was obtained again by suction filtration. Finally, the washed precipitate was dried at 120°C.

[0050] In this way, Cu-BTC-CH3-BA (Example 1) was obtained. Furthermore, using the same synthesis method as for Cu-BTC-CH3-BA, Cu-BTC-CH3-ISO (Example 2) was obtained by replacing 4-methylbenzoic acid with 5-methylisophthalic acid (0.48 mmol), and Cu-BTCCl-BA (Example 3) was obtained by replacing 4-methylbenzoic acid with 4-chlorobenzoic acid (0.48 mmol).

[0051] Furthermore, as comparative samples, Cu-BTC-BA (Comparative Example 1) was obtained by mixing anhydrous copper sulfate (3.6 mmol), trimesic acid (2 mmol), and benzoic acid (0.48 mmol) with ethylene glycol (40 mL) and then following the same procedure. Cu-BTC-ISO (Comparative Example 2) was obtained by mixing anhydrous copper sulfate (3.6 mmol), trimesic acid (1.6 mmol), and isophthalic acid (0.4 mmol) with ethylene glycol (40 mL) and then following the same procedure.

[0052] (Structural evaluation) To confirm whether the obtained sample had a three-dimensional structure similar to Cu-BTC, the Cu-BTC-CH3-BA from Example 1 was subjected to powder X-ray diffraction analysis.

[0053] Figure 2 is a characteristic diagram showing the powder X-ray diffraction pattern of the sample. In Figure 2, the vertical axis represents the diffraction intensity, and the horizontal axis represents the diffraction angle 2θ.

[0054] The powder X-ray diffraction pattern simulation of Cu-BTC is based on the Cambridge Crystal Structure Database, deposit number 112954. As is clear from Figure 2, only peaks originating from Cu-BTC were observed in Cu-BTC-CH3-BA.

[0055] This revealed that Cu-BTC-CH3-BA has a three-dimensional crystal structure similar to Cu-BTC and does not contain any other impurity crystals.

[0056] Next, the nitrogen adsorption isotherms at 77K were measured for Cu-BTC-CH3-BA from Example 1 and Cu-BTC-BA from Comparative Example 1. Before measurement, the samples were heated under vacuum at a temperature of 150°C for 12 hours to remove any remaining solvent and adsorbed water.

[0057] Figure 3 is a characteristic diagram showing the nitrogen adsorption isotherm. In Figure 3, the vertical axis represents the amount of nitrogen adsorbed, and the horizontal axis represents the adsorption equilibrium pressure. As shown in Figure 3, it was confirmed that the isotherms of all samples are IUPAC type I isotherms, due to the presence of micropores.

[0058] Table 1 shows the BET specific surface area calculated using the BET formula from the adsorption isotherm in Figure 3.

[0059] [Table 1] As shown in (Table 1), the specific surface area of ​​Cu-BTC-CH3 in Example 1 was comparable to that of Cu-BTC-BA in Comparative Example 1, which was introduced with only benzoic acid that does not have a hydrophobic functional group.

[0060] This suggests that when introducing benzoic acid compounds, pore blockage of the metal-organic structure due to the introduction of methyl groups does not occur.

[0061] Table 2 shows the BET specific surface areas of Cu-BTC-ISO from Comparative Example 2, Cu-BTC-CH3-ISO from Example 2, and Cu-BTC-Cl-BA from Example 3.

[0062] [Table 2] As shown in (Table 2), the specific surface area of ​​Cu-BTC-ISO in Comparative Example 2 and Cu-BTC-CH3-ISO in Example 2 are comparable.

[0063] From this, it can be concluded that even when isophthalic acid compounds are introduced, pore blockage of the metal-organic structure due to the introduction of methyl groups does not occur.

[0064] Furthermore, the specific surface area of ​​Cu-BTC-Cl-BA in Example 3 is slightly lower than that of Cu-BTC-BA in Comparative Example 1.

[0065] From this, it can be concluded that even when halogens are introduced as hydrophobic functional groups into metal-organic structures, there is almost no reduction in specific surface area due to pore blockage.

[0066] Next, the water adsorption isotherms at 298K were measured for Cu-BTC-CH3-BA from Example 1 and Cu-BTC-BA from Comparative Example 1. Before measurement, the samples were heated under vacuum at a temperature of 150°C for 12 hours to remove any remaining solvent and adsorbed water.

[0067] Figure 4 is a characteristic diagram showing the water adsorption isotherm. In Figure 4, the vertical axis represents the amount of water adsorbed, and the horizontal axis represents the relative pressure at which adsorption equilibrium is reached. Note that the saturated water vapor pressure at 298K is 3.2kPa, so the relative pressure is (P / 3.2kPa).

[0068] As shown in Figure 4, the moisture adsorption capacity of Cu-BTC-CH3-BA in Example 1 is lower than that of Cu-BTC-BA in Comparative Example 1, and is particularly low in the relative pressure range of 0 to 0.25.

[0069] This suggests that even small hydrophobic functional groups, such as methyl groups, can reduce the water adsorption capacity of the metal-organic structure when introduced into the MOF-199 structure.

[0070] Furthermore, in this embodiment, methyl groups were introduced at a ratio of 30% to trimesic acid, but it is thought that increasing the amount of methyl groups introduced would increase the range of relative pressures in which the water adsorption capacity can be significantly reduced.

[0071] Based on the above, in the metal-organic structure of this disclosure, in which hydrophobicity is imparted to the surface of the metal-organic structure by mixing organic ligands having hydrophobic functional groups such as methyl, fluoro, chloro, iodine, and bromo groups, which have a degree of steric hindrance similar to that of carboxyl groups, during synthesis, no collapse of the metal-organic structure skeleton occurred due to the functional group introduction process, nor was there a significant decrease in specific surface area due to pore blockage by the introduced functional groups.

[0072] Furthermore, even with small-bulk hydrophobic functional groups such as methyl groups, it was possible to reduce the water adsorption capacity by introducing them into the MOF-199 structure.

[0073] (Evaluation of sulfur adsorption performance) Table 3 shows the THT adsorption capacity of each sample at 15 ppm.

[0074] [Table 3] The THT adsorption capacity was evaluated by introducing the sample and THT gas into a bag, leaving it for 24 hours, and then analyzing the THT concentration in the bag to measure the THT adsorption capacity at multiple equilibrium concentrations. The adsorption isotherm was then calculated using Languir's equation, assuming that the adsorbate molecules are adsorbed in a monolayer, and the adsorption capacity at 15 ppm was determined.

[0075] As is clear from (Table 3), the Cu-BTC-CH3-BA of Example 1, in which a methyl group was introduced, showed a higher THT adsorption capacity than the Cu-BTC-BA of Comparative Example 1, in which a methyl group was not introduced.

[0076] This indicates that although Cu-BTC-CH3-BA has a lower water adsorption capacity than Cu-BTC-BA, the amount of the target sulfur component adsorbed is not reduced.

[0077] Compared to conventional adsorbents, Cu-BTC-CH3-BA is a material that can suppress the degradation of metal-organic structures due to moisture. Therefore, the amount of adsorbent needed to account for degradation can be reduced, and as a result, the amount of adsorbent required can be reduced.

[0078] The reason why Cu-BTC-CH3-BA showed a higher adsorption capacity than Cu-BTC-BA is that the approximately 2000-5000 ppm of moisture that is thought to be present in the test environment inhibited sulfur adsorption by Cu-BTC-BA, while this effect was less pronounced on Cu-BTC-CH3-BA.

[0079] In Example 2's Cu-BTC-CH3-ISO, the amount of sulfur adsorption was hardly reduced compared to Comparative Example 2's Cu-BTC-ISO, which did not have a methyl group introduced.

[0080] Furthermore, in the Cu-BTC-Cl-BA of Example 3, the amount of sulfur adsorbed was only slightly reduced compared to the Cu-BTC-BA of Comparative Example 1, which did not have a chloro group introduced, due to a decrease in specific surface area. From this, it is assumed that the amount of adsorbent can be reduced in the same way as with Cu-BTC-CH3-BA when a methyl group is introduced to an isophthalic acid compound or a halogen group is introduced to a benzoic acid compound.

[0081] As in this embodiment, the metal-organic structure 4 has copper ions, and the adsorbate to be removed may be a sulfur compound.

[0082] As a result, copper ions readily adsorb sulfur compounds, which are adsorbates, thus achieving a higher adsorption capacity. Consequently, it is possible to provide an adsorbent that can reduce the volume of adsorbent used in the adsorber and be made more compact.

[0083] Furthermore, as in this embodiment, the adsorbate to be removed may be THT. As a result, the metal-organic structure of this disclosure has a larger pore diameter than conventional metal-organic structures, and therefore a higher adsorption capacity can be obtained when using an adsorbate with a larger molecular size than conventional metal-organic structures. Consequently, it is possible to provide an adsorbent that can reduce the volume of adsorbent used in the adsorbent and be made more compact.

[0084] Furthermore, as in this embodiment, the adsorbent may be used in an environment with a relative humidity of 20% or less. This allows it to be used in a range where the moisture adsorption capacity is significantly reduced compared to conventional metal-organic structures, thereby more efficiently suppressing the decrease in adsorption capacity due to the deterioration of the metal-organic structure by moisture. As a result, it is possible to provide an adsorbent that can be made smaller by further reducing the volume of adsorbent used in the adsorber.

[0085] (Other embodiments) As described above, Embodiment 1 has been explained as an example of the technology disclosed in this application. However, the technology in this disclosure is not limited to this and can be applied to embodiments that have been modified, replaced, added, or omitted. Furthermore, it is possible to create new embodiments by combining the components described in Embodiment 1 above.

[0086] Therefore, other embodiments are illustrated below.

[0087] In this first embodiment, 4-methylbenzoic acid and 4-chlorobenzoic acid were described as examples of benzoic acid compounds containing a hydrophobic functional group. Any benzoic acid compound having a functional group is acceptable, as long as it has a hydrophobic functional group at the meta position.

[0088] Therefore, it is not limited to 4-methylbenzoic acid and 4-chlorobenzoic acid. However, when benzoic acid having hydrophobic functional groups with larger molecular sizes than chloro groups, such as 4-bromobenzoic acid or 4-iodobenzoic acid, is used as a material added during the synthesis of metal-organic structures, the pore size can be reduced, thereby reducing the adsorption capacity of inhibitors larger than water.

[0089] In this first embodiment, tetrahydrothiophene was described as an example of an adsorbent. Any fluid containing the adsorbent can be used as the adsorbent.

[0090] Therefore, it is not limited to tetrahydrothiophene. However, a high adsorption capacity can be obtained even when carbon dioxide is used as the adsorbate. [Industrial applicability]

[0091] The adsorbent of this disclosure is an adsorbent that removes adsorbate from a water-containing gas, which is a gas containing water and adsorbate. It is suitable for applications that reduce the amount of adsorbent packed into the adsorbent, thereby miniaturizing the adsorbent, and is applicable as an adsorbent that removes sulfur compounds from fuel gas containing sulfur compounds. Specifically, this disclosure is applicable to fuel cells that can convert city gas into hydrogen and generate electricity.

Claims

1. An adsorbent for removing adsorbent from a water-containing gas which is a gas containing water and adsorbent, The adsorbent comprises a metal-organic structure, The aforementioned metal-organic structure comprises at least one metal ion selected from aluminum ions, iron ions, and copper ions, trimesic acid, and an aromatic carboxylic acid compound. The adsorbent is characterized in that the aromatic carboxylic acid compound is a benzoic acid compound represented by formula (1) or an isophthalic acid compound represented by formula (2). 【Chemistry 1】

2. The adsorbent according to claim 1, wherein the adsorbate is a sulfur compound and the metal ion is a copper ion.

3. A method of using an adsorbent according to claim 1 or 2 to remove tetrahydrothiophene from a fluid containing tetrahydrothiophene.

4. A method for using the adsorbent described in claim 1 or 2 in an environment with a relative humidity of 20% or less.

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