Cover member for input device, and input device

Abstract

To provide a cover member for an input device, etc., capable of improving the writing feeling of input means such as an input pen to an input device.SOLUTION: A cover member for an input device arranged at a front side of a display device 30 in an input device 10 has irregularity on at least one principal surface 20a. In the principal surface 20a having the irregularity, when the size of interval width of the irregularity is regarded as A and the diameter of a tip part of an input medium is regarded as B when a cut-off value of a high-pass filter λc is regarded as a value of 1.6 times the interval width of the irregularity of a measurement cross-sectional curve and a cut-off value of a low-pass filter λs is regarded as 25 μm, the relation between them satisfies 0.02<[A / B]<1.SELECTED DRAWING: Figure 2

Description

Technical Field

[0001] The present invention relates to a cover member for an input device and an input device including the same.

Background Art

[0002] Conventionally, a pen input device that can input characters, figures, etc. using an input pen or the like is known. In such a pen input device, a transparent cover member made of a glass substrate or the like is disposed on the front side of a display device such as a liquid crystal display. By contacting and moving an input pen with respect to this cover member, various input operations can be performed. When a glass substrate is used as the cover member of the pen input device, generally, the surface of the glass substrate is formed with small irregularities and is smooth. Therefore, when the input pen is brought into contact with and moved on the surface of the glass substrate, the pen tip slips, resulting in a problem of poor writing feel.

[0003] For example, Patent Document 1 discloses that in order to improve the writing feel of an input pen in a pen input device, irregularities are formed on the surface of the cover glass of the input device to improve friction. The maximum valley depth of the irregularities is 10 to 400 nm and the average interval is 500 to 2000 nm.

Prior Art Documents

Patent Documents

[0004]

Patent Document 1

Summary of the Invention

Problems to be Solved by the Invention

[0005] However, when the irregularity layer formed on the surface of the cover glass described above is brought into contact with and moved on the surface of the cover glass member, the pen tip catches too much and it becomes difficult to slide, making it difficult to obtain a good writing feel like that of paper and a ballpoint pen.

[0006] Therefore, the present invention has been made in view of the current problems, and provides an input device cover member that further improves the writing feel of input means using an input medium such as an input pen, and an input device equipped therewith. [Means for solving the problem]

[0007] The problems that this invention aims to solve are as described above, and the means for solving these problems will now be explained.

[0008] A cover member for an input device that solves the above problem, and an input device equipped therewith, have the following features. In other words, the input device cover member according to the present invention is an input device cover member that is arranged on the front side of the display device in the input device, and has irregularities on at least one main surface, wherein the cutoff value of the high-pass filter λc on the main surface having irregularities is set to 1.6 times the spacing width of the irregularities of the measurement cross-sectional curve, and the cutoff value of the low-pass filter λs is set to 25 μm, and when the size of the spacing width of the irregularities is A and the diameter of the front end of the input medium is B, the relationship between the two satisfies 0.02 < [A / B] < 1. This configuration reduces the contact area between the tip of the input medium and the cover member, thereby reducing excessive friction. As a result, it is possible to improve the writing feel when using input mediums such as input pens.

[0009] Furthermore, the cover member for the input device according to the present invention is characterized in that, on the main surface having irregularities, when the cutoff value of the high-pass filter λc is set to 1.6 times the spacing width of the irregularities of the measured cross-sectional curve, and the cutoff value of the low-pass filter λs is set to 25 μm, the maximum height width of the irregularities is 3 to 1000 nm, and the spacing width A of the irregularities is 50 to 1000 μm. This configuration prevents the operation of input means such as input pens on the input device from becoming too slippery, and allows for a superior writing experience with input means such as input pens.

[0010] Furthermore, in the main surface having irregularities, when the cutoff value of the high-pass filter λc is set to 25 μm, the arithmetic mean height Sa of the surface roughness (three-dimensional) of the irregularities is 1 to 50 nm and the spacing width of the irregularities is 0.01 to 10 μm. This configuration, with its two types of uneven surfaces, makes it possible to avoid making the operation of input means such as input pens too slippery, while also preventing them from being too slippery, thereby providing an excellent writing experience for input means such as input pens.

[0011] Furthermore, the cover member for the input device according to the present invention has a tip diameter of 0.5 mm to 10 mm for the input medium.

[0012] Furthermore, the cover member for the input device according to the present invention has a haze of less than 10% in the visible light wavelength range. This allows the transparency of the input device cover member to be maintained, and the visibility of the display device to be preserved.

[0013] Furthermore, the input device according to the present invention comprises an input device cover member, a display device, and a detection circuit for detecting input, as described in any one of claims 1 to 4. This makes it possible to improve the writing feel of input methods such as input pens that provide input to input devices.

[0014] Furthermore, the input device according to the present invention includes an input pen that performs input to the input device by moving while in contact with the main surface of the cover member for the input device. This configuration makes it possible to improve the writing feel when using input media such as input pens with input devices.

Advantages of the Invention

[0015] According to the present invention, it is possible to make the writing feel of the input means by an input medium such as an input pen for inputting to an input device excellent.

Brief Description of the Drawings

[0016] [Figure 1] It is a schematic side cross-sectional view showing an input device. [Figure 2] It is a diagram showing the relationship in which the size of the interval width between the concavities and convexities of the measurement cross-sectional curve of the main surface is A, and the diameter of the tip of an input medium such as an input pen is B. [Figure 3] It is a diagram showing the measurement cross-sectional curve of the main surface, the concavities and convexities with a large interval width, and the concavities and convexities with a small interval width. [Figure 4] It is a diagram showing the cut-off values of the high-pass filter λc and the low-pass filter λs. [Figure 5] It is a diagram showing a state where the pen tip touches the main surface of a glass substrate on which two types of large and small concavities and convexities with different interval widths of the concavities and convexities are formed. [Figure 6] It is a diagram showing a state where the pen tip touches the main surface of a glass substrate having no small concavities and convexities among two types of large and small concavities and convexities with different interval widths of the concavities and convexities. [Figure 7] It is a diagram showing a state where the pen tip touches the main surface of a glass substrate having two types of large and small concavities and convexities with different interval widths of the concavities and convexities, and the interval width of the large concavities and convexities is larger than the diameter of the pen tip.

Embodiments for Carrying Out the Invention

[0017] Next, embodiments for implementing the cover member for an input device according to the present invention and an input device including the same will be described with reference to the accompanying drawings.

[0018] The input device 10 shown in FIG. 1 is an embodiment of an input device including a cover member for an input device according to the present invention. The input device 10 comprises a display element 30 for displaying images, a glass substrate 20 as a cover member disposed on the front side of the display element 30, a digitizer circuit 40 disposed on the back side of the display element 30, and an input pen 50. The glass substrate 20 is an example of a cover member for an input device according to the present invention, and the digitizer circuit 40 is an example of a detection circuit for detecting input according to the present invention. Note that the "front side" of the display element 30 refers to the side on which the image is displayed, and the "back side" of the display element 30 refers to the side opposite to the side on which the image is displayed. In Figure 1, the "front side" of the display element 30 is at the top of the page, and the "back side" is at the bottom of the page.

[0019] The input device 10 allows input of characters and shapes by moving the input pen 50 while it is in contact with the glass substrate 20. Input to the input device 10 can also be performed by means other than the input pen 50. For example, characters and shapes can be input by moving the user's finger while it is in contact with the glass substrate 20. The input device 10 is, for example, a tablet terminal. This tablet terminal broadly refers to an input display device equipped with a display function and an input function. The tablet terminal includes devices such as tablet PCs, mobile PCs, smartphones, and game consoles.

[0020] The glass substrate 20 is formed from a transparent glass plate with irregularities formed on at least one main surface 20a. For example, the glass substrate 20 can be made from aluminosilicate glass or borosilicate glass. If the glass substrate 20 is made from alkali-containing aluminosilicate glass, the glass substrate 20 may have a chemically strengthened layer on its surface. Further details of the glass substrate 20 will be described later.

[0021] The glass substrate 20 is positioned so that the side of the main surface 20a, which has irregularities formed on it, is the side that comes into contact with the input pen 50.

[0022] The digitizer circuit 40 is equipped with a detection sensor that detects input from an input means such as an input pen 50. The input pen 50 is an input device shaped like a writing instrument such as a pencil or ballpoint pen, and the pen tip 51 that contacts the glass substrate 20 is made of a synthetic resin material such as elastomer or polyacetal resin, or fibers. The diameter of the pen tip 51 made of these materials is easily affected by the width of the unevenness. Therefore, the writing feel is particularly excellent when the pen tip 51 of the input pen 50 is brought into contact with the main surface 20a of the glass substrate 20, which has unevenness formed such that the ratio of the diameter of the pen tip 51 to the spacing width of the unevenness is defined, and moved.

[0023] In this embodiment, a glass substrate 20 is used as the cover member for the input device, but it is not limited to this, and a resin substrate made of synthetic resin, with irregularities formed on at least one main surface, can also be used as the cover member. In this case, the irregularities on the resin substrate can be formed, for example, by applying a blasting process such as wet blasting to the main surface of the resin substrate, or by applying an embossing process to the main surface of the resin substrate.

[0024] Furthermore, it is also possible to use a cover member made by forming a resin layer with an uneven surface on at least one main surface of a glass substrate. In this case, the cover member can be constructed by attaching a resin sheet with an uneven surface to the main surface of the glass substrate. The unevenness of the resin sheet can be formed, for example, by embossing the surface of the resin sheet or by forming a sheet of synthetic resin mixed with powder or granules. Moreover, the resin layer can also be formed by a spray method, in which synthetic resin is sprayed onto the main surface of the glass substrate.

[0025] However, when a glass substrate 20 is used as the cover material, the surface hardness is higher compared to when a resin substrate or a glass substrate with a resin layer formed on its main surface is used, which is advantageous in that the surface is less prone to scratches.

[0026] Next, the glass substrate 20 will be described. The glass substrate 20 is one embodiment of the cover member for an input device according to the present invention. The main surface 20a of the glass substrate 20 has irregularities formed on it.

[0027] As shown in Figure 2, on the main surface 20a of the glass substrate 20, although details will be described later, when the cutoff value of the high-pass filter λc is set to 1.6 times the spacing width of the irregularities in the measured cross-sectional curve, and the cutoff value of the low-pass filter λs is set to 25 μm, the size of the spacing width of the irregularities is A, and the diameter of the tip of an input medium such as an input pen is B, then [A / B] is in the range of 0.02 to 1 (excluding 1). 0.03 to 0.99 is preferred, 0.05 to 0.95 is more preferred, and 0.07 to 0.90 is particularly preferred. If the value of [A / B] is too small or too large, an appropriate frictional force cannot be obtained, and a good writing experience cannot be achieved.

[0028] As shown in Figure 3, the surface is composed of two different types of irregularities, large and small. The irregularities with large spacing have a maximum height width Rz of 3 nm to 1000 nm and a spacing width RSm of 50 μm to 10000 μm. The irregularities with small spacing have a three-dimensional arithmetic mean height Sa of 1 nm to 50 nm and a spacing width RSm of 0.01 μm to 10 μm. The maximum height width Rz is preferably larger than the three-dimensional arithmetic mean height Sa. Furthermore, the maximum height width Rz is more preferably 1.1 to 500 times the three-dimensional arithmetic mean height Sa.

[0029] Here, for irregularities with large spacing, the maximum height width Rz is the sum of the highest peak height and the deepest valley depth in the irregularities, and the spacing width RSm is the average of the period lengths Xs of the irregularities over a predetermined reference length. Furthermore, for irregularities with small spacing, the three-dimensional arithmetic mean height Sa is the average of the absolute values ​​of the peak height Z1 and valley depth Z2 of the irregularities in a predetermined three-dimensional region, and the spacing width RSm is the average of the period lengths Xs of the irregularities over a predetermined reference length.

[0030] As shown in Figures 3 and 4, the values ​​of the maximum height width Rz and the spacing width RSm of the irregularities with large spacing widths described above are obtained when the cutoff value λc1 of the high-pass filter λc for blocking long-wavelength components from the measured cross-sectional curve of the main surface 20a is set to 1.6 times the spacing width of the irregularities in the measured cross-sectional curve, and the cutoff value λs1 of the low-pass filter λs for blocking short-wavelength components from the measured cross-sectional curve of the main surface 20a is set to 25 μm.

[0031] Furthermore, the three-dimensional arithmetic mean height Sa and the spacing width RSm of the irregularities with small spacing widths, as described above, are values ​​obtained when the cutoff value λc2 of the high-pass filter λc, which blocks long-wavelength components from the measured cross-sectional curve of the main surface 20a, is set to 25 μm. Note that by applying the high-pass filter λc with a cutoff value λc2 to the measured cross-sectional curve of the main surface 20a, the undulation component and the component of irregularities with large spacing widths present in the main surface 20a are removed, and a curve of irregularities with small spacing widths is obtained.

[0032] The large and small spacing patterns of the irregularities on the main surface 20a of the glass substrate 20 are within this range, which allows the input device 10 to maintain the visibility of the display element 30 and improve the writing feel of input means such as the input pen 50. Furthermore, it is possible to suppress the occurrence of glare called sparkling, which is caused by the interference of scattered light due to the formed irregularities. In addition, since no resin layer is formed on the main surface 20a of the glass substrate 20, and the irregularities are formed directly, it has high scratch resistance and is less prone to scratches, so the visibility of the display element 30 is not reduced.

[0033] Large-spacing irregularities affect the contact between the main surface 20a and the pen tip 51 of the input pen 50. The pen tip 51 contacts the main surface 20a of the glass substrate 20 at the convex portions of the large-spacing irregularities, but not at the concave portions. This allows for a moderate increase and decrease in the frictional force between the pen tip 51 and the main surface 20a, preventing excessive increases or decreases in frictional force and resulting in a superior writing experience with the input pen 50. Furthermore, even when the user moves their finger while it is in contact with the glass substrate 20, the finger can move smoothly, resulting in a superior writing experience when using a finger for input. In this way, it is possible to improve the writing experience of input methods such as the input pen 50 and fingers.

[0034] The upper limit of the maximum height width Rz for large-spacing irregularities is set to 1000 nm, but it is preferable to set it to 500 nm, and more preferably to 200 nm. The lower limit of the maximum height width Rz for large-spacing irregularities is set to 3 nm, but it is preferable to set it to 4 nm, and more preferably to 5 nm. The upper limit of the spacing width RSm for large-spacing irregularities is set to 10000 μm, but it is preferable to set it to 9500 μm, and more preferably to 9000 μm. The lower limit of the spacing width RSm for large-spacing irregularities is set to 50 μm, but it is preferable to set it to 100 μm, more preferably to 500 μm, and even more preferably to 1500 μm.

[0035] Small, spaced irregularities contribute to an increase in friction between the main surface 20a of the glass substrate 20 and the pen tip 51. This suppresses the pen tip 51 from slipping on the main surface 20a of the glass substrate 20, resulting in a superior writing experience with the input pen 50. Furthermore, even when the user moves their finger while it is in contact with the glass substrate 20, the finger can move smoothly, resulting in a superior writing experience when using a finger for input. In this way, it is possible to improve the writing experience of input means such as the input pen 50 or a finger. The upper limit of the three-dimensional arithmetic mean height Sa of the small, spaced irregularities is set to 50 nm, but it is preferable to set it to 40 nm, and more preferably to 30 nm. The upper limit of the spacing RSm of the small, spaced irregularities is set to 10 μm, but it is preferable to set it to 7 μm, and more preferably to 5 μm. The lower limit of the spacing width RSm for small-spacing irregularities is set to 0.01 μm, but it is preferable to set it to 0.1 μm, and even more preferable to set it to 0.5 μm.

[0036] Furthermore, the main surface 20a of the glass substrate 20 provides particularly excellent writing feel to the pen tip 51, which is made of materials that easily catch on irregularities, such as the aforementioned elastomers like silicone rubber, resins like polyacetal resin, metals, and fibers. The diameter of the tip, such as the pen tip, is 0.5 mm to 10 mm. A smaller tip diameter allows for finer input with thinner lines, but if it is too small, the digitizer circuit 40 will not be able to recognize it. Therefore, a range of 1 mm to 9.5 mm is preferred, and a range of 1.2 mm to 9 mm is more preferred.

[0037] The glass substrate 20 is formed such that, from the viewpoint of the visibility of the image when the image from the display element 30 is viewed through the glass substrate 20, the haze, which is an index of transparency and represents cloudiness, is less than 10% in the visible light wavelength range (380nm to 780nm). By keeping the haze of the glass substrate 20 below 10%, the transparency of the glass substrate 20 can be maintained, and the visibility of the display element 30 can be maintained.

[0038] In this embodiment, the haze of the glass substrate 20 is set to less than 10%, but it is preferably less than 7%, more preferably less than 5%, and even more preferably less than 4%.

[0039] Furthermore, an anti-reflective coating can be formed on the main surface 20a of the glass substrate 20 to reduce the reflectivity on the side that the input pen contacts, or an anti-fouling coating can be formed to prevent fingerprint adhesion and provide water-repellent and oil-repellent properties.

[0040] When the glass substrate 20 is used as a cover member for the input device 10, the anti-reflective coating is present at least on the main surface 20a of the front side (the side that the input pen 50 contacts) of the glass substrate 20. Furthermore, if there is a gap between the glass substrate 20 and the display element 30, it is preferable to have an anti-reflective coating on the main surface 20a on the back side (display element 30 side) of the glass substrate 20. As the anti-reflective coating, for example, a low refractive index coating with a refractive index lower than that of the glass substrate 20, or a dielectric multilayer film in which a low refractive index coating with a relatively low refractive index and a high refractive index coating with a relatively high refractive index are alternately laminated can be used. The anti-reflective coating can be formed by sputtering or CVD.

[0041] When an anti-reflective coating is present on the main surface 20a of the glass substrate 20, the surface irregularities of the main surface 20a of the glass substrate 20 are formed such that the irregularities of the surface of the anti-reflective coating fall within the range of the above-mentioned surface roughness (maximum height Rz and spacing RSm of irregularities with large spacing widths, and the three-dimensional arithmetic surface height Sa and spacing RSm of irregularities with small spacing widths). Furthermore, when an anti-reflective coating is present on the main surface 20a of the glass substrate 20, the surface irregularities of the main surface 20a of the glass substrate 20 are formed such that the haze of the glass substrate 20 with the anti-reflective coating falls within the above-mentioned range. When measuring the spacing RSm of the irregularities and the three-dimensional arithmetic mean height Sa of the irregularities after the anti-reflective coating has been formed, a 10 nm Au film is formed, and then these values ​​are measured.

[0042] When the glass substrate 20 is used as a cover member for the input device 10, the antifouling film is present on the main surface 20a of the front side (the side that the input pen 50 contacts) of the glass substrate 20. Preferably, the antifouling film contains a fluorine-containing polymer that includes silicon in its main chain. As the fluorine-containing polymer, for example, a polymer can be used that has -Si-O-Si- units in its main chain and a water-repellent functional group containing fluorine in its side chain. The fluorine-containing polymer can be synthesized, for example, by dehydration condensation of silanol. When the glass substrate 20 has both an anti-reflective film and an antifouling film on its front main surface 20a, the anti-reflective film is formed on the main surface 20a of the glass substrate 20, and the antifouling film is formed on the anti-reflective film.

[0043] When the main surface 20a of the glass substrate 20 has an antifouling film, or when the main surface 20a of the glass substrate 20 has both an anti-reflective film and an antifouling film, the surface irregularities of the main surface 20a of the glass substrate 20 are formed such that the irregularities of the surface of the antifouling film are within the range of the above-mentioned surface roughness (maximum height width Rz and spacing width RSm of irregularities with large spacing widths, and three-dimensional arithmetic surface height Sa and spacing width RSm of irregularities with small spacing widths). Furthermore, when the main surface 20a of the glass substrate 20 has an antifouling film, or when the main surface 20a of the glass substrate 20 has both an anti-reflective film and an antifouling film, the surface irregularities of the main surface 20a of the glass substrate 20 are formed such that the haze of the glass substrate 20 after the formation of the antifouling film, or the haze of the glass substrate 20 after the formation of the anti-reflective film and the antifouling film, is within the range described above.

[0044] Next, a method for manufacturing the glass substrate 20 will be described. The irregularities formed on at least one main surface 20a of the glass substrate 20 are formed by combining at least one treatment method such as wet blasting, chemical etching, and silica coating on the main surface 20a. Wet blasting is a process in which abrasive particles composed of solid particles such as alumina and a liquid such as water are uniformly mixed to form a slurry, which is then sprayed at high speed onto a glass workpiece from a spray nozzle using compressed air, thereby forming fine irregularities on the workpiece. Furthermore, a round nozzle with a slurry nozzle area narrowed to a small area relative to the workpiece area is used as the nozzle for spraying the slurry, and various surface shapes can be formed by moving this round nozzle relative to the workpiece.

[0045] In wet blasting, when a slurry sprayed at high speed collides with a workpiece, the abrasive particles in the slurry scrape, strike, and rub the surface of the workpiece, creating fine irregularities on the workpiece surface. In this case, the abrasive particles sprayed onto the workpiece and the fragments of the workpiece scraped away by the abrasive particles are washed away by the liquid sprayed onto the workpiece, resulting in fewer particles remaining on the workpiece. Furthermore, by arbitrarily scanning the nozzle across the workpiece and partially spraying slurry onto the workpiece surface, it is possible to create irregularities with both small and large spacings. The glass substrate 20 is obtained by cutting or otherwise adjusting a workpiece, which has two types of irregularities of different spacings formed on its surface, to the desired size and shape.

[0046] The surface roughness of the small-spaced irregularities formed on the main surface of the workpiece by wet blasting can be adjusted mainly by the particle size distribution of the abrasive grains contained in the slurry and the spray pressure when the slurry is sprayed onto the workpiece. Furthermore, the maximum height width Rz and the spacing width RSm of the large-spaced irregularities can be adjusted by the size of the nozzle used to spray the slurry, the feed pitch width, and the spray pressure.

[0047] In wet blasting, when slurry is sprayed onto the workpiece, the liquid carries the abrasive particles to the workpiece. Compared to dry blasting, this allows for the use of finer abrasive particles, and the impact when the abrasive particles collide with the workpiece is reduced, enabling precise machining. By applying wet blasting to the workpiece in this way, it is easy to form two types of irregularities of appropriate size and spacing width on the main surface 20a of the glass substrate 20. This makes it possible to improve the writing feel of input devices such as the input pen 50 without compromising the transparency of the glass substrate 20.

[0048] In dry blasting, heat is generated in the workpiece due to friction when the sprayed abrasive particles collide with the workpiece. However, in wet blasting, the liquid constantly cools the surface of the workpiece during the process, so the workpiece is not heated by the blasting. Furthermore, it is possible to create irregularities on the main surface 20a of the glass substrate 20 by dry blasting, but in dry blasting, the impact when the abrasive particles collide with the main surface 20a of the glass substrate 20 is too great, which tends to increase the surface roughness of the main surface 20a where irregularities are formed, and the transparency of the glass substrate 20 tends to be impaired.

[0049] Furthermore, the chemical etching process involves chemically etching the main surface 20a of the glass substrate 20 with hydrogen fluoride (HF) gas or hydrofluoric acid.

[0050] Furthermore, the silica coating treatment involves applying a coating agent containing a matrix precursor such as a silica precursor and a liquid medium for dissolving the matrix precursor to the main surface 20a of the glass substrate 20, and then heating it. [Examples]

[0051] Next, an example of a glass substrate 20 having two types of irregularities, large and small, with different spacing widths, formed on the main surface 20a will be described. However, the glass substrate 20 is not limited to this example.

[0052] [Sample preparation] In this embodiment, samples 1 to 9 were prepared as examples of the glass substrate 20, and samples 10 to 12 were prepared as comparative examples. For samples 1 to 12, alkali-containing aluminosilicate glass with a thickness of 1.1 mm was used as the glass substrate 20.

[0053] For the glass substrates 20 of Samples 1-9 (Examples) and Sample 12 (Comparative Example), wet blasting was performed to create two types of irregularities, large and small, with different spacing widths, on one of the main surfaces 20a. Specifically, for the glass substrates 20 of Samples 1-9 and Sample 12, a slurry prepared by uniformly stirring abrasive particles composed of alumina with particle sizes #4000, #6000, or #8000 with water was applied. The glass substrate 20 was placed on a processing table, and wet blasting was performed by scanning and spraying the slurry over the entire main surface 20a of the glass substrate 20 using air at a processing pressure of 0.1-0.3 MPa while moving a round nozzle at a speed of 0.5 mm / s. The round nozzle used for wet blasting narrows the cross-sectional area of ​​the slurry injection port to a small area relative to the main surface 20a, and is a nozzle that partially injects the slurry onto the main surface 20a. The spacing width of the large-spacing irregularities was varied by changing the scanning distance of the round nozzle. The maximum height width Rz of the large-spacing irregularities was varied by increasing the number of scans. The three-dimensional arithmetic mean height Sa of the small-spacing irregularities was varied by changing the particle size of the alumina or by changing the processing pressure. Abrasive grains with a polygonal shape were used as the abrasive grains.

[0054] For samples 1-9 and sample 12, samples with large spacing between irregularities were prepared by varying the scanning distance of the round nozzle from 500 to 3000 μm. Samples with large spacing between irregularities (maximum height Rz) were prepared by varying the number of scans of the round nozzle to 2 to 5 times that of sample 1. Samples with small spacing between irregularities (three-dimensional arithmetic mean height Sa) were prepared by changing the alumina particle size from #4000 to #8000 and increasing the processing pressure in the range of 0.1 to 0.2 MPa.

[0055] The main surface 20a of the glass substrate 20 of comparative example sample 10 was not treated. In other words, the glass substrate 20 of sample 10 was untreated. For the glass substrate 20 of comparative example sample 11, an SiO2 coating film was formed on one of the main surfaces 20a by drying a liquid containing SiO2 on that surface.

[0056] [Surface roughness measurement] The surface roughness of the main surface 20a of the glass substrate 20 for samples 1 to 12 was measured. For samples 1 to 10 and 12, the surface roughness was measured on the main surface 20a that had been wet-blasted, while for sample 11, it was measured on one of the main surfaces 20a.

[0057] The parameters for measuring surface roughness were the maximum height Rz and the spacing RSm for large-spacing irregularities, and the three-dimensional arithmetic surface height Sa and the spacing RSm for small-spacing irregularities. Surface roughness was measured using a white light interference microscope.

[0058] The white light interference microscope used was a Zygo New View 7300, and measurements were performed in accordance with JIS B0601-2013. For samples 1-10 and 12, the measurement conditions for large-spacing surface irregularities were set to a 2.5x objective lens and a 1x zoom lens, with a camera resolution of 640 x 480 pixels and one integration for a measurement area of ​​2827 x 2120 μm. When measuring the maximum height width Rz and the spacing width RSm of large-spacing surface irregularities, the cutoff value λc1 of the high-pass filter λc was set to approximately 1.6 times the spacing width RSm, and the cutoff value λs1 of the low-pass filter λs was set to 25 μm. The measurement conditions for small-spacing surface irregularities were set to a 50x objective lens and a 2x zoom lens, with a camera resolution of 640 x 480 pixels and eight integrations for a measurement area of ​​74 x 55 μm. When measuring the three-dimensional arithmetic mean height Sa and the spacing width RSm of small-spacing irregularities, the cutoff value λc2 of the high-pass filter λc was set to 25 μm. For sample 11, the measurement conditions for large-spacing irregularities were set to use a 50x objective lens and a 0.5x zoom lens, with a measurement area of ​​282 × 210 μm, a camera resolution of 640 × 480, and 8 integrations. When measuring the maximum height width Rz and the spacing width RSm of large-spacing irregularities, the cutoff value λc1 of the high-pass filter λc was set to 52.9 μm, and the cutoff value λs1 of the low-pass filter λs was set to 1.3 μm.

[0059] [Surface roughness measurement results] The results of surface roughness measurements performed on samples 1 to 12 are described below. The measurement results are shown in Table 1.

[0060] [Table 1]

[0061] As shown in Table 1, the maximum height width Rz of large-spacing irregularities was in the range of 25 nm to 125 nm for samples 1 to 9 (examples) and sample 12 (comparative example), and the maximum height width Rz tended to increase as the number of scans in the wet blasting process increased. No large-spacing irregularities were observed in sample 10, an untreated comparative example. The maximum height width Rz of sample 11, a comparative example with an SiO2 coating, was 1225 nm.

[0062] The spacing width RSm of the irregularities with large spacing was in the range of 500 μm to 3000 μm for samples 1 to 9 (examples) and sample 12 (comparative example). No irregularities with large spacing were observed in sample 10, an untreated comparative example. The spacing width RSm of the irregularities in sample 11, a comparative example with an SiO2 coating, was 30 μm.

[0063] The three-dimensional arithmetic surface height Sa for small-spacing irregularities is in the range of 4.5 nm to 5.3 nm for example samples 1 to 9 and comparative example sample 12. The three-dimensional arithmetic surface height Sa of untreated comparative example sample 10 was 0.2 nm, which is smaller than that of samples 1 to 9 and 12, and no small irregularities were observed in comparative example sample 11, which had an SiO2 coating film applied.

[0064] [Haze measurement] Haze measurements were performed on samples 1 through 12. Haze measurements were taken using a Shimadzu UV-3100PC ultraviolet-visible near-infrared analytical photometer, in accordance with JIS K7361-1-1997.

[0065] [Haze measurement results] As shown in Table 1, the haze levels for samples 1-9, which served as examples, ranged from 1.0% to 1.8%, showing no significant difference from the untreated samples 10 and 12. On the other hand, sample 11, a comparative example with an SiO2 coating, showed a high haze level of 34%.

[0066] [Evaluation of visibility] The visibility of the image displayed on the display element 30 was evaluated when the glass substrates 20 of samples 1 to 12 were placed on the front side of the display element 30 in the input device 10. The evaluation method was to assess whether or not blurring was observed in the image displayed on the display element 30 using the following three-level scale: ◎: A clear image is visible with no blurring; ○: The image is clearly visible, but there is slight blurring; ×: The image is unclear and blurring is noticeable.

[0067] [Visibility evaluation results] As shown in Table 1, the visibility of the images was rated as ◎ for samples 1 to 9, which served as examples. Sample 10, an untreated comparative example, received a ◎ rating; Sample 11, a comparative example with an SiO2 coating, received a × rating; and Sample 12, another comparative example, received a ◎ rating.

[0068] [Input medium] The following input pens were used as input media. For samples 1-3 and 10-12, Wacom's BambooTip was used. The pen tip material was resin, and the diameter of the pen tip was 1.9 mm. For samples 4-5, Apple's Apple Pencil was used. The pen tip material was resin, and the diameter of the pen tip was 8.9 mm. For samples 6-7, Wacom's KP-503E was used. The pen tip material was rubber, and the diameter of the pen tip was 1.7 mm. For samples 8-9, ELECOM's TB-TPG03BK was used. The pen tip material was conductive fiber, and the diameter of the pen tip was 8 mm.

[0069] [Width of large-spaced bumps / diameter of the tip of the input medium B] When the spacing width RSm of irregularities with large spacing widths is A and the diameter of the tip of the input medium is B, the ratio of A to B, expressed as [A / B], was in the range of 0.11 to 0.79 for samples 1 to 9, which were examples. On the other hand, it was not possible to calculate for sample 10, an untreated comparative example, for sample 11, a comparative example with an SiO2 coating film, it was 0.01, and for sample 12, another comparative example, it was 1.58.

[0070] [Evaluation of writing feel] The writing feel when inputting characters and figures onto a glass substrate 20 using an input pen 50 was evaluated through a sensory test. The evaluation method involved using the aforementioned input pen 50, and having 20 men and women aged 20 to 50 rate the writing feel on the glass substrate 20 on a 7-point scale from "very good writing feel" to "very bad writing feel." The average score was used for evaluation.

[0071] [Evaluation results of writing feel] As shown in Table 1, the writing feel was 3.9 or higher for samples 1 to 9, which are examples, while it was 3.7 or lower for sample 10, which is an untreated comparative example, sample 11, which is a comparative example with an SiO2 coating film, and sample 12, which is also a comparative example.

[0072] [Overall evaluation of each sample] As shown in Table 1 and Figure 5, for samples 1 to 9, which are examples, the presence of two types of irregularities of different sizes and spacing widths formed on the main surface 20a where the pen tip 51 of the input pen 50 makes contact suppresses the pen tip 51 from slipping on the main surface 20a of the glass substrate 20. Furthermore, the combination of a moderate increase and decrease in frictional force between the pen tip 51 and the main surface 20a resulted in good writing feel and excellent visibility. On the other hand, for sample 10, which is an untreated comparative example, the irregularities on the main surface 20a where the input pen 50 makes contact were small and slippery, resulting in poor writing feel.

[0073] Furthermore, as shown in Figure 6, in the case of sample 11, a comparative example with an SiO2 coating film, the pen tip 51 did not slide easily and snagged because it lacked two types of uneven surfaces with different spacing widths, resulting in poor writing quality. On the other hand, as shown in Figure 7, in the case of sample 12, a comparative example with an excessively large [A / B] value, snagging could not be suppressed, resulting in poor sliding and poor writing quality. [Industrial applicability]

[0074] The present invention is applicable to an input device that can input characters and figures using an input means such as an input pen, and to an input device cover member provided for said input device. In particular, it is applicable to an input device cover member that is positioned on the front side of the display device in the input device and has irregularities on at least one main surface, and to an input device equipped with said input device cover member. [Explanation of Symbols]

[0075] 10 Input devices 20. Glass substrate (cover component for input device) 20a Main surface 30 display elements 40 Digitizer Circuits 50 Input Pens

Claims

1. It is located on the front side of the display device in the input device. An input device cover member, on the main surface opposite to the display device side, in which the leading edge of an input medium, which has an outwardly convex spherical shape, moves while in contact with the main surface, The tip of the input medium has a diameter of 1.7 to 8 mm. The aforementioned input device cover member has at least one main surface with two different types of irregularities of varying sizes. In the main surface having the aforementioned irregularities, When the cutoff value of the high-pass filter λc is set to 1.6 times the spacing width of the large irregularities in the measured cross-sectional curve, and the cutoff value of the low-pass filter λs is set to 25 μm, the spacing width of the large irregularities is: It is 500 to 3000 μm, and When the width of the spacing between the large bumps is A, and the diameter of the tip of the input medium is B, the relationship between the two satisfies 0.13 ≤ [A / B] ≤ 0.

79. In the main surface having the aforementioned irregularities, When the cutoff value of the high-pass filter λc is set to 25 μm, the spacing width of the small irregularities is 2.4 to 2.9 μm. A cover member for an input device characterized by the following features.

2. In the main surface having the aforementioned irregularities, When the cutoff value of the high-pass filter λc is set to 1.6 times the spacing width of the large irregularities in the measured cross-sectional curve, and the cutoff value of the low-pass filter λs is set to 25 μm, the maximum height and width of the large irregularities is 25 to 125 nm. The cover member for an input device according to claim 1, characterized in that...

3. The haze is less than 10% in the visible light wavelength range. A cover member for an input device according to claim 1 or claim 2, characterized in that...

4. The device comprises an input device cover member, a display device, and a detection circuit for detecting input, as described in any one of claims 1 to 3. An input device characterized by the following features.

5. The input medium provides input to the input device by moving while in contact with the main surface of the cover member for the input device, The aforementioned input medium is It is an input pen having a tip that has a convex spherical shape on the outside. The input device according to claim 4, characterized in that

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