resin composition
A resin composition with polyphenylene sulfide and specific solvents addresses the need for high refractive index, transparency, and chemical resistance, enabling effective microlens fabrication with suitable etching rates and EBR.
Patent Information
- Authority / Receiving Office
- JP · JP
- Patent Type
- Patents
- Current Assignee / Owner
- NISSAN CHEM CORP
- Filing Date
- 2023-01-10
- Publication Date
- 2026-06-02
AI Technical Summary
Existing materials lack a high refractive index, transparency, long-term reliability, chemical resistance, and a suitable dry etching rate for microlens fabrication, while also being suitable for Edge Bead Removal (EBR) in wafer processing.
A resin composition containing polyphenylene sulfide with a phenolic hydroxyl group and specific organic solvents, along with optional polyfunctional epoxy compounds and surfactants, is developed to achieve the desired properties.
The resin composition enables EBR, forms a resin film with high refractive index and transparency, exhibits excellent long-term reliability and chemical resistance, and has an appropriate dry etching rate, making it suitable for microlens applications.
Smart Images

Figure 0007868664000001 
Figure 0007868664000002 
Figure 0007868664000003