Detection of probabilistic process windows
The physics-based inverse line scanning model addresses biased roughness measurements in SEMs by analyzing frequency dependence, offering unbiased and precise roughness estimation to enhance semiconductor manufacturing accuracy.
JP7875607B2Inactive Publication Date: 2026-06-18FRACTILIA LLC
Patent Information
- Authority / Receiving Office
- JP · JP
- Patent Type
- Patents
- Current Assignee / Owner
- FRACTILIA LLC
- Filing Date
- 2022-09-09
- Publication Date
- 2026-06-18
- Estimated Expiration
- Not applicable · inactive patent
Smart Images
Figure 0007875607000036 
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Abstract
A method, system, and computer readable medium for configuring a lithography tool to manufacture semiconductor devices, the method including: selecting a first variable, selecting a second variable, selecting at least one response variable that is a function of the first variable and the second variable, determining a measurement uncertainty for each response variable, determining a plurality of probabilities representing a plurality of indications of whether a plurality of points associated with a lithography process meet a specification requirement for each response variable based on measurements of the response variables and the measurement uncertainties of the response variables, where the plurality of probabilities represent a process window, and configuring the lithography tool to manufacture the semiconductor device based on the process window.
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