A system and method for performing deformation and stress analysis modeling within a virtual manufacturing environment.
The virtual manufacturing environment addresses the complexity of semiconductor manufacturing by enabling deformation and stress analysis directly from voxel-based models, enhancing model construction speed and reducing costs while optimizing the manufacturing process.
Patent Information
- Authority / Receiving Office
- JP · JP
- Patent Type
- Patents
- Current Assignee / Owner
- COVENTOR INC
- Filing Date
- 2021-10-14
- Publication Date
- 2026-07-01
- Estimated Expiration
- Not applicable · inactive patent
AI Technical Summary
The increasing complexity of semiconductor manufacturing processes, particularly at advanced technology nodes, leads to lengthy and costly trial-and-error experimental runs in traditional physical manufacturing environments, resulting in negative or invalid characterization results.
A virtual manufacturing environment that enables deformation and stress analysis modeling directly from voxel-based models, allowing for the simulation of process sequences without the need for interface-matched meshes, and performs stress and deformation analysis within the environment.
Accelerates the construction of structural models, reduces computational costs, and provides rapid verification of process assumptions by predicting the complete 3D structure of semiconductor devices, thereby optimizing the manufacturing process.
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