Adjustment method for multi-charged particle beam irradiation device and beam detector
The two-stage aperture beam detector system addresses the challenge of precise beam alignment and detection in multi-beam systems by using optical alignment and conductive substrates with observation holes, improving detection accuracy and reducing scattered electron noise.
JP7885656B2Inactive Publication Date: 2026-07-07NUFLARE TECH INC
Patent Information
- Authority / Receiving Office
- JP · JP
- Patent Type
- Patents
- Current Assignee / Owner
- NUFLARE TECH INC
- Filing Date
- 2022-10-24
- Publication Date
- 2026-07-07
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
To align two-stage aperture holes with high precision.SOLUTION: A beam detector includes a first aperture substrate formed with a first passage hole smaller than the inter-beam pitch of the multi-charged particle beam, a second aperture substrate formed with a second passage hole through which one detection target beam that has passed through the first passage hole can pass, and a sensor that detects a beam current of the detection target beam that has passed through the second passage hole. The second aperture substrate includes a conductive material, and a plurality of third passage holes through which light can pass are formed around the second passage hole.SELECTED DRAWING: Figure 1
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