Photosensitive colored composition, cured product, organic electroluminescent device, and image display device.

Abstract

Provided is a photosensitive coloring composition that causes little roughness of the surface of an electrode following a heat treatment. This photosensitive coloring composition is characterized: by containing (a) a coloring agent, (b) an alkali-soluble resin, (c) a photopolymerization initiator, (d) an ethylenically unsaturated compound, (e) a solvent and (f) a dispersing agent; in that the coloring agent (a) contains a compound represented by a specific general formula (I), a geometric isomer of the compound, a salt of the compound or a salt of a geometric isomer of the compound; in that the dispersing agent (f) contains an acrylic copolymer (f1) which contains repeating units represented by specific general formulae (1), (2) and (3) and does not contain a repeating unit having a quaternary ammonium group; and in that the content of chlorine atoms in the photosensitive coloring composition is 0.05 mass% or less relative to the total solids content in the photosensitive coloring composition.

Description

[Technical Field]

[0001] The present invention relates to a photosensitive colored composition, a cured product, an organic electroluminescent device, and an image display device. This application claims priority based on Japanese Patent Application No. 2020-162460, filed in Japan on September 28, 2020, and Japanese Patent Application No. 2021-024490, filed in Japan on February 18, 2021, and the contents thereof are incorporated herein by reference. [Background technology]

[0002] Liquid crystal displays (LCDs) utilize the property that the arrangement of liquid crystal molecules changes when voltage is switched on or off to the liquid crystal. Many of the components that make up an LCD cell are formed using methods that utilize photosensitive compositions, such as photolithography. These photosensitive compositions are easy to form fine structures with and are easy to process on substrates for large screens, which is why their range of application is expanding.

[0003] Image display devices containing organic electroluminescent elements (also known as organic EL) are attracting attention as next-generation flat panel displays (FPDs) due to their superior visibility and responsiveness, including contrast and viewing angle, as well as their low power consumption, thin and lightweight design, and the ability to make the display itself flexible. An organic electroluminescent element has a structure in which an organic layer containing a light-emitting layer or various functional layers is sandwiched between a pair of electrodes, at least one of which is light-transmitting. An image display device displays an image by driving a panel in which organic electroluminescent elements are arranged for each pixel. Conventionally, such organic electroluminescent devices have been manufactured by forming partitions (banks) on a substrate, and then laminating an emissive layer or various functional layers within the region enclosed by the partitions.

[0004] To deposit light-emitting layers or other films within a region enclosed by partitions, the vapor deposition method, which involves sublimating the material in a vacuum and depositing it onto a substrate, is primarily used. In recent years, wet processes such as casting, spin coating, and inkjet printing have attracted attention for film formation. In particular, inkjet printing is suitable as a method for forming organic layers on large panels because it can reduce film thickness unevenness when applied over large areas, and it is possible to achieve high resolution of displays by differentiating the coating during application, reduce the amount of material used, and improve yield.

[0005] A known method for easily forming partitions is by photolithography using a photosensitive composition. Furthermore, a known method for imparting light-shielding properties to the partitions and suppressing light leakage between pixels is to include a coloring agent in the photosensitive composition.

[0006] Patent Document 1 describes a colored photosensitive resin composition that suppresses outgassing by using a specific organic black pigment and an alkali-soluble resin. [Prior art documents] [Patent Documents]

[0007] [Patent Document 1] International Publication No. 2018 / 101314 [Overview of the project] [Problems that the invention aims to solve]

[0008] Organic electroluminescent devices come in two panel configurations: top-emission and bottom-emission. In the top-emission type, reflective electrodes such as silver are used as electrodes, and hardened materials such as partitions are created on top of them. However, during the heat treatment, components in the photosensitive composition may act, causing corrosion or migration of the metal electrodes. If irregularities occur on the electrode surface (hereinafter also referred to as surface roughness), it may not be possible to form a uniform light-emitting layer in that area, potentially causing display defects due to short circuits, etc., when an organic electroluminescent device is manufactured.

[0009] The present inventors investigated and found that the colored photosensitive resin composition described in Patent Document 1 causes surface roughness of the electrodes, which poses a practical problem.

[0010] The present invention has been made in view of the above circumstances, and aims to provide a photosensitive colored composition that causes less surface roughness of electrodes after heat treatment, and to provide a highly reliable organic light-emitting element and image display device that are free from display defects. [Means for solving the problem]

[0011] As a result of diligent research by the inventors, it was discovered that the above problems could be solved by using a specific dispersant and colorant, leading to the completion of the present invention. In other words, the gist of this invention is as follows.

[0012] [1] A photosensitive coloring composition comprising (a) a colorant, (b) an alkali-soluble resin, (c) a photopolymerization initiator, (d) an ethylenically unsaturated compound, (e) a solvent, and (f) a dispersant, The coloring agent (a) contains at least one selected from the group consisting of a compound represented by the following general formula (I), a geometric isomer of the compound, a salt of the compound, and a salt of a geometric isomer of the compound. The (f) dispersant contains at least repeating units represented by the following general formulas (1), (2), and (3), and contains an acrylic copolymer (f1) that does not have repeating units containing quaternary ammonium groups. A photosensitive colored composition characterized in that the content of chlorine atoms in the photosensitive colored composition is 0.05% by mass or less relative to the total solid content of the photosensitive colored composition.

[0013] [ka]

[0014] (In formula (I), R 1 and R 6 These are, independently of each other, a hydrogen atom, CH3, CF3, a fluorine atom, or a chlorine atom; R2 , R 3 , R 4 , R 5 , R 7 , R 8 , R 9 and R 10 are each independently of the others a hydrogen atom, a halogen atom, R 11 , COOH, COOR 11 , COO - , CONH2, CONHR 11 , CONR 11 R 12 , CN, OH, OR 11 , COCR 11 , OOCNH2, OOCNHR 11 , OOCNR 11 R 12 , NO2, NH2, NHR 11 , NR 11 R 12 , NHCOR 12 , NR 11 COR 12 , N=CH2, N=CHR 11 , N=CR 11 R 12 , SH, SR 11 , SOR 11 , SO2R 11 , SO3R 11 , SO3H, SO3 - , SO2NH2, SO2NHR 11 or SO2NR 11 R 12 ; R 2 and R 3 , R 3 and R 4 , R 4 and R 5 , R 7 and R 8 , R 8 and R 9 , and R 9 and R 10 selected from the group consisting of at least one combination are directly bonded to each other or can also be bonded to each other by an oxygen atom, a sulfur atom, NH or NR 11 bridge; R 11 and R 12These are, independently of each other, an alkyl group having 1 to 12 carbon atoms, a cycloalkyl group having 3 to 12 carbon atoms, an alkenyl group having 2 to 12 carbon atoms, a cycloalkenyl group having 3 to 12 carbon atoms, or an alkynyl group having 2 to 12 carbon atoms.

[0015] [ka]

[0016] (In formula (1), R 31 This is an optionally substituted alkyl group, an optionally substituted aryl group, or an optionally substituted aralkyl group. R 32 This is either a hydrogen atom or a methyl group. * represents a bond.

[0017] [ka]

[0018] (In formula (2), R 33 R is a methylene group, an ethylene group, or a propylene group. 34 R is an alkyl group which may have substituents, 35 This is either a hydrogen atom or a methyl group. n is an integer between 1 and 20. * represents a bond.

[0019] [ka]

[0020] (In formula (3), R 36 and R 37 Each of these is independently a hydrogen atom, an optionally substituted alkyl group, an optionally substituted aryl group, or an optionally substituted aralkyl group, and R 36 and R 37 These may combine with each other to form a ring structure. R 38 This is a hydrogen atom or a methyl group. Z is a divalent linking group. * represents a bond. [2] The photosensitive coloring composition according to [1], wherein the coloring agent (a) comprises an organic coloring pigment. [3] A photosensitive coloring composition comprising (a) a colorant, (b) an alkali-soluble resin, (c) a photopolymerization initiator, (d) an ethylenically unsaturated compound, (e) a solvent, and (f) a dispersant, The optical density per 1 μm of film thickness of the cured coating is 0.5 or higher. The (f) dispersant contains at least repeating units represented by the following general formulas (1), (2), and (3), and contains an acrylic copolymer (f1) that does not have repeating units containing quaternary ammonium groups. A photosensitive colored composition characterized in that the content of chlorine atoms in the photosensitive colored composition is 0.05% by mass or less relative to the total solid content of the photosensitive colored composition.

[0021] [ka]

[0022] (In formula (1), R 31 This is an optionally substituted alkyl group, an optionally substituted aryl group, or an optionally substituted aralkyl group. R 32 This is a hydrogen atom or a methyl group. * represents a bond.

[0023] [ka]

[0024] (In formula (2), R 33 R is a methylene group, an ethylene group, or a propylene group. 34 R is an alkyl group which may have substituents, 35 This is a hydrogen atom or a methyl group. n is an integer between 1 and 20. * represents a bond.

[0025] [ka]

[0026] (In formula (3), R 36 and R 37 Each of these is independently a hydrogen atom, an optionally substituted alkyl group, an optionally substituted aryl group, or an optionally substituted aralkyl group, and R 36 and R 37 These may combine with each other to form a ring structure. R 38 This is a hydrogen atom or a methyl group. Z is a divalent linking group. * represents a bond. [4] The photosensitive coloring composition according to [3], wherein the coloring agent (a) comprises at least one selected from the group consisting of red pigments and orange pigments, and at least one selected from the group consisting of blue pigments and purple pigments. [5] The photosensitive coloring composition according to any one of [1] to [4], wherein the acrylic copolymer (f1) is a block copolymer. [6] The photosensitive coloring composition according to any one of [1] to [5], wherein the amine value of the acrylic copolymer (f1) is 90 mg KOH / g or more. [7] The photosensitive coloring composition according to any one of [1] to [6], wherein the coloring agent (a) is present in an amount of 10% by mass or more relative to the total solid content of the photosensitive coloring composition. [8] A photosensitive colored composition according to any one of [1] to [7], used to form a partition wall of an organic electroluminescent element. [9] A cured product obtained by curing any of the photosensitive coloring compositions described in [1] to [8]. Organic electroluminescent element containing the cured product described in

[10] [9].

[11] An image display device comprising the organic electroluminescent element described in

[10] . [Effects of the Invention]

[0027] According to the present invention, it is possible to provide a photosensitive coloring composition that does not cause surface roughness on electrodes after heat treatment. [Modes for carrying out the invention]

[0028] The embodiments of the present invention will be described in detail below, but the present invention is not limited to the embodiments described below and can be implemented with various modifications within the scope of its gist. In this invention, "(meth)acrylic" means "acrylic and / or methacrylic," and the same applies to "(meth)acrylate" and "(meth)acryloyl."

[0029] "(Co)polymer" means that it includes both monopolymers (homopolymers) and copolymers, and "acid (anhydride)" and "(anhydride)...acid" mean that it includes both the acid and its anhydride. In the present invention, "acrylic resin" means a (co)polymer containing (meth)acrylic acid, or a (co)polymer containing a (meth)acrylic acid ester having a carboxyl group.

[0030] In this invention, "monomer" is a term used in contrast to so-called polymers, and includes not only monomers in the narrow sense, but also dimers, trimers, and oligomers. In this invention, "total solids content" means the total amount of components other than the solvent contained in the photosensitive coloring composition or pigment dispersion. Even if the components other than the solvent are liquid at room temperature, those components are not included in the solvent and are included in the total solids content. In this invention, "weight-average molecular weight" means the weight-average molecular weight (Mw) calculated on a polystyrene basis by GPC (gel permeation chromatography). In this invention, unless otherwise specified, "amine value" refers to the amine value on an effective solids basis, and is expressed as the amount of base and the mass of equivalent KOH per gram of solids of the dispersant. The measurement method will be described later. Unless otherwise specified, "acid value" refers to the acid value on an effective solids basis, and is calculated by neutralization titration.

[0031] Regarding pigments, "CI" stands for Color Index.

[0032] In this specification, percentages and parts expressed in "mass" are synonymous with percentages and parts expressed in "weight".

[0033] [Photosensitive coloring composition] The photosensitive coloring composition of the present invention is (a) Colorants (b) Alkali-soluble resins (c) Photopolymerization initiator (d) Ethylene unsaturated compounds (e) solvent (f) Dispersant It contains as an essential component. In a first embodiment, (a) the coloring agent contains at least one selected from the group consisting of a compound represented by general formula (I), a geometric isomer of a compound represented by general formula (I), a salt of a compound represented by general formula (I), or a salt of a geometric isomer of a compound represented by general formula (I). In a second embodiment, the optical density per 1 μm of film thickness of the coating film obtained by curing the photosensitive coloring composition of the present invention is 0.5 or more. Furthermore, as needed, the product may also contain other components such as adhesion enhancers like silane coupling agents, surfactants, pigment derivatives, photoacid generators, crosslinking agents, mercapto compounds, and polymerization inhibitors. Typically, each component is used in a state where it is dissolved or dispersed in a solvent.

[0034] (a) Colorants The photosensitive colored composition of the present invention contains (a) a coloring agent. By containing (a) a coloring agent, appropriate light absorption can be obtained, and in particular, appropriate light shielding when used for applications such as forming light-shielding members such as partitions. In the first embodiment, (a) as a coloring agent, it contains at least one selected from the group consisting of a compound represented by general formula (I), a geometric isomer of a compound represented by general formula (I), a salt of a compound represented by general formula (I), and a salt of a geometric isomer of a compound represented by general formula (I). The compound represented by the general formula (I) (hereinafter also referred to as "compound (I)") is an organic black pigment. By having a rigid skeleton with an aromatic ring, it is presumed that the gas containing chlorine generated during heat treatment hardly penetrates into the coating film. Also, since the transmittance of ultraviolet rays is high, the applied photosensitive composition is likely to be photocured, and it is useful in these respects.

[0035]

Chemical formula

[0036] In formula (I), R 11 and R 16 each independently represents a hydrogen atom, CH3, CF3, a fluorine atom or a chlorine atom; R 12 , R 13 , R 14 , R 15 , R 17 , R 18 , R 19 and R 20 each independently represents a hydrogen atom, a halogen atom, R 21 , COOH, COOR 21 , COO - , CONH2, CONHR 21 , CONR 21 R 22 , CN, OH, OR 21 , COCR 21 , OOCNH2, OOCNHR 21 , OOCNR 21 R 22 , NO2, NH2, NHR 21 , NR 21 R 22 , NHCOR 22 , NR 21 COR 22 , N=CH2, N=CHR 21 , N=CR 21 R 22 , SH, SR 21 , SOR 21 , SO2R 21 , SO3R 21 , SO3H, SO3 - , SO2NH2, SO2NHR 21or SO2NR 21 R 22 It represents; R 12 and R 13 , R 13 and R 14 , R 14 and R 15 , R 17 and R 18 , R 18 and R 19 , and R 19 and R 20 At least one combination selected from the group consisting of these elements may be directly bonded to each other, or it may consist of an oxygen atom, a sulfur atom, NH, or NR. 21 They may be connected to each other by bridges; R 21 and R 22 Each of these independently represents an alkyl group having 1 to 12 carbon atoms, a cycloalkyl group having 3 to 12 carbon atoms, an alkenyl group having 2 to 12 carbon atoms, a cycloalkenyl group having 3 to 12 carbon atoms, or an alkynyl group having 2 to 12 carbon atoms.

[0037] Compound (I) and its geometric isomers have the following core structures (with substituents omitted from the structural formulas), and the trans-trans isomer is probably the most stable.

[0038] [ka]

[0039] If compound (I) is anionic, it is preferable that its charge is compensated by any known suitable cation, such as a metal, organic, inorganic, or metal-organic cation, specifically alkali metals, alkaline earth metals, transition metals, primary ammonium, secondary ammonium, tertiary ammonium such as trialkylammonium, quaternary ammonium such as tetraalkylammonium, or an organometallic complex. Furthermore, if the geometric isomer of compound (I) is anionic, it is preferable that it be a similar salt.

[0040] In the substituents of general formula (I) and their definitions, the following are preferred because they tend to increase the shielding rate. This is because the following substituents do not absorb and are not thought to affect the hue of the pigment. R 12 , R 14 , R 15 , R 17 , R 19 and R 20 Each of these atoms is independently preferably a hydrogen atom, a fluorine atom, or a chlorine atom, and more preferably a hydrogen atom. R 13 and R 18 Each of these is independently preferably a hydrogen atom, NO2, OCH3, OC2H5, a bromine atom, a chlorine atom, CH3, C2H5, N(CH3)2, N(CH3)(C2H5), N(C2H5)2, α-naphthyl, β-naphthyl, SO3H, or SO3 - It is more preferably a hydrogen atom or SO3H, and particularly preferably a hydrogen atom.

[0041] R 11 and R 16 Each of these is independently preferably a hydrogen atom, CH3, or CF3, and more preferably a hydrogen atom. Preferably, R 11 and R 16 , R 12 and R 17 , R 13 and R 18 , R 14 and R 19 , and R 15 and R 20 At least one combination selected from the group consisting of is identical, and more preferably, R 11 is R 16 It is identical to R 12 is R 17 It is identical to R 13 is R 18 It is identical to R 14 is R 19 It is identical to and R 15 is R 20 It is identical to [the other one].

[0042] C1-C12 alkyl groups include, for example, methyl, ethyl, n-propyl, isopropyl, n-butyl, sec-butyl, isobutyl, tert-butyl, 2-methylbutyl, n-pentyl, 2-pentyl, 3-pentyl, 2,2-dimethylpropyl, n-hexyl, n-heptyl, n-octyl, 1,1,3,3-tetramethylbutyl, 2-ethylhexyl, nonyl, decyl, undecyl, or dodecyl groups.

[0043] Examples of cycloalkyl groups having 3 to 12 carbon atoms include cyclopropyl, cyclopropylmethyl, cyclobutyl, cyclopentyl, cyclohexyl, methylcyclohexyl, trimethylcyclohexyl, thuzyl, norbornyl, bornyl, norcalyl, calyl, menthyl, norpinyl, pinyl, adamantane-1-yl, or adamantane-2-yl.

[0044] Alkenyl groups having 2 to 12 carbon atoms include, for example, vinyl, allyl, 2-propen-2-yl, 2-buten-1-yl, 3-buten-1-yl, 1,3-butadiene-2-yl, 2-penten-1-yl, 3-penten-2-yl, 2-methyl-1-buten-3-yl, 2-methyl-3-buten-2-yl, 3-methyl-2-buten-1-yl, 1,4-pentadiene-3-yl, hexenyl, octenyl, nonenyl, decenyl, or dodecenyl groups.

[0045] Examples of cycloalkenyl groups having 3 to 12 carbon atoms include 2-cyclobuten-1-yl, 2-cyclopenten-1-yl, 2-cyclohexen-1-yl, 3-cyclohexen-1-yl, 2,4-cyclohexadiene-1-yl, 1-p-menten-8-yl, 4(10)-thujen-10-yl, 2-norbornene-1-yl, 2,5-norbornadiene-1-yl, 7,7-dimethyl-2,4-norcaladien-3-yl, or camphenyl.

[0046] Alkynyl groups having 2 to 12 carbon atoms include, for example, 1-propyne-3-yl group, 1-butyne-4-yl group, 1-pentyne-5-yl group, 2-methyl-3-butyne-2-yl group, 1,4-pentadiiin-3-yl group, 1,3-pentadiiin-5-yl group, 1-hexyn-6-yl group, cis-3-methyl-2-penten-4-in-1-yl group, trans-3-methyl-2-penten-4-in-1-yl group, 1,3-hexadiiin-5-yl group, 1-octin-8-yl group, 1-nonin-9-yl group, 1-decine-10-yl group, or 1-dodecine-12-yl group.

[0047] Halogen atoms include, for example, fluorine, chlorine, bromine, or iodine atoms.

[0048] The compound represented by the general formula (I) is preferably a compound that includes at least one selected from the group consisting of the compound represented by the general formula (II) below (hereinafter also referred to as "compound (II)") and geometric isomers of compound (II).

[0049] [ka]

[0050] An example of such a compound is Irgaphor® Black S 0100 CF (manufactured by BASF), which is sold under the trade name.

[0051] This organic black pigment is preferably dispersed and used by the method described later. Furthermore, the presence of a sulfonic acid derivative of compound (I), or a sulfonic acid derivative of a geometric isomer of compound (I), particularly a sulfonic acid derivative of compound (II), or a sulfonic acid derivative of a geometric isomer of compound (II), during dispersion may improve dispersibility and storage properties.

[0052] In a first embodiment of the present invention, (A) the colorant may contain other colorants in addition to the compound of general formula (I). Pigments are preferred as the other colorants, and these pigments may be organic or inorganic. From the viewpoint of high resistance and low dielectric constant, organic pigments are more preferred, and the organic colorants described later are even more preferred. Among organic coloring pigments, it is preferable to use compound (I) and a blue pigment from the viewpoint of achieving uniform transmittance in the high wavelength range of the visible light region. Pigment Blue B60, 15:6, and 16 are preferred, and Pigment Blue B60 is more preferred. On the other hand, from the viewpoint of making the transmittance uniform across the entire visible light region, it is preferable to use, in addition to compound (I), at least one selected from the group consisting of red pigments and orange pigments, and at least one selected from the group consisting of blue pigments and purple pigments.

[0053] In a second embodiment, the photosensitive colored composition of the present invention has an optical density per 1 μm of film thickness of the cured coating film (hereinafter sometimes referred to as "OD per unit film thickness") of 0.5 or more. (a) By containing a colorant and setting the OD per unit film thickness to be above the lower limit, the light-shielding properties of the resulting cured product, particularly the partition wall, are improved.

[0054] The optical density (OD) per unit film thickness can be calculated by measuring the optical density and film thickness of a coating obtained by curing a photosensitive coloring composition, and then dividing the optical density by the film thickness. The conditions for preparing the coating are not particularly limited, but for example, the conditions described in the examples below can be used. To make the OD per unit film thickness equal to or greater than the lower limit, for example, (a) the type of colorant or its proportion in the total solid content can be adjusted as appropriate.

[0055] In a second embodiment of the present invention, the type of colorant that can be used in the photosensitive colored composition is not particularly limited, and pigments or dyes may be used. Among these, pigments are preferred from the viewpoint of durability.

[0056] (a) The pigment contained in the colorant may be one type or two or more types. In particular, from the viewpoint of achieving both uniform light shielding in the visible region and OD per unit film thickness, it is preferable to have two or more types. (a) The types of pigments that can be used as colorants are not particularly limited, but examples include organic colorants and black pigments. Here, organic colorants refer to organic pigments that exhibit colors other than black, and examples include red pigments, orange pigments, blue pigments, purple pigments, green pigments, and yellow pigments.

[0057] Among pigments, organic coloring pigments are preferred from the viewpoint of high resistance and low dielectric constant. Furthermore, from the viewpoint of light shielding, compound (I) or other black pigments are preferred.

[0058] Organic coloring pigments may be used individually or in combination of two or more. In particular, from the viewpoint of achieving an OD of 0.5 or more per unit film thickness, it is more preferable to use a combination of organic coloring pigments of different colors, and even more preferable to use a combination of organic coloring pigments that exhibit a color close to black.

[0059] The chemical structures of these organic coloring pigments are not particularly limited, but examples include azo, phthalocyanine, quinacridone, benzimidazolon, isoindolinone, dioxazine, indanthrene, and perylene pigments. Specific examples of usable pigments are shown below by their pigment numbers. In the following examples such as "CI Pigment Red 2," "CI" stands for Color Index.

[0060] As for red pigments, CI Pigment Red 1, 2, 3, 4, 5, 6, 7, 8, 9, 12, 14, 15, 16, 17, 21, 22, 23, 31, 32, 37, 38, 41, 47, 48, 48:1, 48:2, 48:3, 48:4, 49, 49:1, 49:2, 50:1, 52:1, 52:2, 53, 53:1, 53:2, 53:3, 57, 57:1, 57:2, 58:4, 60, 63, 63:1, 63:2, 64, 64:1, 68, 69, 81, 81:1, 81:2, 81:3, 81:4, 83, 88, 90:1, 101, 101:1, 104, 108, 108:1, 109, 112, 113, 114, 122, 123, 144, 146, 147, 149, 15 1, 166, 168, 169, 170, 172, 173, 174, 175, 176, 177, 178, 179, 181, 184, 185, 187, 188, 190, 193, 194, 200, 202, 206, 207, 208, 209, 210, 214, 216, 220, 221, 224, 230, 231, 232, 233, 23 5, 236, 237, 238, 239, 242, 243, 245, 247, 249, 250, 251, 253, 254, 255, 256, 257, 258, 259, 260, 262, 263, 264, 265, 266, 267, 268, 269, 270, 271, 272, 273, 274, 275, and 276 can be listed. From the viewpoint of light shielding and dispersion, CI pigment red 48:1, 122, 149, 168, 177, 179, 194, 202, 206, 207, 209, 224, 242, and 254 can be preferred, and even more preferably CI pigment red 177, 209, 224, and 254 can be listed. In terms of dispersibility and light-shielding properties, CI Pigment Red 177, 254, and 272 are preferred, and when curing the photosensitive colored composition with ultraviolet light, a red pigment with a low ultraviolet absorption rate is preferred, and from this viewpoint, CI Pigment Red 254 and 272 are more preferred.

[0061] Examples of orange pigments include CI Pigment Orange 1, 2, 5, 13, 16, 17, 19, 20, 21, 22, 23, 24, 34, 36, 38, 39, 43, 46, 48, 49, 61, 62, 64, 65, 67, 68, 69, 70, 71, 72, 73, 74, 75, 77, 78, and 79. From the viewpoint of dispersibility and light-shielding properties, CI Pigment Orange 13, 43, 64, and 72 are preferred. When curing the photosensitive colored composition with ultraviolet light, orange pigments with low ultraviolet absorption rates are preferred, and from this viewpoint, CI Pigment Orange 64 and 72 are more preferred.

[0062] Examples of blue pigments include CI Pigment Blue 1, 1:2, 9, 14, 15, 15:1, 15:2, 15:3, 15:4, 15:6, 16, 17, 19, 25, 27, 28, 29, 33, 35, 36, 56, 56:1, 60, 61, 61:1, 62, 63, 66, 67, 68, 71, 72, 73, 74, 75, 76, 78, and 79. From the viewpoint of light shielding, preferred are CI Pigment Blue 15, 15:1, 15:2, 15:3, 15:4, 15:6, and 60, and even more preferably CI Pigment Blue 15:6. In terms of dispersibility and light-shielding properties, CI Pigment Blue 15:6, 16, and 60 are preferred, and when the photosensitive coloring composition is cured with ultraviolet light, a blue pigment with a low ultraviolet absorption rate is preferred, and from this viewpoint, CI Pigment Blue 60 is more preferred.

[0063] Examples of purple pigments include CI Pigment Violet 1, 1:1, 2, 2:2, 3, 3:1, 3:3, 5, 5:1, 14, 15, 16, 19, 23, 25, 27, 29, 31, 32, 37, 39, 42, 44, 47, 49, and 50. From the viewpoint of light-shielding properties, CI Pigment Violet 19, 23, and 29 are preferred, and CI Pigment Violet 23 is even more preferred. In terms of dispersibility and light-shielding properties, CI Pigment Violet 23 and 29 are preferred, and when the photosensitive coloring composition is cured with ultraviolet light, a purple pigment with a low ultraviolet absorption rate is preferred, and from this viewpoint, CI Pigment Violet 29 is more preferred.

[0064] Examples of green pigments include CI Pigment Green 1, 2, 4, 7, 8, 10, 13, 14, 15, 17, 18, 19, 26, 36, 45, 48, 50, 51, 54, 55, 58, and 59. Preferably, CI Pigment Green 7 and 36 are used.

[0065] As for yellow pigments, CI Pigment Yellow 1, 1:1, 2, 3, 4, 5, 6, 9, 10, 12, 13, 14, 16, 17, 24, 31, 32, 34, 35, 35:1, 36, 36:1, 37, 37:1, 40, 41, 42, 43, 48, 53, 55, 61, 62, 62:1, 63, 65, 73, 74, 75, 81, 83, 87, 93, 94, 95, 97, 100, 101, 104, 105, 108, 109, 110, 111, 116, 117, 119, 120, 126, 127, 127:1, 128, 129, 133, 134, 1 We can list 36, 138, 139, 142, 147, 148, 150, 151, 153, 154, 155, 157, 158, 159, 160, 161, 162, 163, 164, 165, 166, 167, 168, 169, 170, 172, 173, 174, 175, 176, 180, 181, 182, 183, 184, 185, 188, 189, 190, 191, 191:1, 192, 193, 194, 195, 196, 197, 198, 199, 200, 202, 203, 204, 205, 206, 207, and 208. Preferably, CI Pigment Yellow 83, 117, 129, 138, 139, 150, 154, 155, 180, 185 can be cited, and more preferably, CI Pigment Yellow 83, 138, 139, 150, 180.

[0066] From the viewpoint of light shielding properties of the cured product and control of shape and steps, at least one pigment selected from the group consisting of red pigment, orange pigment, blue pigment, and purple pigment is preferred.

[0067] From the viewpoint of controlling the light-shielding properties of the cured product, as well as its shape and any unevenness, it is preferable to include at least one of the following pigments. Red pigment: CI Pigment Red 177, 254, 272 Orange pigment: CI Pigment Orange 43, 64, 72 Blue pigment: CI Pigment Blue 15:6, 60 Purple pigment: CI Pigment Violet 23, 29

[0068] When using two or more organic coloring pigments in combination, there are no particular limitations on the combination of organic coloring pigments, but from the viewpoint of light shielding, it is preferable to use at least one selected from the group consisting of red pigments and orange pigments, and at least one selected from the group consisting of blue pigments and purple pigments. While there are no particular limitations on the color combinations, from the standpoint of light-blocking properties, examples include combinations of red and blue pigments, blue and orange pigments, and blue, orange, and purple pigments.

[0069] Organic coloring pigments, organic black pigments other than the organic black pigment represented by general formula (I), and inorganic black pigments can be used. Examples of organic black pigments other than those represented by general formula (I) include aniline black and perylene black.

[0070] Examples of inorganic black pigments include those described in International Publication No. 2018 / 101314.

[0071] When using these colorants, if the colorant contains chlorine atoms, it is possible to use them by adjusting the amount added so that the amount of chlorine does not increase too much.

[0072] These pigments are preferably used in a dispersed manner such that the average particle size is typically 1 μm or less, preferably 0.5 μm or less, and more preferably 0.25 μm or less. Here, the basis for the average particle size is the number of pigment particles. In the photosensitive colored composition of the present invention, the average particle size of the pigment is determined from the pigment particle size measured by dynamic light scattering (DLS). Particle size measurement is performed on a sufficiently diluted photosensitive colored composition (usually diluted to a pigment concentration of about 0.005 to 0.2% by mass; however, if there is a concentration recommended by the measuring instrument, that concentration should be followed) and measured at 25°C.

[0073] In the photosensitive colored composition of the second aspect of the present invention, one type of colorant, such as an organic coloring pigment or a black pigment, may be used alone, or two or more types may be used in combination.

[0074] In addition to the organic coloring pigments and black pigments mentioned above, dyes may also be used. Examples of dyes that can be used as coloring agents include those described in International Publication No. 2018 / 101314.

[0075] <(b) Alkali-soluble resin> The alkali-soluble resin used in the present invention is not particularly limited as long as it contains a carboxyl group or a hydroxyl group, and examples include epoxy (meth)acrylate resins, acrylic resins, carboxyl group-containing epoxy resins, carboxyl group-containing urethane resins, novolac resins, and polyvinylphenol resins. (b1) Epoxy (meth)acrylate resin (b2) Acrylic copolymer resin These are preferably used from the standpoint of excellent plate-making properties. These can be used individually or in combination of two or more types.

[0076] <(b1) Epoxy (meth)acrylate resin> (b1) Epoxy (meth)acrylate resins are resins obtained by reacting an epoxy compound (epoxy resin) with an α,β-unsaturated monocarboxylic acid and / or an α,β-unsaturated monocarboxylic acid ester having a carboxyl group in the ester portion, and then reacting the resulting hydroxyl group with a compound having two or more substituents that can react with hydroxyl groups, such as a polybasic acid and / or its anhydride. Resins obtained by reacting a compound having two or more substituents that can react with hydroxyl groups with a polybasic acid and / or its anhydride before reacting the polybasic acid and / or its anhydride with a hydroxyl group are also included in the above (b1) epoxy (meth)acrylate resins.

[0077] A resin obtained by reacting the carboxyl group of the resin obtained in the above reaction with a compound having a further reactive functional group is also included in the above (b1) epoxy (meth)acrylate resin. Thus, epoxy (meth)acrylate resins do not substantially contain epoxy groups in terms of their chemical structure and are not limited to "(meth)acrylate," but since epoxy compounds (epoxy resins) are used as raw materials and "(meth)acrylate" is a representative example, they are named in this way according to convention.

[0078] In the present invention, the epoxy (meth)acrylate resin used is preferably (b1-1) and / or epoxy (meth)acrylate resin (b1-2) described below (hereinafter sometimes referred to as "carboxyl group-containing epoxy (meth)acrylate resin"), from the viewpoint of developability and reliability. Furthermore, (b1) as an epoxy (meth)acrylate resin, those having aromatic rings in the main chain are more preferably used from the viewpoint of outgassing.

[0079] <Epoxy (meth)acrylate resin (b1-1)> An alkali-soluble resin obtained by adding an α,β-unsaturated monocarboxylic acid or an α,β-unsaturated monocarboxylic acid ester having a carboxyl group to an epoxy resin, optionally reacting it with an isocyanate group-containing compound, and then further reacting it with a polybasic acid and / or its anhydride. <Epoxy (meth)acrylate resin (b1-2)> An alkali-soluble resin obtained by adding an α,β-unsaturated monocarboxylic acid or an α,β-unsaturated monocarboxylic acid ester having a carboxyl group to an epoxy resin, optionally reacting it with an isocyanate group-containing compound, and then further reacting it with a polyhydric alcohol and a polybasic acid and / or its anhydride.

[0080] Here, the term epoxy resin includes the raw material compounds before the resin is formed by thermal curing, and the epoxy resin can be appropriately selected from known epoxy resins. Furthermore, the epoxy resin can be a compound obtained by reacting a phenolic compound with an epihalohydrin. The phenolic compound is preferably a compound having two or more phenolic hydroxyl groups, and may be a monomer or a polymer. Suitable epoxy resins for use as raw materials include, for example, cresol novolac type epoxy resin, phenol novolac type epoxy resin, bisphenol A type epoxy resin, bisphenol F type epoxy resin, trisphenolmethane type epoxy resin, biphenyl novolac type epoxy resin, naphthalene novolac type epoxy resin, epoxy resins that are reaction products of a polyaddition reaction between dicyclopentadiene and phenol or cresol and epihalohydrin, adamantyl group-containing epoxy resin, and fluorene type epoxy resin. Among these, those having aromatic rings in the main chain are more preferably used.

[0081] Examples of epoxy resins include bisphenol A type epoxy resins (e.g., "jER(registered trademark, hereinafter the same) 828", "jER1001", "jER1002", "jER1004", etc. manufactured by Mitsubishi Chemical Corporation), epoxy resins obtained by the reaction of alcoholic hydroxyl groups of bisphenol A type epoxy resin with epichlorohydrin (e.g., "NER-1302" manufactured by Nippon Kayaku Co., Ltd. (epoxy equivalent 323, softening point 76℃)), and bisphenol F type resins (e.g., "jER" manufactured by Mitsubishi Chemical Corporation). Epoxy resins obtained by the reaction of alcoholic hydroxyl groups of bisphenol F type epoxy resins with epichlorohydrin (e.g., "NER-7406" manufactured by Nippon Kayaku Co., Ltd. (epoxy equivalent 350, softening point 66°C)), bisphenol S type epoxy resins, biphenyl glycidyl ether (e.g., "YX-4000" manufactured by Mitsubishi Chemical Corporation), phenol novolac type epoxy resins (e.g., "EPPN" manufactured by Nippon Kayaku Co., Ltd.) -201", Mitsubishi Chemical's "EP-152", "EP-154", Dow Chemical's "DEN-438"), (o,m,p-)cresol novolac type epoxy resin (e.g., Nippon Kayaku's "EOCN(registered trademark, same hereinafter)-102S", "EOCN-1020", "EOCN-104S"), triglycidyl isocyanurate (e.g., Nissan Chemical's "TEPIC(registered trademark)"), trisphenolmethane type epoxy resin (e.g., Nippon Kayaku's "EPPN(registered trademark)") The following can be suitably used: trademarks (hereinafter the same) "-501", "EPPN-502", "EPPN-503", alicyclic epoxy resins (Daicel Corporation's "Celoxide (registered trademark, hereinafter the same) 2021P", "Celoxide EHPE"), epoxy resins obtained by glycidylating phenolic resins produced by the reaction of dicyclopentadiene and phenol (for example, DIC Corporation's "EXA-7200", Nippon Kayaku Co., Ltd.'s "NC-7300"), and epoxy resins represented by the following general formulas (B1) to (B4).Specifically, examples include "XD-1000" manufactured by Nippon Kayaku Co., Ltd. as the epoxy resin represented by the following general formula (B1), "NC-3000" manufactured by Nippon Kayaku Co., Ltd. as the epoxy resin represented by the following general formula (B2), "E-201" manufactured by Osaka Organic Chemical Industry Co., Ltd. as the epoxy resin represented by the following general formula (B3), and "ESF-300" manufactured by Nippon Steel & Sumitomo Metal Chemical Co., Ltd. as the epoxy resin represented by the following general formula (B4).

[0082] [ka]

[0083] In the above general formula (B1), a is the mean value and represents a number between 0 and 10, R 111 Each of these independently represents a hydrogen atom, a halogen atom, a C1-C8 alkyl group, a C3-C10 cycloalkyl group, a phenyl group, a naphthyl group, or a biphenyl group. Note that there are multiple R groups present in one molecule. 111 These may be the same or different.

[0084] [ka]

[0085] In the general formula (B2) above, b1 and b2 are each independent mean values, representing numbers from 0 to 10, and R 121 Each of these independently represents a hydrogen atom, a halogen atom, a C1-C8 alkyl group, a C3-C10 cycloalkyl group, a phenyl group, a naphthyl group, or a biphenyl group. Note that there are multiple R groups present in one molecule. 121 These may be the same or different.

[0086] [ka]

[0087] In the above general formula (B3), X represents a linking group represented by the following general formula (B3-1) or (B3-2), provided that the molecular structure contains one or more adamantane structures. c represents 2 or 3.

[0088] [ka]

[0089] In the above general formulas (B3-1) and (B3-2), R 131 ~R 134 and R 135 ~R 137 Each of these independently represents an optionally substituted adamantyl group, a hydrogen atom, an optionally substituted C1-C12 alkyl group, or an optionally substituted phenyl group, and * represents a bond.

[0090] [ka]

[0091] In the general formula (B4) above, p and q each independently represent integers from 0 to 4, and R 141 and R 142 Each of these independently represents an alkyl group or halogen atom having 1 to 4 carbon atoms, R 143 and R 144 Each of the following independently represents an alkylene group with 1 to 4 carbon atoms, and x and y independently represent integers of 0 or greater.

[0092] Among these, it is preferable to use an epoxy resin represented by any of the general formulas (B1) to (B4).

[0093] Examples of α,β-unsaturated monocarboxylic acids or α,β-unsaturated monocarboxylic acid esters having a carboxyl group include (meth)acrylic acid, crotonic acid, o-, m- or p-vinylbenzoic acid, monocarboxylic acids such as α-haloalkyl, alkoxyl, halogen, nitro, and cyano-substituted derivatives of (meth)acrylic acid, 2-(meth)acryloyloxyethyl succinic acid, 2-(meth)acryloyloxyethyl adipic acid, 2-(meth)acryloyloxyethyl phthalic acid, 2-(meth)acryloyloxyethyl hexahydrophthalic acid, 2-(meth)acryloyloxyethyl maleic acid, 2-(meth)acryloyloxypropyl succinic acid, 2-(meth)acryloyloxypropyl adipic acid, 2-(meth)acryloyloxypropyl tetrahydrophthalic acid, and 2-(meth)acrylo Examples include yloxypropylphthalic acid, 2-(meth)acryloyloxypropyl maleic acid, 2-(meth)acryloyloxybutylsuccinic acid, 2-(meth)acryloyloxybutyladipic acid, 2-(meth)acryloyloxybutylhydrophthalic acid, 2-(meth)acryloyloxybutylphthalic acid, 2-(meth)acryloyloxybutylmaleic acid (meth), monomers obtained by adding lactones such as ε-caprolactone, β-propiolactone, γ-butyrolactone, and δ-valerolactone to acrylic acid, monomers obtained by adding acids (anhydrides) such as (anhydride) succinic acid, (anhydride) phthalic acid, and (anhydride) maleic acid to hydroxyalkyl (meth)acrylate or pentaerythritol tri(meth)acrylate, and (meth)acrylic acid dimers. Of these, (meth)acrylic acid is particularly preferred in terms of sensitivity.

[0094] Known methods can be used to add an α,β-unsaturated monocarboxylic acid or an α,β-unsaturated monocarboxylic acid ester having a carboxyl group to an epoxy resin. For example, an α,β-unsaturated monocarboxylic acid or an α,β-unsaturated monocarboxylic acid ester having a carboxyl group can be reacted with an epoxy resin at a temperature of 50 to 150°C in the presence of an esterification catalyst. As esterification catalysts used here, tertiary amines such as triethylamine, trimethylamine, benzyldimethylamine, and benzyldiethylamine, and quaternary ammonium salts such as tetramethylammonium chloride, tetraethylammonium chloride, and dodecyltrimethylammonium chloride can be used.

[0095] Each component of the epoxy resin, α,β-unsaturated monocarboxylic acid or α,β-unsaturated monocarboxylic acid ester having a carboxyl group, and esterification catalyst may be selected individually or used in combination of two or more components. The amount of α,β-unsaturated monocarboxylic acid or α,β-unsaturated monocarboxylic acid ester having a carboxyl group used is preferably in the range of 0.5 to 1.2 equivalents, and more preferably in the range of 0.7 to 1.1 equivalents, per equivalent of epoxy groups in the epoxy resin. By using an amount of α,β-unsaturated monocarboxylic acid or α,β-unsaturated monocarboxylic acid ester having a carboxyl group above the lower limit, insufficient introduction of unsaturated groups can be suppressed, and the subsequent reaction with polybasic acids and / or their anhydrides tends to be sufficient. On the other hand, by using an amount below the upper limit, the remaining unreacted α,β-unsaturated monocarboxylic acid or α,β-unsaturated monocarboxylic acid ester having a carboxyl group can be suppressed, and the curing properties tend to be good.

[0096] Examples of polybasic acids and / or their anhydrides include maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, trimellitic acid, benzophenonetetracarboxylic acid, methylhexahydrophthalic acid, endomethylenetetrahydrophthalic acid, chlorendic acid, methyltetrahydrophthalic acid, biphenyltetracarboxylic acid, and their anhydrides.

[0097] Preferably, the compounds are maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, trimellitic acid, biphenyltetracarboxylic acid, or their anhydrides. Particularly preferred are tetrahydrophthalic acid, biphenyltetracarboxylic acid, tetrahydrophthalic anhydride, or biphenyltetracarboxylic dianhydride.

[0098] The addition reaction of polybasic acids and / or their anhydrides can be carried out using known methods, and the target product can be obtained by continuing the reaction under conditions similar to those for the addition reaction of α,β-unsaturated monocarboxylic acids or α,β-unsaturated monocarboxylic acid esters having a carboxyl group to epoxy resins. The amount of polybasic acid and / or its anhydride component added is preferably such that the acid value of the resulting carboxyl group-containing epoxy (meth)acrylate resin is in the range of 10 to 150 mgKOH / g, and more preferably in the range of 20 to 140 mgKOH / g. Setting the amount above the lower limit tends to result in good alkali developability. Setting the amount below the upper limit tends to result in good curing performance.

[0099] During the addition reaction of polybasic acids and / or their anhydrides, polyfunctional alcohols (polyhydric alcohols) such as trimethylolpropane, ditrimethylolpropane, pentaerythritol, dipentaerythritol, trimethylolethane, and 1,2,3-propanetriol may be added to introduce a highly branched structure. In this case, there are no particular restrictions on the mixing order of the polybasic acid and / or its anhydride and the polyfunctional alcohol. Upon heating, the polybasic acid and / or its anhydride undergo an addition reaction with any hydroxyl group present in the mixture of the epoxy resin, the reaction product of an α,β-unsaturated monocarboxylic acid or an α,β-unsaturated monocarboxylic acid ester having a carboxyl group, and the polyfunctional alcohol.

[0100] By using polyhydric alcohols, the molecular weight of (b1) epoxy (meth)acrylate resin can be increased, allowing for the introduction of branching within the molecule, which tends to balance molecular weight and viscosity. Furthermore, the rate of introduction of acidic groups into the molecule can be increased, which tends to facilitate a balance between sensitivity and adhesion.

[0101] Examples of carboxyl group-containing epoxy (meth)acrylate resins include those described above, for example, those described in Korean Published Patent No. 10-2013-0022955.

[0102] The weight-average molecular weight (Mw) of carboxyl group-containing epoxy (meth)acrylate resins, measured by gel permeation chromatography (GPC), is typically 1000 or more, preferably 1500 or more, more preferably 2000 or more, more preferably 3000 or more, even more preferably 4000 or more, and particularly preferably 5000 or more, and typically 30000 or less, preferably 20000 or less, and more preferably 15000 or less. The above upper and lower limits can be combined arbitrarily. For example, 1000 to 30000 is preferred, 1500 to 20000 is more preferred, 1500 to 15000 is even more preferred, and 2000 to 15000 is even more preferred. Setting the value above the lower limit tends to suppress excessive solubility in the developer. Setting the value below the upper limit tends to make it easier to achieve good solubility in the developer.

[0103] The acid value of the carboxyl group-containing epoxy (meth)acrylate resin is not particularly limited, but is preferably 20 mg KOH / g or higher, more preferably 40 mg KOH / g or higher, even more preferably 60 mg KOH / g or higher, even more preferably 80 mg KOH / g or higher, particularly preferably 100 mg KOH / g or higher, and also preferably 200 mg KOH / g or less, more preferably 150 mg KOH / g or less, even more preferably 130 mg KOH / g or less, and particularly preferably 120 mg KOH / g or less. The above upper and lower limits can be arbitrarily combined. For example, 20 mg KOH / g to 200 mg KOH / g is preferred, 60 mg KOH / g to 150 mg KOH / g is more preferred, 80 mg KOH / g to 130 mg KOH / g is even more preferred, and 100 mg KOH / g to 130 mg KOH / g is even more preferred. Setting the value above the lower limit tends to improve developability and resolution. By keeping the value below the aforementioned upper limit, the residual film rate of the photosensitive colored composition tends to be good.

[0104] The chemical structure of the epoxy (meth)acrylate resin is not particularly limited, but from the viewpoint of developability and reliability, it is preferable to contain an epoxy (meth)acrylate resin having a substructure represented by the following general formula (b1-I) (hereinafter sometimes abbreviated as "(b1-I) epoxy (meth)acrylate resin") and / or an epoxy (meth)acrylate resin having a substructure represented by the following general formula (b1-II) (hereinafter sometimes abbreviated as "(b1-II) epoxy (meth)acrylate resin").

[0105] [ka]

[0106] In formula (b1-I), R 11 R represents a hydrogen atom or a methyl group. 12 * represents a divalent hydrocarbon group which may have substituents, k represents 1 or 2, and * represents a bond. The benzene ring in formula (b1-I) may be further substituted with any substituent.

[0107] [ka]

[0108] In formula (b1-II), R 13 Each of these independently represents a hydrogen atom or a methyl group, and R 14 R represents a divalent hydrocarbon group having a cyclic hydrocarbon group as a side chain. 15 and R 16 Each of the following independently represents a divalent aliphatic group which may have substituents, m and n independently represent integers from 0 to 2, and * represents a bond.

[0109] <(b1-I) Epoxy (meth)acrylate resin> First, we will describe in detail the epoxy (meth)acrylate resin having the substructure represented by the general formula (b1-I).

[0110] [ka]

[0111] In formula (b1-I), R 11 R represents a hydrogen atom or a methyl group. 12 * represents a divalent hydrocarbon group which may have substituents, k represents 1 or 2, and * represents a bond. The benzene ring in formula (b1-I) may be further substituted with any substituent.

[0112] (R 12 ) In the above equation (b1-I), R 12 represents a divalent hydrocarbon group which may have substituents. Examples of divalent hydrocarbon groups include divalent aliphatic groups, divalent aromatic ring groups, and groups formed by linking one or more divalent aliphatic groups with one or more divalent aromatic ring groups.

[0113] Divalent aliphatic groups include linear, branched, and cyclic aliphatic groups. Of these, linear aliphatic groups are preferred from the viewpoint of development solubility. On the other hand, cyclic aliphatic groups are preferred from the viewpoint of reducing the penetration of developer into the exposed area. The number of carbon atoms is usually 1 or more, preferably 3 or more, more preferably 6 or more, preferably 20 or less, more preferably 15 or less, and still preferably 10 or less. The above upper and lower limits can be combined arbitrarily. For example, 1 to 20 is preferred, 1 to 15 is more preferred, and 1 to 10 is still preferred. Setting the value above the lower limit tends to result in a stronger film, less surface roughness during development, and better adhesion to the substrate. Setting the value below the upper limit tends to suppress deterioration of sensitivity and film loss during development, and tends to improve resolution.

[0114] Examples of divalent linear aliphatic groups include methylene, ethylene, n-propylene, n-butylene, n-pentylene, n-hexylene, and n-heptylene groups. Among these, the methylene group is preferred from the viewpoint of the rigidity of its skeleton. Examples of divalent branched aliphatic groups include structures in which a divalent linear aliphatic group has a side chain consisting of, for example, a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, or a tert-butyl group. The number of rings in a divalent cyclic aliphatic group is not particularly limited, but is usually 1 or more, preferably 2 or more, and usually 12 or less, preferably 10 or less. The above upper and lower limits can be combined arbitrarily. For example, 1 to 12 is preferred, 1 to 10 is more preferred, and 2 to 10 is even more preferred. Setting the value above the lower limit tends to result in a stronger film and better substrate adhesion. Setting the value below the upper limit tends to suppress deterioration of sensitivity and film loss during development, and tends to improve resolution. Examples of divalent cyclic aliphatic groups include groups obtained by removing two hydrogen atoms from rings such as cyclohexane, cycloheptane, cyclodecane, cyclododecane, norbornane, isobornane, adamantane, cyclododecane, dicyclopentadiene, and dicyclopentane. Among these, groups obtained by removing two hydrogen atoms from dicyclopentadiene, dicyclopentane, and adamantane rings are preferred from the viewpoint of rigidity of the skeleton.

[0115] Substituents that the divalent aliphatic group may have include, for example, alkoxy groups having 1 to 5 carbon atoms such as methoxy and ethoxy groups; hydroxyl groups; nitro groups; cyano groups; and carboxyl groups. Among these, unsubstituted groups are preferred from the viewpoint of ease of synthesis.

[0116] Examples of divalent aromatic ring groups include divalent aromatic hydrocarbon ring groups and divalent aromatic heterocyclic ring groups. The number of carbon atoms is usually 4 or more, preferably 5 or more, more preferably 6 or more, preferably 20 or less, more preferably 15 or less, and still preferably 10 or less. The above upper and lower limits can be combined arbitrarily. For example, 4 to 20 is preferred, 5 to 15 is more preferred, and 6 to 10 is still preferred. Setting the value above the lower limit tends to result in a stronger film, less surface roughness during development, and better adhesion to the substrate. Setting the value below the upper limit tends to suppress deterioration of sensitivity and film loss during development, and tends to improve resolution.

[0117] The aromatic hydrocarbon ring in a divalent aromatic hydrocarbon ring group may be a monocyclic or fused ring. Examples of aromatic hydrocarbon ring groups include benzene rings, naphthalene rings, anthracene rings, phenanthrene rings, perylene rings, tetracene rings, pyrene rings, benzpyrene rings, chrysene rings, triphenylene rings, acenaphthene rings, fluorantene rings, and fluorene rings, all of which have two free valencies. Furthermore, the aromatic heterocyclic group may be a monocyclic or a fused ring. Examples of aromatic heterocyclic groups include furan rings, benzofuran rings, thiophene rings, benzothiophene rings, pyrrole rings, pyrazole rings, imidazole rings, oxadiazole rings, indole rings, carbazole rings, pyrroloimidazole rings, pyrrolopyrrole rings, pyrrolopyrrole rings, thienopyrrole rings, thienothiophene rings, phlopyrrole rings, phlofuran rings, thienofuran rings, benzoisoxazole rings, benzoisothiazole rings, benzimidazole rings, pyridine rings, pyrazine rings, pyridazine rings, pyrimidine rings, triazine rings, quinoline rings, isoquinoline rings, cinoline rings, quinoxaline rings, phenanthidine rings, perimidine rings, quinazoline rings, quinazolinone rings, and azulene rings, all of which have two free valencies. Among these, from the viewpoint of patterning properties, a benzene ring or naphthalene ring having two free valencies is preferred, and a benzene ring having two free valencies is more preferred.

[0118] Examples of substituents that the divalent aromatic ring group may have include hydroxyl, methyl, methoxy, ethyl, ethoxy, propyl, and propoxy groups. Of these, unsubstituted groups are preferred from the viewpoint of developability and solubility.

[0119] Examples of groups formed by linking one or more divalent aliphatic groups and one or more divalent aromatic ring groups include groups formed by linking one or more of the aforementioned divalent aliphatic groups and one or more of the aforementioned divalent aromatic ring groups. The number of divalent aliphatic groups is not particularly limited, but is usually 1 or more, preferably 2 or more, usually 10 or less, preferably 5 or less, and more preferably 3 or less. For example, 1 to 10 is preferred, 1 to 5 is more preferred, 1 to 3 is even more preferred, and 2 to 3 is particularly preferred. Setting the number above the lower limit tends to result in a stronger film, less surface roughness during development, and better adhesion to the substrate. Setting the number below the upper limit tends to suppress deterioration of sensitivity and film loss during development, and tends to improve resolution. The number of divalent aromatic ring groups is not particularly limited, but is usually 1 or more, preferably 2 or more, usually 10 or less, preferably 5 or less, and more preferably 3 or less. For example, 1 to 10 is preferred, 1 to 5 is more preferred, 1 to 3 is even more preferred, and 2 to 3 is particularly preferred. Setting the number above the lower limit tends to result in a stronger film, less surface roughness during development, and better adhesion to the substrate. Setting the number below the upper limit tends to suppress deterioration of sensitivity and film loss during development, and tends to improve resolution.

[0120] Examples of groups formed by linking one or more divalent aliphatic groups with one or more divalent aromatic ring groups include the groups represented by the following formulas (b1-IA) to (b1-IF). Among these, the group represented by the following formula (b1-IA) is preferred from the viewpoint of rigidity of the skeleton and hydrophobicity of the membrane.

[0121] [ka]

[0122] In the above formula (b1-I), k represents 1 or 2. From the viewpoint of adhesion and patternability, k is preferably 1. From the viewpoint of NMP resistance, k is preferably 2. (b1-I) epoxy (meth)acrylate may contain both a substructure where k is 1 and a substructure where k is 2.

[0123] The benzene ring in formula (b1-I) may be further substituted with any substituent. Examples of permissible substituents on the benzene ring in formula (b1-I) include hydroxyl, methyl, methoxy, ethyl, ethoxy, propyl, and propoxy groups. If the benzene ring in formula (b1-I) has substituents, the number of substituents is not particularly limited and may be one or two or more. From the viewpoint of patterning properties, it is preferable that the benzene ring in formula (b1-I) is unsubstituted.

[0124] From the viewpoint of ease of synthesis, the substructure represented by formula (b1-I) is preferably the substructure represented by the following formula (b1-I-1).

[0125] [ka]

[0126] In formula (b1-I-1), R 11 , R 12 And k are equivalent to those in the above formula (b1-I), and R X * represents a hydrogen atom or polybasic acid residue, and * represents a bonding bond. The benzene ring in formula (b1-I-1) may be further substituted with any substituent.

[0127] A polybasic acid residue refers to a monovalent group obtained by removing one OH group from a polybasic acid or its anhydride. Examples of polybasic acids include maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, trimellitic acid, benzophenonetetracarboxylic acid, methylhexahydrophthalic acid, endomethylenetetrahydrophthalic acid, chlorendic acid, methyltetrahydrophthalic acid, and biphenyltetracarboxylic acid. From the viewpoint of patterning properties, preferred are maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, trimellitic acid, and biphenyltetracarboxylic acid, and more preferably tetrahydrophthalic acid, biphenyltetracarboxylic acid, and biphenyltetracarboxylic acid.

[0128] The benzene ring in formula (b1-I-1) may be further substituted with any substituent. Preferably, the substituents listed for the benzene ring in formula (b1-I) can be used.

[0129] (b1-I) The substructure represented by formula (b1-I-1) contained in one molecule of epoxy (meth)acrylate resin may be one type or two or more types, for example, R X The one with the hydrogen atom, and R X It is acceptable for compounds containing polybasic acid residues to be present in the mixture.

[0130] Furthermore, the number of substructures represented by formula (b1-I) contained in one molecule of (b1-I) epoxy (meth)acrylate resin is not particularly limited, but is preferably 1 or more, more preferably 3 or more, preferably 20 or less, and even more preferably 15 or less. Preferably 1 to 20, more preferably 1 to 15, and even more preferably 3 to 15. Setting the value above the lower limit tends to result in a stronger film and less surface roughness during development. Setting the value below the upper limit tends to suppress deterioration of sensitivity and film loss during development, and tends to improve resolution.

[0131] (b1-I) The weight-average molecular weight (Mw) of the epoxy (meth)acrylate resin, measured by gel permeation chromatography (GPC), is not particularly limited, but is preferably 1000 or more, more preferably 1500 or more, even more preferably 2000 or more, even more preferably 3000 or more, especially preferably 4000 or more, most preferably 5000 or more, usually 30000 or less, preferably 20000 or less, and more preferably 15000 or less. The above upper and lower limits can be arbitrarily combined. For example, 1000 to 30000 is preferred, 1500 to 2000 is more preferred, 1500 to 15000 is even more preferred, and 2000 to 1500 is even more preferred. Setting it above the lower limit tends to result in a good residual film rate of the photosensitive colored composition. Setting it below the upper limit tends to result in good solubility in the developer.

[0132] (b1-I) The acid value of the epoxy (meth)acrylate resin is not particularly limited, but is preferably 20 mg KOH / g or more, more preferably 40 mg KOH / g or more, even more preferably 60 mg KOH / g or more, even more preferably 80 mg KOH / g or more, particularly preferably 100 mg KOH / g or more, and also preferably 200 mg KOH / g or less, more preferably 150 mg KOH / g or less, even more preferably 130 mg KOH / g or less, and particularly preferably 120 mg KOH / g or less. The above upper and lower limits can be arbitrarily combined. For example, 20 mg KOH / g to 200 mg KOH / g is preferred, 60 mg KOH / g to 150 mg KOH / g is more preferred, 80 mg KOH / g to 130 mg KOH / g is even more preferred, and 100 mg KOH / g to 130 mg KOH / g is even more preferred. Setting the value above the lower limit tends to improve developability and resolution. By keeping the value below the aforementioned upper limit, the residual film rate of the photosensitive colored composition tends to be good.

[0133] The following are specific examples of (b1-I) epoxy (meth)acrylate resins. * indicates a bond in the examples.

[0134] [Chemistry]

[0135] [Chemistry]

[0136] [Chemistry]

[0137] [Chemistry]

[0138] <(b1-II) epoxy (meth)acrylate resin> The epoxy (meth)acrylate resin having the partial structure represented by the general formula (b1-II) will be described in detail.

[0139] [Chemistry]

[0140] In formula (b1-II), R 13 each independently represents a hydrogen atom or a methyl group, R 14 represents a divalent hydrocarbon group having a cyclic hydrocarbon group as a side chain, R 15 and R 16 each independently represent a divalent aliphatic group which may have a substituent, m and n each independently represent an integer of 0 to 2, and * represents a bond.

[0141] (R 14 ) In the general formula (b1-II), R 14 represents a divalent hydrocarbon group having a cyclic hydrocarbon group as a side chain. Examples of the cyclic hydrocarbon group include an aliphatic ring group or an aromatic ring group.

[0142] The number of rings in the aliphatic ring group is not particularly limited, but is usually 1 or more, preferably 2 or more, and usually 10 or less, preferably 5 or less, and more preferably 3 or less. For example, 1 to 10 is preferred, 1 to 5 is more preferred, 1 to 3 is even more preferred, and 2 to 3 is particularly preferred. Setting the number above the lower limit tends to result in a stronger film and reduces the likelihood of surface roughness occurring during development. Setting the number below the upper limit tends to suppress deterioration of sensitivity and film loss during development, and tends to improve resolution. The aliphatic ring group typically has 4 or more carbon atoms, preferably 6 or more, more preferably 8 or more, preferably 40 or less, more preferably 30 or less, even more preferably 20 or less, and particularly preferably 15 or less. The above upper and lower limits can be combined arbitrarily. For example, 4 to 40 is preferred, 4 to 30 is more preferred, 6 to 20 is even more preferred, and 8 to 15 is particularly preferred. Setting the value above the lower limit tends to result in a stronger film and less surface roughness during development. Setting the value below the upper limit tends to suppress deterioration of sensitivity and film loss during development, and tends to improve resolution. Examples of aliphatic rings in the aliphatic ring group include cyclohexane rings, cycloheptane rings, cyclodecane rings, cyclododecane rings, norbornane rings, isobornane rings, adamantane rings, and cyclododecane rings. Among these, the adamantane ring is preferred from the viewpoint of residual film rate and resolution of the photosensitive colored composition.

[0143] The number of rings in the aromatic ring group is not particularly limited, but is usually 1 or more, preferably 2 or more, more preferably 3 or more, and usually 10 or less, preferably 5 or less, and more preferably 4 or less. The above upper and lower limits can be combined arbitrarily. For example, 1 to 10 is preferred, 1 to 5 is more preferred, 1 to 4 is even more preferred, 2 to 4 is even more preferred, and 3 to 4 is particularly preferred. Setting the value above the lower limit tends to result in a stronger film and less surface roughness during development. Setting the value below the upper limit tends to suppress deterioration of sensitivity and film loss during development, and tends to improve resolution. Examples of aromatic ring groups include aromatic hydrocarbon ring groups and aromatic heterocyclic ring groups. The number of carbon atoms in the aromatic ring group is usually 4 or more, preferably 6 or more, more preferably 8 or more, even more preferably 10 or more, particularly preferably 12 or more, preferably 40 or less, more preferably 30 or less, even more preferably 20 or less, and particularly preferably 15 or less. The above upper and lower limits can be combined arbitrarily. For example, 4 to 40 is preferred, 6 to 40 is more preferred, 8 to 30 is even preferred, 10 to 20 is even more preferred, and 12 to 15 is particularly preferred. Setting the number of carbon atoms above the lower limit tends to result in a stronger film and reduces the likelihood of surface roughness occurring during development. Setting the number of carbon atoms below the upper limit tends to result in better patterning characteristics. Examples of aromatic rings in an aromatic ring group include benzene rings, naphthalene rings, anthracene rings, phenanthrene rings, perylene rings, tetracene rings, pyrene rings, benzpyrene rings, chrysene rings, triphenylene rings, acenaphthene rings, fluorantene rings, and fluorene rings. Among these, fluorene rings are preferred from the viewpoint of patterning properties.

[0144] In a divalent hydrocarbon group having a cyclic hydrocarbon group as a side chain, the divalent hydrocarbon group is not particularly limited, but examples include a divalent aliphatic group, a divalent aromatic ring group, and a group formed by linking one or more divalent aliphatic groups and one or more divalent aromatic ring groups.

[0145] Divalent aliphatic groups include linear, branched, and cyclic aliphatic groups. Of these, linear aliphatic groups are preferred from the viewpoint of developability, while cyclic aliphatic groups are preferred from the viewpoint of reducing the penetration of developer into the exposed area. The number of carbon atoms is usually 1 or more, preferably 3 or more, more preferably 6 or more, preferably 25 or less, more preferably 20 or less, and still preferably 15 or less. The above upper and lower limits can be combined arbitrarily. For example, 1 to 25 is preferred, 3 to 20 is more preferred, and 6 to 15 is still preferred. Setting the value above the lower limit tends to result in a stronger film, less surface roughness during development, and better adhesion to the substrate. Setting the value below the upper limit tends to suppress deterioration of sensitivity and film loss during development, and tends to improve resolution.

[0146] Examples of divalent linear aliphatic groups include methylene, ethylene, n-propylene, n-butylene, n-pentylene, n-hexylene, and n-heptylene groups. Among these, the methylene group is preferred from the viewpoint of the rigidity of its skeleton. Examples of divalent branched aliphatic groups include structures in which a divalent linear aliphatic group has a methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, sec-butyl group, or tert-butyl group as a side chain. The number of rings in a divalent cyclic aliphatic group is not particularly limited, but is usually 1 or more, preferably 2 or more, and usually 10 or less, preferably 5 or less, and more preferably 3 or less. For example, 1 to 10 is preferred, 1 to 5 is more preferred, 1 to 3 is even more preferred, and 2 to 3 is particularly preferred. Setting the number above the lower limit tends to result in a strong film with good substrate adhesion. Setting the number below the upper limit tends to suppress deterioration of sensitivity and film loss during development, and tends to improve resolution. Examples of divalent cyclic aliphatic groups include groups obtained by removing two hydrogen atoms from the cyclohexane ring, cycloheptane ring, cyclodecane ring, cyclododecane ring, norbornane ring, isobornane ring, adamantane ring, and cyclododecane ring. Among these, the group obtained by removing two hydrogen atoms from the adamantane ring is preferred from the viewpoint of rigidity of the skeleton.

[0147] Substituents that the divalent aliphatic group may have include, for example, alkoxy groups having 1 to 5 carbon atoms such as methoxy and ethoxy groups; hydroxyl groups; nitro groups; cyano groups; and carboxyl groups. Among these, unsubstituted groups are preferred from the viewpoint of ease of synthesis.

[0148] Examples of divalent aromatic ring groups include divalent aromatic hydrocarbon ring groups and divalent aromatic heterocyclic ring groups. The number of carbon atoms is usually 4 or more, preferably 5 or more, more preferably 6 or more, preferably 30 or less, more preferably 20 or less, and still preferably 15 or less. For example, 4 to 30 is preferred, 5 to 20 is more preferred, and 6 to 15 is still preferred. Setting the number of carbon atoms above the lower limit tends to result in a stronger film, less surface roughness during development, and better adhesion to the substrate. Setting the number of carbon atoms below the upper limit tends to suppress deterioration of sensitivity and film loss during development, and tends to improve resolution.

[0149] The aromatic hydrocarbon ring in a divalent aromatic hydrocarbon ring group may be a monocyclic or fused ring. Examples of aromatic hydrocarbon ring groups include benzene rings, naphthalene rings, anthracene rings, phenanthrene rings, perylene rings, tetracene rings, pyrene rings, benzpyrene rings, chrysene rings, triphenylene rings, acenaphthene rings, fluorantene rings, and fluorene rings, all of which have two free valencies. The aromatic heterocyclic ring in the aromatic heterocyclic group may be a monocyclic ring or a condensed ring. Examples of the aromatic heterocyclic group include a furan ring, a benzofuran ring, a thiophene ring, a benzothiophene ring, a pyrrole ring, a pyrazole ring, an imidazole ring, an oxadiazole ring, an indole ring, a carbazole ring, a pyrroloimidazole ring, a pyrrolopyrazole ring, a pyrrolopyrrole ring, a thienopyrrole ring, a thienothiophene ring, a furopyrrole ring, a furofuran ring, a thienofuran ring, a benzoisoxazole ring, a benzoisothiazole ring, a benzimidazole ring, a pyridine ring, a pyrazine ring, a pyridazine ring, a pyrimidine ring, a triazine ring, a quinoline ring, an isoquinoline ring, a cinnoline ring, a quinoxaline ring, a phenanthridine ring, a benzimidazole ring, a perimidine ring, a quinazoline ring, a quinazolinone ring, and an azulene ring having two free valences. Among these, from the viewpoint of patterning characteristics, a benzene ring or a naphthalene ring having two free valences is preferable, and a benzene ring having two free valences is more preferable.

[0150] Examples of the substituent that the divalent aromatic ring group may have include a hydroxy group, a methyl group, a methoxy group, an ethyl group, an ethoxy group, a propyl group, and a propoxy group. Among these, from the viewpoint of development solubility, unsubstituted is preferable.

[0151] Examples of the group formed by linking one or more divalent aliphatic groups and one or more divalent aromatic ring groups include a group formed by linking one or more of the aforementioned divalent aliphatic groups and one or more of the aforementioned divalent aromatic ring groups. The number of divalent aliphatic groups is not particularly limited, but is usually 1 or more, preferably 2 or more, usually 10 or less, preferably 5 or less, and more preferably 3 or less. For example, 1 to 10 is preferable, 1 to 5 is more preferable, 1 to 3 is further preferable, and 2 to 3 is particularly preferable. By setting it to be not less than the lower limit value, it is easy to obtain a strong film, surface roughness during development is unlikely to occur, and the adhesion to the substrate tends to be good. By setting it to be not more than the upper limit value, it is easy to suppress deterioration of sensitivity and film reduction during development, and the resolution tends to improve. The number of divalent aromatic ring groups is not particularly limited, but is usually 1 or more, preferably 2 or more, usually 10 or less, preferably 5 or less, and more preferably 3 or less. For example, 1 to 10 is preferred, 1 to 5 is more preferred, 1 to 3 is even more preferred, and 2 to 3 is particularly preferred. Setting the number above the lower limit tends to result in a stronger film, less surface roughness during development, and better adhesion to the substrate. Setting the number below the upper limit tends to suppress deterioration of sensitivity and film loss during development, and tends to improve resolution.

[0152] Examples of groups formed by linking one or more divalent aliphatic groups with one or more divalent aromatic ring groups include the groups represented by formulas (b1-IA) to (b1-IF). Among these, the group represented by formula (b1-IC) is preferred from the viewpoint of rigidity of the skeleton and hydrophobicity of the film.

[0153] The manner in which the cyclic hydrocarbon group forming the side chain is bonded to these divalent hydrocarbon groups is not particularly limited, but examples include a configuration in which one hydrogen atom of the aliphatic group or aromatic ring group is substituted with the cyclic hydrocarbon group forming the side chain, or a configuration in which one of the carbon atoms of the aliphatic group is included in the cyclic hydrocarbon group forming the side chain.

[0154] (R 15 , R 16 ) In general formula (b1-II), R 15 and R 16 Each of these independently represents a divalent aliphatic group which may have substituents.

[0155] Divalent aliphatic groups include linear, branched, and cyclic aliphatic groups. Of these, linear aliphatic groups are preferred from the viewpoint of developability, while cyclic aliphatic groups are preferred from the viewpoint of reducing the penetration of developer into the exposed area. The number of carbon atoms is usually 1 or more, preferably 3 or more, more preferably 6 or more, preferably 20 or less, more preferably 15 or less, and still preferably 10 or less. For example, 1 to 20 is preferred, 3 to 15 is more preferred, and 6 to 10 is still preferred. Setting the number above the lower limit tends to result in a stronger film, less surface roughness during development, and better adhesion to the substrate. Setting the number below the upper limit tends to suppress deterioration of sensitivity and film loss during development, and tends to improve resolution.

[0156] Examples of divalent linear aliphatic groups include methylene, ethylene, n-propylene, n-butylene, n-pentylene, n-hexylene, and n-heptylene groups. Among these, the methylene group is preferred from the viewpoint of the rigidity of its skeleton. Examples of divalent branched aliphatic groups include structures in which a divalent linear aliphatic group has a side chain consisting of, for example, a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, or a tert-butyl group. The number of rings in a divalent cyclic aliphatic group is not particularly limited, but is usually 1 or more, preferably 2 or more, and usually 12 or less, preferably 10 or less. For example, 1 to 12 is preferred, and 2 to 10 is more preferred. Setting the number above the lower limit tends to result in a strong film with good substrate adhesion. Setting the number below the upper limit tends to suppress deterioration of sensitivity and film loss during development, and tends to improve resolution. Examples of divalent cyclic aliphatic groups include cyclohexane rings, cycloheptane rings, cyclodecane rings, cyclododecane rings, norbornane rings, isobornane rings, adamantane rings, cyclododecane rings, and dicyclopentadiene rings with two hydrogen atoms removed. Among these, from the viewpoint of skeleton rigidity, dicyclopentadiene rings and adamantane rings with two hydrogen atoms removed are preferred.

[0157] Substituents that the divalent aliphatic group may have include, for example, alkoxy groups having 1 to 5 carbon atoms such as methoxy and ethoxy groups; hydroxyl groups; nitro groups; cyano groups; and carboxyl groups. Among these, unsubstituted groups are preferred from the viewpoint of ease of synthesis.

[0158] (m, n) In general formula (b1-II), m and n each represent an integer between 0 and 2 independently. Setting them above the lower limit tends to result in good patterning suitability and less surface roughness during development, while setting them below the upper limit tends to result in good developability. From the viewpoint of developability, it is preferable for m and n to be 0. On the other hand, from the viewpoint of patterning suitability and surface roughness during development, it is preferable for m and n to be 1 or greater.

[0159] From the viewpoint of adhesion to the substrate, the substructure represented by general formula (b1-II) is preferably the substructure represented by the following general formula (b1-II-1).

[0160] [ka]

[0161] In formula (b1-II-1), R 13 , R 15 , R 16 , m and n are equivalent to equation (b1-II), and R α represents a monovalent cyclic hydrocarbon group which may have substituents, p represents an integer of 1 or more, and * represents a bond. The benzene ring in formula (b1-II-1) may be further substituted with any substituent.

[0162] (R α ) In general formula (b1-II-1), R α This represents a monovalent cyclic hydrocarbon group which may have substituents. Examples of cyclic hydrocarbon groups include aliphatic ring groups and aromatic ring groups.

[0163] The number of rings in the aliphatic ring group is not particularly limited, but is usually 1 or more, preferably 2 or more, and usually 6 or less, preferably 4 or less, and more preferably 3 or less. For example, 1 to 6 is preferred, 1 to 4 is more preferred, 1 to 3 is even more preferred, and 2 to 3 is particularly preferred. Setting the number above the lower limit tends to result in a stronger film and reduces the likelihood of surface roughness occurring during development. Setting the number below the upper limit tends to result in better patterning characteristics. The aliphatic ring group typically has 4 or more carbon atoms, preferably 6 or more, more preferably 8 or more, preferably 40 or less, more preferably 30 or less, even more preferably 20 or less, and particularly preferably 15 or less. The above upper and lower limits can be combined arbitrarily. For example, 4 to 40 is preferred, 4 to 30 is more preferred, 6 to 20 is even more preferred, and 8 to 15 is particularly preferred. Setting the value above the lower limit tends to result in a stronger film and reduces the likelihood of surface roughness occurring during development. Setting the value below the upper limit tends to result in better patterning characteristics. Examples of aliphatic rings in the aliphatic ring group include cyclohexane rings, cycloheptane rings, cyclodecane rings, cyclododecane rings, norbornane rings, isobornane rings, adamantane rings, and cyclododecane rings. Among these, the adamantane ring is preferred from the viewpoint of strong film properties.

[0164] The number of rings in an aromatic ring group is not particularly limited, but is usually 1 or more, preferably 2 or more, more preferably 3 or more, and usually 10 or less, preferably 5 or less. The above upper and lower limits can be combined arbitrarily. For example, 1 to 10 is preferred, 1 to 5 is more preferred, 2 to 5 is even more preferred, and 3 to 5 is particularly preferred. Setting the value above the lower limit tends to result in a stronger film and reduces the likelihood of surface roughness occurring during development. Setting the value below the upper limit tends to result in better patterning characteristics. Examples of aromatic ring groups include aromatic hydrocarbon ring groups and aromatic heterocyclic ring groups. The number of carbon atoms in the aromatic ring group is usually 4 or more, preferably 5 or more, more preferably 6 or more, preferably 30 or less, more preferably 20 or less, and still preferably 15 or less. The above upper and lower limits can be combined arbitrarily. For example, 4 to 30 is preferred, 5 to 20 is more preferred, and 6 to 15 is still preferred. Setting the value above the lower limit tends to result in a stronger film and reduces the likelihood of surface roughness occurring during development, while setting the value below the upper limit tends to result in good patterning characteristics. Examples of aromatic rings in an aromatic ring group include benzene rings, naphthalene rings, anthracene rings, phenanthrene rings, and fluorene rings. Among these, fluorene rings are preferred from the viewpoint of developability and solubility.

[0165] Examples of substituents that the cyclic hydrocarbon group may have include C1-C5 alkyl groups such as methyl, ethyl, n-propyl, isopropyl, n-butyl, sec-butyl, tert-butyl, amyl, and isoamyl groups; C1-C5 alkoxy groups such as methoxy and ethoxy groups; hydroxyl groups; nitro groups; cyano groups; and carboxyl groups. Among these, unsubstituted groups are preferred from the viewpoint of ease of synthesis.

[0166] p represents an integer greater than or equal to 1, preferably 2 or greater, and preferably 3 or less. For example, 1 to 3 is preferred, and 2 to 3 is more preferred. Setting it above the lower limit tends to result in good film hardening and residual film ratio. Setting it below the upper limit tends to result in good developability.

[0167] Among these, from the viewpoint of strong film hardening, R α It is preferable that the group is a monovalent aliphatic ring group, and more preferably an adamantyl group.

[0168] The benzene ring in formula (b1-II-1) may be further substituted with any substituent. Examples of permissible substituents on the benzene ring in formula (b1-II-1) include hydroxyl, methyl, methoxy, ethyl, ethoxy, propyl, and propoxy groups. When the benzene ring in formula (b1-II-1) has substituents, the number of substituents is not particularly limited and may be one or two or more. From the viewpoint of patterning properties, it is preferable that the benzene ring in formula (b1-II-1) is unsubstituted.

[0169] The following are specific examples of the substructure represented by equation (b1-II-1).

[0170] [ka]

[0171] [ka]

[0172] [ka]

[0173] [ka]

[0174] [ka]

[0175] From the viewpoint of the rigidity of the skeleton and membrane hydrophobicity, the substructure represented by general formula (b1-II) is preferably the substructure represented by the following general formula (b1-II-2).

[0176] [ka]

[0177] In formula (b1-II-2), R 13 , R 15 , R 16 , m and n are equivalent to equation (b1-II), and R β * represents a divalent cyclic hydrocarbon group which may have substituents, and * represents a bond. The benzene ring in formula (b1-II-2) may be further substituted with any substituent.

[0178] (R β ) In equation (b1-II-2), R β This represents a divalent cyclic hydrocarbon group which may have substituents. Examples of cyclic hydrocarbon groups include aliphatic ring groups and aromatic ring groups.

[0179] The number of rings in the aliphatic ring group is not particularly limited, but is usually 1 or more, preferably 2 or more, and usually 10 or less, preferably 5 or less. For example, 1 to 10 is preferred, and 2 to 5 is more preferred. Setting the number above the lower limit tends to result in a stronger film and reduces the likelihood of surface roughness occurring during development. Setting the number below the upper limit tends to suppress deterioration of sensitivity and film loss during development, and tends to improve resolution. The aliphatic ring group typically has 4 or more carbon atoms, preferably 6 or more, more preferably 8 or more, preferably 40 or less, more preferably 35 or less, and still preferably 30 or less. The above upper and lower limits can be combined arbitrarily. For example, 4 to 40 is preferred, 6 to 35 is more preferred, and 8 to 30 is still preferred. Setting the value above the lower limit tends to suppress film roughness during development. Setting the value below the upper limit tends to suppress deterioration of sensitivity and film loss during development, and tends to improve resolution. Examples of aliphatic rings in the aliphatic ring group include cyclohexane rings, cycloheptane rings, cyclodecane rings, cyclododecane rings, norbornane rings, isobornane rings, adamantane rings, and cyclododecane rings. Among these, the adamantane ring is preferred from the viewpoint of film reduction during development and resolution.

[0180] On the other hand, the number of rings in an aromatic ring group is not particularly limited, but is usually 1 or more, preferably 2 or more, more preferably 3 or more, and usually 10 or less, preferably 5 or less. The above upper and lower limits can be combined arbitrarily. For example, 1 to 10 is preferred, 1 to 5 is more preferred, 2 to 5 is even more preferred, and 3 to 5 is particularly preferred. Setting the value above the lower limit tends to result in a stronger film and reduces the likelihood of surface roughness occurring during development. Setting the value below the upper limit tends to suppress deterioration of sensitivity and film thinning, and tends to improve resolution. Examples of aromatic ring groups include aromatic hydrocarbon ring groups and aromatic heterocyclic ring groups. The number of carbon atoms in the aromatic ring group is usually 4 or more, preferably 6 or more, more preferably 8 or more, even more preferably 10 or more, preferably 40 or less, more preferably 30 or less, even more preferably 20 or less, and particularly preferably 15 or less. The above upper and lower limits can be combined arbitrarily. For example, 4 to 40 is preferred, 6 to 30 is more preferred, 8 to 20 is even more preferred, and 10 to 15 is particularly preferred. Setting the value above the lower limit tends to result in a stronger film and reduces the likelihood of surface roughness occurring during development. Setting the value below the upper limit tends to suppress deterioration of sensitivity and film thinning, and tends to improve resolution. Examples of aromatic rings in an aromatic ring group include benzene rings, naphthalene rings, anthracene rings, phenanthrene rings, and fluorene rings. Among these, fluorene rings are preferred from the viewpoint of developability.

[0181] Examples of substituents that the cyclic hydrocarbon group may have include C1-C5 alkyl groups such as methyl, ethyl, n-propyl, isopropyl, n-butyl, sec-butyl, tert-butyl, amyl, and isoamyl groups; C1-C5 alkoxy groups such as methoxy and ethoxy groups; hydroxyl groups; nitro groups; cyano groups; and carboxyl groups. Among these, unsubstituted groups are preferred from the viewpoint of ease of synthesis.

[0182] Among these, from the viewpoint of suppressing film wear and resolution, Rβ It is preferable that the group is a divalent aliphatic ring group, and more preferably a divalent adamantane ring group. On the other hand, from the perspective of patterning characteristics, R β It is preferable that the ring is a divalent aromatic ring group, and more preferably a divalent fluorene ring group.

[0183] The benzene ring in formula (b1-II-2) may be further substituted with any substituent. Examples of permissible substituents on the benzene ring in formula (b1-II-2) include hydroxyl, methyl, methoxy, ethyl, ethoxy, propyl, and propoxy groups. When the benzene ring in formula (b1-II-2) has substituents, the number of substituents is not particularly limited and may be one or two or more. Furthermore, the two benzene rings may be linked via substituents. Examples of substituents in this case include divalent groups such as -O-, -S-, -NH-, and -CH2-. From the viewpoint of patterning characteristics, it is preferable that the benzene ring in formula (b1-II-2) is unsubstituted. Furthermore, from the viewpoint of reducing film thinning, it is preferable that the benzene ring in formula (b1-II-2) is substituted with a methyl group.

[0184] The following are specific examples of the substructure represented by formula (b1-II-2). Note that * in the examples indicates a bond.

[0185] [ka]

[0186] [ka]

[0187] [ka]

[0188] [ka]

[0189] From the viewpoint of coating film residue rate and patterning characteristics, the substructure represented by formula (b1-II) is preferably the substructure represented by the following formula (b1-II-3).

[0190] [ka]

[0191] In formula (b1-II-3), R 13 , R 14 , R 15 , R 16 , m and n are equivalent to equation (b1-II), and R Z represents a hydrogen atom or a polybasic acid residue.

[0192] A polybasic acid residue refers to a monovalent group obtained by removing one OH group from a polybasic acid. Furthermore, if another OH group is removed, the R group in other molecules represented by formula (b1-II-3) is... Z It may be shared with R, that is, Z Multiple equations (b1-II-3) may be linked together via this. Examples of polybasic acids include maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, trimellitic acid, benzophenonetetracarboxylic acid, methylhexahydrophthalic acid, endomethylenetetrahydrophthalic acid, chlorendic acid, methyltetrahydrophthalic acid, and biphenyltetracarboxylic acid. Among these, from the viewpoint of patterning properties, maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, trimellitic acid, and biphenyltetracarboxylic acid are preferred, and more preferably tetrahydrophthalic acid, biphenyltetracarboxylic acid, and biphenyltetracarboxylic acid.

[0193] (b1-II) The substructure represented by formula (b1-II-3) contained in one molecule of epoxy (meth)acrylate resin may be one type or two or more types, for example, R Z The one with the hydrogen atom, and R Z It is acceptable for compounds containing polybasic acid residues to be present in the mixture.

[0194] The number of substructures represented by formula (b1-II) contained in one molecule of (b1-II) epoxy (meth)acrylate resin is not particularly limited, but is preferably 1 or more, more preferably 3 or more, preferably 20 or less, more preferably 15 or less, and still preferably 10 or less. For example, 1 to 20 is preferred, 1 to 15 is more preferred, and 3 to 10 is still preferred. Setting the number above the lower limit tends to result in a stronger film and reduces the likelihood of surface roughness occurring during development. Setting the number below the upper limit tends to suppress deterioration of sensitivity and film thinning, and improves resolution.

[0195] (b1-II) The weight-average molecular weight (Mw) of the epoxy (meth)acrylate resin, measured by gel permeation chromatography (GPC), is not particularly limited, but is preferably 1000 or more, more preferably 1500 or more, even more preferably 2000 or more, even more preferably 3000 or more, particularly preferably 4000 or more, most preferably 5000 or more, usually 10000 or less, preferably 8000 or less, and more preferably 7000 or less. The above upper and lower limits can be arbitrarily combined. For example, 1000 to 10000 is preferred, 1500 to 10000 is more preferred, 1500 to 8000 is even more preferred, 2000 to 8000 is even more preferred, and 2000 to 7000 is particularly preferred. Setting it above the lower limit tends to result in a good residual film rate of the photosensitive colored composition. Setting it below the upper limit tends to result in good solubility in the developer.

[0196] (b1-II) The acid value of the epoxy (meth)acrylate resin is not particularly limited, but is preferably 20 mg KOH / g or more, more preferably 40 mg KOH / g or more, even more preferably 60 mg KOH / g or more, even more preferably 80 mg KOH / g or more, particularly preferably 100 mg KOH / g or more, and also preferably 200 mg KOH / g or less, more preferably 150 mg KOH / g or less, even more preferably 130 mg KOH / g or less, and particularly preferably 120 mg KOH / g or less. The above upper and lower limits can be arbitrarily combined. For example, 20 mg KOH / g to 200 mg KOH / g is preferred, 60 mg KOH / g to 150 mg KOH / g is more preferred, 80 mg KOH / g to 130 mg KOH / g is even more preferred, and 100 mg KOH / g to 130 mg KOH / g is even more preferred. Setting it above the lower limit tends to improve developability and resolution. By keeping the value below the aforementioned upper limit, the residual film rate of the photosensitive colored composition tends to be good.

[0197] Carboxy group-containing epoxy (meth)acrylate resins may be used individually or as a mixture of two or more resins. A portion of the carboxyl group-containing epoxy (meth)acrylate resin may be replaced with another binder resin. That is, the carboxyl group-containing epoxy (meth)acrylate resin and another binder resin may be used in combination. In this case, (b) the proportion of the carboxyl group-containing epoxy (meth)acrylate resin in the alkali-soluble resin is preferably 50% by mass or more, more preferably 60% by mass or more, even more preferably 70% by mass or more, particularly preferably 80% by mass or more, and usually 100% by mass or less.

[0198] (b) As the alkali-soluble resin, (b2) an acrylic copolymer resin is preferred from the viewpoint of compatibility with pigments, dispersants, etc., and the acrylic copolymer resin described in Japanese Patent Publication No. 2014-137466 can be preferably used.

[0199] Examples of acrylic copolymer resins include copolymers of an ethylenically unsaturated monomer having one or more carboxyl groups (hereinafter referred to as "unsaturated monomer (b2-1)") and other copolymerizable ethylenically unsaturated monomers (hereinafter referred to as "unsaturated monomer (b2-2)"). Examples of unsaturated monomers (b2-1) include unsaturated monocarboxylic acids such as (meth)acrylic acid, crotonic acid, α-chloroacrylic acid, and cinnamic acid; unsaturated dicarboxylic acids or their anhydrides such as maleic acid, maleic anhydride, fumaric acid, citraconic acid, citraconic anhydride, and mesaconic acid; mono[(meth)acryloyloxyalkyl] esters of divalent or higher polycarboxylic acids such as succinic acid mono[2-(meth)acryloyloxyethyl] and phthalic acid mono[2-(meth)acryloyloxyethyl]; mono(meth)acrylates of polymers having a carboxyl group and a hydroxyl group at both ends, such as ω-carboxypolycaprolactone mono(meth)acrylate; and p-vinylbenzoic acid. These unsaturated monomers (b2-1) can be used individually or in combination of two or more.

[0200] Examples of unsaturated monomers (b2-2) include N-substituted maleimides such as N-phenylmaleimide and N-cyclohexylmaleimide; Aromatic vinyl compounds such as styrene, α-methylstyrene, p-hydroxystyrene, p-hydroxy-α-methylstyrene, p-vinylbenzylglycidyl ether, and acenaphthylene;

[0201] Methyl (meth)acrylate, n-butyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, allyl (meth)acrylate, benzyl (meth)acrylate, polyethylene glycol (degree of polymerization 2-10) methyl ether (meth)acrylate, polypropylene glycol (degree of polymerization 2-10) methyl ether (meth)acrylate, polyethylene glycol (degree of polymerization 2-10) mono (meth)acrylate, polypropylene glycol (degree of polymerization 2-10) mono (meth)acrylate, cyclohexyl (meth)acrylate, isobornyl (meth)acrylate, tricyclo[5.2.1.0 2,6 (meth)acrylic acid esters such as decane-8-yl (meth)acrylate, dicyclopentenyl (meth)acrylate, glycerol mono(meth)acrylate, 4-hydroxyphenyl (meth)acrylate, ethylene oxide-modified (meth)acrylate of paracumylphenol, glycidyl (meth)acrylate, 3,4-epoxycyclohexylmethyl (meth)acrylate, 3-[(meth)acryloyloxymethyl]oxetane, 3-[(meth)acryloyloxymethyl]-3-ethyloxetane;

[0202] Cyclohexyl vinyl ether, isobornyl vinyl ether, tricyclo[5.2.1.0 2,6 Vinyl ethers such as decane-8-yl vinyl ether, pentacyclopentadecanyl vinyl ether, and 3-(vinyloxymethyl)-3-ethyloxetane; Examples of macromonomers that have a mono(meth)acryloyl group at the end of the polymer molecular chain include polystyrene, polymethyl (meth)acrylate, poly-n-butyl (meth)acrylate, and polysiloxane. These unsaturated monomers (b2-2) can be used individually or in combination of two or more.

[0203] In copolymers of unsaturated monomer (b2-1) and unsaturated monomer (b2-2), the copolymerization ratio of unsaturated monomer (b2-1) is preferably 5 to 50% by mass, and more preferably 10 to 40% by mass. By copolymerizing unsaturated monomer (b2-1) within this range, it is possible to obtain a photosensitive colored composition with excellent alkali developability and storage stability.

[0204] Examples of copolymers of an unsaturated monomer (b2-1) and an unsaturated monomer (b2-2) include those disclosed in Japanese Patent Publication No. 7-140654, Japanese Patent Publication No. 8-259876, Japanese Patent Publication No. 10-31308, Japanese Patent Publication No. 10-300922, Japanese Patent Publication No. 11-174224, Japanese Patent Publication No. 11-258415, Japanese Patent Publication No. 2000-56118, and Japanese Patent Publication No. 2004-101728. Copolymers of unsaturated monomer (b2-1) and unsaturated monomer (b2-2) can be produced by known methods, but their structure, Mw, and Mw / Mn can also be controlled by methods disclosed, for example, in Japanese Patent Publication No. 2003-222717, Japanese Patent Publication No. 2006-259680, and International Publication No. 2007 / 029871.

[0205] In addition, resins described in International Publication No. 2016 / 194619 and International Publication No. 2017 / 154439 may be used.

[0206] <(c) Photopolymerization initiator> (c) Photopolymerization initiators are components that directly absorb light, undergo decomposition or hydrogen abstraction reactions, and generate polymerization-active radicals. Polymerization accelerators (chain transfer agents), sensitizing dyes, and other additives may be added as needed. Examples of photopolymerization initiators include metallocene compounds containing titanocene compounds as described in Japanese Patent Publication No. 59-152396 and Japanese Patent Publication No. 61-151197; hexaarylbiimidazole derivatives as described in Japanese Patent Publication No. 2000-56118; halomethylated oxadiazole derivatives and halomethyl-s-triazine derivatives as described in Japanese Patent Publication No. 10-39503; α-aminoalkylphenone derivatives; and oxime ester compounds as described in Japanese Patent Publication No. 2000-80068 and Japanese Patent Publication No. 2006-36750, etc.

[0207] Examples of metallocene compounds include dicyclopentadienyltitanium dichloride, dicyclopentadienyltitanium bisphenyl, dicyclopentadienyltitanium bis(2,3,4,5,6-pentafluorophenyl), dicyclopentadienyltitanium bis(2,3,5,6-tetrafluorophenyl), dicyclopentadienyltitanium bis(2,4,6-trifluorophenyl), dicyclopentadienyltitanium di(2,6-difluorophenyl), dicyclopentadienyltitanium di(2,4-difluorophenyl), di(methylcyclopentadienyl)titanium bis(2,3,4,5,6-pentafluorophenyl), di(methylcyclopentadienyl)titanium bis(2,6-difluorophenyl), and dicyclopentadienyltitanium [2,6-di-fluoro-3-(pyrrole-1-yl)phenyl].

[0208] Examples of hexaarylbiimidazole derivatives include 2-(2'-chlorophenyl)-4,5-diphenylimidazole dimer, 2-(2'-chlorophenyl)-4,5-bis(3'-methoxyphenyl)imidazole dimer, 2-(2'-fluorophenyl)-4,5-diphenylimidazole dimer, 2-(2'-methoxyphenyl)-4,5-diphenylimidazole dimer, and (4'-methoxyphenyl)-4,5-diphenylimidazole dimer.

[0209] Examples of halomethylated oxadiazole derivatives include 2-trichloromethyl-5-(2'-benzofuryl)-1,3,4-oxadiazole, 2-trichloromethyl-5-[β-(2'-benzofuryl)vinyl]-1,3,4-oxadiazole, 2-trichloromethyl-5-[β-(2'-(6''-benzofuryl)vinyl)]-1,3,4-oxadiazole, and 2-trichloromethyl-5-furyl-1,3,4-oxadiazole.

[0210] Examples of halomethyl-s-triazine derivatives include 2-(4-methoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4-methoxynaphthyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4-ethoxynaphthyl)-4,6-bis(trichloromethyl)-s-triazine, and 2-(4-ethoxycarbonylnaphthyl)-4,6-bis(trichloromethyl)-s-triazine.

[0211] Examples of α-aminoalkylphenone derivatives include 2-methyl-1[4-(methylthio)phenyl]-2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butanone-1, 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)butan-1-one, 4-dimethylaminoethylbenzoate, 4-dimethylaminoisoamylbenzoate, 4-diethylaminoacetophenone, 4-dimethylaminopropiophenone, 2-ethylhexyl-1,4-dimethylaminobenzoate, 2,5-bis(4-diethylaminobenzal)cyclohexanone, 7-diethylamino-3-(4-diethylaminobenzoyl)coumarin, and 4-(diethylamino)chalcone.

[0212] Oxime ester compounds are particularly effective as photopolymerization initiators in terms of sensitivity and printmaking properties. For example, when using alkali-soluble resins containing phenolic hydroxyl groups, such highly sensitive oxime ester compounds are especially useful. Because oxime ester compounds have structures that absorb ultraviolet light, transmit light energy, and generate radicals, they are highly sensitive even in small amounts, are stable against thermal reactions, and make it possible to obtain highly sensitive photosensitive colored compositions with small amounts.

[0213] Examples of oxime ester compounds include those represented by the following general formula (IV).

[0214] [ka]

[0215] In the above equation (IV), R 21a This represents a hydrogen atom, an optionally substituted alkyl group, or an optionally substituted aromatic ring group. R 21b represents any substituent containing an aromatic ring. R 22a This represents an optionally substituted alkanoyl group or an optionally substituted allyloyl group. n represents an integer, either 0 or 1.

[0216] R 21a The number of carbon atoms in the alkyl group is not particularly limited, but from the viewpoint of solubility in the solvent and sensitivity, it is usually 1 or more, preferably 2 or more, and usually 20 or less, preferably 15 or less, and more preferably 10 or less. For example, it is 1 to 20, preferably 1 to 15, and more preferably 2 to 10. Examples of alkyl groups include methyl group, ethyl group, propyl group, and cyclopentylethyl group. Examples of substituents that the alkyl group may have include aromatic ring groups, hydroxyl groups, carboxyl groups, halogen atoms, amino groups, amide groups, 4-(2-methoxy-1-methyl)ethoxy-2-methylphenyl groups, or N-acetyl-N-acetoxyamino groups. From the viewpoint of ease of synthesis, it is preferable that the alkyl group be unsubstituted.

[0217] R 21a Examples of aromatic ring groups include aromatic hydrocarbon ring groups and aromatic heterocyclic ring groups. The number of carbon atoms in the aromatic ring group is not particularly limited, but it is preferably 5 or more from the viewpoint of solubility in the photosensitive colored composition. Furthermore, from the viewpoint of developability, it is preferably 30 or less, more preferably 20 or less, and even more preferably 12 or less. For example, 5 to 30, preferably 5 to 20, and more preferably 5 to 12 or less.

[0218] Examples of aromatic ring groups include phenyl, naphthyl, pyridyl, and furyl groups. Of these, phenyl or naphthyl groups are preferred from the viewpoint of developability, and phenyl groups are more preferred. Examples of substituents that the aromatic ring group may have include hydroxyl groups, carboxyl groups, halogen atoms, amino groups, amide groups, alkyl groups, alkoxy groups, and groups formed by linking these substituents. From the viewpoint of developability, alkyl groups, alkoxy groups, and groups formed by linking them are preferred, and linked alkoxy groups are more preferred. Among these, from the perspective of developability, R 21a It is preferable that the compound is an aromatic ring group which may have substituents, and it is even more preferable that the compound is an aromatic ring group which has linked alkoxy groups as substituents.

[0219] Also, R 21b Examples of these groups include a substituted carbazolyl group, a substituted thioxanthonyl group, and a substituted diphenyl sulfide group. Of these, a substituted carbazolyl group is preferred from the viewpoint of sensitivity. A substituted diphenyl sulfide group is preferred from the viewpoint of electrical reliability.

[0220] Also, R 22a The number of carbon atoms in the alkanoyl group is not particularly limited, but from the viewpoint of solubility in the solvent and sensitivity, it is usually 2 or more, preferably 3 or more, and usually 20 or less, preferably 15 or less, more preferably 10 or less, and even more preferably 5 or less. For example, it is 2 to 20, preferably 2 to 15, more preferably 3 to 10, and even more preferably 3 to 5. Examples of alkanoyl groups include acetyl groups, propanoyl groups, and butanoyl groups. Examples of substituents that the alkanoyl group may have include aromatic ring groups, hydroxyl groups, carboxyl groups, halogen atoms, amino groups, and amide groups. From the viewpoint of ease of synthesis, it is preferable that the group be unsubstituted.

[0221] Also, R 22a The number of carbon atoms in the allyroyl group is not particularly limited, but from the viewpoint of solubility in solvents and sensitivity, it is usually 7 or more, preferably 8 or more, and usually 20 or less, preferably 15 or less, and more preferably 10 or less. For example, 7 to 20, preferably 7 to 15, and more preferably 8 to 10. Examples of allyroyl groups include benzoyl groups and naphthoyl groups. Examples of substituents that the allyroyl group may have include hydroxyl groups, carboxyl groups, halogen atoms, amino groups, amide groups, and alkyl groups. From the viewpoint of ease of synthesis, unsubstituted groups are preferred. Among these, from the perspective of sensitivity, R 22a Preferably, the group is an alkanoyl group which may have substituents, more preferably an unsubstituted alkanoyl group, and even more preferably an acetyl group.

[0222] The initiator described in Japanese Patent Publication No. 2016-133574 is also preferably used because it reduces contamination of the liquid crystal layer by colorants.

[0223] The photopolymerization initiator may be used alone or in combination of two or more types. The photopolymerization initiator may, if necessary, be formulated with a sensitizing dye and polymerization accelerator corresponding to the wavelength of the image exposure light source in order to enhance sensitivity. Examples of sensitizing dyes include xanthene dyes described in Japanese Patent Publication No. 4-221958 and Japanese Patent Publication No. 4-219756, heterocyclic coumarin dyes described in Japanese Patent Publication No. 3-239703 and Japanese Patent Publication No. 5-289335, 3-ketocoumarin compounds described in Japanese Patent Publication No. 3-239703 and Japanese Patent Publication No. 5-289335, pyrometene dyes described in Japanese Patent Publication No. 6-19240, Japanese Patent Publication No. 47-2528 and Japanese Patent Publication No. 54-155292, Examples of dyes having a dialkylaminobenzene skeleton described in Japanese Patent Publication No. 45-37377, Japanese Patent Publication No. 48-84183, Japanese Patent Publication No. 52-112681, Japanese Patent Publication No. 58-15503, Japanese Patent Publication No. 60-88005, Japanese Patent Publication No. 59-56403, Japanese Patent Publication No. 2-69, Japanese Patent Publication No. 57-168088, Japanese Patent Publication No. 5-107761, Japanese Patent Publication No. 5-210240, and Japanese Patent Publication No. 4-288818 are examples.

[0224] Among these sensitizing dyes, amino group-containing sensitizing dyes are preferred, and compounds having both an amino group and a phenyl group within the same molecule are more preferred. Preferred sensitizing dyes include, for example, benzophenone compounds such as 4,4'-dimethylaminobenzophenone, 4,4'-diethylaminobenzophenone, 2-aminobenzophenone, 4-aminobenzophenone, 4,4'-diaminobenzophenone, 3,3'-diaminobenzophenone, and 3,4-diaminobenzophenone; 2-(p-dimethylaminophenyl)benzoxazole, 2-(p-diethylaminophenyl)benzoxazole, 2-(p-dimethylaminophenyl)benzo[4,5]benzoxazole, 2-(p-dimethylaminophenyl)benzo[6,7]benzoxazole, and 2,5-bis(p-diethylaminophenyl)-1,3,4-o Examples of p-dialkylaminophenyl group-containing compounds include xazole, 2-(p-dimethylaminophenyl)benzothiazole, 2-(p-diethylaminophenyl)benzothiazole, 2-(p-dimethylaminophenyl)benzimidazole, 2-(p-diethylaminophenyl)benzimidazole, 2,5-bis(p-diethylaminophenyl)-1,3,4-thiadiazole, (p-dimethylaminophenyl)pyridine, (p-diethylaminophenyl)pyridine, (p-dimethylaminophenyl)quinoline, (p-diethylaminophenyl)quinoline, (p-dimethylaminophenyl)pyrimidine, and (p-diethylaminophenyl)pyrimidine. Of these, 4,4'-dialkylaminobenzophenone is particularly preferred. Sensitizing dyes may be used individually or in combination of two or more.

[0225] Examples of polymerization accelerators include aromatic amines such as ethyl p-dimethylaminobenzoate and 2-dimethylaminoethyl benzoate, aliphatic amines such as n-butylamine and N-methyldiethanolamine, and mercapto compounds, which will be discussed later. A single polymerization accelerator may be used, or two or more may be used in combination.

[0226] <(d) Ethylene-unsaturated compounds> The photosensitive colored composition of the present invention contains (d) an ethylenically unsaturated compound. The inclusion of (d) an ethylenically unsaturated compound improves sensitivity. The ethylenically unsaturated compounds used in the present invention are compounds having at least one ethylenically unsaturated group in their molecule. Specifically, examples include (meth)acrylic acid, alkyl (meth)acrylate esters, acrylonitrile, styrene, carboxylic acids having one ethylenically unsaturated bond, and monoesters of polyhydric or monohydric alcohols.

[0227] In the present invention, it is particularly desirable to use a polyfunctional ethylenic monomer having two or more ethylenic unsaturated groups in one molecule. The number of ethylenic unsaturated groups in the polyfunctional ethylenic monomer is not particularly limited, but is usually two or more, preferably four or more, more preferably five or more, and preferably eight or fewer, and more preferably seven or fewer. The above upper and lower limits can be combined arbitrarily. For example, 2 to 8 is preferred, 2 to 7 is more preferred, 4 to 7 is even more preferred, and 5 to 7 is particularly preferred. Setting the value above the lower limit tends to result in high sensitivity. Setting the value below the upper limit tends to improve solubility in the solvent. Examples of polyfunctional ethylenic monomers include, for example, esters of aliphatic polyhydroxy compounds and unsaturated carboxylic acids; esters of aromatic polyhydroxy compounds and unsaturated carboxylic acids; and esters obtained by esterification reactions of polyhydric hydroxy compounds such as aliphatic polyhydroxy compounds and aromatic polyhydroxy compounds with unsaturated carboxylic acids and polybasic carboxylic acids.

[0228] Examples of esters of aliphatic polyhydroxy compounds with unsaturated carboxylic acids include acrylic acid esters of aliphatic polyhydroxy compounds such as ethylene glycol diacrylate, triethylene glycol diacrylate, trimethylolpropane triacrylate, trimethylolethane triacrylate, pentaerythritol diacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, and glycerol acrylate; methacrylic acid esters obtained by replacing these acrylates with methacrylate; itaconic acid esters obtained by replacing itaconate; crotonic acid esters obtained by replacing cronate; and maleic acid esters obtained by replacing maleate.

[0229] Examples of esters of aromatic polyhydroxy compounds with unsaturated carboxylic acids include acrylic acid esters and methacrylic acid esters of aromatic polyhydroxy compounds such as hydroquinone diacrylate, hydroquinone dimethacrylate, resorcinol diacrylate, resorcinol dimethacrylate, and pyrogallol triacrylate.

[0230] Esters obtained by the esterification reaction of polybasic carboxylic acids and unsaturated carboxylic acids with polyvalent hydroxy compounds are not necessarily single compounds, but examples include condensates of acrylic acid, phthalic acid, and ethylene glycol; condensates of acrylic acid, maleic acid, and diethylene glycol; condensates of methacrylic acid, terephthalic acid, and pentaerythritol; and condensates of acrylic acid, adipic acid, butanediol, and glycerin.

[0231] Other useful polyfunctional ethylenic monomers used in the present invention include, for example, urethane (meth)acrylates obtained by reacting a polyisocyanate compound with a hydroxyl group-containing (meth)acrylic acid ester or a polyisocyanate compound with a polyol and a hydroxyl group-containing (meth)acrylic acid ester; epoxy acrylates such as addition products of a polyvalent epoxy compound with hydroxy(meth)acrylate or (meth)acrylic acid; acrylamides such as ethylenebisacrylamide; allyl esters such as diallyl phthalate; and vinyl group-containing compounds such as divinyl phthalate.

[0232] Examples of urethane (meth)acrylates include DPHA-40H, UX-5000, UX-5002D-P20, UX-5003D, UX-5005 (manufactured by Nippon Kayaku Co., Ltd.), U-2PPA, U-6LPA, U-10PA, U-33H, UA-53H, UA-32P, UA-1100H (manufactured by Shin Nakamura Chemical Industry Co., Ltd.), UA-306H, UA-510H, UF-8001G (manufactured by Kyoeisha Chemical Co., Ltd.), UV-1700B, UV-7600B, UV-7605B, UV-7630B, and UV7640B (manufactured by Mitsubishi Chemical Corporation).

[0233] Among these, from the viewpoint of curability, (d) as the ethylenically unsaturated compound, it is preferable to use esters of aliphatic polyhydroxy compounds and unsaturated carboxylic acids or urethane (meth)acrylates, urethane (meth)acrylates obtained by reacting a polyisocyanate compound with a hydroxyl group-containing (meth)acrylic acid ester or a polyisocyanate compound with a polyol and a hydroxyl group-containing (meth)acrylic acid ester, more preferably alkyl (meth)acrylate ester, and even more preferably dipentaerythritol hexaacrylate. These may be used individually or in combination of two or more types.

[0234] <(e) Solvents> The photosensitive coloring composition of the present invention contains (e) a solvent. The inclusion of (e) a solvent allows (a) a colorant to be dispersed or dissolved in the solvent, and also facilitates application. The photosensitive colored composition of the present invention is typically used in a state in which (a) a colorant, (b) an alkali-soluble resin, (c) a photopolymerization initiator, (d) an ethylenically unsaturated compound, (f) a dispersant, and other various materials used as needed, are dissolved or dispersed in a solvent. Among solvents, organic solvents are preferred from the viewpoint of dispersibility and coating properties.

[0235] Among organic solvents, those with a boiling point of 100 to 300°C are preferred from the viewpoint of coating properties, and those with a boiling point of 120 to 280°C are more preferred. Note that the boiling point referred to here is the boiling point at a pressure of 1013.25 hPa, and the same applies to all subsequent boiling point references.

[0236] Examples of such organic solvents include glycol monoalkyl ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol mono-n-butyl ether, propylene glycol t-butyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol mono-n-butyl ether, methoxymethyl pentanol, dipropylene glycol monoethyl ether, dipropylene glycol monomethyl ether, 3-methoxybutanol, 3-methyl-3-methoxybutanol, triethylene glycol monomethyl ether, triethylene glycol monoethyl ether, and tripropylene glycol methyl ether; Glycol dialkyl ethers such as ethylene glycol dimethyl ether, ethylene glycol diethyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol dipropyl ether, diethylene glycol dibutyl ether, and dipropylene glycol dimethyl ether;

[0237] Glycol alkyl ether acetates such as ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, ethylene glycol mono-n-butyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, propylene glycol monobutyl ether acetate, methoxybutyl acetate, 3-methoxybutyl acetate, methoxypentyl acetate, diethylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether acetate, diethylene glycol mono-n-butyl ether acetate, dipropylene glycol monomethyl ether acetate, triethylene glycol monomethyl ether acetate, triethylene glycol monoethyl ether acetate, and 3-methyl-3-methoxybutyl acetate; Glycol diacetates such as ethylene glycol diacetate, 1,3-butylene glycol diacetate, and 1,6-hexanol diacetate; Alkyl acetates such as cyclohexanol acetate; Ethers such as amyl ether, diethyl ether, dipropyl ether, diisopropyl ether, dibutyl ether, diamyl ether, ethyl isobutyl ether, and dihexyl ether;

[0238] Ketones such as acetone, methyl ethyl ketone, methyl amyl ketone, methyl isopropyl ketone, methyl isoamyl ketone, diisopropyl ketone, diisobutyl ketone, methyl isobutyl ketone, cyclohexanone, ethyl amyl ketone, methyl butyl ketone, methylhexyl ketone, methyl nonyl ketone, and methoxymethylpentanone; Monohydric or polyhydric alcohols such as ethanol, propanol, butanol, hexanol, cyclohexanol, ethylene glycol, propylene glycol, butanediol, diethylene glycol, dipropylene glycol, triethylene glycol, methoxymethylpentanol, glycerin, and benzyl alcohol; Aliphatic hydrocarbons such as n-pentane, n-octane, diisobutylene, n-hexane, hexene, isoprene, dipentene, and dodecane; Alicyclic hydrocarbons such as cyclohexane, methylcyclohexane, methylcyclohexene, and bicyclohexyl;

[0239] Aromatic hydrocarbons such as benzene, toluene, xylene, and cumene; Chain-like or cyclic esters such as amyl formate, ethyl formate, ethyl acetate, butyl acetate, propyl acetate, amyl acetate, methyl isobutyrate, ethylene glycol acetate, ethyl propionate, propyl propionate, butyl butyrate, isobutyl butyrate, methyl isobutyrate, ethyl caprylate, butyl stearate, ethyl benzoate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, propyl 3-methoxypropionate, butyl 3-methoxypropionate, and γ-butyrolactone; Alkoxycarboxylic acids such as 3-methoxypropionic acid and 3-ethoxypropionic acid; Halogenated hydrocarbons such as butyl chloride and amyl chloride; Ether ketones such as methoxymethylpentanone; Examples include nitriles such as acetonitrile and benzonitrile.

[0240] Examples of commercially available organic solvents that can be used include mineral spirits, Balsol #2, Apco #18 solvent, Apco thinner, Socal solvent No. 1 and No. 2, Solvesso #150, Shell TS28 solvent, carbitol, ethyl carbitol, butyl carbitol, methyl cellosolve ("Cerosolve" is a registered trademark; the same applies hereinafter), ethyl cellosolve, ethyl cellosolve acetate, methyl cellosolve acetate, and Digrime (all trade names). These organic solvents may be used individually or in combination of two or more.

[0241] When forming partitions using photolithography, it is preferable to select an organic solvent with a boiling point of 100 to 240°C, more preferably 120 to 200°C, and even more preferably 120 to 170°C.

[0242] Among the above organic solvents, glycol alkyl ether acetates are preferred because they offer a good balance of applicability and surface tension, and the solubility of the constituent components in the composition is relatively high. Glycol alkyl ether acetates may be used alone, or in combination with other organic solvents. Glycol monoalkyl ethers are particularly preferred as the organic solvent to be used in combination. Propylene glycol monomethyl ether is preferred due to the solubility of the components in the composition. Glycol monoalkyl ethers are highly polar, and if the amount added is too large, the pigment tends to aggregate, and the storage stability of the resulting photosensitive colored composition tends to decrease, such as an increase in viscosity. Therefore, the proportion of glycol monoalkyl ethers in the solvent is preferably 5% to 30% by mass, and more preferably 5% to 20% by mass.

[0243] It is also preferable to use an organic solvent with a boiling point of 150°C or higher (hereinafter sometimes referred to as "high-boiling point solvent"). By using a high-boiling point solvent, the photosensitive colored composition will dry more slowly, but this has the effect of preventing the uniform dispersion state of the pigment in the composition from being destroyed by rapid drying. In other words, it has the effect of preventing the occurrence of foreign matter defects due to precipitation and solidification of colorants, etc., at the tip of the slit nozzle, for example. Due to the high effectiveness of this effect, among the various solvents mentioned above, diethylene glycol mono-n-butyl ether, diethylene glycol mono-n-butyl ether acetate, and diethylene glycol monoethyl ether acetate are particularly preferred.

[0244] When a high-boiling point solvent is used in combination, the content of the high-boiling point solvent in the organic solvent is preferably 3% to 50% by mass, more preferably 5% to 40% by mass, and particularly preferably 5% to 30% by mass. Setting it above the lower limit tends to suppress the precipitation and solidification of colorants, etc., at the tip of the slit nozzle, which can cause foreign matter defects. Setting it below the upper limit tends to suppress the slow drying temperature of the composition, which can suppress problems such as poor cycle times in the vacuum drying process and pin marks from pre-baking.

[0245] The high-boiling-point solvent with a boiling point of 150°C or higher may be a glycol alkyl ether acetate or a glycol alkyl ether. In this case, it is not necessary to separately include a high-boiling-point solvent with a boiling point of 150°C or higher. Preferred high-boiling point solvents include, among the various solvents mentioned above, diethylene glycol mono-n-butyl ether acetate, diethylene glycol monoethyl ether acetate, dipropylene glycol methyl ether acetate, 1,3-butylene glycol diacetate, 1,6-hexanol diacetate, and triacetin.

[0246] <(f) Dispersant> The photosensitive colored composition of the present invention contains (f) a dispersant. By containing (f) a dispersant, (a) the colorant can be stably dispersed. The (f) dispersant in the photosensitive colored composition of the present invention contains an acrylic copolymer (f1) having repeating units represented by the following general formulas (1) to (3) (hereinafter sometimes referred to as "dispersant (f1)"), and does not have repeating units containing quaternary ammonium groups.

[0247] [ka]

[0248] (In formula (1), R 31 This is an optionally substituted alkyl group, an optionally substituted aryl group, or an optionally substituted aralkyl group. R 32 This is a hydrogen atom or a methyl group. * represents a bond.

[0249] [ka]

[0250] (In formula (2), R 33 R is a methylene group, an ethylene group, or a propylene group. 34 R is an alkyl group which may have substituents, 35 This is a hydrogen atom or a methyl group. n is an integer between 1 and 20. * represents a bond.

[0251] [ka]

[0252] (In formula (3), R 36 and R 37 Each of these is independently a hydrogen atom, an optionally substituted alkyl group, an optionally substituted aryl group, or an optionally substituted aralkyl group, and R 36 and R 37 These may combine with each other to form a ring structure. R 38 This is a hydrogen atom or a methyl group. Z is a divalent linking group. * represents a bond.

[0253] The dispersant (f1) has repeating units represented by the following general formula (1) from the viewpoint of improving compatibility with solvents and alkali-soluble resins and enhancing dispersion stability.

[0254] [ka]

[0255] (In formula (1), R31 This is an optionally substituted alkyl group, an optionally substituted aryl group, or an optionally substituted aralkyl group. R 32 This is a hydrogen atom or a methyl group. * represents a bond.

[0256] (R 31 ) In the above equation (1), R 31 Examples of alkyl groups in this context include linear, branched, or cyclic alkyl groups. From the viewpoint of compatibility with solvents and alkali-soluble resins, linear groups are preferred, and from the viewpoint of affinity for pigments, branched groups are preferred. The number of carbon atoms in the alkyl group is not particularly limited, but is usually 1 or more, preferably 2 or more, more preferably 4 or more, preferably 10 or less, more preferably 8 or less, and still preferably 6 or less. The above upper and lower limits can be combined arbitrarily. For example, 1 to 10 is preferred, 2 to 8 is more preferred, and 4 to 6 is still preferred. Setting it above the lower limit tends to increase affinity to pigments. Setting it below the upper limit tends to increase compatibility with solvents and alkali-soluble resins and improve dispersibility. Examples of alkyl groups include methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl, octyl, and ethylhexyl groups. From the viewpoint of compatibility with solvents and alkali-soluble resins, methyl and ethyl groups are preferred, with methyl groups being more preferred. Examples of substituents that the alkyl group may have include alkoxy groups such as methoxy and ethoxy groups; halogen atoms such as fluorine, chlorine, and bromine atoms; and aryl groups such as phenyl and naphthyl groups. From the viewpoint of compatibility with solvents and alkali-soluble resins, it is preferable that the alkyl group be unsubstituted, and from the viewpoint of affinity for pigments, it is preferable that it be a phenyl group.

[0257] R 31 Examples of aryl groups in this context include monovalent aromatic hydrocarbon ring groups and monovalent aromatic heterocyclic ring groups. The number of carbon atoms in the aryl group is not particularly limited, but is usually 6 or more, preferably 16 or less, more preferably 12 or less, and even more preferably 10 or less. Keeping it below the above upper limit tends to increase the affinity to the pigment. Examples of aryl groups include phenyl, naphthyl, and anthracenyl groups, and from the viewpoint of dispersibility, phenyl and naphthyl groups are preferred, with phenyl being more preferred. Examples of substituents that the aryl group may have include alkyl groups such as methyl and ethyl groups; alkoxy groups such as methoxy and ethoxy groups; halogen atoms such as fluorine, chlorine, and bromine atoms; aryl groups such as phenyl and naphthyl groups; and aralkyl groups such as benzyl and phenethyl groups. From the viewpoint of dispersibility, it is preferable that the group be unsubstituted.

[0258] Among these, R 31 Preferably, the alkyl group may have substituents, and more preferably, a methyl group, a butyl group, an ethylhexyl group, or a benzyl group.

[0259] The dispersant (f1) has repeating units represented by the following general formula (2) from the viewpoint of compatibility with solvents and alkali-soluble resins.

[0260] [ka]

[0261] (In formula (2), R 33 R is a methylene group, an ethylene group, or a propylene group. 34 R is an alkyl group which may have substituents, 35 This is a hydrogen atom or a methyl group. n is an integer between 1 and 20. * represents a bond.

[0262] In equation (2) above, R 33The group is a methylene group, an ethylene group, or a propylene group, but an ethylene group is preferred from the viewpoint of compatibility with solvents and alkali-soluble resins. In equation (2) above, R 34 The alkyl group may have substituents, but a methyl group or an ethyl group is preferred from the viewpoint of compatibility with solvents and alkali-soluble resins.

[0263] In formula (2) above, n is an integer from 1 to 20, but is preferably 1 or greater, more preferably 2 or greater, preferably 10 or less, and more preferably 5 or less. For example, is preferably 1 to 10, more preferably 1 to 5, and still preferably 2 to 5. Setting it above the lower limit tends to improve compatibility with solvents and alkali-soluble resins. Setting it below the upper limit tends to increase affinity to pigments and improve dispersibility.

[0264] The dispersant (f1) has repeating units represented by the general formula (3) above. It is preferably used from the viewpoint of preventing surface roughness of the electrode.

[0265] [ka]

[0266] (In formula (3), R 36 and R 37 Each of these is independently a hydrogen atom, an optionally substituted alkyl group, an optionally substituted aryl group, or an optionally substituted aralkyl group, and R 36 and R 37 These may combine with each other to form a ring structure. R 38 This is a hydrogen atom or a methyl group. Z is a divalent linking group. * represents a bond.

[0267] In equation (3) above, R 36 and R 37Each of these is independently a hydrogen atom, an optionally substituted alkyl group, an optionally substituted aryl group, or an optionally substituted aralkyl group. The optionally substituted alkyl group and optionally substituted aryl group are as follows: R in formula (1) above. 31 The items listed above can be preferably adopted.

[0268] In equation (3) above, R 36 and R 37 These may bond to each other to form a cyclic structure. Examples of cyclic structures include 5-7 membered nitrogen-containing heterocyclic monocyclic rings or fused rings formed by the fusion of two such rings. Nitrogen-containing heterocyclic rings are preferably non-aromatic, and saturated rings are more preferably. Specifically, the following are examples.

[0269] [ka]

[0270] (These cyclic structures may have further substituents.) * represents a bond.

[0271] (Z) In equation (3) above, Z is a divalent linking group. Examples of divalent linking groups include single bonds, alkylene groups with 1 to 10 carbon atoms, arylene groups with 6 to 12 carbon atoms, and -CONH-R 39 -GROUP, -COOR 40 -Base (however, R 39 and R 40 Each of these is independently a single bond, an alkylene group having 1 to 10 carbon atoms, or an ether group (alkyloxyalkyl group) having 2 to 10 carbon atoms. Examples include -COOR from the perspective of dispersibility. 7 -Base is preferred. 40 Among these, from the viewpoint of the long-term stability of the dispersion, alkylene groups having 1 to 10 carbon atoms are preferred, alkylene groups having 1 to 5 carbon atoms are more preferred, and alkylene groups having 1 to 3 carbon atoms are even more preferred.

[0272] The content of repeating units represented by general formula (1) (hereinafter sometimes referred to as "repeating units (1)") in the dispersant (f1) is not particularly limited, but is preferably 20 mol% or more, more preferably 30 mol% or more, even more preferably 40 mol% or more, even more preferably 50 mol% or more, particularly preferably 60 mol% or more, and also preferably 90 mol% or less, more preferably 85 mol% or less, even more preferably 80 mol% or less, and particularly preferably 75 mol% or less. The above upper and lower limits can be arbitrarily combined. For example, 20 mol% to 90 mol% is preferred, 30 mol% to 90 mol% is more preferred, 40 mol% to 80 mol% is even more preferred, 50 mol% to 80 mol% is even more preferred, and 60 mol% to 80 mol% is particularly preferred. Setting it above the lower limit tends to increase affinity to pigments. Setting it below the upper limit tends to increase compatibility with solvents and alkali-soluble resins.

[0273] The content ratio of the repeating units represented by the general formula (2) in the dispersant (f1) (hereinafter sometimes referred to as "repeating units (2)") is not particularly limited, but it is preferably 1 mol% or more, more preferably 2 mol% or more, even more preferably 2.5 mol% or more, particularly preferably 3 mol% or more, and also preferably 30 mol% or less, more preferably 20 mol% or less, even more preferably 15 mol% or less, even more preferably 10 mol% or less, and particularly preferably 8 mol% or less. The above upper and lower limits can be arbitrarily combined. For example, 1 mol% to 30 mol% is preferred, 1 mol% to 20 mol% is preferred, 1 mol% to 15 mol% is even preferred, even more preferably 1 mol% to 10 mol% is even preferred, and 2 mol% to 10 mol% is particularly preferred. Setting it above the lower limit tends to increase compatibility with solvents and alkali-soluble resins. Setting it below the upper limit tends to increase affinity with pigments.

[0274] The content ratio of the repeating units represented by the general formula (3) in the dispersant (f1) (hereinafter sometimes referred to as "repeating units (3)") is not particularly limited, but it is preferably 10 mol% or more, more preferably 20 mol% or more, even more preferably 25 mol% or more, and particularly preferably 30 mol% or more, and also preferably 50 mol% or less, more preferably 45 mol% or less, even more preferably 40 mol% or less, and particularly preferably 35 mol% or less. The above upper and lower limits can be combined arbitrarily. For example, 10 mol% to 50 mol% is preferred, 20 mol% to 40 mol% is preferred, 25 mol% to 35 mol% is even more preferred, and 30 mol% to 35 mol% is particularly preferred. Setting it above the lower limit tends to result in good dispersibility. Setting it below the upper limit tends to result in good temporal stability of the dispersion.

[0275] The dispersant (f1) may be contained in either a random copolymer or a block copolymer, but from the viewpoint of dispersibility, it is preferably a block copolymer, and the block copolymer preferably contains block A containing repeating units having solvent-philic groups and block B containing repeating units having pigment-adsorbing groups.

[0276] The dispersant (f1) is preferably contained in the repeating unit (1), and the repeating unit (2) is preferably contained in block A, and may be contained in either random copolymerization or block copolymerization. In addition, there may be two or more types of repeating unit (1) and repeating unit (2) in block A, in which case each repeating unit may be contained in block A in either random copolymerization or block copolymerization.

[0277] Repeating units other than repeating units (1) and (2) may be contained in block A, and such repeating units include styrene monomers such as styrene and α-methylstyrene; (meth)acrylate monomers such as (meth)acrylate chloride; (meth)acrylamide monomers such as (meth)acrylamide and N-methylolacrylamide; vinyl acetate; acrylonitrile; allyl glycidyl ether, glycidyl crotonic acid ether; and repeating units derived from N-methacryloylmorpholine.

[0278] Among these, the block copolymer having block A having repeating unit (1) and repeating unit (2), and block B having repeating unit (3) is more preferably an AB block copolymer or an ABA block copolymer.

[0279] The amine value of the dispersant (f1) is not particularly limited, but is preferably 50 mg KOH / g or higher, more preferably 80 mg KOH / g or higher, even more preferably 90 mg KOH / g or higher, particularly preferably 100 mg KOH / g or higher, and also preferably 200 mg KOH / g or less, more preferably 160 mg KOH / g or less, even more preferably 140 mg KOH / g or less, and particularly preferably 130 mg KOH / g or less. The above upper and lower limits can be arbitrarily combined. For example, 50 mg KOH / g to 200 mg KOH / g is preferred, 80 mg KOH / g to 160 mg KOH / g is preferred, 100 mg KOH / g to 140 mg KOH / g is even more preferred, and 100 mg KOH / g to 130 mg KOH / g is particularly preferred. Setting it above the lower limit tends to suppress surface roughness of the electrode. Setting it below the upper limit tends to improve the time-dependent stability of the dispersion. The amine value is expressed as the amount of base and the mass of equivalent KOH per gram of solid content of the dispersant (f1).

[0280] The acid value of the dispersant (f1) is not particularly limited, but from the viewpoint of dispersibility, it is preferably 10 mg KOH / g or less, more preferably 5 mg KOH / g or less, even more preferably 1 mg KOH / g, and particularly preferably 0 mg KOH / g.

[0281] The weight-average molecular weight of the dispersant (f1) is not particularly limited, but is preferably 3000 or more, more preferably 5000 or more, even more preferably 7000 or more, and also preferably 100000 or less, more preferably 50000 or less, and even more preferably 10000 or less. The above upper and lower limits can be combined arbitrarily. For example, 3000 to 100000 is preferred, 5000 to 50000 is more preferred, and 7000 to 10000 is even more preferred. Setting it above the lower limit tends to improve dispersibility. Setting it below the upper limit tends to improve the temporal stability of the dispersion.

[0282] The chlorine atom content in the dispersant (f1) is not particularly limited, but is preferably 1.0% by mass or less, more preferably 0.5% by mass or less, even more preferably 0.2% by mass or less, and particularly preferably substantially free of chlorine atoms, i.e., 0.1% by mass or less. Keeping it below the above upper limit tends to suppress surface roughness.

[0283] The method for producing the dispersant (f1) is not particularly limited, and known methods can be employed. Examples include the methods described in Japanese Patent Publication No. 01-299014, Japanese Patent Publication No. 2017-019937, Japanese Patent Publication No. 2018-172530, Japanese Patent Publication No. 2018-203795, Japanese Patent Publication No. 2019-099801, and International Publication No. 2019 / 079659.

[0284] The (f) dispersant in the photosensitive colored composition of the present invention may contain dispersants other than dispersant (f1) (hereinafter sometimes referred to as "other dispersants").

[0285] Other dispersants that offer good dispersion stability include, for example, dispersants having carboxyl groups or their bases; primary, secondary, or tertiary amino groups; quaternary ammonium bases; and nitrogen-containing heterocyclic groups such as pyridine, pyrimidine, and pyrazine. Among these, dispersants having basic functional groups, such as primary, secondary, or tertiary amino groups; quaternary ammonium bases; and nitrogen-containing heterocyclic groups such as pyridine, pyrimidine, and pyrazine, are more preferred. Furthermore, polymer dispersants are preferred because they allow for dispersion of pigments with only a small amount of dispersant.

[0286] Examples of polymer dispersants include acrylic dispersants other than dispersant (f1), urethane dispersants, polyethyleneimine dispersants, polyallylamine dispersants, dispersants composed of monomers and macromonomers having amino groups, polyoxyethylene alkyl ether dispersants, polyoxyethylene diester dispersants, polyether phosphate dispersants, polyester phosphate dispersants, sorbitan aliphatic ester dispersants, and aliphatic-modified polyester dispersants.

[0287] Examples of such polymer dispersants include, by trade name, EFKA (registered trademark, manufactured by BASF), DISPERBYK (registered trademark, manufactured by Bic Chemie), Disparon (registered trademark, manufactured by Kusumoto Chemical Co., Ltd.), SOLSPERSE (registered trademark, manufactured by Lubrizol Corporation), KP (manufactured by Shin-Etsu Chemical Co., Ltd.), Polyflow (manufactured by Kyoeisha Chemical Co., Ltd.), and Azisper (registered trademark, manufactured by Ajinomoto Co., Ltd.).

[0288] Examples of urethane-based and acrylic polymer dispersants include the DISPERBYK 160-166 and 182 series (all urethane-based), DISPERBYK 2000, 2001, and BYK-LPN21116 (all acrylic-based) (all manufactured by Bic Chemie).

[0289] Other dispersants may be used individually or in combination of two or more.

[0290] <Other ingredients in the photosensitive coloring composition> In addition to the components mentioned above, the photosensitive colored composition of the present invention may appropriately contain additives such as adhesion enhancers like silane coupling agents, surfactants, pigment derivatives, photoacid generators, crosslinking agents, mercapto compounds, and polymerization inhibitors.

[0291] (1) Adhesion enhancer The photosensitive colored composition of the present invention may contain an adhesion enhancer to improve adhesion to the substrate. Preferred adhesion enhancers include silane coupling agents and phosphate group-containing compounds. Silane coupling agents come in various types, including epoxy, (meth)acrylic, and amino types, which can be used individually or in combination of two or more.

[0292] Examples of silane coupling agents include (meth)acryloxysilanes such as 3-methacryloxypropylmethyldimethoxysilane and 3-methacryloxypropyltrimethoxysilane; epoxysilanes such as 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldiethoxysilane and 3-glycidoxypropyltriethoxysilane; ureidosilanes such as 3-ureidopropyltriethoxysilane; and isocyanatesilanes such as 3-isocyanatetopropyltriethoxysilane. Epoxysilane silane coupling agents are particularly preferred. As the phosphate group-containing compound, (meth)acryloyl group-containing phosphates are preferred, and those represented by the following general formulas (g1), (g2), or (g3) are preferred.

[0293] [ka]

[0294] In the above general formulas (g1), (g2), and (g3), R 51 l represents a hydrogen atom or a methyl group, l and l' are integers from 1 to 10, and m is 1, 2, or 3. These phosphate-containing compounds may be used individually or in combination of two or more.

[0295] (2) Surfactants The photosensitive coloring composition of the present invention may contain a surfactant to improve its applicability.

[0296] Various types of surfactants can be used, such as anionic, cationic, nonionic, and amphoteric surfactants. Among these, nonionic surfactants are preferred because they are less likely to adversely affect various properties, and fluorine-based and silicone-based surfactants are particularly effective in terms of application properties. Examples of such surfactants include TSF4460 (manufactured by Momentive Performance Materials), DFX-18 (manufactured by Neos), BYK-300, BYK-325, BYK-330 (manufactured by BIC Chemie), KP340 (manufactured by Shin-Etsu Silicone Co., Ltd.), F-470, F-475, F-478, F-554, F-559 (manufactured by DIC Corporation), SH7PA (manufactured by Toray Dow Corning), DS-401 (manufactured by Daikin Corporation), L-77 (manufactured by Nippon Unicar Co., Ltd.), and FC4430 (manufactured by 3M Corporation). One type of surfactant may be used, or two or more types may be used in any combination and ratio.

[0297] (3) Pigment derivatives The photosensitive colored composition of the present invention may contain a pigment derivative as a dispersion aid to improve dispersibility and shelf life. Examples of pigment derivatives include azo, phthalocyanine, quinacridone, benzimidazolon, quinophthalone, isoindolinone, dioxazine, anthraquinone, indanthrene, perylene, perinone, diketopyrrolopyrrole, and dioxazine derivatives, but phthalocyanine and quinophthalone derivatives are preferred among them. Examples of substituents for pigment derivatives include sulfonic acid groups, sulfonamide groups and their quaternary salts, phthalimidomethyl groups, dialkylaminoalkyl groups, hydroxyl groups, carboxyl groups, and amide groups, which are directly bonded to the pigment skeleton or via alkyl groups, aryl groups, heterocyclic groups, etc., with sulfonic acid groups being preferred. Furthermore, multiple substituents may be present on a single pigment skeleton.

[0298] Examples of pigment derivatives include sulfonic acid derivatives of phthalocyanine, quinophthalone, anthraquinone, quinacridone, diketopyrrolopyrrole, and dioxazine. These may be used individually or in combination of two or more.

[0299] (4) Mercapto compounds Mercapto compounds can also be added as polymerization accelerators and to improve adhesion to the substrate.

[0300] Examples of mercapto compounds include 2-mercaptobenzothiazole, 2-mercaptobenzoxazole, 2-mercaptobenzimidazole, hexanedithiol, decanedithiol, 1,4-dimethylmercaptobenzene, butanediol bisthiopropionate, butanediol bisthioglycolate, ethylene glycol bisthioglycolate, trimethylolpropane tristhioglycolate, butanediol bisthiopropionate, trimethylolpropane tristhiopropionate, trimethylolpropane tristhioglycolate, pentaerythritol tetrakisthiopropionate, pentaerythritol tetrakisthioglycolate, trishydroxyethyl tristhiopropionate, ethylene glycol bis( Examples include heterocyclic mercapto compounds such as 3-mercaptobutyrate, butanediol bis(3-mercaptobutyrate), 1,4-bis(3-mercaptobutyryloxy)butane, trimethylolpropane tris(3-mercaptobutyrate), pentaerythritol tetrakis(3-mercaptobutyrate), pentaerythritol tris(3-mercaptobutyrate), ethylene glycol bis(3-mercaptoisobutyrate), butanediol bis(3-mercaptoisobutyrate), trimethylolpropane tris(3-mercaptoisobutyrate), and 1,3,5-tris(3-mercaptobutyloxyethyl)-1,3,5-triazine-2,4,6(1H,3H,5H)-trione, as well as aliphatic polyfunctional mercapto compounds. These can be used individually or in combination of two or more.

[0301] (5) Polymerization inhibitors The photosensitive coloring composition of the present invention may contain a polymerization inhibitor from the viewpoint of controlling the shape of the cured product. It is believed that by including a polymerization inhibitor, the radical polymerization of the layer beneath the coating film can be inhibited, thereby allowing control of the taper angle (the angle between the support and the cured product in the cross-section of the cured product). Examples of polymerization inhibitors include hydroquinone, hydroquinone monomethyl ether, methylhydroquinone, methoxyphenol, and 2,6-di-tert-butyl-4-cresol (BHT). Among these, 2,6-di-tert-butyl-4-cresol is preferred from the viewpoint of shape control. Hydroquinone monomethyl ether and methylhydroquinone are also preferred from the viewpoint of superior safety for the human body. Polymerization inhibitors can be used individually or in combination of two or more types. (b) When producing an alkali-soluble resin, a polymerization inhibitor may be included in the resin, and this may be used as the polymerization inhibitor of the present invention. Alternatively, in addition to the polymerization inhibitor in the resin, the same or a different polymerization inhibitor may be added when producing the photosensitive colored composition.

[0302] If the photosensitive coloring composition contains a polymerization inhibitor, the content ratio is not particularly limited, but is usually 0.0005% by mass or more, preferably 0.001% by mass or more, more preferably 0.01% by mass or more, and usually 0.3% by mass or less, preferably 0.2% by mass or less, and more preferably 0.1% by mass or less, relative to the total solid content of the photosensitive coloring composition. The above upper and lower limits can be arbitrarily combined. For example, 0.0005% by mass to 0.3% by mass is preferred, 0.001% by mass to 0.2% by mass is more preferred, and 0.01% by mass to 0.1% by mass is even more preferred. Setting the value above the lower limit tends to allow control of the shape of the cured product. Setting the value below the upper limit tends to allow maintenance of the required sensitivity.

[0303] <Percentage of each component in the photosensitive colored composition> The content of (a) the colorant in the photosensitive colored composition of the present invention is not particularly limited, but is preferably 5% by mass or more, more preferably 10% by mass or more, even more preferably 15% by mass or more, even more preferably 20% by mass or more, and also preferably 50% by mass or less, more preferably 40% by mass or less, even more preferably 30% by mass or less, and particularly preferably 25% by mass or less. The above upper and lower limits can be arbitrarily combined. For example, 5% to 50% by mass is preferred, 10% to 40% by mass is preferred, 15% to 40% by mass is even preferred, 15% to 30% by mass is even more preferred, and 15% to 25% by mass is particularly preferred. Setting it above the lower limit tends to ensure light shielding properties. Setting it below the upper limit tends to reduce the amount of dispersant and suppress surface roughness.

[0304] In the first embodiment, the content of compound (I) in the photosensitive colored composition is preferably 5% by mass or more, more preferably 10% by mass or more, even more preferably 15% by mass or more, particularly preferably 20% by mass or more, and usually 50% by mass or less, preferably 40% by mass or less, more preferably 30% by mass or less, and particularly preferably 25% by mass or less. The above upper and lower limits can be arbitrarily combined. For example, 5% to 70% by mass is preferred, 20% to 70% by mass is more preferred, 20% to 60% by mass is even more preferred, and 20% to 50% by mass is particularly preferred. Setting the value above the lower limit tends to increase light shielding while suppressing the loss of ultraviolet light necessary for curing. Setting the value below the upper limit tends to reduce the amount of dispersant and suppress surface roughness.

[0305] In the first embodiment, (a) when the colorant contains compound (I) and other pigments, the total percentage of their content is not particularly limited, but the percentage of compound (I) in (a) the colorant is preferably 10% by mass or more, more preferably 20% by mass or more, even more preferably 30% by mass or more, and preferably 90% by mass or less, more preferably 80% by mass or less, and particularly preferably 70% by mass or less. The above upper and lower limits can be combined arbitrarily. For example, 10% by mass to 90% by mass is preferred, 20% by mass to 80% by mass is more preferred, and 30% by mass to 70% by mass is even more preferred. Setting the value above the lower limit tends to improve light shielding and allow for a color tone close to black. Setting the value below the upper limit tends to reduce residue during development and improve reliability during element fabrication.

[0306] In the first embodiment, when (a) the colorant contains compound (I) and an organic coloring pigment, the total percentage of their content is not particularly limited, but the percentage of compound (I) in (a) the colorant is preferably 10% by mass or more, more preferably 20% by mass or more, even more preferably 30% by mass or more, and preferably 90% by mass or less, more preferably 80% by mass or less, and particularly preferably 70% by mass or less. The above upper and lower limits can be combined arbitrarily. For example, 10% by mass to 90% by mass is preferred, 20% by mass to 80% by mass is more preferred, and 30% by mass to 70% by mass is even more preferred. Setting the value above the lower limit tends to increase light shielding properties and allow for a color tone close to black. Setting the value below the upper limit tends to reduce residue during development and improve reliability during element fabrication.

[0307] When a photosensitive colored composition contains an organic coloring pigment, its content is not particularly limited, but is preferably 5% by mass or more, more preferably 10% by mass or more, even more preferably 15% by mass or more, and particularly preferably 20% by mass or more, relative to the total solid content of the photosensitive colored composition. It is usually 50% by mass or less, preferably 40% by mass or less, more preferably 30% by mass or less, and particularly preferably 25% by mass or less. The above upper and lower limits can be combined arbitrarily. For example, 5% to 70% by mass is preferred, 20% to 70% by mass is more preferred, 20% to 60% by mass is even more preferred, and 20% to 50% by mass is particularly preferred. Setting the value above the lower limit tends to increase light-shielding properties. Setting the value below the upper limit tends to reduce the amount of dispersant and suppress surface roughness.

[0308] (a) When the coloring agent contains a red pigment and / or an orange pigment, the total percentage of the red pigment and the orange pigment is not particularly limited, but (a) it is preferably 5% by mass or more, more preferably 8% by mass or more, even more preferably 10% by mass or more, particularly preferably 12% by mass or more, and also preferably 40% by mass or less, more preferably 30% by mass or less, and particularly preferably 20% by mass or less. The above upper and lower limits can be combined arbitrarily. For example, 5% by mass to 40% by mass is preferred, 8% by mass to 40% by mass is preferred, 10% by mass to 30% by mass is even more preferred, and 12% by mass to 20% by mass is particularly preferred. Setting it above the lower limit tends to result in a color tone close to black. Setting it below the upper limit tends to result in high sensitivity.

[0309] (a) When the coloring agent contains a blue pigment and / or a purple pigment, the total percentage of the blue pigment and the purple pigment is not particularly limited, but (a) it is preferably 30% by mass or more, more preferably 50% by mass or more, even more preferably 70% by mass or more, particularly preferably 80% by mass or more, and also preferably 95% by mass or less, more preferably 92% by mass or less, and particularly preferably 90% by mass or less. The above upper and lower limits can be combined arbitrarily. For example, 30% by mass to 95% by mass is preferred, 50% by mass to 95% by mass is preferred, 70% by mass to 92% by mass is even more preferred, and 80% by mass to 90% by mass is particularly preferred. Setting it above the lower limit tends to result in a color tone close to black. Setting it below the upper limit tends to result in good sensitivity and light shielding properties.

[0310] (a) When the colorant contains both a red pigment and / or an orange pigment and a blue pigment and / or a purple pigment, the content of the red pigment and / or orange pigment is not particularly limited in relation to the content of the blue pigment and / or purple pigment, but is preferably 1% by mass or more, more preferably 3% by mass or more, even more preferably 5% by mass or more, particularly preferably 8% by mass or more, and also preferably 300% by mass or less, more preferably 100% by mass or less, and particularly preferably 50% by mass or less. The above upper and lower limits can be combined arbitrarily. For example, 1% by mass to 300% by mass is preferred, 3% by mass to 100% by mass is preferred, 5% by mass to 100% by mass is even more preferred, and 8% by mass to 50% by mass is particularly preferred. Setting the value above the lower limit tends to suppress the transmission of blue light and increase the light-shielding properties. Setting the value below the upper limit tends to result in a color tone close to black.

[0311] When the photosensitive colored composition contains an organic black pigment, the proportion of the pigment is not particularly limited, but it is preferably 3% by mass or more, more preferably 5% by mass or more, even more preferably 10% by mass or more, and especially preferably 20% by mass or more, relative to the total solid content of the photosensitive colored composition. Also, it is preferably 60% by mass or less, more preferably 50% by mass or less, and especially preferably 40% by mass or less. The above upper and lower limits can be combined arbitrarily. For example, 3% to 60% by mass is preferred, 5% to 60% by mass is more preferred, 10% to 50% by mass is even more preferred, and 20% to 40% by mass is especially preferred. Setting the value above the lower limit tends to increase light-shielding properties. Setting the value below the upper limit allows for a reduction in the amount of dispersant, which tends to suppress surface roughness.

[0312] When the photosensitive colored composition contains carbon black as an inorganic black pigment, the content ratio is not particularly limited, but is preferably 1% by mass or more, more preferably 3% by mass or more, even more preferably 5% by mass or more, and preferably 30% by mass or less, more preferably 20% by mass or less, and particularly preferably 10% by mass or less, relative to the total solid content of the photosensitive colored composition. The above upper and lower limits can be combined arbitrarily. For example, 1% to 30% by mass is preferred, 3% to 20% by mass is more preferred, and 3% to 10% by mass is even more preferred. Setting the value above the lower limit tends to increase light shielding properties. Setting the value below the upper limit tends to form a cured product with high resistance and low dielectric constant.

[0313] (a) When the coloring agent contains a black pigment and an organic coloring pigment, the total proportion of these pigments is not particularly limited, but (a) the proportion of black pigment in the coloring agent is preferably 10% by mass or more, more preferably 20% by mass or more, even more preferably 30% by mass or more, and preferably 90% by mass or less, more preferably 80% by mass or less, and particularly preferably 70% by mass or less. The above upper and lower limits can be combined arbitrarily. For example, 10% by mass to 90% by mass is preferred, 20% by mass to 80% by mass is more preferred, and 30% by mass to 70% by mass is even more preferred. Setting the value above the lower limit tends to improve light shielding and allow for a color tone closer to black. Setting the value below the upper limit tends to reduce residue during development and improve reliability during element fabrication.

[0314] (b) The content of alkali-soluble resin is not particularly limited, but is usually 5% by mass or more, preferably 10% by mass or more, more preferably 20% by mass or more, even more preferably 30% by mass or more, particularly preferably 40% by mass or more, and usually 85% by mass or less, preferably 80% by mass or less, more preferably 70% by mass or less, even more preferably 60% by mass or less, and even more preferably 55% by mass or less. The above upper and lower limits can be combined arbitrarily. For example, 5% by mass to 80% by mass is preferred, 10% by mass to 70% by mass is more preferred, 20% by mass to 60% by mass is even more preferred, 30% by mass to 60% by mass is even more preferred, 30% by mass to 55% by mass is particularly preferred, and 40% by mass to 55% by mass is particularly preferred. Setting it to be above the lower limit tends to suppress the decrease in solubility of the unexposed portion in the developer and suppress development defects. By keeping the value below the aforementioned upper limit, it is possible to maintain appropriate sensitivity, suppress dissolution of the exposed area by the developer, and tend to suppress a decrease in the sharpness and adhesion of the pattern.

[0315] (b1) The content of epoxy (meth)acrylate resin is not particularly limited, but is usually 5% by mass or more, preferably 10% by mass or more, more preferably 15% by mass or more, even more preferably 20% by mass or more, even more preferably 30% by mass or more, and especially preferably 40% by mass or more, relative to the total solid content of the photosensitive colored composition of the present invention, and is usually 80% by mass or less, preferably 70% by mass or less, more preferably 60% by mass or less, and especially preferably 55% by mass or less. The above upper and lower limits can be combined arbitrarily. For example, 5% by mass to 80% by mass is preferred, 10% by mass to 70% by mass is more preferred, 20% by mass to 60% by mass is even more preferred, 30% by mass to 60% by mass is even more preferred, 30% by mass to 55% by mass is especially preferred, and 40% by mass to 55% by mass is particularly preferred. Setting it to above the lower limit tends to ensure solubility of the unexposed portion in the developer. By keeping the value below the aforementioned upper limit, it is possible to maintain appropriate sensitivity, suppress dissolution of the exposed area by the developer, and tend to suppress a decrease in the sharpness and adhesion of the pattern.

[0316] (b) The content of (b1) epoxy (meth)acrylate resin contained in the alkali-soluble resin is not particularly limited, but is usually 20% by mass or more, preferably 30% by mass or more, more preferably 40% by mass or more, and usually 100% by mass or less, preferably 90% by mass or less, more preferably 80% by mass or less. The above upper and lower limits can be arbitrarily combined. For example, 20% by mass to 90% by mass is preferred, 30% by mass to 80% by mass is more preferred, and 40% by mass to 80% by mass is even more preferred. Setting it above the lower limit tends to ensure solubility of the unexposed areas in the developer. Setting it below the upper limit tends to maintain appropriate sensitivity, suppress dissolution of the exposed areas by the developer, and suppress a decrease in the sharpness and adhesion of the pattern.

[0317] (c) The content of the photopolymerization initiator is not particularly limited, but is usually 0.1% by mass or more, preferably 0.5% by mass or more, more preferably 1% by mass or more, even more preferably 2% by mass or more, and even more preferably 3% by mass or more, relative to the total solid content of the photosensitive colored composition of the present invention, and is usually 15% by mass or less, preferably 10% by mass or less, more preferably 8% by mass or less, and even more preferably 6% by mass or less. The above upper and lower limits can be combined arbitrarily. For example, 0.1% by mass to 15% by mass is preferred, 0.5% by mass to 15% by mass is more preferred, 1% by mass to 10% by mass is even more preferred, 2% by mass to 8% by mass is even more preferred, and 3% by mass to 6% by mass is particularly preferred. Setting it above the lower limit tends to suppress the decrease in sensitivity. Setting it below the upper limit tends to suppress the decrease in solubility of the unexposed portion in the developer and suppress development defects.

[0318] (c) When a polymerization accelerator is used together with the photopolymerization initiator, the content ratio of the polymerization accelerator is not particularly limited, but is preferably 0.05% by mass or more, usually 10% by mass or less, and preferably 5% by mass or less, relative to the total solid content of the photosensitive colored composition of the present invention. Furthermore, it is preferable to use the polymerization accelerator in a ratio of usually 0.1 to 50 parts by mass, particularly 0.1 to 20 parts by mass, per 100 parts by mass of (c) photopolymerization initiator. Setting the content ratio of the polymerization accelerator above the lower limit tends to suppress the decrease in sensitivity to exposure light. Setting it below the upper limit tends to suppress the decrease in solubility of the unexposed portion in the developer and suppress development defects. (c) When a sensitizing dye is used together with a photopolymerization initiator, the proportion of the dye is not particularly limited, but from the viewpoint of sensitivity, it is usually 20% by mass or less, preferably 15% by mass or less, and more preferably 10% by mass or less, relative to the total solid content in the photosensitive colored composition.

[0319] (d) The content of the ethylenically unsaturated compound is not particularly limited, but is usually 1% by mass or more, preferably 5% by mass or more, more preferably 10% by mass or more, even more preferably 15% by mass or more, and usually 30% by mass or less, preferably 25% by mass or less, and even more preferably 20% by mass or less, relative to the total solid content of the photosensitive colored composition of the present invention. The above upper and lower limits can be combined arbitrarily. For example, 1% by mass to 30% by mass is preferred, 5% by mass to 20% by mass is more preferred, and 10% by mass to 20% by mass is even more preferred. Setting it above the lower limit tends to maintain appropriate sensitivity, suppress dissolution of the exposed area by the developer, and suppress a decrease in the sharpness and adhesion of the pattern. Setting it below the upper limit tends to suppress the high penetration of the developer into the exposed area, making it easier to obtain a good image.

[0320] The photosensitive colored composition of the present invention is prepared by (e) using a solvent so that the total solid content is preferably 5% by mass or more, more preferably 10% by mass or more, even more preferably 15% by mass or more, and preferably 50% by mass or less, more preferably 30% by mass or less, and even more preferably 25% by mass or less. The above upper and lower limits can be combined arbitrarily. For example, it is prepared so that it is preferably 5% by mass to 50% by mass, more preferably 10% by mass to 30% by mass, and even more preferably 15% by mass to 25% by mass.

[0321] (f) The content of the dispersant is not particularly limited, but is usually 1% by mass or more, preferably 2% by mass or more, more preferably 3% by mass or more, and usually 20% by mass or less, preferably 15% by mass or less, more preferably 10% by mass or less, and still preferably 7% by mass or less, based on the total solid content of the photosensitive colored composition. The above upper and lower limits can be combined arbitrarily. For example, 1% to 20% by mass is preferred, 2% to 15% by mass is more preferred, 3% to 10% by mass is still preferred, and 3% to 7% by mass is particularly preferred. Setting it above the lower limit tends to make it easier to obtain sufficient dispersibility. Setting it below the upper limit tends to suppress surface roughness of the electrode surface.

[0322] The content of the dispersant (f1) is not particularly limited, but is usually 1% by mass or more, preferably 2% by mass or more, more preferably 3% by mass or more, and usually 20% by mass or less, preferably 15% by mass or less, more preferably 10% by mass or less, and even more preferably 7% by mass or less, relative to the total solid content of the photosensitive colored composition. The above upper and lower limits can be arbitrarily combined. For example, 1% to 20% by mass is preferred, 2% to 15% by mass is more preferred, 3% to 10% by mass is even more preferred, and 3% to 7% by mass is particularly preferred. Setting it above the lower limit tends to make it easier to obtain sufficient dispersibility. Setting it below the upper limit tends to suppress surface roughness of the electrode surface.

[0323] The content of the dispersant (f1) is not particularly limited, but is usually 20% by mass or more, preferably 40% by mass or more, more preferably 60% by mass or more, even more preferably 80% by mass or more, and usually 100% by mass or less in the dispersant (f). Setting it above the lower limit tends to suppress surface roughness of the electrode surface.

[0324] (a) The ratio of the dispersant to 100 parts by mass of the colorant is not particularly limited, but is usually 5 parts by mass or more, more preferably 10 parts by mass or more, even more preferably 15 parts by mass or more, and usually 50 parts by mass or less, particularly preferably 30 parts by mass or less. The above upper and lower limits can be combined arbitrarily. For example, 5 to 50 parts by mass is preferred, 10 to 50 parts by mass is more preferred, and 15 to 30 parts by mass is even more preferred. Setting it above the lower limit tends to make it easier to obtain sufficient dispersibility. Setting it below the upper limit tends to suppress surface roughness on the electrode surface.

[0325] The content ratio of (b) alkali-soluble resin to 100 parts by mass of (d) ethylenically unsaturated compound is not particularly limited, but is usually 100 parts by mass or more, preferably 200 parts by mass or more, more preferably 250 parts by mass or more, even more preferably 300 parts by mass or more, and particularly preferably 350 parts by mass or more. Also, is usually 700 parts by mass or less, preferably 500 parts by mass or less, more preferably 450 parts by mass or less, and even more preferably 400 parts by mass or less. The above upper and lower limits can be combined arbitrarily. For example, 100 to 700 parts by mass is preferred, 200 to 700 parts by mass is more preferred, 250 to 500 parts by mass is even more preferred, 250 to 450 parts by mass is even more preferred, and 250 to 400 parts by mass is particularly preferred. Setting the value above the lower limit tends to result in a proper dissolution and development state without peeling, etc. Setting the value below the upper limit tends to result in an appropriate dissolution time in the developer.

[0326] When an adhesion enhancer is used, its content is not particularly limited, but is usually 0.1 to 5% by mass, preferably 0.2 to 3% by mass, and more preferably 0.4 to 2% by mass, relative to the total solid content of the photosensitive colored composition. A value above the lower limit tends to provide sufficient adhesion improvement. A value below the upper limit tends to suppress a decrease in sensitivity or the presence of residue after development, which can result in defects.

[0327] When surfactants are used, their content is not particularly limited, but is usually 0.001 to 10% by mass, preferably 0.005 to 1% by mass, more preferably 0.01 to 0.5% by mass, and most preferably 0.03 to 0.3% by mass, relative to the total solid content of the photosensitive coloring composition. Setting the value above the lower limit tends to result in smoothness and uniformity of the coated film. Setting the value below the upper limit tends to result in smoothness and uniformity of the coated film, and also tends to suppress deterioration of other properties.

[0328] <Chlorine atom content in photosensitive colored compositions> The photosensitive colored composition of the present invention has a chlorine atom content of 0.05% by mass or less relative to the total solid content of the photosensitive colored composition. The process of creating the partition involves a heat treatment to harden the photosensitive colored composition, as described later. At this time, surface roughness may occur on the electrode surface. Surface roughness can be observed with an optical microscope, and the surface roughness also increases. If surface roughness occurs on the electrode surface, it may not be possible to uniformly form the light-emitting layer in that area, which may cause display defects due to short circuits, etc., when an organic electroluminescent element is created. This is presumed to be because, during the heat treatment, especially during firing, chlorine atoms in the photosensitive colored composition decompose, volatilize, or sublimate, acting on metal electrodes such as silver, causing corrosion or etching, and surface roughness can be suppressed by keeping the chlorine atom content below a certain value.

[0329] Chlorine atoms in a photosensitive colored composition are mainly contained in the constituent materials such as (a) colorants, (b) alkali-soluble resins, and (f) dispersants, but may also be contained in other materials. In order to bring the chlorine atom content within the numerical range defined by this invention, the chlorine content of one of the constituent materials may be reduced, or the chlorine content of each material may be reduced and designed to fall within the specified numerical range.

[0330] The chlorine atom content in the photosensitive colored composition is not particularly limited, but is 0.05% by mass or less, preferably 0.04% by mass or less, more preferably 0.03% by mass or less, and even more preferably 0.01% by mass or less, relative to the total solid content of the photosensitive colored composition. Keeping it below the above upper limit tends to suppress surface roughness of the electrode. The chlorine atom content in the photosensitive colored composition is not particularly limited, but is usually 0.0005% by mass or more, preferably 0.001% by mass or more, and more preferably 0.002% by mass. Setting it above the lower limit is effective in that it allows for a reduction in the purification process during the manufacturing of each component material. The above upper and lower limits can be combined in any way. For example, 0.0005 to 0.05 mass% is preferred, 0.0005 to 0.04 mass% is more preferred, 0.001 to 0.03 mass% is even more preferred, and 0.002 to 0.01 mass% is particularly preferred.

[0331] The chlorine atom content in the photosensitive colored composition is not particularly limited, but is preferably 100 μg / g or less, more preferably 80 μg / g or less, even more preferably 50 μg / g or less, even more preferably 30 μg / g or less, and particularly preferably 10 μg / g or less, relative to the total mass of the photosensitive colored composition including the solvent. Keeping it below the above upper limit tends to suppress surface roughness of the electrode. The chlorine atom content in the photosensitive colored composition is not particularly limited, but is usually 0.5 μg / g or more, preferably 1.0 μg / g or more, and more preferably 2.0 μg / g or more. Setting it above the lower limit is effective in that it allows for a reduction in the purification process during the manufacturing of each component material. The above upper and lower limits can be combined in any way. For example, 0.5 to 100 μg / g is preferred, 0.5 to 80 μg / g is more preferred, 1.0 to 50 μg / g is even more preferred, 1.0 to 30 μg / g is even more preferred, and 2.0 to 10 μg / g is particularly preferred.

[0332] The content of chlorine atoms in the photosensitive coloring composition is not particularly limited, but is preferably 0.20% by mass or less, more preferably 0.15% by mass or less, even more preferably 0.10% by mass or less, even more preferably 0.05% by mass or less, and particularly preferably 0.03% by mass or less, based on 100% by mass of the content of (a) coloring agent in the photosensitive coloring composition. By keeping it below the above upper limit, surface roughness of the electrode tends to be suppressed. The chlorine atom content in the photosensitive colored composition is not particularly limited, but is usually 0.001% by mass or more, preferably 0.005% by mass or more, and more preferably 0.010% by mass. Setting it above the lower limit is effective in that it allows for a reduction in the purification process during the manufacturing of each component material. The above upper and lower limits can be combined in any way. For example, with respect to 100% by mass of the colorant content of (a) of the photosensitive colored composition, 0.001 to 0.20% by mass is preferred, 0.001 to 0.15% by mass is more preferred, 0.005 to 0.10% by mass is even more preferred, 0.005 to 0.05% by mass is even more preferred, and 0.010 to 0.03% by mass is particularly preferred.

[0333] The chlorine atom content in a photosensitive colored composition can be measured, for example, by combustion ion chromatography.

[0334] <Physical properties of photosensitive colored compositions> In the first embodiment, the optical density (OD) per 1 μm of film thickness of the photosensitive colored composition of the present invention is not particularly limited, but is preferably 0.5 or higher. In the second embodiment, it is 0.5 or higher. More preferably 0.7 or higher, even more preferably 1.0 or higher, even more preferably 1.3 or higher, particularly preferably 1.5 or higher, usually 4.0 or lower, preferably 3.0 or lower, and more preferably 2.0 or lower. The above upper and lower limits can be combined arbitrarily. In both the first and second embodiments, for example, 0.5 to 4.0 is preferred, 0.7 to 4.0 is more preferred, 1.0 to 3.0 is even more preferred, 1.3 to 3.0 is even more preferred, and 1.5 to 2.0 is particularly preferred. Setting it above the lower limit tends to provide sufficient light shielding. Setting it below the upper limit tends to result in good surface roughness of the electrodes.

[0335] The optical density (OD) per 1 μm of film thickness of the coating can be measured using a coating obtained by curing the photosensitive coloring composition of the present invention, and can be measured using a coating obtained by heat curing at 230°C for 20 minutes. Optical density refers to the transmitted optical density, which is expressed by the ISO visual density in the ISO 5-3 standard, based on the spectral sensitivity characteristics of the light-receiving section. Typically, a CIE (International Commission on Illumination) A light source is used as the light source. An example of a measuring instrument that can be used to measure transmitted optical density is the X-Rite 361T(V) from Sakata Inx Engineering Co., Ltd.

[0336] <Method for producing a photosensitive colored composition> The photosensitive colored composition of the present invention is manufactured according to conventional methods. Typically, (a) the coloring agent is preferably dispersed beforehand using a paint conditioner, sand grinder, ball mill, roll mill, stone mill, jet mill, homogenizer, etc. This dispersion process atomizes (a) the coloring agent, improving the coating characteristics of the resist.

[0337] Dispersion treatment is usually preferably carried out using a system that combines (a) a colorant, (e) a solvent, and (f) a dispersant, as well as (b) some or all of an alkali-soluble resin (hereinafter, the mixture subjected to dispersion treatment and the composition obtained by dispersion treatment may be referred to as "pigment dispersion"). In particular, using a polymer dispersant as (f) the dispersant is preferable because it suppresses the thickening of the obtained pigment dispersion and photosensitive colored composition over time, i.e., it provides excellent dispersion stability. Thus, in the process of producing a photosensitive colored composition, it is preferable to produce a pigment dispersion containing at least (a) a colorant, (e) a solvent, and (f) a dispersant. The (a) colorants, (e) solvents, and (f) dispersants that can be used in the pigment dispersion are preferably those described as usable in a photosensitive colored composition. Furthermore, the content ratios of each colorant in the pigment dispersion are preferably those described as content ratios in a photosensitive colored composition.

[0338] When a liquid containing all the components to be incorporated into a photosensitive colored composition is subjected to dispersion treatment, the heat generated during the dispersion treatment may cause highly reactive components to denature. Therefore, it is preferable to perform the dispersion treatment in a system containing a polymeric dispersant. When (a) dispersing the colorant with a sand grinder, glass beads or zirconia beads with a particle size of approximately 0.1 to 8 mm are preferably used. The dispersion treatment conditions are typically a temperature of 0°C to 100°C, preferably in the range of room temperature to 80°C. The dispersion time should be adjusted as appropriate, as the appropriate time varies depending on the composition of the liquid and the size of the dispersion treatment device. The guideline for dispersion is to control the gloss of the pigment dispersion so that the 20° specular gloss (JIS Z8741) of the photosensitive colored composition is in the range of 50 to 300. If the gloss of the photosensitive colored composition is low, it often means that the dispersion treatment is insufficient and rough pigment (colorant) particles remain, which may result in insufficient developability, adhesion, resolution, etc. If the dispersion treatment is performed until the gloss value exceeds the above range, the pigment will be crushed and a large number of ultrafine particles will be generated, which tends to impair the dispersion stability. The particle size of pigments dispersed in a pigment dispersion is typically 0.03 to 0.3 μm, and can be measured by dynamic light scattering.

[0339] Next, the pigment dispersion obtained by the above dispersion process is mixed with the other components contained in the photosensitive colored composition to obtain a homogeneous solution or dispersion. Since fine dust may be mixed into the liquid during the manufacturing process of the photosensitive colored composition, it is desirable to filter the obtained photosensitive colored composition using a filter or the like.

[0340] [Cured product] A cured product of the present invention can be obtained by curing the photosensitive coloring composition of the present invention. The cured product obtained by curing the photosensitive coloring composition of the present invention can be suitably used as a partition wall.

[0341] [Bulkhead] The photosensitive colored composition of the present invention can be suitably used to form partitions, particularly partitions for partitioning the organic layer of an organic electroluminescent device. Examples of organic layers used in an organic electroluminescent device include organic layers used as hole injection layers, hole transport layers, or hole transport layers on hole injection layers, as described in Japanese Patent Publication No. 2016-165396.

[0342] Next, a partition wall using the photosensitive colored composition of the present invention will be described according to its manufacturing method.

[0343] (1) Support The material of the support for forming the partition wall is not particularly limited as long as it has adequate strength. While substrates are primarily used, examples of materials include polyester resins such as polyethylene terephthalate, polyolefin resins such as polypropylene and polyethylene, thermoplastic resin sheets such as polycarbonate, polymethyl methacrylate, and polysulfone, epoxy resins, unsaturated polyester resins, thermosetting resin sheets such as poly(meth)acrylic resins, and various types of glass. Among these, glass and heat-resistant resins are preferred from the viewpoint of heat resistance. In addition, transparent electrodes such as ITO and IZO, or metal electrodes such as silver, gold, platinum, aluminum, and magnesium may be deposited on the surface of the substrate. Besides the substrates mentioned above, it is also possible to form the partition wall on a TFT array.

[0344] To improve surface properties such as adhesion, the support may be subjected to treatments as needed, such as corona discharge treatment, ozone treatment, or thin-film formation of various resins, including silane coupling agents and urethane resins. The substrate thickness is typically in the range of 0.05 to 10 mm, preferably 0.1 to 7 mm. When performing thin film formation treatment with various resins, the film thickness is typically in the range of 0.01 to 10 μm, preferably 0.05 to 5 μm.

[0345] (2) Bulkhead The photosensitive colored composition of the present invention can be used in the same applications as known photosensitive colored compositions for color filters. However, the case in which it is used as a partition will be described below with reference to a specific example of a method for forming a partition using the photosensitive colored composition of the present invention.

[0346] Typically, a photosensitive colored composition is supplied to a substrate where partitions are to be formed, either in the form of a film or a pattern, by methods such as coating, and the solvent is dried. Subsequently, a pattern is formed by methods such as photolithography, which involves exposure and development. After that, partitions are formed on the substrate by additional exposure or heat curing treatment as necessary.

[0347] (3) Formation of partitions [1] Method of supplying to the substrate The photosensitive colored composition of the present invention is typically supplied onto a substrate in a dissolved or dispersed state in a solvent. This can be done by conventionally known methods, such as the spinner method, wire bar method, flow coating method, die coating method, roll coating method, or spray coating method. Alternatively, it may be supplied in a patterned manner, for example, by an inkjet method or printing method. Among these, the die coating method is preferable from an overall viewpoint because it significantly reduces the amount of coating solution used, completely eliminates the influence of mist and other contaminants that can occur with the spin coating method, and suppresses the generation of foreign matter.

[0348] The amount of coating applied varies depending on the application, but for example, in the case of partitions, the dry film thickness is usually 0.5 μm to 10 μm, preferably 1 μm to 9 μm, and particularly preferably 1 μm to 7 μm. It is important that the dry film thickness or the height of the final partition is uniform across the entire substrate. By minimizing variation, the light-emitting layer can be created uniformly, and display defects during illumination can be suppressed.

[0349] When using the photosensitive coloring composition of the present invention to form partitions of different heights simultaneously by photolithography, the final formed partitions will have different heights.

[0350] In addition, known substrates such as glass substrates and array substrates can be used as the substrate. The substrate surface is preferably flat.

[0351] [2] Drying method Drying after supplying the photosensitive coloring composition onto the substrate is preferably done using a drying method that utilizes a hot plate, an IR oven, or a convection oven. A vacuum drying method, in which drying is performed in a vacuum chamber without increasing the temperature, may also be used in combination.

[0352] Drying conditions can be appropriately selected depending on the type of solvent component, the performance of the dryer used, etc. Drying time is usually selected in the range of 15 seconds to 5 minutes at a temperature of 40°C to 130°C, and preferably in the range of 30 seconds to 3 minutes at a temperature of 50°C to 110°C, etc., depending on the type of solvent component, the performance of the dryer used, etc.

[0353] [3] Exposure method Exposure is performed by superimposing a negative mask pattern onto the coating film of the photosensitive colored composition and irradiating it with ultraviolet or visible light through this mask pattern. When exposure is performed using an exposure mask, the exposure mask may be placed close to the coating film of the photosensitive colored composition, or the exposure mask may be placed at a distance from the coating film of the photosensitive colored composition and the exposure light projected through the exposure mask may be projected. A scanning exposure method using laser light without a mask pattern may also be used. If necessary, in order to prevent a decrease in the sensitivity of the photopolymerizable layer due to oxygen, exposure may be performed in an oxygen-free atmosphere or after forming an oxygen-blocking layer such as a polyvinyl alcohol layer on the photopolymerizable layer.

[0354] In a preferred embodiment of the present invention, when partitions of different heights are simultaneously formed by photolithography, for example, an exposure mask is used that has a light-shielding portion (light transmittance 0%) and multiple openings, with the opening having the highest average light transmittance (fully transparent opening) and an opening with a lower average light transmittance (intermediately transparent opening). This method creates a difference in the residual film rate due to the difference in average light transmittance between the intermediately transparent opening and the fully transparent opening, i.e., the difference in exposure amount. Intermediate transmission openings can be created, for example, by a matrix-like light-shielding pattern having minute polygonal light-shielding units. Alternatively, they can be created by controlling the light transmittance using films of absorbers such as chromium-based, molybdenum-based, tungsten-based, or silicon-based materials.

[0355] The light sources used for the above exposure are not particularly limited. Examples of light sources include lamps such as xenon lamps, halogen lamps, tungsten lamps, high-pressure mercury lamps, ultra-high-pressure mercury lamps, metal halide lamps, medium-pressure mercury lamps, low-pressure mercury lamps, carbon arcs, and fluorescent lamps, as well as lasers such as argon ion lasers, YAG lasers, excimer lasers, nitrogen lasers, helium-cadmium lasers, blue-violet semiconductor lasers, and near-infrared semiconductor lasers. Optical filters can also be used when irradiating with light of a specific wavelength.

[0356] The optical filter may be a thin film type in which the light transmittance at the exposure wavelength can be controlled. Examples of materials for such filters include Cr compounds (oxides, nitrides, oxynitrides, fluorides, etc. of Cr), MoSi, Si, W, and Al.

[0357] The exposure dose is not particularly limited, but is typically 1 mJ / cm². 2 Preferably 5 mJ / cm² 2 More preferably 10 mJ / cm² 2 The above is the standard, and the normal value is 300 mJ / cm². 2 Preferably 200 mJ / cm² 2 More preferably, 150 mJ / cm² 2 The following applies: In the proximity exposure method, the distance between the exposure target and the mask pattern is not particularly limited, but is usually 10 μm or more, preferably 50 μm or more, more preferably 75 μm or more, and usually 500 μm or less, preferably 400 μm or less, and more preferably 300 μm or less.

[0358] [4] Development method After the exposure described above, an image pattern can be formed on the substrate by developing with an aqueous solution of an alkaline compound or an organic solvent. The aqueous solution of the alkaline compound may further contain, for example, a surfactant, an organic solvent, a buffer, a complexing agent, a dye, or a pigment.

[0359] Examples of alkaline compounds include inorganic alkaline compounds such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, sodium bicarbonate, potassium bicarbonate, sodium silicate, potassium silicate, sodium metasilicate, sodium phosphate, potassium phosphate, sodium hydrogen phosphate, potassium hydrogen phosphate, sodium dihydrogen phosphate, potassium dihydrogen phosphate, and ammonium hydroxide; and organic alkaline compounds such as mono-, di-, or triethanolamine, mono-, di-, or trimethylamine, mono-, di-, or triethylamine, mono-, or diisopropylamine, n-butylamine, mono-, di-, or triisopropanolamine, ethyleneimine, ethylenediimine, tetramethylammonium hydroxide (TMAH), and choline. These alkaline compounds may also be mixtures of two or more types.

[0360] Examples of surfactants include nonionic surfactants such as polyoxyethylene alkyl ethers, polyoxyethylene alkylaryl ethers, polyoxyethylene alkyl esters, sorbitan alkyl esters, and monoglyceride alkyl esters; anionic surfactants such as alkylbenzene sulfonates, alkylnaphthalene sulfonates, alkyl sulfates, alkyl sulfonates, and sulfosuccinate ester salts; and amphoteric surfactants such as alkyl betaines and amino acids.

[0361] Examples of organic solvents include isopropyl alcohol, benzyl alcohol, ethyl cellosolve, butyl cellosolve, phenyl cellosolve, propylene glycol, and diacetone alcohol. Two or more of these organic solvents may be used in combination. Furthermore, the organic solvents may be used alone or in combination with water or aqueous solutions of alkaline compounds.

[0362] There are no particular restrictions on the development conditions, but typically the development temperature is 10-50°C, preferably 15-45°C, and more preferably 20-40°C. The development method can be, for example, immersion development, spray development, brush development, or ultrasonic development.

[0363] [5] Exposure and heat curing treatment After development, the substrate may be subjected to additional exposure in a manner similar to the exposure method described above, if necessary. After development or after additional exposure, a heat-curing treatment (also called firing) may be performed. The heat-curing treatment conditions are preferably a temperature of 100°C to 280°C, more preferably 150°C to 250°C, and a duration of 5 to 60 minutes.

[0364] The size and shape of the photosensitive colored composition of the present invention when used as a partition wall are appropriately adjusted according to the specifications of the organic electroluminescent device to which it is applied, but the height of the partition wall formed from the photosensitive colored composition of the present invention is usually about 0.5 to 10 μm. Furthermore, from the viewpoint of light shielding, the optical density (OD) per 1 μm of the partition wall of the present invention is preferably 0.7 or higher, more preferably 1.2 or higher, even more preferably 1.5 or higher, and particularly preferably 1.8 or higher. It is also preferably 4.0 or lower, and even more preferably 3.0 or lower. The above upper and lower limits can be combined arbitrarily. For example, 0.7 to 4.0 is preferred, 1.2 to 4.0 is more preferred, 1.5 to 3.0 is even more preferred, and 1.8 to 3.0 is particularly preferred. Here, the optical density (OD) is a value measured by the method described later.

[0365] [Organic electroluminescent element] The organic electroluminescent element of the present invention comprises a cured product of the present invention, for example, a partition wall. For example, various organic electroluminescent devices can be manufactured using a substrate having a partition pattern manufactured by the method described above. The method for forming the organic electroluminescent device is not particularly limited, but preferably, after forming a partition pattern on the substrate by the method described above, the organic electroluminescent device is manufactured by forming organic layers such as pixels using a vapor deposition method in which a functional material is sublimated in a vacuum and deposited into the area surrounded by the partitions on the substrate, or by a wet process such as a casting method, spin coating method, or inkjet printing method.

[0366] Examples of organic electroluminescent devices include bottom-emission and top-emission types. In bottom emission type systems, for example, a partition wall is formed on a glass substrate with stacked transparent electrodes, and a hole transport layer, light-emitting layer, electron transport layer, and metal electrode layer are stacked in the opening surrounded by the partition wall. On the other hand, in top emission type systems, for example, a partition wall is formed on a glass substrate with stacked metal electrode layers as a reflective layer, and an electron transport layer, light-emitting layer, hole transport layer, and transparent electrode layer are stacked in the opening surrounded by the partition wall. Examples of light-emitting layers include organic electroluminescent layers as described in Japanese Patent Publication No. 2009-146691 and Japanese Patent No. 5734681. Alternatively, quantum dots as described in Japanese Patent No. 5653387 and Japanese Patent No. 5653101 may be used.

[0367] The layer configuration is not limited to this; for example, the hole transport layer and electron transport layer may be stacked in a multilayer configuration consisting of two or more layers from the viewpoint of luminous efficiency. The thickness of each layer is not particularly limited, but is usually 1 to 500 nm from the viewpoint of luminous efficiency and brightness.

[0368] Organic electroluminescent elements may be formed with each RGB color separated into different apertures, or two or more colors may be stacked in a single aperture. From the viewpoint of improving reliability, organic electroluminescent elements may be provided with a sealing layer. The sealing layer has the function of preventing moisture in the air from adsorbing onto the organic electroluminescent element and reducing its luminous efficiency. From the viewpoint of improving light extraction efficiency, organic electroluminescent elements may be provided with a low-reflection film at the interface with air. By placing a low-reflection film at the interface between air and the element, it is expected that the refractive index gap will be reduced and reflection at the interface will be suppressed. For example, moth-eye structures and ultra-multilayer film technologies can be applied to such low-reflection films.

[0369] When using organic electroluminescent elements as pixels in an image display device, it is necessary to prevent light from the light-emitting layer of one pixel from leaking to other pixels. Furthermore, if the electrodes and other components are made of metal, it is necessary to prevent a decrease in image quality due to reflection of ambient light. Therefore, it is preferable to provide light-shielding properties to the partitions that constitute the organic electroluminescent elements. Furthermore, in organic electroluminescent devices, electrodes must be provided on the upper and lower surfaces of the partition wall; therefore, from the viewpoint of insulation, it is preferable for the partition wall to have high resistance and low dielectric constant. For this reason, when using a coloring agent to provide light-shielding properties to the partition wall, it is preferable to use the aforementioned organic pigment which has high resistance and low dielectric constant.

[0370] [Image display device] Examples of image display devices of the present invention include a partition wall containing the cured product of the present invention and an organic EL display device having the organic electroluminescent element of the present invention. As long as the organic electroluminescent display device includes the organic electroluminescent element described above, there are no particular restrictions on the type or structure of the image display device. For example, it can be assembled using an actively driven organic electroluminescent element according to conventional methods. For example, it can be formed by the method described in "Organic EL Display" (Ohmsha, published August 20, 2004, authored by Shizuka Tokito, Chihaya Adachi, and Hideyuki Murata). For example, an image may be displayed by combining an organic electroluminescent element that emits white light with a color filter, or by combining organic electroluminescent elements with different emission colors such as RGB.

[0371] [illumination] The organic electroluminescent element containing the cured product of the present invention can be used for illumination. There are no particular restrictions on the type or structure of the illumination, and it can be assembled according to conventional methods using the organic electroluminescent element containing the cured product of the present invention. The organic electroluminescent element may be a simple matrix drive type or an active matrix drive type. To ensure the lighting emits white light, organic electroluminescent elements that emit white light may be used. Alternatively, organic electroluminescent elements of different emission colors may be combined to create a system where the colors mix to produce white light, or the system may be configured to allow adjustment of the mixing ratio to provide a color-tuning function. [Examples]

[0372] The present invention will be described more specifically below with reference to examples and comparative examples, but the present invention is not limited to the following examples unless it exceeds the gist of the invention. The components of the photosensitive coloring compositions used in the following examples and comparative examples, as well as the methods for evaluating them, are as follows.

[0373] <Alkali-soluble resin-I> 300 parts by mass of Nippon Kayaku Co., Ltd.'s "XD1000" (polyglycidyl ether of dicyclopentadiene-phenol polymer, epoxy equivalent 252), 87 parts by mass of acrylic acid, 0.2 parts by mass of p-methoxyphenol, 5 parts by mass of triphenylphosphine, and 255 parts by mass of propylene glycol monomethyl ether acetate were charged into a reaction vessel and stirred at 100°C until the acid value reached 3.0 mg KOH / g. Then, 145 parts by mass of tetrahydrophthalic anhydride was added and the reaction was carried out at 120°C for 4 hours. The weight-average molecular weight Mw of the resulting alkali-soluble resin-I, as measured by GPC, was 2600, and the acid value was 106 mg KOH / g.

[0374] <Alkali-soluble resin-II>

[0375] [ka]

[0376] 50.0 parts by mass of the epoxy compound with the above structure (epoxy equivalent 248), 14.2 parts by mass of acrylic acid, 52.6 parts by mass of methoxybutyl acetate, 1.29 parts by mass of triphenylphosphine, and 0.044 parts by mass of paramethoxyphenol were placed in a flask equipped with a thermometer, stirrer, and condenser, and reacted at 90°C with stirring until the acid value was 5 mg KOH / g or less. The reaction took 12 hours to obtain an epoxy acrylate solution. To the epoxy acrylate solution described above, 42.9 parts by mass of methoxybutyl acetate, 1.98 parts by mass of trimethylolpropane (TMP), 24.9 parts by mass of biphenyltetracarboxylic acid di-anhydride (BPDA), and 5.39 parts by mass of tetrahydrophthalic anhydride (THPA) were placed in a flask equipped with a thermometer, stirrer, and condenser, and the mixture was slowly heated to 105°C while stirring to allow the reaction to proceed. Once the resin solution became clear, it was diluted with methoxybutyl acetate to prepare a solid content of 50% by mass, yielding an alkali-soluble resin (II) with an acid value of 100 mg KOH / g and a weight-average molecular weight (Mw) of 12000.

[0377] <Alkali-soluble resin-III> "ZCR-8035H" manufactured by Nippon Kayaku Co., Ltd. (weight-average molecular weight Mw=7000, acid value=82 mgKOH / g). It has a substructure represented by the following formula (C-1).

[0378] [ka]

[0379] <Pigment-I> BASF's Irgaphor® Black S 0100 CF (having the chemical structure represented by formula (2) below)

[0380] [ka]

[0381] <Pigment-II> CI Pigment Orange 64 <Pigment-III> CI Pigment Violet 29 <Pigment-IV> CI Pigment Blue 60

[0382] <Dispersant-I> A methacrylic AB diblock copolymer comprising block A containing repeating units with solvent-philic groups and block B containing repeating units with pigment-adsorbing groups. It has repeating units of the following formulas (a) to (f). The amine value is 120 mgKOH / g. The weight-average molecular weight is 9000. The dispersant is substantially free of chlorine atoms.

[0383] The percentages of repeating units represented by formulas (a) to (f) below within the total repeating units are (a) 33.3 mol%, (b) 13.3 mol%, (c) 6.7 mol%, (d) 6.7 mol%, (e) 6.7 mol%, and (f) 33.3 mol%, respectively.

[0384] [ka]

[0385] [ka]

[0386] <Dispersant-II> A methacrylic AB diblock copolymer comprising block A containing repeating units with solvent-philic groups and block B containing repeating units with pigment-adsorbing groups. It has repeating units of the following formulas (h) to (n). The amine value is 70 mgKOH / g. The weight-average molecular weight before quaternization of the amino groups is 9000. The chlorine atom content in the dispersant is 2.1% by mass.

[0387] The percentages of repeating units represented by the following formulas (h) to (n) within the total repeating units are as follows: (h) 33.3 mol%, (i) 13.3 mol%, (j) 6.7 mol%, (k) 6.7 mol%, (l) 6.7 mol%, (m) 24.0 mol%, and (n) 9.3 mol%, respectively.

[0388] [ka]

[0389] [ka]

[0390] <Solvent-I> PGMEA: Propylene glycol monomethyl ether acetate <Solvent-II> MB:3-Methoxy-1-Butanol <Solvent-III> MBA:3-Methoxybutylacetate

[0391] <Photopolymerization Initiator-I> Oxime ester-based photopolymerization initiator having the following chemical structure

[0392] [ka]

[0393] <Ethylene-unsaturated compounds> DPHA-40H: Urethane acrylate manufactured by Nippon Kayaku Co., Ltd. <Surfactants> DIC Megafuck F-559

[0394] <Viscosity Evaluation> The viscosity of the prepared pigment dispersion was measured using a RE-85L viscometer manufactured by Toki Sangyo Co., Ltd. (measurement conditions: 23°C, 20 rpm).

[0395] <Measurement of chlorine atom content> The measurements were performed using combustion ion chromatography. The chlorine atom content in the photosensitive colored composition was quantified using a calibration curve method with a combustion absorption ion chromatograph (CIC) AQF2100H manufactured by Mitsubishi Chemical Analytec Co., Ltd. (now Nitto Seikou Analytec Co., Ltd.).

[0396] <Measurement of optical density per unit film thickness (unit OD value)> The optical density per unit film thickness was measured using the following procedure. First, the prepared photosensitive colored composition was applied to a glass substrate using a spin coater to a film thickness of 1.5 μm after firing. After drying under reduced pressure for 1 minute, it was dried on a hot plate at 100°C for 120 seconds. The resulting coated film was exposed to light without using an exposure mask. The irradiation light source had an intensity of 40 mW / cm² at a wavelength of 365 nm. 2 Using a high-pressure mercury lamp, the exposure dose was 50 mJ / cm². 2 Next, the resist-coated substrate 1 was obtained by heating and curing it in an oven at 230°C for 30 minutes. The optical density (OD value) of the obtained resist-coated substrate 1 was measured using an X-Rite 361T(V) transmission densitometer (color temperature of the illumination source: approximately 2850K (equivalent to CIE standard light source A), spectral sensitivity characteristics of the light-receiving section: ISO visual density according to ISO 5-3 standard). The film thickness was measured using a non-contact surface / layer cross-sectional shape measurement system VertScan(R)2.0 manufactured by Ryoka Systems Co., Ltd. From the optical density (OD value) and film thickness, the optical density (unit OD value) per unit film thickness (1 μm) was calculated. The OD value is a numerical value indicating light-shielding ability, and a larger value indicates higher light-shielding ability.

[0397] <Electrode surface roughness evaluation> On an electrode substrate, which had a 60 nm thick silver thin film deposited over its entire surface on a glass substrate, each photosensitive coloring composition was applied using a spin coater to achieve a film thickness of 1.5 μm after firing. After drying under reduced pressure for 1 minute, it was dried on a hot plate at 100°C for 120 seconds. Next, using a photomask capable of forming a 50 μm square aperture pattern on the resulting coated substrate, wavelengths below 330 nm were cut off with a high-pressure mercury lamp, and the exposure gap was 5 μm at 50 mJ / cm². 2 Ultraviolet exposure was performed. The light intensity at a wavelength of 365 nm was 40 mW / cm². 2 Next, using a 2.38% by mass aqueous solution of TMAH (tetramethylammonium hydroxide) as the developer, shower development was performed at 25°C with a developer water pressure of 0.05 MPa for 60 seconds. After that, development was stopped by rinsing the developer with pure water, and the surface was washed with a water spray for 60 seconds. These operations removed the openings through development, yielding an electrode substrate with patterned partitions. The substrate with the pattern was then heated (baked) in an oven at 230°C for 30 minutes to cure the pattern. The electrode substrates with the resulting 50 μm aperture pattern were observed at 200x magnification using an optical microscope to check for any changes in the shape of the electrode surface (surface roughness) within the aperture pattern. Surface roughness is shown in the order of A, B, and C, with A being the best. A: No surface roughness occurred on the electrode surface after heat curing. B: After heat curing, slight surface roughness occurs on the electrode surface, but this does not pose a practical problem and is acceptable. C: After heat curing, irregularities are visible on the electrode surface, resulting in surface roughness, which poses a practical problem and is unacceptable.

[0398] <Evaluation of Luminescence Characteristics> A transparent conductive film of indium tin oxide (ITO) was deposited to a thickness of 70 nm on glass. An anode was formed on this substrate using conventional photolithography techniques and hydrochloric acid etching. Each photosensitive coloring composition was then applied to the substrate using a spin coater to achieve a film thickness of 1.5 μm after firing. After drying under reduced pressure for 1 minute, the substrate was dried on a hot plate at 100°C for 120 seconds. Next, the resulting coated substrate was exposed to a high-pressure mercury lamp with wavelengths below 330 nm cut off, using an exposure mask (having multiple rectangular covering sections (40 μm x 80 μm) at pitches of 60 μm x 100 μm) and an exposure gap of 5 μm at 50 mJ / cm². 2 Ultraviolet exposure was performed. The light intensity at a wavelength of 365 nm was 40 mW / cm². 2 Next, using a 2.38% by mass aqueous solution of TMAH (tetramethylammonium hydroxide) as the developer, shower development was performed at 25°C with a developer water pressure of 0.05 MPa for 60 to 120 seconds. After that, development was stopped by rinsing the developer with pure water, and the surface was washed with a water spray for 60 seconds. The shower development time was set to 1.2 times or more the time required to dissolve and remove the unexposed parts of the coating. These operations removed the openings through development, yielding an electrode substrate with patterned partitions. The substrate with the pattern was then heated (baked) in an oven at 230°C for 30 minutes to cure the pattern.

[0399] <Fabrication of Organic Electroluminescent Devices> An organic electroluminescent device was fabricated by sequentially layering molybdenum oxide as a hole injection layer with a thickness of 10 nm, N-([1,1'-biphenyl]-4-yl)-9,9-dimethyl-N-[4-(9-phenyl-9H-carbazole-3-yl)phenyl]-9H-fluoren-2-amine as a hole transport layer with a thickness of 60 nm, tris(8-hydroxyquinolinate)aluminum as an emissive layer with a thickness of 60 nm, 8-hydroxyquinolinolatolithium as an electron injection layer with a thickness of 1 nm, and aluminum as a cathode with a thickness of 80 nm, using vacuum deposition. Next, a desiccant was applied to the recess of a sealing glass having a recess in the center, and a UV-curing resin was applied to the frame portion surrounding the recess. The sealing glass was positioned so that the recess completely covered the organic electroluminescent element on the electrode substrate, the sealing glass was attached to the electrode substrate, and the UV-curing resin was cured by irradiating it with UV light to create a hollow structure, thereby fabricating an organic electroluminescent element evaluation device.

[0400] <Evaluation of Luminescence Characteristics of Organic Electroluminescent Devices> The fabricated element has a current density of 10 mA / cm². 2 The voltage value (driving voltage) was measured when a DC current was applied. When creating the cell, the current density is 10 mA / cm². 2 Voltage value when power is applied (driving voltage) A: Voltage 6.5V or less B: Voltage higher than 6.5V Next, the fabricated element was subjected to a current density of 50 mA / cm² in a 60°C environment. 2 When the DC current was driven at a constant current, the time (h) from the initial brightness to 90% was measured as the drive life. The time it takes for the brightness to reach 90% of the initial brightness (lifetime) A: Longer than 25 hours B: Less than 25 hours

[0401] <Preparation of Pigment Dispersions 1-3> The pigments, dispersants, alkali-soluble resins, and solvents listed in Table 1 were mixed in the mass ratios listed in Table 1. This mixture was dispersed using a paint shaker at a temperature of 25-45°C for 3 hours. 0.5 mm diameter zirconia beads were used as beads, added in an amount equal to 2.5 times the mass of the dispersion. After dispersion, the beads and dispersion were separated by filter to prepare pigment dispersions 1-3. Note that the amount of solvent in Table 1 includes the amount of dispersant and solvent derived from alkali-soluble resin. Furthermore, Table 1 shows the results of the viscosity evaluation of the pigment dispersion measured using the method described above.

[0402] [Table 1]

[0403] [Examples 1, 2, Comparative Example 1] Each component was added so that the proportion of solids of each component in the total solid content was as shown in Table 2. Then, a solvent was added so that PGMEA / MB / MBA = 72 / 20 / 8 and the proportion of solids in the total solid content was 17% by mass. The mixture was then stirred and dissolved to prepare the photosensitive colored compositions of Examples 1 and 2 and Comparative Example 1. The chlorine atom content, unit OD value, and evaluation results of the electrode surface roughness measured by the above method are shown in Tables 2 and 3.

[0404] [Table 2]

[0405] The substrate using the photosensitive coloring composition of Comparative Example 1 was found to have uneven and rough surfaces on the silver (electrode) surface. This is thought to be because the amount of chlorine atoms contained in the dispersant-II was high, and therefore also contained in large quantities in the photosensitive coloring composition. During firing, a chlorine-containing gas was generated, which reacted with the silver (electrode) surface, causing the formation of unevenness on the surface. On the other hand, in the substrate using the photosensitive colored composition of Example 1, no surface irregularities were observed on the silver (electrode) surface. This is thought to be because the dispersant-I contained no chlorine atoms, and consequently, its content in the photosensitive colored composition was also low, resulting in a normal electrode substrate being obtained without causing surface roughness on the silver (electrode). In terms of the light emission characteristics of the organic electroluminescent element, Example 1 has a longer lifespan compared to Comparative Example 1. This is thought to be because the reduced chlorine content suppressed the degradation of the light-emitting element over time.

[0406] [Table 3]

[0407] Even with the substrate using the photosensitive colored composition of Example 2, the surface roughness of the silver (electrode) was at a level that was practically not a problem. The reason why the surface roughness of the silver (electrode) was better in Example 1 than in Example 2 is thought to be because pigment-I has a rigid framework consisting of aromatic rings, so even trace amounts of chlorine atoms were not released outside the film.

[0408] In terms of the light emission characteristics of the organic electroluminescent device, Example 2 showed a lower initial drive voltage and was superior to Example 1.

Claims

1. A photosensitive colored composition comprising (a) a colorant, (b) an alkali-soluble resin, (c) a photopolymerization initiator, (d) an ethylenically unsaturated compound, (e) a solvent, and (f) a dispersant, The coloring agent (a) contains at least one selected from the group consisting of a compound represented by the following general formula (I), a geometric isomer of the compound, a salt of the compound, and a salt of a geometric isomer of the compound. The (f) dispersant contains at least repeating units represented by the following general formulas (1), (2), and (3), and contains an acrylic copolymer (f1) that does not have repeating units containing quaternary ammonium groups. A photosensitive colored composition characterized in that the content of chlorine atoms in the photosensitive colored composition is 0.05% by mass or less relative to the total solid content of the photosensitive colored composition. 【Chemistry 1】 (In formula (I), R １ and R ６ These are hydrogen atoms, CH, independently of each other. ３ CF ３ , a fluorine atom or a chlorine atom; R ２ 、R ３ 、R ４ 、R ５ 、R ７ 、R ８ 、R ９ and R １０ are, independently of each other from all the others, a hydrogen atom, a halogen atom, R １１ , COOH, COOR １１ , COO － , CONH ２ , CONHR １１ , CONR １１ R １２ , CN, OH, OR １１ , COCR １１ , OOCNH ２ , OOCNHR １１ , OOCNR １１ R １２ , NO ２ , NH ２ , NHR １１ , NR １１ R １２ , NHCOR １２ , NR １１ COR １２ , N = CH ２ , N = CHR １１ , N = CR １１ R １２ , SH, SR １１ , SOR １１ , SO ２ R １１ , SO ３ R １１ , SO ３ , SO<​​​​​​​​​​​​​​​​ R ２ and R ３ , R ３ and R ４ , R ４ and R ５ , R ７ and R ８ , R ８ and R ９ , and R ９ and R １０ At least one combination selected from the group consisting of the following is directly bonded to each other, or an oxygen atom, sulfur atom, NH or NR １１ They can also be connected to each other by bridges; R １１ and R １２ These are, independently of each other, an alkyl group having 1 to 12 carbon atoms, a cycloalkyl group having 3 to 12 carbon atoms, an alkenyl group having 2 to 12 carbon atoms, a cycloalkenyl group having 3 to 12 carbon atoms, or an alkynyl group having 2 to 12 carbon atoms. 【Chemistry 2】 (In formula (1), R ３１ This is an optionally substituted alkyl group, an optionally substituted aryl group, or an optionally substituted aralkyl group. R ３２ This is a hydrogen atom or a methyl group. * indicates a bonding operation. 【Transformation 3】 (In formula (2), R ３３ R is a methylene group, an ethylene group, or a propylene group. ３４ R is an alkyl group which may have substituents, ３５ This is a hydrogen atom or a methyl group. n is an integer between 1 and 20. * indicates a bonding operation. 【Chemistry 4】 (In formula (3), R ３６ and R ３７ Each of these is an alkyl group, independently of the others. R ３８ This is a hydrogen atom or a methyl group. Z is a divalent linking group. * indicates a bonding operation.

2. The photosensitive coloring composition according to claim 1, wherein the coloring agent (a) comprises an organic coloring pigment.

3. The photosensitive coloring composition according to claim 1 or 2, wherein the acrylic copolymer (f1) is a block copolymer.

4. The photosensitive coloring composition according to any one of claims 1 to 3, wherein the amine value of the acrylic copolymer (f1) is 90 mg KOH / g or more.

5. The photosensitive colored composition according to any one of claims 1 to 4, wherein the coloring agent (a) is present in an amount of 10% by mass or more relative to the total solid content of the photosensitive colored composition.

6. A photosensitive colored composition according to any one of claims 1 to 5, used to form a partition wall for an organic electroluminescent element.

7. A cured product obtained by curing a photosensitive coloring composition according to any one of claims 1 to 6.

8. An organic electroluminescent element comprising the cured product according to claim 7.

9. An image display device comprising an organic electroluminescent element as described in claim 8.

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