Crucible device and vapor deposition device comprising same

Abstract

A crucible device (1) comprising: a body (2) having an internal space (2a) for housing a vapor deposition material (8); a cap (4) provided on the end (2b) of the body (2); and shielding plates (5a-5e) attached to the cap (4) so as to intersect the depth direction of the body (2).

Description

Crucible device and vapor deposition device including the same

[0001] The present disclosure relates to a crucible device having an internal space for accommodating a deposition material, and a deposition device including the same.

[0002] Conventionally, a crucible device has been known that includes a main body having an internal space for accommodating a vapor deposition material, a heating device located on the outer surface of the main body, a lid member provided at an opening, and a plurality of shielding plates arranged in the internal space along a direction intersecting the direction of travel of vapor based on the vapor deposition material (Patent Document 1).

[0003] According to the configuration described in Patent Document 1, the multiple shielding plates can filter out unwanted metal oxides formed on the surface of the deposition material, thereby preventing the metal oxides from adhering to the substrate to be treated.

[0004] Japanese Patent Application Publication No. 2007-100216

[0005] However, in the configuration of Patent Document 1, the multiple shielding plates are attached to the inner surface of the main body. Therefore, metal oxides of the vapor deposition material adhere between the shielding plates and the inner surface of the main body, making it difficult to remove the shielding plates from the main body. As a result, it becomes difficult to replace the vapor deposition material stored in the main body.

[0006] A crucible device according to one aspect of the present disclosure includes a main body having an internal space for accommodating a deposition material, a cap provided at an end of the main body, and one or more shielding plates attached to the cap so as to intersect with the depth direction of the main body.

[0007] Another crucible device according to one aspect of the present disclosure comprises a main body having an internal space for accommodating deposition material, and a plurality of shielding plates that intersect with the depth direction of the main body, the plurality of shielding plates being arranged at intervals in the depth direction of the main body, the plurality of shielding plates having shielding portions of the same shape and opening patterns of the same shape, and the plurality of shielding plates being arranged so that the opening patterns are offset from one another.

[0008] A vapor deposition apparatus according to one aspect of the present disclosure includes the crucible apparatus according to one aspect of the present disclosure and a chamber connected to the crucible apparatus.

[0009] According to one aspect of the present disclosure, it is possible to provide a crucible device that allows for easy replacement of the evaporation material contained in the main body while preventing metal oxides formed on the surface of the evaporation material from adhering to the substrate to be treated, and a evaporation device equipped with the same.

[0010] 1 is a cross-sectional view of a vapor deposition device according to an embodiment; FIG. 2 is a cross-sectional view of a crucible device provided in the vapor deposition device; FIG. 3 is a plan view of the crucible device; FIG. 4 is a side view of a lid member and five shielding plates provided in the crucible device; FIG. 5 is a plan view of each of the five shielding plates; FIG. 6 is a partial perspective view of the lid member and the shielding plates; FIG. 7 is a side view of the lid member and five shielding plates when the crucible device is operating; FIG. 8 is a diagram showing how residue of vapor deposition material adheres to a substrate to be processed according to a comparative example; FIG. 9 is a diagram showing the results of an internal pressure simulation of a main body provided in the crucible device; FIG. 10 is a graph showing the relationship between the aperture ratio of the shielding plate and the residue of vapor deposition material accommodated in the main body; FIG. 11 is a graph showing the relationship between the aperture ratio of the shielding plate and the internal pressure of the main body and the adhesion rate to a substrate to be processed.

[0011] FIG. 1 is a cross-sectional view of a vapor deposition apparatus 20 according to an embodiment.

[0012] The deposition apparatus 20 includes a crucible apparatus 1 and a chamber 21 connected to the crucible apparatus 1. The chamber 21 is provided with a substrate 22 to be processed, a mask 23 arranged on the crucible apparatus 1 side of the substrate 22 to be processed, and a rate detector 24 arranged between the substrate 22 to be processed and the crucible apparatus 1 to measure the amount of deposition from the crucible apparatus 1.

[0013] Fig. 2 is a cross-sectional view of the crucible device 1 according to the embodiment. Fig. 3 is a plan view of the crucible device 1. Fig. 4 is a side view of the cap portion 4 and the shielding plates 5a to 5e provided in the crucible device 1.

[0014] The crucible device 1 includes a substantially cylindrical main body 2 having an internal space 2a for accommodating a vapor deposition material 8, a cap 4 provided at an end 2b of the main body 2, and five shielding plates 5a, 5b, 5c, 5d, and 5e attached to the cap 4 so as to intersect with the depth direction (Z-axis direction) of the main body 2. For example, vapor based on the vapor deposition material 8 travels along the Z-axis direction, and the shielding plates 5a to 5e are arranged along the XY plane. The shielding plates 5a to 5e are located in the internal space 2a. The shielding plates 5a to 5e are arranged perpendicular to the depth direction of the main body 2. The shielding plates 5a to 5e are aligned in the depth direction of the main body 2 at intervals. The cap 4 and the shielding plates 5a to 5e are detachable from the main body 2. The cap 4 can also be detached from the main body 2 while the shielding plates 5a to 5e remain attached to the cap 4. The crucible device 1 includes a heating device 3 for heating the outer surface of the main body 2 .

[0015] The cap portion 4 has a lid portion 4a and a shaft portion 4b that protrudes from the lid portion 4a toward the internal space 2a, and a plurality of shielding plates 5a to 5e are supported by the shaft portion 4b.

[0016] As a result, the cap portion 4 has the shaft portion 4b that protrudes from the lid portion 4a toward the internal space 2a, so that the shielding plates 5a, 5b, 5c, 5d, and 5e can be easily attached to the cap portion 4.

[0017] Figure 5 is a plan view of each of the shielding plates 5a, 5b, 5c, 5d, and 5e. Figure 6 is a partial perspective view of the cap portion 4 and the shielding plates 5a to 5e. Components similar to those previously described are designated by the same reference numerals. Detailed descriptions of these components will not be repeated.

[0018] Each of the shielding plates 5a to 5e is disk-shaped and has four shielding portions 7a to 7e and opening patterns 11a to 11e. The opening patterns 11a to 11e are made up of four openings 6a to 6e formed along the periphery of each of the shielding plates 5a to 5e.

[0019] The shielding portions 7a to 7e are arranged along the periphery between the openings 6a to 6e. For example, as shown in FIG. 5, the four shielding portions 7a of the shielding plate 5a are arranged along the periphery between the four openings 6a. The four shielding portions 7b of the shielding plate 5b are arranged along the periphery between the four openings 6b. The four shielding portions 7c of the shielding plate 5c are arranged along the periphery between the four openings 6c. The four shielding portions 7d of the shielding plate 5d are arranged along the periphery between the four openings 6d. The four shielding portions 7e of the shielding plate 5e are arranged along the periphery between the four openings 6e.

[0020] The multiple shielding plates 5a to 5e are arranged such that the opening patterns 11a to 11e are offset from one another. The opening patterns 11a to 11e of the shielding plates 5a to 5e and the spaces between adjacent shielding plates form flow paths for the vaporized deposition material 8. The opening patterns 11a to 11e of the shielding plates 5a to 5e have the same shape. Note that the straight line L is drawn to facilitate understanding of the present invention and to allow easy visual recognition of the aspect in which the opening patterns 11a to 11e of the shielding plates 5a to 5e are arranged offset from one another in the circumferential direction around the central axis.

[0021] As a result, vapor based on the evaporation material 8 heated by the heating device 3 passes through the opening 6e of the shielding plate 5e, the opening 6d of the shielding plate 5d, the opening 6c of the shielding plate 5c, the opening 6b of the shielding plate 5b, and the opening 6a of the shielding plate 5a in this order, and heads toward the substrate 22 to be processed, which is placed outside the crucible device 1.

[0022] When the plurality of shielding plates 5a to 5e are viewed from the cap 4 side in the depth direction of the main body 2, the vapor deposition material 8 is not visible. The shielding plates 7a to 7e shield the vapor deposition material 8 that has bumped.

[0023] As a result, metal oxide based on the coating of the evaporation material 8 heated by the heating device 3 is shielded by the shielding portion 7e of the shielding plate 5e. Metal oxide that passes through the opening 6e of the shielding plate 5e is shielded by the shielding portion 7d of the shielding plate 5d. Metal oxide that passes through the opening 6d of the shielding plate 5d is shielded by the shielding portion 7c of the shielding plate 5c. Metal oxide that passes through the opening 6c of the shielding plate 5c is shielded by the shielding portion 7b of the shielding plate 5b. Metal oxide that passes through the opening 6b of the shielding plate 5b is shielded by the shielding portion 7a of the shielding plate 5a.

[0024] The lid portion 4a includes four passage openings 4c through which the vaporized deposition material 8 passes. The four passage openings 4c are formed along the periphery of the lid portion 4a. Below each passage opening 4c, shielding portions 7a to 7e included in the shielding plates 5a to 5e are overlapped in a spiral shape. When each passage opening 4c is viewed from above the cap portion 4 in the depth direction of the main body portion 2, the deposition material 8 is not visible.

[0025] As a result, the shielding portions 7a, 7b, 7c, 7d, and 7e that shield the metal oxides based on the coating of the deposition material 8 heated by the heating device 3 are arranged in a spiral shape. Therefore, the metal oxides based on the coating of the deposition material 8 can be reliably shielded.

[0026] The size of the gap between the shielding plates 5a to 5e can be changed. The gap between the adjacent shielding plates 5a to 5e can be, for example, about 3 mm. For example, the gap G1 between the shielding plate 5a and the shielding plate 5b can be about 3 mm.

[0027] The gap between adjacent shielding plates 5a to 5e can be easily changed, for example, from about 3 mm to about 1 mm. By providing nuts between the shielding plates and changing the thickness of these nuts, the gap G1 between shielding plates 5a and 5b can be set to about 1 mm, for example. Furthermore, by changing the thickness of the nuts between the shielding plates, the number of shielding plates can be adjusted to five or less as needed.

[0028] This embodiment has a structure in which the shielding plates 5a to 5e are attached to the cap portion 4, which provides a high degree of freedom in terms of combinations and changes to the gaps between the shielding plates, making it easy to set conditions to suit the environment. When the shielding plates are attached to the crucible side as in Patent Document 1, the shielding plates are fixed to the crucible, which limits the pattern and number of shielding plates. Therefore, the lid member-side structure of this embodiment in which the shielding plates 5a to 5e are attached to the cap portion 4 has great advantages.

[0029] The deposition material 8 preferably contains magnesium. The deposition material 8 may be magnesium pieces covered with a magnesium oxide film, magnesium pellets covered with a magnesium oxide film, or magnesium ingots covered with a magnesium oxide film. The deposition material 8 may contain at least one of silver and lithium fluoride.

[0030] As a result, the magnesium oxide (MgO) film floating within the main body 2 due to the sudden boiling that occurs when the magnesium material on which the MgO coating is formed is heated is shielded by the shielding plates 5a to 5e arranged in the internal space 2a of the main body 2.

[0031] The MgO coating has a higher melting point and boiling point than Mg, and if used as the deposition material 8 in the crucible device 1 as is, even though the Mg vaporizes upon heating, the MgO coating has not yet reached its melting point, and the vaporized Mg, i.e., "vaporized Mg," remains sealed within the MgO coating. As heating continues, the MgO coating is gradually compressed by the expanding vaporized MgO. As a result, part of the MgO coating breaks under the pressure of the vaporized MgO, and steam suddenly escapes from the broken part of the MgO coating, causing bumping.

[0032] If bumping occurs, Mg or MgO adheres to the substrate 22 to be processed, which is the target of deposition, causing thermal damage and making it impossible to maintain a stable deposition rate. Furthermore, Mg or MgO residue remains on the deposition shield in the chamber. The deposition shield with this residue is removed, cleaned, and recycled. Therefore, removing the Mg or MgO film firmly attached to the deposition shield requires costs for cleaning and other procedures, and it also takes time before the shield can be reused. As a result, the overall ease of replacement and maintenance of the deposition shield is reduced.

[0033] The reason why Mg or MgO adheres to the substrate 22 to be processed is that the lid member of the general main body 2 has a large opening to allow steam to escape easily, and therefore Mg or MgO caused by bumping escapes from the main body 2 into the chamber without being prevented from doing so by the lid member.

[0034] Therefore, in this embodiment, shielding plates 5a to 5e are provided along the XY plane that intersects with the Z-axis direction along which Mg or MgO caused by bumping progresses, in order to prevent the upward progression of Mg or MgO caused by bumping, and a structure for the cap part 4 is proposed in which Mg or MgO caused by bumping does not escape to the outside of the main body part 2.

[0035] As a result, the deposition material 8 accommodated in the internal space 2a of the main body 2 is heated by the heating device 3 located on the outer surface of the main body 2. As a result, the metal oxide based on the coating of the deposition material 8 heated by the heating device 3 advances in the Z-axis direction toward the cap 4 together with the vapor of the deposition material 8. Then, this metal oxide based on the coating of the deposition material 8 is shielded by the shielding plates 5a to 5e arranged in the internal space 2a of the main body 2.

[0036] Because the shielding plates 5a to 5e are attached to the cap portion 4, a gap is formed between the shielding plates 5a to 5e and the inner surface of the main body portion 2. Therefore, metal oxides of the deposition material 8 do not adhere to the gap between the shielding plates 5a to 5e and the inner surface of the main body portion 2. Therefore, the shielding plates 5a to 5e can be easily removed from the main body portion 2. As a result, the deposition material 8 contained in the main body portion 2 can be easily replaced while preventing metal oxides formed on the surface of the deposition material 8 from adhering to the substrate 22 to be processed.

[0037] To ensure that the Mg vapor is normally released outside the main body 2, the Mg vapor that has passed through the opening 6e of the shielding plate 5e from the deposition material 8 side reaches the shielding portion 7d of the shielding plate 5d, changes its direction of travel by approximately 90 degrees, travels in the XY plane, and passes through the passage opening 4c toward the substrate 22 to be processed. The Mg vapor that has passed through the opening 6d of the shielding plate 5d from the deposition material 8 side reaches the shielding portion 7c of the shielding plate 5c, changes its direction of travel by approximately 90 degrees, travels in the XY plane, and passes through the passage opening 4c toward the substrate 22 to be processed. The Mg vapor that has passed through the opening 6c of the shielding plate 5c from the deposition material 8 side reaches the shielding portion 7b of the shielding plate 5b, changes its direction of travel by approximately 90 degrees, travels in the XY plane, and passes through the passage opening 4c toward the substrate 22 to be processed. The Mg vapor that passes through the opening 6b of the shielding plate 5b from the deposition material 8 side reaches the shielding portion 7a of the shielding plate 5a, changes its direction of travel by approximately 90 degrees, travels in the XY plane, and passes through the passage opening 4c toward the substrate 22 to be processed. The Mg vapor that passes through the opening 6a of the shielding plate 5a from the deposition material 8 side reaches the shielding portion 4d provided in the lid portion 4a of the cap unit 4, changes its direction of travel by approximately 90 degrees, travels in the XY plane, and passes through the passage opening 4c toward the substrate 22 to be processed. Because the Mg vapor flow path is configured in this way, the film formation rate of the Mg vapor on the substrate 22 to be processed is not hindered even if the shielding plates 5a to 5e are provided to prevent the progression of Mg or MgO in the Z-axis direction due to bumping.

[0038] In this way, the shielding plates 5a to 5e are configured to prevent the progression of Mg or MgO in the Z-axis direction due to bumping. That is, when the cap part 4 attached to the main body part 2 is viewed from above, the passage opening 4c of the cap part 4 is shielded by the shielding parts 7a, 7b, 7c, 7d, and 7e and does not penetrate to the deposition material 8 contained in the internal space 2a. In other words, the cap part 4 is configured so as to have no opening when viewed from above.

[0039] The flow path of Mg vapor that passes through one of the openings 6e to 6b of the shielding plates 5e to 5b from the deposition material 8 side is configured to change its direction of travel by approximately 90 degrees and extend in a direction along the XY plane, so that clogging does not occur as in Patent Document 1 even if deposition is continued for two weeks, for example.

[0040] Furthermore, by overlapping the plurality of shielding plates 5a to 5e with gaps provided between them, local accumulation and root clogging can be avoided.

[0041] The shielding plates 5a to 5e of the cap part 4 are configured so as to have no opening when viewed from the Z-axis direction, and the internal pressure of the internal space 2a increases by closing the passage opening 4c of the cap part 4, but in this embodiment, the increase in the internal pressure of the internal space 2a is an advantage. When the internal pressure increases, the temperature of the deposition material 8 itself also easily increases from a low temperature (output) state of the heating device 3, shortening the time required to detect the deposition rate (vapor amount) and shortening the time until the rate stabilizes.

[0042] Fig. 7 is a side view of the cap portion 4 and the shielding plates 5a to 5e when the crucible device 1 according to the embodiment is in operation. Fig. 8 is a diagram showing the state of adhesion of the remaining deposition material 8 9 to the substrate 22 to be processed. Fig. 8 (1) shows the case of this embodiment, and Fig. 8 (2) shows the case of a comparative example in which the shielding plates 5a to 5e are not provided. Components similar to those described above are given the same reference numerals. Detailed descriptions of these components will not be repeated.

[0043] The configuration of the cap portion 4 and the shielding plates 5a-5e according to this embodiment improves the maintainability of the crucible apparatus 1. That is, the Mg or MgO residue 9 resulting from bumping is prevented from advancing by the shielding plates 5a-5e and adheres to the shielding plates 5a-5e, preventing it from scattering from the main body portion 2 into the chamber, simplifying maintenance related to replacing the chamber's adhesion prevention plates. Furthermore, the shielding plates 5a-5e according to this embodiment are attached to the cap portion 4 rather than to the inside of the main body portion 2, which allows for smooth replacement of the main body portion 2 and the deposition material 8, simplifying maintenance of the crucible apparatus 1.

[0044] In the crucible apparatus according to the comparative example, which does not have the shielding plates 5a to 5e, Mg or MgO residue 9 resulting from bumping is scattered from the main body 2 into the chamber and adheres to the pixels 10 deposited on the substrate 22 as shown in FIG. 8(2). As shown in FIG. 8(2), the pixels 10 to which the Mg or MgO residue 9 resulting from bumping adheres do not light up properly. The substrate 22 onto which the pixels 10 are deposited undergoes a sealing process after the cathode is formed, so the adhered residue 9 cannot be removed, and the display panel based on the substrate 22 cannot be shipped.

[0045] 9 is a diagram showing the results of a simulation of the internal pressure of the main body 2. The same components as those described above are denoted by the same reference numerals, and detailed description of these components will not be repeated.

[0046] In the crucible device 1 according to this embodiment, the shielding plates 5a to 5e are arranged offset from one another along the circumferential direction around the central axis when viewed from the Z-axis direction, as shown in Fig. 5. Therefore, when the shielding plates 5a to 5e and the cap portion 4 are viewed as a whole from the Z-axis direction, the surface of the deposition material 8 is not visible, and the aperture ratio is 0%. When the top surface of the crucible device 1 is open, that is, when the cap portion 4 is removed, the aperture ratio is 100%. The internal pressure of the main body portion 2 at this time is 4.1 Pa.

[0047] In a crucible device 91 described in Patent Document 1, disk-shaped shielding plates 95a, 95b, and 95c are attached to the inner peripheral surface of a crucible 92. The shielding plate 95a has an opening 96a formed in the center with an aperture ratio of 8.2%. The shielding plate 95b has six openings 96b formed along the circumferential direction with an aperture ratio of 12.2%. The shielding plate 95c has six openings 96c formed along the circumferential direction, each smaller than the opening 96b with an aperture ratio of 5.4%. Due to the configuration of the openings 96a, 96b, and 96c, when the shielding plates 95a to 95c are viewed as a whole from the Z-axis direction, the surface of the deposition material is not visible, and the aperture ratio is 0%. The internal pressure of the crucible 92 at this time is 7.0 Pa.

[0048] Comparing the crucible device 1 and the crucible device 91, both of which have an opening ratio of 0%, the internal pressure of the crucible device 1 is lower. Therefore, the temperature rise of the crucible device 1 is smaller than that of the crucible device 91, and therefore the deposition material 8 is not wasted as much as that of the crucible device 91.

[0049] The temperature rise in the crucible device 91 is greater, and therefore the evaporation amount of the deposition material is greater than in the crucible device 1. For this reason, there is a risk of clogging at the opening 96c of the lowest shielding plate 95c. Even if the lowest shielding plate 95c is moved to the second or third stage from the bottom, the internal pressure remains the same, and therefore there is a high risk of clogging with long-term use.

[0050] In contrast, the crucible device 1 according to this embodiment is configured so that the flow path of the Mg vapor that has passed through one of the openings 6e to 6b of the shielding plates 5e to 5b from the deposition material 8 side is changed in direction by approximately 90 degrees and extended in the horizontal direction along the XY plane. For this reason, there is no need to provide an opening 96c with a small opening ratio as in Patent Document 1, and therefore the crucible device 1 does not become clogged.

[0051] As in the crucible apparatus 1A, three shielding plates 5a, 5b, and 5c may be provided. In this case, the aperture ratio when the shielding plates 5a, 5b, and 5c and the cap portion 4 are viewed as a whole from the Z-axis direction is 10%, and the internal pressure of the main body portion 2 is 3.7 Pa.

[0052] As in the crucible apparatus 1B, a single shielding plate 5a may be provided. In this case, the aperture ratio when the shielding plate 5a and the cap portion 4 are viewed from above as a whole is 24%, and the internal pressure of the main body portion 2 is 3.3 Pa.

[0053] When the shielding plate 5a is not provided as in the crucible device 1C, the opening ratio when the cap portion 4C is viewed from the Z-axis direction is 32%, and the internal pressure of the main body portion 2 is 2.8 Pa.

[0054] In this way, as the number of shielding plates increases, the internal pressure of the main body 2 increases. Furthermore, the opening ratio decreases, so the effect of preventing Mg or MgO from being released to the outside of the main body 2 due to bumping increases.

[0055] Fig. 10 is a graph showing the relationship between the aperture ratio of the shielding plates 5a to 5e and the residue 9 of the vapor deposition material 8 contained in the main body 2. Fig. 11 is a diagram showing the relationship between the aperture ratio of the shielding plates 5a to 5e and the residue 9 of the vapor deposition material 8 contained in the main body 2. Fig. 12 is a graph showing the relationship between the aperture ratio of the shielding plates 5a to 5e and the internal pressure of the main body 2 and the adhesion rate to the substrate 22 to be processed. Components similar to those described above are assigned the same reference numerals. Detailed descriptions of these components will not be repeated.

[0056] 10 and 11, as the aperture ratio when the shielding plates 5a to 5e and the cap portion 4 are viewed as a whole from above decreases, the count number of Mg or MgO residues 9 scattered from the main body portion 2 into the chamber decreases. When the aperture ratio is 32%, the count number of residues 9 exceeds 3,000. However, when the aperture ratio is reduced to 24%, the count number of residues 9 drops sharply to 1,000 or less. When the aperture ratio is reduced to 10%, the count number of residues 9 decreases further, and when the aperture ratio is reduced to 0%, the count number of residues 9 decreases to nearly zero.

[0057] As shown in Figure 12, when the aperture ratio when the shielding plates 5a to 5e and the cap portion 4 are viewed from above as a whole becomes smaller, the internal pressure of the main body portion 2 increases as shown by curve C1, and the rate of adhesion of Mg or MgO residue 9 to the substrate to be processed 22 due to bumping decreases as shown by curve C2.

[0058] The present disclosure is not limited to the above-described embodiments, and various modifications are possible within the scope of the claims. Embodiments obtained by appropriately combining the technical means disclosed in different embodiments are also included in the technical scope of the present disclosure. Furthermore, new technical features can be formed by combining the technical means disclosed in each embodiment.

[0059] 1 Crucible device 2 Body part 2a Internal space 2b End part 3 Heating device 4 Cap part 4a Lid part 4b Shaft part 4c Passing port 5a to 5e Shielding plate 6a to 6e Opening 7a to 7e Shielding part 8 Vapor deposition material 11a to 11e Opening pattern 12 Discharge cap

Claims

1. A main body having an internal space for containing the vapor deposition material, A cap portion provided at the end of the main body portion, The cap portion is equipped with one or more shielding plates that intersect with the depth direction of the main body portion, The shielding plate has multiple shielding plates, A crucible device in which the aforementioned multiple shielding plates are arranged in the depth direction of the main body at intervals from each other.

2. The crucible device according to claim 1, wherein each shielding plate has a shielding portion and an opening pattern.

3. The crucible device according to claim 2, wherein the plurality of shielding plates are arranged such that their opening patterns are offset from each other.

4. The crucible apparatus according to claim 3, wherein the deposition material is not visible when the plurality of shielding plates are viewed from the side of the cap portion in the depth direction of the main body portion.

5. The cap portion has a lid portion and a shaft portion that protrudes from the lid portion toward the internal space, The crucible device according to claim 3, wherein the plurality of shielding plates are supported on the shaft portion.

6. The crucible apparatus according to claim 5, wherein the lid portion includes a plurality of passages through which vaporized deposition material passes.

7. The crucible device according to claim 6, wherein, below each passage opening, the multiple shielding portions included in the multiple shielding plates overlap in a spiral manner.

8. The crucible apparatus according to claim 6, wherein the vapor deposition material is not visible when each passage opening is viewed from above the cap portion in the depth direction of the main body portion.

9. The crucible device according to claim 6, wherein the plurality of passage openings are formed along the periphery of the lid.

10. The crucible device according to any one of claims 1 to 9, wherein the cap portion and the one or more shielding plates are detachable from the main body portion.

11. The crucible device according to claim 1, wherein each shielding plate is disc-shaped.

12. The crucible device according to claim 1, wherein the size of the interval is changeable.

13. The crucible device according to claim 2, wherein the opening pattern is composed of a plurality of openings formed along the periphery of each shielding plate.

14. The crucible apparatus according to claim 2, wherein the shielding portion shields the vapor-deposited material that has been boiled over.

15. The crucible apparatus according to claim 2, wherein the opening pattern and the spacing form a flow path for vaporized deposition material.

16. The crucible device according to claim 3, wherein the opening patterns of the plurality of shielding plates are the same shape.

17. The crucible apparatus according to any one of claims 1 to 9 and 11 to 16, wherein the vapor deposition material comprises magnesium.

18. The crucible apparatus according to claim 17, wherein the vapor deposition material includes a magnesium piece covered with a magnesium oxide film.

19. The crucible apparatus according to any one of claims 1 to 9 and 11 to 16, comprising a heating device for heating the outer surface of the main body.

20. A main body having an internal space for containing a vapor deposition material, The main body comprises a plurality of shielding plates intersecting the depth direction, The plurality of shielding plates are arranged in the depth direction of the main body with intervals between them, The plurality of shielding plates have shielding portions and opening patterns of the same shape, A crucible device in which the plurality of shielding plates are arranged such that the opening patterns are offset from each other.

21. A vapor deposition apparatus comprising a crucible device according to any one of claims 1 to 9, 11 to 16, or 20, and a chamber connected to the crucible device.