FLOW CELLS.

Abstract

An example of a flow cell includes a substrate and a resin molded and cured on the substrate. The molded and cured resin has nanodepressions separated by interstitial regions. Each nanodepression has a maximum aperture dimension ranging from approximately 10 nm to approximately 1000 nm. The molded and cured resin also includes an interpenetrating polymer network. This network comprises an epoxy-based polymer and a (meth)acryloyl-based polymer.

Description

FLOW CELLS Cross-reference to related applications This application claims the benefit of the U.S. provisional application serial number 63 / 015,259, filed on April 24, 2020, the contents of which are incorporated herein by reference in their entirety. Background Nanoimprinting technology enables the economical and efficient production of nanostructures. Nanoimprint lithography uses direct mechanical deformation of a resistant material by means of a stamp that has nanostructures. If the resistant material cures while the stamp is in place, the shape of the nanostructures is fixed into the resistant material. Introduction In a first aspect, a flow cell comprises a substrate; and a resin molded and cured on the substrate, the molded and cured resin includes nanodepressions separated by interstitial rows, each of the nanodepressions having a dimension: of largest opening in the range of approximately 1 nm to approximately 1000 µm, and the molded and cured resin includes an interpenetrating polymer network that includes an epcxi-based polymer and a (meth)acryloyl-based polymer. An example of the first aspect further comprises a grid layer positioned on the substrate; and a planar waveguide layer positioned on the grid layer.* In one example, a refractive index of the interpenetrating polymer network is in the range of approximately 1.35 to approximately 1.52; and a refractive index of the planar waveguide layer is in the range of approximately 1.6 to approximately 2.5. An example of the first aspect further comprises a hydrogel positioned in each of the nanodepressions; and amplification primers attached to the hydrogel. In an example of the first aspect, the thickness of the molded and cured resin is in the range of approximately 225 nm to approximately 600 nm. In an example of the first aspect, where a weight ratio of the polymer based on «poxi» to the polymer based on «met)acr:1 oí 1 o is in the range of 25:75 to approximately 75*25. It should be understood that any features of the d& flow cell described in this description can be combined with each other in any way and / or configuration desirable to achieve the benefits described herein, which include, for example, having a printed layer with one or more tuned properties. In a second aspect, a method comprises applying a resin mixture onto a substrate, the resin mixture independently including two crosslinkable monomers present in the resin mixture in a predetermined weight ratio, a first of the two independently crosslinkable monomers being a cationicly polymerizable monomer and a second of the independently crosslinkable monomers being a polymerizable monomer with free radicals; imprinting the resin mixture with a working stamp having a plurality of nanocharacteristics; and curing the resin mixture while the working stamp is in place, to form an interpenetrating polymer network imprinted with flow cell nanoprints. In an example of the second aspect, the cationicly polymerizable monomer is a multifunctional epoul monomer, and the free-radical polymerizable monomer is a multifunctional methacryloyl monomer. In this example, the multifunctional epoul monomer is selected from the group consisting of; i) 2,4,6,8-tetramethyl-2,4,6,S-tetrakis(propyl giicidyl ether)clclotetrasiloxans; ii .) Tetrakis (epoxycyclohexyl ethyl) cic 1 ote trasi 1 oxajw: XÜ) i?óli (c&ñétí Isiléxanó)terminated in dígücidyl ether: where 4 < n < 8; Poly(propyleneglycGl) digllcldil ether; "and" vii) Poly(bisphenol A^QO^epielprhid^ with glycidyl end: where Θ < ,n * 2; vil i) Bisphenol A propoxylate dlglieidil ether: (ix) Tris with functionality .iwnopheniXoipolydimethyls.^ with epOKi termination): xi; 2f2 ' - / 2 >2Y3,3,4,4 / 5, 5~Qcta.f 6dii1)bis(oxirano): (xii) 1,3-Bis{B-glycidoxynropyljtetraethyldisiloxane: xiv) Gliddyl polyetherhedral siloesqiü.oxane: 20 xy y Ep οχ i id ohe x í lo po 1 i oe t a.éd rl oosi 1 sssqui οχ a π ©: paint acrylate: ©glycerol ratio v) Dimetaci: poly sheet. ethylene glycol : where 8 < n < 1G; yí) Dimethaneryla:ta of glycerol, ifteécla of ís&wros: 1; vií! Mstacrylate ds 3~ (acryloi 1οκ£) ~2-hldroxyrop.il viii) Ethylene glycol didiacrylate© íx) Say about the bis hole (2~metacri^ oxyethyl: Tricyclodecan© dimetanol acrylic acid: 0 0 c xi) Gliaerolate diaorilate g 1í oer o1 / fe no1): HgC CHg io 0 OH xii) bisphenol bimetacrylate A 15 HaC CHs < or* ny g. íl 20 xiii} Polidimeth11si1oxane •ne t. ncri 1 ox ipr opi lo: Λ de bisphenol A (1 0 ^oA^ghí OH . >. 3 CH3 , terminated in whereby it is selected to produce the monomer with a molecular weight of approximately 420 g / mol, 950 g / mol, 4000 g / mol, 10,000 g / mol or 25,000 g / mol; Triaorilato de carbozilato de circio br omonor bo mana 1 act ona: xvíi) Silsesquioxane acrylic polLoctaécirícQ: .1:8 xviíi) SiIsésquiOKanQ mtacrii pollootaédrleo: xix) 2^4, S<8-tetrainethyl-^ G, 8~tetrak^^ ace i lo i 1 ox ip r cp 11) c 1 el otetsasi 1 ex a π or xx) In an example with this function you can find some examples - from i) to xix). Regarding the second aspect, the poly(propiteng^ diglycidyl ether) mouomer: the wnómew of (suetlacrilm Ktul ti functional is 2, z, 3, 3, 4,4, 5,5~QCtafiuoro“l, 6~he.xan.Qdio 1 diacrylate: and the predetermined weight ratio as approximately 5Qr5Ct: In an example of the second aspect, the multifunctional epoxy monomer is Boli(propylene glycol) diglycidyl ether: manóme re (met)acryloyl multifun.^ is dlae of aerol apr αχ iwdamente predetermined weight e.g. range a approxi It should be understood that any feature of this method can be combined together in any desirable way. Furthermore, it should be understood that any combination of features of the method and / or the flow cell can be used together and / or combined with any of the examples described in this description to achieve the benefits as described herein, which include, for example, adjusting one or more properties of a printed layer. In a third aspect, a method comprises mixing a cationicly polymerizable monomer and a free-radical polymerizable monomer to form a resin mixture, wherein the resin mixture is a precursor to an interpenetrating polymer network to be incorporated into a flow cell; adjusting a weight ratio of the cationicly polymerizable monomer and the free-radical polymerizable monomer using at least one property to be imparted to the resin mixture or the interpenetrating polymer network, the property being selected from group 10 comprising refractive index of the interpenetrating polymer network, absorption of the interpenetrating polymer network, hardness of the interpenetrating polymer network, thickness of the interpenetrating polymer network, hydrophilic / hydrophobic balance of the network. > m*·' '.cá ititerpebetrante#.viscosity of Xa resin mixture, 15 chemical compatibility of the surface of the resin mixture with a working seal, chemical compatibility of the surface of the interpenetrating polymer network, shrinkage of the interpenetrating polymer network and combinations of these; and modeling the resin mixture to form the interpenetrating polymer network. OR In an example of the third aspect, the polymerizable monomer is a monomer of epurisiloxane and where the polymerizable monomer with free radicals is a monomer of (meth)acryloyl. In an example of the third aspect, the desired property is the chemical compatibility of the surface of the resin mixture with the working seal; the method also involves selecting a working seal material; and the weight ratio of the cationicly polymerizable monomer and the lipo-radically polymerizable monomer is adjusted to be within a range of approximately 25:75 to approximately 75:25. In an example of the third aspect, the modeling involves nanoimprint lithography, It should be understood that any feature of this method can be combined in any way desired. Furthermore, it should be understood that any combination of features of method 15 and / or the other method and / or the flow cell can be used together, and / or combined with any of the examples described in this description to achieve the benefits as described herein, which include, for example, adjusting one or more properties of a printed layer. Brief description of the figures The characteristics of the examples in the present description will become evident with reference to the detailed description and figures that follow,... «in which the similar reference numbers correspond to similar, though perhaps not identical, components. For the sake of brevity, the reference numbers or characteristics that have a previously described function may or may not be described in ' / ·. / ' or” m η '”<ι.·' i'cuss »u .i-; uj« . Figure 1 is a schematic illustration of an example of an interpenetrating polymer network; Figure 2 is a strip diagram representing an illustrative method for fabricating an example of an interpenetrating polymer network; Figures 3A to 3C are schematic illustrations of an example 15 of a method for making a molded and cured resin; Figure 4L is a top view of an example of a flow cell; Figure 4B is an enlarged cross-sectional view, taken along line 4B-4B of Figure 4A, of an example of a flow channel and sequence surfaces modeled on an illustrative first flow cell; Figure 4C is an enlarged cross-sectional view, taken along line 4O4C of Figure 4A, of an example of a flow channel and sequencing surfaces modeled on a second illustrative flow cell; Figure 5A is a graph representing the refractive index of a resin mixture and a cured resin, compared to the epoxy monomer content in the resin mixture; and Figure 5S is a graph that represents the thickness of a deposited resin mesol and a cured resin, compared to the epoxy monomer content in the resin mixture. Detailed description Modeling technology has been used to create individual depressions on flow cell surfaces. The depressions can be functionalized, for example, with capture primers. Within each of the functionalized depressions, cellular populations (localized and independent groups) of amplicons can be generated from the respective genetic oligonucleotide fragments. A higher density of groups can be obtained when the depressions have small dimensions and a low pitch (e.g., the spacing from the center of one depression to the center of an adjacent or nearby depression or from the edge of one depression to the edge of an adjacent or nearby depression). A higher density of groups means that more bases can be read from a given unit area, which increases the genetic throughput of the modeled flow cell. Nano-impression lithography (NIL) is an example of a high-throughput modeling technique that can allow for high accuracy and lower costs than, for example, modeling techniques that use photons or electrons. NÜ uses a working seal to create features of a K / cld curable resins. Some resin molds are easily printable, but some have properties that are suitable for use in flow cells. For example, some cured resins have compositions that react undesirably when exposed to curing chemicals. Other resin blends are difficult to print on. For example, resins intended to adhere after curing may not easily release from a working seal. Some resins can also become more difficult to print when the size and / or spacing of features between them is reduced (e.g., as the size and / or spacing is less than 500 nm). As an example, some resins that can replicate features larger than 1 µm, but can generate defects that obstruct and / or cover the features as the feature size is reduced. 5: The resin blend examples described herein cure to form an interpenetrating polymer network. The resin blend formulation may be modified so that one or more properties of the resin blend are adjusted for a particular application, including, e.g., printing, and / or one or more properties of the resulting interpenetrating polymer network are adjusted for a particular application, e.g., flow cell sequencing. For example, the viscosity of the resin formulation may be adjusted to facilitate processability and / or reflow (the time required to fill all working sealing characteristics with the resin formulation by applying reasonable pressure (e.g., with a roller weight)). As another example, the wettability of the resin formulation may be adjusted to improve the compatibility of the formulation with a .2.0 particular working seal material and / or with a particular substrate material. As other examples, the hydrophilic / hydrophobic balance, thickness, refractive index, surface properties (e.g., tackiness, chemical resistance, etc.), shrinkage, and / or hardness of the resulting interpenetrating polyhedral network can be adjusted for a particular application. As a specific example, the resin blend formulation can be adjusted to generate an interpenetrating polymer network with a refractive index suitable for use with a plane waveguide in a flow cell. As another specific example, the resin blend formulation can be adjusted to generate an interpenetrating polymer network with a surface property that cleanly releases the working seal after curing. Other properties, such as the self-flushability of the interpenetrating polymer network, can be adjusted.Select a particular initiator to be included in the resin mixture. Aiming for a specific property for the final resin and / or the resulting interpenetrating polymer network can determine the components of the resin mixture and the quantity of each component. For flow cell applications: described herein, the resulting penetrating polymerization also includes polymer bonding layers and other surface modification processes that introduce the desired surface chemistry for sequencing. 2θ.ΐί.η1£ί Ubi The terms used in this description shall be understood to have their ordinary meaning in the art, relevant unless otherwise specified. Several terms used in this description and their meanings are set out below. As used in the present description, the singular terms un, una and el / la refer to both the singular and the plural unless the context clearly indicates otherwise. The term comprising, as used in the present description, is synonymous with including, containing, or characterizing, and is inclusive or open and does not exclude additional unenumerated elements. The terms "substantially" and "approximately" used throughout this specification, including the claims, are used to describe and account for small fluctuations, such as those due to variations in processing. For example, these terms may refer to less than or equal to ±10% of a stated value, less than or equal to ±1% of a stated value, such as less than or equal to ±2% of a stated value, such as less than or equal to ±1% of a stated value, such as less than or equal to 0.5% of a stated value, such as less than or equal to ±0.2% of a stated value, such as less than or equal to ±11% of a stated value, such as less than or equal to 0.05% of a stated value. An acryloyl group is an enzyme with the structure FbC-CH C í^=O > -CP, where R can be an alkyl chain, a phenyl chain (bisphenol, for example), a fluorinated carbon chain, an alcohol, a glycol chain, a siloxane chain (dimethylsiloxane, cyclosiloxane, etc.). The acryloyl group can be part of a mono- or multifunctional molecule or a metal complex (zirconium or hafnium complexes, for example). The acryloyl group can also be a methacryloyl, with a methyl group in place of the single hydrogen atom in the C-C bond. When the term (meth)acryloyl is used, it means that the group can be either acryloyl or methacryloyl. A (meth)acryloyl-based polymer is a polymer or copolymer of monomeric units of acryloyl. A cationicly polymerizable monomer* is a monomer whose 2ü Polymerization and / or crosslinking is initiated by cations. The term "deposit," as used in this description, refers to any suitable application technique, which may be manual or automated and, in some cases, results in the modification of surface properties. Generally, deposition can be achieved using vapor deposition techniques, coating techniques, grafting techniques, or similar methods. Some specific examples include chemical vapor deposition (CVD) and spray coating. e.g., ultrasonic spray coating), rotary coating, dip coating, blade coating, paddle dispensing, through-flow coating, aerosol printing, micro-contact printing, inkjet printing, or the like. As used in the present description, the terms 'depression' and 'nanodepression' refer to a distinct concave feature in a molded resin of the interpenetrating polymer network. Nanodepressions are printed features that are transferred from a work stamp during a photoprinting process and are therefore a negative replica of the nanofeatures of the work stamp. Each nanodepression has a larger 'aperture' dimension (e.g., diameter or length depending on the shape) that varies from approximately 10 nm to approximately 1000 nm. In some examples, the larger 'aperture' dimension is a diameter or length that varies from approximately 25 nm to approximately 750 nm, e.g., from approximately 50 nm. at approximately 500 nm, approximately 40 mA, approximately 400 nm, etc. The largest aperture is surrounded, at least partially, by one or more interstitial regions of the resin.Depressions can have any of a variety of shapes at their opening in a surface that includes, for example, round, elliptical, square, polygonal, star-shaped (with any number of vertices), etc. The cross-section of a depression taken orthogonally to the surface can be curved, square, polygonal, hyperbolic, conical, angular, etc. The term "each," when used in reference to a collection of items, is intended to identify an individual item in the collection, but does not necessarily refer to all items in the collection. Exceptions may occur if there is explicit disclosure or if the context clearly indicates otherwise. The term epoxy (also called glycidyl group or oxirane), as used in the present description, refers to:o - . An epoxy-based polymer is a homopolymer of 20 monomeric epoxy units. A feature, used in the present description, refers to a point or area in a pattern that can be distinguished from other points or areas based on its relative location. The features Illustrative examples include depressions in a molded resin, projections of a working stamp, etc. The term "nanofeature" is specifically used to describe the characteristics of a working stamp that will be transferred to a resin blend. Nanofeatures are part of a pattern, and during printing, a negative replica of the pattern is generated in the printed material. For example, a nanofeature can be a nanobump that generates a nanodepression during printing. Each nanobump has a larger dimension that corresponds to the largest aperture dimension of the nanodepression to be printed and, in some examples, is in the range of approximately 10 nm to approximately 1000 nm. As used in this description, the term flow cell means a vessel having a chamber (e.g., a flow channel) where a reaction can take place, an inlet for supplying one or more reactants to the chamber, and an outlet for removing reactants from the chamber. In some examples, the chamber allows for the detection of the reaction occurring within it. For example, the chamber / flow channel may include one or more transparent surfaces that allow for the optical detection of arrays, optically distinct molecules, or the like, in the nanopressure(s). A free radical polymerizable monomer is a monomer whose polymerization and / or crosslinking is initiated by free radicals. In this description, the term independently crosslinked monomers refers to two or more different monomers that react and crosslink respectively without crosslinking with each other. The two or more different monomers are miscible with each other, so that the respective polymerization and crosslinking reactions occur in the same phase. This ensures that the crosslinked polymers become entangled and fixed in an interpenetrating network. In contrast, immiscible monomer systems would result in phase separation, and the polymerization and crosslinking reactions would occur in separate phases. This would result in the crosslinked polymers physically separating into the two phases. In the examples described in the present description, the independently crosslinked molecules can polymerize and crosslink simultaneously or primarily (but in the same phase). 20As used in the present description, the term Interstitial Region refers to an area on a surface (e.g., of a substrate, pattern, etc.) that separates features. For example, an interstitial region can separate one feature of a matrix from another feature of a matrix or pattern. The two separated features can be discrete, that is, not in physical contact with each other. In another example, an interstitial region can separate a first portion of a feature from a second portion of a feature. In many examples, the interstitial region is continuous, while the features are discrete, for example, as is the case with a plurality of nanodepressions defined on an otherwise continuous surface. The separation provided by an interstitial region can be partial or total. Interstitial regions can have aSurface material that differs from the surface material of the features defined on the surface. For example, the features of a flow matrix may have an amount or concentration of a polyaerobic coating and one or more primers that exceeds the amount or concentration present in the interstitial regions. In some examples, the polyaerobic coating and the primer(s) may not be present in the interstitial regions. An interpenetrating polymer network refers to two or more individual polymer networks that are at least partially intertwined, but not crosslinked with each other. The two or more individual polymer networks are mechanically connected through the physical entanglement and interweaving of their polymer chains and, therefore, cannot be separated unless the chemical bonds in one or both individual networks are broken. Each of the individual polymer networks is crosslinked; however, the two or more individual polymer networks are not crosslinked (e.g., fused). e.g. ® reí. leal adas} between itself. The interpenetrating polymer network is generated from independently reí i cu lab les monomers. The independently reí leal ables monomers are mixed and then polymerized and crosslinked simultaneously or sequentially, but in the same phase so that these monomers are physically intertwined, to create this polymer network. An interpenetrating polymer network can be distinguished from a polymeric mixture, which is formed by physically mixing two (or more) polymers together. The polymers in a polymeric mixture do not crosslink because polymerization occurs before the two polymers are fused together. The term 'pitch' as ​​used in this description refers to the spacing of features. In one example, 'pitch' refers to the separation from the center of one feature to the center of an adjacent or nearest feature. This 'pitch' may be called center-to-center spacing. In another example, 'pitch' refers to the spacing from the edge of one feature to the edge of an adjacent or nearest feature. This 'pitch' may be called edge-to-edge spacing. As used in this description, the term primer is defined as a single-stranded nucleic acid sequence (e.g., single-stranded DNA). Some primers, which may be referred to as amplification primers, serve as a starting point for template sequencing and the generation of DNA groups. Others, which may be referred to as sequencing primers, serve as a starting point for DNA synthesis. The 5' terminal end of the primer may be modified to allow coupling to a polymer coating. The primer length may have any number of bases and may include a variety of non-natural nucleotides. In one example, the sequencing primer is a short chain, ranging from 10 to 60 bases to 20 to 40 bases. mixture of resins and interpenetrating polymer network As illustrated schematically in Figure 1, examples of the interpenetrating polymer network 10 include two or more individual, but intertwined, polyhedral networks, 12 and 14. Polymer networks 12, 14, and therefore the interpenetrating polymer network 10 can form when a mixture of resins of at least two different monomer types is cured. In the examples described herein, the curing mechanism of one monomer type is orthogonal to the curing mechanism of the other monomer type, and therefore these components can be mixed without adversely affecting the curing efficiency. The orthogonal curing mechanisms are different and do not interfere with each other. One of the polymer networks 12 can be generated through the cationic polymerization of a cationicly polymerizable monomer. Epoxide-containing monomers are examples of cationicly polymerizable monomers. In the examples described herein, the epoxide-containing monomers are multifunctional epoxide monomers selected from the group consisting of: i) 2,4,6,S-tetramethi 1~2,4, 6, B~t«trakis (prop.yl glfeidll ether)cyclotetrasiloxane; iii) Tet raM s 1 si c1ot aurasi1oxane: ©til ItetráwtíJ iii) ΒοΙΐΜίυούίΙ.δ,ίΙ^ terminated in digllcidyl ether: where < < n < 8; iv| Polypropxlenglycol} dxglyoidyl ether: where 5 < n < 10; v) 3f4~epoxidolghe.xi^ epox id elche xanoca rdx i 1 ato: íqne can be used to increase Xa duréga); Bisfend A digliddil ether, brominated: 4.5 < (x ψ y) < 7 (which can be used for a higher index- of refraction); vil) Fe 11(bisphenol A-cu-epichlorohydrinJ , with gucidyl terminal triglycidyl ether: (2,2,3,3,4,4,2,5-0©tafluorohe^^6dlil )bis tamarane) (which can be used for a lower refractive index}; xii} 1f3~Bis(Ó-glfcidoxiprppi 5 ..Z$ Vs^' Z í^C4·4 „ \ z 1 i 10 \ xíij 1,3 Bis(2(3,4 me t iIdi si 1 αχ w) year: 3 HX ' rb ,χ1·4%* X ' xív) Tetrahedral polyctahedral structure: sjr wc $ Hs epaxicyclohex-l-yl)ethyl tetra- / * J si1ses qu i ox a no: xvi) Tris(4TMhydroxyphenyl)methane triglyoidyl ether xvii) 4 / 4'-Methylenobis(N,K~diglyedylaniline) xviiii· any combination of i) the xviij „ Although several examples have been provided, it should be understood that these examples are not limiting, and that any other monomer containing a phosphate capable of crosslinking may be used. For example, any polyhedral oligomeric silsesquioxane (POSS) core functionalized with epoxy groups may be used. As used herein, the term polyhedral oligomeric silsesquioxane (POSS) refers to a chemical composition that is a hybrid intermediate (RSiQi.s) between silica (SiQi) and silicon (RaSLO). An example of PQSS may be that described in Kehagias et al., Microelectronics Engine® (2009), pp. 776-778, which is incorporated as a reference in its entirety. The composition is an organosilicon compound with the chemical formula iRSiOgdn, where the R groups may be the same or different. In still other examples, an mpncf undena 1 epoxy monomer can be used together with multifunctional epoxy monomers as a comonomer to help adjust the general properties of the retina. Examples of such monofunctional epoxy monomers include the following: i) dxddil -2# 2, 3, 3-tetrafluoro^^ ether (helps reduce the refractive index of the resin): δ ii) Glycidyl 2,2,3,3,4,4,5,5-octafluoropent.yl ether (helps reduce the refractive index of the resin): 111) (2,:2, 3,3,4,4, 5,5 / 5, 6, 7, 7, 8, 8,9, 9, 9- heptadecafluorononi1}oxirane 1 helps reduce the refractive index of resin): ivi any combination of i) to ii) « Although several examples have been provided, it should be understood that these examples are not limiting and that any other single-function epoxy monomer may be used. The other polymer network 14 is generated through free-radical polymerization of a free-radical polymerizable monomer. The kinetics of free-radical polymerization are generally much faster than, e.g., cationicly initiated epoxy ring-opening polymerization. Monomers containing (meth)acryloyl are examples of free-radical polymerizable monomers. In the examples described herein, the (meth)acryloyl-containing monomers are multifunctional (meth)acryloyl monomers selected from the group consisting of: i) 2,2,3,3,4,4,5,5-octafluoro-l, 6-Hexan.odiol diacrylate: iii) Triacr11 pent ae rit ri t o1: viii) Fetilsnglycol Bimetrelate; M:M2 disulfide -wtñorilpil) oxyethyl where m is in the range from 0 to 4, n is in the range from 0 to 4, and mtn ~ 4; Acrylate of ci xvil) χνίίϊ) Silsesquioxane mtecryl polyoctahedral:: xxx ) ¿, 4S, 8 -t é trame ti 1 - 2, 4,6, 8 -tetrakis (3 acryloxypropyl) cycle after! loxane: any combination of i) to xix). Although several examples have been provided, it should be understood that these examples are not limiting, and that any other monomer containing {met)aoriloyl capable of crosslinking can be used. In still other examples, a monofunctional (meth)acryloyl monomer can be used in conjunction with multifunctional (meth)acryloyl monomers as a co-mer to help adjust the overall properties of the resin. Examples of such a (meth)acryloyl monomer include the following molecules: i) Pentabromobenzyl acrylate; lilies WXaoxylate of 2-[(1r, 1 \ 1 '“Trlf1coro-2'(tr if leo r orne ti 1) ~:2f- h id roxi) not prepi 11 - 3- norbor: . vi) Acid 3~ (acrylamide;phenylboronic .:0 Wt a©ri lab© of he-kaf for i:so-prop 11; νϊϋ) Pentafluorof.enylG acrylate:: ι.χ) Pentafluorophanyl metacrllato; •Hexafluoroisopropyl aarylate lato of hex-af S9 ) Poly(dimethylsilcx^ terminated in monomctacrylate: R ~ alkyl (methyl or butyl), where n is selected to have as objective any mclecnlar weight between 250 g / m>u, and 50,000 g / mcl; xiiij Tere-butyl acrylate; (xiv) Tere-butyl metracrylate: xv) Acrylate oligomers of 2“carbcxiethyloi where n is in the range of 0 to 3; and xvi) any combination of x) to xv) < IO In one example, the cationicly polymerizable monomer is a multifunctional epoxy monomer, and the free-radical polymerizable monomer is a multifunctional (meth)acryloyl monomer. Multifunctional monomers include more options for polymerization and crosslinking. In another, more specific example, the cationicly polymerizable monomer is an epoxysiloxane monomer, and the free-radical polymerizable monomer is a (meth)acrylsyl monomer. Each of the described polymerization mechanisms (free radicals and ions) can be initiated by exposure to ultraviolet (UV) light. In some examples, alternative UV-activated polymerization mechanisms can be used; for example, thiol-ene chemistry can be used instead of the radical-initiated monomers described herein, since this type of chemistry also involves free-radical polymerization. Some illustrative vinyl-based molecules that participate in thiol-ene chemistry include: i) Vinyl-terminated polydimethylsiloxane: wherein n is selected to produce the monomer with a molecular weight of approximately 800 g / mol, 9400 g / mol, 28,000 g / mol, 49,500 g / mol, 117,000 g / mol or 155,000 g / mol; ii} Polydimethylsyl-Hano terminated in bis(divinylol): ίϋ) Pentaerythritol tetrakis (3~merfepiop^^ iv) 2,2'-thiodiethanethiol: í^gg|_| v) 1,5-pentanedithiol: vi) Pulioctahedral oetavinyl SOsesqufe^ vii) any combination of i) to vi}. With reference now to Figure 2, an example of a method with reference number 100 is illustrated. As shown, the method- 5. 1.00 includes mixing the cationicly polymerizable monomer {this may be a multifunctional monomer alone or a mixture of at least one multifunctional monomer and one or more mono- or multifunctional monomers} and the free-radical polymerizable monomer (this may be a multifunctional monomer alone, or a mixture of at least one multifunctional monomer and one or more mono- or multifunctional monomers) to form a resin mixture, wherein the resin mixture is a precursor for an interpenetrating polymer network to be incorporated into a flow cell (reference number 1.02); adjusting a weight ratio of the cationicly polymerizable monomer and the free-radical polymerizable monomer using at least one property to be imparted to the given mixture.The property is selected from the group that includes: Index of resistance of the interpenetrating polymer network, absorption of the interpenetrating polymer network, hardness of the interpenetrating polymer network, thickness of the interpenetrating polymer network, hydrofluorescence balance of the interpenetrating polymer network, viscosity of the resin mixture, chemical compatibility of the surface of the resin mixture with a working seal, chemical compatibility of the surface of the. 4 interpenetrating polymer network, interpenetrating polymer network shrinkage and combinations thereof (reference number 104); and shaping the resin mesola to form the interpenetrating polymer network (reference number 106?). Any example of the cationicly polymerizable monomer and the free-radical polymerizable monomer described herein may be used. Generally, the weight ratio of the cationicly polymerizable monomer to the free-radical polymerizable monomeric resin blend is in the range of approximately 1:9 (1:9) to approximately 90:1 (9:1). In the examples described herein, the weight ratio of these monomers can be adjusted to obtain a predetermined property of the resin blend and / or to obtain a predetermined property of the resulting interpenetrating polymer network. The predetermined property of the resin blend can be viscosity and / or permeability with a working seal and / or a substrate (e.g., a flow cell substrate). The default property of the resulting interpenetrating polymer network can be the hydrophilic / hydrophobic equilibrium, thickness, refractive index, absorption, surface properties (e.g., tackiness, chemical resistance, etc.), shrinkage, and / or hardness. The autofluorescence of.The interpenetrating polymer network 10 can also be adjusted or eliminated by selecting a particular initiator for the resin mixture. The effect of the weight ratio on a particular property will depend, in part, on the ratios and the respective properties of the monomers used. Figure 5A and Figure 5B (both described in detail in the Examples section) illustrate the effect of the ratio in pea© of a mixture of epoxy-based monomers: S6 The thickness of a layer of the resin mixture and the thickness of the resulting interpenetrating polymer network 10 (Figure 58). With this particular combination of monomers, the refractive index of the resin mixture and the resulting interpenetrating polymer network 10 can be kept at a desirably low level when the ratio of the ionically polymerizable monomer (epoxy) to the free-radically polymerizable monomer (acrylolol) is in the range of approximately 10:90 (1:9) to approximately 50:50 (1:1). With this particular combination of monomers, the thickness of the resin mixture and the resulting interpenetrating polymer network 10 is generally reduced as the epoxy content is reduced. To achieve desirable surface properties (e.g., tackiness, chemical resistance, etc.) for the interpenetrating polymer network 10, each of the selected monomers can have these properties equal or similar so that the properties are imparted to the network 10. In this example, the weight ratio can be within the range of 10:90 (1:9) to approximately 90:10 {9:1}. For shrinkage, acrylic-based monomers shrink more significantly than epoxy-based materials. As a result, to limit the shrinkage of the final interpenetrating polymer network 10, a larger quantity of the epoxy material could be used. For hardness, some epozi-based monomers are harder than some (methacrylate)-based monomers. Therefore, the weight ratio will depend on the hardness of the individual monomers and the desired hardness for the final interpenetrating polymer network. Furthermore, multiple properties can be targeted, which can affect the step ratio. For example, it may be desirable to target a low refractive index for the interpenetrating polymer network and good wettability with the working seal. For a low refractive index, a fluorinated monomer can be selected, but this could adversely affect the wettability of the resin blend with the working seal. In this example, the second monomer and its quantity can be selected to recover some compatibility. The second monomer can be present in an amount of at least 33% by weight. The weight ratio of the cationicly polymerizable monomer and the free-radical polymerizable monomer can also be adjusted to make the resin mixture printable. A printable resin is one that can conform to the characteristics of an applied work stamp; that, after curing, can fix the configuration of the applied work stamp feature; and that can cleanly release the work stamp after curing. As such, reference number 104 of Method 15 can include adjusting the weight ratio of the cationicly polymerizable monomer and the free-radical polymerizable monomer to make the resin mixture printable by a work stamp. To make the resin mixture printable by a work stamp, the work stamp material can be taken into consideration when adjusting the step ratio of the monomers.For example, the material of the working seal can affect the wettability of the resin mixture to the working seal, as well as the release capacity of the resulting interpenetrating polymer network 10. As such, the monomers and their associated weight ratio can be selected to be compatible with the working seal, or the working seal can be selected to be compatible with the monomers and their associated weight ratio. In the latter example, the weight ratio can be adjusted to achieve one or more target properties, and then the chemistry of the working seal. 2.0 can be selected to properly print the resin mixture. In addition, printability can also be improved by other factors, such as greater exposure to UV radiation (for a resin with a higher degree of cure) and / or the addition of a leveling agent to the resin mixture. In the following examples, the working seal material is a silicon-based material, such as acrylate or polymerized silicon metal. In one example of a resin blend that can be printed with these working stamps, the multifunctional epoxy monomer 5 is poly(propylene glycol) diglycidyl ether, the multifunctional acrylate monomer is 2,2,3,3,4,4,5,5-octaphosphate-1,5-hexane diacrylate, and the default weight ratio is approximately 50:50 (1:1). In another example of a resin blend that can be printed with these working stamps, the multifunctional epoxy monomer 10 is poly(propylene glycol) diglycidyl ether, the multifunctional acrylate monomer is 1,3-glycerol diglycerol diacrylate, and the default weight ratio is in the range of approximately 25:75 (1:3). aproX'imadémenbe 75:25 (3< 1 j,. For some (meth)acryloyl monomers, the maximum weight ratio is 1:1, and therefore other examples include more of the epoxy monomer and less of the (meth)acryloyl monomer. This may be because the epoxy monomer is able to wet the sealing material. In addition to the cationicly polymerizable monomer and the free-radical polymerizable monomer (which are present in the given weight ratio), the resin mixture examples described herein may also include a cationic photoinitiator and a free-radical photoinitiator. The respective photoinitiators may be used in amounts ranging from approximately 0.25 wt% to approximately 10 wt% relative to the initiating monomer. In other examples, each photoinitiator is present in the mixture in amounts ranging from approximately 0.5 wt% to approximately 9.5 wt%, e.g., from approximately 1 wt% to approximately 5 wt% relative to the initiating monomer. Cationic photoinitiators can be used to initiate the curing of monmorum or cationic polymerizable monomers. The cationic photoinitiator can be a system that includes a photoacid generator (which is the cationic compound) and a sensitizer (which aids in the formation of the cationic compound). These two compounds can be used in a 1:1 weight ratio or some other suitable weight ratio. Each of these two compounds can also be present in the quantities provided in this description for the photoinitiator. Suitable cationic compounds (photoacid generators) include any of a variety of useful materials such as onium salts, certain organometallic complexes, and the like, and mixtures thereof. Some specific examples of cationic photoinitiators are...Suitable mica compounds include LF-MdroxynaphthalimM triflate, triarylsulfonium hexafluorophosphate salts, metallized; salts: of triarylsulfonium hexafluoroantimonate; triflate: of 1-naphthyl diphenylsulfonium; triflate of 4-phenylthiophenium diphenylsulfonium; hexafluorophosphate of bis-(4,5,methylphosphoryl)iodonium; hexafluorophosphate of bis-(4,3,5,6,7,6,7,8,9 ... Free radical initiators can be used to initiate the curing of free radical polymerizable monomers or monomers. Suitable free radical photoinitiators include benzoin ethers (e.g., benzoin methyl ether and benzoin isopropyl ether), substituted benzoin ethers (e.g., anisoles methyl ether), substituted acetophenones (e.g., 2,2-dimethylacetophenone and 2,2-dimethylacetophenone), substituted alpha-acetols (e.g., 2-methyl-2-hydroxypropionate), aromatic phosphine oxides (e.g., diphenyl(2,4,6-trimethylbenzyl)phosphine oxide; a mixture of diphenyl(2,4,6-trimethylbenzyl)phosphine oxide and 2-methyl-2-methylpropionate phosphine oxide). 6-, trimethylbenzoyl 1 i ros fina; and ethyl (2, 4, 6-trimethylbenzoyl)phenylphosphinate) , aromatic sulfonyl chloride (for example, 2-naphthalene sulfonyl chloride), phytoactive extracts (for example, 1-phosphoryl-1,2-propanediolone-2-ethyl phosphate and the like, and mixtures thereof. The resin mixture may also include a solvent so that it can be deposited onto a substrate for printing and curing. The resin mixture must be diluted in the solvent to achieve a desired viscosity for the deposition technique to be used and / or to achieve a target thickness of the resin layer that is at least substantially uniform. Examples of suitable solvents include: propylene glycol monomethyl ether acetate (PGMEA), toluene, dimethyl sulfoxide (DMSO), tetrahydrofuran (THE), etc. In one example, the concentration of the compounds in the solvent is in the range of approximately 15% by weight (I by weight) to approximately 5% by weight (where the monomers are present in the desired weight ratio) and the total concentration of the photoinitiators in the solvent is in the range of: approximately 1% by weight to approximately 10% by weight, although it is believed that the maximum limits may be higher depending on the respective solubility of the monomers and photoinitiators in the solvent selected. Referring now to Figures 3A to 3C, an example of a method for fabricating a patterned interpenetrating polymer network 10 is illustrated. The method includes applying a resin mixture onto a substrate, the resin mixture independently comprising two crosslinkable monomers present in the resin mixture 16 in a predetermined weight ratio, the first of the two independently crosslinkable monomers being the cationicly polymerizable monomer and the second of the two independently crosslinkable monomers being a free-radical polymerizable monomer; printing the resin mixture 18 with a working stamp 20 having a plurality of nanofeatures 22; and curing the resin mixture 16 while the working stamp 20 is in place, to form an interpenetrating polymer network (10) printed with flow-cell nanodepressions. Figure 3A shows the application of resin mixture 16 onto substrate 18. Any example of resin mixture 15 described herein may be used. The substrate 18 used may depend on the type of flow cell to be formed. In some examples, the substrates may be polyethylene, glass and modified or functionalized glass, plastics (including polyethylene, polystyrene and styrene copolymers and other materials), polypropylene, polyethylene, polybutylene, polyurethanes, polytetrafluoroethylene (such as those of Chemoursi, cyclic olefin / cycloolefin polymers (COPs) (such as Zem's EEOUQR®), polyimides, etc.), nylon, ceramics / ceramic oxides, silica, fused silica or silica-based materials, aluminum silicate, silicon and modified silicon (e.g., boron-doped p+ silicon), silicon nitride (SiO₂), silicon oxide (SiO₂), tantalum pentoxide (TaCu) or other tantalum oxides (TaO₂), naphtha oxide (Na₂O₃), carbon, metals, inorganic glasses, or the like. The substrate can also be a multilayer structure. Some examples of multilayer structures include glass or silicon with a coating layer of tantalum oxide or another metal oxide on the surface. Other examples of multilayer structures include an underlying support (e.g., glass or silicon) with a patterned resin on top. Still other examples of multilayer substrates can include a silicon substrate on an insulator (SOI). Another example of a multilayer substrate includes a planar waveguide. For example, a glass substrate can support a grating layer (a laser-coupling grating) and a planar waveguide layer. C It is desirable that the grating layer have a refractive index within the range of approximately 1.35 to approximately 1.55, and a resin with a suitable refractive index can be used to generate the grating layer. For example, one might include a 5. Fluorinated monomer is the resin to achieve a refractive index within the range of approximately 1.35 to approximately 1.4. In another example, a slightly fluorinated or siloxane-based monomer can be included in the resin to achieve a refractive index within the range of approximately 1.4 to approximately 1.45. In yet another embodiment, the siloxane-based monomer content in the resin can be reduced to achieve a refractive index within the range of approximately 1.45 to approximately 1.5. It is desirable that the planar waveguide layer have a refractive index greater than the refractive index of the modeled interpenetrating polymer network. In some examples, it is desirable that the planar waveguide have a refractive index within the range of approximately 1.6 to approximately 2.6, and a resin with a suitable refractive index can be used to generate the planar waveguide layer. Highly transparent polymers having a refractive index ranging from approximately 1.6 to approximately 1.65 can be used for the planar waveguide and can be deposited using nanoimprint lithography. Highly transparent monomers with high polarizability and / or bromide content, having a refractive index ranging from approximately 1.65 to approximately 1.8, can be used for the plane waveguide and can be deposited using nanoimprint lithography. Highly transparent metal oxides with a refractive index greater than 1.8 can also be used for the plane waveguide and can be deposited using sputtering. As illustrative metal oxides, the following can be used: zinc monoxide (ZnO) with a refractive index of approximately 2.0; tantalum pentoxide (TaGs) with a refractive index of approximately 2.3; zirconium dioxide (ErOg) with a refractive index of approximately 2.14; or titanium dioxide (TiO2) with a refractive index of approximately 2.64. In any of the examples described in this description, the substrate may have a diameter ranging from approximately 2 mm to approximately 300 mm, or be a rectangular sheet or panel whose largest dimension is up to approximately 10 feet (3 meters). In one example, the substrate is a wafer having a diameter ranging from approximately 200 mm to approximately 300 mm. In another example, the substrate is a mold having a width ranging from approximately 0.1 mm to approximately 10 mm. Although illustrative dimensions have been provided, it should be understood that a substrate of any suitable dimensions may be used. For another example, a panel may be used that is a rectangular support, having a surface area greater than a 300 mm round wafer. The application of the resin mixture 16 onto the substrate 18 can be carried out using any of the deposition techniques described in this description. After depositing the resin mixture 16, it can be gently baked to remove excess solvent. Figure 3B represents the impression of the resin mixture 16 with a working stamp 20 having a plurality of nanofeatures 22. The pattern of the nanofeatures 22 of the working stamp 20 is a negative replica of the desired features (e.g., nanodepressions 24) (see Figure 30) that will form in the molded and cured resin 28. The size and shape of the nanofeatures 22 depend on the desired size and shape for the nanodepressions 24. The working stamp 20 is pressed into the resin mixture 16 to create an impression on / in the resin mixture. The working stamp 20 is held in place during curing, as illustrated in Figure 3B. Curing can be carried out by exposure to photothermal radiation, such as ultraviolet (UV) radiation, using, e.g., UV light sources, mercury vapor light sources, UV-emitting LED light sources, etc. Curing promotes the formation of cations and radicals due to the presence of the respective photoinitiators, and these cations and radicals are used to cure the epoxy and (meth)acryloyl portions of the resin 16 mesolate, respectively. As such, curing promotes the separate polymerization and / or crosslinking of the monomers in the resin 16 mixture. Curing may include a single exposure stage, or it may include multiple stages, including a soft bake (e.g., to remove the solvent(s)) followed by UV exposure. When included, the soft bake may take place at a lower temperature, ranging from approximately 50°C to approximately 150°C for 0 seconds to approximately 3 minutes, and may take place before placing the working seal 20 into the resin mixture 16. In one example, the soft bake time is in the range of approximately 30 seconds to approximately 2.5 minutes. Some multi-map curing processes may also include a hard bake. However, the curing mechanisms of the resin mixture 16 described herein are so rapid that the resin mixture 15 can achieve maximum cure without a hard bake. If a hard bake is performed, the working seal 20 is released / separated before the hard bake, e.g., so that the working seal 28 does not bond to the molded and cured resin 28. If performed, the duration of the hard bake can last from approximately 5 seconds to approximately 10 minutes at a temperature ranging from approximately 60°C to approximately 300 °C. Hard baking: can be carried out, for example, to remove residual solvents, for further polymerization of some of the resin table materials 16 (and thus improve the degree of curing and achieve an acceptable layer hardness S) and / or to help fix the printed topography. Examples of devices that can be used for soft baking and / or hard baking include a hot plate, oven, etc. After curing, the working seal 20 is released, as shown in Figure 3C. Curing forms the patterned and cured resin 28. The chemical composition of the patterned and cured resin 28 is the interpenetrating polymer network 10. The chemical composition of the interpenetrating polymer network 10 will depend on the composition of the resin matrix. In one example, the patterned and cured resin 28 of the interpenetrating polymer network 10 may have a weight ratio of an epoxy-based polymer to a (meth)actylyl-based polymer that is in the range of 25:75 to approximately 71:25. In one example, the thickest portion of the thickness of the patterned and cured resin is in the range of approximately 225 nm to approximately 600 nm. As shown in Figure 3C, the modeled and cured rebine 28 included the nanodepressions 24 defined therein, and the interstitial regions 26 that separate the adjacent nanodepressions 21. The nanodepressions 24 are the negative replica of the nanocharacteristics of the work stamp 22. Examples of the resin mixture described herein can be formulated to be successfully printed with a work stamp having nanocharacteristics 22 that will create the nanodepressions 24 described herein. Many different arrangements of nanodepressions 24 can be considered, including regular, repeating, and irregular patterns. In one example, the nanodepressions 24 are arranged in a hexagonal grid to achieve compact packing and improved density. Other arrangements may include, for example, rectilinear (e.g., rectangular) arrangements (e.g., lines or trenches), triangular arrangements, etc. In some examples, the arrangement or pattern may be an x-y format of nanodepressions 24 in rows and columns. In some other examples, the arrangement or pattern may be a repeating array of interstitial nanodepressions 24. In still other examples, the arrangement or pattern may be a random arrangement of nanodepressions 24 and / or interstitial regions 26. The arrangement or pattern can be characterized with respect to the density of the nanodepressions 24 (e.g., number of nanodepressions 24) in a defined area. For example, the nanodepressions 24 may be present at a density of approximately 2 million per watt. The density can be adjusted to different densities, including, for example, a density of approximately 100 g / cm², approximately 1000 per mm², approximately 0.1 million per mm², approximately 1 million per mm², approximately 2 million per mm², approximately 5 million per mm², approximately 10 million per mm², approximately 50 million per mm², or more, or less. It should be further understood that the density of the nanodepressions 24 in the molded and cured resin 28 may be between one of the lower and one of the upper values ​​selected from the above ranges. As examples, a.A high-density matrix may be characterized by having nanodepressions 24 separated by less than approximately 10 nm, a medium-density matrix may be characterized by having nanodepressions 24 separated by approximately 400 nm to approximately 1 pm, and a low-density matrix may be characterized by having nanodepressions 24 separated by more than approximately 1 pm. Although illustrative densities have been provided, it should be understood that substrates of any suitable density may be used. The distribution or pattern of nanodepressions 24 can be characterized, additionally or alternatively, in terms of the average step. The pattern may be regular, such that the coefficient of variation around the average step is small, or the pattern may be irregular, in which case the coefficient of variation may be relatively large. In either case, the average step may be, for example, approximately 50 nm, approximately 100 nm, approximately 0.5 nm, approximately 1 nm, approximately 5 nm, approximately 10 nm, approximately 100 nm, or more or less. The average step for a particular pattern of nanodepressions 24 may lie between one of the lower and one of the upper values ​​selected from the ranges above. In one example, the nanodepressions 24 have a step (center-to-center separation) of approximately 1.5 nm.Although illustrative average step values ​​have been provided, it should be understood that other average step values ​​may be used. The size of each nanodepression 24 can be characterized by its volume, area of ​​the opening of the pit, depth, and / or diameter. Each nanodepression 24 can have any volume capable of confining at least part of the fluid introduced into the flow cell (reference number 30 in Figure 4A). The minimum or maximum volume 20 can be selected, for example, to accommodate the expected analyte productivity (e.g., multiplexing), resolution, nucleotides, or reactivity for downstream applications of the flow cell 3Q. For example, the volume 20 can be approximately 1 x 10⁻⁵ pm⁻¹, at least approximately 1 x 10² pm⁻³, at least approximately 0.1 pm⁻³, at least approximately 1 pm⁻³, at least approximately 10 pm⁻¹, at least approximately 100 pm⁻³, or Q TIí(M.íOSí * The area occupied by each nanodepression aperture can be selected based on criteria similar to those previously discussed for volume. For example, the area for each nanodepression aperture can be at least approximately 1000 µm, at least approximately 1000 µm, at least approximately 0.1 µm, at least approximately 100 µm, at least approximately 100 µm², or more. Alternatively, the area can be at most approximately 1000 µm, at most approximately 100 µm, at most approximately 100 µm, at most approximately 100 µm, at most approximately 100 µm, at most approximately 0.1 µm, at most approximately 1000 µm, or less. The area occupied by each depression aperture can be greater, less, or fall between the values ​​specified above. The depth of each nanodepression 24 can be large enough to displace a polymeric hydrogel (described below with reference to the Figure). In one example, the depth can be at least approximately 0.1 pm, at least approximately 0.5 nm, at least approximately 1 pm, at least approximately 10 nm, at least 3 approximately 100 pm, or greater. Alternatively or additionally, the depth may be at most approximately 1 x 10³ gm, or at most approximately 10 pm, or less. In other examples, the depth is: of approximately 0.4 pm< The depth of each depression 24 can be greater, less, or between the values ​​specified above. In some cases, the diameter or length and width of each nanodepression 24 can be in the range of approximately 10 nm to approximately 1000 nm. For example, the diameter or length and width of each nanodepression 14 can be approximately 0.50 µm, approximately 0.1 µm, approximately 0.5 µm, or approximately 1 µm. Some resins can be printed with larger depressions, e.g., having a diameter or length and width of approximately 10 µm, approximately 100 µm, or more. In some examples of the nanodepressions 24, the diameter or length and width is approximately 0.4 µm. Flow cells As mentioned, the IB substrate that has the molded and cured resin 28: on it can be incorporated into a flow cell 30. An illustrative flow cell 30 is shown in Figure 4L. As will be described with reference to Figure 4E, some examples of s The flow cell 30A includes two opposing sequencing surfaces 32, 34. In other examples, the flow cell 3OS includes a sequencing surface 32 supported by a substrate 18 and an opposing lid 36 attached to the substrate 18. ,β: The flow cell 3Ώ includes flow channels 38. Although several pairs of flow channels 38 are shown in Figure 4Ά, it should be understood that any number of flow channels 38 can be included in the flow cell 30 (e.g., a single channel, four channels, etc.). In some of the examples described herein (Figure 4Ά), each flow channel 38 is an area defined between two opposing sequencing surfaces 32, 34. In other examples described herein (Figure 4Ά), each flow channel 38 is an area defined between a sequencing surface (e.g., 32) and the opposite lid 38. Fluids can be introduced into and removed from the flow channels 38. Each flow channel 38 can be isolated from the other flow channel 38 in a flow cell 30 so that the fluid introduced into any channel flow 38 particular do not flow into any adjacent flow 38 channel. In one example, the flow channel 38 has a rectangular configuration. The length and width of the flow channel 38 can be smaller, respectively, than the length and width of the substrate 18 such that a portion (e.g., the surface) 40} of the molded and colored resin 28 (on the substrate 18) surrounds the flow channel 38 is available for joining to another substrate 18 or the lid 36. In some cases, the width of each flow channel 38 may be approximately 1 m, approximately 2.5 mm, approximately 5 m, approximately 7 mm, approximately 10 mm, or more, or less. The width and / or length of each flow channel 38 may be greater than, less than, or between the values ​​specified above. In another example, the flow channel 38 is square: (e.g., 10 m x 10 mm). The depth of each flow channel 38 can be as small as the thickness of a monolayer, for example, when micro-contact, spray, or dye-jet printing is used to deposit a separate material that defines the walls of the flow channel. As 15 other examples, the depth of each flow channel 38 can be approximately 1 µm, approximately 10 µm, approximately 50 µm, approximately 150 µm, or greater. In one example, the depth can be in the range of approximately 10 µm to approximately 100 µm. In another example, the depth is approximately 5 µm or less. It should be understood that the depth of each flow channel 38 can be greater than, less than, or between the values ​​specified above. The depth of the flow channel 38 can also vary along the length and width of the flow cell 30, e.g. e.g., when the modeled sequencing surface or surfaces 32, 34 are used. Figure 4B illustrates a cross-sectional view of the MA flow cell including patterned opposing sequencing surfaces 32, 34. In one example, each of these surfaces 32, 34 can be prepared in the nanodepressions 24, 24' of patterned and cured reams 28, 28' on the substrate 18, 18'. The substrates 18, 18' can be fixed, e.g., across surfaces 48, 40*j to each other to form an example of the flow cell 3AA. Any suitable bonding material 42, such as an adhesive, a radiation-adsorbing material that aids bonding, etc., can be used to join the surfaces 40, 40' together. Sequencing surfaces 32, 34 include a polymeric hydrogel 44, 44' and amplification primers 46, 46* attached to the polymeric hydrogel 44, 44'. An example of the polypolymer hydrogel 44, 44' includes an acrylamide polymer, such as poly(N-(3-asidoacetamide ylpentyl)acetylamid” co-acrylamide, PA3AM. uAZAM and some other forms of the acrylamide polymer are represented by the following structure (11: where: RA is selected from the group consisting of amide, optionally substituted anino, optionally substituted alkenyl, optionally substituted alkenyl, halogen, optionally substituted hydrazons, optionally substituted hydratin, carboxyl, hydroxy, optionally substituted tetrazol, optionally substituted tetrazine, nitrile oxide, nitrone, sulfate, and io: ; R:® is H or optionally substituted alkyl; Rc, R° and R£ are selected independently from the group consisting of H and optionally substituted alkyl; each of the -(CHóp··- can be replaced optionally; p is an integer in the range 1 to 30; n is an integer in the range of 1 to 58,000; ym is an integer in the range of 1 to 100,000. An expert in the technique will recognize that the arrangement gives the characteristics of recurrent fe and fe in structure (I) is S representative, and the minor rich subunits may be present in any order in the polymer structure (e.g., random, block, patterned, or a combination of these). The molecular weight of PIZAM and other forms of acrylamide copolymer can vary from approximately 5 kDa to approximately 1500 kUa or from approximately 10 kDa to approximately 1000 kDa, or they can be, in a specific example, approximately 312 kDa. In some examples, PAZAM and other forms of acrylamide coppel are linear polymers. In some other examples, PAZAM and other forms of aurylamide coppel are slightly crosslinked polymers. In other examples, the polymeric hydrogel 44, 44' can be a variation of the structure In one example, the acrylamide unit can be replaced by N,N-dl methylacrylamide. In this example, the acrylamide unit in the where a (instead of each case this example. one in 100,000. i1a eri1ami da can be in addition to the aerylamide unit. In this example, the structure example# q can be an integer in the tangent from 1 to 100., 0QÍ1. As yet another example, the polymer hydrogel 44, 44' can include a recurrent unit of each of the structures (XII) and (IV); wherein each of Fe3, Rs·', h'' and R2h is independently selected from hydrogen, an optionally substituted alkyl or optionally substituted phenyl, each of R3eyg® is independently selected from hydrogen, an optionally substituted alkyl, an optionally substituted phenyl or an optionally substituted C7-C14 aralkyl; and each of y IL is independently selected from an optionally substituted alkyl linker or an optionally substituted hethydroalkylene linker. It should be understood that other molecules can be used to form the polymeric hydrogel 44, 44' provided they are functionalized to graft oligonucleotide primers 4 6, 4 6 * to it. Other examples of suitable polymeric layers include those having a colloidal structure, such as agarose; or a polymeric mesh structure, such as gelatin; or a crosslinked polymeric structure, such as polyacrylamide polymers and copolymers, silane-free acrylamide (SFA), or an axo-olifined version of SEA. Examples of suitable polyacrylamide polymers can be synthesized from acrylamide and an acrylic acid or an acrylic acid containing a vinyl group, or from monomers that undergo photocyclization reactions. [2+2), Still other examples! of suitable polymer hydromels 44, 44' include mixed copolymers of acrylamides and acrylates. In the examples described in the present description, a variety of polymer architectures containing acrylamide monomers (e.g., acrylamides, acrylates, etc.) can be used, such as branched polymers, including star polymers, star-shaped or star-block polymers, dendrimers, and the like. For example, monomers (e.g., acrylamide, etc.) can be incorporated either randomly or block-like into the branches (arms) of a star-shaped polymer. To introduce the polymeric hydrogel 44, 44' into the nanodepressions 24, 24*, a mixture of the polymeric hydrogel 44, 44' can be generated and then applied to the molded and cured resins 28, 2Sf. In one example, the polymeric hydrogel 44, 44* can be present in a mixture (e.g., with water or with ethanol and water). The mixture can then be applied to the respective molded and cured resins 28, 28' (including the nanodepressions). 24, 24 *) using spin coating, or dip coating or immersion, or material flow under positive or negative pressure, or another suitable technique. These types of techniques generally deposit the polymeric hydrogel 44, 44' onto the molded and cured stencils 28, 28' (e.g., in the nanodepressions 24, 24' and in the interstitial regions 28, 26' and surfaces 40, 40' adjacent to these). Other selective deposition techniques (e.g., involving a mask, controlled printing techniques, etc.) can be used to specifically deposit the polymeric hydrogel 44, 44' in the nanodepressions 24, 24' and not in the interstitial regions 26, 26' and surfaces 40, 40'. In some examples, the shaped and cured resin surfaces (including nanodepressions 24, 24') can be activated, and then the mixture (including the polymeric hydrogel 44, 44') can be applied to them. In one example, a silane derivative (e.g., narburnene silane) can be deposited onto the shaped and cured resin surface using vapor deposition, spin coating, or other deposition methods. In another example, the shaped and cured resin surface can be exposed to plasma incineration to generate surface activating agents (e.g., -OH groups) that can adhere to the polymeric hydrogel 44, 44'. Depending on the chemistry of the climate-controlled environment 44, 44', the applied mixture may be exposed to a curing process. In one example, curing may take place at a temperature ranging from ambient temperature (e.g., approximately 25°C) to approximately 95°C for a time ranging from approximately 1 millisecond to approximately several days. Afterwards, polishing can be carried out to remove the polymeric hydrogel 44, 44' from the interstitial regions 26, 26' on the perimeter of the nanodepressions 24, 24' microdepressions, leaving the polymeric hydrogel 44, 44' on the surface of the nanodepressions 2:4, 24* at least substantially intact. The sequencing surfaces 32, 3.4 also include the amplification closers 46, 46' attached to the polymeric hydrogel 44, 44*. A grafting process can be performed to graft the amplification primers 46, 46' into the polymeric hydrogel 44, 44' into the nanodepressions 24, 24*. In one example, the amplification primers 46, 46' can be immobilized in the polymeric hydrogel 44, 44' by single-point coaxing to or near the 5' end of the primers 46, 46*. This coupling leaves (i) a specific adapter portion of the primers 46, 46' free to hybridize with its corresponding nucleic acid fragment ready for sequencing and (ii) the 3' hydroxyl group free for primer extension. Any suitable nanocoax can be used for this purpose. Examples of terminated primers that can be used include 10 alkyne-terminated primers (e.g., which can be bonded to an acid surface entity of the polymeric hydragel 44, 44'), or acid-terminated primers (e.g., which can be attached to a surface entity in the polymer hydrogel 44, 44'). Specific examples of suitable primers 46, 46 include the ES and F7 primers used on the surface of commercially available flow cells for sequencing on HiSeq™, HiSeqX™, MSeq™, MINISeq™, NextSeq™, NovaSeq™, GAMME Analyzer, ISEC™, and other instrument platforms. Both P5 and P7 primers can be grafted onto each of the polymeric hydrogels 44, 44'. In one example, grafting may involve flow through the reservoir (e.g., using a temporarily attached cap), dip coating, spray coating, puddle dispensing, or by another suitable method that will bond the primer(s) 46, 46' to the polymeric hydrogel 44, 44'. Each of these illustrative techniques may use a primer solution or mixture, which may include the primer(s) 46, 46', water, a regulator, and a catalyst. With any of the grafting methods, the primer(s) 46, 46' react with reactive groups of the polymeric hydrogel 44, 44' in the nanodepressions 24, 24' and have an affinity for the surrounding molded and cured resin. 28, 28'. As such, the primers 46, 46' are selectively grafted into the polymeric hydrogel 44, 44'. As shown in Figure 4B, the substrates 18, 18' are fixed together through the molded and cured resins 28, 28' in such a way that the sequencing surfaces 32, 34 face each other with the flow channel 38 defined between them. Molded and cured resins 28, 28* can bond to each other in some or all of the interstitial regions: 26, 26' (such as the perimeter surfaces 40, 40'1. The bond that is formed can be a chemical bond, or a mechanical bond (e.g. using a fastener, etc.} <. Any suitable technique, such as laser bonding, diffusion bonding, anodic bonding, electron bonding, plasma activation bonding, glass frit bonding, or other methods known in the art, may be used to join surfaces 40, 40' together. In one example, a separating layer (e.g., material 42) may be used to join surfaces 40, 40*. The separating layer may be any material 42 that will seal at least some portion of surfaces 40, 40' together. In some examples, the separating layer may be a radiation-absorbing material that aids in joining. In the example shown in Figure 4C, the flow cell 30B includes a stack of planar waveguide 48 located between the substrate 18 and the molded and cured resin 28. In other examples, the stack of planar waveguide 48 may be similar to the example shown in Figure 4B and, therefore, may include two opposing stacks of planar waveguide 48, which are associated with a respective sequencing surface 32, 34. The stack or stacks of planar waveguide 48 may include a grid layer 5G located on the substrate 18 and a planar waveguide layer 52 located on the grid layer tO. Any example of the grid layer 50 and the planar waveguide layer 52 described herein may be used. In one example, an indicator of refraction of the polymer network at inter.rpm^ of the molded and cured resin 28 is in the range of approximately 1.34 to approximately 1.50; and a refractive index of the waveguide layer of each plane 52 is in the range of approximately 1.6 to approximately 2.5. These refractive indices are well controlled to ii) obtain the propagation of light through the plane waveguide layer 52 by total internal reflection at its boundary with the grating layer 50; ii) adjust the penetration depth of an evanescent wave in the molded resin 28 (and, specifically, reach the bottom of the nanndepr®^^ 24); and iii) effectively guide the light in the plane waveguide layer 52 after it strikes the grating layer 50. It is also desirable to prevent the molded and cured resin 28 from being an output coupling agent. This can be achieved by matching a refractive index of an image-forming regulator (e.g., introduced in nanodepressions 24, 24') with the refractive index of the molded and cured resin 28. The sequendadon surface 32 (which includes the polymeric hydrogel 44 and the amplification primers 46) is formed in the nanodepressions 24 of the molded and cured resin 28. In this example, the lid 36 is attached to the perimeter surfaces 40 of the molded and cured resin 2.8 as shown in Figure 4B. sequencing method The examples in flow cell 30, 30I, 30B can be used in an assembly sequencing technique, such as sequencing by synthesis (SBS). In assembly sequencing, a template polynucleotide chain (not shown) to be sequenced can be formed in flow cell 30, 30I, 3QB by adding amplification primers 46, W. At the beginning of the formation of the template polynucleotide chain, the templates can be prepared from any nucleic acid sample. e.g., a DNA sample or an RNA sample) .. The nucleic acid sample: can be fragmented: into single-stranded DNA fragments of similar size (e.g., <1000 bp). During preparation, adapters can be added to the ends of these fragments. Through reduced cycle amplification, motifs can be introduced. and sequencing regions that are complementary to the 43, 46' primers in the 24, 24' depressions. The final G library templates include the DNA fragment or AHE and adapters at both ends. In some examples, fragments from a single nucleic acid sample have the same adapters added to it. 101 A plurality of gene library templates can be introduced into the flow cell 30, 30A* 303. Multiple gene library templates are hybridized, for example, with one of two types of primers 46, 46* immobilized on the nanodopresipees 24, 24G Next, cluster generation can be performed. In one example of cluster generation, gene templates are copied from two primers hybridized by 3' extension using a high-fidelity DNA polymerase. The original gene templates are denatured, leaving the copies immobilized in the 2', 2' nanodepressions. Isothermal bridging amplification or some other form of amplification can be used to amplify the immobilized copies. For example, the copied templates are wound up to hybridize with an adjacent complementary primer, and a polymerase copies the copied templates to form double-stranded bridges, which are then denatured to form two single-stranded chains. These two chains coil and hybridize with the adjacent complementary primers 4 6, 46' and extend, again to form two new double-stranded loops 2®.The process is repeated on each template copy in cycles of isothermal denaturing and amplification to create dense clonal clusters. Each double-strand bridge cluster is denatured. In one example, the reverse strand is removed by specific base cleavage, leaving forward strands of template polynucleotides. Clustering results in the formation of multiple template polynucleotide strands at each nanodepression. This example of clustering is bridge amplification and is an example of the amplification that can be performed. It should be understood that other amplification techniques can be used, such as the Exclusion Amplification (Examp) workflow (Ilumina Inc.). A sequencing primer can be introduced that hybridizes to a complementary sequence in the template polynucleotide chain. This sequencing primer produces the template polynucleotide chain ready for sequencing. To initiate sequencing, an incorporation mixture can be added to flow cell 30, 30A, 30B. In one example, the incorporation mixture includes a liquid carrier, a polymerase, and 3' OH-blocked nucleotides. When the incorporation mixture is introduced into flow cell 30, 30A, 30B, the fluid enters flow channel 38 and nanodepressions 23, 24' (where template palinucleotide chains are present). Nucleotides blocked with OH at the 3' end are added to the sequencing primer (thus extending the sequencing range) in a template-dependent manner, such 163 It is shown that the detection of the order and type of nucleotides added to the sequencing primer can be used to determine the template sequence. More particularly, one of the nucleotides is incorporated, by means of a respective polymerase, into an incipient chain that extends the sequencing primer and is complementary to the template polynucleotide chain. In other words, in at least some of the template polynucleotide chains throughout the flow cell 30, 3AA, 308, the respective polymerases extend the sequencing primer hybridized by one of the nucleotides in the incorporation mixture. In this illustrative method, after the incorporation of the nucleotide base into the nascent chain, the incorporation mixture, which includes any blocked nucleotides, with OH in the incorporated 3' nq, can be removed from the flow cell 30, 30L, 30B. This can be achieved using a washing solution (e.g., regulator). The blocked nucleotides with DH at 3' include a reversible termination property (e.g., the blocking group with OH at 3') that terminates further extension of the primer once a nucleotide is added to the sequencing primer. Without further incorporation, the most recently incorporated nucleotides can be detected through an imaging event. During an imaging event, an illumination system (not shown) can provide excitation light to the flow channel at 3' and 2'. If the 3CE flow cell is used, waveguide-based illumination can be employed. A cleavage mixture can then be introduced into flow cell 30, 30A, 30B. In the examples described herein, the cleavage mixture is capable of i) removing the 3' OH blocking group from the incorporated nucleotides, and ii) cleaving any detestable tags from the incorporated nucleotides. The removal of the 3' OH blocking group allows for a subsequent sequencing cycle. Examples of OB-blocking groups at the 3' position and suitable unblocking agents / components in the cleavage mixture may include: ester entities that can be removed by basic hydrolysis; ayl entities that can be removed with NaI, chlorotrimethylsilane and NaClScCl, or with Hg(II) in acetone water; aeidomethyl that can be cleaved with phthalenes such as tri(2-carboxyethyl)phosphine (TCEP) or tri(hydroxypropyl)phosphine (THP); acetals such as tert-butoxyethoxy, which can be cleaved under acidic conditions; MOM (-CH2OCHa) entities that can be cleaved with LIBFa and CH2CN / RaO; 2,4-dinitrabenzenesulfenyl that can be cleaved with nucleophiles such as IOS such as thiaphenol and thiosulfate* tstrahydrofuranyl ether that can be cleaved with AgH) P Hg(IX); and phosphate at 3* that can be cleaved by phosphatase enzymes (e.g., palinucleotide kinase). Washing may take place between the various fluid delivery stages. Afterwards, the SBS cycle can be repeated n times to extend the sequencing primer by n nucleotides, and thus detect a sequence of length n. In some examples, paired-end sequencing may be used, where the forward strands are sequenced and removed, and then the reverse strands are constructed and sequenced. Although the SBS has been described in detail, it should be understood that the flow cells 30, 30A, and 30B described herein can be used with other sequencing protocols for genotyping and other chemical and / or biological applications. In some cases, the flow cell primers can be selected to allow simultaneous sequencing of paired ends, where both the forward and reverse strands are present in the polymeric Mdrogel 44, 4 4*7, thus enabling simultaneous base designation for each read. Simultaneous and sequential paired-end sequencing facilitates the detection of genomic rearrangements and repetitive sequence elements, as well as gene fusions and novel transcripts. In another example, the cells of LO 6 flow 30, 30Á, 30B described in the present description can be used for 0- gene generation in a flow cell. To further illustrate this description, examples are provided. It is understood that these examples are provided for illustrative purposes and should not be interpreted as limiting the scope of this description. Practical, non-limiting examples Id Example 1 Two control resins (6 and 7) were prepared. Five different resin mixtures (1-5) were prepared by combining control resins 6 and 7 in the appropriate ratio. In control resin 7, and therefore in each of the resin mixtures 1-5, the epoxy-based monomeric system included a 1:3 ratio of: 107 (in weight), and In control resin 6, and therefore in each of these resin mixtures, the acryloyl-based monomeric system included: The mcncero content of the mixtures and controls is shown in Table 1. ID of the polymerizable resin ionically: Mixture 1:3 of epoxy monomers (% by weight of total monomers) Polymer monomer with free radicals: Oxylene monomer (% by weight of total monomers) Mixture .1 to lie r: e sin as 1 10 90 Resin mixture 2 25 75 Resin mixture 3 50 5.2 Resin mixture 4 15 25 Resin mixture 5 02 10 Control resin S included 4 wt% 2,2-dimethooxy-2-phenylacetophenone (with respect to the monomer) as a free radical photoinitiator, and control resin 7 included 4 wt% bis(4-methylphenyl)iodo hexafluorophosphate (with respect to the monomer) as a cationic photoinitiator and 4 wt% isopropyl-SH-thioxanthen-one (with respect to the monomer) as a sensitizer. The control resins were diluted in propylene glycol monomethyl ether to a solid concentration of 8 L / mol. The control resins were then blended in appropriate ratios to obtain each of the resin mixtures. Each mixture and control resin was centrifugally coated onto a silicon wafer. The refractive index and thickness of Each 1 mixture and control resin were measured before curing. Each mesela and control resin was cured using exposure W. The fefraotion index and thickness of each cured resin were measured after curing. The results for the refractive index are shown in Figure 5A and the results for the thickness are shown in Figure 5B. The results in Figure 5A indicate that varying the monomeric ratio in the molecules produces a reduction in the refractive index of the resin layer between 1.51 (100% epoxy - control resin 7) and 1.45 (100% acrylic - control resin 6). The results in the Figure SB indicates that decreasing the ratio of epoxy monomer in the mixtures produced thinner resin layers. Example 2 Several mixtures of different resins were prepared in a manner similar to Example 1. The menomer content of the mixtures is shown in Table 2.a. The following acronyms are used in Table 2i 2,4,5,S~tetrame^ 6, 8-tetrakis (propyl glíddil ether)ciGlotetrasilcxane; G~D4 Tetrakis ícpoxycicluhex.Ll ethylphtetramethyl cyclotetrasiloxane: EC-DI Poly {dimethylsiloxanoj.f terminated in diglyoidyl ether: G-^DMS Polypropylene) diglycidyl ether: FPGGE 2, 2,3,3, 4,4,5, ó-octafluori·-!, 6-hexancdioI diacrylate: BFA Tetraaurylate: from PETA Mamlato of i, the dialysis of glycerol; GDA XD of the resin Cationicly polymerizable monomer; Epoxy (% by weight of total monomers) Free radical polymerizable monomer: Acrylol (% by weight of total monomers) G~D4 &C-D4 G~ PDMS PPGGE SFA PSTA | GDA RH 3* — 50 | 50 ------ $ — _ RM 9 — — — *«*·» · ” 25 75 w :10 --— 10 — _—. 90 — $ RM 11 — — — 25 7 5 ---- $ RR 12 — 50 — —~ 50 — RM 13 — — — '^5 — — - 25 RM 14 ί 12.5 12.5 · -Λ. 75 ! — — — J RM 15 | ****.·*-· —' ** **. — — — ) 25 RM 20 — ““ 50 50 S l 3 i^s ' -'XM j K> . \ >'A 25 50 ™ ——r 50 1 — RM 2'3 - — — - 75 — -- 35 | — RM 24 ·** — —. M_W> —--- 25 —.................!— 7 5 RM 25 —— 50 ---- bu RM 2 δ ----- 75 i 2 C' RM 27 —·· — ** ---- 25 ·* ** 75 í « RM GR — — 50 50 i 33 --— ----. · 25) ·* agent of- attended Each resin mixture was filtered and centrifugally coated onto a silicon wafer. The impression was tested by pressing a silicon acrylate (Si-WS) working stamp or a fluorinated (F-WS) working stamp into the coated resin mixture and curing was performed. The resin mixtures and cured resins were tested to determine coating capacity (uniform substrate wetting), wettability with the working seal (effective filling of WS characteristics), effective curing, printability with the working seal (ease of WS release and visual quality of the diffraction pattern), refractive index (of the cured resin), and / or thickness (of the cured resin). Coating capacity is defined as the resin mixture forming a practically uniform film on the substrate. Printability refers to the successful transfer of the working seal's characteristics to the cured resin, without alteration, loss of feature dimension, etc. The resin, the type(s) of working seal, and the results are shown in Table 3. If two working seal types and a single result are provided, this indicates that the result was the same for both working seals. If two working seals and two results are provided, this indicates the result for the working seal. 113 respective.. For example, if the job stamp type is yes-^s $ F-W3 and the printing results are yes «. no, then the Yes-WS was successfully printed and F-WS rr ss was successfully printed. Table 3 i» da 1« resin Sealo da trabajo Con capacidad da recobrisniento HwntódKoiBsianto WS Curar Ta^rlroir RI 8532 «m Grossor (aro) KM 8 SÍ-WS 4* si Si Sí i .49611 361 tí RN 9 SirWS Sí Si No 1.49292 54213 W 10 Si-es ψ / „ Si No No 1.55536 263±2 O 3,1 sí-ws +7- Si Sí Na 1.54751 55413 KM 12 Sí-WS Sí Si NO 1.48276 49512 í® 13 Si-WS a / -· Si No NO 1.51161 228±4 WM Sí-WS + / — Si Si Na 1. / 6ÍW 127 + 2 KM 15 SÍ-WS a / - Si Si No 1.48718 33312 3® 16 SÍ-WS Si Si No 1.42141 452+2 RN 17 Si-WS 4 F-WS ·> Si Si Na i. 51Q31 553 ti KM 18 S1-WS & F-WS Ψ Sí Si No 1.51253 55711 sm ii Si-WS 1 FW:S r si Sí NO 1.31734 582+1 :w- FQ sl-ws & F-WS Sí sí. NO 1.47746 507 ±2 RM 21 sí-ws to F-WS Sí. yes na 1.46611 496+2 BM 22 Si-WS & F-WS + Sí Si No 1.52955 4 Oí* 2 RM 23 Sl-wS δ F-WS si Sí No 1 ..327M 4101:2) RM 2 3 Si-WS. & F-WS + Si sí sí yw 1.50§41 650+1 M 25 Sl-WS S F-WS + Yes Sx yes and no l.sOss 520i:l Rh 26 Sv-WS & F-WS Yes Yes yes and no 1.48861 424 A SU 27 Si~ÚS & F-WS * Yes Yes No 1.5Ü834 511x1 M 28 Si-WS & F-US + Yes Yes W 1.5(056 47111 RM 29 Si-WS & F-wS Yes Yes No 1.5031S 45311 With resin mixtures 8 and 9 (different PPGGE and BFA ratios), uniform films were coated (f+) and UV curing was effective. For resin mixture B, the working seal was effective and printability was achieved. For resin mixture 9, a leveling agent can be added to achieve printability. with resin mixtures of 10 to 13 (different ratios of 15 EC-D4 and BEA), moderately uniform films were coated (m / -). Curing was not always effective, for example, when the acrylic monomer content was too high (90 1) or the epoxy monomer content was too high (75 M). For this combination, the EC-D4:BFA ratio should be approximately 2.0 50:50 to approximately: 25:75« Adetóás, with the resin mixtures 1:0. to 13, a wet foundation of effective working seal was achieved, but© no pattern could be successfully transferred from the seal to the resin because the release of the working seal was not desirable. EC“D4 is a very viscous compound, and therefore it may be desirable to reduce this amount (as shown in resin mixtures 11 and 12). In addition, a leveling agent may be added to improve the release of the working seal. With resin mesols 14 to 16 (different ratios of EC-O4 / GL)4 and BFA), moderately uniform films were coated (f / “j). Curing was effective for all these examples. In addition, with resin mesols 14 to 16, effective wetting of the working seal was achieved, but no pattern could be successfully transferred from the seal to the resin because the release of the working seal was undesirable. The film thickness increased as the G-Cd content increased. Furthermore, a leveling agent can be added to improve the release of the working seal. With the resin blends 17 to 19 (different G-D4 and GDA ratios), uniform films were coated (Ή , Curing was effective for all these examples. Furthermore, with the resin blends 17 to 19, effective wetting of the working seal was achieved, but no pattern could be successfully transferred from the seal to the resin because the release of the working seal was undesirable. A leveling agent can be added to improve the release of the working seal. 116 With resin mix 20 (G-PDhS and GDA), a moderately uniform film was applied (H / ~) and curing was effective. Furthermore, with resin mix 20, effective wetting of the working seal was achieved, but no pattern could be successfully transferred from the seal to the resin. The PDMS material is soft, and perhaps increasing the amount of COA could improve printability. Additionally, a leveling agent can be added to improve the release of the working seal. With resin blends 21 to 23 (different ratios of GPDMS and PETA), uniform films were coated. Curing was effective. Furthermore, with resin blends 21 to 23, effective wetting of the working seal was achieved, but no pattern could be successfully transferred from the seal to the resin. The PDMS 15 material is soft, and perhaps increasing the PETA content could improve printability. Additionally, a leveling agent can be added to improve the release of the working seal. With resin blends 24 to 26 (different ratios PPGGE and GDA), uniform films were coated. Curing with CV was effective. For resin blends 24 to 26, the working seal foundation was effective and impeccability was obtained when using Si-WS. However, impression transfer could not be achieved with F-WS. In these examples, an impact on viscosity can also be observed because as the amount of epoxy (GGE) increased, the thickness of the cured resin also increased. The impact of the acrylic monomer (GDA, RI ~ 1.446 and PPGGE, RI ~ 1.457) on the refractive index can also be observed in these resin blends. With resin blends 27 to 29 (different PPGGE and PETA ratios), uniform films were coated. UV curing was effective. For the metals, with resins 27 to 29, working seal wetting was effective, but printability was not achieved because working seal release was undesirable. For these illustrative blends, a leveling agent can be added to improve working seal release. In these examples, an impact on viscosity can also be observed because as the amount of acryloyl (PETA) increases, the thickness of the cured resin also increases. The results of this example illustrate how different monomers and different quantities of monomers in a resin mixture can be altered to adjust one or more properties of the resin mixture and / or the resulting interconnected network. Furthermore, the results for resin mixtures 24 to 26 indicate how the monomers and their ratios can be selected. 118 in weight of the monomers to generate a mixture of resins that can be printed using a particular work stamp. Additional notes It should be noted that all combinations of the foregoing concepts and additional concepts described in greater detail below (provided such concepts are not mutually inconsistent) are considered part of the subject matter of the invention described herein. In particular, all combinations of the claimed subject matter appearing at the end of this description are considered part of the subject matter of the invention described herein. It should also be noted that the terminology used explicitly in this description, which may also appear in any incorporated description, by reference, should have a meaning consistent with the particular concepts described herein. References throughout this specification to an example, another example, etc., mean that a particular element (e.g., feature, structure, and / or characteristic described in connection with the example) is included in at least one example described herein and may or may not be present in other examples. Furthermore, 119 It is understood that the elements described for: -any example can be combined in any way, appropriate in the: various examples unless the context clearly dictates otherwise. Furthermore, it should be understood that the ranges provided in this description include the stated range and any values ​​or subranges within the stated range, even if such values ​​or subranges are explicitly mentioned. For example, a range from approximately 225 nm to approximately 600 nm should be interpreted to include not only the explicitly listed limits of approximately 225 nm to approximately 600 nm, but also individual values, such as approximately 358 nm, approximately 375.5 nm, etc., and subranges, such as approximately 3.55 nm to approximately 395 nm, give about 35Q nm to about- 57S nm, etc. Furthermore, when using feproximádaménfe^ and / or feustanúlalménta to describe a value, it is intended that they encompass minor variations {up to + / - 10% of the established value. Although valid examples have been described in detail, it is understood that the examples described may be modified. Therefore, the above description will be considered non-limiting. When used in this specification and claims, the terms "includes" and "comprising" and variations thereof mean that the specified features, stages, or components are included. The terms should not be construed as excluding the presence of other features, stages, or components. The invention may also broadly consist of the parts, elements, steps, examples, and / or features mentioned or indicated in the individual specification, or collectively, in any and all combinations of two or more of said parts, elements, steps, examples, and / or features. In particular, one or more features in any of the embodiments described herein may be combined with one or more features of any other embodiment described herein. Protection may be sought for any feature described in one or more documents referenced in this description in combination with 2Q I presented the description. Although certain illustrative embodiments of the invention have been described, the scope of the appended claims is not intended to be limited solely to these embodiments. The claims 121 should be interpreted literally, intentionally, and / or to encompass equivalents. Representative characteristics are established in the following clauses, which are independent or may be combined, in any combination, with other characteristics described in the text and / or figures of the specification. 10. 1.. a flow cell, comprising: a substrate; and a resin molded and cured onto the substrate, the molded and cured resin includes nanodepressions separated by interstitial regions, each of the nanodepressions having a larger aperture dimension in the range of approximately 10 nm to approximately 3000 ns, and the molded and cured resin includes an interpenetrating polymer network that includes an epoxy-based polymer and a methacrylene-based polymer. 2. The flow cell as defined in clause 1, which further comprises: a grid layer located on the substrate; and a cloned planar waveguide layer on the grid layer. The flow cell as defined in any of the preceding clauses, where: The refractive index of the interpenetrating peiceric network© is in the range of approximately 1.35 to approximately 1.52; and the refractive index of the plane waveguide layer is in the range of approximately 1.6 to approximately 2.5. 4. The flow cell as defined in any of the preceding clauses, further comprising: a hydrogel positioned in each of the nanodepressions; and amplifying fixation primers attached to the polymeric hydrogel. 5. The flow cell as defined in any of the preceding clauses, wherein the thickness of the molded and cured resin is in the range of approximately 225 nm at 2C, approximately 000 nm- β. The nomo flow cell: is defined in any clause above, where the weight ratio between the epoxy-based polymer and the (met)acrylDil©-based polymer is in the range of 25:75 to approximately 75:25. 7. A method comprising: applying a resin mixture onto a substrate, the resin mixture independently includes two crosslinkable monomers present in the resin mixture in a predetermined weight ratio, a first of the two independently crosslinkable monomers being an ionically polymerizable monomer and a second of the two independently crosslinkable monomers being a free-radical polymerizable monomer; print the resin mixture with a working stamp having a plurality of nanocatalysts; and cure the resin mixture while the working stamp is in place, to smoke an interpenetrating polymer network printed with flow cell nanodepressions. 8. The method as defined in clause 7, wherein: the polymerizable monomer is a multifunctional epoxy monomer and wherein the free-radical polymerizable monomer is a multifunctional (meta)oxymethyl epoxy monomer. The method as defined in any of clauses 7 to 8, wherein the multifunctional epoxy monomer is selected from the group consisting of: 124 O 4 - 8-tMba&Mi 1.--2,-4., 6, S-tetrakis (propyl glycide 1 ether) and oleteó.::asi lax;-o: Te t ra ki a {epox io ic 1 chex 11 Mil) t et raateti 1 ci c1atetra silaxane: iii) Poly terminated in diglycidyl ether vrig θ en conde 4 < π < 8; iv) polypropylene glycol) diglycidyl ether: where 5 < n < 10; v) 3, teteoxycite epoxy ic ic 1 oh éxán c?ca rb α xx la tp ; vi} si diglidi bromado: 4.5 < (x 4 y) < 7 W: Poly(bisphenol Α~οα-βρ1ο1οΛ with extreme Hs© ©Hg Bisféndl A dil. 127 ix) Tris with monophenyl functionality (poidimethylslto^ with epoxx termination): I Trimethylolprapaño triol ieidO ether: 2,2* ~ (2,2,3,3, 4,4,5,5-Octafluorahexane-1,6~ diillMs (oxitanc) : xii) 1,3-S is(3 ~g 1i o idoxiprap i11t etramethi1ó isi1oxane: xiii) 1.3 Bis [233.4 epoxycyclicQh®x-*l~ily ethyl] tetram© t iIdi s i1axane: xivl GLiaidíi .palíadtaédrioa. xilwsquioxaúa^ 129 1 Ρ \ fe k / JV o I- °S o. ι> , „.( 0^ χν) EpGxiciclohexilG paliact ..0 W Μ ”\ ^fes.J f fef Χ<χ><χ ..Sí / *ea*»*» \ °X ϊ ovb 0 i. O 7 i n-Ki.. ¿fe V* '\>οΛ d ^5¡sí^ 5 f ^©Γ 'Ί (í Cf s 6 No xvi 1} 4,4'-methylejiobis (N,N-diglycidylanilineJ: xviii) any combination of i) & xvii). 10. The method as defined in clauses 7 to 5, wherein the multi-functional (met} acryloílo) parameter is selected from the group consisting of: ·..: 2, 2,3, 3f4, 4, 5, n-octa il üoro-i, 6-hexanodioi diacrylate: Poly(ethyleneglyoQl) dimetharylate: viii) Ethylene glycol dimethacrylate olleérol / phenol): 134 xiii) Pplídimti.lsilo^ ending in methacríloxípropyl: where n is selected to produce the monomer with a molecular weight of approximately 420 g / mol, 951 g / mol > 4009 g / iwl, 10,000 g / mol or 25, 000 g / mol; xis) Zircon carboxylate triacrylate w bromoñórbórnanelaetone: 13a where ni is in the range of 0 to 4, n is in the range of 0 to 4, and m * n ~ 4; xvj Zirconium aerylate.: xvíj Hafnl carboxyethyl acrylate xVü) Silsesquxoxane or the polyoctahedral: 136 xviii) Silsesquioxane metacri1 pd / octahedral: xlx) 2,4,6,8”tetxamethyl~2,4,6,S-tetrakis(3~ aerilaí loxipx©^ Gíclotetrasilexane: XXΪ any combination gives i) to xix). 11. The method as defined in clauses 7 to 10, where: the sonomer of multifunctional epoxy is Poly(prcpilenglte digllcidil éteí: the moncmepo of multifunctional (met)acryloilc is 2,2,3,3,4,4,5,5-octaflucro-1,δ-hexauodiol diacrylate: 138 The default weight ratio is approximately 5 0:5 0. 12. The method as defined in any of clauses 7 to 11fen where; the multifunctional epoxy monomer is P o 1 i. í prop i 1 sng 1 ic ~ I) dig 1 icid i. 1 ether: the .monomer of (mstjacryl.il or multifunctional! is diacylated glycerol 1,3-diglycerol^ The default ratio in pepo is in the range of approximately 25:75 to approximately 75:25, 13. A method, which I understand: mixing a cationicly polymerizable monomer and a free-radical polymerizable monomer to form a resin mixture, wherein the resin mixture is a precursor to an interpenetrating polymer network that 5. It will be incorporated into a flow cell; Adjusting a weight ratio of the cationicly polymerizable monomer and the free-radical polymerizable monomer using a property to be imparted to the resin mixture or the interpenetrating polymer network, the property being selected from the group comprising refractive index of the interpenetrating polymer network, absorption of the interpenetrating polymer network, hardness of the interpenetrating polymer network, thickness of the interpenetrating polymer network, hydrophilic / hydrophobic balance of the interpenetrating polymer network, viscosity of the resin mixture, surface chemical compatibility of the resin mixture with a working seal, surface chemical compatibility of the interpenetrating polymer network, shrinkage of the interpenetrating polymer network and combinations thereof; and shaping the resin mixture to form the interpenetrating polymer network. 1-1. The method as defined in clause 13, where the cationicly polymerizable monomer is an epoxy monomer and where the free-radical polymerizable monomer is a (meth)acryloyl monomer. 15. The method as defined in any one of clauses 13 to 14, where: The desired property is the chemical compatibility of the surface of the resin mixture with the working seal; the method further comprises selecting a working seal material; and the weight ratio of the cationicly polymerizable monomer and the free-radically polymerizable monomer is adjusted to be within a range of approximately 25:75 to approximately 75:25. 16. The method as defined in any one of clauses 13 to 15, wherein the modeling involves nanoimprint lithography.

Claims

REI VINDXCAC XÓ® 1. Linea flow cell, comprising: a substrate; and a resin molded and cured onto the substrate, the molded and cured resin including nanopressures separated by interstitial regions, each of the nanopressures having a larger aperture dimension in the range of approximately 10 nm to approximately 100 nm, and the molded and cured resin including an interpenetrating polymer network, including an epoxy-based polymer and a (meth)acrylic-based polymer.

2. The flow cell as defined in claim 1, further comprising: i. A grid layer located on the substrate; and ii. A plane waveguide layer positioned on the grid layer.

3. The rubber flow cell is defined in claim 2, characterized in that: a refractive index of the interpenetrating polymer network is in the range of approximately 1.35 to approximately 1.52; and a refractive index of the plane waveguide layer is in the range of approximately 1.6 to approximately 2.

5.

4. The flow cell as defined in claim 1, further comprising: a hydragel positioned in each of the nanopressures; and amplification primers attached to the hydragel.

5. The flow cell as defined in claim 1, characterized in that the thickness of the molded and cured resin is in the range of approximately 225 nm to approximately 6Θ& nm.

6. The flow cell as defined in claim 1, characterized in that the weight ratio between the epoxy-based polymer and the (meth) acryldyl-based polymer is in the range of 25:75 to approximately 75:

25.

7. A method comprising: applying a resin mixture onto a substrate, the resin mixture independently including two crosslinkable monomers present in the resin mixture in a predetermined weight ratio, the first of the two independently crosslinkable monomers being a cationicly crosslinkable monomer and the second of the two independently crosslinkable monomers being a free-radical polymer monomer; imprinting the resin mixture with a working seal bearing a plurality of nanometric characteristics; and curing the resin mixture while the working seal is in place, to form an interpenetrating polymer network imprinted with flow cell nanodepressions. 5 8. The method as defined in claim 7, characterized in that the cationicly polymerizable monomer is a multifunctional epoxy monomer and wherein the free-radical polymerizable monomer is a multifunctional (meth)acrylyl monomer, 10 9. The method as defined in La feIv.ndicacidn 8, characterized in that a number of multifunctional epoxy is selected from the group consisting of; i) 3,4,6,e-tetramethyl-2,4,6,8-tetrakls(pr^ glycidyl ether}cyclotetraailoxanc: 144 ii) Tetrakls(epoKicolQhexyl cyclotetrasiloxane: eth1}tetramethyl i) Poly dimethylsil^, terminated© in diglycidyl ether; wherein 4 < n < 8 Pe 11 (prbpiléhg 1-íml) diglycidyl ether: wherein 5 < n < 10; 3,4~epoxyIclohexylmethyl 3,4-epoxy eielótu>x¿wxxarbox:Í late: Msphenol A diglycidyl ether, bwmaM: vil) Foli (bisphenol A-óQ-opielorhydrí^^^ con extreme f inal de glicidilo: 146 Tris con funcionalidad. mondfenilo (polidimetilsi^ con terminación epoxi): Tribetilólpropan^ tríglicidil éter: ' - {2,2, 3, 3, 4,4, 5, , 6~ di11)bis (oxírano).: epoxí c ic1oh e x-1-i1)eti1]tetre xi v) G1í oi di 1 po1 i octaéd ri co s i1sasgaí©xano; xv) Epoxíciclohaxíío polioetaédrico silsasguíoxano:

10.

10. El método como se define en la reivindicacióri 8, caracterizado porque el monómero de (met )acr: loilo muitifuncional se selecciona del grupo que consiste en: i) díacrilato de 2,2,3,3,4,4,5,5-octafluoro-1,6~hex¿modiol Tétraaorilato de peo caerytritol: Diacrylato de 1,3-dlgI.icerQlato de glíeerol·: x) Dlacrilato de triol©ladecano dlMethanol.; Dládrilat© de glioewlat© dé bisfenol A fl g 1 leer di / . f ehM) <: xii) Dímetacrilato de bís.fenol A: xíií) Polidimetilai.loxane terminated in me tacnfeloxypropilo: wherein n is selected to produce the monomer with a molecular weight of approximately 420 g / mol, 950 g / mol, 4000 g / mol, 10,000 g / mol or 23,000 g / mol; xiv) Zirconium carboxylate triaorylate monorbor nan to the ctone: wherein m is in the range of 0 to 4, n is in the range of 0 to 4, and m ≤ n ≤ 4; Zirconium aorylate: xvi) Hafalo oarboxyethyl acrylate: quidxano lo pólicetañer i cor > ciel ote after i lo xana: 157 χχ) cu 1 quier eonh 1 nacxen from i) to xix}.

11. The method as defined in claim 8, characterized in that: the epoxy monomer is a diglyceride ether; the (meth)acrylate multifunctional monomer is a 3,3-diglyceride-1,β-hexahydrochloride monomer; and the (meth)acryloyl monomer is a predetermined weight ratio.

12. The method as defined in claim 8, characterized in that: the multifunctional epoxy monomer is a diglyceride ether; the (meth)acryloyl monomer is a 1,3-diglyceride monomer; and the final character is approximately 50:

50. (propylene glycol) 0 1 f tifuncin©nal is diacrylate of 0 un wng t V the predetermined weight ratio is in the range of approximately 25:75 to approximately 75:25.13x A method, comprising: 5' mixing a cationicly polymerizable monomer and a free-radical polymerizable monomer to form a resin mixture, characterized in that the resin mixture is a precursor for an interpenetrating polymer network to be incorporated into a flow cell; 10 adjusting a ratio in stock of the cationicly polymerizable monomer and the free-radical polymerizable monomer using at least a property to be imparted to the resin mixture or to the interpenetrating polymer network, the property being selected from the group consisting of refractive index of the interpenetrating polymer network, absorption of the interpenetrating polymer network, hardness of the interpenetrating polymer network, thickness of the interpenetrating polymer network, hydrophilic / hydrophobic balance of the interpenetrating polymer network, viscosity of the mixture.of resins, 20 chemical compatibility of the surface of the resin mixture with a seal: of work, chemical compatibility of the surface of the interpenetrating polymer network, shrinkage of the interpenetrating polymer network and combinations of these; and 160 modeling the resin mixture to form the interpenetrating polymer network.

14. The method as defined in claim 13, characterized in that the cationicly polymerizable monomer is a suloxane monomer and wherein the free-radical polymerizable monomer is a (methacrylic) monomer.

15. The method as defined in claim 13, characterized in that: the desired property is the chemical compatibility of the surface of the resin mixture with the working seal; the method further comprises selecting a working seal material; and the weight ratio of the cationicly polymerizable monomer and the free-radical polymerizable monomer is adjusted to be within a range of approximately 25:

75.

16. The method as defined in claim 13, characterized in that the patterning involves lithography of Nanoprinting. An example of.A flow cell includes a substrate and a resin molded and cured onto the substrate. The molded and cured resin has five nanodepressions separated by interstitial regions. Each nanodepression has a maximum aperture dimension ranging from approximately 10 nm to approximately 1000 rLm. The molded and cured resin also includes an interpenetrating polymer network. The interpenetrating polymer network of the molded and cured resin includes an epoxy-based polymer and a (meta)acrylic-based polymer.