Method of mapping one or more features on or below a substrate surface using a scanning probe microscopy device.
NL2039059B1Active Publication Date: 2026-06-16NEARFIELD INSTR BV
Patent Information
- Authority / Receiving Office
- NL · NL
- Patent Type
- Patents
- Current Assignee / Owner
- NEARFIELD INSTR BV
- Filing Date
- 2024-11-12
- Publication Date
- 2026-06-16
Abstract
Title: Method of mapping one or more features on or below a substrate surface using a scanning probe microscopy device. Abstract The present document relates to a method of mapping one or more features on or below a substrate surface of a substrate using a scanning probe microscopy device. The scanning probe microscopy device comprises a scan head comprising a cantilever and a probe tip for being brought into contact With the substrate surface. The scan head cooperates With a substrate carrier for moving the probe tip relative to the substrate surface for obtaining measurement data, the substrate carrier being configured for supporting the substrate. The method comprises mapping the one or more features by moving the probe tip relative to the substrate surface and bringing the probe in contact With the substrate surface continuously or intermittently for taking measurements at the substrate surface. Prior to the step of mapping, the method further comprises obtaining, for each pixel of a plurality of pixels wherein the measurements are to be taken, a pixel size associated With a predetermined measurement resolution. The pixel size defines a measurement area for the probe tip for taking said measurements at each pixel at the substrate surface. The method then involves applying, for performing the step of mapping, a probe comprising a probe tip having an apex including a rounded shape, the rounded shape having a radius of curvature such as to yield, in contact With the substrate surface, a contact area of a size substantially similar to said measurement area.
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