Dosage-controlled voltage contrast inspection in charged-particle beam systems and methods thereof
By applying incremental dosages of charged particles to switch polarity and form inspection images based on gray level values, the method addresses the limitations of existing voltage contrast techniques, enhancing defect detection and classification in complex integrated circuits.
Patent Information
- Application Number
- PCT/EP2025/050165
- Authority / Receiving Office
- WO · WO
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2024-01-29
- Filing Date
- 2025-01-06
- Publication Date
- 2025-08-07
AI Technical Summary
Existing voltage contrast inspection techniques in charged-particle beam systems suffer from low defect sensitivity, particularly in detecting high-resistance defects, and are inadequate in classifying defect types, impacting defect capture rate and inspection throughput in complex integrated circuit manufacturing.
A method involving incremental dosage of charged particles to switch the polarity of a sample region, forming inspection images based on gray level values to detect and classify defects, using a charged-particle beam apparatus.
Enhances defect detection sensitivity and classification accuracy, allowing for precise identification of defect types and locations in layered or stacked structures, improving inspection efficiency and throughput.