Display panel and display device

Abstract

The present disclosure relates to the technical field of display, and provides a display panel and a display device. The display panel of the present disclosure comprises a display area, a first transition area, a second transition area and a hole area. The display panel comprises a base substrate, and a planarizing layer, a light-emitting layer and at least one isolation column that are arranged on the base substrate; the light-emitting layer extends from the display area to the second transition area, and is disconnected at each isolation column; the isolation column surrounding the hole area and closest to the display area is a first isolation column, and a first recess formed in the base substrate is defined between the first isolation column and the planarizing layer; the planarizing layer comprises a planarizing area and an inclined area, and the planarizing layer comprises a first surface facing away from the base substrate; and a dihedral angle formed between a tangent plane of any point on the first surface in the inclined area and the second surface of the base substrate close to the planarizing layer is α; and the width of the first recess meets the following formula: W=α*k, wherein W represents the width of the first recess, k represents a coefficient, and k belongs to [0.48, 0.65].

Description

Display panel and display device Technical Field

[0001] The present disclosure belongs to the field of display technology, and particularly relates to a display panel and a display device. Background Art

[0002] Organic Light-Emitting Diode (OLED) display panels often feature holes in the screen to accommodate devices such as cameras and sensors. However, these holes can easily expose the OLED film layer, necessitating the use of isolation columns to block the water and oxygen intrusion channels formed by the electro-luminescence (EL) layer to prevent defects such as growing dark spots (GDS) in the active area (AA).

[0003] However, as user requirements for AA hole boundary specifications gradually tighten, the space left for AA hole spacer packaging is shrinking. Fluctuations in the exposure and development processes of the pixel definition layer can easily leave adhesive residue within the undercut structure of the spacer, leading to EL material breakage failures, creating new pathways for water and oxygen intrusion, and ultimately causing defects such as GDS. Summary of the Invention

[0004] The present disclosure aims to solve at least one of the technical problems existing in the prior art and provide a display panel and a display device.

[0005] In a first aspect, a technical solution adopted to solve the technical problem of the present disclosure is a display panel comprising a display area, a first transition area, a second transition area, and an aperture area; the second transition area surrounds the aperture area and is located between the first transition area and the aperture area, and the first transition area surrounds the second transition area and is located between the display area and the first transition area; the display panel comprises a base substrate, a flat layer disposed on the base substrate, a light-emitting layer disposed on a side of the flat layer facing away from the base substrate, and at least one isolation column disposed on the base substrate; the flat layer extends from the display area to the first transition area; the light-emitting layer extends from the display area to the second transition area and is interrupted at the position of each isolation column; at least one isolation column is located in the second transition area;

[0006] The isolation column surrounding the opening area and closest to the display area is a first isolation column, and a first groove provided on the base substrate is defined between the first isolation column and the flat layer;

[0007] The flat layer has a flat area and an inclined area, and the flat layer includes a first surface facing away from the substrate; a cross-section at any point on the first surface of the inclined area forms a dihedral angle α with the second surface of the substrate close to the flat layer; the width of the first groove satisfies the following formula: W = α × k; where W represents the width of the first groove, k represents a coefficient, k∈[0.48,0.65].

[0008] In some embodiments, the planar layer includes a first sub-planar layer, a second sub-planar layer, and a third sub-planar layer sequentially arranged in a direction away from the substrate;

[0009] The second sub-planarizing layer at least wraps a boundary portion of the first sub-planarizing layer close to the first isolation pillar, and the third sub-planarizing layer at least wraps a boundary portion of the second sub-planarizing layer close to the first isolation pillar.

[0010] In some embodiments, a dihedral angle α formed by the cut surface and the second surface is between 30° and 40°.

[0011] In some embodiments, the planar layer includes a first sub-planar layer, a second sub-planar layer, and a third sub-planar layer sequentially arranged in a direction away from the substrate;

[0012] A portion of the surface of the second sub-flat layer facing away from the base substrate, which is located in the inclined area and not covered by the third sub-flat layer, is continuous with a portion of the surface of the third sub-flat layer located in the inclined area, and together with the surface of the third sub-flat layer located in the flat area, forms the first surface.

[0013] In some embodiments, an edge of an orthographic projection of the third sub-planar layer on the base substrate is farther away from the second transition region than an edge of an orthographic projection of the first sub-planar layer on the base substrate.

[0014] In some embodiments, a dihedral angle α formed by the cut surface and the second surface is between 22° and 30°.

[0015] In some embodiments, the planar layer includes a first sub-planar layer, a second sub-planar layer, and a third sub-planar layer sequentially arranged in a direction away from the substrate;

[0016] The second sub-planar layer covers a portion of the surface of the first sub-planar layer located in the inclined region; the third sub-planar layer covers a portion of the surface of the second sub-planar layer located in the inclined region;

[0017] A portion of the surface of the first sub-flat layer facing away from the base substrate, which is located in the inclined area and not covered by the second sub-flat layer, is continuous with a portion of the surface of the second sub-flat layer located in the inclined area; a portion of the surface of the second sub-flat layer facing away from the base substrate, which is located in the inclined area and not covered by the third sub-flat layer, is continuous with a portion of the surface of the third sub-flat layer located in the inclined area, and together with the surface of the third sub-flat layer located in the flat area, form the first surface.

[0018] In some embodiments, a dihedral angle α formed by the cut surface and the second surface is between 18° and 22°.

[0019] In some embodiments, the display panel further includes a metal trace disposed on a side of the planar layer close to the base substrate;

[0020] The orthographic projection of the metal trace on the base substrate covers the orthographic projection of the isolation column on the base substrate.

[0021] In some embodiments, the display panel further includes an interlayer insulating layer disposed between the isolation column and the metal trace, the interlayer insulating layer including a flat portion and a protruding portion disposed opposite to the metal trace;

[0022] The isolation column is disposed on a surface of the protrusion facing away from the base substrate.

[0023] In some embodiments, the isolation column includes a first conductive portion, a second conductive portion, and a third conductive portion sequentially arranged in a direction away from the base substrate; the first conductive portion and the third conductive portion both protrude from the second conductive portion.

[0024] In some embodiments, a difference between a width of the protrusion and a width of the first conductive portion is greater than 2.9 um.

[0025] In some embodiments, a ratio of a width of the first conductive portion to a width of the metal trace is between 0.4 and 0.6.

[0026] In some embodiments, the display panel includes a first insulating layer, a first gate line, a second insulating layer, a second gate line, an interlayer insulating layer, a first signal line, a first sub-planar layer, a second signal line, a second sub-planar layer, a third signal line, and a third sub-planar layer, which are sequentially arranged in a direction away from the base substrate;

[0027] The metal wiring includes a first metal wiring and a second metal wiring; wherein the first metal wiring is provided on the same layer as the first gate wiring, and the second metal wiring is provided on the same layer as the second gate wiring;

[0028] The first isolation column is disposed in the same layer as one of the first signal line, the second signal line, and the third signal line.

[0029] In some embodiments, the second metal trace includes a third surface facing away from the substrate; and a difference between a width of the third surface and a width of the first conductive portion is greater than 2.9 um.

[0030] In a second aspect, an embodiment of the present disclosure further provides a display device, comprising a display panel as described in any one of the first aspects. BRIEF DESCRIPTION OF THE DRAWINGS

[0031] FIG1 is a schematic diagram of filling residual glue in an undercut structure in the related art;

[0032] FIG2 is a schematic diagram of the water and oxygen intrusion path caused by the structure of FIG1 ;

[0033] FIG3 is a top view of a display panel provided in an embodiment of the present disclosure;

[0034] FIG4 is a cross-sectional view of the structure shown in FIG3 along the AA' direction;

[0035] FIG5 is another cross-sectional view of the structure shown in FIG3 along the AA' direction;

[0036] FIG6 is another cross-sectional view of the structure shown in FIG3 along the AA' direction;

[0037] FIG7 is a schematic diagram of the collapse of an undercut structure in the related art;

[0038] FIG8 is an enlarged view of the isolation column provided in an embodiment of the present disclosure. DETAILED DESCRIPTION

[0039] In order to make the purpose, technical solutions and advantages of the embodiments of the present disclosure clearer, the technical solutions in the embodiments of the present disclosure will be clearly and completely described below in conjunction with the drawings in the embodiments of the present disclosure. Obviously, the described embodiments are only part of the embodiments of the present disclosure, not all of the embodiments. The components of the embodiments of the present disclosure generally described and shown in the drawings herein can be arranged and designed in various different configurations. Therefore, the following detailed description of the embodiments of the present disclosure provided in the drawings is not intended to limit the scope of the disclosure for which protection is sought, but merely represents selected embodiments of the present disclosure. Based on the embodiments of the present disclosure, all other embodiments obtained by those skilled in the art without making creative work are within the scope of protection of the present disclosure.

[0040] Unless otherwise defined, the technical or scientific terms used in this disclosure should have the usual meanings understood by people with ordinary skills in the field to which this disclosure belongs. The words "first", "second" and similar words used in this disclosure do not indicate any order, quantity or importance, but are only used to distinguish different components. Similarly, words such as "one", "an" or "the" do not indicate a quantity limitation, but rather indicate the existence of at least one. Words such as "include" or "comprise" mean that the elements or objects appearing before the word include the elements or objects listed after the word and their equivalents, without excluding other elements or objects. Words such as "connect" or "connected" are not limited to physical or mechanical connections, but may include electrical connections, whether direct or indirect. "Up", "down", "left", "right" and the like are only used to indicate relative positional relationships. When the absolute position of the object being described changes, the relative positional relationship may also change accordingly.

[0041] In this disclosure, "multiple or several" refers to two or more. "And / or" describes the relationship between associated objects, indicating that three possible relationships exist. For example, "A and / or B" can mean: A exists alone, A and B exist simultaneously, or B exists alone. The character " / " generally indicates that the associated objects are in an "or" relationship.

[0042] Figure 1 is a schematic diagram of residual glue filled in an undercut structure in the related art, Figure 2 is a schematic diagram of the water and oxygen intrusion path caused by the structure of Figure 1, Figure 3 is a top view of the display panel provided by an embodiment of the present disclosure; Figure 4 is a cross-sectional view of the structure shown in Figure 3 along the A-A' direction.

[0043] As shown in Figures 3 and 4, the display panel 100 provided in the embodiment of the present disclosure includes a display area AA, a first transition area BB1, a second transition area BB2, and an aperture area CC. The second transition area BB2 surrounds the aperture area CC and is located between the first transition area BB1 and the aperture area CC; the first transition area BB1 surrounds the second transition area BB2 and is located between the display area AA and the first transition area BB1. The aperture area CC is provided with apertures for mounting devices such as cameras and sensors. The display area AA is provided with a plurality of light-emitting devices. The light-emitting layer EL in the light-emitting devices is typically formed as a single surface within the display area AA. Therefore, when encapsulation is performed using the encapsulation layer 6, the area near the aperture is often difficult to encapsulate, or even if encapsulated, it is difficult to ensure the encapsulation effect in that area. Therefore, isolation columns are provided in the second transition area BB2 to prevent impurities such as water and oxygen from entering the display area AA from the light-emitting layer EL formed along the entire surface of the aperture area CC, thereby causing defects such as GDS.

[0044] As shown in Figures 3 and 4, the display panel 100 includes a base substrate 1, an intermediate structure layer 2 arranged on the base substrate 1, a flat layer PLN arranged on the side of the intermediate structure layer 2 away from the base substrate 1, a pixel defining layer PDL and a light-emitting layer EL arranged on the side of the flat layer PLN away from the base substrate 1, and at least one isolation column arranged on the base substrate 1.

[0045] The intermediate structure layer 2 includes pixel drive circuits, first electrodes for various light-emitting devices, and signal traces for various components (such as cameras and sensors located in the hole area). The flat layer PLN extends from the display area AA to the first transition area BB1 and is used to flatten the underlying packaging structure. The pixel defining layer PDL has a pixel opening, and part of the structure of the light-emitting layer EL is located within the pixel opening. The light-emitting layer EL extends from the display area AA to the second transition area BB2 and is interrupted at the location of each isolation column. At least one isolation column is located in the second transition area BB2.

[0046] As shown in FIG. 4 , the isolation column surrounding the opening area CC and closest to the display area AA is the first isolation column 3 . A first groove 5 provided on the base substrate 1 is defined between the first isolation column 3 and the planar layer PLN.

[0047] However, fluctuations in the exposure and development process of the pixel definition layer (PDL) can create adhesive residue 01 within the second groove 02, as shown in Figure 1, and can subsequently fill the undercut structure 4 of the first spacer 3. Once this residue 01 fills the undercut structure 4 of the first spacer 3, the water and oxygen intrusion pathways formed by the EL material cannot be blocked by the spacer. Furthermore, new water and oxygen intrusion pathways may form, damaging the package structure, as shown in Figure 2. The narrower the second groove 02, the more difficult it is to clean the residual adhesive 01 formed within it. Conversely, the wider the second groove 02, the easier it is to clean the residual adhesive 01 within it.

[0048] To address this issue, the present disclosure optimizes the second groove 02 to form a first groove 5. As shown in FIG4 , the first groove 5 is defined by the first spacer 3 and the planar layer PLN. Therefore, the planar layer PLN can be optimized to form the first groove 5. For example, the area of ​​the planar layer PLN can be reduced from the second transition region BB2 toward the display area AA, so that the edge of the planar layer PLN is further away from the second transition region BB2, thereby increasing the width W1 of the first groove 5. The width W1 of the first groove 5 can be understood as the shortest distance from the outline boundary of the orthographic projection of the planar layer PLN on the substrate 1 to the outline boundary of the orthographic projection of the first spacer 3 on the substrate 1. Alternatively, the thickness of the planar layer PLN can be reduced, so that the slope of the planar layer PLN in the inclined region EE is gentler, thereby increasing the opening width W2 of the first groove 5. The opening width W2 of the first groove 5 can be understood as the shortest distance from the edge of the first spacer 3 facing away from the surface of the substrate 1 near the display area AA to the contact with the planar layer PLN. The opening width W2 of the first groove 5 facing away from the substrate 1 is related to the height of the first spacer 3 and the slope of the planar layer PLN in the inclined region EE. When the height of the first spacer 3 is fixed, a larger value of α results in a steeper slope of the planar layer PLN in the inclined region EE and a narrower opening of the first groove 5, making it more difficult to clean the residual adhesive O1 within the first groove 5 during the fabrication process. Conversely, a smaller value of α results in a gentler slope of the planar layer PLN in the inclined region EE and a wider opening of the first groove 5, making it easier to clean the residual adhesive O1 within the first groove 5. Regardless of which of the above-mentioned methods for optimizing the planar layer PLN is used, the resulting planar layer PLN has a flat region DD and an inclined region EE, and the planar layer includes a first surface S1 facing away from the substrate. A cross-section at any point on the first surface S1 in the inclined region EE forms a dihedral angle α with the second surface of the substrate 1 near the planar layer PLN (for ease of illustration, α in FIG. 4 represents the acute angle between the cross-section and a reference plane parallel to the second surface). The width W1 of the first groove 5 satisfies the formula: W=α×k, where W represents the width W1 of the first groove 5. k represents a coefficient, k∈[0.48,0.65].

[0049] The disclosed embodiments optimize the structure of the planar layer PLN, increase the width W1 of the first groove 5, and / or increase the opening width W2 of the first groove 5. This makes it easier to clean the residual adhesive O1 within the first groove 5 during the manufacturing process. This eliminates the phenomenon of residual adhesive O1 filling the undercut structure 4 caused by fluctuations in the pixel definition layer (PDL) exposure process. This ensures that the first isolation column 3 can completely cut off the light-emitting layer EL, thereby blocking the path for water and oxygen intrusion and avoiding defects such as GDS. The light-emitting layer EL is disconnected at each isolation column position.

[0050] It should be noted that the value of k is limited by the size of α. The value of α is negatively correlated with the value of k. That is, the larger α is, the smaller the value of k is. Conversely, the larger α is, the larger the value of k is. This ensures that the width W1 of the first groove 5 is not too large, thereby affecting the layout of the second isolation pillars (the remaining isolation pillars in the plurality of isolation pillars excluding the first isolation pillar 3) within the second transition region BB2. Therefore, the value of k in the present disclosure can be set empirically based on actual application conditions, provided that k∈[0.48,0.65].

[0051] In some embodiments, in addition to the above-mentioned optimized flat layer PLN, the width of the first isolation column 3 can also be shortened so that the edge of the first isolation column 3 close to the display area AA is further away from the display area AA, thereby increasing the width W1 of the first groove 5.

[0052] In some embodiments, as shown in the structure of FIG. 4 , the width W1 of the first groove 5 may be greater than 13 μm.

[0053] The above analysis shows that optimizing the structure of the planar layer PLN and increasing the opening width W2 and width W1 of the first groove 5 can improve the probability of cleaning the residual adhesive O1 within the first groove 5, ensuring that the isolation pillar can completely cut off the light-emitting layer EL. The following describes various embodiments of optimizing the planar layer PLN in detail.

[0054] In some embodiments, as shown in FIG4 , the planar layer PLN includes a first sub-planar layer PLN1, a second sub-planar layer PLN2, and a third sub-planar layer PLN3, which are sequentially arranged in a direction away from the base substrate 1. Optionally, the second sub-planar layer PLN2 at least wraps around the boundary portion of the first sub-planar layer PLN1 near the first isolation pillar 3, for example, the second sub-planar layer PLN2 at least wraps around the surface of the first sub-planar layer PLN1 located in the inclined region EE; the third sub-planar layer PLN3 at least wraps around the boundary portion of the second sub-planar layer PLN2 near the first isolation pillar 3, for example, the third sub-planar layer PLN2 at least wraps around the surface of the second sub-planar layer PLN1 located in the inclined region EE. The end surfaces of the first sub-planar layer PLN1, the second sub-planar layer PLN2, and the third sub-planar layer PLN3 are all in direct contact with the surface of the intermediate structural layer 2 facing away from the base substrate 1. The first surface S1 of the planar layer PLN is also the surface of the third sub-planar layer PLN3 facing away from the second sub-planar layer PLN2.

[0055] Exemplarily, the orthographic projection of the third sub-flat layer PLN3 on the base substrate 1 completely covers the orthographic projection of the second sub-flat layer PLN2 on the base substrate 1. The orthographic projection of the second sub-flat layer PLN2 on the base substrate 1 completely covers the orthographic projection of the first sub-flat layer PLN1 on the base substrate 1.

[0056] The flat layer PLN of this embodiment includes three layers of a first sub-flat layer PLN1, a second sub-flat layer PLN2 and a third sub-flat layer PLN3 arranged in sequence, and sequentially wraps the boundary part close to the first isolation column 3, which is beneficial to the protection of the lower intermediate structure layer 2, improves the flatness, and thus is beneficial to the preparation of the light-emitting layer EL.

[0057] It should be noted that the flat layer PLN involved in the present disclosure includes, but is not limited to, a first sub-flat layer PLN1, a second sub-flat layer PLN2, and a third sub-flat layer PLN3 in a stacked arrangement, and may also be a combination of any one or more of them. Each embodiment of the present disclosure is described using an example in which the flat layer PLN includes the first sub-flat layer PLN1, the second sub-flat layer PLN2, and the third sub-flat layer PLN3.

[0058] For example, the materials of the first sub-planarization layer PLN1, the second sub-planarization layer PLN2 and the third sub-planarization layer PLN3 can be organic materials. The film thickness of organic materials is thicker than that of inorganic layers such as the passivation layer PVX, which is conducive to achieving planarization.

[0059] In some embodiments, the thickness and / or dimensions of the planar layer PLN are adjusted to account for the actual product structure, such as the thickness and size range of the planar layer PLN. The value of α is ultimately determined to be between 30° and 40°. In the three-sub ...

[0060] For example, in the structure shown in FIG4 , when the α value is large, a smaller k value may be selected, for example, k is selected as 0.48, thereby setting the width W1 of the first groove 5 to be between 14.4 μm and 19.2 μm.

[0061] Exemplarily, the sum of the thicknesses of the first sub-planar layer PLN1 , the second sub-planar layer PLN2 , and the third sub-planar layer PLN3 is between 5 um and 6 um.

[0062] In some embodiments, as shown in FIG5 , another optimized structure of the first groove is shown. Specifically, the flat layer PLN includes a first sub-flat layer PLN1, a second sub-flat layer PLN2, and a third sub-flat layer PLN3, which are sequentially arranged in a direction away from the base substrate 1. Optionally, the second sub-flat layer PLN2 at least wraps around the boundary portion of the first sub-flat layer PLN1 near the first isolation column 3. For example, the second sub-flat layer PLN2 at least wraps around the surface of the first sub-flat layer PLN1 located in the inclined region EE; the third sub-flat layer PLN3 covers the portion of the surface of the second sub-flat layer PLN2 located in the inclined region EE. The portion of the surface of the second sub-flat layer PLN2 that is located in the inclined region EE and not covered by the third sub-flat layer PLN3, is continuous with the portion of the surface of the third sub-flat layer PLN3 located in the inclined region EE, and together with the surface of the third sub-flat layer PLN3 located in the flat region DD, forms the first surface S1.

[0063] The difference between the third sub-flat layer PLN3 shown in Figure 5 and the third sub-flat layer PLN3 shown in Figure 4 is that the boundary of the third sub-flat layer PLN3 shown in Figure 5 is farther away from the second transition zone BB2, that is, the boundary of the third sub-flat layer PLN3 retreats to the surface of the second sub-flat layer PLN2 away from the first sub-flat layer PLN1. Compared with the structure shown in Figure 4, the opening width W2 of the first groove 5 is wider. At the same time, the retreat of the boundary of the third sub-flat layer PLN3 further increases the width W1 of the first groove 5, which is conducive to cleaning the residual glue 01 located in the first groove 5, ensuring that the first isolation column 3 can completely cut off the light-emitting layer EL, thereby blocking the water and oxygen intrusion path, and avoiding the generation of defects such as GDS.

[0064] Exemplarily, the orthographic projection of the second sub-flat layer PLN2 on the base substrate 1 completely covers the orthographic projection of the first sub-flat layer PLN1 on the base substrate 1. The orthographic projection of the third sub-flat layer PLN3 on the base substrate 1 partially covers the orthographic projection of the second sub-flat layer PLN2 on the base substrate 1.

[0065] In some embodiments, as shown in FIG5 , the contour edge of the orthographic projection of the third sub-planar layer PLN3 on the base substrate 1 is further away from the second transition region BB2 than the contour edge of the orthographic projection of the first sub-planar layer PLN1 on the base substrate 1, thereby increasing the opening width W2 of the first groove 5. The opening width W2 of the first groove 5 can be understood as the shortest distance from the edge of the first isolation column 3 facing away from the surface of the base substrate 1 close to the display area AA to the point where it extends horizontally to contact the second sub-planar layer PLN2.

[0066] In some embodiments, as shown in Figure 5, taking into account the actual product structure, the edge setback distance of the third sub-planar layer PLN3 and / or the thickness of the third sub-planar layer PLN3 are adjusted based on the edge setback of the third sub-planar layer PLN3, ultimately determining the value of α to be between 22° and 30°. In the three-sub-planar layer PLN structure shown in Figure 5, the first surface S1 of the planar layer PLN, i.e., the surface of the third sub-planar layer PLN3 located in the inclined region EE and in contact with the light-emitting layer EL, and the surface of the second sub-planar layer PLN2 located in the inclined region EE and in contact with the light-emitting layer EL, together constitute the surface. The dihedral angle α formed by a tangent plane at any point on the first surface S1 and the second surface is between 22° and 30°. Therefore, the width W of the first groove 5 is W = α × k∈[10.56 μm, 19.5 μm].

[0067] For example, in the structure shown in FIG5 , when the α value is small, in order to ensure that the width W1 of the first groove 5 is not too narrow, a larger k value can be selected, for example, k is selected as 0.565, thereby setting the width W1 of the first groove 5 to between 11.3um and 16.95um.

[0068] Exemplarily, as shown in FIG5 , the distance between the orthographic projection of the edge of the third sub-planar layer PLN3 on the substrate 1 and the orthographic projection of the edge of the first sub-planar layer PLN1 on the substrate 1 is between 5 um and 10 um.

[0069] Exemplarily, as shown in FIG5 , the thickness of the third sub-planar layer PLN3 is between 1.5 um and 2.5 um.

[0070] In some embodiments, as shown in FIG6 , another optimized structure of the first groove is illustrated. Specifically, the planar layer PLN includes a first sub-planar layer PLN1, a second sub-planar layer PLN2, and a third sub-planar layer PLN3, sequentially arranged in a direction away from the base substrate 1. Optionally, the second sub-planar layer PLN2 covers the portion of the surface of the first sub-planar layer PLN1 located in the inclined region EE; the third sub-planar layer PLN3 covers the portion of the surface of the second sub-planar layer PLN2 located in the inclined region EE. The portion of the surface of the first sub-planar layer PLN2 facing away from the base substrate 1, located in the inclined region EE and not covered by the second sub-planar layer PLN2, is continuous with the portion of the surface of the second sub-planar layer PLN2 located in the inclined region EE. The portion of the surface of the second sub-planar layer PLN2 facing away from the base substrate 1, located in the inclined region EE and not covered by the third sub-planar layer PLN3, is continuous with the portion of the surface of the third sub-planar layer PLN located in the inclined region EE, and together with the surface of the third sub-planar layer PLN3 located in the flat region DD, forms the first surface S1.

[0071] The structure shown in FIG6 differs from the structure shown in FIG5 in that the boundaries of the second sub-planar layer PLN2 and the third sub-planar layer PLN3 are further away from the second transition region BB2. That is, the boundary of the second sub-planar layer PLN2 is retracted to the surface of the first sub-planar layer PLN1 that faces away from the passivation layer PVX. Compared to the structure shown in FIG5, the opening width W2 of the first groove 5 is wider. Furthermore, the retraction of the boundary of the second sub-planar layer PLN2 further increases the width W1 of the first groove 5, which facilitates the cleaning of residual glue O1 within the first groove 5, ensuring that the first isolation column 3 can completely cut through the light-emitting layer EL, thereby blocking the path for water and oxygen intrusion and avoiding defects such as GDS.

[0072] Exemplarily, the orthographic projection of the second sub-flat layer PLN2 on the base substrate 1 partially covers the orthographic projection of the first sub-flat layer PLN1 on the base substrate 1. The orthographic projection of the third sub-flat layer PLN3 on the base substrate 1 partially covers the orthographic projection of the second sub-flat layer PLN2 on the base substrate 1.

[0073] In some embodiments, as shown in Figure 6, taking into account the actual product structure, the edges of the second and third sub-planar layers PLN2 and PLN3 are both set back. By adjusting the setback distances of the second and third sub-planar layers PLN2 and PLN3 and / or the thicknesses of the second and third sub-planar layers PLN2 and PLN3, α is ultimately determined to be within the range of 18° to 22°. In the three-sub-planar layer structure shown in Figure 6, the first surface S1 of the planar layer PLN, comprising the surface of the third sub-planar layer PLN3 located in the inclined region EE and in contact with the light-emitting layer EL, the surface of the second sub-planar layer PLN2 located in the inclined region EE and in contact with the light-emitting layer EL, and the surface of the first sub-planar layer PLN1 located in the inclined region EE and in contact with the light-emitting layer EL, is formed. The dihedral angle α formed by any tangent plane at any point on the first surface S1 and the second surface is between 18° and 22°. Therefore, the width of the first groove 5 is W = α × k∈[8.64 μm, 14.3 μm].

[0074] For example, in the structure shown in FIG6 , when the α value is small, in order to ensure that the width W1 of the first groove 5 is not too narrow, a larger k value can be selected, for example, k is selected as 0.65, thereby setting the width W1 of the first groove 5 to between 11.7um and 14.3um.

[0075] Exemplarily, as shown in FIG6 , the distance between the orthographic projection of the edge of the second sub-planar layer PLN2 on the base substrate 1 and the orthographic projection of the edge of the first sub-planar layer PLN1 on the base substrate 1 is between 5 um and 10 um.

[0076] Exemplarily, as shown in FIG6 , the distance between the orthographic projection of the edge of the third sub-planar layer PLN3 on the substrate 1 and the orthographic projection of the edge of the second sub-planar layer PLN2 on the substrate 1 is between 5 um and 10 um.

[0077] For example, as shown in FIG6 , the thickness of the second sub-planar layer PLN2 is between 1.5 μm and 2.5 μm. The thickness of the third sub-planar layer PLN3 is between 1.5 μm and 2.5 μm. Optionally, the thickness of the second sub-planar layer PLN2 is 2 μm, and the thickness of the third sub-planar layer PLN3 is 2 μm.

[0078] 6 , the thickness of the first sub-planar layer PLN1 is between 1.5 μm and 2.5 μm. Optionally, the thickness of the first sub-planar layer PLN1 is 2.5 μm.

[0079] In some embodiments, the width W1 of the first groove 5 is between 13 um and 17 um.

[0080] In some embodiments, as shown in Figures 4 to 6, the display panel 100 also includes a metal trace (for example, a first metal trace M1 and / or a second metal trace M2) arranged on the side of the flat layer PLN close to the base substrate 1, and the orthographic projection of the metal trace on the base substrate 1 covers the orthographic projection of the isolation column on the base substrate 1.

[0081] In this embodiment, an isolation column is positioned directly above the metal traces (M1 and / or M2) to elevate the isolation column, thereby facilitating the isolation of the light-emitting layer EL. Here, the isolation column can be the first isolation column 3 and / or the second isolation column. For ease of understanding, this disclosure uses the first isolation column 3 as an example.

[0082] Exemplarily, the metal trace is part of the intermediate structure layer 2 and may be a gate line, a capacitor plate, or a gate electrode of a thin film transistor.

[0083] Exemplarily, the metal wiring is a single-layer structure, and the first isolation column 3 is a metal isolation column with a multi-layer structure.

[0084] In addition to the risk of residual adhesive 01, the structural stability of the first spacer 3 itself is also directly related to the product packaging effect. When process fluctuations cause the first spacer 3 to shift in position, if the boundary of the first spacer 3 is not in the flat area DD, the undercut structure 4 will collapse. As shown in Figure 7, the undercut structure 4 of the first spacer 3 near the display area AA collapses. If the undercut structure 4 of the first spacer 3 near the via area is also unable to cut through the light-emitting layer EL due to external factors (although this event is unlikely, it is possible), the current packaging will fail.

[0085] In some embodiments, the display panel 100 further includes an interlayer insulating layer ILD disposed between the isolation column and the metal trace. As shown in Figures 4 to 6, the interlayer insulating layer ILD is disposed between the isolation column and the second metal trace M2, and the interlayer insulating layer ILD includes a flat portion ILD1 and a protruding portion ILD2 disposed opposite the second metal trace M2. The isolation column is disposed on the surface of the protruding portion ILD2 facing away from the base substrate 1, ensuring that the isolation column is raised while allowing the isolation column to fall on a flat surface, thereby reducing the possibility of the light-emitting layer EL being unable to be cut off due to the collapse of the undercut structure 4, thereby reducing the probability of package failure. The isolation column here can be any isolation column in the display panel 100, such as the first isolation column 3 and / or the second isolation column. The present disclosure is described using the first isolation column 3 as an example.

[0086] In some embodiments, Figure 8 is an enlarged view of a spacer provided by an embodiment of the present disclosure, specifically an enlarged view of the first spacer 3 in Figures 4 to 6 . As shown in Figure 8 , the spacer includes a first conductive portion 31, a second conductive portion 32, and a third conductive portion 33, arranged in sequence away from the base substrate 1. Both the first conductive portion 31 and the third conductive portion 33 protrude beyond the second conductive portion 32, forming an I-shaped cross-section of the first, second, and third conductive portions 31, 32, 33, forming an undercut structure 4 for severing the light-emitting layer EL.

[0087] In some embodiments, as shown in FIG8 , the difference between the width of the protrusion ILD2 and the width of the first conductive portion 31 is greater than 2.9 μm. In this embodiment, by shortening the width of the first conductive portion 31, the difference between the width of the protrusion ILD2 and the width of the first conductive portion 31 is greater than 2.9 μm. This ensures that the spacer remains on the flat surface where the protrusion ILD2 is located despite fluctuations in the manufacturing process, preventing collapse.

[0088] Exemplarily, as shown in FIG8 , the shortest distance between the edge of the protrusion ILD2 and the edge of the first conductive portion 31 is greater than 1.45 um.

[0089] In some embodiments, as shown in FIG. 8 , the ratio of the width of the first conductive portion 31 to the width of the metal trace is between 0.4 and 0.6.

[0090] Exemplarily, the metal traces include a first metal trace M1 and a second metal trace M2, wherein the second metal trace M2 is closer to the first isolation pillar 3 than the first metal trace M1. For example, the second metal trace M2 is disposed directly opposite the first isolation pillar 3. The ratio of the width of the first conductive portion 31 to the width of the second metal trace M2 is between 0.4 and 0.6. The width of the second metal trace M2 can be understood as the width of the surface of the second metal trace M2 facing away from the substrate, or alternatively, the average width of the two surfaces of the second metal trace M2 facing each other in the thickness direction. For another example, the first metal trace M1 is disposed directly opposite the first isolation pillar 3. The ratio of the width of the first conductive portion 31 to the width of the first metal trace M2 is between 0.4 and 0.6. The width of the first metal trace M1 can be understood as the width of the surface of the first metal trace M1 facing away from the substrate, or alternatively, the average width of the two surfaces of the first metal trace M1 facing each other in the thickness direction.

[0091] In this embodiment, the ratio of the width of the first conductive portion 31 to the width of the metal trace is set between 0.4 and 0.6, to ensure that the isolation pillar still falls on a flat surface in the event of process fluctuations.

[0092] In some embodiments, the width of the first conductive portion 31 is between 3.8 um and 4.2 um, and the width of the second metal trace M2 away from the third surface S3 of the substrate is between 0.76 um and 0.84 um.

[0093] In some embodiments, as shown in Figures 4 to 6, the display panel includes a first insulating layer 21, a first gate line (not shown in the figure, which can be understood as the gate line of the thin film transistor located in the display area), a second insulating layer 22, a second gate line (not shown in the figure, which can be understood as the gate line of the thin film transistor located in the display area AA), an interlayer insulating layer ILD, a first signal line SD1 (located in the first transition area BB1, which can be a signal transmission line of the sensor in the via), a first sub-planar layer PLN1, a second signal line (not shown in the figure, which can be the source / drain electrode line of the thin film transistor located in the display area AA), a second sub-planar layer PLN2, a third signal line SD3 (located in the second transition area BB2), and a third sub-planar layer PLN3, which are sequentially arranged in a direction away from the base substrate 1. The metal lines include a first metal line M1 and a second metal line M2; the first metal line M1 is arranged on the same layer as the first gate line, and the second metal line M2 is arranged on the same layer as the second gate line; the first isolation pillar 3 is arranged on the same layer as one of the first signal line SD1, the second signal line, and the third signal line SD3.

[0094] Exemplarily, the first isolation column 3 and the third signal line SD3 are provided in the same layer.

[0095] Exemplarily, as shown in FIG. 4 to FIG. 6 , the third signal line SD3 is multiplexed into the first isolation column 3 .

[0096] In some embodiments, as shown in Figures 4-6 , the first spacer 3 is positioned directly opposite the second metal trace M2. The second metal trace M2 includes a third surface S3 facing away from the substrate. The difference between the width of the third surface S3 and the width of the first conductive portion 31 is greater than 2.9 μm. In this embodiment, by increasing the width of the second metal trace M2 or shortening the width of the first conductive portion 31 to a value greater than 2.9 μm, the spacer remains on the flat surface where the protrusion ILD2 is located, preventing collapse despite fluctuations in the manufacturing process.

[0097] In some embodiments, as shown in Figures 4 to 6, the display panel 100 further includes an encapsulation layer 6 disposed on the side of the light-emitting layer EL facing away from the flat layer PLN, for sealing the light-emitting device, thereby reducing or preventing degradation of the light-emitting device caused by moisture and / or oxygen in the environment. The encapsulation layer 6 can be a single-layer structure or a multi-layer structure including a stack of inorganic and organic layers. Exemplarily, the encapsulation layer 6 includes a first inorganic encapsulation layer, an organic encapsulation layer, and a second inorganic encapsulation layer disposed sequentially in a direction away from the base substrate 1. The encapsulation layer 6 extends from the display area AA to the second transition area BB2, thereby covering the isolation column.

[0098] Exemplary materials for the encapsulation layer 6 may include insulating materials such as silicon oxynitride (SiON), silicon oxide (SiOx), silicon nitride (SiNx), and polymer resins. Inorganic materials such as silicon oxynitride (SiON), silicon oxide (SiOx), and silicon nitride (SiNx) have high density and can prevent the intrusion of water, oxygen, and the like. The material of the organic encapsulation layer may be a polymer material containing a desiccant or a polymer material that can block water vapor, such as a polymer resin, to planarize the surface of the display panel 100 and relieve stress in the first and second inorganic encapsulation layers. A water-absorbing material such as a desiccant may also be included to absorb intrusive water, oxygen, and the like.

[0099] In some embodiments, as shown in Figures 4 to 6, the display panel further includes a passivation layer PVX disposed on a side of the planar layer PLN close to the base substrate 1, and a signal line disposed on a side of the passivation layer PVX close to the base substrate 1; the passivation layer PVX wraps around the third metal trace M3, and the planar layer PLN wraps around the passivation layer PVX. Here, the third metal trace M3 can be a multilayer metal structure, such as a titanium-aluminum-titanium (Ti / Al / Ti) structure. The third metal trace M3 can be, for example, a source or drain of a thin film transistor, or a transmission signal line of a device in the aperture area.

[0100] In some embodiments, the display panel 100 further includes a touch function layer disposed on the encapsulation layer 6. The touch function layer includes a touch buffer layer (Touch Buffer), a first touch metal layer (Touch Metal A, TMA), a touch insulating layer (Touch Insulator, TLD), a second touch metal layer (Touch Metal B, TMB), and a touch protection layer (TOC), disposed sequentially in a direction away from the base substrate 1. The edge of the display area AA near the second transition area BB2 lacks the first and second touch metal layers but does have a touch insulating layer. The touch insulating layer and touch protection layer extend from the display area AA to the second transition area BB2.

[0101] In some embodiments, the display panel 100 is an OLED display panel 100 .

[0102] In addition, embodiments of the present disclosure further provide a display device comprising the display panel described in any of the above embodiments. The display device may be, for example, a mobile phone, tablet computer, television, monitor, laptop computer, digital photo frame, vehicle-mounted device, or any other product with a display function. Other essential components of the display device are readily understood by those skilled in the art and are not detailed here, nor should they be construed as limitations of the present disclosure.

[0103] It is understood that the above embodiments are merely exemplary embodiments for illustrating the principles of the present disclosure, and the present disclosure is not limited thereto. Those skilled in the art may make various modifications and improvements without departing from the spirit and substance of the present disclosure, and such modifications and improvements are also considered to be within the scope of protection of the present disclosure.

Claims

1. A display panel comprising a display area, a first transition area, a second transition area, and an aperture area; the second transition area surrounds the aperture area and is located between the first transition area and the aperture area, and the first transition area surrounds the second transition area and is located between the display area and the first transition area; the display panel comprises a base substrate, a planar layer disposed on the base substrate, a light-emitting layer disposed on a side of the planar layer facing away from the base substrate, and at least one isolation pillar disposed on the base substrate; The planar layer extends from the display area to the first transition area; the light-emitting layer extends from the display area to the second transition area and is interrupted at the position of each isolation column; at least one isolation column is located in the second transition area; The isolation column surrounding the opening area and closest to the display area is a first isolation column, and a first groove provided on the base substrate is defined between the first isolation column and the flat layer; The flat layer has a flat area and an inclined area, and the flat layer includes a first surface facing away from the substrate; a dihedral angle α formed by a cross-section at any point on the first surface of the inclined area and a second surface of the substrate close to the flat layer is formed; the width of the first groove satisfies the following formula: W = α × k; where W represents the width of the first groove, and k represents a coefficient, k∈[0.48,0.65].

2. The display panel according to claim 1, wherein The planar layer comprises a first sub-planar layer, a second sub-planar layer and a third sub-planar layer which are sequentially arranged in a direction away from the substrate; The second sub-planarizing layer at least wraps a boundary portion of the first sub-planarizing layer close to the first isolation pillar, and the third sub-planarizing layer at least wraps a boundary portion of the second sub-planarizing layer close to the first isolation pillar.

3. The display panel according to claim 2, wherein: The dihedral angle α formed by the cut surface and the second surface is between 30° and 40°.

4. The display panel according to claim 1, wherein: The planar layer comprises a first sub-planar layer, a second sub-planar layer and a third sub-planar layer which are sequentially arranged in a direction away from the substrate; The second sub-planar layer at least wraps the boundary portion of the first sub-planar layer close to the first isolation column; the third sub-planar layer covers the surface portion of the second sub-planar layer located in the inclined area; A portion of the surface of the second sub-flat layer facing away from the base substrate, which is located in the inclined area and not covered by the third sub-flat layer, is continuous with a portion of the surface of the third sub-flat layer located in the inclined area, and together with the surface of the third sub-flat layer located in the flat area, forms the first surface.

5. The display panel according to claim 4, wherein: An edge of an orthographic projection of the third sub-planar layer on the substrate is farther away from the second transition region than an edge of an orthographic projection of the first sub-planar layer on the substrate.

6. The display panel according to claim 4 or 5, wherein: The dihedral angle α formed by the cut surface and the second surface is between 22° and 30°.

7. The display panel according to claim 1, wherein: The planar layer comprises a first sub-planar layer, a second sub-planar layer and a third sub-planar layer which are sequentially arranged in a direction away from the substrate; The second sub-planar layer covers a portion of the surface of the first sub-planar layer located in the inclined region; the third sub-planar layer covers a portion of the surface of the second sub-planar layer located in the inclined region; A portion of the surface of the first sub-flat layer facing away from the base substrate, which is located in the inclined area and not covered by the second sub-flat layer, is continuous with a portion of the surface of the second sub-flat layer located in the inclined area; a portion of the surface of the second sub-flat layer facing away from the base substrate, which is located in the inclined area and not covered by the third sub-flat layer, is continuous with a portion of the surface of the third sub-flat layer located in the inclined area, and together with the surface of the third sub-flat layer located in the flat area, form the first surface.

8. The display panel according to claim 7, wherein: A dihedral angle α formed by the cut surface and the second surface is between 18° and 22°.

9. The display panel according to claim 1, wherein: The display panel further includes a metal trace arranged on a side of the planar layer close to the base substrate; The orthographic projection of the metal trace on the base substrate covers the orthographic projection of the isolation column on the base substrate.

10. The display panel according to claim 9, wherein: The display panel further includes an interlayer insulating layer disposed between the isolation column and the metal wiring, wherein the interlayer insulating layer includes a flat portion and a protruding portion disposed opposite to the metal wiring; The isolation column is disposed on a surface of the protrusion facing away from the base substrate.

11. The display panel according to claim 9 or 10, wherein: The isolation column includes a first conductive portion, a second conductive portion, and a third conductive portion sequentially arranged in a direction away from the base substrate; the first conductive portion and the third conductive portion both protrude from the second conductive portion.

12. The display panel according to claim 11, wherein: A difference between a width of the protruding portion and a width of the first conductive portion is greater than 2.9 μm.

13. The display panel according to claim 11, wherein: The ratio of the width of the first conductive portion to the width of the metal trace is between 0.4 and 0.

6.

14. The display panel according to claim 11, wherein: The display panel includes a first insulating layer, a first gate line, a second insulating layer, a second gate line, an interlayer insulating layer, a first signal line, a first sub-planar layer, a second signal line, a second sub-planar layer, a third signal line and a third sub-planar layer, which are sequentially arranged in a direction away from the base substrate; The metal wiring includes a first metal wiring and a second metal wiring; wherein the first metal wiring is provided on the same layer as the first gate wiring, and the second metal wiring is provided on the same layer as the second gate wiring; The first isolation column is disposed in the same layer as one of the first signal line, the second signal line, and the third signal line.

15. The display panel according to claim 14, wherein: The second metal trace includes a third surface facing away from the substrate; a difference between a width of the third surface and a width of the first conductive portion is greater than 2.9 um.

16. A display device, wherein: The display panel comprises the display panel according to any one of claims 1 to 15.

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