Fully automatic wet etching system and machine for scientific research

Abstract

The present application relates to the technical field of semiconductor cleaning and etching. Disclosed are a fully automatic wet etching system and machine for scientific research. The system comprises a machine system, an etching system, a feeding system, a robot system and a control system, wherein the machine system is used for providing a miniaturized machine chamber; the etching system comprises a plurality of chemical solution modules arranged in the miniaturized machine chamber in an arc arrangement mode; each chemical solution module comprises a chemical solution tank, and a solution supply mechanism for supplying a solution to the chemical solution tank according to a preset solution supply policy and controlling an etching environment in the chemical solution tank; the feeding system is used for realizing the automatic conveying of workpieces; the robot system comprises a robot module, and a visual module in communication connection with the robot module; and the robot module is arranged at the top of an operation space, and is used for grabbing the workpieces on the basis of image information fed back by the visual module and placing the workpieces into the chemical solution tanks according to a preset etching policy to complete etching. The present application achieves an intelligent and miniaturized design, and meets the requirements of flexible and changeable scientific research scenarios, thereby improving the scientific research efficiency and saving on scientific research resources.

Description

A scientific research type wet etching full-automatic system and machine TECHNICAL FIELD

[0001] The present application relates to the technical field of semiconductor cleaning and etching, in particular to a scientific research type organic wet bench. BACKGROUND

[0002] In the manufacturing process of semiconductor micro-nano devices, a wet bench is needed for wafer surface cleaning and acid-base etching. However, in the field of scientific research, there is currently no full-automatic wet bench equipment that can be used for scientific research. Although the traditional enterprise-level wet bench has high automation, it is only suitable for batch production, and has the following problems:

[0003] 1. The equipment has a large size, which occupies the clean room space of the research place and wastes resources;

[0004] 2. Centralized liquid supply and large chemical tank design are adopted, which greatly increases the cost of scientific research;

[0005] 3. It is only suitable for large-size semiconductors (4 / 6 / 8 / 12-inch wafers) and cannot be compatible with small-size semiconductors (1cm-2cm wafers);

[0006] 4. It is designed according to the standard process flow of industrial production and cannot meet the flexible and variable scientific research scenarios.

[0007] Therefore, the current scientific research method for semiconductors in colleges and universities is mainly manual operation, which involves many dangerous chemical reagents. If the protection is not proper or the operation is not standardized, it is easy to cause danger and endanger the life and health safety of scientific researchers. Moreover, manual operation of small equipment is required in most experimental scenarios, which is not convenient and has the disadvantages of unstable process and low efficiency.

[0008] In summary, the existing technology is still blank in terms of how to improve the efficiency and stability of scientific research, which seriously restricts the development of semiconductor research. Therefore, it is urgent to provide a solution to solve the above problems. SUMMARY

[0009] Therefore, the purpose of the present application is to provide a scientific research type wet etching full-automatic system and machine, which meets the needs of scientific research in colleges and universities and improves the efficiency and stability of scientific research.

[0010] To achieve the above technical purpose, the present application provides a scientific research type wet etching full-automatic system, which comprises a machine system, an etching system, a feeding system, a robot system and a control system.

[0011] The machine system is used to provide a miniaturized machine room including an installation space and a working space;

[0012] The etching system comprises a plurality of liquid medicine modules arranged in an arc line manner in the miniaturized machine chamber;

[0013] The liquid medicine module comprises a liquid medicine tank and a liquid supply mechanism;

[0014] The liquid supply mechanism is used to supply liquid to the liquid medicine tank according to a preset liquid supply strategy and control the etching environment in the liquid medicine tank;

[0015] The feeding system is used to transport the workpiece into the working space and close the working space after completing the transportation;

[0016] The robot system comprises a robot module and a vision module in communication connection with the robot module;

[0017] The robot module is arranged at the top of the working space and is used to grab the workpiece according to the image information fed back by the vision module and place the workpiece into the liquid medicine tank to complete etching according to a preset etching strategy;

[0018] The control system is in communication connection with the machine system, the feeding system, the robot system and the etching system, and is used to realize automatic etching operation according to user instructions.

[0019] In a more specific embodiment, the robot module is also used to grab a cleaning tool to perform a cleaning action according to the image information fed back by the vision module.

[0020] In a more specific embodiment, the robot module can also perform at least one of the following actions: extension action, rotation action and shaking action.

[0021] In a more specific embodiment, a timing system is further included;

[0022] The timing system is used to obtain the running time information of the machine system, the feeding system and the robot system and feed back to the control system, so that the control system can control the machine system, the feeding system, the robot system and the etching system according to a preset time strategy.

[0023] In a more specific embodiment, a human-computer interaction system and a monitoring system are further included;

[0024] The human-computer interaction system is in communication connection with the control system;

[0025] The monitoring system is used to obtain the running data of the machine system, the robot system, the etching system and the feeding system respectively, and issue an alarm when the running data exceeds a threshold value;

[0026] The monitoring system is also configured to monitor the machine system, the robot system, the etching system and the feeding system in real time according to a preset monitoring strategy.

[0027] In a more specific embodiment, the liquid supply mechanism comprises a liquid supply module and an etching environment module.

[0028] The liquid supply module is configured to supply the liquid in the small-capacity liquid tank to the liquid tank.

[0029] The etching environment module comprises at least one of a heating module, a bubbling module, an ultrasonic vibration module, a cleaning module, a spraying module and a circulating filtration module.

[0030] The liquid tank is provided with an overflow recovery module.

[0031] The application also discloses a scientific research type wet etching full-automatic machine.

[0032] The scientific research type wet etching full-automatic system is arranged on the machine body and comprises a machine system, an etching system, a feeding system, a robot system and a control system.

[0033] The machine system is configured to provide a miniaturized machine room comprising an installation space and a working space.

[0034] The etching system comprises a plurality of liquid modules arranged in the miniaturized machine room in an arc arrangement.

[0035] The liquid module comprises a liquid tank and a liquid supply mechanism.

[0036] The liquid supply mechanism is configured to supply liquid to the liquid tank according to a preset liquid supply strategy and control the etching environment in the liquid tank.

[0037] The feeding system is configured to transport a workpiece into the working space and close the working space after the transportation is completed.

[0038] The robot system comprises a robot module and a vision module in communication connection with the robot module.

[0039] The robot module is arranged on the top of the working space and is configured to grasp a workpiece according to image information fed back by the vision module and place the workpiece into the liquid tank to complete etching according to a preset etching strategy.

[0040] The control system is in communication connection with the machine system, the feeding system, the robot system and the etching system and is configured to realize automatic etching operation according to a user instruction.

[0041] In a more specific embodiment, the robot module is further configured to perform a cleaning action according to image information fed back by the vision module.

[0042] In a more specific embodiment, the robot module is further capable of performing at least one of a telescopic action, a rotating action, and a shaking action.

[0043] In a more specific embodiment, a timing system is further included.

[0044] The timing system is configured to acquire running time information of the machine system, the feeding system, the robot system, and feed back the control system, so that the control system can control the machine system, the feeding system, the robot system, and the etching system according to a preset time strategy.

[0045] In a more specific embodiment, a human-computer interaction system and a monitoring system are further included.

[0046] The human-computer interaction system is in communication connection with the control system.

[0047] The monitoring system is configured to acquire running data of the machine system, the robot system, the etching system, and the feeding system respectively, and send an alarm when the running data exceeds a threshold value.

[0048] The monitoring system is further configured to perform real-time monitoring on the machine system, the robot system, the etching system, and the feeding system according to a preset monitoring strategy.

[0049] In a more specific embodiment, the liquid supply mechanism includes a liquid supply module and an etching environment module.

[0050] The liquid supply module is configured to supply liquid in a small-capacity liquid tank to the liquid tank.

[0051] The etching environment module includes at least one of a heating module, a bubbling module, an ultrasonic vibration module, a cleaning module, a spraying module, and a circulating filtration module.

[0052] The liquid tank is provided with an overflow recovery module.

[0053] In a more specific embodiment, the robot module is a collaborative robot.

[0054] In a more specific embodiment, the miniaturized machine chamber is arranged in the machine body.

[0055] The support partition is arranged in the miniaturized machine chamber.

[0056] The support partition separates the miniaturized machine chamber into an upper chamber and a lower chamber.

[0057] The upper chamber forms a working space.

[0058] In a more specific embodiment, a plurality of the chemical liquid modules are circumferentially arranged in the lower chamber.

[0059] The support partition is provided with a first avoiding opening corresponding to each chemical liquid tank of the chemical liquid modules.

[0060] In a more specific embodiment, the machine body is provided with an electric control chamber and a raw liquid chamber for storing small-volume chemical liquid tanks in the space below the miniaturized machine chamber.

[0061] In a more specific embodiment, the machine system further comprises a fan filter unit.

[0062] The machine body is provided with an air outlet and an air inlet communicating with the upper chamber.

[0063] The fan filter unit is installed on the machine body and connected with the air inlet.

[0064] In a more specific embodiment, the machine body is further provided with a spray cleaning device.

[0065] The spray cleaning device comprises a spray assembly and a spray moving device.

[0066] The spray moving device is installed in the upper chamber and connected with the spray assembly for moving the spray assembly.

[0067] The support partition is provided with a plurality of first drain holes.

[0068] The lower chamber is provided with a main drain pipe communicating with the outside of the machine body.

[0069] In a more specific embodiment, the support partition is provided with a water collecting portion in the middle.

[0070] The water collecting portion is provided with a second drain hole.

[0071] In a more specific embodiment, the lower chamber is provided with a support cylinder connected with the support partition in the middle.

[0072] The support cylinder is provided with a control cavity.

[0073] The second drain hole communicates with the control cavity.

[0074] The control cavity is provided with a branch drain pipe connected with the second drain hole.

[0075] The branch drain pipe extends out of the support cylinder from the end away from the second drain hole.

[0076] In a more specific embodiment, a flower basket holder for holding the workpiece is further included;

[0077] The robot module is connected with a flower basket gripper mechanism for grabbing the flower basket holder.

[0078] In a more specific embodiment, the flower basket gripper mechanism includes a clamping driving assembly and two gripper pieces;

[0079] The clamping driving assembly is connected with the two gripper pieces for driving the two gripper pieces to open and close to grab the flower basket holder;

[0080] The clamping driving assembly is provided with an explosion-proof and corrosion-proof protective cover.

[0081] In a more specific embodiment, the flower basket holder includes two fixed plates;

[0082] The two fixed plates are arranged in parallel and spaced apart and are fixedly connected by a plurality of connecting rods;

[0083] Each connecting rod and the two fixed plates form a holding cavity for holding the workpiece therebetween;

[0084] A handle block is fixedly connected to the top position between the two fixed plates;

[0085] Guide clamping grooves are arranged on both sides of the handle block;

[0086] Positioning protrusions are arranged on the clamping surfaces of the two gripper pieces and are clamped into the guide clamping grooves;

[0087] The bottom of the gripper piece is provided with a limiting flange which can contact and abut against the bottom of the handle block.

[0088] In a more specific embodiment, the flower basket holder includes a bottom plate and two fixed plates;

[0089] The two fixed plates are arranged in parallel and spaced apart on the top of the fixed plate;

[0090] A handle block is fixedly connected to the top position between the two fixed plates;

[0091] Guide clamping grooves are arranged on both sides of the handle block;

[0092] Positioning protrusions are arranged on the clamping surfaces of the two gripper pieces and are clamped into the guide clamping grooves;

[0093] The bottom of the gripper piece is provided with a limiting flange which can contact and abut against the bottom of the handle block.

[0094] A plurality of limiting rods are fixed between the two fixed plates on the bottom plate;

[0095] The space between the limiting rods and the bottom plate forms a workpiece containing cavity.

[0096] In a more specific embodiment, the two fixing plates are each fixed with a positioning block on one side thereof;

[0097] Two positioning blocks are movably inserted between the two positioning blocks for pressing the workpiece.

[0098] In a more specific embodiment, the liquid supply mechanism comprises a liquid supply device and a liquid discharge device for forming a liquid supply module;

[0099] The liquid supply device comprises a pump tube and a liquid pump;

[0100] One end of the pump tube is connected to the liquid tank, and the other end is connected to a small-capacity liquid tank;

[0101] The liquid pump is installed on the pump tube, and is used for pumping the liquid in the small-capacity liquid tank into the liquid tank according to a preset liquid supply strategy;

[0102] The liquid discharge device comprises a liquid discharge pipe and a liquid discharge valve;

[0103] The liquid discharge pipe is connected to the liquid tank;

[0104] The liquid discharge valve is connected to the liquid discharge pipe, and is used for controlling the flow of the liquid discharge pipe according to a preset liquid supply strategy;

[0105] The liquid tank is provided with a liquid level sensor for detecting the liquid level of the liquid;

[0106] In a more specific embodiment, the liquid tank is provided with a liquid chamber and an overflow chamber for forming an overflow module;

[0107] The liquid chamber is used for containing the liquid supplied by the liquid supply mechanism, and is used for placing the workpiece;

[0108] The overflow chamber is used for receiving the overflow of the liquid chamber;

[0109] The pump tube and the liquid discharge pipe are connected to the liquid chamber.

[0110] In a more specific embodiment, the liquid tank comprises an inner tank body;

[0111] The inner tank body is provided with an immersion inlet formed on the top thereof;

[0112] The inner tank body is provided with a liquid chamber formed in the inner space thereof;

[0113] A connecting flange is arranged around the outer periphery of the inner tank body;

[0114] The connecting flange top surface edge is connected with a side wall;

[0115] The side wall, the connecting flange top surface and the inner tank body peripheral surface form the overflow chamber.

[0116] In a more specific embodiment, the liquid supply mechanism further comprises a heating device for forming a heating module;

[0117] The heating device is used for heating the liquid in the liquid chamber according to a preset liquid supply strategy.

[0118] In a more specific embodiment, the liquid tank further comprises an outer tank body;

[0119] The inner tank body bottom extends into the outer tank body, and the connecting flange is connected with the outer tank body, so that the connecting flange, the outer tank body and the inner tank body form a heating chamber;

[0120] The outer tank body is provided with a medium input pipe and a medium output pipe which communicate with the heating chamber;

[0121] The heating device is installed in the heating chamber and used for heating the heat conduction heating in the heating chamber.

[0122] In a more specific embodiment, the liquid supply mechanism further comprises a circulating device for forming a circulating filtration module or a circulating spray device for forming a spray module;

[0123] The circulating device is used for extracting the liquid in the liquid chamber and returning it to the liquid chamber after filtration according to a preset liquid supply strategy;

[0124] The circulating spray device is used for extracting the liquid in the liquid chamber and returning it to the liquid chamber in a spray manner after filtration according to a preset liquid supply strategy.

[0125] In a more specific embodiment, the etching system further comprises a cleaning device for forming a cleaning module;

[0126] The cleaning device is used for cleaning the workpiece in the liquid chamber.

[0127] In a more specific embodiment, the liquid supply mechanism further comprises a bubbling device for forming a bubbling module;

[0128] The bubbling device is used for bubbling the liquid in the liquid chamber according to a preset liquid supply strategy.

[0129] In a more specific embodiment, the etching system further comprises an etching switch cover device;

[0130] The etching switch cover device is used for controlling opening and closing of the immersion inlet of the liquid chamber.

[0131] In a more specific embodiment, the feeding system comprises a conveying device, a first feeding switch cover device;

[0132] The conveying device is used for conveying the workpiece from a standby position outside the machine body to a feeding position in the miniaturized machine chamber.

[0133] The machine body is provided with a feeding opening in communication with the miniaturized machine chamber and through which the conveyed workpiece passes.

[0134] The first feeding switch cover device is used for controlling opening and closing of the feeding opening.

[0135] In a more specific embodiment, the feeding system further comprises a second feeding switch cover device;

[0136] The conveying device is installed in the lower chamber and comprises a first feeding mechanism and a second feeding mechanism.

[0137] The support partition plate is provided with a second avoiding opening through which the workpiece enters the upper chamber.

[0138] The first feeding mechanism is used for conveying the workpiece from the standby position to a transfer position in the lower chamber.

[0139] The second feeding mechanism is used for conveying the workpiece from the transfer position to the feeding position in the upper chamber.

[0140] The second feeding switch cover device is used for controlling opening and closing of the second avoiding opening.

[0141] From the above technical solutions, the embodiments of the scientific research type wet etching full-automatic system designed by the present application have the following beneficial effects:

[0142] 1. The liquid supply mechanism designed by automation is used to supply liquid to the liquid tank according to a preset liquid supply strategy and control the etching environment, and then the robot module designed by automation is used in combination with the vision module to flexibly simulate human hand operation to complete etching according to a preset etching strategy, so that the process can be flexibly changed to meet the flexible and variable scientific research scene.

[0143] 2. The overall full-automatic control is realized, completely replacing manual operation, accurately controlling process parameters, guaranteeing process stability, greatly improving scientific research efficiency, and without the need for manual access to tools and consumables and manual contact with dangerous chemicals, effectively protecting personnel health and safety.

[0144] 3. The liquid medicine module and the robot module are integrated in the working space of the miniaturized machine room, the robot module adopts a top assembly method, and the plurality of liquid medicine modules adopt an arc arrangement method, the overall arrangement structure is optimized, the miniaturized design is realized, the clean room space occupation of the scientific research place is reduced, and the installation and maintenance cost is reduced.

[0145] 4. The etching system capable of independent liquid supply and etching environment control is integrated in the machine system, compared with the enterprise-level centralized liquid supply design, the size reduction is effectively realized, the miniaturized design is realized, the small-size workpiece experiment is compatible, and then the liquid consumption is reduced, the amount of expensive chemicals is reduced, the scientific research cost is greatly saved, and the machine function is more rich.

[0146] 5. The design of the scientific research type wet etching full-automatic system fills the gap of the existing technology in the scientific research field for scientific research wet etching equipment / process research, greatly improves the scientific research efficiency and process stability, has a positive and far-reaching influence on the development of semiconductor scientific research, makes a great technical contribution to the scientific research field, and also provides great help for promoting economic development.

[0147] From the above technical solutions, the scientific research type wet etching full-automatic machine table designed in the embodiment of the present application has the following beneficial effects:

[0148] 1. The liquid supply mechanism designed by automation supplies liquid to the liquid tank according to a preset liquid supply strategy and controls the etching environment, and then the robot module designed by automation flexibly simulates manual operation to complete etching according to a preset etching strategy, so that the process can be flexibly changed to meet the flexible and changeable scientific research scene.

[0149] 2. The robot module is matched with the feeding system capable of automatically feeding materials and the etching system capable of automatically providing liquid, overall automatic control is realized, manual operation is completely replaced, process parameters are accurately controlled, process stability is guaranteed, scientific research efficiency is greatly improved, and personnel health and safety are effectively guaranteed without manual access to tools and consumables and without manual contact with dangerous chemicals.

[0150] 3. Each system module is integrated into the machine body, the overall structure is optimized, the device size is reduced, the miniaturized design is realized, the clean room space occupation of the scientific research place is reduced, and the installation and maintenance cost is reduced.

[0151] 4. The etching system capable of independent liquid supply and etching environment control is designed and integrated in the machine body, compared with the enterprise-level centralized liquid supply design, the size reduction is effectively realized, the miniaturized design is realized, the small-size workpiece experiment is compatible, and then the liquid consumption is reduced, the amount of expensive chemicals is reduced, the scientific research cost is greatly saved, and the machine function is more rich.

[0152] 5、The design of the scientific research type wet etching full-automatic machine fills the blank of the prior art in the field of scientific research for scientific research wet etching equipment / process research, greatly improves the scientific research efficiency and process stability, has a positive and far-reaching influence on the development of semiconductor scientific research, makes a great technical contribution to the field of scientific research, and also provides great help for promoting economic development. BRIEF DESCRIPTION OF DRAWINGS

[0153] In order to more clearly illustrate the technical solutions in the embodiments of the present application or the prior art, the drawings needed to be used in the embodiments or the prior art description will be briefly introduced below. Obviously, the drawings in the following description are only some embodiments of the present application, and other drawings can also be obtained by those skilled in the art without creative labor.

[0154] Fig. 1 is a perspective view of a scientific research type wet etching full-automatic machine provided in the present application;

[0155] Fig. 2 is a sectional view of a scientific research type wet etching full-automatic machine provided in the present application;

[0156] Fig. 3 is a first partial schematic view of a scientific research type wet etching full-automatic machine provided in the present application;

[0157] Fig. 4 is a second partial schematic view of a scientific research type wet etching full-automatic machine provided in the present application;

[0158] Fig. 5 is a first partial sectional view of a scientific research type wet etching full-automatic machine provided in the present application;

[0159] Fig. 6 is a cooperation perspective view of a gripper mechanism and a flower basket frame of a scientific research type wet etching full-automatic machine provided in the present application;

[0160] Fig. 7 is an exploded schematic view of the cooperation of the gripper mechanism and the flower basket frame of the scientific research type wet etching full-automatic machine provided in the present application;

[0161] Fig. 8 is a perspective view of a liquid medicine tank with a heating device design of a scientific research type wet etching full-automatic machine provided in the present application;

[0162] Fig. 9 is a sectional view of a liquid medicine tank with a heating device design of a scientific research type wet etching full-automatic machine provided in the present application;

[0163] Fig. 10 is a perspective view of a liquid medicine tank with a heating device design of a scientific research type wet etching full-automatic machine provided in the present application without a tank cover;

[0164] Figure 11 is a perspective view of a liquid tank without a cover of a scientific wet etching full-automatic machine provided in the present application without a heating device design;

[0165] Figure 12 is a cross-sectional view of a liquid tank without a heating device design of a scientific wet etching full-automatic machine provided in the present application;

[0166] Figure 13 is a schematic diagram of a partial structure of a scientific wet etching full-automatic machine provided in the present application with a conveying device;

[0167] Figure 14 is a schematic diagram of a structure of a conveying device of a scientific wet etching full-automatic machine provided in the present application;

[0168] Figure 15 is a system block diagram of a scientific wet etching full-automatic system provided in the present application;

[0169] In the figure: 1, control system; 2, robot system; 21, robot module; 22, vision module; 3, etching system; 31, liquid module; 32, liquid supply mechanism; 33, liquid supply module; 34, etching environment module; 4, feeding system; 5, human-machine interaction system; 6, timing system; 7, monitoring system; 8, machine system; 9, cleaning system; 100, machine body; 101, support partition; 102, first escape port; 103, first drain hole; 104, water collecting part; 105, second drain hole; 106, fan filter unit; 107, explosion-proof lighting device; 108, spraying moving device; 109, spraying assembly; 110, support cylinder; 111, electric control cantilever; 112, air pressure gauge; 113, temperature gauge; 114, raw liquid chamber; 115, electric control chamber; 116, loading table; 117, observation window; 201, clamping drive assembly; 202, clamping jaw; 203, protective cover; 204, clamping mechanism; 205, basket holder; 206, fixed plate; 207, connecting rod; 208, pressing block; 209, positioning block; 210, handle block; 211, guide slot; 212, positioning protrusion; 213, limiting flange; 214, insertion slot; 301, liquid tank; 302, inner tank body; 303, connecting flange; 304, side wall; 305, liquid chamber; 306, overflow chamber; 307, overflow recovery port; 308, liquid inlet; 309, liquid outlet; 310, liquid outlet valve; 311, heating chamber; 312, heating device; 313, etching end cover; 314, switch driver; 315, cleaning device; 401, first feeding switch cover device; 402, conveying device; 403, plate driver; 404, baffle; 405, first feeding mechanism; 406, second feeding mechanism; 407, first supporting piece; 408, escape notch; 409, second supporting piece; 500, workpiece; 600, small-capacity liquid tank. DETAILED DESCRIPTION

[0170] The technical solutions of the embodiments of the present application will be described clearly and completely below with reference to the drawings. Obviously, the described embodiments are only some of the embodiments of the present application, rather than all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those of ordinary skill in the art without creative work fall within the scope of protection of the present application.

[0171] In the description of the embodiments of the present application, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer" and the like indicate the orientation or positional relationship shown in the drawings, and are only used to facilitate the description of the embodiments of the present application and simplify the description, and do not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as a limitation on the embodiments of the present application. In addition, the terms "first", "second", "third" are only for descriptive purposes, and cannot be understood as indicating or implying relative importance.

[0172] In the description of the embodiments of the present application, it should be noted that unless otherwise explicitly specified and limited, the terms "mounting", "connecting", "connecting" should be understood in a broad sense, for example, it can be fixedly connected, or it can be replaceably connected, or it can be integrally connected, it can be mechanically connected, or it can be electrically connected, it can be directly connected, or it can be indirectly connected through an intermediate medium, it can be the communication inside two elements. For those of ordinary skill in the art, the specific meaning of the above terms in the embodiments of the present application can be understood according to the specific circumstances.

[0173] The present applicant has found through research that:

[0174] The enterprise-level full-automatic wet bench has the following disadvantages:

[0175] 1. It cannot adapt to flexible and variable scientific research scenes, and the operation logic is relatively fixed, and can only complete predetermined simple and repetitive task.

[0176] 2. It is designed for batch production type baskets (4 / 6 / 8 / 12 inches, 25 pieces), and cannot be compatible with small size wafers.

[0177] 3. Large amount of chemical liquid is used, which causes waste, inconvenience in replacement, storage safety and other problems. In scientific research, the amount of chemical liquid used is small (about tens to hundreds of milliliters), the price is high (hundreds to tens of thousands of yuan per liter), and the storage conditions are strict. The enterprise-level full-automatic wet bench is designed for batch production of enterprises (such as solar cell factories), and the consumption of chemical liquid is large. The centralized liquid supply method is used, the storage capacity of the liquid tank is large (20L-1000L), the tank capacity is large (20-50L), and the liquid needs to be replaced regularly (usually 1 day-2 weeks in a factory), which consumes manpower and material resources. Although the amount of chemical liquid can be appropriately saved by reducing the frequency of replacing the chemical liquid, long-term non-replacement will also cause problems such as decrease in cleanliness, evaporation of reagents, and unsafe storage. In particular, high-temperature chemical liquid is usually used in a mixed manner. In addition, the CDS liquid supply needs to pass through a long pipeline, and the pipeline will have residual chemical liquid, which will affect the liquid supply quality if not cleaned regularly. Even if the cleaning tank is pumped from the cache tank, there will be certain temperature loss, concentration loss, and the like. In scientific research, small-capacity chemical liquid barrels (a few hundred milliliters to a few liters) are usually used, which are convenient for personnel to use and do not need to be replaced regularly. The full-automatic wet bench needs to be replaced regularly by professional personnel (with relevant qualifications). Universities usually do not have relevant personnel, and wet bench manufacturers on the market usually do not provide chemical liquid replacement services.

[0178] The manual scientific research operation mode has the following disadvantages:

[0179] 1. Small equipment is needed for assistance, and the operation is not convenient. Usually, a water bath, an ultrasonic cleaner and the like are needed for heating or oscillation. Manual operation is required, which wastes the energy of scientific research personnel.

[0180] 2. The process control is not accurate, and the scientific research efficiency is low. The temperature, liquid concentration, and rotation speed are controlled by simple devices, which are not accurate enough, resulting in low repeatability and affecting the scientific research efficiency.

[0181] In order to better solve the above problems, the embodiments of the present application disclose a scientific research type wet etching full-automatic system, as shown in FIG. 15:

[0182] The system includes a bench system 8, an etching system 3, a feeding system 4, a robot system 2, and a control system 1.

[0183] The bench system 8 is used to provide a miniaturized machine room including an installation space and a working space. It should be noted that the “miniaturized machine room” is a specific term, and it is not limited to how small the machine room is.

[0184] The etching system 3 includes a plurality of chemical liquid modules 31 arranged in an arc line arrangement in the miniaturized machine room. The chemical liquid module 31 includes a chemical liquid tank 301 and a liquid supply mechanism 32. The liquid supply mechanism 32 is used to supply liquid to the chemical liquid tank 301 according to a preset liquid supply strategy and control the etching environment in the chemical liquid tank 301.

[0185] The liquid medicine module 31 improves the conventional single-row parallel arrangement mode to an arc arrangement mode, and more preferably adopts a circumferential arrangement mode, which can save space and make the running track of the robot module 21 more flexible.

[0186] The feeding system 4 is used to realize automatic conveying of the workpiece.

[0187] The robot system 2 comprises a robot module 21 and a vision module 22 in communication connection with the robot module 21; the robot module 21 is arranged on the top of the working space and is used to grab the workpiece according to the image information fed back by the vision module 22 and place the workpiece into the liquid medicine tank 301 to complete etching according to a preset etching strategy.

[0188] The control system 1 is in communication connection with the machine system 8, the feeding system 4, the robot system 2 and the etching system 3, and is used to realize automatic etching operation according to user instructions.

[0189] The embodiment of the scientific research type wet etching full-automatic system designed in the present application has the following beneficial effects:

[0190] 1. The liquid supply mechanism 32 designed by automation is used to supply liquid to the liquid medicine tank 301 according to a preset liquid supply strategy and control the etching environment, and then the robot module 21 designed by automation is used to simulate the operation of human hands flexibly in combination with the vision module 22 to complete etching according to a preset etching strategy, so as to realize flexible change of process and meet flexible and changeable scientific research scenes.

[0191] 2. The whole is realized in full-automatic control, completely replaces manual operation, accurately controls process parameters, guarantees process stability, greatly improves scientific research efficiency, and moreover, does not need manual access to tools and consumables, does not need manual contact with dangerous chemicals, effectively guarantees personnel health and safety.

[0192] 3. The liquid medicine module 31 and the robot module 21 are integrated and arranged in the working space of a miniaturized machine room, the robot module 21 adopts a top assembly mode, and a plurality of liquid medicine modules 31 adopt an arc arrangement mode, the overall arrangement structure is optimized, miniaturized design is realized, clean room space occupation in a scientific research place is reduced, and installation and maintenance costs are reduced. (In a clean room, in order to maintain a hundred-level cleanliness and equipment environment requirements, many means (circulating air, temperature control, anti-microseismic, ultrapure water, etc.) need to be adopted, and the operation and maintenance cost is high. Therefore, saving clean room space occupation can well reduce installation and maintenance costs).

[0193] 4. The etching system 3 that can independently supply liquid and control the etching environment is integrated into the machine system 8. Compared with the enterprise-level centralized liquid supply design, it can effectively achieve size reduction and miniaturization design, and is compatible with small-size workpiece experiments (such as 1cm-2cm small workpieces), thereby reducing the consumption of liquid medicine and the use of expensive chemicals, greatly saving scientific research costs, and having richer functions.

[0194] 5. The design of this fully automated scientific research wet etching system fills the gap in existing technologies in the scientific research field for scientific research wet equipment / process research, greatly improves scientific research efficiency and process stability, and has a positive and far-reaching impact on the development of semiconductor research. It has made significant technical contributions to the scientific research field and provided tremendous support for promoting economic development.

[0195] In a more specific embodiment, the robot module 21 is further configured to grab a cleaning tool and perform a cleaning action based on the image information fed back by the vision module 22. It is understood that:

[0196] Robot module 21 is designed to perform cleaning operations. Specifically, vision module 22 captures images of the interior of the machine room and identifies the locations of dirt within the images. Robot module 21 then grabs cleaning tools and cleans the affected areas. By adding visual recognition capabilities to robot module 21, it can perform targeted cleaning operations within the work area. Combined with vision module 22, robot module 21 not only performs cleaning tasks but also supports extended functions such as work surface organization, in conjunction with 6S management, improving work efficiency.

[0197] If the robot module 21 is not equipped with a cleaning function, a dedicated cleaning system 9 may be provided to perform cleaning operations. The cleaning system 9 may include at least one of a purge cleaning device and a spray cleaning device.

[0198] In a more specific embodiment, the robot module 21 is designed to be able to perform the following actions: grabbing a workpiece for sampling, placing the workpiece into the liquid tank 301 (setting out), and moving the workpiece (transferring). In addition, the robot module 21 is also capable of performing at least one of a telescopic action, a rotation action, and a shaking action. It is understood that:

[0199] 1. The robot module 21 has a telescopic function, that is, it is equipped with a telescopic mechanism or module that can perform telescopic actions, so that the overall telescopic length can be adjusted as needed, thereby making the robot module 21 have a wider coverage range to adapt to different work scenarios and operation requirements.

[0200] 2、Robot module 21 has a shaking function, that is, it is configured with a shaking mechanism or module, and can perform a shaking action, so that the robot module 21 can simulate the action of human hand shaking to realize the shaking, vibration and other etching strategy operations of the workpiece or material, so as to achieve the specific process requirements. Specifically, the robot module 21 can shake the liquid tank 301 or the workpiece at a set frequency and amplitude within a specified time to promote mixing or reaction.

[0201] 3、Robot module 21 has a rotating function, that is, it is configured with a rotating mechanism or module, and can perform a rotating action to realize the etching strategy operation of driving the workpiece to rotate in the liquid tank 301 to complete the specific process step or task. Specifically, the robot module 21 can rotate the liquid tank 301 or the workpiece at a set speed and direction within a specified time to realize stirring and mixing.

[0202] In a more specific embodiment, a timing system 6 is further included; the timing system 6 is used to obtain the running time information of the machine system 8, the feeding system 4, and the robot system 2 and feedback the control system 1, so that the control system 1 can control the machine system 8, the feeding system 4, the robot system 2 and the etching system 3 according to the preset time strategy. For example, through the timing system 6, the robot module 21 / supply liquid mechanism 32, etc. can operate according to the preset time interval, such as adding liquid or sampling at a certain time, etc., to realize stable control of process parameters and time.

[0203] In a more specific embodiment, a human-computer interaction system 5 and a monitoring system 7 are further included;

[0204] The human-computer interaction system 5 is in communication connection with the control system 1, realizes the human-computer interaction between the operator and each system module; for example, it is convenient for the operator to give each system module various execution instructions to control the execution action, function, etc. of each system module, or to obtain various running data of each system module.

[0205] The monitoring system 7 is used to obtain the running data of the machine system 8, the robot system 2, the etching system 3 and the feeding system 4 respectively, and sends an alarm when the running data exceeds the threshold value; the monitoring system 7 is also used to monitor the machine system 8, the robot system 2, the etching system 3 and the feeding system 4 in real time according to the preset monitoring strategy.

[0206] In a more specific embodiment, the liquid supply mechanism 32 includes a liquid supply module 33 and an etching environment module 34.

[0207] The liquid supply module 33 is used to supply the liquid in the small-capacity liquid tank 600 to the liquid tank 301, and has a liquid supply function, a liquid preparation function, and a liquid level control function. It should be noted that "small-capacity liquid tank" is a specific term and is not limited to the size of the tank. Of course, through overall structural optimization, the small size design is achieved, and the small size of the connected small-capacity liquid tank 600 is natural. Small-capacity and small-volume liquid tanks are selected to further save the amount of liquid.

[0208] The etching environment module 34 includes at least one of a heating module, a bubbling module, an ultrasonic vibration module, a cleaning module, a spraying module, and a circulating filtration module. It can be understood that:

[0209] The liquid tank 301 has heating function, bubbling function, ultrasonic vibration function, cleaning function, spraying function, and circulating filtration function under the control of the etching environment module 34. The etching environment control realized based on these functions can be, for example, creating a circulating filtration and spraying environment while heating to a preset temperature, or circulating filtration while bubbling, or bubbling while ultrasonic vibration, or liquid inlet spraying while bubbling, and the like. This strategy can be implemented by the liquid supply mechanism 32 in cooperation with the human-computer interaction system 5, the timing system 6, and the like.

[0210] The liquid tank 301 is provided with an overflow recovery module to have an overflow function.

[0211] The above-mentioned scientific research type wet etching full-automatic system has the advantages of intelligence and miniaturization, can be flexibly applied to various scientific research scenes, improves the scientific research efficiency, saves scientific research resources, ensures the safety of personnel and equipment, and has very good commercial value and economic benefits.

[0212] The embodiment of the present application also discloses a scientific research type wet etching full-automatic machine, which is constructed based on the above-mentioned scientific research type wet etching full-automatic system.

[0213] Please refer to FIG. 1, FIG. 2 and FIG. 15, one embodiment of a scientific research type wet etching full-automatic machine provided in the embodiment of the present application includes:

[0214] Including a machine body 100 and a scientific research type wet etching full-automatic system.

[0215] The scientific research type wet etching full-automatic system is configured on the machine body, and includes a machine system 8, an etching system 3, a feeding system 4, a robot system 2, and a control system 1.

[0216] The machine system 8 is used to provide a miniaturized machine room including an installation space and a working space.

[0217] The etching system 3 comprises a plurality of liquid medicine modules 31 arranged in an arc line manner in a miniaturized machine chamber; the liquid medicine module 31 comprises a liquid medicine tank 301 and a liquid supply mechanism 32; the liquid supply mechanism 32 is used for supplying liquid to the liquid medicine tank 301 according to a preset liquid supply strategy and controlling the etching environment in the liquid medicine tank 301.

[0218] The feeding system 4 is used for conveying the workpiece 500 into the working space and closing the working space after the conveying is completed.

[0219] The robot system 2 comprises a robot module 21 and a vision module 22 in communication connection with the robot module 21; the robot module 21 is arranged at the top of the working space and is used for grabbing the workpiece according to the image information fed back by the vision module 22 and placing the workpiece into the liquid medicine tank 301 to complete the etching according to a preset etching strategy.

[0220] The control system 1 is in communication connection with the machine system 8, the feeding system 4, the robot system 2 and the etching system 3, and is used for realizing automatic etching operation according to the user instruction.

[0221] The scientific research type wet etching full-automatic machine table designed in the embodiment or the combination of the machine table and the modules thereof has all or part of the following beneficial effects:

[0222] 1. The liquid supply mechanism 32 designed in an automatic manner is used for realizing the creation of the etching environment in the liquid medicine tank according to a preset liquid supply strategy, and the robot module 21 designed in an automatic manner is used for flexibly simulating the manual operation to complete the etching according to a preset etching strategy, so that the process can be flexibly changed to meet the flexible and changeable scientific research scene.

[0223] 2. The robot module 21 is matched with the feeding system 4 capable of automatically conveying materials and the etching system 3 capable of automatically providing liquid medicine, so that the overall automatic control can be realized, the manual operation is completely replaced, the process parameters are accurately controlled, the process stability is guaranteed, the scientific research efficiency is greatly improved, and in addition, the tools and consumables do not need to be manually taken, and the dangerous chemicals do not need to be manually contacted, so that the health and safety of personnel are effectively guaranteed.

[0224] 3. Furthermore, according to the commonly used process in scientific research, each system module is integrated into the machine table body 100, the overall structure is optimized, the equipment size is reduced, the miniaturized design is realized, the clean room space which is precious for scientific research is avoided to be occupied, and meanwhile, the placement position is conveniently and flexibly adjusted, the personnel use conflict is avoided, in order to realize the flexible movement, the pulley device and the fixing device are arranged at the bottom of the machine table body 100 and are added with the corrosion-resistant seat, the height can be adjusted and locked, the machine table body 100 can be fixed and locked with the ground, the shaking and shaking caused by the work of the robot module 21 is avoided. When a plurality of machine table bodies 100 are used, different processes can be performed on different machine table bodies 100, and one detachable and replaceable etching system 3 is reserved for each machine table body 100, so as to improve the use flexibility.

[0225] 4. Design an etching system 3 that can independently supply liquid and control the etching environment and integrate it into the machine body 100. Compared with the enterprise-level centralized liquid supply design, it effectively achieves size reduction, realizes miniaturization design, is compatible with small-size workpiece experiments, and thus reduces liquid consumption, reduces the use of expensive chemicals, greatly saves scientific research costs, and makes the machine body 100 more functional.

[0226] 5. The design of this fully automated scientific research wet etching machine fills the gap in existing technology in the scientific research field for scientific research wet equipment / process research, greatly improves scientific research efficiency and process stability, and has a positive and far-reaching impact on the development of semiconductor research. It has made significant technical contributions to the scientific research field and provided tremendous support for promoting economic development.

[0227] The above is Example 1 of a scientific research-type wet etching fully automated machine provided in the embodiments of the present application. The following is Example 2 of a scientific research-type wet etching fully automated machine provided in the embodiments of the present application. Please refer to Figures 1 to 15 for details.

[0228] Based on the solution of the first embodiment of the above-mentioned scientific research wet etching fully automated machine:

[0229] In a more specific embodiment, the robot module 21 is designed to be able to perform the following actions: grabbing a workpiece for sampling; placing a workpiece into the liquid tank 301 for sampling; and moving and transporting the workpiece; and can also perform at least one of a telescopic action, a rotational action, and a shaking action. It is understood that:

[0230] 1. The robot module 21 has a telescopic function, that is, it is equipped with a telescopic mechanism or module that can perform telescopic actions, so that the overall telescopic length can be adjusted as needed, thereby making the robot module 21 have a wider coverage range to adapt to different work scenarios and operation requirements.

[0231] 2. Robot module 21 has a shaking function, that is, it is equipped with a shaking mechanism or module that can perform a shaking action. This allows robot module 21 to simulate the shaking of a human hand to implement etching strategies such as shaking and vibrating the workpiece or material, thereby meeting specific process requirements. Specifically, robot module 21 can shake the solution tank 301 or the workpiece at a set frequency and amplitude within a specified time to promote mixing or reaction.

[0232] 3. Robot module 21 has a rotation function, that is, it is equipped with a rotation mechanism or module that can perform a rotational action, implementing an etching strategy operation that rotates the workpiece in the solution tank 301 to complete a specific process step or task. Specifically, robot module 21 can rotate the solution tank 301 or the workpiece at a set speed and direction within a specified time to achieve stirring and mixing.

[0233] Since the operating environment where the robot module 21 is located involves flammable and explosive dangerous goods such as acid, alkali, and organic matter, therefore, the explosion-proof and corrosion-proof design of the robot module 21 should be good enough, in terms of safety explosion-proof design enhancement, explosion-proof materials and explosion-proof devices can be used in the structure and electrical system of the robot module 21 to ensure that there will be no fire or explosion accident in the flammable and explosive environment. In terms of corrosion resistance performance enhancement design, corrosion-resistant materials or special coating treatment are used on the shell and key components of the robot module 21 to prevent corrosive substances such as acid and alkali from causing damage to the robot module 21.

[0234] The robot module 21 designed in this application has the functions of grabbing workpieces 500 (sampling), placing workpieces 500 into the chemical solution tank 301 (sampling), and moving workpieces 500 (conveying). Among them, sampling and sampling are designed in two ways:

[0235] The first way is to extract the basket rack 205 containing the workpieces 500 for sampling. The basket rack 205 is adaptively designed according to the size of the workpieces 500 to be tested to meet the requirements of containing small-sized workpieces 500.

[0236] The second way is to directly grab the workpieces 500 from the tooling for sampling. This way has the following characteristics: 1. It adopts a two-sided clamping method to ensure that it does not affect the surface of the workpiece 500 and can stably and flexibly clamp 1cm-2cm square pieces. 2. The control accuracy of the force is 0.01N to ensure that the pieces are not easily broken. 3. It realizes the functions of sampling, sampling, and conveying samples.

[0237] Both of these sampling methods can meet the sampling needs in different scenarios, and the processing capacity for small-sized wafers and other workpieces 500 has also been further improved.

[0238] The robot module 21 is automatically controlled by the control system 1 to control the positioning accuracy and conveying speed of sampling, effectively solve the process problems such as glue coating uniformity, temperature change, corrosion time control, and improve the process stability.

[0239] The robot module 21 can also be designed with cleaning function to clean the working area inside the machine body 100:

[0240] Cleaning control method one: the robot module 21 grabs a cleaning tool and cleans the upper chamber according to the preset cleaning track. Specifically, it can grab a cleaning tool with a dust-free paper / cloth to simulate a wiping action with a human hand for cleaning. The robot module 21 can be configured with the ability to suck the cleaning tool.

[0241] The second cleaning control mode: the vision module 22 acquires images of the inside of the machine room and identifies the positions of dirt in the images; the robot module 21 picks up the cleaning tool and cleans the positions of dirt. By adding the vision recognition function to the robot module 21, the robot module 21 can perform targeted cleaning operations on the working area. The robot module 21 combined with the vision module 22 can not only realize cleaning work, but also cooperate with 6s management to arrange the workbench and perform other extended functions to improve work efficiency.

[0242] The setting of the vision module also makes the interconnection between the robot module 21 and the feeding system 4 and the etching system 3 more accurate, realizes highly intelligent operation, and improves production efficiency and precision.

[0243] The robot module 21 in the first and second cleaning control modes can also be a robot module that is independently added for cleaning, realizing a double-robot-module design.

[0244] In a more specific embodiment, a timing system 6 is further included, which is used to acquire the running time of the robot module 21 and control the running of the robot module 21 according to a preset running time strategy. It can be understood that the timing system 6 enables the robot module 21 / liquid supply mechanism, etc. to operate at preset time intervals, such as adding reagent or taking samples at a preset time, to realize stable control of process parameters and time.

[0245] In a more specific embodiment, if the robot module 21 is not configured with a cleaning function, a dedicated cleaning system 9 can be added and arranged on the machine table body 100, which is used to clean the inside of the machine room. The cleaning system 9 includes at least one of a blowing cleaning device and a spraying cleaning device, and specific implementations are, for example, nitrogen blowing cleaning, spraying cleaning, etc.

[0246] In a more specific embodiment, a human-computer interaction system 5 and a monitoring system 7 are further included.

[0247] The human-computer interaction system 5 is in communication connection with the control system 1, realizing human-computer interaction between the operator and each system module; for example, the operator can give each system module various execution instructions to control the execution actions, functions, etc. of each system module, or acquire various running data of each system module.

[0248] As shown in FIG. 1, the human-computer interaction system 5 of the present application includes an electric control cantilever 111 fixed on the machine table body 100, and / or a remote control terminal, etc.

[0249] The monitoring system 7 is configured to acquire operation data of the machine system 8, the robot system 2, the etching system 3 and the feeding system 4 respectively, and send an alarm when the operation data exceeds a threshold value; the monitoring system 7 is also configured to perform real-time monitoring on the machine system 8, the robot system 2, the etching system 3 and the feeding system 4 according to a preset monitoring strategy.

[0250] The monitoring system 7 is composed of various sensors, such as a temperature sensor for detecting the temperature of the liquid tank 301, a liquid level sensor for detecting the amount of liquid in the liquid tank 301, an air pressure sensor for detecting the air pressure in the working area of the machine chamber, etc. As shown in FIG. 1, the front of the machine body 100 can be provided with an air pressure gauge 112 and a temperature gauge 113.

[0251] In a more specific embodiment, the liquid supply mechanism 32 includes a liquid supply module 33 and an etching environment module 34.

[0252] The liquid supply module 33 is configured to supply the liquid in the small-capacity liquid tank 600 to the liquid tank 301, and has the functions of liquid supply, liquid preparation and liquid level control. It should be noted that "small-capacity liquid tank" is a specific term and is not limited to the size of the tank. Of course, through the overall structural optimization, the small size design is realized, and the size of the connected small-capacity liquid tank 600 is naturally small. The selection of a small-capacity small-volume small liquid tank further saves the amount of liquid.

[0253] The etching environment module 34 includes at least one of a heating module, a bubbling module, an ultrasonic vibration module, a cleaning module, a spraying module and a circulating filtration module. It can be understood that:

[0254] The liquid tank 301 has the functions of heating, bubbling, ultrasonic vibration, cleaning, spraying and circulating filtration under the control of the etching environment module 34. The etching environment control realized based on these functions can be, for example, creating a circulating filtration and spraying environment while heating to a preset temperature, or circulating filtration while bubbling, or bubbling while ultrasonic vibration, or spraying while bubbling, etc. This strategy can be implemented by the liquid supply mechanism 32 in cooperation with the man-machine interaction system 5 and the timing system 6.

[0255] The liquid tank 301 is provided with an overflow recovery module to have the function of overflow.

[0256] Based on the above scheme, the automatic scientific research scene of the present application can realize:

[0257] 1. After the robot module 21 recognizes the size and position of the workpiece 500 through the vision module 22 , it moves to the corresponding position and grabs the workpiece 500 , and then places the workpiece 500 into the corresponding liquid tank 301 .

[0258] 2. When the workpiece 500 is immersed in the liquid medicine tank 301, the robot module 21 can shake or rotate the workpiece 500 in the liquid medicine tank 301 at preset intervals under the control of the timing system 6, and detect the fragmentation through feedback from the vision module 22 or other sensor modules.

[0259] This application can interconnect the robot module 21 with the automation function module on the machine body 100 to achieve human-machine interconnection and high intelligence. Specifically, the following functions can be achieved:

[0260] 1. Human-machine Interaction: The robot module 21 interacts with personnel in real-time, exchanging data and transmitting commands. Personnel can monitor the operating status of the robot module 21 and the machine body 100 through a monitoring system 7 comprised of a computer or mobile device, and view experimental data and results in real time. The robot module 21 can communicate with personnel and conduct operations through a human-machine interaction system 5 comprised of voice or touchscreen interfaces.

[0261] 2. Automated operation: The robot module 21 can be responsible for various operations, such as sampling, adding liquid, stirring, heating, etc. Equipped with sensors and a vision module 22, the robot module 21 can monitor and identify the experimental environment and the status of the workpiece 500, thereby automatically adjusting and making decisions.

[0262] 3. Intelligent Decision-Making: The robot module 21 can automatically analyze experimental data and make corresponding decisions based on pre-set processes and algorithms. For example, it can automatically adjust reaction conditions and dosage based on real-time parameters such as temperature and drug concentration to achieve the optimal reaction effect.

[0263] 4. Automatic fault diagnosis and maintenance: The robot module 21 can monitor the operating status of the entire wet bench through the monitoring system 7, promptly detecting and reporting potential faults. When a fault occurs, the robot module 21 can automatically stop operation and provide a preliminary analysis of the cause of the fault and recommended repair methods.

[0264] In a more specific embodiment, as shown in FIG. 2, the robot module 21 is a multi-axis collaborative robot, specifically a six-axis collaborative robot. Traditional modular robots or industrial robots, although having strong load capacity and large working range, are not as flexible and intelligent as collaborative robots in terms of action, running track, operation logic and function, and cannot adapt to flexible scientific research scenarios. Industrial robot modules are usually pre-programmed with motion tracks, and the action and operation logic are relatively fixed, and can only complete predetermined simple repetitive tasks. Collaborative robots, through human-computer interaction, can sense the surrounding environment in real time through sensors, and can autonomously decide and adjust the motion track and action according to the task changes and actual situation, have higher flexibility and adaptability, and can realize more complex tasks. Therefore, the robot module 21 of the present application is designed as a collaborative robot.

[0265] For the preset etching strategy, it can be summarized as a time / state change strategy for the workpiece 500 in the created etching environment, for example:

[0266] 1. Immersion time strategy, which can be continuous immersion within a certain time range or immersion at certain time intervals. This strategy can be implemented by the robot module 21 in cooperation with the extension mechanism and the timing system 6, etc.

[0267] 2. Static state strategy, which can be a specific state change within a certain time range, for example, during the static process, the workpiece 500 is subjected to a set frequency of shaking or a set speed of rotation every certain period of time. This strategy can be implemented by the robot module 21 in cooperation with the timing system 6, the shaking mechanism and the rotating mechanism, etc.

[0268] Of course, it is not limited to the above control strategy, and those skilled in the art can change the control strategy according to the actual process needs without limitation.

[0269] In a more specific embodiment, as shown in FIG. 3 and FIG. 4, the miniaturized machine chamber is provided with a support partition plate 101, which divides the miniaturized machine chamber into an upper chamber and a lower chamber.

[0270] The robot module 21 is installed at the top of the upper chamber, which is aesthetically pleasing and space-saving.

[0271] In a more specific embodiment, the liquid tank 301 is a plurality of circumferentially arranged in the lower chamber, which improves the conventional single-row parallel arrangement to a circumferential arrangement, which can save space and make the running track of the robot module 21 more flexible.

[0272] The support partition plate 101 is provided with a first avoiding opening 102 corresponding to each liquid tank 301.

[0273] Compared with the enterprise-level wet bench design, the design layout of the present application can reduce a certain number of liquid tanks 301, realize the reduction of the size of the equipment, facilitate the use of the user, and at the same time improve the utilization rate of the equipment. On the basis of the design of the reduced size of the equipment, that is, the capacity of the liquid tank 301 can be reduced, compared with the enterprise-level wet bench design, the use amount of liquid can be greatly saved.

[0274] In a more specific embodiment, for the layout design of the machine body 100, an electric control room 115 and a stock solution room 114 for storing small-capacity liquid tanks 600 as shown in FIG. 2 can be arranged in the space below the miniaturized machine chamber in the machine body 100. The controller of the robot module 21, the controller of the conveying device 402, and the controller of the etching system 3 are all installed in the electric control room 115. All electrical appliances and lines that may come into contact with liquid mist are subjected to PFA corrosion-resistant isolation treatment.

[0275] In a more specific embodiment, as shown in FIG. 3, the machine system 8 further comprises a fan filter unit 106 / FFU, and the fan filter unit 106 is provided with a high-efficiency filtering device.

[0276] Taking the arrangement of the robot module 21 on the top of the upper chamber as an example, in order to avoid the installation of the robot module 21 and to free up more space, the fan filter unit 106 can be designed in two parts and arranged in a spaced manner.

[0277] The machine body 100 is provided with an air outlet and an air inlet communicating with the upper chamber, and the fan filter unit 106 is installed on the machine body 100 and connected with the air inlet. The fan filter unit 106 is used to ensure that the control quality of the operating area of the robot module 21 meets the cleanliness level 100 requirement.

[0278] In a more specific embodiment, nitrogen guns and pure water guns are respectively arranged on the left and right sides of the front part of the upper chamber. The water guns are designed to drip and flow with live water, which facilitates the cleaning of fragile workpieces 500.

[0279] In a more specific embodiment, an automatic fire extinguishing system is also designed. The automatic fire extinguishing system is provided with smoke sensors, temperature sensors, and open flame sensors. The automatic fire extinguishing system is designed to work even when the power is off.

[0280] In a more specific embodiment, as shown in FIG. 1, the machine system 8 further comprises an explosion-proof lighting device 107 installed on the machine body 100 for illuminating the upper chamber.

[0281] The machine body 100 is provided with an observation window 117 for observing the upper chamber, so as to facilitate the observation of the operation of the robot module 21. At the same time, the machine body 100 is provided with an automatic up-and-down safety door, and the automatic up-and-down safety door is provided with a misoperation alarm device to ensure personnel safety.

[0282] In a more specific embodiment, as shown in FIG. 4, the design of the spray cleaning device is taken as an example, and specifically includes a spray assembly 109 and a spray moving device 108; the spray moving device 108 is installed in the upper chamber and connected with the spray assembly 109 for driving the spray assembly 109 to move. The spray moving device 108 can be two sets of linear displacement modules, which are symmetrically arranged at the two side edge positions of the support partition plate 101, and the respective driving ends are connected with the spray assembly 109 respectively to drive the spray assembly 109 to reciprocate above the support partition plate 101. The spray assembly 109 is a spray pipe, and a plurality of nozzles are arranged on the spray pipe to clean the workbench on the support partition plate 101 by spraying water.

[0283] In order to facilitate drainage, a plurality of first drainage holes 103 are formed on the support partition plate 101, and a main drainage pipe is arranged in the lower chamber to communicate with the outside of the machine body 100, so that the dirty water drained through the first drainage holes 103 is discharged out of the machine body 100 through the main drainage pipe.

[0284] In a more specific embodiment, as shown in FIG. 4, in order to avoid water accumulation on the support partition plate 101, a water collecting portion 104 is arranged in the middle of the support partition plate 101 to collect the accumulated water, and then the water is discharged through the second drainage hole 105 arranged on the water collecting portion 104. The support partition plate 101 can be designed to have a certain inclination from the periphery to the center, or the whole can be designed to have a certain inclination to one position, so as to achieve better water collection and drainage effect, and the specific design is not limited.

[0285] In a more specific embodiment, as shown in FIG. 5, in order to avoid the water leaked through the first drainage hole 103 from affecting some electric control devices, control elements or line pipes, a support cylinder 110 connected with the support partition plate 101 is arranged in the middle of the lower chamber, and the support cylinder 110 has an independent control distribution chamber, and the designed support cylinder 110 can also support and reinforce the support partition plate 101.

[0286] In this application, the second drainage hole 105 is designed to communicate with the control distribution chamber, and in order to avoid the water leaked through the second drainage hole 105 from affecting the components inside the control distribution chamber, a branch drainage pipe connected with the second drainage hole 105 is arranged in the control distribution chamber, and the end of the branch drainage pipe away from the second drainage hole 105 extends out of the support cylinder 110, and specifically can directly extend out of the machine body 100.

[0287] In a more specific embodiment, as shown in FIG. 6, in order to achieve the grasping of the workpiece 500, the robot module 21 is connected with a flower basket clamping jaw mechanism 204 for grasping the flower basket rack 205, and for this purpose, a flower basket rack 205 for containing the workpiece 500 is further included, and the flower basket rack 205 is grasped / released by the flower basket clamping jaw mechanism 204.

[0288] For the design of the flower basket clamping jaw mechanism 204, it specifically includes a clamping driving assembly 201 and two clamping jaw pieces 202, the clamping driving assembly 201 is connected with the two clamping jaw pieces 202 for driving the two clamping jaw pieces 202 to open / close to clamp the flower basket rack 205.

[0289] In order to achieve better explosion-proof and corrosion-proof effect, the explosion-proof and corrosion-proof protective cover 203 is sleeved on the clamping driving assembly 201.

[0290] In a more specific embodiment, as shown in FIG. 6 and FIG. 7, the flower basket rack 205 of the present application is designed for the containing needs of small-sized workpieces 500, and the design specification is suitable for, for example: 4 / 6 inch workpieces 500 and 1cm-2cm square scattered piece workpieces 500.

[0291] Taking the design suitable for 4 / 6 inch workpieces 500 as an example:

[0292] The flower basket rack 205 specifically includes two fixed plates 206.

[0293] The two fixed plates 206 are arranged in parallel and spaced apart, and are fixedly connected through a plurality of connecting rods 207, and the connecting rods 207 and the two fixed plates 206 form a containing cavity for containing the workpiece 500; the workpiece 500 can enter from the two fixed plates 206 and be placed in the formed containing cavity, and the limiting action of the fixed plate 206 and the connecting rod 207 is used to realize the fixation.

[0294] In order to facilitate the clamping of the clamping jaw piece 202, a handle block 210 is fixedly connected at the top position between the two fixed plates 206, and guide clamping grooves 211 are arranged on both sides of the handle block 210, and positioning protrusions 212 are arranged on the clamping surfaces of the two clamping jaw pieces 202, which are capable of being clamped into the guide clamping grooves 211, and the positioning protrusions 212 and the guide clamping grooves 211 are used to realize the reliable connection between the clamping jaw piece 202 and the handle block 210.

[0295] At the same time, the bottom of the clamping jaw piece 202 is provided with a limiting flange 213 which can contact and abut against the bottom of the handle block 210, and the limiting flange 213 can clasp the handle block 210 to avoid falling.

[0296] In a more specific embodiment, taking the design suitable for 1cm-2cm square scattered piece workpieces 500 as an example:

[0297] The flower basket frame 205 comprises a bottom plate and two fixed plates 206 as shown in FIG. 6 and FIG. 7.

[0298] The two fixed plates 206 are arranged in parallel and spaced apart at the top of the fixed plate 206. A handle block 210 is fixedly connected between the two fixed plates 206 at the top. The handle block 210 is provided with a guide clamping groove 211 on both sides.

[0299] A plurality of limiting rods are fixed between the two fixed plates 206 on the bottom plate, and the adjacent limiting rods and the bottom plate form a containing cavity for containing the workpiece 500. The difference between this design scheme and the above-mentioned design scheme suitable for 4 / 6 inches is the formation of the bottom plate and the containing cavity. Those skilled in the art can make changes and design according to needs, without limitation.

[0300] In a more specific embodiment, as shown in FIG. 6 and FIG. 7, in the above-mentioned two flower basket frame 205 design schemes, the two fixed plates 206 are each fixed with a positioning block 209 on the side facing each other. The positioning block 209 can be L-shaped. A pressing block 208 for pressing the workpiece 500 is movably inserted between the two positioning blocks 209. The pressing block 208 is provided with a gap on both sides, which can be used for the vertical block part of the positioning block 209 to move through. The horizontal block part of the positioning block 209 can play a limiting role, avoiding the downward sliding of the installed pressing block 208 out of the positioning block 209. In this design, the pressing block 208 can be adjusted up and down, and can be flexibly adjusted according to the size of the contained workpiece 500, realizing the pressing effect of workpieces 500 of various sizes, avoiding the floating and falling of the workpiece 500 when immersed in the liquid medicine, and ensuring the stability and safety of the small-size workpiece 500 in the flower basket frame 205. The positioning block 209 can be designed to be adjustable in the upper and lower installation positions, so that the application range of the pressing block 208 is wider.

[0301] In a more specific embodiment, in order to better position and fix the workpiece 500, as shown in FIG. 7, the connecting rod 207 and the limiting rod are each provided with a slot 214 for clamping the workpiece 500.

[0302] In a more specific embodiment, for the liquid supply mechanism 32 design, it comprises a liquid feeding device and a liquid discharging device for forming a liquid supply module 33.

[0303] The liquid feeding device comprises a pump liquid pipe and a liquid pump.

[0304] The pump liquid pipe is connected to the liquid tank 301 at one end and to the small-capacity liquid tank 600 at the other end, and is designed for a vial; the liquid pump is installed on the pump liquid pipe and used to pump the liquid in the small-capacity liquid tank 600 into the liquid tank 301 according to a preset liquid supply strategy, and the liquid in the small-capacity liquid tank 600 is directly pumped into the liquid tank 301 by the liquid pump. One small-capacity liquid tank 600 corresponds to one pump liquid pipe, and each pump liquid pipe corresponds to one liquid pump, and one small-capacity liquid tank 600 can supply liquid to multiple liquid tanks 301.

[0305] The liquid discharge device includes a liquid discharge pipe and a liquid discharge valve 310, and the liquid discharge pipe is connected to the liquid tank 301.

[0306] The liquid discharge valve 310 is connected to the liquid discharge pipe and used to control the flow of the liquid discharge pipe according to a preset liquid supply strategy.

[0307] The liquid tank 301 is provided with a liquid level sensor for detecting the liquid level of the liquid, and the design can realize dynamic change of the liquid level and adjust the liquid level according to the etching requirements of different workpieces.

[0308] The liquid pump can be a pneumatic diaphragm pump, which is a small-flow pump. By directly pumping the liquid into the liquid tank 301, the pumping time can be greatly shortened, and the waste of residual liquid in the pipeline can be reduced.

[0309] In the design, a centralized liquid supply port can be reserved for use in batch preparation.

[0310] According to the process requirements, each liquid tank 301 corresponds to multiple small-capacity liquid tanks 600 with different liquids, which realizes direct mixing operation in the liquid tank 301. For liquids with violent reactions, a separate mixing tank can be added, and by setting the parameters of the liquid pump, the solution ratio and dosage can be accurately controlled to realize automatic liquid preparation. The small-capacity liquid tank 600 is designed as a small-capacity bottle, and through small-capacity and small-volume design, the amount of liquid can be further saved.

[0311] In a more specific embodiment, as shown in FIGS. 9 and 12, the liquid tank 301 is designed with a liquid chamber 305 and an overflow chamber 306 for forming an overflow module.

[0312] The liquid chamber 305 is used to accommodate the liquid supplied by the liquid supply mechanism 32 and to accommodate the workpiece 500, and the overflow chamber 306 is used to receive the overflow liquid from the liquid chamber 305.

[0313] The overflow chamber 306 is provided with an overflow recovery port 307, the chemical liquid chamber 305 is provided with a liquid inlet port 308 connected to a pump liquid pipe, and a liquid outlet port 309 connected to a liquid discharge pipe, and the liquid discharge valve 310 can be a quick discharge valve. The liquid level sensor for detecting the liquid level mentioned above is arranged in the chemical liquid chamber 305, based on which the liquid level can be automatically controlled, the amount of chemical liquid is saved, and the safety of the equipment is protected. Before the basket rack 205 containing workpieces 500 of different sizes is placed, the liquid level can be set to different heights according to the size of the workpieces 500 and the size of the basket rack 205, and then the liquid level in the chemical liquid chamber 305 is monitored in real time by the liquid level sensor and fed back to the control system 1, the control system 1 controls the pump-in amount of the chemical liquid pump or controls the opening and closing degree of the liquid discharge valve 310, so as to keep the liquid level within the set range, realize precise and stable control of the liquid level.

[0314] In a more specific embodiment, as shown in FIGS. 8-11, the chemical liquid tank 301 specifically includes an inner tank body 302.

[0315] The inner tank body 302 is open at the top to form an immersion inlet, the inner space of the inner tank body 302 forms a chemical liquid chamber 305, and the bottom is provided with a positioning structure for positioning the basket rack 205.

[0316] A connecting flange 303 is annularly arranged on the outer periphery of the inner tank body 302, the top surface edge of the connecting flange 303 is connected with a side wall 304, and the side wall 304 and the top surface of the connecting flange 303 and the outer periphery of the inner tank body 302 form an overflow chamber 306. The inner tank body 302, the connecting flange 303 and the side wall 304 are connected and fixed by welding, and the specific preparation material is adaptively selected and matched according to the different chemical liquids stored. The structure of the chemical liquid tank 301 of the present application is designed to be compatible with 4 / 6-inch workpieces 500 and 1cm-2cm small piece workpieces 500, and 1.3L and 130mL small capacity chemical liquid tanks 301, which can greatly save the use amount of chemical liquid.

[0317] In a more specific embodiment, as shown in FIG. 9, the liquid supply mechanism 32 further includes a heating device 312 for forming a heating module, which is used to heat the chemical liquid in the chemical liquid chamber 305 according to a preset liquid supply strategy. Not all chemical liquid tanks 301 are equipped with heating devices 312, and the specific configuration can be flexible according to the needs, for example, the chemical liquid in some chemical liquid tanks 301 does not need to be heated, and the heating device 312 can not be configured.

[0318] In a more specific embodiment, the heating device 312 can be designed for direct heating or water bath heating. For flammable and explosive organic chemical liquids, water bath heating design is safer, as shown in FIG. 9, the chemical liquid tank 301 further includes an outer tank body.

[0319] The inner tank 302 extends to the bottom of the outer tank, and the connecting flange 303 is connected with the outer tank, so that the connecting flange 303, the outer tank and the inner tank 302 form a heating chamber 311. The outer tank is provided with a medium input pipe and a medium output pipe which communicate with the heating chamber 311. The heating device 312 is installed in the heating chamber 311 and is used for heating the heat-conducting medium in the heating chamber 311. The heat-conducting medium can be conventional water or heat-conducting oil, and is not limited in particular. The heating device 312 can be an electric heating pipe or an electric heating wire. A temperature sensor can be arranged in the heating chamber 311, which is used for detecting the temperature of the heat-conducting medium and feeding back to the control system 1, so that the control system 1 can accurately control the heating temperature of the liquid medicine chamber 305 by controlling the power of the heating device 312.

[0320] In a more specific embodiment, the liquid supply mechanism 32 further comprises a circulating device for forming a circulating filtering module or a circulating spraying device for forming a spraying module. The circulating device is used to extract the liquid medicine in the liquid medicine chamber 305 according to a preset liquid supply strategy, and then send it back to the liquid medicine chamber 305 after filtering. The circulating spraying device is used to extract the liquid medicine in the liquid medicine chamber 305 according to a preset liquid supply strategy, and then send it back to the liquid medicine chamber 305 in a spraying manner after filtering.

[0321] By increasing the circulating device, the liquid medicine is circulated, so that the liquid medicine in the liquid medicine chamber 305 is in a flowing state, and more fully contacts the workpiece 500, thereby improving the cleaning and etching effect. The circulating device can specifically include a circulating pump, a circulating conveying pipe and a filtering device. The input end of the circulating pump is connected with the filter and connected with one side of the liquid medicine chamber 305 through the circulating conveying pipe. The output end of the circulating pump is connected with the other side of the liquid medicine chamber 305 through the circulating conveying pipe.

[0322] The circulating spraying device is different from the circulating device in the backflow mode. The circulating spraying device specifically can include a circulating pump, a circulating conveying pipe, a spraying head and a filtering device.

[0323] Of course, for the spraying design, it can also be that one end of the pump liquid pipe is connected with the spray head to realize the spraying function, that is, the liquid is fed in a spraying manner.

[0324] In a more specific embodiment, the liquid supply mechanism 32 further comprises a bubbling device for forming a bubbling module. The bubbling device is used to bubble the liquid medicine in the liquid medicine chamber 305 according to a preset liquid supply strategy, so as to realize the bubbling function of the liquid medicine tank 301.

[0325] In a more specific embodiment, the etching system 3 further includes a cleaning device 315, which is used to clean the workpiece 500 in the chemical solution chamber 305. The cleaning device 315 can be designed as two, specifically a spray pipe design. The two cleaning devices 315 can be symmetrically installed on the chemical solution tank 301 as shown in Figure 10 and arranged toward the chemical solution chamber 305. One of the cleaning devices 315 can be connected to a nitrogen tank via a sprayer, while the other cleaning device 315 can be connected to a pure water tank via a sprayer.

[0326] In a more specific embodiment, as shown in FIG8 , the etching system 3 further includes an etching switch cover device, which is used to control the opening and closing of the immersion inlet of the liquid medicine chamber 305. The etching switch cover device is designed to include an etching end cover 313 and a switch driver 314. One side of the etching end cover 313 is hinged to one side of the inner tank body 302 via a rotating shaft, and the switch driver 314 is installed on the liquid medicine tank 301 and connected to the rotating shaft, and is used to drive the rotating shaft to rotate, thereby controlling the opening and closing of the etching end cover 313. The design of the etching switch cover device can improve data accuracy and ensure personnel safety.

[0327] The design of the automatically controlled etching switch cover device can improve operational efficiency and reduce the direct contact between operators and harmful substances. At the same time, the etching switch cover device can be interconnected with the control system 1. For example, when the monitoring system 7 detects an abnormality in the equipment, the etching switch cover device is controlled to close the liquid tank 301. The switch driver 314 can be designed as a pneumatic telescopic cylinder, which drives the rotating shaft to rotate through a connecting rod mechanism. According to process and safety requirements, the timing and frequency of automatically opening and closing the etching end cover 313 can be set, thereby improving the reliability, efficiency and safety of scientific research experiments.

[0328] In a more specific embodiment, the liquid supply mechanism 32 further includes an ultrasonic instrument for vibrating the liquid chamber 305 according to a preset liquid supply strategy.

[0329] The etching system 3 listed in this application has the functions of spraying, circulating filtration spraying, heating, circulating filtration, automatic liquid preparation, vibration, bubbling, overflow, etc., which can be configured on the corresponding liquid tank 301 according to process requirements.

[0330] For example, taking the design of the 301 chemical tank for acetone / IPA / EKC as an example, it can be equipped with spraying, circulating filtration spraying, heating, and circulating filtration functions, and the tank structure material can be SUS316L; taking the design of the 301 chemical tank for DIW as an example, it can be equipped with circulating filtration spraying, bubbling, overflow, and quick discharge, and the tank structure material can be NPP.

[0331] For the preset liquid supply strategy, it can specifically be an etching environment + liquid supply strategy, for example:

[0332] The liquid supply strategy can be liquid supply amount control, liquid dispensing control strategy.

[0333] The etching environment strategy can be a strategy of changing the etching environment by creating a circulating filtration spray while heating to a preset temperature, or circulating filtration while bubbling, or bubbling while ultrasonic vibration, or liquid inlet spray while bubbling, etc. This strategy can be implemented by the liquid supply mechanism 32 in cooperation with the human-computer interaction system 5, the timing system 6, etc.

[0334] In a more specific embodiment, as shown in FIG. 13, for the design of the feeding system 4, it includes a conveying device 402 and a first feeding switch cover device 401.

[0335] The conveying device 402 is used to convey the workpiece 500 from a standby position outside the machine body 100 to a feeding position in the machine chamber; as shown in FIG. 1, the standby position outside the machine body 100 is provided with a loading table 116 for placing the workpiece 500 to be tested or a basket rack 205 containing the workpiece 500.

[0336] The machine body 100 is provided with a feeding opening communicating with the machine chamber and through which the conveyed workpiece 500 passes, and the first feeding switch cover device 401 is used to control the opening and closing of the feeding opening. The first feeding switch cover device 401 includes a baffle 404 and a baffle driver 403; the baffle 404 can be slidingly installed on the machine body 100 and used to shield the feeding opening, and the baffle driver 403 can be a telescopic air cylinder connected with the baffle 404 and driving the baffle 404 to extend and retract to realize opening and closing control. Before feeding, the feeding opening is opened, and after feeding is completed, the feeding opening is closed.

[0337] In a more specific embodiment, as shown in FIG. 14, taking the design of the aforementioned support partition 101 as an example, the feeding system 4 further includes a second feeding switch cover device.

[0338] The conveying device 402 can be specifically installed in the lower chamber, and in order to avoid being affected by the water leaking through the first drainage hole 103 when installed in the lower chamber, the lower chamber can also be designed with a separate installation chamber for installing the conveying device 402.

[0339] The conveying device 402 includes a first feeding mechanism 405 and a second feeding mechanism 406.

[0340] The support partition 101 is provided with a second avoiding opening for the workpiece 500 to enter the upper chamber, and the second avoiding opening communicates with the installation chamber.

[0341] The first feeding mechanism 405 is used for conveying the workpiece 500 from the standby position to the transfer position in the lower chamber, and the second feeding mechanism 406 is used for conveying the workpiece 500 from the transfer position to the feeding position in the upper chamber. The first feeding mechanism 405 can be a horizontal displacement mechanism, and the second feeding mechanism 406 can be a vertical displacement mechanism. The driving end of the first feeding mechanism 405 is connected with a first supporting piece 407, and the first supporting piece 407 is provided with a positioning groove for fixing the flower basket frame 205. The positioning groove is also provided with an avoiding slot 408. The driving end of the second feeding mechanism 406 is connected with a second supporting piece 409, and the second supporting piece 409 can pass through the avoiding slot 408 to lift the flower basket frame 205 from the first supporting piece 407 to continue conveying to the feeding position.

[0342] The second feeding switch cover device is used for controlling the opening and closing of the second avoiding port. The design composition of the second feeding switch cover device can refer to the design composition of the first feeding switch cover, and details are not described herein. After the workpiece 500 reaches the feeding position and the robot module 21 completes the grasping of the workpiece 500, the second feeding switch cover device can be switched to a state of closing the second avoiding port.

[0343] Again, the beneficial effects of the full-automation scientific research wet etching machine designed in the present application are summarized as follows:

[0344] 1. The scientific research efficiency can be improved. The full-automation design can greatly reduce the experimental time, provide more accurate and stable experimental results, enhance the credibility of scientific research results, speed up the scientific research progress, improve the scientific research efficiency, and promote the formation and innovation of scientific knowledge.

[0345] 2. The scientific research resources can be saved. The full-automation design can accurately control the amount of liquid medicine, reduce the amount of reagent, reduce the scientific research cost, improve the resource utilization efficiency, automatically monitor and adjust the experimental conditions, reduce the risk of experimental failure, reduce the waste of experimental consumables, thereby reducing the waste of resources; at the same time, the equipment is optimized and miniaturized, and is compatible with small-size workpiece experiments, which not only reduces the floor space and saves the installation and maintenance cost, but also greatly reduces the consumption of liquid medicine and saves the scientific research cost.

[0346] 3. The safety of personnel and equipment can be ensured. Remote operation is realized through the automatic process and the precise control system 1, the opportunity of personnel contacting the dangerous liquid medicine is reduced, the operation risk is reduced, and the safety of personnel and equipment is ensured.

[0347] 4、Has commercial value and economic benefits. The full-automatic machine has wide application range, fills the blank of the existing technology in the field of scientific research for scientific research wet process equipment / technology research, can be used in various laboratories and scientific research institutions, meets the scientific research demand, has a positive and far-reaching influence on the development of semiconductor scientific research. Moreover, the intelligence and automation of the full-automatic machine will attract the demand of users, and is expected to achieve great success in the market. In addition, the use of the full-automatic machine will also promote the development of related industrial chain, promote the upgrading and innovation of related technology and equipment, and thus provide great help for promoting economic progress.

[0348] The scientific research type wet etching full-automatic system and machine provided by the present application are described in detail above. For those skilled in the art, according to the idea of the embodiments of the present application, there will be changes in specific implementation manners and application ranges. In summary, the content of the specification should not be understood as a limitation of the present application.

Claims

1. A fully automated system for scientific research wet etching, characterized in that, The system comprises a machine system (8), an etching system (3), a feeding system (4), a robot system (2) and a control system (1); The machine system (8) is used to provide a miniaturized machine room comprising an installation space and a working space; The etching system (3) comprises a plurality of liquid medicine modules (31) arranged in an arc line in the miniaturized machine room; The liquid medicine module (31) comprises a liquid medicine tank (301) and a liquid supply mechanism (32); The liquid supply mechanism (32) is used to supply liquid to the liquid medicine tank (301) according to a preset liquid supply strategy and control the etching environment in the liquid medicine tank (301); The feeding system (4) is used to transport a workpiece (500) into the working space and close the working space after the transportation is completed; The robot system (2) comprises a robot module (21) and a vision module (22) in communication connection with the robot module (21); The robot module (21) is arranged on the top of the working space and is used to grab a workpiece according to image information fed back by the vision module (22) and place the workpiece (500) into the liquid medicine tank (301) to complete etching according to a preset etching strategy; The control system (1) is in communication connection with the machine system (8), the feeding system (4), the robot system (2) and the etching system (3) and is used to realize automatic etching operation according to user instructions.

2. The fully automated system for scientific research wet etching according to claim 1, wherein, The robot module (21) is also used to grab a cleaning tool to perform a cleaning action according to image information fed back by the vision module (22). 3.The system of claim 1, wherein, The robot module (21) can also perform at least one of a telescopic action, a rotating action and a shaking action.

4. The fully automated system for scientific research wet etching according to claim 1, wherein, A timing system (6) is further included; The timing system (6) is used to obtain running time information of the machine system (8), the feeding system (4) and the robot system (2) and feed back the control system (1) so that the control system (1) can control the machine system (8), the feeding system (4), the robot system (2) and the etching system (3) according to a preset time strategy.

5. The fully automated system for scientific research wet etching according to claim 1, wherein, A man-machine interaction system (5) and a monitoring system (7) are further included; The man-machine interaction system (5) is in communication connection with the control system (1); The monitoring system (7) is used to obtain running data of the machine system (8), the robot system (2), the etching system (3) and the feeding system (4) respectively and issue an alarm when the running data exceeds a threshold value; The monitoring system (7) is also used to perform real-time monitoring on the machine system (8), the robot system (2), the etching system (3) and the feeding system (4) according to a preset monitoring strategy.

6. The fully automated system for scientific research wet etching according to claim 1, wherein, The liquid supply mechanism (32) comprises a liquid supply module (33) and an etching environment module (34); The liquid supply module (33) is used to supply liquid medicine in a small-capacity liquid medicine tank (600) to the liquid medicine tank (301); The etching environment module (34) comprises at least one of a heating module, a bubbling module, an ultrasonic vibration module, a cleaning module, a spraying module and a circulating filtration module; The liquid tank (301) is provided with an overflow recovery module.

7. A full-automated research wet etching machine, characterized in that, The scientific research type wet etching full-automatic system comprises a machine body (100) and a scientific research type wet etching full-automatic system. The scientific research type wet etching full-automatic system is arranged on the machine body and comprises a machine system (8), an etching system (3), a feeding system (4), a robot system (2) and a control system (1). The machine system (8) is used for providing a miniaturized machine room comprising an installation space and a working space. The etching system (3) comprises a plurality of liquid modules (31) arranged in an arc line arrangement in the miniaturized machine room. The liquid module (31) comprises a liquid tank (301) and a liquid supply mechanism (32). The liquid supply mechanism (32) is used for supplying liquid to the liquid tank (301) according to a preset liquid supply strategy and controlling the etching environment in the liquid tank (301). The feeding system (4) is used for conveying a workpiece (500) into the working space and closing the working space after the conveying is completed. The robot system (2) comprises a robot module (21) and a vision module (22) in communication connection with the robot module (21). The robot module (21) is arranged on the top of the working space and is used for grabbing a workpiece (500) according to image information fed back by the vision module (22) and placing the workpiece into the liquid tank (301) to complete etching according to a preset etching strategy. The control system (1) is in communication connection with the machine system (8), the feeding system (4), the robot system (2) and the etching system (3) and is used for realizing automatic etching operation according to a user instruction.

8. The fully automated research wet etching machine of claim 7, wherein the plurality of etching chambers are arranged in a circular pattern. The robot module (21) is also used for grabbing a cleaning tool to perform a cleaning action according to image information fed back by the vision module (22).

9. The fully automated scientific wet etching machine according to claim 7, characterized in that: The robot module (21) can also perform at least one of a telescopic action, a rotating action and a shaking action.

10. The fully automated research wet etching machine of claim 7, wherein the etching solution is a hydrofluoric acid solution. A timing system (6) is further included. The timing system (6) is used for acquiring running time information of the machine system (8), the feeding system (4) and the robot system (2) and feeding back the control system (1) so that the control system (1) can control the machine system (8), the feeding system (4), the robot system (2) and the etching system (3) according to a preset time strategy.

11. The fully automated research wet etching machine of claim 7, wherein the etching solution is a hydrofluoric acid solution. A man-machine interaction system (5) and a monitoring system (7) are further included. The man-machine interaction system (5) is in communication connection with the control system (1). The monitoring system (7) is used for acquiring running data of the machine system (8), the robot system (2), the etching system (3) and the feeding system (4) respectively and issuing an alarm when the running data exceeds a threshold value. The monitoring system (7) is also used for performing real-time monitoring on the machine system (8), the robot system (2), the etching system (3) and the feeding system (4) according to a preset monitoring strategy.

12. The fully automated wet etching system for scientific research of claim 7, wherein the wet etching system further comprises a plurality of etching tanks. The liquid supply mechanism (32) comprises a liquid supply module (33) and an etching environment module (34). The liquid supply module (33) is used for supplying the liquid in the small-capacity liquid tank (600) to the liquid tank (301); The etching environment module (34) comprises at least one of a heating module, a bubbling module, an ultrasonic vibration module, a cleaning module, a spraying module and a circulating filtration module; The liquid tank (301) is provided with an overflow recovery module.

13. The fully automated wet etching system for scientific research of claim 7, wherein the wet etching system further comprises a plurality of etching tanks. The robot module (21) is a collaborative robot.

14. The fully automated scientific wet etching machine according to claim 7, characterized in that: The miniaturized machine chamber is arranged in the machine table body (100); The miniaturized machine chamber is provided with a support partition (101); The support partition (101) separates the miniaturized machine chamber into an upper chamber and a lower chamber; The upper chamber forms a working space.

15. The fully automated research wet etching machine of claim 14, wherein the plurality of etching solutions are stored in a plurality of etching solution containers. A plurality of liquid modules (31) are circumferentially arranged in the lower chamber; The support partition (101) is provided with a first avoiding opening (102) corresponding to each liquid tank (301) in the liquid module (31).

16. The fully automated research wet etching machine of claim 14, wherein, The machine table body (100) is provided with an electric control room (115) and a raw liquid room (114) for storing small-capacity liquid tanks (600) in the space below the miniaturized machine chamber.

17. The fully automated research wet etching machine of claim 14, wherein, The machine table system (8) further comprises a fan filter unit (106); The machine table body (100) is provided with an air outlet and an air inlet communicating with the upper chamber; The fan filter unit (106) is installed on the machine table body (100) and connected with the air inlet.

18. The fully automated research wet etching machine of claim 14, wherein, The machine table body (100) is further provided with a spraying cleaning device; The spraying cleaning device comprises a spraying assembly (109) and a spraying moving device (108); The spraying moving device (108) is installed in the upper chamber and connected with the spraying assembly (109) for driving the spraying assembly (109) to move; The support partition (101) is provided with a plurality of first drainage holes (103); The lower chamber is provided with a main drainage pipe communicating with the outside of the machine table body (100).

19. The fully automated research wet etching machine of claim 18, wherein, The support partition (101) is provided with a water collecting part (104) in the middle; The water collecting part (104) is provided with a second drainage hole (105).

20. The fully automated research wet etching machine of claim 19, wherein, The lower chamber is provided with a support cylinder (110) connected with the support partition (101); The support cylinder (110) is provided with a control cavity; The second drainage hole (105) communicates with the control cavity; The control cavity is provided with a branch drainage pipe connected with the second drainage hole (105); The branch drainage pipe extends out of the support cylinder (110) away from the second drainage hole (105).

21. The fully automated wet etching system for scientific research of claim 7, wherein, Further comprising a basket rack (205) for containing workpieces (500); The robot module (21) is connected with a basket clamping jaw mechanism (204) for grabbing the basket rack (205).

22. The fully automated research wet etching machine of claim 21, wherein, The basket clamping jaw mechanism (204) comprises a clamping driving assembly (201) and two clamping jaw pieces (202); The clamping driving assembly (201) is connected with the two clamping jaw pieces (202) for driving the two clamping jaw pieces (202) to open and close to grab the basket rack (205). The clamping driving assembly (201) is provided with an explosion-proof and corrosion-proof protective cover (203).

23. The fully automated research wet etching machine of claim 22, wherein, The flower basket frame (205) comprises two fixed plates (206); The two fixed plates (206) are arranged in parallel and are fixedly connected through a plurality of connecting rods (207); Each connecting rod (207) and the two fixed plates (206) form a containing cavity for containing a workpiece (500); The two fixed plates (206) are fixedly connected with a handle block (210) at the top position; The handle block (210) is provided with guide clamping grooves (211) on the two side surfaces; The clamping surfaces of the two clamping jaw pieces (202) are provided with positioning protrusions (212) clamped into the guide clamping grooves (211); The bottom of the clamping jaw piece (202) is provided with a limiting flange (213) which can contact and abut against the bottom of the handle block (210).

24. The fully automated research wet etching machine of claim 22, wherein, The flower basket frame (205) comprises a bottom plate and two fixed plates (206); The two fixed plates (206) are arranged in parallel and are fixedly connected through a plurality of connecting rods (207); The two fixed plates (206) are arranged in parallel and are fixedly connected through a plurality of connecting rods (207); The handle block (210) is provided with guide clamping grooves (211) on the two side surfaces; The clamping surfaces of the two clamping jaw pieces (202) are provided with positioning protrusions (212) clamped into the guide clamping grooves (211); The bottom of the clamping jaw piece (202) is provided with a limiting flange (213) which can contact and abut against the bottom of the handle block (210). A plurality of limiting rods are fixed between the two fixed plates (206) on the bottom plate. The limiting rods and the bottom plate form a containing cavity for containing a workpiece (500).

25. The fully automated research wet etching machine of claim 23 or 24, wherein, The two fixed plates (206) are fixedly connected with a handle block (210) at the top position; The handle block (210) is provided with guide clamping grooves (211) on the two side surfaces; 26. The fully automated research wet etching machine of claim 12, wherein, The clamping surfaces of the two clamping jaw pieces (202) are provided with positioning protrusions (212) clamped into the guide clamping grooves (211); The bottom of the clamping jaw piece (202) is provided with a limiting flange (213) which can contact and abut against the bottom of the handle block (210). The liquid supply mechanism (32) comprises a liquid supply module (33) formed by a liquid feeding device and a liquid discharging device; The liquid feeding device comprises a pump liquid pipe and a liquid pump; One end of the pump liquid pipe is connected to the liquid tank (301), and the other end is connected to a small-capacity liquid tank (600); The liquid pump is installed on the pump liquid pipe and is used to pump the liquid in the small-capacity liquid tank (600) into the liquid tank (301) according to a preset liquid supply strategy; The liquid discharging device comprises a liquid discharging pipe and a liquid discharging valve (310); The liquid discharging pipe is connected to the liquid tank (301); 27. The fully automated research wet etching machine of claim 26, wherein, The liquid discharging valve (310) is connected to the liquid discharging pipe and is used to control the flow of the liquid discharging pipe according to a preset liquid supply strategy; The liquid tank (301) is provided with a liquid level sensor for detecting the liquid level of the liquid. The liquid tank (301) is provided with a liquid chamber (305) and an overflow chamber (306) for forming an overflow module; The liquid chamber (305) is used to contain the liquid supplied by the liquid supply mechanism (32) and to place the workpiece (500); The overflow chamber (306) is used to receive the overflow liquid of the liquid chamber (305). The pump liquid pipe and the liquid discharge pipe are connected to the liquid chamber (305).

28. The fully automated research wet etching machine of claim 27, wherein, The liquid tank (301) comprises an inner tank body (302); The inner tank body (302) is open at the top to form an immersion inlet; The inner tank body (302) forms a liquid chamber (305) inside; A connecting flange (303) is arranged around the outer periphery of the inner tank body (302); The connecting flange (303) is connected to the top edge of the side wall (304); The side wall (304) and the top surface of the connecting flange (303) and the outer periphery of the inner tank body (302) form an overflow chamber (306).

29. The fully automated research wet etching machine of claim 28, wherein, The liquid supply mechanism (32) further comprises a heating device (312) for forming a heating module; The heating device (312) is used to heat the liquid in the liquid chamber (305) according to a preset liquid supply strategy.

30. The fully automated research wet etching machine of claim 29, wherein, The liquid tank (301) further comprises an outer tank body; The bottom of the inner tank body (302) extends into the outer tank body, and the connecting flange (303) is connected to the outer tank body, so that the connecting flange (303), the outer tank body and the inner tank body (302) form a heating chamber (311); The outer tank body is provided with a medium input pipe and a medium output pipe which communicate with the heating chamber (311); The heating device (312) is installed in the heating chamber (311) for heating the heat conduction heating in the heating chamber (311).

31. The fully automated scientific wet etching machine according to claim 27, characterized in that: The liquid supply mechanism (32) further comprises a circulating device for forming a circulating and filtering module or a circulating and spraying device for forming a spraying module; The circulating device is used to extract the liquid in the liquid chamber (305) according to a preset liquid supply strategy, and then send it back to the liquid chamber (305) after filtering; The circulating and spraying device is used to extract the liquid in the liquid chamber (305) according to a preset liquid supply strategy, and then send it back to the liquid chamber (305) in a spraying manner after filtering.

32. The fully automated research wet etching machine of claim 27, wherein, The etching system (3) further comprises a cleaning device (315) for forming a cleaning module; The cleaning device (315) is used to clean the workpiece (500) in the liquid chamber (305).

33. The fully automated research wet etching machine of claim 27, wherein, The liquid supply mechanism (32) further comprises a bubbling device for forming a bubbling module; The bubbling device is used to bubble the liquid in the liquid chamber (305) according to a preset liquid supply strategy.

34. The fully automated research wet etching machine of claim 27, wherein, The etching system (3) further comprises an etching switch cover device; The etching switch cover device is used to control the opening and closing of the immersion inlet of the liquid chamber (305).

35. The fully automated research wet etching machine of claim 17, wherein, The feeding system (4) comprises a conveying device (402) and a first feeding switch cover device (401); The conveying device (402) is used to convey the workpiece (500) from a standby position outside the machine body (100) to a feeding position in the miniaturized machine chamber; The machine body (100) is provided with a feeding port which communicates with the miniaturized machine chamber and through which the conveyed workpiece (500) passes; The first feeding switch cover device (401) is used to control the opening and closing of the feeding port.

36. The fully automated research wet etching machine of claim 35, wherein, The feeding system (4) further comprises a second feeding switch cover device; The conveying device (402) is installed in the lower chamber and comprises a first feeding mechanism (405) and a second feeding mechanism (406); The support partition (101) is provided with a second avoiding opening for the workpiece (500) to enter the upper chamber; The first feeding mechanism (405) is used for conveying the workpiece (500) from the standby position to a transfer position in the lower chamber; The second feeding mechanism (406) is used for conveying the workpiece (500) from the transfer position to a feeding position in the upper chamber; The second feeding switch cover device is used for controlling the opening and closing of the second avoiding opening.

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