Adjustable diffraction grating and system for multimodal image acquisition

Abstract

The present disclosure relates to an adjustable diffraction device (10) and a system for multimodal image acquisition, which addresses the limitations of conventional fixed-mask systems. The device features an adjustable mask arrangement (30) with a plurality of diffraction gratings (31), which can be dynamically controlled by a processing unit (50) to adjust its aperture size and period. This enables the system to generate diffracted X-rays with enhanced characteristics, leading to improved image quality and greater versatility across various applications. The integrated system, which also includes an X-ray emitting device (11) and an X-ray detector device (12), can seamlessly switch between different imaging modalities, providing a single, efficient, and automated solution for scientific and medical analysis.

Description

[0001] ADJUSTABLE DIFFRACTION GRATING AND SYSTEM FOR MULTIMODAL IMAGE ACQUISITION

[0002] RELATED TECHNICAL FIELD

[0003] The present disclosure is related to the field of X-ray imaging and, more particularly, to diffraction devices for obtaining diffracted X-rays. The disclosure also relates to multimodal image acquisition systems, which combine different imaging modalities to provide a more comprehensive view of a sample.

[0004] BACKGROUND

[0005] Conventional X-ray imaging relies on the absorption of X-rays by different tissues, which can result in low-contrast images. A solution to this issue is detecting the phase signal due to interactions of photons with matter, which is highly sensitive for low- attenuating tissues and samples.

[0006] The consistent improvement of the quality of optical elements, the incorporation of precision instruments, and the optimization of imaging techniques are responsible for the significant advancement of Phase Contrast Imaging (PCI) methods. Due to limitations in technology and imaging techniques, phase contrast was restricted to using synchrotron X-ray radiation sources. However, in the last two decades, new solutions to the problem of spatial and temporal resolution have allowed the implementation of phase contrast techniques with conventional polychromatic X-ray sources. The in-line propagation, speckle-based, and edge illumination phase contrast X-ray imaging techniques are among the different PCI methods. The latter is of great interest since edge illumination is particularly adapted to visualizing details that present low photon absorption, as well as being able to extend spatial resolution by exploiting the dithering process, which is crucial in application areas such as biology and medicine.

[0007] Edge illumination phase contrast imaging (PCI) consists of illuminating the sample by collimating the photon flux through a grating. Then, the sample deflects the beamlets due to photon diffraction; this effect causes beam signals to have positive or negative fringes at the detector. By exploiting the pixel pitch and grating spatial periodicity, absorption / attenuation, differential phase, and dark-field signals can be retrieved, in order to bring complementary description of the observed sample. Recent works use two gratings to achieve the edge lighting configuration; one collimates the photon flux, and the other limits the photon counting area in the detector pixels.

[0008] Traditional systems require a different fixed mask for each desired imaging mode or sample type, a process that is time-consuming and labor-intensive. In addition, the state of the art discloses devices for obtaining X-ray phase contrast images and systems that allow the acquisition of X-ray dark-field, phase contrast, and attenuation images such as those disclosed in US 2017 / 0213364 Al, CN 114269250 A and US 11,813,102 B2.

[0009] The document US 2017 / 0213364A1 discloses a system and method for the regularized reconstruction of phase contrast computerized tomography (PCT). The document addresses the technical problem of reconstructing PCT data from an under-sampled scan, which is particularly relevant for applications where minimizing radiation dose is critical. The proposed solution provides a means to generate high-quality images even when a limited number of projection views are available.

[0010] The core of the method involves performing a regularized Fourier analysis on the undersampled object scan data to obtain a set of Fourier coefficients. These coefficients are then corrected to account for system contributions. From these corrected coefficients, the system is configured to obtain an absorption sinogram, a differential phase sinogram, and a dark field sinogram. These sinograms can then be used to perform a tomographic reconstruction, resulting in a multimodal image of the scanned object.

[0011] The method also includes a regularizer unit, which improves the reconstruction by exploiting prior knowledge from neighboring detector pixels or view angles.

[0012] Additionally, CN 114269250A discloses a system for acquiring X-ray dark-field, phase contrast, and attenuation images. The system includes an X-ray source, a grating interferometer, an X-ray detector, a control unit, and an output unit. It is designed to address the issues of conventional stepping methods, where image acquisition is paused while the gratings are repositioned, leading to long acquisition times and susceptibility to vibration.

[0013] The control unit manages a laterally moving transducer to move one or both gratings. During the detector's exposure time, the gratings move a distance that is less than their period. This intentional movement allows for a continuous data acquisition process, which is faster and reduces the overall X-ray exposure for the subject. This mode is used to output dark-field, phase contrast, and attenuation image data.

[0014] Additionally, the control unit moves one or both gratings a distance that is greater than or equal to their period during the detector’s exposure time. This movement washes out the fringe pattern, allowing the system to operate like a conventional attenuation X-ray system.

[0015] On the other hand, the document US 11,813,102 B2 discloses an X-ray interferometer for phase contrast imaging. The system includes an X-ray source, a source grating, two phase gratings, an analyzer grating, and an X-ray detector. An alternative embodiment replaces the combination of the X-ray source and source grating with a periodically structured X- ray source. The system is designed to be compatible with polychromatic, low spatial coherence medical X-ray tubes and large area medical X-ray detectors for large field-of- view imaging.

[0016] In the disclosed arrangement, the two-phase gratings are placed much closer to the X-ray detector than to the X-ray source. The image object is positioned upstream and close to the phase gratings. The two-phase gratings are configured to form a universal moire pattern, and the analyzer grating is selected to convert this pattern into a lower spatial frequency fringe that can be resolved by a standard X-ray detector.

[0017] The document also explains that the periods of the gratings can be selected to be the same or different. For example, if the two-phase gratings have the same period, the source and analyzer gratings can also have the same period. The image object is designed to be placed upstream and close to the two-phase gratings, and the interferometer sensitivity is proportional to the distance between the source grating (or structured source) and the image object.

[0018] Conventional diffraction devices typically use fixed masks or gratings, which are designed for specific X-ray parameters and experimental conditions. The inherent rigidity of these devices limits their versatility, often requiring time-consuming manual reconfiguration or component replacement to accommodate different experimental needs.

[0019] Therefore, there is a need for integrated and adaptable devices and systems that can perform multiple types of analyses in an automated and efficient manner, allowing for a seamless switch between different imaging modalities without the need for manual reconfiguration or additional hardware.

[0020] SUMMARY

[0021] The present disclosure is related to a diffraction device for obtaining diffracted X-Rays comprising an adjustable mask arrangement comprising a plurality of diffraction gratings, configured to receive input X-rays from an X-ray emitting device to generate diffracted X-rays, and a processing unit configured to control the movement of the adjustable mask arrangement and adjust the aperture size and period of the adjustable mask arrangement.

[0022] The present disclosure also describes a versatile and efficient system for acquiring multimodal images, offering a significant advantage by integrating multiple components for automated and precise image capture. This eliminates the need for complex, separate setups and ensures greater consistency and reliability in the imaging process.

[0023] More specifically, the system comprises an X-ray emitting device configured to emit X- rays, an X-ray detector device configured to obtain a set of diffracted images, wherein each image of the set of diffracted images is obtained from diffracted X-rays. The system also comprises a diffraction device comprising an adjustable mask arrangement and located between the X-ray emitting device, the X-ray detector device and a sample, wherein the diffraction device is configured for generating the diffracted X-rays by means of the adjustable mask arrangement, and a processing unit connected to the diffraction device, the X-ray emitting device, and the X-ray detector device, and is configured to receive the diffracted images by means of the X-ray detector device.

[0024] In addition, the present disclosure solves the key technical problem of inflexibility and lack of adaptability found in traditional X-ray diffraction devices, which typically rely on fixed masks. By introducing a system with dynamic and precise control over the geometry of the diffraction masks, the present disclosure overcomes this limitation. This advancement optimizes the generation of diffracted X-rays, leading to improved image quality and making the device more versatile for a wide range of scientific and medical applications.

[0025] BRIEF DESCRIPTION OF THE DRAWINGS

[0026] FIG. 1 provides a profile view of one embodiment of the diffraction device and its component elements.

[0027] FIG. 2 illustrates an embodiment of the adjustable mask arrangement with multiple diffraction gratings and patterns. The relative position of the gratings can be shifted to modulate the duty cycle and mask period, allowing adaptability to various X-ray imaging setups.

[0028] FIG. 3A, FIG. 3B, FIG. 3C and FIG. 3D illustrate embodiments of different patterns that can comprise the diffraction gratings.

[0029] FIG. 4 corresponds to a schematic and block diagram of one embodiment of the system of the present disclosure, also illustrating the arrangement of the diffraction device within the system. FIG. 5A and FIG. 5B correspond to a schematic and block diagram of one embodiment of the system of the present disclosure.

[0030] FIG. 6 illustrates an alignment and imaging protocol using the device and system of the present invention.

[0031] FIG. 7 illustrates a Poecilia reticulata larvae specimen. The figure shows four anatomical areas, which are highlighted in the final images, including a fused image

[0032] FIG. 8 illustrates a CIRS011 A accreditation phantom. The figure shows four regions of interest (ROIs) along with a fused final image, demonstrating the application of the system of the present invention for mammographic analysis.

[0033] DETAILED DESCRIPTION

[0034] The present disclosure is related to the field of X-ray imaging devices, and more particularly, to a diffraction device for obtaining diffracted X-rays. X-ray imaging is a fundamental technique used to study different material structures across a wide range of scientific and industrial applications. The X-ray diffraction device provides dynamic control of an adjustable mask arrangement, which overcomes the limitations of traditional fixed-mask systems. The primary advantage is its ability to adapt and optimize the diffraction process in real-time, resulting in improved image quality and greater versatility for a wide range of applications.

[0035] This disclosure also relates to multimodal image acquisition systems, which combine different imaging modalities to provide a more comprehensive view of a sample (60). Current multimodal systems often rely on separate, bulky hardware for each modality, an architecture that is highly inefficient and demands complex, time-consuming manual alignment. Consequently, there is a clear need for a single, integrated, and adaptable system that can perform multiple types of analyses in an automated and efficient manner. The present invention addresses this need with a diffraction device featuring an adjustable mask arrangement that, when integrated into a broader system, enables a new level of control, allowing the system to simultaneously obtain different imaging modalities without requiring any physical intervention.

[0036] In particular and referring to FIG. 1, the present disclosure describes a diffraction device (10) for obtaining diffracted X-rays (25) comprising an adjustable mask arrangement (30) comprising a plurality of diffraction gratings (31), said adjustable mask arrangement (30) configured to receive input X-rays (8) from an X-rays emitting device (11) to generate diffracted X-rays (25), and a processing unit (50) configured to control the movement of the adjustable mask arrangement (30) and adjust the aperture size and period of the adjustable mask arrangement (30).

[0037] In a preferred embodiment, the diffraction device (10) can be used for an advanced imaging application based on single mask edge illumination. In this application, when the X-ray beam is modulated by a diffraction absorption mask, a reference intensity pattern is generated at the detector plane.

[0038] In the present disclosure, it will be understood that an intensity pattern corresponds to the spatial distribution of the intensity of the X-ray beam (8) after it has been modulated by the adjustable mask arrangement (30) and has interacted with the sample (60). The intensity pattern, which is comprised of the diffracted X-rays (25), carries information regarding the properties of the sample (60), such as its density, composition, and internal structure. When an object is introduced within the X-ray path, the intensity pattern is locally modified. By analyzing the changes in pixel intensity induced by the object as compared to the reference intensity pattern, attenuation, phase shift, and small-angle scattering effects produced by the sample (60) structure can be retrieved. The modulation of the intensity pattern over a fixed pixel position in the edge-illumination image follows a distribution function called the Illumination Curve (IC), which typically behaves as a Gaussian distribution.

[0039] In another embodiment of the present disclosure, and referring to FIG. 1, the diffraction device (10) may contain the movement module (33) consisting of a movement module, and the movement devices (34) are composed of linear motors and angular goniometers. The mask arrangement (30) is contained in the diffraction device module (10) using the support (32) consisting of a fixed support panel.

[0040] When the sample (60) refracts a beam, the X-ray detector device (12) perceives it as a displacement of the illumination point on the IC. The movement devices (34) enable the positioning of the pattern (35) of diffraction with micrometer-level precision, which is essential for accurately mapping the refraction in terms of variation in the detected intensity pattern. This control ensures that the beam’s shift is reliably translated into the illumination curve, allowing for a quantitative measurement of refraction.

[0041] Therefore, the IC can be used for phase retrieval by mathematically inverting it, using well-established phase-retrieval algorithms. This capability to recover phase information from the IC is a significant advantage of the diffraction device (10), as it allows for the visualization of the sample (60) features that have poor contrast in conventional absorption-based images, such as soft tissues in medical applications or microstructures in materials science.

[0042] It will be understood in the present disclosure that the sample (60) refers to any object, material, or specimen that is being investigated using the system (100) and the diffraction device (10). The diffraction device (10) can be positioned along the primary axis of the X-ray beam, between the X-ray emitting device (11) and the sample (60). The purpose of this arrangement is to allow the X-rays to interact with the sample (60) after being modulated by the adjustable mask arrangement (30), enabling the detection of subtle changes in the beam’s properties caused by the internal structure of the sample (60).

[0043] The sample (60) is not limited to a specific type. In one embodiment, the sample (60) may be a biological specimen, such as soft tissues, for medical imaging applications. In another embodiment, the sample (60) may be a material specimen, such as a composite material or a micro-electronic component, for non-destructive testing and analysis. Particularly, the capability of the diffraction device (10) to detect both absorption and phase contrast makes it particularly suitable for imaging samples (60) with very low X- ray absorption, such as organic materials, where conventional imaging techniques may not provide sufficient contrast. Referring to FIG. 2, an adjustable mask arrangement (30) can be an optical element or assembly that consists of a defined array of one or more diffraction gratings (31). The diffraction gratings (31) are the active components, structured with a repeating pattern (35) of alternating areas that are either X-ray absorbing or non-absorbing. Likewise, the physical arrangement of the diffraction gratings (31), including their period and aperture size, is designed to modulate the cone-shaped X-ray beam as it passes through.

[0044] Particularly, the shift and relative position between the diffraction gratings (31) allow modulation of the duty cycle and mask arrangement (30) period, allowing the adaptability of the adjustable mask arrangement (30) into several X-ray imaging setups by means of the system (100).

[0045] The pattern (35) of the diffraction gratings (31) can be configured to have diverse shapes and forms, as shown in FIG. 3A, FIG. 3B, FIG. 3C and FIG. 3D, and the pattern (35) serves as a blueprint for the diffracted images.

[0046] Also, the adjustable mask arrangement (30) can be an element positioned between the X- ray emitting device (11) and the sample (60), allowing it to receive the incoming X-rays (8) beam, and can be mechanically or digitally controlled by the processing unit (50). This control, which, as mentioned before, can be mechanical or digital, allows its physical properties, such as the aperture size and the period of the diffraction gratings (31), to be dynamically changed. This real-time adjustability of the mask arrangement (30) enables the device (10) to tailor the manipulation of the X-rays (8) beam as it passes through the diffraction gratings (31), thereby optimizing the diffraction pattern (35) to suit different imaging requirements or experimental conditions.

[0047] On the other hand, the input X-rays (8) are the X-ray beams that are emitted from an X- ray emitting device (11) and directed toward the diffraction device (10). These X-rays (8) are the initial source of radiation that will be manipulated by the adjustable mask arrangement (30) to generate the diffracted X-rays (25) used for imaging. Particularly, while the preferred embodiment of the present disclosure utilizes X-rays, the diffraction device (10) is not limited to this electromagnetic wavelength. The adjustable mask arrangement (30) and the principles of the present disclosure can be applied to other appropriate electromagnetic wavelengths for diffraction. These alternative applications and embodiments would require corresponding adjustments in the materials and dimensions of the adjustable mask arrangement (30) to be effective with the specific properties of the different types of radiation.

[0048] The diffracted X-rays (25) are the X-ray beams that have passed through the adjustable mask arrangement (30). As the input X-rays (8) interact with the precise, periodic structures of the diffraction gratings (31), they are scattered in a specific, predictable pattern. This process, known as diffraction, results in a beam that is no longer a single, uniform wavefront but a periodic arrangement of beamlets.

[0049] These resulting diffracted X-rays (25) are important because the unique pattern or intensity pattern they form contains valuable information about the geometry of the adjustable mask arrangement (30). This information can be used for high-resolution imaging, such as phase-contrast imaging and dark field imaging, or for other analytical purposes. By dynamically controlling the adjustable mask arrangement (30), the properties of the diffracted X-rays (25) can be manipulated to optimize image contrast and quality, in real-time, an approach that is not possible to achieve with traditional fixed masks.

[0050] In addition, this dynamic control of the adjustable mask arrangement (30) provides the diffraction device (10) with the capability to actively tune the characteristics of the diffracted X-rays (25) beam. For instance, by selecting among a variety of diffraction gratings (31) and adjusting their position and orientation in order to adjust the aperture size and period of the diffraction device (10), it is possible to modify the fringe spacing and intensity of the diffracted X-rays (25). This manipulation and tunning of the position of the diffraction gratings (31) allows the diffraction device (10) aperture size and period to be calibrated in real-time to, for example, maximize the signal-to-noise ratio, enhance a specific type of image contrast (such as differential phase or dark-field contrast), or compensate for variations in the X-rays from the X-ray emitting device (11), which corresponds to the emitted X-rays (8). The technical capability to enhance different imaging modalities on the fly with a single device represents a significant advancement.

[0051] The term plurality, as used in the present disclosure, refers to the fact that the diffraction device (10) can be configured in different forms, including a single diffraction grating (31) but also a collection of diffraction gratings (31) that work in concert. More specifically, the adjustable mask arrangement (30) may comprise one or more diffraction gratings (31). In some embodiments, the diffraction device (10) includes a single grating, while in other embodiments it comprises a plurality of gratings. These individual or single diffraction gratings (31) can be mounted, for example, on a thin, X-ray transparent substrate which provides mechanical support without significantly interfering with the emitting X-rays (8) beams. Likewise, the diffraction gratings (31) can be arranged to collectively form the complete adjustable mask arrangement (30), and this integrated assembly allows for the collective and coordinated manipulation of the X-rays (8), enabling real-time adjustments that optimize the diffraction process for various imaging scenarios and also allowing for the generation of the diffracted X-rays (25).

[0052] In addition, the adjustable mask arrangement (30) can have a length that varies between 1.0 cm and 30.0 cm and a width that varies between 1.0 cm and 30.0 cm. In the preferred embodiment of the present disclosure, the adjustable mask arrangement (30) has a length of 15.0 cm and a width of 15.0 cm.

[0053] Particularly, the diffraction gratings (31) are the core functional components of the adjustable mask arrangement (30). More specifically, each one of the diffraction gratings (31) is a periodical patterned structure made from materials with high X-ray absorption properties deposited over a low X-ray attenuating substrate, alternating between high and low X-ray attenuation regions. Additionally, the diffraction gratings (31) require having alignment references for setting a default configuration used for the dynamic alignment. Referring to FIG. 2, in some embodiments of the diffraction device (10), the adjustable mask arrangement (30) is configured with a variable number of diffraction gratings (31), specifically between one and nine diffraction gratings (31).

[0054] Also, referring to FIG. 2, in some embodiments of the diffraction device (10), the adjustable mask arrangement (30) is configured to include between two and nine diffraction gratings (31).

[0055] The previous configurations are particularly well-suited for a technique known as grating interferometry, which uses a specific arrangement of diffraction gratings (31) to simultaneously acquire multiple types of information, such as absorption, phase-contrast, and dark-field images. Also, the inclusion of multiple diffraction gratings (31) together with the process known as dithering, in which the mask is moved over sub-pixel distances to acquire a series of images, improves image quality by enhancing the signal-to-noise ratio, and crucially, increasing the original resolution of the final image. These configurations also allow the diffraction device (10) to be compatible with the SingleMask Edge-Illumination (El) technique, which relies on a specific arrangement of one physical grating or an effective grating composed of multiple diffraction gratings (31) to optimize the interaction with the X-ray beam.

[0056] Referring to FIG. 2, in one embodiment of the present disclosure, the adjustable mask arrangement (30) is configured to have at least three diffraction gratings (31). This particular embodiment, utilizing at least three diffraction gratings (31), offers significant technical advantages by enabling dynamic shaping of the intensity pattern, which is not achievable with a single diffraction grating (31). The primary benefit is a substantial improvement in image contrast, by fine-tuning the global shape of the beamlets that form the intensity patterns, enabling straightforward adaptation to any detection system for laboratory and medical diagnostics setups.

[0057] In another embodiment of the present disclosure, at least two diffraction gratings (31) are used to create a 2D intensity pattern. This provides a significant advantage in data collection. By superposing the two diffraction gratings (31), the adjustable mask arrangement (30) can be optimized to obtain multi-directional phase-contrast and darkfield signals. This allows the diffraction device (10) to collect a richer, multimodal dataset from a single scan of the sample (60), providing more comprehensive information about said sample (60) and improving the overall diagnostic capability. Furthermore, this embodiment enables compatibility with a broader range of multimodal image retrieval algorithms, such as UMPA or LCS, thereby enhancing flexibility in data analysis and facilitating adaptation to different experimental or clinical requirements.

[0058] Referring to FIG. 2, each of the diffraction gratings (31) can comprise a pattern (35) of alternating areas that can be either X-ray absorbing or non-absorbing. The physical configuration and arrangement of these areas is what defines the unique pattern (35) of the diffraction grating (31). This pattern (35) can vary in shape, form, and complexity; for example, the diffraction gratings (31) can be configured to include both unidimensional patterns and two-dimensional design patterns. Furthermore, this embodiment enables compatibility with a broader range of multimodal image retrieval algorithms, such as UMPA or LCS, thereby enhancing flexibility in data analysis and facilitating adaptation to different experimental or clinical requirements, techniques to ensure uniformity and high precision across the entire array. The accuracy of the pattern (35) is important because it acts as the blueprint for diffracted images (13).

[0059] The main function of the pattern (35) is to act as a master plan to modulate the X-ray beam in a specific way as it passes through the diffraction grating (31). Upon interacting with the pattern (35), the X-rays (8) beam is transformed into a series of diffracted X-rays (25). The form of these diffracted X-rays (25), in turn, generates a set of diffracted images (13) that contain the necessary information for different multimodal analyses.

[0060] Particularly, and referring to FIG. 3A, FIG. 3B, FIG. 3C and FIG. 3D, in any of the embodiments, each one of the diffraction gratings (31) comprises its own diffraction pattern (35) selected from the group consisting of parallel bars, dot matrix, concentric rings, checkerboard, and combinations thereof. This variety of patterns (35) allows the diffraction device (10) to generate more sophisticated and multi-dimensional diffraction patterns. For instance, a parallel bar pattern (35) can create a one-dimensional fringe pattern, ideal, for example, for standard grating interferometry and Edge-Illumination. On the other hand, a two-dimensional pattern (35) like a dot matrix or checkerboard generates a more complex diffraction pattern, which is particularly useful, for example, for analyzing the sample (60) with non-uniform or anisotropic properties.

[0061] A significant advantage of this configuration is the versatility of the diffraction device (10) and its capability to perform a wider range of analyses with a single apparatus. The ability to select from a variety of patterns (35) and configurations of their components allows the diffraction device (10) to be optimized for specific applications. For example, the concentric rings pattern (35) can be configured to act as an X-ray lens, focusing the diffracted X-rays (25) to a small spot, a feature essential for high-resolution imaging. This enables the diffraction device (10) to be reconfigured to suit specific analytical needs, from basic absorption imaging to advanced multimodal analysis, without requiring manual physical changes to the diffraction device (10).

[0062] In one embodiment of the adjustable mask arrangement (30), the pattern (35) of the diffraction gratings (31) is a one-dimensional pattern of parallel bars. The width of each bar can range from tens of micrometers to a micrometer level, while the height is often comparable to the width of the detection system to ensure sufficient interaction with the X-rays (8). The most critical dimension is the period of the diffraction gratings (31), which is the distance (7) from the center of one repeating or successive structural unit of the diffraction gratings (31) to the center of the next. This period can vary from tens of micrometers down to a few micrometers, depending on the specific application and X- ray energy. On the other hand, the aperture size (d) of the adjustable mask arrangement (30) refers to the physical space of the transparent section of the diffraction gratings (31) that allows for high radiation transmission, in contrast to the absorbing regions. The aperture size can be dynamically changed. In addition, the duty cycle (a) refers to the ratio between the aperture width and the diffraction gratings (31) period.

[0063] By adjusting the aperture size and the period, the system can precisely control the amount and characteristics of the X-rays beam (8) as it passes through the adjustable mask arrangement (30), which is essential for optimizing the resulting diffraction pattern or intensity pattern to suit different imaging requirements or experimental conditions.

[0064] Another advantage of this embodiment is that it can be used for two of the most widely used multimodal imaging techniques for industrial and medical applications: grating interferometry and Edge-Illumination. This makes the configuration highly versatile, as the same physical arrangement can be adapted to different retrieval methods depending on the imaging task, energy range, or resolution requirements. In addition, the onedimensional bar geometry simplifies fabrication compared to more complex patterns while still enabling high sensitivity to refraction and scattering signals. The adaptability of this embodiment, therefore, ensures broad compatibility with existing and emerging imaging systems, providing a practical path for integration into both laboratory -based and clinical diagnostic setups.

[0065] In any of the embodiments of the present disclosure, the physical dimensions of the diffraction gratings (31) can be designed on a microscopic scale to interact effectively with X-ray wavelengths. In particular, the period of the diffraction gratings (31) can typically range from about few micrometers to tens of micrometers, depending on the X- ray setup and application. The size (a) of the repeated grating elements (bars, holes, rings, etc.) is usually in the order of hundreds of nanometers to several micrometers, while the overall pattern (35) dimensions, as well as the diffraction gratings (31) thickness, can vary from hundreds of micrometers to tens of centimeters, ensuring sufficient absorption or phase modulation of the incident X-rays (8) beam. These ranges may be adjusted according to the desired imaging modality and the specific spectral range of operation.

[0066] In one embodiment, each one of the diffraction gratings (31) comprises alternating regions of a first material and a second material, wherein the first and the second material have different attenuation properties. This configuration allows an X-ray (8) beam to pass through the diffraction gratings (31), one material strongly absorbs radiation, thereby reducing the intensity of the beam, while the other material transmits most of the radiation with minimal loss. The resulting alternation of high and low attenuation regions forms a periodic pattern that modulates the X-ray (8) beam, producing a well-defined diffraction pattern or intensity pattern.

[0067] Additionally, by selecting specific material pairs, the properties of the diffraction gratings (31) can be finely tuned to optimize the imaging process. This design is particularly beneficial for advanced imaging techniques like phase-contrast imaging, as it allows for the exploitation of both the absorption and phase-shifting properties of the materials, rather than just the absorption of a single material against air. This embodiment enhances the visibility of subtle features, such as soft tissues in medical imaging, and this dual-material approach can offer manufacturing advantages by providing more flexibility in fabrication processes of the diffraction device (10), allowing for the creation of diffraction gratings (31) with precise and consistent diffraction patterns or intensity patterns.

[0068] In another embodiment of the present disclosure, the first material is a high attenuation material, and the second material is a low attenuation material. The high attenuation material can be chosen for its ability to absorb X-rays efficiently by blocking their passage. Conversely, the low attenuation material can be chosen to be substantially transparent to X-rays, allowing them to pass through with minimal loss. A significant advantage of this specific embodiment is the creation of a high-contrast diffraction pattern or intensity patterns, and by maximizing the difference in attenuation between the two materials, the diffraction gratings (31) produce well-defined intensity patterns or intensity patterns whose visibility is high enough for retrieval algorithms to detect any change induced by the presence of the sample (60). This embodiment further allows tailoring the diffraction gratings (31) to different energy ranges by selecting suitable material pairs, ensuring optimal performance across diverse applications in medical diagnostics, industrial inspection, and security screening.

[0069] Also, in one embodiment of the present disclosure, the adjustable mask arrangement (30) is composed of an alternating periodic pattern (35) of attenuating and non-attenuating material and placed on the support (32) consisting of a fixed support panel. In any of the embodiments, the high attenuation material is selected from a group of materials with high X-ray absorption properties, including but not limited to gold, tungsten, copper, nickel, lead, bismuth, tin, platinum, tantalum, dichalcogenides, and combinations thereof.

[0070] Also, in any of the embodiments, the low attenuation material is selected from the group consisting of glass, quartz, fused silica, borosilicate glass, polyimide, cellulose acetate, polyethylene terephthalate, epoxy glass, kapton, bakelite, plastic, and combinations thereof.

[0071] It should be understood that the materials described in the preceding paragraphs are provided by way of example only, and the disclosure is not limited to these specific materials. Any other materials with similar X-ray attenuation properties, whether high or low, that are suitable for the fabrication of the diffraction gratings (31) can also be used. This includes any such materials that would be known to a person of ordinary skill in the art.

[0072] Referring to FIG. 1, in a preferred embodiment of the disclosure, the adjustable mask arrangement (30) is connected to a support (32) and a securing element (33), which together provide the necessary structural integrity for the adjustable mask arrangement (30) and the diffraction gratings (31). Furthermore, the adjustable mask arrangement (30) is operatively connected to a plurality of movement devices (34). Furthermore, each of the plurality of movement devices (34) is precisely controlled by the processing unit (50) and is configured to manipulate the position of the adjustable mask arrangement (30), thereby enabling the dynamic adjustment of its physical properties.

[0073] Particularly, the support (32) can be a structural component to which the plurality of diffraction gratings (31) is affixed. This support (32) is configured to provide a rigid and stable base for the diffraction gratings (31). Its primary function is to maintain the precise alignment and dimensional integrity of the diffraction gratings (31), ensuring they are held firmly in a fixed position relative to each other, which is important for the proper generation of the diffraction pattern or intensity patterns.

[0074] The support (32) can have a length that varies between 15 centimeters and 40 centimeters, and a width that varies between 15 centimeters and 40 centimeters. In the preferred embodiment of the present disclosure, the support (32) has a length of 200 centimeters and a width of 200 centimeters.

[0075] In any of the embodiments, the support (32) can be fabricated from a rigid material that provides high mechanical stability. The materials for the support (32) can be selected from the group, including but not limited to aluminum, stainless steel, silicon carbide, fused silica, high-performance ceramics, or other materials chosen to maintain the precise alignment of the diffraction gratings (31), thereby minimizing any potential distortion to the resulting diffraction pattern or intensity patterns.

[0076] On the other hand, the securing element (33) can be a component configured to couple to the support (32) and serves as the physical interface between the support (32) and the movement devices (34). In addition, the securing element (33) is configured to securely hold the entire adjustable mask arrangement (30) assembly in place, thereby transferring the movements from the plurality of movement devices (34) to the adjustable mask arrangement (30). Furthermore, the securing element (33) may be a clamping mechanism, such as a set of screws, bolts, or a custom-designed clamp. Alternatively, the securing element (33) may be a bonded connection utilizing a rigid adhesive, or any other suitable mechanism known to a person of ordinary skill in the art.

[0077] Referring again to FIG. 1, the plurality of movement devices (34) refers to actuators responsible for the dynamic positioning of the adjustable mask arrangement (30) and are configured to provide multi-axis control, including translational movement along the X, Y, and Z axes, as well as rotational () and translational (A) movements. Each one of the movement devices (34) can be controlled by the processing unit (50). In addition, by manipulating the position of the adjustable mask arrangement (30), the movement devices (34) enable the dynamic adjustment of the physical properties of said adjustable mask arrangement (30) in real-time, and thereby the diffraction device (10) can actively optimize the diffraction pattern or intensity patterns to maximize image contrast and quality. This advantage is crucial for applications where the sample (60) properties or X- ray source conditions may change, allowing the diffraction device (10) to adapt to a wide range of imaging scenarios.

[0078] In various embodiments of the disclosure, the movement devices (34) can be selected from a group that includes, but is not limited to, piezoelectric actuators, MEMS (Micro- Electro-Mechanical Systems) actuators, stepper motors, leadscrew stages, or linear servo or translation stages. The choice of the movement device (34) type depends on the precision and speed settings required for the adjustable mask arrangement (30). For instance, piezoelectric actuators are ideal for sub-micrometer level movement with extremely high precision of the adjustable mask arrangement (30), while stepper motors are suitable for broader range movements.

[0079] Furthermore, the precise control afforded by the plurality of movement devices (34) allows the diffraction device (10) to perform advanced scanning methodologies that go beyond static imaging. By performing programmed motions, the diffraction device (10) allows a series of diffraction patterns or intensity patterns to be acquired from various positions or angles relative to the sample (60). This capability is essential for performing sophisticated analyses such as multimodal tomography, where multiple 2D projections can be used to reconstruct a comprehensive 3D image of the sample (60) based on attenuation, phase contrast, and dark field imaging. The high resolution and repeatability of these programmed movements also allow for automated and systematic data acquisition, ensuring that the collected data is consistent and reliable for subsequent processing and analysis.

[0080] Additionally, the plurality of movement devices (34) allows for alignment of the diffracted X-rays (25) with the X-ray detector device (12) and in matching the periods of the adjustable mask arrangement (30) and said X-ray detector device (12). In one embodiment, the movement devices (34) comprise a motorized linear stage configured to provide high-resolution translational movement, such as a full step of approximately 2.5 pm, for aligning the beams with the X-ray detector device (12) columns along the Y-axis. The movement devices (34) may also include a motorized goniometer stage for adjusting the rotation of the adjustable mask arrangement (30) over the propagation axis, for example, with a full step of approximately 7.14 millidegrees. These stages can be configured for micro-stepping, thereby achieving even finer resolution, such as a 1 / 32 step size with a 1.25 pm displacement. A significant advantage of this embodiment is the high movement resolution, which is critical for achieving specific illumination fringing in the alignment process. This control over the beam modulation by means of the movement devices (34) is essential for ensuring optimal image quality and reliability.

[0081] In the preferred embodiment, at least one of the movement devices (34) is configured to provide translational or rotational movement to the mask arrangement (30). This capability enables the adjustable mask arrangement (30) to be moved linearly in a controlled manner along an axis perpendicular to the rays (8) beams propagation, such as the X-axis and the Y-axis shown in FIG. 1. This movement enables alignment and scanning operations, as it allows for precise positioning of the diffraction gratings (31) relative to both the X-rays (8) from the X-ray emitting device (11) and the X-ray detector device (12).

[0082] A key advantage of this embodiment is that it provides the adjustable mask arrangement (30) with axis translation capability along any one of the three principal translational axes (X, Y, or Z). This capability is often the most essential requirement for producing a clear and effective diffraction pattern or intensity patterns. It allows for the precise alignment of the adjustable mask arrangement (30) to achieve the optimal grating period for a given X-ray energy and to perform basic scans across the sample (60). While more complex movements are possible, this translational or rotational capability of the diffraction device (10) provides the essential functionality required for a wide range of foundational X-ray imaging applications.

[0083] In one embodiment of the disclosure, each of the diffraction gratings (31) is connected to an independent movement device (34). In other embodiments, each of the diffraction gratings (31) is connected to a plurality of movement devices (34). Each movement device (34) is configured to translate its respective diffraction gratings (31) along at least one axis, a different axis, or a degree of freedom, relative to the support (32). This configuration allows each one of the diffraction gratings (31) to be controlled individually, rather than the entire mask arrangement (30) moving as a single unit or single element.

[0084] An advantage of the above is directly related to the previously described advantages of high-resolution control. By having a dedicated movement device (34) for each of the diffraction gratings (31), the diffraction device (10) can perform precise and specific alignment adjustments for each diffraction grating (31). This is particularly advantageous for dynamically compensating for beam distortion. For example, the adjustable mask arrangement (30) can precisely adjust the period of the diffraction gratings (31) in realtime or create complex, variable diffraction patterns or intensity patterns on the fly, as mentioned previously. This capability to control each one of the diffraction gratings (31) independently allows the diffraction device (10) to be versatile, optimizing image quality and the ability to obtain phase information under a wide range of experimental conditions, such as changes in X-ray energy, beam coherence, or fluctuations in temperature and vibration.

[0085] Referring again to FIG. 1, in one embodiment, the adjustable mask arrangement (30) is connected to at least two movement devices (34) configured to provide translational or rotational movement to the adjustable mask arrangement (30) along at least two orthogonal axes. This capability enables the adjustable mask arrangement (30) to be moved linearly within at least a plane (e.g., the X-Y plane), which is perpendicular to the propagation axis of the X-rays (8) beams. This planar movement enables comprehensive alignment and scanning operations, as it allows the diffraction device (10) to precisely position the adjustable mask arrangement (30) at any point within a defined two- dimensional area. An advantage of the above is that this two-axis translational mechanism is the ability it provides to the diffraction device (10) to perform full planar alignment and to conduct two-dimensional scanning of the sample (60). In another embodiment, the adjustable mask arrangement (30) is configured to have three dedicated movement devices (34) and at least three diffraction gratings (31). In this configuration, each of the at least three diffraction gratings (31) is independently connected to a support (32), a securing element (33), and a single, dedicated movement device (34). Likewise, the movement of each movement device (34) is precisely controlled by the processing unit (50), thereby enabling individual control over each of the diffraction gratings (31) within the adjustable mask arrangement (30). The diffraction gratings (31) can be configured with different properties, for example, one of the diffraction gratings (31) can be optimized for absorption contrast, another for phase contrast, and a third for dark-field imaging. This allows the diffraction device (10) to acquire a rich, multi -contrast dataset with a single scan of the sample (60). Furthermore, this independent control allows the diffraction device (10) to dynamically correct distortions in the diffraction gratings (31) or the X-ray (8) beam itself by adjusting each position of the diffraction gratings (31) individually.

[0086] In any of the embodiments of the present disclosure, the movement devices (34) may be selected from a group including but not limited to piezoelectric actuators, stepper motors, leadscrew stages, and linear servo motors, or any other suitable device known to a person of ordinary skill in the art.

[0087] In another embodiment, at least one of the movement devices (34) is configured to move the adjustable mask arrangement (30) to perform a full or partial scan of a sample area (37) not illustrated. This capability enables the diffraction device (10) to acquire data from different regions of the sample (60) by systematically translating the adjustable mask arrangement (30) across the sample area (37), for instance, in a raster, serpentine, or point-by-point pattern. This scanning process permits the construction of a complete image of the sample (60) by allowing for the acquisition of a series of diffraction patterns or intensity patterns at discrete scan positions. The data from each of these positions can then be computationally combined and stitched together to form a full-field, high- resolution image of the entire sample area (37). Particularly, in a preferred embodiment of the present disclosure, the adjustable mask arrangement (30) is configured to have an aperture size that can vary between 1 micrometer and 1000 micrometers. This capability allows the diffraction device (10) to be reconfigured to suit a wide range of imaging requirements. The variation in aperture size can be achieved through various means, such as by physically interchanging diffraction gratings (31) with different periods or by dynamically adjusting the position of multiple diffraction gratings (31), as described in other embodiments, to form apertures of the desired dimensions.

[0088] In addition, an advantage of a variable aperture size of the adjustable mask arrangement (30) is the ability to adapt the diffraction device (10) for different imaging modalities and applications, for example, a small aperture size, on the order of a few micrometers, can be highly suitable for high-resolution imaging, especially in applications that rely on phase contrast or dark-field effects to detect fine details. Conversely, a larger aperture size, up to 1000 micrometers, can be utilized for applications requiring a higher X-ray dose to penetrate a dense sample (60) or for acquiring images with a lower resolution. This capability of the adjustable mask arrangement (30) provides a critical trade-off between imaging resolution and radiation dose, allowing the diffraction device (10) to be highly versatile and adaptable to different sample (60) types.

[0089] The present disclosure also describes a system (100) for multimodal image acquisition, comprising an X-ray emitting device (11) configured to emit X-rays (8), an X-ray detector device (12) configured to obtain a set of diffracted images (13), wherein each image of the set of diffracted images (13) is obtained from diffracted X-rays (25). The system (100) also comprises a diffraction device (10) comprising an adjustable mask arrangement (30) and located between the X-ray emitting device (11), the X-ray detector device (12) and a sample (60), wherein the diffraction device (10) is configured for generating the diffracted X-rays (25) by means of the adjustable mask arrangement (30), and a processing unit (50) connected to the diffraction device (10), the X-ray emitting device (11), and the X-ray detector device (12), and is configured to receive the diffracted images (13) by means of the X-ray detector device (12). Particularly, the X-ray emitting device (11) is a source of X-ray radiation configured to emit a beam that propagates along a primary axis. The emitted beam is directed toward the diffraction device (10), serving as the illumination source for the system (100). In one embodiment, the X-ray emitting device (11) is a source that provides a high degree of spatial coherence. This coherence is critical for generating a clear and usable diffraction pattern or intensity patterns as the beam passes through the diffraction gratings (31). The X-ray emitting device (11) can be configured to operate within a specific energy range to suit different imaging applications, such as medical imaging or materials analysis.

[0090] In a more specific embodiment, the X-ray emitting device (11) can be a polychromatic X- ray source that includes a tungsten target and a beryllium window. The polychromatic X- ray source can be configured to operate over a wide range of voltage and current, allowing it to generate X-rays with a broad energy spectrum. The focal spot of the polychromatic X-ray source can have a dimension of approximately 50 pm to 300 pm, a size that provides an intensity distribution for the imaging technique. The intensity of the emitted X-ray beam can be approximately normally distributed across its solid angle.

[0091] Likewise, the X-ray emiting device (11) may include a collimating element to control the exit angle of the beam and mitigate scattering and background noise. This collimator ensures that the X-rays (8) beam is directed towards the rest of the X-ray emitting device (11) within a specific cone angle. Additionally, the X-ray emitting device (11) can be equipped with a communication interface, such as an RS-232C port, that allows for its automated operability and remote control by the processing unit (50). This external control capability is essential for integrating the X-ray emitting device (11) into the system (100) and for automating an image acquisition process.

[0092] It will be understood in the present disclosure that the X-ray detector device (12) can be configured to receive and detect the diffracted X-rays (25) after the X-rays (8) have been modulated by the adjustable mask arrangement (30). The primary function of the X-ray detector device (12) is to capture the resulting diffraction pattern or intensity patterns and convert the diffracted X-rays (25) signal into an electrical signal. This electrical signal can then be transmitted to the processing unit (50) for image reconstruction and analysis. In addition, the X-ray detector device (12) may be selected to have a sufficient spatial resolution and active area to effectively capture the diffracted beams, and to be sensitive to the energy spectrum of the X-rays (8) emitted by the X-ray emitting device (11).

[0093] The X-ray detector device (12) can be one of several types, each offering distinct advantages. For instance, for applications requiring high resolution and low noise, the X- ray detector device (12) may be a Charge-Coupled Device (CCD) sensor. For applications that prioritize speed and high frame rates, a Complementary Metal-Oxide- Semiconductor (CMOS) sensor may be used. Furthermore, for imaging larger samples that extend beyond the dimensions of a single sensor, the X-ray detector device (12) may be a flat-panel detector. In an alternative embodiment, the X-ray detector device (12) can be a photon-counting detector that is capable of energy discrimination, which can be useful for reducing noise and acquiring spectral information from the sample (60).

[0094] The advanced processing capability of the X-ray detector device (12), in conjunction with the processing unit (50), provides key advantages, for example, the seamless integration of data acquisition and computational power allows the raw X-ray detector device (12) data to be transformed into a meaningful and high-quality image. This is made possible because the system (100) can perform crucial processing tasks, such as image reconstruction, noise reduction, and phase retrieval, directly from the digitized signal of the X-ray detector device (12).

[0095] In one embodiment, the X-ray detector device (12) can be configured with a pixel size that is selected to be commensurate with or smaller than the period of the diffraction gratings (31). This specific configuration allows the X-ray detector device (12) to have sufficient spatial resolution to accurately sample the diffracted X-rays (25) beams and resolve the fine fringe patterns produced by the diffraction gratings (31). The precise matching of the pixel of the X-ray detector device (12) pitch to the period of the diffraction gratings (31) allows for a direct correlation between the acquired signal and the modulation of the X-rays (8) beam. This fundamental relationship is essential for the effective reconstruction of a high-quality image. In one embodiment, the X-ray detector device (12) comprises a digital pixel sensor (38) not illustrated. The digital pixel sensor (38) can be configured such that each pixel converts an analog signal into a digital value directly at the pixel site. This configuration enables high readout speed and low noise, as the analog signals are not required to travel long distances before conversion. The digital pixel sensor (38) also enables a high dynamic range by allowing for independent gain control or exposure time at the pixel level, which is particularly beneficial for capturing images with a wide range of intensities and ensuring no information is lost in either bright or dark areas of the sample (60).

[0096] On the other hand, and referring to FIG. 4, FIG. 5A and FIG. 5B, the set of diffracted images (13) refers to the digital data acquired by the X-ray detector device (12) after the X-rays (8) beams have interacted with the sample (60) and the adjustable mask arrangement (30). This data is not a direct visual representation of the sample (60), but rather a collection of X-ray intensity values recorded at a plurality of discrete positions as the mask arrangement (30) is systematically moved across the sample area (37). Each image within the set of diffracted images (13) contains encoded information about the absorption of the sample (60), refraction, and scattering properties.

[0097] The set of diffracted images (13) serves as the primary input for the processing unit (50). Computational algorithms can be applied to this raw data to extract and separate the different types of encoded information. For example, from the set of diffracted images (13), the processing unit (50) can reconstruct and generate a full-field image displaying a conventional absorption contrast image. The data can also be used to derive other image types, such as a differential phase-contrast image, which highlights refractive properties, or a dark-field image, which reveals small-angle scattering from micro-structures within the sample (60). Therefore, the set of diffracted images (13) refers to a set of data from which one or more distinct image modalities can be derived.

[0098] In one embodiment of the present disclosure, the set of diffracted images (13) can be obtained through a “dithering' process. This technique involves acquiring multiple images for each scan by moving the diffraction mask arrangement (30) at sub-pixel distances. This allows for an improvement in the final image resolution and a reduction of artifacts. An example of this embodiment's implementation uses one to sixteen dithering steps to achieve an effective improvement in image quality.

[0099] In another embodiment, the set of diffracted images (13) may be obtained using the digital pixel sensor (38) that enables image reconstruction based on pixel parity. In this configuration, the information required to retrieve the signals is contained within pairs of pixels in a column. The total signal, such as attenuation, can be reconstructed by summing the positive and negative fringes from a pixel pair. This technique simplifies the signal retrieval process by performing direct operations on each pixel pair.

[0100] An additional embodiment for obtaining the set of diffracted images (13) involves a phase acquisition procedure, using a fixed alignment configuration where the illumination curve is set to be at equal positive and negative fringing using a -50% - 50% over the flat-field. In a particular example, a total set of 8 images can be acquired, and each set of 8 images may include eight dithered flat-field images and eight dithered sample images. These images can then be corrected and concatenated to form the final data set, which optimizes the acquisition process and improves image quality on the phase contrast signal.

[0101] An additional embodiment for obtaining the set of diffracted images (13) involves a darkfield acquisition procedure, using a fixed alignment configuration where the illumination curve is set to be totally fringed over a set of pixels at a -100% - 0% over the flat-field. Similarly to the previous embodiment, a total of 8 images is acquired to then optimize the dark field signal.

[0102] In a preferred embodiment, the system (100) comprises the diffraction device (10), which includes the adjustable mask arrangement (30). The diffraction device (10) can be strategically positioned between the X-ray emitting device (11), the X-ray detector device (12), and the sample (60). The primary function of the diffraction device (10) is to generate the diffracted X-rays (25) by interacting with the X-rays (8) beams from the X- ray emitting device (11). This interaction, which is modulated by the adjustable mask arrangement (30), results in a finely tuned intensity pattern that carries information about the sample (60).

[0103] In addition, the strategic disposition of the diffraction device (10) allows it to serve as the central component for a wide range of imaging applications. Its location ensures that the X-rays (8) beam interacts with the sample (60) after being modulated by the adjustable mask arrangement (30), enabling the detection of subtle phase shifts and absorption differences. The ability to precisely adjust the mask arrangement (30), as described in other embodiments, provides a significant degree of freedom for optimizing the intensity pattern to suit different sample (60) types and experimental conditions. This versatility allows the system (100) to achieve high-resolution, high-contrast images, making it a powerful tool for applications such as medical imaging and materials science.

[0104] In any of the disclosed embodiments, the system (100) comprises a processing unit (50) that is connected to the diffraction device (10), the X-ray emitting device (11), and the X- ray detector device (12). The processing unit (50) is configured to receive the diffracted images (13) from the X-ray detector device (12). Also, the processing unit (50) serves as the brain of the system (100), orchestrating the operation of the various components to acquire, process, and analyze the imaging data.

[0105] In the present disclosure, it will be understood that the processing unit (50) can be any processing module or data-processing device. This includes, for example, control units and processing modules that are well-known to a person of ordinary skill in the art, as well as combinations of these components.

[0106] The processing unit (50) may also include or be connected to a display device and / or a Human Interface Device (HID). A display device can be any device capable of connecting to a computing unit (50) and showing its output, such as a monitor, flat-panel screen, LCD, LED, or OLED display. A Human Interface Device is any device that allows a user to input data, including but not limited to a keyboard, mouse, trackball, touchpad, or touchscreen. Likewise, the processing unit (50) can control the movement devices (34) within the diffraction device (10) to execute a pre-programmed scanning or alignment routine, ensuring that the mask arrangement (30) is positioned with high accuracy. This automation minimizes the need for manual intervention, increases the throughput of the system (100), and ensures consistent and repeatable results.

[0107] The processing unit (50) is also responsible for all data processing, image reconstruction, and image combination. Upon receiving the set of diffracted images (13), the processing unit (50) can be configured to apply algorithms to reconstruct the final image. This can include tasks such as correcting background noise, normalizing the signal, and performing mathematical inversions to retrieve phase information from the raw data. This computational power is a significant advantage, as it transforms the raw data, which is essentially a collection of intensity values, into meaningful and interpretable images that reveal properties of the sample (60), such as absorption, phase, and dark-field contrast.

[0108] Referring to FIG. 4, in one embodiment of the present disclosure, the system (100) is minimally composed of a polychromatic collimated X-ray source corresponding to the X-ray emitting device (11) and a digital detector array corresponding to the X-ray detector device (12). The sample (60), which receives the X-ray radiation from the polychromatic collimated X-ray source, is located between the polychromatic collimated X-ray source and the digital detector array. The adjustable mask arrangement (30) is located between the polychromatic collimated X-ray source before the sample (60). The data retrieved by the digital detector array is then stored and processed by the processing unit (50).

[0109] In one embodiment of the present disclosure, the system (100) is configured for the processing unit (50) to obtain the raw data from the X-ray detector device (12) and apply computational processing to generate the final images. This reconstruction process is multifaceted, and the processing unit (50) can generate various imaging modalities, such as absorption contrast, phase contrast, and dark-field signals from a single dataset. This multi-modal approach provides a more comprehensive view of the sample (60) than conventional imaging techniques. Likewise, the image processing can be performed through a series of steps controlled by the processing unit (50). The processing unit (50) subjects the acquired images to preprocessing, including dead-pixel interpolation to correct X-ray detector device (12) imperfections and a flat-field correction to eliminate artifacts caused by non-uniform illumination. The intervention of the processing unit (50) at these stages is essential to ensure the quality and accuracy of the data before the final image reconstruction.

[0110] In another embodiment, the system (100) uses a dithering process to improve spatial resolution. The processing unit (50) manages this process by controlling the movement of the adjustable mask arrangement (30) and receiving the set of diffracted images (13) composed of a series of dithered images. The processing unit (50) then concatenates them to reconstruct a single, higher-resolution image. For example, when using the digital pixel sensor (38), the processing unit (50) can perform reconstruction based on pixel parity, where it recovers the signal information from pairs of pixels to form the final image.

[0111] A preferred embodiment of the disclosure involves the multichannel integration of the different signals (e.g., absorption, phase, and dark field) into a single, combined image. This integration is carried out by the processing unit (50), which assigns each signal to a color channel (e.g., RGB channels). The resulting image, optimized for reading, highlights features not evident in the individual signals, improving the visualization of soft tissue or enhancing the edges in the sample (60).

[0112] Particularly, the preferred embodiment adjusts the mask arrangement (30) in a position and alignment that allows a multimodal imaging mode. Using a preconfigured routine, the system (100) is set to simultaneously generate absorption, phase contrast and darkfield images in a single take by different mathematical reconstructions of the same dithered images using the processing unit (50).

[0113] In one embodiment, the processing unit (50) is configured to control the movement of the adjustable mask arrangement (30) and to adjust the aperture size and period of the adjustable mask arrangement (30). This centralized control makes the system (100) highly flexible, and this flexibility of the system (100), driven by the centralized control of the processing unit (50), stems from its ability to dynamically coordinate and adjust multiple parameters simultaneously. This allows the system (100) to autonomously adapt to different conditions, such as X-ray emitting device (11) to X-ray detector device (12) distance, pixel pitch, and X-ray detector device (12) resolution, as well as the sample (60) to X-ray detector device (12) distance which is often limited in some X-ray imaging applications, optimizing image quality. The processing unit (50) can automatically adjust the position of the adjustable mask arrangement (30) and period to perform a full or partial scan of the sample (60), which optimizes acquisition time. In this way, the system (100) not only improves workflow efficiency but also ensures the best possible image quality in different embodiments, whether in absorption, phase, or dark-field contrast, without requiring manual intervention.

[0114] Furthermore, the capability of the processing unit (50) to adjust the aperture size and period of the adjustable mask arrangement (30) provides the system (100) with greater versatility. The system (100) can be easily reconfigured to switch between different imaging modalities or to adapt to various experimental conditions without the need for manual intervention. This level of automation is critical for industrial and clinical applications where speed and repeatability are essential. Finally, by enabling the system (100) to automatically optimize its configuration, this significantly improves the utility of the diffraction device (10) and performance across a wide range of applications.

[0115] Referring to FIG. 4, FIG. 5A, FIG. 5B and FIG. 6, these show an embodiment of the present disclosure that details an alignment and imaging protocol. The automatic alignment protocol utilizes the system (100) without a sample (60). Given the current position and interference image from the X-ray detector device (12), the processing unit (50) communicates the ideal position of the adjustable mask arrangement (30) to the processing unit (50). Once the system (100) is aligned, the sample (60) is placed, and the imaging pipeline begins. In this embodiment, the system (100) retrieves a total of eight images, which are then post-processed by the processing unit (50) to produce four final images: absorption, phase contrast, dark-field and a fused image of the previous three. EXAMPLES

[0116] EXAMPLE 1

[0117] In an experimental example, a system (100) was utilized to generate a set of multimodal images of a sample (60), as shown in FIG. 7. In this case, an ex vivo specimen of 2 week Poecilia reticulata larvae specimen with a total length of 6.7 mm from head to tail and a transversal length of 1.7 mm from torso to dorsal fin. The X-ray emitting device (11) was configured to emit X-rays (8) that interacted with the sample (60) to generate diffracted X-rays (25).

[0118] Also, a diffraction device (10) was positioned between the sample (60) and the X-ray detector device (12). The adjustable mask arrangement (30) was held by a support (32) and a securing element (33), and its movement was controlled by the processing unit (50) via the movement devices (34) to perform a dithering process.

[0119] The X-ray detector device (12), equipped with a digital pixel sensor (38), captured a set of diffracted images (13). The system (100) acquired a total of 34 images, 17 for each of the two illumination modalities used (~50%-50% and ~100%-0%). The processing unit (50) received the images and processed them using pixel parity-based reconstruction algorithms. From this processing, the absorption contrast, phase contrast, and dark-field signals were recovered and generated, providing a multimodal analysis of the sample (60). The results of this imaging process are shown in FIG. 7 with four anatomical areas. Such areas include the lateral fin, otoliths, tail and a dorsal view of the spine. Due to the early development of the specimen, the absorption signal is low due to no presence of dense material. However, phase contrast and dark-field are able to provide additional structural information in all four regions and an overall increase on the Signal-to-noise ratio (SNR) and contrast-to-noise ratio (CNR) of 64.5% in the otoliths region (compared with dark-field), 48.3% in the spine region (compared with phase contrast) and 29.9% in the tail region (compared with dark field). The lateral fin region did not present a significant improvement in image quality or structural information. EXAMPLE 2

[0120] The second example uses a CIRS011A accreditation phantom at mammographic distances and a flat-panel detector. Similarly, four regions of interest (ROIs) were displayed together with a fused final image (as shown in FIG. 8).

[0121] Another experimental example using the system (100) is described herein, and the results are shown in FIG. 8. Specifically, a laboratory system (100) comprised a microfocal Microbox 100 model MC 110 X-ray source as the X-rays emitting device (11), an embodiment of the adjustable mask arrangement (30) of the present disclosure, and a-Si flat-panel detector as the X-ray detector device (12) with 143 pm pixel size. This example replicated a standard mammography setup: considering a distance of 70 cm between the X-ray emitting device (11) and the X-ray detector device (12), and the distance from the adjustable mask arrangement (30) to the X-ray detector device (12) was 7 cm.

[0122] In this embodiment of the system (100), the adjustable mask arrangement (30) comprised two diffraction gratings (31) of equal period and aperture size, which were adjusted to reduce the aperture size to <60 pm. A sample (60) was placed between the adjustable mask arrangement (30) and the X-ray detector device (12). The sample (60) used for this experiment was a CIRS011A accreditation phantom, containing elements such as capillary tubes, masses, microcalcifications, and dense material rings.

[0123] The alignment and imaging stages used a high-resolution stepping motor as the movement device (34). A total of 16 images were collected, wherein the X-ray emitting device (11) generated the incident X-rays (8), which passed through the diffraction device (10), including the adjustable mask arrangement (30), to produce the diffracted X-rays (25). With the sample (60) positioned on the beam path, a set of diffracted images (13) was obtained at the X-ray detector device (12). Then, image reconstruction, enhancement, and fusion were processed by the processing unit (50), and four images were obtained: absorption (FIG. 8 A-E top), differential phase contrast (FIG. 8 A-E middle), dark-field (FIG. 8 A-E bottom), and a fused image (FIG. 8 A-E left) that combined information from the previous three (Multifuse). Furthermore, FIG. 8 shows four ROIs together with the final Multifuse image. Particularly, in FIG 8. (A) shows the global view of the sample (60), for a more detailed description of the sample, four ROIs are shown which also depict objects of interest in diagnostics such as microcalcifications (D) and masses (C). A nylon capillary of 1.25 mm diameter size is also included (B) which mimics tubular anatomical structures, and an optical density reference zone ring (E). Each region (B-E) shows the same ROI for the four images produced and is later characterized under image quality metrics such as contrast-to-noise ratio (CNR). All four regions show an overall increase in image quality in the final Multifuse image, in particular, the microcalcifications region reached a mean SNR for each particle increase of 40% and masses reached a mean CNR increase of 25%.

[0124] It should be understood that the invention described in the present disclosure is not limited to the embodiments described and illustrated, as it will be evident to a person skilled in the art that there are variations and possible modifications that do not depart from the spirit of the invention, which is only defined by the following claims.

Claims

CLAIMS1. A diffraction device (10) for obtaining diffracted X-rays (25), comprising: an adjustable mask arrangement (30) comprising at least one diffraction grating (31), configured to receive input X-rays (8) from an X-ray emitting device (11) to generate diffracted X-rays (25); and a processing unit (50) configured to control movement of the adjustable mask arrangement (30) and to adjust the aperture size and period of the adjustable mask arrangement (30).

2. The diffraction device of Claim 1, wherein the adjustable mask arrangement (30) is configured to have between one and nine diffraction gratings (31).

3. The diffraction device of Claim 1, wherein the adjustable mask arrangement (30) is configured to have at least three diffraction gratings (31).

4. The diffraction device of Claim 3, wherein the at least three diffraction gratings (31) are different from each other.

5. The diffraction device of Claim 1 to 4, wherein each one of the diffraction gratings (31) comprises a diffraction pattern (35) selected from the group consisting of parallel bars, dot matrix, concentric rings, checkerboard, and combinations thereof.

6. The diffraction device of Claim 1, wherein each one of the diffraction gratings (31) comprises alternating regions of a first material and a second material, wherein the first and the second material having different attenuation properties.

7. The diffraction device of Claim 6, wherein the first material is a high attenuation material, and the second material is a low attenuation material.

8. The diffraction device of Claim 7, wherein the high attenuation material is selected from the group consisting of gold, tungsten, copper, nickel, lead, bismuth, tin, platinum, tantalum, dichalcogenides, and combinations thereof.

9. The diffraction device of Claim 7, wherein the low attenuation material is selected from the group consisting of glass, quartz, fused silica, borosilicate glass, polyimide, cellulose acetate, polyethylene terephthalate, epoxy glass, kapton, bakelite, plastic, and combinations thereof.

10. The diffraction device of Claim 1, wherein the adjustable mask arrangement (30) is connected to a support (32), a securing element (33), and a plurality of movement devices (34) controlled by the processing unit (50).

11. The diffraction device of Claim 10, wherein at least one of the movement devices (34) is configured to provide translational movement to the mask arrangement (30) along at least a first axis.

12. The diffraction device of Claim 10, wherein each diffraction grating (31) is connected to an independent movement device (34) configured to translate its respective diffraction grating (31) along at least one axis relative to the support (32).

13. The diffraction device of Claim 10, wherein the adjustable mask arrangement (30) is connected to at least two movement devices (34) configured to provide translational movement to the mask arrangement (30) along at least two orthogonal axes.

14. The diffraction device of Claim 3 and 10, wherein the adjustable mask arrangement (30) comprises at least three diffraction gratings (31), wherein each one of the at least three diffraction gratings (31) is connected to a support (32), a securing element (33), and a plurality of movement devices (34) controlled by the processing unit (50).

15. The diffraction device of Claim 10, wherein the adjustable mask arrangement (30) is configured to have three movement devices (34) and at least three diffraction gratings(31), wherein each of the at least three diffraction gratings (31) is connected to a support(32), a securing element (33), and one of the three movement devices (34) controlled by the processing unit (50).

16. The diffraction device of Claim 10, wherein the movement devices (34) are selected from the group consisting of piezoelectric actuators, stepper motors, leadscrew stages, and linear servo motors.

17. The diffraction device of Claim 10, wherein at least one of the movement devices (34) is configured to move the adjustable mask arrangement (30) to perform a full or partial scan of a sample area (37).

18. The diffraction device of Claim 1, wherein the aperture size of the adjustable mask arrangement (30) is configured to vary between 1 micrometer and 1000 micrometers.

19. A system (100) for multimodal image acquisition, comprising:- an X-ray emitting device (11) configured to emit X-rays (8);- an X-ray detector device (12) configured to obtain a set of diffracted images (13), wherein each image of the set of diffracted images (13) is obtained from diffracted X-rays (25);- a diffraction device (10) comprising an adjustable mask arrangement (30) and located between the X-ray emitting device (11), the X-ray detector device (12) and a sample (60), wherein the diffraction device (10) is configured for generating the diffracted X-rays (25) by means of the adjustable mask arrangement (30); and- a processing unit (50) connected to the diffraction device (10), the X-ray emitting device (11), and the X-ray detector device (12), and is configured to receive the diffracted images (13) by means of the X-ray detector device (12).

20. The system of Claim 19, wherein the X-ray detector device (12) comprising a digital pixel sensor (38).

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