Automatic adjustment system and method for focused beam current, and ion implanter

Abstract

The present application provides an automatic adjustment system and method for a focused beam current, and an ion implanter. The system comprises: a quadrupole magnetic lens group directly facing an output end of an ion source mechanism, the quadrupole magnetic lens group comprising at least one X magnetic lens and at least one Y magnetic lens; a lens position adjustment assembly configured for adjusting a position of the X magnetic lens and / or the Y magnetic lens; a Faraday cup arranged on a side of the quadrupole magnetic lens group away from the ion source mechanism and configured for collecting actual beam current magnitude information; a controller electrically connected to the lens position adjustment assembly and the Faraday cup, and configured for analyzing, according to the actual beam current magnitude information, whether a current beam current is a target beam current, the controller being further configured for controlling the lens position adjustment assembly to adjust the position of the X magnetic lens and / or the Y magnetic lens when the current beam current is not the target beam current, so that the actual beam current magnitude information reaches a maximum value or the current beam current achieves a target beam current value.

Description

Focusing beam current automatic adjustment system, method and ion implanter

[0001] Related applications

[0002] The present application claims priority to Chinese Patent Application No. 202411324806.6, filed on September 23, 2024, the contents of which are incorporated herein by reference in its entirety. TECHNICAL FIELD

[0003] The present application relates to the technical field of ion implantation, in particular to a focusing beam current automatic adjustment system, method and ion implanter. BACKGROUND

[0004] In the technical field of semiconductor device and integrated circuit production, the quantity, depth and distribution of doping elements are precisely controlled by using an ion implanter. The existing ion implanter includes an ion source system, a beam focusing system, a beam line system and a target chamber system arranged in sequence from left to right, the beam focusing system is used for focusing the beam generated by the ion source system, and the beam focusing system includes a doublet quadrupole magnetic lens (one X magnetic lens and one Y magnetic lens). The installation process of the beam focusing system is: obtaining the installation position of the doublet quadrupole magnetic lens based on theoretical calculation; and fixedly installing the doublet quadrupole magnetic lens according to the obtained installation position. The doublet quadrupole magnetic lens will be worn after long time use, at this time the focusing effect of the beam focusing system is reduced, therefore the existing technology has the problem that the focusing effect of the beam focusing system cannot be adjusted by adjusting the position of the doublet quadrupole magnetic lens due to the fixed installation of the doublet quadrupole magnetic lens.

[0005] At present, there is no effective technical solution to the above problems. TECHNICAL PROBLEM

[0006] The purpose of the present application is to provide a focusing beam current automatic adjustment system, method and ion implanter, which can effectively solve the problem that the optimal installation position of the doublet quadrupole magnetic lens when actually installing the doublet quadrupole magnetic lens is not the optimal installation position obtained based on theoretical calculation due to the limited actual installation precision of the doublet quadrupole magnetic lens and the deviation of the vacuum degree and other parameters of the environment where the doublet quadrupole magnetic lens is located from the ideal state, and the optimal installation position of the doublet quadrupole magnetic lens changes before and after wear, thereby effectively improving the focusing effect of the beam focusing system. TECHNICAL SOLUTION

[0007] In a first aspect, the present application provides a focusing beam current automatic adjustment system, which is applied in an ion implanter, the ion implanter includes an ion source mechanism, the ion source mechanism is used for generating a beam, and the focusing beam current automatic adjustment system includes:

[0008] A quadrupole magnetic lens group opposite to an output end of the ion source mechanism, comprising at least one X magnetic lens and at least one Y magnetic lens;

[0009] A lens position adjusting assembly for adjusting the position of the X magnetic lens and / or the Y magnetic lens;

[0010] A Faraday cup arranged on a side of the quadrupole magnetic lens group away from the ion source mechanism, for collecting actual beam current size information;

[0011] A controller electrically connected with the lens position adjusting assembly and the Faraday cup, for analyzing whether the current beam current is the target beam current according to the actual beam current size information, and for controlling the lens position adjusting assembly to adjust the position of the X magnetic lens and / or the Y magnetic lens to make the actual beam current size information reach a maximum or the current beam current reach the target beam current when the current beam current is not the target beam current.

[0012] The application provides a focused beam current automatic adjustment system, comprising a quadrupole magnetic lens group, a lens position adjusting assembly, a Faraday cup and a controller, when it is analyzed that the current beam current is not the target beam current, the application can make the actual beam current size information reach a maximum or the current beam current reach the target beam current by controlling the lens position adjusting assembly to adjust the position of the X magnetic lens and / or the Y magnetic lens, so that even if the quadrupole magnetic lens group is worn after long-time use, the application can adjust the focusing effect of the quadrupole magnetic lens group by adjusting the position of the X magnetic lens and / or the Y magnetic lens, thereby effectively solving the problem that the focusing effect of the beam focusing system cannot be adjusted by adjusting the position of the dual-element quadrupole magnetic lens because the dual-element quadrupole magnetic lens is fixedly installed.

[0013] In an embodiment, the quadrupole magnetic lens group comprises one X magnetic lens and one Y magnetic lens, and the controller controls the lens position adjusting assembly to adjust the position of the X magnetic lens and / or the Y magnetic lens to make the actual beam current size information reach a maximum or the current beam current reach the target beam current, and the process comprises:

[0014] A1, controlling the lens position adjusting assembly to adjust the position of the X magnetic lens and / or the Y magnetic lens according to a preset position adjustment value, and recording the X magnetic lens position information, the Y magnetic lens position information and the actual beam current size information after the position adjustment, until the cumulative adjustment times of the X magnetic lens and the Y magnetic lens both reach a first preset quantity threshold or the current beam current reaches the target beam current;

[0015] A2, when the cumulative adjustment times of the X magnetic lens and the Y magnetic lens both reach the first preset quantity threshold and the current beam current does not reach the target beam current, controlling the lens position adjusting assembly to adjust the position of the X magnetic lens and / or the Y magnetic lens according to the X magnetic lens position information and the Y magnetic lens position information corresponding to the maximum actual beam current size information, so as to make the actual beam current size information reach a maximum.

[0016] In an embodiment, the distance between the X magnetic lens and the ion source mechanism is less than the distance between the Y magnetic lens and the ion source mechanism, and step A1 comprises:

[0017] A11, controlling the lens position adjusting assembly to adjust the position of the X magnetic lens according to the preset position adjustment value, and recording the X magnetic lens position information, the Y magnetic lens position information and the actual beam size information at this time;

[0018] A12, analyzing whether the actual beam size information is greater than or equal to the preset target beam size, if yes, ending the adjustment, if no, executing step A13, and the preset target beam size is the size of the target beam;

[0019] A13, controlling the lens position adjusting assembly to adjust the position of the Y magnetic lens according to the preset position adjustment value, and recording the X magnetic lens position information, the Y magnetic lens position information and the actual beam size information at this time;

[0020] A14, analyzing whether the actual beam size information is greater than or equal to the preset target beam size, if yes, ending the adjustment, if no, executing step A15;

[0021] A15, analyzing whether the cumulative adjustment number of the Y magnetic lens reaches a first preset number threshold, if yes, executing step A16, if no, returning to step A13;

[0022] A16, analyzing whether the cumulative adjustment number of the X magnetic lens reaches a first preset number threshold, if yes, executing step A2, if no, controlling the lens position adjusting assembly to adjust the position of the Y magnetic lens to the initial position and emptying the cumulative adjustment number of the Y magnetic lens, and returning to step A11.

[0023] Since before executing step A13 and step A15, the technical solution first analyzes whether the actual beam size information is greater than or equal to the preset target beam size, and ends the adjustment when the actual beam size information is greater than or equal to the preset target beam size, that is, the technical solution is equivalent to stopping adjusting the position of the X magnetic lens and / or the Y magnetic lens after adjusting the current beam to the target beam, so the technical solution can effectively avoid the situation that even if the current beam has been adjusted to the target beam under the current X magnetic lens position information, the position of the X magnetic lens and / or the Y magnetic lens is still adjusted.

[0024] In an embodiment, the quadrupole magnetic lens group comprises a first quadrupole magnetic lens, a second quadrupole magnetic lens and a third quadrupole magnetic lens arranged in sequence, when the first quadrupole magnetic lens and the third quadrupole magnetic lens are X magnetic lenses, the second quadrupole magnetic lens is a Y magnetic lens, when the first quadrupole magnetic lens and the third quadrupole magnetic lens are Y magnetic lenses, the second quadrupole magnetic lens is an X magnetic lens, the controller controls the lens position adjusting assembly to adjust the position of the X magnetic lens and / or the Y magnetic lens, and the process of making the actual beam size information reach the maximum or making the current beam reach the target beam includes:

[0025] A1', controlling the lens position adjusting assembly to adjust the position of the second quadrupole magnetic lens according to the preset position adjustment value, and recording the second quadrupole magnetic lens position information after position adjustment and the actual beam size information, until the cumulative adjustment number of the second quadrupole magnetic lens reaches the first preset number threshold or the current beam reaches the target beam;

[0026] A2', when the cumulative adjustment number of the second quadrupole magnetic lens reaches the first preset number threshold and the current beam does not reach the target beam, controlling the lens position adjusting assembly to adjust the position of the second quadrupole magnetic lens according to the second quadrupole magnetic lens position information corresponding to the maximum actual beam size information, so as to make the actual beam size information reach the maximum.

[0027] In an embodiment, the focused beam automatic adjustment system further comprises a current adjusting assembly for adjusting the current of the second quadrupole magnetic lens, and step A1' comprises:

[0028] A11', controlling the lens position adjusting assembly to adjust the position of the second quadrupole magnetic lens according to the preset position adjustment value and controlling the current adjusting assembly to adjust the current of the second quadrupole magnetic lens according to the preset current adjustment value, and recording the second quadrupole magnetic lens position information, the second quadrupole magnetic lens current information and the actual beam size information after each adjustment, until the cumulative adjustment number of the position of the second quadrupole magnetic lens reaches the first preset number threshold and the cumulative adjustment number of the current of the second quadrupole magnetic lens reaches the second preset number threshold or the current beam reaches the target beam;

[0029] Step A2' comprises:

[0030] A21, when the cumulative adjustment number of the position of the second quadrupole magnetic lens reaches the first preset number threshold, the cumulative adjustment number of the current of the second quadrupole magnetic lens reaches the second preset number threshold and the current beam does not reach the target beam, controlling the lens position adjusting assembly to adjust the position of the second quadrupole magnetic lens according to the second quadrupole magnetic lens position information corresponding to the maximum actual beam size information, and controlling the current adjusting assembly to adjust the current of the second quadrupole magnetic lens according to the second quadrupole magnetic lens current information corresponding to the maximum actual beam size information, so as to make the actual beam size information reach the maximum.

[0031] In an embodiment, step A11' comprises:

[0032] A111, controlling the lens position adjusting assembly to adjust the position of the second quadrupole magnetic lens according to the preset position adjustment value, and recording the second quadrupole magnetic lens position information, the second quadrupole magnetic lens current information and the actual beam size information at this time;

[0033] A112, analyzing whether the actual beam size information is greater than or equal to the preset target beam size, if yes, ending the adjustment, if no, executing step A113;

[0034] A113, controlling the current adjusting assembly to adjust the current of the second quadrupole magnetic lens according to the preset current adjustment value, and recording the second quadrupole magnetic lens position information, the second quadrupole magnetic lens current information and the actual beam size information at this time;

[0035] A114, analyzing whether the actual beam size information is greater than or equal to the preset target beam size, if yes, ending the adjustment, if no, executing step A115;

[0036] A115, analyzing whether the cumulative adjustment number of the current of the second quadrupole magnetic lens reaches the second preset number threshold, if yes, executing step A116, if no, returning to step A112;

[0037] A116, analyzing whether the cumulative adjustment number of the position of the second quadrupole magnetic lens reaches the first preset number threshold, if yes, executing step A2', if no, controlling the current adjusting assembly to adjust the current of the second quadrupole magnetic lens to the initial current and the cumulative adjustment number of the current of the second quadrupole magnetic lens, and returning to step A111.

[0038] Since before executing step A113 and step A115, the technical solution first analyzes whether the actual beam size information is greater than or equal to the preset target beam size, and ends the adjustment when the actual beam size information is greater than or equal to the preset target beam size, that is, the technical solution is equivalent to stopping adjusting the position and current of the second quadrupole magnetic lens after adjusting the current beam to the target beam, so the technical solution can effectively avoid the situation that even if the current beam has been adjusted to the target beam under the current second quadrupole magnetic lens position information, the current and position of the second quadrupole magnetic lens are still adjusted.

[0039] In an embodiment, the X magnetic lens and the Y magnetic lens each comprise two south poles and two north poles, the two south poles of the X magnetic lens are located in the first quadrant and the third quadrant of the X magnetic lens respectively, the two north poles of the X magnetic lens are located in the second quadrant and the fourth quadrant of the X magnetic lens respectively, the two south poles of the Y magnetic lens are located in the second quadrant and the fourth quadrant of the Y magnetic lens respectively, and the two north poles of the Y magnetic lens are located in the first quadrant and the third quadrant of the Y magnetic lens respectively.

[0040] In an embodiment, the ion implanter further comprises an analyzing magnet, which is arranged between the ion source mechanism and the focused beam automatic adjustment system or between the focused beam automatic adjustment system and the beam line mechanism.

[0041] In a second aspect, the present application provides a focused beam automatic adjustment method, which is applied in the focused beam automatic adjustment system provided in the first aspect, and comprises the following steps:

[0042] S1, analyzing whether the current beam is the target beam according to the actual beam size information;

[0043] S2, when the current beam is not the target beam, controlling the lens position adjusting assembly to adjust the positions of the X magnetic lens and / or the Y magnetic lens, so that the actual beam size information reaches the maximum.

[0044] The focused beam automatic adjustment method provided by the present application is applied in the focused beam automatic adjustment system, which comprises the quadrupole magnetic lens group, the lens position adjusting assembly, the Faraday cup and the controller. When it is analyzed that the current beam is not the target beam, the present application can make the actual beam size information reach the maximum or make the current beam reach the target beam by controlling the lens position adjusting assembly to adjust the positions of the X magnetic lens and / or the Y magnetic lens. Therefore, even if the quadrupole magnetic lens group is worn after long-time use, the present application can adjust the focusing effect of the quadrupole magnetic lens group by adjusting the positions of the X magnetic lens and / or the Y magnetic lens, thereby effectively solving the problem that the focusing effect of the beam focusing system cannot be adjusted by adjusting the positions of the dual-element quadrupole magnetic lens due to the fixed installation of the dual-element quadrupole magnetic lens.

[0045] In a third aspect, the present application provides an ion implanter, which comprises the focused beam automatic adjustment system provided in the first aspect.

[0046] The ion implanter provided by the present application comprises the focused beam automatic adjustment system, which comprises the quadrupole magnetic lens group, the lens position adjusting assembly, the Faraday cup and the controller. When it is analyzed that the current beam is not the target beam, the present application can make the actual beam size information reach the maximum or make the current beam reach the target beam by controlling the lens position adjusting assembly to adjust the positions of the X magnetic lens and / or the Y magnetic lens. Therefore, even if the quadrupole magnetic lens group is worn after long-time use, the present application can adjust the focusing effect of the quadrupole magnetic lens group by adjusting the positions of the X magnetic lens and / or the Y magnetic lens, thereby effectively solving the problem that the focusing effect of the beam focusing system cannot be adjusted by adjusting the positions of the dual-element quadrupole magnetic lens due to the fixed installation of the dual-element quadrupole magnetic lens. Advantages

[0047] The application provides a focused beam automatic adjustment system, method and ion implanter, which comprises a quadrupole magnetic lens group, a lens position adjusting assembly, a Faraday cup and a controller, when it is analyzed that the current beam is not the target beam, the application can maximize the actual beam size information or make the current beam reach the target beam by adjusting the position of the X magnetic lens and / or the Y magnetic lens, so that even if the quadrupole magnetic lens group is worn after long-time use, the focusing effect of the quadrupole magnetic lens group can be adjusted by adjusting the position of the X magnetic lens and / or the Y magnetic lens, thereby effectively solving the problem that the focusing effect of the beam focusing system cannot be adjusted by adjusting the position of the dual-element quadrupole magnetic lens due to the fixed installation of the dual-element quadrupole magnetic lens. BRIEF DESCRIPTION OF DRAWINGS

[0048] Fig. 1 is a structural schematic diagram of a focused beam automatic adjustment system according to an embodiment of the application;

[0049] Fig. 2 is a structural schematic diagram of a focused beam automatic adjustment system according to another embodiment of the application;

[0050] Fig. 3 is a structural schematic diagram of an X magnetic lens and a Y magnetic lens according to an embodiment of the application;

[0051] Fig. 4 is a control structural schematic diagram of a focused beam automatic adjustment system according to an embodiment of the application;

[0052] Fig. 5 is a flowchart of a focused beam automatic adjustment method according to an embodiment of the application.

[0053] Reference signs: 1, ion source mechanism; 2, focused beam automatic adjustment system; 21, quadrupole magnetic lens group; 211, first quadrupole magnetic lens; 212, second quadrupole magnetic lens; 213, third quadrupole magnetic lens; 22, lens position adjusting assembly; 23, Faraday cup; 3, beam line mechanism; 4, target chamber mechanism; 5, analyzing magnet; 6, controller. Embodiments of the application

[0054] The technical solutions in the embodiments of the application will be clearly and completely described below with reference to the drawings in the embodiments of the application. Obviously, the described embodiments are only some of the embodiments of the application, rather than all the embodiments of the application. The components of the embodiments of the application described and shown in the drawings herein can be arranged and designed in various different configurations. Therefore, the following detailed description of the embodiments of the application provided in the drawings is not intended to limit the scope of the claimed application, but only represents selected embodiments of the application. Based on the embodiments of the application, all other embodiments obtained by those skilled in the art without creative work are within the scope of protection of the application.

[0055] It should be noted that similar reference numbers and letters refer to similar items in the following drawings, and therefore, once an item is defined in one drawing, it need not be further defined and explained in subsequent drawings. Meanwhile, in the description of the present application, the terms "first", "second", etc. are only used to distinguish the description, and cannot be understood as indicating or implying relative importance.

[0056] In a first aspect, as shown in FIGS. 1-4, the present application provides a focused beam current automatic adjustment system applied in an ion implanter, the ion implanter comprising an ion source mechanism 1 for generating a beam current, the focused beam current automatic adjustment system comprising:

[0057] A quadrupole magnetic lens group 21 opposite to an output end of the ion source mechanism 1, comprising at least one X magnetic lens and at least one Y magnetic lens;

[0058] A lens position adjusting assembly 22 for adjusting the position of the X magnetic lens and / or the Y magnetic lens;

[0059] A Faraday cup 23 arranged on a side of the quadrupole magnetic lens group 21 away from the ion source mechanism 1, for collecting actual beam current size information;

[0060] A controller 6 electrically connected with the lens position adjusting assembly 22 and the Faraday cup 23, for analyzing whether a current beam current is a target beam current according to the actual beam current size information, and for controlling the lens position adjusting assembly 22 to adjust the position of the X magnetic lens and / or the Y magnetic lens to make the actual beam current size information reach a maximum or the current beam current reach the target beam current when the current beam current is not the target beam current.

[0061] The focusing beam current automatic adjustment system provided by the application is applied to an ion implanter. The ion implanter comprises, in sequence, an ion source mechanism 1, the focusing beam current automatic adjustment system 2, a beam line mechanism 3, and a target chamber mechanism 4. The ion source mechanism 1 can be an existing ion source system and is configured to generate a beam current. The beam line mechanism 3 can be an existing beam line system and is configured to analyze and accelerate the beam current according to the Lorentz force of the beam current, so as to remove impurities in the beam current and increase the kinetic energy of the beam current. The target chamber mechanism 4 can be an existing target chamber system and is configured to place a wafer to be implanted with ions. The ion implanter is configured to implant the wafer with ions. The focusing beam current automatic adjustment system 2 comprises a quadrupole magnetic lens group 21, a lens position adjusting assembly 22, a Faraday cup 23, and a controller 6. The quadrupole magnetic lens group 21 is opposite to an output end of the ion source mechanism 1. The quadrupole magnetic lens group 21 comprises at least one X magnetic lens (see the left part of FIG. 3, where N represents a north pole, S represents a south pole, Y represents a Y-axis direction, and X represents an X-axis direction) and at least one Y magnetic lens (see the right part of FIG. 3). The X magnetic lens and the Y magnetic lens are both quadrupole magnetic lenses. The X magnetic lens can be an existing magnetic lens that can focus ions in the X-axis direction. The Y magnetic lens can be an existing magnetic lens that can focus ions in the Y-axis direction. The lens position adjusting assembly 22 can be a linear slide module or an electric push rod that can drive the X magnetic lens and / or the Y magnetic lens to move. The lens position adjusting assembly 22 can adjust the position of the X magnetic lens and / or the Y magnetic lens, because the position of the X magnetic lens and / or the position of the Y magnetic lens will change when the lens position adjusting assembly 22 drives the X magnetic lens and / or the Y magnetic lens to move. The Faraday cup 23 can be an existing device. The Faraday cup 23 is arranged on a side of the quadrupole magnetic lens group 21 that is away from the ion source mechanism 1. The Faraday cup 23 can collect actual beam current size information, i.e., the size of the beam current focused by the quadrupole magnetic lens group 21. The controller 6 is electrically connected to the lens position adjusting assembly 22 and the Faraday cup 23. The controller 6 can analyze whether the current beam current is a target beam current according to the actual beam current size information. When the current beam current is not the target beam current, the controller 6 can control the lens position adjusting assembly 22 to adjust the position of the X magnetic lens and / or the Y magnetic lens, so that the actual beam current size information reaches a maximum or the current beam current reaches the target beam current. Specifically, the controller 6 can analyze whether the current beam current is the target beam current by judging whether the actual beam current size information is greater than or equal to a preset target beam current size or whether a difference between the actual beam current size information and the preset target beam current size is within a preset range. The preset target beam current size is the size of the target beam current.It should be understood that before analyzing whether the current beam is the target beam according to the actual beam size information, the embodiment can first install the quadrupole magnetic lens group 21 according to the installation position of the quadrupole magnetic lens group 21 obtained based on theoretical calculation. It should also be understood that since the purpose of setting the dual quadrupole magnetic lens in the present application is to adjust the beam generated by the ion source mechanism to the target beam, and when the actual beam size information reaches the maximum, the beam spot reaches the maximum and is most stable, the present application adjusts the position of the X magnetic lens and / or the Y magnetic lens to maximize the actual beam size information (equivalent to adjusting the actual beam size information to the maximum within the adjustable range of the X magnetic lens and the Y magnetic lens) or to make the current beam reach the target beam, which is equivalent to adjusting the installation position of the quadrupole magnetic lens group 21 to the optimal installation position.

[0062] The focusing beam automatic adjustment system provided by the present application includes a quadrupole magnetic lens group 21, a lens position adjustment assembly 22, a Faraday cup 23, and a controller 6. When it is analyzed that the current beam is not the target beam, the present application can maximize the actual beam size information or make the current beam reach the target beam by adjusting the position of the X magnetic lens and / or the Y magnetic lens through the lens position adjustment assembly 22. Therefore, even if the quadrupole magnetic lens group 21 is worn out after long-term use, the present application can adjust the focusing effect of the quadrupole magnetic lens group 21 by adjusting the position of the X magnetic lens and / or the Y magnetic lens, thereby effectively solving the problem that the focusing effect of the beam focusing system cannot be adjusted by adjusting the position of the dual quadrupole magnetic lens due to the fixed installation of the dual quadrupole magnetic lens.

[0063] In some embodiments, the quadrupole magnetic lens group 21 includes an X magnetic lens and a Y magnetic lens, and the controller 6 controls the lens position adjustment assembly 22 to adjust the position of the X magnetic lens and / or the Y magnetic lens to maximize the actual beam size information or make the current beam reach the target beam. The process includes:

[0064] A1, controlling the lens position adjustment assembly 22 to adjust the position of the X magnetic lens and / or the Y magnetic lens according to the preset position adjustment value, and recording the X magnetic lens position information, the Y magnetic lens position information, and the actual beam size information after the position adjustment, until the cumulative adjustment times of the X magnetic lens and the Y magnetic lens both reach a first preset quantity threshold or the current beam reaches the target beam;

[0065] A2, when the cumulative adjustment times of the X magnetic lens and the Y magnetic lens both reach the first preset quantity threshold and the current beam does not reach the target beam, controlling the lens position adjustment assembly 22 to adjust the position of the X magnetic lens and / or the Y magnetic lens according to the X magnetic lens position information and the Y magnetic lens position information corresponding to the maximum actual beam size information, so as to maximize the actual beam size information.

[0066] The preset position adjustment value of step A1 is a preset value, which can be changed by those skilled in the art according to actual needs. The preset position adjustment value can be 1% of the upper limit value of the lens position adjustment, which can reflect the adjustable range of the installation position of the X magnetic lens and the Y magnetic lens. The upper limit value of the lens position adjustment is a value calculated based on the vacuum degree of the environment where the quadrupole magnetic lens group 21 is located and the installation accuracy of the quadrupole magnetic lens group 21. Since the preset position adjustment value can be 1% of the upper limit value of the lens position adjustment, that is, when the cumulative adjustment number of the X magnetic lens or the Y magnetic lens reaches 100 times and the current beam does not reach the target beam, it means that the installation position of the X magnetic lens or the Y magnetic lens cannot be adjusted any more, so step A1 sets the end condition as: the cumulative adjustment number of the X magnetic lens and the Y magnetic lens both reaches the first preset number threshold or the current beam reaches the target beam. It should be understood that since the position of the X magnetic lens and / or the Y magnetic lens is adjusted each time, the embodiment records the X magnetic lens position information, the Y magnetic lens position information and the actual beam size information after the position adjustment. Therefore, when the cumulative adjustment number of the X magnetic lens and the Y magnetic lens both reaches the first preset number threshold and the current beam does not reach the target beam, the embodiment records multiple actual beam size information and the corresponding X magnetic lens position information and Y magnetic lens position information. Step A2 can first determine the maximum value of the actual beam size information from the multiple actual beam size information, and then control the lens position adjustment assembly 22 to adjust the position of the X magnetic lens and / or the Y magnetic lens according to the X magnetic lens position information and the Y magnetic lens position information corresponding to the maximum actual beam size information, so as to adjust the position of the X magnetic lens to the X magnetic lens position information corresponding to the maximum actual beam size information and adjust the position of the Y magnetic lens to the Y magnetic lens position information corresponding to the maximum actual beam size information, so as to make the actual beam size information reach the maximum value. That is, the embodiment is equivalent to first trying to adjust the current beam to the target beam, and then when the current beam cannot be adjusted to the target beam, the X magnetic lens position information and the Y magnetic lens position information corresponding to the maximum actual beam size information are used as the optimal installation position of the quadrupole magnetic lens group 21.

[0067] In some embodiments, the distance between the X magnetic lens and the ion source mechanism 1 is less than the distance between the Y magnetic lens and the ion source mechanism 1, and step A1 comprises:

[0068] A11, controlling the lens position adjustment assembly 22 to adjust the position of the X magnetic lens according to the preset position adjustment value, and recording the X magnetic lens position information, the Y magnetic lens position information and the actual beam size information at this time;

[0069] A12, analyze whether the actual beam current size information is greater than or equal to the preset target beam current size, if yes, end the adjustment, if no, execute step A13, and the preset target beam current size is the size of the target beam current;

[0070] A13, control the lens position adjustment assembly 22 to adjust the position of the Y magnetic lens according to the preset position adjustment value, and record the X magnetic lens position information, the Y magnetic lens position information and the actual beam current size information at this time;

[0071] A14, analyze whether the actual beam current size information is greater than or equal to the preset target beam current size, if yes, end the adjustment, if no, execute step A15;

[0072] A15, analyze whether the cumulative adjustment times of the Y magnetic lens reach the first preset number threshold, if yes, execute step A16, if no, return to step A13;

[0073] A16, analyze whether the cumulative adjustment times of the X magnetic lens reach the first preset number threshold, if yes, execute step A2, if no, control the lens position adjustment assembly 22 to adjust the position of the Y magnetic lens to the initial position and clear the cumulative adjustment times of the Y magnetic lens, and return to step A11.

[0074] This embodiment is equivalent to first trying to adjust the current beam current to the target beam current by adjusting the Y magnetic lens position information under the same X magnetic lens position information, and when the cumulative adjustment times of the Y magnetic lens reach the first preset number threshold (equivalent to being unable to adjust the current beam current to the target beam current by adjusting the Y magnetic lens position information under the current X magnetic lens position information) and the cumulative adjustment times of the X magnetic lens do not reach the first preset number threshold, restoring the position of the Y magnetic lens and adjusting the position of the X magnetic lens until the cumulative adjustment times of the X magnetic lens and the Y magnetic lens both reach the first preset number threshold or the current beam current reaches the target beam current. The working principle of this embodiment is that under the same X magnetic lens position information, there is at most one Y magnetic lens position information that can make the actual beam current size information greater than or equal to the preset target beam current size, i.e. there is at most one opportunity to adjust the current beam current to the target beam current under the same X magnetic lens position information. Since this embodiment first analyzes whether the actual beam current size information is greater than or equal to the preset target beam current size before executing step A13 and step A15, and ends the adjustment when the actual beam current size information is greater than or equal to the preset target beam current size, i.e. this embodiment is equivalent to stopping adjusting the positions of the X magnetic lens and / or the Y magnetic lens after adjusting the current beam current to the target beam current, so this embodiment can effectively avoid the situation that even if the current beam current has been adjusted to the target beam current under the current X magnetic lens position information, the positions of the X magnetic lens and / or the Y magnetic lens are still adjusted.

[0075] In some embodiments, the quadrupole magnetic lens group 21 comprises a first quadrupole magnetic lens 211, a second quadrupole magnetic lens 212 and a third quadrupole magnetic lens 213 arranged in sequence, when the first quadrupole magnetic lens 211 and the third quadrupole magnetic lens 213 are X magnetic lenses, the second quadrupole magnetic lens 212 is a Y magnetic lens, when the first quadrupole magnetic lens 211 and the third quadrupole magnetic lens 213 are Y magnetic lenses, the second quadrupole magnetic lens 212 is an X magnetic lens, the controller 6 controls the lens position adjusting assembly 22 to adjust the position of the X magnetic lens and / or the Y magnetic lens, so that the process of making the actual beam size information maximum or making the current beam reach the target beam includes:

[0076] A1', controlling the lens position adjusting assembly 22 to adjust the position of the second quadrupole magnetic lens 212 according to the preset position adjustment value, and recording the second quadrupole magnetic lens position information after position adjustment and the actual beam size information, until the cumulative adjustment number of the second quadrupole magnetic lens 212 reaches a first preset number threshold or the current beam reaches the target beam;

[0077] A2', when the cumulative adjustment number of the second quadrupole magnetic lens 212 reaches the first preset number threshold and the current beam does not reach the target beam, controlling the lens position adjusting assembly 22 to adjust the position of the second quadrupole magnetic lens 212 according to the second quadrupole magnetic lens position information corresponding to the maximum actual beam size information, so that the actual beam size information reaches the maximum.

[0078] This embodiment is equivalent to making the polarity of the first quadrupole magnetic lens 211 and the polarity of the third quadrupole magnetic lens 213 the same and making the polarity of the first quadrupole magnetic lens 211 and the polarity of the second quadrupole magnetic lens 212 opposite. This embodiment is equivalent to determining the optimal installation position of the quadrupole magnetic lens group 21 only by adjusting the position of the second quadrupole magnetic lens 212.

[0079] In some embodiments, the focused beam automatic adjustment system 2 further comprises a current adjusting assembly for adjusting the current of the second quadrupole magnetic lens 212, and step A1' comprises:

[0080] A11', controlling the lens position adjusting assembly 22 to adjust the position of the second quadrupole magnetic lens 212 according to a preset position adjustment value and controlling the current adjusting assembly to adjust the current of the second quadrupole magnetic lens 212 according to a preset current adjustment value, and recording the second quadrupole magnetic lens position information, the second quadrupole magnetic lens current information and the actual beam size information after each adjustment, until the cumulative adjustment number of the position of the second quadrupole magnetic lens 212 reaches a first preset number threshold and the cumulative adjustment number of the current of the second quadrupole magnetic lens 212 reaches a second preset number threshold or the current beam reaches the target beam;

[0081] Step A2' comprises:

[0082] A21, when the number of cumulative adjustments of the position of the second quadrupole magnetic lens 212 reaches the first preset number threshold, the number of cumulative adjustments of the current of the second quadrupole magnetic lens 212 reaches the second preset number threshold, and the current beam does not reach the target beam, the lens position adjusting assembly 22 is controlled to adjust the position of the second quadrupole magnetic lens 212 according to the second quadrupole magnetic lens position information corresponding to the maximum actual beam size information, and the current adjusting assembly is controlled to adjust the current of the second quadrupole magnetic lens 212 according to the second quadrupole magnetic lens current information corresponding to the maximum actual beam size information, so that the actual beam size information reaches the maximum.

[0083] The preset current adjustment value of this embodiment is a preset value, and those skilled in the art can change the size of the preset current adjustment value according to actual needs. The preset current adjustment value can be 1% of the lens current adjustment upper limit value, which can reflect the adjustable range of the current of the second quadrupole magnetic lens 212. The lens current adjustment upper limit value can be a value calculated based on the maximum implantation energy size of the ion implanter and the optical path parameters and other data. Since the preset current adjustment value of this embodiment can be 1% of the lens current adjustment upper limit value, when the number of cumulative adjustments of the current of the second quadrupole magnetic lens 212 reaches 100 times and the current beam does not reach the target beam, it means that the current of the second quadrupole magnetic lens 212 cannot be adjusted any more. The current adjusting assembly of this embodiment can be a power supply with adjustable output current. The current adjusting assembly of this embodiment can also be a constant voltage power supply connected to the second quadrupole magnetic lens 212 through a variable resistor. The current of the second quadrupole magnetic lens 212 can be adjusted by adjusting the resistance value of the variable resistor. This embodiment is equivalent to determining the optimal installation position of the quadrupole magnetic lens group 21 by adjusting the position and current of the second quadrupole magnetic lens 212.

[0084] In some embodiments, step A11' comprises:

[0085] A111, the lens position adjusting assembly 22 is controlled to adjust the position of the second quadrupole magnetic lens 212 according to the preset position adjustment value, and the second quadrupole magnetic lens position information, the second quadrupole magnetic lens current information and the actual beam size information at this time are recorded;

[0086] A112, whether the actual beam size information is greater than or equal to the preset target beam size is analyzed. If yes, the adjustment is ended. If no, step A113 is performed.

[0087] A113, the current adjusting assembly is controlled to adjust the current of the second quadrupole magnetic lens 212 according to the preset current adjustment value, and the second quadrupole magnetic lens position information, the second quadrupole magnetic lens current information and the actual beam size information at this time are recorded;

[0088] A114, analyze whether the actual beam current size information is greater than or equal to the preset target beam current size, if yes, end the adjustment, if no, execute step A115;

[0089] A115, analyze whether the cumulative adjustment times of the current of the second quadrupole magnetic lens 212 reaches the second preset quantity threshold, if yes, execute step A116, if no, return to step A112;

[0090] A116, analyze whether the cumulative adjustment times of the position of the second quadrupole magnetic lens 212 reaches the first preset quantity threshold, if yes, execute step A2', if no, control the current adjustment assembly to adjust the current of the second quadrupole magnetic lens 212 to the initial current and the cumulative adjustment times of the current of the second quadrupole magnetic lens 212 is emptied, and return to step A111.

[0091] This embodiment is equivalent to obtaining the actual beam current size information corresponding to different second quadrupole magnetic lens current information based on the same second quadrupole magnetic lens position information, and when the cumulative adjustment times of the position of the second quadrupole magnetic lens 212 does not reach the first preset quantity threshold and the cumulative adjustment times of the current of the second quadrupole magnetic lens 212 reaches the second preset quantity threshold, restoring the current of the second quadrupole magnetic lens 212 and adjusting the second quadrupole magnetic lens position information, until the cumulative adjustment times of the position of the second quadrupole magnetic lens 212 reaches the first preset quantity threshold and the cumulative adjustment times of the current of the second quadrupole magnetic lens 212 reaches the second preset quantity threshold. The working principles of step A112 and step A114 of this embodiment are similar to those of step A12 and step A14 of the above-mentioned embodiment, and will not be discussed in detail here. Since before executing step A113 and step A115, this embodiment first analyzes whether the actual beam current size information is greater than or equal to the preset target beam current size, and when the actual beam current size information is greater than or equal to the preset target beam current size, the adjustment is ended, that is, this embodiment is equivalent to stopping adjusting the position and current of the second quadrupole magnetic lens 212 after adjusting the current beam to the target beam, so this embodiment can effectively avoid the situation that even if the current beam has been adjusted to the target beam under the current second quadrupole magnetic lens position information, the current and position of the second quadrupole magnetic lens 212 are still adjusted.

[0092] In some embodiments, the X magnetic lens and the Y magnetic lens each include two south poles and two north poles, the two south poles of the X magnetic lens are located in the first quadrant and the third quadrant of the X magnetic lens respectively, the two north poles of the X magnetic lens are located in the second quadrant and the fourth quadrant of the X magnetic lens respectively, the two south poles of the Y magnetic lens are located in the second quadrant and the fourth quadrant of the Y magnetic lens respectively, and the two north poles of the Y magnetic lens are located in the first quadrant and the third quadrant of the Y magnetic lens respectively.

[0093] In some embodiments, the ion implanter further comprises an analyzing magnet 5 disposed between the ion source mechanism 1 and the focused beam automatic adjustment system 2 or between the focused beam automatic adjustment system 2 and the beam line mechanism 3. The analyzing magnet 5 can select suitable ions to pass and intercept unsuitable ions, i.e. the embodiment is equivalent to screening the ions in the beam generated by the ion source mechanism 1 or the ions in the beam focused by the focused beam automatic adjustment system 2 using the analyzing magnet 5.

[0094] As can be seen from the above, the focused beam automatic adjustment system provided by the application comprises the quadrupole magnetic lens group 21, the lens position adjusting assembly 22, the Faraday cup 23 and the controller 6. When it is analyzed that the current beam is not the target beam, the application can maximize the actual beam size information or make the current beam reach the target beam by controlling the lens position adjusting assembly 22 to adjust the position of the X magnetic lens and / or the Y magnetic lens, so that the focusing effect of the quadrupole magnetic lens group 21 can be adjusted by adjusting the position of the X magnetic lens and / or the Y magnetic lens even if the quadrupole magnetic lens group 21 is worn after long time use, thereby effectively solving the problem that the focusing effect of the beam focusing system cannot be adjusted by adjusting the position of the dual-element quadrupole magnetic lens because the dual-element quadrupole magnetic lens is fixedly installed.

[0095] In a second aspect, as shown in FIG. 5, the application further provides a focused beam automatic adjustment method applied in the focused beam automatic adjustment system provided in the first aspect, and the focused beam automatic adjustment method comprises the following steps:

[0096] S1, analyzing whether the current beam is the target beam according to the actual beam size information;

[0097] S2, when the current beam is not the target beam, controlling the lens position adjusting assembly 22 to adjust the position of the X magnetic lens and / or the Y magnetic lens so as to maximize the actual beam size information.

[0098] The embodiment of the application provides a focused beam automatic adjustment method applied in the focused beam automatic adjustment system 2 provided in the first aspect, and the principle of the focused beam automatic adjustment method of the embodiment is the same as that of the focused beam automatic adjustment system 2 provided in the first aspect, which will not be discussed here in detail.

[0099] The application provides a focused beam current automatic adjustment method, which is applied to a focused beam current automatic adjustment system.

[0100] In a third aspect, the application provides an ion implanter comprising the focused beam current automatic adjustment system according to the first aspect.

[0101] The embodiment of the application provides an ion implanter comprising the focused beam current automatic adjustment system according to the first aspect, and the principle of the ion implanter is the same as that of the focused beam current automatic adjustment system according to the first aspect, which will not be repeated here.

[0102] The application provides an ion implanter comprising a focused beam current automatic adjustment system, which comprises a quadrupole magnetic lens group 21, a lens position adjusting assembly 22, a Faraday cup 23 and a controller 6. When it is analyzed that the current beam current is not the target beam current, the application can maximize the actual beam current size information or make the current beam current reach the target beam current by controlling the lens position adjusting assembly 22 to adjust the positions of the X magnetic lens and / or the Y magnetic lens. Therefore, even if the quadrupole magnetic lens group 21 is worn after long-time use, the focusing effect of the quadrupole magnetic lens group 21 can be adjusted by adjusting the positions of the X magnetic lens and / or the Y magnetic lens, so that the problem that the focusing effect of the beam focusing system cannot be adjusted by adjusting the positions of the dual-element quadrupole magnetic lens due to the fixed installation of the dual-element quadrupole magnetic lens is effectively solved.

[0103] From the above, the application provides a focused beam current automatic adjustment system and method and an ion implanter, which comprises a quadrupole magnetic lens group 21, a lens position adjusting assembly 22, a Faraday cup 23 and a controller 6. When it is analyzed that the current beam is not the target beam, the application can maximize the actual beam size information or make the current beam reach the target beam by adjusting the position of the X magnetic lens and / or the Y magnetic lens, so that even if the quadrupole magnetic lens group 21 is worn after long-time use, the focusing effect of the quadrupole magnetic lens group 21 can be adjusted by adjusting the position of the X magnetic lens and / or the Y magnetic lens, thereby effectively solving the problem that the focusing effect of the beam focusing system cannot be adjusted by adjusting the position of the dual-element quadrupole magnetic lens due to the fixed installation of the dual-element quadrupole magnetic lens.

[0104] In the embodiments provided in the application, it should be understood that, in this paper, relationship terms such as first and second are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or sequence between the entities or operations.

[0105] The above only describes the embodiments of the application and is not used to limit the protection scope of the application. For those skilled in the art, the application can have various modifications and changes. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the application shall be included in the protection scope of the application.

Claims

1. A focused beam current automatic adjustment system, applied in an ion implanter, the ion implanter comprising an ion source mechanism for generating a beam, wherein, The focusing beam current automatic adjustment system comprises: A quadrupole magnetic lens group opposite to an output end of the ion source mechanism, comprising at least one X magnetic lens and at least one Y magnetic lens; A lens position adjusting assembly for driving the X magnetic lens and / or the Y magnetic lens to move so as to adjust the position of the X magnetic lens and / or the Y magnetic lens; A Faraday cup arranged on a side of the quadrupole magnetic lens group away from the ion source mechanism, for collecting actual beam current size information; A controller electrically connected with the lens position adjusting assembly and the Faraday cup, for analyzing whether a current beam current is a target beam current according to the actual beam current size information, and for controlling the lens position adjusting assembly to adjust the position of the X magnetic lens and / or the Y magnetic lens so as to make the actual beam current size information reach a maximum or make the current beam current reach the target beam current when the current beam current is not the target beam current; The quadrupole magnetic lens group comprises a first quadrupole magnetic lens, a second quadrupole magnetic lens and a third quadrupole magnetic lens arranged in sequence, the second quadrupole magnetic lens is a Y magnetic lens when the first quadrupole magnetic lens and the third quadrupole magnetic lens are both X magnetic lenses, or the second quadrupole magnetic lens is an X magnetic lens when the first quadrupole magnetic lens and the third quadrupole magnetic lens are both Y magnetic lenses, and the controller controls the lens position adjusting assembly to adjust the position of the X magnetic lens and / or the Y magnetic lens so as to make the actual beam current size information reach a maximum or make the current beam current reach the target beam current, and the process comprises: A1', controlling the lens position adjusting assembly to adjust the position of the second quadrupole magnetic lens according to a preset position adjustment value, and recording second quadrupole magnetic lens position information and actual beam current size information after position adjustment, until the cumulative adjustment number of the second quadrupole magnetic lens reaches a first preset number threshold or the current beam current reaches the target beam current; A2', when the cumulative adjustment number of the second quadrupole magnetic lens reaches the first preset number threshold and the current beam current does not reach the target beam current, controlling the lens position adjusting assembly to adjust the position of the second quadrupole magnetic lens according to the second quadrupole magnetic lens position information corresponding to the maximum actual beam current size information, so as to make the actual beam current size information reach a maximum.

2. The focused beam current auto-adjustment system of claim 1, wherein, The focusing beam current automatic adjustment system further comprises a current adjusting assembly for adjusting the current of the second quadrupole magnetic lens, and step A1' comprises: A11', controlling the lens position adjusting assembly to adjust the position of the second quadrupole magnetic lens according to a preset position adjustment value and controlling the current adjusting assembly to adjust the current of the second quadrupole magnetic lens according to a preset current adjustment value, and recording second quadrupole magnetic lens position information, second quadrupole magnetic lens current information and actual beam current size information after each adjustment, until the cumulative adjustment number of the position of the second quadrupole magnetic lens reaches a first preset number threshold and the cumulative adjustment number of the current of the second quadrupole magnetic lens reaches a second preset number threshold or the current beam current reaches the target beam current; Step A2' comprises: A21、when the cumulative adjustment times of the position of the second quadrupole magnetic lens reaches the first preset number threshold, the cumulative adjustment times of the current of the second quadrupole magnetic lens reaches the second preset number threshold, and the current beam current does not reach the target beam current, controlling the lens position adjustment assembly to adjust the position of the second quadrupole magnetic lens according to the second quadrupole magnetic lens position information corresponding to the maximum actual beam current size information, and controlling the current adjustment assembly to adjust the current of the second quadrupole magnetic lens according to the second quadrupole magnetic lens current information corresponding to the maximum actual beam current size information, so that the actual beam current size information reaches the maximum.

3. The focused beam current auto-adjustment system of claim 2, wherein, Step A11' comprises: A111、controlling the lens position adjustment assembly to adjust the position of the second quadrupole magnetic lens according to the preset position adjustment value, and recording the second quadrupole magnetic lens position information, the second quadrupole magnetic lens current information and the actual beam current size information at this time; A112、analyzing whether the actual beam current size information is greater than or equal to the preset target beam current size, if yes, ending the adjustment, if not, executing step A113; A113、controlling the current adjustment assembly to adjust the current of the second quadrupole magnetic lens according to the preset current adjustment value, and recording the second quadrupole magnetic lens position information, the second quadrupole magnetic lens current information and the actual beam current size information at this time; A114、analyzing whether the actual beam current size information is greater than or equal to the preset target beam current size, if yes, ending the adjustment, if not, executing step A115; A115、analyzing whether the cumulative adjustment times of the current of the second quadrupole magnetic lens reaches the second preset number threshold, if yes, executing step A116, if not, returning to step A112; A116、analyzing whether the cumulative adjustment times of the position of the second quadrupole magnetic lens reaches the first preset number threshold, if yes, executing step A2', if not, controlling the current adjustment assembly to adjust the current of the second quadrupole magnetic lens to the initial current and emptying the cumulative adjustment times of the current of the second quadrupole magnetic lens, and returning to step A111.

4. The focused beam current auto-adjust system of claim 1, wherein, The X magnetic lens and the Y magnetic lens each comprise two south poles and two north poles, the two north poles of the X magnetic lens are located in the first quadrant and the third quadrant of the X magnetic lens respectively, the two south poles of the X magnetic lens are located in the second quadrant and the fourth quadrant of the X magnetic lens respectively, the two north poles of the Y magnetic lens are located in the second quadrant and the fourth quadrant of the Y magnetic lens respectively, and the two south poles of the Y magnetic lens are located in the first quadrant and the third quadrant of the Y magnetic lens respectively.

5. The focused beam current auto-adjustment system of claim 1, wherein, The ion implanter further comprises an analyzing magnet, which is arranged between the ion source mechanism and the focused beam automatic adjustment system or between the focused beam automatic adjustment system and the beam line mechanism.

6. A method of automatic focusing of a beam current, wherein The focused beam automatic adjustment method is applied in the focused beam automatic adjustment system as claimed in any one of claims 1-5, and comprises the following steps: S1、analyzing whether the current beam current is the target beam current according to the actual beam current size information; S2, when the current beam is not the target beam, controlling the lens position adjusting component to adjust the position of the X magnetic lens and / or the Y magnetic lens so that the actual beam size information reaches maximum; The step S2 comprises: S21, controlling the lens position adjusting component to adjust the position of the second quadrupole magnetic lens according to a preset position adjustment value, and recording the second quadrupole magnetic lens position information after position adjustment and the actual beam size information until the cumulative adjustment times of the second quadrupole magnetic lens reaches a first preset quantity threshold or the current beam reaches the target beam; S22, when the cumulative adjustment times of the second quadrupole magnetic lens reaches the first preset quantity threshold and the current beam does not reach the target beam, controlling the lens position adjusting component to adjust the position of the second quadrupole magnetic lens according to the second quadrupole magnetic lens position information corresponding to the maximum actual beam size information so that the actual beam size information reaches maximum.

7. An ion implanter, wherein, The ion implanter comprises the focused beam automatic adjustment system as claimed in any one of claims 1-5.

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