Systems, articles, and methods related to waste streams from semiconductor processing facilities

Abstract

The present disclosure is generally related to systems, articles, and methods for treating waste from semiconductor processing facilities. Some embodiments involve one or more fluidic systems capable of removing one or more contaminants from waste streams exiting a semiconductor processing facility. In some embodiments, the methods involve a neutralization system input [IWN], a non-potable reuse system [NPR], a chemical mechanical polisher copper reclamation system [CMP-Cu], a chemical mechanical polisher metal and / or metal oxide reclamation system [CMP-O / M], a hydrofluoric wastewater system [HFW], an isopropyl alcohol treatment system [IPAL], a hydrofluoric wastewater reclaim system [HFWR], an ammonia peroxide treatment system [APM], a scrubber reclaim system [LSR], and / or a neutralization reject system [IWN Reject], In some embodiments, one or more inputs of the systems described herein are provided to the systems such that one or more outputs exit the systems. Some output streams have a relatively low concentration of contaminants while other outputs may have relatively high concentration of contaminants.

Description

[0001] SYSTEMS, ARTICLES, AND METHODS RELATED TO WASTE STREAMS FROM SEMICONDUCTOR PROCESSING FACILITIES

[0002] TECHNICAL FIELD

[0003] Treating waste from a semiconductor processing facilities is generally described.

[0004] SUMMARY

[0005] Systems, articles, and methods related to treating waste from a semiconductor processing facilities are generally described. The subject matter of the present disclosure involves, in some cases, interrelated products, alternative solutions to a particular problem, and / or a plurality of different uses of one or more systems and / or articles.

[0006] In one aspect, methods are described. In some embodiments, the method comprises providing a neutralization system input having a pH less than or equal to 11 and greater than or equal to 3 to a neutralization system, the neutralization system operated such that: a first neutralization system output and a second neutralization system output exit the neutralization system, the first neutralization system output has a lower concentration of total dissolved solids (TDS) than the concentration of total dissolved solids in the neutralization system input, and the second neutralization system output has a higher concentration of TDS than the concentration of TDS in the neutralization system input; providing a non-potable reuse system input to a non- potable reuse system, the non-potable reuse system operated such that a non-potable reuse system output exits the non-potable reuse system; providing a hydrofluoric wastewater reclaim system input comprising fluoride ions to a hydrofluoric wastewater reclaim system, the hydrofluoric wastewater reclaim system operated such that: a first hydrofluoric wastewater reclaim system output and a second hydrofluoric wastewater reclaim system output exit the hydrofluoric wastewater reclaim system, the first hydrofluoric wastewater reclaim system output has a lower concentration of fluoride ions than the concentration of fluoride ions in the hydrofluoric wastewater reclaim system input, and the second hydrofluoric wastewater reclaim system output has a higher concentration of fluoride ions than the concentration of fluoride ions in the hydrofluoric wastewater reclaim system input; providing a hydrofluoric wastewater system input comprising fluoride ions and silica to a hydrofluoric wastewater system, the hydrofluoric wastewater system operated such that: a first hydrofluoric wastewater system output and a second hydrofluoric wastewater system output exit the hydrofluoric wastewater system, the first hydrofluoric wastewater system output has a lower concentration of fluoride ions than the concentration of fluoride ions in the hydrofluoric wastewater system input, and the xxxxxx.x second hydrofluoric wastewater system output comprises at least some of the silica; providing a first ammonia peroxide treatment system input comprising ammonia and a second ammonia peroxide treatment system input comprising sulfuric acid to an ammonia peroxide treatment system, the ammonia peroxide treatment system operated such that: a first ammonia peroxide treatment system output and a second ammonia peroxide treatment system output exit the ammonia peroxide treatment system, the first ammonia peroxide treatment system output has a concentration of ammonia that is lower than the concentration of ammonia in the first ammonia peroxide treatment system input, and the second ammonia peroxide treatment system output comprises ammonium ions derived from at least some of the ammonia in the first ammonia peroxide treatment system input and sulfate ions derived from at least some of the sulfuric acid in the second ammonia peroxide treatment system input; providing an isopropyl alcohol treatment system input comprising isopropyl alcohol to an isopropyl alcohol treatment system, the isopropyl alcohol treatment system operated such that a first isopropyl alcohol treatment system output exits the isopropyl alcohol treatment system, the first isopropyl alcohol treatment system output having a lower concentration of isopropyl alcohol than the concentration of isopropyl alcohol in the isopropyl alcohol treatment system input; providing a chemical mechanical polisher metal and / or metal oxide reclamation system input comprising at least one metal and / or metal oxide to a chemical mechanical polisher metal and / or metal oxide reclamation system, the chemical mechanical polisher metal and / or metal oxide reclamation system operated such that: a first chemical mechanical polisher metal and / or metal oxide reclamation system output, a second chemical mechanical polisher metal and / or metal oxide reclamation system output, and a third chemical mechanical polisher metal and / or metal oxide reclamation system output exit the chemical mechanical polisher metal and / or metal oxide reclamation system, the first chemical mechanical polisher metal and / or metal oxide reclamation system output has a higher concentration of the at least one metal and / or metal oxide than the concentration of the at least one metal and / or metal oxide in the chemical mechanical polisher metal and / or metal oxide reclamation system input, the second chemical mechanical polisher metal and / or metal oxide reclamation system output has a lower concentration of the at least one metal and / or metal oxide than the concentration of the at least one metal and / or metal oxide in the chemical mechanical polisher metal and / or metal oxide reclamation system input, and the third chemical mechanical polisher metal and / or metal oxide reclamation system output has a lower concentration of the at least one metal and / or metal oxide than the concentration of the at least one metal and / or metal oxide in the chemical mechanical polisher metal and / or metal oxide reclamation system input, the third chemical mechanical polisher metal and / or metal oxide xxxxxx.x reclamation system output having a different composition than the second chemical mechanical polisher metal and / or metal oxide reclamation system output; providing a scrubber reclaim system input to a scrubber reclaim system, the scrubber reclaim system operated such that: a first scrubber reclaim system output and a second scrubber reclaim system output exit the scrubber reclaim system, the first scrubber reclaim system output has a conductivity that is higher than the conductivity of the scrubber reclaim system input, and the second scrubber reclaim system output has a conductivity that is lower than the conductivity of the scrubber reclaim system input; providing a neutralization reject system input to a neutralization reject system, the neutralization reject system operated such that a neutralization reject system output exits the neutralization reject system, wherein: the neutralization system input comprises at least a portion of the first ammonia peroxide treatment system output; the non-potable reuse system input comprises at least a portion of the first neutralization system output, at least a portion of the first isopropyl alcohol treatment system output, at least a portion of the third chemical mechanical polisher metal and / or metal oxide reclamation system output, and / or at least a portion of the first hydrofluoric wastewater reclaim system output; the hydrofluoric wastewater system input comprises at least a portion of the second hydrofluoric wastewater reclaim system output, at least a portion of the second chemical mechanical polisher metal and / or metal oxide reclamation system output, and / or at least a portion of the first scrubber reclaim system output; at least some of the ammonia in the ammonia peroxide treatment system input is derived from a first portion of waste from a semi-conductor processing facility, the first portion of waste comprising ammonia; at least some of the isopropyl alcohol in the isopropyl alcohol treatment system input is derived from a second portion of waste from a semi-conductor processing facility; at least some of the at least one metal and / or metal oxide in the chemical mechanical polisher metal and / or metal oxide reclamation system input is derived from a third portion of waste from a semiconductor processing facility; the scrubber reclaim system input comprises at least a portion of a wastewater stream from a scrubber; and the neutralization reject system input comprises at least a portion of the second neutralization system output.

[0007] In some embodiments, the method comprises providing an input comprising at least a portion of an output of a semiconductor processing facility to a treatment system, the output of the semiconductor processing facility comprising water and at least one solute, such that a treatment system output exiting the treatment system has a lower concentration of the at least one solute than the output of the semiconductor processing facility.

[0008] In some embodiments, the method comprises providing an input comprising at least a portion of an output of a semiconductor processing facility to a treatment system, the output of xxxxxx.x the semiconductor processing facility comprising water, such that a treatment system output exiting the treatment system comprises water having a higher purity than the water in the output of the semiconductor processing facility.

[0009] Other advantages and novel features of the present disclosure will become apparent from the following detailed description of various non-limiting embodiments of the disclosure when considered in conjunction with the accompanying figures. In cases where the present specification and a document incorporated by reference include conflicting and / or inconsistent disclosure, the present specification shall control.

[0010] BRIEF DESCRIPTION OF THE DRAWINGS

[0011] Non-limiting embodiments of the present disclosure will be described by way of example with reference to the accompanying figures, which are schematic and are not intended to be drawn to scale unless otherwise indicated. In the figures, each identical or nearly identical component illustrated is typically represented by a single numeral. For purposes of clarity, not every component is labeled in every figure, nor is every component of each embodiment of the disclosure shown where illustration is not necessary to allow those of ordinary skill in the art to understand the disclosure. In the figures:

[0012] FIGS. 1-2 are block flow schematic diagrams of systems for treating waste from a semiconductor processing facility, according to some embodiments.

[0013] FIGS. 3 A-3M are block flow schematic diagrams of subsystems for treating waste from a semiconductor processing facility, according to some embodiments.

[0014] FIG. 4A is a schematic illustration of an example of a single-membrane membrane separator, according to some embodiments.

[0015] FIG. 4B is a schematic illustration of an example of a membrane separator comprising multiple semi-permeable membranes fluidically connected in parallel, according to some embodiments.

[0016] FIG. 4C is a schematic illustration of an example of a membrane separator comprising multiple semi-permeable membranes fluidically connected in series, according to some embodiments.

[0017] DETAILED DESCRIPTION

[0018] Systems, articles, and methods related to treating waste from a semiconductor processing facilities are generally described. Certain aspects relate to methods for treating waste from semiconductor processing facilities. In some embodiments, the methods involve one or more xxxxxx.x fluidic systems capable of removing one or more species, such as contaminants, from waste streams exiting a semiconductor processing facility. In some embodiments, the methods involve a [IWN], a [NPR], a [CMP-Cu], a [CMP-O / M], a [HFW], a [IPAL], a [HFWR], a [APM], a [LSR], and / or a [IWN Reject], In some embodiments, one or more inputs of the systems described herein are provided to the systems, and one or more outputs, in the form of treated streams and / or solids, exit the systems. The outputs may be in the form of, for example, treated streams and / or solids. Some output streams may have a relatively low concentration of contaminants (e.g., from purification) while other outputs may have relatively high concentration of contaminants (e.g., from contaminant enrichment such as for disposal).

[0019] Semiconductor processing facilities are generally used to fabricate semiconductor devices. Semiconductor devices include microelectronics including, but not limited to, processors such as computer processing units (CPUs), graphical processing units (GPUs), and / or integrated circuits. Such processing facilities may generate a relatively large amount of waste that, if released into the environment untreated, can cause significant environmental harm and / or safety risks. With increasing prevalence of semiconductor devices, there is a strong need to effectively process waste from semiconductor processing facilities. The waste may comprise, for example, wastewater. Semiconductor processing wastewater may contain at least some components (e.g., residual reagents, reaction products, and / or spectator species) that contacted a semiconductor during a semiconductor processing process (e.g., a process for the formation of electronics from silicon semiconductors, III-V semiconductors, and / or other types of semiconductors). Semiconductor processing facilities generally produce multiple waste streams, at least some of which may have relatively dissimilar compositions (e.g., a first stream comprising ammonia, a second stream comprising isopropyl alcohol, and a third stream comprising fluoride ions). In order to efficiently and effectively treat multiple waste streams exiting semiconductor processing facilities, it may be advantageous to treat waste streams using interrelated systems, some of which may be directed to removing specific contaminants. Accordingly, one aspect of the present disclosure is directed to advantageous methods capable of treating (e.g., synergistically) multiple sources of waste from semiconductor processing facilities.

[0020] Aspects of this disclosure generally relate to providing an input comprising at least a portion of an output of a semiconductor processing facility to a treatment system. The output from the semiconductor processing facility may comprise, for example, waste such as wastewater. The output of the semiconductor processing facility comprising water may comprise at least one solute. The output of the semiconductor processing facility may be provided to the xxxxxx.x treatment system, and the system may be operated such that a treatment system output exits the treatment system having a lower concentration of the at least one solute than the output of the semiconductor processing facility. The treatment system may generate an output comprising water having a higher purity than the water in the output of the semiconductor processing facility.

[0021] FIG. 1 shows a schematic block flow diagram of a non-limiting example of a treatment system. The system shown in FIG. 1 can be used, for example, to treat waste from a semiconductor processing facility. As can be seen from FIG. 1, system 100 comprises various interrelated subsystems that can treat different portions of waste from the semiconductor processing facility. The waste that is treated can be taken in directly from the facility or it may be taken in following an upstream treatment.

[0022] A variety of units are shown in FIG. 1. These units may serve as subsystems or sub-units of the overall water treatment system. The units include a neutralization system [IWN], a non- potable reuse system [NPR], a hydrofluoric wastewater reclaim system [HFWR], a hydrofluoric wastewater system [HFW], an ammonia peroxide treatment system [APM], an isopropyl alcohol treatment system [IP AL], a chemical mechanical polisher metal / metal oxide reclamation system [CMP-O / M], a chemical mechanical polisher copper reclamation system [CMP-Cu], a scrubber reclaim system [LSR], a neutralization reject system [IWN Reject], treated wastewater [WWT], a wastewater reclaim [WWR], a cooling tower blowdown [CTBD], an ammonia exhaust system [AME], a photolithography wastewater stream [PLW], a SALIX wet gas scrubber system wastewater stream [SWGS], an ultrapure water system [UPW], and a point of treatment water system [POTW],

[0023] The [IWN], in some embodiments, is configured to at least partially neutralize streams and / or reduce the concentration of the total dissolved solids (TDS) in streams of the input entering the [IWN], The [NPR], in some embodiments, comprises a vessel configured to store water that may be used for further applications including, but not limited to reuse in semiconductor processing processes. While the term “non-potable” is used for the [NPR] out of convenience, the water output by the [NPR] is not inherently non-potable and may, in some instances, be water treated to a high specification for TDS (i.e., low TDS content), metal (i.e., low metal content), and / or organic content (i.e., low organic content). The [HFWR], in some embodiments, is configured to remove at least some fluoride (either in the form of HF molecules, fluoride ions, or both) from streams entering the [HFWR], The [HFW], in some embodiments, is configured to remove at least some fluoride and / or silica from one or more streams entering the [HFW], The [HFW], in some embodiments, is configured to remove at least xxxxxx.x some fluoride, silicon, and / or silica from one or more streams entering the [HFW], In some embodiments, the [APM] is configured to remove at least some ammonia (either in the form of ammonia molecules, ammonium ions, or both) from one or more streams entering the [APM], In some embodiments, the [IP AL] is configured to remove at least some isopropyl alcohol from one or more streams entering the [IP AL], In some embodiments, the [CMP-O / M] is configured to remove at least one metal and / or metal oxide from one or more streams entering the [CMP- O / M], In some embodiments, the [CMP-Cu] is configured to remove copper metal and / or copper ions from one or more streams entering the [CMP-Cu], The [LSR], in some embodiments, is configured to alter the conductivity of one or more streams entering the [LSR], In some embodiments, the [IWN Reject] is configured to store liquid and facilitate the transport of the stored liquid to fluidic systems downstream from the [IWN Reject], In some embodiments, the [WWR] is a system configured to output a stream comprising reclaimed water from treated waste. In some embodiments, the [CTBD] corresponds to a blowdown from a cooling tower. In some embodiments the [AME] is a system configured to output an effluent comprising ammonia at a relatively high concentration, e.g., produced from exhaust of a scrubber system. In some embodiments, the [PLW] is a stream exiting a photolithographic station at a semiconductor processing facility. In some embodiments, the [SWGS] is a wastewater stream exiting a SALIX wet gas scrubber. In some embodiments, the [UPW] is a system configured to output a comprising ultrapure water and a stream comprising wastewater. In some embodiments, the [POTW] is a system configured to treat and / or contain an input stream such that at least a portion of the input can be reused for semiconductor processing applications.

[0024] Each of these units and streams, and their connectivities, are described below. In addition, the following abbreviations are used throughout the specification to specify these units and streams:

[0025] [IWN] - neutralization system [NPR] - non-potable reuse system [HWFR] - hydrofluoric wastewater reclaim system [HFW] - hydrofluoric wastewater system [APM] - ammonia peroxide treatment system [IP AL] - isopropyl alcohol treatment system [CMP-O / M] - chemical mechanical polisher metal and / or metal oxide reclamation system

[0026] [CMP-Cu] - chemical mechanical polisher copper reclamation system

[0027] [LSR] - scrubber reclaim system xxxxxx.x [IWN Reject] - neutralization reject system

[0028] [WWT] - treated wastewater

[0029] [WWR] - wastewater reclaim

[0030] [CTBD] - cooling tower blowdown

[0031] [AME] - ammonia exhaust system

[0032] [PLW] - photolithography wastewater stream

[0033] [SWGS] - SALIX wet gas scrubber system wastewater stream

[0034] [UPW] - ultrapure water system

[0035] [POTW] - point of treatment water system

[0036] While system 100 includes numerous fluidic connections for providing outputs from the semiconductor processing facility and / or other systems to the inputs of certain systems, not every fluidic connection shown in system 100 is mandatory for each embodiment within the scope of this disclosure.

[0037] Provided below is a detailed overview of the embodiment of system 100 shown in FIG. 1 followed by a series of descriptions of non-limiting combinations of features shown in FIG. 1 that do not necessarily include each and every element shown in FIG. l.In some embodiments, the system for treating waste comprises a [IWN], In some embodiments, a [IWN] input is provided to the [IWN] via one or more inlets. For example, as shown in FIG. 1, [IWN] input 103 is provided to [IWN] 102 via inlet 104. The [IWN] input may be in the form of one of more liquid streams, at least some of which may comprise one or more species. The species may comprise contaminants. In some embodiments, the [IWN] input has a pH of less than or equal to 11 (e.g., less than or equal to 10, less than or equal to 9, less than or equal to 8, or less). In some embodiments, the [IWN] input has a pH of greater than or equal to 3 (e.g., greater than or equal to 4, greater than or equal to 5, greater than or equal to 6, greater than or equal to 7, or greater). Combinations of these ranges are also possible (e.g., less than or equal to 11 and greater than or equal to 3, or other combinations).

[0038] In some embodiments, the [IWN] is operated such that one or more outputs exit the [IWN] via one or more outlets. For example, as shown in FIG. 1, [IWN] 102 is operated such that first [IWN] output 105 exits [IWN] 102 via outlet 106 and second [IWN] output 107 exits [IWN] 102 via outlet 108. In some embodiments, the [IWN] is configured to at least partially neutralize at least a portion (e.g., at least 1 wt%, at least 5 wt%, at least 10 wt%, at least 20 wt%, at least 30 wt%, at least 40 wt%, at least 50 wt%, at least 60 wt%, at least 70 wt%, at least 80 wt%, at least 90 wt%, at least 99 wt%, or 100 wt%) of the [IWN] input. Accordingly, in some embodiments, the first [IWN] output has a pH that is closer to 7 than the pH of the [IWN] input xxxxxx.x (e.g., by at least 0.1 pH units, at least 0.2 pH units, at least 0.5 pH units, at least 1 pH unit, at least 1.5 pH units, at least 2 pH units, at least 3 pH units, or more). In some embodiments, the first [IWN] output has a concentration of total dissolved solids (TDS) that is lower (e.g., by a factor of at least 2, at least 5, at least 10, at least 15, and / or up to 18, up to 19, up to 20, or more) than the concentration of TDS in the [IWN] input. In some embodiments, the second [IWN] output has a higher (e.g., by a factor of at least 2, at least 5, at least 10, at least 15, and / or up to 18, up to 19, up to 20, or more) concentration of total dissolved solids (TDS) than the [IWN] input than the concentration of TDS in the [IWN] input [IWN],

[0039] The [IWN] input may comprise at least a portion of any of a variety of outputs described herein. In some embodiments, the [IWN] input comprises at least a portion (e.g., at least 1 wt%, at least 5 wt%, at least 10 wt%, at least 20 wt%, at least 30 wt%, at least 40 wt%, at least 50 wt%, at least 60 wt%, at least 70 wt%, at least 80 wt%, at least 90 wt%, at least 99 wt%, or 100 wt%) of a [WWT] output. The [WWT] output refers to any of a variety of treated wastewater streams generated externally or internally to the water treatment system (e.g., water treatment system 100), examples of which are provided below. For example, as shown in FIG. 1, [IWN] input 103 comprises all of [WWT] output 186. In some embodiments, the [IWN] input comprises at least a portion (e.g., at least 1 wt%, at least 5 wt%, at least 10 wt%, at least 20 wt%, at least 30 wt%, at least 40 wt%, at least 50 wt%, at least 60 wt%, at least 70 wt%, at least 80 wt%, at least 90 wt%, at least 99 wt%, or 100 wt%) of the first [CMP-O / M] output. For example, as shown in FIG. 1, [IWN] input 103 comprises all of first [CMP-O / M] output 157. In some but not necessarily all embodiments, the [IWN] input comprises at least a portion (e.g., at least 1 wt%, at least 5 wt%, at least 10 wt%, at least 20 wt%, at least 30 wt%, at least 40 wt%, at least 50 wt%, at least 60 wt%, at least 70 wt%, at least 80 wt%, at least 90 wt%, at least 99 wt%, or 100 wt%) of the first [CMP-Cu] output. For example, as shown FIG. 2, [IWN] input 103 comprises all of first [CMP-Cu] output 167. In some embodiments, the [IWN] input comprises at least a portion (e.g., at least 1 wt%, at least 5 wt%, at least 10 wt%, at least 20 wt%, at least 30 wt%, at least 40 wt%, at least 50 wt%, at least 60 wt%, at least 70 wt%, at least 80 wt%, at least 90 wt%, at least 99 wt%, or 100 wt%) of the first [APM] output. For example, as shown in FIG. 1, [IWN] input 103 comprises all of first [APM] output 137.

[0040] In some embodiments, the system for treating waste comprises a [NPR], In some embodiments, a [NPR] input is provided to the [NPR] via one or more inlets. For example, as shown in FIG. 1, [NPR] input 111 is provided to [NPR] 110 via inlet 112. The [NPR] input may be in the form of one of more liquid streams, at least some of which may comprise one or more species (e.g., contaminants). In some embodiments, the [NPR] input comprises liquid that is xxxxxx.x suitable for non-potable applications (though in some instances the liquid is itself potable). . The liquid of the [NPR] input may not be suitable for human consumption as it may not meet specifications for potable water. As one example, the [NPR] input may lack at least one solute (e.g., residual chlorine) within its water, the absence of which renders the water unsuitable for use as drinking water for humans. In some embodiments, the [NPR] is operated such that one or more outputs exit the [NPR] via one or more outlets. For example, turning again to FIG. 1, [NPR] 110 is operated such that [NPR] output 113 exits [NPR] 110 via outlet 114. In some embodiments, at least a portion (e.g., at least 1 wt%, at least 5 wt%, at least 10 wt%, at least 20 wt%, at least 30 wt%, at least 40 wt%, at least 50 wt%, at least 60 wt%, at least 70 wt%, at least 80 wt%, at least 90 wt%, at least 99 wt%, or 100 wt%) of the [NPR] output is transported to the semiconductor processing facility to be reused in one or more semiconductor processes.

[0041] The [NPR] input may comprise any of a variety of outputs described herein. In some embodiments, the [NPR] input comprises at least a portion (e.g., at least 1 wt%, at least 5 wt%, at least 10 wt%, at least 20 wt%, at least 30 wt%, at least 40 wt%, at least 50 wt%, at least 60 wt%, at least 70 wt%, at least 80 wt%, at least 90 wt%, at least 99 wt%, or 100 wt%) of the first [IWN] output. For example, as shown in FIG. 1, [NPR] input 111 comprises all of first [IWN] output 105. In some embodiments, the [NPR] input comprises at least a portion (e.g., at least 1 wt%, at least 5 wt%, at least 10 wt%, at least 20 wt%, at least 30 wt%, at least 40 wt%, at least 50 wt%, at least 60 wt%, at least 70 wt%, at least 80 wt%, at least 90 wt%, at least 99 wt%, or 100 wt%) of the first [IP AL] output. For example, as shown in FIG. 1, [NPR] input 111 comprises all of first [IP AL] output 147. In some embodiments, the [NPR] input comprises at least a portion (e.g., at least 1 wt%, at least 5 wt%, at least 10 wt%, at least 20 wt%, at least 30 wt%, at least 40 wt%, at least 50 wt%, at least 60 wt%, at least 70 wt%, at least 80 wt%, at least 90 wt%, at least 99 wt%, or 100 wt%) of the third [CMP-O / M] output. For example, as shown in FIG. 1, [NPR] input 111 comprises all of third [CMP-O / M] output 161. In some embodiments, the [NPR] comprises at least a portion (e.g., at least 1 wt%, at least 5 wt%, at least 10 wt%, at least 20 wt%, at least 30 wt%, at least 40 wt%, at least 50 wt%, at least 60 wt%, at least 70 wt%, at least 80 wt%, at least 90 wt%, at least 99 wt%, or 100 wt%) of the first [HFW] output. For example, as shown in FIG. 1, [NPR] input 111 comprises all of first [HFW] output 129. In some embodiments, the [NPR] comprises at least a portion (e.g., at least 1 wt%, at least 5 wt%, at least 10 wt%, at least 20 wt%, at least 30 wt%, at least 40 wt%, at least 50 wt%, at least 60 wt%, at least 70 wt%, at least 80 wt%, at least 90 wt%, at least 99 wt%, or 100 wt%) of the first [HFWR] output. For example, as shown in FIG. 1, [NPR] input 111 comprises all of first [HFWR] output 119. In some embodiments, the [NPR] input further comprises at least a portion (e.g., at least 1 xxxxxx.x wt%, at least 5 wt%, at least 10 wt%, at least 20 wt%, at least 30 wt%, at least 40 wt%, at least 50 wt%, at least 60 wt%, at least 70 wt%, at least 80 wt%, at least 90 wt%, at least 99 wt%, or 100 wt%) of an output of a system downstream from the [NPR], For example, as shown in FIG. 1, [NPR] input 111 comprises all of output 195 exiting outlet 194 of downstream system 193. Such a recycling of a downstream output, rather than disposing of that downstream output, may lead to greater system efficiency and the production of a lower amount of waste being exposed to the environment.

[0042] In some embodiments, the system for treating waste comprises a [HFWR], In some embodiments, a [HFWR] input comprising fluoride ions, such as fluoride ions dissolved in a liquid stream, is provided to the [HFWR] via one or more inlets. For example, as shown in FIG. 1, [HFWR] input 117 is provided to [HFWR] 116 via inlet 118. The [HFWR] input may be in the form of one of more liquid streams, at least some of which may comprise one or more species, for example, contaminants such as fluoride ions. In some embodiments, the [HFWR] is operated such that one or more outputs exit the [HFWR] via one or more outlets. For example, as shown in FIG. 1, [HFWR] 116 is operated such that first [HFWR] output 119 exits [HFWR] 116 via outlet 120, auxiliary [HFWR] output 121 exits [HFWR] 116 via outlet 122, and second [HFWR] output 123 exits [HFWR] 116 via outlet 124. In accordance with certain embodiments, the [HFWR] is configured to remove fluoride ions from at least a portion (e.g., at least 1 wt%, at least 5 wt%, at least 10 wt%, at least 20 wt%, at least 30 wt%, at least 40 wt%, at least 50 wt%, at least 60 wt%, at least 70 wt%, at least 80 wt%, at least 90 wt%, at least 99 wt%, or 100 wt%) of the [HWFR] input. Accordingly, in some embodiments, the first [HFWR] output and auxiliary [HFWR] output each have a lower concentration (e.g., by a factor of at least 2, at least 5, at least 10, at least 20, at least 50, and / or up to 500, up to 750, up to 1000, or more) of fluoride ions than the concentration of fluoride ions in the [HFWR] input. In some embodiments, the first [HFWR] output has a lower concentration (e.g., by a factor of at least 2, at least 5, at least 10, at least 20, at least 50, and / or up to 500, up to 1000, up to 2000, or more) of total dissolved solids (TDS) than the concentration of total dissolved solids (TDS) in the [HFWR] input. In some embodiments, the first [HFWR] output corresponds to a second membrane separator permeate output of a series-connected two-membrane separator process.

[0043] In some embodiments, the auxiliary [HFWR] output has a lower concentration (e.g., by a factor of at least 5, at least 10, at least 20, at least 50, and / or up to 400, up to 450, up to 500, or more) of fluoride ions than the concentration of fluoride ions in the [HFWR] input. In some embodiments, the auxiliary [HFWR] output has a lower concentration (e.g., by a factor of at least 10, at least 20, at least 50, and / or up to 500, up to 750, up to 1000, or more) of total xxxxxx.x dissolved solids (TDS) than the concentration of total dissolved solids (TDS) in the [HFWR] input. In some embodiments, the auxiliary [HFWR] output corresponds to a first membrane separator permeate output of a series-connected two-membrane separator process. In some embodiments, the auxiliary [HFWR] output has a higher concentration of fluoride ions than the first [HFWR] output (e.g., by a factor of at least 1.5, at least 2, at least 5, at least 10, and / or up to 50, up to 100, or more).

[0044] In some embodiments, the second [HFWR] output has a higher concentration (e.g., by a factor of at least 10, at least 20, at least 50, and / or up to 90, up to 95, up to 100, or more) of fluoride ions than the concentration of fluoride ions in the [HFWR] input. In some embodiments, the second [HFWR] output has a higher concentration (e.g., by a factor of at least 10, at least 20, at least 50, and / or up to 90, up to 95, up to 100, or more) of total dissolved solids (TDS) than the concentration of total dissolved solids (TDS) in the [HFWR] input. In some embodiments, the second [HFWR] output corresponds to a first membrane separator retentate output of a series- connected two-membrane separator process.

[0045] In some embodiments, the system for treating waste comprises a [HFW], In some embodiments, a [HFW] input comprising fluoride ions and silica is provided to the [HFW] via one or more inlets. For example, as shown in FIG. 1, [HFW] input 127 is provided to [HFW] 126 via inlet 128. The [HFW] input may be in the form of one of more liquid streams, at least some of which may comprise one or more species (e.g., contaminants such as fluoride ions and / or silica). In some embodiments, the [HFW] is operated such that one or more output exits the [HFW] via one or more outlets. For example, as shown in FIG. 1, [HFW] 126 is operated such that first [HFW] output 129 exits [HFW] 126 via outlet 130, second [HFW] output 131 exits [HFW] 126 via outlet 132, and third [HFW] output 196 exits [HFW] via outlet 197. In some embodiments, the first [HFW] output has a lower concentration (e.g., by a factor of at least 2, at least 5, at least 10, at least 20, at least 50, and / or up to 500, up to 1000, up to 5000, or more) of fluoride ions than the concentration of fluoride ions in the [HFW] input. In some embodiments, the second [HFW] output comprises at least some (e.g., at least 1 wt%, at least 5 wt%, at least 10 wt%, at least 20 wt%, at least 30 wt%, at least 40 wt%, at least 50 wt%, at least 60 wt%, at least 70 wt%, at least 80 wt%, at least 90 wt%, at least 99 wt%, or 100 wt%) of the silica from the [HFW] input. In some embodiments, the third [HFW] output has a higher concentration (e.g., by a factor of at least 2, at least 5, at least 10, at least 20, at least 50, and / or up to 500, up to 1000, up to 5000, or more) of fluoride ions than the concentration of fluoride ions in the [HFW] input. In some embodiments, the third [HFW] output corresponds to a first membrane separator retentate output of a series-connected two-membrane separator process. In xxxxxx.x some embodiments, the first [HFW] output corresponds to a second membrane separator permeate output of a series-connected two-membrane separator process.

[0046] As used herein, when a second quantity is greater than a first quantity by a factor of X, then the magnitude of the second quantity is X times the first quantity. For example, if the first quantity is 5 and the second quantity is 100, then the second quantity is greater than the first quantity by a factor of 20 (because 5 times 20 is 100). Similarly, as used herein, when a first quantity is less than a second quantity by a factor of X, then, again, the magnitude of the second quantity is X times the first quantity. In the example above, the first quantity would be said to be less than the second quantity by a factor of 20 (again, because 5 times 20 is 100).

[0047] The [HFW] input may comprise any of a variety of outputs described herein. In some embodiments, the [HFW] input comprises at least a portion (e.g., at least 1 wt%, at least 5 wt%, at least 10 wt%, at least 20 wt%, at least 30 wt%, at least 40 wt%, at least 50 wt%, at least 60 wt%, at least 70 wt%, at least 80 wt%, at least 90 wt%, at least 99 wt%, or 100 wt%) of the second [HFWR] output. For example, as shown in FIG. 1, [HFW] input 127 comprises all of second [HFWR] output 123. In some embodiments, the [HFW] input comprises at least a portion (e.g., at least 1 wt%, at least 5 wt%, at least 10 wt%, at least 20 wt%, at least 30 wt%, at least 40 wt%, at least 50 wt%, at least 60 wt%, at least 70 wt%, at least 80 wt%, at least 90 wt%, at least 99 wt%, or 100 wt%) of the second [CMP-O / M] output. For example, as shown in FIG. 1, [HFW] input 127 comprises all of second [CMP-O / M] output 159. In some embodiments, the [HFW] input comprises at least a portion (e.g., at least 1 wt%, at least 5 wt%, at least 10 wt%, at least 20 wt%, at least 30 wt%, at least 40 wt%, at least 50 wt%, at least 60 wt%, at least 70 wt%, at least 80 wt%, at least 90 wt%, at least 99 wt%, or 100 wt%) of the first [LSR] output. For example, as shown in FIG. 1, [HFW] input 127 comprises all of first [LSR] output 175. In some embodiments, the [HFW] input comprises at least a portion of the [UPW] output exiting the [UPW], For example, as shown in FIG. 1, [HFW] input 127 comprises portion 191E of [UPW] output 201 exiting [UPW] 200. In some embodiments, the [UPW] output comprises waste streams generated as part of the process of generating ultrapure water. The waste streams exiting the [UPW] may comprise dissolved ions and / or hydrofluoric acid. The ultrapure water may be generated in the [UPW] by subjecting input liquid to an ion exchange process (e.g., via exposure to an ion exchange medium such as ion exchange resin) and / or electrodialysis (e.g., via exposure to an electrodialysis stack). Waste streams comprising concentrate from electrodialysis and / or residual hydrofluoric acid (e.g., eluted from an ion exchange medium) may then exit the [UPW], In some embodiments, the hydrofluoric acid in the [UPW] may be derived from the use of xxxxxx.x hydrofluoric acid to regenerate protons on various resins involved in semiconductor processing (e.g., IX resins).

[0048] In some embodiments, the system for treating waste comprises a [APM], In some embodiments, a first [APM] input comprising ammonia and a second [APM] input comprising sulfuric acid are provided to a [APM] via one or more inlets. For example, as shown in FIG. 1, first [APM] input 135 is provided to [APM] 134 via inlet 136 and second [APM] input 141 is provided to [APM] 134 via inlet 142. In some embodiments, the [APM] is operated such that a first [APM] output and a second [APM] output exit the [APM] via one or more outlets. For example, as shown in FIG. 1, [APM] 134 is operated such that first [APM] output 137 exits [APM] via outlet 138 and second [APM] output 139 exits [APM] 134 via outlet 140. In some embodiments, the first [APM] output has a concentration of ammonia that is lower (e.g., by a factor of at least 2, at least 5, at least 10, at least 20, at least 50, and / or up to 500, up to 1000, or more) than the concentration of ammonia in the first [APM] input. In some embodiments, the second [APM] output comprises ammonium ions derived from at least some of the ammonia in the first [APM] input and sulfate ions derived from at least some of the sulfuric acid in the second [APM] input. The ammonium sulfate may be dissolved in a liquid stream and / or output as a solid ammonium sulfate salt. In some embodiments, the ammonia from the first [APM] input and the sulfuric acid from the second [APM] input are exposed to each other and form ammonium sulfate. In some embodiments, the second [APM] output comprises ammonium sulfate derived from a reaction between the ammonia from the first [APM] input and the sulfuric acid from the second [APM] input.

[0049] The first [APM] input may comprise any of a variety of outputs described herein. In some embodiments, the first [APM] input comprises a first portion of waste (e.g., wastewater) from a semiconductor processing facility. In some embodiments, the first portion of waste is derived from semiconductor processing processes involving exposure of semiconductors (e.g., wafers or resulting devices) to ammonia (e.g., as an etchant gas). In some embodiments, the first portion of waste comprises ammonia. The ammonia may be present as neutral NH3 molecules or as ammonium cations (NH4+). For example, as shown in FIG. 1, first [APM] input 135 comprises first portion of waste 187. In some embodiments, at least a portion (e.g., at least 1 wt%, at least 5 wt%, at least 10 wt%, at least 20 wt%, at least 30 wt%, at least 40 wt%, at least 50 wt%, at least 60 wt%, at least 70 wt%, at least 80 wt%, at least 90 wt%, at least 99 wt%, or 100 wt%) of the ammonia in the first [APM] input is derived from the first portion of waste.

[0050] The second [APM] input may comprise any of a variety of outputs described herein. In some embodiments, the second [APM] input comprises an acid input. In some embodiments, the xxxxxx.x acid input comprises sulfuric acid. For example, as shown in FIG. 1, second [APM] input 141 comprises acid input 185. In some embodiments, the acid input provides at least a portion of the sulfate ions in the second [APM] input.

[0051] In some embodiments, the system for treating waste comprises a [IPAL], In some embodiments, a [IPAL] input comprising isopropyl alcohol is provided to the [IPAL] via one or more inlets. For example, as shown in FIG. 1, [IPAL] input 145 is provided to [IPAL] 144 via inlet 146. The [IPAL] input may be in the form of one of more liquid streams, at least some of which may comprise one or more species, for example, contaminants such as isopropyl alcohol. In some embodiments, the [IPAL] is operated such that a first [IPAL] output, a second [IPAL] output, and a third [IPAL] output exit the [IPAL] via one or more outlets. For example, as shown in FIG. 1, [IPAL] 144 is operated such that first [IPAL] output 147 exits [IPAL] 144 via outlet 148, second [IPAL] output 149 exits [IPAL] 144 via outlet 150, and third [IPAL] output 151 exits [IPAL] 144 via outlet 152. In some embodiments, the first [IPAL] output has a lower (e.g., by a factor of at least 5000, at least 10000, at least 50000, at least 100000, at least 200000, and / or up to 495000, up to 499000, up to 500000, or more) concentration of isopropyl alcohol than the concentration of isopropyl alcohol in the [IPAL] input. In some embodiments, the first [IPAL] output comprises at least a portion of a membrane separator retentate output.

[0052] In some embodiments, the second [IPAL] output has a higher (e.g., by a factor of at least 5000, at least 10000, at least 20000, at least 30000, at least 40000, and / or up to 49500, up to 49900, up to 50000, or more) concentration of isopropyl alcohol than the concentration of isopropyl alcohol in the [IPAL] input. In some embodiments, the third [IPAL] output has a higher (e.g., by a factor of at least 2, at least 5, at least 10, at least 20, at least 50, and / or up to 500, up to 1000, up to 5000, or more) concentration of isopropyl alcohol than the concentration of isopropyl alcohol in the [IPAL] input.

[0053] The [IPAL] input may comprise any of a variety of outputs described herein. In some embodiments, the [IPAL] input comprises at least a portion (e.g., at least 1 wt%, at least 5 wt%, at least 10 wt%, at least 20 wt%, at least 30 wt%, at least 40 wt%, at least 50 wt%, at least 60 wt%, at least 70 wt%, at least 80 wt%, at least 90 wt%, at least 99 wt%, or 100 wt%) of a second portion of waste from a semiconductor processing facility. In some embodiments, the second portion of waste comprises isopropyl alcohol. In some embodiments, the second portion of waste is derived from semiconductor processing processes involving isopropyl alcohol. For example, as shown in FIG. 1, [IPAL] input 145 comprises second portion of waste 188. In some embodiments, at least a portion (e.g., at least 1 wt%, at least 5 wt%, at least 10 wt%, at least 20 wt%, at least 30 wt%, at least 40 wt%, at least 50 wt%, at least 60 wt%, at least 70 wt%, at least xxxxxx.x 80 wt%, at least 90 wt%, at least 99 wt%, or 100 wt%) of the isopropyl alcohol in the [IPAL] input is derived from the second portion of waste.

[0054] In some embodiments, the system for treating waste comprises a [CMP-O / M], In some embodiments, a [CMP-O / M] input comprising at least one metal and / or metal oxide is provided to the [CMP-O / M] via one or more inlets. In some embodiments, the at least one metal and / or metal oxide comprises aluminum and / or copper. The metal may be present in metallic form and / or ionic form. For example, as shown in FIG. 1, [CMP-O / M] input 155 is provided to [CMP-O / M] 154 via inlet 156. The [CMP-O / M] input may be in the form of one of more liquid streams, at least some of which may comprise one or more species, for example, contaminants such as metal and / or metal oxides suspended and / or dissolved in liquid such as water. In some embodiments, the [CMP-O / M] is operated such that a first [CMP-O / M] output, a second [CMP- O / M] output, a third [CMP-O / M] output, and a fourth [CMP-O / M] output exit the [CMP-O / M] via one or more outlets. For example, as shown in FIG. 1, [CMP-O / M] 154 is operated such that first [CMP-O / M] output 157 exits [CMP-O / M] 154 via outlet 158, second [CMP-O / M] output 159 exits [CMP-O / M] 154 via outlet 160, third [CMP-O / M] output 161 exits [CMP-O / M] 154 via outlet 162, and fourth [CMP-O / M] output 198 exits [CMP-O / M] 154 via outlet 199. In some embodiments, the first [CMP-O / M] output has a higher (e.g., by a factor of at least 2, at least 5, at least 10, at least 20, at least 50, and / or up to 500, up to 1000, up to 5000, or more) concentration of the at least one metal and / or metal oxide than the concentration of the at least one metal and / or metal oxide in the [CMP-O / M] input. In some embodiments, the first [CMP- O / M] output has a higher (e.g., by a factor of at least 2, at least 5, at least 10, at least 20, at least 50, and / or up to 500, up to 1000, up to 5000, or more) concentration of total dissolved solids (TDS) than the concentration of total dissolved solids (TDS) in the [CMP-O / M] input. In some embodiments, the first [CMP-O / M] output has a lower (e.g., by a factor of at least 2, at least 5, at least 10, at least 20, at least 50, and / or up to 500, up to 1000, up to 5000, or more) concentration of total suspended solids (TSS) than the concentration of total suspended solids (TSS) in the [CMP-O / M] input. The first [CMP-O / M] output may comprise at least a portion of a membrane separator retentate output.

[0055] In some embodiments, the second [CMP-O / M] output has a lower (e.g., by a factor of at least 2, at least 5, at least 10, at least 20, at least 50, and / or up to 500, up to 1000, up to 5000, or more) concentration of the at least one metal and / or metal oxide than the concentration of the at least one metal and / or metal oxide in the [CMP-O / M] input. In some embodiments, the second [CMP-O / M] output comprises at least a portion of a clarified filter backwash. xxxxxx.x In some embodiments, the third [CMP-O / M] output has a lower (e.g., by a factor of at least 2, at least 5, at least 50, at least 100, at least 500, at least 1000, at least 10000, at least 50000, at least 100000 and / or up to 190000, up to 195000, up to 200000, or more) concentration of the at least one metal and / or metal oxide than the concentration of the at least one metal and / or metal oxide in the [CMP-O / M] input. In some embodiments, the third [CMP-O / M] output has a lower (e.g., by a factor of at least 2, at least 5, at least 50, at least 100, at least 500, at least 1000, at least 10000, at least 50000, at least 100000 and / or up to 190000, up to 195000, up to 200000, or more) concentration of total dissolved solids (TDS) than the concentration of total dissolved solids (TDS) in the [CMP-O / M] input. In some embodiments, the third [CMP- O / M] output has a different composition than the second [CMP-O / M] output, for example, in terms of types of solutes and / or suspended solids and / or concentrations thereof. The third [CMP- O / M] output may comprise at least a portion of a membrane separator permeate output.

[0056] In some embodiments, the fourth [CMP-O / M] output comprises solids comprising the at least one metal and / or metal oxide that can be transported out of the system. For example, the fourth [CMP-O / M] may be transported out of the system for disposal. The solids may comprise sludge. The solids may be generated via a chemical precipitation process.

[0057] The [CMP-O / M] input may comprise any of a variety of outputs described herein. In some embodiments, the [CMP-O / M] comprises at least a portion (e.g., at least 1 wt%, at least 5 wt%, at least 10 wt%, at least 20 wt%, at least 30 wt%, at least 40 wt%, at least 50 wt%, at least 60 wt%, at least 70 wt%, at least 80 wt%, at least 90 wt%, at least 99 wt%, or 100 wt%) of a third portion of waste (e.g., wastewater) from a semiconductor processing facility. In some embodiments, the third portion of waste is derived from semiconductor processes involving metals and / or metal oxides, such as polishing of the wafers and / or devices on wafers. For example, as shown in FIG. 1, [CMP-O / M] input 155 comprises third portion of waste 189. In some embodiments, at least a portion (e.g., at least 1 wt%, at least 5 wt%, at least 10 wt%, at least 20 wt%, at least 30 wt%, at least 40 wt%, at least 50 wt%, at least 60 wt%, at least 70 wt%, at least 80 wt%, at least 90 wt%, at least 99 wt%, or 100 wt%) of the at least one metal and / or metal oxide in the [CMP-O / M] input is derived from a third portion of waste from a semiconductor processing facility.

[0058] In some, but not necessarily all embodiments, the system for treating waste comprises a [CMP-Cu], In some embodiments, the [CMP-Cu] is within the same treatment facility (e.g., e.g., within the same enclosure such as building) as other fluidic systems described herein. In some but not all embodiments, the [CMP-Cu] is fluidically connected to one or more fluidic systems described herein. In some embodiments, a [CMP-Cu] input comprising copper ions and / or xxxxxx.x copper metal is provided to the [CMP-Cu] via one or more inlets. For example, as shown in FIG. 1, [CMP-Cu] input 165 is provided to [CMP-Cu] 164 via inlet 166. The [CMP-Cu] input may be in the form of one of more liquid streams, at least some of which may comprise one or more species, for example, contaminants such as copper suspended and / or copper ions dissolved in liquid such as water. In some embodiments, the [CMP-Cu] is operated such that a first [CMP- Cu] output and a second [CMP-Cu] output exit the [CMP-Cu] via one or more outlets. For example, as shown in FIG. 1, [CMP-Cu] 164 is operated such that first [CMP-Cu] output 167 exits [CMP-Cu] 164 via outlet 168 and second [CMP-Cu] output 169 exits [CMP-Cu] 164 via outlet 170. In some embodiments, the first [CMP-Cu] output has a lower (e.g., by a factor of at least 2, at least 5, at least 10, at least 20, at least 50, and / or up to 500, up to 1000, up to 5000, or more) concentration of copper metal and / or copper ions than the concentration of copper metal and / or copper ions in the [CMP-Cu] input. In some embodiments, the first [CMP-Cu] comprises clarified water following chemical precipitation.

[0059] In some embodiments, the second [CMP-Cu] output comprises at least some (e.g., at least 1 wt%, at least 5 wt%, at least 10 wt%, at least 20 wt%, at least 30 wt%, at least 40 wt%, at least 50 wt%, at least 60 wt%, at least 70 wt%, at least 80 wt%, at least 90 wt%, at least 99 wt%, or 100 wt%) of the copper metal and / or copper ions from the [CMP-Cu] input, for example as a solute in a liquid stream and / or as a solid material.

[0060] The [CMP-Cu] input may comprise any of a variety of outputs described herein. In some embodiments, the [CMP-Cu] input comprises at least a portion (e.g., at least 1 wt%, at least 5 wt%, at least 10 wt%, at least 20 wt%, at least 30 wt%, at least 40 wt%, at least 50 wt%, at least 60 wt%, at least 70 wt%, at least 80 wt%, at least 90 wt%, at least 99 wt%, or 100 wt%) of the a fourth portion of waste from a semiconductor processing facility. For example, as shown in FIG. 1, [CMP-Cu] input 165 comprises fourth portion of waste 190. In some embodiments, at least a portion (e.g., at least 1 wt%, at least 5 wt%, at least 10 wt%, at least 20 wt%, at least 30 wt%, at least 40 wt%, at least 50 wt%, at least 60 wt%, at least 70 wt%, at least 80 wt%, at least 90 wt%, at least 99 wt%, or 100 wt%) of the copper metal and / or copper ions in the [CMP-Cu] input is derived from the fourth portion of waste.

[0061] In some embodiments, the system for treating waste comprises a [LSR], In some embodiments, a [LSR] input is provided to a [LSR] via one or more inlets. For example, as shown in FIG. 1, [LSR] input 173 is provided to [LSR] 172 via inlet 174. The [LSR] input may be in the form of one of more liquid streams, at least some of which may comprise one or more species, for example, contaminants. In some embodiments, the [LSR] is operated such that a first [LSR] output and a second [LSR] output exit the [LSR] via one or more outlets. For xxxxxx.x example, as shown in FIG. 1, [LSR] 172 is operated such that first [LSR] output 175 exits [LSR] 172 via outlet 176 and second [LSR] output 177 exits [LSR] 172 via outlet 178. In some embodiments, the first [LSR] output has a conductivity that is higher (e.g., by a factor of at least 2, at least 5, at least 10, at least 20, at least 50, and / or up to 500, up to 1000, up to 5000, or more) than the conductivity of the [LSR] input. In some embodiments, the first [LSR] output comprises at least a portion of a membrane separate retentate output, an ultrafiltration (UF) backwash, and / or a filter backwash. In some embodiments, the second [LSR] output has a conductivity that is lower (e.g., by a factor of at least 2, at least 5, at least 10, at least 20, at least 50, and / or up to 450, up to 475, up to 500, or more) than the conductivity of the [LSR] input.

[0062] The [LSR] input may comprise any of a variety of outputs described herein. In some embodiments, the [LSR] input comprises at least a portion (e.g., at least 1 wt%, at least 5 wt%, at least 10 wt%, at least 20 wt%, at least 30 wt%, at least 40 wt%, at least 50 wt%, at least 60 wt%, at least 70 wt%, at least 80 wt%, at least 90 wt%, at least 99 wt%, or 100 wt%) of the auxiliary [HFWR] output. For example, as shown in FIG. 1, [LSR] input 173 comprises all of auxiliary [HFWR] output 121. In some, but not necessarily all embodiments, the [LSR] input comprises at least a portion (e.g., at least 1 wt%, at least 5 wt%, at least 10 wt%, at least 20 wt%, at least 30 wt%, at least 40 wt%, at least 50 wt%, at least 60 wt%, at least 70 wt%, at least 80 wt%, at least 90 wt%, at least 99 wt%, or 100 wt%) of the second [LSR] output. For example, as shown in FIG. 1, [LSR] input 173 comprises all of second [LSR] output 177. In some embodiments, the [LSR] input comprises at least a portion (e.g., at least 1 wt%, at least 5 wt%, at least 10 wt%, at least 20 wt%, at least 30 wt%, at least 40 wt%, at least 50 wt%, at least 60 wt%, at least 70 wt%, at least 80 wt%, at least 90 wt%, at least 99 wt%, or 100 wt%) of a wastewater stream output from a scrubber. In some embodiments, the scrubber that produces the wastewater stream output is external to the system of this disclosure. For example, as shown in FIG. 1, [LSR] input 173 comprises all of second scrubber wastewater 208 entering system 100. The scrubber may be external to system 100 or a part of system 100.

[0063] In some embodiments, the system for treating waste comprises a [IWN Reject], In some embodiments, a [IWN Reject] input is provided to the [IWN Reject] via one or more inlets. For example, as shown in FIG. 1, [IWN Reject] input 181 is provided to [IWN Reject] 180 via inlet 182. The [IWN Reject] input may be in the form of one of more liquid streams, at least some of which may comprise one or more species, for example, contaminants. In some embodiments, the [IWN Reject] is operated such that a [IWN Reject] output exits the [IWN Reject] via one or more outlets. For example, as shown in FIG. 1, [IWN Reject] 180 is operated such that [IWN Reject] output 183 exits [IWN Reject] 180 via outlet 184. In some embodiments, the [IWN xxxxxx.x Reject] input comprises at least one contaminant. In some embodiments, the [IWN Reject] comprises one or more vessels configured to receive the [IWN Reject] input and output a [IWN Reject] output to another fluidic system downstream for further processing. In some embodiments, the composition of the [IWN Reject] output is substantially the same as the total [IWN Reject] input. For example, the [IWN Reject] may be a mixture of multiple input streams to the vessels of the [IWN Reject], but without substantial chemical or physical changes being performed other than mixing.

[0064] The [IWN Reject] input may comprise any of a variety of outputs described herein. In some embodiments, the [IWN Reject] input comprises at least a portion (e.g., at least 1 wt%, at least 5 wt%, at least 10 wt%, at least 20 wt%, at least 30 wt%, at least 40 wt%, at least 50 wt%, at least 60 wt%, at least 70 wt%, at least 80 wt%, at least 90 wt%, at least 99 wt%, or 100 wt%) of the second [IWN] output. For example, as shown in FIG. 1, [IWN Reject] input 181 comprises all of second [IWN] output 107. In some embodiments, the [IWN Reject] input comprises at least a portion (e.g., at least 1 wt%, at least 5 wt%, at least 10 wt%, at least 20 wt%, at least 30 wt%, at least 40 wt%, at least 50 wt%, at least 60 wt%, at least 70 wt%, at least 80 wt%, at least 90 wt%, at least 99 wt%, or 100 wt%) of the third [IPAL] output. For example, as shown in FIG. 1, [IWN Reject] input 181 comprises third [IPAL] output 151. In some embodiments, the [IWN Reject] input comprises at least a portion (e.g., at least 1 wt%, at least 5 wt%, at least 10 wt%, at least 20 wt%, at least 30 wt%, at least 40 wt%, at least 50 wt%, at least 60 wt%, at least 70 wt%, at least 80 wt%, at least 90 wt%, at least 99 wt%, or 100 wt%) of a [AME] output, a [SWGS] output, and / or a [PLW] output. For example, as shown in FIG. 1, [IWN Reject] input 181 comprises all of [AME] output 192A, [SWGS] output 192B, and [PLW] output 192C. In some embodiments, the [IWN Reject] input comprises at least a portion (e.g., at least 1 wt%, at least 5 wt%, at least 10 wt%, at least 20 wt%, at least 30 wt%, at least 40 wt%, at least 50 wt%, at least 60 wt%, at least 70 wt%, at least 80 wt%, at least 90 wt%, at least 99 wt%, or 100 wt%) of the third hydrofluoric wastewater system [HFW] output. For example, as shown in FIG. 1, [IWN Reject] input 181 comprises all of third [HFW] output 196. In some embodiments, the [IWN Reject] comprises at least a portion (e.g., at least 1 wt%, at least 5 wt%, at least 10 wt%, at least 20 wt%, at least 30 wt%, at least 40 wt%, at least 50 wt%, at least 60 wt%, at least 70 wt%, at least 80 wt%, at least 90 wt%, at least 99 wt%, or 100 wt%) of the second [IPAL] output. For example, as shown in FIG. 1, [IWN Reject] input 181 comprises all of second [IPAL] output 149.

[0065] In some embodiments, the [WWT] output comprises any of a variety of outputs upstream from the [IWN], In some embodiments, the [WWT] comprises at least a portion (e.g., at least 1 xxxxxx.x wt%, at least 5 wt%, at least 10 wt%, at least 20 wt%, at least 30 wt%, at least 40 wt%, at least 50 wt%, at least 60 wt%, at least 70 wt%, at least 80 wt%, at least 90 wt%, at least 99 wt%, or 100 wt%) of a [UPW Reclaim] output, a [UPW] output, a [CTBD] output, an [IW Lift Station] output, or combinations thereof. For example, as shown in FIG. 1, [WWT] output 186 comprises [UPW Reclaim] output 191 A, portion 191B of [UPW] output 201, [CTBD] output 191C, and [IW Lift Station] output 19 ID.

[0066] In some embodiments, the system for treating waste comprises a [POTW], In some embodiments, a [POTW] input is provided to the [POTW] via one or more inlets. For example, as shown in FIG. 1, [POTW] input 203 is provided to [POTW] 205 via inlet 204. The [POTW] input may be in the form of one or more liquid streams, at least some of which may comprise one or more species, for example, contaminants. In some embodiments, the [POTW] is operated such that a [POTW] output exits the [POTW] via one or more outlets. For example, as shown in FIG. 1, [POTW] is operated such that [POTW] output 206 exits [POTW] 205 via outlet 207.

[0067] In some embodiments, the [POTW] input comprises at least a portion of the first [CMP- Cu] output. For example, as shown in FIG. 1, [POTW] input 204 comprises all of first [CMP- Cu] output 206.

[0068] FIG. 2 is substantially the same as FIG. 1 except that some outputs of system 100 are transported to different fluidic systems. In some embodiments, the [HFW] input comprises at least a portion (e.g., at least 1 wt%, at least 5 wt%, at least 10 wt%, at least 20 wt%, at least 30 wt%, at least 40 wt%, at least 50 wt%, at least 60 wt%, at least 70 wt%, at least 80 wt%, at least 90 wt%, at least 99 wt%, or 100 wt%) of the first [CMP-O / M] output. For example, as shown in FIG. 2, [HFW] input 127 comprises all of first [CMP-O / M] output 157. In some embodiments, the [IWN] input comprises at least a portion (e.g., at least 1 wt%, at least 5 wt%, at least 10 wt%, at least 20 wt%, at least 30 wt%, at least 40 wt%, at least 50 wt%, at least 60 wt%, at least 70 wt%, at least 80 wt%, at least 90 wt%, at least 99 wt%, or 100 wt%) of the first [CMP-Cu] output. For example, as shown in FIG. 2, [IWN] input 103 comprises all of first [CMP-Cu] output 167. In some embodiments, the [HFW] input comprises at least a portion (e.g., at least 1 wt%, at least 5 wt%, at least 10 wt%, at least 20 wt%, at least 30 wt%, at least 40 wt%, at least 50 wt%, at least 60 wt%, at least 70 wt%, at least 80 wt%, at least 90 wt%, at least 99 wt%, or 100 wt%) of the second [IP AL] output. For example, as shown in FIG. 2, [HFW] input 127 comprises at least a portion of second [IP AL] output 149.

[0069] In some embodiments, the [IWN] is configured to at least partially neutralize at least a portion of the [IWN] input. Example embodiments of the [IWN] are shown in FIGS. 3A-3B. In xxxxxx.x some embodiments, the [IWN] comprises an equalization tank. In some embodiments, the [IWN] comprises one or more tanks fluidically connected to an outlet of the equalization tank, wherein the one or more tanks are configured to mix a variety of additives into the [IWN] input, for example, using stirrers, shakers, impellers, and / or agitators. In some embodiments, an acid, such as sulfuric acid, and / or base, such as sodium hydroxide, are mixed into the [IWN] input such that the pH of the first [IWN] output is closer to 7 than the [IWN] input, as described above. In some embodiments, the [IWN] comprises an industrial wastewater effluent tank fluidically connected to one or more outlets on the one or more tanks. In some embodiments, at least some of the first [IWN] output is stored in at least one of the plurality of tanks so that it can be fed into any of a variety of fluidic systems described herein, for example, the [NPR] and / or the [IWN Reject],

[0070] In some embodiments, the [IWN] system comprises an auto backwash filter fluidically connected to an outlet of the one or more tanks. In some embodiments, the [IWN] comprises an ultrafiltration unit (UF) fluidically connected to an outlet of the auto backwash filter. In some embodiments, the [IWN] comprises a tubular membrane filter (TMF) fluidically connected to a retentate outlet of the UF. In some embodiments, the [IWN] comprises a UF filtrate tank fluidically connected to an outlet on a permeate side of the UF and / or to an outlet on the permeate side of the TMF. In some embodiments, the [IWN] comprises a cartridge filter fluidically connected to an outlet of the UF filtrate tank. In some embodiments, the [IWN] comprises a cartridge filter fluidically connected to an outlet of the UF filtrate tank. In some embodiments, the [IWN] comprises one or more membrane separator, such as reverse osmosis membrane separators, fluidically connected in series. In some embodiments, at least one of the one or more membrane separators comprises a membrane suitable for seawater reverse osmosis (SWRO). Such a membrane may have a relatively high rejection percentage for solute (e.g., greater than or equal to 99%, greater than 99.5%, or higher). In some embodiments, the retentate side of at least one of the one or more membrane separator is configured to an outlet of the cartridge filter. In some embodiments, the [IWN] comprises a treated water tank fluidically connected to the permeate side of at least one of the membrane separators of the one or more membrane separators. In some embodiments, the [IWN] comprises a UV system fluidically connected to an outlet of the treated water tank.

[0071] In some embodiments, the [NPR] comprises a vessel configured to store liquid. The vessel may comprise, for example, a tank. In some embodiments, the [NPR] comprises a manifold and / or valving configured to direct transport of the liquid to downstream fluidic systems for further processing. xxxxxx.x In some embodiments, the [HFW] is configured to remove at least some fluoride ions from the [HFW] input. An example embodiment of the [HFW] is shown in FIGS. 3C-3D. In some embodiments, the [HFW] comprises an equalization tank. In some embodiments, the [HFW] comprises an equalization tank and one or more tanks (e.g., a first reaction tank and / or a second reaction tank) fluidically connected to an outlet of the equalization tank, wherein the one or more tanks are configured to mix a variety of additives into the [HFW] input, for example, using stirrers, shakers, impellers, and / or agitators. Additives, including but not limited to acids, such as sulfuric acid, bases, such as sodium hydroxide and / or calcium hydroxide, salts such as calcium chloride, and / or coagulants may be added to the contents of one or more of the tanks. Such additives, in some embodiments, facilitate the separation of fluoride ions from the liquid contents in the [HFW] input. In some embodiments, the [HFW] comprises a sedimentation tank fluidically connected to an outlet of the one or more tanks. In some embodiments, the [HFW] comprises a third reaction tank fluidically connected to an outlet of the sedimentation tank. In some embodiments, additives including but not limited the acids, bases, coagulants, and salts described above as well as aluminum may be added to the contents of the third reaction tank. In some embodiments, the [HFW] comprises a lamella clarifier fluidically connected to an outlet on the third reaction tank. In the some embodiments, the [HFW] comprises an effluent tank fluidically connected to an outlet of the lamella clarifier. In some embodiments, the [HFW] further comprises one or more membrane separators connected in parallel or in series. In some embodiments the one or more membrane separators are downstream from the lamella clarifier and fluidically connected to other components of the [HFW] system. In some embodiments, at least a portion of the membrane separator permeate output exiting the one or more membrane separators is transported to the [NPR], e.g., by forming at least a portion of the first [HFW] output. In some embodiments, at least a portion of the membrane separator retentate output exiting the one or more membrane separators is transported to the [IWN Reject], e.g., by forming at least a portion of the third [HFW] output.

[0072] In some embodiments, the [HFW] comprises a dewatering unit configured to remove excess liquid from solids, such as solids derived from fluoride ions, separated from the [HFW] input. FIG. 3D shows a non-limiting example of an HFW dewatering unit. In some embodiments, solids, such as solids precipitated in the sedimentation tank, are transported to a tank that feeds a filter press. The filter press may compress solids such that excess liquid is removed and the compressed solids are disposed. The dewatering unit, in some embodiments, facilitates the limited liquid discharge exiting the systems described herein. In some embodiments, the dewatering unit comprises a filter press, sludge tank fluidically connected to xxxxxx.x the filter press, a squeezing water tank fluidically connected to the filter press, and / or a sludge bin configured to store solids exiting the filter press for later disposal.

[0073] In some embodiments, the [APM] is configured to remove ammonia (e.g., as neutral molecules and / or ammonium ions) from the first [APM] input. An example embodiment of the APM is shown in FIG. 3E. In some embodiments, the [APM] comprises an equalization tank. In some embodiments, the [APM] comprises an APM stripping tower fluidically connected to an outlet of the equalization tank. In some embodiments, the [APM] comprises an ammonia absorption scrubber fluidically connected to a gas outlet of the APM stripping tower. In some embodiments, the ammonia absorption scrubber is configured to receive an input comprising sulfuric acid. In some embodiments, the [APM] comprises an ammonium sulfate tank fluidically connected to the ammonia absorption tower. In some embodiments, the [APM] comprises a treated water tank fluidically connected to a liquid output of the ammonia absorption tower. The contents of the treated water tank may be transported to other fluidic systems such as the [IWN] for further processing.

[0074] In some embodiments, the [IP AL] is configured to remove isopropyl alcohol from the [IP AL] input. An example embodiment of the [IP AL] is shown in FIG. 3F. In some embodiments, the [IP AL] comprises an automatic backwashing filter. In some embodiments, the [IP AL] comprises a cartridge filter fluidically connected to an outlet of the automatic backwashing filter. In some embodiments, the [IP AL] comprises a membrane separator, such as a reverse osmosis membrane separator. In some embodiments, the [IP AL] comprises a treated water tank fluidically connected to an outlet on the permeate side of the membrane separator. In some embodiments, the [IP AL] comprises a distillation apparatus configured as an IPA recovery unit, fluidically connected to an outlet on the retentate side of the membrane separator. In some embodiments, the [IP AL] comprises a concentrated IPA tank fluidically connected to an outlet of the IPA recovery unit. In some embodiments, the [IP AL] comprises a boiler configured to at least partially evaporate liquid. An output exiting the concentrated IPA tank comprising isopropyl alcohol may be transported out of the system for disposal. In some embodiments, an output exiting the IPA recovery unit is transported to another fluidic system described herein, such as the [HFW],

[0075] In some embodiments, the [CMP-O / M] is configured to remove metal and / or metal oxides from the [CMP-O / M] input. An example embodiment of the [CMP-O / M] is shown in FIGS. 3G-3I. In some embodiments, the [CMP-O / M] comprises an automatic backwashing filter. In some embodiments, the [CMP-O / M] comprises an ultrafiltration unit (UF) fluidically connected to an outlet of the automatic backwashing filter. In some embodiments, the [CMP- xxxxxx.x 0 / M] comprises an ultraviolet light unit (UV) fluidically connected to an outlet on the permeate side of the UF. An ozone generator may introduce ozone in the contents entering the UV, according to some embodiments. In some embodiments, the [CMP-O / M] comprises a cartridge filter fluidically connected to an outlet of the UV. Additives, including but not limited to caustic, antiscalant, and / or sodium bisulfite (SBS) may be introduced to the cartridge filter. In some embodiments, the [CMP-O / M] comprises a membrane separator, such as a reverse osmosis membrane separator, fluidically connected to an outlet of the cartridge filter. The reverse osmosis membrane separator may be configured to be operated in a batch or semibatch manner. In some embodiments, a stream exiting the permeate side of the membrane separator may be transported to out of the [CMP-O / M] via one or more output streams (e.g., the [CMP-O / M] effluent shown in FIG.3G) and may include the addition of caustics and / or acids. In some embodiments, streams exiting the retentate side of the membrane separator may be transported to other fluidic system described herein, such as the IWN.

[0076] As shown in FIG. 3H, in some embodiments, the [CMP-O / M] comprises a backwash collection tank. In some embodiments, the [CMP-O / M] comprises one or more tanks (e.g., a first reaction tank and / or a second reaction tank) configured to mix a variety of additives, for example, using stirrers, shakers, impellers, and / or agitators that are fluidically connected to an outlet of the backwash collection tank. In some embodiments, coagulant and / or polymer are added to the one or more tanks. In some embodiments, the [CMP-O / M] comprises a lamella clarifier fluidically connected to an outlet of the second reaction tank. In some embodiments, additives including but not limited to coagulant, sulfuric acid, and / or polymer are added to the lamella clarifier. The lamella clarifier may facilitate the separation of solids (e.g., metals and / or metal oxides) from liquid contents in the lamella clarifier. In some embodiments, the [CMP- O / M] comprises a clarified water tank fluidically connected to an outlet of the lamella clarifier. Solids that were separated from the liquid contents in the lamella clarifier may be transported to the [CMP-O / M] dewatering unit. The [CMP-O / M] dewatering unit, an example of which is shown in FIG. 31, may be substantially the same as the dewatering unit associated with the [HFW], but instead of receiving solids from the [HFW], the [CMP-O / M] receives solids from the [CMP-O / M],

[0077] In some embodiments, the [CMP-Cu] is configured to remove copper metal and / or copper ions from the [CMP-Cu] input. An example embodiment of the [CMP-Cu] is shown in FIGS. 3 J-3K. In some embodiments, the [CMP-Cu] is substantially the same of the [CMP-O / M] except that acids such as sulfuric acid, bases such as sodium hydroxide, salts such as magnesium chloride may also be added into the plurality of tanks, and a sedimentation tank is used instead xxxxxx.x of a lamella clarifier. In some embodiments, the [CMP-Cu] comprises a dewatering unit that is substantially the same as the dewatering unit associated with the [CMP-O / M],

[0078] In some embodiments, the [LSR] is configured to alter the conductivity of the [LSR] input. An example embodiment of the [LSR] is shown in FIG. 3L. In some embodiments, the [LSR] comprises an automatic backwashing filter. In some embodiments, streams entering the automatic backwashing filter comprises a catalyst. In some embodiments, the [LSR] comprises an ultrafiltration unit (UF) fluidically connected to an outlet of the automatic backwashing filter. In some embodiments, the [LSR] comprises an activated carbon filter fluidically connected to an outlet of the UF. In some embodiments, the [LSR] comprises a strong acid cation vessel (SAC) fluidically connected to an outlet of the activated carbon filter. In some embodiments, the SAC is water softener comprising ion exchange resins. In some embodiments, the [LSR] comprises a cartridge filter fluidically connected to an outlet of the SAC. In some embodiments, output streams exiting the SAC are combined with an antiscalant, acids, bases, and / or SBS and transported to a cartridge filter. In some embodiments, the [LSR] comprises a membrane separator, such as a reverse osmosis membrane separator, fluidically connected to an outlet of the cartridge filter. The reverse osmosis membrane separator may be operated in a batch or semibatch manner. In some embodiments, stream exiting the permeate side of the reverse osmosis membrane separator exits the [LSR] for further processing and comprise caustics, acids, and / or NaOCl In some embodiments, streams exiting the retentate side of the reverse osmosis infinity are transported to one or more fluidic system described herein, such as the [HFW], for further processing.

[0079] In some embodiments, the [HFWR] is configured to remove at least some fluoride ions from the [HFWR] input. An example embodiment of the [HFWR] is shown in FIG. 3M. In some embodiments, the [HFWR] comprises an automatic backwashing filter. The [HFWR] input may enter the automatic backwashing filter via one or more inlets. Catalysts may be added into the [HFWR] input. In some embodiments, the [HFWR] comprises an ultrafiltration unit fluidically connected to an outlet of the automatic backwashing filter. In some embodiments, the [HFWR] comprises an activated carbon filter fluidically connected to an outlet on the permeate side of the activated carbon filter. In some embodiments, the [HFWR] comprises a tubular membrane filter (TMF) fluidically connected to an outlet on the retentate side of the activated carbon filter. In some embodiments, the [HFWR] comprises a cartridge filter fluidically connected to an outlet of the activated carbon filter. In some embodiments, antiscalants, caustics, and / or acids can be added to streams entering the cartridge filter. In some embodiments, one or more membrane separators, such as reverse osmosis membrane separators, are fluidically xxxxxx.x connected in series. In some embodiments, caustics and / or acids can be added to streams entering the membrane separators. In some embodiments, the retentate side of first reverse osmosis membrane separator is fluidically connected to an outlet of the cartridge filter. The retentate side of the second reverse osmosis membrane separator may be fluidically connected to the permeate side of the first reverse osmosis membrane separator. In FIG. 3M, auxiliary [HFWR] output 121 comprises a portion of the permeate exiting the permeate side of the first membrane separator, while first [HFWR] output 119 comprise at least a portion of the permeate exiting the second membrane separator.

[0080] As described above, some fluidic systems described herein involve membrane separators such as reverse osmosis membrane separators. Some embodiments comprise transporting a membrane separator retentate input (e.g., a first membrane separator retentate input and / or a second membrane separator retentate input) to a retentate side of a membrane separator. A membrane separator refers to a collection of components including one or more semi-permeable membranes configured to perform a membrane-based separation process (e.g., an osmotic process, a filtration process, or a combination thereof) on an input (e.g., at least one input stream) and produce an output (e.g., at least one output stream). The membrane separator may comprise at least one semi-permeable membrane defining a permeate side of the membrane separator and a retentate side of the membrane separator. Each membrane separator described herein may include further sub-units such as, for example, individual semi-permeable membrane modules (e.g., in the form of cartridges), valving, fluidic conduits, and the like. As described in more detail below, each membrane separator can include a single semi-permeable membrane or multiple semi-permeable membranes. In some embodiments, a single membrane separator can include multiple sub-units (e.g., multiple modules such as multiple cartridges) that may or may not share a common container.

[0081] The retentate side of the membrane separator may be fluidically connected to one or more fluidic systems described herein. For example, the retentate side of the membrane separator of the [LSR] in FIG. 3L may be fluidically connected to cartridge filter of the [LSR],

[0082] In association with various embodiments, inputs (e.g., a membrane separator retentate input) and outputs (e.g., a membrane separator permeate output, a membrane separator retentate output) are described. In each case the input and / or output may be in the form of a single stream or multiple streams. In some embodiments, it can be advantageous to use a single stream, as opposed to multiple streams. Thus, in some embodiments, the membrane separator retentate input is in the form of a single stream. In certain embodiments, the membrane separator xxxxxx.x retentate output is in the form of a single stream. In certain embodiments, the membrane separator permeate output is in the form of a single stream.

[0083] In some embodiments, the membrane separator is operated as an osmotic separator. For example, in some embodiments, the semi-permeable membrane is an osmotic membrane. Transport of solvent (e.g., water) through osmotic membrane(s) of membrane separators can be achieved via a transmembrane net driving force (i.e., a net driving force through the thickness of the membrane(s)), according to certain embodiments. Generally, the transmembrane net driving force (A / J is expressed as:

[0084] AX= AP - A / 7 = (Px- P2) - (ZJi - 772) [1] wherein Pi is the hydraulic pressure on the retentate side of the osmotic membrane, P2 is the hydraulic pressure on the permeate side of the osmotic membrane, II 1 is the osmotic pressure of the stream on the retentate side of the osmotic membrane, and 7 2 is the osmotic pressure of the stream on the permeate side of the osmotic membrane. (Pi - P2) can be referred to as the transmembrane hydraulic pressure difference, and (77 / - II2) can be referred to as the transmembrane osmotic pressure difference.

[0085] The osmotic pressure of a particular liquid is an intrinsic property of the liquid. The osmotic pressure can be determined in a number of ways, with the most efficient method depending upon the type of liquid being analyzed. For certain solutions with relatively low molar concentrations of ions, osmotic pressure can be accurately measured using an osmometer. In other cases, the osmotic pressure can simply be determined by comparison with solutions with known osmotic pressures. For example, to determine the osmotic pressure of an uncharacterized solution, one could apply a known amount of the uncharacterized solution on one side of a non- porous, semi-permeable, osmotic membrane and iteratively apply different solutions with known osmotic pressures on the other side of the osmotic membrane until the differential pressure through the thickness of the membrane is zero.

[0086] The osmotic pressure (77) of a solution containing n solubilized species may be estimated as: n = ^=1ijMjRT [2] wherein z) is the van’t Hoff factor of the jthsolubilized species, Mj is the molar concentration of the jthsolubilized species in the solution, R is the ideal gas constant, and Zis the absolute temperature of the solution. Equation [2] generally provides an accurate estimate of osmotic pressure for liquid with low concentrations of solubilized species (e.g., concentrations at or below between about 4 wt% and about 6 wt%). For many liquids comprising solubilized xxxxxx.x species, at species concentrations above around 4-6 wt%, the increase in osmotic pressure per increase in salt concentration is greater than linear (e.g., slightly exponential).

[0087] As mentioned above, one type of osmotic separation technique that can be performed using the membrane separators of this disclosure, according to some embodiments, is reverse osmosis. Reverse osmosis generally occurs when the osmotic pressure on the retentate side of the osmotic membrane is greater than the osmotic pressure on the permeate side of the osmotic membrane, and a pressure is applied to the retentate side of the osmotic membrane such that the hydraulic pressure on the retentate side of the osmotic membrane is sufficiently greater than the hydraulic pressure on the permeate side of the osmotic membrane such that the osmotic pressure difference is overcome and liquid (e.g., a solvent such as water) is transported from the retentate side of the osmotic membrane to the permeate side of the osmotic membrane. Generally, such situations result when the transmembrane hydraulic pressure difference (P1-P2) is greater than the transmembrane osmotic pressure difference (77 / -II2) such that liquid (e.g., a solvent such as water) is transported from the retentate side of the osmotic membrane to the permeate side of the osmotic membrane (rather than having liquid be transported from the permeate side of the osmotic membrane to the retentate side of the osmotic membrane, which would be energetically favored in the absence of the pressure applied to the retentate side of the osmotic membrane). In some embodiments, the membrane separator is operated to perform reverse osmosis.

[0088] While FIGS. 3B, 3E, 3G, 3L, and 3M show examples of configurations of membrane separators, it should be understood that a different number of membrane separators can be employed in the system and used in the methods of this disclosure. In some embodiments, the membrane separator is a first membrane separator and the system comprises additional membrane separators arranged in series and / or parallel with the first membrane separator. In some embodiments, the system comprises a plurality of membrane separators (e.g., at least two, at least three, at least four, at least five, at least ten, and least twenty, or more membrane separators) configured as described in this disclosure. A second membrane separator retentate input (e.g., a second membrane separator retentate inlet stream) may comprise at least a portion of the first membrane separator retentate output. The first membrane separator retentate output may be directly transported to the retentate side of the second membrane separator, or one or more intermediate processes may be performed, such as those described in the embodiments shown in FIGS. 3B, 3E, 3G, 3L, and 3M.

[0089] In some embodiments, a pressure of any of the streams described herein can be increased via one or more additional components, such as one or more booster pumps. In some embodiments, a pressure of any of the streams described herein can be decreased via one or xxxxxx.x more additional components, such as one or more additional valves and / or energy recovery devices. In some embodiments, a membrane separator described herein further comprises one or more heating, cooling, or other concentration or dilution mechanisms or devices.

[0090] The membrane separators described herein can each include a single semi-permeable membrane or a plurality of semi-permeable membranes.

[0091] FIG. 4A is a schematic illustration of membrane separator 400A, in which a single semi- permeable membrane is used to separate permeate side 404 from retentate side 406. Membrane separator 400 A can be operated by transporting retentate inlet stream 410 across retentate side 406. At least a portion of a liquid (e.g., a solvent) and, in some instances, solute within retentate inlet stream 410 can be transported across semi-permeable membrane 402 to permeate side 404. This can result in the formation of retentate outlet stream 412, which can include a higher concentration of solute than is contained within retentate inlet stream 410, as well as permeate outlet stream 414. Permeate outlet stream 414 can correspond to the liquid (e.g., solvent) and, in some instances, solute, of retentate inlet stream 410 that was transported from retentate side 406 to permeate side 404.

[0092] In some embodiments, a membrane separator comprises a plurality of semi-permeable membranes connected in parallel. One example of such an arrangement is shown in FIG. 4B. In FIG. 4B, membrane separator 400B comprises three semi-permeable membranes 402A, 402B, and 402C arranged in parallel. Retentate inlet stream 410 is split into three sub-streams, with one sub-stream fed to retentate side 406A of semi-permeable membrane 402A, another substream fed to retentate side 406B of semi-permeable membrane 402B, and yet another substream fed to retentate side 406C of semi-permeable membrane 402C. Membrane separator 400B can be operated by transporting the retentate inlet sub-streams across the retentate sides of the semi-permeable membranes. At least a portion of a liquid (e.g., a solvent), and, in some instances, solute, within retentate inlet stream 410 can be transported across each of semi- permeable membranes 402A, 402B, and 402C to permeate sides 404A, 404B, and 404C, respectively. This can result in the formation of three retentate outlet sub-streams, which can be combined to form retentate outlet stream 412. Retentate outlet stream 412 can include a higher concentration of solute than is contained within retentate inlet stream 410. Permeate outlet stream 414 can also be formed (from three permeate outlet sub-streams). Permeate outlet stream 414 can correspond to the liquid (e.g., solvent), and, in some instances, solute of retentate inlet stream 410 that was transported from retentate sides 406A-406C to permeate sides 404A-404C.

[0093] While FIG. 4B shows three semi-permeable membranes connected in parallel, other embodiments could include 2, 4, 5, or more semi-permeable membranes connected in parallel. xxxxxx.x In some embodiments, a membrane separator (e.g., the first membrane separator, the second membrane separator) comprises a plurality of semi-permeable membranes connected in series. One example of such an arrangement is shown in FIG. 4C. In FIG. 4C, membrane separator 400C comprises three semi-permeable membranes 402A, 402B, and 402C arranged in series. In FIG. 4C, retentate inlet stream 410 is first transported to retentate side 406A of semi- permeable membrane 402A. At least a portion of a liquid (e.g., a solvent), and, in some instances, solute, within retentate inlet stream 410 can be transported across semi-permeable membrane 402A to permeate side 404A of semi-permeable membrane 402A. This can result in the formation of permeate outlet stream 414 and first intermediate retentate stream 440 that is transported to retentate side 406B of semi-permeable membrane 402B. At least a portion of a liquid (e.g., a solvent), and, in some instances, solute, within first intermediate retentate stream 440 can be transported across semi-permeable membrane 402B to permeate side 404B of semi- permeable membrane 402B. This can result in the formation of permeate outlet stream 450 and second intermediate retentate stream 441 that is transported to retentate side 406C of semi- permeable membrane 402C. At least a portion of a liquid (e.g., a solvent), and, in some instances, solute within second intermediate retentate stream 441 can be transported across semi- permeable membrane 402C to permeate side 404C of semi-permeable membrane 402C. This can result in the formation of permeate outlet stream 451 and retentate outlet stream 412.

[0094] While FIG. 4C shows three semi-permeable membranes connected in series, other embodiments could include 2, 4, 5, or more semi-permeable membranes connected in series.

[0095] For membrane separators comprising a plurality of semi-permeable membranes, parameters such as rejection percentage, recovery, and salt passage percentage at standard conditions for the membrane separators are calculated by performing a mass balance on the entire membrane separator. This means that all initial retentate streams for the membrane separator would be added and considered together, all final permeate outlet streams for the membrane separator would be added and considered together, and all final retentate outlet streams for the membrane separator would be added and considered together. For example, as mentioned above, in FIG. 4B, membrane separator 400B comprises three semi-permeable membranes 402 A, 402B, and 402C arranged in parallel. Accordingly, calculation of the composition of the retentate inlet stream of membrane separator 400B for the purpose of calculating parameters such as the rejection percentage, recovery, and salt passage percentage at standard conditions for membrane separator 400B would involve taking measurements of retentate inlet stream 410 prior to it being split into the three inlet sub-streams fed to retentate sides 406A, 406B, and 406C of semi-permeable membranes 402A, 402B, and 402C, xxxxxx.x respectively. Similarly, calculation of the composition of the retentate outlet stream of membrane separator 400B for the purpose of calculating parameters such as the rejection percentage, recovery, and salt passage percentage at standard conditions for membrane separator 400B would involve taking measurements of retentate outlet stream 412, which is a combination of the three outlet sub-streams from retentate sides 406A, 406B, and 406C from semi-permeable membranes 402A, 402B, and 402C, respectively. Also similarly, calculation of the composition of the permeate outlet stream of membrane separator 400B for the purpose of calculating parameters such as the rejection percentage, recovery, and salt passage percentage at standard conditions would involve taking measurements of permeate outlet stream 414, which is a combination of the three outlet sub-streams from permeate sides 404A, 404B, and 404C from semi-permeable membranes 402A, 402B, and 402C, respectively.

[0096] As another example of the calculation of parameters corresponding to a membrane separator comprising a plurality of semi-permeable membranes, reference is made to membrane separator 400C in FIG. 4C. Membrane separator 400C comprises three semi-permeable membranes 402A, 402B, and 402C arranged in series. Accordingly, calculation of the composition of the retentate inlet stream of membrane separator 400C for the purpose of calculating parameters such as the rejection percentage, recovery, and salt passage percentage at standard conditions for membrane separator 400C would involve taking measurements of retentate inlet stream 410 prior to it entering semi-permeable membrane 402 A because semi- permeable membrane 402A is the initial semi-permeable membrane in the series. Similarly, calculation of the composition of the retentate outlet stream of membrane separator 400C for the purpose of calculating parameters such as the rejection percentage, recovery, and salt passage percentage at standard conditions for membrane separator 400C would involve taking measurements of retentate outlet stream 412 exiting semi-permeable membrane 402C because semi-permeable membrane 402C is the final semi-permeable membrane in the series with respect to the retentate outlet streams, thereby making retentate outlet stream 412 the final retentate outlet stream of membrane separator 400C. Calculation of the composition of the permeate outlet stream of membrane separator 400C for the purpose of calculating parameters such as the rejection percentage, recovery, and salt passage percentage at standard conditions would involve taking measurements of a combination of permeate outlet streams 414, 450, and 451 exiting semi-permeable membranes 402A, 402B, and 402C respectively. In addition, in some embodiments, a given membrane separator could include multiple semi-permeable membranes connected in parallel as well as multiple semi-permeable membranes connected in senes. xxxxxx.x In some embodiments, the membrane separator comprises a plurality of semi-permeable membranes. In some such embodiments, the plurality of semi-permeable membranes within the membrane separator are connected in series. In some such embodiments, the plurality of semi- permeable membranes within the membrane separator are connected in parallel. In certain embodiments, the membrane separator comprises a plurality of membranes a first portion of which are connected in series and another portion of which are connected in parallel.

[0097] As mentioned above, each membrane separator of the system may comprise at least one semi-permeable membrane. In general, a semi-permeable membrane is a barrier that allows some components of a mixture to pass through while blocking at least some of other components (e.g., blocking all of another component, or reducing the relative rate of permeation of another component). For example, a semi-permeable membrane may block some molecules in a liquid solution from passing through while allowing others to pass through. In some instances, a semi- permeable membrane blocks some molecules and permits other molecules to pass through based on their molecular weight and / or charge. As noted above, a semi-permeable membrane can be used for osmotic processes. For example, the semi-permeable membrane may be an osmotic membrane. An osmotic membrane may be capable of producing an osmotic pressure difference between solutions on either side of the membrane upon application of a hydraulic pressure difference across the two sides of the membrane. For example, if an osmotic membrane is placed between two solutions of identical composition such that there is initially no osmotic pressure difference across the membrane, application of a hydraulic pressure difference across the osmotic membrane may allow for transport of components from one side of the membrane to the other such that an osmotic pressure difference across the two sides of the membrane is established. Semi-permeable membranes may also be used for nanofiltration processes. Semi- permeable membranes may be configured for osmotic processes, nanofiltration processes, and / or processes in which separation is achieved based on a combination of nanofiltration and osmotic mechanisms (e.g., based on, for example, the molecular weight cutoff of the membranes, pore sizes of the membranes, the nature of the mixtures to which they are exposed, and a magnitude of applied hydraulic pressure).

[0098] The semi-permeable membrane medium can comprise, for example, a metal, a ceramic, a polymer (e.g., polyamides, polyethylenes, polyesters, poly(tetrafluoroethylene), polysulfones, polycarbonates, polypropylenes, poly(acrylates)), and / or composites or other combinations of these. The semi-permeable membranes generally allow for the selective transport of solvent (e.g., water) through the membrane, where solvent is capable of being transmitted through the membrane while solute (e.g., solubilized species such as solubilized ions) are inhibited from xxxxxx.x being transported through the membrane. Examples of commercially available semi-permeable membranes that can be used in association with certain of the embodiments described herein include, but are not limited to, those commercially available from Dow Water and Process Solutions (e.g., FilmTec™ membranes), Hydranautics, GE Osmonics, Suez, LG, Toyobo, Microdyn, and Toray Membrane, among others known to those of ordinary skill in the art.

[0099] In some embodiments, the semi-permeable membrane of a membrane separator of this disclosure has an average molecular weight cutoff (MWCO) that is sufficiently high such that a desired amount of liquid and / or solute (and / or type of solute) can pass through during operation of the system. In some embodiments, the semi-permeable membrane(s) of the membrane separator and / or the second membrane separator, has an average MWCO of greater than or equal to 50 Daltons, greater than or equal to 75 Daltons, greater than or equal to 100 Daltons, greater than or equal to 150 Daltons, or greater. In some embodiments, the semi-permeable membrane of a membrane separator of this disclosure has an average molecular weight cutoff (MWCO) that is sufficiently low such that a desired amount of solute (and / or type of solute) is rejected such that an effective separation is performed. In some embodiments, the semi-permeable membrane(s) of the membrane separator and / or the second membrane separator has an average MWCO of less than or equal to 400 Daltons, less than or equal to 300 Daltons, less than or equal to 250 Daltons, less than or equal to 200 Daltons, or less. Combinations of these ranges (e.g., greater than or equal to 50 Daltons and less than or equal to 400 Daltons, greater than or equal to 50 Daltons and less than or equal to 250 Daltons) are possible. The average MWCO of a membrane refers to the lowest molecular weight solute in which 90% of the solute is retained by the membrane.

[0100] The average MWCO of the semi-permeable membrane may affect any of a variety of the parameters discussed below, such as solute permeability, salt passage, rejection, and / or recovery.

[0101] The solute permeability of each membrane separator may be chosen based on any of a variety of design criteria such as desired purity of permeate, desired hydraulic pressure to be used, and nature of incoming influent (e.g., solute concentration of incoming influent). The solute permeability of a membrane separator can be calculated from the solute flux through the membrane and the respective concentrations of solute on either side using equation [3] below:

[0102] Js = B(CR - Cp) [3]

[0103] In the above equation, Jsrepresents the ion flux, CR represents the concentration of solute on the retentate side of the membrane, Cp represents the concentration of solute on the permeate side of the membrane, and B represents the solute permeability. Solute permeability is xxxxxx.x dependent on the species of solute in the retentate inlet stream and the concentrations on either side of the membrane.

[0104] In some embodiments in which multiple membrane separators are employed, the solute permeabilities of the first membrane separator, the second membrane separator, and / or the third membrane separator during operation of the method are chosen to afford good, consistent performance across all membrane separators by accounting for differences in concentrations of their respective retentate inlet streams.

[0105] In some embodiments, a solute permeability of the first membrane separator during the step of transporting the first membrane separator retentate input to the retentate side of the first membrane separator is different than a solute permeability of the second membrane separator during the step of transporting the second membrane separator retentate input to the retentate side of the second membrane separator. In some embodiments, at least a portion (e.g., at least 1 wt%, at least 5 wt%, at least 10 wt%, at least 20 wt%, at least 30 wt%, at least 40 wt%, at least 50 wt%, at least 60 wt%, at least 70 wt%, at least 80 wt%, at least 90 wt%, at least 99 wt%, or 100 wt%) of solute and / or solids in the first membrane separator retentate input are transported from the retentate side of the first membrane separator, through the first semi-permeable membrane of the first membrane separator, to the permeate side of the first membrane separator. In some embodiments, at least a portion (e.g., at least 1 wt%, at least 5 wt%, at least 10 wt%, at least 20 wt%, at least 30 wt%, at least 40 wt%, at least 50 wt%, at least 60 wt%, at least 70 wt%, at least 80 wt%, at least 90 wt%, at least 99 wt%, or 100 wt%) of solute and / or solids in the second membrane separator retentate input are transported from the retentate side of the second membrane separator, through the second semi-permeable membrane of the second membrane separator, to the permeate side of the second membrane separator.

[0106] Water permeability can be calculated from the water flux, pressure differential and osmotic differential, as shown below in equation [4]:

[0107] Jw = A(AP - An) [4]

[0108] In the above equation [4], Jwrepresents the flux of water through the membrane, AP represents the hydraulic pressure differential across the membrane, An represents the osmotic pressure differential across the membrane, and A represents the water permeability.

[0109] The salt passage percentage at standard conditions of each membrane separator may be chosen based on any of a variety of design criteria such as desired purity of permeate, desired hydraulic pressure to be used, and nature of incoming influent (e.g., concentration of incoming influent). The salt passage percentage at standard conditions of a membrane separator is an intrinsic property of the separator based on the quantity of salt, as a percentage, which passes xxxxxx.x through the semi-permeable membrane(s) from the retentate side to the permeate side of the membrane separator under defined reference conditions. The salt passage percentage at standard conditions of a membrane separator can be determined using the standardized test described in ASTM D4516-19a. In some embodiments, a salt passage percentage at standard conditions of the first membrane separator is different than a salt passage percentage at standard conditions of the second membrane separator, wherein the salt passage percentage at standard conditions is determined using ASTM D4516-19a. In some embodiments, the salt passage percentage at standard conditions of the first membrane separator and the salt passage percentage at standard conditions of the second membrane separator are at least 5% (or at least 10%, at least 15%, at least 20%, at least 25%, at least 30%, or more) different from each other.

[0110] In some embodiments in which multiple membrane separators are employed, the salt passages at standard conditions of the first membrane separator and the second membrane separator (and, if present a third membrane separator, a fourth membrane separator, or more) used in in the operation of the method are chosen to afford good, consistent performance across all membrane separators by accounting for differences in concentrations of their respective retentate inlet streams. In some embodiments, the salt passage percentage at standard conditions of the first membrane separator and / or the second membrane separator membrane separator are independently greater than or equal to 0%, greater than or equal to 1%, greater than or equal to 2%, greater than or equal to 5%, greater than or equal to 10%, greater than or equal to 15%, greater than or equal to 20%, greater than or equal to 50%, greater than or equal to 75%, and / or up to 80%, up to 85%, up to 90%, or greater. In some embodiments, the membrane separator has a relatively low salt passage percentage at standard conditions. Such a low salt passage percentage at standard conditions may be useful in embodiments in which the membrane separator is operated as a high-rejection reverse osmosis separator. In some embodiments, the membrane separator has a salt passage percentage at standard conditions of less than or equal to 10%, less than or equal to 5%, less than or equal to 2%, less than or equal to 1%, less than or equal to 0.1%, or less.

[0111] Intrinsic properties of a semi-permeable membrane such as salt passage percentage at standard conditions and / or MWCO can be selected based on supplier specifications for commercially-obtained membranes, by controlling the synthesis of membranes, and / or by physically and / or chemically modifying existing membranes (e.g., commercially obtained membranes).

[0112] The rejection of each membrane separator may be chosen based on any of a variety of design criteria such as desired purity of permeate, desired hydraulic pressure to be used, and xxxxxx.x nature of incoming influent (e.g., solute concentration of incoming influent). The rejection, R, of a membrane separator can be calculated from CR (the concentration of solute on the retentate side of the membrane) and Cp (the concentration of solute on the permeate side of the membrane) and expressed as a percentage using Equation [5] below:

[0113] R = [1 - (CP / CR)] * 100 [5]

[0114] In some embodiments in which multiple membrane separators are employed, the rejections (7?) of the first membrane separator, the second membrane separator, and / or the third membrane separator during operation of the method are chosen to afford good, consistent performance across all membrane separators by accounting for differences in concentrations of their respective retentate inlet streams.

[0115] In some embodiments, the rejection for at least one solute (e.g., the solute during the step of transporting the membrane separator retentate input to the retentate side of the membrane separator) of the membrane separator is greater than or equal to 10%, greater than or equal to 15%, greater than or equal to 20%, greater than or equal to 50%, greater than or equal to 75%, greater than or equal to 80%, greater than or equal to 85%, greater than or equal to 90%, greater than or equal to 95%, greater than or equal to 98%, greater than or equal to 99%, greater than or equal to 99.9%, or greater. In some embodiments, the rejection for at least one solute (e.g., the solute during the step of transporting the membrane separator retentate input to the retentate side of the membrane separator) of the membrane separator is less than or equal to 100%, less than or equal to 99%, less than or equal to 95%, less than or equal to 90%, less than or equal to 85%, less than or equal to 80%, less than or equal to 75%, less than or equal to 60%, less than or equal to 50%, or less. Combinations of these ranges (e.g., greater than or equal to 10% and less than or equal to 100%) are possible. These ranges may be independently applicable to the first membrane separator, the second membrane separator, and / or the third membrane separator.

[0116] As used herein, a liquid that is “purified” is one that includes that liquid in a higher mass percentage than was contained in the original liquid prior to purification. Purified water, for example, is a liquid that contains water in a higher mass percentage than the original liquid prior to the purification process. Purified liquids can be either completely purified liquids (in which no components other than the purified liquid are present, or components other than the purified liquid are present only in trace amounts), or they can be incompletely purified liquids (in which components other than the purified liquid may still be present, but such components are present in a lesser amount than in the original liquid that was subject to purification).

[0117] As used herein, two elements are in fluidic communication with each other (or, equivalently, in fluid communication with each other) when fluid may be transported from one xxxxxx.x of the elements to the other of the elements without otherwise altering the configurations of the elements or a configuration of an element between them (such as a valve). Two conduits connected by an open valve (thus allowing for the flow of fluid between the two conduits) are considered to be in fluidic communication with each other. In contrast, two conduits separated by a closed valve (thus preventing the flow of fluid between the conduits) are not considered to be in fluidic communication with each other.

[0118] As used herein, two elements are fluidically connected to each other when they are connected such that, under at least one configuration of the elements and any intervening elements, the two elements are in fluidic communication with each other. Two membrane separators connected by a valve and conduits that permit flow between the membrane separators in at least one configuration of the valve would be said to be fluidically connected to each other. To further illustrate, two membrane separators that are connected by a valve and conduits that permit flow between the membrane separators in a first valve configuration but not a second valve configuration are considered to be fluidically connected to each other both when the valve is in the first configuration and when the valve is in the second configuration. In contrast, two membrane separators that are not connected to each other (e.g., by a valve, another conduit, or another component) in a way that would permit fluid to be transported between them under any configuration would not be said to be fluidically connected to each other. Elements that are in fluidic communication with each other are always fluidically connected to each other, but not all elements that are fluidically connected to each other are necessarily in fluidic communication with each other.

[0119] Various components are described herein as being fluidically connected. Fluidic connections may be either direct fluidic connections or indirect fluidic connections. Generally, a direct fluidic connection exists between a first region and a second region (and the two regions are said to be directly fluidically connected to each other) when they are fluidically connected to each other and when the composition of the fluid at the second region of the fluidic connection has not substantially changed relative to the composition of the fluid at the first region of the fluidic connection (i.e., no fluid component that was present in the first region of the fluidic connection is present in a weight percentage in the second region of the fluidic connection that is more than 5% different from the weight percentage of that component in the first region of the fluidic connection). As an illustrative example, a stream that connects first and second unit operations, and in which the pressure and temperature of the fluid is adjusted but the composition of the fluid is not altered, would be said to directly fluidically connect the first and second unit operations. If, on the other hand, a separation step is performed and / or a chemical xxxxxx.x reaction is performed that substantially alters the composition of the stream contents during passage from the first unit operation to the second unit operation, the stream would not be said to directly fluidically connect the first and second unit operations. In some embodiments, a direct fluidic connection between a first region and a second region can be configured such that the fluid does not undergo a phase change from the first region to the second region. In some embodiments, the direct fluidic connection can be configured such that at least 50 wt% (or at least 75 wt%, at least 90 wt%, at least 95 wt%, or at least 98 wt%) of the fluid (e.g., liquid) in the first region is transported to the second region via the direct fluidic connection. Any of the fluidic connections described herein may be, in some embodiments, direct fluidic connections. In other cases, the fluidic connections may be indirect fluidic connections.

[0120] The following applications are incorporated herein by reference, in their entirety, for all purposes: U.S. Patent Application Publication No. US 2015 / 0060286 published on March 5, 2015, filed as U.S. Patent Application No. 14 / 452,387 on August 5, 2014, and entitled “WATER TREATMENT SYSTEMS AND ASSOCIATED METHODS”; U.S. Patent Application Publication No. US 2015 / 0129410 published on May 14, 2015, filed as U.S. Patent Application No. 14 / 485,606 on September 12, 2014, and entitled “SYSTEMS INCLUDING A CONDENSING APPARATUS SUCH AS A BUBBLE COLUMN CONDENSER”; U.S. Patent Application Publication No. US 2015 / 0083577 published on March 26, 2015, filed as U.S. Patent Application No. 14 / 494,101 on September 23, 2014, and entitled “DESALINATION SYSTEMS AND ASSOCIATED METHODS”; U.S. Patent Application Publication No. US2016 / 0228795 published on August 11, 2016, filed as U.S. Patent Application No. 14 / 719,295 on May 21, 2015, and entitled “METHODS AND SYSTEMS FOR PRODUCING TREATED BRINES”; U.S. Patent Application Publication No. US 2019 / 0009218 published on January 10, 2019, filed as U.S. Patent Application No. 15 / 747,907 on January 26, 2018, and entitled “OSMOTIC DESALINATION METHODS AND ASSOCIATED SYSTEMS”; U.S. Patent Application Publication No. US 2017 / 0144906 published on May 25, 2017, filed as U.S. Patent Application No. 15 / 364,785 on November 30, 2016, and entitled “SYSTEMS AND METHODS FOR TREATMENT OF WATER, SUCH AS OILFIELD WASTEWATER, VIA CHEMICAL COAGULATION”; U.S. Patent Application Publication No. US 2021 / 0179452 published on June 17, 2021, filed as U.S. Patent Application No. 17 / 270,142 on February 22, 2021, and entitled “LIQUID SOLUTION CONCENTRATION SYSTEM COMPRISING ISOLATED SUBSYSTEM AND RELATED METHODS”; U.S. Patent Application Publication No. US 2022 / 0380233 published on December 1, 2022, filed as U.S. Patent Application No. 17 / 882,701 on August 8, 2022, and entitled “OSMOTIC METHODS AND SYSTEMS xxxxxx.x INVOLVING ENERGY RECOVERY”; U.S. Patent Application Publication No.

[0121] US 2024 / 0109037 published on April 4, 2024, filed as U.S. Patent Application No. 18 / 315,130 on May 10, 2023, and entitled “LIQUID SEPARATION USING SOLUTE-PERMEABLE MEMBRANES AND RELATED SYSTEMS”; and U.S. Patent Application Publication No. US 2023 / 0001355, published on January 5, 2023, filed as U.S. Patent Application No. 17 / 305,289 on July 2, 2021, and entitled “MEMBRANES WITH CONTROLLED POROSITY FOR SERIAL FILTRATION.”

[0122] While several embodiments of the present invention have been described and illustrated herein, those of ordinary skill in the art will readily envision a variety of other means and / or structures for performing the functions and / or obtaining the results and / or one or more of the advantages described herein, and each of such variations and / or modifications is deemed to be within the scope of the present invention. More generally, those skilled in the art will readily appreciate that all parameters, dimensions, materials, and configurations described herein are meant to be exemplary and that the actual parameters, dimensions, materials, and / or configurations will depend upon the specific application or applications for which the teachings of the present invention is / are used. Those skilled in the art will recognize, or be able to ascertain using no more than routine experimentation, many equivalents to the specific embodiments of the invention described herein. It is, therefore, to be understood that the foregoing embodiments are presented by way of example only and that, within the scope of the appended claims and equivalents thereto, the invention may be practiced otherwise than as specifically described and claimed. The present invention is directed to each individual feature, system, article, material, and / or method described herein. In addition, any combination of two or more such features, systems, articles, materials, and / or methods, if such features, systems, articles, materials, and / or methods are not mutually inconsistent, is included within the scope of the present invention.

[0123] The indefinite articles “a” and “an,” as used herein in the specification and in the claims, unless clearly indicated to the contrary, should be understood to mean “at least one.”

[0124] The phrase “and / or,” as used herein in the specification and in the claims, should be understood to mean “either or both” of the elements so conjoined, i.e., elements that are conjunctively present in some cases and disjunctively present in other cases. Other elements may optionally be present other than the elements specifically identified by the “and / or” clause, whether related or unrelated to those elements specifically identified unless clearly indicated to the contrary. Thus, as a non-limiting example, a reference to “A and / or B,” when used in conjunction with open-ended language such as “comprising” can refer, in one embodiment, to A xxxxxx.x without B (optionally including elements other than B); in another embodiment, to B without A (optionally including elements other than A); in yet another embodiment, to both A and B (optionally including other elements); etc.

[0125] As used herein in the specification and in the claims, “or” should be understood to have the same meaning as “and / or” as defined above. For example, when separating items in a list, “or” or “and / or” shall be interpreted as being inclusive, i.e., the inclusion of at least one, but also including more than one, of a number or list of elements, and, optionally, additional unlisted items. Only terms clearly indicated to the contrary, such as “only one of’ or “exactly one of,” or, when used in the claims, “consisting of,” will refer to the inclusion of exactly one element of a number or list of elements. In general, the term “or” as used herein shall only be interpreted as indicating exclusive alternatives (i.e. “one or the other but not both”) when preceded by terms of exclusivity, such as “either,” “one of,” “only one of,” or “exactly one of.” “Consisting essentially of,” when used in the claims, shall have its ordinary meaning as used in the field of patent law.

[0126] As used herein in the specification and in the claims, the phrase “at least one,” in reference to a list of one or more elements, should be understood to mean at least one element selected from any one or more of the elements in the list of elements, but not necessarily including at least one of each and every element specifically listed within the list of elements and not excluding any combinations of elements in the list of elements. This definition also allows that elements may optionally be present other than the elements specifically identified within the list of elements to which the phrase “at least one” refers, whether related or unrelated to those elements specifically identified. Thus, as a non-limiting example, “at least one of A and B” (or, equivalently, “at least one of A or B,” or, equivalently “at least one of A and / or B”) can refer, in one embodiment, to at least one, optionally including more than one, A, with no B present (and optionally including elements other than B); in another embodiment, to at least one, optionally including more than one, B, with no A present (and optionally including elements other than A); in yet another embodiment, to at least one, optionally including more than one, A, and at least one, optionally including more than one, B (and optionally including other elements); etc.

[0127] As used herein, “wt%” is an abbreviation of weight percentage. As used herein, “at%” is an abbreviation of atomic percentage.

[0128] Some embodiments may be embodied as a method, of which various examples have been described. The acts performed as part of the methods may be ordered in any suitable way. Accordingly, embodiments may be constructed in which acts are performed in an order different xxxxxx.x than illustrated, which may include different (e.g., more or less) acts than those that are described, and / or that may involve performing some acts simultaneously, even though the acts are shown as being performed sequentially in the embodiments specifically described above.

[0129] Use of ordinal terms such as “first,” “second,” “third,” etc., in the claims to modify a claim element does not by itself connote any priority, precedence, or order of one claim element over another or the temporal order in which acts of a method are performed, but are used merely as labels to distinguish one claim element having a certain name from another element having a same name (but for use of the ordinal term) to distinguish the claim elements.

[0130] In the claims, as well as in the specification above, all transitional phrases such as “comprising,” “including,” “carrying,” “having,” “containing,” “involving,” “holding,” and the like are to be understood to be open-ended, i.e., to mean including but not limited to. Only the transitional phrases “consisting of’ and “consisting essentially of’ shall be closed or semi-closed transitional phrases, respectively, as set forth in the United States Patent Office Manual of Patent Examining Procedures, Section 2111.03. xxxxxx.x

Claims

1. CLAIMSWhat is claimed is:

1. A method, comprising: providing a neutralization system input having a pH less than or equal to 11 and greater than or equal to 3 to a neutralization system, the neutralization system operated such that: a first neutralization system output and a second neutralization system output exit the neutralization system, the first neutralization system output has a lower concentration of total dissolved solids (TDS) than the concentration of total dissolved solids in the neutralization system input, and the second neutralization system output has a higher concentration of TDS than the concentration of TDS in the neutralization system input; providing a non-potable reuse system input to a non-potable reuse system, the non-potable reuse system operated such that a non-potable reuse system output exits the non-potable reuse system; providing a hydrofluoric wastewater reclaim system input comprising fluoride ions to a hydrofluoric wastewater reclaim system, the hydrofluoric wastewater reclaim system operated such that: a first hydrofluoric wastewater reclaim system output and a second hydrofluoric wastewater reclaim system output exit the hydrofluoric wastewater reclaim system, the first hydrofluoric wastewater reclaim system output has a lower concentration of fluoride ions than the concentration of fluoride ions in the hydrofluoric wastewater reclaim system input, and the second hydrofluoric wastewater reclaim system output has a higher concentration of fluoride ions than the concentration of fluoride ions in the hydrofluoric wastewater reclaim system input; providing a hydrofluoric wastewater system input comprising fluoride ions and silica to a hydrofluoric wastewater system, the hydrofluoric wastewater system operated such that: xxxxxx.xa first hydrofluoric wastewater system output and a second hydrofluoric wastewater system output exit the hydrofluoric wastewater system, the first hydrofluoric wastewater system output has a lower concentration of fluoride ions than the concentration of fluoride ions in the hydrofluoric wastewater system input, and the second hydrofluoric wastewater system output comprises at least some of the silica; providing a first ammonia peroxide treatment system input comprising ammonia and a second ammonia peroxide treatment system input comprising sulfuric acid to an ammonia peroxide treatment system, the ammonia peroxide treatment system operated such that: a first ammonia peroxide treatment system output and a second ammonia peroxide treatment system output exit the ammonia peroxide treatment system, the first ammonia peroxide treatment system output has a concentration of ammonia that is lower than the concentration of ammonia in the first ammonia peroxide treatment system input, and the second ammonia peroxide treatment system output comprises ammonium ions derived from at least some of the ammonia in the first ammonia peroxide treatment system input and sulfate ions derived from at least some of the sulfuric acid in the second ammonia peroxide treatment system input; providing an isopropyl alcohol treatment system input comprising isopropyl alcohol to an isopropyl alcohol treatment system, the isopropyl alcohol treatment system operated such that a first isopropyl alcohol treatment system output exits the isopropyl alcohol treatment system, the first isopropyl alcohol treatment system output having a lower concentration of isopropyl alcohol than the concentration of isopropyl alcohol in the isopropyl alcohol treatment system input; providing a chemical mechanical polisher metal and / or metal oxide reclamation system input comprising at least one metal and / or metal oxide to a chemical mechanical polisher metal and / or metal oxide reclamation system, the chemical mechanical polisher metal and / or metal oxide reclamation system operated such that: a first chemical mechanical polisher metal and / or metal oxide reclamation system output, a second chemical mechanical polisher metal and / or metal oxide reclamation system output, and a third chemical mechanical polisher metal and / or xxxxxx.xmetal oxide reclamation system output exit the chemical mechanical polisher metal and / or metal oxide reclamation system, the first chemical mechanical polisher metal and / or metal oxide reclamation system output has a higher concentration of the at least one metal and / or metal oxide than the concentration of the at least one metal and / or metal oxide in the chemical mechanical polisher metal and / or metal oxide reclamation system input, the second chemical mechanical polisher metal and / or metal oxide reclamation system output has a lower concentration of the at least one metal and / or metal oxide than the concentration of the at least one metal and / or metal oxide in the chemical mechanical polisher metal and / or metal oxide reclamation system input, and the third chemical mechanical polisher metal and / or metal oxide reclamation system output has a lower concentration of the at least one metal and / or metal oxide than the concentration of the at least one metal and / or metal oxide in the chemical mechanical polisher metal and / or metal oxide reclamation system input, the third chemical mechanical polisher metal and / or metal oxide reclamation system output having a different composition than the second chemical mechanical polisher metal and / or metal oxide reclamation system output; providing a scrubber reclaim system input to a scrubber reclaim system, the scrubber reclaim system operated such that: a first scrubber reclaim system output and a second scrubber reclaim system output exit the scrubber reclaim system, the first scrubber reclaim system output has a conductivity that is higher than the conductivity of the scrubber reclaim system input, and the second scrubber reclaim system output has a conductivity that is lower than the conductivity of the scrubber reclaim system input; providing a neutralization reject system input to a neutralization reject system, the neutralization reject system operated such that a neutralization reject system output exits the neutralization reject system; wherein: xxxxxx.xthe neutralization system input comprises at least a portion of the first ammonia peroxide treatment system output; the non-potable reuse system input comprises at least a portion of the first neutralization system output, at least a portion of the first isopropyl alcohol treatment system output, at least a portion of the third chemical mechanical polisher metal / metal oxide reclamation system output and / or at least a portion of the first hydrofluoric wastewater reclaim system output; the hydrofluoric wastewater system input comprises at least a portion of the second hydrofluoric wastewater reclaim system output, at least a portion of the second chemical mechanical polisher metal and / or metal oxide reclamation system output, and / or at least a portion of the first scrubber reclaim system output; at least some of the ammonia in the ammonia peroxide treatment system input is derived from a first portion of waste from a semi-conductor processing facility, the first portion of waste comprising ammonia; at least some of the isopropyl alcohol in the isopropyl alcohol treatment system input is derived from a second portion of waste from a semi-conductor processing facility; at least some of the at least one metal and / or metal oxide in the chemical mechanical polisher metal and / or metal oxide reclamation system input is derived from a third portion of waste from a semiconductor processing facility; the scrubber reclaim system input comprises at least a portion of a wastewater stream from a scrubber; and the neutralization reject system input comprises at least a portion of the second neutralization system output.

2. A method, comprising: providing an input comprising at least a portion of an output of a semiconductor processing facility to a treatment system, the output of the semiconductor processing facility comprising water and at least one solute, such that a treatment system output exiting the treatment system has a lower concentration of the at least one solute than the output of the semiconductor processing facility. xxxxxx.x3. A method, comprising: providing an input comprising at least a portion of an output of a semiconductor processing facility to a treatment system, the output of the semiconductor processing facility comprising water, such that a treatment system output exiting the treatment system comprises water having a higher purity than the water in the output of the semiconductor processing facility.

4. The method of any one of claims 1-3, wherein the neutralization system input comprises at least a portion of a wastewater treatment output.

5. The method of any one of claims 1-4, wherein the wastewater treatment output comprises a comprises an ultrapure water system output, a cooling tower blowdown output, and / or a lift station output.

6. The method of any one of claims 1-5, wherein the non-potable reuse system input further comprises at least a portion of an output of a system downstream from the non-potable reuse system.

7. The method of any one of claims 1-6, wherein the hydrofluoric wastewater system input further comprises at least a portion of a UPW system output.

8. The method of any one of claims 1-7, wherein the hydrofluoric wastewater system is operated such that a third hydrofluoric wastewater system output exits the hydrofluoric wastewater system, wherein the third hydrofluoric wastewater system output has a lower concentration of fluoride ions than the concentration of fluoride ions in the hydrofluoric wastewater system input.

9. The method of any one of claims 1-8, wherein the non-potable reuse system input comprises at least a portion of the first hydrofluoric wastewater system output.

10. The method of any one of claims 1-9, wherein the neutralization reject system input comprises at least a portion of an ammonia exhaust system output, at least a portion xxxxxx.xof a SALIX wet gas scrubber system wastewater stream, and / or at least a portion of a photolithography wastewater stream.

11. The method of any one of claims 1-10, wherein the neutralization reject system input comprises at least a portion of the second neutralization system output.

12. The method of any one of claims 1-11, further comprising adjusting the pH of at least a portion of the neutralization system input.

13. The method of any one of claims 1-12, further comprising transporting at least a portion of the neutralization system input through one or more membrane separators and / or one or more filters.

14. The method of any one of claims 1-13, further comprising providing a catalyst, an acid, and / or a caustic to the hydrofluoric wastewater reclaim system input.

15. The method of any one of claims 1-14, further comprising separating at least some fluoride ions in the hydrofluoric wastewater reclaim system by providing the hydrofluoric wastewater reclaim system input to one or more membrane separators and / or one or more filters.

16. The method of any one of claims 1-15, further comprising providing a coagulant, an acid, a base, and / or a salt to the hydrofluoric wastewater system input.

17. The method of any one of claims 1-16, further comprising separating at least some fluoride ions from the hydrofluoric wastewater system input after coagulation of at least a portion of the hydrofluoric wastewater system input.

18. The method of any one of claims 1-17, further comprising generating ammonium sulfate from the ammonia peroxide treatment system input.

19. The method of claim 18, wherein the generating is conducted using a stripper vessel and / or a scrubber vessel. xxxxxx.x20. The method of any one of claims 1-19, further comprising providing the isopropyl alcohol treatment system input to one or more filters and / or one or more membrane separators.

21. The method of any one of claims 1-20, further comprising separating the isopropyl alcohol from the isopropyl alcohol treatment system input.

22. The method of any one of claims 1-21, wherein at least a portion of the isopropyl alcohol in the isopropyl alcohol treatment system input is separated using a distillation apparatus.

23. The method of any one of claims 1-22, further comprising providing a coagulant, an acid, a base, and / or a salt to the chemical mechanical polisher metal / metal oxide reclamation system input such that the at least one metal and / or metal oxide separates from the chemical mechanical polisher metal / metal oxide reclamation system input.

24. The method of any one of claims 1-23, further comprising providing a coagulant, an acid, a base, and / or a salt to the chemical mechanical polisher copper reclamation system input such that at least some of the copper from the chemical mechanical polisher copper reclamation system input.

25. The method of any one of claims 1-24, further comprising providing an antiscalant, an acid, and / or a catalyst to the scrubber reclaim system input.

26. The method of any one of claims 1-25, further comprising providing the scrubber reclaim system input to one or more filters and / or one or more membrane separators.

27. The method of any one of claims 1-26, wherein the neutralization system input comprises at least a portion of the first chemical mechanical polisher metal and / or metal oxide reclamation system output and / or the first isopropyl alcohol treatment system output. xxxxxx.x28. The method of any one of claims 1-27, wherein the hydrofluoric wastewater system input comprises at least a portion of the first chemical mechanical polisher metal and / or metal oxide reclamation system output and / or the first isopropyl alcohol treatment system output.

29. The method of any one of claims 1-28, wherein the first neutralization system output has a pH closer to 7 than the neutralization system input.

30. The method of any one of claims 1-29, wherein the neutralization system input comprises at least a portion of the first chemical mechanical polisher metal and / or metal oxide reclamation system output.

31. The method of any one of claims 1-30, wherein an auxiliary hydrofluoric wastewater reclaim system output exits the hydrofluoric wastewater reclaim system, the auxiliary hydrofluoric wastewater reclaim system output having a lower concentration of fluoride ions than the concentration of fluoride ions in the hydrofluoric wastewater reclaim system input.

32. The method of claim 31, the scrubber reclaim system input comprises at least a portion of the auxiliary hydrofluoric wastewater reclaim system output.

33. The method of any one of claims 1-32, wherein a second isopropyl alcohol treatment system output exits the isopropyl alcohol treatment system.

34. The method of claim 33, wherein the second isopropyl alcohol treatment system output has a higher concentration of isopropyl alcohol than the concentration of isopropyl alcohol in the isopropyl alcohol treatment system input.

35. The method of any one of claims 1-34, wherein a third isopropyl alcohol treatment system output exits the isopropyl alcohol treatment system. xxxxxx.x36. The method of claim 35, wherein the third isopropyl alcohol treatment system output has a higher concentration of isopropyl alcohol than the concentration of isopropyl alcohol in the isopropyl alcohol treatment system input.

37. The method of claim 36, wherein the neutralization reject system input comprises at least a portion of the third isopropyl alcohol treatment system output.

38. The method of any one of claims 1-37, further comprising providing a chemical mechanical polisher copper reclamation system input comprising copper metal and / or copper ions to a chemical mechanical polisher copper reclamation system, the chemical mechanical polisher copper reclamation system operated such that: a first chemical mechanical polisher copper reclamation system output and a second chemical mechanical polisher copper reclamation system output exit the chemical mechanical polisher copper reclamation system, the first chemical mechanical polisher copper reclamation system output has a lower concentration of copper metal and / or copper ions than the amount of copper metal and / or copper ions in the chemical mechanical polisher copper reclamation system input, and the second chemical mechanical polisher copper reclamation system output comprises at least some of the copper metal and / or copper ions.

39. The method of claim 38, wherein at least some of the copper in the chemical mechanical polisher copper reclamation system input is derived from a fourth portion of waste from a semiconductor processing facility.

40. The method of any one of claims 38-39, wherein the neutralization system input comprises at least a portion of the first chemical mechanical polisher copper reclamation system output.

41. The method of any one of claims 38-40, wherein the hydrofluoric wastewater system input comprises at least a portion of the first chemical mechanical polisher copper reclamation system output. xxxxxx.x

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