Disilane preparation device and disilane preparation method

Abstract

A disilane preparation device and a disilane preparation method. The disilane preparation device comprises a reactor (1), a heating part (2), a high-voltage electrode (3), and a high-voltage pulse power supply (4). The reactor (1) comprises a dissociation part (11) and a reaction part (12) that are communicated, and the dissociation part (11) is arranged upstream of the reaction part (12); the dissociation part (11) is provided with a dissociation inlet (111), and the reaction part (12) is provided with a reaction inlet (121) and a reaction outlet (122); the high-voltage electrode (3) is arranged in the dissociation part (11), and the high-voltage pulse power supply (4) is configured to supply power to the high-voltage electrode (3), so as to dissociate a silane gas introduced into the dissociation part (11) through the dissociation inlet (111) to generate active ions; and a catalyst (5) is provided in the reaction part (12), the heating part (2) is configured to heat the reaction part (12), and the active ions introduced into the reaction part (12) from the dissociation part (11) react with a silane gas introduced into the reaction part (12) through the reaction inlet (121) to generate disilane. The disilane preparation device enables disilane preparation, improves the production capacity of disilane, simplifies the process flow, and reduces costs.

Description

An apparatus and method for preparing silane Technical Field

[0001] This application relates to the field of silane preparation technology, specifically to an silane preparation apparatus and a silane preparation method. Background Technology

[0002] Silane (Si2H6) is a colorless synthetic gas with a slightly pungent odor. As a silicon-based electronic gas, silane is widely used in the integrated circuit and solar cell industries. It can be used in the fabrication of amorphous silicon thin films and in epitaxial and diffusion processes in the integrated circuit industry. It can also be used as an ion source and LCD substrate. With the rapid development of the integrated circuit and solar energy industries, the demand for silane is constantly increasing.

[0003] However, the current production capacity of silane is low, and there are few preparation methods, mainly due to the high technical difficulty of its preparation. The widely used synthesis methods include the reduction of halosilanes, the pyrolysis of silanes, and the synthesis of metal silicides. The method of reducing halosilanes with complex metal hydrides (such as lithium aluminum hydride or sodium aluminum hydride) is complex due to the high impurity content of the raw materials, requiring numerous distillation and purification steps, resulting in relatively high raw material costs. The pyrolysis of silanes and the synthesis of metal silicides suffer from low silane yields and limited application value.

[0004] Therefore, how to prepare silane in order to increase silane production capacity, simplify the process and reduce costs is a technical problem that urgently needs to be solved by those skilled in the art.

[0005] Summary of the Invention

[0006] The purpose of this application is to provide an equipment and method for preparing silane, which can produce silane, increase the production capacity of silane, and simplify the process and reduce costs.

[0007] To address the aforementioned technical problems, this application provides an apparatus for preparing silane, comprising a reactor, a heating section, a high-voltage electrode, and a high-voltage pulse power supply. The reactor includes a dissociation section and a reaction section connected in series. The dissociation section is located upstream of the reaction section and has a dissociation inlet. The reaction section has a reaction inlet and a reaction outlet. The high-voltage electrode is located within the dissociation section. The high-voltage pulse power supply supplies power to the high-voltage electrode to dissociate silane gas introduced into the dissociation section through the dissociation inlet to generate active ions. A catalyst is provided within the reaction section. The heating section heats the reaction section. The active ions introduced into the reaction section through the dissociation section react with the silane gas introduced into the reaction section through the reaction inlet to generate silane.

[0008] Optionally, the system further includes a heat exchanger comprising a first heat exchange section and a second heat exchange section that are not connected to each other; the first heat exchange section includes a first inlet and a first outlet, the second heat exchange section includes a second inlet and a second outlet, the first outlet is connected to the reactor, and the second inlet is connected to the reaction outlet.

[0009] Optionally, the heat exchanger is a shell-and-tube heat exchanger, wherein the first heat exchange section is formed on the tube side of the shell-and-tube heat exchanger, and the second heat exchange section is formed on the shell side of the shell-and-tube heat exchanger.

[0010] Optionally, the reactor shell is made of stainless steel and forms a grounding electrode; the shell is fixed to the high-voltage electrode by an insulating fixing part.

[0011] Optionally, the catalyst is at least one of a network structure, a theta ring structure, a foam structure, and a grid structure.

[0012] Optionally, it further includes a first flow regulating unit and a second flow regulating unit, wherein the first flow regulating unit is used to regulate the air intake flow of the dissociation inlet, and the second flow regulating unit is used to regulate the air intake flow of the reaction inlet.

[0013] This application also provides a method for preparing silane, based on the above-mentioned silane preparation equipment, the method comprising the following steps:

[0014] S1: Silane gas is introduced into the dissociation section through the dissociation inlet, and silane gas is introduced into the reaction section through the reaction inlet at the same time;

[0015] S2: The silane gas introduced into the dissociation section through the dissociation inlet is dissociated to generate active ions through the high-voltage electrode;

[0016] S3: Active ions enter the reaction section and react with silane gas introduced into the reaction section through the reaction inlet under the action of catalyst and heating section to generate ethsilane;

[0017] S4: The reaction product containing silane is discharged from the reaction outlet.

[0018] Optionally, the silane preparation equipment may include a heat exchanger;

[0019] Before step S1, step S0 is also included: introducing silane gas into the first heat exchange section through the first inlet, and introducing the silane gas discharged from the first outlet into the reactor;

[0020] After step S4, step S5 is also included: the reaction product discharged from the reaction outlet is introduced into the second heat exchange section through the second inlet, and after exchanging heat with the silane gas in the first heat exchange section, the reaction product is discharged from the second outlet.

[0021] Optionally, the heating temperature of the heating element is 200℃-500℃.

[0022] Optionally, the ratio of the inlet flow rate of the reaction inlet to the inlet flow rate of the dissociation inlet is 1-5;

[0023] And / or, the ratio of the volume of the reaction section to the air intake per minute at the reaction inlet is 5-10.

[0024] The silane preparation equipment and method provided in this application have the following technical advantages compared with the prior art:

[0025] The raw material silane gas is divided into two streams. One stream is first introduced into the dissociation section to dissociate and generate active ions, and then introduced into the reaction section. The other stream of silane gas is directly introduced into the reaction section to react with the active ions to generate silane. This ensures reaction efficiency and increases the production capacity of silane.

[0026] The raw material only requires silane gas, without any other raw materials, which makes the raw material cost relatively low. Since the reaction products discharged from the reaction outlet only include silane and unreacted silane gas, there are fewer impurities, which can simplify the subsequent distillation and purification process, making the process simple and thus effectively reducing costs. At the same time, it can also obtain high-purity silane to ensure the application value of silane. Attached Figure Description

[0027] Figure 1 is a schematic diagram of the silane preparation apparatus provided in the embodiment of this application;

[0028] Figure 2 is a flowchart of the method for preparing silane provided in the embodiments of this application;

[0029] Figure 3 is a detailed flowchart of the method for preparing silane provided in the embodiments of this application.

[0030] In Figures 1-3, the reference numerals are explained as follows: 1 Reactor, 11 Dissociation section, 111 Dissociation inlet, 12 Reaction section, 121 Reaction inlet, 122 Reaction outlet, 13 Shell, 14 Grounding electrode; 2 Heating section; 3 High-voltage electrode; 4 High-voltage pulse power supply; 5 Catalyst; 6 Heat exchanger, 61 First inlet, 62 First outlet, 63 Second inlet, 64 Second outlet; 7 Insulation fixing section. Detailed Implementation

[0031] To enable those skilled in the art to better understand the technical solutions of this application, the application will be further described in detail below with reference to the accompanying drawings and specific embodiments.

[0032] This application provides an ethylsilane preparation device, as shown in FIG1. ​​The ethylsilane preparation device includes a reactor 1, a heating section 2, a high-voltage electrode 3 and a high-voltage pulse power supply 4. The reactor 1 includes a dissociation section 11 and a reaction section 12 connected in communication. The dissociation section 11 and the reaction section 12 are connected in communication and are located upstream of the reaction section 12.

[0033] The dissociation section 11 is provided with a dissociation inlet 111 through which silane gas can be introduced into the dissociation section 11. The main component of the silane gas is SiH4. The high-voltage electrode 3 is located in the dissociation section 11. The high-voltage pulse power supply 4 is used to supply power to the high-voltage electrode 3. The high-voltage electrode 3 can dissociate the silane gas introduced into the dissociation section 11 through the dissociation inlet 111 to form active ions. The active ions include SiH2 and SiH3. Then, these active ions enter the reaction section 12 which is connected to the dissociation section 11.

[0034] The reaction section 12 is provided with a reaction inlet 121 and a reaction outlet 122. Silane gas (mainly SiH4) can be introduced into the reaction section 12 through the reaction inlet 121. A catalyst 5 is provided in the reaction section 12, and a heating section 2 is used to heat the reaction section 12. Within the reaction section 12, active ions SiH2 introduced into the reaction section 12 through the dissociation section 11 react with SiH4 in the silane gas introduced into the reaction section 12 through the reaction inlet 121, under the catalytic action of the catalyst 5 and the heating action of the heating section 2, to generate disilane Si2H6, with the chemical formula SiH2 + SiH4 = Si2H6. Simultaneously, active ions SiH3 and SiH3 can also react to generate disilane Si2H6, with the chemical formula SiH3 + SiH3 = Si2H6. Finally, the generated disilane Si2H6 and the unreacted silane gas (SiH4) are discharged as reaction products through the reaction outlet 122.

[0035] In other words, the raw material silane gas is divided into two streams. One stream is first introduced into the dissociation section 11 to dissociate and generate active ions, and then introduced into the reaction section 12. The other stream of silane gas is directly introduced into the reaction section 12 to react with the active ions to generate silane. This can ensure reaction efficiency and increase the production capacity of silane.

[0036] The reaction product can be further purified using purification equipment (such as a distillation column) to obtain silane with higher purity. The specific methods for purifying silane using purification equipment are well-known existing techniques to those skilled in the art, and will not be elaborated upon here for the sake of brevity.

[0037] The silane preparation equipment provided in this embodiment requires only silane gas as raw material, without any other raw materials, resulting in relatively low raw material costs. Since the reaction products discharged from the reaction outlet 122 only include silane and unreacted silane gas, there are few impurities, which simplifies the subsequent distillation and purification process, making the process simple and effectively reducing costs. At the same time, it can also obtain high-purity silane to ensure the application value of silane.

[0038] In this embodiment, the reactor 1 includes a shell 13. A portion of the shell 13 forms the dissociation section 11, and a portion forms the reaction section 12. That is, the dissociation section 11 and the reaction section 12 are both located in the same shell 13. Of course, the dissociation section 11 and the reaction section 12 can also be set in different shells 13. When the dissociation section 11 and the reaction section 12 are set in the same shell 13, the dissociated active ions can quickly participate in the reaction, reducing the probability of the active ions recovering silane, thereby increasing the proportion of silane in the reaction product and improving the reaction efficiency.

[0039] Furthermore, the silane preparation equipment also includes a heat exchanger 6, which includes a first heat exchange section and a second heat exchange section that are not connected to each other. The first heat exchange section includes a first inlet 61 and a first outlet 62, and the second heat exchange section includes a second inlet 63 and a second outlet 64. The first outlet 62 is connected to the reactor 1, and the second inlet 63 is connected to the reaction outlet 122.

[0040] In detail, the second inlet 63 is connected to the reaction outlet 122. The reaction product discharged from the reaction outlet 122 can be passed into the second heat exchange section through the second inlet 63, and then discharged through the second outlet 64 and enter the subsequent purification equipment. The raw material silane gas can be introduced into the first heat exchange section through the first inlet 61, and then this part of the silane gas will be discharged through the first outlet 62. During this process, the silane gas passing through the first heat exchange section can exchange heat with the reaction product passing through the second heat exchange section. The silane gas absorbs the heat released by the reaction product, the temperature of the silane gas rises, and then the silane gas is passed into the reactor 1 again.

[0041] Specifically, as shown in Figure 1, the first outlet 62 can be connected to the dissociation inlet 111. Silane gas heated in the heat exchanger 6 is then introduced into the dissociation section 11 to participate in dissociation, increasing the temperature of the silane gas entering the dissociation section 11 from the dissociation inlet 111, which is more conducive to silane gas dissociation. This reduces the requirements for the high-voltage pulse power supply 4 and lowers costs while achieving the same dissociation effect. Alternatively, the first outlet 62 can be connected to the reaction inlet 121. Silane gas heated in the heat exchanger 6 is then introduced into the reaction section 12 to participate in the reaction, increasing the temperature of the silane gas entering the reaction section 12 from the dissociation inlet 111. This reduces the energy consumption of the heating section 2 while maintaining the same reaction temperature, thus lowering costs. Alternatively, the first outlet 62 can be connected to both the dissociation inlet 111 and the reaction inlet 121 simultaneously; the specific configuration can be determined based on actual conditions.

[0042] The heating unit 2 can heat the reaction unit 12. The reaction products discharged from the reaction outlet 122 have a certain temperature. Therefore, when the reaction products are discharged, the heat of the reaction products can be recovered by the heat exchanger 6, so that the temperature of the silane gas introduced into the reactor 1 can be increased, thereby reducing energy consumption and effectively reducing costs.

[0043] In this embodiment, the heating temperature of the heating section 2 is preferably 200℃-500℃. If the heating temperature is too low, such as 50℃ or 100℃, the reaction in the reaction section 12 may be insufficient. If the heating temperature is too high, such as 600℃ or 700℃, the generated silane may decompose. Setting the heating temperature of the heating section 2 to 200℃-500℃, such as 200℃, 300℃, 400℃, or 500℃, can ensure that the silane gas and active ions react fully in the reaction section 12 while avoiding the decomposition of silane and ensuring the yield of silane.

[0044] In this embodiment, the heat exchanger 6 is a shell-and-tube heat exchanger. The first heat exchange section is formed on the tube side of the shell-and-tube heat exchanger, and the second heat exchange section is formed on the shell side of the shell-and-tube heat exchanger. Specifically, the shell-and-tube heat exchanger includes a shell and a bundle of tubes arranged in parallel inside the shell. The inner cavity of the tube bundle forms the first heat exchange section, and the cavities outside the tube bundle and inside the shell form the second heat exchange section.

[0045] Silane gas can be introduced into the tube bundle through the first inlet 61 and into the reactor 1 through the first outlet 62. The reaction products can be introduced into the shell through the second inlet 63 and discharged through the second outlet 64. During this process, the reaction products and silane gas can exchange heat through the tube wall of the tube bundle.

[0046] Of course, in this embodiment, there are no restrictions on the specific structure of the heat exchanger 6. For example, it can also be a plate heat exchanger, etc. The shell and tube heat exchanger has a simple structure, low cost, wide flow cross section, and is easy to clean.

[0047] As shown in Figure 1, the high-voltage electrode 3 has a conical structure. This design facilitates the formation of plasma active materials in three-dimensional space, resulting in a more complete reaction. The high-voltage electrode 3 can be made of conductive materials such as stainless steel or copper. The voltage of the high-voltage pulse power supply 4 is 5kV to 30kV, and the pulse duty cycle is 20% to 80%. If the voltage is too high, such as 40kV or 50kV, the cost will be high and the operation will be difficult. If the voltage is too low, it will lead to insufficient dissociation and a small amount of active ions, which is not conducive to the formation of silane. Therefore, the voltage of the high-voltage pulse power supply 4 is set to 5kV to 30kV, specifically 5kV, 10kV, 20kV, 30kV, etc. This ensures that the silane gas is effectively dissociated to form active ions and improves the reaction efficiency of the reaction section 12, while reducing costs.

[0048] The shell 13 of reactor 1 is made of stainless steel and forms a grounding electrode 14, eliminating the need for a separate grounding electrode 14, thus simplifying the overall structure and reducing costs. Furthermore, the stainless steel shell 13 has high structural strength and strong pressure resistance, making it suitable for heating to generate high temperatures.

[0049] The housing 13 is fixedly provided with an insulating fixing part 7, which is fixed to the high-voltage electrode 3 to prevent the high-voltage electrode 3 from contacting the housing 13 and conducting electricity. Specifically, the insulating fixing part 7 can be made of insulating material such as polytetrafluoroethylene, and no specific limitation is made here.

[0050] The catalyst 5 within the reaction section 12 can be at least one of the following: a mesh structure, a grid structure, a foam structure, or a theta ring structure. This catalyst 5 fills the space within the reaction section 12, generating more active sites on its surface to increase reaction activity. Simultaneously, it increases the contact area between reactant gases (including silane gas and active ions), thereby improving reaction efficiency. Specifically, the catalyst 5 can be nickel-supported alumina, silver-supported alumina, molybdenum-supported alumina, copper-supported alumina, nickel, silver, molybdenum, copper, etc.

[0051] The silane preparation equipment also includes a first flow regulating unit and a second flow regulating unit. The first flow regulating unit is used to regulate the inlet flow rate of the dissociation inlet 111, and the second flow regulating unit is used to regulate the inlet flow rate of the reaction inlet 121, so as to regulate the amount of silane gas entering the dissociation unit 11 and the amount of silane gas entering the reaction unit 12, so as to ensure the reaction efficiency.

[0052] Specifically, the first flow regulating unit can be directly set at the dissociation inlet 111, and the second flow regulating unit can be directly set at the reaction inlet 121, as shown in Figure 1. When the first outlet 62 is connected to the dissociation inlet 111, the first flow regulating unit can also be set at the first inlet 61 or at the dissociation inlet 111, and both can regulate the flow rate of silane gas entering the dissociation unit 11.

[0053] Specifically, in this embodiment, the ratio of the inlet flow rate of the reaction inlet 121 to the inlet flow rate of the dissociation inlet 111 is 1-5. This ratio can be 1, 2, 3, 4, or 5, which can ensure the reaction efficiency.

[0054] Specifically, the first and second flow rate regulating units can be adjusted according to the volume of the reaction section 12. The ratio of the volume of the reaction section 12 to the per-minute air intake of the reaction inlet 121 is 5-10, so that the silane gas introduced into the reaction section 12 can stay in the reaction section 12 for 5-10 minutes before being discharged from the reaction outlet 122. If the ratio of the volume of the reaction section 12 to the per-minute air intake of the reaction inlet 121 is too small, the silane gas introduced into the reaction section 12 will have a shorter residence time in the reaction section 12. If the ratio of the volume of the reaction section 12 to the per-minute air intake of the reaction inlet 121 is too large, the silane gas introduced into the reaction section 12 will have a longer residence time in the reaction section 12. When the ratio of the volume of the reaction section 12 to the per-minute air intake of the reaction inlet 121 is 5-10, the residence time of the silane gas introduced into the reaction section 12 is 5-10 minutes. This can ensure sufficient reaction while avoiding the decomposition of the generated silane, ensuring the content of silane in the product, and ensuring reaction efficiency.

[0055] For example, when the volume of the reaction section 12 is 10m³ 3 At that time, the first flow rate regulating unit is adjusted to make the amount of silane gas introduced into the reaction section 12 2m³ per minute. 3 The silane gas can remain in the reaction section 12 for 5 minutes to ensure a complete reaction. The dissociation inlet 111 introduces 0.4 m³ of silane gas into the dissociation section 11 at a rate of 0.4 m³ / min. 3 -2m 3 .

[0056] As shown in Figure 2, this embodiment also provides a method for preparing silane. Based on the above-mentioned silane preparation equipment, the method for preparing silane includes the following steps:

[0057] S1: Silane gas is introduced into the dissociation section 11 through the dissociation inlet 111, and silane gas is introduced into the reaction section 12 through the reaction inlet 121.

[0058] Reactor 1 has two raw material inlets. Specifically, the raw material silane gas is divided into two streams. One stream of silane gas is introduced into the dissociation section 11 through the dissociation inlet 111, and the other stream of silane gas is introduced into the reaction section 12 through the reaction inlet 121.

[0059] S2: The silane gas introduced into the dissociation section 11 through the dissociation inlet 111 is dissociated by the high voltage electrode 3 to generate active ions.

[0060] The high-voltage pulse power supply 4 is used to supply power to the high-voltage electrode 3, which can dissociate the silane gas introduced into the dissociation section 11 through the dissociation inlet 111 to form active ions, including SiH2 and SiH3.

[0061] S3: Active ions enter the reaction section 12 and react with silane gas introduced into the reaction section 12 through the reaction inlet 121 under the action of catalyst 5 and heating section 2 to generate ethylsilane.

[0062] The dissociation section 11 and the reaction section 12 are connected and located upstream of the reaction section 12. The active ions SiH2 and SiH3 formed in the dissociation section can enter the reaction section 12. In the reaction section 12, the active ions SiH2 introduced into the reaction section 12 by the dissociation section 11 react with the SiH4 in the silane gas introduced into the reaction section 12 by the reaction inlet 121, under the catalytic action of the catalyst 5 and the heating action of the heating section 2, to generate silane Si2H6, with the chemical formula SiH2 + SiH4 = Si2H6. At the same time, the active ions SiH3 and SiH3 can also react to generate silane Si2H6, with the chemical formula SiH3 + SiH3 = Si2H6.

[0063] S4: The reaction product containing silane is discharged from the reaction outlet 122.

[0064] Finally, the silane produced by the reaction and the silane gas that did not participate in the reaction are discharged as reaction products from the reaction outlet 122.

[0065] The method for preparing silane provided in this embodiment involves dividing the raw material silane gas into two streams. One stream is first introduced into the dissociation section 11 to dissociate and generate active ions, and then introduced into the reaction section 12. The other stream of silane gas is directly introduced into the reaction section 12 to react with the active ions to generate silane. This ensures reaction efficiency and increases the production capacity of silane.

[0066] The raw material only requires silane gas and no other raw materials, which makes the raw material cost relatively low. Since the reaction products discharged from the reaction outlet 122 only include silane and unreacted silane gas, there are few impurities, which can simplify the subsequent distillation and purification process, making the process simple and thus effectively reducing costs. At the same time, it can also obtain high-purity silane to ensure the application value of silane.

[0067] Furthermore, when the silane preparation equipment includes the aforementioned heat exchanger 6, in the silane preparation method, as shown in Figure 3, before step S1, step S0 is included: silane gas is introduced into the first heat exchange section through the first inlet 61, and the silane gas discharged from the first outlet 62 is introduced into the reactor 1. Furthermore, after step S4, step S5 is included: the reaction product discharged from the reaction outlet 122 is introduced into the second heat exchange section through the second inlet 63, and after exchanging heat with the silane gas in the first heat exchange section, the reaction product is discharged from the second outlet 64.

[0068] The second inlet 63 is connected to the reaction outlet 122. The reaction product discharged from the reaction outlet 122 can be introduced into the second heat exchange section through the second inlet 63, and then discharged through the second outlet 64 and enter the subsequent purification equipment. The raw material silane gas can be introduced into the first heat exchange section through the first inlet 61, and then this part of the silane gas will be discharged through the first outlet 62. During this process, the silane gas passing through the first heat exchange section can exchange heat with the reaction product passing through the second heat exchange section. The silane gas absorbs the heat released by the reaction product, and the temperature of the silane gas rises. Then the silane gas is introduced into the reactor 1.

[0069] The heating unit 2 can heat the reaction unit 12. The reaction products discharged from the reaction outlet 122 have a certain temperature. Therefore, when the reaction products are discharged, the heat of the reaction products can be recovered by the heat exchanger 6, so that the temperature of the silane gas introduced into the reactor 1 can be increased, thereby reducing energy consumption and effectively reducing costs.

[0070] The above are merely preferred embodiments of this application. It should be noted that those skilled in the art can make various improvements and modifications without departing from the principles of this application, and these improvements and modifications should also be considered within the scope of protection of this application.

Claims

1. An ethylsilane production apparatus characterized by comprising: The device comprises a reactor, a heating part, a high-voltage electrode and a high-voltage pulse power supply, the reactor comprises a dissociation part and a reaction part which are communicated, the dissociation part is arranged at the upstream side of the reaction part, the dissociation part is provided with a dissociation inlet, and the reaction part is provided with a reaction inlet and a reaction outlet; The high-voltage electrode is arranged in the dissociation part, and the high-voltage pulse power supply is used to supply power to the high-voltage electrode to dissociate the silane gas introduced into the dissociation part through the dissociation inlet to generate active ions; The reaction part is provided with a catalyst, the heating part is used to heat the reaction part, and the active ions introduced into the reaction part from the dissociation part react with the silane gas introduced into the reaction part from the reaction inlet to generate disilane.

2. The ethylsilane production apparatus according to claim 1, characterized by The device further comprises a heat exchanger, and the heat exchanger comprises a first heat exchange part and a second heat exchange part which are not communicated with each other; The first heat exchange part comprises a first inlet and a first outlet, the second heat exchange part comprises a second inlet and a second outlet, the first outlet is communicated with the reactor, and the second inlet is communicated with the reaction outlet.

3. The ethylsilane production apparatus according to claim 2, characterized by The heat exchanger is a shell-and-tube heat exchanger, the tube side of the shell-and-tube heat exchanger forms the first heat exchange part, and the shell side of the shell-and-tube heat exchanger forms the second heat exchange part.

4. The ethylsilane production apparatus according to any one of claims 1 to 3, characterized by The shell of the reactor is made of stainless steel and forms a grounding electrode; The shell is fixed with the high-voltage electrode through an insulating fixing part.

5. The ethylsilane production apparatus according to any one of claims 1 to 3, characterized by The catalyst is at least one of a mesh structure, a Zita ring structure, a foam structure and a grid structure.

6. The ethylsilane production apparatus according to any one of claims 1 to 3, characterized by The device further comprises a first flow adjusting part and a second flow adjusting part, the first flow adjusting part is used to adjust the gas flow of the dissociation inlet, and the second flow adjusting part is used to adjust the gas flow of the reaction inlet.

7. A method for preparing disilane based on the disilane preparation apparatus according to any one of claims 1 to 6, characterized by, The disilane preparation method comprises the following steps: S1: introducing silane gas into the dissociation part through the dissociation inlet, and introducing silane gas into the reaction part through the reaction inlet; S2: dissociating the silane gas introduced into the dissociation part through the dissociation inlet into active ions through the high-voltage electrode; S3: the active ions enter the reaction part, and react with the silane gas introduced into the reaction part through the reaction inlet under the action of the catalyst and the heating part to generate disilane; S4: discharging the reaction product containing disilane from the reaction outlet.

8. The method of claim 7, wherein the di-silane is prepared by the process comprising: When the disilane preparation device comprises the heat exchanger; ​ Before step S1, the device further comprises a step S0: introducing silane gas into the first heat exchange part through the first inlet, and introducing the silane gas discharged from the first outlet into the reactor; After step S4, the device further comprises a step S5: introducing the reaction product discharged from the reaction outlet into the second heat exchange part through the second inlet, and discharging the reaction product from the second outlet after heat exchange with the silane gas in the first heat exchange part.

9. The method of claim 7 or 8, wherein the di-silane is prepared by the process of claim 1. The heating temperature of the heating part is 200-500 DEG C.

10. The method of claim 7 or 8, wherein the di-silane is prepared by the process of claim 1. The ratio of the gas flow of the reaction inlet to the gas flow of the dissociation inlet is 1-5; And / or, the ratio of the volume of the reaction part to the gas flow per minute of the reaction inlet is 5-10.

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