Ceramization composite process applied to metal substrate

Abstract

Disclosed in the present invention is a ceramization composite process applied to a metal substrate, comprising the following steps: 1) performing micro-arc oxidation treatment on a metal substrate; and 2) performing post-treatment on the metal substrate obtained in step 1). In the present invention, micro-arc oxidation treatment is performed on the metal substrate, which may result in micro-arc oxidation ceramic films of different colors on the surface of the metal substrate, the colors are uniform, and the appearance is beautiful; and then post-treatment is performed on the metal substrate to form protection for the micro-arc oxidation ceramic films and fill micro-pores of the micro-arc oxidation ceramic films, such that micro-film pores on the surface of the metal substrate undergone the micro-arc oxidation treatment are sealed, thereby greatly improving the stain resistance, weatherability, and surface hardness of the metal substrate, preventing film layer pulverization or cracking after the metal substrate is impacted, and solving the problems of poor stain resistance caused by the presence of micro-pores on surfaces, poor weatherability and insufficient surface hardness caused by open and unsealed film pores, and high hardness and brittleness of micro-arc oxidation films of existing micro-arc oxidation processes.

Description

A ceramic composite process applied to metal substrates Technical Field

[0001] This invention belongs to the field of metal material surface treatment technology, specifically a ceramic composite process applied to metal substrates. Background Technology

[0002] Micro-arc oxidation (MAO), also known as plasma electrolytic oxidation (PEO), is an evolution of anodic oxidation technology, producing films with superior performance compared to anodic oxidation. The MAO process relies on the precise matching and adjustment of the electrolyte and electrical parameters. Under the instantaneous high temperature and pressure generated by arc discharge, an oxide film is grown in situ on the surface of valve metals such as aluminum, magnesium, and titanium, as well as their alloys. Its corrosion resistance and wear resistance are significantly superior to traditional anodic oxidation films, thus attracting widespread attention.

[0003] Current technologies using micro-arc oxidation processes to treat metal substrates have the following drawbacks:

[0004] First, the micro-arc oxidation film layer on the surface of the metal substrate has micropores, and the specific defects are: 1) liquid is easy to remain after flowing over the surface of the metal substrate; 2) dirt and foreign matter cannot be thoroughly cleaned or removed after entering the micropores.

[0005] Second, the pores of the micro-arc oxidation film on the surface of the metal substrate are open and not closed. The specific defects are: 1) the weather resistance, including salt spray test, cannot meet specific requirements; 2) the micro-undulations on the film surface lead to insufficient surface hardness, which means that the surface's abrasion resistance and other properties need to be further improved.

[0006] Third, while the micro-arc oxide film formed on the surface of the metal substrate is hard, it is also brittle. Specifically, the micro-arc oxide film is easily pulverized after being impacted and cracked after the product is deformed.

[0007] Based on this, the present invention discloses a ceramic composite process applied to metal substrates. Summary of the Invention

[0008] In view of the shortcomings of the prior art, the purpose of this invention is to provide a ceramic composite process for metal substrates.

[0009] To achieve the above objectives, the technical solution adopted by the present invention is as follows:

[0010] A ceramicization composite process applied to a metal substrate includes the following steps:

[0011] 1) Perform micro-arc oxidation treatment on the metal substrate;

[0012] 2) Perform post-processing on the metal substrate obtained in step 1).

[0013] Furthermore, in step 1), the metal substrate is pretreated before undergoing micro-arc oxidation.

[0014] Further, the pretreatment steps for the metal substrate include:

[0015] s1. Grind and polish the metal substrate to improve the surface smoothness of the metal substrate;

[0016] s2. Clean the metal substrate obtained in step s1.

[0017] Furthermore, in step 1), the process conditions for micro-arc oxidation are as follows:

[0018] A pulse power supply is used, with a frequency of 50-1250Hz, a voltage of 300-750V, an electrolyte temperature of 10-55℃, and a time of 5-50min.

[0019] Furthermore, the pulse power supply is a positive and negative dual-pulse power supply, with a positive pulse voltage of 0-750V, a negative pulse voltage of 0-450V, a duty cycle of 5%-50%, and a frequency of 50-1250Hz.

[0020] Furthermore, in step 2), the post-processing steps for the metal substrate obtained in step 1) include:

[0021] S21. Perform plasma cleaning on the metal substrate obtained in step 1) to remove dirt and foreign matter that may exist in the micro-membrane pores after micro-arc oxidation treatment.

[0022] S22. Spray coating, electrophoresis and / or ion implantation are performed on the metal substrate obtained in step s21.

[0023] Furthermore, the spraying includes nano-spraying.

[0024] Furthermore, the process conditions for the nano-spraying are as follows:

[0025] The spray gun shaft speed is 300-1500mm / s, the conveyor belt speed is 1-50mm / s, and the paint flow rate is 0.1-10g / 30s.

[0026] Furthermore, the process conditions for the ion implantation are as follows:

[0027] Metal ion implantation was performed using a metal plasma implantation device with an accelerating voltage of 25-60 kV, an implantation energy of 40-70 keV, and a vacuum degree of 1×10⁻⁶ kV. -2 Pa-3×10-2 Pa, the implantation time is 20-70 min. After the metal ion implantation is completed, the metal substrate is placed in an oven and kept at 200-220℃ for 25-60 min.

[0028] Compared with the prior art, the present invention has the following beneficial effects:

[0029] This invention discloses a ceramic composite process applied to metal substrates. By performing micro-arc oxidation on the metal substrate, micro-arc oxidation ceramic films of different colors can be obtained on the surface of the metal substrate. The colors are uniform and the appearance is beautiful. After post-processing the metal substrate, the micro-arc oxidation ceramic films can be protected and the micropores of the micro-arc oxidation ceramic films can be filled. This seals the micropores on the surface of the metal substrate after micro-arc oxidation, which greatly improves the dirt resistance, weather resistance and surface hardness of the metal substrate. It also prevents the film layer from powdering or cracking after the metal substrate is subjected to impact. This solves the problems of poor dirt resistance, poor weather resistance and insufficient surface hardness caused by the presence of micropores on the surface of existing micro-arc oxidation processes, as well as the high hardness and brittleness of micro-arc oxidation films. Detailed Implementation

[0030] The present invention will now be described in detail so that its advantages and features can be more easily understood by those skilled in the art, thereby providing a clearer and more explicit definition of the scope of protection of the present invention.

[0031] The following provides a brief overview of one or more aspects to offer a basic understanding of them. This overview is not an exhaustive summary of all conceived aspects, nor is it intended to identify key or decisive elements of all aspects, nor to define the scope of any or all aspects. Its sole purpose is to present some concepts of one or more aspects in a simplified form to prepare for the more detailed descriptions that follow.

[0032] A ceramicization composite process applied to a metal substrate includes the following steps:

[0033] 1) First, pretreat the metal substrate, then perform micro-arc oxidation on the metal substrate;

[0034] 2) Perform post-processing on the metal substrate obtained in step 1).

[0035] Step 1) includes the following steps for pretreating the metal substrate:

[0036] s1. Grind and polish the metal substrate to improve the surface smoothness of the metal substrate;

[0037] s2. Clean the metal substrate obtained in step s1.

[0038] In some implementations, the process conditions for micro-arc oxidation in step 1) are as follows:

[0039] A pulse power supply is used, with a frequency of 50-1250Hz, a voltage of 300-750V, an electrolyte temperature of 10-55℃, and a time of 5-50min.

[0040] In some implementations, the pulse power supply is a single-pulse power supply.

[0041] In some embodiments, the pulse power supply is preferably a positive and negative dual-pulse power supply, with a positive pulse voltage of 0-750V, a negative pulse voltage of 0-450V, a duty cycle of 5%-50%, and a frequency of 50-1250Hz.

[0042] In some embodiments, step 2), the post-processing step of the metal substrate obtained in step 1), includes:

[0043] S21. Perform plasma cleaning on the metal substrate obtained in step 1) to remove dirt and foreign matter that may exist in the micro-membrane pores after micro-arc oxidation treatment.

[0044] S22. Spray coating, electrophoresis, and / or ion implantation are performed on the metal substrate obtained in step s21. Spray coating may be performed only on the metal substrate obtained in step s21, or ion implantation or electrophoresis may be performed only on the metal substrate obtained in step s21, or ion implantation may be performed on the metal substrate obtained in step s21 before spray coating. The specific choice can be made flexibly according to actual needs.

[0045] In some implementations, the spraying includes nano-spraying.

[0046] In some implementations, the process conditions for nano-spraying are as follows:

[0047] The spray gun shaft speed is 300-1500mm / s, the conveyor belt speed is 1-50mm / s, and the paint flow rate is 0.1-10g / 30s.

[0048] In some implementations, the process conditions for ion implantation are as follows:

[0049] Metal ion implantation was performed using a metal plasma implantation device with an accelerating voltage of 25-60 kV, an implantation energy of 40-70 keV, and a vacuum degree of 1×10⁻⁶ kV. -2 Pa-3×10 -2 Pa, the implantation time is 20-70 min. After the metal ion implantation is completed, the metal substrate is placed in an oven and kept at 200-220℃ for 25-60 min.

[0050] Example 1

[0051] A ceramicization composite process applied to a metal substrate includes the following steps:

[0052] 1) First, pretreat the metal substrate, then perform micro-arc oxidation on the metal substrate;

[0053] 2) Perform post-processing on the metal substrate obtained in step 1).

[0054] Step 1) includes the following steps for pretreating the metal substrate:

[0055] s1. Grind and polish the metal substrate to improve the surface smoothness of the metal substrate;

[0056] s2. Clean the metal substrate obtained in step s1.

[0057] In step 1), the process conditions for micro-arc oxidation are as follows:

[0058] A single-pulse power supply with a frequency of 1200Hz, a voltage of 750V, an electrolyte temperature of 45℃, and a time of 40min was used.

[0059] Step 2), the post-processing steps for the metal substrate obtained in step 1), include:

[0060] S21. Perform plasma cleaning on the metal substrate obtained in step 1) to remove dirt and foreign matter that may exist in the micro-membrane pores after micro-arc oxidation treatment.

[0061] S22. The metal substrate obtained in step s21 is subjected to nano-spraying using Al2O3 ultrafine powder with a particle size of 20nm. The process conditions are as follows:

[0062] The spray gun shaft speed is 300 mm / s, the conveyor belt speed is 10 mm / s, and the paint flow rate is 0.5 g / 30 s.

[0063] Example 2

[0064] A ceramicization composite process applied to a metal substrate includes the following steps:

[0065] 1) First, pretreat the metal substrate, then perform micro-arc oxidation on the metal substrate;

[0066] 2) Perform post-processing on the metal substrate obtained in step 1).

[0067] Step 1) includes the following steps for pretreating the metal substrate:

[0068] s1. Grind and polish the metal substrate to improve the surface smoothness of the metal substrate;

[0069] s2. Clean the metal substrate obtained in step s1.

[0070] In step 1), the process conditions for micro-arc oxidation are as follows:

[0071] A positive and negative dual-pulse power supply is used, with a frequency of 1200Hz, a voltage of 750V, an electrolyte temperature of 55℃, a time of 50min, a positive pulse voltage of 750V, a negative pulse voltage of 450V, and a duty cycle of 50%.

[0072] Step 2), the post-processing steps for the metal substrate obtained in step 1), include:

[0073] S21. Perform plasma cleaning on the metal substrate obtained in step 1) to remove dirt and foreign matter that may exist in the micro-membrane pores after micro-arc oxidation treatment.

[0074] S22. First, ion implantation is used to implant the metal substrate obtained in step s21, and then nano-spraying is performed using Al2O3 ultrafine powder with a particle size of 20nm.

[0075] The process conditions for nano-spraying are as follows:

[0076] The spray gun shaft speed is 300 mm / s, the conveyor belt speed is 10 mm / s, and the paint flow rate is 0.5 g / 30 s.

[0077] The process conditions for ion implantation are as follows:

[0078] Metal ion implantation was performed using a metal plasma implantation device with an accelerating voltage of 50 kV, an implantation energy of 65 keV, and a vacuum degree of 2 × 10⁻⁶. -2 Pa, the implantation time is 50 min. After the metal ion implantation is completed, the metal substrate is placed in an oven and kept at 220℃ for 50 min.

[0079] The rest is the same as in Example 1.

[0080] Example 3

[0081] A ceramicization composite process applied to a metal substrate includes the following steps:

[0082] 1) First, pretreat the metal substrate, then perform micro-arc oxidation on the metal substrate;

[0083] 2) Perform post-processing on the metal substrate obtained in step 1).

[0084] Step 1) includes the following steps for pretreating the metal substrate:

[0085] s1. Grind and polish the metal substrate to improve the surface smoothness of the metal substrate;

[0086] s2. Clean the metal substrate obtained in step s1.

[0087] In step 1), the process conditions for micro-arc oxidation are as follows:

[0088] A positive and negative dual-pulse power supply is used, with a frequency of 1250Hz, a voltage of 750V, an electrolyte temperature of 55℃, a time of 50min, a positive pulse voltage of 650V, a negative pulse voltage of 400V, and a duty cycle of 10%.

[0089] Step 2), the post-processing steps for the metal substrate obtained in step 1), include:

[0090] S21. Perform plasma cleaning on the metal substrate obtained in step 1) to remove dirt and foreign matter that may exist in the micro-membrane pores after micro-arc oxidation treatment.

[0091] S22. Ion implantation is performed on the metal substrate obtained in step s21.

[0092] The process conditions for ion implantation are as follows:

[0093] Metal ion implantation was performed using a metal plasma implantation device with an accelerating voltage of 40 kV, an implantation energy of 45 keV, and a vacuum degree of 1 × 10⁻⁶. -2 Pa, the implantation time is 70 min, after the metal ion implantation is completed, the metal substrate is placed in an oven and kept at 200℃ for 60 min.

[0094] The rest is the same as in Example 1.

[0095] Any parts or structures not specifically described in this invention can be made using existing technologies or products, and will not be elaborated upon here.

[0096] The above description is merely an embodiment of the present invention and does not limit the patent scope of the present invention. Any equivalent structural or procedural transformations made based on the content of the present invention specification, or direct or indirect applications in other related technical fields, are similarly included within the patent protection scope of the present invention.

Claims

1. A ceramicization composite process applied to a metal substrate, characterized in that, Includes the following steps: 1) Perform micro-arc oxidation treatment on the metal substrate; 2) Perform post-processing on the metal substrate obtained in step 1).

2. The ceramicization composite process applied to a metal substrate according to claim 1, characterized in that, In step 1), the metal substrate is pretreated before micro-arc oxidation.

3. The ceramicization composite process applied to a metal substrate according to claim 2, characterized in that, The steps for pretreating the metal substrate include: s1. Grind and polish the metal substrate to improve the surface smoothness of the metal substrate; s2. Clean the metal substrate obtained in step s1.

4. The ceramicization composite process applied to a metal substrate according to claim 1, characterized in that, In step 1), the process conditions for micro-arc oxidation are as follows: A pulse power supply is used, with a frequency of 50-1250Hz, a voltage of 300-750V, an electrolyte temperature of 10-55℃, and a time of 5-50min.

5. The ceramicization composite process applied to a metal substrate according to claim 4, characterized in that, The pulse power supply is a positive and negative dual-pulse power supply, with a positive pulse voltage of 0-750V, a negative pulse voltage of 0-450V, a duty cycle of 5%-50%, and a frequency of 50-1250Hz.

6. The ceramicization composite process applied to a metal substrate according to claim 1, characterized in that, Step 2), the post-processing steps for the metal substrate obtained in step 1), include: S21. Perform plasma cleaning on the metal substrate obtained in step 1) to remove dirt and foreign matter that may exist in the micro-membrane pores after micro-arc oxidation treatment. S22. Spray coating, electrophoresis and / or ion implantation are performed on the metal substrate obtained in step s21.

7. The ceramicization composite process applied to a metal substrate according to claim 6, characterized in that, The spraying includes nano-spraying.

8. The ceramicization composite process applied to a metal substrate according to claim 7, characterized in that, The process conditions for the nano-spraying are as follows: The spray gun shaft speed is 300-1500mm / s, the conveyor belt speed is 1-50mm / s, and the paint flow rate is 0.1-10g / 30s.

9. The ceramicization composite process applied to a metal substrate according to claim 6, characterized in that, The process conditions for the ion implantation are as follows: Metal ion implantation was performed using a metal plasma implantation device with an accelerating voltage of 25-60 kV, an implantation energy of 40-70 keV, and a vacuum degree of 1×10⁻⁶ kV. -2 Pa-3×10 -2 Pa, the implantation time is 20-70 min. After the metal ion implantation is completed, the metal substrate is placed in an oven and kept at 200-220℃ for 25-60 min.