Helium purification device employing high-efficiency low-temperature adsorption

Abstract

The present invention relates to the technical field of solid separation, and more specifically to the high-end equipment manufacturing industry, and in particular to a helium purification device employing high-efficiency low-temperature adsorption. The device comprises a machine body and a material control assembly. A purification chamber is provided inside the machine body. Helium gas can flow from top to bottom within the purification chamber, and an adsorbent can also flow from top to bottom within the purification chamber. The material control assembly is used to regulate a motion state of the adsorbent. The material control assembly has a first control state, and when in the first control state, the material control assembly is used to mix and stir the adsorbent within the purification chamber. In the present invention, the material control assembly is provided, and when the material control assembly is in the first control state, the material control assembly is used to stir and mix the adsorbent in the purification chamber, so that the adsorbent in the purification chamber is brought into uniform and sufficient contact with the helium gas, thereby removing impurities from the helium gas and improving the purity of the helium gas.

Description

A high-efficiency low-temperature adsorption helium purification device Technical Field

[0001] This invention relates to the field of solid separation technology, specifically to the high-end equipment manufacturing industry, and in particular to a high-efficiency low-temperature adsorption helium purification device. Background Technology

[0002] Helium is a natural resource with important applications in satellite and spacecraft launches, missile weaponry, airships and other aerostats, low-temperature superconductivity research, semiconductor manufacturing, nuclear magnetic resonance imaging, special metal smelting, and gas leak detection. Helium is usually extracted from natural gas, which contains various impurities. Therefore, the gas obtained from natural gas needs to be separated to extract helium, and then the separated helium needs to be purified.

[0003] The common process for purifying helium in existing technologies is the low-temperature adsorption method. Specifically, the helium to be purified is passed into a container filled with a specific adsorbent (such as activated carbon), allowing the helium to permeate through the adsorbent and removing impurities and moisture. In this process, to improve the adsorption efficiency, a stirring mechanism is needed to agitate the adsorbent within the purification container, ensuring uniform and sufficient contact between the adsorbent and helium. Simultaneously, to further improve purification efficiency, the regeneration cycle of the adsorbent needs to be shortened, i.e., the adsorbent's usage time needs to be reduced by promptly removing the old adsorbent from the purification container and adding new adsorbent. Therefore, the stirring mechanism needs to be stopped periodically for adsorbent replacement. However, existing helium purification equipment has the following problems: When replacing the adsorbent (such as activated carbon), it is usually done by simultaneously discharging the old adsorbent from the bottom of the container and adding new adsorbent from the top. This method easily leads to waste of new adsorbent or residue of old adsorbent, resulting in inconsistent adsorption efficiency and affecting the uniformity of helium purification. Summary of the Invention

[0004] Therefore, it is necessary to provide a high-efficiency low-temperature adsorption helium purification device to address the problems existing in current helium purification equipment. This device would solve the problem that existing helium purification equipment easily leads to the waste of new adsorbent or the residue of old adsorbent when changing the adsorbent, resulting in inconsistent adsorption efficiency and affecting the uniformity of helium purification.

[0005] The above objectives are achieved through the following technical solutions:

[0006] A high-efficiency low-temperature adsorption helium purification device includes:

[0007] The body contains a purification chamber.

[0008] Helium gas can flow from top to bottom within the purification chamber;

[0009] The adsorbent can also flow from top to bottom within the purification chamber;

[0010] Material control component, which is used to regulate the movement state of the adsorbent;

[0011] The material control component has a first control state and a second control state;

[0012] In the first control state, the material control component is used to mix and stir the adsorbent in the purification chamber;

[0013] In the second control state, the material control component is used to isolate adsorbents with different working times within the purification chamber.

[0014] In one embodiment, the material control assembly includes a rotating mandrel, a waist-shaped plate, a limiting frame, and a control plate. The rotating mandrel is located in the purification chamber, and its axis is horizontal. The rotating mandrel can rotate around its axis. The waist-shaped plate is fixedly connected to the rotating mandrel, and the rotating mandrel is located at the center of the waist-shaped plate. There are two control plates, which are rotatably connected to both sides of the waist-shaped plate. There are two limiting frames, which are arranged in opposite directions on both sides of the waist-shaped plate. The control plate and the waist-shaped plate are configured at an angle. The limiting frames are used to limit the maximum value of the angle between the control plate and the waist-shaped plate.

[0015] The rotating mandrel can also move horizontally in a direction perpendicular to the axis of rotation of the mandrel;

[0016] The rotating spindle can also move in the vertical direction.

[0017] In one embodiment, the material control assembly further includes a rotation unit for driving a rotating mandrel to rotate about its axis.

[0018] In one embodiment, the rotating unit includes a rotation drive source, a spline sleeve, a spline shaft, a first bevel gear, a second bevel gear, and a mounting box. The rotation drive source is located in the lower part of the purification chamber. The torque output end of the rotation drive source is fixedly connected to the spline sleeve. The axis of the spline sleeve is vertical. The spline shaft is slidably connected inside the spline sleeve. The mounting box is located inside the purification chamber. The mounting box has a mounting cavity inside. The end of the spline shaft away from the spline sleeve passes through the mounting cavity and is fixedly connected to the first bevel gear. The end of the rotating spindle near the first bevel gear also passes through the mounting cavity and is fixedly connected to the second bevel gear. The second bevel gear meshes with the first bevel gear.

[0019] In one embodiment, the material control assembly further includes a vertical drive source, the axis of which is vertical, and the telescopic end of the vertical drive source is located at the bottom of the mounting box.

[0020] In one embodiment, the material control assembly further includes a horizontal drive source with a horizontal axis at its telescopic end. The telescopic end of the horizontal drive source can drive the housing portion of the rotary drive source and the housing portion of the vertical drive source to move synchronously in the horizontal direction in a direction perpendicular to the axis of the rotating spindle.

[0021] In one embodiment, a sliding plate is provided on the outside of the mounting box, and a synchronous baffle is slidably connected to both ends of the sliding plate. The synchronous baffle can move synchronously with the sliding plate in the vertical direction and move relative to it in the horizontal direction in a direction perpendicular to the axis of the rotating spindle. The synchronous baffle slides in contact with the inner peripheral wall of the purification chamber, and the side of the control plate and the side of the synchronous baffle are located in the same vertical plane.

[0022] In one embodiment, a guide groove is provided on the side wall of the purification chamber. The guide groove includes a vertical guide section and an inclined guide section, which are connected. A guide post is provided on the outer side of the sliding plate near the purification chamber, and the guide post is slidably connected in the guide groove.

[0023] In one embodiment, the bottom of the purification chamber is provided with an opening, and a blocking block is slidably disposed in the opening. The blocking block can slide along the opening. When the blocking block slides along the opening until the blocking block is engaged with the opening, the opening is closed. When the blocking block slides along the opening until the blocking block is disengaged from the opening, the opening is opened.

[0024] In one embodiment, a high-efficiency cryogenic adsorption helium purification device further includes a refrigeration module and a buffer module. The refrigeration module is used to perform cryogenic treatment on the helium to be introduced into the purification chamber, and the buffer module is used to adjust the pressure of the cryogenically treated helium.

[0025] The beneficial effects of this invention are:

[0026] This invention incorporates a material control component. When in the first control state, the component stirs and mixes the adsorbent in the purification chamber, ensuring uniform and sufficient contact between the adsorbent and helium gas. This removes impurities from the helium, improving its purity. Furthermore, because the material control component is located away from the helium outlet, powder from the adsorbent is less likely to escape through the outlet, reducing the impurity content in the helium and further increasing its purity. When the component switches to the second control state, the adsorbent flows downwards. The adsorbent flowing down from the top of the purification chamber is positioned above the material control component, while the old adsorbent below it flows downwards out of the chamber. This facilitates the replacement of old and new adsorbents, minimizing waste and residue. It also ensures consistent adsorption efficiency for the remaining adsorbent in the purification chamber, thereby improving the adsorbent's helium purification efficiency. Attached Figure Description

[0027] Figure 1 is an overall schematic diagram of a high-efficiency low-temperature adsorption helium purification device according to the present invention.

[0028] Figure 2 is a side view of a high-efficiency low-temperature adsorption helium purification device according to the present invention;

[0029] Figure 3 is a cross-sectional view of AA in Figure 2;

[0030] Figure 4 is a magnified schematic diagram of the structure at point C in Figure 3;

[0031] Figure 5 is a magnified schematic diagram of the structure at point D in Figure 3;

[0032] Figure 6 is a cross-sectional view of BB in Figure 2;

[0033] Figure 7 is a schematic diagram of the first control state of the material control component in a high-efficiency low-temperature adsorption helium purification device of the present invention.

[0034] Figure 8 is a schematic diagram of the second control state of the material control component in the high-efficiency low-temperature adsorption helium purification device of the present invention.

[0035] in:

[0036] 100. Body; 110. Purification chamber; 111. Guide groove; 111a. Vertical guide section; 111b. Inclined guide section; 120. Storage box; 121. Opening; 130. Sealing block; 140. Hydraulic rod; 150. Flushing module; 160. Helium inlet; 170. Helium outlet; 180. Feed inlet; 200. Material control assembly; 210. Rotating spindle; 220. Waist-shaped plate; 230. Limiting frame; 240. Control board; 250. Rotating unit; 251. Rotation drive source; 252. Spline sleeve; 253. Spline shaft; 254. First bevel gear; 255. Second bevel gear; 256. Mounting box; 260. Vertical drive source; 280. Sliding plate; 290. Synchronization baffle; 300. Freezing module; 400. Buffer module. Detailed Implementation

[0037] To make the objectives, technical solutions, and advantages of this invention clearer, the invention will be further described in detail below through embodiments and in conjunction with the accompanying drawings. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.

[0038] The serial numbers assigned to components in this document, such as "first," "second," etc., are merely used to distinguish the described objects and have no sequential or technical meaning. The terms "connection" and "linkage" used in this application, unless otherwise specified, include both direct and indirect connections (linkages). In the description of this invention, it should be understood that the terms "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," "clockwise," and "counterclockwise," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are used only for the convenience of describing the invention and for simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on the invention.

[0039] In this invention, unless otherwise explicitly specified and limited, "above" or "below" the second feature can mean that the first feature is in direct contact with the second feature, or that the first feature is in indirect contact with the second feature through an intermediate medium. Furthermore, "above," "over," and "on top" of the second feature can mean that the first feature is directly above or diagonally above the second feature, or simply that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature can mean that the first feature is directly below or diagonally below the second feature, or simply that the first feature is at a lower horizontal level than the second feature.

[0040] As shown in Figures 1-8, a high-efficiency low-temperature adsorption helium purification device includes a body 100 and a material control component 200. The body 100 has a purification chamber 110 inside, where helium can flow from top to bottom, and the adsorbent can also flow from top to bottom within the purification chamber 110. The material control component 200 is located inside the purification chamber 110 and is used to regulate the movement state of the adsorbent. The material control component 200 has a first control state and a second control state. In the first control state, the material control component 200 is used to mix and stir the adsorbent in the purification chamber 110. In the second control state, the material control component 200 is used to isolate adsorbents with different working times within the purification chamber 110.

[0041] During use, the operator first adds the adsorbent (taking activated carbon as an example) into the purification chamber 110, filling approximately two-thirds of its volume. Then, helium gas flows from top to bottom within the purification chamber 110. As the helium passes through the adsorbent, it exits through the exhaust port of the purification chamber 110. Simultaneously, the material control component 200 is activated, placing it in its first control state. At this point, the material control component 200 stirs and mixes the adsorbent within the purification chamber 110, ensuring uniform and sufficient contact between the adsorbent and helium gas. This removes impurities from the helium and improves its purity. Once the pre-set working time of the adsorbent in the purification chamber 110 has elapsed, it needs to be replaced. The material control component 200 automatically switches from the first control state to the second control state. At this time, the adsorbent flows from top to bottom in the purification chamber 110 (that is, new adsorbent is added into the purification chamber 110 while the old adsorbent is discharged). The new adsorbent is located above the material control component 200, and the old adsorbent is located below the material control component 200. That is, adsorbents with different working times are separated by the material control component 200. When the old adsorbent below the material control component 200 is completely discharged, the adsorbent stops flowing from top to bottom. At this time, the material control component 200 switches back to the first control state. This can reduce the waste of new adsorbent or the residue of old adsorbent when replacing adsorbent, so that the adsorption efficiency of the adsorbent remaining in the purification chamber 110 is basically consistent, thereby improving the purification efficiency of the adsorbent for helium.

[0042] In a further embodiment, as shown in Figures 3 and 7, the material control assembly 200 includes a rotating spindle 210, a waist-shaped plate 220, a limiting frame 230, and a control plate 240. The axis of the rotating spindle 210 is horizontal, and the rotating spindle 210 can rotate around its axis. The rotating spindle 210 is located inside the purification chamber 110. The waist-shaped plate 220 is fixedly connected to the rotating spindle 210, and the rotating spindle 210 is located at the center of the waist-shaped plate 220. There are two control plates 240. The control plate 240 and the waist plate 220 are respectively rotatably connected to both sides of the waist plate 220. There are two limit frames 230, which are respectively arranged in opposite directions on both sides of the waist plate 220. The control plate 240 and the waist plate 220 are configured at an angle. The limit frames 230 are used to limit the maximum value of the angle between the control plate 240 and the waist plate 220. The rotating spindle 210 can also move in the horizontal direction along a direction perpendicular to the axis of the rotating spindle 210, and the rotating spindle 210 can also move in the vertical direction.

[0043] As shown in Figure 7, rotating the spindle 210 drives the waist-shaped plate 220 to rotate clockwise. At this time, under the resistance of the adsorbent, the angle between the control plate 240 and the waist-shaped plate 220 gradually decreases until the control plate 240 is close to the waist-shaped plate 220. At this time, when the material control component 200 is in the first control state, the adsorbent inside the purification chamber 110 is stirred and mixed under the rotation of the control plate 240 and the waist-shaped plate 220, so that the adsorbent in the purification chamber 110 is in uniform and sufficient contact with the helium, thereby removing impurities in the helium and improving the purity of the helium.

[0044] When the adsorbent needs to be replaced, as shown in Figure 8, the rotating spindle 210 drives the waist-shaped plate 220 to rotate in the opposite direction. Under the resistance of the adsorbent, the angle between the waist-shaped plate 220 and the control plate 240 gradually increases, causing the control plate 240 to abut against the inner wall of the purification chamber 110. As the rotating spindle 210 continues to rotate in the opposite direction, the angle between the control plate 240 and the waist-shaped plate 220 continues to increase. When both control plates 240 rotate to abut against the limiting frame 230, the angle between them reaches its maximum value of approximately 90 degrees. At this point, both control plates 240 are in contact with the inner wall of the purification chamber 110. The two control plates 240 and the waist-shaped plate 220 isolate the internal area of ​​the purification chamber 110 into upper and lower regions, at which point the rotating spindle 210 stops rotating. At this point, the upper surfaces of the two control plates 240 are equivalent to two parallel inclined guide surfaces. The material control component 200 is in the second control state. Next, the adsorbent flows from top to bottom. When the new adsorbent enters the purification chamber 110 from the upper part, it will be stored in the upper area of ​​the material control component 200, while the old adsorbent is located below the material control component 200. When the adsorbent below the material control component 200 is completely discharged, the adsorbent stops flowing from top to bottom. Then, the material control component 200 switches to the first control state. This reduces the waste of new adsorbent or the residue of old adsorbent when replacing the adsorbent, and makes the adsorption efficiency of the adsorbent remaining in the purification chamber 110 basically consistent, thereby improving the purification efficiency of the adsorbent for helium.

[0045] It should also be noted that, in order to enable the adsorbent to flow from top to bottom, a storage box 120 is specifically provided inside the body 100. The storage box 120 is circumferentially closed to form a purification chamber 110. The upper part of the purification chamber 110 is provided with a feed inlet 180 for adding new adsorbent into the purification chamber 110. The bottom of the purification chamber 110 is provided with an opening 121. A sealing block 130 is slidably disposed in the opening 121. The sealing block 130 can slide along the opening 121. When the sealing block 130 slides along the opening 121 until the sealing block 130 is engaged with the opening 121, the opening 121 is closed. When the sealing block 130 slides along the opening 121 until the sealing block 130 is disengaged from the opening 121, the opening 121 is opened. At this time, the material control component 200 is in the second working state. At this time, the opening 121 at the bottom of the purification chamber 110 is open for replacing the adsorbent inside the purification chamber 110.

[0046] When the material control component 200 is in the first control state, the blocking block 130 slides along the opening 121 until the blocking block 130 engages with the opening 121, and the opening 121 is closed.

[0047] When the material control component 200 is in the second control state, the sealing block 130 slides along the opening 121 until it disengages from the opening 121, at which point the opening 121 opens. Simultaneously, the feed inlet 180 opens, adding new adsorbent into the purification chamber 110. Specifically, to drive the sealing block 130 to disengage from or engage with the opening 121, a hydraulic rod 140 is provided at the bottom of the machine body 100. The axis of the hydraulic rod 140 is vertical, and its telescopic end is fixedly connected to the sealing block 130. The extension or retraction of the hydraulic rod 140 moves the sealing block 130, thereby disengaging or engaging with the opening 121. Furthermore, to reduce the amount of old adsorbent remaining on the sealing block 130, a rinsing module 150 is provided at the lower part of the machine body 100 to rinse away any remaining old adsorbent.

[0048] In a further embodiment, as shown in FIG7, the material control component 200 further includes a rotation unit 250, which is used to drive the rotating spindle 210 to rotate around its axis. The material control component 200 also includes a vertical drive source 260, which is any one of a linear cylinder, a hydraulic cylinder, or an electric telescopic rod. The axis of the telescopic end of the vertical drive source 260 is vertical, and the telescopic end of the vertical drive source 260 is used to drive the rotating spindle 210 to move in the vertical direction.

[0049] When the material control component 200 is in the first control state, it is only necessary to start the rotation unit 250, which will drive the rotation spindle 210 to rotate around its axis.

[0050] When the material control component 200 is in the second control state, the telescopic end of the vertical drive source 260 first drives the rotating spindle 210 to move upward a preset distance in the vertical direction. At the same time, the rotating spindle 210, the waist-shaped plate 220, and the control plate 240 rotate counterclockwise so that both control plates 240 abut against the inner wall of the purification chamber 110. Thus, the two control plates 240 and the waist-shaped plate 220 isolate the internal area of ​​the purification chamber 110 into upper and lower areas. The reason for moving the rotating spindle 210 upward a preset distance in the vertical direction is to move the waist-shaped plate 220 and the control plate 240 above the old adsorbent. Thus, after adding new adsorbent into the purification chamber 110, the new and old adsorbents can be completely separated by the material control component 200.

[0051] In a further embodiment, as shown in Figures 4 and 5, the rotating unit 250 includes a rotation drive source 251, a spline sleeve 252, a spline shaft 253, a first bevel gear 254, a second bevel gear 255, and a mounting box 256. The rotation drive source 251 is located in the lower part of the purification chamber 110. The rotation drive source 251 is a drive motor. The torque output end of the rotation drive source 251 is fixedly connected to the spline sleeve 252. The axis of the spline sleeve 252 is vertical. The spline shaft 253 is slidably connected inside the spline sleeve 252. The mounting box 256 is located inside the purification chamber 110. The mounting box 256 has a mounting cavity inside. One end of the spline shaft 253 away from the spline sleeve 252 passes through the mounting cavity and is fixedly connected to the first bevel gear 254. One end of the rotating spindle 210 near the first bevel gear 254 also passes through the mounting cavity and is fixedly connected to the second bevel gear 255. The second bevel gear 255 meshes with the first bevel gear 254.

[0052] When the material control component 200 is in the first control state, the rotation drive source 251 is activated. The rotation drive source 251 drives the spline sleeve 252 to rotate clockwise, the spline sleeve 252 drives the spline shaft 253 to rotate, the spline shaft 253 drives the first bevel gear 254 to rotate, the first bevel gear 254 drives the second bevel gear 255 to rotate, and the second bevel gear 255 drives the rotating spindle 210 to rotate, thereby causing the rotating spindle 210 to rotate around its axis.

[0053] When the material control component 200 is in the second control state, the rotation drive source 251 rotates counterclockwise. At the same time, the telescopic end of the vertical drive source 260 extends upward. The telescopic end of the vertical drive source 260 drives the rotating spindle 210 to move vertically upward. The rotating spindle 210 moves vertically upward while rotating around its axis, so that the waist-shaped plate 220 and the control plate 240 move above the old adsorbent and isolate the area where the old adsorbent is located from the area above the waist-shaped plate 220 and the control plate 240. At this time, the adsorbent can flow from top to bottom.

[0054] After the old and new adsorbents have been replaced, the adsorbents stop flowing from top to bottom. Then, the rotation drive source 251 continues to rotate clockwise, while the vertical drive source 260 is reset.

[0055] It should also be noted that, in order for the telescopic end of the vertical drive source 260 to drive the rotating spindle 210 to move in the vertical direction, specifically, the telescopic end of the vertical drive source 260 is fixedly connected to the bottom of the mounting box 256, so that by driving the mounting box 256 to move in the vertical direction, the telescopic end of the vertical drive source 260 can drive the rotating spindle 210 to move in the vertical direction.

[0056] In a further embodiment, the material control assembly 200 also includes a horizontal drive source, which is any one of a linear cylinder, a hydraulic cylinder, or an electric telescopic rod. The axis of the telescopic end of the horizontal drive source is horizontal, and the telescopic end of the horizontal drive source can drive the outer shell of the rotary drive source 251 and the outer shell of the vertical drive source 260 to move synchronously in the horizontal direction along a direction perpendicular to the axis of the rotating spindle 210.

[0057] The horizontal drive source is set up so that the outer shell of the rotary drive source 251 and the outer shell of the vertical drive source 260 can be driven to move synchronously in the horizontal direction along the direction perpendicular to the axis of the rotating spindle 210 through the telescopic end of the horizontal drive source, thereby adjusting the position of the waist plate 220 so that when the material control component 200 is in the second control state, both control plates 240 can abut against the inner wall of the purification chamber 110.

[0058] It should also be noted that, as shown in Figure 7, in order to make the helium flow from top to bottom, specifically, a helium inlet 160 is provided on the upper left side of the storage box 120, and a helium outlet 170 is provided on the middle right side of the storage box 120. The reason for setting the helium inlet 160 above the helium outlet 170 is that the density of helium is less than that of air. Setting the helium inlet 160 above the helium outlet 170 can prolong the residence time of helium in the purification chamber 110, so that the helium is fully purified.

[0059] When the material control component 200 is in the first control state, the waist-shaped plate 220 and the control plate 240 are biased away from the helium outlet 170. Under the stirring action of the material control component 200, the fine powder in the adsorbent is not easily discharged through the helium outlet 170, which can reduce the content of helium impurities discharged from the helium outlet 170 and improve the purification degree of helium.

[0060] In a further embodiment, as shown in FIG7, a sliding plate 280 is provided on the outside of the mounting box 256. Both ends of the sliding plate 280 are slidably connected to a synchronous baffle 290. The synchronous baffle 290 can move synchronously with the sliding plate 280 in the vertical direction and move relative to it in the horizontal direction in a direction perpendicular to the axis of the rotating spindle 210. The synchronous baffle 290 slides in contact with the inner peripheral wall of the purification chamber 110. The side of the control plate 240 and the side of the synchronous baffle 290 are located in the same vertical plane.

[0061] This is to avoid the waste of new adsorbent caused by gaps between the material control component 200 and the inner wall of the purification chamber 110 when the material control component 200 is in the second control state, which would result in new adsorbent leaking downward through the gaps.

[0062] In a further embodiment, as shown in Figures 3, 7 and 8, a guide groove 111 is also provided on the side wall of the purification chamber 110. The guide groove 111 includes a vertical guide section 111a and an inclined guide section 111b, which are connected. A guide post is provided on the outer side of the sliding plate 280 near the purification chamber 110, and the guide post is slidably connected in the guide groove 111.

[0063] The vertical guide section 111a is set to guide and limit the vertical movement of the sliding plate 280 and the synchronous baffle 290. The inclined guide section 111b is set to control the ratio between the horizontal movement distance of the horizontal drive source and the vertical movement distance of the vertical drive source 260, so that the rising height of the waist plate 220 and the control plate 240 and the horizontal movement distance of the waist plate 220 and the control plate 240 are matched.

[0064] In a further embodiment, as shown in FIG3, the high-efficiency low-temperature adsorption helium purification device further includes a refrigeration module 300 and a buffer module 400. The refrigeration module 300 is used to perform low-temperature treatment on the helium to be introduced into the purification chamber 110, and the buffer module 400 is used to adjust the pressure of the low-temperature treated helium.

[0065] When in use, the helium to be purified should first be cryogenically treated by the buffer module 400, and then the cryogenically treated helium should be sent to the buffer module 400 for pressure adjustment. Then the pressure-adjusted helium should be introduced into the helium inlet 160, so that the helium to be purified can enter the purification chamber 110.

[0066] In a further embodiment, as shown in FIG1, a discharge port is provided at the lower part of the body 100, which is used to discharge the old adsorbent from the body 100.

[0067] The technical features of the above embodiments can be combined in any way. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0068] The embodiments described above are merely illustrative of several implementations of the present invention, and while the descriptions are specific and detailed, they should not be construed as limiting the scope of the invention. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of the present invention, and these modifications and improvements all fall within the scope of protection of the present invention. Therefore, the scope of protection of the present invention should be determined by the appended claims.

Claims

1. A high efficiency cryo-sorption method helium purification device, characterized by, include: The body contains a purification chamber. Helium gas can flow from top to bottom within the purification chamber; The adsorbent can also flow from top to bottom within the purification chamber; Material control component, which is used to regulate the movement state of the adsorbent; The material control component has a first control state and a second control state; In the first control state, the material control component is used to mix and stir the adsorbent in the purification chamber; In the second control state, the material control component is used to isolate adsorbents with different working times within the purification chamber.

2. The helium purification apparatus of claim 1, wherein The material control assembly includes a rotating mandrel, a waist-shaped plate, a limiting frame, and a control plate. The axis of the rotating mandrel is horizontal and can rotate around its axis. The rotating mandrel is located in the purification chamber. The waist-shaped plate is fixedly connected to the rotating mandrel, and the rotating mandrel is located at the center of the waist-shaped plate. There are two control plates, which are rotatably connected to both sides of the waist-shaped plate. There are two limiting frames, which are arranged in opposite directions on both sides of the waist-shaped plate. The control plate and the waist-shaped plate are configured at an angle. The limiting frames are used to limit the maximum value of the angle between the control plate and the waist-shaped plate. The rotating mandrel can also move horizontally in a direction perpendicular to the axis of rotation of the mandrel; The rotating spindle can also move in the vertical direction.

3. A high efficiency cryosorbtion process helium purification unit according to claim 2, characterized in that, The material control assembly also includes a rotation unit, which drives the rotating spindle to rotate around its axis.

4. A high efficiency cryosorbtion process helium purification unit according to claim 3, characterized in that, The rotating unit includes a rotation drive source, a spline sleeve, a spline shaft, a first bevel gear, a second bevel gear, and a mounting box. The rotation drive source is located at the lower part of the purification chamber. The torque output end of the rotation drive source is fixedly connected to the spline sleeve. The axis of the spline sleeve is vertical, and the spline shaft is slidably connected inside the spline sleeve. The mounting box is located inside the purification chamber. The mounting box has a mounting cavity inside. The end of the spline shaft away from the spline sleeve passes through the mounting cavity and is fixedly connected to the first bevel gear. The end of the rotating spindle close to the first bevel gear also passes through the mounting cavity and is fixedly connected to the second bevel gear. The second bevel gear meshes with the first bevel gear.

5. A high efficiency cryosorbtion process helium purification unit according to claim 4 wherein, The material control assembly also includes a vertical drive source, the axis of which is vertical, and the telescopic end of the vertical drive source is located at the bottom of the mounting box.

6. A high efficiency cryosorbtion helium purification unit according to claim 5, wherein, The material control component also includes a horizontal drive source. The axis of the telescopic end of the horizontal drive source is horizontal. The telescopic end of the horizontal drive source can drive the rotary drive source and the vertical drive source to move synchronously in the horizontal direction along a direction perpendicular to the axis of the rotary spindle.

7. A high efficiency cryosorbtion helium purification unit according to claim 4, wherein, The mounting box is provided with a sliding plate on the outside. Both ends of the sliding plate are slidably connected to a synchronous baffle. The synchronous baffle can move synchronously with the sliding plate in the vertical direction and move relative to it in the horizontal direction in a direction perpendicular to the axis of the rotating spindle. The synchronous baffle slides in contact with the inner peripheral wall of the purification chamber. The side of the control plate and the side of the synchronous baffle are located in the same vertical plane.

8. The high-efficiency low-temperature adsorption helium purification device according to claim 7, characterized in that, The side wall of the purification chamber is also provided with a guide groove, which includes a vertical guide section and an inclined guide section. The vertical guide section and the inclined guide section are connected. A guide post is provided on the outer side of the sliding plate near the purification chamber. The guide post is slidably connected in the guide groove.

9. The high-efficiency low-temperature adsorption helium purification device according to claim 1, characterized in that, The bottom of the purification chamber is provided with an opening, and the sealing block can slide along the extension direction of the opening. When the sealing block slides along the opening until the sealing block is engaged with the opening, the opening is closed. When the sealing block slides along the opening until the sealing block is disengaged from the opening, the opening is opened.

10. The high-efficiency low-temperature adsorption helium purification device according to claim 1, characterized in that, It also includes a cryogenic module and a buffer module. The cryogenic module is used to cryogenically process the helium gas to be introduced into the purification chamber, and the buffer module is used to adjust the pressure of the cryogenically processed helium gas.

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