Substrate cleaning liquid, method for producing substrate cleaned using same, and method for producing device

A substrate cleaning liquid with a hydrophobic polymer and polar compound forms a film to hold and peel off particles, addressing the challenges of existing methods by ensuring effective particle removal and solvent-free film peeling.

WO2026139475A1PCT designated stage Publication Date: 2026-07-02MERCK PATENT GMBH
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Patent Information

Authority / Receiving Office
WO · WO
Patent Type
Applications
Current Assignee / Owner
MERCK PATENT GMBH
Filing Date
2025-12-22
Publication Date
2026-07-02

AI Technical Summary

Technical Problem

Existing substrate cleaning methods face challenges in effectively removing particles without causing physical or chemical damage, particularly when patterns are fine and complex, and often require organic solvents for film removal.

Method used

A substrate cleaning liquid comprising a hydrophobic polymer, a polar compound, and a solvent is applied, forming a film that holds particles, which is then peeled off using a stripping liquid without the need for organic solvents.

Benefits of technology

The method allows for efficient particle removal with reduced residual particles, easy film peeling, and avoids the use of organic solvents, while maintaining substrate integrity.

✦ Generated by Eureka AI based on patent content.

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Patent Text Reader

Abstract

[Problem] To obtain a substrate cleaning liquid capable of cleaning a substrate and removing particles. [Solution] A substrate cleaning liquid comprising a hydrophobic polymer (A), a polar compound (B), and a solvent (C): wherein the polar compound (B) is soluble in water. The substrate cleaning liquid is a highly functional material that can be used in a semiconductor device production step of a nanotechnology process, for example, a step of producing a semiconductor device that controls liquid crystals, quantum dots, or OLED displays formed on a substrate.
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