Mask manufacturing method, Anti-glare mask, and manufacturing method for Anti-glare product

Abstract

A mask manufacturing method, an anti-glare mask, and a manufacturing method for an anti-glare product. The mask manufacturing method comprises: generating a base scatter plot having random characteristics; on the basis of the base scatter plot, drawing a Voronoi diagram; and clipping a pattern from the Voronoi diagram, and performing two instances of mirroring, edge trimming and arraying on the pattern, in order to obtain an anti-glare mask. The anti-glare mask is manufactured using the mask manufacturing method. The manufacturing method for an anti-glare product comprises steps such as coating, exposure, development, etching, and stripping. A base scatter plot having random characteristics is used to draw a Voronoi diagram, and steps such as pattern clipping, mirroring, edge trimming and arraying are then performed, such that an ultimately obtained anti-glare mask has an anti-glare effect. The manufacturing method avoids optical defects such as Moire patterns and reflected bright lines, so that the mask manufacturing precision is improved, and patterns on masks are also more uniform and delicate, thereby improving the quality and performance of the masks.

Description

Mask manufacturing methods, anti-glare masks, and anti-glare product manufacturing methods Technical Field

[0001] This application relates to the field of photolithography technology, specifically to a mask fabrication method, an anti-glare mask, and a method for fabricating anti-glare products. Background Technology

[0002] The statements herein are provided only as background information in connection with this application and do not necessarily constitute prior art.

[0003] With the increasing popularity of high-resolution displays and OLED (Organic Light Emitting Display), conventional AG (Anti-glare) solutions have shown some difficult-to-solve visual issues, such as sparkling and visual balance of sharpness.

[0004] To address these issues, a common industry practice is to introduce anti-sparkling microstructures of OCA (Optically Clear Adhesive). However, this introduces other problems, such as peeling, moiré patterns, rainbow patterns, extremely high costs, and unwanted flickering under strong light. Technical issues

[0005] One of the objectives of this application is to provide a mask manufacturing method, an anti-glare mask, and an anti-glare product manufacturing method. Technical solutions

[0006] The technical solution adopted in the embodiments of this application is:

[0007] In a first aspect, a mask fabrication method is provided, comprising: generating a base scatter plot with random characteristics; drawing a Thiessen polygon plot according to the base scatter plot; extracting a pattern from the Thiessen polygon plot, wherein the pattern is mirrored twice, edge-trimmed, and arrayed to obtain an anti-glare mask.

[0008] In one embodiment, a periodic, uniform point array is generated based on the cell size, and then the position of the point array is adjusted according to the randomness to obtain a basic scatter plot with a certain degree of randomness in the position.

[0009] In one embodiment, drawing a Thiessen polygon graph includes: triangulating the entire graphic according to the point array, with each point forming a triangle with its two nearest points; recording the circumcenter of each triangle, where the circumcenter of the triangle is an endpoint of the Thiessen polygon graph; and connecting all endpoints by traversal to form the Thiessen polygon graph.

[0010] In one embodiment, the two mirrorings include mirroring the pattern first in a vertical direction, and then mirroring the overall image after the first mirroring in a horizontal direction a second time.

[0011] Secondly, an anti-glare mask is provided, which is manufactured using the mask manufacturing method described above.

[0012] Thirdly, a method for manufacturing an anti-glare product is provided, wherein the method employs the aforementioned anti-glare mask; the method for manufacturing the anti-glare product includes:

[0013] Photoresist coating: Photoresist is applied to a glass substrate to form a photoresist coating.

[0014] Exposure, transferring the pattern on the anti-glare mask onto the photoresist coating through exposure;

[0015] Developing involves applying a developing solution onto the photoresist coating.

[0016] Etching, etching the pattern onto the glass substrate;

[0017] Remove the photoresist residue to obtain the anti-glare product.

[0018] In one embodiment, during the exposure step, an ultraviolet light source is used to precisely transfer the fine pattern on the anti-glare mask onto the photoresist coating, ensuring the accuracy and clarity of the pattern.

[0019] In one embodiment, during the development step, the photoresist on the exposed portion is removed by a chemical reaction, allowing the pattern on the mask to be revealed on the photoresist coating.

[0020] In one embodiment, during the etching step, a pattern is precisely etched onto a glass substrate using physical or chemical methods to create an anti-glare effect.

[0021] In one embodiment, the adhesive removal step is followed by a cleaning step to thoroughly clean the anti-glare product and remove all impurities and residues. Beneficial effects

[0022] The beneficial effects of the mask manufacturing method provided in this application are as follows: by drawing a Thiessen polygon map using a basic scatter plot with random characteristics, and then going through steps such as pattern cutting, mirroring, edge trimming and arraying, the final anti-glare mask has a unique anti-glare effect. This manufacturing method does not cause optical defects such as moiré patterns and reflective bright lines. It not only improves the manufacturing precision of the mask, but also makes the pattern on the mask more uniform and delicate, thereby improving the quality and performance of the mask.

[0023] The beneficial effects of the anti-glare mask provided in this application embodiment are as follows: the mask made by the mask manufacturing method has a Thiessen polygonal pattern, which can effectively reduce the reflection and scattering of light at a specific angle, thereby avoiding the generation of glare, improving the visual effect of the anti-glare mask, and enhancing the user's comfort.

[0024] The beneficial effects of the anti-glare product manufacturing method provided in this application are: the process is simple, easy to operate, and relatively low in cost; through steps such as coating, exposure, development, etching, and removal of adhesive, glass substrate products with anti-glare effect can be manufactured efficiently. Attached Figure Description

[0025] To more clearly illustrate the technical solutions in the embodiments of this application, the drawings used in the description of the embodiments or exemplary technologies will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0026] Figure 1 shows the final mask pattern obtained by the mask manufacturing method provided in the embodiment of this application.

[0027] Figure 2 is a scatter array diagram of the mask fabrication method provided in the embodiment of this application;

[0028] Figure 3 is a triangulation diagram of the mask manufacturing method provided in the embodiment of this application;

[0029] Figure 4 is a Thiessen polygon diagram in the mask fabrication method provided in the embodiment of this application;

[0030] Figure 5 shows a mask pattern with high randomness of Thiessen polygons in the mask manufacturing method provided in the embodiments of this application.

[0031] Figure 6 shows a mask pattern with low randomness of Thiessen polygons in the mask manufacturing method provided in the embodiments of this application. Embodiments of the present invention

[0032] To make the objectives, technical solutions, and advantages of this application clearer, the following detailed description is provided in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the scope of this application.

[0033] It should be noted that when a component is referred to as "fixed to" or "set on" another component, it can be directly or indirectly attached to that other component. When a component is referred to as "connected to" another component, it can be directly or indirectly connected to that other component. The terms "upper," "lower," "left," "right," etc., indicate orientation or positional relationships based on the orientation or positional relationships shown in the accompanying drawings, and are for ease of description only, not to indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this application. Those skilled in the art can understand the specific meaning of the above terms according to the specific circumstances. The terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features. "A plurality" means two or more, unless otherwise explicitly defined.

[0034] To illustrate the technical solutions provided in this application, the following detailed description is provided in conjunction with specific drawings and embodiments.

[0035] Some embodiments of this application provide a mask fabrication method, including: generating a base scatter plot with random characteristics (see Figure 2); drawing a Thiessen polygon plot according to the base scatter plot (see Figure 4); cropping a pattern from the Thiessen polygon plot; and obtaining an anti-glare mask by mirroring the pattern twice, trimming its edges, and arraying the pattern (see Figure 1).

[0036] Compared with the prior art, the mask manufacturing method provided in this embodiment uses a scatter plot with random characteristics to draw a Thiessen polygon map, and then goes through steps such as pattern cutting, mirroring, edge trimming and arraying. The final anti-glare mask has a unique anti-glare effect. This manufacturing method will not cause optical defects such as moiré patterns and reflective bright lines. It not only improves the manufacturing accuracy of the mask, but also makes the pattern on the mask more uniform and delicate, thereby improving the quality and performance of the mask.

[0037] In one embodiment, referring to Figure 2, a periodic, uniform point array is generated based on the cell size, and then the position of the point array is adjusted according to the randomness to obtain a basic scatter plot with certain random characteristics in the position.

[0038] In this embodiment, the random array as the basis for the scattered points ensures that the final mask can be freely adjusted according to the specific actual situation, which makes it easier to adjust and balance various optical parameters. The Thiessen polygons generated in this random way have adjustable randomness and scattering distance. Different random effects will result in different pattern effects. Please refer to Figures 5 and 6 together.

[0039] In one embodiment, referring to Figures 3 and 4 together, drawing the Thiessen polygon graph includes: triangulating the entire graphic according to the point array, with each point forming a triangle with its two nearest points; recording the circumcenter of each triangle, where the circumcenter of the triangle is an endpoint of the Thiessen polygon graph; and connecting all endpoints by traversal to form the Thiessen polygon graph.

[0040] In this embodiment, the circumcenter of the triangle refers to the center of the circumcircle of the triangle, that is, the intersection of the perpendicular bisectors of the three sides of the triangle.

[0041] In this embodiment, the random scheme with the Thiessen polygon graph as the topological structure has a free number of sides in each random unit, unlike random schemes such as hexagons, quadrilaterals, and triangles where each random unit is a fixed polygon. Therefore, the Thiessen polygon graph can bring a more dispersed reflection effect.

[0042] In this embodiment, the Thiessen polygons naturally achieve close packing, and the Thiessen polygons are the most common random grid structure in nature, resulting in a display effect that is closer to nature.

[0043] In one embodiment, pattern selection refers to selecting a portion of the graphic from the Thiessen polygon graph as a pattern for subsequent processing. The pattern selection method can be adjusted according to actual needs; for example, a portion with a specific shape, size, or random characteristics can be selected as the pattern.

[0044] In one embodiment, the two mirrorings include first mirroring the pattern along the vertical direction, and then mirroring the overall image after the first mirroring along the horizontal direction.

[0045] In this embodiment, the double mirroring method ensures the pattern is symmetrical in both the horizontal and vertical directions, thereby further enhancing the visual effect and uniformity of the anti-glare mask. By cutting and mirroring the pattern twice, patterns with specific designs and random characteristics can be obtained. After edge trimming and array processing, these patterns can be seamlessly joined, ultimately resulting in an anti-glare mask with a unique anti-glare effect.

[0046] In one embodiment, edge trimming refers to smoothing the edges of the cut pattern to remove burrs and irregularities. Edge trimming can improve the manufacturing accuracy of the mask and the clarity of the pattern, thereby further improving the quality and performance of the mask.

[0047] In one embodiment, array processing refers to arranging and combining the modified patterns according to a certain rule to form a complete anti-glare mask. Array processing can make the pattern on the mask more uniform and delicate, and can improve the manufacturing efficiency and utilization rate of the mask.

[0048] The mask fabrication method provided in this application not only has a unique anti-glare effect, but also has a simple and easy-to-operate manufacturing process with relatively low cost. By drawing a Thiessen polygon map using a scatter plot with random characteristics, and then performing steps such as pattern cropping, mirroring, edge trimming, and arraying, a high-quality and high-performance anti-glare mask can be obtained. This mask can effectively reduce the reflection and scattering of light at specific angles, thereby avoiding glare and improving the visual effect of the anti-glare mask and user comfort.

[0049] Some embodiments of this application also provide an anti-glare mask, which is manufactured using the mask manufacturing method described above.

[0050] Compared with the prior art, the anti-glare mask provided in this application embodiment has a Thiessen polygonal pattern. This effectively reduces the reflection and scattering of light at specific angles, thereby avoiding glare and improving the visual effect of the anti-glare mask, thus enhancing user comfort.

[0051] The anti-glare mask of this application embodiment features a Thiessen polygonal pattern whose randomness and uniformity result in a finer pattern on the mask, making it less prone to optical defects such as moiré patterns and reflective bright lines. Furthermore, the natural close-packed nature of the Thiessen polygonal pattern allows for a denser arrangement of patterns on the mask, improving manufacturing precision and utilization.

[0052] Some embodiments of this application also provide a method for manufacturing an anti-glare product, which employs the aforementioned anti-glare mask; the method for manufacturing an anti-glare product includes:

[0053] Photoresist coating: Photoresist is applied to a glass substrate to form a photoresist coating.

[0054] Exposure transfers the pattern on the anti-glare mask onto the photoresist coating.

[0055] Development involves applying developing solution to the photoresist coating.

[0056] Etching involves etching a pattern onto a glass substrate.

[0057] Remove the photoresist residue to obtain the anti-glare product.

[0058] Compared with the prior art, the anti-glare product manufacturing method provided in this application is simple, easy to operate, and relatively low in cost; through steps such as coating, exposure, development, etching, and resist removal, glass substrate products with anti-glare effect can be manufactured efficiently.

[0059] Some embodiments of this application also provide a method for manufacturing an anti-glare product, which employs the aforementioned anti-glare mask. Through steps such as coating, exposure, development, etching, and resist removal, the pattern on the anti-glare mask can be precisely transferred onto a glass substrate, thereby producing a glass substrate product with anti-glare properties. This method is not only simple and easy to operate, but also relatively low in cost, and can efficiently produce high-quality anti-glare products.

[0060] In one embodiment, to ensure the quality and performance of the anti-glare product, the photoresist used in the coating step needs to have specific viscosity, uniformity, and curing characteristics. The viscosity of the photoresist needs to be moderate to ensure uniform application on the glass substrate and to minimize the formation of bubbles and defects. Simultaneously, the uniformity of the photoresist is crucial for subsequent exposure and development steps, as it directly affects the pattern transfer effect and clarity. Furthermore, the curing characteristics of the photoresist also need to be strictly controlled to ensure stable performance during exposure and development.

[0061] In one embodiment, during the exposure step, an ultraviolet light source is used to precisely transfer the fine pattern on the anti-glare mask onto the photoresist coating, ensuring the accuracy and clarity of the pattern.

[0062] In this embodiment, the ultraviolet light source used in the exposure step needs to have high intensity and stability to ensure that the fine pattern on the anti-glare mask can be accurately transferred to the photoresist coating. At the same time, the exposure time also needs to be precisely controlled to avoid pattern distortion and reduced sharpness caused by overexposure or underexposure.

[0063] In one embodiment, during the development step, the photoresist on the exposed portion is removed by a chemical reaction, allowing the pattern on the mask to be revealed on the photoresist coating.

[0064] In this embodiment, the developing solution used in the developing step needs to have appropriate chemical activity and stability to ensure that it can remove the photoresist from the exposed areas without damaging the photoresist in the unexposed areas. At the same time, the developing time also needs to be precisely controlled to avoid incomplete patterns or reduced clarity due to over-development or under-development.

[0065] In one embodiment, during the etching step, a pattern is precisely etched onto a glass substrate using physical or chemical methods to create an anti-glare effect.

[0066] In this embodiment, the etching solution or etching method used in the etching step needs to have high precision and controllability to ensure that the pattern can be accurately etched onto the glass substrate without causing excessive damage to the substrate. At the same time, the etching depth and uniformity also need to be strictly controlled during the etching process to ensure that the final anti-glare product has consistent optical performance and appearance.

[0067] In one embodiment, the adhesive removal step is followed by a cleaning step to thoroughly clean the anti-glare product and remove all impurities and residues.

[0068] In this embodiment, the cleaning step is crucial for ensuring the final quality and performance of the anti-glare product. The cleaning agent used needs to have excellent solubility and decontamination capabilities to effectively remove photoresist residue, developer residue, and other potential impurities. Simultaneously, the cleaning time and temperature need to be precisely controlled to avoid damage to the glass substrate or etched patterns. Thorough cleaning ensures a clean and flawless surface for the anti-glare product, thereby improving its optical performance and visual appeal.

[0069] Furthermore, the cleaning step helps remove tiny particles and contaminants that may be generated during the etching process, which can affect the optical performance and appearance of anti-glare products. Therefore, meticulous execution of the cleaning step is crucial to ensuring the final product quality. After cleaning, the anti-glare product undergoes a series of quality tests to ensure it meets predetermined standards and requirements. These tests may include optical performance testing, surface quality inspection, and durability testing, aiming to comprehensively evaluate the product's performance and reliability. Through this series of manufacturing processes and quality control measures, the final anti-glare product can be guaranteed to have excellent optical performance and visual effects, meeting the needs of various application scenarios.

[0070] The anti-glare product obtained based on the anti-glare product manufacturing method provided in the embodiments of this application has the following characteristic dimensions: pitch (scattered point spacing) dimension P: 1um≤P≤50um; height dimension H: 0um≤H≤10um; and polygon vertex randomness range (0,P / 2).

[0071] The above are merely optional embodiments of this application and are not intended to limit this application. Various modifications and variations can be made to this application by those skilled in the art. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of this application should be included within the scope of the claims of this application.

Claims

1. A method for fabricating a mask, characterized in that, include: Generate a basic scatter plot with random properties; Draw the Thiessen polygon plot based on the aforementioned basic scatter plot; An anti-glare mask is obtained by cropping a pattern from the Thiessen polygon image and then mirroring, trimming the edges, and arranging the pattern twice.

2. The mask fabrication method according to claim 1, characterized in that, Based on the cell size, a periodic, uniform point array is generated, and then the position of the point array is adjusted according to the randomness to obtain a basic scatter plot with a certain degree of randomness in the position.

3. The mask fabrication method according to claim 2, characterized in that, Drawing the Thiessen polygon diagram includes: Based on the point array, the entire graphic is triangulated, and each point forms a triangle with its two nearest points. Record the circumcenter of each triangle, which is the endpoint of the Thiessen polygon graph; By connecting all endpoints through a traversal, a Thiessen polygon graph is formed.

4. The mask fabrication method according to claim 1, characterized in that, The two mirroring steps involve first mirroring the pattern vertically, and then mirroring the overall image after the first mirroring horizontally.

5. An anti-glare mask, characterized in that, The anti-glare mask is manufactured using the mask manufacturing method described in any one of claims 1-4.

6. A method for manufacturing anti-glare products, characterized in that, The method for manufacturing the anti-glare product uses the anti-glare mask as described in claim 5; The method for manufacturing the anti-glare product includes: Photoresist coating: Photoresist is applied to a glass substrate to form a photoresist coating. Exposure, transferring the pattern on the anti-glare mask onto the photoresist coating through exposure; Developing involves applying a developing solution onto the photoresist coating. Etching, etching the pattern onto the glass substrate; Remove the photoresist residue to obtain the anti-glare product.

7. The method for manufacturing an anti-glare product according to claim 6, characterized in that, In the exposure step, an ultraviolet light source is used to precisely transfer the fine pattern on the anti-glare mask onto the photoresist coating, ensuring the accuracy and clarity of the pattern.

8. The method for manufacturing an anti-glare product according to claim 6, characterized in that, In the development step, the photoresist on the exposed portion is removed by a chemical reaction, allowing the pattern on the mask to be revealed on the photoresist coating.

9. The method for manufacturing an anti-glare product according to claim 6, characterized in that, In the etching step, a pattern is precisely etched onto the glass substrate using physical or chemical methods to create an anti-glare effect.

10. The method for manufacturing an anti-glare product according to claim 6, characterized in that, The adhesive removal step is followed by a cleaning step to thoroughly clean the anti-glare product and remove all impurities and residues.

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