Second harmonic generation device and method based on dual topological angular states
By leveraging the nonlinear interaction between the inner and outer topological photonic crystal structures and the topological angular states, the structural complexity and fabrication errors associated with second harmonic generation in existing technologies have been addressed, resulting in efficient and robust second harmonic conversion.
Patent Information
- Application Number
- CN202310248551.9
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2023-03-15
- Publication Date
- 2026-07-14
- Estimated Expiration
- 2043-03-15
AI Technical Summary
Existing second harmonic generation technologies in microcavities suffer from problems such as complex structure, difficulty in frequency matching, significant impact of processing errors, and low conversion efficiency. In particular, devices based on traditional photonic crystal microcavities are easily affected by processing defects.
By employing an inner and outer layer topological photonic crystal structure and utilizing the nonlinear interaction of topological angular states, a high-Q photonic crystal microcavity with frequency matching conditions is designed. Efficient second harmonic generation is achieved by adjusting the radius of the dielectric pillars and the cell structure, and is topologically protected.
It achieves efficient second harmonic generation with simple structure and easy integration, has high Q value and robustness, can resist the influence of processing defects, and significantly improves conversion efficiency.
Smart Images

Figure CN116382013B_ABST