Mask manufacturing method and mask
By using dual laser heads to simultaneously cut the mask, the problem of burrs generated by laser cutting was solved, the quality of the mask and the yield of OLED evaporation were improved, and the risk of substrate scratches was reduced.
CN116590655BActive Publication Date: 2026-07-03SHENZHEN KEBAOYUAN TECH CO LTD
Patent Information
- Application Number
- CN202210250633.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2022-03-15
- Publication Date
- 2026-07-03
- Estimated Expiration
- 2042-03-15
AI Technical Summary
Technical Problem
In existing technologies, defects such as burrs are generated during laser cutting of the mask, which can scratch the OLED substrate and affect the evaporation yield.
Method used
A dual-laser head is used to simultaneously cut both sides of the stainless steel sheet to form a mask through-hole pattern, avoiding burr defects caused by single-sided cutting.
Benefits of technology
It improves the manufacturing quality of the photomask and the yield of OLED evaporation, reduces the risk of substrate scratches, and improves the overall yield of the evaporation process.
✦ Generated by Eureka AI based on patent content.
Smart Images
Figure CN116590655B_ABST
Abstract
The application provides a mask manufacturing method and a mask manufactured by the method. The mask manufacturing method comprises the following steps: screen printing a stainless steel sheet as a mask; synchronously cutting the stainless steel sheet by using upper and lower laser heads to form a required mask via hole pattern; welding the cut stainless steel sheet to a mask plate frame, removing the excess part and cleaning to obtain a final mask plate. The mask manufacturing method provided by the application can improve the manufacturing yield and efficiency of the mask plate by using the double laser head cutting method without burr and other defects. The mask provided by the application is manufactured by the above method, and the generation of the mask plate via hole edge defects is avoided, so that the quality of the mask plate and the quality of OLED evaporation can be improved.
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Citation Information
Patent Citations
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