Transport track and transport system, method and system for designing a track

Abstract

The application discloses a photomask transmission track and an automatic transmission system, a design method and system of the photomask transmission track, equipment and a storage medium. The photomask transmission track comprises one or more transverse tracks extending in a transverse direction and passing above a first type of carrying module, and a plurality of longitudinal tracks crossing a plurality of photolithography equipment, the longitudinal tracks extending in a longitudinal direction and passing above a second type of carrying module, and the longitudinal tracks connecting two ends of the transverse tracks, so that the carrying modules of different photolithography equipment each have a corresponding transmission track, and can independently run on the transverse track and the longitudinal track without interference, and a transport vehicle can run on a loop formed between the transverse track and the longitudinal track, which is beneficial to increasing the transmission path and the degree of freedom of the transport vehicle, reducing the number of curved tracks that the transport vehicle needs to pass through when running, and correspondingly beneficial to increasing the running speed of the transport vehicle on the photomask transmission track, thereby improving the transmission efficiency of the photomask between the photolithography equipment.

Description

Technical Field

[0001] The embodiments of the present invention relate to the field of automated production, and in particular to a photomask transmission track and automated transmission system, a design method and system for the photomask transmission track, equipment, and storage medium. Background Technology

[0002] Semiconductor manufacturing is costly, due to both high equipment investment and long production cycles. If equipment utilization is not maximized or production cycles are extended, semiconductor manufacturing costs can increase significantly or even become uncontrollable. In fully automated semiconductor manufacturing plants, unlike work-in-process which is transferred between equipment via automated material handling systems (AMHS), the transfer of photomasks—a critical material in semiconductor manufacturing—is achieved through automated photomask handling systems (ARHS).

[0003] With the diversification of semiconductor manufacturing market demands, the increasing complexity of chip designs, and the massive expansion of the chip market, the need for photomasks used for pattern transfer on wafers is growing. Due to the high cost of photomask manufacturing and lithography equipment, and with the upgrading of semiconductor equipment and the ever-increasing speed of wafer processing, research into automated transfer systems is deepening, and the requirements for the transfer capabilities of these systems are becoming more stringent. Based on traditional wafer handling systems, photomasks have evolved from manual handling to automated transfer between lithography machines and storage equipment via automated photomask transfer systems.

[0004] However, the transmission efficiency of photomasks between devices needs to be improved. Summary of the Invention

[0005] The problem solved by the embodiments of the present invention is to provide a photomask transmission track and automated transmission system, a design method and system for the photomask transmission track, equipment and storage medium, so as to improve the transmission efficiency of photomasks between devices.

[0006] To address the aforementioned problems, this invention provides a photomask transport track for transporting photomasks between multiple photolithography devices. The multiple photolithography devices are arranged longitudinally, with the longitudinal direction perpendicular to the transverse direction. Each photolithography device includes a developing machine and an exposure machine arranged sequentially in the transverse direction. Adjacent support modules are mounted on the exposure machine to support the photomask. The adjacent support modules arranged in the transverse direction serve as a first type of support module, and the adjacent support modules arranged in the longitudinal direction serve as a second type of support module. The photomask transport track is suspended above the photolithography devices and includes: one or more transverse tracks extending laterally and passing over the first type of support modules; and multiple longitudinal tracks spanning the multiple photolithography devices, extending longitudinally and passing over the second type of support modules, with the multiple longitudinal tracks connecting the two ends of the transverse tracks.

[0007] Accordingly, this embodiment of the invention also provides an automated transmission system, including: a photomask transmission track provided in this embodiment of the invention, used for transmitting photomasks; and a transport vehicle, slidably disposed on the photomask transmission track, used for transporting the photomasks.

[0008] Accordingly, this invention also provides a design method for a photomask transport track, wherein the photomask transport track is used to transport photomasks between multiple lithography devices; the multiple lithography devices are arranged longitudinally; each lithography device includes a developing machine and an exposure machine placed sequentially in the transverse direction, the transverse direction being perpendicular to the longitudinal direction, and adjacent support modules are provided on the exposure machine, the support modules being used to support the photomask; the design method for the photomask transport track includes: obtaining the arrangement direction of adjacent support modules on the exposure machine in each lithography device, the adjacent support modules arranged in the transverse direction being used as a first type of support module, and the adjacent support modules arranged in the longitudinal direction being used as a second type of support module; based on the arrangement direction of the adjacent support modules and the track hardware design rules, designing a photomask transport track suspended above the lithography devices, the photomask transport track including: one or more transverse tracks extending in the transverse direction and passing above the first type of support modules, and multiple longitudinal tracks extending in the longitudinal direction and passing above the second type of support modules, the longitudinal tracks spanning the multiple lithography devices, and the multiple longitudinal tracks connecting the two ends of the transverse tracks.

[0009] Accordingly, this invention also provides a design system for a photomask transport track, which is used to transport photomasks between multiple photolithography devices. The multiple photolithography devices are arranged longitudinally, with the longitudinal direction perpendicular to the transverse direction. Each photolithography device includes a developing machine and an exposure machine placed sequentially in the transverse direction. Adjacent support modules are provided on the exposure machine, and the support modules are used to support the photomasks. The design system for the photomask transport track includes: a position orientation acquisition unit, used to acquire the arrangement direction of adjacent support modules on the exposure machine in each photolithography device, arranged in the transverse direction. The adjacent carrier modules are used as the first type of carrier modules, and the adjacent carrier modules arranged longitudinally are used as the second type of carrier modules; the design unit is used to design a photomask transmission track suspended above the photolithography equipment based on the arrangement direction of the adjacent carrier modules and the track hardware design rules. The photomask transmission track includes: one or more transverse tracks extending laterally and passing above the first type of carrier modules, and multiple longitudinal tracks extending longitudinally and passing above the second type of carrier modules. The longitudinal tracks span the multiple photolithography equipment, and the multiple longitudinal tracks connect the two ends of the transverse tracks.

[0010] Accordingly, embodiments of the present invention also provide an apparatus, including at least one memory and at least one processor, wherein the memory stores one or more computer instructions, wherein the one or more computer instructions are executed by the processor to implement the design method for photomask transmission tracks provided in embodiments of the present invention.

[0011] Accordingly, embodiments of the present invention also provide a storage medium storing one or more computer instructions, which are used to implement the design method for the photomask transmission track provided in embodiments of the present invention.

[0012] Compared with the prior art, the technical solution of the embodiments of the present invention has the following advantages:

[0013] The photomask transport track provided in this embodiment of the invention includes: a transverse track extending laterally and passing above the first type of carrier module, and multiple longitudinal tracks extending longitudinally and passing above the second type of carrier module. The longitudinal tracks span the multiple lithography devices, and the multiple longitudinal tracks connect the two ends of the transverse track. Thus, the carrier modules of different lithography devices each have a corresponding transport track, and can operate independently on the transverse and longitudinal tracks without interfering with each other. The transport vehicle can travel around the loop formed between the transverse and longitudinal tracks, which helps to increase the transport vehicle's transport path and degree of freedom. Furthermore, the arrangement of the transverse track and the multiple longitudinal tracks reduces the number of curves that the transport vehicle needs to pass through during operation, which is conducive to increasing the running speed of the transport vehicle on the photomask transport track, thereby improving the transport efficiency of the photomask between lithography devices.

[0014] In the design method of the photomask transport track provided in this embodiment of the invention, the photomask transport track is designed based on the arrangement direction of adjacent carrier modules and the track hardware design rules. The photomask transport track includes: a transverse track extending laterally and passing above the first type of carrier module, and multiple longitudinal tracks extending longitudinally and passing above the second type of carrier module. The longitudinal tracks span the multiple lithography devices, and the multiple longitudinal tracks connect the two ends of the transverse track. Thus, the carrier modules of different lithography devices each have a corresponding transport track, and can operate independently on the transverse and longitudinal tracks without interfering with each other. The transport vehicle can travel around the loop formed between the transverse and longitudinal tracks, which helps to increase the transport vehicle's transport path and degree of freedom. Furthermore, the setting of the transverse track and the multiple longitudinal tracks can reduce the number of curves that the transport vehicle needs to pass through during operation, which is conducive to increasing the running speed of the transport vehicle on the photomask transport track, thereby improving the transport efficiency of the photomask between lithography devices. Attached Figure Description

[0015] Figure 1 This is a schematic diagram of a photomask transmission track;

[0016] Figure 2 This is a schematic diagram of an embodiment of the photomask transmission track of the present invention;

[0017] Figure 3 This is a schematic diagram of an embodiment of the automated transmission system of the present invention.

[0018] Figure 4 This is a flowchart illustrating an embodiment of the photomask transmission track design method of the present invention;

[0019] Figure 5 This is a schematic diagram of one embodiment of the plurality of photolithography devices of the present invention;

[0020] Figure 6 This is a schematic diagram of an embodiment of the photomask transmission track designed using the photomask transmission track design method provided by the present invention;

[0021] Figure 7 This is a functional block diagram of an embodiment of the photomask transmission track design system of the present invention;

[0022] Figure 8 This is a hardware structure diagram of an embodiment of the device provided by the present invention. Detailed Implementation

[0023] As the background technology shows, the transmission efficiency of photomasks between devices needs to be improved. This paper analyzes the reasons why the transmission efficiency of photomasks between devices needs to be improved, using a photomask transmission track as an example. Figure 1 This is a schematic diagram of a photomask transmission track, which is used to transmit photomasks.

[0024] like Figure 1 As shown, multiple photolithography devices are arranged along the Y-axis. Each photolithography device includes a developing machine and an exposure machine arranged sequentially along the X-axis. The exposure machine has a support module for holding a photomask. For ease of illustration and explanation, ... Figure 1 Five sets of lithography equipment are shown: first lithography equipment 11, second lithography equipment 12, third lithography equipment 13, fourth lithography equipment 14, and fifth lithography equipment 15.

[0025] like Figure 1 As shown, the photomask transport track 16 is suspended above the photolithography equipment and passes through the center point of the exposure machine's support module in each photolithography equipment (e.g., ...). Figure 1 Above the crosshair indicated by the middle arrow G.

[0026] The transfer track 16 is used in conjunction with the transport vehicle. Specifically, the transport vehicle is slidably mounted on the transfer track 16 and is used to pick up and place the photomask carried on the carrier module.

[0027] However, the transmission track 16 needs to pass through the center point of the carrying module of all the equipment. The transmission track 16 is a single-channel track. If the photomask needs to be transported from the first photolithography equipment 11 to the fifth photolithography equipment 15, the transport vehicle needs to pass through all the equipment in the transmission path. When the handling volume is high, traffic jams are likely to occur, resulting in low utilization of the transport vehicle.

[0028] Furthermore, compared to transporting the vehicle along the straight sections of transfer track 16, transporting the vehicle along the curved sections of transfer track 16 (such as...) Figure 1(As shown at the position of the dashed circle in the middle) The transport speed is slower, and there are more curved tracks in the transmission track 16, which can easily reduce the transport speed of the transport vehicle, thereby reducing the utilization rate of the transmission track 16, resulting in low transmission efficiency of the photomask between devices.

[0029] To address the technical problem, this invention provides a photomask transport track, comprising: a transverse track extending laterally and passing above a first type of carrier module, and multiple longitudinal tracks extending longitudinally and passing above a second type of carrier module. The longitudinal tracks span multiple lithography devices, and the multiple longitudinal tracks connect the two ends of the transverse track. Thus, the carrier modules of different lithography devices each have a corresponding transport track, and can operate independently on the transverse and longitudinal tracks without interference. Furthermore, the transport vehicle can travel around the loop formed between the transverse and longitudinal tracks, which helps increase the transport vehicle's transport path and degrees of freedom. The arrangement of the transverse track and the multiple longitudinal tracks reduces the number of curves the transport vehicle needs to pass through during operation, which correspondingly helps increase the transport vehicle's running speed on the photomask transport track, thereby improving the transmission efficiency of the photomask between lithography devices.

[0030] To make the above-mentioned objects, features, and advantages of the embodiments of the present invention more apparent and understandable, specific embodiments of the present invention will be described in detail below with reference to the accompanying drawings. (Reference) Figure 2 The diagram shows a schematic representation of an embodiment of the photomask transmission track of the present invention.

[0031] In this embodiment, the photomask transport track is used to transport photomasks between multiple lithography devices.

[0032] In this embodiment, multiple photolithography devices 100 are arranged along the longitudinal direction (e.g., ...). Figure 2 The photolithography apparatus 100 is arranged in the Y-direction (as shown in the middle); each photolithography apparatus 100 includes a lateral (e.g., Figure 2 The developing machine 10 and the exposure machine 20 are placed sequentially (as shown in the X direction). The exposure machine 20 is equipped with adjacent support modules (such as...). Figure 2 (As indicated by the crosshair point pointed to by the middle arrow H), the horizontal direction is perpendicular to the vertical direction, and the carrier module is used to carry the photomask.

[0033] The photolithography equipment 100 is used to perform photolithography processes to transfer patterns on a photomask to photoresist, and then transfer the patterns on the photoresist to a wafer.

[0034] The exposure machine 20 is used to perform the exposure process, which uses light to project the pattern on the mask onto the photoresist after passing through an optical system, thereby transferring the pattern.

[0035] The developing machine 10 is used to perform a developing process after the exposure process, that is, to remove or retain the part of the photoresist that has undergone a chemical reaction with light after exposure, thereby forming a pattern in the photoresist.

[0036] The carrier module is used to hold the photomask, serving as a connection point with the transport vehicle connector. That is, the transport vehicle removes the photomask from the carrier module, or places the photomask onto the carrier module.

[0037] It should be noted that, in this embodiment, the photolithography equipment 100 is used to facilitate the explanation and description of the photomask transport track, and the photolithography equipment 100 is not part of the photomask transport track.

[0038] In this embodiment, the photomask transport track 200 is suspended above the photolithography equipment 100.

[0039] like Figure 2 As shown, in this embodiment, the photomask transmission track 200 includes: one or more transverse tracks 210 extending transversely and passing above the first type of carrier module; and multiple longitudinal tracks 220 spanning multiple photolithography devices 100, the longitudinal tracks 220 extending longitudinally and passing above the second type of carrier module, and the multiple longitudinal tracks 220 connecting the two ends of the transverse tracks 210.

[0040] In this embodiment, in each lithography device 100, the arrangement direction of adjacent carrier modules on the exposure machine 20 includes the horizontal direction and the column direction. Adjacent carrier modules arranged in the horizontal direction are used as first-type carrier modules, and adjacent carrier modules arranged in the vertical direction are used as second-type carrier modules.

[0041] The carrier module is used to carry the photomask. During the transportation of the photomask, the transmission track is used in conjunction with the transport vehicle. The transport vehicle is slidably set on the photomask transmission track. The transport vehicle takes the photomask from the carrier module, or places the photomask on the carrier module.

[0042] Therefore, the photomask transmission track 200 needs to pass above the carrier module so that the transport vehicle can interact with the carrier module.

[0043] It should be noted that in the semiconductor field, the carrier modules on the exposure machine 20 are usually arranged in pairs, and adjacent carrier modules can be arranged horizontally or vertically.

[0044] In other embodiments, the number and arrangement of the carrier modules can also be of other types.

[0045] In this embodiment, one or more lithography devices with a first type of carrier module form a first equipment group, and one or more devices with a second type of carrier module form a second equipment group.

[0046] For ease of illustration and explanation, five lithography devices 100 are shown: the first lithography device 100(a), the second lithography device 100(b), the third lithography device 100(c), the fourth lithography device 100(d), and the fifth lithography device 100(e).

[0047] In the first lithography equipment 100(a), the second lithography equipment 100(b), and the third lithography equipment 100(c), adjacent carrier modules are arranged horizontally. Therefore, the first lithography equipment 100(a), the second lithography equipment 100(b), and the third lithography equipment 100(c) constitute the first equipment group. In the fourth lithography equipment 100(d) and the fifth lithography equipment 100(e), adjacent carrier modules are arranged vertically. Therefore, the fourth lithography equipment 100(d) and the fifth lithography equipment 100(e) constitute the second equipment group.

[0048] It should be noted that the developing machine 10 is also equipped with a transport connection point for carrying the work-in-process; in each photolithography device 100, the lateral distance between the carrying module and the transport connection point is used as the length of the device.

[0049] In this embodiment, the photolithography equipment 100 consists of two parts: a coating and developing machine 10 and an exposure machine 20. The size of the developing machine 10 usually varies. The lateral distance between the carrier module and the transport connection point is used as the length of the equipment to distinguish the photolithography equipment corresponding to different types of developing machines 10.

[0050] As an example, for ease of illustration and explanation, in Figure 2 The diagram illustrates a lithography apparatus 100 with five different device lengths: a first lithography apparatus 100(a) with a first device length A, a second lithography apparatus 100(b) with a second device length B, a third lithography apparatus 100(c) with a third device length C, a fourth lithography apparatus 100(d) with a fourth device length D, and a fifth lithography apparatus 100(e) with a fifth device length E.

[0051] In other embodiments, the number of lithography devices may be different, and the device length of the lithography devices may also include other types.

[0052] In this embodiment, the photomask transport track 200 includes: one or more transverse tracks 210 extending laterally and passing above the first type of carrier module, and multiple longitudinal tracks 220 extending longitudinally and passing above the second type of carrier module. The longitudinal tracks 220 span multiple lithography devices 100, and the multiple longitudinal tracks connect the two ends of the transverse tracks 210. Thus, the carrier modules of different lithography devices 100 each have corresponding transport tracks. At the same time, the transport vehicle can operate independently on the transverse and longitudinal tracks without interfering with each other, and the transport vehicle can travel around the loop formed between the transverse and longitudinal tracks, which is beneficial to increasing the transport vehicle's transport path and degree of freedom. Furthermore, the arrangement of the transverse tracks 210 and the multiple longitudinal tracks 220 can reduce the number of curves that the transport vehicle needs to pass through during operation, which is beneficial to increasing the running speed of the transport vehicle on the photomask transport track 200, thereby improving the transport efficiency of the photomask between the lithography devices 100.

[0053] In this embodiment, the distance between the track turning point and the load-bearing module along the lateral or longitudinal direction is at least a critical distance. By setting a critical distance between the track turning point and the load-bearing module along the lateral or longitudinal direction, the turning point is avoided from being located near the connection point between the equipment and the overhead crane, thereby ensuring the normal operation of the transport vehicle at the curved track.

[0054] In this embodiment, the photomask transport track 200 passes above the center line of the carrier module, thereby improving the accuracy of the transport vehicle in picking up and placing photomasks on the carrier module.

[0055] In a specific embodiment, the deviation between the center line of the photomask transmission track 200 and the center line of the carrier module is within a preset deviation range.

[0056] In a specific embodiment, the longitudinal track 220 located on the side of the first type of bearing module near the transport connection point 30 is used as the first lateral distance between itself and the transport connection point 30; the first lateral distance is greater than the difference between the minimum equipment length and the critical distance in the first equipment group.

[0057] The transverse track 210 and the longitudinal track 220 need to be connected by a curved track. By making the first transverse distance greater than the difference between the minimum equipment length and the critical distance in the first equipment group, the distance between the curved track connected to the longitudinal track 220 near the transport connection point 30 and the load-bearing module in the first equipment group can be greater than the critical distance, thereby ensuring the normal operation of the transport vehicle at the curved track.

[0058] In this embodiment, the longitudinal track 220 located on the side of the second type of carrier module away from the transport connection point 30 has a lateral distance between it and the transport connection point as the second lateral distance. The second lateral distance is greater than or equal to the sum of the maximum length and critical distance in the first equipment group and the distance between adjacent first type of carrier modules. This ensures that the distance between the curved track connected to the longitudinal track 220 located on the side of the second type of carrier module away from the transport connection point 30 and the carrier module in the first equipment group is greater than the critical distance, thereby ensuring the normal operation of the transport vehicle at the curved track.

[0059] It should be noted that, for ease of illustration and explanation, this embodiment uses a lithography device 100 with five different device lengths as an example: a first lithography device 100(a) with a first device length A, a second lithography device 100(b) with a second device length B, a third lithography device 100(c) with a third device length C, a fourth lithography device 100(d) with a fourth device length D, and a fifth lithography device 100(e) with a fifth device length E; and the first lithography device 100(a), the second lithography device 100(b), and the third lithography device 100(c) constitute the first device group, while the fourth lithography device 100(d) and the fifth lithography device 100(e) constitute the second device group.

[0060] Accordingly, the photomask transmission track 200, which includes two longitudinal tracks 220 and three transverse tracks 210, will be used as an example for illustration.

[0061] In other embodiments, the number of photolithography devices may vary, the device length may vary, and the arrangement direction, position, and device length type of the carrier modules in the photolithography device may be combined in other ways. Correspondingly, the number and position of the longitudinal and transverse tracks in the photomask transport track may also be combined in other ways.

[0062] Accordingly, the present invention also provides an automated transmission system. Figure 3 This is a schematic diagram of an embodiment of the automated transmission system of the present invention.

[0063] In this embodiment, the automated transmission system includes: a photomask transmission track 200 as described in the previous embodiment, used for transmitting photomasks; and a transport vehicle (not shown), slidably disposed on the photomask transmission track 200, used for transporting photomasks.

[0064] The photomask transport track 200 includes one or more transverse tracks 210 extending laterally and passing above a first type of carrier module, and multiple longitudinal tracks 220 extending longitudinally and passing above a second type of carrier module. The longitudinal tracks 220 span multiple lithography devices 100, and the multiple longitudinal tracks connect the two ends of the transverse tracks 210. Thus, each carrier module of different lithography devices 100 has a corresponding transport track. At the same time, the transport vehicle can operate independently on the transverse and longitudinal tracks without interfering with each other, and the transport vehicle can travel around the loop formed between the transverse and longitudinal tracks, which helps to increase the transport vehicle's transport path and degree of freedom. Furthermore, the arrangement of the transverse tracks 210 and the multiple longitudinal tracks 220 reduces the number of curves that the transport vehicle needs to pass through during operation, which is conducive to increasing the running speed of the transport vehicle on the photomask transport track 200, thereby improving the transmission efficiency of the automated transport system.

[0065] Among them, the transport vehicle can be a crane or other transport vehicle.

[0066] In this embodiment, the developing machine 10 is also provided with a transport connection point 30 for carrying work-in-process; the automated transport system also includes a work-in-process transport track 40, which is set above the transport connection point 30 of the developing machine 10 of the multiple photolithography equipment 100 and extends longitudinally for transporting work-in-process.

[0067] In this embodiment, a transport vehicle is also slidably mounted on the work-in-process transport track 40 for transporting work-in-process.

[0068] Specifically, transport connection point 30 is used to carry the work-in-process after development, so that the transport vehicle can pick up and put down the work-in-process, and the work-in-process is transported through the work-in-process transport track 40 accordingly.

[0069] Accordingly, the present invention also provides a design method for a photomask transmission track. Figure 4 This is a flowchart illustrating an embodiment of the design method for the photomask transmission track of the present invention.

[0070] In this embodiment, the photomask transport track is used to transport photomasks between multiple lithography devices.

[0071] Reference Figure 5 The diagram shows an embodiment of a plurality of photolithography devices of the present invention.

[0072] like Figure 5 As shown, in this embodiment, multiple photolithography devices 100 are arranged along the longitudinal direction (e.g., ...). Figure 5 The photolithography apparatus 100 is arranged in the Y-direction (as shown in the middle); each photolithography apparatus 100 includes a lateral (e.g., Figure 5 The developing machine 10 and the exposure machine 20 are placed sequentially (as shown in the X direction). The exposure machine 20 is equipped with adjacent support modules (such as...). Figure 5 (As indicated by the crosshair point pointed to by the middle arrow H), the horizontal direction is perpendicular to the vertical direction, and the carrier module is used to carry the photomask.

[0073] The photolithography equipment 100 is used to perform photolithography processes to transfer patterns on a photomask to photoresist, and then transfer the patterns on the photoresist to a wafer.

[0074] The exposure machine 20 is used to perform the exposure process, which uses light to project the pattern on the photomask onto the photoresist through an optical system, thereby transferring the pattern. The developing machine 10 is used to perform the developing process after the exposure process, which removes or retains the parts of the exposed photoresist that have undergone a chemical reaction with light, thus forming a pattern in the photoresist.

[0075] The carrier module is used to hold the photomask, serving as a connection point with the transport vehicle connector. That is, the transport vehicle removes the photomask from the carrier module, or places the photomask onto the carrier module.

[0076] It should be noted that, in this embodiment, the photolithography equipment 100 is used to facilitate the explanation and description of the photomask transport track, and the photolithography equipment 100 is not part of the photomask transport track.

[0077] The design method of the photomask transmission track in this embodiment will be described in detail below with reference to the accompanying drawings.

[0078] Reference Figure 4 and Figure 5 Step S1: Obtain the arrangement direction of adjacent carrier modules on the exposure machine 20 in each photolithography device 100. Adjacent carrier modules arranged horizontally are used as first-type carrier modules, and adjacent carrier modules arranged vertically are used as second-type carrier modules.

[0079] The carrier module is used to carry the photomask. During the transportation of the photomask, the transmission track is used in conjunction with the transport vehicle. The transport vehicle is slidably set on the photomask transmission track. The transport vehicle takes the photomask from the carrier module, or places the photomask on the carrier module.

[0080] Therefore, when designing the photomask transmission track, the hardware design rules include: the photomask transmission track passes above the carrier module so that the transport vehicle can interact with the carrier module.

[0081] By obtaining the arrangement direction of adjacent carrier modules on the exposure machine 20 in each photolithography device 100, the photomask transmission track can be designed based on the arrangement direction of adjacent carrier modules and the track hardware design rules.

[0082] It should be noted that in the semiconductor field, the carrier modules on the exposure machine 20 are usually arranged in pairs, and adjacent carrier modules can be arranged horizontally or vertically.

[0083] Continue to refer to Figure 4 In this embodiment, the design method further includes: after obtaining the arrangement direction of adjacent carrier modules on the exposure machine in each lithography device, and before designing the transmission track, performing step S3: based on the arrangement direction of adjacent carrier modules, grouping the lithography devices 100 to obtain a first device group with a first type of carrier module and a second device group with a second type of carrier module.

[0084] Reference Figure 5 For ease of illustration and explanation, five lithography devices 100 are shown: the first lithography device 100(a), the second lithography device 100(b), the third lithography device 100(c), the fourth lithography device 100(d), and the fifth lithography device 100(e).

[0085] In the first lithography equipment 100(a), the second lithography equipment 100(b), and the third lithography equipment 100(c), adjacent carrier modules are arranged horizontally. Therefore, the first lithography equipment 100(a), the second lithography equipment 100(b), and the third lithography equipment 100(c) constitute the first equipment group. In the fourth lithography equipment 100(d) and the fifth lithography equipment 100(e), adjacent carrier modules are arranged vertically. Therefore, the fourth lithography equipment 100(d) and the fifth lithography equipment 100(e) constitute the second equipment group.

[0086] It should be noted that the developing machine 10 is also equipped with a transport connection point for carrying the work-in-process; the design method also includes: before designing the photomask transport track, performing step S4: obtaining the lateral distance between the carrying module and the transport connection point in each photolithography device 100, which is used as the device length.

[0087] In this embodiment, the photolithography equipment 100 consists of two parts: a coating and developing machine 10 and an exposure machine 20. The size of the developing machine 10 usually comes in different types. By obtaining the lateral distance between the carrier module and the transport connection point as the equipment length, the equipment length of the photolithography equipment corresponding to different types of developing machines 10 can be counted, so as to plan the photomask transport track in combination with photolithography equipment of different types and lengths.

[0088] As an example, for ease of illustration and explanation, in Figure 5The diagram illustrates a lithography apparatus 100 with five different device lengths: a first lithography apparatus 100(a) with a first device length A, a second lithography apparatus 100(b) with a second device length B, a third lithography apparatus 100(c) with a third device length C, a fourth lithography apparatus 100(d) with a fourth device length D, and a fifth lithography apparatus 100(e) with a fifth device length E.

[0089] In other embodiments, the number of lithography devices may be different, and the device length of the lithography devices may also include other types.

[0090] Reference Figure 4 and Figure 6 , Figure 6 A schematic diagram of an embodiment of a photomask transport track is shown. Step S2 is performed: based on the arrangement direction of adjacent carrier modules and the track hardware design rules, a photomask transport track 200 is designed to be suspended above the photolithography equipment 100. The photomask transport track 200 includes: one or more transverse tracks 210 extending laterally and passing above the first type of carrier module, and multiple longitudinal tracks 220 extending longitudinally and passing above the second type of carrier module. The longitudinal tracks 220 span multiple photolithography equipment 100, and the multiple longitudinal tracks connect the two ends of the transverse tracks 210.

[0091] Based on the arrangement direction of adjacent carrier modules and the track hardware design rules, a photomask transport track 200 is designed to be suspended above the photolithography equipment 100. The photomask transport track 200 includes: one or more transverse tracks 210 extending laterally and passing above the first type of carrier module, and multiple longitudinal tracks 220 extending longitudinally and passing above the second type of carrier module. The longitudinal tracks 220 span multiple photolithography equipment 100s, and the multiple longitudinal tracks connect the two ends of the transverse tracks 210. Thus, the carrier modules of different photolithography equipment 100s all have corresponding transport tracks. At the same time, the transport vehicle can operate independently on the transverse and longitudinal tracks without interfering with each other, and the transport vehicle can travel around the loop formed between the transverse and longitudinal tracks, which is beneficial to increasing the transport vehicle's transport path and degree of freedom. Furthermore, the arrangement of the transverse tracks 210 and the multiple longitudinal tracks 220 can reduce the number of curves that the transport vehicle needs to pass through during operation, which is beneficial to increasing the running speed of the transport vehicle on the photomask transport track 200, thereby improving the transport efficiency of the photomask between the photolithography equipment 100s.

[0092] In this embodiment, the track hardware design rules include: the distance between the track turning point and the load-bearing module along the lateral or longitudinal direction is at least a critical distance. By setting a critical distance between the track turning point and the load-bearing module along the lateral or longitudinal direction, the turning point is avoided from being located near the connection point between the equipment and the overhead crane, thereby ensuring the normal operation of the transport vehicle at the curved track.

[0093] In this embodiment, the track hardware design rules also include: the photomask transmission track 200 passes above the center line of the carrier module, thereby improving the accuracy of the transport vehicle in picking up and placing the photomask on the carrier module.

[0094] In a specific embodiment, the deviation between the center line of the photomask transmission track 200 and the center line of the carrier module is within a preset deviation range.

[0095] In this embodiment, before designing the photomask transmission track 200, the length of each photolithography device 100 is also obtained; the step of designing the photomask transmission track 200 includes: designing the photomask transmission track 200 based on the arrangement direction of adjacent carrier modules, as well as the device length and track hardware design rules, thereby combining different types of photolithography devices 200 to plan the path of the photomask transmission track 200.

[0096] In a specific embodiment, in the step of designing the photomask transmission track 200 based on the arrangement direction of adjacent carrier modules and the track hardware design rules, the longitudinal track 220 located on the side of the first type of carrier module near the transport connection point 30 has a lateral distance between it and the transport connection point 30 as the first lateral distance; the first lateral distance is greater than the difference between the minimum equipment length and the critical distance in the first equipment group.

[0097] The transverse track 210 and the longitudinal track 220 need to be connected by a curved track. By making the first transverse distance greater than the difference between the minimum equipment length and the critical distance in the first equipment group, the distance between the curved track connected to the longitudinal track 220 near the transport connection point 30 and the load-bearing module in the first equipment group can be greater than the critical distance, thereby ensuring the normal operation of the transport vehicle at the curved track.

[0098] In this embodiment, the longitudinal track 220 located on the side of the second type of carrier module away from the transport connection point has a lateral distance between it and the transport connection point as the second lateral distance. The second lateral distance is greater than or equal to the sum of the maximum length and critical distance in the first equipment group and the distance between adjacent first type of carrier modules. This ensures that the distance between the curved track connected to the longitudinal track 220 located on the side of the second type of carrier module away from the transport connection point and the carrier module in the first equipment group is greater than the critical distance, thereby ensuring the normal operation of the transport vehicle at the curved track.

[0099] It should be noted that, for ease of illustration and explanation, this embodiment uses a lithography device 100 with five different device lengths as an example: a first lithography device 100(a) with a first device length A, a second lithography device 100(b) with a second device length B, a third lithography device 100(c) with a third device length C, a fourth lithography device 100(d) with a fourth device length D, and a fifth lithography device 100(e) with a fifth device length E; and the first lithography device 100(a), the second lithography device 100(b), and the third lithography device 100(c) constitute the first device group, while the fourth lithography device 100(d) and the fifth lithography device 100(e) constitute the second device group.

[0100] Accordingly, the photomask transmission track 200, which includes two longitudinal tracks 220 and three transverse tracks 210, will be used as an example for illustration.

[0101] In other embodiments, the number of photolithography devices may vary, the device length may vary, and the arrangement direction, position, and device length type of the carrier modules in the photolithography device may be combined in other ways. Correspondingly, the number and position of the longitudinal and transverse tracks in the photomask transport track may also be combined in other ways.

[0102] To address the technical issues, this invention also provides a design system for a photomask transmission track. Figure 7 This is a functional block diagram of an embodiment of the photomask transmission track design system of the present invention.

[0103] In this embodiment, the photomask transport track is used to transport photomasks between multiple lithography devices.

[0104] Reference Figure 5 The diagram shows an embodiment of a plurality of photolithography devices of the present invention.

[0105] like Figure 5 As shown, in this embodiment, multiple photolithography devices 100 are arranged along the longitudinal direction (e.g., ...). Figure 5 The photolithography apparatus 100 is arranged in the Y-direction (as shown in the middle); each photolithography apparatus 100 includes a lateral (e.g., Figure 5 The developing machine 10 and the exposure machine 20 are placed sequentially (as shown in the X direction). The exposure machine 20 is equipped with adjacent support modules (such as...). Figure 5 (As indicated by the crosshair point pointed to by the middle arrow H), the horizontal direction is perpendicular to the vertical direction, and the carrier module is used to carry the photomask.

[0106] The photolithography equipment 100 is used to perform photolithography processes to transfer patterns on a photomask to photoresist, and then transfer the patterns on the photoresist to a wafer.

[0107] The exposure machine 20 is used to perform the exposure process, which uses light to project the pattern on the mask onto the photoresist after passing through an optical system, thereby transferring the pattern.

[0108] The developing machine 10 is used to perform a developing process after the exposure process, that is, to remove or retain the part of the photoresist that has undergone a chemical reaction with light after exposure, thereby forming a pattern in the photoresist.

[0109] The carrier module is used to hold the photomask, serving as a connection point with the transport vehicle connector. That is, the transport vehicle removes the photomask from the carrier module, or places the photomask onto the carrier module.

[0110] It should be noted that, in this embodiment, the photolithography equipment 100 is used to facilitate the explanation and description of the photomask transport track, and the photolithography equipment 100 is not part of the photomask transport track.

[0111] refer to Figure 7 In this embodiment, the photomask transport track design system 300 includes: a position orientation acquisition unit 301, used to acquire the arrangement direction of adjacent carrier modules on the exposure machine in each photolithography device, wherein adjacent carrier modules arranged horizontally are used as first-type carrier modules, and adjacent carrier modules arranged vertically are used as second-type carrier modules; and a design unit 302, used to design a photomask transport track suspended above the photolithography device based on the arrangement direction of the adjacent carrier modules and the track hardware design rules. The photomask transport track includes: one or more horizontal tracks extending horizontally and passing above the first-type carrier modules, and multiple vertical tracks extending vertically and passing above the second-type carrier modules. The vertical tracks span multiple photolithography devices, and the multiple vertical tracks connect the two ends of the horizontal tracks.

[0112] Design unit 302 designs a photomask transmission track based on the arrangement direction of adjacent carrier modules and the track hardware design rules. The photomask transmission track includes: a transverse track extending laterally and passing above the first type of carrier module, and multiple longitudinal tracks extending longitudinally and passing above the second type of carrier module. The longitudinal tracks span multiple lithography devices, and the multiple longitudinal tracks connect the two ends of the transverse track. Thus, the carrier modules of different lithography devices each have a corresponding transmission track, and can operate independently on the transverse and longitudinal tracks without interference. The transport vehicle can travel around the loop formed between the transverse and longitudinal tracks, which helps to increase the transmission path and degree of freedom of the transport vehicle. Furthermore, the setting of the transverse track and the multiple longitudinal tracks can reduce the number of curves that the transport vehicle needs to pass through during operation, which is conducive to increasing the running speed of the transport vehicle on the photomask transmission track, thereby improving the transmission efficiency of the photomask between lithography devices.

[0113] The position and orientation acquisition unit 301 acquires the arrangement orientation of adjacent carrier modules on the exposure machine 20 in each lithography device 100.

[0114] The carrier module is used to carry the photomask. During the transportation of the photomask, the transmission track is used in conjunction with the transport vehicle. The transport vehicle is slidably set on the photomask transmission track. The transport vehicle takes the photomask from the carrier module, or places the photomask on the carrier module.

[0115] Therefore, when designing the photomask transmission track, the hardware design rules include: the photomask transmission track passes above the carrier module so that the transport vehicle can interact with the carrier module.

[0116] The position orientation acquisition unit 301 acquires the arrangement orientation of adjacent carrier modules on the exposure machine 20 in each photolithography device 100, so that the design unit 302 can design the photomask transmission track based on the arrangement orientation of the adjacent carrier modules and the track hardware design rules.

[0117] It should be noted that in the semiconductor field, the carrier modules on the exposure machine 20 are usually arranged in pairs, and adjacent carrier modules can be arranged horizontally or vertically.

[0118] In this embodiment, the design system further includes a grouping unit 303, which is used to group the lithography equipment 100 based on the arrangement direction of adjacent carrier modules to obtain a first equipment group with a first type of carrier module and a second equipment group with a second type of carrier module.

[0119] Reference Figure 5 For ease of illustration and explanation, five lithography devices 100 are shown: the first lithography device 100(a), the second lithography device 100(b), the third lithography device 100(c), the fourth lithography device 100(d), and the fifth lithography device 100(e).

[0120] In the first lithography equipment 100(a), the second lithography equipment 100(b), and the third lithography equipment 100(c), adjacent carrier modules are arranged horizontally. Therefore, the first lithography equipment 100(a), the second lithography equipment 100(b), and the third lithography equipment 100(c) constitute the first equipment group. In the fourth lithography equipment 100(d) and the fifth lithography equipment 100(e), adjacent carrier modules are arranged vertically. Therefore, the fourth lithography equipment 100(d) and the fifth lithography equipment 100(e) constitute the second equipment group.

[0121] It should be noted that the developing machine 10 is also provided with a transport connection point 30 for carrying the work-in-process; the design system 300 also includes: an equipment length acquisition unit 304, which is used to acquire the lateral distance between the carrying module and the transport connection point in each photolithography device 100, and to use it as the equipment length.

[0122] In this embodiment, the photolithography equipment 100 consists of two parts: a coating and developing machine 10 and an exposure machine 20. The size of the developing machine 10 usually comes in different types. By obtaining the lateral distance between the carrier module and the transport connection point as the equipment length, the equipment length of the photolithography equipment corresponding to different types of developing machines 10 can be counted so that the design unit 302 can combine photolithography equipment with different types of equipment lengths to plan the photomask transport track.

[0123] As an example, for ease of illustration and explanation, in Figure 5 The diagram illustrates a lithography apparatus 100 with five different device lengths: a first lithography apparatus 100(a) with a first device length A, a second lithography apparatus 100(b) with a second device length B, a third lithography apparatus 100(c) with a third device length C, a fourth lithography apparatus 100(d) with a fourth device length D, and a fifth lithography apparatus 100(e) with a fifth device length E.

[0124] In other embodiments, the number of lithography devices may be different, and the device length of the lithography devices may also include other types.

[0125] Figure 6 A schematic diagram of one embodiment of a photomask transmission track is shown.

[0126] Design unit 302 is used to design a photomask transmission track 200 that is suspended above the photolithography equipment 100 based on the arrangement direction of adjacent carrier modules and track hardware design rules.

[0127] Based on the arrangement direction of adjacent carrier modules and the track hardware design rules, design unit 302 designs a photomask transmission track 200 suspended above the photolithography equipment 100. The photomask transmission track 200 includes one or more transverse tracks 210 extending laterally and passing above the first type of carrier module, and multiple longitudinal tracks 220 extending longitudinally and passing above the second type of carrier module. The longitudinal tracks 220 span multiple photolithography equipment 100s, and the multiple longitudinal tracks connect the two ends of the transverse tracks 210. Thus, the carrier modules of different photolithography equipment 100s all have corresponding transmission tracks. At the same time, the transport vehicle can operate independently on the transverse and longitudinal tracks without interfering with each other, and the transport vehicle can travel around the loop formed between the transverse and longitudinal tracks, which is beneficial to increasing the transmission path and degree of freedom of the transport vehicle. Furthermore, the setting of the transverse track 210 and the multiple longitudinal tracks 220 can reduce the number of curves that the transport vehicle needs to pass through during operation, which is beneficial to increasing the running speed of the transport vehicle on the photomask transmission track 200, thereby improving the transmission efficiency of the photomask between the photolithography equipment 100s.

[0128] In this embodiment, the track hardware design rules include: the distance between the track turning point and the load-bearing module along the lateral or longitudinal direction is at least a critical distance. By setting a critical distance between the track turning point and the load-bearing module along the lateral or longitudinal direction, the turning point is avoided from being located near the connection point between the equipment and the overhead crane, thereby ensuring the normal operation of the transport vehicle at the curved track.

[0129] In this embodiment, the track hardware design rules also include: the photomask transmission track 200 passes above the center line of the carrier module, thereby improving the accuracy of the transport vehicle in picking up and placing the photomask on the carrier module.

[0130] In a specific embodiment, the deviation between the center line of the photomask transmission track 200 and the center line of the carrier module is within a preset deviation range.

[0131] In this embodiment, the device length unit 304 also obtains the device length of each lithography device 100 and outputs the device length to the design unit 302; accordingly, the design unit 302 designs the photomask transmission track 200 based on the arrangement direction of adjacent carrier modules, as well as the device length and track hardware design rules, thereby planning the path of the photomask transmission track 200 in combination with different types of lithography devices 200.

[0132] In a specific embodiment, the longitudinal track 220 located on the side of the first type of bearing module near the transport connection point 30 is used as the first lateral distance between itself and the transport connection point 30; the first lateral distance is greater than the difference between the minimum equipment length and the critical distance in the first equipment group.

[0133] The transverse track 210 and the longitudinal track 220 need to be connected by a curved track. By making the first transverse distance greater than the difference between the minimum equipment length and the critical distance in the first equipment group, the distance between the curved track connected to the longitudinal track 220 near the transport connection point 30 and the load-bearing module in the first equipment group can be greater than the critical distance, thereby ensuring the normal operation of the transport vehicle at the curved track.

[0134] In this embodiment, the longitudinal track 220 located on the side of the second type of carrier module away from the transport connection point has a lateral distance between it and the transport connection point as the second lateral distance. The second lateral distance is greater than or equal to the sum of the maximum length and critical distance in the first equipment group and the distance between adjacent first type of carrier modules. This ensures that the distance between the curved track connected to the longitudinal track 220 located on the side of the second type of carrier module away from the transport connection point and the carrier module in the first equipment group is greater than the critical distance, thereby ensuring the normal operation of the transport vehicle at the curved track.

[0135] It should be noted that, for ease of illustration and explanation, this embodiment uses a lithography device 100 with five different device lengths as an example: a first lithography device 100(a) with a first device length A, a second lithography device 100(b) with a second device length B, a third lithography device 100(c) with a third device length C, a fourth lithography device 100(d) with a fourth device length D, and a fifth lithography device 100(e) with a fifth device length E; and the first lithography device 100(a), the second lithography device 100(b), and the third lithography device 100(c) constitute the first device group, while the fourth lithography device 100(d) and the fifth lithography device 100(e) constitute the second device group.

[0136] Accordingly, the photomask transmission track 200, which includes two longitudinal tracks 220 and three transverse tracks 210, will be used as an example for illustration.

[0137] In other embodiments, the number of photolithography devices may vary, the device length may vary, and the arrangement direction, position, and device length type of the carrier modules in the photolithography device may be combined in other ways. Correspondingly, the number and position of the longitudinal and transverse tracks in the photomask transport track may also be combined in other ways.

[0138] To address the technical problem, embodiments of the present invention also provide a device that can implement the photomask transmission track design method provided in the embodiments of the present invention by loading the above-described photomask transmission track design method in the form of a program. An optional hardware structure of the terminal device provided in the embodiments of the present invention can be as follows: Figure 8As shown, it includes: at least one processor 01, at least one communication interface 02, at least one memory 03, and at least one communication bus 04.

[0139] In this embodiment, the number of processor 01, communication interface 02, memory 03, and communication bus 04 is at least one, and the processor 01, communication interface 02, and memory 03 communicate with each other through communication bus 04. Communication interface 02 can be an interface for a communication module used for network communication, such as the interface of a GSM module. Processor 01 may be a central processing unit (CPU), an application-specific integrated circuit (ASIC), or one or more integrated circuits configured to implement embodiments of the present invention. Memory 03 may include high-speed RAM and may also include non-volatile memory (NVM), such as at least one disk storage device.

[0140] The memory 03 stores one or more computer instructions, which are executed by the processor 01 to implement the design method of the photomask transmission track provided in this embodiment of the invention.

[0141] It should be noted that the aforementioned terminal device may also include other devices (not shown) that may not be essential to understanding the content disclosed in the embodiments of the present invention; given that these other devices may not be essential for understanding the content disclosed in the embodiments of the present invention, the embodiments of the present invention will not describe them one by one.

[0142] This invention also provides a storage medium storing one or more computer instructions for implementing the photomask transmission track design method provided in this invention.

[0143] Embodiments of the present invention can be implemented by various means, such as hardware, firmware, software, or combinations thereof. In a hardware configuration, the method according to an exemplary embodiment of the present invention can be implemented by one or more application-specific integrated circuits (ASICs), digital signal processors (DSPs), digital signal processing devices (DSPDs), programmable logic devices (PLDs), field-programmable gate arrays (FPGAs), processors, controllers, microcontrollers, microprocessors, etc. In a firmware or software configuration, embodiments of the present invention can be implemented in the form of modules, processes, functions, etc. Software code can be stored in memory units and executed by a processor.

[0144] Memory cells are located inside or outside the processor and can send data to and receive data from the processor via various known means.

[0145] While the present invention has been disclosed above, it is not limited thereto. Any person skilled in the art can make various modifications and alterations without departing from the spirit and scope of the invention; therefore, the scope of protection of the present invention should be determined by the scope defined in the claims.

Claims

1. A photomask transmission track, characterized in that, The photomask transport track is suspended above the photolithography equipment and is used to transport photomasks between multiple photolithography equipment. The multiple photolithography equipment are arranged longitudinally, with the longitudinal direction perpendicular to the transverse direction. Each photolithography equipment includes a developing machine and an exposure machine placed sequentially in the transverse direction. The exposure machine is provided with adjacent support modules, which are used to support the photomask. The adjacent support modules arranged in the transverse direction are used as first-type support modules, and the adjacent support modules arranged in the longitudinal direction are used as second-type support modules. The photomask transmission track includes: One or more transverse tracks extend laterally and pass over the first type of load-bearing module; Multiple vertical tracks span the multiple lithography devices, the vertical tracks extend longitudinally and pass above the second type of support module, and the multiple vertical tracks connect the two ends of the horizontal tracks.

2. The photomask transmission track as described in claim 1, characterized in that, The developing machine is also provided with a transport connection point for carrying the work-in-process; in each photolithography device, the lateral distance between the carrying module and the transport connection point is used as the length of the device. One or more lithography devices having the first type of carrier module constitute a first equipment group, and one or more having the second type of carrier module constitute a second equipment group; The distance between the track turning point and the load-bearing module in the lateral or longitudinal direction is at least a critical distance; The longitudinal track located on the side of the first type of bearing module near the transport connection point has a lateral distance between itself and the transport connection point as a first lateral distance; the first lateral distance is greater than the difference between the minimum equipment length in the first equipment group and the critical distance. The longitudinal track located on the side of the second type of carrier module away from the transport connection point has a lateral distance between itself and the transport connection point as a second lateral distance; the second lateral distance is greater than or equal to the sum of the maximum length and critical distance in the first equipment group and the distance between adjacent first type of carrier modules.

3. The photomask transmission track as described in claim 1, characterized in that, The photomask transmission track passes above the center line of the carrier module.

4. The photomask transmission track as described in claim 1 or 3, characterized in that, The photomask transmission track, which is suspended above the photolithography equipment, is designed based on the arrangement direction of adjacent carrier modules and the track hardware design rules; the track hardware design rules include: the deviation between the center line of the photomask transmission track and the center line of the carrier module is within a preset deviation range.

5. An automated transmission system, characterized in that, include: The photomask transport track as described in any one of claims 1-4 is used for transporting photomasks; A transport vehicle is slidably mounted on the photomask transport track for transporting the photomask.

6. The automated transmission system as described in claim 5, characterized in that, The developing machine is also equipped with a transport connection point for carrying work-in-process; the automated transport system further includes a work-in-process transport track, which is set above the transport connection point of the developing machine of multiple lithography devices and extends longitudinally for transporting work-in-process.

7. A method for designing a photomask transmission track, characterized in that, The photomask transport track is used to transport photomasks between multiple photolithography devices; the multiple photolithography devices are arranged longitudinally; each photolithography device includes a developing machine and an exposure machine placed in sequence in the transverse direction, the transverse direction being perpendicular to the longitudinal direction, and the exposure machine is provided with adjacent support modules, the support modules being used to support the photomask; The method for designing the photomask transmission track includes: In each of the photolithography devices, the arrangement direction of adjacent carrier modules on the exposure machine is obtained. Adjacent carrier modules arranged horizontally are used as first-type carrier modules, and adjacent carrier modules arranged vertically are used as second-type carrier modules. Based on the arrangement direction of adjacent carrier modules and the track hardware design rules, a photomask transmission track is designed to be suspended above the photolithography equipment. The photomask transmission track includes: one or more transverse tracks extending laterally and passing above the first type of carrier module, and multiple longitudinal tracks extending longitudinally and passing above the second type of carrier module. The longitudinal tracks span the multiple photolithography equipment, and the multiple longitudinal tracks connect the two ends of the transverse tracks.

8. The design method for the photomask transmission track as described in claim 7, characterized in that, The developing machine is also provided with a transport connection point for carrying the work-in-process; the design method further includes: before designing the photomask transport track, obtaining the lateral distance between the carrying module and the transport connection point in each photolithography device, which is used as the device length; The steps for designing the photomask transmission track include: designing the photomask transmission track based on the arrangement direction of adjacent carrier modules, the length of the device, and the track hardware design rules.

9. The design method for the photomask transmission track as described in claim 8, characterized in that, The track hardware design rules include: the distance between the track turning point and the load-bearing module along the lateral or longitudinal direction is at least a critical distance; The design method further includes: after obtaining the arrangement direction of adjacent carrier modules on the exposure machine in each of the lithography devices, and before designing the transmission track, grouping the lithography devices based on the arrangement direction of adjacent carrier modules to obtain a first device group with the first type of carrier modules and a second device group with the second type of carrier modules; Based on the arrangement direction of adjacent carrier modules and the track hardware design rules, in the step of designing the photomask transmission track, the longitudinal track located on the side of the first type of carrier module near the transport connection point has a lateral distance between it and the transport connection point as the first lateral distance; the first lateral distance is greater than the difference between the minimum equipment length in the first equipment group and the critical distance. The longitudinal track located on the side of the second type of carrier module away from the transport connection point has a lateral distance between itself and the transport connection point as a second lateral distance; the second lateral distance is greater than or equal to the sum of the maximum length and critical distance in the first equipment group and the distance between adjacent first type of carrier modules.

10. The design method for the photomask transmission track as described in claim 7, characterized in that, The track hardware design rules also include: the photomask transmission track passes above the center line of the carrier module.

11. The method for designing a photomask transmission track as described in claim 7 or 10, characterized in that, The track hardware design rules also include: the deviation between the centerline of the photomask transmission track and the centerline of the carrier module is within a preset deviation range.

12. A design system for a photomask transport track, wherein the photomask transport track is used to transport photomasks between multiple photolithography devices; the multiple photolithography devices are arranged longitudinally, the longitudinal direction being perpendicular to the transverse direction; each photolithography device includes a developing machine and an exposure machine placed sequentially in the transverse direction, the exposure machine being provided with adjacent support modules, the support modules being used to support the photomask; The design system for the photomask transmission track is characterized by comprising: The position orientation acquisition unit is used to acquire the arrangement orientation of adjacent carrier modules on the exposure machine in each of the photolithography devices. Adjacent carrier modules arranged in the horizontal direction are used as first-type carrier modules, and adjacent carrier modules arranged in the vertical direction are used as second-type carrier modules. The design unit is used to design a photomask transport track suspended above the lithography equipment based on the arrangement direction of adjacent carrier modules and the track hardware design rules. The photomask transport track includes: one or more transverse tracks extending laterally and passing above the first type of carrier module, and multiple longitudinal tracks extending longitudinally and passing above the second type of carrier module. The longitudinal tracks span the multiple lithography equipment, and the multiple longitudinal tracks connect the two ends of the transverse tracks.

13. A device, characterized in that, It includes at least one memory and at least one processor, the memory storing one or more computer instructions, wherein the one or more computer instructions are executed by the processor to implement the design method of the photomask transmission track as described in any one of claims 7-11.

14. A storage medium, characterized in that, The storage medium stores one or more computer instructions, which are used to implement the design method of the photomask transmission track as described in any one of claims 7-11.

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