Display panel and preparation method thereof

Abstract

The invention provides a display panel and a preparation method thereof.The display panel comprises a first protection layer, the first protection layer is arranged on the side, away from a substrate, of a pixel definition layer, and the orthographic projection of the first protection layer on the substrate is located in the orthographic projection of a second color light-emitting layer and an isolation structure on the substrate; the area, corresponding to the first protection layer, on the pixel definition layer is prevented from being etched to form a pit, so that the cathode film forming continuity is prevented from being influenced, cathode open circuit and dark spot formation are avoided, and the display effect of the display panel is improved.

Description

Technical Field

[0001] The present application relates to the field of display technology, and in particular to a display panel and a method for preparing the same. Background Art

[0002] OLED (Organic Light-Emitting Diode) is an active light-emitting device with a sandwich structure consisting of multiple organic layers and electrodes on both sides. At present, display screens based on AMOLED (Active-matrix organic light-emitting diode) have been commercialized in the fields of smart phones, watches and laptops.

[0003] However, the performance of existing displays needs to be improved. Summary of the invention

[0004] In view of this, the purpose of the present application is to provide a display panel that can improve the continuity of cathode film formation, reduce the occurrence rate of dark spots, and thus improve the display effect.

[0005] Based on the above purpose, the present application provides a display panel, which includes:

[0006] substrate;

[0007] an anode layer, disposed on one side of the substrate, the anode layer comprising a plurality of anodes;

[0008] A pixel definition layer is disposed on the same side of the substrate as the anode layer, and a plurality of pixel openings for exposing the anode are formed on the pixel definition layer;

[0009] An isolation structure is arranged on a side of the pixel definition layer away from the substrate, the isolation structure encloses a plurality of isolation openings corresponding to the pixel openings; the isolation openings include a first type of isolation openings and a second type of isolation openings;

[0010] a light-emitting functional layer, arranged in the isolation opening and covering the anode, the light-emitting functional layer being separated by the isolation structure, and comprising a first color light-emitting layer respectively arranged in the first type of isolation opening and a second color light-emitting layer respectively arranged in the second type of isolation opening;

[0011] A cathode layer, disposed in the isolation opening and covering the light-emitting functional layer, wherein the cathode layer is divided into a plurality of cathodes by the isolation structure;

[0012] The first protection layer is disposed on a side of the pixel definition layer away from the substrate and is located in the second type isolation opening, and the orthographic projection of the first protection layer on the substrate at least partially overlaps with the orthographic projection of the isolation structure on the substrate.

[0013] In one embodiment, the isolation structure includes a support portion and a crown portion, the crown portion is located on a side of the support portion away from the substrate, an area of ​​an orthographic projection of the support portion on the substrate is smaller than an area of ​​an orthographic projection of the crown portion on the substrate, and the orthographic projection of the support portion on the substrate is located within an orthographic projection of the crown portion on the substrate;

[0014] Preferably, the orthographic projection of the first protective layer on the substrate at least partially overlaps with the orthographic projection of the crown portion on the substrate, and does not overlap with the orthographic projection of the support portion on the substrate;

[0015] Preferably, the support portion is a conductive structure, and the cathode layer is electrically connected to the support portion;

[0016] Preferably, the display panel further comprises an encapsulation layer, and the encapsulation layer covers the cathode layer and the isolation structure.

[0017] In one embodiment, the isolation opening further includes a third type of isolation opening, the light-emitting functional layer further includes a third color light-emitting layer, and the third color light-emitting layer is disposed in the third type of isolation opening; the display panel further includes:

[0018] A second protective layer is disposed on a side of the pixel definition layer away from the substrate and is located in the third type of isolation opening, wherein an orthographic projection of the second protective layer on the substrate at least partially overlaps an orthographic projection of the isolation structure on the substrate;

[0019] Preferably, the orthographic projection of the second protective layer on the substrate at least partially overlaps with the orthographic projection of the crown portion on the substrate, and does not overlap with the orthographic projection of the support portion on the substrate;

[0020] Preferably, the second protective layer is prepared before the first color light-emitting layer is prepared, and is removed when the first color light-emitting layer is patterned;

[0021] Preferably, the first protective layer and the second protective layer are prepared by the same process;

[0022] Preferably, the material of the second protective layer includes metal;

[0023] Preferably, the material of the second protective layer is the same as that of the cathode layer;

[0024] Preferably, the material of the first protective layer is the same as that of the second protective layer, and the thickness of the first protective layer and the second protective layer are the same.

[0025] In one embodiment, the display panel further includes:

[0026] A third protection layer is disposed on a side of the pixel definition layer away from the substrate and is located in the third type of isolation opening, wherein an orthographic projection of the third protection layer on the substrate at least partially overlaps with an orthographic projection of the isolation structure on the substrate;

[0027] Preferably, the orthographic projection of the third protective layer on the substrate at least partially overlaps with the orthographic projection of the crown portion on the substrate, and does not overlap with the orthographic projection of the support portion on the substrate;

[0028] Preferably, the third protective layer is prepared after the one-color light-emitting layer is prepared, and is removed when the second-color light-emitting layer is patterned;

[0029] Preferably, the material of the third protective layer includes metal;

[0030] Preferably, the material of the third protective layer is the same as that of the cathode layer.

[0031] In one embodiment, the second protective layer is prepared before the first color light-emitting layer is prepared, and is thinned when the first color light-emitting layer is patterned, and the thinned second protective layer is removed when the second color light-emitting layer is patterned.

[0032] In one embodiment, the first protective layer is prepared before the first color light-emitting layer is prepared, and is removed when the first color light-emitting layer is patterned;

[0033] Preferably, the material of the first protective layer includes metal;

[0034] Preferably, the material of the first protection layer is the same as that of the cathode layer.

[0035] Based on the same inventive concept, the present application also provides a display panel, which includes:

[0036] substrate;

[0037] an anode layer, disposed on one side of the substrate, the anode layer comprising a plurality of anodes;

[0038] A pixel definition layer is disposed on the same side of the substrate as the anode layer, and a plurality of pixel openings for exposing the anode are formed on the pixel definition layer;

[0039] An isolation structure is arranged on a side of the pixel definition layer away from the substrate, the isolation structure encloses a plurality of isolation openings corresponding to the pixel openings; the isolation openings include a first type of isolation openings and a third type of isolation openings;

[0040] a light-emitting functional layer, arranged in the isolation opening and covering the anode, the light-emitting functional layer being separated by the isolation structure, the light-emitting functional layer comprising a first color light-emitting layer at least partially arranged in the first type of isolation opening, and a third color light-emitting layer at least partially arranged in the third type of pixel opening;

[0041] A cathode layer, disposed in the isolation opening and covering the light-emitting functional layer, wherein the cathode layer is divided into a plurality of cathodes by the isolation structure;

[0042] A first pit is formed on the pixel definition layer, the first pit is located in the third type isolation opening, and at least part of the orthographic projection of the first pit on the substrate is located in the orthographic projection of the isolation structure on the substrate.

[0043] In one embodiment, the isolation opening further includes a second type of isolation opening, the light-emitting functional layer further includes a second color light-emitting layer, and the second color light-emitting layer is disposed in the second type of isolation opening;

[0044] A second pit is formed on the pixel definition layer, the second pit is located in the second type of isolation opening, and the orthographic projection of the second pit on the substrate is located in the orthographic projection of the isolation structure on the substrate;

[0045] Preferably, the depth of the second pit is less than the depth of the first pit;

[0046] Preferably, the pixel openings include first-type pixel openings located in the first-type isolation openings, second-type pixel openings located in the second-type isolation openings, and third pixel openings located in the third-type isolation openings, the first concave pit is annular, and the orthographic projection of the first concave pit on the substrate surrounds the orthographic projection of the third-type pixel opening on the substrate;

[0047] Preferably, the second concave pit is annular, and the orthographic projection of the second concave pit on the substrate surrounds the orthographic projection of the second type pixel opening on the substrate;

[0048] Preferably, the isolation structure comprises a support portion and a crown portion, the crown portion is located on a side of the support portion away from the substrate, an area of ​​an orthographic projection of the support portion on the substrate is smaller than an area of ​​an orthographic projection of the crown portion on the substrate, and the orthographic projection of the support portion on the substrate is located within an orthographic projection of the crown portion on the substrate;

[0049] Preferably, the support portion is a conductive structure, and the cathode layer is electrically connected to the support portion;

[0050] Preferably, the display panel further comprises an encapsulation layer, and the encapsulation layer covers the cathode layer and the isolation structure.

[0051] Based on the same inventive concept, the present application also provides a method for preparing a display panel, which comprises:

[0052] forming an anode layer on one side of the substrate, wherein the anode layer includes a plurality of anodes;

[0053] forming a pixel definition layer on the same side of the anode layer as the substrate, wherein a plurality of pixel openings exposing the anode are formed on the pixel definition layer;

[0054] An isolation structure is formed on a side of the pixel definition layer away from the substrate, wherein the isolation structure encloses a plurality of isolation openings corresponding to the pixel openings; the isolation openings include a first type of isolation openings and a second type of isolation openings;

[0055] A first protective layer is formed on a side of the pixel definition layer away from the substrate and in the second type of isolation opening; an orthographic projection of the first protective layer on the substrate at least partially overlaps with an orthographic projection of the isolation structure on the substrate;

[0056] forming a first color light-emitting layer and a first cathode layer on the isolation structure and in the isolation opening; the first color light-emitting layer covers the first protection layer;

[0057] Patterning the first cathode layer and the first color light-emitting layer to remove the first cathode layer and the first color light-emitting layer on the isolation structure and in the second type of isolation openings, and the first protective layer, and retaining the first cathode layer and the first color light-emitting layer in the first type of isolation openings;

[0058] forming a second color light emitting layer and a second cathode layer on the isolation structure and in the isolation opening;

[0059] The second cathode layer and the second color light-emitting layer are patterned to remove the second cathode layer and the second color light-emitting layer on the isolation structure and in the first type of isolation openings, and retain the second cathode layer and the second color light-emitting layer in the second type of isolation openings.

[0060] In one embodiment, the pixel opening further includes a third type of pixel opening;

[0061] After patterning the second cathode layer and the second color light-emitting layer, the method further includes:

[0062] forming a third color light emitting layer and a third cathode layer on the isolation structure and in the isolation opening;

[0063] Patterning the third cathode layer and the third color light-emitting layer to remove the third cathode layer and the third color light-emitting layer on the isolation structure, in the first type of isolation openings and in the second type of isolation openings, and retaining the third cathode layer and the third color light-emitting layer in the third type of isolation openings;

[0064] Before forming the first color light emitting layer and the first cathode layer on the isolation structure and in the isolation opening, the method further includes:

[0065] A second protective layer is formed on a side of the pixel definition layer away from the substrate and in the third type isolation opening; the orthographic projection of the second protective layer on the substrate at least partially overlaps with the orthographic projection of the isolation structure on the substrate;

[0066] When the first color light-emitting layer is formed on the isolation structure and in the isolation opening, the first color light-emitting layer covers the second protection layer;

[0067] When patterning the first cathode layer and the first color light-emitting layer, removing the second protective layer;

[0068] Preferably, after patterning the first cathode layer and the first color light-emitting layer and before forming the second color light-emitting layer on the isolation structure and in the isolation opening, the method further includes:

[0069] A third protective layer is formed on a side of the pixel definition layer away from the substrate and within the third type isolation opening; the orthographic projection of the third protective layer on the substrate at least partially overlaps with the orthographic projection of the isolation structure on the substrate;

[0070] When the second color light-emitting layer is formed on the isolation structure and in the isolation opening, the second color light-emitting layer covers the third protection layer;

[0071] When patterning the second cathode layer and the second color light-emitting layer, removing the third protective layer;

[0072] Preferably, before forming the first color light-emitting layer on the isolation structure and in the isolation opening, the method further comprises:

[0073] A second protective layer is formed on a side of the pixel definition layer away from the substrate and in the third type isolation opening; the orthographic projection of the second protective layer on the substrate at least partially overlaps with the orthographic projection of the isolation structure on the substrate;

[0074] When the first color light-emitting layer is formed on the isolation structure and in the isolation opening, the first color light-emitting layer covers the second protection layer;

[0075] When the first color light emitting layer is patterned, the second protective layer is thinned;

[0076] When the second color light emitting layer is patterned, the thinned second protective layer is removed.

[0077] Based on the same inventive concept, the present application also provides a display device, which includes the display panel as described above.

[0078] Compared with the prior art, a display panel provided in the present application includes a first protective layer, which is arranged on the side of the pixel definition layer away from the substrate, and the orthographic projection of the first protective layer on the substrate is located within the orthographic projection of the second color light-emitting layer and the isolation structure on the substrate, thereby avoiding the area on the pixel definition layer corresponding to the first protective layer from being etched to form pits, or reducing the depth of the pits, thereby avoiding affecting the continuity of cathode film formation, and further avoiding cathode short circuit and formation of dark spots, thereby improving the display effect of the display panel. BRIEF DESCRIPTION OF THE DRAWINGS

[0079] In order to more clearly illustrate the technical solutions in the present application or related technologies, the drawings required for use in the embodiments or related technical descriptions are briefly introduced below. Obviously, the drawings described below are only embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without creative work.

[0080] Figure 1 is a structural schematic diagram of a related display panel;

[0081] Figure 2 is a schematic diagram of a layer structure of a related display panel;

[0082] Figure 3 is a schematic diagram of the layer structure of a display panel in an embodiment of the present application;

[0083] Figure 4 is a schematic diagram of a layer structure of a display panel in another embodiment of the present application;

[0084] Figure 5 is a schematic diagram of a layer structure of a display panel in another embodiment of the present application;

[0085] Figure 6 is a schematic diagram of a layer structure of a display panel in another embodiment of the present application;

[0086] Figure 7 is a schematic diagram of a layer structure of a display panel in another embodiment of the present application;

[0087] Figure 8 is a schematic diagram of a layer structure of a display panel in another embodiment of the present application;

[0088] Fig. 9 is a flow chart of a method for preparing a display panel in another embodiment of the present application;

[0089] Figures 10a to 10d is a schematic diagram of a method for preparing a display panel in another embodiment of the present application;

[0090] Figures 11a to 11c is a schematic diagram of a method for preparing a display panel in another embodiment of the present application;

[0091] Fig.12 FIG. 4 is a schematic diagram of a layer structure of a display panel in another embodiment of the present application.

[0092] Marking Description:

[0093] 100. display panel; 200. evaporation source;

[0094] 1. Substrate;

[0095] 2. pixel definition layer; 21. pit; 211. first pit; 212. second pit; 22. pixel opening; 221. first type pixel opening; 222. second type pixel opening; 223. third type pixel opening;

[0096] 3. Isolation structure; 31. Isolation opening; 311. First type of isolation opening; 312. Second type of isolation opening; 313. Third type of isolation opening; 32. Support part; 33. Crown part;

[0097] 4. Light-emitting unit; 41. Anode layer; 411. Anode; 42. Light-emitting functional layer; 421. First color light-emitting layer; 422. Second color light-emitting layer; 423. Third color light-emitting layer; 43. Cathode layer; 431. Cathode; 432. First cathode layer; 433. Second cathode layer; 434. Third cathode layer;

[0098] 5. The first protective layer;

[0099] 6. Second protective layer;

[0100] 7. The third protective layer;

[0101] 8. Encapsulation layer. DETAILED DESCRIPTION

[0102] In order to make the objectives, technical solutions and advantages of the present application more clearly understood, the present application is further described in detail below in combination with specific embodiments and with reference to the accompanying drawings.

[0103] It should be noted that, unless otherwise defined, the technical terms or scientific terms used in the embodiments of the present application should be the usual meanings understood by people with ordinary skills in the field to which the present application belongs. The "first", "second" and similar words used in the embodiments of the present application do not represent any order, quantity or importance, but are only used to distinguish different components. "Including" or "comprising" and similar words mean that the elements or objects appearing in front of the word cover the elements or objects listed after the word and their equivalents, without excluding other elements or objects. "Connect" or "connected" and similar words are not limited to physical or mechanical connections, but can include electrical connections, whether direct or indirect. "Up", "down", "left", "right" and the like are only used to indicate relative positional relationships. When the absolute position of the described object changes, the relative positional relationship may also change accordingly.

[0104] Reference Figure 1-2 As shown, it is a schematic diagram of the structure of a related display panel, which includes a substrate 1, a pixel definition layer 2 and an isolation structure 3. The isolation structure 3 is arranged on the side of the pixel definition layer 2 away from the substrate 1, and encloses an isolation opening 31 for accommodating a light-emitting unit. The light-emitting unit generally includes R, G, and B, which are respectively used to emit red light, green light, and blue light. Therefore, the isolation opening 31 also includes a plurality of types of isolation openings 31 respectively used to accommodate different light-emitting units.

[0105] After long-term research, the inventors found that the cathode layer 43 in the light-emitting unit is usually prepared by using the evaporation source 200 for full-surface evaporation and then etching. The isolation structure 3 has a large upper and small lower structure, which will block the cathode layer 43 during evaporation, resulting in a thinner cathode layer 43 evaporated below the isolation structure 3. When preparing the first color pixel, it is necessary to retain the cathode layer 43 and the encapsulation layer in the first type of isolation opening 31, and remove the cathode layer 43 and the encapsulation layer in other areas (including the isolation structure 3 and other isolation openings 31), and the encapsulation layer needs to be dry-etched. Therefore, when the encapsulation layer corresponding to the first color light-emitting functional layer 42 is dry-etched, since the pixel definition layer 2 is not resistant to dry etching, the area where the cathode layer 43 is thinner in other isolation openings 31 will be etched to the pixel definition layer 2 below the isolation opening 31, forming a pit 21 on the pixel definition layer 2, thereby affecting the continuity of subsequent cathode film formation, and easily causing the cathode layer 43 to be disconnected and form a dark spot.

[0106] Based on this, the present application provides a display panel solution, as detailed in the following embodiments.

[0107] Reference Figure 1 , 3 As shown in FIG. 4 , an embodiment of the present application discloses a display panel 100 , which includes a substrate 1 , an anode layer 41 , a pixel definition layer 2 , an isolation structure 3 , a light-emitting functional layer 42 , a cathode layer 43 and a first protective layer 5 .

[0108] The anode layer 41 is arranged on one side of the substrate 1, and the anode layer 41 includes a plurality of anodes 411; the pixel definition layer 2 and the anode layer 41 are arranged on the same side of the substrate 1, and a plurality of pixel openings 22 exposing the anodes 411 are formed on the pixel definition layer 2; the isolation structure 3 is arranged on the side of the pixel definition layer 2 away from the substrate 1, and the isolation structure 3 encloses a plurality of isolation openings 31 corresponding to the pixel openings 22, and the isolation openings 31 include a first type of isolation opening 311 and a second type of isolation opening 312; the light-emitting function layer 42 is arranged in the isolation opening 31 and covers the anode 411, and the light-emitting function layer 42 is formed by the isolation structure 31. The light-emitting functional layer 42 includes a first color light-emitting layer 421 and a second color light-emitting layer 422 respectively arranged in the first type of isolation opening 311 and the second type of isolation opening 312; the cathode layer 43 is arranged in the isolation opening 31 and covers the light-emitting functional layer 42, and the cathode layer 43 is divided into a plurality of cathodes 431 by the isolation structure 3; the first protective layer 5 is arranged on the side of the pixel definition layer 2 away from the substrate 1 and is located in the second type of isolation opening 312, and the orthographic projection of the first protective layer 5 on the substrate 1 at least partially overlaps with the orthographic projection of the isolation structure 3 on the substrate 1.

[0109] Each anode 411, cathode 431 and light-emitting functional layer 42 form a light-emitting unit 4, the light-emitting functional layer 42 is separated by the isolation structure 3, and the cathode 431 completely covers the light-emitting functional layer 42 and overlaps the isolation structure 3. The pixel opening 22 includes a first type of pixel opening 221 and a second type of pixel opening 222, the first type of isolation opening 311 corresponds to the first type of pixel opening 221, and the second type of isolation opening 312 corresponds to the second type of pixel opening 222.

[0110] A display panel 100 provided in this embodiment, by arranging the first protective layer 5 on the side of the pixel definition layer 2 away from the substrate 1, and the orthographic projection of the first protective layer 5 on the substrate 1 is located within the orthographic projection of the second color light-emitting layer 422 and the isolation structure 3 on the substrate 1, and is also located within the orthographic projection of the cathode 431 on the substrate 1, the first protective layer 5 can effectively protect the underlying pixel definition layer 2 when the first color light-emitting layer 421 is patterned, and prevent the area on the pixel definition layer 2 corresponding to the first protective layer 5 from being etched to form a pit, or reduce the depth of the pit, thereby avoiding affecting the continuity of cathode film formation, and further avoiding cathode disconnection and the formation of dark spots, thereby improving the display effect of the display panel 100.

[0111] At the same time, the first protective layer 5 is prepared before the first color light emitting layer 421 is prepared, and is removed when the first color light emitting layer 421 is patterned, so as to avoid the residual first protective layer 5 affecting the display effect of the display panel 100. Figure 4 .

[0112] Preferably, the patterning is achieved by etching or the like. The material of the first protective layer 5 may include a metal material, which has a strong etching resistance. Further, the first protective layer 5 may be made of the same material as the cathode layer 43, and a mask plate may be used to achieve precise coating.

[0113] Please refer to Figure 4 As shown, in one embodiment, the isolation structure 3 includes a support portion 32 and a crown portion 33, the crown portion 33 is located on the side of the support portion 32 away from the substrate 1, the area of ​​the orthographic projection of the support portion 32 on the substrate 1 is smaller than the area of ​​the orthographic projection of the crown portion 33 on the substrate 1, and the orthographic projection of the support portion 32 on the substrate 1 is located within the orthographic projection of the crown portion 33 on the substrate 1, so that the isolation structure 3 forms a T-shaped structure, so that the isolation structure 3 can effectively block the light-emitting functional layer 42 of the adjacent light-emitting unit 4, so as to reduce the current crosstalk problem of the adjacent light-emitting units 4.

[0114] Preferably, the orthographic projection of the first protective layer 5 on the substrate 1 at least partially overlaps with the orthographic projection of the crown 33 on the substrate 1, and has no overlap with the orthographic projection of the support portion 32 on the substrate 1, thereby protecting the area below the crown 33 of the pixel definition layer 2 corresponding to the pixel definition layer 2, and at the same time, avoiding the first protective layer 5 from overlapping the support portion 32 and avoiding electrical connection with the support portion 32.

[0115] Preferably, the support portion 32 is a conductive structure, and the cathode layer 43 is electrically connected to the support portion 32, so that the support portion 32 of the isolation structure 3 connects the cathode 431 in series, so that the support portion 32 and the cathode 431 constitute a common electrode for easy driving.

[0116] Among them, the material of the cathode layer 43 can be a metal material. The smaller the thickness of the cathode layer 43, the higher its transmittance, but the higher its resistivity. If the thickness of the cathode layer 43 is too small, when the isolation structure 3 is not set, the voltage drop of the cathode 431 (the common electrode at this time) will be too large. In this embodiment, the cathode 431 is connected to the conductive support part 32, which can remove the thickness restriction of the cathode layer 43, so that the cathode layer 43 has a smaller thickness to have a higher transmittance.

[0117] Reference Figure 5 As shown, in one embodiment, the pixel opening 22 further includes a third type of pixel opening 223 , the light-emitting function layer 42 further includes a third color light-emitting layer 423 , and the third color light-emitting layer 423 is disposed in the third type of isolation opening 313 .

[0118] The third type of isolation opening 313 corresponds to the third type of pixel opening 223 , and the first color light emitting layer 421 , the second color light emitting layer 422 , and the third color light emitting layer 423 are three light emitting layers for emitting light of different colors, specifically red light, green light, and blue light.

[0119] Please continue to refer to Figure 5 As shown, in one embodiment, the display panel 100 also includes a second protective layer 6, which is arranged on the side of the pixel definition layer 2 away from the substrate 1 and is located at the third type of isolation opening 313, and the orthographic projection of the second protective layer 6 on the substrate 1 at least partially overlaps with the orthographic projection of the isolation structure 3 on the substrate 1.

[0120] Among them, the second protective layer 6 can protect the pixel definition layer 2 within the third type pixel opening 223, and prevent the area on the pixel definition layer 2 corresponding to the second protective layer 6 from being etched to form pits when the first color light-emitting layer 421 is patterned, that is, the area on the pixel definition layer 2 corresponding to the second protective layer 6 is protected from experiencing one less etching, and even when the second color light-emitting layer 422 is patterned, the area on the pixel definition layer 2 corresponding to the second protective layer 6 will not be severely etched, and will not affect the continuity of the cathode film formation.

[0121] Preferably, the orthographic projection of the second protective layer 6 on the substrate 1 at least partially overlaps with the orthographic projection of the crown 33 on the substrate 1, and has no overlap with the orthographic projection of the support portion 32 on the substrate 1, thereby protecting the area below the crown 33 of the pixel definition layer 2 corresponding to the pixel definition layer 2, and at the same time, avoiding the second protective layer 6 from overlapping the support portion 32 and avoiding electrical connection with the support portion 32.

[0122] Preferably, the second protective layer 6 is prepared before the first color light emitting layer 421 is prepared, and is removed when the first color light emitting layer 421 is patterned, thereby preventing the residual second protective layer 6 from affecting the display effect of the display panel 100 .

[0123] Preferably, the material of the second protective layer 6 includes metal, which has strong etching resistance. Further, the material of the second protective layer 6 is the same as that of the cathode layer 43, and a mask is used to achieve precise coating.

[0124] Preferably, the first protective layer 5 and the second protective layer 6 are prepared by the same process and can be prepared by precise coating using a mask, which is beneficial to improving the production efficiency of the display panel 100 .

[0125] Preferably, the material of the first protective layer 5 is the same as that of the second protective layer 6, and the thicknesses of the first protective layer 5 and the second protective layer 6 are the same, which can ensure that the first protective layer 5 and the second protective layer 6 are accurately removed at the same time when the first color light-emitting layer 421 is patterned.

[0126] In one embodiment, the display panel 100 further includes a third protective layer, which is disposed on a side of the pixel definition layer 2 away from the substrate 1 and is located within a third type of isolation opening 313 , and an orthographic projection of the third protective layer on the substrate 1 at least partially overlaps with an orthographic projection of the isolation structure 3 on the substrate 1 .

[0127] The positions of the third protective layer and the second protective layer 6 are the same, and the second protective layer 6 and the first protective layer 5 are removed at the same time when the first color light emitting layer 421 is patterned. Therefore, after the second protective layer 6 is removed, the third protective layer is continuously provided at the same position, so that the area corresponding to the third protective layer on the pixel definition layer 2 is prevented from being etched to form pits when the second color light emitting layer 422 is patterned, thereby ensuring the continuity of cathode film formation. The material of the third protective layer can be the same as that of the first protective layer 5.

[0128] Preferably, the orthographic projection of the third protective layer on the substrate 1 at least partially overlaps with the orthographic projection of the crown 33 on the substrate 1, and has no overlap with the orthographic projection of the support portion 32 on the substrate 1, thereby protecting the area below the crown 33 of the pixel definition layer 2 corresponding to the pixel definition layer 2, and at the same time, avoiding the third protective layer 7 from overlapping the support portion 32 and avoiding electrical connection with the support portion 32.

[0129] Preferably, the third protective layer is prepared after the first color light emitting layer 421 is prepared, and is removed when the second color light emitting layer 422 is patterned, thereby preventing the residual third protective layer from affecting the display effect of the display panel 100 .

[0130] Preferably, the material of the third protective layer includes metal, which has strong etching resistance. Further, the material of the third protective layer is the same as that of the cathode layer 43, and a mask is used to achieve precise coating.

[0131] Please refer to Figure 6 As shown, in one embodiment, the second protective layer 6 is prepared before the first color light-emitting layer 421 is prepared, and is thinned when the first color light-emitting layer 421 is patterned. The thinned second protective layer 6 is removed when the second color light-emitting layer 422 is patterned.

[0132] The second protective layer 6 is removed after being etched twice, so there is no need to set a third protective layer, thus reducing one process step.

[0133] Preferably, the material of the second protective layer 6 is the same as that of the first protective layer 5, and the thickness of the second protective layer 6 is greater than that of the first protective layer 5, so that the second protective layer 6 can be thinned when the first color light-emitting layer 421 is patterned, and removed when the second color light-emitting layer 422 is patterned. In another embodiment, the material of the second protective layer 6 is different from that of the first protective layer 5, and the etching resistance of the two is different, and the thickness can be set according to the etching resistance, and there is no specific limitation.

[0134] Please continue to refer to Figure 4 As shown, in one embodiment, the display panel 100 further includes an encapsulation layer 8 , which covers the cathode layer 43 and the isolation structure 3 , and is used to protect the light-emitting unit 4 and the isolation structure 3 .

[0135] Reference Figure 8 As shown, another embodiment of the present application discloses a display panel 100, which includes a substrate 1, an anode layer 41, a pixel definition layer 2, an isolation structure 3, a light-emitting functional layer 42, a cathode layer 43 and a first protective layer.

[0136] An anode layer 41 is arranged on one side of the substrate 1, and the anode layer 41 includes a plurality of anodes 411; a pixel definition layer 2 and the anode layer 41 are arranged on the same side of the substrate 1, and a plurality of pixel openings 22 exposing the anodes 411 are formed on the pixel definition layer 2; an isolation structure 3 is arranged on a side of the pixel definition layer 2 away from the substrate 1, and the isolation structure 3 encloses a plurality of isolation openings 31 corresponding to the pixel openings 22, and the isolation openings 31 include a first type of isolation openings 311 and a third type of isolation openings 313; a light-emitting functional layer 42 is arranged in the isolation openings 31 and covers the anodes 411, and the light-emitting functional layer 42 is separated by the isolation structure 3, and the light-emitting functional layer 42 includes a first color light-emitting layer 421 respectively arranged in the first type of isolation openings 311 and a third color light-emitting layer 423 arranged in the third type of isolation openings 313; a cathode layer 43 is arranged in the isolation openings 31 and covers the light-emitting functional layer 42, and the cathode layer 43 is separated into a plurality of cathodes 431 by the isolation structure 3.

[0137] A first pit 211 is formed on the pixel definition layer 2 , the first pit 211 is located in the third type isolation opening 313 , and the orthographic projection of the first pit 211 on the substrate 1 is located in the orthographic projection of the isolation structure 3 on the substrate 1 .

[0138] In this embodiment, the first protective layer can be set in the area corresponding to the first pit 211 on the pixel definition layer 2 to effectively protect the underlying pixel definition layer 2, effectively reduce the depth of the first pit 211 on the pixel definition layer 2 caused by dry etching of the encapsulation layer, and reduce the impact on the continuity of the subsequent cathode layer film.

[0139] In one embodiment, the pixel opening 22 also includes a second type of isolation opening 312, and the light-emitting function layer 42 also includes a second color light-emitting layer 422, and the second color light-emitting layer 422 is at least partially arranged in the second type of isolation opening 312; wherein a second pit 212 is formed on the pixel definition layer 2, the second pit 212 is located in the second type of isolation opening 312, and the orthographic projection of the second pit 212 on the substrate 1 is located in the orthographic projection of the isolation structure 3 on the substrate 1.

[0140] In this embodiment, the first protective layer 5 can be simultaneously disposed in the area corresponding to the first pit 211 and the area corresponding to the second pit 212 on the pixel definition layer 2, so as to effectively protect the underlying pixel definition layer 2, effectively reduce the depth of the first pit 211 and the second pit 212 on the pixel definition layer 2 caused by dry etching of the encapsulation layer, and reduce the impact on the continuity of the subsequent cathode layer film.

[0141] Preferably, the depth of the second pit 212 is less than the depth of the first pit 211; wherein, since the area corresponding to the second pit 212 needs to undergo one dry etching, while the area corresponding to the first pit 211 undergoes two dry etchings, when the thickness of the protective layer for the two pits is the same, the depth of the second pit 212 will be less than the depth of the first pit 211. In other embodiments, the depth of the first pit 211 can be reduced by increasing the thickness of the protective layer in the area corresponding to the first pit 211.

[0142] Preferably, the first pit 211 is annular, and the orthographic projection of the first pit 211 on the substrate 1 surrounds the orthographic projection of the second-type pixel opening 222 on the substrate 1 .

[0143] Preferably, the second pit 212 is annular, and the orthographic projection of the second pit 212 on the substrate 1 surrounds the orthographic projection of the third-type pixel opening 223 on the substrate 1 .

[0144] Reference Fig. 9 As shown, another embodiment of the present application discloses a method for preparing a display panel, which includes the following steps:

[0145] Step S1 : forming an anode layer 41 on one side of a substrate 1 , wherein the anode layer 41 includes a plurality of anodes 411 .

[0146] Step S2 , forming a pixel definition layer 2 on the same side of the anode layer 41 as the substrate 1 , and forming a plurality of pixel openings 22 exposing the anode 411 on the pixel definition layer 2 .

[0147] Step S3 , forming an isolation structure 3 on a side of the pixel definition layer 2 away from the substrate 1 , the isolation structure 3 enclosing a plurality of isolation openings 31 corresponding to the pixel openings 22 , the isolation openings 31 including first type isolation openings 311 and second type isolation openings 312 .

[0148] Step S4, forming a first protective layer 5 on the side of the pixel definition layer 2 away from the substrate 1 and in the second type isolation opening 312; the orthographic projection of the first protective layer 5 on the substrate 1 and the orthographic projection of the isolation structure 3 on the substrate 1 at least partially overlap; Fig.10a .

[0149] Step S5, forming a first color light emitting layer 421 and a first cathode layer 432 on the isolation structure 3 and in the isolation opening 31; the first color light emitting layer 421 covers the first protective layer 5; Fig.10b .

[0150] Step S6, patterning the first cathode layer 432 and the first color light-emitting layer 421 to remove the first cathode layer 432 and the first color light-emitting layer 421 on the isolation structure 3 and in the second type isolation opening 312, and the first protective layer 5, and retaining the first cathode layer 432 and the first color light-emitting layer 421 in the first type isolation opening 311; Fig.10c .

[0151] Step S7 , forming a second color light emitting layer 422 and a second cathode layer 433 on the isolation structure 3 and in the isolation opening 31 .

[0152] Step S8, patterning the second cathode layer 433 and the second color light-emitting layer 422 to remove the second cathode layer 433 and the second color light-emitting layer 422 on the isolation structure 3 and in the first type of isolation opening 311, and retaining the second cathode layer 433 and the second color light-emitting layer 422 in the second type of isolation opening 312, referring to Fig.10d .

[0153] The pixel openings 22 include first-type pixel openings 221 and second-type pixel openings 222 . The first-type isolation openings 311 correspond to the first-type pixel openings 221 , and the second-type isolation openings 312 correspond to the second-type pixel openings 222 .

[0154] The present embodiment provides a method for preparing a display panel, wherein a first protective layer 5 is disposed on a side of a pixel definition layer 2 away from a substrate 1, and the orthographic projection of the first protective layer 5 on the substrate 1 is located within the orthographic projection of the second color light-emitting layer 422 and the isolation structure 3 on the substrate 1. The first protective layer 5 can effectively protect the underlying pixel definition layer 2 when the first color light-emitting layer 421 is patterned, thereby preventing an area on the pixel definition layer 2 corresponding to the first protective layer 5 from being etched to form a pit, or reducing the depth of the pit, thereby avoiding affecting the continuity of cathode film formation, and further avoiding cathode short circuit and formation of dark spots, thereby improving the display effect of the display panel 100.

[0155] Reference Fig.11a As shown, in one embodiment, the pixel opening 22 further includes a third type of pixel opening 223. Step S8, after patterning the second cathode layer 433 and the second color light emitting layer 422, further includes the following steps:

[0156] Step S21, forming a third color light emitting layer 423 and a third cathode layer 434 on the isolation structure 3 and in the isolation opening 31. The light emitting functional layer 42 further includes a third color light emitting layer 423, which is disposed in the third type pixel opening 223. Fig.11b .

[0157] Step S22, patterning the third cathode layer 434 and the third color light emitting layer 423 to remove the third cathode layer 434 and the third color light emitting layer 423 on the isolation structure 3, in the first type isolation opening 311 and the second type isolation opening 312, and retaining the third cathode layer 434 and the third color light emitting layer 423 in the third type isolation opening 313, referring to Fig.11c .

[0158] Step S7, before forming the first color light emitting layer 421 and the first cathode layer 432 on the isolation structure 3 and in the isolation opening 31, the following steps are also included:

[0159] Step S31, forming a second protective layer 6 on the side of the pixel definition layer 2 away from the substrate 1 and in the third type isolation opening 313; the orthographic projection of the second protective layer 6 on the substrate 1 and the orthographic projection of the isolation structure 3 on the substrate 1 at least partially overlap, refer to Fig.11b .

[0160] Step S32 , when forming the first color light emitting layer 421 on the isolation structure 3 and in the isolation opening 31 , the first color light emitting layer 421 covers the second protection layer 6 .

[0161] Step S33: When patterning the first cathode layer 432 and the first color light emitting layer 421, the second protective layer 6 is removed.

[0162] Among them, the second protective layer 6 and the first protective layer 5 are removed at the same time, and the second protective layer 6 can protect the pixel definition layer 2 in the third type isolation opening 313, so as to prevent the area on the pixel definition layer 2 corresponding to the second protective layer 6 from being etched to form pits when the first color light-emitting layer 421 is patterned, that is, the area on the pixel definition layer 2 corresponding to the second protective layer 6 is protected from being etched once less, and even when the second color light-emitting layer 422 is patterned, the area on the pixel definition layer 2 corresponding to the second protective layer 6 will not be severely etched, and will not affect the continuity of the cathode film formation.

[0163] In one embodiment, after step S6, patterning the first cathode layer 432 and the first color light-emitting layer 421, and before step S7, forming the second color light-emitting layer 422 on the isolation structure 3 and in the isolation opening 31, the following steps are further included:

[0164] Step S41, forming a third protective layer 7 in the isolation opening 31 corresponding to the third type isolation opening 313 on the side of the pixel definition layer 2 away from the substrate 1; the orthographic projection of the third protective layer 7 on the substrate 1 is located at least partially overlapped with the orthographic projection of the isolation structure 3 on the substrate 1, referring to Fig.12 shown.

[0165] Step S42 , when forming the second color light emitting layer 422 on the isolation structure 3 and in the pixel opening, the second color light emitting layer 422 covers the third protection layer 7 .

[0166] Step S43: When patterning the second cathode layer 433 and the second color light emitting layer 422, the third protection layer 7 is removed.

[0167] In one embodiment, before step S5, forming the first color light emitting layer 421 on the isolation structure 3 and in the isolation opening 31, the following steps are also included:

[0168] Step S51, forming a second protection layer 6 on a side of the pixel definition layer 2 away from the substrate 1 and within the third type isolation opening 313; the orthographic projection of the second protection layer 6 on the substrate 1 is located within the orthographic projection of the isolation structure 3 on the substrate 1;

[0169] Step S52, when forming the first color light emitting layer 421 on the isolation structure 3 and in the isolation opening 31, the first color light emitting layer 421 covers the second protection layer 6;

[0170] Step S53, when patterning the first color light emitting layer 421, the second protective layer 6 is thinned;

[0171] Step S54: When patterning the second color light emitting layer 422, the thinned second protection layer 6 is removed.

[0172] The display panel 100 prepared by the method for preparing a display panel in this embodiment can refer to the above display panel embodiments, and has the same structure, principle and technical effects as those in the above embodiments, which will not be described in detail herein.

[0173] Another embodiment of the present application discloses a display device, which includes the display panel 100 in the above embodiment. Further, the display device includes a mobile phone, a VR device, a computer, a television, a car display device, etc.

[0174] The display device provided in this embodiment, its display panel 100, by arranging the first protective layer 5 on the side of the pixel definition layer 2 away from the substrate 1, and the orthographic projection of the first protective layer 5 on the substrate 1 is located within the orthographic projection of the second color light-emitting layer 422 and the isolation structure 3 on the substrate 1, the first protective layer 5 can effectively protect the underlying pixel definition layer 2 when the first color light-emitting layer 421 is patterned, and prevent the area on the pixel definition layer 2 corresponding to the first protective layer 5 from being etched to form pits, thereby avoiding affecting the continuity of cathode film formation, and further avoiding cathode disconnection and formation of dark spots, thereby improving the display effect of the display device.

[0175] Patent applications PCT / CN2023 / 134518, 202310759370.2, 202310740412.8, 202310707209.0, and 202311346196.5 record relevant technical solutions of the isolation structure 2, and their contents are incorporated into this application by reference for reference.

[0176] Although the present application has been described in conjunction with specific embodiments thereof, many alternatives, modifications and variations of these embodiments will be apparent to those skilled in the art in light of the foregoing description.

[0177] It should be noted that the above describes some embodiments of the present application. Other embodiments are within the scope of the appended claims. In some cases, the actions or steps recorded in the claims can be performed in an order different from that in the above embodiments and still achieve the desired results. In addition, the processes depicted in the accompanying drawings do not necessarily require the specific order or continuous order shown to achieve the desired results. In some embodiments, multitasking and parallel processing are also possible or may be advantageous.

[0178] The embodiments of the present application are intended to cover all such substitutions, modifications and variations that fall within the broad scope of the appended claims. Therefore, any omissions, modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the embodiments of the present application should be included in the scope of protection of the present application.

Claims

1. A display panel, characterized in that: include: substrate; an anode layer, disposed on one side of the substrate, the anode layer comprising a plurality of anodes; A pixel definition layer is disposed on the same side of the substrate as the anode layer, and a plurality of pixel openings for exposing the anode are formed on the pixel definition layer; An isolation structure is arranged on a side of the pixel definition layer away from the substrate, the isolation structure encloses a plurality of isolation openings corresponding to the pixel openings; the isolation openings include a first type of isolation openings and a second type of isolation openings; a light-emitting functional layer, arranged in the isolation opening and covering the anode, the light-emitting functional layer being separated by the isolation structure, and comprising a first color light-emitting layer respectively arranged in the first type of isolation opening and a second color light-emitting layer respectively arranged in the second type of isolation opening; A cathode layer, disposed in the isolation opening and covering the light-emitting functional layer, wherein the cathode layer is divided into a plurality of cathodes by the isolation structure; The first protection layer is disposed on a side of the pixel definition layer away from the substrate and is located in the second type isolation opening, and the orthographic projection of the first protection layer on the substrate at least partially overlaps with the orthographic projection of the isolation structure on the substrate.

2. The display panel according to claim 1, wherein: The isolation structure comprises a support portion and a crown portion, wherein the crown portion is located on a side of the support portion away from the substrate, an area of ​​an orthographic projection of the support portion on the substrate is smaller than an area of ​​an orthographic projection of the crown portion on the substrate, and the orthographic projection of the support portion on the substrate is located within an orthographic projection of the crown portion on the substrate; Preferably, the orthographic projection of the first protective layer on the substrate at least partially overlaps with the orthographic projection of the crown portion on the substrate, and does not overlap with the orthographic projection of the support portion on the substrate; Preferably, the support portion is a conductive structure, and the cathode layer is electrically connected to the support portion; Preferably, the display panel further comprises an encapsulation layer, and the encapsulation layer covers the cathode layer and the isolation structure.

3. The display panel according to claim 2, wherein: The isolation opening further includes a third type of isolation opening, the light-emitting functional layer further includes a third color light-emitting layer, and the third color light-emitting layer is arranged in the third type of isolation opening; the display panel further includes: A second protective layer is disposed on a side of the pixel definition layer away from the substrate and is located in the third type of isolation opening, wherein an orthographic projection of the second protective layer on the substrate at least partially overlaps an orthographic projection of the isolation structure on the substrate; Preferably, the orthographic projection of the second protective layer on the substrate at least partially overlaps with the orthographic projection of the crown portion on the substrate, and does not overlap with the orthographic projection of the support portion on the substrate; Preferably, the second protective layer is prepared before the first color light-emitting layer is prepared, and is removed when the first color light-emitting layer is patterned; Preferably, the first protective layer and the second protective layer are prepared by the same process; Preferably, the material of the second protective layer includes metal; Preferably, the material of the second protective layer is the same as that of the cathode layer; Preferably, the material of the first protective layer is the same as that of the second protective layer, and the thickness of the first protective layer and the second protective layer are the same.

4. The display panel according to claim 3, wherein: The display panel further includes: A third protection layer is disposed on a side of the pixel definition layer away from the substrate and is located in the third type of isolation opening, wherein an orthographic projection of the third protection layer on the substrate at least partially overlaps with an orthographic projection of the isolation structure on the substrate; Preferably, the orthographic projection of the third protective layer on the substrate at least partially overlaps with the orthographic projection of the crown portion on the substrate, and does not overlap with the orthographic projection of the support portion on the substrate; Preferably, the third protective layer is prepared after the one-color light-emitting layer is prepared, and is removed when the second-color light-emitting layer is patterned; Preferably, the material of the third protective layer includes metal; Preferably, the material of the third protective layer is the same as that of the cathode layer.

5. The display panel according to claim 3, wherein: The second protective layer is prepared before the first color light-emitting layer is prepared, and is thinned when the first color light-emitting layer is patterned. The thinned second protective layer is removed when the second color light-emitting layer is patterned.

6. The display panel according to claim 1, wherein: The first protective layer is prepared before the first color light-emitting layer is prepared, and is removed when the first color light-emitting layer is patterned; Preferably, the material of the first protective layer includes metal; Preferably, the material of the first protection layer is the same as that of the cathode layer.

7. A display panel, characterized in that: include: substrate; an anode layer, disposed on one side of the substrate, the anode layer comprising a plurality of anodes; A pixel definition layer is disposed on the same side of the substrate as the anode layer, and a plurality of pixel openings for exposing the anode are formed on the pixel definition layer; An isolation structure is arranged on a side of the pixel definition layer away from the substrate, the isolation structure encloses a plurality of isolation openings corresponding to the pixel openings; the isolation openings include a first type of isolation openings and a third type of isolation openings; a light-emitting functional layer, arranged in the isolation opening and covering the anode, the light-emitting functional layer being separated by the isolation structure, the light-emitting functional layer comprising a first color light-emitting layer at least partially arranged in the first type of isolation opening, and a third color light-emitting layer at least partially arranged in the third type of isolation opening; A cathode layer, disposed in the isolation opening and covering the light-emitting functional layer, wherein the cathode layer is divided into a plurality of cathodes by the isolation structure; A first pit is formed on the pixel definition layer, the first pit is located in the third type isolation opening, and at least part of the orthographic projection of the first pit on the substrate is located in the orthographic projection of the isolation structure on the substrate.

8. The display panel according to claim 7, wherein: The isolation openings further include a second type of isolation openings, the light-emitting functional layer further includes a second color light-emitting layer, and the second color light-emitting layer is arranged in the second type of isolation openings; A second pit is formed on the pixel definition layer, the second pit is located in the second type of isolation opening, and the orthographic projection of the second pit on the substrate is located in the orthographic projection of the isolation structure on the substrate; Preferably, the depth of the second pit is less than the depth of the first pit; Preferably, the pixel openings include first-type pixel openings located in the first-type isolation openings, second-type pixel openings located in the second-type isolation openings, and third pixel openings located in the third-type isolation openings, the first concave pit is annular, and the orthographic projection of the first concave pit on the substrate surrounds the orthographic projection of the third-type pixel opening on the substrate; Preferably, the second concave pit is annular, and the orthographic projection of the second concave pit on the substrate surrounds the orthographic projection of the second type pixel opening on the substrate; Preferably, the isolation structure comprises a support portion and a crown portion, the crown portion is located on a side of the support portion away from the substrate, an area of ​​an orthographic projection of the support portion on the substrate is smaller than an area of ​​an orthographic projection of the crown portion on the substrate, and the orthographic projection of the support portion on the substrate is located within an orthographic projection of the crown portion on the substrate; Preferably, the support portion is a conductive structure, and the cathode layer is electrically connected to the support portion; Preferably, the display panel further comprises an encapsulation layer, and the encapsulation layer covers the cathode layer and the isolation structure.

9. A method for preparing a display panel, characterized in that: include: forming an anode layer on one side of the substrate, wherein the anode layer includes a plurality of anodes; forming a pixel definition layer on the same side of the anode layer as the substrate, wherein a plurality of pixel openings exposing the anode are formed on the pixel definition layer; An isolation structure is formed on a side of the pixel definition layer away from the substrate, wherein the isolation structure encloses a plurality of isolation openings corresponding to the pixel openings; the isolation openings include a first type of isolation openings and a second type of isolation openings; forming a first protective layer on a side of the pixel definition layer away from the substrate and in the second type of isolation opening; The orthographic projection of the first protection layer on the substrate at least partially overlaps with the orthographic projection of the isolation structure on the substrate; forming a first color light emitting layer and a first cathode layer on the isolation structure and in the isolation opening; The first color light emitting layer covers the first protective layer; Patterning the first cathode layer and the first color light-emitting layer to remove the first cathode layer and the first color light-emitting layer on the isolation structure and in the second type of isolation openings, and the first protective layer, and retaining the first cathode layer and the first color light-emitting layer in the first type of isolation openings; forming a second color light emitting layer and a second cathode layer on the isolation structure and in the isolation opening; The second cathode layer and the second color light-emitting layer are patterned to remove the second cathode layer and the second color light-emitting layer on the isolation structure and in the first type of isolation openings, and retain the second cathode layer and the second color light-emitting layer in the second type of isolation openings.

10. The method for manufacturing a display panel according to claim 9, wherein: The pixel openings also include a third type of pixel openings; After patterning the second cathode layer and the second color light-emitting layer, the method further includes: forming a third color light emitting layer and a third cathode layer on the isolation structure and in the isolation opening; Patterning the third cathode layer and the third color light-emitting layer to remove the third cathode layer and the third color light-emitting layer on the isolation structure, in the first type of isolation openings and in the second type of isolation openings, and retaining the third cathode layer and the third color light-emitting layer in the third type of isolation openings; Before forming the first color light emitting layer and the first cathode layer on the isolation structure and in the isolation opening, the method further includes: A second protective layer is formed on a side of the pixel definition layer away from the substrate and in the third type isolation opening; the orthographic projection of the second protective layer on the substrate at least partially overlaps with the orthographic projection of the isolation structure on the substrate; When the first color light-emitting layer is formed on the isolation structure and in the isolation opening, the first color light-emitting layer covers the second protection layer; When patterning the first cathode layer and the first color light-emitting layer, removing the second protective layer; Preferably, after patterning the first cathode layer and the first color light-emitting layer and before forming the second color light-emitting layer on the isolation structure and in the isolation opening, the method further includes: A third protective layer is formed on a side of the pixel definition layer away from the substrate and within the third type isolation opening; the orthographic projection of the third protective layer on the substrate at least partially overlaps with the orthographic projection of the isolation structure on the substrate; When the second color light-emitting layer is formed on the isolation structure and in the isolation opening, the second color light-emitting layer covers the third protection layer; When patterning the second cathode layer and the second color light-emitting layer, removing the third protective layer; Preferably, before forming the first color light-emitting layer on the isolation structure and in the isolation opening, the method further comprises: A second protective layer is formed on a side of the pixel definition layer away from the substrate and in the third type isolation opening; the orthographic projection of the second protective layer on the substrate at least partially overlaps with the orthographic projection of the isolation structure on the substrate; When the first color light-emitting layer is formed on the isolation structure and in the isolation opening, the first color light-emitting layer covers the second protection layer; When the first color light emitting layer is patterned, the second protective layer is thinned; When the second color light emitting layer is patterned, the thinned second protective layer is removed.

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