Plasma parameter diagnosis system in vacuum chamber

Abstract

The invention relates to the technical field of electric propulsion, in particular to a plasma parameter diagnosis system in a vacuum chamber, which comprises a vacuum chamber, a plasma confinement acceleration device, a laser emitting device, a laser receiving device, a probe array, a microwave horn antenna array and a fixed bracket guide rail, wherein the plasma confinement acceleration device is arranged in the vacuum chamber; the laser emitting device is arranged on the fixed bracket guide rail on one side through a first adjusting bracket; the laser receiving device is arranged on the fixed support guide rail on the other side through a second adjusting support. The probe array is arranged in front of the plasma confinement acceleration device through the movable bracket; and the microwave horn antenna array is arranged on the side of the plasma confinement acceleration device. According to the invention, the synchronous measurement of the plasma state in multiple diagnosis modes can be realized, the plasma diagnosis time can be effectively saved, and the plasma performance can be measured and analyzed through multiple dimensions.

Description

Technical Field

[0001] The present application relates to the field of electric propulsion technology, and in particular to a plasma parameter diagnostic system in a vacuum chamber. Background Art

[0002] High-power electric propulsion systems will be the primary propulsion system for future large-scale spacecraft deep space exploration, large deep space shuttles, and manned lunar and Mars landings. Currently, a number of key technology research projects are underway for high-power electric propulsion systems, including electromagnetic propulsion, field-reversed plasma propulsion, and variable specific impulse electric propulsion. However, these propulsion technologies still face key technical difficulties, unclear research mechanisms, and a lack of understanding of new acceleration principles. Furthermore, for future advanced space electric propulsion systems, in addition to achieving plasma acceleration for spacecraft, the propulsion systems must also be expanded to implement additional functions, such as the reflection and absorption of electromagnetic wave signals.

[0003] In order to promote breakthroughs in key technical difficulties in the current new electric propulsion technology, deeply explore the research mechanism, and verify the effectiveness of the new plasma acceleration effect, it is necessary to conduct comprehensive and precise measurement and diagnosis of the physical parameters of the plasma. However, the existing devices cannot achieve close-range diagnosis of the plasma in the vacuum chamber, nor can they achieve diagnostic measurement of the multi-dimensional (time and space) physical parameters of the plasma. Summary of the Invention

[0004] The present application provides a plasma parameter diagnosis system in a vacuum chamber, which can realize comprehensive diagnosis of plasma performance parameters in a vacuum chamber and provide effective experimental support for plasma acceleration effect and plasma density measurement.

[0005] To achieve the above-mentioned objectives, the present application provides a plasma parameter diagnostic system in a vacuum chamber, comprising a vacuum chamber, a plasma confinement accelerator, a laser emitting device, a laser receiving device, a probe array, a microwave horn antenna array, and a fixed bracket guide rail, wherein: the plasma confinement accelerator is arranged inside the vacuum chamber and is sealed and connected to the ion source via a first adapter flange; the fixed bracket guide rails are arranged below the interior of the vacuum chamber, on both sides of the plasma confinement accelerator; the laser emitting device is arranged on the fixed bracket guide rail on one side via a first adjustment bracket; the laser receiving device is arranged on the fixed bracket guide rail on the other side via a second adjustment bracket, and is arranged opposite to the laser emitting device; the probe array is arranged in front of the plasma confinement accelerator via a movable bracket; the microwave horn antenna array is arranged on the side of the plasma confinement accelerator and is fixed to the fixed bracket guide rail on one side of the laser emitting device via a third adjustment bracket.

[0006] Furthermore, the laser emitting device includes a laser signal emitter and a laser emitting probe, wherein: the laser emitting probe is arranged inside the vacuum chamber and is arranged on the fixed bracket guide rail through the first adjustment bracket; the laser signal emitter is arranged outside the vacuum chamber and is connected to the laser emitting probe through the second adapter flange and cable.

[0007] Furthermore, the laser receiving device includes a laser receiver and a laser receiving probe, wherein: the laser receiving probe is arranged inside the vacuum chamber, and is arranged on the fixed bracket guide rail through the second adjustment bracket, and is arranged opposite to the laser transmitting probe; the laser receiver is arranged outside the vacuum chamber, and is connected to the laser receiving probe through a third adapter flange and a cable.

[0008] Furthermore, the probe array is a Langmuir probe array, which is connected to a probe acquisition system outside the vacuum chamber through a first circuit transfer blind plate and a cable.

[0009] Furthermore, the probe array collects plasma electrical signals at different positions by moving the bracket.

[0010] Furthermore, the microwave horn antenna array is connected to a microwave signal generating and receiving system outside the vacuum chamber through a second circuit transfer blind plate and a cable.

[0011] Furthermore, a metal baffle is provided inside the vacuum chamber. The metal baffle is arranged on the side of the plasma confinement accelerator and is arranged opposite to the microwave horn antenna array to reflect microwave signals.

[0012] Furthermore, a wave-absorbing material is provided below the interior of the vacuum chamber, and the wave-absorbing material is located between the two fixed bracket guide rails.

[0013] The present application provides a plasma parameter diagnostic system in a vacuum chamber, which has the following beneficial effects:

[0014] 1. This application realizes the vacuum-tight connection between the ion source and the vacuum chamber through an adapter flange, and uses a plasma confinement accelerator to realize the effective confinement and acceleration of the plasma in the ion source. It can realize the accurate measurement of plasma velocity and density, explore the acceleration effect of plasma under different working conditions, and at the same time realize the diagnosis of plasma parameters of the plasma acceleration plume part and the study of the interaction mechanism between microwave and plasma through the microwave horn antenna array and Langmuir probe array.

[0015] 2. The present application can realize the synchronous measurement of plasma state by multiple diagnostic methods, further shorten the diagnosis time, reduce the errors that may occur in measurement time and space, effectively save plasma diagnosis time and measure and analyze plasma performance in multiple dimensions, provide a more efficient measurement method for plasma confinement and acceleration effects, and provide experimental support for understanding the interaction mechanism between plasma and electromagnetic waves, and further provide diagnostic data support for the performance optimization of electric propulsion. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] The drawings that constitute part of this application are used to provide a further understanding of this application and make other features, objects and advantages of this application more apparent. The illustrative embodiment drawings of this application and their descriptions are used to explain this application and do not constitute an improper limitation of this application. In the drawings:

[0017] Figure 1 is a top view of a plasma parameter diagnostic system in a vacuum chamber provided according to an embodiment of the present application;

[0018] Figure 2 is a side view of a plasma parameter diagnostic system in a vacuum chamber provided according to an embodiment of the present application;

[0019] In the figure: 1-vacuum chamber, 2-plasma confinement accelerator, 21-first adapter flange, 31-laser signal transmitter, 32-laser transmitting probe, 33-first adjustment bracket, 34-second adapter flange, 41-laser receiver, 42-laser receiving probe, 43-third adapter flange, 5-probe array, 51-movable bracket, 52-first circuit transfer blind plate, 53-probe acquisition system, 6-microwave horn antenna array, 61-third adjustment bracket, 62-second circuit transfer blind plate, 63-microwave signal generating and receiving system, 7-fixed bracket guide rail, 8-metal baffle, 9-absorbing material. DETAILED DESCRIPTION

[0020] In order to enable those skilled in the art to better understand the present invention, the following will clearly and completely describe the technical solutions in the embodiments of the present invention in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments in the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts should fall within the scope of protection of this application.

[0021] It should be noted that the terms "first", "second", etc. in the specification and claims of the present application and the above-mentioned drawings are used to distinguish similar objects and are not necessarily used to describe a specific order or sequential order. It should be understood that the data used in this way can be interchanged where appropriate, so that the embodiments of the present application described here. In addition, the terms "including" and "having" and any of their variations are intended to cover non-exclusive inclusions. For example, a process, method, system, product or device that includes a series of steps or units is not necessarily limited to those steps or units clearly listed, but may include other steps or units that are not clearly listed or inherent to these processes, methods, products or devices.

[0022] In this application, terms such as "upper," "lower," "left," "right," "front," "back," "top," "bottom," "inner," "outer," "center," "vertical," "horizontal," "transverse," and "longitudinal" indicate positions or locations based on the positions or locations shown in the accompanying drawings. These terms are primarily intended to better describe this application and its embodiments and are not intended to limit the devices, elements, or components indicated to having a specific orientation, or to being constructed or operated in a specific orientation.

[0023] Furthermore, some of the above terms may be used to express other meanings besides indicating a position or location. For example, the term "on" may also be used to indicate a dependency or connection in certain circumstances. Those skilled in the art will understand the specific meanings of these terms in this application based on the specific circumstances.

[0024] Additionally, the term "plurality" shall mean two or more.

[0025] It should be noted that, in the absence of conflict, the embodiments and features of the embodiments in this application can be combined with each other. The present application will be described in detail below with reference to the accompanying drawings and in combination with the embodiments.

[0026] like Figure 1-2As shown, the present application provides a plasma parameter diagnostic system in a vacuum chamber, comprising a vacuum chamber 1, a plasma confinement accelerator 2, a laser emitting device, a laser receiving device, a probe array 5, a microwave horn antenna array 6 and a fixed bracket guide rail 7, wherein: the plasma confinement accelerator 2 is arranged inside the vacuum chamber 1 and is sealed with the ion source through a first adapter flange 21; the fixed bracket guide rail 7 is arranged at the bottom inside the vacuum chamber 1, and is located on both sides of the plasma confinement accelerator 2; the laser emitting device is arranged on the fixed bracket guide rail 7 on one side through a first adjustment bracket 33; the laser receiving device is arranged on the fixed bracket guide rail 7 on the other side through a second adjustment bracket, and is arranged opposite to the laser emitting device; the probe array 5 is arranged in front of the plasma confinement accelerator 2 through a movable bracket 51; the microwave horn antenna array 6 is arranged on the side of the plasma confinement accelerator 2, and is fixed to the fixed bracket guide rail 7 on one side of the laser emitting device through a third adjustment bracket 61.

[0027] Specifically, the plasma parameter diagnostic system in the vacuum chamber provided in the embodiment of the present application combines existing ion sources, vacuum equipment and diagnostic equipment, adopts contact and non-contact diagnostic methods, realizes close-range diagnosis of plasma in the vacuum chamber 1, and realizes diagnostic measurement of multi-dimensional (time, three-dimensional space) physical parameters of plasma, avoiding the influence of other media on the plasma diagnostic results.

[0028] More specifically, in the embodiment of the present application, the vacuum chamber 1 is used to ensure a vacuum environment and simulate the environment in which the plasma operates; the plasma confinement accelerator 2 is used to accelerate and directionally confine the plasma diffused from the ion source, and the first adapter flange 21 on the vacuum chamber 1 and the ion source are vacuum sealed to meet the experimental leakage rate requirements; an adjustable laser emitting device and a laser receiving device are used to realize the measurement and diagnosis of performance parameters such as the velocity and density of the plasma after confinement and acceleration; an adjustable microwave horn antenna array 6 is used to realize the diagnostic measurement of the influence of the plasma on the microwave signal; a probe array 5 is combined with a movable bracket 51 to realize the measurement of the plasma density and electron temperature at different positions in the downstream area after the plasma acceleration at the same time, thereby avoiding the consistency and repeatability of the results measured by a single probe at different positions.

[0029] Furthermore, the laser emitting device includes a laser signal emitter 31 and a laser emitting probe 32, wherein: the laser emitting probe 32 is arranged inside the vacuum chamber 1 and is arranged on the fixed bracket guide rail 7 through the first adjustment bracket 33; the laser signal emitter 31 is arranged outside the vacuum chamber 1 and is connected to the laser emitting probe 32 through the second adapter flange 34 and the cable.

[0030] Furthermore, the laser receiving device includes a laser receiver 41 and a laser receiving probe 42, wherein: the laser receiving probe 42 is arranged inside the vacuum chamber 1, and is arranged on the fixed bracket guide rail 7 through the second adjustment bracket, and is arranged opposite to the laser transmitting probe 32; the laser receiver 41 is arranged outside the vacuum chamber 1, and is connected to the laser receiving probe 42 through the third adapter flange 43 and the cable.

[0031] Specifically, the laser emitting device and the laser receiving device are respectively arranged on both sides in front of the plasma confinement accelerator 2. The laser signal transmitter 31 is used to generate a laser signal for diagnosing plasma physical parameters. The laser signal is transmitted from the atmospheric environment into the interior of the vacuum chamber 1 through the second adapter flange 34 and the cable. The laser emitting probe 32 is used to emit the laser, and the laser receiving probe 42 is used to receive the laser. The received laser signal enters the laser receiver 41 from the interior of the vacuum chamber 1 through the third adapter flange 43 and the cable. The laser receiver 41 is used to receive the laser signal that passes through the plasma and analyze and process the laser signal. That is, the embodiment of the present application uses the parameter changes of the laser passing through the plasma to invert the plasma physical parameters. The laser emitting probe 32 and the laser receiving probe 42 are arranged relative to each other and are both set on the fixed bracket guide rail 7 through the adjustment bracket. According to actual conditions, the position and height of the laser probe can be adjusted.

[0032] Furthermore, the probe array 5 is a Langmuir probe array, which is connected to a probe acquisition system 53 outside the vacuum chamber 1 through a first circuit transfer blind plate 52 and a cable.

[0033] Furthermore, the probe array 5 collects plasma electrical signals at different positions by moving the bracket 51 .

[0034] Specifically, in the embodiment of the present application, the probe array 5 is preferably a Langmuir probe array, which is moved by the movable bracket 51 to collect electrical signals of the plasma at different positions; the probe acquisition system 53 is used to collect and process the IV signals collected by the Langmuir probe array, and then calculate the density of the plasma.

[0035] Furthermore, the microwave horn antenna array 6 is connected to the microwave signal generating and receiving system 63 outside the vacuum chamber 1 through a second circuit transfer blind plate 62 and cables.

[0036] Furthermore, a metal baffle 8 is provided inside the vacuum chamber 1 . The metal baffle 8 is provided on the side of the plasma confinement accelerator 2 and is opposite to the microwave horn antenna array 6 for reflecting microwave signals.

[0037] Specifically, a metal baffle 8 is positioned opposite the microwave horn antenna to reflect the electromagnetic wave signals emitted by the microwave horn antenna. The microwave horn antenna array 6 transmits and receives electromagnetic wave signals generated by the microwave signal transmission and reception system 63, and collects the return signals to determine the plasma's attenuation of the microwave signals. The microwave horn antenna array 6 comprises multiple horn antennas, which are mounted on fixed support rails 7 via adjustable brackets. The position and height of the microwave horn antennas can be adjusted according to actual conditions.

[0038] Furthermore, an absorbing material 9 is provided below the interior of the vacuum chamber 1 and is located between the two fixing bracket rails 7. The absorbing material 9 is used to absorb stray electromagnetic wave signals in the vacuum chamber 1 and reduce the impact on the electromagnetic wave signals emitted by the horn antenna.

[0039] Specifically, the plasma parameter diagnostic system in the vacuum chamber provided in the embodiment of the present application can realize the effective diagnosis of plasma performance parameters (plasma density, electron temperature, plasma velocity, and plasma signal attenuation capability of microwaves) under a vacuum environment. It adopts a variety of diagnostic test methods to realize close-range, efficient, synchronous and accurate measurement and diagnosis of the physical parameters of the confined accelerated plasma in the vacuum chamber 1; a laser fluorescence diagnostic device, a plasma probe device and a microwave signal transceiver device are directly placed in the vacuum chamber 1, which realizes the diagnosis of plasma performance parameters without dielectric obstruction interference, solves the problem of deploying comprehensive diagnostic equipment for plasma confinement acceleration performance under vacuum environment, helps to master the optimization and adjustment of plasma confinement acceleration performance, and lays the foundation for new plasma confinement acceleration mechanism and comprehensive diagnosis of plasma performance.

[0040] The above description is merely a preferred embodiment of the present application and is not intended to limit the present application. Various modifications and variations are possible for those skilled in the art. Any modifications, equivalent substitutions, or improvements made within the spirit and principles of the present application shall be included within the scope of protection of the present application.

Claims

1. A plasma parameter diagnostic system in a vacuum chamber, characterized in that: It includes a vacuum chamber, a plasma confinement accelerator, a laser emitting device, a laser receiving device, a probe array, a microwave horn antenna array, and a fixed support rail, wherein: The plasma confinement accelerator is arranged inside the vacuum chamber and is sealed to the ion source via a first adapter flange; The fixed support guide rails are arranged below the interior of the vacuum chamber and on both sides of the plasma confinement accelerator; The laser emitting device is arranged on the fixed bracket guide rail on one side through a first adjustment bracket; The laser receiving device is arranged on the guide rail of the fixed bracket on the other side through the second adjustment bracket and is arranged opposite to the laser emitting device; The probe array is arranged in front of the plasma confinement accelerator through a movable bracket; The microwave horn antenna array is arranged on the side of the plasma confinement accelerator and is fixed to the fixed bracket guide rail on one side of the laser emitting device through a third adjustment bracket.

2. The plasma parameter diagnostic system in a vacuum chamber according to claim 1, characterized in that: The laser emitting device includes a laser signal transmitter and a laser emitting probe, wherein: The laser emission probe is arranged inside the vacuum chamber and is arranged on the fixed bracket guide rail through the first adjustment bracket; The laser signal transmitter is arranged outside the vacuum chamber and is connected to the laser emission probe via a second adapter flange and a cable.

3. The plasma parameter diagnostic system in a vacuum chamber according to claim 2, characterized in that: The laser receiving device includes a laser receiver and a laser receiving probe, wherein: The laser receiving probe is arranged inside the vacuum chamber, is arranged on the guide rail of the fixed bracket through the second adjustment bracket, and is arranged opposite to the laser transmitting probe; The laser receiver is arranged outside the vacuum chamber and is connected to the laser receiving probe via a third adapter flange and a cable.

4. The plasma parameter diagnostic system in a vacuum chamber according to claim 3, characterized in that: The probe array is a Langmuir probe array, which is connected to a probe acquisition system outside the vacuum chamber via a first circuit transfer blind plate and a cable.

5. The plasma parameter diagnostic system in a vacuum chamber according to claim 4, characterized in that: The probe array collects plasma electrical signals at different positions by moving the bracket.

6. The plasma parameter diagnostic system in a vacuum chamber according to claim 5, characterized in that: The microwave horn antenna array is connected to the microwave signal generating and receiving system outside the vacuum chamber through a second circuit transfer blind plate and a cable.

7. The plasma parameter diagnostic system in a vacuum chamber according to claim 6, characterized in that: A metal baffle is further provided inside the vacuum chamber. The metal baffle is arranged on the side of the plasma confinement accelerator and is arranged opposite to the microwave horn antenna array for reflecting microwave signals.

8. The plasma parameter diagnostic system in a vacuum chamber according to claim 7, characterized in that: A wave-absorbing material is further provided below the interior of the vacuum chamber, and the wave-absorbing material is located between the two fixing bracket guide rails.

Images