Direct drawing apparatus and direct drawing method

Abstract

The invention provides a direct drawing apparatus and a direct drawing method, which can continue exposure even if an optical modulation element has a failure. The direct drawing device includes: an optical modulation element having a plurality of elements arranged in correspondence with a sub-scanning direction, and for modulating light of a light source; and an exposure head for exposing the substrate with the light modulated by the optical modulation element, the control unit relatively moving the exposure head in the main scanning direction so as to expose the sub-exposure region with the light modulated by the selection element, and after the sub-exposure region is exposed, the exposure head moves the sub-exposure region with the light modulated by the selection element. The exposure head is relatively moved in the sub-scanning direction by an amount corresponding to the sub-exposure width.

Description

Technical Field

[0001] The technology disclosed in this application specification relates to substrate exposure. The substrates to be processed include, for example, semiconductor wafers, glass substrates for liquid crystal displays (LCDs), substrates for flat panel displays (FPDs) such as organic electroluminescence (EL) displays, substrates for optical disks, magnetic disks, magneto-optical disks, glass substrates for photomasks, ceramic substrates, substrates for field emission displays (FEDs), and substrates for solar cells. The technology relates particularly to a direct writing apparatus and method. Background Art

[0002] In direct drawing devices (maskless exposure devices) that directly perform exposure without using a photomask, the following method is widely used: an optical modulation element such as a digital micromirror device (DMD) or a grating light valve (GLV: registered trademark) is used instead of a photomask, the optical modulation element is operated according to exposure data, and the stage is scanned at the same time, thereby performing exposure.

[0003] Here, the optical modulation element is a micro electromechanical system (MEMS) having a fine and complex structure, and there is a concern about failure or poor performance.

[0004] On the other hand, for example, Japanese Patent Application Laid-Open No. 2023-122118 (Patent Document 1) discloses a technique for supplementing the exposure area of ​​an exposure head in which a failure is detected by using another exposure head.

[0005] [Prior art literature]

[0006] [Patent Document]

[0007] [Patent Document 1] Japanese Patent Application Laid-Open No. 2023-122118 Summary of the Invention

[0008] [Problems to be solved by the invention]

[0009] The technology disclosed in Patent Document 1 cannot be applied to a case where a malfunction occurs in an optical modulation element in an exposure device having a single exposure head.

[0010] The technology disclosed in this specification has been developed in view of the above-described problems, and is a technology for continuing exposure even when a malfunction occurs in an optical modulation element.

[0011] [Technical means to solve the problem]

[0012] The first form of direct drawing device disclosed in the specification of the present application is a direct drawing device for a substrate, and includes: a light source; an optical modulation element having a plurality of elements arranged corresponding to a sub-scanning direction and used to modulate the light of the light source; an exposure head for exposing the substrate using the light modulated by the optical modulation element; a first drive unit for moving the exposure head relative to the substrate in a main scanning direction intersecting the sub-scanning direction; a second drive unit for moving the exposure head relative to the substrate in the sub-scanning direction; and a control unit for controlling the modulation state of the light in the optical modulation element, the second drive unit, and the control unit. The operation of the first drive unit and the operation of the second drive unit are controlled, and a part of the multiple elements of the optical modulation element, that is, at least one element, is used as a selection element. The area exposed by the exposure head using the light modulated by the selection element is used as a sub-exposure area, and the width of the sub-exposure area in the sub-scanning direction is used as a sub-exposure width. The control unit causes the exposure head to move relatively in the main scanning direction to expose the sub-exposure area using the light modulated by the selection element. After the sub-exposure area is exposed, the exposure head is moved relatively in the sub-scanning direction by an amount corresponding to the sub-exposure width.

[0013] A direct drawing device according to a second aspect of the technology disclosed in this specification is related to the direct drawing device according to the first aspect, and the selection element includes a plurality of the elements arranged adjacent to each other.

[0014] The third form of direct drawing device as the technology disclosed in the specification of this application is associated with the first form or the second form of direct drawing device, and also includes a selection unit that selects the selection element from the plurality of elements, the selection unit determines the modulation state of the light of each element, and selects the selection element based on the result of the determination.

[0015] The fourth form of the direct drawing device as the technology disclosed in the specification of this application is associated with the direct drawing device as any one of the first to third forms, and the area exposed corresponding to all the elements of the optical modulation element is used as a full exposure area, and the area other than the sub-exposure area in the full exposure area is used as a residual area. After the sub-exposure area is exposed, the control unit moves the exposure head relatively in the sub-scanning direction by an amount corresponding to the sub-exposure width, and moves the exposure head relatively in the main scanning direction to expose the residual area using the light modulated by the selection element.

[0016] The fifth form of the direct drawing device as the technology disclosed in the specification of this application is associated with the direct drawing device as any one of the first form to the fourth form, and multiple selection elements are selected, and the selection elements include a first selection element and a second selection element. The control unit causes the exposure head to move relatively in the main scanning direction to expose the sub-exposure area using the light modulated by the first selection element. After the sub-exposure area is exposed, the exposure head is moved relatively in the sub-scanning direction by an amount corresponding to the sub-exposure width, and the exposure head is moved relatively in the main scanning direction to expose the same sub-exposure area using the light modulated by the second selection element.

[0017] The sixth form of direct drawing device as the technology disclosed in the specification of this application is associated with the direct drawing device as any one of the first to fifth forms, and the selection element is different before and after causing the exposure head to move relative to the sub-scanning direction by an amount corresponding to the sub-exposure width.

[0018] The seventh form of the direct drawing method as the technology disclosed in the specification of the present application is a direct drawing method for a substrate using a direct drawing device, the direct drawing device including: an optical modulation element having a plurality of elements arranged corresponding to a sub-scanning direction and used to modulate light from a light source; and an exposure head for exposing the substrate using the light modulated by the optical modulation element. In the direct drawing method, at least one of the plurality of elements of the optical modulation element is used as a selection element, an area exposed by the exposure head using the light modulated by the selection element is used as a sub-exposure area, and the width of the sub-exposure area in the sub-scanning direction is used as a sub-exposure width. The direct drawing method includes: a process of relatively moving the exposure head in a main scanning direction intersecting the sub-scanning direction to expose the sub-exposure area using the light modulated by the selection element; and a process of relatively moving the exposure head in the sub-scanning direction by an amount corresponding to the sub-exposure width after the sub-exposure area is exposed.

[0019] [Effects of the Invention]

[0020] According to at least the first and seventh aspects of the technology disclosed in this specification, even when an optical modulation element has a defect, light modulation and exposure can be performed using a selection element without a defect.

[0021] In addition, the objects, features, aspects, and advantages associated with the technology disclosed in this specification will become more apparent from the detailed description and drawings shown below. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] Figure 1 It is a side view showing the structure of the exposure apparatus according to the embodiment.

[0023] Figure 2 It is a plan view showing the structure of an exposure apparatus according to an embodiment.

[0024] Figure 3 This is a diagram illustrating the structure of an optical modulation element of an illumination optical system.

[0025] Figure 4 This is a diagram showing an example of the relationship between the exposure area on the substrate and the plurality of exposure heads.

[0026] Figure 5 This is a diagram conceptually showing the structure of a plurality of exposure heads.

[0027] Figure 6 This is a diagram conceptually showing a connection structure between each driving unit and a control unit of an exposure device.

[0028] Figure 7 This is a diagram showing an example of the relationship among the exposure area on the substrate, the head corresponding area of ​​the exposure head, and the selection zone of the optical modulation element.

[0029] Figure 8 It is a diagram showing an example of the relationship between the exposure area on the substrate and the head corresponding area of ​​the exposure head.

[0030] Figure 9 This is a diagram showing another example of the relationship among the exposure area on the substrate, the head corresponding area of ​​the exposure head, and the selection zone of the optical modulation element.

[0031] Figure 10 It is a diagram showing an example of the relationship between the exposure area on the substrate and the head corresponding area of ​​the exposure head.

[0032] Figure 11 It is a diagram showing an example of the relationship between the exposure area on the substrate and the head corresponding area of ​​the exposure head.

[0033] Figure 12 This is a diagram showing another example of the relationship among the exposure area on the substrate, the head corresponding area of ​​the exposure head, and the selection zone of the optical modulation element.

[0034] Figure 13 It is a diagram showing an example of the relationship between the exposure area on the substrate and the head corresponding area of ​​the exposure head.

[0035] Figure 14It is a diagram showing an example of the relationship between the exposure area on the substrate and the head corresponding area of ​​the exposure head.

[0036] Figure 15 This is a diagram showing an example of the variation in exposure amount for each sub-exposure region.

[0037] Explanation of Figure Numbers

[0038] 9: Substrate

[0039] 14A: Substrate

[0040] 14B: belt

[0041] 32a: Exposure head

[0042] 32b: Exposure head

[0043] 32c: Exposure head

[0044] 32d: Exposure head

[0045] 32e: Exposure head

[0046] 33A: Optical modulation element

[0047] 50: Control Department

[0048] 150a: Select belt

[0049] 150b: Select belt

[0050] 150c: Select belt

[0051] 150d: Select belt

[0052] 150e: Select belt

[0053] 150f: Select belt

[0054] 150g: Select belt

[0055] 150h: Select belt

[0056] 240a: Sub-exposure area

[0057] 240b: Sub-exposure area

[0058] 240c: Sub-exposure area

[0059] 240d: Sub-exposure area

[0060] 240e: Sub-exposure area

[0061] 240f: Sub-exposure area

[0062] 240g: Sub-exposure area

[0063] 240h: Sub-exposure area DETAILED DESCRIPTION

[0064] Hereinafter, embodiments will be described with reference to the accompanying drawings. In the following embodiments, detailed features and the like are shown for technical explanation, but these are merely examples and are not all essential features for implementing the embodiments.

[0065] The drawings are schematic and, for ease of explanation, may omit or simplify structures as appropriate. Furthermore, the relative sizes and positions of structures shown in different drawings are not necessarily accurately depicted and may be modified as appropriate. Furthermore, in drawings such as plan views, which are not cross-sectional views, hatching may be added to facilitate understanding of the embodiments.

[0066] In the following description, the same components are denoted by the same reference numerals and shown in the figures, and their names and functions are also assumed to be the same. Therefore, detailed descriptions thereof may be omitted in order to avoid redundancy.

[0067] Furthermore, when the descriptions in the specification of the present application state that a certain component is “included,” “comprising,” or “has” or the like, this does not constitute an exclusive statement excluding the presence of other components unless otherwise specified.

[0068] In addition, even if ordinal numbers such as "first" or "second" are sometimes used in the descriptions recorded in the specification of this application, these terms are used to facilitate understanding of the content of the implementation method, and the content of the implementation method is not limited to the order that may be generated by these ordinal numbers.

[0069] In addition, in the descriptions recorded in the specification of this application, expressions such as "positive direction of the...axis" or "negative direction of the...axis" are used to set the direction of the arrow along the illustrated...axis as the positive direction and the direction on the opposite side of the arrow of the illustrated...axis as the negative direction.

[0070] In addition, in the descriptions recorded in the specification of this application, even if terms such as "upper", "lower", "left", "right", "side", "bottom", "front" or "inside" are sometimes used to indicate specific positions or directions, these terms are used to facilitate understanding of the content of the implementation method and have nothing to do with the position or direction when the implementation method is actually implemented.

[0071] <Implementation Method>

[0072] Figure 1 : is a side view showing the structure of the exposure device (direct drawing device) related to this embodiment. Figure 2 It is a plan view showing the structure of the exposure apparatus (direct drawing apparatus) according to this embodiment.

[0073] like Figure 1 and Figure 2 In the illustrated example, the exposure apparatus 1 includes a stage 10 for holding a substrate 9; a stage drive unit 20 connected to the stage 10; a head unit 30 having a plurality of exposure heads (exposure head 32a, exposure head 32b, exposure head 32c, exposure head 32d, and exposure head 32e) arranged along the X-axis; and a control unit 50 for controlling the operation of each drive unit in the apparatus. The control unit 50 controls the controlled objects by executing a program stored in an internal or external recording medium (a volatile or non-volatile memory such as a hard disk drive (HDD), random access memory (RAM), read-only memory (ROM), or flash memory). For example, the control unit 50 includes a central processing unit (CPU), a microprocessor, or a microcomputer. Furthermore, the exposure apparatus 1 may include an irradiation light imaging unit 40 for imaging light emitted from each exposure head (irradiation light).

[0074] The stage 10 has a flat plate-like shape and serves as a holding portion for placing and holding the substrate 9 in a horizontal position on its upper surface. A plurality of suction holes (not shown here) are formed on the upper surface of the stage 10. Therefore, when the substrate 9 is placed on the stage 10, the suction pressure of the suction holes secures the substrate 9 to the upper surface of the stage 10. Furthermore, a layer of photosensitive material, such as a color resist, is formed on the surface of the substrate 9 held on the stage 10.

[0075] The stage drive unit 20 is a mechanism for moving the stage 10 in the main scanning direction (Y-axis direction), the sub-scanning direction (X-axis direction), and the rotational direction (rotational direction about the Z-axis). The stage drive unit 20 includes a rotation mechanism 21 for rotating the stage 10; a support plate 22 for rotatably supporting the stage 10; a sub-scanning mechanism 23 for moving the support plate 22 in the sub-scanning direction; a base plate 24 for supporting the support plate 22 via the sub-scanning mechanism 23; and a main scanning mechanism 25 for moving the base plate 24 in the main scanning direction.

[0076] The rotation mechanism 21 includes a linear motor 21a, which comprises a moving element mounted on the negative Y-axis end of the stage 10 and a stator mounted on the upper surface of the support plate 22. Furthermore, a rotation shaft 21b is provided between the lower surface of the center portion of the stage 10 and the support plate 22. Therefore, when the linear motor 21a is activated, the moving element moves along the stator in the X-axis direction, causing the stage 10 to rotate within a predetermined angle around the rotation shaft 21b on the support plate 22.

[0077] The sub-scanning mechanism 23 includes a linear motor 23a, which includes a moving element mounted on the lower surface of the support plate 22 and a stator mounted on the upper surface of the base plate 24. Furthermore, a pair of guides 23b extending in the sub-scanning direction are provided between the support plate 22 and the base plate 24. Therefore, when the linear motor 23a is activated, the support plate 22 moves in the sub-scanning direction along the guides 23b on the base plate 24. As the support plate 22 moves in the sub-scanning direction, the substrate 9 also moves in the sub-scanning direction, thereby causing the exposure head to move relative to the substrate 9 in the sub-scanning direction.

[0078] The main scanning mechanism 25 includes a linear motor 25a, which includes a moving element mounted on the lower surface of the base plate 24 and a stator mounted on the base 60 of the exposure device 1. Furthermore, a pair of guides 25b extending in the main scanning direction are provided between the base plate 24 and the base 60. Therefore, when the linear motor 25a is activated, the base plate 24 moves in the main scanning direction along the guides 25b on the base 60. As the base plate 24 moves in the main scanning direction, the substrate 9 also moves in the main scanning direction, thereby causing the exposure head to move relative to the substrate 9 in the main scanning direction.

[0079] The head unit 30 is a mechanism for irradiating the upper surface of the substrate 9 held on the stage 10 with pulsed light in a predetermined pattern. The head unit 30 comprises a frame 31 mounted on the base 60, spanning the stage 10 and the stage drive unit 20; and five exposure heads (exposure head 32a, exposure head 32b, exposure head 32c, exposure head 32d, and exposure head 32e) mounted on the frame 31 at equal intervals along the sub-scanning direction. Each exposure head is connected to a laser oscillator 34 via an illumination optical system 33. Furthermore, a laser drive unit 35 is connected to the laser oscillator 34.

[0080] Therefore, when the laser driving unit 35 is operated, pulse light is oscillated from the laser oscillator 34 , and the oscillated pulse light is introduced into each exposure head via the illumination optical system 33 .

[0081] The illumination optical system 33 includes at least one optical modulation element such as a GLV (registered trademark) or a DMD that modulates the pulse light oscillated from the laser oscillator 34. The configuration of the illumination optical system 33 will be described later.

[0082] Each exposure head is equipped with an emission unit 36 ​​for downwardly emitting pulsed light introduced from the illumination optical system 33, an aperture unit 37 for partially shielding the pulsed light, and a projection optical system 38 for forming an image of the pulsed light on the upper surface of the substrate 9. The aperture unit 37 includes an aperture AP, which is a glass plate formed with a predetermined light-shielding pattern. The pulsed light emitted from the emission unit 36 ​​is partially shielded when passing through the aperture AP of the aperture unit 37, and enters the projection optical system 38 as a beam of light with a predetermined pattern. The pulsed light that has passed through the projection optical system 38 is then irradiated onto the upper surface of the substrate 9, thereby drawing (exposing) a predetermined pattern on the photosensitive material on the substrate 9.

[0083] In addition, if Figure 1 In the conceptual example shown, each exposure head is equipped with an aperture driver 39 for adjusting the position of the aperture AP arranged in the aperture unit 37. The aperture driver 39 can select a pattern to be projected onto the substrate 9 or adjust the projection position of the pattern by adjusting the horizontal position of the aperture AP (including its tilt within the horizontal plane). Furthermore, the aperture driver 39 can also prohibit the application of pulsed light by shielding the entire irradiation area of ​​the pulsed light using the light shielding portion of the aperture AP. The aperture driver 39 can be constructed, for example, by combining multiple linear motors.

[0084] After a single exposure in the main scanning direction is completed, the exposure device 1 typically moves the stage 10 in the sub-scanning direction by an amount corresponding to the full exposure width W. The stage 10 is then moved again in the main scanning direction while pulsed light is emitted from each exposure head. In this manner, the exposure device 1 typically shifts the substrate 9 in the sub-scanning direction by the full exposure width W of the exposure head while repeating drawing (exposure) in the main scanning direction a predetermined number of times (e.g., four times), thereby forming a color filter pattern on the substrate 9.

[0085] Figure 3 3 is a diagram illustrating the structure of the optical modulation element 33A of the illumination optical system 33. Figure 3 As shown in the example, the optical modulation element 33A includes a substrate 14A and a plurality of strips 14B (microbridges) as movable lattices arranged in parallel on the substrate 14A. A plurality of slits 14C are formed between the strips 14B.

[0086] The portion other than the end portion of the belt 14B is located away from the substrate 14A. The lower surface facing the substrate 14A is composed of a flexible member containing SiNx, etc., and the upper surface opposite to the lower surface is composed of a reflective electrode film containing a single-layer metal film such as aluminum.

[0087] The plurality of belts 14B are arranged corresponding to the sub-scanning direction. Figure 3 In the embodiment, the plurality of belts 14B are arranged along the X-axis direction. Figure 4 In the case where the optical modulation element 33A is a DMD, as long as a part of the plurality of micro mirrors arranged in a two-dimensional manner corresponds to the sub-exposure area described later, Figure 4 The exposure areas in the sub-scanning direction (sub-exposure areas described later) may be arranged correspondingly.

[0088] The optical modulation element 33A is driven and controlled by turning on and off the voltage applied between the ribbon 14B and the substrate 14A. When the voltage is applied between the ribbon 14B and the substrate 14A, electrostatically induced charges generate an electrostatic attraction force between the ribbon 14B and the substrate 14A, causing the ribbon 14B to bend toward the substrate 14A. On the other hand, when the voltage is removed, the deflection disappears, and the ribbon 14B moves away from the substrate 14A.

[0089] Typically, one pixel includes a plurality of, for example, six, stripes 14B. By alternately arranging the stripes 14B to which a voltage is applied, a diffraction grating can be generated by applying a voltage, thereby modulating light.

[0090] The control unit 50 controls the belt 14B of the optical modulation element 33A based on exposure data stored in advance in a memory or the like, and light modulated for each pixel is input to the emission unit 36 ​​.

[0091] Each exposure head can also expose multiple exposure areas. For example, exposure head 32a can expose exposure area Aa and exposure area Ab; exposure head 32b can expose exposure area Aa, exposure area Ab, and exposure area Ac; exposure head 32c can expose exposure area Ab, exposure area Ac, and exposure area Ad; exposure head 32d can expose exposure area Ac, exposure area Ad, and exposure area Ae; and exposure head 32e can expose exposure area Ad and exposure area Ae. Furthermore, the exposure areas that can be exposed are not limited to the exposure areas at the positions corresponding to each exposure head and the exposure areas adjacent thereto, as described above.

[0092] Figure 4 : is a diagram showing an example of the relationship between the exposure area on the substrate and the plurality of exposure heads. Figure 4 In the example shown, the exposure areas at the positions corresponding to the respective exposure heads (i.e., the exposure area Aa relative to the exposure head 32a, the exposure area Ab relative to the exposure head 32b, the exposure area Ac relative to the exposure head 32c, the exposure area Ad relative to the exposure head 32d, and the exposure area Ae relative to the exposure head 32e) are exposed.

[0093] Figure 5 FIG is a diagram conceptually showing the structure of multiple exposure heads. Figure 5 In the example shown, exposure heads 32a, 32b, 32c, 32d, and 32e include a plurality of components such as an aperture AP, an aperture drive unit 39, and a projection optical system 38. Furthermore, when all of these components operate normally, substrate 9 is irradiated with normal pulse light.

[0094] return Figure 1 and Figure 2 The irradiation light imaging unit 40 is a mechanism for capturing the pulsed light emitted from each exposure head. The irradiation light imaging unit 40 includes a charge coupled device (CCD) camera 41, a guide rail 42, and a camera drive mechanism 43 including a linear motor. The CCD camera 41 is positioned so that its imaging direction faces upward. When the camera drive mechanism 43 is activated, the CCD camera 41 moves in the secondary scanning direction along the guide rail 42 mounted on the side of the base plate 24 on the positive Y-axis side.

[0095] When using the CCD camera 41, first the main scanning mechanism 25 is operated to position the base plate 24 so that the CCD camera 41 is located below the head 30 ( Figure 1 and Figure 2 Then, the camera drive mechanism 43 is activated to move the CCD camera 41 in the sub-scanning direction, while the CCD camera 41 simultaneously captures the pulsed light emitted from each exposure head. The image data obtained by the capture is transmitted from the CCD camera 41 to the control unit 50. The transmitted image data is used, for example, to determine whether the corresponding exposure head has a malfunction.

[0096] The control unit 50 is a processing unit for controlling the operation of each driving unit in the exposure apparatus 1 . Figure 6 This is a diagram conceptually showing a connection structure between each driving unit of the exposure apparatus 1 and the control unit 50 .

[0097] <About the operation of the exposure head>

[0098] Next, the operation of one of the plurality of exposure heads, 32a, will be described. The same operation can be performed on the other exposure heads 32b, 32c, 32d, and 32e.

[0099] The pulsed light oscillated from the laser oscillator 34 is incident on the exposure head 32a via the illumination optical system 33. However, if there is a malfunction in any belt 14B of the optical modulation element 33A in the illumination optical system 33 (for example, the belt 14B cannot move normally or the movable area of ​​the belt 14B is narrow, etc.), the light of the pixel corresponding to the belt 14B cannot be accurately modulated, and the exposure area corresponding to the light cannot be accurately exposed.

[0100] When the general Figure 4 When the area exposed by the exposure head 32a moving in the main scanning direction (Y-axis direction) (the stripe-shaped area with a width of W in the X-axis direction) is set as the full exposure area, and the areas exposed by the light modulated by each belt 14B of the optical modulation element 33A are set as sub-exposure areas, in the case where the belt 14B with a defect is included as described above, the sub-exposure area corresponding to the belt 14B with a defect in the full exposure area cannot be accurately exposed.

[0101] Therefore, in this embodiment, among the plurality of bands 14B in the optical modulation element 33A, the bands 14B that have been determined to be free of defects are used as selective bands, and multiple exposures are performed using the selective bands, thereby operating the exposure head 32a to expose the entire exposure area. Furthermore, the entire exposure area actually includes areas where no light is irradiated (areas where the exposure pattern where no light is irradiated is allocated).

[0102] At least one of the multiple bands 14B in the optical modulation element 33A corresponds to the selection band. Ideally, as many normal bands 14B as possible without defects should be selected. Multiple bands 14B can be selected as selection bands. Alternatively, to facilitate selection and operation control, multiple adjacent bands 14B can be considered as a single selection target (a regional selection target). A determination can be made as to whether the selection target, including the multiple bands 14B, contains defects, and this selected target is used as the selection band. In this case, the number of the multiple bands 14B considered as a single target can vary depending on the selection target. In other words, the number of bands 14B constituting each selection band set in the optical modulation element 33A can also vary.

[0103] For example, a sub-exposure area within the full exposure area is first exposed using the selective bands, and then a second exposure is performed using the selective bands for the remaining exposure area (remaining area) within the full exposure area. In this case, the amount of movement of the exposure head 32a in the sub-scanning direction (X-axis direction) is set to the width of the sub-exposure area in the sub-scanning direction (X-axis direction). When exposure is performed using a selection band consisting of multiple bands 14B as a whole, the width of the sub-scanning direction (X-axis direction) is set to the sum of the widths of the multiple bands 14B. If the width of the sub-exposure area can be set in a variety of patterns due to the number of bands 14B included in the selective band, any of the widths of the sub-exposure area in the multiple patterns can be used.

[0104] Figure 7 : is a diagram showing an example of the relationship between the exposure area on the substrate, the head corresponding area of ​​the exposure head 32a, and the selection band of the optical modulation element 33A. Figure 7 The size of the exposure area, the size of the head corresponding area, and the size of the selection band in the figure do not reflect the actual size ratio, but conceptually represent their relationship. Figure 7 In FIG, a case is shown where a plurality of bands 14B are collectively defined as selection objects 140a, 140b, 140c, 140d, 140e, 140f, 140g, and 140h, and each selection object includes the same number of bands 14B. Figure 7 In the example, selected object 140c is determined to be a defective selected object, selected object 140a is selected as selected tape 150a, selected object 140b is selected as selected tape 150b, selected object 140d is selected as selected tape 150d, selected object 140e is selected as selected tape 150e, selected object 140f is selected as selected tape 150f, selected object 140g is selected as selected tape 150g, and selected object 140h is selected as selected tape 150h. On the other hand, selected object 140c is not selected as a selected tape due to a problem with tape 14B, for example.

[0105] The exposure head 32a is configured to receive light modulated by each selection band. Specifically, the head corresponding area 160a is irradiated with light modulated by selection band 150a, the head corresponding area 160b is irradiated with light modulated by selection band 150b, the head corresponding area 160d is irradiated with light modulated by selection band 150d, the head corresponding area 160e is irradiated with light modulated by selection band 150e, the head corresponding area 160f is irradiated with light modulated by selection band 150f, the head corresponding area 160g is irradiated with light modulated by selection band 150g, and the head corresponding area 160h is irradiated with light modulated by selection band 150h.

[0106] First, in the first exposure, the exposure head 32a configured at the specified exposure position is moved in the main scanning direction under the control of the control unit 50, and the corresponding sub-exposure area is exposed using the selection belt 150a, the selection belt 150b, the selection belt 150d, the selection belt 150e, the selection belt 150f, the selection belt 150g, and the selection belt 150h. In detail, the light modulated by the selection band 150a is irradiated from the head corresponding area 160a to the sub-exposure area 240a, the light modulated by the selection band 150b is irradiated from the head corresponding area 160b to the sub-exposure area 240b, the light modulated by the selection band 150d is irradiated from the head corresponding area 160d to the sub-exposure area 240d, the light modulated by the selection band 150e is irradiated from the head corresponding area 160e to the sub-exposure area 240e, the light modulated by the selection band 150f is irradiated from the head corresponding area 160f to the sub-exposure area 240f, the light modulated by the selection band 150g is irradiated from the head corresponding area 160g to the sub-exposure area 240g, and the light modulated by the selection band 150h is irradiated from the head corresponding area 160h to the sub-exposure area 240h.

[0107] In addition, selection belt 150a is movable under the control of control unit 50 based on exposure data representing the modulation of light irradiated to sub-exposure area 240a, selection belt 150b is movable under the control of control unit 50 based on exposure data representing the modulation of light irradiated to sub-exposure area 240b, selection belt 150d is movable under the control of control unit 50 based on exposure data representing the modulation of light irradiated to sub-exposure area 240d, selection belt 150e is movable under the control of control unit 50 based on exposure data representing the modulation of light irradiated to sub-exposure area 240e, selection belt 150f is movable under the control of control unit 50 based on exposure data representing the modulation of light irradiated to sub-exposure area 240f, selection belt 150g is movable under the control of control unit 50 based on exposure data representing the modulation of light irradiated to sub-exposure area 240g, and selection belt 150h is movable under the control of control unit 50 based on exposure data representing the modulation of light irradiated to sub-exposure area 240h. In other words, each selection band is assigned exposure data representing the modulation of the light irradiated to the sub-exposure area corresponding to each selection band rather than exposure data corresponding to the full exposure area of ​​the exposure head 32a, and each selection band is controlled based on the assigned exposure data.

[0108] On the other hand, since the selection object 140 c is not selected as the selection band, the sub-exposure area 240 c corresponding to the head corresponding area 160 c is not exposed.

[0109] Next, after the exposure head 32a is moved to the end point in the main scanning direction, the exposure head 32a is moved in the sub-scanning direction by an amount corresponding to the sub-exposure width SW under the control of the control unit 50. The sub-exposure width SW is a width corresponding to the width of the sub-exposure area and is narrower than the width W of the full exposure area. Figure 7 In the example, the sub-exposure width SW is 1 / 8 of the width W of the full exposure area.

[0110] Figure 8 : is a diagram showing an example of the relationship between the exposure area on the substrate and the head corresponding area of ​​the exposure head 32a. Figure 8 In FIG. 3 , the exposure head 32a is shown. Figure 7 The state is a state after the state is moved by an amount corresponding to the sub-exposure width SW. Figure 8 The exposure head 32a shown by the dotted line is Figure 7 The exposure head 32a in (in other words, the exposure head 32a before movement). Figure 8 The size of the exposure area and the size of the head corresponding area do not reflect the ratio of actual sizes, but conceptually express their relationship.

[0111] exist Figure 8 , through the above movement, the head corresponding area 160a is configured at a position for exposing the sub-exposure area 240b, the head corresponding area 160b is configured at a position for exposing the sub-exposure area 240c, the head corresponding area 160d is configured at a position for exposing the sub-exposure area 240e, the head corresponding area 160e is configured at a position for exposing the sub-exposure area 240f, the head corresponding area 160f is configured at a position for exposing the sub-exposure area 240g, the head corresponding area 160g is configured at a position for exposing the sub-exposure area 240h, and the head corresponding area 160h is configured at a position for exposing the area further outside the sub-exposure area 240h (the area outside the full exposure area).

[0112] Then, as the second exposure, the exposure head 32a is moved in the main scanning direction under the control of the control unit 50, and the light modulated by the selection band 150b is irradiated from the head corresponding area 160b to the sub-exposure area 240c.

[0113] Furthermore, selection belt 150b is movable under the control of control unit 50 based on exposure data indicating the modulation of light irradiated onto sub-exposure region 240c. In other words, with respect to selection belt 150b, the exposure data used for control in the first exposure (exposure data indicating the modulation of light irradiated onto sub-exposure region 240b) and the exposure data used for control in the second exposure (exposure data indicating the modulation of light irradiated onto sub-exposure region 240c) are different.

[0114] On the other hand, in the second exposure, the sub-exposure areas corresponding to the other selection bands and the selection object 140 c are not exposed.

[0115] Through the above operation, multiple exposures are performed using light modulated by the selective bands, thereby exposing the entire exposure area. Specifically, the exposure head 32a is moved to perform the second exposure so that the sub-exposure area 240c that was not exposed in the first exposure is exposed to light modulated by the selective bands 150b. This allows the entire exposure area to be exposed using only light modulated by the selective bands, with the total of the sub-exposure areas including the sub-exposure area 240c.

[0116] Therefore, even if a defect occurs in a portion of the ribbons 14B of the optical modulation element 33A, a ribbon 14B other than the aforementioned ribbon 14B can be selected as a selection ribbon, and the entire exposure area can be properly exposed through multiple exposures. In other words, even if a defect occurs in a portion of the ribbons 14B of the optical modulation element 33A, there is no need to replace or repair the optical modulation element 33A, and proper exposure of the entire exposure area can continue.

[0117] In addition, Figure 7 and Figure 8 In the example, the selection band 150b adjacent to the selection object 140c is controlled in the second exposure to expose the sub-exposure area 240c. The selection band that is controlled in the second exposure to expose the sub-exposure area 240c is not limited to the selection band adjacent to the selection object 140c.

[0118] In addition, Figure 7 and Figure 8 For convenience, the exposure head 32a is shown moving in the same direction as the main scanning direction (for example, the positive direction), but in the first exposure and the second exposure, the exposure head 32a can also move in the opposite direction of the main scanning direction (for example, the positive direction and the negative direction).

[0119] Here, a method for determining a failure of a selected band from among the plurality of bands 14B in the optical modulation element 33A will be described.

[0120] As an example of this determination method, multiple belts 14B may be controlled so that the exposure head 32a irradiates the belts 14B with the maximum light intensity, and the light intensity at that time is compared and selected. Specifically, the exposure head 32a irradiates pulsed light at the maximum light intensity, and the irradiation light imaging unit 40 captures the image. The control unit 50 then analyzes the image data obtained from the capture and compares the light intensity calculated based on the image data with a reference light intensity (threshold light intensity) for each sub-exposure area. As a result, belts 14B corresponding to sub-exposure areas with a small difference from the threshold light intensity are determined to be free of defects (eligible for selection), while belts 14B corresponding to sub-exposure areas with a large difference from the threshold light intensity are determined to be defective (ineligible for selection). Furthermore, the light intensity used for comparison does not need to be the maximum light intensity; instead, comparison can be performed with corresponding threshold light intensity levels in multiple light intensity patterns to improve determination accuracy.

[0121] In the above example, the control unit 50 performs analysis of the image data and determination of the modulation state of the belt 14B. However, a functional unit for performing the determination may be provided in the exposure apparatus 1 separately from the control unit 50 .

[0122] <Regarding other operations of the exposure head>

[0123] Next, other operations (three exposures) of the exposure head 32a will be described. Figure 9 : is another example of the relationship between the exposure area on the substrate, the head corresponding area of ​​the exposure head 32a and the selection band of the optical modulation element 33A. Figure 9 The size of the exposure area, the size of the head corresponding area, and the size of the selection band do not reflect the ratio of actual sizes, but conceptually express their relationship.

[0124] exist Figure 7 In the example, only the selected object 140c is not selected as a selection band, but Figure 9 In the example, selection object 140c, selection object 140d, and selection object 140f are determined to be defective due to a malfunction or low light level of belt 14B, and are therefore not selected as selection belts.

[0125] First, in the first exposure, the exposure head 32a, positioned at a predetermined exposure position, is moved in the main scanning direction under the control of the control unit 50, and the corresponding sub-exposure areas are exposed using the selection belts 150a, 150b, 150e, 150g, and 150h. Specifically, light modulated by the selection belt 150a is irradiated from the head corresponding area 160a onto the sub-exposure area 240a, light modulated by the selection belt 150b is irradiated from the head corresponding area 160b onto the sub-exposure area 240b, light modulated by the selection belt 150e is irradiated from the head corresponding area 160e onto the sub-exposure area 240e, light modulated by the selection belt 150g is irradiated from the head corresponding area 160g onto the sub-exposure area 240g, and light modulated by the selection belt 150h is irradiated from the head corresponding area 160h onto the sub-exposure area 240h.

[0126] In addition, the selection belt 150a is movable under the control of the control unit 50 based on the exposure data representing the modulation of the light irradiated to the sub-exposure area 240a, the selection belt 150b is movable under the control of the control unit 50 based on the exposure data representing the modulation of the light irradiated to the sub-exposure area 240b, the selection belt 150e is movable under the control of the control unit 50 based on the exposure data representing the modulation of the light irradiated to the sub-exposure area 240e, the selection belt 150g is movable under the control of the control unit 50 based on the exposure data representing the modulation of the light irradiated to the sub-exposure area 240g, and the selection belt 150h is movable under the control of the control unit 50 based on the exposure data representing the modulation of the light irradiated to the sub-exposure area 240h.

[0127] On the other hand, since selection object 140c, selection object 140d, and selection object 140f are not selected as selection bands, sub-exposure area 240c corresponding to head corresponding area 160c, sub-exposure area 240d corresponding to head corresponding area 160d, and sub-exposure area 240f corresponding to head corresponding area 160f are not exposed.

[0128] Next, after the exposure head 32a is moved to the end point in the main scanning direction, the exposure head 32a is moved in the sub-scanning direction by an amount corresponding to the sub-exposure width SW under the control of the control unit 50. The sub-exposure width SW is a width corresponding to the width of the sub-exposure area and is narrower than the width of the full exposure area. Figure 9 In the example, the sub-exposure width SW is 1 / 8 of the width W of the full exposure area.

[0129] Figure 10 : is a diagram showing an example of the relationship between the exposure area on the substrate and the head corresponding area of ​​the exposure head 32a. Figure 10 In FIG. 3 , the exposure head 32a is shown. Figure 9The state is a state after the state is moved by an amount corresponding to the sub-exposure width SW. Figure 10 The exposure head 32a shown by the dotted line is Figure 9 The exposure head 32a in (in other words, the exposure head 32a before movement). Figure 10 The size of the exposure area and the size of the head corresponding area do not reflect the ratio of actual sizes, but conceptually express their relationship.

[0130] exist Figure 10 In the embodiment, through the above movement, the head corresponding area 160a is configured at a position for exposing the sub-exposure area 240b, the head corresponding area 160b is configured at a position for exposing the sub-exposure area 240c, the head corresponding area 160e is configured at a position for exposing the sub-exposure area 240f, the head corresponding area 160g is configured at a position for exposing the sub-exposure area 240h, and the head corresponding area 160h is configured at a position for exposing the area further outside the sub-exposure area 240h (the area outside the full exposure area).

[0131] Then, as the second exposure, the exposure head 32a is moved in the main scanning direction under the control of the control unit 50, and the light modulated by the selection band 150b is irradiated from the head corresponding area 160b to the sub-exposure area 240c, and the light modulated by the selection band 150e is irradiated from the head corresponding area 160e to the sub-exposure area 240f.

[0132] Furthermore, selection belt 150b is movable under the control of control unit 50 based on exposure data indicating the modulation of light irradiated onto sub-exposure region 240c. In other words, with respect to selection belt 150b, the exposure data used for control in the first exposure (exposure data indicating the modulation of light irradiated onto sub-exposure region 240b) and the exposure data used for control in the second exposure (exposure data indicating the modulation of light irradiated onto sub-exposure region 240c) are different.

[0133] Similarly, the selection belt 150 e is movable under the control of the control unit 50 based on exposure data indicating the modulation of the light irradiated to the sub-exposure region 240 f .

[0134] On the other hand, in the second exposure, the sub-exposure areas corresponding to the other selection bands and the selection objects 140 c , 140 d , and 140 f are not exposed.

[0135] Furthermore, after the exposure head 32 a is moved to the end point in the main scanning direction, the exposure head 32 a is moved in the sub-scanning direction by an amount corresponding to the sub-exposure width SW under the control of the control unit 50 .

[0136] Figure 11: is a diagram showing an example of the relationship between the exposure area on the substrate and the head corresponding area of ​​the exposure head 32a. Figure 11 In FIG. 3 , the exposure head 32a is shown. Figure 10 The state is a state after the state is moved by an amount corresponding to the sub-exposure width SW. Figure 11 The exposure head 32a shown by the dotted line is Figure 10 The exposure head 32a in (in other words, the exposure head 32a before movement). Figure 11 The size of the exposure area and the size of the head corresponding area do not reflect the ratio of actual sizes, but conceptually express their relationship.

[0137] exist Figure 11 In the embodiment, through the above-mentioned movement, the head corresponding area 160a is configured at a position for exposing the sub-exposure area 240c, the head corresponding area 160b is configured at a position for exposing the sub-exposure area 240d, the head corresponding area 160e is configured at a position for exposing the sub-exposure area 240g, and the head corresponding area 160g and the head corresponding area 160h are configured at positions for exposing the area further outside the sub-exposure area 240h (the area outside the full exposure area).

[0138] Then, as the third exposure, the exposure head 32a is moved in the main scanning direction under the control of the control unit 50, and the light modulated by the selection band 150b is irradiated from the head corresponding area 160b to the sub-exposure area 240d.

[0139] Furthermore, selection belt 150b is movable under the control of control unit 50 based on exposure data indicating the modulation of light irradiated onto sub-exposure region 240d. In other words, with respect to selection belt 150b, the exposure data used for control in the first exposure (exposure data indicating the modulation of light irradiated onto sub-exposure region 240b) differs from the exposure data used for control in the second exposure (exposure data indicating the modulation of light irradiated onto sub-exposure region 240c) and the exposure data used for control in the third exposure (exposure data indicating the modulation of light irradiated onto sub-exposure region 240d).

[0140] On the other hand, in the third exposure, the sub-exposure areas corresponding to the other selection bands and the selection objects 140 c , 140 d , and 140 f are not exposed.

[0141] Through the above operation, multiple exposures are performed using light modulated by the selective bands, thereby exposing the entire exposure area. Specifically, the exposure head 32a is moved to perform the second and third exposures so that sub-exposure areas 240c, 240d, and 240f, which were not exposed in the first exposure, are exposed to light modulated by the selective bands 150b and 150e. This allows the entire exposure area to be exposed using only light modulated by the selective bands, with the total of the sub-exposure areas including sub-exposure areas 240c, 240d, and 240f.

[0142] Therefore, even when there are defects in a plurality of selected locations, the entire exposure area can be appropriately exposed by multiple exposures.

[0143] Next, another operation (uniform exposure) of the exposure head 32a will be described. Figure 12 : is another example of the relationship between the exposure area on the substrate, the head corresponding area of ​​the exposure head 32a and the selection band of the optical modulation element 33A. Figure 12 The size of the exposure area, the size of the head corresponding area, and the size of the selection band do not reflect the ratio of actual sizes, but conceptually express their relationship.

[0144] exist Figure 12 In the example of , the selection band changes each time an exposure is made. Figure 12 In the example shown in FIG, all selected objects can be selected bands, but at the time of the first exposure, selected objects 140c, 140d, 140e, 140f, 140g, and 140h are selected as the selected bands. In other words, a portion of the selected objects determined to be free of defects are selected as the selected bands.

[0145] On the other hand, the width W2 of the full exposure area is narrower than the full exposure width W of the exposure head 32a. Specifically, the full exposure area is a region obtained by combining the sub-exposure area 240c, the sub-exposure area 240d, the sub-exposure area 240e, the sub-exposure area 240f, the sub-exposure area 240g, and the sub-exposure area 240h.

[0146] First, in the first exposure, the exposure head 32a configured at the specified exposure position is moved along the main scanning direction under the control of the control unit 50, and the corresponding sub-exposure area is exposed using the selection belt 150c, the selection belt 150d, the selection belt 150e, the selection belt 150f, the selection belt 150g, and the selection belt 150h. Specifically, light modulated by selection band 150c is irradiated from head corresponding area 160c onto sub-exposure area 240c, light modulated by selection band 150d is irradiated from head corresponding area 160d onto sub-exposure area 240d, light modulated by selection band 150e is irradiated from head corresponding area 160e onto sub-exposure area 240e, light modulated by selection band 150f is irradiated from head corresponding area 160f onto sub-exposure area 240f, light modulated by selection band 150g is irradiated from head corresponding area 160g onto sub-exposure area 240g, and light modulated by selection band 150h is irradiated from head corresponding area 160h onto sub-exposure area 240h. Each light irradiation is performed with a light intensity that is sufficient to achieve a desired exposure state through multiple exposures (here, three times).

[0147] In addition, selection belt 150c is movable under the control of control unit 50 based on exposure data representing the modulation of light irradiated to sub-exposure area 240c, selection belt 150d is movable under the control of control unit 50 based on exposure data representing the modulation of light irradiated to sub-exposure area 240d, selection belt 150e is movable under the control of control unit 50 based on exposure data representing the modulation of light irradiated to sub-exposure area 240e, selection belt 150f is movable under the control of control unit 50 based on exposure data representing the modulation of light irradiated to sub-exposure area 240f, selection belt 150g is movable under the control of control unit 50 based on exposure data representing the modulation of light irradiated to sub-exposure area 240g, and selection belt 150h is movable under the control of control unit 50 based on exposure data representing the modulation of light irradiated to sub-exposure area 240h.

[0148] On the other hand, in the first exposure, since the selection objects 140a and 140b are not selected as selection bands, the sub-exposure area 240a corresponding to the head corresponding area 160a and the sub-exposure area 240b corresponding to the head corresponding area 160b are not exposed.

[0149] Next, after the exposure head 32a is moved to the end point in the main scanning direction, the exposure head 32a is moved in the sub-scanning direction by an amount corresponding to the sub-exposure width SW under the control of the control unit 50. The sub-exposure width SW is a width corresponding to the width of the sub-exposure area and is narrower than the width W2 of the full exposure area. Figure 12 In the example, the sub-exposure width SW is 1 / 6 of the width W2 of the full exposure area.

[0150] Figure 13 : is a diagram showing an example of the relationship between the exposure area on the substrate and the head corresponding area of ​​the exposure head 32a. Figure 13 In FIG. 3 , the exposure head 32a is shown. Figure 12 The state is a state after the state is moved by an amount corresponding to the sub-exposure width SW. Figure 13 The exposure head 32a shown by the dotted line is Figure 12 The exposure head 32a in (in other words, the exposure head 32a before movement). Figure 13 The size of the exposure area and the size of the head corresponding area do not reflect the ratio of actual sizes, but conceptually express their relationship.

[0151] exist Figure 13 , through the above movement, the head corresponding area 160a is configured at a position for exposing the sub-exposure area 240b, the head corresponding area 160b is configured at a position for exposing the sub-exposure area 240c, the head corresponding area 160c is configured at a position for exposing the sub-exposure area 240d, the head corresponding area 160d is configured at a position for exposing the sub-exposure area 240e, the head corresponding area 160e is configured at a position for exposing the sub-exposure area 240f, the head corresponding area 160f is configured at a position for exposing the sub-exposure area 240g, the head corresponding area 160g is configured at a position for exposing the sub-exposure area 240h, and the head corresponding area 160h is configured at a position for exposing the area further outside the sub-exposure area 240h (the area outside the full exposure area).

[0152] Here, for the second exposure, the selection object 140b, the selection object 140c, the selection object 140d, the selection object 140e, the selection object 140f, and the selection object 140g are selected as the selection band.

[0153] Then, as a second exposure, the exposure head 32a is moved in the main scanning direction under the control of the control unit 50, and the light modulated by the selection band 150b is irradiated from the head corresponding area 160b onto the sub-exposure area 240c, the light modulated by the selection band 150c is irradiated from the head corresponding area 160c onto the sub-exposure area 240d, the light modulated by the selection band 150d is irradiated from the head corresponding area 160d onto the sub-exposure area 240e, the light modulated by the selection band 150e is irradiated from the head corresponding area 160e onto the sub-exposure area 240f, the light modulated by the selection band 150f is irradiated from the head corresponding area 160f onto the sub-exposure area 240g, and the light modulated by the selection band 150g is irradiated from the head corresponding area 160g onto the sub-exposure area 240h. Each light irradiation is performed with the light intensity required to achieve the desired exposure state through multiple exposures (here, three times).

[0154] In addition, the selection belt 150b is movable under the control of the control unit 50 based on the exposure data representing the modulation of the light irradiated to the sub-exposure area 240c, the selection belt 150c is movable under the control of the control unit 50 based on the exposure data representing the modulation of the light irradiated to the sub-exposure area 240d, the selection belt 150d is movable under the control of the control unit 50 based on the exposure data representing the modulation of the light irradiated to the sub-exposure area 240e, the selection belt 150e is movable under the control of the control unit 50 based on the exposure data representing the modulation of the light irradiated to the sub-exposure area 240f, the selection belt 150f is movable under the control of the control unit 50 based on the exposure data representing the modulation of the light irradiated to the sub-exposure area 240g, and the selection belt 150g is movable under the control of the control unit 50 based on the exposure data representing the modulation of the light irradiated to the sub-exposure area 240h.

[0155] On the other hand, in the second exposure, since the selection objects 140a and 140h are not selected as selection bands, the sub-exposure area 240b corresponding to the head corresponding area 160a and the area corresponding to the head corresponding area 160h (the area outside the full exposure area) are not exposed.

[0156] Furthermore, after the exposure head 32 a is moved to the end point in the main scanning direction, the exposure head 32 a is moved in the sub-scanning direction by an amount corresponding to the sub-exposure width SW under the control of the control unit 50 .

[0157] Figure 14 : is a diagram showing an example of the relationship between the exposure area on the substrate and the head corresponding area of ​​the exposure head 32a. Figure 14 In FIG. 3 , the exposure head 32a is shown. Figure 13 The state is a state after the state is moved by an amount corresponding to the sub-exposure width SW. Figure 14 The exposure head 32a shown by the dotted line is Figure 13 The exposure head 32a in (in other words, the exposure head 32a before movement). Figure 14 The size of the exposure area and the size of the head corresponding area do not reflect the ratio of actual sizes, but conceptually express their relationship.

[0158] exist Figure 14, through the above-mentioned movement, the head corresponding area 160a is configured at a position for exposing the sub-exposure area 240c, the head corresponding area 160b is configured at a position for exposing the sub-exposure area 240d, the head corresponding area 160c is configured at a position for exposing the sub-exposure area 240e, the head corresponding area 160d is configured at a position for exposing the sub-exposure area 240f, the head corresponding area 160e is configured at a position for exposing the sub-exposure area 240g, the head corresponding area 160f is configured at a position for exposing the sub-exposure area 240h, and the head corresponding area 160g and the head corresponding area 160h are configured at positions for exposing the area further outside the sub-exposure area 240h (the area outside the full exposure area).

[0159] Here, for the third exposure, the selection object 140 a , the selection object 140 b , the selection object 140 c , the selection object 140 d , the selection object 140 e , and the selection object 140 f are selected as the selection band.

[0160] Then, as a third exposure, the exposure head 32a is moved in the main scanning direction under the control of the control unit 50, and the light modulated by the selection band 150a is irradiated from the head corresponding area 160a onto the sub-exposure area 240c, the light modulated by the selection band 150b is irradiated from the head corresponding area 160b onto the sub-exposure area 240d, the light modulated by the selection band 150c is irradiated from the head corresponding area 160c onto the sub-exposure area 240e, the light modulated by the selection band 150d is irradiated from the head corresponding area 160d onto the sub-exposure area 240f, the light modulated by the selection band 150e is irradiated from the head corresponding area 160e onto the sub-exposure area 240g, and the light modulated by the selection band 150f is irradiated from the head corresponding area 160f onto the sub-exposure area 240h. Each light irradiation is performed at a light intensity that is sufficient to achieve a desired exposure state through multiple exposures (here, three times).

[0161] In addition, the selection belt 150a is movable under the control of the control unit 50 based on the exposure data representing the modulation of the light irradiated to the sub-exposure area 240c, the selection belt 150b is movable under the control of the control unit 50 based on the exposure data representing the modulation of the light irradiated to the sub-exposure area 240d, the selection belt 150c is movable under the control of the control unit 50 based on the exposure data representing the modulation of the light irradiated to the sub-exposure area 240e, the selection belt 150d is movable under the control of the control unit 50 based on the exposure data representing the modulation of the light irradiated to the sub-exposure area 240f, the selection belt 150e is movable under the control of the control unit 50 based on the exposure data representing the modulation of the light irradiated to the sub-exposure area 240g, and the selection belt 150f is movable under the control of the control unit 50 based on the exposure data representing the modulation of the light irradiated to the sub-exposure area 240h.

[0162] On the other hand, in the third exposure, since the selection targets 140g and 140h are not selected as the selection bands, the areas corresponding to the head corresponding areas 160g and 160h (areas outside the full exposure area) are not exposed.

[0163] By performing multiple exposures using light modulated using the selective bands through the above operation, the entire exposure area can be exposed. Furthermore, by irradiating the same sub-exposure area multiple times with light modulated using different selective bands, the difference in exposure amount between the sub-exposure areas is reduced, enabling uniform exposure across the entire exposure area.

[0164] Figure 15 : is a diagram showing an example of the deviation of the exposure amount of each sub-exposure area. Figure 15 In FIG, the vertical axis represents the exposure amount [relative value], and the horizontal axis represents the symbol of the corresponding sub-exposure area.

[0165] Figure 15 The dotted line in represents the exposure amount when the light modulated by each selection band is irradiated to the corresponding sub-exposure area in one exposure. Figure 15 The solid line in the figure shows the case where the modulation characteristics of the selected band are the same as those of the dashed line. Figure 12 、 Figure 13 and Figure 14 The exposure amount of each sub-exposure area when three exposures are performed as shown.

[0166] like Figure 15 As shown, when three exposures are performed, the same sub-exposure area is irradiated multiple times with light modulated by different selective bands. Therefore, the difference in exposure amount between each sub-exposure area is offset and reduced. As a result, the variation in exposure amount between the sub-exposure areas is reduced. In other words, uniform exposure can be achieved across the entire exposure area.

[0167] <Effects of the above-described embodiment>

[0168] Next, examples of the effects produced by the above-described embodiments are described. Furthermore, in the following description, the effects are described based on the specific structures shown as examples in the above-described embodiments. However, they can be replaced with other specific structures shown as examples in the present specification within the scope of producing the same effects. That is, for convenience, only one of the corresponding specific structures may be represented below as a representative example, but the representatively represented specific structure can also be replaced with another corresponding specific structure.

[0169] According to the embodiment described above, the direct drawing device includes a light source, an optical modulation element 33A, an exposure head 32a, a first drive unit, a second drive unit, and a control unit 50. Here, the light source corresponds to, for example, the laser oscillator 34. In addition, the first drive unit corresponds to, for example, the main scanning mechanism 25. In addition, the second drive unit corresponds to, for example, the sub-scanning mechanism 23. The optical modulation element 33A has a plurality of elements (with 14B) arranged corresponding to the sub-scanning direction. In addition, the optical modulation element 33A modulates the light from the laser oscillator 34. The exposure head 32a uses the light modulated by the optical modulation element 33A to expose the substrate 9. The main scanning mechanism 25 moves the exposure head 32a relative to the substrate 9 in the main scanning direction intersecting the sub-scanning direction. The sub-scanning mechanism 23 moves the exposure head 32a relative to the substrate 9 in the sub-scanning direction. The control unit 50 controls the modulation state of the light in the optical modulation element 33A, the operation of the main scanning mechanism 25, and the operation of the sub-scanning mechanism 23. Here, at least one of the multiple strips 14B of the optical modulation element 33A serves as a selection element (selection strip). Furthermore, the area exposed by the exposure head 32a using light modulated using the selection strip is referred to as a sub-exposure area. Furthermore, the width of the sub-exposure area in the sub-scanning direction is referred to as the sub-exposure width SW. The control unit 50 then relatively moves the exposure head 32a in the main scanning direction to expose the sub-exposure area using light modulated using the selection strip. Furthermore, after the sub-exposure area is exposed, the control unit 50 relatively moves the exposure head 32a in the sub-scanning direction by an amount corresponding to the sub-exposure width SW.

[0170] According to such a configuration, even when a defect occurs in any of the bands 14B of the optical modulation element 33A, light modulation and exposure can be performed using the selected band without the defect.

[0171] Here, a prior art technique is described for continuing exposure using another exposure head in place of a defective exposure head in an exposure apparatus including multiple exposure heads. This technique requires moving the defective exposure head from its exposure position, and a margin corresponding to the movement of the exposure head must be ensured.

[0172] On the other hand, the technique for performing exposure using the selective bands described in this embodiment allows the exposure head to be moved less than in the conventional technique described above due to a malfunction of the optical modulation element 33A. Specifically, while the conventional technique requires the entire exposure head to be moved from the exposure position, the technique for performing exposure using the selective bands described in this embodiment only requires the exposure head to be offset by an amount corresponding to the sub-exposure width. Therefore, this embodiment can suppress the increase in occupied space (the margin required for movement).

[0173] Furthermore, even when other structures shown as examples in the specification of this application are appropriately added to the above structure, that is, even when other structures in the specification of this application that are not mentioned as the above structure are appropriately added, the same effect can be produced.

[0174] Furthermore, according to the embodiment described above, the selection band includes a plurality of adjacently arranged bands 14B. With this configuration, by selecting a whole array of the plurality of bands 14B as the selection band, and using this selection band as the selection band, selection becomes easier than selecting individual bands 14B provided on the optical modulation element 33A as the selection band, and the burden of light modulation control using the selection bands can be reduced.

[0175] Furthermore, according to the embodiment described above, the direct drawing apparatus includes a selection unit that selects a selected band from the plurality of bands 14B. The selection unit corresponds to, for example, the control unit 50. The control unit 50 determines the light modulation state of each band 14B and selects the selected band based on the determination result. With this configuration, by selecting a band 14B free of defects as the selected band and using the selected band for light modulation, light modulation and exposure can be performed even if any of the bands 14B of the optical modulation element 33A has a defect.

[0176] Furthermore, according to the embodiment described above, the area corresponding to all of the bands 14B of the optical modulation element 33A is exposed as the full exposure area. The area within the full exposure area other than the sub-exposure area exposed to light modulated by the selective band is referred to as the residual area. After the sub-exposure area is exposed, the control unit 50 relatively moves the exposure head 32a in the sub-scanning direction by an amount corresponding to the sub-exposure width SW, and relatively moves the exposure head 32a in the main scanning direction to expose the residual area using light modulated by the selective band. With this configuration, the residual area outside of the sub-exposure area within the full exposure area is exposed using light modulated by the selective band after the exposure head 32a has moved by an amount corresponding to the sub-exposure width. This allows the selective band to be used to expose the area including the residual area even if any of the bands 14B of the optical modulation element 33A is defective.

[0177] Furthermore, according to the embodiment described above, multiple selection bands are selected, including a first selection band (e.g., selection band 150c) and a second selection band (e.g., selection band 150b). The control unit 50 then moves the exposure head 32a relative to the main scanning direction to expose the sub-exposure area with light modulated by the selection band 150c. Furthermore, after the sub-exposure area is exposed, the control unit 50 moves the exposure head 32a relative to the sub-scanning direction by an amount corresponding to the sub-exposure width SW, and moves the exposure head 32a relative to the main scanning direction to expose the same sub-exposure area with light modulated by the selection band 150b. With this configuration, by irradiating the same sub-exposure area multiple times with light modulated by different selection bands, the difference in exposure amount between the sub-exposure areas is minimized, enabling uniform exposure across the entire exposure area.

[0178] Furthermore, since the optical performance at the minimum point is determined by various factors such as light intensity distribution, lens performance, and focusing performance, uniforming the optical performance across the entire exposure area requires consideration of technical difficulties and high costs, such as adjustment of the optical lens. On the other hand, according to this embodiment, uniform exposure can be easily achieved across the entire exposure area.

[0179] Furthermore, according to the embodiment described above, the selective band is different before and after the exposure head 32a is relatively moved in the sub-scanning direction by an amount corresponding to the sub-exposure width SW. With this configuration, by making the selective band different before and after the relative movement of the exposure head 32a, it is possible to increase the exposure variation of the sub-exposure area and the residual area.

[0180] According to the embodiment described above, in the direct writing method, the exposure head 32a is relatively moved in the main scanning direction to expose the sub-exposure area with light modulated using the selective band. Then, after the sub-exposure area is exposed, the exposure head 32a is relatively moved in the sub-scanning direction by an amount corresponding to the sub-exposure width SW.

[0181] According to such a configuration, even when a defect occurs in any of the bands 14B of the optical modulation element 33A, light modulation and exposure can be performed using the selected band without the defect.

[0182] Furthermore, the order in which each process is performed may be changed without particular limitation.

[0183] In addition, even when other structures shown as examples in the specification of this application are appropriately added to the above structure, that is, when other structures in the specification of this application that are not mentioned as the above structure are appropriately added, the same effect can be produced.

[0184] <Regarding Modifications of the Embodiments Described Above>

[0185] In the above-described embodiments, the material, dimensions, shape, relative arrangement relationship, implementation conditions, etc. of each component may be described, but these are merely examples in all respects and are not limiting.

[0186] Therefore, numerous modifications and equivalents, not shown in the examples, are contemplated within the technical scope disclosed in this specification, including, for example, modifications, additions, or omissions of at least one component.

[0187] In at least one embodiment described above, when a material name is described without being particularly specified, the material may include other additives, such as an alloy, unless there is any inconsistency.

Claims

1. A direct drawing device for a substrate, comprising: light source; an optical modulation element having a plurality of elements arranged corresponding to the sub-scanning direction and configured to modulate light from the light source; an exposure head, configured to expose the substrate using the light modulated by the optical modulation element; a first driving unit for moving the exposure head relative to the substrate in a main scanning direction intersecting the sub-scanning direction; a second driving unit, configured to move the exposure head relative to the substrate in the secondary scanning direction; as well as a control unit configured to control a modulation state of the light in the optical modulation element, an operation of the first drive unit, and an operation of the second drive unit; A part of the plurality of elements of the optical modulation element, that is, at least one element, is used as a selection element, The area exposed by the exposure head using the light modulated by the selection element is used as a sub-exposure area. The width of the sub-exposure area in the sub-scanning direction is defined as the sub-exposure width. The control unit relatively moving the exposure head in the main scanning direction to expose the sub-exposure area with the light modulated by the selection element, After the sub-exposure area is exposed, the exposure head is relatively moved in the sub-scanning direction by an amount corresponding to the sub-exposure width.

2. The direct drawing device according to claim 1, wherein: The selection element includes a plurality of the elements arranged adjacent to each other.

3. The direct drawing device according to claim 1 or 2, further comprising a selection unit that selects the selected element from a plurality of the elements, The selection section determines the modulation state of the light of each of the elements, and selects the selection element based on the determination result.

4. The direct drawing device according to claim 1 or 2, wherein: The area corresponding to all the elements of the optical modulation element to be exposed is defined as a fully exposed area. The area outside the sub-exposure area in the full exposure area is regarded as a residual area. After the sub-exposure area is exposed, the control unit moves the exposure head relatively in the sub-scanning direction by an amount corresponding to the sub-exposure width, and moves the exposure head relatively in the main scanning direction to expose the residual area using the light modulated by the selection element.

5. The direct drawing device according to claim 1 or 2, wherein: Select a plurality of said selection elements, The selection element includes a first selection element and a second selection element, The control unit moving the exposure head relatively in the main scanning direction to expose the sub-exposure area with the light modulated by the first selection element, After the sub-exposure area is exposed, the exposure head is moved relatively in the sub-scanning direction by an amount corresponding to the sub-exposure width, and the exposure head is moved relatively in the main scanning direction to expose the same sub-exposure area using the light modulated by the second selection element.

6. The direct drawing device according to claim 1 or 2, wherein: The selection element differs before and after the exposure head is relatively moved in the sub-scanning direction by an amount corresponding to the sub-exposure width.

7. A direct drawing method for a substrate using a direct drawing apparatus, the direct drawing apparatus comprising: an optical modulation element having a plurality of elements arranged corresponding to the sub-scanning direction and configured to modulate light from the light source; and an exposure head for exposing the substrate using the light modulated by the optical modulation element, wherein the direct writing method A part of the plurality of elements of the optical modulation element, that is, at least one element, is used as a selection element, The area exposed by the exposure head using the light modulated by the selection element is used as a sub-exposure area. The width of the sub-exposure area in the sub-scanning direction is used as the sub-exposure width, and the direct drawing method includes: a step of relatively moving the exposure head in a main scanning direction intersecting the sub-scanning direction to expose the sub-exposure area with the light modulated by the selection element; as well as A step of relatively moving the exposure head in the sub-scanning direction by an amount corresponding to the sub-exposure width after the sub-exposure region is exposed.

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