Plasma particle and oscillation propagation velocity measuring device and measuring method thereof
By adopting a multi-axis electrode design and a fixed-frequency signal measurement method in the plasma particle and oscillation propagation velocity measurement device, the problems of high cost and difficult transportation of existing devices are solved, and efficient measurement with low cost and easy transportation is achieved.
Patent Information
- Application Number
- CN202511201067.6
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-08-26
- Publication Date
- 2025-10-03
AI Technical Summary
Existing plasma velocity measurement equipment is expensive, complex, and difficult to transport between facilities.
A measuring device including a substrate and electrodes is designed. A cross groove is set on the end surface of the substrate to accommodate electrodes in different directions. A component is installed in the through hole to fix the Z-direction electrode. A multi-axis electrode design is adopted and a fixed frequency signal is applied to measure the plasma particle and oscillation propagation speed.
The device is miniaturized, low-cost and easy to transport for measuring the propagation velocity of plasma particles and oscillations, thereby improving the accuracy and simplicity of the measurement.
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Figure CN120751565A_ABST
Abstract
Description
Technical Field
[0001] The present invention relates to the field of electric propulsion technology, and in particular to a plasma particle and oscillation propagation velocity measuring device and a measuring method thereof. Background Art
[0002] In the field of electric propulsion, since the plasma flow field is a dynamic system, studying the temporal variability of the plasma is very important. In order to capture the dynamic fluctuations in the plasma flow field, diagnostic methods with time resolution are required.
[0003] Existing methods, such as time-resolved laser-induced fluorescence, have successfully demonstrated the ability to create time-resolved ion velocity distribution functions, but these devices are expensive, complex, and difficult to transport between facilities. Therefore, miniaturization and simplification of measurement devices are of great significance. Summary of the Invention
[0004] The object of the present invention is to provide a plasma particle and oscillation propagation velocity measuring device and a measuring method thereof, so as to alleviate the technical problems existing in the prior art that traditional plasma velocity measuring devices are expensive, complicated, and difficult to transport between facilities.
[0005] In a first aspect, the present invention provides a plasma particle and oscillation propagation velocity measuring device, comprising: a substrate and an electrode; The end surface of the base body is provided with two cross-shaped grooves, wherein one groove is used to accommodate the two electrodes in the X direction, and the other groove is used to accommodate the two electrodes in the Y direction; A through hole is provided in the middle of the end surface of the base body, and a mounting member is provided in the through hole. The mounting member has two mounting holes for accommodating the two electrodes in the Z direction; The X direction, the Y direction and the Z direction are arranged perpendicular to each other.
[0006] In an alternative embodiment, There are six electrodes, including an X1 electrode, an X2 electrode, a Y1 electrode, a Y2 electrode, a Z1 electrode, and a Z2 electrode; The X1 electrode and the X2 electrode are both arranged in the same groove, and there is a distance between the X1 electrode and the X2 electrode; The Y1 electrode and the Y2 electrode are both disposed in another groove, and there is a distance between the Y1 electrode and the Y2 electrode; The Z1 electrode and the Z2 electrode are respectively installed in the two installation holes.
[0007] In an alternative embodiment, The mounting member is a columnar structure, and the same side end surface of the mounting member has a first end surface and a second end surface; The first end surface is provided with a mounting hole along the axial direction for mounting the Z1 electrode; The second end surface is provided with another mounting hole along the axial direction for mounting the Z2 electrode.
[0008] In an alternative embodiment, A baffle is provided between the first end surface and the second end surface, and the baffle is used to reduce interference between the Z1 electrode and the Z2 electrode.
[0009] In an alternative embodiment, The mounting component is further provided with a plurality of flow holes, and both the first end surface and the second end surface are provided with a plurality of the flow holes for plasma to flow through.
[0010] In an alternative embodiment, The X1 electrode, the X2 electrode, the Y1 electrode and the Y2 electrode are all arranged in a semi-cylindrical shape, and the side plane of the X1 electrode and the side plane of the X2 electrode are arranged opposite to each other, and the side plane of the Y1 electrode and the side plane of the Y2 electrode are arranged opposite to each other, so as to reduce obstruction to plasma flow.
[0011] In a second aspect, the present invention provides a method for measuring the plasma particle and oscillation propagation velocity measurement device, comprising the following steps: The plasma particle velocity is calculated based on the distance between the two electrodes in the same direction and the time required for the electrical signals of the two electrodes to rise to the peak.
[0012] In an alternative embodiment, The method of “calculating the plasma particle velocity based on the distance between the two electrodes in the same direction and the time required for the electrical signals of the two electrodes to rise to the peak” includes the following steps: Simultaneously start collecting the electrical signals of the two electrodes in the same direction. When the plasma flows through the surface of the first electrode, the electrons and ions in the plasma will gather on the electrode surface. The time it takes for the electrical signal to rise to the peak is recorded as ; The plasma continues to move, and when it passes the second electrode, the time it takes for the electrical signal to rise to its peak is ; Plasma particle speed It can be expressed as:
[0013] In an alternative embodiment, The same fixed-frequency electrical signal is applied to two electrodes in the same direction, the phase difference is measured, and the plasma oscillation propagation speed is calculated based on the phase difference.
[0014] In an alternative embodiment, The method of “applying the same fixed frequency electric signal to two electrodes in the same direction, measuring the phase difference, and calculating the plasma oscillation propagation speed based on the phase difference” includes the following steps: The distance between two electrodes in the same direction is , applying the same frequency to both electrodes signal; Record the signals from two electrodes and measure the phase difference between them ; According to the calculated plasma particle velocity , using the measured phase difference and known frequencies , calculate the plasma oscillation propagation speed:
[0015] in, is the plasma oscillation propagation speed.
[0016] The plasma particle and oscillation propagation velocity measuring device provided by the present invention provides an "X"-shaped groove on the end face of the substrate for fixing electrodes in the x and y directions, a through hole is provided in the middle of the end face of the substrate, and a mounting member is provided in the through hole. The two mounting holes on the mounting member are used to fix the two electrodes in the z direction, thereby realizing the measurement of the plasma particle velocity and the plasma oscillation propagation velocity. The overall device is simple, low in cost, occupies a small space and is easy to transport, thereby alleviating the technical problems of traditional plasma velocity measurement devices in the prior art, such as high cost, complexity, and difficulty in transportation between facilities. BRIEF DESCRIPTION OF THE DRAWINGS
[0017] In order to more clearly illustrate the specific embodiments of the present invention or the technical solutions in the prior art, the following briefly introduces the drawings required for use in the specific embodiments or the description of the prior art. Obviously, the drawings described below are some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.
[0018] Figure 1 A schematic diagram of the overall structure of a device for measuring the propagation velocity of plasma particles and oscillations provided in an embodiment of the present invention; Figure 2A schematic diagram of the structure of a plasma particle and oscillation propagation velocity measurement device from a first perspective provided by an embodiment of the present invention; Figure 3 This is a schematic structural diagram of the installation components in the plasma particle and oscillation propagation velocity measurement device provided by an embodiment of the present invention.
[0019] Icons: 10-X1 electrode; 20-X2 electrode; 30-Y1 electrode; 40-Y2 electrode; 50-Z1 electrode; 60-Z2 electrode; 100-substrate; 110-groove; 200-mounting component; 210-mounting hole; 220-baffle; 230-flow hole. DETAILED DESCRIPTION
[0020] The technical solution of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the embodiments described are only some embodiments of the present invention, not all embodiments. All other embodiments obtained by ordinary technicians in this field based on the embodiments of the present invention without making any creative efforts shall fall within the scope of protection of the present invention.
[0021] In the description of the present invention, it should be noted that the terms "center," "upper," "lower," "left," "right," "vertical," "horizontal," "inner," and "outer," etc., indicating orientations or positional relationships, are based on the orientations or positional relationships shown in the accompanying drawings and are intended solely to facilitate and simplify the description of the present invention. They are not intended to indicate or imply that the devices or components referred to must have, be constructed, or operate in a specific orientation, and therefore should not be construed as limitations on the present invention. Furthermore, the terms "first," "second," and "third" are used for descriptive purposes only and should not be construed as indicating or implying relative importance.
[0022] In the description of the present invention, it should be noted that, unless otherwise expressly specified or limited, the terms "mounted," "connected," and "connected" should be understood in a broad sense. For example, they may refer to fixed, detachable, or integral connections; mechanical or electrical connections; direct or indirect connections through an intermediate medium; and internal communication between two components. Those skilled in the art will understand the specific meanings of the above terms in the present invention based on specific circumstances.
[0023] The following describes the specific embodiments of the present invention in detail with reference to the accompanying drawings. It should be understood that the specific embodiments described herein are only used to illustrate and explain the present invention and are not intended to limit the present invention.
[0024] like Figure 1 、 Figure 2As shown, the plasma particle and oscillation propagation velocity measurement device provided in this embodiment includes: a substrate 100 and electrodes; two cross-arranged grooves 110 are provided on the end surface of the substrate 100. Specifically, the substrate 100 is a square cylindrical ceramic substrate 100, and the end surface of the substrate 100 is a flat surface. The positions of the two diagonal lines on the end surface of the substrate 100 are recessed to form the two cross-arranged grooves 110, wherein one groove 110 is used to accommodate two electrodes in the X direction, and the other groove 110 is used to accommodate two electrodes in the Y direction.
[0025] A through hole is provided in the middle of the end face of the substrate 100, and a mounting component 200 is provided in the through hole. The mounting component 200 has two mounting holes 210 for accommodating two electrodes in the Z direction. It should be noted that the two electrodes in the Z direction have a certain height difference, and the X direction, Y direction and Z direction are arranged perpendicularly to each other.
[0026] There are six electrodes in total, including an X1 electrode 10, an X2 electrode 20, a Y1 electrode 30, a Y2 electrode 40, a Z1 electrode 50 and a Z2 electrode 60; the X1 electrode 10 and the X2 electrode 20 are both arranged in the same groove 110, and there is a distance between the X1 electrode 10 and the X2 electrode 20; the Y1 electrode 30 and the Y2 electrode 40 are both arranged in another groove 110, and there is a distance between the Y1 electrode 30 and the Y2 electrode 40. Optionally, the X1 electrode 10, the X2 electrode 20, the Y1 electrode 30 and the Y2 electrode 40 are respectively located at the four corners of the end face of the base, that is, arranged in a symmetrical array.
[0027] In addition, the end face of the substrate 100 has four fixing holes arranged along the axial direction, and the four fixing holes are used to install the X1 electrode 10, the X2 electrode 20, the Y1 electrode 30 and the Y2 electrode 40 respectively. The parts of the X1 electrode 10, the X2 electrode 20, the Y1 electrode 30 and the Y2 electrode 40 extending out of the fixing holes are designed to be semi-cylindrical, and the side plane of the X1 electrode 10 and the side plane of the X2 electrode 20 are arranged opposite to each other, and the side plane of the Y1 electrode 30 and the side plane of the Y2 electrode 40 are arranged opposite to each other, which can reduce the obstruction of the flow field. The exposed part of the electrode is used to receive plasma and derive the electrical signal from the rear end of the electrode.
[0028] The Z1 electrode 50 and the Z2 electrode 60 are respectively installed in the two installation holes 210. Specifically, Figure 3 As shown, the mounting member 200 is a columnar structure, and the end face on the same side of the mounting member 200 has a first end face and a second end face. There is a certain height difference between the first end face and the second end face, that is, the first end face and the second end face are not on the same plane. The first end face is axially provided with a mounting hole 210 for mounting the Z1 electrode 50; the second end face is axially provided with another mounting hole 210 for mounting the Z2 electrode 60.
[0029] In an optional embodiment, a baffle 220 is provided between the first end surface and the second end surface, and the baffle 220 is used to reduce interference between the Z1 electrode 50 and the Z2 electrode 60 .
[0030] In an optional embodiment, the mounting member 200 is further provided with a plurality of flow holes 230 , and both the first end face and the second end face are provided with a plurality of flow holes 230 for plasma to flow through, so as to reduce obstruction to the flow field.
[0031] The plasma particle and oscillation propagation velocity measuring device of the present invention has the following beneficial effects: (1) The device is designed with multi-axis electrodes, which can measure the three-dimensional spatial distribution of plasma particle velocity. The electrodes on the three axes of the device can apply signals of different frequencies, avoiding mutual interference between signals.
[0032] (2) Based on the influence of plasma fluctuations on the signal phase, the three-dimensional plasma oscillation propagation velocity can be measured.
[0033] (3) The exposed parts of the X1 electrode 10, X2 electrode 20, Y1 electrode 30, and Y2 electrode 40 are designed to be semi-cylindrical, and the end face ceramic substrate 100 is designed with an "X"-shaped groove and a central opening, which can avoid obstruction of the flow field and improve measurement accuracy.
[0034] Based on the above, the measurement method of the plasma particle and oscillation propagation velocity measurement device provided in this embodiment can measure the plasma particle velocity and plasma oscillation propagation velocity. The specific method and principle are as follows: 1. Principle of plasma particle velocity measurement: Taking the X-direction electrode as an example, at the beginning of the measurement, the electrical signal collection of the X1 electrode 10 and the X2 electrode 20 is started at the same time. At this time, they have the same starting time and no electrical signal is actively applied to the electrodes. When the plasma flows through the surface of the X1 electrode 10, the electrons and ions in the plasma will gather on the electrode surface. At this time, an electrical signal will rise from nothing to something. The time it takes for the electrical signal to rise to the peak is recorded as ; When the plasma continues to move and passes through the X2 electrode 20, an electrical signal is also generated. The time when the electrical signal rises to the peak is recorded as . Given the distance between two electrodes After that, the plasma particle speed It can be expressed as:
[0035] Similarly, the plasma particle velocities in the other two directions can be obtained:
[0036] in and is the distance between electrodes in the Y and Z directions.
[0037] 2. Principle of plasma oscillation propagation velocity measurement: Taking the X-direction electrode as an example, unlike the measurement of plasma velocity, it is necessary to apply the same fixed frequency electrical signal to the two electrodes; in plasma, the oscillation propagation speed The Doppler frequency shift is caused by the flow of plasma. If there is relative motion between the oscillating propagation direction of the plasma and the incoming flow direction, the propagation velocity can be calculated by Doppler effect analysis. The specific steps are as follows: 1. Signal settings The two electrodes are spaced , the electrodes are subjected to the same frequency signal.
[0038] 2. Measuring phase difference Use an oscilloscope or other device to record the signals of the two electrodes and measure the phase difference between them , the phase difference is the plasma oscillation propagation speed and plasma particle speed The result of joint action.
[0039] 3. Calculate the oscillation propagation speed based on the phase difference
[0040] According to the plasma particle velocity calculated in the previous section , using the measured phase difference and known frequencies , the oscillation propagation speed can be solved by the following formula:
[0041] Similarly, the plasma oscillation propagation speed in the other two directions can be obtained:
[0042] in and are the frequency and phase of the signal applied to the electrodes in the X, Y, and Z directions.
[0043] In summary, the present invention can measure the three-dimensional plasma oscillation propagation velocity based on the influence of plasma fluctuations on the signal phase.
[0044] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, rather than to limit it. Although the present invention has been described in detail with reference to the above embodiments, those skilled in the art should understand that they can still modify the technical solutions described in the above embodiments, or replace some or all of the technical features therein with equivalents. However, these modifications or replacements do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of the present invention.
Claims
1. A plasma particle and oscillation propagation velocity measuring device, characterized in that: include: a substrate (100) and an electrode; The end surface of the base (100) is provided with two cross-shaped grooves (110), wherein one of the grooves (110) is used to accommodate the two electrodes in the X direction, and the other groove (110) is used to accommodate the two electrodes in the Y direction; A through hole is provided in the middle of the end surface of the base (100), a mounting component (200) is provided in the through hole, and the mounting component (200) has two mounting holes (210) for accommodating the two electrodes in the Z direction; The X direction, the Y direction and the Z direction are arranged perpendicular to each other.
2. The plasma particle and oscillation propagation velocity measuring device according to claim 1, characterized in that: There are six electrodes, including an X1 electrode (10), an X2 electrode (20), a Y1 electrode (30), a Y2 electrode (40), a Z1 electrode (50), and a Z2 electrode (60); The X1 electrode (10) and the X2 electrode (20) are both arranged in the same groove (110), and there is a distance between the X1 electrode (10) and the X2 electrode (20); The Y1 electrode (30) and the Y2 electrode (40) are both arranged in another groove (110), and there is a distance between the Y1 electrode (30) and the Y2 electrode (40); The Z1 electrode (50) and the Z2 electrode (60) are respectively installed in the two installation holes (210).
3. The plasma particle and oscillation propagation velocity measuring device according to claim 2, characterized in that: The mounting member (200) is a columnar structure, and the same-side end surface of the mounting member (200) has a first end surface and a second end surface; The first end surface is provided with a mounting hole (210) along the axial direction for mounting the Z1 electrode (50); The second end surface is provided with another mounting hole (210) along the axial direction, for mounting the Z2 electrode (60).
4. The plasma particle and oscillation propagation velocity measuring device according to claim 3, characterized in that: A baffle (220) is provided between the first end surface and the second end surface, and the baffle (220) is used to reduce interference between the Z1 electrode (50) and the Z2 electrode (60).
5. The plasma particle and oscillation propagation velocity measuring device according to claim 4, characterized in that: The mounting component (200) is further provided with a plurality of flow holes (230), and both the first end surface and the second end surface are provided with a plurality of the flow holes (230) for plasma to flow through.
6. The plasma particle and oscillation propagation velocity measuring device according to claim 5, characterized in that The X1 electrode (10), the X2 electrode (20), the Y1 electrode (30) and the Y2 electrode (40) are all arranged in a semi-cylindrical shape, and the side plane of the X1 electrode (10) and the side plane of the X2 electrode (20) are arranged relative to each other, and the side plane of the Y1 electrode (30) and the side plane of the Y2 electrode (40) are arranged relative to each other, so as to reduce obstruction to the plasma flow.
7. A method for measuring the plasma particle and oscillation propagation velocity of a device according to any one of claims 1 to 6, characterized in that: The following steps are involved: The plasma particle velocity is calculated based on the distance between the two electrodes in the same direction and the time required for the electrical signals of the two electrodes to rise to the peak.
8. The measuring method of the plasma particle and oscillation propagation velocity measuring device according to claim 7, characterized in that: The method of "calculating the plasma particle velocity based on the distance between two electrodes in the same direction and the time required for the electrical signals of the two electrodes to rise to the peak" includes the following steps: Simultaneously start collecting the electrical signals of the two electrodes in the same direction. When the plasma flows through the surface of the first electrode, the electrons and ions in the plasma will gather on the electrode surface. The time it takes for the electrical signal to rise to the peak is recorded as ; The plasma continues to move, and when it passes the second electrode, the time it takes for the electrical signal to rise to its peak is ; Plasma particle speed It can be expressed as: Where x is the distance between the two electrodes.
9. The measuring method of the plasma particle and oscillation propagation velocity measuring device according to claim 8, characterized in that: The same fixed-frequency electrical signal is applied to two electrodes in the same direction, the phase difference is measured, and the plasma oscillation propagation speed is calculated based on the phase difference.
10. The measuring method of the plasma particle and oscillation propagation velocity measuring device according to claim 9, characterized in that: The method of "applying the same fixed frequency electric signal to two electrodes in the same direction, measuring the phase difference, and calculating the plasma oscillation propagation speed based on the phase difference" includes the following steps: The distance between two electrodes in the same direction is , applying the same frequency to both electrodes signal; Record the signals from two electrodes and measure the phase difference between them ; According to the calculated plasma particle velocity , using the measured phase difference and known frequencies , calculate the plasma oscillation propagation speed: in, is the plasma oscillation propagation speed.