Reinforced ultrathin flexible glass as well as method and application thereof

Abstract

The invention provides reinforced ultra-thin flexible glass and a preparation method and application thereof, the reinforced ultra-thin flexible glass adopts a specific formula calculated by oxide percentage, and the contents of Li2O, P2O5 and Y2O3 in the reinforced flexible glass are not actively added or are controlled to be neglected, so that the rate and degree of the glass in the etching and reinforcing process are controlled, and the yield of the glass is improved. The thickness of the obtained reinforced ultra-thin flexible glass can reach 0.03 mm, and the reinforced ultra-thin flexible glass is high in light transmittance, small in haze and good in bending strength and impact resistance.

Description

Technical Field

[0001] This application relates to the field of glass materials technology, and in particular to a reinforced ultrathin flexible glass, its method and application. Background Technology

[0002] Ultra-thin flexible glass is a new type of glass material, characterized by a thickness of ≤0.15mm (150μm), breaking through the physical limitations of traditional glass. This means it can be bent or rolled arbitrarily under external force without thermal processing, and possesses excellent resilience and fatigue resistance. With the rapid rise of foldable devices, the application of ultra-thin glass in foldable devices is gradually becoming more widespread. The global penetration rate of foldable screen phones rapidly increased from 13% in 2020 to 70% in 2023, and the shipment volume of ultra-thin flexible glass is expected to reach 33.7 million pieces in 2025, with a compound annual growth rate of over 36%. Due to its high transmittance (>90%), scratch resistance, and crease resistance, ultra-thin flexible glass is gradually replacing CPI as the mainstream material for foldable screen cover plates.

[0003] However, although the existing ultra-thin flexible glass has been thinned and strengthened to a certain extent, its performance has not been significantly improved, making it difficult to meet the market demand for high bending performance and compressive strength of ultra-thin flexible glass. Summary of the Invention

[0004] The purpose of this application is to provide a reinforced ultrathin flexible glass, its preparation method and application, which still has good bending and compressive properties at a thickness of 0.03 mm.

[0005] In a first aspect, this application provides a reinforced ultrathin flexible glass, wherein the thickness of the reinforced ultrathin flexible glass is 0.03-0.15 mm; and it comprises the following components by mass percentage of oxides:

[0006] SiO2: 55.00wt-66.00wt%;

[0007] Al2O3: 15.00wt-25.00wt%;

[0008] Na2O: 8.00wt-16.00wt%;

[0009] K2O: 2.00wt-6.00wt%;

[0010] MgO: 1.00wt-5.00wt%;

[0011] Zr₂O: 0.10wt-2.00wt%;

[0012] B2O3: 0.20wt-3.00wt%.

[0013] The components satisfy the following relationship:

[0014] (1)13%≤((B2O3)+(K2O)) / ((Al2O3)+(ZrO2)+(Na2O))≤19%;

[0015] (2)16.00wt%≤((Al2O3)+(B2O3))≤25.00wt%;

[0016] The reinforced ultrathin flexible glass does not contain Li2O, P2O5, or Y2O3.

[0017] Furthermore, in some embodiments of this application, the reinforced ultrathin flexible glass does not contain CaO and / or SrO.

[0018] Furthermore, in some embodiments of this application, the reinforced ultrathin flexible glass includes a surface compressive stress layer on at least one side, and the depth of the surface compressive stress layer is 5-9 μm.

[0019] Furthermore, in some embodiments of this application, the thickness of the reinforced ultrathin flexible glass is 0.03mm-0.15mm, and its surface compressive stress is ≥550MPa.

[0020] Furthermore, in some embodiments of this application, the thickness of the reinforced ultrathin flexible glass is 0.03mm-0.15mm, and its average pen drop height is ≥60mm.

[0021] Furthermore, in some embodiments of this application, the thickness of the reinforced ultrathin flexible glass is 0.03mm-0.15mm, and the light transmittance at 550nm is ≥91.0%.

[0022] Furthermore, in some embodiments of this application, the thickness of the reinforced ultrathin flexible glass is 0.03mm-0.15mm, and its haze is ≤0.1.

[0023] Furthermore, in some embodiments of this application, the ultimate bending radius of the reinforced ultrathin flexible glass is ≤0.50mm when the thickness is 0.03mm.

[0024] Furthermore, in some embodiments of this application, the reinforced ultrathin flexible glass, at a thickness of 0.03 mm, has at least resistance to a ball-to-ring impact force of 8 N.

[0025] Furthermore, in some embodiments of this application, the surface roughness of the reinforced ultrathin flexible glass is ≤0.5nm.

[0026] Furthermore, in some embodiments of this application, when the length, width and thickness of the reinforced ultrathin flexible glass are 160*140*0.03mm, the ratio of the difference between the minimum thickness and the maximum thickness to the maximum thickness of the reinforced ultrathin flexible glass is not higher than 15%.

[0027] Furthermore, in some embodiments of this application, the reinforced ultrathin flexible glass is obtained by simultaneously chemically etching and strengthening an ultrathin base glass.

[0028] Secondly, this application also provides a method for preparing the reinforced ultrathin flexible glass described in the first aspect, comprising the following steps:

[0029] Step 1: Provide ultra-thin base glass;

[0030] Step 2: Simultaneous chemical etching and strengthening of the ultrathin base glass provided in Step 1 to obtain reinforced ultrathin flexible glass;

[0031] The ultrathin base glass has a thickness of 0.15–0.3 mm, and its composition, based on the mass percentage of oxides, includes the following components:

[0032] SiO2: 55-66%;

[0033] Al2O3: 15-25%;

[0034] Na2O: 8-16%;

[0035] K2O: 2-6%;

[0036] MgO: 1-5%;

[0037] Zr2O: 0.1-2%;

[0038] B2O3: 0.2-3%.

[0039] And each component satisfies the following relationship:

[0040] (1)13%≤((B2O3)+(K2O)) / ((Al2O3)+(ZrO2)+(Na2O)≤19%;

[0041] (2)16%≤((Al2O3)+(B2O3))≤25%;

[0042] Furthermore, the ultrathin base glass does not contain Li2O, P2O5, or Y2O3.

[0043] Furthermore, in some embodiments of this application, in the simultaneous chemical etching strengthening process, the average etching rate of the ultrathin base glass is less than the average strengthening rate of the ultrathin base glass. Furthermore, in some embodiments of this application, in the simultaneous chemical etching strengthening step, the molten salt used for chemical etching strengthening comprises at least KNO3 and KOH; its chemical etching strengthening temperature is 250℃-400℃; and its chemical etching strengthening time is 120min-180min.

[0044] Furthermore, in some embodiments of this application, the mass ratio of KNO3 to KOH in the chemically etch-strengthened molten salt is 50%-90%:10%-50%.

[0045] Furthermore, in some embodiments of this application, the chemically etch-enhanced molten salt further includes NaNO3; the amount of NaNO3 in the chemically etch-enhanced molten salt is 0-5% by mass.

[0046] Thirdly, this application also provides the ultrathin base glass used in the second aspect, with a thickness of 0.15 to 0.3 mm, comprising the following components by mass percentage of oxides:

[0047] SiO2: 55-66%;

[0048] Al2O3: 15-25%;

[0049] Na2O: 8-16%;

[0050] K2O: 2-6%;

[0051] MgO: 1-5%;

[0052] Zr2O: 0.1-2%;

[0053] B2O3: 0.2-3%.

[0054] The components satisfy the following relationship:

[0055] (1)13%≤((B2O3)+(K2O)) / ((Al2O3)+(ZrO2)+(Na2O)≤19%;

[0056] (2)16%≤((Al2O3)+(B2O3))≤25%;

[0057] The ultrathin base glass does not contain Li2O, P2O5, or Y2O3.

[0058] Furthermore, in some embodiments of this application, the ultrathin base glass does not contain CaO and / or SrO.

[0059] Furthermore, in some embodiments of this application, the thickness of the ultrathin base glass is 0.1mm-0.3mm, and its light transmittance at 550nm is ≥91.0%.

[0060] Furthermore, in some embodiments of this application, the thickness of the ultrathin base glass is 0.1mm-0.3mm, and its haze is ≤0.2.

[0061] Fourthly, this application also provides applications of reinforced ultrathin flexible glass prepared by the method described in the first aspect or the method described in the second aspect in communication devices, automotive displays or windows, foldable electronic devices, aerospace window glass, aviation radiation-resistant glass, advertising displays, building curtain walls, photovoltaic equipment, medical devices and / or furniture decoration.

[0062] Fifthly, this application also provides an electronic device comprising the reinforced ultrathin flexible glass described in the first aspect or the reinforced ultrathin flexible glass prepared by the method described in the second aspect.

[0063] In a sixth aspect, this application also provides an electronic device, including a housing and a mid-frame; the housing includes the reinforced ultrathin flexible glass described in the first aspect or the reinforced ultrathin flexible glass prepared by the method described in the second aspect.

[0064] The beneficial effects of this application are:

[0065] 1. The reinforced ultrathin flexible glass provided in this application uses a specific formula calculated as a percentage of oxides, and does not actively add or controls the content of Li2O, P2O5 and Y2O3 in the reinforced flexible glass to be negligible, so as to control the rate and degree of glass etching and strengthening process, so that the reinforced ultrathin flexible glass can not only reach a thickness of 0.03mm, but also has high light transmittance, low haze, and good bending strength and impact resistance.

[0066] 2. The reinforced ultrathin flexible glass provided in this application can also perform chemical etching and chemical strengthening simultaneously in a concurrent chemical etching strengthening process, which reduces the problems of long process flow and cycle, high material, equipment and labor costs, low yield, and significant performance loss caused by the separate chemical thinning and chemical strengthening steps.

[0067] 3. The reinforced ultrathin flexible glass provided in this application has a thickness of 0.03 mm, which can simultaneously achieve at least resistance to 8N ball-to-ring impact force and an ultimate bending radius ≤0.50 mm.

[0068] The reinforced ultrathin flexible glass provided in this application, when the thickness is between 0.03mm and 0.15mm, can simultaneously achieve excellent performance with a light transmittance of ≥91.0% at 550nm, haze ≤0.1, average coating drop height ≥60mm, surface compressive stress ≥550MPa, and the ratio of the difference between the minimum and maximum thickness to the maximum thickness of the reinforced ultrathin flexible glass not exceeding 15%. Attached Figure Description

[0069] To more clearly illustrate the technical solutions of the embodiments of this application, the accompanying drawings used in the embodiments will be briefly introduced below. It should be understood that the following drawings only show some embodiments of this application and should not be regarded as a limitation of the scope. For those skilled in the art, other related drawings can be obtained based on these drawings without creative effort.

[0070] Figure 1 The flowchart of the preparation method of reinforced ultrathin flexible glass provided in this application and the flowchart of the preparation method of reinforced ultrathin flexible glass in the prior art. Detailed Implementation

[0071] To make the objectives, technical solutions, and advantages of the embodiments of this application clearer, the technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0072] In this application, transmittance refers to the ratio of the radiant energy projected onto and transmitted through an object to the total radiant energy projected onto the object during the process of incident light flux from the incident surface or medium to the other side.

[0073] In this application, base glass refers to glass that has not undergone etching or strengthening treatment.

[0074] Test method:

[0075] 1. Stress test:

[0076] In this application, the CS, CT, and DOL of the glass under test are tested using an FSM-6000 device. During the test, the refractive index is set to 1.504 and the photoelastic coefficient is set to 28.6. The average strengthening rate is calculated from the DOL value measured per unit time interval.

[0077] 2. Optical performance testing

[0078] Transmittance testing was conducted according to the national standard GB / T 7962.12-2010 "Test Methods for Colorless Optical Glass - Part 12: Internal Spectral Transmittance," using a haze meter to measure the glass transmittance. Specifically, the transmittance of five pieces of glass from the same batch to different wavelengths of light was measured using a haze meter. The average transmittance of the five pieces of glass measured at 550 nm wavelength was taken as the transmittance result of the glass at 550 nm wavelength.

[0079] The haze meter used in this application test is a Konica Minolta CM-3600A spectrophotometer from Japan. The light-receiving optical system is transmission, the spectral dispersive method is a planar refracting grating, the wavelength range is 360nm~740nm, the wavelength spacing is 10nm, the illumination source is a pulsed xenon lamp X4, the ambient temperature where the instrument is placed is 24℃, and the air humidity is 40%.

[0080] 3. Surface roughness test

[0081] In this application, the surface roughness test was conducted in accordance with the provisions of GB / T 32642.

[0082] 4. Thickness test

[0083] In this application, the thickness of the glass under test is measured using a digital micrometer (Mitutoyo 406-250-30) or a laser thickness gauge. The average etching rate is obtained from the thickness value per unit etching time interval.

[0084] 5. Ball-to-ring test

[0085] In this application, an electronic universal testing machine was used for testing. The ball head was made of stainless steel with a diameter of 1 mm. The inner diameter of the support ring was 4 mm, the outer diameter was 6 mm, and the wall thickness was 1 mm. The ring support surface was hemispherical. The center of the ultrathin flexible glass was placed between the support ring and the extrusion ball head. The ball head was pressed down at a speed of 1.2 mm / min to compress the surface of the ultrathin flexible glass until the ultrathin flexible glass broke. The force value at the time of breakage was recorded.

[0086] 6. Critical radius of curvature test for bending

[0087] In this application, the test results were obtained by referring to the national standard GB / T 38686-2020 "Test Method for Flexibility of Ultrathin Glass - Two-point Bending Method"; the difference is that in this application, the glass is etched and strengthened, then cleaned before the performance is tested.

[0088] 7. Test method for mass percentage of Li2O and B2O3 components

[0089] In this application, the mass percentages of Li2O and B2O3 components in the glass were tested according to the national standard GB / T 1549-2008.

[0090] 8. Determination of the mass percentage of the glass composition in this application

[0091] The composition of the glass in this application was determined by X-ray fluorescence spectrometry (XRF). The testing equipment used was a Thermo Scientific ARL. TM The XRF instrument used was PERFORM'X, with a target of Rh (rhodium), a photodiode voltage of 40 kW, a current of 60 mA, a collimator of 0.15, a LiF200 crystal, an FPC detector, a 29 mm circular detection range, and UniQuant standard-free analysis software. Standard-free XRF testing was employed. The instrument cannot measure the concentration of elements with atomic numbers 6 and below, or their oxides, in the glass. SiO2, Al2O3, P2O5, ZrO2, Na2O, K2O, CaO, NiO, Y2O3, SrO, and MgO are the mass percentages of oxides that XRF can accurately measure. Li2O and B2O3 are oxides that XRF cannot accurately measure.

[0092] Therefore, by substituting the Li2O and B2O3 content values ​​obtained from the above tests into the XRF test results, the complete mass percentage of the glass composition can be obtained.

[0093] 9. Average coating pen drop height test

[0094] In this application, a marker pen is used to test the pen impact. The pen impact height is obtained according to the method in group standard T / CSTM 00409-2021. Before testing the pen impact height, an OCA+PE film with a thickness greater than 50μm is applied to the first and second surfaces of the glass to be tested using a roller press. The average pen impact height of 5 coated glass pieces is taken as the average pen impact height of the glass to be tested.

[0095] Traditional ultrathin flexible glass manufacturing processes often employ a two-stage forming process (chemical thinning). This involves first chemically thinning a relatively thick glass sheet to a specific thickness, followed by post-processing and strengthening to obtain bendable, reinforced ultrathin flexible glass. However, the post-processing of ultrathin flexible glass is lengthy, leading to low yield rates during production. This, in turn, degrades the performance of the reinforced ultrathin flexible glass, making it difficult to meet the rapidly increasing market demand for bending and compressive strength. Based on this, the applicant proposes a novel reinforced ultrathin flexible glass in this application. This reinforced ultrathin flexible glass features an optimized component formulation, with redesigned proportions between components to ensure that its performance is not significantly affected during etching and strengthening processes, resulting in reinforced ultrathin flexible glass with excellent bending and compressive strength.

[0096] In a first aspect, this application provides a reinforced ultrathin flexible glass, wherein the thickness of the reinforced ultrathin flexible glass is 0.03-0.15 mm; and it comprises the following components by mass percentage of oxides:

[0097] SiO2: 55-66%;

[0098] Al2O3: 15-25%;

[0099] Na2O: 8-16%;

[0100] K2O: 2-6%;

[0101] MgO: 1-5%;

[0102] Zr2O: 0.1-2%;

[0103] B2O3: 0.2-3%.

[0104] The components satisfy the following relationship:

[0105] (1)13%≤((B2O3)+(K2O)) / ((Al2O3)+(ZrO2)+(Na2O)≤19%;

[0106] (2)16%≤((Al2O3)+(B2O3))≤25%;

[0107] The reinforced ultrathin flexible glass does not contain Li2O, P2O5, or Y2O3.

[0108] In this application, "the reinforced ultrathin flexible glass does not contain Li2O, P2O5 and Y2O3" should be understood as follows: when providing the raw materials for preparing the reinforced ultrathin flexible glass of this application, no salts or elements containing Li2O, P2O5 and Y2O3 or capable of forming oxides of Li2O, P2O5 and Y2O3 are actively added, and the content of impurities such as Li2O, P2O5 and Y2O3 is also controlled in the other raw materials used, so that the content of Li2O, P2O5 and Y2O3 in the obtained reinforced ultrathin flexible glass is not higher than 100 PPM.

[0109] The applicant discovered that the presence of certain amounts of Li₂O, P₂O₅, and Y₂O₃ in ultrathin flexible glass can negatively impact the performance of the strengthened ultrathin flexible glass formed after etching. The reasons may be as follows: the glass network formed by P₂O₅, SiO₂, and B₂O₃ has lower chemical stability compared to the glass network formed by SiO₂ and B₂O₃, which is detrimental to the etching of ultrathin flexible glass. Y₂O₃, as an oxide on the network exterior, leads to decreased stability during the etching strengthening process, especially when etching with hydroxides containing other alkali metal ions larger than Li atoms, affecting the surface quality of the etch-strengthened ultrathin flexible glass and consequently its bending performance. Li₂O may inhibit the strengthening rate of the ultrathin flexible glass, thus affecting the DOL depth after K-Na strengthening. Therefore, the resulting strengthened ultrathin flexible glass exhibits lower bending, compressive, and impact resistance after etching compared to strengthened ultrathin flexible glass without Li₂O, P₂O₅, and Y₂O₃.

[0110] Furthermore, the applicant also discovered that when the strengthened ultrathin flexible glass provided in this application does not contain CaO and / or SrO, it is more beneficial to improve the warping and wrinkling defects that easily occur after the ultrathin flexible glass is etched and strengthened. The reason may be that although CaO and SrO are all alkaline earth metal oxides like MgO, compared to MgO, CaO and SrO contain more Ca... 2+ and Sr 2+ A larger ionic radius results in a higher coefficient of thermal expansion for the formed reinforced ultrathin flexible glass, which reduces its resistance to thermal shock and makes it more prone to warping and wrinkling defects during high-temperature strengthening. It should be noted that the statement "the ultrathin flexible glass provided in this application does not contain CaO and / or SrO" should also be understood as CaO and / or SrO. When providing the raw materials for preparing the reinforced ultrathin flexible glass of this application, no salts or elements containing CaO and / or SrO or capable of forming oxides like CaO and / or SrO are actively added. Furthermore, the content of impurities such as CaO and / or SrO in other raw materials used is controlled so that the content of CaO and / or SrO in the resulting reinforced ultrathin flexible glass does not exceed 100 PPM.

[0111] In this application, SiO2 acts as a network forging agent in the glass, forming a glass network structure. However, excessive SiO2 content leads to poor glass meltability, increased viscosity of the molten glass, and difficulty in clarifying the glass. Insufficient SiO2 results in an unstable glass network structure and easy crystallization. Therefore, to meet the glass formability requirements, in some embodiments of this application, the SiO2 content in the strengthened ultrathin flexible glass, based on the mass percentage of oxides, is 55.00 wt%-66.00 wt%, preferably 57 wt%-64 wt%, and more preferably 58 wt%-63 wt%. For example, the SiO2 content in the reinforced ultrathin flexible glass, by mass percentage of oxides, can be: 55.00 wt%, 55.50 wt%, 56.00 wt%, 56.50 wt%, 57.00 wt%, 57.50 wt%, 58.00 wt%, 58.50 wt%, 59.00 wt%, 59.50 wt%, 60.00 wt%, 60.50 wt%, 61.00 wt%, 61.50 wt%, 62.00 wt%, 62.50 wt%, 63.00 wt%, 63.50 wt%, 64.00 wt%, 64.50 wt%, 65.00 wt%, 65.50 wt%, or 76.00 wt%, etc., and all ranges and sub-ranges between the above values. It should be understood that, in embodiments, any of the above ranges can be combined with any other range.

[0112] In the glass system of this application, Al2O3 serves as an intermediate in the glass network, supplementing the network. During chemically strengthened etching, the ion exchange rate can be adjusted by changing the spatial dimensions within the glass network used for ion exchange. Furthermore, the good chemical stability of Al2O3 significantly influences the chemical etching rate. Therefore, in some embodiments of this application, the Al2O3 content in the strengthened ultrathin flexible glass, based on the mass percentage of oxides, is 15.00 wt%-25.00 wt%, preferably 16 wt%-23 wt%, and more preferably 17 wt%-20 wt%. For example, the Al2O3 content in the reinforced ultrathin flexible glass, by mass percentage of oxides, can be: 15.00 wt%, 15.50 wt%, 16.00 wt%, 16.50 wt%, 17.00 wt%, 17.50 wt%, 18.00 wt%, 18.50 wt%, 19.00 wt%, 19.50 wt%, 20.00 wt%, 20.50 wt%, 21.00 wt%, 22.00 wt%, 22.50 wt%, 23.00 wt%, 23.50 wt%, 24.00 wt%, 24.50 wt%, or 25.00 wt%, etc., and all ranges and sub-ranges between the above values. It should be understood that, in embodiments, any of the above ranges can be combined with any other range.

[0113] In the glass system of this application, ZrO2 serves as an intermediate in the glass network, supplementing the network; ZrO2 can increase the ion exchange rate of the glass and improve the strengthening depth. However, excessive ZrO2 increases the difficulty of glass melting and causes crystallization. Therefore, in some embodiments of this application, the ZrO2 content in the strengthened ultrathin flexible glass is 0.10 wt% to 2.00 wt%, preferably 0.3 wt% to 2 wt%, and more preferably 0.5 wt% to 1.5 wt%, based on the mass percentage of oxides. For example, the ZrO2 content in the reinforced ultrathin flexible glass, by mass percentage of oxides, can be 0.10 wt%, 0.20 wt%, 0.30 wt%, 0.40 wt%, 0.50 wt%, 0.60 wt%, 0.70 wt%, 0.80 wt%, 0.90 wt%, 1.00 wt%, 1.10 wt%, 1.20 wt%, 1.30 wt%, 1.40 wt%, 1.50 wt%, 1.60 wt%, 1.70 wt%, 1.80 wt%, 1.90 wt%, or 2.00 wt%, etc., and all ranges and sub-ranges between the above values. It should be understood that, in embodiments, any of the above ranges can be combined with any other range.

[0114] In the glass system of this application, Na2O is a network exooxide that can provide free oxygen. An appropriate amount of Na2O is beneficial for improving the viscosity of the glass, promoting the melting and clarification of the molten glass, increasing Na-K exchange in the glass, ensuring CS (constituent oxygen content), and controlling DOL (dryness index). However, excessive Na2O will affect the degree of connection in the glass's network structure, thereby affecting the glass's stability. Therefore, in some embodiments of this application, the Na2O content in the strengthened ultrathin flexible glass is 8.00wt%-16.00wt% by mass percentage of the oxide; preferably 9wt%-15wt%, and more preferably 10wt%-14wt%. For example, the Na₂O content in the reinforced ultrathin flexible glass, by mass percentage of oxides, can be 8.00 wt%, 8.50 wt%, 9.00 wt%, 8.50 wt%, 10.00 wt%, 10.50 wt%, 11.00 wt%, 11.50 wt%, 12.00 wt%, 12.50 wt%, 13.00 wt%, 13.50 wt%, 14.00 wt%, 14.50 wt%, 15.00 wt%, 15.50 wt%, or 16.00 wt%, etc., and all ranges and sub-ranges between the above values. It should be understood that, in embodiments, any of the above ranges can be combined with any other range.

[0115] In the glass system of this application, K2O is an oxide on the glass network, which can reduce the difficulty of glass melting and is beneficial to production. However, K2O can affect the chemical strengthening effect in the glass and is not conducive to Na-K exchange in the glass. Therefore, in some embodiments of this application, the K2O content in the strengthened ultrathin flexible glass is 2.00wt%-6.00wt% by mass percentage of oxide; preferably 2.5wt%-5.5wt%, and more preferably 3wt%-5wt%. For example, the K₂O content in the reinforced ultrathin flexible glass, by mass percentage of oxides, can be 2.00 wt%, 2.20 wt%, 2.40 wt%, 2.60 wt%, 2.80 wt%, 3.00 wt%, 3.20 wt%, 3.40 wt%, 3.60 wt%, 3.80 wt%, 4.00 wt%, 4.20 wt%, 4.40 wt%, 4.60 wt%, 4.80 wt%, 5.00 wt%, 5.20 wt%, 5.40 wt%, 5.60 wt%, 5.80 wt%, or 6.00 wt%, etc., and all ranges and sub-ranges between the above values. It should be understood that, in embodiments, any of the above ranges can be combined with any other range.

[0116] In the glass system of this application, MgO is a network oxide that provides free oxygen. However, at high temperatures, MgO can increase the high-temperature viscosity, which is beneficial for glass forming. Therefore, in some embodiments of this application, the MgO content in the strengthened ultrathin flexible glass is 1.00wt%-5.00wt% by mass percentage of oxides; preferably 1.5wt%-4.5wt%, and more preferably 2wt%-4wt%. For example, the MgO content in the reinforced ultrathin flexible glass, by mass percentage of oxides, can be 1.00 wt%, 1.20 wt%, 1.40 wt%, 1.60 wt%, 1.80 wt%, 2.00 wt%, 2.20 wt%, 2.40 wt%, 2.60 wt%, 2.80 wt%, 3.00 wt%, 3.20 wt%, 3.40 wt%, 3.60 wt%, 3.80 wt%, 4.00 wt%, 4.20 wt%, 4.40 wt%, 4.60 wt%, 4.80 wt%, or 5.00 wt%, etc., and all ranges and sub-ranges between the above values. It should be understood that, in embodiments, any of the above ranges can be combined with any other range.

[0117] B2O3 helps lower the melting temperature of the substrate glass and improves its transmittance, overall uniformity, and other properties. Simultaneously, B2O3 possesses excellent chemical stability, influencing the etching of the glass. In some embodiments of this application, the B2O3 content in the reinforced ultrathin flexible glass, based on the mass percentage of oxides, is 0.20 wt% to 3.00 wt%, preferably 0.4 wt% to 2 wt%, and more preferably 0.6 wt% to 1.5 wt%. For example, the B2O3 content in the reinforced ultrathin flexible glass, by mass percentage of oxides, can be: 0.20 wt%, 0.30 wt%, 0.40 wt%, 0.50 wt%, 0.60 wt%, 0.70 wt%, 0.90 wt%, 1.00 wt%, 1.30 wt%, 1.50 wt%, 1.80 wt%, 2.00 wt%, 2.10 wt%, 2.30 wt%, 2.50 wt%, 2.70 wt%, 2.90 wt%, or 3.00 wt%, etc., and all ranges and sub-ranges between the above values. It should be understood that, in embodiments, any of the above ranges can be combined with any other ranges.

[0118] The reinforced ultrathin flexible glass in this application maintains good bending performance, compressive strength, and impact resistance even after being etched and thinned. This is due not only to the selection or omission of various components, but also to the controlled dosage of B2O3, K2O, Al2O3, ZrO2, and Na2O, satisfying the following relationship:

[0119] (1)13%≤((B2O3)+(K2O)) / ((Al2O3)+(ZrO2)+(Na2O)≤19%;

[0120] (2)16%≤((Al2O3)+(B2O3))≤25%.

[0121] In some embodiments of this application, the ratio of ((B₂O₃) + (K₂O)) / ((Al₂O₃) + (ZrO₂) + (Na₂O)) by mass percentage of oxides can be controlled at 13.00%, 13.20%, 13.40%, 13.60%, 13.80%, 14.00%, 14.20%, 14.40%, 14.60%, 14.80%, 15.00%, and 15.20%. %, 15.40%, 15.60%, 15.80%, 16.00%, 16.20%, 16.40%, 16.60%, 16.80%, 17.00%, 17.20%, 17.40%, 17.60%, 17.80%, 18.00%, 18.20%, 18.40%, 18.60%, 18.80%, or 19.00%, etc., as well as all ranges and sub-ranges between the above values. It should be understood that, in the implementation, any of the above ranges can be combined with any other range.

[0122] Meanwhile, in some embodiments of this application, the content of Al2O3+B2O3 in the reinforced ultrathin flexible glass is controlled within the range of 16.00wt% to 25.00wt% by mass percentage of oxides, preferably, the content of Al2O3+B2O3 is controlled within the range of 17wt% to 22wt%. For example, the content of Al2O3+B2O3, by mass percentage of oxides, can be 16.00 wt%, 16.20 wt%, 16.40 wt%, 16.60 wt%, 16.80 wt%, 17.00 wt%, 17.20 wt%, 17.40 wt%, 17.60 wt%, 17.80 wt%, 18.00 wt%, 18.20 wt%, 18.40 wt%, 18.60 wt%, 18.80 wt%, 19.00 wt%, 19.20 wt%, 19.40 wt%, 19.60 wt%, 19.80 wt%, 20.00 wt%, 20.20 wt%, 20.40 wt%, 20.60 wt%, 20.80 wt%, etc. t%, 21.00wt%, 21.20wt%, 21.40wt%, 21.60wt%, 21.80wt%, 22.00wt%, 22.20wt%, 22.40wt%, 22.60wt%, 22.80wt%, 23.00wt%, 23.20wt%, 23.40wt%, 23.60wt%, 23.80wt%, 24.00wt%, 24.20wt%, 24.40wt%, 24.60wt%, 24.80wt%, 25.00wt%, 25.20wt%, 25.40wt%, 25.60wt%, 25.80wt%, or 26.00wt%, etc., as well as all ranges and subranges between the above values. It should be understood that, in the embodiments, any of the above ranges can be combined with any other range.

[0123] In some embodiments of this application, when the thickness of the reinforced ultrathin flexible glass is 0.03mm-0.15mm, its surface compressive stress can reach at least 550MPa. That is, even when the thickness of the reinforced ultrathin flexible glass is 0.03mm, its surface compressive stress can reach at least 550MPa, and further up to 670MPa, or even 700MPa. It can be seen that the reinforced ultrathin flexible glass provided by this application has good compressive stress strength.

[0124] In some embodiments of this application, when the thickness of the reinforced ultrathin flexible glass is 0.03 mm, its ultimate bending radius is ≤0.50 mm. That is, even when the thickness of the reinforced ultrathin flexible glass is 0.03 mm, its ultimate bending radius is ≤0.50 mm, and can further reach no more than 0.40 mm, or even 0.37 mm. When the thickness is 0.05 mm, the ultimate bending radius is ≤1.1 mm, and can further reach no more than 1 mm, or even 0.97 mm. It can be seen that the reinforced ultrathin flexible glass provided by this application has good bending performance.

[0125] In some embodiments of this application, the reinforced ultrathin flexible glass with a thickness of 0.03mm-0.05mm has at least resistance to a ball-on-ring impact force of 8N, and can further reach resistance to a ball-on-ring impact force of 10N, or even resistance to a ball-on-ring impact force of 12N. It can be seen that the reinforced ultrathin flexible glass provided by this application has good impact resistance.

[0126] In some embodiments of this application, when the thickness of the reinforced ultrathin flexible glass is 0.03mm-0.15mm, its average pen drop height can reach at least ≥60mm. That is, even when the thickness of the reinforced ultrathin flexible glass is 0.03mm, its average pen drop height can reach at least ≥60mm, and further can reach an average pen drop height of 65mm. In some preferred embodiments, the reinforced ultrathin flexible glass can even reach an average pen drop height of more than 70mm. It can be seen that the reinforced ultrathin flexible glass provided by this application has good impact resistance.

[0127] It is evident that the reinforced ultrathin flexible glass provided in this application possesses excellent compressive strength, bending performance, and impact resistance.

[0128] In some embodiments of this application, the reinforced ultrathin flexible glass includes a surface compressive stress layer on at least one side, the depth (DOL) of which is 5 to 9 μm, preferably both sides include a surface compressive stress layer, and the depth of the surface compressive stress layer on each side is 5 to 9 μm, preferably 6 to 7.5 μm.

[0129] In some embodiments of this application, the thickness of the reinforced ultrathin flexible glass can reach 0.03-0.15 mm, exhibiting excellent light transmission performance. For example, with a thickness of 0.03 mm-0.15 mm, the transmittance of the reinforced ultrathin flexible glass at 550 nm can reach over 91%, more preferably over 91.5%, and even up to 92.00%. Simultaneously, its haze can be reduced to below 0.1, more preferably below 0.05, and even below 0.03 in some preferred embodiments. Therefore, the reinforced ultrathin flexible glass provided by this application also possesses excellent light transmission and lower haze.

[0130] In some embodiments of this application, the thickness of the reinforced ultrathin flexible glass can be between 0.03 and 0.15 mm. In some embodiments of this application, the thickness of the reinforced ultrathin flexible glass can be 0.03 mm, 0.04 mm, 0.05 mm, 0.06 mm, 0.07 mm, 0.08 mm, 0.09 mm, or 0.1 mm, as well as all ranges and sub-ranges between these values. It should be understood that, in embodiments, any of the above ranges can be combined with any other range.

[0131] In some embodiments of this application, the surface roughness of the reinforced ultrathin flexible glass is below 0.5 nm, and can further reach below 0.45 nm. In some preferred embodiments, the surface roughness of the reinforced ultrathin flexible glass can reach below 0.3 nm.

[0132] In some embodiments of this application, the surface thickness uniformity of the reinforced ultrathin flexible glass is also high, and the ratio of the difference between the minimum and maximum thickness to the maximum thickness of the reinforced ultrathin flexible glass is no higher than 15% of the maximum thickness. Taking a reinforced ultrathin flexible glass with a length, width, and thickness of 160*140*0.03mm as an example, the absolute value of the difference between its minimum and maximum thickness is no higher than 4μm; that is, when its length, width, and thickness are 160*140*0.03mm, the ratio of the difference between its minimum and maximum thickness to the maximum thickness of the ultrathin flexible glass is no higher than 15%, indicating high surface thickness uniformity and excellent performance.

[0133] Secondly, this application provides a method for preparing the reinforced ultrathin flexible glass as described above, comprising the following steps:

[0134] Step 1: Provide ultra-thin base glass;

[0135] Step 2: Simultaneous chemical etching is performed on the ultrathin base glass provided in Step 1 to obtain reinforced ultrathin flexible glass.

[0136] In the preparation method of this application, the thickness of the ultrathin base glass is 0.15-0.3 mm, and its composition, based on the mass percentage of oxides, includes the following components:

[0137] SiO2: 55-66%;

[0138] Al2O3: 15-25%;

[0139] Na2O: 8-16%;

[0140] K2O: 2-6%;

[0141] MgO: 1-5%;

[0142] Zr2O: 0.1-2%;

[0143] B2O3: 0.2-3%.

[0144] And each component satisfies the following relationship:

[0145] (1)13%≤((B2O3)+(K2O)) / ((Al2O3)+(ZrO2)+(Na2O)≤19%;

[0146] (2)16%≤((Al2O3)+(B2O3))≤25%;

[0147] Furthermore, the reinforced ultrathin flexible glass does not contain Li2O, P2O5, or Y2O3.

[0148] By utilizing the specially selected combination of components in ultra-thin base glass and the relationships between these components, the etching and strengthening speeds, as well as the etching and strengthening processes, of the ultra-thin base glass during the etching and strengthening process can be adjusted. This effectively controls and improves the performance of the resulting strengthened ultra-thin flexible glass, thereby obtaining strengthened ultra-thin flexible glass with high bending performance, high impact resistance, high compressive strength, high light transmittance, and low haze.

[0149] In this application, the applicant discovered that in the simultaneous etching strengthening process, a higher average strengthening rate is more advantageous for improving the compressive and impact resistance of strengthened ultrathin flexible glass compared to the average etching rate. Therefore, in this application, the formulation of the ultrathin base glass is adjusted in specific components and proportions to achieve an average strengthening rate higher than the average etching rate in the simultaneous etching strengthening process, thereby obtaining strengthened ultrathin flexible glass with significantly improved compressive stress and pen drop height test results. The reason may be that a higher average strengthening rate than the average etching rate allows the ultrathin base glass to retain a chemically strengthened layer of a certain depth during the etching process. At the same time, when the average strengthening rate and average etching rate reach a certain speed, at the corresponding etching temperature and etching time, a chemically strengthened layer of a specific depth of 5-9μm can be formed when the glass is etched to the required thickness. This ensures that the compressive and impact resistance of the obtained ultrathin flexible glass reaches a certain level, while also ensuring that the tensile stress of the obtained ultrathin flexible glass does not exceed the upper limit, and the state of the glass after being stressed is more stable. However, if the strengthening depth is further increased, that is, the compressive stress layer depth gradually increases and the tensile stress layer depth gradually decreases, the tensile stress will increase. Excessive tensile stress results in excessive rigidity of the glass, and the rebound force during bending is very large, which cannot guarantee the bending performance of the glass.

[0150] In this application, "the ultra-thin base glass does not contain Li2O, P2O5 and Y2O3" should be understood as follows: when providing the raw materials for preparing the ultra-thin base glass of this application, no salts or elements containing Li2O, P2O5 and Y2O3 or capable of forming oxides of Li2O, P2O5 and Y2O3 are actively added, and the content of impurities such as Li2O, P2O5 and Y2O3 is also controlled in the other raw materials used, so that the content of Li2O, P2O5 and Y2O3 in the obtained ultra-thin base glass is not higher than 100 PPM.

[0151] The applicant discovered that the presence of certain amounts of Li₂O, P₂O₅, and Y₂O₃ in the ultrathin base glass actually negatively impacts the performance of the strengthened ultrathin flexible glass formed after etching. The reasons may be as follows: the glass network formed by P₂O₅, SiO₂, and B₂O₃ has lower chemical stability compared to the glass network formed by SiO₂ and B₂O₃, which is detrimental to the etching of the ultrathin flexible glass. Y₂O₃, as an oxide on the network exterior, leads to decreased stability during the etching strengthening process, especially when etching with hydroxides of other alkali metal ions larger than Li atoms, affecting the surface quality of the etch-strengthened ultrathin flexible glass and consequently its bending performance. Li₂O may inhibit the strengthening rate of the ultrathin flexible glass, thus affecting the DOL depth after K-Na strengthening. Therefore, the resulting strengthened ultrathin flexible glass exhibits lower bending, compressive, and impact resistance after etching compared to strengthened ultrathin flexible glass without Li₂O, P₂O₅, and Y₂O₃.

[0152] Furthermore, in some embodiments of this application, the ultrathin base glass does not contain CaO and / or SrO, which is more conducive to improving the warping and wrinkling defects that easily occur after the ultrathin flexible glass is etched and strengthened. The reason may be that although CaO and SrO are all alkaline earth metal oxides like MgO, compared to MgO, CaO and SrO contain more CaO. 2+ and Sr 2+ A larger ionic radius results in a higher coefficient of thermal expansion for the formed reinforced ultrathin flexible glass, which reduces its resistance to thermal shock and makes it more prone to warping and wrinkling defects during high-temperature strengthening. It should be noted that the statement "the ultrathin base glass provided in this application does not contain CaO and / or SrO" should also be understood as CaO and / or SrO. When providing the raw materials for preparing the ultrathin base glass of this application, no salts or elements containing CaO and / or SrO or capable of forming oxides like CaO and / or SrO are actively added. Furthermore, the content of impurities such as CaO and / or SrO is controlled in other raw materials used to ensure that the content of CaO and / or SrO in the resulting ultrathin base glass does not exceed 100 PPM.

[0153] See Figure 1In the preparation method of this application, simultaneous chemical etching and chemical strengthening processes are carried out. That is, the ultrathin base glass undergoes chemical strengthening simultaneously during the chemical etching process. Compared to the prior art where chemical etching and chemical strengthening processes are performed step-by-step, this method requires a shorter process cycle, lower raw material and labor costs, and less energy. Furthermore, it reduces the loss of glass performance due to excessive processes. Simultaneously, because chemical strengthening occurs concurrently during chemical etching, the surface activity of the ultrathin base glass is higher during the strengthening process, allowing strengthening ions to more easily penetrate the glass interior and undergo ion exchange. Therefore, under the same or similar strengthening conditions, the preparation method provided in this application yields a deeper compressive stress layer and a superior strengthening effect.

[0154] In the preparation method of this application, before the ultrathin base glass provided in step 1 is simultaneously chemically etched and strengthened, a protective ink coating process, a cutting process, an edge treatment process, and an ink removal process are also included. The protective ink coating process, cutting process, edge treatment process, and ink removal process are all mature processes in the industry and are the same as or similar to the prior art.

[0155] In the preparation method of this application, after the glass is simultaneously chemically etched and strengthened, a surface treatment process for strengthening the glass is also included. The surface treatment process is also a mature process in the industry and is the same as or similar to the prior art.

[0156] For example, the ink coating process can be any of screen printing, inkjet printing, or roller coating, and the ink can be a photocurable ink, a thermocurable ink, etc. This application does not limit this process, and any existing technology that can achieve the coating of protective ink is acceptable.

[0157] For example, the cutting process can be any of laser or cutting wheel. This application does not limit this process and any existing technology for glass cutting can be used.

[0158] For example, the edge treatment process can be any one of chemical etching and edge polishing. The etchant in the edge treatment process can be hydrofluoric acid, nitric acid, sulfuric acid or one or more acids. This application does not limit this process and any existing technology that can achieve edge treatment is acceptable.

[0159] For example, the deinking process can be immersion deinking, and the deinking agent in the deinking process can be sodium hydroxide, sodium bicarbonate, sodium carbonate or one or more alkaline solutions. This application does not limit this process, and any existing technology that can achieve deinking is acceptable.

[0160] For example, the surface treatment process can be as follows: the strengthened ultrathin flexible glass is placed in an etching solution containing one or more acids such as hydrofluoric acid, nitric acid, hydrochloric acid, and sulfuric acid. By mass percentage, the surface-strength etching solution includes 0.1% to 2% hydrofluoric acid, 0.5% to 2% nitric acid, 0% to 1% hydrochloric acid, 0% to 1% sulfuric acid, and the balance being water. The etching time is 60 to 1200 seconds, and the etching temperature is 20 to 50°C. Then, ultrasonic cleaning is performed.

[0161] In the preparation method of this application, the chemical etching strengthening temperature in step 2 is 250℃-400℃, preferably 270℃-380℃. Exemplarily, the chemical etching strengthening temperature can be 250℃, 260℃, 270℃, 280℃, 290℃, 300℃, 310℃, 320℃, 330℃, 340℃, 350℃, 360℃, 370℃, 380℃, 390℃, or 400℃, as well as all ranges and sub-ranges between these values. In some embodiments of this application, the chemical etching strengthening time is 120min-180min, preferably 130min-170min. For example, the chemical etching strengthening time can be 120 min, 125 min, 130 min, 135 min, 140 min, 145 min, 150 min, 155 min, 160 min, 165 min, 170 min, 175 min, or 180 min, as well as all ranges and sub-ranges between the above values. It should be understood that, in embodiments, any of the above ranges can be combined with any other range.

[0162] In the preparation method of this application, the chemical etching strengthening molten salt used in the synchronous chemical etching strengthening comprises at least a potassium salt for etching strengthening and a potassium alkali for etching strengthening, wherein the potassium salt is preferably potassium nitrate and the potassium alkali is preferably potassium hydroxide. In some embodiments of this application, the mass ratio of the potassium salt and potassium alkali for chemical etching strengthening is 50%-90%:10%-50%, preferably 60%-80%:20%-40%. Exemplarily, the mass ratio of the potassium salt and potassium alkali for chemical etching strengthening is 50%:50%, 55%:45%, 60%:40%, 65%:35%, 70%:30%, 75%:25%, 80%:20%, 85%:15%, or 90%:10%, etc., and all ranges and subranges between the above values.

[0163] In other embodiments, the chemical etching strengthening molten salt used in the simultaneous chemical etching strengthening may further include a sodium salt, such as sodium nitrate. The amount of sodium nitrate added to the chemical etching strengthening component is 0-5%, preferably 0-3%. Exemplarily, the amount of sodium nitrate added is 0%, 0.5%, 1%, 1.5%, 2%, 2.5%, 3%, 3.5%, 4%, 4.5%, or 5%, and all ranges and sub-ranges between these values. It should be understood that, in embodiments, any of the above ranges can be combined with any other range. It should be noted that when sodium salt is added to the chemical etching strengthening component, the amount of potassium salt added to the chemical etching strengthening component is correspondingly reduced.

[0164] Furthermore, the ultrathin base glass provided in this application can be prepared by providing raw materials according to the above-mentioned components and their relationships, and by using existing methods for preparing ultrathin base glass, such as melting, annealing, and forming the raw materials to obtain ultrathin base glass. This application does not limit the forming method used to prepare the ultrathin base glass; for example, the forming methods may include, but are not limited to, the pull-down method, overflow method, and float method. For example, by uniformly mixing the components according to the formula, melting and forming, and then cooling and annealing, ultrathin base glass can be obtained. The preparation process of this ultrathin base glass is prior art and therefore will not be described in detail in this application. The composition of the ultrathin base glass in this application is essentially the same as the composition of the strengthened ultrathin flexible glass obtained from it.

[0165] For example, in the process of preparing the ultrathin base glass of this application, the melting temperature is 1700℃-1600℃ and the melting time is 5h-100h.

[0166] Thirdly, this application provides an ultrathin base glass with a thickness of 0.15 to 0.3 mm, comprising the following components by mass percentage of oxides:

[0167] SiO2: 55-66%;

[0168] Al2O3: 15-25%;

[0169] Na2O: 8-16%;

[0170] K2O: 2-6%;

[0171] MgO: 1-5%;

[0172] Zr2O: 0.1-2%;

[0173] B2O3: 0.2-3%.

[0174] The components satisfy the following relationship:

[0175] (1)13%≤((B2O3)+(K2O)) / ((Al2O3)+(ZrO2)+(Na2O)≤19%;

[0176] (2)16%≤((Al2O3)+(B2O3))≤25%;

[0177] The ultrathin base glass does not contain Li2O, P2O5, or Y2O3.

[0178] In this application, "the ultrathin base glass does not contain Li2O, P2O5 and Y2O3" should be understood as follows: when providing the raw materials for preparing the ultrathin base glass of this application, no salts or elements containing Li2O, P2O5 and Y2O3 or capable of forming oxides of Li2O, P2O5 and Y2O3 are actively added, and the content of impurities such as Li2O, P2O5 and Y2O3 is also controlled in the other raw materials used, so that the content of Li2O, P2O5 and Y2O3 in the obtained reinforced ultrathin flexible glass is not higher than 100 PPM.

[0179] The applicant discovered that the presence of certain amounts of Li₂O, P₂O₅, and Y₂O₃ in the ultrathin base glass actually negatively impacts the performance of the strengthened ultrathin flexible glass formed after etching. The reasons may be as follows: the glass network formed by P₂O₅, SiO₂, and B₂O₃ has lower chemical stability compared to the glass network formed by SiO₂ and B₂O₃, which is detrimental to the etching of ultrathin flexible glass. Y₂O₃, as an oxide on the network exterior, leads to decreased stability during the etching strengthening process, especially when etching with hydroxides of other alkali metal ions larger than Li atoms, affecting the surface quality of the ultrathin flexible glass formed after etching strengthening, and consequently its bending performance. Li₂O may inhibit the strengthening rate of the ultrathin flexible glass, thus affecting the DOL depth after K-Na strengthening. Therefore, the strengthened ultrathin flexible glass formed by these elements exhibits lower bending, compressive, and impact resistance after etching strengthening compared to ultrathin base glass without Li₂O, P₂O₅, and Y₂O₃.

[0180] Furthermore, the applicant also discovered that when the ultrathin base glass provided in this application does not contain CaO and / or SrO, it is more beneficial to improve the warping and wrinkling defects that easily occur after the ultrathin base glass is etched and strengthened. The reason may be that although CaO and SrO are all alkaline earth metal oxides like MgO, compared to MgO, CaO and SrO contain more Ca... 2+ and Sr 2+A larger ionic radius results in a higher coefficient of thermal expansion for the formed reinforced ultrathin flexible glass, which reduces its resistance to thermal shock and makes it more prone to warping and wrinkling defects during high-temperature strengthening. It should be noted that the statement "the ultrathin flexible glass provided in this application does not contain CaO and / or SrO" should also be understood as CaO and / or SrO. When providing the raw materials for preparing the ultrathin base glass of this application, no salts or elements containing CaO and / or SrO or capable of forming oxides like CaO and / or SrO are actively added. Furthermore, the content of impurities such as CaO and / or SrO is controlled in other raw materials used to ensure that the content of CaO and / or SrO in the resulting reinforced ultrathin flexible glass does not exceed 100 PPM.

[0181] In this application, SiO2 acts as a network forging agent in the glass, forming a glass network structure. However, excessive SiO2 content leads to poor glass meltability, increased viscosity of the molten glass, and difficulty in clarifying the glass. Insufficient SiO2 results in an unstable glass network structure and easy crystallization. Therefore, to meet the glass formability requirements, in some embodiments of this application, the SiO2 content in the strengthened ultrathin flexible glass, based on the mass percentage of oxides, is 55.00 wt%-66.00 wt%, preferably 57 wt%-64 wt%, and more preferably 58 wt%-63 wt%. For example, the SiO2 content in the reinforced ultrathin flexible glass, by mass percentage of oxides, can be: 55.00 wt%, 55.50 wt%, 56.00 wt%, 56.50 wt%, 57.00 wt%, 57.50 wt%, 58.00 wt%, 58.50 wt%, 59.00 wt%, 59.50 wt%, 60.00 wt%, 60.50 wt%, 61.00 wt%, 61.50 wt%, 62.00 wt%, 62.50 wt%, 63.00 wt%, 63.50 wt%, 64.00 wt%, 64.50 wt%, 65.00 wt%, 65.50 wt%, or 76.00 wt%, etc., and all ranges and sub-ranges between the above values. It should be understood that, in embodiments, any of the above ranges can be combined with any other range.

[0182] In the glass system of this application, Al2O3 serves as an intermediate in the glass network, supplementing the network. During chemically strengthened etching, the ion exchange rate can be adjusted by changing the spatial dimensions within the glass network used for ion exchange. Furthermore, the good chemical stability of Al2O3 significantly influences the chemical etching rate. Therefore, in some embodiments of this application, the Al2O3 content in the strengthened ultrathin flexible glass, based on the mass percentage of oxides, is 15.00 wt%-25.00 wt%, preferably 16 wt%-23 wt%, and more preferably 17 wt%-20 wt%. For example, the Al2O3 content in the reinforced ultrathin flexible glass, by mass percentage of oxides, can be: 15.00 wt%, 15.50 wt%, 16.00 wt%, 16.50 wt%, 17.00 wt%, 17.50 wt%, 18.00 wt%, 18.50 wt%, 19.00 wt%, 19.50 wt%, 20.00 wt%, 20.50 wt%, 21.00 wt%, 22.00 wt%, 22.50 wt%, 23.00 wt%, 23.50 wt%, 24.00 wt%, 24.50 wt%, or 25.00 wt%, etc., and all ranges and sub-ranges between the above values. It should be understood that, in embodiments, any of the above ranges can be combined with any other range.

[0183] In the glass system of this application, ZrO2 serves as an intermediate in the glass network, supplementing the network; ZrO2 can increase the ion exchange rate of the glass and improve the strengthening depth. However, excessive ZrO2 increases the difficulty of glass melting and causes crystallization. Therefore, in some embodiments of this application, the ZrO2 content in the strengthened ultrathin flexible glass is 0.10 wt% to 2.00 wt%, preferably 0.3 wt% to 2 wt%, and more preferably 0.5 wt% to 1.5 wt%, based on the mass percentage of oxides. For example, the ZrO2 content in the reinforced ultrathin flexible glass, by mass percentage of oxides, can be 0.10 wt%, 0.20 wt%, 0.30 wt%, 0.40 wt%, 0.50 wt%, 0.60 wt%, 0.70 wt%, 0.80 wt%, 0.90 wt%, 1.00 wt%, 1.10 wt%, 1.20 wt%, 1.30 wt%, 1.40 wt%, 1.50 wt%, 1.60 wt%, 1.70 wt%, 1.80 wt%, 1.90 wt%, or 2.00 wt%, etc., and all ranges and sub-ranges between the above values. It should be understood that, in embodiments, any of the above ranges can be combined with any other range.

[0184] In the glass system of this application, Na2O is a network exooxide that can provide free oxygen. An appropriate amount of Na2O is beneficial for improving the viscosity of the glass, promoting the melting and clarification of the molten glass, increasing Na-K exchange in the glass, ensuring CS (constituent oxygen content), and controlling DOL (dryness index). However, excessive Na2O will affect the degree of connection in the glass's network structure, thereby affecting the glass's stability. Therefore, in some embodiments of this application, the Na2O content in the strengthened ultrathin flexible glass is 8.00wt%-16.00wt% by mass percentage of the oxide; preferably 9wt%-15wt%, and more preferably 10wt%-14wt%. For example, the Na₂O content in the reinforced ultrathin flexible glass, by mass percentage of oxides, can be 8.00 wt%, 8.50 wt%, 9.00 wt%, 8.50 wt%, 10.00 wt%, 10.50 wt%, 11.00 wt%, 11.50 wt%, 12.00 wt%, 12.50 wt%, 13.00 wt%, 13.50 wt%, 14.00 wt%, 14.50 wt%, 15.00 wt%, 15.50 wt%, or 16.00 wt%, etc., and all ranges and sub-ranges between the above values. It should be understood that, in embodiments, any of the above ranges can be combined with any other range.

[0185] In the glass system of this application, K2O is an oxide on the glass network, which can reduce the difficulty of glass melting and is beneficial to production. However, K2O can affect the chemical strengthening effect in the glass and is not conducive to Na-K exchange in the glass. Therefore, in some embodiments of this application, the K2O content in the strengthened ultrathin flexible glass is 2.00wt%-6.00wt% by mass percentage of oxide; preferably 2.5wt%-5.5wt%, and more preferably 3wt%-5wt%. For example, the K₂O content in the reinforced ultrathin flexible glass, by mass percentage of oxides, can be 2.00 wt%, 2.20 wt%, 2.40 wt%, 2.60 wt%, 2.80 wt%, 3.00 wt%, 3.20 wt%, 3.40 wt%, 3.60 wt%, 3.80 wt%, 4.00 wt%, 4.20 wt%, 4.40 wt%, 4.60 wt%, 4.80 wt%, 5.00 wt%, 5.20 wt%, 5.40 wt%, 5.60 wt%, 5.80 wt%, or 6.00 wt%, etc., and all ranges and sub-ranges between the above values. It should be understood that, in embodiments, any of the above ranges can be combined with any other range.

[0186] In the glass system of this application, MgO is a network oxide that provides free oxygen. However, at high temperatures, MgO can increase the high-temperature viscosity, which is beneficial for glass forming. Therefore, in some embodiments of this application, the MgO content in the strengthened ultrathin flexible glass is 1.00wt%-5.00wt% by mass percentage of oxides; preferably 1.5wt%-4.5wt%, and more preferably 2wt%-4wt%. For example, the MgO content in the reinforced ultrathin flexible glass, by mass percentage of oxides, can be 1.00 wt%, 1.20 wt%, 1.40 wt%, 1.60 wt%, 1.80 wt%, 2.00 wt%, 2.20 wt%, 2.40 wt%, 2.60 wt%, 2.80 wt%, 3.00 wt%, 3.20 wt%, 3.40 wt%, 3.60 wt%, 3.80 wt%, 4.00 wt%, 4.20 wt%, 4.40 wt%, 4.60 wt%, 4.80 wt%, or 5.00 wt%, etc., and all ranges and sub-ranges between the above values. It should be understood that, in embodiments, any of the above ranges can be combined with any other range.

[0187] B2O3 helps lower the melting temperature of the substrate glass and improves its transmittance, overall uniformity, and other properties. Simultaneously, B2O3 possesses excellent chemical stability, influencing the etching of the glass. In some embodiments of this application, the B2O3 content in the reinforced ultrathin flexible glass, based on the mass percentage of oxides, is 0.20 wt% to 3.00 wt%, preferably 0.4 wt% to 2 wt%, and more preferably 0.6 wt% to 1.5 wt%. For example, the B2O3 content in the reinforced ultrathin flexible glass, by mass percentage of oxides, can be: 0.20 wt%, 0.30 wt%, 0.40 wt%, 0.50 wt%, 0.60 wt%, 0.70 wt%, 0.90 wt%, 1.00 wt%, 1.30 wt%, 1.50 wt%, 1.80 wt%, 2.00 wt%, 2.10 wt%, 2.30 wt%, 2.50 wt%, 2.70 wt%, 2.90 wt%, or 3.00 wt%, etc., and all ranges and sub-ranges between the above values. It should be understood that, in embodiments, any of the above ranges can be combined with any other ranges.

[0188] The ultrathin base glass in this application maintains good bending, compressive, and impact resistance even after being etched, thinned, and strengthened. This is due not only to the selection or omission of various components but also to the controlled dosage of B2O3, K2O, Al2O3, ZrO2, and Na2O, satisfying the following relationship:

[0189] (1)13%≤((B2O3)+(K2O)) / ((Al2O3)+(ZrO2)+(Na2O)≤19%;

[0190] (2)16%≤((Al2O3)+(B2O3))≤25%.

[0191] In some embodiments of this application, the ratio of ((B₂O₃) + (K₂O)) / ((Al₂O₃) + (ZrO₂) + (Na₂O)) by mass percentage of oxides can be controlled at 13.00%, 13.20%, 13.40%, 13.60%, 13.80%, 14.00%, 14.20%, 14.40%, 14.60%, 14.80%, 15.00%, and 15.20%. %, 15.40%, 15.60%, 15.80%, 16.00%, 16.20%, 16.40%, 16.60%, 16.80%, 17.00%, 17.20%, 17.40%, 17.60%, 17.80%, 18.00%, 18.20%, 18.40%, 18.60%, 18.80%, or 19.00%, etc., as well as all ranges and sub-ranges between the above values. It should be understood that, in the implementation, any of the above ranges can be combined with any other range.

[0192] Meanwhile, in some embodiments of this application, the content of Al2O3+B2O3 in the reinforced ultrathin flexible glass is controlled within the range of 16.00wt% to 25.00wt% by mass percentage of oxides, preferably, the content of Al2O3+B2O3 is controlled within the range of 17wt% to 22wt%. For example, the content of Al2O3+B2O3, by mass percentage of oxides, can be 16.00 wt%, 16.20 wt%, 16.40 wt%, 16.60 wt%, 16.80 wt%, 17.00 wt%, 17.20 wt%, 17.40 wt%, 17.60 wt%, 17.80 wt%, 18.00 wt%, 18.20 wt%, 18.40 wt%, 18.60 wt%, 18.80 wt%, 19.00 wt%, 19.20 wt%, 19.40 wt%, 19.60 wt%, 19.80 wt%, 20.00 wt%, 20.20 wt%, 20.40 wt%, 20.60 wt%, 20.80 wt%, etc. t%, 21.00wt%, 21.20wt%, 21.40wt%, 21.60wt%, 21.80wt%, 22.00wt%, 22.20wt%, 22.40wt%, 22.60wt%, 22.80wt%, 23.00wt%, 23.20wt%, 23.40wt%, 23.60wt%, 23.80wt%, 24.00wt%, 24.20wt%, 24.40wt%, 24.60wt%, 24.80wt%, 25.00wt%, 25.20wt%, 25.40wt%, 25.60wt%, 25.80wt%, or 26.00wt%, etc., as well as all ranges and subranges between the above values. It should be understood that, in the embodiments, any of the above ranges can be combined with any other range.

[0193] In some embodiments of this application, the thickness of the ultrathin base glass can reach 0.03-0.3 mm, which has good light transmission performance. For example, with a thickness of 0.15 mm-0.3 mm, the transmittance of the ultrathin base glass at 550 nm can reach more than 91%, more preferably more than 91.5%, and even more preferably 91.9%. At the same time, its haze is reduced to below 0.2, more preferably to below 0.15, and even more preferably to below 0.1. Therefore, the ultrathin base glass provided by this application also has good light transmission and lower haze, providing an excellent glass substrate for obtaining reinforced ultrathin flexible glass with good light transmission and haze. Fourthly, this application provides the application of the reinforced ultrathin flexible glass as described above, or the reinforced ultrathin flexible glass prepared by the above-described method, or the reinforced ultrathin flexible glass as described above, in communication equipment, automotive displays or windows, foldable electronic devices, aerospace window glass, aviation radiation-resistant glass, advertising displays, building curtain walls, photovoltaic equipment, medical equipment, and / or furniture decoration.

[0194] Fifthly, this application also provides an electronic device comprising the aforementioned reinforced ultrathin flexible glass or reinforced ultrathin flexible glass prepared by the aforementioned method. In this application, the electronic device includes a housing and a mid-frame; the housing comprises the aforementioned reinforced ultrathin flexible glass or reinforced ultrathin flexible glass prepared by the aforementioned method. The electronic device can be at least one of a mobile phone, tablet computer, handheld game console, portable digital device (e.g., digital camera), vehicle central control system, electronic whiteboard glass, smart home device, or smart wearable device (e.g., smart bracelet, smartwatch, smart glasses).

[0195] To facilitate a better understanding of the innovative aspects of this application by those skilled in the art, the technical solutions of this application are further described in detail below with reference to embodiments. The embodiments of this application described in detail below are exemplary and are only used to explain this application, and should not be construed as limiting this application.

[0196] Example 1

[0197] According to the formula of Example 1 in Table 1, each raw material component was accurately weighed according to the proportion and thoroughly mixed to obtain a mixture. The mixture was heated to 1650°C in a high-temperature melting furnace for 72 hours. Ultra-thin base glass with dimensions of 440mm*360mm*0.1mm was produced by the downward drawing method. After ink protection, a batch of glass samples with dimensions of 160mm*140mm*0.15mm were produced by laser cutting. The glass samples were edge-treated with hydrofluoric acid as an etchant and then de-inked with sodium carbonate as an ink remover. The ultra-thin base glass samples of Example 1 were then etched and strengthened according to the mass ratio of etching strengthening molten salt, etching strengthening temperature, and etching strengthening time in Example 1 in Table 3. The strengthened ultra-thin flexible glass was then placed in an etching solution with hydrofluoric acid as an etchant for surface treatment. The glass was etched at 30°C for 2 minutes and then ultrasonically cleaned to obtain the strengthened ultra-thin flexible glass.

[0198] Examples 2 to 7

[0199] The procedure was carried out under the same conditions as in Example 1, except that the composition of each raw material for preparing reinforced ultrathin flexible glass is shown in Table 1 and the conditions are shown in Table 3.

[0200] Examples 11 to 17

[0201] According to the formulations of Examples 1 to 7 in Table 1, the formulations of Examples 11 to 17 were respectively configured and operated under the same conditions as Examples 1 to 7. The difference is that the ultra-thin base glass produced by drawing down Examples 11 to 17 has a size of 440mm*360mm*0.2mm, and the etching strengthening time is reduced (not shown in the table).

[0202] Examples 21 to 27

[0203] The formulations of Examples 1 to 7 in Table 1 are used to configure the formulations of Examples 21 to 27 respectively, and the dimensions of the ultra-thin base glass are drawn down, with the difference being a reduction in the etching and strengthening time (not shown in the table).

[0204] Comparative Examples 1 to 8

[0205] The procedure was carried out under the same conditions as in Example 1, except that the raw material composition for preparing reinforced ultrathin flexible glass was as shown in Table 2 and the conditions were as shown in Table 4.

[0206] Comparative Examples 11 to 18

[0207] Based on the formulations of Comparative Examples 1 to 7 in Table 1, the formulations of Comparative Examples 11 to 18 were prepared respectively, and the same conditions were followed as those of Comparative Examples 1 to 8. The difference is that the size of the ultra-thin base glass produced by Comparative Examples 11 to 18 was 440mm*360mm*0.2mm, and the etching strengthening time was reduced (not shown in the table).

[0208] Comparative Examples 21 to 28

[0209] Based on the formulations of Comparative Examples 1 to 8 in Table 1, the formulations of Comparative Examples 21 to 28 were prepared respectively, and the dimensions of the ultra-thin base glass were drawn down. The same conditions as those of Comparative Examples 1 to 8 were followed, except that the etching strengthening time was reduced (not shown in the table).

[0210] The performance of the ultrathin base glass of Examples 1-7 and Comparative Examples 1-8 and the reinforced ultrathin flexible glass obtained after etching and strengthening were tested respectively, and the results are shown in Tables 1, 2, 5 and 6 respectively.

[0211] As can be seen from Tables 1, 2, 5 and 6, the ultra-thin base glass and the reinforced ultra-thin flexible glass provided in this application have higher light transmittance and lower haze. At the same time, the reinforced ultra-thin flexible glass obtained after etching and strengthening also has better bending performance, impact resistance and higher compressive stress strength.

[0212] In addition, performance tests were conducted on the ultrathin base glass and the reinforced ultrathin flexible glass obtained after etching and strengthening in Examples 11-17, 21-27 and Comparative Examples 11-18, 21-28, respectively. The results are shown in Table 7. As can be seen from Table 7, the ultrathin base glass and the reinforced ultrathin flexible glass provided in this application have good light transmittance and haze at different thicknesses. Moreover, the reinforced ultrathin flexible glass obtained after etching and strengthening also has better bending performance, impact resistance, and higher compressive stress strength.

[0213] Furthermore, the applicant further explored the optimization of the synchronous etching strengthening process provided in this application compared to the traditional step-by-step etching strengthening process. Specifically, the 160mm*140mm*0.1mm glass sample obtained in Example 1 above was thinned and strengthened using a conventional step-by-step etching strengthening process. The process conditions of the conventional step-by-step etching strengthening process are shown in Table 8. Performance tests were then conducted on the etch-strengthened ultrathin flexible glass (Comparative Example S1 and Comparative Example S2), and the results are shown in Table 9.

[0214] As shown in Table 9, the maximum compressive stress of the strengthened ultrathin flexible glass obtained by the step-by-step etching strengthening process is lower than that obtained by the synchronous etching strengthening process. This may be because microcracks easily appear on the surface of the glass sheet during the strengthening process, but these microcracks are not promptly etched away during distributed strengthening, resulting in poor surface quality and affecting its pen-holding performance and surface roughness. Furthermore, the subsequent surface treatment requires a longer time for surface optimization, leading to a loss of surface compressive stress and resulting in a lower measured surface compressive stress than the strengthened glass obtained by the process described in this application. Therefore, the synchronous etching strengthening process provided in this application is more beneficial for performance optimization of strengthened ultrathin flexible glass during the etching strengthening process.

[0215] Furthermore, the applicant further investigated the effects of etching strengthening temperature, etching strengthening time, etching strengthening molten salt ratio, and etching strengthening rate on the performance of the formed strengthened ultrathin flexible glass in the synchronous etching strengthening process provided in this application. Specifically, the 160mm*140mm*0.1mm glass samples obtained in Example 1 were etched and strengthened using different etching strengthening temperatures, etching strengthening times, etching strengthening molten salt ratios, and etching strengthening rates. The specific process conditions for the etching strengthening process are shown in Table 10. Performance tests were then conducted on the etch-strengthened strengthened ultrathin flexible glass (Examples S1 to S3), and the results are shown in Table 11.

[0216] As can be seen from Table 11, the compressive stress strength of the reinforced ultrathin flexible glass formed by the synchronous etching strengthening process provided in this application is relatively good, and the impact resistance is also relatively good. In particular, when a higher etching strengthening temperature and etching strengthening rate are used, the compressive stress strength and impact resistance of the reinforced ultrathin flexible glass formed are even better, which is more conducive to shortening the etching strengthening process cycle and improving production efficiency.

[0217]

[0218]

[0219]

[0220]

[0221]

[0222]

[0223]

Claims

1. A reinforced ultrathin flexible glass, wherein the thickness of the reinforced ultrathin flexible glass is 0.03-0.15 mm; characterized in that, The product comprises the following components by mass percentage of oxides: SiO2: 55-66%; Al2O3: 15-25%; Na2O: 8-16%; K2O: 2-6%; MgO: 1-5%; Zr2O: 0.1-2%; B2O3: 0.2-3%. The components satisfy the following relationship: (1)13%≤((B2O3)+(K2O)) / ((Al2O3)+(ZrO2)+(Na2O)≤19%; (2)16%≤((Al2O3)+(B2O3))≤25%; The reinforced ultrathin flexible glass does not contain Li2O, P2O5, or Y2O3.

2. The reinforced ultrathin flexible glass according to claim 1, characterized in that, The reinforced ultrathin flexible glass does not contain CaO and / or SrO.

3. The reinforced ultrathin flexible glass according to any one of claims 1 to 2, characterized in that, The reinforced ultrathin flexible glass includes a surface compressive stress layer on at least one side, and the depth of the surface compressive stress layer is 5-9 μm.

4. The reinforced ultrathin flexible glass according to any one of claims 1 to 3, characterized in that, The thickness of the reinforced ultrathin flexible glass is 0.03mm-0.15mm, and its surface compressive stress is ≥550MPa.

5. The reinforced ultrathin flexible glass according to any one of claims 1 to 4, characterized in that, The thickness of the reinforced ultrathin flexible glass is 0.03mm-0.15mm, and its average coating drop height is ≥60mm.

6. The reinforced ultrathin flexible glass according to any one of claims 1 to 5, characterized in that, The reinforced ultrathin flexible glass has a thickness of 0.03mm-0.15mm and a light transmittance of ≥91.0% at 550nm.

7. The reinforced ultrathin flexible glass according to any one of claims 1 to 6, characterized in that, The thickness of the reinforced ultrathin flexible glass is 0.03mm-0.15mm, and its haze is ≤0.

1.

8. The reinforced ultrathin flexible glass according to any one of claims 1 to 7, characterized in that, When the thickness of the reinforced ultrathin flexible glass is 0.03 mm, its ultimate bending radius is ≤0.5 mm.

9. The reinforced ultrathin flexible glass according to any one of claims 1 to 8, characterized in that, The reinforced ultrathin flexible glass has a thickness of 0.03 mm and is capable of withstanding at least an 8N ball-to-ring impact force.

10. The reinforced ultrathin flexible glass according to any one of claims 1 to 9, characterized in that, The surface roughness of the reinforced ultrathin flexible glass is ≤0.5nm.

11. The reinforced ultrathin flexible glass according to any one of claims 1 to 10, characterized in that, The ratio of the difference between the minimum and maximum thickness of the reinforced ultrathin flexible glass to the maximum thickness of the reinforced ultrathin flexible glass is no higher than 15%.

12. The reinforced ultrathin flexible glass according to any one of claims 1 to 11, characterized in that, The reinforced ultrathin flexible glass is obtained by simultaneously chemically etching and strengthening an ultrathin base glass.

13. The method for preparing reinforced ultrathin flexible glass according to any one of claims 1 to 12, characterized in that, Includes the following steps: Step 1: Provide ultra-thin base glass; Step 2: Simultaneous chemical etching and strengthening of the ultrathin base glass provided in Step 1 to obtain reinforced ultrathin flexible glass; The ultrathin base glass has a thickness of 0.15–0.3 mm, and its composition, based on the mass percentage of oxides, includes the following components: SiO2: 55-66%; Al2O3: 15-25%; Na2O: 8-16%; K2O: 2-6%; MgO: 1-5%; Zr2O: 0.1-2%; B2O3: 0.2-3%. And each component satisfies the following relationship: (1)13%≤((B2O3)+(K2O)) / ((Al2O3)+(ZrO2)+(Na2O)≤19%; (2)16%≤((Al2O3)+(B2O3))≤25%; Furthermore, the reinforced ultrathin flexible glass does not contain Li2O, P2O5, or Y2O3.

14. The method for preparing reinforced ultrathin flexible glass according to claim 13, characterized in that, In the simultaneous chemical etching strengthening process, the average etching rate of the ultrathin base glass is less than the average strengthening rate of the ultrathin base glass.

15. The method for preparing reinforced ultrathin flexible glass according to claim 13, characterized in that, In the synchronous chemical etching strengthening step, the molten salt component for chemical etching strengthening includes at least KNO3 and KOH; the chemical etching strengthening temperature is 250℃-400℃; and the chemical etching strengthening time is 120min-180min.

16. The method for preparing reinforced ultrathin flexible glass according to claim 14, characterized in that, The mass ratio of KNO3 to KOH in the chemically etched and strengthened molten salt is 50%-90%:10%-50%.

17. The method for preparing reinforced ultrathin flexible glass according to claim 13, characterized in that, The chemical etching-enhanced molten salt also includes NaNO3; the amount of NaNO3 in the chemical etching-enhanced salt is 0-5% by mass.

18. An ultrathin base glass with a thickness of 0.15–0.3 mm, characterized in that, The product comprises the following components by mass percentage of oxides: SiO2: 55-66%; Al2O3: 15-25%; Na2O: 8-16%; K2O: 2-6%; MgO: 1-5%; Zr2O: 0.1-2%; B2O3: 0.2-3%. The components satisfy the following relationship: (1)13%≤((B2O3)+(K2O)) / ((Al2O3)+(ZrO2)+(Na2O))≤19%; (2)16%≤((Al2O3)+(B2O3))≤25%; The ultrathin base glass does not contain Li2O, P2O5, or Y2O3.

19. The ultrathin base glass according to claim 18, characterized in that, The ultrathin base glass does not contain CaO and / or SrO.

20. The ultrathin base glass according to claim 18, characterized in that, The thickness of the ultrathin base glass is 0.1 to 0.3 mm, and its light transmittance at 550 nm is ≥91.0%.

21. The ultrathin base glass according to claim 18, characterized in that, The thickness of the ultra-thin base glass is 0.1 to 0.3 mm, and its haze is ≤0.

02.

22. The application of reinforced ultrathin flexible glass prepared by any one of claims 1 to 12 or by any one of claims 13 to 17 in communication equipment, automotive displays or windows, foldable electronic devices, aerospace window glass, aviation radiation-resistant glass, advertising displays, building curtain walls, photovoltaic equipment, medical equipment and / or furniture decoration.

23. An electronic device, characterized in that, The reinforced ultrathin flexible glass includes the reinforced ultrathin flexible glass prepared by any one of claims 1 to 12 or by any one of claims 13 to 17.

24. An electronic device, characterized in that, It includes an outer shell and a middle frame; the outer shell includes reinforced ultrathin flexible glass prepared by any one of claims 1 to 12 or by any one of claims 13 to 17.

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