Kr separation method, system, terminal and storage medium based on selective desorption

Abstract

The application relates to a Kr separation method and system based on selective desorption, a terminal and a storage medium, and relates to the technical field of rare gas purification, which comprises the following steps: collecting a historical krypton loss amount; calculating the difference between the quotient of the historical krypton loss amount and the mass of an adsorption column and the initial unit krypton adsorption amount, so as to generate an actual unit krypton adsorption amount; calculating the quotient between the product of the actual unit krypton adsorption amount and the mass of the adsorption column and the single-time air flow speed to be adsorbed, so as to generate an actual adsorption time; controlling a primary adsorption column to adsorb air to be adsorbed according to the actual adsorption time, so as to generate an adsorption column to be separated; controlling an adsorption column cleaning device to clean the adsorption column to be separated according to the actual unit krypton adsorption amount, and collecting the desorbed gas after cleaning to a waste gas storage device; performing a desorption operation on the cleaned adsorption column, controlling a gas collecting device to collect the desorbed gas, and heating and activating the primary adsorption column to recover the adsorption capacity. The application has the effect of reducing krypton loss.

Description

Technical Field

[0001] This application relates to the technical field of rare gas purification, and in particular to a Kr separation method, system, terminal and storage medium based on selective desorption. Background Technology

[0002] A primary adsorption column is a closed, cylindrical container in a primary separation module that uses carbon molecular sieves filled inside the column to adsorb krypton in the gas stream at extremely low temperatures, thereby removing the main components of nitrogen and oxygen in the gas stream.

[0003] In related technologies, primary separation technology refers to the process of removing oxygen and nitrogen from pre-purified sample air. This process includes four steps: adsorbing sample air onto a primary adsorption column, cleaning the adsorption column, heating for desorption, and column regeneration. The cleaning of the adsorption column also includes evaporating liquid nitrogen until the liquid level is below the column core, while simultaneously drawing a vacuum to remove oxygen and nitrogen from the column, heating the adsorption column to the recovery temperature, drawing a vacuum again, and applying pulsed gas to clean the column.

[0004] Regarding the aforementioned technologies, the carbon molecular sieve in the primary adsorption column requires pulse gas cleaning, multiple temperature increases and decreases, and multiple vacuuming operations to complete one separation operation, which leads to the loss of the carbon molecular sieve and a decrease in the adsorption capacity of the adsorption column. When the adsorption column is heated, pulsed gas cleaning, and vacuumed, the adsorbed krypton is more easily desorbed, resulting in increased krypton loss and a reduced krypton content after actual desorption. There is still room for improvement. Summary of the Invention

[0005] To reduce krypton loss, this application provides a Kr separation method, system, terminal, and storage medium based on selective desorption.

[0006] Firstly, this application provides a Kr separation method based on selective desorption, employing the following technical solution:

[0007] A Kr separation method based on selective desorption includes:

[0008] Collect the historical krypton loss of the preset sample gas;

[0009] The difference between the quotient of historical krypton loss and the preset adsorption column mass and the preset initial unit krypton adsorption amount is calculated to generate the preset actual unit krypton adsorption amount of the primary adsorption column.

[0010] The actual adsorption time is calculated by quotient between the product of the actual unit krypton adsorption capacity and the adsorption column mass and the preset single-pass airflow velocity.

[0011] The primary adsorption column is controlled to adsorb the preset air to be adsorbed based on the actual adsorption time, so as to generate the adsorption column to be separated.

[0012] The preset adsorption column cleaning device is controlled according to the actual unit krypton adsorption amount to clean the adsorption column to be separated, so as to generate the adsorption column to be desorbed, and the desorbed gas after cleaning is collected into the preset waste gas storage device.

[0013] The adsorption column to be desorbed is subjected to a desorption operation to generate primary separated krypton gas. A preset gas collection device is controlled to collect the primary separated krypton gas, and the primary adsorption column is heated and activated to restore its adsorption capacity.

[0014] By adopting the above technical solution, the actual unit krypton adsorption capacity of the primary adsorption column is obtained by calculating the difference between the quotient of historical krypton loss and adsorption column mass and the initial unit krypton adsorption capacity. The actual adsorption time is obtained by calculating the quotient between the product of the actual unit krypton adsorption capacity and adsorption column mass and the single flow velocity of the air to be adsorbed. Based on the actual adsorption time, the primary adsorption column is controlled to adsorb the air to be adsorbed to obtain the adsorption column to be separated. Based on the actual unit krypton adsorption capacity, a preset adsorption column cleaning device is controlled to clean the adsorption column to be separated to obtain the adsorption column to be desorbed. The desorbed gas after cleaning is collected to the waste gas storage device. The adsorption column to be desorbed is desorbed to obtain the primary separated krypton gas. The gas collection device is controlled to collect the primary separated krypton gas, and the primary adsorption column is heated and activated to restore its adsorption capacity. Thus, the relevant data of the cleaning steps are adjusted according to the actual adsorption capacity of the primary adsorption column, so that the nitrogen and oxygen molecules adsorbed on the primary adsorption column are removed to the maximum extent and the number of adsorbed krypton molecules that are mistakenly removed is reduced, thereby reducing krypton loss.

[0015] Optionally, the adsorption column cleaning device includes a vacuum assembly. The steps of controlling the preset adsorption column cleaning device to clean the adsorption column to be separated according to the actual unit krypton adsorption amount, to generate an adsorption column to be desorbed, and collecting the desorbed gas after cleaning into a preset waste gas storage device include:

[0016] The adsorption column cleaning device is controlled to clean the adsorption column to be separated according to the actual unit krypton adsorption amount, so as to generate a primary cleaned adsorption column, and the vacuum component is controlled to collect the desorbed gas to the waste gas storage device.

[0017] Collect the nitrogen and oxygen concentration in the waste gas storage device;

[0018] Determine whether the nitrogen and oxygen concentration meets the preset requirements for secondary cleaning;

[0019] If the conditions are not met, the adsorption column to be desorbed will be designated as a single-cleaning adsorption column.

[0020] If satisfied, the difference between the initial unit krypton adsorption amount and the actual unit krypton adsorption amount is normalized based on the initial unit krypton adsorption amount to generate the adsorption column aging coefficient.

[0021] The adsorption column cleaning device is controlled to perform a second cleaning of the adsorption column after the first cleaning based on the aging coefficient of the adsorption column and the oxygen and nitrogen concentration, and the nitrogen and oxygen concentration in the waste gas storage device is continuously collected for cyclical judgment.

[0022] By adopting the above technical solution, the adsorption column cleaning device is controlled to clean the adsorption column to be separated according to the actual unit krypton adsorption amount to obtain the first-stage cleaned adsorption column. The vacuum component is controlled to collect the desorbed gas to the waste gas storage device. It is determined whether the nitrogen and oxygen concentration meets the preset secondary cleaning requirements. If not, the adsorption column to be desorbed is determined as the first-stage cleaned adsorption column. If it meets the requirements, the difference between the initial unit krypton adsorption amount and the actual unit krypton adsorption amount is normalized according to the initial unit krypton adsorption amount to obtain the adsorption column aging coefficient. The adsorption column cleaning device is controlled to perform a secondary cleaning of the first-stage cleaned adsorption column according to the adsorption column aging coefficient and the oxygen and nitrogen concentration. The nitrogen and oxygen concentration in the waste gas storage device is continuously collected for cyclic judgment, so that the nitrogen and oxygen molecules adsorbed on the first-stage adsorption column are desorbed to the maximum extent and the number of adsorbed krypton molecules that are mistakenly removed is reduced, thereby increasing the krypton content collected in the first stage separation.

[0023] Optionally, the adsorption column cleaning device includes an adsorption column heating assembly. The steps of controlling the adsorption column cleaning device to clean the adsorption column to be separated according to the actual unit krypton adsorption amount to generate a primary cleaned adsorption column, and controlling the vacuum assembly to collect the desorbed gas into the waste gas storage device include:

[0024] Calculate the quotient between the initial unit krypton adsorption amount and the actual unit krypton adsorption amount to generate the adsorption column aging ratio;

[0025] Calculate the difference between the initial unit krypton adsorption amount and the actual unit krypton adsorption amount to generate the unit adsorption aging amount;

[0026] The evaporation heating parameters and evaporation vacuum parameters are determined by calculating the unit adsorption aging amount and the aging ratio of the adsorption column.

[0027] The heating component of the adsorption column is controlled to heat the adsorption column to be separated based on the evaporation heating parameters.

[0028] The vacuum assembly is controlled according to the evaporation vacuum parameters to extract the desorbed gas to the waste gas storage device, and the first-cleaned adsorption column is identified as the adsorption column to be separated.

[0029] By adopting the above technical solution, the aging ratio of the adsorption column is obtained by calculating the quotient between the initial unit krypton adsorption amount and the actual unit krypton adsorption amount, and the unit adsorption aging amount is obtained by calculating the difference between the initial unit krypton adsorption amount and the actual unit krypton adsorption amount. Based on the unit adsorption aging amount and the adsorption column aging ratio, the evaporation heating parameters and evaporation vacuuming parameters are determined. The adsorption column heating component is controlled to heat the adsorption column to be separated according to the evaporation heating parameters, and the vacuuming component is controlled to extract the desorbed gas to the waste gas storage device according to the evaporation vacuuming parameters. The adsorption column of the first cleaning is determined as the adsorption column to be separated, thereby reducing the amount of krypton lost in the first cleaning step.

[0030] Optionally, the steps for determining the evaporation heating parameters and evaporation vacuum parameters based on the unit adsorption aging amount and the aging ratio of the adsorption column include:

[0031] Calculate the quotient between the preset initial evaporation time and the aging ratio of the adsorption column to generate the actual evaporation time;

[0032] The product of the unit adsorption aging amount and the preset evaporation temperature correction factor is calculated and summed with the preset initial evaporation temperature to generate the actual evaporation temperature.

[0033] The actual evaporation time and actual evaporation temperature are summarized to generate evaporation heating parameters;

[0034] Calculate the quotient between the preset initial evaporation vacuum time and the adsorption column aging ratio to generate the actual evaporation vacuum time;

[0035] The unit adsorption aging amount, the initial unit krypton adsorption amount, and the preset initial evaporation vacuum pressure are substituted into the preset evaporation vacuum pressure correction formula for calculation to generate the actual evaporation vacuum pressure.

[0036] The actual evaporation vacuuming time and actual evaporation vacuuming pressure are summarized to generate evaporation vacuuming parameters.

[0037] By adopting the above technical solution, the actual evaporation time is obtained by calculating the quotient between the initial evaporation time and the aging ratio of the adsorption column. The actual evaporation temperature is obtained by calculating the sum of the product of the unit adsorption aging amount and the evaporation temperature correction coefficient and the initial evaporation temperature. The evaporation heating parameters are obtained by summing the actual evaporation time and the actual evaporation heating parameters. The actual evaporation vacuuming time is obtained by calculating the quotient between the initial evaporation vacuuming time and the aging ratio of the adsorption column. The actual evaporation vacuuming pressure is obtained by substituting the unit adsorption aging amount, the initial unit krypton adsorption amount, and the initial evaporation vacuuming pressure into the evaporation vacuuming pressure correction formula. The evaporation vacuuming parameters are obtained by summing the actual evaporation vacuuming time and the actual evaporation vacuuming pressure. This provides data support for subsequently controlling the heating component of the adsorption column to heat the adsorption column to be separated according to the evaporation heating parameters, and controlling the vacuuming component to extract the desorbed gas to the waste gas storage device according to the evaporation vacuuming parameters, and for identifying the adsorption column to be separated as the adsorption column after the first cleaning.

[0038] Optionally, the adsorption column cleaning device includes an adsorption column pulse cleaning component. The steps of controlling the adsorption column cleaning device to perform a secondary cleaning of the adsorption column based on the aging coefficient and oxygen / nitrogen concentration, and continuing to collect nitrogen and oxygen concentration data in the waste gas storage device for cyclical judgment, include:

[0039] The temperature of the adsorption column and the evaporation time of the first cleaning were recorded.

[0040] The temperature of the adsorption column during the first cleaning and the aging coefficient of the adsorption column are substituted into the preset recovery temperature correction formula for calculation to generate the actual recovery temperature.

[0041] The evaporation time of the first cleaning and the aging coefficient of the adsorption column are substituted into the preset recovery time correction formula for calculation to generate the actual recovery time.

[0042] The heating component of the adsorption column is controlled to heat the adsorption column for the first cleaning based on the actual recovery temperature and actual recovery time.

[0043] The actual flushing gas parameters and actual reheating vacuum parameters are determined by calculating the adsorption column aging coefficient, nitrogen and oxygen concentration, and preset maximum residual concentration of the adsorption column.

[0044] Based on the actual flushing parameters, the pulse cleaning component of the adsorption column is controlled to introduce the preset flushing gas into the primary cleaning column, and the vacuum component is controlled to extract the desorbed gas in the primary cleaning adsorption column to the waste gas storage device based on the actual temperature recovery and vacuuming parameters.

[0045] By adopting the above technical solution, the actual recovery temperature is calculated by substituting the temperature of the primary cleaning adsorption column and the aging coefficient of the adsorption column into the recovery temperature correction formula. The actual recovery time is calculated by substituting the evaporation time of the primary cleaning and the aging coefficient of the adsorption column into the recovery time correction formula. The actual flushing gas parameters and the actual recovery vacuum parameters are determined by calculating the aging coefficient of the adsorption column, the nitrogen and oxygen concentration, and the preset maximum residual concentration of the adsorption column. Based on the actual recovery temperature and the actual recovery time, the adsorption column heating component is controlled to heat the primary cleaning adsorption column. Based on the actual flushing parameters, the adsorption column pulse cleaning component is controlled to introduce flushing gas into the primary cleaning column. Furthermore, based on the actual recovery vacuum parameters, the vacuum component is controlled to extract the desorbed gas from the primary cleaning adsorption column to the waste gas storage device.

[0046] Optionally, the steps for calculating and determining the actual flushing gas parameters and actual reheating vacuum parameters based on the adsorption column aging coefficient, nitrogen and oxygen concentration, and preset maximum residual concentration of the adsorption column include:

[0047] Calculate the quotient between the nitrogen and oxygen concentration and the maximum residual concentration of the adsorption column to generate the flushing gas flow rate correction parameter;

[0048] The flushing gas flow rate correction parameters, the preset initial flushing gas flow rate, and the adsorption column aging coefficient are substituted into the preset flushing gas flow rate correction formula for calculation to generate the actual flushing gas flow rate.

[0049] The difference between the nitrogen and oxygen concentration and the maximum residual concentration of the adsorption column is normalized based on the nitrogen and oxygen concentration to generate a correction parameter for the flushing gas flow rate.

[0050] The actual flushing gas flow rate is calculated by substituting the flushing gas flow rate correction parameter, the adsorption column aging coefficient, and the preset adsorption column adsorption volume into the preset flushing gas flow rate correction formula.

[0051] The actual flushing gas flow rate and the actual flushing gas injection rate are summarized to generate actual flushing gas parameters;

[0052] The actual temperature recovery and vacuuming parameters are determined by calculating the adsorption column aging coefficient, the actual flushing gas flow rate, and the initial flushing gas flow rate.

[0053] By adopting the above technical solution, the quotient between the nitrogen and oxygen concentration and the maximum residual concentration of the adsorption column is calculated to obtain the rinsing gas flow rate correction parameter. The rinsing gas flow rate correction parameter, the initial rinsing gas flow rate, and the adsorption column aging coefficient are substituted into the rinsing gas flow rate correction formula to calculate the actual rinsing gas flow rate. The difference between the nitrogen and oxygen concentration and the maximum residual concentration of the adsorption column is normalized according to the nitrogen and oxygen concentration to obtain the rinsing gas inlet flow rate correction parameter. The rinsing gas inlet flow rate correction parameter, the adsorption column aging coefficient, and the adsorption volume of the adsorption column are substituted into the rinsing gas inlet flow rate correction formula to calculate the actual rinsing gas inlet flow rate. The actual rinsing gas flow rate and the actual rinsing gas inlet flow rate are summarized to obtain the actual rinsing gas parameter. The actual reheat vacuum parameter is determined by calculating the adsorption column aging coefficient, the actual rinsing gas flow rate, and the initial rinsing gas flow rate. This provides data support for controlling the adsorption column cleaning device to perform secondary cleaning of the primary adsorption column based on the actual rinsing gas parameter and the actual reheat vacuum parameter, thereby maximizing the extraction of oxygen and nitrogen molecules adsorbed on the adsorption column and reducing krypton loss during the vacuuming process.

[0054] Optionally, the steps for determining the actual temperature recovery vacuum parameters based on the adsorption column aging coefficient, the actual flushing gas flow rate, and the initial flushing gas flow rate include:

[0055] Collect actual adsorption column pressure and actual adsorption column vacuuming time;

[0056] The actual adsorption column pressure and the adsorption column aging coefficient are substituted into the preset warming vacuum pressure correction formula for calculation to generate the actual warming vacuum pressure.

[0057] Calculate the quotient between the actual flushing gas flow rate and the initial flushing gas flow rate to generate a gas flow rate correction ratio;

[0058] Calculate the quotient between the actual temperature return vacuum pressure and the actual adsorption column pressure to generate the temperature return vacuum pressure correction ratio.

[0059] Calculate the sum between the preset adsorption column aging compensation value and the adsorption column aging coefficient to generate the aging compensation amount for the reheating and vacuuming time.

[0060] Calculate the product of the actual evaporation vacuum time, the gas flow rate correction ratio, the temperature recovery vacuum pressure correction ratio, and the aging compensation amount for the temperature recovery vacuum time to generate the actual temperature recovery vacuum time.

[0061] Calculate the quotient of the difference between the actual adsorption column pressure and the actual temperature return vacuum pressure and the temperature return vacuum time to generate the actual temperature return vacuum rate.

[0062] The actual temperature recovery vacuum pressure, actual temperature recovery vacuum time, and actual temperature recovery vacuum rate are summarized to generate actual temperature recovery vacuum parameters.

[0063] By adopting the above technical solution, the actual rewarming vacuum pressure is calculated by substituting the actual adsorption column pressure and the adsorption column aging coefficient into the rewarming vacuum pressure correction formula. The gas flow rate correction ratio is obtained by calculating the quotient between the actual flushing gas flow rate and the initial flushing gas flow rate. The rewarming vacuum pressure correction ratio is obtained by calculating the quotient between the actual rewarming vacuum pressure and the actual adsorption column pressure. The aging compensation amount for rewarming vacuum time is obtained by calculating the sum of the adsorption column aging compensation value and the adsorption column aging coefficient. The actual rewarming vacuum time is obtained by multiplying the actual evaporation vacuum time, the gas flow rate correction ratio, the rewarming vacuum pressure correction ratio, and the aging compensation amount for rewarming vacuum time. The actual rewarming vacuum rate is obtained by calculating the quotient between the difference between the actual adsorption column pressure and the actual rewarming vacuum pressure and the rewarming vacuum time. The actual rewarming vacuum parameters are obtained by summing the actual rewarming vacuum pressure, the actual rewarming vacuum time, and the actual rewarming vacuum rate. This provides data support for controlling the vacuuming component to perform vacuuming operation on the adsorption column in the secondary cleaning step based on the actual rewarming vacuum parameters, thereby reducing the amount of krypton lost during the vacuuming process.

[0064] Secondly, this application provides a Kr separation system based on selective desorption, employing the following technical solution:

[0065] A Kr separation system based on selective desorption includes:

[0066] The data collection module is used to collect historical krypton consumption data.

[0067] A memory for storing programs of the Kr separation method based on selective desorption as described in any of the preceding claims;

[0068] The processor and the program in the memory can be loaded and executed by the processor and implement the Kr separation method based on selective desorption as described in any of the above.

[0069] By employing the above technical solution, the processor loads and executes the program stored in the memory based on the selective desorption Kr separation method. This controls the acquisition module to obtain a series of data related to the implementation of selective desorption Kr separation. The difference between the historical krone loss and the adsorption column mass and the initial unit krone adsorption amount is calculated to obtain the actual unit krone adsorption amount of the first-stage adsorption column. The quotient between the product of the actual unit krone adsorption amount and the adsorption column mass and the single flow velocity of the air to be adsorbed is calculated to obtain the actual adsorption time. Based on the actual adsorption time, the first-stage adsorption column is controlled to adsorb the air to be adsorbed, resulting in the adsorption column to be separated. The system controls the preset adsorption column cleaning device to clean the adsorption column to be separated based on the actual unit krypton adsorption capacity, and collects the desorbed gas after cleaning into the waste gas storage device. The desorption operation is then performed on the adsorption column to be desorbed to obtain the first-stage separated krypton gas. The gas collection device is controlled to collect the first-stage separated krypton gas, and the first-stage adsorption column is heated and activated to restore its adsorption capacity. Thus, the relevant data of the cleaning steps are adjusted according to the actual adsorption capacity of the first-stage adsorption column, so that the nitrogen and oxygen molecules adsorbed on the first-stage adsorption column are removed to the maximum extent and the number of adsorbed krypton molecules that are mistakenly removed is reduced, thereby reducing krypton loss.

[0070] Thirdly, this application provides a smart terminal, which adopts the following technical solution:

[0071] A smart terminal includes a memory and a processor, wherein the memory stores a computer program that can be loaded by the processor and executed as described in any of the preceding claims, based on the Kr separation method of selective desorption.

[0072] By employing the above technical solution, and through the operation of a smart terminal, the processor loads and executes a computer program stored in the memory based on the selective desorption Kr separation method. This program calculates the difference between the historical krypton loss and the adsorption column mass and the initial unit krypton adsorption amount to obtain the actual unit krypton adsorption amount of the primary adsorption column. The actual adsorption time is obtained by calculating the quotient between the product of the actual unit krypton adsorption amount and the adsorption column mass and the single flow velocity of the air to be adsorbed. Based on the actual adsorption time, the primary adsorption column is controlled to adsorb the air to be adsorbed, resulting in the adsorption column to be separated. Based on the actual unit krypton adsorption amount, a preset adsorption column cleaning device is controlled to clean the adsorption column to be separated, resulting in the adsorption column to be desorbed. The desorbed gas after cleaning is collected in a waste gas storage device. Desorption is performed on the adsorption column to be desorbed to obtain the primary separated krypton gas. The gas collection device is controlled to collect the primary separated krypton gas, and the primary adsorption column is heated and activated to restore its adsorption capacity. Therefore, the relevant data of the cleaning steps are adjusted according to the actual adsorption capacity of the primary adsorption column, maximizing the removal of nitrogen and oxygen molecules adsorbed on the primary adsorption column and reducing the number of adsorbed krypton molecules mistakenly removed, thereby reducing krypton loss.

[0073] Fourthly, this application provides a computer storage medium capable of storing corresponding programs, which facilitates the reduction of krypton loss, and adopts the following technical solution:

[0074] A computer-readable storage medium storing a computer program that can be loaded by a processor and executed any of the above-described Kr separation methods based on selective desorption.

[0075] By employing the above technical solution, a computer program for a Kr separation method based on selective desorption is stored in a computer-readable storage medium. The processor loads and executes the computer program stored in the storage medium, thereby calculating the difference between the quotient of historical krypton loss and adsorption column mass and the initial unit krypton adsorption amount to obtain the actual unit krypton adsorption amount of the primary adsorption column. The actual adsorption time is obtained by calculating the quotient between the product of the actual unit krypton adsorption amount and the adsorption column mass and the single flow velocity of the air to be adsorbed. Based on the actual adsorption time, the primary adsorption column is controlled to adsorb the air to be adsorbed, resulting in the adsorption column to be separated. Based on the actual unit krypton adsorption amount, a preset adsorption column cleaning device is controlled to clean the adsorption column to be separated, resulting in the adsorption column to be desorbed. The desorbed gas after cleaning is collected in a waste gas storage device. Desorption is performed on the adsorption column to be desorbed to obtain the primary separated krypton gas. The gas collection device is controlled to collect the primary separated krypton gas, and the primary adsorption column is heated and activated to restore its adsorption capacity. Therefore, the relevant data of the cleaning steps are adjusted according to the actual adsorption capacity of the primary adsorption column, so that the nitrogen and oxygen molecules adsorbed on the primary adsorption column are removed to the maximum extent and the number of adsorbed krypton molecules mistakenly removed is reduced, thereby reducing krypton loss.

[0076] In summary, this application includes at least one of the following beneficial technical effects:

[0077] 1. The actual unit krypton adsorption capacity of the primary adsorption column is obtained by calculating the difference between the quotient of historical krypton loss and adsorption column mass and the initial unit krypton adsorption capacity. The actual adsorption time is obtained by calculating the quotient between the product of the actual unit krypton adsorption capacity and adsorption column mass and the single flow velocity of the air to be adsorbed. Based on the actual adsorption time, the primary adsorption column is controlled to adsorb the air to be adsorbed to obtain the adsorption column to be separated. Based on the actual unit krypton adsorption capacity, the preset adsorption column cleaning device is controlled to clean the adsorption column to be separated to obtain the adsorption column to be desorbed. The desorbed gas after cleaning is collected to the waste gas storage device. The desorption operation is performed on the adsorption column to be desorbed to obtain the primary separated krypton gas. The gas collection device is controlled to collect the primary separated krypton gas, and the primary adsorption column is heated and activated to restore its adsorption capacity. Thus, the relevant data of the cleaning steps are adjusted according to the actual adsorption capacity of the primary adsorption column to maximize the removal of nitrogen and oxygen molecules adsorbed on the primary adsorption column and reduce the number of adsorbed krypton molecules that are mistakenly removed, thereby reducing krypton loss.

[0078] 2. By controlling the adsorption column cleaning device to clean the adsorption column to be separated according to the actual unit krypton adsorption amount, a primary cleaned adsorption column is obtained. The vacuum component is controlled to collect the desorbed gas to the waste gas storage device. It is determined whether the nitrogen and oxygen concentrations meet the preset secondary cleaning requirements. If not, the adsorption column to be desorbed is determined as the primary cleaned adsorption column. If it meets the requirements, the difference between the initial unit krypton adsorption amount and the actual unit krypton adsorption amount is normalized according to the initial unit krypton adsorption amount to obtain the adsorption column aging coefficient. The adsorption column cleaning device is controlled to perform secondary cleaning on the primary cleaned adsorption column according to the adsorption column aging coefficient and oxygen and nitrogen concentrations. The nitrogen and oxygen concentrations in the waste gas storage device are continuously collected for cyclic judgment, so that the nitrogen and oxygen molecules adsorbed on the primary adsorption column are desorbed to the maximum extent and the number of adsorbed krypton molecules that are mistakenly removed is reduced, thereby increasing the krypton content collected in the primary separation.

[0079] 3. The actual recovery temperature is calculated by substituting the temperature of the adsorption column during the first cleaning and the aging coefficient of the adsorption column into the recovery temperature correction formula. The actual recovery time is calculated by substituting the evaporation time of the first cleaning and the aging coefficient of the adsorption column into the recovery time correction formula. Based on the aging coefficient of the adsorption column, the nitrogen and oxygen concentration, and the preset maximum residual concentration of the adsorption column, the actual flushing gas parameters and the actual recovery vacuum parameters are determined. The adsorption column heating component is then controlled to heat the adsorption column during the first cleaning based on the actual recovery temperature and the actual recovery time. The adsorption column pulse cleaning component is then controlled to introduce flushing gas into the adsorption column during the first cleaning based on the actual flushing parameters. Finally, the vacuum component is controlled to extract the desorbed gas from the adsorption column during the first cleaning to the waste gas storage device based on the actual recovery vacuum parameters. Attached Figure Description

[0080] Figure 1 This is a flowchart of a Kr separation method based on selective desorption in an embodiment of this application.

[0081] Figure 2 This is a flowchart illustrating the steps in this application embodiment of controlling a preset adsorption column cleaning device to clean the adsorption column to be separated based on the actual unit krypton adsorption amount, so as to generate an adsorption column to be desorbed, and collecting the desorbed gas after cleaning into a preset waste gas storage device.

[0082] Figure 3 This is a flowchart illustrating the steps in this application embodiment of controlling the adsorption column cleaning device to clean the adsorption column to be separated according to the actual unit krypton adsorption amount, so as to generate a primary cleaned adsorption column, and controlling the vacuum component to collect the desorbed gas to the waste gas storage device.

[0083] Figure 4 This is a flowchart illustrating the steps in this application embodiment to determine the evaporation heating parameters and evaporation vacuuming parameters based on the unit adsorption aging amount and the aging ratio of the adsorption column.

[0084] Figure 5 This is a flowchart illustrating the steps in this application embodiment of controlling the adsorption column cleaning device to perform a secondary cleaning of the adsorption column based on the aging coefficient of the adsorption column and the oxygen and nitrogen concentration, and continuing to collect the nitrogen and oxygen concentration in the waste gas storage device for cyclical judgment.

[0085] Figure 6 This is a flowchart illustrating the steps in this application embodiment to calculate and determine the actual flushing gas parameters and the actual temperature recovery and vacuuming parameters based on the aging coefficient of the adsorption column, the nitrogen and oxygen concentration, and the preset maximum residual concentration of the adsorption column.

[0086] Figure 7 This is a flowchart illustrating the steps in this application embodiment to determine the actual temperature recovery and vacuuming parameters based on the aging coefficient of the adsorption column, the actual flushing gas flow rate, and the initial flushing gas flow rate. Detailed Implementation

[0087] To make the purpose, technical solution, and advantages of this application clearer, the following description is provided in conjunction with the appendix. Figures 1 to 7 The present application will be further described in detail below with reference to embodiments. It should be understood that the specific embodiments described herein are for illustrative purposes only and are not intended to limit the scope of the application.

[0088] This application discloses a Kr separation method based on selective desorption. This method primarily addresses the problem of reduced Kr content due to adsorption column aging. Specifically, it discloses a sample air, a primary adsorption column, an adsorption column cleaning device, an adsorption column status monitoring device, and a processing terminal. The processing terminal is communicatively connected to both the adsorption column cleaning device and the adsorption column status monitoring device to achieve data exchange and control. After the historical Kr loss of the sample air collected by the adsorption column status monitoring device is sent to the processing terminal, the processing terminal determines the actual unit Kr adsorption capacity of the primary adsorption column based on the historical Kr loss. Then, the processing terminal determines the adsorption time of the primary adsorption column on the sample air based on the actual unit Kr adsorption capacity. After the adsorption time ends, the processing terminal determines the relevant parameters for the adsorption column cleaning step based on the actual unit Kr adsorption capacity and controls the adsorption column cleaning device to clean the primary adsorption column according to these parameters. The aim is to quickly and rationally control the adsorption column cleaning device to clean the primary adsorption column, thereby maximizing the removal of adsorbed oxygen and nitrogen from the adsorption column while minimizing Kr loss, thus increasing the Kr content collected in the primary separation stage.

[0089] Reference Figure 1 This application discloses a Kr separation method based on selective desorption, comprising the following steps:

[0090] Step S100: Collect the historical krypton loss of the preset sample gas.

[0091] Here, the sample gas refers to the gas after the previous separation operation, and the historical krypton loss refers to the molar amount of krypton in the exhaust gas discharged during the separation process of the sample gas after the previous separation operation. The processing terminal queries the historical database for the historical data corresponding to the most recent gas separation operation, and then queries the historical data to find the krypton loss in the sample gas. The processing terminal then determines this krypton loss as the historical krypton loss.

[0092] A historical database is a collection of data used to store all data for each gas separation process, including data such as the time of a single gas separation, the amount of krypton lost in a single process, and the amount of krypton collected in a single process.

[0093] The single gas separation time refers to the specific time period and time interval of each gas separation, the single krypton loss refers to the mass of krypton in the waste gas collected during each gas separation, and the single krypton collection amount refers to the mass of krypton collected after each gas separation is completed.

[0094] Step S101: Calculate the difference between the historical krypton loss and the preset adsorption column mass and the preset initial unit krypton adsorption amount, so as to generate the preset actual unit krypton adsorption amount of the primary adsorption column.

[0095] The actual unit krypton adsorption capacity refers to the molar amount of krypton adsorbed per unit mass of the primary adsorption column. The actual unit krypton adsorption capacity can be obtained by dividing the historical krypton loss by the adsorption column mass and then subtracting the calculated quotient from the initial unit krypton adsorption capacity.

[0096] The adsorption column mass refers to the mass of the carbon molecular sieve in the primary adsorption column. In one embodiment, the operator finds the mass of the carbon molecular sieve that can be filled into the adsorption column in the adsorption column technical manual according to the adsorption column model, which is the adsorption column mass.

[0097] The initial unit krypton adsorption capacity refers to the molar amount of krypton adsorbed per unit mass of the primary adsorption column in the previous gas separation operation. The initial unit krypton adsorption capacity is obtained by querying the historical data corresponding to the most recent gas separation operation in the historical database through the processing terminal and continuing to query the historical data.

[0098] A primary adsorption column is a closed, cylindrical container in a primary separation module that uses carbon molecular sieves filled inside the column to adsorb krypton in the gas stream at extremely low temperatures, thereby removing the main components of nitrogen and oxygen in the gas stream.

[0099] Step S102: Calculate the quotient between the product of the actual unit krypton adsorption amount and the adsorption column mass and the preset single adsorption airflow velocity to generate the actual adsorption time.

[0100] The actual adsorption time refers to the time required for the primary adsorption column to adsorb krypton from the gas after it is introduced into the primary adsorption column. The actual adsorption time can be obtained by multiplying the actual unit krypton adsorption amount by the adsorption column mass through the processing terminal, and then dividing the product by the single flow rate of the air to be adsorbed.

[0101] The single-pass airflow velocity refers to the molar amount of krypton flowing in the air to be separated per unit time. In one embodiment, the operator finds the permissible gas flow volume per unit time in the adsorption column technical manual based on the primary adsorption column size. The gas flow volume per unit time is then converted into the molar amount of gas flowing per unit time via a processing terminal. Multiplying this molar amount by the molar fraction of krypton yields the single-pass airflow velocity. For example, a gas flow volume of 6 L / min and a krypton molar fraction of 3 × 10⁻⁶ are used. -4 For example, the velocity of the airflow to be adsorbed in a single cycle is approximately 8 × 10⁻⁶. -5 mol / min.

[0102] Step S103: Control the primary adsorption column to adsorb the preset air to be adsorbed according to the actual adsorption time, so as to generate the adsorption column to be separated.

[0103] The adsorption column to be separated refers to the primary adsorption column after the air to be adsorbed has undergone adsorption. After the actual adsorption time is determined by the processing terminal, the air to be adsorbed is introduced into the primary adsorption column for adsorption according to the actual adsorption time. After the adsorption is completed, the adsorption column to be separated is determined as the primary adsorption column by the processing terminal.

[0104] Air to be adsorbed refers to air that needs to be separated after impurity removal.

[0105] Step S104: Control the preset adsorption column cleaning device to clean the adsorption column to be separated according to the actual unit krypton adsorption amount, so as to generate the adsorption column to be desorbed, and collect the desorbed gas after cleaning into the preset waste gas storage device.

[0106] The adsorption column to be desorbed refers to the primary adsorption column that, after cleaning, only adsorbs krypton gas. After determining the actual unit krypton adsorption capacity at the treatment terminal, the terminal controls the adsorption column cleaning device to clean the adsorption column to be separated based on this capacity. The cleaned adsorption column is the desorbed adsorption column, and the desorbed gas during the cleaning process is collected in a waste gas storage device. Specific methods are described in [reference needed]. Figure 2 This step provides support for subsequent desorption operations on the adsorption column to extract krypton.

[0107] Waste gas storage devices are sealed containers used to store waste gas extracted by vacuum components during the cleaning process.

[0108] An adsorption column cleaning device is a device used to desorb oxygen and nitrogen molecules adsorbed in a primary adsorption column, so that only krypton molecules are adsorbed on the primary adsorption column. It includes a vacuum pumping component, an adsorption column heating component, and an adsorption column pulse cleaning component. The vacuum pumping component is a module used to extract the gas inside the primary adsorption column. The vacuum pumping component is connected to the bottom port of the adsorption column to be separated. After receiving the vacuum pumping command sent by the processing terminal, the vacuum pumping component starts to work and transports the extracted gas to the waste gas storage device for storage.

[0109] The adsorption column heating assembly is a module used to heat the primary adsorption column to a set temperature. The adsorption column heating assembly consists of three electric heating strips of different lengths wrapped around the outer surface of the primary adsorption column and a temperature sensor. After receiving a heating command from the processing terminal, the adsorption column heating assembly starts to work and measures the temperature of the primary adsorption column in real time through the temperature sensor, and stops heating after reaching the set target temperature.

[0110] The adsorption column pulse cleaning assembly is a module used to introduce flushing gas into the primary adsorption column to flush away residual oxygen and nitrogen molecules on the primary adsorption column. The adsorption column pulse cleaning assembly is connected to the top port of the primary adsorption column. After receiving the flushing command sent by the processing terminal, the adsorption column pulse cleaning assembly starts to introduce flushing gas into the primary adsorption column and controls the flow rate and content of the flushing gas according to the received command.

[0111] Step S105: Perform desorption operation on the adsorption column to generate primary separated krypton gas, control the preset gas collection device to collect the primary separated krypton gas, and heat and activate the primary adsorption column to restore its adsorption capacity.

[0112] In this process, the first-stage separation of krypton gas refers to the krypton gas desorbed from the adsorption column. The adsorption column heating component in the adsorption column cleaning device at the treatment terminal heats the adsorption column to be desorbed, raising its temperature to 0°C. Then, the vacuum component in the adsorption column cleaning device extracts the desorbed gas from the adsorption column to a gas collection device for storage. The adsorption column heating component then continues to heat and activate the adsorption column to be desorbed, raising its temperature to 260°C, thereby restoring the adsorption capacity of the adsorption column.

[0113] A gas collection device is a sealed container used to store primary separated krypton gas.

[0114] Reference Figure 2 The steps include: controlling the preset adsorption column cleaning device to clean the adsorption column to be separated according to the actual unit krypton adsorption amount, so as to generate the adsorption column to be desorbed, and collecting the desorbed gas after cleaning into the preset waste gas storage device.

[0115] Step S200: Control the adsorption column cleaning device to clean the adsorption column to be separated according to the actual unit krypton adsorption amount, so as to generate a primary cleaned adsorption column, and control the vacuum component to collect the desorbed gas to the waste gas storage device.

[0116] The first-stage adsorption column refers to the primary adsorption column after the adsorption column to be separated has undergone one cleaning. The first-stage adsorption column is obtained by controlling the adsorption column cleaning device at the processing terminal to clean the adsorption column to be separated based on the actual unit krypton adsorption capacity. The vacuum assembly is then controlled to collect the desorbed gas into the waste gas storage device. Specific methods are described in [reference needed]. Figure 3 This process provides support for subsequent secondary cleaning of the primary cleaning adsorption column.

[0117] Step S201: Collect the nitrogen and oxygen concentration in the waste gas storage device.

[0118] The nitrogen and oxygen concentration refers to the volume fraction of nitrogen and oxygen molecules in the waste gas collected in the waste gas storage device. In one embodiment, the oxygen concentration and nitrogen concentration can be obtained by inserting the probes of the electrochemical sensor and the thermal conductivity sensor into the waste gas storage device for measurement. The nitrogen and oxygen concentration can then be obtained by adding the oxygen concentration and nitrogen concentration through the processing terminal.

[0119] Step S202: Determine whether the nitrogen and oxygen concentration meets the preset secondary cleaning requirements.

[0120] The secondary cleaning requirement refers to the need to perform a secondary cleaning of the adsorption column when the nitrogen and oxygen concentration is lower than the allowable nitrogen and oxygen concentration in the waste gas storage device.

[0121] The nitrogen and oxygen concentration is determined by the processing terminal to see if it meets the requirements for secondary cleaning, thereby determining whether the nitrogen and oxygen molecules in the adsorption column to be separated have been cleaned.

[0122] Step S2021: If the condition is not met, the adsorption column to be desorbed is determined as a first-time cleaning adsorption column.

[0123] If the processing terminal determines that the nitrogen and oxygen concentration does not meet the requirements for secondary cleaning, it means that the nitrogen and oxygen molecules in the adsorption column to be separated have been cleaned. Therefore, the processing terminal identifies the adsorption column to be separated as the primary cleaning adsorption column, thus providing support for the subsequent desorption operation of the adsorption column to be desorbed.

[0124] Step S20022: If satisfied, normalize the difference between the initial unit krypton adsorption amount and the actual unit krypton adsorption amount based on the initial unit krypton adsorption amount to generate the adsorption column aging coefficient.

[0125] If the processing terminal determines that the nitrogen and oxygen concentration meets the requirements for secondary cleaning, it means that the nitrogen and oxygen molecules in the adsorption column to be separated have not been cleaned. In this case, the processing terminal normalizes the difference between the initial unit krypton adsorption amount and the actual unit krypton adsorption amount based on the initial unit krypton adsorption amount to generate the adsorption column aging coefficient. This provides data support for the subsequent control of the adsorption column cleaning device to perform secondary cleaning of the adsorption column after the primary cleaning based on the adsorption column aging coefficient.

[0126] The aging coefficient of an adsorption column is a parameter used to quantify the degree of aging of a primary adsorption column. It is obtained by subtracting the actual adsorption amount per unit of krypton from the initial adsorption amount per unit of krypton, and then dividing the difference by the initial adsorption amount per unit of krypton.

[0127] Step S20221: Based on the aging coefficient of the adsorption column and the oxygen and nitrogen concentration, control the adsorption column cleaning device to perform a second cleaning of the adsorption column after the first cleaning, and continue to collect the nitrogen and oxygen concentration in the waste gas storage device for cyclic judgment.

[0128] In this process, the adsorption column cleaning device is controlled by the processing terminal to perform a secondary cleaning of the adsorption column after the primary cleaning, based on the aging coefficient of the adsorption column and the oxygen and nitrogen concentration. The specific method is described in [reference needed]. Figure 5 This method reduces krypton loss due to aging of the primary adsorption column and improves the purity of the krypton collected after desorption. After the primary adsorption column is cleaned a second time, the nitrogen and oxygen concentration in the waste gas storage device is collected for cyclical judgment to determine whether subsequent desorption operations can be performed.

[0129] Reference Figure 3 The steps include controlling the adsorption column cleaning device to clean the adsorption column to be separated based on the actual unit krypton adsorption capacity, generating a primary cleaned adsorption column, and controlling the vacuum assembly to collect the desorbed gas into the waste gas storage device.

[0130] Step S300: Calculate the quotient between the initial unit krypton adsorption amount and the actual unit krypton adsorption amount to generate the adsorption column aging ratio.

[0131] The aging ratio of the adsorption column refers to the ratio of the actual unit krypton adsorption amount to the initial unit krypton adsorption amount. The aging ratio of the adsorption column can be obtained by dividing the actual unit krypton adsorption amount by the initial unit krypton adsorption amount through the treatment terminal.

[0132] Step S301: Calculate the difference between the initial unit krypton adsorption amount and the actual unit krypton adsorption amount to generate the unit adsorption aging amount.

[0133] The unit adsorption aging amount refers to the difference between the actual unit krypton adsorption amount and the initial unit krypton adsorption amount. The unit adsorption aging amount can be obtained by subtracting the actual unit krypton adsorption amount from the initial unit krypton adsorption amount through the processing terminal.

[0134] Step S302: Calculate based on the unit adsorption aging amount and the aging ratio of the adsorption column to determine the evaporation heating parameters and evaporation vacuum parameters.

[0135] Among them, the evaporation heating parameters refer to the set of parameters required to control the adsorption column heating component in the adsorption column cleaning device when heating the adsorption column to be separated, including the actual evaporation time and the actual evaporation temperature.

[0136] Evaporation vacuum parameters refer to the set of parameters required to control the vacuum components in the adsorption column cleaning device when performing vacuum operation on the adsorption column to be separated, including the actual evaporation vacuum time and the actual evaporation vacuum pressure.

[0137] Actual evaporation time refers to the heating time required for evaporation heating of the adsorption column to be separated during a single cleaning cycle; actual evaporation temperature refers to the temperature required to be reached during evaporation heating of the adsorption column to be separated during a single cleaning cycle; actual evaporation vacuuming time refers to the vacuuming time required during vacuuming operation of the adsorption column to be separated during a single cleaning cycle; actual evaporation vacuuming pressure refers to the vacuuming pressure required during vacuuming operation of the adsorption column to be separated during a single cleaning cycle. For specific methods, refer to... Figure 4 This method provides data support for subsequently controlling the adsorption column cleaning device to perform a single cleaning of the adsorption column to be separated based on the evaporation heating parameters and evaporation vacuum parameters.

[0138] Step S303: Control the heating component of the adsorption column to heat the adsorption column to be separated according to the evaporation heating parameters.

[0139] In this process, after the evaporation heating parameters are determined at the processing terminal, the processing terminal controls the adsorption column heating component to heat the adsorption column to be separated according to the evaporation heating parameters, so that the nitrogen and oxygen molecules in the adsorption column to be separated are desorbed from the adsorption column, thereby enabling the vacuum component to extract the nitrogen and oxygen molecules to the waste gas storage device.

[0140] Step S304: Control the vacuuming component according to the evaporation vacuuming parameters to extract the desorbed gas to the waste gas storage device, and determine the first cleaning adsorption column as the adsorption column to be separated.

[0141] In this process, after the evaporation vacuum parameters are determined at the processing terminal, the processing terminal controls the vacuuming component to extract the desorbed gas to the waste gas storage device according to the evaporation vacuum parameters. The processing terminal also identifies the primary cleaning adsorption column as the adsorption column to be separated, thereby providing support for subsequent operations on the primary cleaning adsorption column.

[0142] Reference Figure 4 The steps for determining the evaporation heating parameters and evaporation vacuum parameters based on the unit adsorption aging amount and the aging ratio of the adsorption column include:

[0143] Step S400: Calculate the quotient between the preset initial evaporation time and the adsorption column aging ratio to generate the actual evaporation time.

[0144] In this step, the actual evaporation time is the same as that in step S302 above. The actual evaporation time can be obtained by dividing the initial evaporation time by the aging ratio of the adsorption column through the processing terminal. The smaller the aging ratio of the adsorption column, the worse the adsorption capacity of the first-stage adsorption column. Therefore, it is necessary to adjust the evaporation time based on the aging ratio of the adsorption column to extend the evaporation time, so that the adsorbed nitrogen and oxygen molecules can be fully desorbed.

[0145] The initial evaporation time refers to the time required for the evaporation step in the previous gas separation operation. The initial evaporation time is obtained by querying the historical data of the most recent gas separation operation with the most recent single separation time in the historical database through the processing terminal.

[0146] Step S401: Calculate the sum between the product of the unit adsorption aging amount and the preset evaporation temperature correction coefficient and the preset initial evaporation temperature to generate the actual evaporation temperature.

[0147] In this step, the actual evaporation temperature is the same as that in step S302 above. The actual evaporation temperature is obtained by multiplying the unit adsorption aging amount and the evaporation temperature correction coefficient by the processing terminal, and then adding the calculated product to the initial evaporation temperature. When the adsorption capacity weakens, the evaporation temperature needs to be increased to compensate for the insufficient desorption of nitrogen and oxygen molecules caused by the failure of some adsorption sites on the primary adsorption column.

[0148] The evaporation temperature correction factor is a correction parameter used to adjust the heating temperature of the adsorption column heating assembly in order to more fully desorb nitrogen and oxygen molecules from the adsorption column. In one embodiment, the evaporation temperature correction factor is 1.0 ± 0.5 K·g / mmol.

[0149] The initial evaporation temperature refers to the heating temperature required for the evaporation step in the previous gas separation operation. The initial evaporation temperature is obtained by querying the historical data of the most recent gas separation operation in the historical database through the processing terminal.

[0150] Step S402: Summarize the actual evaporation time and actual evaporation temperature to generate evaporation heating parameters.

[0151] The evaporation heating parameters in this step are the same as those in step S302 above. The evaporation heating parameters can be obtained by summarizing the actual evaporation time and actual evaporation temperature through the processing terminal.

[0152] Step S403: Calculate the quotient between the preset initial evaporation vacuum time and the adsorption column aging ratio to generate the actual evaporation vacuum time.

[0153] The actual vacuuming time in this step is the same as the actual vacuuming time in step S302 above. The actual evaporation vacuuming time can be obtained by dividing the initial evaporation vacuuming time by the aging ratio of the adsorption column through the processing terminal.

[0154] The initial evaporation vacuum time refers to the vacuuming time required in the evaporation step of the previous gas separation operation. The initial evaporation vacuum time is obtained by querying the historical data of the most recent gas separation operation with the single separation time in the historical database through the processing terminal and continuing to query the historical data.

[0155] Step S404: Substitute the unit adsorption aging amount, the initial unit krypton adsorption amount, and the preset initial evaporation vacuum pressure into the preset evaporation vacuum pressure correction formula for calculation to generate the actual evaporation vacuum pressure.

[0156] In this step, the actual evaporation vacuum pressure is the same as that in step S302 above. The unit adsorption aging amount, the initial unit krypton adsorption amount, and the initial evaporation vacuum pressure are substituted into the evaporation vacuum pressure correction formula through the processing terminal. The actual evaporation vacuum pressure can be obtained by calculation, where, This refers to the actual evaporation vacuum pressure. This refers to the initial evaporation vacuum pressure. This refers to the amount of adsorption and aging per unit. This refers to the initial unit krypton adsorption capacity. The weaker the adsorption capacity of the primary adsorption column, the lower the vacuum pressure required to extract nitrogen and oxygen molecules and reduce the amount of krypton that is accidentally adsorbed into the waste gas storage device, thereby reducing krypton loss.

[0157] The initial evaporation vacuum pressure refers to the vacuum pressure required for the evaporation step in the previous gas separation operation. The initial evaporation vacuum pressure is obtained by querying the historical data of the most recent gas separation operation in the historical database through the processing terminal and then retrieving the vacuum pressure from the historical data.

[0158] Step S405: Summarize the actual evaporation vacuuming time and actual evaporation vacuuming pressure to generate evaporation vacuuming parameters.

[0159] The evaporation vacuum parameters in this step are the same as those in step S302 above. The evaporation vacuum parameters can be obtained by summing up the actual evaporation vacuum time and actual evaporation vacuum pressure through the processing terminal.

[0160] Reference Figure 5 The steps of controlling the adsorption column cleaning device to perform a secondary cleaning of the adsorption column based on the aging coefficient of the adsorption column and the oxygen and nitrogen concentration, and continuing to collect the nitrogen and oxygen concentration in the waste gas storage device for cyclical judgment include:

[0161] Step S500: Collect the temperature of the adsorption column during one cleaning cycle and the evaporation time during one cleaning cycle.

[0162] The temperature of the adsorption column during the first cleaning refers to the temperature of the adsorption column after the evaporation heating is completed during the first cleaning. The temperature of the adsorption column during the first cleaning is obtained by determining the actual evaporation temperature through the processing terminal.

[0163] The evaporation time for one cleaning cycle refers to the time taken from the start of evaporation heating to the end of one cleaning cycle. It is obtained by determining the actual evaporation time of one cleaning cycle through the processing terminal.

[0164] The actual evaporation temperature and actual evaporation time in this step are the same as those in step S402 above, and will not be repeated here.

[0165] Step S501: Substitute the temperature of the first cleaning adsorption column and the aging coefficient of the adsorption column into the preset recovery temperature correction formula for calculation to generate the actual recovery temperature.

[0166] The actual reheat temperature refers to the temperature required to reheat the adsorption column during the secondary cleaning process. This temperature is determined by substituting the primary cleaning adsorption column temperature and the adsorption column aging coefficient into the reheat temperature correction formula at the processing terminal. The actual return temperature can be obtained by calculation, where, This refers to the actual temperature at which the temperature returns to normal. This refers to the temperature at which the adsorption column is cleaned once. This refers to the aging coefficient of the adsorption column. The formula is based on the evaporation heating temperature during the first cleaning and the degree of aging of the adsorption column, and the recovery temperature is corrected accordingly. This avoids the problem of increased krypton loss due to the weakening of the adsorption capacity caused by the aging of the adsorption column.

[0167] Step S502: Substitute the evaporation time of the first cleaning and the aging coefficient of the adsorption column into the preset recovery time correction formula for calculation to generate the actual recovery time.

[0168] The actual warm-up time refers to the time required to reheat the adsorption column during the secondary cleaning process, after the primary cleaning. The primary cleaning evaporation time and the adsorption column aging coefficient are substituted into the warm-up time correction formula via the processing terminal. The actual warm-up time can be obtained by calculation, where, This refers to the actual warm-up time. This refers to the evaporation time during one cleaning cycle. This refers to the aging coefficient of the adsorption column. When there is no loss in the first-stage adsorption column, the actual reheating time should be equal to 1 / 3 of the actual evaporation time. However, due to the aging of the first-stage adsorption column, it is necessary to extend the actual reheating time so that the oxygen and nitrogen molecules adsorbed on the adsorption column can be fully desorbed.

[0169] Step S503: Control the heating component of the adsorption column to heat the adsorption column for the first cleaning according to the actual rewarming temperature and the actual rewarming time.

[0170] In this process, after the processing terminal determines the actual rewarming temperature and the actual rewarming time, the processing terminal controls the adsorption column heating component to heat the primary cleaning adsorption column according to the actual rewarming temperature and the actual rewarming time, thereby providing support for subsequent vacuuming and flushing gas operations on the primary cleaning adsorption column.

[0171] Step S504: Calculate the actual flushing gas parameters and actual reheat vacuum parameters based on the adsorption column aging coefficient, nitrogen and oxygen concentration and the preset maximum residual concentration of the adsorption column.

[0172] The actual flushing gas parameters refer to the set of parameters required to control the adsorption column pulse cleaning component in the adsorption column cleaning device when flushing the adsorption column with flushing gas, including the actual flushing gas flow rate and the actual flushing gas flow rate.

[0173] Actual rewarming vacuum parameters refer to the set of parameters required to control the vacuum components in the adsorption column cleaning device when performing a vacuuming operation on the adsorption column for a single cleaning. These parameters include actual rewarming vacuum pressure, actual rewarming vacuum time, and actual rewarming vacuum rate.

[0174] The maximum residual concentration of the adsorption column refers to the maximum nitrogen and oxygen concentration that can be left behind in the primary adsorption column. In one embodiment, the maximum residual concentration of the adsorption column is 5000 ppm.

[0175] The actual flushing gas flow rate refers to the flow rate of the gas introduced during the aeration cleaning operation of the adsorption column in the primary cleaning stage during the secondary cleaning process; the actual flushing gas flow rate refers to the volume of flushing gas introduced during the aeration cleaning operation of the adsorption column in the primary cleaning stage during the secondary cleaning process; the temperature recovery and vacuuming time refers to the time required for vacuuming the adsorption column in the primary cleaning stage during the secondary cleaning process; the temperature recovery and vacuuming pressure refers to the pressure required for vacuuming the adsorption column in the primary cleaning stage during the secondary cleaning process; the temperature recovery and vacuuming rate refers to the pressure drop of the adsorption column in the primary cleaning stage per unit time during the vacuuming operation. For specific methods, refer to [reference needed]. Figure 6 This process provides data support for subsequent vacuuming and flushing gas operation of the primary cleaning column by controlling the adsorption column pulse cleaning assembly and vacuum assembly through the processing terminal.

[0176] Step S505: Control the adsorption column pulse cleaning component to introduce the preset flushing gas into the primary cleaning column according to the actual flushing parameters, and control the vacuum component to extract the desorbed gas in the primary cleaning adsorption column to the waste gas storage device according to the actual temperature recovery vacuum parameters.

[0177] In this process, after the actual flushing parameters and actual temperature recovery and vacuuming parameters are determined at the processing terminal, the processing terminal controls the adsorption column pulse cleaning component to introduce flushing gas into the primary cleaning column according to the actual flushing parameters, and controls the vacuuming component to extract the desorbed gas in the primary cleaning adsorption column to the waste gas storage device according to the actual temperature recovery and vacuuming parameters.

[0178] Purging gas refers to an inert gas used to desorb molecules adsorbed on the adsorption column.

[0179] Reference Figure 6 The steps for determining the actual flushing gas parameters and actual temperature recovery vacuum parameters, based on the adsorption column aging coefficient, nitrogen and oxygen concentration, and the preset maximum residual concentration of the adsorption column, include:

[0180] Step S600: Calculate the quotient between the nitrogen and oxygen concentration and the maximum residual concentration of the adsorption column to generate the flushing gas flow rate correction parameter.

[0181] The flushing gas flow rate correction parameter refers to the ratio between the nitrogen and oxygen concentration in the waste gas storage device and the maximum nitrogen and oxygen concentration that can remain in the adsorption column. The flushing gas flow rate correction parameter can be obtained by dividing the nitrogen and oxygen concentration by the maximum residual concentration in the adsorption column at the treatment terminal.

[0182] Step S601: Substitute the flushing gas flow rate correction parameter, the preset initial flushing gas flow rate, and the adsorption column aging coefficient into the preset flushing gas flow rate correction formula for calculation to generate the actual flushing gas flow rate.

[0183] In this step, the actual flushing gas flow rate is the same as that in step S504 above. The flushing gas flow rate correction parameter, the initial flushing gas flow rate, and the adsorption column aging coefficient are substituted into the flushing gas flow rate correction formula through the processing terminal. The actual flushing gas flow rate can be obtained by calculation, where, This refers to the actual flushing gas flow rate. This refers to the initial flushing gas flow rate. This refers to the aging coefficient of the adsorption column. This refers to the correction parameter for the flushing gas flow rate.

[0184] The initial flushing gas flow rate refers to the gas flow rate of the flushing gas introduced into the adsorption column pulse cleaning component during the most recent gas separation operation, including the secondary cleaning. The initial flushing gas flow rate is obtained by querying the historical data corresponding to the most recent operation, including the secondary cleaning, through the processing terminal in the historical database.

[0185] Step S602: Normalize the difference between the nitrogen and oxygen concentration and the maximum residual concentration of the adsorption column based on the nitrogen and oxygen concentration to generate a correction parameter for the flushing gas flow rate.

[0186] The flushing gas flow rate correction parameter refers to the correction parameter used to adjust the flow rate of flushing gas in order to ensure that the residual nitrogen and oxygen concentration in the adsorption column is within the maximum residual concentration of the adsorption column. The flushing gas flow rate correction parameter can be obtained by subtracting the maximum residual concentration of the adsorption column from the nitrogen and oxygen concentration at the processing terminal, and then dividing the nitrogen and oxygen concentration by the calculated difference.

[0187] Step S603: Substitute the flushing gas flow rate correction parameter, the adsorption column aging coefficient, and the preset adsorption column adsorption volume into the preset flushing gas flow rate correction formula for calculation to generate the actual flushing gas flow rate.

[0188] In this step, the actual flushing gas flow rate is consistent with that in step S504 above. The flushing gas flow rate correction parameter, the adsorption column aging coefficient, and the adsorption column adsorption volume are substituted into the flushing gas flow rate correction formula through the processing terminal. The actual flushing gas flow rate can be obtained by calculation, where, This refers to the actual amount of flushing gas introduced. This refers to the adsorption volume of the adsorption column. This refers to the aging coefficient of the adsorption column. This refers to the correction parameter for the flushing gas flow rate.

[0189] The adsorption volume of the adsorption column refers to the internal volume of the primary adsorption column, which in one embodiment is obtained by the operator by referring to the adsorption column technical manual according to the model of the primary adsorption column.

[0190] Step S604: Summarize the actual flushing gas flow rate and the actual flushing gas injection rate to generate actual flushing gas parameters.

[0191] In this step, the actual flushing gas parameters are the same as those in step S504 above. After the actual flushing gas flow rate and the actual flushing gas flow rate are determined at the processing terminal, the actual flushing gas parameters can be obtained by summing up the actual flushing gas flow rate and the actual flushing gas flow rate at the processing terminal.

[0192] Step S605: Calculate the actual temperature recovery and vacuuming parameters based on the adsorption column aging coefficient, the actual flushing gas flow rate, and the initial flushing gas flow rate.

[0193] The actual temperature recovery vacuum parameters in this step are consistent with those in step S504 above. After the actual flushing gas flow rate and the initial flushing gas flow rate are determined at the processing terminal, the actual temperature recovery vacuum parameters can be calculated by the processing terminal based on the adsorption column aging coefficient, the actual flushing gas flow rate, and the initial flushing gas flow rate. The specific method is described in [reference needed]. Figure 7 This process provides data support for the subsequent control of the vacuum pumping component to perform vacuuming operations on the primary cleaning adsorption column.

[0194] Reference Figure 7 The steps for determining the actual temperature recovery vacuum parameters based on the adsorption column aging coefficient, actual flushing gas flow rate, and initial flushing gas flow rate include:

[0195] Step S700: Collect the actual adsorption column pressure and the actual adsorption column vacuuming time.

[0196] The actual adsorption column pressure refers to the pressure of the adsorption column at the end of the vacuuming operation during a single cleaning cycle. The actual adsorption column pressure is determined by the actual evaporation vacuuming pressure at the processing terminal.

[0197] The actual vacuuming time of the adsorption column refers to the time required from the start to the end of the vacuuming operation of the adsorption column during a single cleaning process. The actual evaporation vacuuming time is determined by the processing terminal.

[0198] Step S701: Substitute the actual adsorption column pressure and adsorption column aging coefficient into the preset warming vacuum pressure correction formula to calculate the actual warming vacuum pressure.

[0199] In this step, the actual re-temperature vacuum pressure is consistent with the actual re-temperature vacuum pressure in step S504 above. The actual adsorption column pressure and the adsorption column aging coefficient are substituted into the re-temperature vacuum pressure correction formula through the processing terminal. The actual rewarming vacuum pressure can be obtained by calculation, where, This refers to the actual vacuum pressure during temperature recovery. This refers to the actual adsorption column pressure. This refers to the aging coefficient of the adsorption column.

[0200] Step S702: Calculate the quotient between the actual flushing gas flow rate and the initial flushing gas flow rate to generate a gas flow rate correction ratio.

[0201] The gas flow rate correction ratio refers to the ratio of the actual flushing gas flow rate to the initial flushing gas flow rate during secondary cleaning. The gas flow rate correction ratio can be obtained by dividing the initial flushing gas flow rate by the actual flushing gas flow rate through the processing terminal.

[0202] Step S703: Calculate the quotient between the actual temperature return vacuum pressure and the actual adsorption column pressure to generate the temperature return vacuum pressure correction ratio.

[0203] The temperature recovery vacuum pressure correction ratio refers to the ratio of the actual temperature recovery vacuum pressure to the actual adsorption column pressure during the secondary cleaning process. This ratio can be obtained by dividing the actual adsorption column pressure by the actual temperature recovery vacuum pressure at the processing terminal.

[0204] Step S704: Calculate the sum between the preset adsorption column aging compensation value and the adsorption column aging coefficient to generate the aging compensation amount for the reheating and vacuuming time.

[0205] Among them, the aging compensation amount for the rewarming vacuum time refers to the total correction parameter for correcting the vacuum time of the secondary cleaning process based on the aging coefficient of the adsorption column. The aging compensation amount for the rewarming vacuum time can be obtained by adding the aging compensation value of the adsorption column to the aging coefficient of the adsorption column through the processing terminal.

[0206] The adsorption column aging compensation value refers to the correction amount made by adjusting the vacuuming time of the secondary cleaning based on the aging coefficient of the adsorption column. In one embodiment, the adsorption column aging compensation value is equal to 1.

[0207] Step S705: Calculate the product of the actual evaporation vacuum time, the gas flow rate correction ratio, the reheat vacuum pressure correction ratio, and the aging compensation amount for the reheat vacuum time to generate the actual reheat vacuum time.

[0208] The actual rewarming vacuum time in this step is the same as the actual rewarming vacuum time in step S504 above. The actual rewarming vacuum time can be obtained by multiplying the actual evaporation vacuum time, the gas flow rate correction ratio, the rewarming vacuum pressure correction ratio, and the aging compensation amount of the rewarming vacuum time by the processing terminal.

[0209] Step S706: Calculate the quotient of the difference between the actual adsorption column pressure and the actual temperature return vacuum pressure and the temperature return vacuum time to generate the actual temperature return vacuum rate.

[0210] In this step, the actual temperature recovery vacuum rate is the same as that in step S504 above. The actual temperature recovery vacuum rate can be obtained by subtracting the actual temperature recovery vacuum pressure from the actual adsorption column pressure through the processing terminal, and then dividing the difference by the temperature recovery vacuum time.

[0211] Step S707: Summarize the actual rewarming vacuum pressure, actual rewarming vacuum time, and actual rewarming vacuum rate to generate actual rewarming vacuum parameters.

[0212] The actual rewarming vacuum parameters in this step are the same as those in step S504 above. The actual rewarming vacuum parameters can be obtained by summarizing the actual rewarming vacuum pressure, actual rewarming vacuum time, and actual rewarming vacuum rate through the processing terminal.

[0213] Based on the same inventive concept, embodiments of this application provide a Kr separation method based on selective desorption, including:

[0214] The data acquisition module is used to collect historical krypton loss, nitrogen and oxygen concentration, temperature of the first cleaning adsorption column, evaporation time of the first cleaning, actual adsorption column pressure, and actual vacuuming time of the adsorption column.

[0215] Memory for storing programs based on the Kr separation method of selective desorption;

[0216] The processor and memory can load and execute programs and implement the Kr separation method based on selective desorption.

[0217] Those skilled in the art will clearly understand that, for the sake of convenience and brevity, the above-described division of functional modules is used as an example. In practical applications, the above functions can be assigned to different functional modules as needed, that is, the internal structure of the device can be divided into different functional modules to complete all or part of the functions described above. The specific working process of the system, device, and unit described above can be referred to the corresponding process in the foregoing method embodiments, and will not be repeated here.

[0218] This application provides a computer-readable storage medium storing a computer program that can be loaded by a processor and executed based on a Kr separation method of selective desorption.

[0219] Computer storage media include, for example, USB flash drives, portable hard drives, read-only memory (ROM), random access memory (RAM), magnetic disks, optical disks, and other media that can store program code.

[0220] Based on the same inventive concept, embodiments of this application provide a smart terminal, including a memory and a processor, wherein the memory stores a computer program that can be loaded and executed by the processor based on a Kr separation method of selective desorption.

[0221] Those skilled in the art will clearly understand that, for the sake of convenience and brevity, the above-described division of functional modules is used as an example. In practical applications, the above functions can be assigned to different functional modules as needed, that is, the internal structure of the device can be divided into different functional modules to complete all or part of the functions described above. The specific working process of the system, device, and unit described above can be referred to the corresponding process in the foregoing method embodiments, and will not be repeated here.

[0222] The above are all preferred embodiments of this application and are not intended to limit the scope of protection of this application. Any feature disclosed in this specification (including the abstract and drawings) may be replaced by other equivalent or similar features unless specifically stated otherwise. That is, unless specifically stated otherwise, each feature is only one example of a series of equivalent or similar features.

Claims

1. A Kr separation method based on selective desorption, characterized in that, include: Collect the historical krypton loss of the preset sample gas; The difference between the quotient of historical krypton loss and the preset adsorption column mass and the preset initial unit krypton adsorption amount is calculated to generate the preset actual unit krypton adsorption amount of the primary adsorption column. The actual adsorption time is calculated by quotient between the product of the actual unit krypton adsorption capacity and the adsorption column mass and the preset single-pass airflow velocity. The primary adsorption column is controlled to adsorb the preset air to be adsorbed based on the actual adsorption time, so as to generate the adsorption column to be separated. The preset adsorption column cleaning device is controlled according to the actual unit krypton adsorption amount to clean the adsorption column to be separated, so as to generate the adsorption column to be desorbed, and the desorbed gas after cleaning is collected into the preset waste gas storage device. The adsorption column to be desorbed is subjected to a desorption operation to generate primary separated krypton gas. A preset gas collection device is controlled to collect the primary separated krypton gas, and the primary adsorption column is heated and activated to restore its adsorption capacity. The adsorption column cleaning device includes a vacuum assembly. The steps of controlling the preset adsorption column cleaning device to clean the adsorption column to be separated according to the actual unit krypton adsorption amount, to generate an adsorption column to be desorbed, and collecting the desorbed gas after cleaning into a preset waste gas storage device include: The adsorption column cleaning device is controlled to clean the adsorption column to be separated according to the actual unit krypton adsorption amount, so as to generate a primary cleaned adsorption column, and the vacuum component is controlled to collect the desorbed gas to the waste gas storage device. Collect the nitrogen and oxygen concentration in the waste gas storage device; Determine whether the nitrogen and oxygen concentration meets the preset requirements for secondary cleaning; If the conditions are not met, the adsorption column to be desorbed will be designated as a single-cleaning adsorption column. If satisfied, the difference between the initial unit krypton adsorption amount and the actual unit krypton adsorption amount is normalized based on the initial unit krypton adsorption amount to generate the adsorption column aging coefficient. The adsorption column cleaning device is controlled to perform a second cleaning of the adsorption column after the first cleaning based on the aging coefficient of the adsorption column and the oxygen and nitrogen concentration, and the nitrogen and oxygen concentration in the waste gas storage device is continuously collected for cyclical judgment. The adsorption column cleaning device includes an adsorption column heating assembly. The steps of controlling the adsorption column cleaning device to clean the adsorption column to be separated according to the actual unit krypton adsorption amount to generate a primary cleaned adsorption column, and controlling the vacuum assembly to collect the desorbed gas into the waste gas storage device include: Calculate the quotient between the initial unit krypton adsorption amount and the actual unit krypton adsorption amount to generate the adsorption column aging ratio; Calculate the difference between the initial unit krypton adsorption amount and the actual unit krypton adsorption amount to generate the unit adsorption aging amount; The evaporation heating parameters and evaporation vacuum parameters are determined by calculating the unit adsorption aging amount and the aging ratio of the adsorption column. The heating component of the adsorption column is controlled to heat the adsorption column to be separated based on the evaporation heating parameters. The vacuum assembly is controlled according to the evaporation vacuum parameters to extract the desorbed gas to the waste gas storage device, and the first-cleaned adsorption column is identified as the adsorption column to be separated.

2. The Kr separation method based on selective desorption according to claim 1, characterized in that, The steps for determining the evaporation heating parameters and evaporation vacuum parameters based on the unit adsorption aging amount and the aging ratio of the adsorption column include: Calculate the quotient between the preset initial evaporation time and the aging ratio of the adsorption column to generate the actual evaporation time; The product of the unit adsorption aging amount and the preset evaporation temperature correction factor is calculated and summed with the preset initial evaporation temperature to generate the actual evaporation temperature. The actual evaporation time and actual evaporation temperature are summarized to generate evaporation heating parameters; Calculate the quotient between the preset initial evaporation vacuum time and the adsorption column aging ratio to generate the actual evaporation vacuum time; The unit adsorption aging amount, the initial unit krypton adsorption amount, and the preset initial evaporation vacuum pressure are substituted into the preset evaporation vacuum pressure correction formula for calculation to generate the actual evaporation vacuum pressure. The actual evaporation vacuuming time and actual evaporation vacuuming pressure are summarized to generate evaporation vacuuming parameters.

3. The Kr separation method based on selective desorption according to claim 1, characterized in that, The adsorption column cleaning device includes an adsorption column pulse cleaning assembly. The steps of controlling the adsorption column cleaning device to perform a secondary cleaning of the adsorption column after the primary cleaning, based on the adsorption column aging coefficient and oxygen / nitrogen concentration, and continuously collecting nitrogen and oxygen concentration data from the waste gas storage device for cyclical judgment include: The temperature of the adsorption column and the evaporation time of the first cleaning were recorded. The temperature of the adsorption column during the first cleaning and the aging coefficient of the adsorption column are substituted into the preset recovery temperature correction formula for calculation to generate the actual recovery temperature. The evaporation time of the first cleaning and the aging coefficient of the adsorption column are substituted into the preset recovery time correction formula for calculation to generate the actual recovery time. The heating component of the adsorption column is controlled to heat the adsorption column for the first cleaning based on the actual recovery temperature and actual recovery time. The actual flushing gas parameters and actual reheating vacuum parameters are determined by calculating the adsorption column aging coefficient, nitrogen and oxygen concentration, and preset maximum residual concentration of the adsorption column. Based on the actual flushing parameters, the pulse cleaning component of the adsorption column is controlled to introduce the preset flushing gas into the primary cleaning column, and the vacuum component is controlled to extract the desorbed gas in the primary cleaning adsorption column to the waste gas storage device based on the actual temperature recovery and vacuuming parameters.

4. The Kr separation method based on selective desorption according to claim 3, characterized in that, The steps for determining the actual flushing gas parameters and the actual temperature recovery vacuum parameters, based on the adsorption column aging coefficient, nitrogen and oxygen concentration, and the preset maximum residual concentration of the adsorption column, include: Calculate the quotient between the nitrogen and oxygen concentration and the maximum residual concentration of the adsorption column to generate the flushing gas flow rate correction parameter; The flushing gas flow rate correction parameters, the preset initial flushing gas flow rate, and the adsorption column aging coefficient are substituted into the preset flushing gas flow rate correction formula for calculation to generate the actual flushing gas flow rate. The difference between the nitrogen and oxygen concentration and the maximum residual concentration of the adsorption column is normalized based on the nitrogen and oxygen concentration to generate a correction parameter for the flushing gas flow rate. The actual flushing gas flow rate is calculated by substituting the flushing gas flow rate correction parameter, the adsorption column aging coefficient, and the preset adsorption column adsorption volume into the preset flushing gas flow rate correction formula. The actual flushing gas flow rate and the actual flushing gas injection rate are summarized to generate actual flushing gas parameters; The actual temperature recovery and vacuuming parameters are determined by calculating the adsorption column aging coefficient, the actual flushing gas flow rate, and the initial flushing gas flow rate.

5. The Kr separation method based on selective desorption according to claim 4, characterized in that, The steps for determining the actual temperature recovery vacuum parameters based on the adsorption column aging coefficient, actual flushing gas flow rate, and initial flushing gas flow rate include: Collect actual adsorption column pressure and actual adsorption column vacuuming time; The actual adsorption column pressure and the adsorption column aging coefficient are substituted into the preset warming vacuum pressure correction formula for calculation to generate the actual warming vacuum pressure. Calculate the quotient between the actual flushing gas flow rate and the initial flushing gas flow rate to generate a gas flow rate correction ratio; Calculate the quotient between the actual temperature return vacuum pressure and the actual adsorption column pressure to generate the temperature return vacuum pressure correction ratio. Calculate the sum between the preset adsorption column aging compensation value and the adsorption column aging coefficient to generate the aging compensation amount for the reheating and vacuuming time. Calculate the product of the actual evaporation vacuum time, the gas flow rate correction ratio, the temperature recovery vacuum pressure correction ratio, and the aging compensation amount for the temperature recovery vacuum time to generate the actual temperature recovery vacuum time. Calculate the quotient of the difference between the actual adsorption column pressure and the actual temperature return vacuum pressure and the temperature return vacuum time to generate the actual temperature return vacuum rate. The actual temperature recovery vacuum pressure, actual temperature recovery vacuum time, and actual temperature recovery vacuum rate are summarized to generate actual temperature recovery vacuum parameters.

6. A Kr separation system based on selective desorption, characterized in that, include: The data collection module is used to collect historical krypton consumption data. A memory for storing the program of the Kr separation method based on selective desorption as described in any one of claims 1 to 5; The processor and the program in the memory can be loaded and executed by the processor to implement the Kr separation method based on selective desorption as described in any one of claims 1 to 5.

7. A smart terminal, characterized in that, It includes a memory and a processor, wherein the memory stores a computer program that can be loaded by the processor and executed as described in any one of claims 1 to 5, based on the Kr separation method of selective desorption.

8. A computer-readable storage medium, characterized in that, The computer program is stored that can be loaded by a processor and executed as described in any one of claims 1 to 5, based on the Kr separation method of selective desorption.

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